TW202438231A - 研磨方法及研磨裝置 - Google Patents
研磨方法及研磨裝置 Download PDFInfo
- Publication number
- TW202438231A TW202438231A TW113104592A TW113104592A TW202438231A TW 202438231 A TW202438231 A TW 202438231A TW 113104592 A TW113104592 A TW 113104592A TW 113104592 A TW113104592 A TW 113104592A TW 202438231 A TW202438231 A TW 202438231A
- Authority
- TW
- Taiwan
- Prior art keywords
- substrate
- grinding
- wafer
- polishing
- grinding wheel
- Prior art date
Links
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B47/00—Drives or gearings; Equipment therefor
- B24B47/22—Equipment for exact control of the position of the grinding tool or work at the start of the grinding operation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
- B24B49/02—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation according to the instantaneous size and required size of the workpiece acted upon, the measuring or gauging being continuous or intermittent
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B7/00—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
- B24B7/04—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor involving a rotary work-table
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P52/00—Grinding, lapping or polishing of wafers, substrates or parts of devices
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Grinding And Polishing Of Tertiary Curved Surfaces And Surfaces With Complex Shapes (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2023-023242 | 2023-02-17 | ||
| JP2023023242 | 2023-02-17 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TW202438231A true TW202438231A (zh) | 2024-10-01 |
Family
ID=92421765
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW113104592A TW202438231A (zh) | 2023-02-17 | 2024-02-06 | 研磨方法及研磨裝置 |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JPWO2024171883A1 (https=) |
| TW (1) | TW202438231A (https=) |
| WO (1) | WO2024171883A1 (https=) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI908478B (zh) * | 2024-11-20 | 2025-12-11 | 廣運機械工程股份有限公司 | 晶錠晶圓研磨系統 |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001277084A (ja) * | 2000-03-28 | 2001-10-09 | Nippei Toyama Corp | 両頭研削盤 |
| JP5814111B2 (ja) * | 2011-12-28 | 2015-11-17 | Ntn株式会社 | 研削盤の測定異常機能付き加工径測定装置 |
| JP6023598B2 (ja) * | 2013-01-30 | 2016-11-09 | コマツNtc株式会社 | 研削加工方法 |
| JP2019155488A (ja) * | 2018-03-07 | 2019-09-19 | 株式会社東京精密 | 研削盤 |
-
2024
- 2024-02-06 JP JP2025501069A patent/JPWO2024171883A1/ja active Pending
- 2024-02-06 WO PCT/JP2024/003849 patent/WO2024171883A1/ja not_active Ceased
- 2024-02-06 TW TW113104592A patent/TW202438231A/zh unknown
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI908478B (zh) * | 2024-11-20 | 2025-12-11 | 廣運機械工程股份有限公司 | 晶錠晶圓研磨系統 |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2024171883A1 (ja) | 2024-08-22 |
| JPWO2024171883A1 (https=) | 2024-08-22 |
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