JPWO2024029362A1 - - Google Patents

Info

Publication number
JPWO2024029362A1
JPWO2024029362A1 JP2024538928A JP2024538928A JPWO2024029362A1 JP WO2024029362 A1 JPWO2024029362 A1 JP WO2024029362A1 JP 2024538928 A JP2024538928 A JP 2024538928A JP 2024538928 A JP2024538928 A JP 2024538928A JP WO2024029362 A1 JPWO2024029362 A1 JP WO2024029362A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2024538928A
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2024029362A1 publication Critical patent/JPWO2024029362A1/ja
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D9/00Electrolytic coating other than with metals
    • C25D9/04Electrolytic coating other than with metals with inorganic materials
    • C25D9/08Electrolytic coating other than with metals with inorganic materials by cathodic processes
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C26/00Coating not provided for in groups C23C2/00 - C23C24/00
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D9/00Electrolytic coating other than with metals
    • C25D9/04Electrolytic coating other than with metals with inorganic materials
    • C25D9/08Electrolytic coating other than with metals with inorganic materials by cathodic processes
    • C25D9/10Electrolytic coating other than with metals with inorganic materials by cathodic processes on iron or steel

Landscapes

  • Chemical & Material Sciences (AREA)
  • Metallurgy (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Electrochemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Vapour Deposition (AREA)
  • Carbon And Carbon Compounds (AREA)
  • Chemically Coating (AREA)
  • Physical Vapour Deposition (AREA)
  • Laminated Bodies (AREA)
JP2024538928A 2022-08-05 2023-07-20 Pending JPWO2024029362A1 (enrdf_load_stackoverflow)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2022125321 2022-08-05
PCT/JP2023/026614 WO2024029362A1 (ja) 2022-08-05 2023-07-20 被覆基材

Publications (1)

Publication Number Publication Date
JPWO2024029362A1 true JPWO2024029362A1 (enrdf_load_stackoverflow) 2024-02-08

Family

ID=89848879

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2024538928A Pending JPWO2024029362A1 (enrdf_load_stackoverflow) 2022-08-05 2023-07-20

Country Status (6)

Country Link
EP (1) EP4567161A1 (enrdf_load_stackoverflow)
JP (1) JPWO2024029362A1 (enrdf_load_stackoverflow)
KR (1) KR20250004328A (enrdf_load_stackoverflow)
CN (1) CN119317738A (enrdf_load_stackoverflow)
TW (1) TW202415811A (enrdf_load_stackoverflow)
WO (1) WO2024029362A1 (enrdf_load_stackoverflow)

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0248103A (ja) * 1989-06-20 1990-02-16 Sumitomo Electric Ind Ltd 被覆超硬合金工具及びその製造法
JPH11264066A (ja) * 1998-03-16 1999-09-28 Hitachi Tool Eng Ltd 被覆硬質工具
JP2000117509A (ja) * 1998-10-14 2000-04-25 Mitsubishi Materials Corp 耐摩耗性の優れた表面被覆超硬合金製スローアウエイ切削チップ
JP2010105979A (ja) * 2008-10-31 2010-05-13 General Electric Co <Ge> 金属酸化物コーティング
JP2012233223A (ja) * 2011-04-28 2012-11-29 Waseda Univ 電気めっき組成物、および、電気めっき液
JP2020006487A (ja) * 2018-07-10 2020-01-16 三菱マテリアル株式会社 硬質被覆層が優れた耐チッピング性を発揮する表面切削工具

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3865442B2 (ja) 1995-11-22 2007-01-10 のぞみフォトニクス株式会社 多層酸化物薄膜素子及びその製造方法
JP2009147192A (ja) 2007-12-17 2009-07-02 Fujifilm Corp 結晶性無機膜とその製造方法、半導体装置
JP2011032521A (ja) 2009-07-31 2011-02-17 Mitsubishi Materials Corp Csd溶液及び該溶液を用いたcis系膜形成方法
CN104302804B (zh) * 2012-12-26 2016-10-26 伍尚华 一种采用物理气相沉积工艺在氮化硅切削刀具表面制备Al2O3涂层及其复合涂层的方法
JP6213173B2 (ja) 2013-11-14 2017-10-18 東ソー株式会社 チタン酸化物膜の製造方法及びチタン酸化物膜

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0248103A (ja) * 1989-06-20 1990-02-16 Sumitomo Electric Ind Ltd 被覆超硬合金工具及びその製造法
JPH11264066A (ja) * 1998-03-16 1999-09-28 Hitachi Tool Eng Ltd 被覆硬質工具
JP2000117509A (ja) * 1998-10-14 2000-04-25 Mitsubishi Materials Corp 耐摩耗性の優れた表面被覆超硬合金製スローアウエイ切削チップ
JP2010105979A (ja) * 2008-10-31 2010-05-13 General Electric Co <Ge> 金属酸化物コーティング
JP2012233223A (ja) * 2011-04-28 2012-11-29 Waseda Univ 電気めっき組成物、および、電気めっき液
JP2020006487A (ja) * 2018-07-10 2020-01-16 三菱マテリアル株式会社 硬質被覆層が優れた耐チッピング性を発揮する表面切削工具

Also Published As

Publication number Publication date
CN119317738A (zh) 2025-01-14
WO2024029362A1 (ja) 2024-02-08
KR20250004328A (ko) 2025-01-07
EP4567161A1 (en) 2025-06-11
TW202415811A (zh) 2024-04-16

Similar Documents

Publication Publication Date Title
JPWO2024029362A1 (enrdf_load_stackoverflow)
JPWO2024029363A1 (enrdf_load_stackoverflow)
BR102022026909A2 (enrdf_load_stackoverflow)
BR202022009269U2 (enrdf_load_stackoverflow)
BR202022005961U2 (enrdf_load_stackoverflow)
CN307046250S (enrdf_load_stackoverflow)
BY13135U (enrdf_load_stackoverflow)
CN307050250S (enrdf_load_stackoverflow)
CN307049372S (enrdf_load_stackoverflow)
CN307049368S (enrdf_load_stackoverflow)
BY13142U (enrdf_load_stackoverflow)
CN307049311S (enrdf_load_stackoverflow)
BY13140U (enrdf_load_stackoverflow)
BY13139U (enrdf_load_stackoverflow)
BY13138U (enrdf_load_stackoverflow)
CN307048308S (enrdf_load_stackoverflow)
BY13137U (enrdf_load_stackoverflow)
CN307048184S (enrdf_load_stackoverflow)
CN307045410S (enrdf_load_stackoverflow)
CN307047482S (enrdf_load_stackoverflow)
CN307045450S (enrdf_load_stackoverflow)
CN307047403S (enrdf_load_stackoverflow)
CN307047308S (enrdf_load_stackoverflow)
CN307046818S (enrdf_load_stackoverflow)
BY13159U (enrdf_load_stackoverflow)

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20240405

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20250701

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20250818