KR20250091208A - 화합물, 조성물, 경화물, 경화물의 제조 방법 및 전자부품의 제조 방법 - Google Patents

화합물, 조성물, 경화물, 경화물의 제조 방법 및 전자부품의 제조 방법 Download PDF

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Publication number
KR20250091208A
KR20250091208A KR1020257012275A KR20257012275A KR20250091208A KR 20250091208 A KR20250091208 A KR 20250091208A KR 1020257012275 A KR1020257012275 A KR 1020257012275A KR 20257012275 A KR20257012275 A KR 20257012275A KR 20250091208 A KR20250091208 A KR 20250091208A
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KR
South Korea
Prior art keywords
group
carbon atoms
ring
compound
substituted
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Pending
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KR1020257012275A
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English (en)
Korean (ko)
Inventor
요스케 무라마츠
유키코 카네하라
히로마사 사이토
Original Assignee
가부시키가이샤 아데카
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Publication of KR20250091208A publication Critical patent/KR20250091208A/ko
Pending legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D401/00—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom
    • C07D401/02—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom containing two hetero rings
    • C07D401/04—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom containing two hetero rings directly linked by a ring-member-to-ring-member bond
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D221/00—Heterocyclic compounds containing six-membered rings having one nitrogen atom as the only ring hetero atom, not provided for by groups C07D211/00 - C07D219/00
    • C07D221/02—Heterocyclic compounds containing six-membered rings having one nitrogen atom as the only ring hetero atom, not provided for by groups C07D211/00 - C07D219/00 condensed with carbocyclic rings or ring systems
    • C07D221/04—Ortho- or peri-condensed ring systems
    • C07D221/18—Ring systems of four or more rings
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D409/00—Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms
    • C07D409/02—Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing two hetero rings
    • C07D409/04—Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing two hetero rings directly linked by a ring-member-to-ring-member bond
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/094—Multilayer resist systems, e.g. planarising layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G2261/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
    • C08G2261/10—Definition of the polymer structure
    • C08G2261/13—Morphological aspects
    • C08G2261/135—Cross-linked structures
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Structural Engineering (AREA)
  • Architecture (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Plural Heterocyclic Compounds (AREA)
  • Heterocyclic Carbon Compounds Containing A Hetero Ring Having Nitrogen And Oxygen As The Only Ring Hetero Atoms (AREA)
  • Nitrogen Condensed Heterocyclic Rings (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
KR1020257012275A 2022-10-26 2023-10-23 화합물, 조성물, 경화물, 경화물의 제조 방법 및 전자부품의 제조 방법 Pending KR20250091208A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2022171826 2022-10-26
JPJP-P-2022-171826 2022-10-26
PCT/JP2023/038145 WO2024090369A1 (ja) 2022-10-26 2023-10-23 化合物、組成物、硬化物、硬化物の製造方法及び電子部品の製造方法

Publications (1)

Publication Number Publication Date
KR20250091208A true KR20250091208A (ko) 2025-06-20

Family

ID=90830886

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020257012275A Pending KR20250091208A (ko) 2022-10-26 2023-10-23 화합물, 조성물, 경화물, 경화물의 제조 방법 및 전자부품의 제조 방법

Country Status (6)

Country Link
EP (1) EP4610254A1 (https=)
JP (1) JPWO2024090369A1 (https=)
KR (1) KR20250091208A (https=)
CN (1) CN120019045A (https=)
TW (1) TW202428566A (https=)
WO (1) WO2024090369A1 (https=)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20180356732A1 (en) 2015-12-01 2018-12-13 Nissan Chemical Industries, Ltd. Resist underlayer film-forming composition containing indolocarbazole novolak resin
WO2022131346A1 (ja) 2020-12-17 2022-06-23 株式会社Adeka 化合物及び組成物

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SG77689A1 (en) 1998-06-26 2001-01-16 Ciba Sc Holding Ag New o-acyloxime photoinitiators
NL1016815C2 (nl) 1999-12-15 2002-05-14 Ciba Sc Holding Ag Oximester-fotoinitiatoren.
EP1395615B1 (en) 2001-06-11 2009-10-21 Basf Se Oxime ester photoinitiators having a combined structure
CA2505893A1 (en) 2002-12-03 2004-06-17 Ciba Specialty Chemicals Holding Inc. Oxime ester photoinitiators with heteroaromatic groups
JP4565824B2 (ja) 2003-09-24 2010-10-20 株式会社Adeka 二量体オキシムエステル化合物及び該化合物を有効成分とする光重合開始剤
KR100799043B1 (ko) 2004-08-20 2008-01-28 가부시키가이샤 아데카 옥심 에스테르 화합물 및 이 화합물을 함유하는 광중합개시제
JP3798008B2 (ja) 2004-12-03 2006-07-19 旭電化工業株式会社 オキシムエステル化合物及び該化合物を含有する光重合開始剤
JP4818458B2 (ja) 2009-11-27 2011-11-16 株式会社Ａｄｅｋａ オキシムエステル化合物及び該化合物を含有する光重合開始剤
KR20140122613A (ko) * 2013-04-10 2014-10-20 삼성디스플레이 주식회사 헤테로아릴계 화합물 및 이를 포함한 유기 발광 소자
JP6595983B2 (ja) 2014-04-04 2019-10-23 株式会社Ａｄｅｋａ オキシムエステル化合物及び該化合物を含有する光重合開始剤
CN108473436B (zh) * 2015-12-28 2021-07-06 富士胶片株式会社 化合物、固化性组合物、固化物、光学部件及透镜
US10811618B2 (en) * 2016-12-19 2020-10-20 Universal Display Corporation Organic electroluminescent materials and devices
JP7702974B2 (ja) * 2020-12-28 2025-07-04 Jsr株式会社 半導体基板の製造方法及び組成物
CN113861113B (zh) * 2021-09-14 2022-12-06 中国科学院福建物质结构研究所 一种稠环吡啶化合物及其衍生物的制备和应用

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20180356732A1 (en) 2015-12-01 2018-12-13 Nissan Chemical Industries, Ltd. Resist underlayer film-forming composition containing indolocarbazole novolak resin
WO2022131346A1 (ja) 2020-12-17 2022-06-23 株式会社Adeka 化合物及び組成物

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
J. Chem. Res. (2016), Vol.40, p428-435(Abudullah M. AsrI et al.)

Also Published As

Publication number Publication date
WO2024090369A1 (ja) 2024-05-02
CN120019045A (zh) 2025-05-16
JPWO2024090369A1 (https=) 2024-05-02
EP4610254A1 (en) 2025-09-03
TW202428566A (zh) 2024-07-16

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