WO2023090160A1 - Glass plate cleaning device and glass plate manufacturing method - Google Patents

Glass plate cleaning device and glass plate manufacturing method Download PDF

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WO2023090160A1
WO2023090160A1 PCT/JP2022/041077 JP2022041077W WO2023090160A1 WO 2023090160 A1 WO2023090160 A1 WO 2023090160A1 JP 2022041077 W JP2022041077 W JP 2022041077W WO 2023090160 A1 WO2023090160 A1 WO 2023090160A1
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cleaning
glass plate
rotating shaft
cleaning member
main surface
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薫 鑑継
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日本電気硝子株式会社
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    • B08B1/32
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04Cleaning involving contact with liquid
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C23/00Other surface treatment of glass not in the form of fibres or filaments
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/304Mechanical treatment, e.g. grinding, polishing, cutting

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  • Geochemistry & Mineralogy (AREA)
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  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning In General (AREA)
  • Surface Treatment Of Glass (AREA)
  • Cleaning By Liquid Or Steam (AREA)

Abstract

Provided is a glass plate cleaning device 1 comprising: a rotary cleaning body W which has a cleaning member 9 that contacts the upper surface Ga of a glass plate G, and a rotary shaft 8 that is coupled to the cleaning member 9 and rotates together with the cleaning member 9; and a support base 5 for supporting the rotary shaft 8. The support base 5 comprises a sliding support structure S for supporting the rotary shaft 8 so as to allow movement thereof in the axial direction.

Description

ガラス板の洗浄装置及びガラス板の製造方法Glass plate cleaning device and glass plate manufacturing method
 本発明は、ガラス板の洗浄装置及び洗浄工程を含むガラス板の製造方法に関する。 The present invention relates to a glass plate cleaning apparatus and a glass plate manufacturing method including a cleaning step.
 液晶ディスプレイ、有機ELディスプレイ等のディスプレイは、高精細化が推進されている。これに伴い、ディスプレイ用の基板として用いられるガラス板の主表面には、ディスプレイの製造工程において緻密な電気回路が形成される。したがって、この種のガラス板には、塵や汚れが付いていない高い清浄性が要求されている。 Displays such as liquid crystal displays and organic EL displays are being promoted for higher definition. Along with this, a precise electric circuit is formed on the main surface of a glass plate used as a display substrate in the manufacturing process of the display. Therefore, this type of glass plate is required to have a high degree of cleanness, free from dust and dirt.
 そこで、ガラス板の製造工程では、元ガラス板を所定サイズに切断して複数枚のガラス板を得る切断工程の後等に、ガラス板の主表面を洗浄する洗浄工程が設けられるのが一般的である。 Therefore, in the glass plate manufacturing process, a cleaning step for cleaning the main surfaces of the glass plates is generally provided after the cutting step to obtain a plurality of glass plates by cutting the original glass plate into a predetermined size. is.
 ガラス板の主表面の洗浄方法としては、例えば特許文献1に開示の方法が挙げられる。同文献では、複数の洗浄部材をガラス板の主表面に接触させた状態で、各洗浄部材を回転させる。これにより、ガラス板の主表面を擦りながら洗浄する。なお、洗浄部材は、回転軸(スピンドル)の先端部に装着されている。この回転軸を回転駆動することにより、洗浄部材が回転軸と共に回転する。 As a method for cleaning the main surface of the glass plate, for example, the method disclosed in Patent Document 1 can be mentioned. In this document, each cleaning member is rotated while a plurality of cleaning members are in contact with the main surface of the glass plate. This cleans the main surface of the glass plate while rubbing it. The cleaning member is attached to the tip of the rotating shaft (spindle). By rotationally driving this rotating shaft, the cleaning member rotates together with the rotating shaft.
特開2020-7193号公報JP 2020-7193 A
 特許文献1では、ガラス板に対する洗浄部材の高さ位置を調整するために、洗浄部材と回転軸との間にスペーサを設けることが開示されている。このスペーサの厚みを調整することにより、ガラス板に対する洗浄部材の高さ位置が調整される。 Patent Document 1 discloses providing a spacer between the cleaning member and the rotating shaft in order to adjust the height position of the cleaning member with respect to the glass plate. By adjusting the thickness of this spacer, the height position of the cleaning member with respect to the glass plate is adjusted.
 しかしながら、仮にスペーサを設けたとしても、スペーサの厚みのばらつき等に起因して、ガラス板に対する洗浄部材の高さ位置を正確に調整できない場合がある。その結果、洗浄部材とガラス板との接触状態が不十分になり、ガラス板の主表面に洗浄ムラが生じるおそれがある。 However, even if spacers are provided, it may not be possible to accurately adjust the height position of the cleaning member with respect to the glass plate due to variations in the thickness of the spacers. As a result, the contact state between the cleaning member and the glass plate becomes insufficient, and there is a risk that uneven cleaning may occur on the main surface of the glass plate.
 本発明は、ガラス板の主表面の洗浄ムラを確実に低減することを課題とする。 An object of the present invention is to reliably reduce uneven cleaning of the main surface of a glass plate.
(1) 上記の課題を解決するために創案された本発明に係るガラス板の洗浄装置は、ガラス板の主表面に接触する洗浄部材および洗浄部材に連結されて洗浄部材と共に回転する回転軸を有する回転洗浄体と、回転軸を支持する支持台とを備え、支持台が、回転軸を軸方向に移動可能に支持するスライド支持構造を備えることを特徴とする。 (1) A glass plate cleaning apparatus according to the present invention, which has been invented to solve the above problems, includes a cleaning member that contacts the main surface of the glass plate and a rotating shaft that is connected to the cleaning member and rotates together with the cleaning member. and a support base for supporting the rotating shaft, and the support base includes a slide supporting structure for axially movably supporting the rotating shaft.
 このようにすれば、スライド支持構造で回転軸を軸方向に移動(スライド)させることにより、ガラス板の主表面に対する洗浄部材の高さ位置を正確に調整できる。その結果、洗浄部材とガラス板の主表面との接触状態が安定し、ガラス板の主表面の洗浄ムラを確実に低減できる。 With this configuration, the height position of the cleaning member relative to the main surface of the glass plate can be accurately adjusted by moving (sliding) the rotating shaft in the axial direction with the slide support structure. As a result, the contact state between the cleaning member and the main surface of the glass plate is stabilized, and uneven cleaning of the main surface of the glass plate can be reliably reduced.
(2) 上記(1)の構成において、回転洗浄体を複数備え、一つの支持台が、複数の回転軸をそれぞれの軸方向に移動可能に支持する複数のスライド支持構造を備えることが好ましい。 (2) In the configuration of (1) above, it is preferable that a plurality of rotary cleaning bodies are provided, and one support stand is provided with a plurality of slide support structures that support a plurality of rotating shafts movably in their respective axial directions.
 このようにすれば、一つの支持台で複数の回転軸を支持しつつ、各回転軸に連結された各洗浄部材の高さ位置をそれぞれのスライド支持構造によって個別に調整できる。 In this way, while supporting a plurality of rotating shafts with one support, the height position of each cleaning member connected to each rotating shaft can be individually adjusted by each slide support structure.
(3) 上記(1)又は(2)の構成において、スライド支持構造は、回転軸が回転洗浄体の自重で主表面側に移動するように構成されていることが好ましい。 (3) In the configuration of (1) or (2) above, it is preferable that the slide support structure is configured so that the rotating shaft moves toward the main surface by the weight of the rotating cleaning body.
 このようにすれば、回転軸がガラス板の主表面に常に接近しようとするため、洗浄部材とガラス板の主表面との接触状態がより安定する。 By doing so, the rotating shaft always tries to approach the main surface of the glass plate, so that the contact state between the cleaning member and the main surface of the glass plate becomes more stable.
(4) 上記(3)の構成において、回転洗浄体は、着脱可能な錘を備えることが好ましい。 (4) In the configuration of (3) above, it is preferable that the rotating cleaning body has a detachable weight.
 このようにすれば、回転軸がガラス板の主表面側に向かう力を錘の重さによって調整できる。したがって、洗浄部材とガラス板の主表面との接触状態がより安定する。 By doing so, the force of the rotating shaft toward the main surface of the glass plate can be adjusted by the weight of the weight. Therefore, the contact state between the cleaning member and the main surface of the glass plate becomes more stable.
(5) 上記(1)~(4)のいずれかの構成において、スライド支持構造は、回転軸を回転可能かつ軸方向に移動可能に支持する滑り軸受を備えることが好ましい。 (5) In any one of the configurations (1) to (4) above, the slide support structure preferably includes a sliding bearing that supports the rotating shaft rotatably and axially movably.
 このようにすれば、回転軸の軸方向の移動を許容しつつ、回転軸の回転を安定させることができる。 By doing so, it is possible to stabilize the rotation of the rotating shaft while allowing the axial movement of the rotating shaft.
(6) 上記の課題を解決するために創案された本発明に係るガラス板の製造方法は、上記(1)~(5)のいずれかの構成を有するガラス板洗浄装置を用いて、ガラス板の主表面を洗浄する洗浄工程を備えることを特徴とする。 (6) A method for manufacturing a glass plate according to the present invention, which was invented to solve the above problems, uses a glass plate cleaning apparatus having any one of the above configurations (1) to (5) to clean a glass plate. characterized by comprising a cleaning step of cleaning the main surface of the
 このようにすれば、既に述べた対応する構成と同様の作用効果を享受できる。 By doing so, it is possible to enjoy the same effect as the corresponding configuration already described.
 本発明によれば、洗浄部材とガラス板の主表面との接触状態が安定するため、ガラス板の主表面の洗浄ムラを確実に低減できる。 According to the present invention, since the contact state between the cleaning member and the main surface of the glass plate is stabilized, uneven cleaning of the main surface of the glass plate can be reliably reduced.
第一実施形態に係るガラス板の洗浄装置を示す断面図である。BRIEF DESCRIPTION OF THE DRAWINGS It is sectional drawing which shows the washing|cleaning apparatus of the glass plate which concerns on 1st embodiment. 図1のガラス板の洗浄装置を示す平面図である。FIG. 2 is a plan view showing the apparatus for cleaning the glass plate of FIG. 1; 図1のガラス板の洗浄装置に含まれる、一つの洗浄ユニット周辺を拡大して示す断面図である。1. It is sectional drawing which expands and shows one washing|cleaning unit periphery contained in the washing|cleaning apparatus of the glass plate of FIG. 図1のガラス板の洗浄装置を用いた洗浄工程を説明するための側面図である。FIG. 3 is a side view for explaining a cleaning process using the glass plate cleaning apparatus of FIG. 1 ; 図1のガラス板の洗浄装置を用いた洗浄工程を説明するための側面図である。FIG. 3 is a side view for explaining a cleaning process using the glass plate cleaning apparatus of FIG. 1 ; 図1のガラス板の洗浄装置を用いた洗浄工程を説明するための側面図である。FIG. 3 is a side view for explaining a cleaning process using the glass plate cleaning apparatus of FIG. 1 ; 図1のガラス板の洗浄装置を用いた洗浄工程を説明するための側面図である。FIG. 3 is a side view for explaining a cleaning process using the glass plate cleaning apparatus of FIG. 1 ; 第二実施形態に係るガラス板の洗浄装置に含まれる、一つの洗浄ユニット周辺を拡大して示す断面図である。It is sectional drawing which expands and shows the periphery of one washing|cleaning unit contained in the washing|cleaning apparatus of the glass plate which concerns on 2nd embodiment.
 以下、本実施形態に係るガラス板の洗浄装置及びガラス板の製造方法について、図面を参照しながら説明する。なお、図中のXYZは直交座標系である。X方向及びY方向は水平方向であり、Z方向は鉛直方向である。各実施形態において対応する構成要素には同一符号を付すことにより、重複する説明を省略する場合がある。各実施形態において構成の一部分のみを説明している場合、当該構成の他の部分については、先行して説明した他の実施形態の構成を適用することができる。各実施形態の説明において明示している構成の組み合わせばかりではなく、特に組み合わせに支障が生じなければ、明示していなくても複数の実施形態の構成同士を部分的に組み合わせることができる。 A glass plate cleaning apparatus and a glass plate manufacturing method according to the present embodiment will be described below with reference to the drawings. It should be noted that XYZ in the figure is an orthogonal coordinate system. The X and Y directions are horizontal and the Z direction is vertical. Duplicate description may be omitted by attaching the same reference numerals to corresponding components in each embodiment. When only a part of the configuration is described in each embodiment, the configurations of other embodiments previously described can be applied to other portions of the configuration. In addition to combinations of configurations explicitly specified in the description of each embodiment, configurations of a plurality of embodiments can be partially combined even if they are not specified unless there is a particular problem with the combination.
(第一実施形態)
 図1及び図2に示すように、第一実施形態に係るガラス板の洗浄装置1は、ガラス板Gをローラコンベアやベルトコンベア等の搬送機構(不図示)によって水平姿勢で搬送しながら、ガラス板Gの板厚方向に対向する一対の主表面である上面Ga及び下面Gbを同時に洗浄するものである。
(First embodiment)
As shown in FIGS. 1 and 2, the glass plate cleaning apparatus 1 according to the first embodiment conveys a glass plate G in a horizontal posture by a conveying mechanism (not shown) such as a roller conveyor or a belt conveyor, while cleaning the glass plate. An upper surface Ga and a lower surface Gb, which are a pair of main surfaces of the plate G facing each other in the plate thickness direction, are cleaned at the same time.
 ここで、本実施形態では、ガラス板Gの上面Gaは保証面とされ、ガラス板Gの下面Gbは非保証面とされる。保証面には、ディスプレイの製造工程等で電気回路等が形成される。そのため、保証面となるガラス板Gの上面Gaの清浄度が特に重要となる。 Here, in this embodiment, the upper surface Ga of the glass plate G is a guaranteed surface, and the lower surface Gb of the glass plate G is a non-guaranteed surface. An electric circuit or the like is formed on the security surface in the display manufacturing process or the like. Therefore, the cleanliness of the upper surface Ga of the glass plate G, which is the guaranteed surface, is particularly important.
 ガラス板Gの一辺の大きさは500mm~4000mmであることが好ましく、板厚は0.05mm~10mmであることが好ましく、0.2mm~0.7mmであることがより好ましい。 The size of one side of the glass plate G is preferably 500 mm to 4000 mm, the plate thickness is preferably 0.05 mm to 10 mm, and more preferably 0.2 mm to 0.7 mm.
 洗浄装置1は、ガラス板Gの上面Gaを洗浄する上面洗浄機構2と、ガラス板Gの下面Gbを洗浄する下面洗浄機構3とを備える。 The cleaning apparatus 1 includes an upper surface cleaning mechanism 2 for cleaning the upper surface Ga of the glass plate G and a lower surface cleaning mechanism 3 for cleaning the lower surface Gb of the glass plate G.
 ここで、下面洗浄機構3は、上面洗浄機構2を上下反転させたような構成であり、上面洗浄機構2と実質的に同じ構成を有する。したがって、以下では、上面洗浄機構2の構成を例にとって説明し、下面洗浄機構3の構成の詳しい説明は省略する。 Here, the lower surface cleaning mechanism 3 has a configuration in which the upper surface cleaning mechanism 2 is turned upside down, and has substantially the same configuration as the upper surface cleaning mechanism 2 . Therefore, the configuration of the upper surface cleaning mechanism 2 will be described below as an example, and a detailed description of the configuration of the lower surface cleaning mechanism 3 will be omitted.
 図1に示すように、上面洗浄機構2は、内部空間に洗浄液4が貯留された筐体構造をなす支持台5と、ガラス板Gの上面Gaを洗浄する複数の洗浄ユニット6とを備える。 As shown in FIG. 1, the upper surface cleaning mechanism 2 includes a support base 5 having a housing structure in which the cleaning liquid 4 is stored in the internal space, and a plurality of cleaning units 6 for cleaning the upper surface Ga of the glass plate G.
 洗浄液4としては、洗浄液(例えば液体洗剤)や、すすぎ液(例えば水)といった液体を使用できる。 As the cleaning liquid 4, liquids such as cleaning liquid (eg, liquid detergent) and rinsing liquid (eg, water) can be used.
 支持台5は、ガラス板Gの搬送方向(Y方向)と直交するガラス板Gの幅方向(X方向)に跨るように配置されている。支持台5の幅方向両端部は、支持台5を昇降可能に支持する昇降装置5aによって支持されている。本実施形態では、ガラス板Gの洗浄時には、支持台5は所定の基準位置で定置される。一方、ガラス板Gの品種変更等でガラス板Gの厚みが大きく変更される場合には、ガラス板Gの洗浄前に、昇降装置5aによって支持台5の高さ位置を調整し、ガラス板Gの厚みに応じた基準位置を予め設定する。 The support table 5 is arranged so as to straddle the width direction (X direction) of the glass plate G perpendicular to the conveying direction (Y direction) of the glass plate G. Both ends of the support base 5 in the width direction are supported by lifting devices 5a that support the support base 5 so as to be able to move up and down. In this embodiment, when cleaning the glass plate G, the support base 5 is fixed at a predetermined reference position. On the other hand, when the thickness of the glass plate G is greatly changed due to a change in the type of the glass plate G, etc., the height position of the support base 5 is adjusted by the lifting device 5a before cleaning the glass plate G, and the glass plate G is cleaned. A reference position is set in advance according to the thickness of the .
 複数の洗浄ユニット6は、ガラス板Gの搬送方向(Y方向)と直交するガラス板Gの幅方向(X方向)に沿って列状に配列されている。各洗浄ユニット6は、支持台5の内部空間に面するように支持台5に固定された軸ケース7と、軸ケース7の内部空間に面するように軸ケース7に回転可能に保持された回転軸8と、支持台5及び軸ケース7の外側で回転軸8の先端部に装着された洗浄部材9とを備える。各洗浄ユニット6において、回転軸8及び洗浄部材9は回転洗浄体Wを構成し、共に一体的に回転するようになっている。ここで、「先端部」はガラス板G側の端部を意味し、「基端部」はガラス板G側の先端部とは反対側の端部を意味する(以下、同様)。 A plurality of cleaning units 6 are arranged in a row along the width direction (X direction) of the glass plate G perpendicular to the glass plate G conveying direction (Y direction). Each cleaning unit 6 has a shaft case 7 fixed to the support base 5 so as to face the inner space of the support base 5, and is rotatably held in the shaft case 7 so as to face the inner space of the shaft case 7. A rotating shaft 8 and a cleaning member 9 attached to the tip of the rotating shaft 8 outside the support base 5 and the shaft case 7 are provided. In each washing unit 6, the rotating shaft 8 and the washing member 9 constitute a rotating washing body W, which rotate together integrally. Here, the "front end" means the end on the glass plate G side, and the "base end" means the end on the side opposite to the front end on the glass plate G side (the same applies hereinafter).
 軸ケース7は、円筒状の部材であり、支持台5の上面及び下面にそれぞれ設けられた孔に挿通された状態で固定されている。 The shaft case 7 is a cylindrical member, and is fixed in a state of being inserted through holes respectively provided on the upper and lower surfaces of the support base 5 .
 軸ケース7の先端部及び基端部には、それぞれ滑り軸受10,11が圧入固定されている。先端部側の滑り軸受10は、円筒部10aと、円筒部10aの先端部に設けられた鍔部10bとを有する。基端部側の滑り軸受11は、円筒部11aと、円筒部11aの基端部に設けられた鍔部11bとを有する。滑り軸受10,11は、例えば金属製等であってもよいが、本実施形態では樹脂製(例えばエンジニアリングプラスチック製)である。 Slide bearings 10 and 11 are press-fitted and fixed to the tip and base ends of the shaft case 7, respectively. The slide bearing 10 on the tip side has a cylindrical portion 10a and a collar portion 10b provided at the tip portion of the cylindrical portion 10a. The sliding bearing 11 on the proximal end side has a cylindrical portion 11a and a collar portion 11b provided at the proximal end portion of the cylindrical portion 11a. The sliding bearings 10 and 11 may be made of metal, for example, but are made of resin (eg, engineering plastic) in this embodiment.
 回転軸8は、軸方向(Z方向)の移動が許容された状態で、滑り軸受10,11の円筒部10a,11aによって回転可能に保持されている。つまり、滑り軸受10,11及び軸ケース7により、回転軸8を軸方向に移動可能に支持するスライド支持構造Sが構成されている。本実施形態では、一つの支持台5が、複数のスライド支持構造Sを備え、複数の回転軸8が軸方向に移動可能に支持されている。つまり、複数の回転洗浄体Wが軸方向に移動可能とされている。 The rotary shaft 8 is rotatably held by cylindrical portions 10a and 11a of slide bearings 10 and 11 while allowing movement in the axial direction (Z direction). That is, the slide bearings 10 and 11 and the shaft case 7 constitute a slide support structure S that supports the rotary shaft 8 so as to be axially movable. In this embodiment, one support table 5 includes a plurality of slide support structures S, and a plurality of rotating shafts 8 are supported so as to be axially movable. In other words, a plurality of rotary cleaning bodies W are movable in the axial direction.
 洗浄部材9は、回転軸8に対して着脱可能である。洗浄部材9は、ガラス板Gの上面Gaに接触してガラス板Gの上面Gaを洗浄する洗浄部9aと、洗浄部9aを支持する支持部9bとを備える。 The cleaning member 9 is detachable with respect to the rotary shaft 8. The cleaning member 9 includes a cleaning portion 9a that comes into contact with the upper surface Ga of the glass plate G to clean the upper surface Ga of the glass plate G, and a support portion 9b that supports the cleaning portion 9a.
 洗浄部9aの種類は、例えばブラシ等であってもよいが、本実施形態ではスポンジである。洗浄部9aの形状は特に限定されるものではないが、本実施形態ではディスク状である。 The type of the cleaning part 9a may be, for example, a brush, but in this embodiment it is a sponge. Although the shape of the cleaning portion 9a is not particularly limited, it is disc-shaped in this embodiment.
 軸ケース7には、支持台5の内部空間と軸ケース7の内部空間とを連通する第一供給路R1が設けられており、支持台5の内部空間の洗浄液4が、矢印aのように第一供給路R1を通じて軸ケース7の内部空間に供給されるようになっている。 The shaft case 7 is provided with a first supply path R1 that communicates the inner space of the support base 5 with the inner space of the shaft case 7, and the cleaning liquid 4 in the inner space of the support base 5 flows as indicated by an arrow a. The internal space of the shaft case 7 is supplied through the first supply path R1.
 回転軸8には、軸ケース7の内部空間と洗浄部材9とを連通する第二供給路R2が設けられており、軸ケース7の内部空間の洗浄液4が、矢印bのように第二供給路R2を通じて洗浄部材9に供給されるようになっている。 The rotary shaft 8 is provided with a second supply path R2 that communicates the inner space of the shaft case 7 with the cleaning member 9, and the cleaning liquid 4 in the inner space of the shaft case 7 is supplied to the second supply path R2 as indicated by an arrow b. It is supplied to the cleaning member 9 through the path R2.
 洗浄部材9には、第二供給路R2に連通する貫通孔R3が設けられおり、第二供給路R2によって供給された洗浄液4が、矢印cのように貫通孔R3を通じてガラス板Gに供給されるようになっている。貫通孔R3は、洗浄部材9が洗浄液4を透過可能な材質(例えば、多孔質体等)で形成される場合には省略してもよい。 The cleaning member 9 is provided with a through hole R3 communicating with the second supply path R2, and the cleaning liquid 4 supplied through the second supply path R2 is supplied to the glass plate G through the through hole R3 as indicated by an arrow c. It has become so. The through hole R3 may be omitted when the cleaning member 9 is made of a material (for example, a porous material or the like) through which the cleaning liquid 4 can pass.
 上面洗浄機構2は、各洗浄ユニット6の回転軸8を回転駆動する回転駆動機構12を備える。回転駆動機構12は、支持台5及び軸ケース7の外側で回転軸8の基端部に回転駆動力を付与するようになっている。 The upper surface cleaning mechanism 2 includes a rotation drive mechanism 12 that rotates the rotating shaft 8 of each cleaning unit 6 . The rotary drive mechanism 12 applies a rotary drive force to the proximal end portion of the rotary shaft 8 outside the support base 5 and the shaft case 7 .
 回転駆動機構12は、ギア機構13と、駆動部14とを備える。ギア機構13は、各回転軸8の基端部に取り付けられた複数のギア13aを備え、隣接するギア13a同士が噛み合っている。駆動部14は、モータ14aと、モータ14aに取り付けられたギア14bとを備え、ギア14bがギア機構13のギア13aと噛み合っている。したがって、モータ14aの回転によりギア14bを回転させると、その動力がギア機構13に伝達され、各洗浄ユニット6の回転軸8が回転するようになっている。 The rotation drive mechanism 12 includes a gear mechanism 13 and a drive section 14. The gear mechanism 13 has a plurality of gears 13a attached to the base end of each rotating shaft 8, and the adjacent gears 13a are meshed with each other. The drive unit 14 includes a motor 14 a and a gear 14 b attached to the motor 14 a , and the gear 14 b meshes with the gear 13 a of the gear mechanism 13 . Therefore, when the gear 14b is rotated by the rotation of the motor 14a, the power is transmitted to the gear mechanism 13, and the rotary shaft 8 of each cleaning unit 6 rotates.
 本実施形態では、幅方向に隣接する回転軸8は、互いに反対向きに回転するようになっているが(図2を参照)、互いに同じ向きに回転するようにしてもよい。動力伝達部は、ギア機構13に限定されるものではなく、例えばベルト等の他の手段であってもよい。各回転軸8に個別に駆動部(モータ)を取り付けてもよい。 In this embodiment, the rotating shafts 8 adjacent in the width direction are designed to rotate in opposite directions (see FIG. 2), but they may rotate in the same direction. The power transmission unit is not limited to the gear mechanism 13, and may be other means such as a belt. A drive unit (motor) may be attached to each rotating shaft 8 individually.
 また、下面洗浄機構3は、上面洗浄機構2と同様に、洗浄ユニット15、洗浄部材16、洗浄部16a、支持部16b等を有している。洗浄装置1は、ガラス板Gの上下面Ga,Gbを一対の洗浄部材9,16で挟んで洗浄するようになっている。ただし、本実施形態では、上面洗浄機構2の洗浄部材9は、ガラス板Gの上面Gaに追随するように上下方向に移動するが、下面洗浄機構3の洗浄部材16は、ガラス板Gの下面Gbに追随するように上下方向に移動しない。つまり、下面洗浄機構3の洗浄部材16は、洗浄中も高さ位置が一定に維持される。 Further, like the upper surface cleaning mechanism 2, the lower surface cleaning mechanism 3 has a cleaning unit 15, a cleaning member 16, a cleaning section 16a, a support section 16b, and the like. The cleaning apparatus 1 cleans the upper and lower surfaces Ga and Gb of the glass plate G while sandwiching them between a pair of cleaning members 9 and 16 . However, in this embodiment, the cleaning member 9 of the upper surface cleaning mechanism 2 moves vertically so as to follow the upper surface Ga of the glass plate G, but the cleaning member 16 of the lower surface cleaning mechanism 3 moves along the lower surface of the glass plate G. It does not move vertically to follow Gb. In other words, the cleaning member 16 of the undersurface cleaning mechanism 3 maintains a constant height position during cleaning.
 図2に示すように、上面洗浄機構2は、複数の洗浄ユニット6がX方向に列状に配列された洗浄列L1,L2を、搬送方向(Y方向)に間隔を置いて複数列(図示例は2列)有している。上流側の洗浄列L1に含まれる洗浄部材9と、下流側の洗浄列L2に含まれる洗浄部材9とは、搬送方向から見て完全に重ならないようにそれぞれ配置される。その結果、搬送方向から見た場合に、上流側の洗浄列L1で幅方向に隣接する洗浄部材9の間の隙間に、下流側の洗浄列L2の洗浄部材9がオーバーラップするように配置されている。  As shown in FIG. 2, the upper surface cleaning mechanism 2 has a plurality of cleaning rows L1 and L2 in which a plurality of cleaning units 6 are arranged in rows in the X direction, spaced apart in the transport direction (Y direction). The example has two rows). The cleaning members 9 included in the cleaning line L1 on the upstream side and the cleaning members 9 included in the cleaning line L2 on the downstream side are arranged so as not to completely overlap when viewed from the transport direction. As a result, when viewed from the conveying direction, the cleaning members 9 of the cleaning row L2 on the downstream side are arranged so as to overlap the gaps between the cleaning members 9 adjacent in the width direction in the cleaning row L1 on the upstream side. ing. 
 支持台5は、各洗浄列L1,L2毎に個別のものを用いてもよい。あるいは、支持台5は、複数の洗浄列L1,L2で共通(一つ)のものを用いてもよい。 Separate support bases 5 may be used for each of the washing lines L1 and L2. Alternatively, a common (one) support table 5 may be used for the plurality of cleaning lines L1 and L2.
 図3に示すように、上面洗浄機構2において、スライド支持構造Sは、回転軸8が回転洗浄体W(回転軸8及び洗浄部材9)の自重でガラス板Gの上面Ga側に移動するように構成されている。つまり、ガラス板Gがない状態の回転軸8の先端部の支持台5からの下方突出量D1は、ガラス板Gがある状態の回転軸8の先端部の支持台5からの下方突出量D2よりも大きい。換言すれば、ガラス板Gがない状態の回転軸8の基端部の支持台5からの上方突出量U1は、ガラス板Gがある状態の回転軸8の基端部の支持台5からの上方突出量U2よりも小さい。 As shown in FIG. 3, in the upper surface cleaning mechanism 2, the slide support structure S is arranged so that the rotating shaft 8 moves toward the upper surface Ga of the glass plate G by the weight of the rotating cleaning body W (the rotating shaft 8 and the cleaning member 9). is configured to That is, the amount D1 of downward projection of the tip of the rotating shaft 8 from the support base 5 without the glass plate G is the amount D2 of downward protrusion of the tip of the rotating shaft 8 from the support base 5 with the glass plate G. bigger than In other words, the upward protrusion amount U1 of the base end portion of the rotating shaft 8 without the glass plate G from the support base 5 is the same as the amount U1 of the base end portion of the rotating shaft 8 with the glass plate G present from the support base 5 It is smaller than the upward protrusion amount U2.
 本実施形態では、ガラス板Gがない状態では、上面洗浄機構2の洗浄部材9が、回転洗浄体Wの自重による回転軸8の下降を伴って、下面洗浄機構3の洗浄部材16の上に載置されるようになっている。なお、ギア機構13によって回転駆動力を伝達する場合、ギア13a同士の噛み合いを維持するために、回転軸8の最大移動量(下方突出量D1-下方突出量D2)は、ギア13aの厚み(歯幅)よりも小さく設定することが好ましい。回転軸8の最大移動量は、例えば、ギア13aの下面と軸ケース7(滑り軸受11)の上面との間の隙間の上下方向(Z方向)の大きさで管理できる。回転軸8の最大移動量は、例えば0.1~10mmに設定される。 In the present embodiment, when the glass plate G is not present, the cleaning member 9 of the upper surface cleaning mechanism 2 moves onto the cleaning member 16 of the lower surface cleaning mechanism 3 as the rotating shaft 8 descends due to the weight of the rotating cleaning body W. It is designed to be placed. When the gear mechanism 13 transmits the rotational driving force, in order to maintain the engagement between the gears 13a, the maximum amount of movement of the rotating shaft 8 (the amount of downward projection D1−the amount of downward projection D2) is the thickness of the gear 13a ( face width). The maximum amount of movement of the rotating shaft 8 can be controlled, for example, by the size of the gap in the vertical direction (Z direction) between the lower surface of the gear 13a and the upper surface of the shaft case 7 (slide bearing 11). The maximum amount of movement of the rotating shaft 8 is set to 0.1 to 10 mm, for example.
 本実施形態では、両洗浄部材9,16の洗浄部9a,16aの周縁部には、ガラス板Gを両洗浄部材9,16の相互間に案内する傾斜案内面9aa,16aaが設けられている。これにより、洗浄工程において、ガラス板Gが両洗浄部材9,16の相互間に容易に進入できるようになっている。 In this embodiment, inclined guide surfaces 9aa, 16aa for guiding the glass plate G between the cleaning members 9, 16 are provided at the peripheral edges of the cleaning portions 9a, 16a of the cleaning members 9, 16. . This allows the glass plate G to easily enter between the two cleaning members 9 and 16 in the cleaning process.
 次に、本実施形態に係るガラス板の製造方法を説明する。 Next, a method for manufacturing a glass plate according to this embodiment will be described.
 本製造方法は、例えば、成形工程と、徐冷工程と、採板工程と、切断工程と、洗浄工程と、検査工程と、梱包工程とを備える。 This manufacturing method includes, for example, a molding process, a slow cooling process, a board picking process, a cutting process, a cleaning process, an inspection process, and a packing process.
 成形工程では、オーバーフローダウンドロー法やフロート法等の公知の方法によって、溶融ガラスからガラスリボンを成形する。 In the forming process, a glass ribbon is formed from molten glass by a known method such as an overflow downdraw method or a float method.
 徐冷工程では、成形されたガラスリボンの反り及び内部歪を低減するために、成形されたガラスリボンを徐冷する。 In the slow cooling process, the molded glass ribbon is slowly cooled in order to reduce the warp and internal strain of the molded glass ribbon.
 採板工程では、徐冷されたガラスリボンを所定の長さごとに切断し、複数枚の元ガラス板を得る。 In the plate-cutting process, the slowly cooled glass ribbon is cut into predetermined lengths to obtain multiple original glass plates.
 切断工程では、元ガラス板を所定サイズに切断し、一枚又は複数枚のガラス板Gを得る。元ガラス板の切断方法としては、例えば、曲げ応力割断、レーザー割断、レーザー溶断等を利用することができる。ガラス板Gは矩形状であることが好ましい。 In the cutting step, the original glass plate is cut into a predetermined size to obtain one or more glass plates G. As a method for cutting the original glass plate, for example, bending stress cutting, laser cutting, laser fusion cutting, or the like can be used. The glass plate G is preferably rectangular.
 洗浄工程では、上記の洗浄装置1を用いて、ガラス板Gを水平姿勢で搬送しながら洗浄する。 In the cleaning process, the cleaning apparatus 1 is used to clean the glass plate G while conveying it in a horizontal posture.
 検査工程では、洗浄されたガラス板Gに対して表面に傷、塵、汚れ等がないか、及び/又は、気泡、異物等の内部欠陥がないかを検査する。検査は、カメラ等の光学検査装置を用いて行う。 In the inspection process, the cleaned glass plate G is inspected for scratches, dust, dirt, etc. on the surface and/or internal defects such as air bubbles and foreign matter. The inspection is performed using an optical inspection device such as a camera.
 梱包工程では、検査の結果、所望の品質を満たすガラス板Gを梱包する。梱包は、所定のパレットに対して、複数枚のガラス板Gを平置きで積層したり、縦置きで積層したりすることによって行う。この場合、ガラス板Gの積層方向の相互間には、合紙や発泡樹脂等からなる保護シートを介在させることが好ましい。 In the packing process, as a result of the inspection, the glass plates G that satisfy the desired quality are packed. Packing is performed by stacking a plurality of glass sheets G horizontally or vertically on a predetermined pallet. In this case, it is preferable to interpose a protective sheet made of interleaving paper, foamed resin, or the like between the glass plates G in the stacking direction.
 なお、本製造方法は、採板工程の後に熱処理工程や、切断工程の後に端面加工工程をさらに備えていてもよい。 It should be noted that this manufacturing method may further include a heat treatment process after the board picking process and an end surface processing process after the cutting process.
 次に、上記の洗浄工程における洗浄装置1の動作を説明する。 Next, the operation of the cleaning device 1 in the cleaning process described above will be described.
 洗浄工程では、まず、図4に示すように、洗浄装置1の上流側からガラス板Gを搬送方向(Y方向)に沿って搬送する。この際、上面洗浄機構2の洗浄部材9は、回転洗浄体Wの自重による回転軸8の下降を伴って、下面洗浄機構3の洗浄部材16の上に載置された状態で待機する。つまり、待機状態では、両洗浄部材9,16が互いに接触する。 In the cleaning step, first, as shown in FIG. 4, the glass plate G is transported along the transport direction (Y direction) from the upstream side of the cleaning device 1. At this time, the cleaning members 9 of the upper surface cleaning mechanism 2 stand by while being placed on the cleaning members 16 of the lower surface cleaning mechanism 3 as the rotating shaft 8 descends due to the weight of the rotary cleaning body W itself. That is, both cleaning members 9 and 16 are in contact with each other in the standby state.
 その後、ガラス板Gが両洗浄部材9,16まで到達すると、図5及び図6に示すように、両洗浄部材9,16を押し分けるようにして、両洗浄部材9,16の相互間にガラス板Gが進入する。 After that, when the glass plate G reaches both cleaning members 9 and 16, as shown in FIGS. Plank G enters.
 詳細には、上面洗浄機構2の洗浄部材9は、スライド支持構造Sによって、回転軸8と共に回転軸8の軸方向(上下方向)に移動可能である。そのため、ガラス板Gが両洗浄部材9,16まで到達すると、上面洗浄機構2の洗浄部材9は、傾斜案内面9aaと接触するガラス板Gによって上方に押し上げられる(図5を参照)。これにより、上面洗浄機構2の洗浄部材9は、回転軸8と共に上方に移動しながらガラス板Gの上面Gaに乗り上げる。乗り上げた後は、上面洗浄機構2の洗浄部材9は、洗浄回転部Wの自重による回転軸8の下降によって、ガラス板Gの上面Gaを下方に押圧し続ける(図6を参照)。 Specifically, the cleaning member 9 of the upper surface cleaning mechanism 2 is movable along with the rotating shaft 8 in the axial direction (vertical direction) of the rotating shaft 8 by the slide support structure S. Therefore, when the glass plate G reaches both cleaning members 9 and 16, the cleaning member 9 of the upper surface cleaning mechanism 2 is pushed upward by the glass plate G coming into contact with the inclined guide surface 9aa (see FIG. 5). As a result, the cleaning member 9 of the upper surface cleaning mechanism 2 rides on the upper surface Ga of the glass plate G while moving upward together with the rotating shaft 8 . After riding on the upper surface Ga, the cleaning member 9 of the upper surface cleaning mechanism 2 continues to press the upper surface Ga of the glass plate G downward as the rotating shaft 8 descends due to the weight of the cleaning rotary unit W (see FIG. 6).
 さらに、ガラス板Gが両洗浄部材9,16の相互間から退出すると、図7に示すように、上面洗浄機構2の洗浄部材9は、洗浄回転部Wの自重による回転軸8の下降を伴って、下面洗浄機構3の洗浄部材16の上に再び載置される。 Further, when the glass plate G is withdrawn from between the cleaning members 9 and 16, the cleaning member 9 of the upper surface cleaning mechanism 2 moves downward due to the weight of the cleaning rotating portion W, as shown in FIG. and placed on the cleaning member 16 of the lower surface cleaning mechanism 3 again.
 以上のように、上面洗浄機構2の回転軸8(洗浄回転部W)は、スライド支持構造Sによって上下方向に移動可能である。そのため、上面洗浄機構2の洗浄部材9は、ガラス板Gの上面Gaに追随するように高さ位置が自動調整される。このような動作は、上面洗浄機構2に含まれる各洗浄部材9で同様に生じる。したがって、各洗浄部材9とガラス板Gの上面Gaとの接触状態が安定し、ガラス板Gの上面Gaの洗浄ムラを確実に低減できる。 As described above, the rotating shaft 8 (cleaning rotating part W) of the upper surface cleaning mechanism 2 can be vertically moved by the slide support structure S. Therefore, the height position of the cleaning member 9 of the upper surface cleaning mechanism 2 is automatically adjusted so as to follow the upper surface Ga of the glass plate G. As shown in FIG. Such an operation similarly occurs in each cleaning member 9 included in the upper surface cleaning mechanism 2 . Therefore, the contact state between each cleaning member 9 and the upper surface Ga of the glass plate G is stabilized, and uneven cleaning of the upper surface Ga of the glass plate G can be reliably reduced.
(第二実施形態)
 図8に示すように、第二実施形態に係るガラス板の洗浄装置1及びガラス板の洗浄方法が、第一実施形態と相違するところは、上面洗浄機構2の回転洗浄体Wに着脱可能な錘21が設けられている点である。
(Second embodiment)
As shown in FIG. 8, the glass plate cleaning apparatus 1 and the glass plate cleaning method according to the second embodiment differ from the first embodiment in that a The point is that the weight 21 is provided.
 詳細には、錘21は、洗浄部材9の支持部9bの上に載置された状態で、ボルト等の締結部材によって支持部9bに着脱可能に固定されている。 Specifically, the weight 21 is detachably fixed to the support portion 9b by a fastening member such as a bolt while being placed on the support portion 9b of the cleaning member 9 .
 錘21の形状は、特に限定されるものではないが、本実施形態では平面視でディスク状の洗浄部9aの周縁部に沿った円環状形状をなす。また、錘21は、取付性を考慮し、周方向で複数に分割されている(例えば半割り形状)。 The shape of the weight 21 is not particularly limited, but in this embodiment, it has an annular shape along the periphery of the disk-shaped cleaning portion 9a in plan view. Further, the weight 21 is divided into a plurality of parts in the circumferential direction (for example, a half-split shape) in consideration of mountability.
 このように錘21を設けることで、回転軸8に作用する回転洗浄体Wの自重の大きさを調整できる。つまり、回転軸8がガラス板Gの上面Gaに向かう力を調整できる。したがって、洗浄部材9とガラス板Gの上面Gaとの接触状態が非常に安定するという利点がある。 By providing the weight 21 in this manner, the self-weight of the rotating cleaning body W acting on the rotating shaft 8 can be adjusted. That is, the force of the rotation shaft 8 directed toward the upper surface Ga of the glass plate G can be adjusted. Therefore, there is an advantage that the contact state between the cleaning member 9 and the upper surface Ga of the glass plate G is very stable.
 なお、錘21は、複数枚の板状体を重ねて配置した積層構造とすることが好ましい。このようにすれば、板状体の積層枚数によって、錘21の重さを容易に調整できる。 It should be noted that the weight 21 preferably has a laminated structure in which a plurality of plate-like bodies are stacked. In this way, the weight of the weight 21 can be easily adjusted according to the number of laminated plate-like bodies.
 錘21は、回転軸8に着脱可能に設けられていてもよい。錘21の取付位置は、回転洗浄体Wの範囲内であれば、特に限定されるものではない。 The weight 21 may be detachably attached to the rotating shaft 8 . The mounting position of the weight 21 is not particularly limited as long as it is within the range of the rotating cleaning body W.
 本発明は、上記の実施形態の構成に限定されるものではなく、上記した作用効果に限定されるものでもない。本発明は、本発明の要旨を逸脱しない範囲で種々の変更が可能である。 The present invention is not limited to the configurations of the above-described embodiments, nor is it limited to the above-described effects. Various modifications can be made to the present invention without departing from the gist of the present invention.
 上記の実施形態では、支持台の内部空間に貯留された洗浄液を、回転軸及び洗浄部材を介してガラス板に供給する構成を説明したが、洗浄液の供給方法はこれに限定されない。例えば、シャワーノズル等によってガラス板に洗浄液を噴射して供給してもよい。換言すれば、支持台は、回転軸を支持するスライド支持構造を有していれば、洗浄液を貯留する構成を備えていなくてもよい。 In the above embodiment, the cleaning liquid stored in the inner space of the support is supplied to the glass plate via the rotating shaft and the cleaning member, but the method of supplying the cleaning liquid is not limited to this. For example, the cleaning liquid may be sprayed onto the glass plate using a shower nozzle or the like. In other words, as long as the support table has a slide support structure that supports the rotating shaft, it does not have to be configured to store the cleaning liquid.
 上記の実施形態では、ガラス板のない待機状態において、上面洗浄機構の洗浄部材と下面洗浄機構の洗浄部材とが、互いに接触する場合を説明したが、これに限定されない。例えば、ガラス板のない待機状態において、上面洗浄機構の洗浄部材と下面洗浄機構の洗浄部材との間に、ガラス板の厚みよりも小さい隙間が形成されていてもよい。つまり、ガラス板のない待機状態において、上面洗浄機構の洗浄部材と下面洗浄機構の洗浄部材とが、互いに接触していなくてもよい。この場合、上面洗浄機構の回転軸は、最も下方に突出した位置(下死点)において、スライド支持構造(例えば軸ケース)と係合する抜け止め部を備えることが好ましい。 In the above embodiment, the case where the cleaning member of the upper surface cleaning mechanism and the cleaning member of the lower surface cleaning mechanism contact each other in the standby state without the glass plate has been described, but the present invention is not limited to this. For example, in a standby state without the glass plate, a gap smaller than the thickness of the glass plate may be formed between the cleaning member of the upper surface cleaning mechanism and the cleaning member of the lower surface cleaning mechanism. In other words, the cleaning member of the upper surface cleaning mechanism and the cleaning member of the lower surface cleaning mechanism do not have to be in contact with each other in the standby state without the glass plate. In this case, it is preferable that the rotation shaft of the upper surface washing mechanism has a retaining portion that engages with the slide support structure (for example, the shaft case) at the most downwardly projecting position (bottom dead center).
 上記の実施形態では、一つの支持台で複数の回転軸を支持する場合を説明したが、各回転軸にそれぞれ専用の支持台を設けてもよい。 In the above embodiment, a single support base supports a plurality of rotating shafts, but each rotating shaft may be provided with its own dedicated support base.
 上記の実施形態では、定位置に配置された洗浄部材に対してガラス板を移動させる場合を説明したが、洗浄部材とガラス板との間に相対的な移動があれば、いずれを移動させる態様であってもよい。すなわち、定位置に配置されたガラス板に対して、洗浄部材を移動させてもよいし、ガラス板と洗浄部材の両方を移動させてもよい。 In the above embodiment, the case where the glass plate is moved with respect to the cleaning member arranged at a fixed position has been described. may be That is, the cleaning member may be moved with respect to the glass plate arranged at a fixed position, or both the glass plate and the cleaning member may be moved.
 上記の実施形態では、ガラス板の上下面を同時に洗浄する場合を説明したが、ガラス板の上面のみを洗浄するようにしてもよい。 In the above embodiment, the case of cleaning the upper and lower surfaces of the glass plate at the same time has been described, but only the upper surface of the glass plate may be cleaned.
 上記の実施形態において、ガラス板の洗浄搬送時に、ガラス板が搬送方向と直交する幅方向において、一端側が他端側よりも低位に位置するように傾斜していてもよい。これにより、ガラス板の上面に付着した余分な液体が自重でガラス板の上面から流れ落ち、ガラス板の上面に汚れの原因となる液体溜りが形成されるのを防止できる。 In the above embodiment, the glass plate may be inclined such that one end side is positioned lower than the other end side in the width direction perpendicular to the conveying direction during cleaning and conveying of the glass plate. As a result, it is possible to prevent excess liquid adhering to the upper surface of the glass plate from flowing down from the upper surface of the glass plate due to its own weight and forming a liquid pool that causes contamination on the upper surface of the glass plate.
1   洗浄装置
2   上面洗浄機構
3   下面洗浄機構
4   洗浄液
5   支持台
6   洗浄ユニット
7   軸ケース
8   回転軸
9   洗浄部材
10  滑り軸受
11  滑り軸受
12  回転駆動機構
16  洗浄部材
21  錘
G   ガラス板
W   回転洗浄体
S   スライド支持構造
1 cleaning device 2 upper cleaning mechanism 3 lower cleaning mechanism 4 cleaning liquid 5 support 6 cleaning unit 7 shaft case 8 rotating shaft 9 cleaning member 10 slide bearing 11 slide bearing 12 rotary drive mechanism 16 cleaning member 21 weight G glass plate W rotating cleaning body S slide support structure

Claims (6)

  1.  ガラス板の主表面を洗浄するガラス板の洗浄装置において、
     前記ガラス板の前記主表面に接触する洗浄部材および前記洗浄部材に連結されて前記洗浄部材と共に回転する回転軸を有する回転洗浄体と、
     前記回転軸を支持する支持台とを備え、
     前記支持台が、前記回転軸を軸方向に移動可能に支持するスライド支持構造を備えることを特徴とするガラス板の洗浄装置。
    In a glass plate cleaning apparatus for cleaning the main surface of a glass plate,
    a rotating cleaning body having a cleaning member that contacts the main surface of the glass plate and a rotating shaft that is connected to the cleaning member and rotates together with the cleaning member;
    A support base that supports the rotating shaft,
    A cleaning apparatus for a glass plate, wherein the support table has a slide support structure that supports the rotating shaft so as to be axially movable.
  2.  前記回転洗浄体を複数備え、
     一つの前記支持台は、複数の前記回転軸をそれぞれの軸方向に移動可能に支持する複数の前記スライド支持構造を備える請求項1に記載のガラス板の洗浄装置。
    A plurality of the rotary cleaning bodies are provided,
    2. The apparatus for cleaning a glass plate according to claim 1, wherein one support base includes a plurality of slide support structures that support a plurality of rotation shafts movably in their respective axial directions.
  3.  前記スライド支持構造は、前記回転軸が前記回転洗浄体の自重で前記ガラス板の前記主表面側に移動するように構成されている請求項1又は2に記載のガラス板の洗浄装置。 The apparatus for cleaning a glass plate according to claim 1 or 2, wherein the slide support structure is configured such that the rotating shaft moves toward the main surface of the glass plate under the weight of the rotating cleaning body.
  4.  前記回転洗浄体が、着脱可能な錘を備える請求項3に記載のガラス板の洗浄装置。 The apparatus for cleaning a glass plate according to claim 3, wherein the rotary cleaning body has a detachable weight.
  5.  前記スライド支持構造は、前記回転軸を回転可能かつ軸方向に移動可能に支持する滑り軸受を備える請求項1~4のいずれか1項に記載のガラス板の洗浄装置。 The glass plate cleaning apparatus according to any one of claims 1 to 4, wherein the slide support structure includes a sliding bearing that supports the rotating shaft rotatably and axially movably.
  6.  請求項1~5のいずれか1項に記載のガラス板洗浄装置を用いて、前記ガラス板の前記主表面を洗浄する洗浄工程を備えることを特徴とするガラス板の製造方法。 A method for manufacturing a glass plate, comprising a cleaning step of cleaning the main surface of the glass plate using the glass plate cleaning apparatus according to any one of claims 1 to 5.
PCT/JP2022/041077 2021-11-16 2022-11-02 Glass plate cleaning device and glass plate manufacturing method WO2023090160A1 (en)

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Citations (6)

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JPH10321573A (en) * 1997-05-19 1998-12-04 Ebara Corp Cleaning device
JP2001293445A (en) * 2000-04-14 2001-10-23 Sony Corp Cleaning device and methods for manufacturing semiconductor device and liquid crystal element
JP2014014533A (en) * 2012-07-10 2014-01-30 East Japan Railway Co Cleaning device and carrier device
CN211275818U (en) * 2019-08-28 2020-08-18 日本电气硝子株式会社 Glass substrate cleaning device
JP2021113132A (en) * 2018-03-26 2021-08-05 日本電気硝子株式会社 Production method of glass plate, and cleaning apparatus of glass plate

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10242093A (en) * 1997-02-27 1998-09-11 Dainippon Screen Mfg Co Ltd Substrate cleaning equipment
JPH10321573A (en) * 1997-05-19 1998-12-04 Ebara Corp Cleaning device
JP2001293445A (en) * 2000-04-14 2001-10-23 Sony Corp Cleaning device and methods for manufacturing semiconductor device and liquid crystal element
JP2014014533A (en) * 2012-07-10 2014-01-30 East Japan Railway Co Cleaning device and carrier device
JP2021113132A (en) * 2018-03-26 2021-08-05 日本電気硝子株式会社 Production method of glass plate, and cleaning apparatus of glass plate
CN211275818U (en) * 2019-08-28 2020-08-18 日本电气硝子株式会社 Glass substrate cleaning device

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