JP7675954B2 - プラズマ処理装置及びプラズマ処理方法 - Google Patents

プラズマ処理装置及びプラズマ処理方法 Download PDF

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Publication number
JP7675954B2
JP7675954B2 JP2024570142A JP2024570142A JP7675954B2 JP 7675954 B2 JP7675954 B2 JP 7675954B2 JP 2024570142 A JP2024570142 A JP 2024570142A JP 2024570142 A JP2024570142 A JP 2024570142A JP 7675954 B2 JP7675954 B2 JP 7675954B2
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Prior art keywords
frequency power
antenna
high frequency
plasma processing
generating unit
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Japanese (ja)
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JPWO2024150666A1 (https=
Inventor
龍太 樋口
武尚 齊藤
俊希 中島
友志 北邨
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Tokyo Electron Ltd
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Tokyo Electron Ltd
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32174—Circuits specially adapted for controlling the RF discharge
    • H01J37/32183—Matching circuits
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
    • H01J37/3211—Antennas, e.g. particular shapes of coils
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
    • H01J37/32119—Windows
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32137—Radio frequency generated discharge controlling of the discharge by modulation of energy
    • H01J37/32155—Frequency modulation
    • H01J37/32165—Plural frequencies
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32174—Circuits specially adapted for controlling the RF discharge

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Plasma Technology (AREA)
  • Drying Of Semiconductors (AREA)
  • Chemical Vapour Deposition (AREA)
JP2024570142A 2023-01-12 2023-12-25 プラズマ処理装置及びプラズマ処理方法 Active JP7675954B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2025074159A JP2025114638A (ja) 2023-01-12 2025-04-28 プラズマ処理装置及びプラズマ処理方法

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2023002993 2023-01-12
JP2023002993 2023-01-12
PCT/JP2023/046507 WO2024150666A1 (ja) 2023-01-12 2023-12-25 プラズマ処理装置及びプラズマ処理方法

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JP2025074159A Division JP2025114638A (ja) 2023-01-12 2025-04-28 プラズマ処理装置及びプラズマ処理方法

Publications (2)

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JPWO2024150666A1 JPWO2024150666A1 (https=) 2024-07-18
JP7675954B2 true JP7675954B2 (ja) 2025-05-13

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JP2024570142A Active JP7675954B2 (ja) 2023-01-12 2023-12-25 プラズマ処理装置及びプラズマ処理方法
JP2025074159A Pending JP2025114638A (ja) 2023-01-12 2025-04-28 プラズマ処理装置及びプラズマ処理方法

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US (1) US20250343028A1 (https=)
EP (1) EP4651631A1 (https=)
JP (2) JP7675954B2 (https=)
KR (1) KR20250123936A (https=)
CN (1) CN120457773B (https=)
TW (1) TW202449837A (https=)
WO (1) WO2024150666A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2026034454A1 (ja) * 2024-08-06 2026-02-12 パナソニックＩｐマネジメント株式会社 電波放射装置

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016528667A (ja) 2013-06-17 2016-09-15 アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ プラズマチャンバ内での高速で再現性のあるプラズマの点火及び同調のための方法
US20190252153A1 (en) 2018-02-14 2019-08-15 Research & Business Foundation Sungkyunkwan University Apparatus for generating plasma and apparatus for treating substrate having the same
JP2020155814A (ja) 2019-03-18 2020-09-24 コニカミノルタ株式会社 画像形成システムおよび異常紙情報表示方法
JP2022139328A (ja) 2021-03-11 2022-09-26 東京エレクトロン株式会社 着火方法及びプラズマ処理装置

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008226857A (ja) * 2008-05-16 2008-09-25 Matsushita Electric Ind Co Ltd プラズマ処理方法及び装置
JP5479867B2 (ja) * 2009-01-14 2014-04-23 東京エレクトロン株式会社 誘導結合プラズマ処理装置
JP5851681B2 (ja) 2009-10-27 2016-02-03 東京エレクトロン株式会社 プラズマ処理装置
JP5606821B2 (ja) * 2010-08-04 2014-10-15 東京エレクトロン株式会社 プラズマ処理装置
JP2020158814A (ja) * 2019-03-26 2020-10-01 東京エレクトロン株式会社 成膜装置および成膜方法
JP7503993B2 (ja) * 2020-10-08 2024-06-21 東京エレクトロン株式会社 プラズマ処理装置およびプラズマ処理方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016528667A (ja) 2013-06-17 2016-09-15 アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ プラズマチャンバ内での高速で再現性のあるプラズマの点火及び同調のための方法
US20190252153A1 (en) 2018-02-14 2019-08-15 Research & Business Foundation Sungkyunkwan University Apparatus for generating plasma and apparatus for treating substrate having the same
JP2020155814A (ja) 2019-03-18 2020-09-24 コニカミノルタ株式会社 画像形成システムおよび異常紙情報表示方法
JP2022139328A (ja) 2021-03-11 2022-09-26 東京エレクトロン株式会社 着火方法及びプラズマ処理装置

Also Published As

Publication number Publication date
CN120457773B (zh) 2026-04-28
KR20250123936A (ko) 2025-08-18
CN120457773A (zh) 2025-08-08
EP4651631A1 (en) 2025-11-19
WO2024150666A1 (ja) 2024-07-18
US20250343028A1 (en) 2025-11-06
JPWO2024150666A1 (https=) 2024-07-18
TW202449837A (zh) 2024-12-16
JP2025114638A (ja) 2025-08-05

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