TW202307569A - 光阻劑用樹脂、光阻劑及硬化物 - Google Patents

光阻劑用樹脂、光阻劑及硬化物 Download PDF

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Publication number
TW202307569A
TW202307569A TW111109429A TW111109429A TW202307569A TW 202307569 A TW202307569 A TW 202307569A TW 111109429 A TW111109429 A TW 111109429A TW 111109429 A TW111109429 A TW 111109429A TW 202307569 A TW202307569 A TW 202307569A
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TW
Taiwan
Prior art keywords
monomer
photoresist
meth
acrylate
resin
Prior art date
Application number
TW111109429A
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English (en)
Chinese (zh)
Inventor
山田彩花
河野瑞貴
長澤敦
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日商日油股份有限公司
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Publication date
Application filed by 日商日油股份有限公司 filed Critical 日商日油股份有限公司
Publication of TW202307569A publication Critical patent/TW202307569A/zh

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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/04—Acids; Metal salts or ammonium salts thereof
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
    • C08F220/28—Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
    • C08F290/06—Polymers provided for in subclass C08G
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

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  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
TW111109429A 2021-04-06 2022-03-15 光阻劑用樹脂、光阻劑及硬化物 TW202307569A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2021-064980 2021-04-06
JP2021064980 2021-04-06

Publications (1)

Publication Number Publication Date
TW202307569A true TW202307569A (zh) 2023-02-16

Family

ID=83546058

Family Applications (1)

Application Number Title Priority Date Filing Date
TW111109429A TW202307569A (zh) 2021-04-06 2022-03-15 光阻劑用樹脂、光阻劑及硬化物

Country Status (5)

Country Link
JP (1) JPWO2022215456A1 (https=)
KR (1) KR20230167373A (https=)
CN (1) CN117222944A (https=)
TW (1) TW202307569A (https=)
WO (1) WO2022215456A1 (https=)

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10161310A (ja) * 1996-12-04 1998-06-19 Jsr Corp 感放射線性樹脂組成物
JP4753036B2 (ja) 2005-07-25 2011-08-17 日産化学工業株式会社 ポジ型感光性樹脂組成物及びそれから得られる硬化膜
JP2007171311A (ja) 2005-12-19 2007-07-05 Sekisui Chem Co Ltd レジスト材料、エッチングパターンの形成方法及び導電性パターンの形成方法
JP5155764B2 (ja) * 2007-08-20 2013-03-06 富士フイルム株式会社 ポジ型感光性組成物及びそれを用いたパターン形成方法
JP5664299B2 (ja) * 2011-02-07 2015-02-04 東洋インキＳｃホールディングス株式会社 感光性着色組成物及びそれを用いたカラーフィルタ
KR101612673B1 (ko) 2015-03-11 2016-04-14 동우 화인켐 주식회사 네가티브형 감광성 수지 조성물
JP2017025236A (ja) 2015-07-24 2017-02-02 明和化成株式会社 ノボラック型フェノール樹脂、その製造方法、及びそれを含むフォトレジスト組成物
TWI709576B (zh) * 2016-02-23 2020-11-11 日商迪愛生股份有限公司 彩色阻劑組成物、濾色器及彩色阻劑組成物之製造方法
JP6577979B2 (ja) * 2016-07-21 2019-09-18 富士フイルム株式会社 積層体及び液晶表示装置

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Publication number Publication date
CN117222944A (zh) 2023-12-12
KR20230167373A (ko) 2023-12-08
WO2022215456A1 (ja) 2022-10-13
JPWO2022215456A1 (https=) 2022-10-13

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