TW202327745A - Glass plate cleaning device and glass plate manufacturing method - Google Patents

Glass plate cleaning device and glass plate manufacturing method Download PDF

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Publication number
TW202327745A
TW202327745A TW111142632A TW111142632A TW202327745A TW 202327745 A TW202327745 A TW 202327745A TW 111142632 A TW111142632 A TW 111142632A TW 111142632 A TW111142632 A TW 111142632A TW 202327745 A TW202327745 A TW 202327745A
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cleaning
glass plate
rotating shaft
cleaning device
cleaning member
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TW111142632A
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Chinese (zh)
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鑑継薫
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日商日本電氣硝子股份有限公司
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Publication of TW202327745A publication Critical patent/TW202327745A/en

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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B1/00Cleaning by methods involving the use of tools
    • B08B1/30Cleaning by methods involving the use of tools by movement of cleaning members over a surface
    • B08B1/32Cleaning by methods involving the use of tools by movement of cleaning members over a surface using rotary cleaning members
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04Cleaning involving contact with liquid
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C23/00Other surface treatment of glass not in the form of fibres or filaments
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/304Mechanical treatment, e.g. grinding, polishing, cutting

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning In General (AREA)
  • Surface Treatment Of Glass (AREA)
  • Cleaning By Liquid Or Steam (AREA)

Abstract

Provided is a glass plate cleaning device 1 comprising: a rotary cleaning body W which has a cleaning member 9 that contacts the upper surface Ga of a glass plate G, and a rotary shaft 8 that is coupled to the cleaning member 9 and rotates together with the cleaning member 9; and a support base 5 for supporting the rotary shaft 8. The support base 5 comprises a sliding support structure S for supporting the rotary shaft 8 so as to allow movement thereof in the axial direction.

Description

玻璃板的清洗裝置以及玻璃板的製造方法Glass plate cleaning device and glass plate manufacturing method

本發明是有關於一種玻璃板的清洗裝置以及包括清洗步驟的玻璃板的製造方法。The invention relates to a glass plate cleaning device and a glass plate manufacturing method including a cleaning step.

液晶顯示器、有機電致發光(Electro-Luminescence,EL)顯示器等顯示器不斷推進高精細化。隨之,在顯示器的製造步驟中,會在用作顯示器用基板的玻璃板的主表面形成緻密的電路。因此,對於此種玻璃板要求不附著灰塵或污垢的高潔淨性。Displays such as liquid crystal displays and organic electro-luminescence (EL) displays continue to advance in high-definition. Accordingly, in the manufacturing process of the display, a dense circuit is formed on the main surface of the glass plate used as the substrate for the display. Therefore, such a glass plate is required to have high cleanliness that does not adhere to dust or dirt.

因此,在玻璃板的製造步驟中,將原始玻璃板切斷成規定尺寸而獲得多片玻璃板的切斷步驟後等,一般要設置清洗玻璃板的主表面的清洗步驟。Therefore, in the manufacturing process of a glass plate, the cleaning process of cleaning the main surface of a glass plate is generally provided after the cutting process of cutting an original glass plate into a predetermined size and obtaining a plurality of glass plates.

作為玻璃板的主表面的清洗方法,例如可列舉專利文獻1中所揭示的方法。該文獻中,在使多個清洗構件接觸於玻璃板的主表面的狀態下,使各清洗構件旋轉。藉此,一邊擦拭玻璃板的主表面一邊進行清洗。另外,清洗構件安裝於旋轉軸(轉軸(spindle))的頭端部。藉由旋轉驅動該旋轉軸,使得清洗構件與旋轉軸一起旋轉。 [現有技術文獻] [專利文獻] As a cleaning method of the main surface of a glass plate, the method disclosed by patent document 1 is mentioned, for example. In this document, each cleaning member is rotated in a state where a plurality of cleaning members are brought into contact with the main surface of the glass plate. Thereby, washing|cleaning is performed wiping the main surface of a glass plate. In addition, the cleaning member is attached to the head end of the rotating shaft (spindle). By rotationally driving the rotating shaft, the cleaning member rotates together with the rotating shaft. [Prior art literature] [Patent Document]

專利文獻1:日本專利特開2020-7193號公報Patent Document 1: Japanese Patent Laid-Open No. 2020-7193

[發明所欲解決之課題] 專利文獻1中揭示有為了調整相對於玻璃板的清洗構件的高度位置,而在清洗構件與旋轉軸之間設置間隔件(spacer)。藉由調整該間隔件的厚度,可調整相對於玻璃板的清洗構件的高度位置。 [Problem to be Solved by the Invention] Patent Document 1 discloses that a spacer is provided between the cleaning member and the rotation shaft in order to adjust the height position of the cleaning member with respect to the glass plate. By adjusting the thickness of the spacer, the height position of the cleaning member relative to the glass plate can be adjusted.

然而,即便設置了間隔件,亦會因間隔件的厚度的偏差等而導致有時無法準確地調整相對於玻璃板的清洗構件的高度位置。其結果,有清洗構件與玻璃板的接觸狀態不充分,在玻璃板的主表面產生清洗不均之虞。However, even if the spacer is provided, the height position of the cleaning member with respect to the glass plate may not be accurately adjusted due to variations in the thickness of the spacer or the like. As a result, the contact state between the cleaning member and the glass plate is insufficient, and cleaning unevenness may occur on the main surface of the glass plate.

本發明的課題在於確實地減少玻璃板的主表面的清洗不均。 [解決課題之手段] The subject of this invention is to reduce the unevenness of cleaning of the main surface of a glass plate reliably. [Means to solve the problem]

(1)為了解決所述課題而創立的本發明的玻璃板的清洗裝置的特徵在於包括:旋轉清洗體,具有接觸於玻璃板的主表面的清洗構件及連結於清洗構件而與清洗構件一起旋轉的旋轉軸;以及支撐台,支撐旋轉軸;支撐台包括滑動支撐結構,所述滑動支撐結構能夠使旋轉軸沿軸向移動地支撐旋轉軸。(1) The glass plate cleaning device of the present invention created in order to solve the above-mentioned problems is characterized in that it includes: a rotating cleaning body, a cleaning member having contact with the main surface of the glass plate, and being connected to the cleaning member so as to rotate together with the cleaning member. and a supporting table supporting the rotating shaft; the supporting table includes a sliding support structure that supports the rotating shaft so that the rotating shaft can move in an axial direction.

如此,利用滑動支撐結構使旋轉軸沿軸向移動(滑動),藉此能夠準確地調整相對於玻璃板的主表面的清洗構件的高度位置。其結果,清洗構件與玻璃板的主表面的接觸狀態穩定,能夠確實地減少玻璃板的主表面的清洗不均。In this way, by moving (sliding) the rotation shaft in the axial direction by the sliding support structure, it is possible to accurately adjust the height position of the cleaning member with respect to the main surface of the glass plate. As a result, the contact state between the cleaning member and the main surface of the glass plate is stabilized, and uneven cleaning of the main surface of the glass plate can be reliably reduced.

(2)所述(1)的結構中,較佳為包括多個旋轉清洗體,且一個支撐台包括多個滑動支撐結構,所述多個滑動支撐結構能夠使多個旋轉軸沿各自的軸向移動地支撐多個旋轉軸。(2) In the structure of (1), it is preferable to include a plurality of rotating cleaning bodies, and one support table includes a plurality of sliding support structures, and the plurality of sliding support structures can make a plurality of rotating shafts rotate along their respective axes. A plurality of rotation axes are supported for movement.

如此,能夠以一個支撐台支撐多個旋轉軸,並且藉由各滑動支撐結構個別地調整連結於各旋轉軸的各清洗構件的高度位置。In this way, a plurality of rotating shafts can be supported by one supporting platform, and the height positions of the cleaning members connected to the rotating shafts can be individually adjusted through the sliding support structures.

(3)所述(1)或(2)的結構中,較佳為滑動支撐結構構成為,旋轉軸利用旋轉清洗體的自重向主表面側移動。(3) In the structure of (1) or (2) above, it is preferable that the sliding support structure is configured so that the rotating shaft moves toward the main surface side by the self-weight of the rotating cleaning body.

如此,由於令旋轉軸始終接近於玻璃板的主表面,故而清洗構件與玻璃板的主表面的接觸狀態更穩定。In this way, since the rotation axis is always brought close to the main surface of the glass plate, the contact state between the cleaning member and the main surface of the glass plate becomes more stable.

(4)所述(3)的結構中,較佳為旋轉清洗體包括能夠裝卸的重物。(4) In the structure of (3) above, it is preferable that the rotary cleaning body includes a loadable and detachable weight.

如此,可藉由重物的重量來調整旋轉軸朝向玻璃板的主表面側的力。因此,清洗構件與玻璃板的主表面的接觸狀態更穩定。In this way, the force of the rotating shaft toward the main surface side of the glass plate can be adjusted by the weight of the weight. Therefore, the contact state of the cleaning member and the main surface of the glass plate becomes more stable.

(5)所述(1)至(4)中任一項的結構中,較佳為滑動支撐結構包括滑動軸承,所述滑動軸承能夠使旋轉軸旋轉且能夠使旋轉軸沿軸向移動地支撐旋轉軸。(5) In the structure of any one of (1) to (4), it is preferable that the sliding support structure includes a sliding bearing that can rotate the rotating shaft and support the rotating shaft in the axial direction. axis of rotation.

如此,可容許旋轉軸的軸向的移動,並且使旋轉軸的旋轉穩定。In this way, the axial movement of the rotary shaft is allowed, and the rotation of the rotary shaft is stabilized.

(6)為了解決所述課題而創立的本發明的玻璃板的製造方法的特徵在於包括:清洗步驟,使用具有所述(1)至(5)中任一項的結構的玻璃板清洗裝置,清洗玻璃板的主表面。(6) The manufacturing method of the glass plate of the present invention created in order to solve the above-mentioned problems is characterized by comprising: a cleaning step using a glass plate cleaning device having the structure of any one of the above (1) to (5), Clean the main surface of the glass plate.

如此,能夠享有與已述對應結構相同的作用效果。 [發明的效果] In this way, it is possible to enjoy the same operation and effect as the above-mentioned corresponding structure. [Effect of the invention]

根據本發明,清洗構件與玻璃板的主表面的接觸狀態穩定,因此能夠確實地減少玻璃板的主表面的清洗不均。According to the present invention, since the contact state between the cleaning member and the main surface of the glass plate is stabilized, unevenness in cleaning of the main surface of the glass plate can be reliably reduced.

以下,一邊參照圖式,一邊對本實施方式的玻璃板的清洗裝置以及玻璃板的製造方法進行說明。另外,圖中的XYZ是正交座標系。X方向及Y方向是水平方向,Z方向是鉛垂方向。對各實施方式中對應的結構要素標註相同符號,因此有時省略重複說明。在各實施方式中僅說明結構的一部分的情況下,對於所述結構的其他部分,可適用先前說明的其他實施方式的結構。不僅在各實施方式的說明中闡明的結構的組合,只要不對組合產生特別障礙,則即便未闡明,亦可將多個實施方式的結構彼此部分組合。Hereinafter, the washing|cleaning apparatus of the glass plate which concerns on this embodiment, and the manufacturing method of a glass plate are demonstrated, referring drawings. In addition, XYZ in the figure is an orthogonal coordinate system. The X direction and the Y direction are horizontal directions, and the Z direction is a vertical direction. Since the same code|symbol is attached|subjected to the corresponding structural element in each embodiment, overlapping description may be abbreviate|omitted. When only a part of the structure is described in each embodiment, the structures of other embodiments described above can be applied to the other parts of the structure. Not only the combination of the structures explained in the description of the respective embodiments, but also partial combinations of the structures of the plurality of embodiments may be combined even if it is not explained, unless there is a particular hindrance to the combination.

(第一實施方式) 如圖1及圖2所示,第一實施方式的玻璃板的清洗裝置1一邊藉由輥式輸送機(roller conveyor)或帶式輸送機(belt conveyor)等搬送機構(未圖示)以水平姿態搬送玻璃板G,一邊同時清洗玻璃板G的板厚方向上對向的一對主表面即上表面Ga及下表面Gb。 (first embodiment) As shown in FIGS. 1 and 2 , the cleaning device 1 for a glass plate according to the first embodiment is moved horizontally by a conveying mechanism (not shown) such as a roller conveyor or a belt conveyor. The upper surface Ga and the lower surface Gb, which are a pair of main surfaces facing each other in the plate thickness direction of the glass plate G, are simultaneously cleaned while conveying the glass plate G in a posture.

此處,本實施方式中,玻璃板G的上表面Ga為保證面,玻璃板G的下表面Gb為非保證面。在顯示器的製造步驟等中,在保證面形成電路等。因此,成為保證面的玻璃板G的上表面Ga的潔淨度特別重要。Here, in this embodiment, the upper surface Ga of the glass plate G is a guaranteed surface, and the lower surface Gb of the glass plate G is a non-guaranteed surface. In the manufacturing process of the display and the like, circuits and the like are formed on the guaranteed surface. Therefore, the cleanliness of the upper surface Ga of the glass plate G serving as the guaranteed surface is particularly important.

玻璃板G的一邊的大小較佳為500 mm~4000 mm,板厚較佳為0.05 mm~10 mm,更佳為0.2 mm~0.7 mm。The size of one side of the glass plate G is preferably from 500 mm to 4000 mm, and the plate thickness is preferably from 0.05 mm to 10 mm, more preferably from 0.2 mm to 0.7 mm.

清洗裝置1包括:上表面清洗機構2,清洗玻璃板G的上表面Ga;以及下表面清洗機構3,清洗玻璃板G的下表面Gb。The cleaning device 1 includes: an upper surface cleaning mechanism 2 for cleaning the upper surface Ga of the glass plate G; and a lower surface cleaning mechanism 3 for cleaning the lower surface Gb of the glass plate G.

此處,下表面清洗機構3是如使上表面清洗機構2上下翻轉所得的結構,具有與上表面清洗機構2實質上相同的結構。因此,以下以上表面清洗機構2的結構為例進行說明,省略下表面清洗機構3的結構的詳細說明。Here, the lower surface cleaning mechanism 3 has a structure obtained by turning the upper surface cleaning mechanism 2 upside down, and has substantially the same structure as the upper surface cleaning mechanism 2 . Therefore, the structure of the upper surface cleaning mechanism 2 will be described below as an example, and the detailed description of the structure of the lower surface cleaning mechanism 3 will be omitted.

如圖1所示,上表面清洗機構2包括:支撐台5,形成為在內部空間貯存有清洗液4的殼體結構;以及多個清洗單元6,清洗玻璃板G的上表面Ga。As shown in FIG. 1 , the upper surface cleaning mechanism 2 includes: a support table 5 formed as a shell structure storing a cleaning liquid 4 in an inner space; and a plurality of cleaning units 6 for cleaning the upper surface Ga of the glass plate G.

作為清洗液4,可使用清洗液(例如液體洗劑)或沖洗液(例如水)等液體。As the cleaning liquid 4 , a liquid such as a cleaning liquid (for example, liquid lotion) or a rinse liquid (for example, water) can be used.

支撐台5以橫跨與玻璃板G的搬送方向(Y方向)正交的玻璃板G的寬度方向(X方向)的方式配置。支撐台5的寬度方向兩端部由升降裝置5a支撐,所述升降裝置5a可升降地支撐支撐台5。本實施方式中,在清洗玻璃板G時,支撐台5被定置在規定的基準位置。另一方面,在因玻璃板G的品種變更等而玻璃板G的厚度大幅變更的情況下,在清洗玻璃板G之前,藉由升降裝置5a調整支撐台5的高度位置,預先設定與玻璃板G的厚度對應的基準位置。The support table 5 is arrange|positioned so that it may straddle the width direction (X direction) of the glass plate G orthogonal to the conveyance direction (Y direction) of the glass plate G. Both ends in the width direction of the support stand 5 are supported by elevating devices 5 a that support the support stand 5 so as to be able to move up and down. In this embodiment, when washing the glass plate G, the support base 5 is fixed at a predetermined reference position. On the other hand, when the thickness of the glass plate G is greatly changed due to a change in the type of glass plate G, etc., before cleaning the glass plate G, the height position of the support table 5 is adjusted by the lifting device 5a, and the height position of the support table 5 is set in advance to match the glass plate G. The reference position corresponding to the thickness of G.

多個清洗單元6沿著與玻璃板G的搬送方向(Y方向)正交的玻璃板G的寬度方向(X方向)排列成列狀。各清洗單元6包括:軸殼(axis case)7,以面向支撐台5的內部空間的方式固定於支撐台5;旋轉軸8,以面向軸殼7的內部空間的方式可旋轉地保持於軸殼7;以及清洗構件9,在支撐台5及軸殼7的外側安裝於旋轉軸8的頭端部。在各清洗單元6中,旋轉軸8及清洗構件9構成旋轉清洗體W,一起一體地旋轉。此處,「頭端部」意指玻璃板G側的端部,「基端部」意指與玻璃板G側的頭端部為相反側的端部(以下相同)。The several cleaning units 6 are arranged in a row along the width direction (X direction) of the glass plate G orthogonal to the conveyance direction (Y direction) of the glass plate G. Each cleaning unit 6 includes: an axis case 7 fixed to the support table 5 so as to face the inner space of the support table 5 ; The shell 7 and the cleaning member 9 are mounted on the head end of the rotating shaft 8 on the outside of the support table 5 and the shaft shell 7 . In each cleaning unit 6, the rotary shaft 8 and the cleaning member 9 constitute a rotary cleaning body W, and rotate integrally together. Here, the "head end" means the end on the glass plate G side, and the "basal end" means the end opposite to the head end on the glass plate G side (hereinafter the same).

軸殼7是圓筒狀的構件,以插通至分別設置於支撐台5的上表面及下表面的孔的狀態固定。The shaft housing 7 is a cylindrical member, and is fixed in a state of being inserted into holes respectively provided on the upper surface and the lower surface of the support table 5 .

在軸殼7的頭端部及基端部分別壓入固定有滑動軸承10、滑動軸承11。頭端部側的滑動軸承10具有圓筒部10a、及設置於圓筒部10a的頭端部的凸緣部10b。基端部側的滑動軸承11具有圓筒部11a、及設置於圓筒部11a的基端部的凸緣部11b。滑動軸承10、滑動軸承11例如可為金屬製等,在本實施方式中為樹脂製(例如工程塑膠(engineering plastic)製)。A sliding bearing 10 and a sliding bearing 11 are press-fitted and fixed to the head end and base end of the shaft housing 7 , respectively. The sliding bearing 10 on the head end side has a cylindrical portion 10a and a flange portion 10b provided at the head end of the cylindrical portion 10a. The sliding bearing 11 on the base end side has a cylindrical portion 11a and a flange portion 11b provided on the base end portion of the cylindrical portion 11a. The sliding bearing 10 and the sliding bearing 11 may be made of metal, for example, and are made of resin (for example, made of engineering plastic) in this embodiment.

旋轉軸8以被容許軸向(Z方向)的移動的狀態由滑動軸承10的圓筒部10a、滑動軸承11的圓筒部11a可旋轉地保持。即,由滑動軸承10、滑動軸承11及軸殼7構成可沿軸向移動地支撐旋轉軸8的滑動支撐結構S。本實施方式中,一個支撐台5包括多個滑動支撐結構S,可沿軸向移動地支撐多個旋轉軸8。即,多個旋轉清洗體W可沿軸向移動。The rotating shaft 8 is rotatably held by the cylindrical portion 10 a of the sliding bearing 10 and the cylindrical portion 11 a of the sliding bearing 11 in a state where movement in the axial direction (Z direction) is permitted. That is, the sliding support structure S that supports the rotary shaft 8 so as to be movable in the axial direction is constituted by the sliding bearing 10 , the sliding bearing 11 , and the shaft housing 7 . In this embodiment, one support table 5 includes a plurality of sliding support structures S, and supports a plurality of rotating shafts 8 so as to be movable in the axial direction. That is, the plurality of rotary cleaning bodies W can move in the axial direction.

清洗構件9對於旋轉軸8可裝卸。清洗構件9包括:清洗部9a,接觸於玻璃板G的上表面Ga而清洗玻璃板G的上表面Ga;以及支撐部9b,支撐清洗部9a。The cleaning member 9 is detachable from the rotary shaft 8 . The cleaning member 9 includes a cleaning part 9a for cleaning the upper surface Ga of the glass plate G by contacting the upper surface Ga of the glass plate G, and a support part 9b for supporting the cleaning part 9a.

清洗部9a的種類例如可為刷子(brush)等,在本實施方式中為海綿(sponge)。清洗部9a的形狀並無特別限定,在本實施方式中為圓盤狀。The type of the cleaning unit 9 a may be, for example, a brush or the like, and is a sponge in the present embodiment. Although the shape of the cleaning part 9a is not specifically limited, In this embodiment, it is disc-shaped.

在軸殼7設置有將支撐台5的內部空間與軸殼7的內部空間連通的第一供給路R1,支撐台5的內部空間的清洗液4按照箭頭a通過第一供給路R1供給至軸殼7的內部空間。The shaft housing 7 is provided with a first supply path R1 that communicates the interior space of the support table 5 with the interior space of the shaft case 7, and the cleaning liquid 4 in the interior space of the support table 5 is supplied to the shaft through the first supply path R1 according to the arrow a. The inner space of shell 7.

在旋轉軸8設置有將軸殼7的內部空間與清洗構件9連通的第二供給路R2,軸殼7的內部空間的清洗液4按照箭頭b通過第二供給路R2供給至清洗構件9。The rotating shaft 8 is provided with a second supply path R2 that communicates the inner space of the shaft housing 7 with the cleaning member 9 , and the cleaning liquid 4 in the inner space of the shaft housing 7 is supplied to the cleaning member 9 through the second supply path R2 according to the arrow b.

在清洗構件9設置有連通於第二供給路R2的貫通孔R3,藉由第二供給路R2所供給的清洗液4按照箭頭c通過貫通孔R3供給至玻璃板G。在由可使清洗液4透過的材質(例如多孔質體等)形成清洗構件9的情況下,貫通孔R3可省略。The cleaning member 9 is provided with a through-hole R3 communicating with the second supply path R2, and the cleaning liquid 4 supplied by the second supply path R2 is supplied to the glass plate G through the through-hole R3 according to the arrow c. When the cleaning member 9 is formed of a material (such as a porous body) through which the cleaning liquid 4 can pass, the through hole R3 can be omitted.

上表面清洗機構2包括旋轉驅動各清洗單元6的旋轉軸8的旋轉驅動機構12。旋轉驅動機構12在支撐台5及軸殼7的外側對旋轉軸8的基端部賦予旋轉驅動力。The upper surface cleaning mechanism 2 includes a rotational drive mechanism 12 that rotationally drives the rotation shaft 8 of each cleaning unit 6 . The rotation drive mechanism 12 applies a rotation drive force to the base end portion of the rotation shaft 8 on the outside of the support base 5 and the shaft housing 7 .

旋轉驅動機構12包括齒輪機構13及驅動部14。齒輪機構13包括安裝於各旋轉軸8的基端部的多個齒輪13a,相鄰的齒輪13a彼此嚙合。驅動部14包括馬達14a、及安裝於馬達14a的齒輪14b,齒輪14b與齒輪機構13的齒輪13a嚙合。因此,當藉由馬達14a的旋轉使齒輪14b旋轉時,旋轉的動力傳遞至齒輪機構13,從而使各清洗單元6的旋轉軸8旋轉。The rotation drive mechanism 12 includes a gear mechanism 13 and a drive unit 14 . The gear mechanism 13 includes a plurality of gears 13a attached to the base ends of the respective rotating shafts 8, and adjacent gears 13a mesh with each other. The driving unit 14 includes a motor 14 a and a gear 14 b attached to the motor 14 a, and the gear 14 b meshes with the gear 13 a of the gear mechanism 13 . Therefore, when the gear 14b is rotated by the rotation of the motor 14a, the power of the rotation is transmitted to the gear mechanism 13, and the rotation shaft 8 of each cleaning unit 6 is rotated.

本實施方式中,在寬度方向上相鄰的旋轉軸8相互往相反朝向旋轉(參照圖2),但亦可相互往相同朝向旋轉。動力傳遞部並不限定於齒輪機構13,例如亦可為輸送帶(belt)等其他機構。亦可在各旋轉軸8個別地安裝驅動部(馬達)。In the present embodiment, the rotation shafts 8 adjacent to each other in the width direction rotate in opposite directions (see FIG. 2 ), but may also rotate in the same direction. The power transmission unit is not limited to the gear mechanism 13 , and may be other mechanisms such as a belt, for example. A driving unit (motor) may be separately attached to each rotating shaft 8 .

而且,下表面清洗機構3與上表面清洗機構2同樣地,具有清洗單元15、清洗構件16、清洗部16a、支撐部16b等。清洗裝置1用一對清洗構件9、16夾著玻璃板G的上下表面Ga、Gb進行清洗。但是,本實施方式中,上表面清洗機構2的清洗構件9以追隨於玻璃板G的上表面Ga的方式沿上下方向移動,但下表面清洗機構3的清洗構件16不以追隨於玻璃板G的下表面Gb的方式沿上下方向移動。即,下表面清洗機構3的清洗構件16在清洗中高度位置亦維持固定。Furthermore, the lower surface cleaning mechanism 3 has the cleaning unit 15, the cleaning member 16, the cleaning part 16a, the support part 16b, etc. similarly to the upper surface cleaning mechanism 2. The cleaning device 1 cleans the upper and lower surfaces Ga, Gb of the glass plate G between a pair of cleaning members 9 and 16 . However, in this embodiment, the cleaning member 9 of the upper surface cleaning mechanism 2 moves vertically so as to follow the upper surface Ga of the glass plate G, but the cleaning member 16 of the lower surface cleaning mechanism 3 does not follow the glass plate G. The way of the lower surface Gb moves in the up and down direction. That is, the height position of the cleaning member 16 of the lower surface cleaning mechanism 3 is also kept constant during cleaning.

如圖2所示,上表面清洗機構2在搬送方向(Y方向)上空出間隔地具有多列(圖示例為2列)清洗列L1、L2,所述清洗列L1、L2是多個清洗單元6在X方向上排列成列狀而成。上游側的清洗列L1中所包含的清洗構件9、與下游側的清洗列L2中所包含的清洗構件9分別以自搬送方向觀察不完全重疊的方式配置。其結果,以下述方式配置,即,在自搬送方向觀察的情況下,下游側的清洗列L2的清洗構件9重疊於上游側的清洗列L1中在寬度方向上相鄰的清洗構件9之間的間隙。As shown in FIG. 2 , the upper surface cleaning mechanism 2 has a plurality of rows (two rows in the illustration) cleaning rows L1 and L2 at intervals in the conveying direction (Y direction). The cleaning rows L1 and L2 are a plurality of cleaning rows. The cells 6 are arranged in a row in the X direction. The cleaning members 9 included in the cleaning row L1 on the upstream side and the cleaning members 9 included in the cleaning row L2 on the downstream side are arranged so as not to completely overlap each other when viewed from the conveyance direction. As a result, it is arranged in such a manner that, viewed from the conveyance direction, the cleaning members 9 of the cleaning row L2 on the downstream side overlap between the cleaning members 9 adjacent in the width direction in the cleaning row L1 on the upstream side. Clearance.

亦可各清洗列L1、L2每個使用不同的支撐台5。或者,亦可使用多個清洗列L1、L2共用(一個)的支撐台5。Different support tables 5 may be used for each of the cleaning rows L1 and L2. Alternatively, a common (one) support table 5 for a plurality of cleaning rows L1 and L2 may be used.

如圖3所示,在上表面清洗機構2中,滑動支撐結構S構成為,旋轉軸8利用旋轉清洗體W(旋轉軸8及清洗構件9)的自重向玻璃板G的上表面Ga側移動。即,無玻璃板G的狀態的旋轉軸8的頭端部自支撐台5的下方突出量D1大於有玻璃板G的狀態的旋轉軸8的頭端部自支撐台5的下方突出量D2。換言之,無玻璃板G的狀態的旋轉軸8的基端部自支撐台5的上方突出量U1小於有玻璃板G的狀態的旋轉軸8的基端部自支撐台5的上方突出量U2。As shown in FIG. 3 , in the upper surface cleaning mechanism 2 , the sliding support structure S is configured so that the rotating shaft 8 moves toward the upper surface Ga side of the glass plate G by the self-weight of the rotating cleaning body W (rotating shaft 8 and cleaning member 9 ). . That is, the amount D1 of the head end of the rotating shaft 8 projecting from the bottom of the support table 5 in the state without the glass plate G is greater than the amount D2 of the head end of the rotating shaft 8 projecting from the bottom of the supporting table 5 in the state with the glass plate G. In other words, the protruding amount U1 of the proximal end of the rotary shaft 8 from the support base 5 without the glass plate G is smaller than the protruding amount U2 of the base end of the rotary shaft 8 from the support base 5 with the glass plate G present.

本實施方式中,在無玻璃板G的狀態下,上表面清洗機構2的清洗構件9伴隨因旋轉清洗體W的自重所致的旋轉軸8的下降而載置於下表面清洗機構3的清洗構件16上。另外,在藉由齒輪機構13傳遞旋轉驅動力的情況下,為了維持齒輪13a彼此的嚙合,旋轉軸8的最大移動量(下方突出量D1-下方突出量D2)較佳為設定為小於齒輪13a的厚度(齒寬)。旋轉軸8的最大移動量例如可由齒輪13a的下表面與軸殼7(滑動軸承11)的上表面之間的間隙的上下方向(Z方向)的大小來管理。旋轉軸8的最大移動量例如設定為0.1 mm~10 mm。In the present embodiment, in the state where there is no glass plate G, the cleaning member 9 of the upper surface cleaning mechanism 2 is placed on the lower surface cleaning mechanism 3 for cleaning as the rotating shaft 8 falls due to the self-weight of the rotary cleaning body W. member 16. In addition, in the case of transmitting the rotational driving force through the gear mechanism 13, in order to maintain the meshing of the gears 13a, the maximum moving amount of the rotating shaft 8 (the amount of downward protrusion D1−the amount of downward protrusion D2) is preferably set to be smaller than that of the gears 13a. thickness (tooth width). The maximum movement amount of the rotary shaft 8 can be controlled by, for example, the size of the gap in the vertical direction (Z direction) between the lower surface of the gear 13 a and the upper surface of the shaft housing 7 (sliding bearing 11 ). The maximum movement amount of the rotary shaft 8 is set to, for example, 0.1 mm to 10 mm.

本實施方式中,在兩清洗構件9、16的清洗部9a、16a的周緣部設置有傾斜導引面9aa、傾斜導引面16aa,傾斜導引面9aa、傾斜導引面16aa將玻璃板G導引至兩清洗構件9、16的相互間。藉此,在清洗步驟中,玻璃板G能夠容易地進入至兩清洗構件9、16的相互間。In this embodiment, an inclined guide surface 9aa and an inclined guide surface 16aa are provided on the peripheral portions of the cleaning parts 9a and 16a of the two cleaning members 9 and 16, and the inclined guide surface 9aa and the inclined guide surface 16aa guide the glass plate G Lead to the mutual between the two cleaning members 9,16. Thereby, glass plate G can enter between both cleaning members 9 and 16 easily in a cleaning process.

接下來,說明本實施方式的玻璃板的製造方法。Next, the manufacturing method of the glass plate of this embodiment is demonstrated.

本製造方法例如包括成形步驟、緩冷步驟、裁板步驟、切斷步驟、清洗步驟、檢查步驟、及捆包步驟。This manufacturing method includes, for example, a forming step, a slow cooling step, a panel cutting step, a cutting step, a cleaning step, an inspection step, and a packing step.

在成形步驟中,藉由溢流下拉法(overflow down draw)或浮式法(float)等公知的方法,自熔融玻璃成形玻璃帶。In the forming step, a glass ribbon is formed from molten glass by a known method such as an overflow down draw method or a float method.

在緩冷步驟中,為了減少成形後的玻璃帶的翹曲及內部應變,將成形後的玻璃帶進行緩冷。In the slow cooling step, the formed glass ribbon is slowly cooled in order to reduce warpage and internal strain of the formed glass ribbon.

在裁板步驟中,將緩冷後的玻璃帶以規定長度為單位進行切斷,獲得多片原始玻璃板。In the panel cutting step, the slow-cooled glass ribbon is cut in units of specified lengths to obtain multiple original glass panels.

在切斷步驟中,將原始玻璃板切斷成規定尺寸,獲得一片或多片玻璃板G。作為原始玻璃板的切斷方法,例如可利用彎曲應力割斷、雷射割斷、雷射熔斷等。玻璃板G較佳為矩形。In the cutting step, the original glass sheet is cut into a predetermined size to obtain one or more glass sheets G. As a method of cutting the original glass plate, for example, bending stress cutting, laser cutting, laser fusing, etc. can be used. The glass plate G is preferably rectangular.

在清洗步驟中,使用所述清洗裝置1,一邊以水平姿態搬送玻璃板G一邊進行清洗。In the cleaning process, the cleaning device 1 is used to clean the glass plate G while conveying it in a horizontal posture.

在檢查步驟中,針對清洗後的玻璃板G檢查是否在表面無損傷、灰塵、污垢等及/或無氣泡、異物等內部缺陷。檢查是使用相機(camera)等光學檢查裝置來進行。In the inspection step, it is inspected whether there is no damage, dust, dirt, etc. on the surface and/or internal defects such as air bubbles and foreign matter on the cleaned glass plate G. The inspection is performed using an optical inspection device such as a camera.

在捆包步驟中,將檢查結果滿足所需品質的玻璃板G進行捆包。捆包是藉由下述方式進行:對規定的托板(pallet),以平置方式積層多片玻璃板G,或以縱置方式積層玻璃板G。該情況下,較佳為在玻璃板G的積層方向的相互間介置包含間隔紙或發泡樹脂等的保護片材。In the packing step, the glass plate G whose inspection result satisfies the required quality is packed. Packing is carried out by laminating a plurality of glass plates G in a horizontal arrangement or by laminating the glass plates G in a vertical arrangement with respect to a predetermined pallet. In this case, it is preferable to interpose the protective sheet which contains spacer paper, foamed resin, etc. between the lamination direction of glass plate G.

另外,本製造方法亦可在裁板步驟之後更包括熱處理步驟,或在切斷步驟之後更包括端面加工步驟。In addition, the manufacturing method may further include a heat treatment step after the panel cutting step, or further include an end surface processing step after the cutting step.

接下來,說明所述清洗步驟中的清洗裝置1的動作。Next, the operation of the cleaning device 1 in the cleaning step will be described.

在清洗步驟中,首先,如圖4所示,自清洗裝置1的上游側沿搬送方向(Y方向)搬送玻璃板G。此時,上表面清洗機構2的清洗構件9以下述狀態待機,即,伴隨因旋轉清洗體W的自重所致的旋轉軸8的下降而載置於下表面清洗機構3的清洗構件16上。即,在待機狀態下,兩清洗構件9、16相互接觸。In the cleaning process, first, as shown in FIG. 4 , the glass plate G is conveyed in the conveyance direction (Y direction) from the upstream side of the cleaning device 1 . At this time, the cleaning member 9 of the upper surface cleaning mechanism 2 is placed on the cleaning member 16 of the lower surface cleaning mechanism 3 as the rotary shaft 8 descends due to the weight of the rotary cleaning body W, on standby. That is, in the standby state, both cleaning members 9, 16 are in contact with each other.

然後,當玻璃板G到達兩清洗構件9、16時,如圖5及圖6所示,以將兩清洗構件9、16推開的方式,使玻璃板G進入至兩清洗構件9、16的相互間。Then, when the glass plate G arrives at the two cleaning components 9, 16, as shown in Fig. 5 and Fig. 6, the glass plate G is entered into the two cleaning components 9, 16 in a manner that the two cleaning components 9, 16 are pushed away. each other.

詳細而言,上表面清洗機構2的清洗構件9藉由滑動支撐結構S可與旋轉軸8一起沿旋轉軸8的軸向(上下方向)移動。因此,當玻璃板G到達兩清洗構件9、16時,上表面清洗機構2的清洗構件9被與傾斜導引面9aa接觸的玻璃板G向上方推壓(參照圖5)。藉此,上表面清洗機構2的清洗構件9一邊與旋轉軸8一起向上方移動一邊覆蓋至玻璃板G的上表面Ga。覆蓋後,上表面清洗機構2的清洗構件9藉由因清洗旋轉部W的自重所致的旋轉軸8的下降將玻璃板G的上表面Ga持續地向下方按壓(參照圖6)。Specifically, the cleaning member 9 of the upper surface cleaning mechanism 2 can move along the axial direction (up and down direction) of the rotating shaft 8 together with the rotating shaft 8 through the sliding support structure S. Therefore, when the glass plate G reaches both cleaning members 9 and 16, the cleaning member 9 of the upper surface cleaning mechanism 2 is pushed upward by the glass plate G in contact with the inclined guide surface 9aa (see FIG. 5 ). Thereby, the cleaning member 9 of the upper surface cleaning mechanism 2 covers the upper surface Ga of the glass plate G, moving upward together with the rotating shaft 8. As shown in FIG. After covering, the cleaning member 9 of the upper surface cleaning mechanism 2 continuously presses the upper surface Ga of the glass plate G downward by the lowering of the rotating shaft 8 due to the self-weight of the cleaning rotary unit W (see FIG. 6 ).

進而,當玻璃板G自兩清洗構件9、16的相互間退出時,如圖7所示,上表面清洗機構2的清洗構件9伴隨因清洗旋轉部W的自重所致的旋轉軸8的下降而再次載置於下表面清洗機構3的清洗構件16上。Furthermore, when the glass plate G withdraws from between the two cleaning members 9, 16, as shown in FIG. And again, it is placed on the cleaning member 16 of the lower surface cleaning mechanism 3 .

如上所述,上表面清洗機構2的旋轉軸8(清洗旋轉部W)藉由滑動支撐結構S可沿上下方向移動。因此,上表面清洗機構2的清洗構件9以追隨於玻璃板G的上表面Ga的方式自動調整高度位置。此種動作同樣地產生於上表面清洗機構2中所包含的各清洗構件9。因此,各清洗構件9與玻璃板G的上表面Ga的接觸狀態穩定,能夠確實地減少玻璃板G的上表面Ga的清洗不均。As described above, the rotary shaft 8 (cleaning rotary part W) of the upper surface cleaning mechanism 2 is movable in the vertical direction by the sliding support structure S. As shown in FIG. Therefore, the cleaning member 9 of the upper surface cleaning mechanism 2 automatically adjusts a height position so that it may follow the upper surface Ga of the glass plate G. As shown in FIG. Such actions also occur in each of the cleaning members 9 included in the upper surface cleaning mechanism 2 . Therefore, the contact state of each cleaning member 9 with the upper surface Ga of the glass plate G is stabilized, and the cleaning unevenness of the upper surface Ga of the glass plate G can be reliably reduced.

(第二實施方式) 如圖8所示,第二實施方式的玻璃板的清洗裝置1以及玻璃板的清洗方法與第一實施方式的不同之處在於,在上表面清洗機構2的旋轉清洗體W設有可裝卸的重物21。 (Second Embodiment) As shown in FIG. 8 , the difference between the glass plate cleaning device 1 and the glass plate cleaning method of the second embodiment and the first embodiment is that the rotating cleaning body W of the upper surface cleaning mechanism 2 is provided with a detachable Heavy 21.

詳細而言,重物21以載置於清洗構件9的支撐部9b上的狀態,藉由螺栓(bolt)等緊固構件可裝卸地固定於支撐部9b。Specifically, the weight 21 is mounted on the support portion 9b of the cleaning member 9, and is detachably fixed to the support portion 9b by fastening members such as bolts.

重物21的形狀並無特別限定,在本實施方式中在俯視下形成為沿著圓盤狀的清洗部9a的周緣部的圓環狀形狀。而且,考慮安裝性而將重物21沿周向分割為多個(例如半圓環形狀)。The shape of the weight 21 is not particularly limited, but in the present embodiment is formed in an annular shape along the periphery of the disc-shaped cleaning portion 9a in plan view. Furthermore, the weight 21 is divided into multiple pieces (for example, in a semicircular ring shape) in the circumferential direction in consideration of mountability.

藉由如此設置重物21,可調整作用於旋轉軸8的旋轉清洗體W的自重的大小。即,可調整旋轉軸8朝向玻璃板G的上表面Ga的力。因此,有清洗構件9與玻璃板G的上表面Ga的接觸狀態非常穩定的優點。By providing the weight 21 in this way, the size of the self-weight of the rotary cleaning body W acting on the rotary shaft 8 can be adjusted. That is, the force of the rotating shaft 8 toward the upper surface Ga of the glass plate G can be adjusted. Therefore, there is an advantage that the contact state between the cleaning member 9 and the upper surface Ga of the glass plate G is very stable.

另外,重物21較佳為成為將多片板狀體重疊配置的積層結構。如此,可藉由板狀體的積層片數而容易地調整重物21的重量。In addition, it is preferable that the weight 21 has a laminated structure in which a plurality of plate-shaped objects are stacked and arranged. In this way, the weight of the weight 21 can be easily adjusted by the number of laminated plates.

重物21亦可能夠裝卸地設置於旋轉軸8。重物21的安裝位置只要為旋轉清洗體W的範圍內,則並無特別限定。The weight 21 may be detachably installed on the rotating shaft 8 . The attachment position of the weight 21 is not particularly limited as long as it is within the range of the rotary cleaning body W.

本發明並不限定於所述實施方式的結構,且不限定於所述作用效果。本發明可在不脫離本發明的主旨的範圍內進行各種變更。The present invention is not limited to the structure of the above-described embodiment, and is not limited to the above-described operational effects. Various modifications can be made in the present invention without departing from the scope of the present invention.

所述實施方式中,說明瞭將貯存在支撐台的內部空間的清洗液經由旋轉軸及清洗構件供給至玻璃板的結構,但清洗液的供給方法不限定於此。例如,亦可藉由淋浴噴頭(shower nozzle)等向玻璃板噴射清洗液而供給。換言之,支撐台只要具有支撐旋轉軸的滑動支撐結構,則亦可包括貯存清洗液的結構。In the above-described embodiment, the structure in which the cleaning liquid stored in the inner space of the support table is supplied to the glass plate via the rotating shaft and the cleaning member has been described, but the supply method of the cleaning liquid is not limited to this. For example, the washing liquid may be supplied by spraying the washing liquid onto the glass plate from a shower nozzle or the like. In other words, as long as the support table has a sliding support structure for supporting the rotating shaft, it may also include a structure for storing cleaning liquid.

所述實施方式中,說明瞭在無玻璃板的待機狀態下,上表面清洗機構的清洗構件與下表面清洗機構的清洗構件相互接觸的情況,但不限定於此。例如,亦可在無玻璃板的待機狀態下,在上表面清洗機構的清洗構件與下表面清洗機構的清洗構件之間形成小於玻璃板的厚度的間隙。即,亦可在無玻璃板的待機狀態下,上表面清洗機構的清洗構件與下表面清洗機構的清洗構件相互不接觸。該情況下,上表面清洗機構的旋轉軸較佳為在最向下方突出位置(下止點),包括與滑動支撐結構(例如軸殼)卡合的制動部。In the above embodiment, the case where the cleaning member of the upper surface cleaning mechanism and the cleaning member of the lower surface cleaning mechanism are in contact with each other in the standby state without a glass plate has been described, but the present invention is not limited thereto. For example, in a standby state without a glass plate, a gap smaller than the thickness of the glass plate may be formed between the cleaning member of the upper surface cleaning mechanism and the cleaning member of the lower surface cleaning mechanism. That is, in the standby state without a glass plate, the cleaning member of the upper surface cleaning mechanism and the cleaning member of the lower surface cleaning mechanism may not contact each other. In this case, it is preferable that the rotating shaft of the upper surface cleaning mechanism is at the most downward protruding position (bottom dead center), and includes a stopper that engages with the sliding support structure (eg, shaft housing).

所述實施方式中,說明瞭由一個支撐台支撐多個旋轉軸的情況,但亦可在各旋轉軸分別設置專用的支撐台。In the above-described embodiment, a case where a plurality of rotating shafts are supported by one support stand has been described, but it is also possible to provide a dedicated support stand for each of the rotating shafts.

所述實施方式中,說明瞭相對於配置於固定位置的清洗構件使玻璃板移動的情況,但只要在清洗構件與玻璃板之間存在相對移動,則可為使任一者移動的形態。即,可相對於配置於固定位置的玻璃板使清洗構件移動,亦可使玻璃板與清洗構件兩者移動。In the above-mentioned embodiment, the case where the glass plate is moved relative to the cleaning member arranged at a fixed position has been described, but as long as there is relative movement between the cleaning member and the glass plate, either one may be moved. That is, the cleaning member may be moved with respect to the glass plate arranged at a fixed position, or both the glass plate and the cleaning member may be moved.

所述實施方式中,說明瞭同時清洗玻璃板的上下表面的情況,但亦可僅清洗玻璃板的上表面。In the said embodiment, although the case where the upper and lower surfaces of a glass plate were washed simultaneously was demonstrated, it is also possible to wash only the upper surface of a glass plate.

所述實施方式中,亦可在清洗搬送玻璃板時,使玻璃板在與搬送方向正交的寬度方向上,以一端側較另一端側的位置低的方式傾斜。藉此,能夠防止附著於玻璃板的上表面的多餘的液體因自重而滴落至玻璃板的上表面,在玻璃板的上表面形成成為污垢的原因的液體積存。In the above embodiment, when the glass plate is cleaned and conveyed, the glass plate may be inclined such that one end side is lower than the other end side in the width direction perpendicular to the conveyance direction. Thereby, excess liquid adhering to the upper surface of the glass plate can be prevented from dripping onto the upper surface of the glass plate due to its own weight and forming a liquid pool that causes stains on the upper surface of the glass plate.

1:清洗裝置 2:上表面清洗機構 3:下表面清洗機構 4:清洗液 5:支撐台 5a:升降裝置 6、15:清洗單元 7:軸殼 8:旋轉軸 9、16:清洗構件 9a、16a:清洗部 9b、16b:支撐部 9aa、16aa:傾斜導引面 10、11:滑動軸承 10a、11a:圓筒部 10b、11b:凸緣部 12:旋轉驅動機構 13:齒輪機構 13a、14b:齒輪 14:驅動部 14a:馬達 21:重物 a、b、c:箭頭 D1、D2:下方突出量 G:玻璃板 Ga:上表面 Gb:下表面 L1、L2:清洗列 R1:第一供給路 R2:第二供給路 R3:第三供給路 S:滑動支撐結構 U1、U2:上方突出量 W:旋轉清洗體 X、Y、Z:方向 1: Cleaning device 2: Upper surface cleaning mechanism 3: Bottom surface cleaning mechanism 4: cleaning solution 5: Support table 5a: Lifting device 6, 15: cleaning unit 7: Shaft housing 8: Rotation axis 9, 16: cleaning components 9a, 16a: cleaning part 9b, 16b: support part 9aa, 16aa: inclined guide surface 10, 11: Sliding bearings 10a, 11a: cylindrical part 10b, 11b: flange part 12: Rotary drive mechanism 13: gear mechanism 13a, 14b: gears 14: Drive Department 14a: Motor 21: heavy objects a, b, c: arrows D1, D2: Bottom protrusion G: glass plate Ga: upper surface Gb: lower surface L1, L2: cleaning columns R1: the first supply road R2: The second supply road R3: The third supply road S: sliding support structure U1, U2: Upper protrusion W: rotating cleaning body X, Y, Z: direction

圖1是表示第一實施方式的玻璃板的清洗裝置的剖視圖。 圖2是表示圖1的玻璃板的清洗裝置的俯視圖。 圖3是將圖1的玻璃板的清洗裝置中所包含的一個清洗單元周邊放大表示的剖視圖。 圖4是用於說明使用圖1的玻璃板的清洗裝置的清洗步驟的側視圖。 圖5是用於說明使用圖1的玻璃板的清洗裝置的清洗步驟的側視圖。 圖6是用於說明使用圖1的玻璃板的清洗裝置的清洗步驟的側視圖。 圖7是用於說明使用圖1的玻璃板的清洗裝置的清洗步驟的側視圖。 圖8是將第二實施方式的玻璃板的清洗裝置中所包含的一個清洗單元周邊放大表示的剖視圖。 Fig. 1 is a cross-sectional view showing a glass plate cleaning device according to a first embodiment. Fig. 2 is a plan view showing the glass plate cleaning device of Fig. 1 . Fig. 3 is an enlarged cross-sectional view showing the periphery of one cleaning unit included in the glass plate cleaning device of Fig. 1 . Fig. 4 is a side view for explaining a cleaning step using the glass plate cleaning device shown in Fig. 1 . Fig. 5 is a side view for explaining a cleaning step using the glass plate cleaning device shown in Fig. 1 . Fig. 6 is a side view for explaining a cleaning step using the glass plate cleaning device shown in Fig. 1 . Fig. 7 is a side view for explaining a cleaning step using the glass plate cleaning device shown in Fig. 1 . 8 is an enlarged cross-sectional view showing the periphery of one cleaning unit included in the glass plate cleaning device according to the second embodiment.

1:清洗裝置 1: Cleaning device

2:上表面清洗機構 2: Upper surface cleaning mechanism

3:下表面清洗機構 3: Bottom surface cleaning mechanism

4:清洗液 4: cleaning solution

5:支撐台 5: Support table

6、15:清洗單元 6, 15: cleaning unit

7:軸殼 7: Shaft housing

8:旋轉軸 8: Rotation axis

9、16:清洗構件 9, 16: cleaning components

9a、16a:清洗部 9a, 16a: cleaning part

9b、16b:支撐部 9b, 16b: support part

9aa、16aa:傾斜導引面 9aa, 16aa: inclined guide surface

10、11:滑動軸承 10, 11: Sliding bearings

10a、11a:圓筒部 10a, 11a: cylindrical part

10b、11b:凸緣部 10b, 11b: flange part

13a:齒輪 13a: gear

a、b、c:箭頭 a, b, c: arrows

D1、D2:下方突出量 D1, D2: Bottom protrusion

R1:第一供給路 R1: the first supply road

R2:第二供給路 R2: The second supply road

R3:第三供給路 R3: The third supply road

S:滑動支撐結構 S: sliding support structure

U1、U2:上方突出量 U1, U2: Upper protrusion

W:旋轉清洗體 W: rotating cleaning body

X、Z:方向 X, Z: direction

Claims (6)

一種玻璃板的清洗裝置,清洗玻璃板的主表面,所述玻璃板的清洗裝置的特徵在於包括: 旋轉清洗體,具有接觸所述玻璃板的所述主表面的清洗構件及連結於所述清洗構件而與所述清洗構件一起旋轉的旋轉軸;以及 支撐台,支撐所述旋轉軸; 所述支撐台包括滑動支撐結構,所述滑動支撐結構能夠使所述旋轉軸沿軸向移動地支撐所述旋轉軸。 A glass plate cleaning device for cleaning the main surface of a glass plate, the glass plate cleaning device is characterized in that it comprises: a rotary cleaning body having a cleaning member contacting the main surface of the glass plate and a rotating shaft connected to the cleaning member to rotate together with the cleaning member; and a supporting platform supporting the rotating shaft; The supporting table includes a sliding support structure that supports the rotating shaft so that the rotating shaft can move in the axial direction. 如請求項1所述的玻璃板的清洗裝置,其包括多個所述旋轉清洗體, 一個所述支撐台包括多個所述滑動支撐結構,多個所述滑動支撐結構能夠使多個所述旋轉軸沿各自的軸向移動地支撐多個所述旋轉軸。 The glass plate cleaning device according to claim 1, which includes a plurality of said rotating cleaning bodies, One support table includes a plurality of sliding support structures, and the plurality of sliding support structures supports the plurality of rotation shafts so that the plurality of rotation shafts can move along respective axial directions. 如請求項1或請求項2所述的玻璃板的清洗裝置,其中 所述滑動支撐結構構成為,所述旋轉軸利用所述旋轉清洗體的自重向所述玻璃板的所述主表面側移動。 The cleaning device for glass plates as described in claim 1 or claim 2, wherein The sliding support structure is configured such that the rotation shaft moves toward the main surface side of the glass plate by the weight of the rotary cleaning body. 如請求項3所述的玻璃板的清洗裝置,其中 所述旋轉清洗體包括能夠裝卸的重物。 The cleaning device of glass plate as described in claim item 3, wherein The rotary cleaning body includes loadable and detachable weights. 如請求項1至請求項4中任一項所述的玻璃板的清洗裝置,其中 所述滑動支撐結構包括滑動軸承,所述滑動軸承能夠使所述旋轉軸旋轉且能夠使所述旋轉軸沿軸向移動地支撐所述旋轉軸。 The cleaning device for a glass plate as described in any one of claim 1 to claim 4, wherein The sliding support structure includes a sliding bearing that supports the rotating shaft so as to be able to rotate the rotating shaft and move the rotating shaft in an axial direction. 一種玻璃板的製造方法,其特徵在於包括:清洗步驟,使用如請求項1至請求項5中任一項所述的玻璃板的清洗裝置,清洗所述玻璃板的所述主表面。A method for manufacturing a glass plate, characterized by comprising: a cleaning step of cleaning the main surface of the glass plate using the glass plate cleaning device according to any one of claim 1 to claim 5 .
TW111142632A 2021-11-16 2022-11-08 Glass plate cleaning device and glass plate manufacturing method TW202327745A (en)

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