TW202208695A - 金屬填充微細結構體的製造方法 - Google Patents
金屬填充微細結構體的製造方法 Download PDFInfo
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- TW202208695A TW202208695A TW110129211A TW110129211A TW202208695A TW 202208695 A TW202208695 A TW 202208695A TW 110129211 A TW110129211 A TW 110129211A TW 110129211 A TW110129211 A TW 110129211A TW 202208695 A TW202208695 A TW 202208695A
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Classifications
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
- C25D11/02—Anodisation
- C25D11/04—Anodisation of aluminium or alloys based thereon
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
- C25D11/02—Anodisation
- C25D11/04—Anodisation of aluminium or alloys based thereon
- C25D11/18—After-treatment, e.g. pore-sealing
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
- C25D11/02—Anodisation
- C25D11/04—Anodisation of aluminium or alloys based thereon
- C25D11/18—After-treatment, e.g. pore-sealing
- C25D11/20—Electrolytic after-treatment
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
- C25D11/02—Anodisation
- C25D11/04—Anodisation of aluminium or alloys based thereon
- C25D11/18—After-treatment, e.g. pore-sealing
- C25D11/24—Chemical after-treatment
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
- C25D11/02—Anodisation
- C25D11/26—Anodisation of refractory metals or alloys based thereon
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
- C25D11/02—Anodisation
- C25D11/34—Anodisation of metals or alloys not provided for in groups C25D11/04 - C25D11/32
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- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Manufacturing Of Electrical Connectors (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
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| Application Number | Priority Date | Filing Date | Title |
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| JP2020140860 | 2020-08-24 | ||
| JP2020-140860 | 2020-08-24 |
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| TW202208695A true TW202208695A (zh) | 2022-03-01 |
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| KR (1) | KR102723699B1 (https=) |
| CN (1) | CN115956144B (https=) |
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| JP2011090865A (ja) * | 2009-10-22 | 2011-05-06 | Shinko Electric Ind Co Ltd | 導電フィルムおよびその製造方法、並びに半導体装置およびその製造方法 |
| WO2017057150A1 (ja) * | 2015-09-29 | 2017-04-06 | 富士フイルム株式会社 | 金属充填微細構造体の製造方法 |
| JP6644895B2 (ja) | 2016-08-24 | 2020-02-12 | 富士フイルム株式会社 | 保管方法 |
| JP6906616B2 (ja) * | 2017-08-25 | 2021-07-21 | 富士フイルム株式会社 | 構造体、構造体の製造方法、積層体および半導体パッケージ |
| WO2019065095A1 (ja) * | 2017-09-26 | 2019-04-04 | 富士フイルム株式会社 | 金属充填微細構造体の製造方法および絶縁性基材 |
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- 2021-07-13 JP JP2022545520A patent/JP7506753B2/ja active Active
- 2021-07-13 WO PCT/JP2021/026287 patent/WO2022044585A1/ja not_active Ceased
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| CN115956144B (zh) | 2025-07-18 |
| KR102723699B1 (ko) | 2024-10-30 |
| JP7506753B2 (ja) | 2024-06-26 |
| CN115956144A (zh) | 2023-04-11 |
| KR20230043153A (ko) | 2023-03-30 |
| WO2022044585A1 (ja) | 2022-03-03 |
| JPWO2022044585A1 (https=) | 2022-03-03 |
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