TW202428566A - 化合物、組合物、硬化物、硬化物之製造方法及電子零件之製造方法 - Google Patents

化合物、組合物、硬化物、硬化物之製造方法及電子零件之製造方法 Download PDF

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Publication number
TW202428566A
TW202428566A TW112140541A TW112140541A TW202428566A TW 202428566 A TW202428566 A TW 202428566A TW 112140541 A TW112140541 A TW 112140541A TW 112140541 A TW112140541 A TW 112140541A TW 202428566 A TW202428566 A TW 202428566A
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Taiwan
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group
carbon atoms
compound
ring
substituted
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TW112140541A
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English (en)
Chinese (zh)
Inventor
村松洋亮
金原有希子
齋藤広真
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日商艾迪科股份有限公司
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Publication of TW202428566A publication Critical patent/TW202428566A/zh

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    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D401/00—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom
    • C07D401/02—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom containing two hetero rings
    • C07D401/04—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom containing two hetero rings directly linked by a ring-member-to-ring-member bond
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D221/00—Heterocyclic compounds containing six-membered rings having one nitrogen atom as the only ring hetero atom, not provided for by groups C07D211/00 - C07D219/00
    • C07D221/02—Heterocyclic compounds containing six-membered rings having one nitrogen atom as the only ring hetero atom, not provided for by groups C07D211/00 - C07D219/00 condensed with carbocyclic rings or ring systems
    • C07D221/04—Ortho- or peri-condensed ring systems
    • C07D221/18—Ring systems of four or more rings
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D409/00—Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms
    • C07D409/02—Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing two hetero rings
    • C07D409/04—Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing two hetero rings directly linked by a ring-member-to-ring-member bond
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/094—Multilayer resist systems, e.g. planarising layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G2261/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
    • C08G2261/10—Definition of the polymer structure
    • C08G2261/13—Morphological aspects
    • C08G2261/135—Cross-linked structures
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Structural Engineering (AREA)
  • Architecture (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Plural Heterocyclic Compounds (AREA)
  • Heterocyclic Carbon Compounds Containing A Hetero Ring Having Nitrogen And Oxygen As The Only Ring Hetero Atoms (AREA)
  • Nitrogen Condensed Heterocyclic Rings (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
TW112140541A 2022-10-26 2023-10-24 化合物、組合物、硬化物、硬化物之製造方法及電子零件之製造方法 TW202428566A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2022171826 2022-10-26
JP2022-171826 2022-10-26

Publications (1)

Publication Number Publication Date
TW202428566A true TW202428566A (zh) 2024-07-16

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Family Applications (1)

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TW112140541A TW202428566A (zh) 2022-10-26 2023-10-24 化合物、組合物、硬化物、硬化物之製造方法及電子零件之製造方法

Country Status (6)

Country Link
EP (1) EP4610254A1 (https=)
JP (1) JPWO2024090369A1 (https=)
KR (1) KR20250091208A (https=)
CN (1) CN120019045A (https=)
TW (1) TW202428566A (https=)
WO (1) WO2024090369A1 (https=)

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SG77689A1 (en) 1998-06-26 2001-01-16 Ciba Sc Holding Ag New o-acyloxime photoinitiators
NL1016815C2 (nl) 1999-12-15 2002-05-14 Ciba Sc Holding Ag Oximester-fotoinitiatoren.
EP1395615B1 (en) 2001-06-11 2009-10-21 Basf Se Oxime ester photoinitiators having a combined structure
CA2505893A1 (en) 2002-12-03 2004-06-17 Ciba Specialty Chemicals Holding Inc. Oxime ester photoinitiators with heteroaromatic groups
JP4565824B2 (ja) 2003-09-24 2010-10-20 株式会社Adeka 二量体オキシムエステル化合物及び該化合物を有効成分とする光重合開始剤
KR100799043B1 (ko) 2004-08-20 2008-01-28 가부시키가이샤 아데카 옥심 에스테르 화합물 및 이 화합물을 함유하는 광중합개시제
JP3798008B2 (ja) 2004-12-03 2006-07-19 旭電化工業株式会社 オキシムエステル化合物及び該化合物を含有する光重合開始剤
JP4818458B2 (ja) 2009-11-27 2011-11-16 株式会社Ａｄｅｋａ オキシムエステル化合物及び該化合物を含有する光重合開始剤
KR20140122613A (ko) * 2013-04-10 2014-10-20 삼성디스플레이 주식회사 헤테로아릴계 화합물 및 이를 포함한 유기 발광 소자
JP6595983B2 (ja) 2014-04-04 2019-10-23 株式会社Ａｄｅｋａ オキシムエステル化合物及び該化合物を含有する光重合開始剤
US20180356732A1 (en) 2015-12-01 2018-12-13 Nissan Chemical Industries, Ltd. Resist underlayer film-forming composition containing indolocarbazole novolak resin
CN108473436B (zh) * 2015-12-28 2021-07-06 富士胶片株式会社 化合物、固化性组合物、固化物、光学部件及透镜
US10811618B2 (en) * 2016-12-19 2020-10-20 Universal Display Corporation Organic electroluminescent materials and devices
EP4265614A4 (en) 2020-12-17 2024-11-20 Adeka Corporation COMPOUND AND COMPOSITION
JP7702974B2 (ja) * 2020-12-28 2025-07-04 Jsr株式会社 半導体基板の製造方法及び組成物
CN113861113B (zh) * 2021-09-14 2022-12-06 中国科学院福建物质结构研究所 一种稠环吡啶化合物及其衍生物的制备和应用

Also Published As

Publication number Publication date
WO2024090369A1 (ja) 2024-05-02
CN120019045A (zh) 2025-05-16
JPWO2024090369A1 (https=) 2024-05-02
EP4610254A1 (en) 2025-09-03
KR20250091208A (ko) 2025-06-20

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