TW202415811A - 被覆基材 - Google Patents

被覆基材 Download PDF

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Publication number
TW202415811A
TW202415811A TW112129274A TW112129274A TW202415811A TW 202415811 A TW202415811 A TW 202415811A TW 112129274 A TW112129274 A TW 112129274A TW 112129274 A TW112129274 A TW 112129274A TW 202415811 A TW202415811 A TW 202415811A
Authority
TW
Taiwan
Prior art keywords
film
substrate
atm
bath
coated substrate
Prior art date
Application number
TW112129274A
Other languages
English (en)
Chinese (zh)
Inventor
村田朋來
Original Assignee
日商日本特殊陶業股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商日本特殊陶業股份有限公司 filed Critical 日商日本特殊陶業股份有限公司
Publication of TW202415811A publication Critical patent/TW202415811A/zh

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Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D9/00Electrolytic coating other than with metals
    • C25D9/04Electrolytic coating other than with metals with inorganic materials
    • C25D9/08Electrolytic coating other than with metals with inorganic materials by cathodic processes
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C26/00Coating not provided for in groups C23C2/00 - C23C24/00
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D9/00Electrolytic coating other than with metals
    • C25D9/04Electrolytic coating other than with metals with inorganic materials
    • C25D9/08Electrolytic coating other than with metals with inorganic materials by cathodic processes
    • C25D9/10Electrolytic coating other than with metals with inorganic materials by cathodic processes on iron or steel

Landscapes

  • Chemical & Material Sciences (AREA)
  • Metallurgy (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Electrochemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Vapour Deposition (AREA)
  • Carbon And Carbon Compounds (AREA)
  • Chemically Coating (AREA)
  • Physical Vapour Deposition (AREA)
  • Laminated Bodies (AREA)
TW112129274A 2022-08-05 2023-08-04 被覆基材 TW202415811A (zh)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2022125321 2022-08-05
JP2022-125321 2022-08-05
PCT/JP2023/026614 WO2024029362A1 (ja) 2022-08-05 2023-07-20 被覆基材
WOPCT/JP2023/026614 2023-07-20

Publications (1)

Publication Number Publication Date
TW202415811A true TW202415811A (zh) 2024-04-16

Family

ID=89848879

Family Applications (1)

Application Number Title Priority Date Filing Date
TW112129274A TW202415811A (zh) 2022-08-05 2023-08-04 被覆基材

Country Status (6)

Country Link
EP (1) EP4567161A1 (enrdf_load_stackoverflow)
JP (1) JPWO2024029362A1 (enrdf_load_stackoverflow)
KR (1) KR20250004328A (enrdf_load_stackoverflow)
CN (1) CN119317738A (enrdf_load_stackoverflow)
TW (1) TW202415811A (enrdf_load_stackoverflow)
WO (1) WO2024029362A1 (enrdf_load_stackoverflow)

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0248103A (ja) * 1989-06-20 1990-02-16 Sumitomo Electric Ind Ltd 被覆超硬合金工具及びその製造法
JP3865442B2 (ja) 1995-11-22 2007-01-10 のぞみフォトニクス株式会社 多層酸化物薄膜素子及びその製造方法
JP3001849B2 (ja) * 1998-03-16 2000-01-24 日立ツール株式会社 被覆硬質工具
JP2000117509A (ja) * 1998-10-14 2000-04-25 Mitsubishi Materials Corp 耐摩耗性の優れた表面被覆超硬合金製スローアウエイ切削チップ
JP2009147192A (ja) 2007-12-17 2009-07-02 Fujifilm Corp 結晶性無機膜とその製造方法、半導体装置
JP5535466B2 (ja) * 2008-10-31 2014-07-02 ゼネラル・エレクトリック・カンパニイ 金属酸化物コーティング
JP2011032521A (ja) 2009-07-31 2011-02-17 Mitsubishi Materials Corp Csd溶液及び該溶液を用いたcis系膜形成方法
JP5896508B2 (ja) * 2011-04-28 2016-03-30 学校法人早稲田大学 組成物およびニッケル炭化物Ni3Cを主相とするめっき膜の製造用電気めっき液
CN104302804B (zh) * 2012-12-26 2016-10-26 伍尚华 一种采用物理气相沉积工艺在氮化硅切削刀具表面制备Al2O3涂层及其复合涂层的方法
JP6213173B2 (ja) 2013-11-14 2017-10-18 東ソー株式会社 チタン酸化物膜の製造方法及びチタン酸化物膜
JP7121234B2 (ja) * 2018-07-10 2022-08-18 三菱マテリアル株式会社 硬質被覆層が優れた耐チッピング性を発揮する表面切削工具

Also Published As

Publication number Publication date
CN119317738A (zh) 2025-01-14
WO2024029362A1 (ja) 2024-02-08
KR20250004328A (ko) 2025-01-07
JPWO2024029362A1 (enrdf_load_stackoverflow) 2024-02-08
EP4567161A1 (en) 2025-06-11

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