KR20250004328A - 피복 기재 - Google Patents
피복 기재 Download PDFInfo
- Publication number
- KR20250004328A KR20250004328A KR1020247039072A KR20247039072A KR20250004328A KR 20250004328 A KR20250004328 A KR 20250004328A KR 1020247039072 A KR1020247039072 A KR 1020247039072A KR 20247039072 A KR20247039072 A KR 20247039072A KR 20250004328 A KR20250004328 A KR 20250004328A
- Authority
- KR
- South Korea
- Prior art keywords
- film
- atm
- substrate
- less
- bath solution
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D9/00—Electrolytic coating other than with metals
- C25D9/04—Electrolytic coating other than with metals with inorganic materials
- C25D9/08—Electrolytic coating other than with metals with inorganic materials by cathodic processes
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C26/00—Coating not provided for in groups C23C2/00 - C23C24/00
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D9/00—Electrolytic coating other than with metals
- C25D9/04—Electrolytic coating other than with metals with inorganic materials
- C25D9/08—Electrolytic coating other than with metals with inorganic materials by cathodic processes
- C25D9/10—Electrolytic coating other than with metals with inorganic materials by cathodic processes on iron or steel
Landscapes
- Chemical & Material Sciences (AREA)
- Metallurgy (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Electrochemistry (AREA)
- Inorganic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Chemical Vapour Deposition (AREA)
- Carbon And Carbon Compounds (AREA)
- Chemically Coating (AREA)
- Physical Vapour Deposition (AREA)
- Laminated Bodies (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2022125321 | 2022-08-05 | ||
JPJP-P-2022-125321 | 2022-08-05 | ||
PCT/JP2023/026614 WO2024029362A1 (ja) | 2022-08-05 | 2023-07-20 | 被覆基材 |
Publications (1)
Publication Number | Publication Date |
---|---|
KR20250004328A true KR20250004328A (ko) | 2025-01-07 |
Family
ID=89848879
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020247039072A Pending KR20250004328A (ko) | 2022-08-05 | 2023-07-20 | 피복 기재 |
Country Status (6)
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH09202606A (ja) | 1995-11-22 | 1997-08-05 | Fuji Xerox Co Ltd | 多層酸化物薄膜素子及びその製造方法 |
JP2009147192A (ja) | 2007-12-17 | 2009-07-02 | Fujifilm Corp | 結晶性無機膜とその製造方法、半導体装置 |
JP2011032521A (ja) | 2009-07-31 | 2011-02-17 | Mitsubishi Materials Corp | Csd溶液及び該溶液を用いたcis系膜形成方法 |
JP2015093821A (ja) | 2013-11-14 | 2015-05-18 | 東ソー株式会社 | チタン酸化物膜の製造方法及びチタン酸化物膜 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0248103A (ja) * | 1989-06-20 | 1990-02-16 | Sumitomo Electric Ind Ltd | 被覆超硬合金工具及びその製造法 |
JP3001849B2 (ja) * | 1998-03-16 | 2000-01-24 | 日立ツール株式会社 | 被覆硬質工具 |
JP2000117509A (ja) * | 1998-10-14 | 2000-04-25 | Mitsubishi Materials Corp | 耐摩耗性の優れた表面被覆超硬合金製スローアウエイ切削チップ |
JP5535466B2 (ja) * | 2008-10-31 | 2014-07-02 | ゼネラル・エレクトリック・カンパニイ | 金属酸化物コーティング |
JP5896508B2 (ja) * | 2011-04-28 | 2016-03-30 | 学校法人早稲田大学 | 組成物およびニッケル炭化物Ni3Cを主相とするめっき膜の製造用電気めっき液 |
CN104302804B (zh) * | 2012-12-26 | 2016-10-26 | 伍尚华 | 一种采用物理气相沉积工艺在氮化硅切削刀具表面制备Al2O3涂层及其复合涂层的方法 |
JP7121234B2 (ja) * | 2018-07-10 | 2022-08-18 | 三菱マテリアル株式会社 | 硬質被覆層が優れた耐チッピング性を発揮する表面切削工具 |
-
2023
- 2023-07-20 EP EP23849917.2A patent/EP4567161A1/en active Pending
- 2023-07-20 WO PCT/JP2023/026614 patent/WO2024029362A1/ja active Application Filing
- 2023-07-20 JP JP2024538928A patent/JPWO2024029362A1/ja active Pending
- 2023-07-20 KR KR1020247039072A patent/KR20250004328A/ko active Pending
- 2023-07-20 CN CN202380044412.2A patent/CN119317738A/zh active Pending
- 2023-08-04 TW TW112129274A patent/TW202415811A/zh unknown
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH09202606A (ja) | 1995-11-22 | 1997-08-05 | Fuji Xerox Co Ltd | 多層酸化物薄膜素子及びその製造方法 |
JP2009147192A (ja) | 2007-12-17 | 2009-07-02 | Fujifilm Corp | 結晶性無機膜とその製造方法、半導体装置 |
JP2011032521A (ja) | 2009-07-31 | 2011-02-17 | Mitsubishi Materials Corp | Csd溶液及び該溶液を用いたcis系膜形成方法 |
JP2015093821A (ja) | 2013-11-14 | 2015-05-18 | 東ソー株式会社 | チタン酸化物膜の製造方法及びチタン酸化物膜 |
Also Published As
Publication number | Publication date |
---|---|
CN119317738A (zh) | 2025-01-14 |
WO2024029362A1 (ja) | 2024-02-08 |
JPWO2024029362A1 (enrdf_load_stackoverflow) | 2024-02-08 |
EP4567161A1 (en) | 2025-06-11 |
TW202415811A (zh) | 2024-04-16 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PA0105 | International application |
Patent event date: 20241125 Patent event code: PA01051R01D Comment text: International Patent Application |
|
PA0201 | Request for examination | ||
PG1501 | Laying open of application |