TW202009283A - Electromagnetic wave shielding film with transfer film, manufacturing method thereof and manufacturing method of shielded printed wiring board with which it is difficult to generate gap between shielding film and printed wiring board - Google Patents
Electromagnetic wave shielding film with transfer film, manufacturing method thereof and manufacturing method of shielded printed wiring board with which it is difficult to generate gap between shielding film and printed wiring board Download PDFInfo
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- TW202009283A TW202009283A TW108114877A TW108114877A TW202009283A TW 202009283 A TW202009283 A TW 202009283A TW 108114877 A TW108114877 A TW 108114877A TW 108114877 A TW108114877 A TW 108114877A TW 202009283 A TW202009283 A TW 202009283A
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K9/00—Screening of apparatus or components against electric or magnetic fields
- H05K9/0073—Shielding materials
- H05K9/0081—Electromagnetic shielding materials, e.g. EMI, RFI shielding
- H05K9/0084—Electromagnetic shielding materials, e.g. EMI, RFI shielding comprising a single continuous metallic layer on an electrically insulating supporting structure, e.g. metal foil, film, plating coating, electro-deposition, vapour-deposition
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/0213—Electrical arrangements not otherwise provided for
- H05K1/0216—Reduction of cross-talk, noise or electromagnetic interference
- H05K1/0218—Reduction of cross-talk, noise or electromagnetic interference by printed shielding conductors, ground planes or power plane
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/28—Applying non-metallic protective coatings
- H05K3/281—Applying non-metallic protective coatings by means of a preformed insulating foil
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K9/00—Screening of apparatus or components against electric or magnetic fields
- H05K9/0073—Shielding materials
- H05K9/0081—Electromagnetic shielding materials, e.g. EMI, RFI shielding
- H05K9/0088—Electromagnetic shielding materials, e.g. EMI, RFI shielding comprising a plurality of shielding layers; combining different shielding material structure
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/07—Electric details
- H05K2201/0707—Shielding
- H05K2201/0715—Shielding provided by an outer layer of PCB
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- Physics & Mathematics (AREA)
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- Manufacturing & Machinery (AREA)
- Shielding Devices Or Components To Electric Or Magnetic Fields (AREA)
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- Structure Of Printed Boards (AREA)
Abstract
Description
發明領域 本發明是有關於附轉印膜之電磁波屏蔽膜、附轉印膜之電磁波屏蔽膜之製造方法及屏蔽印刷配線板之製造方法。Field of invention The invention relates to a manufacturing method of an electromagnetic wave shielding film with a transfer film, an electromagnetic wave shielding film with a transfer film, and a manufacturing method of a shielded printed wiring board.
背景技術 在急速發展小型化、高機能化的行動電話、視訊攝影機、筆記型電腦等電子儀器中,為了將電路裝入複雜的機構中,大多會使用撓性印刷配線板。再者,活用其優異之可撓性,還會利用在像是印刷頭之類的可動部與控制部之連接。於該等電子儀器中,必須要有電磁波屏蔽措施,於裝置內所使用之撓性印刷配線板中,亦開始使用已施加電磁波屏蔽措施的撓性印刷配線板(以下亦記載為「屏蔽印刷配線板」)。Background technique In electronic devices such as mobile phones, video cameras, and notebook computers, which are rapidly becoming smaller and more functional, flexible printed wiring boards are mostly used in order to fit circuits into complex mechanisms. In addition, using its excellent flexibility, it can also be used in the connection between the movable part such as the printing head and the control part. In these electronic instruments, electromagnetic wave shielding measures are required. In the flexible printed wiring boards used in the device, flexible printed wiring boards with electromagnetic wave shielding measures have also been used (hereinafter also referred to as "shielded printed wiring board").
舉例言之,專利文獻1中揭示有一種屏蔽印刷配線板之製造方法,其係於含印刷電路的基體膜上被覆電磁波屏蔽膜。 於專利文獻1中記載的屏蔽印刷配線板之製造方法中揭示:在被覆電磁波屏蔽膜時,於覆蓋膜(保護層)之單面設置屏蔽層及導電性接著劑層(接著劑層),且於另一面貼合可剝離之具黏著性的黏著性膜(轉印膜)而形成補強屏蔽膜(附轉印膜之電磁波屏蔽膜),並以導電性接著劑層抵接於基體膜上之方式來載置補強屏蔽膜,進行加熱、加壓使其等接著後,剝離前述黏著性膜。For example, Patent Document 1 discloses a method for manufacturing a shielded printed wiring board, which is coated with an electromagnetic wave shielding film on a base film containing a printed circuit. The method for manufacturing a shielded printed wiring board described in Patent Document 1 discloses that when covering an electromagnetic wave shielding film, a shielding layer and a conductive adhesive layer (adhesive layer) are provided on one side of a cover film (protective layer), and Attach a peelable adhesive film (transfer film) on the other side to form a reinforced shielding film (electromagnetic wave shielding film with transfer film), and contact the base film with a conductive adhesive layer Method, the reinforcing shielding film is placed, and the adhesive film is peeled off after heating, pressurizing, and the like.
先前技術文獻 專利文獻 專利文獻1:日本特開2000-269632號公報Prior technical literature Patent Literature Patent Document 1: Japanese Patent Laid-Open No. 2000-269632
發明概要 發明欲解決之課題 如上述,電磁波屏蔽膜會透過電磁波屏蔽膜的接著劑層黏貼於印刷配線板。 與接著劑層相接的印刷配線板之表面通常並非平坦而是有高低差。 接著劑層具有可塑性,因此可一定程度填埋印刷配線板表面的高低差,但卻無法完全埋住而有產生間隙之情形。 此種間隙會成為各種問題的原因。Summary of the invention Problems to be solved by invention As described above, the electromagnetic wave shielding film will stick to the printed wiring board through the adhesive layer of the electromagnetic wave shielding film. The surface of the printed wiring board that is in contact with the adhesive layer is usually not flat but has a level difference. The adhesive layer has plasticity, so it can fill the height difference of the surface of the printed wiring board to a certain extent, but it can not be completely buried and there may be gaps. Such gaps can cause various problems.
作為此種問題之一例,以下說明透過電磁波屏蔽膜來連接印刷配線板的接地電路與外部接地之情形。 印刷配線板之基本結構具有:基底膜、形成於基底膜上且含接地電路的印刷電路、及覆蓋印刷電路的覆蓋層。 為了使接地電路與外部接地電連接,在位於接地電路上的覆蓋層上有時會形成露出接地電路的孔。該露出接地電路的孔會成為印刷配線板表面的高低差。 如上述,電磁波屏蔽膜會透過電磁波屏蔽膜的接著劑層黏貼於印刷配線板。另,在此情形下,為了使接地電路與外部接地電連接,電磁波屏蔽膜的接著劑層會使用具導電性之接著劑層。 當電磁波屏蔽膜黏貼於印刷配線板時,電磁波屏蔽膜的接著劑層會變形或流動而填埋露出接地電路的孔(亦即印刷配線板表面的高低差)。 不過,若露出接地電路的孔徑小,則電磁波屏蔽膜的接著劑層無法充分填埋露出接地電路的孔,會有接地電路與電磁波屏蔽膜的接著劑層無法充分接觸之情形。在此種情形下,會產生連接電阻上升的問題。As an example of such a problem, the case where the ground circuit of the printed wiring board is connected to the external ground through the electromagnetic wave shielding film will be described below. The basic structure of the printed wiring board includes: a base film, a printed circuit formed on the base film and including a ground circuit, and a cover layer covering the printed circuit. In order to electrically connect the ground circuit to the external ground, a hole exposing the ground circuit may be formed in the cover layer on the ground circuit. The hole exposing the ground circuit will become the level difference of the surface of the printed wiring board. As described above, the electromagnetic wave shielding film will stick to the printed wiring board through the adhesive layer of the electromagnetic wave shielding film. In addition, in this case, in order to electrically connect the ground circuit to the external ground, the adhesive layer of the electromagnetic wave shielding film will make the conductive adhesive layer of the tool. When the electromagnetic wave shielding film is adhered to the printed wiring board, the adhesive layer of the electromagnetic wave shielding film deforms or flows to fill the hole exposing the ground circuit (that is, the height difference of the surface of the printed wiring board). However, if the aperture of the exposed ground circuit is small, the adhesive layer of the electromagnetic wave shielding film cannot fully fill the hole exposing the ground circuit, and there may be a case where the ground circuit and the adhesive layer of the electromagnetic wave shielding film cannot sufficiently contact. In this case, there is a problem that the connection resistance increases.
本發明是有鑑於上述問題而成,本發明之目的在提供一種附轉印膜之電磁波屏蔽膜,其於製造屏蔽印刷配線板時,可使電磁波屏蔽膜的接著劑層與印刷配線板表面之間不易產生間隙。The present invention is made in view of the above problems, and an object of the present invention is to provide an electromagnetic wave shielding film with a transfer film, which can make the adhesive layer of the electromagnetic wave shielding film and the surface of the printed wiring board when manufacturing a shielded printed wiring board There is no gap between them.
用以解決課題之手段 即,本發明附轉印膜之電磁波屏蔽膜係由轉印膜及積層於上述轉印膜的電磁波屏蔽膜構成,其特徵在於:上述電磁波屏蔽膜包含:與上述轉印膜接觸的保護層、積層於上述保護層的屏蔽層、及積層於上述屏蔽層的接著劑層;上述轉印膜之楊氏模數為2.0GPa以上。Means to solve the problem That is, the electromagnetic wave shielding film with a transfer film of the present invention is composed of a transfer film and an electromagnetic wave shielding film laminated on the transfer film, characterized in that the electromagnetic wave shielding film includes a protective layer in contact with the transfer film, The shield layer laminated on the protective layer and the adhesive layer laminated on the shield layer; the Young's modulus of the transfer film is 2.0 GPa or more.
使用本發明附轉印膜之電磁波屏蔽膜來製造屏蔽印刷配線板時,會將附轉印膜之電磁波屏蔽膜的接著劑層抵接並壓接於印刷配線板之表面。 此時,若轉印膜之楊氏模數為2.0GPa以上,則轉印膜夠硬,因此壓接壓力不易分散。 故,即便是在印刷配線板表面有高低差時,亦可牢牢地壓住電磁波屏蔽膜的接著劑層,接著劑層可充分地填埋高低差。When the electromagnetic wave shielding film with a transfer film of the present invention is used to manufacture a shielded printed wiring board, the adhesive layer of the electromagnetic wave shielding film with a transfer film is abutted and pressed against the surface of the printed wiring board. At this time, if the Young's modulus of the transfer film is 2.0 GPa or more, the transfer film is hard enough, and therefore the pressure bonding pressure is not easily dispersed. Therefore, even if there is a level difference on the surface of the printed wiring board, the adhesive layer of the electromagnetic wave shielding film can be firmly pressed, and the adhesive layer can sufficiently fill the level difference.
於本發明附轉印膜之電磁波屏蔽膜中,上述接著劑層可具有導電性。 通常於印刷配線板的印刷電路也會設置接地電路。當本發明附轉印膜之電磁波屏蔽膜的接著劑層具有導電性時,藉由以使電磁波屏蔽膜的接著劑層與接地電路接觸之方式將電磁波屏蔽膜配置於印刷配線板,而使該等電連接。再者,藉由使電磁波屏蔽膜的接著劑層與外部接地電連接,可使接地電路與外部接地電連接。 另,使電磁波屏蔽膜的接著劑層與接地電路接觸時,會在位於接地電路上的覆蓋層形成露出接地電路的孔(亦即印刷配線板表面的高低差)。 若使用本發明附轉印膜之電磁波屏蔽膜,則可使電磁波屏蔽膜的接著劑層與接地電路充分地接觸,因此,可防止電磁波屏蔽膜的接著劑層與接地電路間之連接電阻上升。In the electromagnetic wave shielding film with a transfer film of the present invention, the adhesive layer may have conductivity. Generally, the printed circuit on the printed wiring board is also provided with a ground circuit. When the adhesive layer of the electromagnetic wave shielding film with transfer film of the present invention has conductivity, the electromagnetic wave shielding film is arranged on the printed wiring board in such a manner that the adhesive layer of the electromagnetic wave shielding film is in contact with the ground circuit Isoelectric connection. Furthermore, by electrically connecting the adhesive layer of the electromagnetic wave shielding film to the external ground, the ground circuit can be electrically connected to the external ground. In addition, when the adhesive layer of the electromagnetic wave shielding film is brought into contact with the ground circuit, a hole exposing the ground circuit (that is, the height difference of the surface of the printed wiring board) is formed in the cover layer on the ground circuit. If the electromagnetic wave shielding film with a transfer film of the present invention is used, the adhesive layer of the electromagnetic wave shielding film can sufficiently contact the ground circuit, and therefore, the connection resistance between the adhesive layer of the electromagnetic wave shielding film and the ground circuit can be prevented from increasing.
於本發明附轉印膜之電磁波屏蔽膜中,上述屏蔽層可由金屬層構成。 又,於本發明附轉印膜之電磁波屏蔽膜中,上述屏蔽層可由導電性樹脂構成。 依此,於本發明附轉印膜之電磁波屏蔽膜中,只要能屏蔽電磁波,則屏蔽層之材料並無特殊限制。In the electromagnetic wave shielding film with a transfer film of the present invention, the shielding layer may be composed of a metal layer. Furthermore, in the electromagnetic wave shielding film with a transfer film of the present invention, the shielding layer may be made of conductive resin. Accordingly, in the electromagnetic wave shielding film with a transfer film of the present invention, as long as it can shield electromagnetic waves, the material of the shielding layer is not particularly limited.
另一本發明附轉印膜之電磁波屏蔽膜係由轉印膜及積層於上述轉印膜的電磁波屏蔽膜構成,其特徵在於:上述電磁波屏蔽膜包含:與上述轉印膜接觸的保護層、及積層於上述保護層且具導電性的接著劑層;上述轉印膜之楊氏模數為2.0GPa以上。Another electromagnetic wave shielding film with a transfer film of the present invention is composed of a transfer film and an electromagnetic wave shielding film laminated on the transfer film, characterized in that the electromagnetic wave shielding film includes a protective layer in contact with the transfer film, And a conductive adhesive layer deposited on the protective layer; the Young's modulus of the transfer film is 2.0 GPa or more.
於本發明附轉印膜之電磁波屏蔽膜中,轉印膜之楊氏模數為2.0GPa以上。即,轉印膜夠硬。故,在將電磁波屏蔽膜壓接於印刷配線板時,壓力不易分散。 故,即便是在印刷配線板表面有高低差時,亦可牢牢地壓住電磁波屏蔽膜的接著劑層,接著劑層可充分地填埋高低差。 另,於本發明附轉印膜之電磁波屏蔽膜中,具導電性之接著劑層具有電磁波屏蔽機能以及與印刷配線板之接著機能兩者。In the electromagnetic wave shielding film with a transfer film of the present invention, the Young's modulus of the transfer film is 2.0 GPa or more. That is, the transfer film is hard enough. Therefore, when the electromagnetic wave shielding film is crimped to the printed wiring board, the pressure is not easily dispersed. Therefore, even if there is a level difference on the surface of the printed wiring board, the adhesive layer of the electromagnetic wave shielding film can be firmly pressed, and the adhesive layer can sufficiently fill the level difference. In addition, in the electromagnetic wave shielding film with a transfer film of the present invention, the conductive adhesive layer has both the electromagnetic wave shielding function and the bonding function with the printed wiring board.
又,使電磁波屏蔽膜的接著劑層與接地電路接觸時,會在位於接地電路上的覆蓋層形成露出接地電路的孔(亦即印刷配線板表面的高低差)。 若使用本發明附轉印膜之電磁波屏蔽膜,則可使電磁波屏蔽膜的接著劑層與接地電路充分地接觸,因此,可防止電磁波屏蔽膜的接著劑層與接地電路間之連接電阻上升。In addition, when the adhesive layer of the electromagnetic wave shielding film is brought into contact with the ground circuit, a hole exposing the ground circuit (that is, the height difference of the surface of the printed wiring board) is formed in the cover layer on the ground circuit. If the electromagnetic wave shielding film with a transfer film of the present invention is used, the adhesive layer of the electromagnetic wave shielding film can sufficiently contact the ground circuit, and therefore, the connection resistance between the adhesive layer of the electromagnetic wave shielding film and the ground circuit can be prevented from increasing.
本發明附轉印膜之電磁波屏蔽膜之製造方法特徵在於包含以下步驟:轉印膜準備步驟,準備楊氏模數為2.0GPa以上的轉印膜;及電磁波屏蔽膜形成步驟,於上述轉印膜上依序積層保護層、屏蔽層及接著劑層而形成電磁波屏蔽膜。 又,另一本發明附轉印膜之電磁波屏蔽膜之製造方法特徵在於包含以下步驟:轉印膜準備步驟,準備楊氏模數為2.0GPa以上的轉印膜;及電磁波屏蔽膜形成步驟,於上述轉印膜上依序積層保護層、由導電性樹脂構成且具電磁波屏蔽機能的接著劑層而形成電磁波屏蔽膜。 利用此種方法,可製造上述本發明附轉印膜之電磁波屏蔽膜。The method for manufacturing an electromagnetic wave shielding film with a transfer film of the present invention is characterized by including the following steps: a transfer film preparation step, preparing a transfer film with a Young's modulus of 2.0 GPa or more; and an electromagnetic wave shielding film forming step, in which the above transfer An electromagnetic wave shielding film is formed by sequentially laminating a protective layer, a shielding layer, and an adhesive layer on the film. In addition, another method for manufacturing an electromagnetic wave shielding film with a transfer film of the present invention includes the following steps: a transfer film preparation step, preparing a transfer film having a Young's modulus of 2.0 GPa or more; and an electromagnetic wave shielding film forming step, An electromagnetic wave shielding film is formed by sequentially depositing a protective layer and an adhesive layer made of conductive resin and having an electromagnetic wave shielding function on the transfer film. By this method, the electromagnetic wave shielding film with the transfer film of the present invention described above can be manufactured.
本發明之屏蔽印刷配線板之製造方法特徵在於包含以下步驟: 印刷配線板準備步驟,準備印刷配線板,該印刷配線板包含:基底膜、形成於上述基底膜上且含接地電路的印刷電路、及覆蓋上述印刷電路的覆蓋層; 附轉印膜之電磁波屏蔽膜準備步驟,準備上述本發明附轉印膜之電磁波屏蔽膜; 壓接步驟,將上述附轉印膜之電磁波屏蔽膜的接著劑層配置成與上述印刷配線板的上述覆蓋層接觸,並將上述附轉印膜之電磁波屏蔽膜壓接於上述印刷配線板;及 剝離步驟,自上述附轉印膜之電磁波屏蔽膜剝離轉印膜; 又,與上述接著劑層接觸的上述覆蓋層之表面有高低差。The manufacturing method of the shielded printed wiring board of the present invention is characterized by comprising the following steps: A printed wiring board preparation step to prepare a printed wiring board including: a base film, a printed circuit formed on the base film and including a ground circuit, and a cover layer covering the printed circuit; The preparation step of the electromagnetic wave shielding film with a transfer film prepares the electromagnetic wave shielding film with a transfer film of the present invention; In the pressure bonding step, the adhesive layer of the electromagnetic wave shielding film with the transfer film is arranged in contact with the cover layer of the printed wiring board, and the electromagnetic wave shielding film with the transfer film is pressure bonded to the printed wiring board; and Peeling step, peeling the transfer film from the electromagnetic wave shielding film with the transfer film; In addition, the surface of the cover layer in contact with the adhesive layer has a step difference.
如上述,本發明附轉印膜之電磁波屏蔽膜之楊氏模數為2.0GPa以上且夠硬。 故,即便是在印刷配線板的覆蓋層表面有高低差時,亦可牢牢地壓住電磁波屏蔽膜的接著劑層,接著劑層可充分地填埋高低差。As described above, the electromagnetic wave shielding film with transfer film of the present invention has a Young's modulus of 2.0 GPa or more and is sufficiently hard. Therefore, even when there is a level difference on the surface of the cover layer of the printed wiring board, the adhesive layer of the electromagnetic wave shielding film can be firmly pressed, and the adhesive layer can sufficiently fill the level difference.
於本發明之屏蔽印刷配線板之製造方法中,上述高低差宜為露出上述接地電路的孔,且上述接著劑層宜具有導電性。 如上述,本發明之屏蔽印刷配線板之製造方法中接著劑層可充分地填埋高低差。 尤其是當高低差為露出接地電路的孔且接著劑層具有導電性時,可使接著劑層充分地與接地電路接觸。 故,可抑制連接電阻上升。In the method for manufacturing a shielded printed wiring board of the present invention, the height difference is preferably a hole exposing the ground circuit, and the adhesive layer is preferably electrically conductive. As described above, in the method for manufacturing a shielded printed wiring board of the present invention, the adhesive layer can sufficiently fill the height difference. Especially when the height difference is a hole exposing the ground circuit and the adhesive layer has conductivity, the adhesive layer can be sufficiently brought into contact with the ground circuit. Therefore, the increase in connection resistance can be suppressed.
用以實施發明之形態 以下,具體說明本發明附轉印膜之電磁波屏蔽膜。然而,本發明並不限於以下實施形態,在未變更本發明要旨的範圍內,可適當地變更而應用。Forms for carrying out the invention Hereinafter, the electromagnetic wave shielding film with a transfer film of the present invention will be specifically described. However, the present invention is not limited to the following embodiments, and can be appropriately changed and applied within the scope of not changing the gist of the present invention.
(第1實施形態) 利用圖式,詳述本發明第1實施形態之附轉印膜之電磁波屏蔽膜。 圖1為截面圖,其示意顯示本發明第1實施形態之附轉印膜之電磁波屏蔽膜之一例。(First embodiment) Using the drawings, the electromagnetic wave shielding film with a transfer film according to the first embodiment of the present invention will be described in detail. 1 is a cross-sectional view schematically showing an example of an electromagnetic wave shielding film with a transfer film according to the first embodiment of the present invention.
如圖1所示,附轉印膜之電磁波屏蔽膜10由轉印膜20及積層於轉印膜20的電磁波屏蔽膜30構成。
又,電磁波屏蔽膜30包含:與轉印膜20接觸的保護層31、積層於保護層31的屏蔽層32、及積層於屏蔽層32的接著劑層33。As shown in FIG. 1, the electromagnetic
又,轉印膜20之楊氏模數為2.0GPa以上。
另,轉印膜20之楊氏模數之下限宜為2.5GPa,且以2.7更佳。
又,轉印膜20之楊氏模數之上限宜為5.0GPa,且以4.5更佳。
若轉印膜之楊氏模數大於5.0GPa,在將附轉印膜之電磁波屏蔽膜黏貼於印刷配線板時,高低差附隨性容易降低。In addition, the Young's modulus of the
附轉印膜之電磁波屏蔽膜10係黏貼於印刷配線板用來製造屏蔽印刷配線板。
使用附轉印膜之電磁波屏蔽膜10來製造屏蔽印刷配線板時,會將附轉印膜之電磁波屏蔽膜10的接著劑層33抵接並壓接於印刷配線板之表面。
此時,若轉印膜20之楊氏模數為2.0GPa以上,則由於轉印膜20夠硬,因此壓接壓力不易分散。
故,即便是在印刷配線板表面有高低差時,亦可牢牢地壓住電磁波屏蔽膜30的接著劑層33,接著劑層33可充分地填埋高低差。The electromagnetic
其次,說明形成附轉印膜之電磁波屏蔽膜10的各層之構造。Next, the structure of each layer forming the electromagnetic
(轉印膜) 轉印膜之材料只要是轉印膜之楊氏模數可成為2.0GPa以上,則無特殊限制,例如可列舉:聚對苯二甲酸乙二酯、聚萘二甲酸乙二酯、聚氟乙烯、聚二氟亞乙烯、硬質聚氯乙烯、聚二氯亞乙烯、耐綸、聚醯亞胺、聚苯乙烯、聚乙烯醇、乙烯-乙烯醇共聚物、聚碳酸酯、聚丙烯腈、聚丁烯、軟質聚氯乙烯、聚二氟亞乙烯、聚乙烯、聚丙烯、聚胺甲酸乙酯、乙烯醋酸乙烯酯共聚物、聚醋酸乙烯酯等塑膠片等、玻璃紙、道林紙、牛皮紙、塗料紙等紙類、各種不織布、合成紙、金屬層或組合有該等的複合膜等。 又,轉印膜亦可為熱硬化性樹脂或熱塑性樹脂,惟以熱塑性樹脂為佳。若為熱塑性樹脂,則附轉印膜之電磁波屏蔽膜容易附隨於印刷配線板的高低差。 轉印膜亦可為單面或雙面經脫模處理的膜,脫模處理方法可舉如:將脫模劑塗佈於膜之單面或雙面,或是以物理方式進行消光處理的方法。(Transfer film) The material of the transfer film is not particularly limited as long as the Young's modulus of the transfer film can be 2.0 GPa or more, and examples include polyethylene terephthalate, polyethylene naphthalate, and polyvinyl fluoride , Polydifluoroethylene, Rigid Polyvinyl Chloride, Polyvinylidene Chloride, Nylon, Polyimide, Polystyrene, Polyvinyl Alcohol, Ethylene-Vinyl Alcohol Copolymer, Polycarbonate, Polyacrylonitrile, Polyethylene Butene, soft polyvinyl chloride, polydifluoroethylene, polyethylene, polypropylene, polyurethane, ethylene vinyl acetate copolymer, polyvinyl acetate and other plastic sheets, cellophane, Dowling paper, kraft paper, Papers such as coated paper, various non-woven fabrics, synthetic paper, metal layers, or composite films incorporating these. In addition, the transfer film may also be thermosetting resin or thermoplastic resin, but thermoplastic resin is preferred. If it is a thermoplastic resin, the electromagnetic wave shielding film with a transfer film easily attaches to the height difference of the printed wiring board. The transfer film can also be a single-sided or double-sided film that has been subjected to a release treatment. The release treatment method can be exemplified by applying a release agent to one or both sides of the film, or performing a matting treatment in a physical manner method.
又,當轉印膜由塑膠片構成時,為了調整楊氏模數,亦可含有氧化鈦或二氧化矽等無機粒子,或是具有核殼結構之有機物粒子等。In addition, when the transfer film is made of a plastic sheet, in order to adjust the Young's modulus, it may contain inorganic particles such as titanium oxide or silicon dioxide, or organic particles having a core-shell structure.
轉印膜之厚度宜為10~150μm,且以20~100μm更佳,尤其宜為40~60μm。 若轉印膜之厚度小於10μm,則於製造屏蔽印刷配線板時,轉印膜會破裂而不易自電磁波屏蔽膜剝離。 若轉印膜之厚度大於150μm,則不易進行處理。The thickness of the transfer film is preferably 10 to 150 μm, and more preferably 20 to 100 μm, and particularly preferably 40 to 60 μm. If the thickness of the transfer film is less than 10 μm, the transfer film may break when the shielded printed wiring board is manufactured, and it is not easy to peel off from the electromagnetic wave shielding film. If the thickness of the transfer film is greater than 150 μm, it is not easy to handle.
於轉印膜與保護層間亦可設有轉印膜用黏著劑層。在此情形下,轉印膜會形成由轉印膜用黏著劑層貼合的狀態。轉印膜必須在使用電磁波屏蔽膜時能輕易地自電磁波屏蔽膜剝離,轉印膜用黏著劑層宜作成在剝離轉印膜時殘留於轉印膜側。An adhesive layer for transfer film may also be provided between the transfer film and the protective layer. In this case, the transfer film will be in a state where it is bonded by the adhesive layer for the transfer film. The transfer film must be easily peelable from the electromagnetic wave shielding film when the electromagnetic wave shielding film is used. The adhesive layer for the transfer film should be made to remain on the transfer film side when the transfer film is peeled off.
(保護層) 保護層只要是具有絕緣性且可保護接著劑層及屏蔽層,則無特殊限制,例如宜由熱塑性樹脂組成物、熱硬化性樹脂組成物、活性能量線硬化性組成物等構成。(The protective layer) The protective layer is not particularly limited as long as it is insulating and can protect the adhesive layer and the shielding layer. For example, it is preferably composed of a thermoplastic resin composition, a thermosetting resin composition, an active energy ray-curable composition, or the like.
上述熱塑性樹脂組成物並無特殊限制,可舉例如:苯乙烯系樹脂組成物、醋酸乙烯酯系樹脂組成物、聚酯系樹脂組成物、聚乙烯系樹脂組成物、聚丙烯系樹脂組成物、醯亞胺系樹脂組成物、丙烯酸系樹脂組成物等。The thermoplastic resin composition is not particularly limited, and examples thereof include styrene-based resin compositions, vinyl acetate-based resin compositions, polyester-based resin compositions, polyethylene-based resin compositions, and polypropylene-based resin compositions. Acetylene imide resin composition, acrylic resin composition, etc.
上述熱硬化性樹脂組成物並無特殊限制,可舉例如:選自於由環氧系樹脂組成物、胺甲酸乙酯系樹脂組成物、胺甲酸乙酯脲系樹脂組成物、苯乙烯系樹脂組成物、酚系樹脂組成物、三聚氰胺系樹脂組成物、丙烯酸系樹脂組成物及醇酸系樹脂組成物所構成群組中之至少1種樹脂組成物。The above-mentioned thermosetting resin composition is not particularly limited, and examples thereof include epoxy resin-based resin compositions, urethane-based resin compositions, urethane-urea-based resin compositions, and styrene-based resins. At least one resin composition in the group consisting of a composition, a phenol resin composition, a melamine resin composition, an acrylic resin composition, and an alkyd resin composition.
上述活性能量線硬化性組成物並無特殊限制,可舉例如:分子中具有至少2個(甲基)丙烯醯氧基的聚合性化合物等。The active energy ray-curable composition is not particularly limited, and examples thereof include a polymerizable compound having at least two (meth)acryloyloxy groups in the molecule.
保護層可由單獨1種材料構成,亦可由2種以上材料構成。The protective layer may be composed of a single material or two or more materials.
於保護層中,視需要亦可含有硬化促進劑、賦黏劑、抗氧化劑、顏料、染料、塑化劑、紫外線吸收劑、消泡劑、調平劑、填充劑、阻燃劑、黏度調節劑、抗結塊劑等。In the protective layer, it can also contain hardening accelerators, tackifiers, antioxidants, pigments, dyes, plasticizers, UV absorbers, defoamers, leveling agents, fillers, flame retardants, viscosity adjustment Agents, anti-caking agents, etc.
保護層之厚度並無特殊限制,可視需要適當地設定,宜為1~15μm,且以3~10μm更佳。 若保護層之厚度小於1μm,會因為過薄而不易充分保護接著劑層及屏蔽層。 若保護層之厚度大於15μm,會因為過厚以致電磁波屏蔽膜不易彎折,且保護層本身容易破損。故,不易應用在要求耐彎折性的構件中。The thickness of the protective layer is not particularly limited, and can be set appropriately according to the needs, preferably 1~15μm, and more preferably 3~10μm. If the thickness of the protective layer is less than 1 μm, it will not be easy to fully protect the adhesive layer and the shielding layer because it is too thin. If the thickness of the protective layer is greater than 15 μm, the electromagnetic wave shielding film may not be easily bent due to the excessive thickness, and the protective layer itself may be easily damaged. Therefore, it is not easy to apply to members requiring bending resistance.
於保護層與屏蔽層間亦可形成有錨固塗佈層。 錨固塗佈層之材料可舉例如:胺甲酸乙酯樹脂、丙烯酸樹脂、以胺甲酸乙酯樹脂為殼且以丙烯酸樹脂為核的核-殼型複合樹脂、環氧樹脂、醯亞胺樹脂、醯胺樹脂、三聚氰胺樹脂、酚樹脂、脲甲醛樹脂、使苯酚等封端劑與聚異氰酸酯反應而得的封端異氰酸酯、聚乙烯醇、聚乙烯氫吡咯酮等。An anchor coating layer can also be formed between the protective layer and the shielding layer. Examples of the material of the anchor coating layer include urethane resin, acrylic resin, core-shell composite resin with urethane resin as the shell and acrylic resin as the core, epoxy resin, amide imide resin, Acrylate resin, melamine resin, phenol resin, urea-formaldehyde resin, blocked isocyanate, polyvinyl alcohol, polyvinylpyrrolidone, etc. obtained by reacting a blocking agent such as phenol with polyisocyanate.
(屏蔽層)
圖1之附轉印膜之電磁波屏蔽膜10中,屏蔽層32可由金屬層構成,亦可由導電性樹脂構成。
就附轉印膜之電磁波屏蔽膜10而言,只要能屏蔽電磁波,則屏蔽層之材料並無特殊限制。(Shield)
In the electromagnetic
當屏蔽層由金屬層構成時,金屬層可包含由金、銀、銅、鋁、鎳、錫、鈀、鉻、鈦、鋅等材料構成的層體,理想的是包含銅層。 從導電性及經濟性觀點來看,銅對於屏蔽層而言屬於適當之材料。When the shielding layer is composed of a metal layer, the metal layer may include a layer body composed of materials such as gold, silver, copper, aluminum, nickel, tin, palladium, chromium, titanium, and zinc, and it is desirable to include a copper layer. From the viewpoint of conductivity and economy, copper is an appropriate material for the shield layer.
另,屏蔽層亦可包含由上述金屬之合金構成的層體。 又,屏蔽層亦可使用金屬箔,亦可為利用濺鍍、無電鍍敷或電鍍等方法形成的金屬膜。In addition, the shielding layer may include a layered body made of an alloy of the above metals. In addition, the shielding layer may use metal foil, or may be a metal film formed by sputtering, electroless plating, electroplating, or the like.
當屏蔽層由導電性樹脂構成時,屏蔽層可由導電性粒子與樹脂構成。When the shield layer is composed of conductive resin, the shield layer may be composed of conductive particles and resin.
導電性粒子並無特殊限制,可為金屬微粒子、碳奈米管、碳纖維、金屬纖維等。The conductive particles are not particularly limited, and may be metal fine particles, carbon nanotubes, carbon fibers, metal fibers, and the like.
當導電性粒子為金屬微粒子時,金屬微粒子並無特殊限制,可為銀粉、銅粉、鎳粉、焊粉、鋁粉、對銅粉施以鍍銀的銀包銅粉、以金屬被覆高分子微粒子或玻璃珠等的微粒子等。 於該等之中,從經濟性觀點來看,宜為可便宜取得的銅粉或銀包銅粉。When the conductive particles are metal fine particles, the metal fine particles are not particularly limited, and can be silver powder, copper powder, nickel powder, solder powder, aluminum powder, silver-coated copper powder coated with silver on copper powder, and metal coated polymer Fine particles such as fine particles or glass beads. Among these, from the economic point of view, it is preferable to be copper powder or silver-coated copper powder that can be obtained cheaply.
導電性粒子之平均粒徑並無特殊限制,宜為0.5~15.0μm。若導電性粒子之平均粒徑為0.5μm以上,則導電性樹脂之導電性會變得良好。若導電性粒子之平均粒徑為15.0μm以下,則可使導電性樹脂薄化。The average particle size of the conductive particles is not particularly limited, and it is preferably 0.5 to 15.0 μm. If the average particle diameter of the conductive particles is 0.5 μm or more, the conductivity of the conductive resin becomes good. If the average particle diameter of the conductive particles is 15.0 μm or less, the conductive resin can be thinned.
導電性粒子之形狀並無特殊限制,可自球狀、扁平狀、鱗片狀、枝晶狀、棒狀、纖維狀等適當選擇。The shape of the conductive particles is not particularly limited, and can be appropriately selected from spherical, flat, scaly, dendritic, rod-shaped, and fibrous.
導電性粒子之摻合量並無特殊限制,宜為15~80質量%,且以15~60質量%更佳。The amount of conductive particles blended is not particularly limited, but it is preferably 15 to 80% by mass, and more preferably 15 to 60% by mass.
樹脂並無特殊限制,可舉例如:苯乙烯系樹脂組成物、醋酸乙烯酯系樹脂組成物、聚酯系樹脂組成物、聚乙烯系樹脂組成物、聚丙烯系樹脂組成物、醯亞胺系樹脂組成物、醯胺系樹脂組成物、丙烯酸系樹脂組成物等熱塑性樹脂組成物;及酚系樹脂組成物、環氧系樹脂組成物、胺甲酸乙酯系樹脂組成物、三聚氰胺系樹脂組成物、醇酸系樹脂組成物等熱硬化性樹脂組成物等。The resin is not particularly limited, and examples thereof include: styrene-based resin composition, vinyl acetate-based resin composition, polyester-based resin composition, polyethylene-based resin composition, polypropylene-based resin composition, and amide-imide system Thermoplastic resin compositions such as resin compositions, amide-based resin compositions, acrylic-based resin compositions; and phenol-based resin compositions, epoxy-based resin compositions, urethane-based resin compositions, melamine-based resin compositions , Alkyd resin composition and other thermosetting resin composition.
(接著劑層) 接著劑層可由熱硬化性樹脂構成,亦可由熱塑性樹脂構成。(Adhesive layer) The adhesive layer may be composed of a thermosetting resin or a thermoplastic resin.
熱硬化性樹脂例如可列舉:酚系樹脂、環氧系樹脂、胺甲酸乙酯系樹脂、三聚氰胺系樹脂、聚醯胺系樹脂及醇酸系樹脂等。 又,熱塑性樹脂例如可列舉:苯乙烯系樹脂、醋酸乙烯酯系樹脂、聚酯系樹脂、聚乙烯系樹脂、聚丙烯系樹脂、醯亞胺系樹脂及丙烯酸系樹脂。 又,環氧系樹脂更宜為醯胺改質環氧樹脂。 該等樹脂適合作為構成接著劑層的樹脂。Examples of thermosetting resins include phenol resins, epoxy resins, urethane resins, melamine resins, polyamide resins, and alkyd resins. Examples of the thermoplastic resin include styrene-based resin, vinyl acetate-based resin, polyester-based resin, polyethylene-based resin, polypropylene-based resin, amide-imide-based resin, and acrylic-based resin. In addition, the epoxy resin is more preferably modified amide epoxy resin. Such resins are suitable as the resin constituting the adhesive layer.
接著劑層之厚度並無特殊限制,宜為1~50μm,且以3~30μm更佳。 若接著劑層之厚度小於1μm,則構成接著劑層的樹脂量少,因此不易獲得充分之接著性能。並且,會變得容易破損。 若接著劑層之厚度大於50μm,則全體會變厚,容易失去柔軟性。The thickness of the adhesive layer is not particularly limited, preferably 1-50 μm, and more preferably 3-30 μm. If the thickness of the adhesive layer is less than 1 μm, the amount of resin constituting the adhesive layer is small, so it is difficult to obtain sufficient adhesive performance. Also, it will easily break. If the thickness of the adhesive layer is greater than 50 μm, the entire body becomes thicker, and the flexibility is easily lost.
接著劑層亦可具有導電性。 通常於印刷配線板的印刷電路也會設置接地電路。當本發明附轉印膜之電磁波屏蔽膜的接著劑層具有導電性時,藉由以使電磁波屏蔽膜的接著劑層與接地電路接觸之方式將電磁波屏蔽膜配置於印刷配線板,而使該等電連接。再者,藉由使電磁波屏蔽膜的接著劑層與外部接地電連接,可使接地電路與外部接地電連接。 另,使電磁波屏蔽膜的接著劑層與接地電路接觸時,會在位於接地電路上的覆蓋層形成露出接地電路的孔(亦即印刷配線板表面的高低差)。 若使用本發明附轉印膜之電磁波屏蔽膜,則可使電磁波屏蔽膜的接著劑層與接地電路充分地接觸,因此,可防止電磁波屏蔽膜的接著劑層與接地電路間之連接電阻上升。The adhesive layer may also have conductivity. Generally, the printed circuit on the printed wiring board is also provided with a ground circuit. When the adhesive layer of the electromagnetic wave shielding film with transfer film of the present invention has conductivity, the electromagnetic wave shielding film is arranged on the printed wiring board in such a manner that the adhesive layer of the electromagnetic wave shielding film is in contact with the ground circuit Isoelectric connection. Furthermore, by electrically connecting the adhesive layer of the electromagnetic wave shielding film to the external ground, the ground circuit can be electrically connected to the external ground. In addition, when the adhesive layer of the electromagnetic wave shielding film is brought into contact with the ground circuit, a hole exposing the ground circuit (that is, the height difference of the surface of the printed wiring board) is formed in the cover layer on the ground circuit. If the electromagnetic wave shielding film with a transfer film of the present invention is used, the adhesive layer of the electromagnetic wave shielding film can sufficiently contact the ground circuit, and therefore, the connection resistance between the adhesive layer of the electromagnetic wave shielding film and the ground circuit can be prevented from increasing.
當接著劑層具有導電性時,接著劑層可由導電性粒子與樹脂構成。When the adhesive layer has conductivity, the adhesive layer may be composed of conductive particles and resin.
導電性粒子並無特殊限制,可為金屬微粒子、碳奈米管、碳纖維、金屬纖維等。The conductive particles are not particularly limited, and may be metal fine particles, carbon nanotubes, carbon fibers, metal fibers, and the like.
當導電性粒子為金屬微粒子時,金屬微粒子並無特殊限制,可為銀粉、銅粉、鎳粉、焊粉、鋁粉、對銅粉施以鍍銀的銀包銅粉、以金屬被覆高分子微粒子或玻璃珠等的微粒子等。 於該等之中,從經濟性觀點來看,宜為可便宜取得的銅粉或銀包銅粉。When the conductive particles are metal fine particles, the metal fine particles are not particularly limited, and can be silver powder, copper powder, nickel powder, solder powder, aluminum powder, silver-coated copper powder coated with silver on copper powder, and metal coated polymer Fine particles such as fine particles or glass beads. Among these, from the economic point of view, it is preferable to be copper powder or silver-coated copper powder that can be obtained cheaply.
導電性粒子之平均粒徑並無特殊限制,宜為0.5~15.0μm。若導電性粒子之平均粒徑為0.5μm以上,則導電性接著劑層之導電性會變得良好。若導電性粒子之平均粒徑為15.0μm以下,則可使導電性接著劑層薄化。The average particle size of the conductive particles is not particularly limited, and it is preferably 0.5 to 15.0 μm. If the average particle diameter of the conductive particles is 0.5 μm or more, the conductivity of the conductive adhesive layer becomes good. If the average particle diameter of the conductive particles is 15.0 μm or less, the conductive adhesive layer can be thinned.
導電性粒子之形狀並無特殊限制,可自球狀、扁平狀、鱗片狀、枝晶狀、棒狀、纖維狀等適當選擇。The shape of the conductive particles is not particularly limited, and can be appropriately selected from spherical, flat, scaly, dendritic, rod-shaped, and fibrous.
導電性粒子之摻合量並無特殊限制,宜為15~80質量%,且以15~60質量%更佳。The amount of conductive particles blended is not particularly limited, but it is preferably 15 to 80% by mass, and more preferably 15 to 60% by mass.
樹脂並無特殊限制,可舉例如:苯乙烯系樹脂組成物、醋酸乙烯酯系樹脂組成物、聚酯系樹脂組成物、聚乙烯系樹脂組成物、聚丙烯系樹脂組成物、醯亞胺系樹脂組成物、醯胺系樹脂組成物、丙烯酸系樹脂組成物等熱塑性樹脂組成物;及酚系樹脂組成物、環氧系樹脂組成物、胺甲酸乙酯系樹脂組成物、三聚氰胺系樹脂組成物、醇酸系樹脂組成物等熱硬化性樹脂組成物等。The resin is not particularly limited, and examples thereof include: styrene-based resin composition, vinyl acetate-based resin composition, polyester-based resin composition, polyethylene-based resin composition, polypropylene-based resin composition, and amide-imide system Thermoplastic resin compositions such as resin compositions, amide-based resin compositions, acrylic-based resin compositions; and phenol-based resin compositions, epoxy-based resin compositions, urethane-based resin compositions, melamine-based resin compositions , Alkyd resin composition and other thermosetting resin composition.
又,當接著劑層具有導電性時,宜具有各向異性導電性。 若接著劑層具有各向異性導電性,則相較於具有各向同性導電性時,會更加提升利用印刷配線板之印刷電路傳輸的高頻信號傳輸特性。In addition, when the adhesive layer has conductivity, it is preferable to have anisotropic conductivity. If the adhesive layer has anisotropic conductivity, the transmission characteristics of the high-frequency signal transmitted by the printed circuit of the printed wiring board will be more improved than when the adhesive layer has the isotropic conductivity.
其次,說明本發明第1實施形態之附轉印膜之電磁波屏蔽膜之製造方法。 本發明附轉印膜之電磁波屏蔽膜之製造方法包含:(1)轉印膜準備步驟;及(2)電磁波屏蔽膜形成步驟。Next, a method of manufacturing the electromagnetic wave shielding film with transfer film according to the first embodiment of the present invention will be described. The method for manufacturing an electromagnetic wave shielding film with a transfer film of the present invention includes: (1) a transfer film preparation step; and (2) an electromagnetic wave shielding film forming step.
(1)轉印膜準備步驟 於本步驟中,準備楊氏模數為2.0GPa以上的轉印膜。 轉印膜之材料等既已說明,故而省略此處的說明。(1) Transfer film preparation steps In this step, a transfer film having a Young's modulus of 2.0 GPa or more is prepared. The material and the like of the transfer film have already been described, so the description here is omitted.
(2)電磁波屏蔽膜形成步驟 其次,於轉印膜上依序積層保護層、屏蔽層及接著劑層而形成電磁波屏蔽膜。 將該等積層的方法可使用與以往製造電磁波屏蔽膜之方法相同的方法。 舉例言之,可於轉印膜上形成保護層及屏蔽層,且於另外的剝離膜上形成接著劑層,藉由將該等貼合,製作出附轉印膜之電磁波屏蔽膜。 另,保護層、屏蔽層及接著劑層之材料等既已說明,故而省略此處的說明。(2) Electromagnetic wave shielding film forming steps Next, a protective layer, a shielding layer, and an adhesive layer are sequentially deposited on the transfer film to form an electromagnetic wave shielding film. The method of stacking these layers can be the same as the conventional method of manufacturing an electromagnetic wave shielding film. For example, a protective layer and a shielding layer can be formed on the transfer film, and an adhesive layer can be formed on another release film. By bonding these, an electromagnetic wave shielding film with a transfer film is produced. In addition, the materials of the protective layer, the shielding layer, and the adhesive layer have already been described, so the description here is omitted.
利用以上步驟,可製造本發明第1實施形態之附轉印膜之電磁波屏蔽膜。Through the above steps, the electromagnetic wave shielding film with a transfer film according to the first embodiment of the present invention can be manufactured.
其次,說明使用本發明第1實施形態之附轉印膜之電磁波屏蔽膜的屏蔽印刷配線板之製造方法。 本發明第1實施形態之屏蔽印刷配線板之製造方法包含:(1)印刷配線板準備步驟;(2)附轉印膜之電磁波屏蔽膜準備步驟;(3)壓接步驟;及(4)剝離步驟。Next, a method of manufacturing a shielded printed wiring board using the electromagnetic wave shielding film with a transfer film according to the first embodiment of the present invention will be described. The manufacturing method of a shielded printed wiring board according to the first embodiment of the present invention includes: (1) a preparation step of a printed wiring board; (2) a preparation step of an electromagnetic wave shielding film with a transfer film; (3) a crimping step; and (4) Stripping step.
以下,利用圖式,詳述該等各步驟。 圖2為步驟圖,其示意顯示本發明第1實施形態之屏蔽印刷配線板之製造方法中印刷配線板準備步驟之一例。 圖3為步驟圖,其示意顯示本發明第1實施形態之屏蔽印刷配線板之製造方法中附轉印膜之電磁波屏蔽膜準備步驟之一例。 圖4為步驟圖,其示意顯示本發明第1實施形態之屏蔽印刷配線板之製造方法中壓接步驟之一例。 圖5為步驟圖,其示意顯示本發明第1實施形態之屏蔽印刷配線板之製造方法中剝離步驟之一例。Hereinafter, these steps will be described in detail using drawings. FIG. 2 is a step diagram schematically showing an example of a preparation step of a printed wiring board in the method for manufacturing a shielded printed wiring board according to the first embodiment of the present invention. 3 is a step diagram schematically showing an example of a preparation step of an electromagnetic wave shielding film with a transfer film in the method for manufacturing a shielded printed wiring board according to the first embodiment of the present invention. Fig. 4 is a step diagram schematically showing an example of the pressure bonding step in the method for manufacturing a shielded printed wiring board according to the first embodiment of the present invention. 5 is a step diagram schematically showing an example of a peeling step in the method for manufacturing a shielded printed wiring board according to the first embodiment of the present invention.
(1)印刷配線板準備步驟
首先,如圖2所示,準備印刷配線板50,該印刷配線板50包含:基底膜51、形成於基底膜51上且含接地電路52a的印刷電路52、及覆蓋印刷電路52的覆蓋層53。
於印刷配線板50中,在覆蓋層53上形成有露出接地電路52a的孔54,孔54會形成高低差。(1) Printed wiring board preparation steps
First, as shown in FIG. 2, a printed
基底膜51、印刷電路52及覆蓋層53可與習知印刷配線板中所使用者相同。The
(2)附轉印膜之電磁波屏蔽膜準備步驟
其次,如圖3所示,準備上述本發明第1實施形態之附轉印膜之電磁波屏蔽膜10。
附轉印膜之電磁波屏蔽膜10由轉印膜20及積層於轉印膜20的電磁波屏蔽膜30構成。
又,電磁波屏蔽膜30包含:與轉印膜20接觸的保護層31、積層於保護層31的屏蔽層32、及積層於屏蔽層32的接著劑層33。
又,接著劑層33具有導電性。(2) Preparation steps of electromagnetic wave shielding film with transfer film
Next, as shown in FIG. 3, the electromagnetic
(3)壓接步驟
其次,如圖4所示,將附轉印膜之電磁波屏蔽膜10的接著劑層33配置成與印刷配線板50的覆蓋層53接觸,並將附轉印膜之電磁波屏蔽膜10壓接於印刷配線板50。(3) Crimping steps
Next, as shown in FIG. 4, the
此時,由於接著劑層33具有可撓性,因此會填埋孔54。
轉印膜20之楊氏模數為2.0GPa以上,因此,在將電磁波屏蔽膜30壓接於印刷配線板50時,壓力不易分散。
如此一來,便可牢牢地壓住電磁波屏蔽膜30的接著劑層33,接著劑層33可充分地填埋孔54。
於是,接著劑層33與接地電路52a可充分地接觸。At this time, since the
又,接著劑層33具有導電性,因此,接地電路52a與接著劑層33可形成電連接。
如上述,接著劑層33與接地電路52a充分地接觸,因此,可形成低連接電阻狀態。Moreover, since the
又,於製造屏蔽印刷配線板後,藉由使電磁波屏蔽膜的接著劑層與外部接地電連接,可使接地電路與外部接地電連接。In addition, after manufacturing the shielded printed wiring board, by electrically connecting the adhesive layer of the electromagnetic wave shielding film to the external ground, the ground circuit can be electrically connected to the external ground.
本步驟中壓接時的條件並無特殊限制,例如宜為壓力:1.0~5.0MPa、溫度:140~190℃、時間:15~90分鐘之條件。There are no special restrictions on the conditions during the crimping in this step. For example, the conditions are preferably pressure: 1.0 to 5.0 MPa, temperature: 140 to 190°C, and time: 15 to 90 minutes.
(4)剝離步驟
其次,如圖5所示,自附轉印膜之電磁波屏蔽膜10剝離轉印膜20。
剝離方法並無特殊限制,可採用習知方法。(4) Stripping step
Next, as shown in FIG. 5, the
經由以上步驟,可製造屏蔽印刷配線板60。Through the above steps, the shielded printed
上述本發明第1實施形態之屏蔽印刷配線板之製造方法係於覆蓋層53上形成孔54作為高低差,然而,本發明之屏蔽印刷配線板之製造方法亦可於覆蓋層上形成單純的高低差。又,在此情形下,附轉印膜之電磁波屏蔽膜的接著劑層亦可不具導電性。The manufacturing method of the shielded printed wiring board according to the first embodiment of the present invention described above is to form the
(第2實施形態) 其次,利用圖式,詳述本發明第2實施形態之附轉印膜之電磁波屏蔽膜。(Second embodiment) Next, using the drawings, the electromagnetic wave shielding film with a transfer film according to the second embodiment of the present invention will be described in detail.
圖6為截面圖,其示意顯示本發明第2實施形態之附轉印膜之電磁波屏蔽膜之一例。
如圖6所示,附轉印膜之電磁波屏蔽膜110由轉印膜120及積層於轉印膜120的電磁波屏蔽膜130構成。
又,電磁波屏蔽膜130包含:與轉印膜120接觸的保護層131、及積層於保護層131且具導電性的接著劑層133。6 is a cross-sectional view schematically showing an example of an electromagnetic wave shielding film with a transfer film according to a second embodiment of the present invention.
As shown in FIG. 6, the electromagnetic
又,轉印膜120之楊氏模數為2.0GPa以上。
另,轉印膜120之楊氏模數之下限宜為2.5GPa,且以2.7GPa更佳。
又,轉印膜120之楊氏模數之上限宜為5.0GPa,且以4.5GPa更佳。
若轉印膜之楊氏模數大於5.0GPa,在將附轉印膜之電磁波屏蔽膜黏貼於印刷配線板時,高低差附隨性容易降低。In addition, the Young's modulus of the
附轉印膜之電磁波屏蔽膜110可黏貼於印刷配線板用以製造屏蔽印刷配線板。
使用附轉印膜之電磁波屏蔽膜110來製造屏蔽印刷配線板時,會將附轉印膜之電磁波屏蔽膜110的接著劑層133抵接並壓接於印刷配線板之表面。
此時,若轉印膜120之楊氏模數為2.0GPa以上,則由於轉印膜120夠硬,因此壓接壓力不易分散。
故,即便是在印刷配線板表面有高低差時,亦可牢牢地壓住電磁波屏蔽膜130的接著劑層133,接著劑層133可充分地填埋高低差。The electromagnetic
另,於附轉印膜之電磁波屏蔽膜110中,接著劑層133具有導電性,亦具有電磁波屏蔽機能。
即,於附轉印膜之電磁波屏蔽膜110中,接著劑層133具有電磁波屏蔽機能以及與印刷配線板之接著機能兩者。In addition, in the electromagnetic
通常於印刷配線板的印刷電路也會設置接地電路。由於附轉印膜之電磁波屏蔽膜的接著劑層具有導電性,因此,藉由以使電磁波屏蔽膜的接著劑層與接地電路接觸之方式將電磁波屏蔽膜配置於印刷配線板,而使該等電連接。再者,藉由使電磁波屏蔽膜的接著劑層與外部接地電連接,可使接地電路與外部接地電連接。 另,使電磁波屏蔽膜的接著劑層與接地電路接觸時,會在位於接地電路上的覆蓋層形成露出接地電路的孔(亦即印刷配線板表面的高低差)。 若使用本發明附轉印膜之電磁波屏蔽膜,則可使電磁波屏蔽膜的接著劑層與接地電路充分地接觸,因此,可防止電磁波屏蔽膜的接著劑層與接地電路間之連接電阻上升。Generally, the printed circuit on the printed wiring board is also provided with a ground circuit. Since the adhesive layer of the electromagnetic wave shielding film with the transfer film has conductivity, the electromagnetic wave shielding film is arranged on the printed wiring board in such a manner that the adhesive layer of the electromagnetic wave shielding film is in contact with the ground circuit. Electrical connection. Furthermore, by electrically connecting the adhesive layer of the electromagnetic wave shielding film to the external ground, the ground circuit can be electrically connected to the external ground. In addition, when the adhesive layer of the electromagnetic wave shielding film is brought into contact with the ground circuit, a hole exposing the ground circuit (that is, the height difference of the surface of the printed wiring board) is formed in the cover layer on the ground circuit. If the electromagnetic wave shielding film with a transfer film of the present invention is used, the adhesive layer of the electromagnetic wave shielding film can sufficiently contact the ground circuit, and therefore, the connection resistance between the adhesive layer of the electromagnetic wave shielding film and the ground circuit can be prevented from increasing.
接著劑層133可由導電性粒子與樹脂構成。The
導電性粒子並無特殊限制,可為金屬微粒子、碳奈米管、碳纖維、金屬纖維等。The conductive particles are not particularly limited, and may be metal fine particles, carbon nanotubes, carbon fibers, metal fibers, and the like.
當導電性粒子為金屬微粒子時,金屬微粒子並無特殊限制,可為銀粉、銅粉、鎳粉、焊粉、鋁粉、對銅粉施以鍍銀的銀包銅粉、以金屬被覆高分子微粒子或玻璃珠等的微粒子等。 於該等之中,從經濟性觀點來看,宜為可便宜取得的銅粉或銀包銅粉。When the conductive particles are metal fine particles, the metal fine particles are not particularly limited, and can be silver powder, copper powder, nickel powder, solder powder, aluminum powder, silver-coated copper powder coated with silver on copper powder, and metal coated polymer Fine particles such as fine particles or glass beads. Among these, from the economic point of view, it is preferable to be copper powder or silver-coated copper powder that can be obtained cheaply.
導電性粒子之平均粒徑並無特殊限制,宜為0.5~15.0μm。若導電性粒子之平均粒徑為0.5μm以上,則導電性接著劑層之導電性會變得良好。若導電性粒子之平均粒徑為15.0μm以下,則可使導電性接著劑層薄化。The average particle size of the conductive particles is not particularly limited, and it is preferably 0.5 to 15.0 μm. If the average particle diameter of the conductive particles is 0.5 μm or more, the conductivity of the conductive adhesive layer becomes good. If the average particle diameter of the conductive particles is 15.0 μm or less, the conductive adhesive layer can be thinned.
導電性粒子之形狀並無特殊限制,可自球狀、扁平狀、鱗片狀、枝晶狀、棒狀、纖維狀等適當選擇。The shape of the conductive particles is not particularly limited, and can be appropriately selected from spherical, flat, scaly, dendritic, rod-shaped, and fibrous.
導電性粒子之摻合量並無特殊限制,宜為15~80質量%,且以15~60質量%更佳。The amount of conductive particles blended is not particularly limited, but it is preferably 15 to 80% by mass, and more preferably 15 to 60% by mass.
樹脂並無特殊限制,可舉例如:苯乙烯系樹脂組成物、醋酸乙烯酯系樹脂組成物、聚酯系樹脂組成物、聚乙烯系樹脂組成物、聚丙烯系樹脂組成物、醯亞胺系樹脂組成物、醯胺系樹脂組成物、丙烯酸系樹脂組成物等熱塑性樹脂組成物;及酚系樹脂組成物、環氧系樹脂組成物、胺甲酸乙酯系樹脂組成物、三聚氰胺系樹脂組成物、醇酸系樹脂組成物等熱硬化性樹脂組成物等。The resin is not particularly limited, and examples thereof include: styrene-based resin composition, vinyl acetate-based resin composition, polyester-based resin composition, polyethylene-based resin composition, polypropylene-based resin composition, and amide-imide system Thermoplastic resin compositions such as resin compositions, amide-based resin compositions, acrylic-based resin compositions; and phenol-based resin compositions, epoxy-based resin compositions, urethane-based resin compositions, melamine-based resin compositions , Alkyd resin composition and other thermosetting resin composition.
另,附轉印膜之電磁波屏蔽膜110的轉印膜120、保護層131之理想材料等,係與附轉印膜之電磁波屏蔽膜10的轉印膜20、保護層31之理想材料等相同,故而省略此處的說明。In addition, the ideal materials for the
其次,說明本發明第2實施形態之附轉印膜之電磁波屏蔽膜之製造方法。 本發明附轉印膜之電磁波屏蔽膜之製造方法包含:(1)轉印膜準備步驟;及(2)電磁波屏蔽膜形成步驟。Next, a method of manufacturing an electromagnetic wave shielding film with a transfer film according to a second embodiment of the present invention will be described. The method for manufacturing an electromagnetic wave shielding film with a transfer film of the present invention includes: (1) a transfer film preparation step; and (2) an electromagnetic wave shielding film forming step.
(1)轉印膜準備步驟 於本步驟中,準備楊氏模數為2.0GPa以上之轉印膜的轉印膜材料等既已說明,故而省略此處的說明。(1) Transfer film preparation steps In this step, the transfer film material and the like for preparing a transfer film having a Young's modulus of 2.0 GPa or more have already been described, so the description here is omitted.
(2)電磁波屏蔽膜形成步驟 其次,於轉印膜上依序積層保護層及接著劑層而形成電磁波屏蔽膜。 將該等積層的方法可使用與以往製造電磁波屏蔽膜之方法相同的方法。 又,該等材料等既已說明,故而省略此處的說明。(2) Electromagnetic wave shielding film forming steps Next, a protective layer and an adhesive layer are sequentially deposited on the transfer film to form an electromagnetic wave shielding film. The method of stacking these layers can be the same as the conventional method of manufacturing an electromagnetic wave shielding film. In addition, these materials and the like have already been explained, so the explanation here is omitted.
實施例 以下顯示更具體說明本發明的實施例,惟本發明並不限於該等實施例。Examples The following shows more specific embodiments of the present invention, but the present invention is not limited to these embodiments.
(實施例1-1~1-3)及(比較例1-1) (1)轉印膜準備步驟 準備具有表1所示楊氏模數且厚度50μm之由聚對苯二甲酸乙二酯膜構成的轉印膜(實施例1-1~1-3),以及厚度50μm之由聚甲基戊烯構成的轉印膜(比較例1-1)。另,楊氏模數為利用拉伸試驗機(島津製作所(股)製造,商品名AGS-X50S)並根據JIS K 7113-1995於25℃下測得之值。(Examples 1-1 to 1-3) and (Comparative Example 1-1) (1) Transfer film preparation steps A transfer film made of polyethylene terephthalate film (Examples 1-1 to 1-3) having a Young's modulus shown in Table 1 and having a thickness of 50 μm, and a polymethylpentane having a thickness of 50 μm were prepared A transfer film made of olefin (Comparative Example 1-1). The Young's modulus is a value measured at 25°C in accordance with JIS K 7113-1995 using a tensile tester (manufactured by Shimadzu Corporation, trade name AGS-X50S).
(2)電磁波屏蔽膜形成步驟 於轉印膜表面塗佈脫模劑並予以加熱乾燥而形成脫模劑層。準備環氧系樹脂作為保護層用組成物,並使用線棒於脫模劑層表面塗佈該環氧系樹脂,藉由進行加熱乾燥而形成厚度5μm之保護層。 其次,利用真空蒸鍍,於保護層之表面形成厚度0.1μm之由銀構成的屏蔽層。 接著,於環氧系樹脂中,添加平均粒徑5μm之樹枝狀覆銀銅粉作為導電性填料且達到15質量%,製備為接著劑層用組成物。又,利用線棒於屏蔽層上塗佈該接著劑層用組成物後,進行100℃×3分鐘之乾燥,形成厚度15μm之具各向異性導電性的接著劑層。 經由以上步驟,製作出實施例1-1~1-3及比較例1-1之附轉印膜之電磁波屏蔽膜。(2) Electromagnetic wave shielding film forming steps A release agent is coated on the surface of the transfer film and heated and dried to form a release agent layer. An epoxy-based resin was prepared as a composition for a protective layer, and the epoxy-based resin was coated on the surface of the release agent layer using a wire rod, and then dried by heating to form a protective layer with a thickness of 5 μm. Next, using vacuum evaporation, a shield layer made of silver with a thickness of 0.1 μm was formed on the surface of the protective layer. Next, to the epoxy resin, dendritic silver-coated copper powder having an average particle diameter of 5 μm was added as a conductive filler and reached 15% by mass to prepare a composition for an adhesive layer. Furthermore, after applying the composition for the adhesive layer on the shield layer with a wire rod, drying was performed at 100° C. for 3 minutes to form an anisotropic conductive adhesive layer with a thickness of 15 μm. Through the above steps, electromagnetic wave shielding films with transfer films of Examples 1-1 to 1-3 and Comparative Example 1-1 were produced.
(實施例2-1~2-3)及(比較例2-1) (1)轉印膜準備步驟 準備具有表2所示楊氏模數且厚度50μm之由聚對苯二甲酸乙二酯膜構成的轉印膜(實施例2-1~2-3),以及厚度50μm之由聚甲基戊烯構成的轉印膜(比較例2-1)。另,楊氏模數為利用拉伸試驗機(島津製作所(股)製造,商品名AGS-X50S)並根據JIS K 7113-1995於25℃下測得之值。(Examples 2-1 to 2-3) and (Comparative Example 2-1) (1) Transfer film preparation steps A transfer film composed of polyethylene terephthalate film (Examples 2-1 to 2-3) having a Young's modulus shown in Table 2 and having a thickness of 50 μm, and a polymethylpentane having a thickness of 50 μm were prepared A transfer film composed of alkene (Comparative Example 2-1). The Young's modulus is a value measured at 25°C in accordance with JIS K 7113-1995 using a tensile tester (manufactured by Shimadzu Corporation, trade name AGS-X50S).
(2)電磁波屏蔽膜形成步驟 於轉印膜表面塗佈脫模劑。準備環氧系樹脂作為保護層用組成物,並使用線棒於已塗佈脫模劑之轉印膜表面塗佈該環氧系樹脂,藉由進行加熱乾燥而形成厚度5μm之保護層。 其次,準備接著劑層用組成物,其係於環氧系樹脂中添加平均粒徑5μm之樹枝狀覆銀銅粉作為導電性填料且達到60質量%者。 然後,利用線棒於保護層上塗佈該接著劑層用組成物後,進行100℃×3分鐘之乾燥,形成厚度15μm之具各向同性導電性的接著劑層。 經由以上步驟,製作出實施例2-1~2-3及比較例2-1之附轉印膜之電磁波屏蔽膜。 另,於實施例2-1~2-3及比較例2-1之附轉印膜之電磁波屏蔽膜中,具導電性之接著劑層具有電磁波屏蔽機能以及與印刷配線板之接著機能兩者。(2) Electromagnetic wave shielding film forming steps Apply a release agent to the surface of the transfer film. An epoxy-based resin was prepared as a composition for a protective layer, and the epoxy-based resin was applied to the surface of the transfer film coated with a release agent using a wire bar, and a protective layer with a thickness of 5 μm was formed by heating and drying. Next, a composition for an adhesive layer prepared by adding a dendritic silver-coated copper powder having an average particle diameter of 5 μm as a conductive filler to an epoxy resin and achieving 60% by mass. Then, after applying the composition for the adhesive layer on the protective layer with a wire rod, it was dried at 100° C. for 3 minutes to form an isotropic conductive adhesive layer with a thickness of 15 μm. Through the above steps, electromagnetic wave shielding films with transfer films of Examples 2-1 to 2-3 and Comparative Example 2-1 were produced. In addition, in the electromagnetic wave shielding films with transfer film of Examples 2-1 to 2-3 and Comparative Example 2-1, the conductive adhesive layer has both the electromagnetic wave shielding function and the bonding function with the printed wiring board .
(評價用基板之作成)
圖7(a)及圖7(b)為步驟圖,其示意顯示實施例1之評價用基板之製作方法。
首先,如圖7(a)所示,於由聚醯亞胺構成的基底膜251上,形成2個由部分表面設有鍍金層之銅箔構成的印刷電路252,並於其上形成具有露出印刷電路的孔254(直徑0.5mm)且由聚醯亞胺膜構成的覆蓋層253(厚度37.5μm),藉此,製作出作為評價用基板使用的印刷配線板250。
另,於印刷配線板250中,印刷電路252係模擬接地電路。(Creation of evaluation board)
7(a) and 7(b) are step diagrams schematically showing the method for manufacturing the evaluation substrate of Example 1. FIG.
First, as shown in FIG. 7(a), on the
其次,如圖7(b)所示,以實施例1-1之附轉印膜之電磁波屏蔽膜210的接著劑層233接觸印刷配線板250的覆蓋層253之方式,將附轉印膜之電磁波屏蔽膜210配置於印刷配線板250。
其次,利用壓機,於溫度:170℃、時間3分鐘、壓力:3.0MPa之條件下進行加熱加壓,將附轉印膜之電磁波屏蔽膜壓接於印刷配線板。
接著,藉由將轉印膜220剝離,製得實施例1之評價用基板。
另,圖7(b)中,符號230表示電磁波屏蔽膜,符號231表示保護層,符號232表示屏蔽層。Next, as shown in FIG. 7(b), in a manner that the
除了使用實施例1-2、1-3、2-1~2-3以及比較例1-1及比較例2-1之附轉印膜之電磁波屏蔽膜外,藉由與製得上述實施例1之評價用基板之方法相同的方法,製得實施例1-2、1-3及2-1~2-3以及比較例1-1及比較例2-1之評價用基板。In addition to using the electromagnetic wave shielding films with transfer films of Examples 1-2, 1-3, 2-1 to 2-3 and Comparative Examples 1-1 and 2-1, the above examples were prepared by 1 Evaluation substrate method The same method was used to produce evaluation substrates of Examples 1-2, 1-3, and 2-1 to 2-3, and Comparative Examples 1-1 and 2-1.
(連接電阻試驗)
圖8為示意圖,其示意顯示連接電阻試驗中實施例1-1之評價用基板之連接電阻測定方法。
於實施例1-1之評價用基板中,如圖8所示,利用電阻計270測定2個印刷電路252間之電阻值,來對評價用基板的印刷電路與附轉印膜之電磁波屏蔽膜的接著劑層之連接電阻加以評價。
又,利用相同方法,評價實施例1-2、1-3及2-1~2-3以及比較例1-1及2-1之評價用基板中評價用基板的印刷電路與附轉印膜之電磁波屏蔽膜的接著劑層之連接電阻。表1及表2中顯示結果。
另,將實施例1-1~1-3、比較例1-1中連接電阻小於3000mΩ之情形評價為導電性優異,將實施例2-1~2-3、比較例2-1中連接電阻小於250mΩ之情形評價為導電性優異。(Connection resistance test)
8 is a schematic diagram schematically showing a method for measuring the connection resistance of the evaluation substrate of Example 1-1 in the connection resistance test.
In the evaluation substrate of Example 1-1, as shown in FIG. 8, the resistance value between two printed
[表1]
[表2]
如表1及表2所示,可得知使用實施例1-1~1-3及實施例2-1~2-3之附轉印膜之電磁波屏蔽膜時,可形成低連接電阻狀態。即,顯示出實施例1-1~1-3及實施例2-1~2-3中,附轉印膜之電磁波屏蔽膜的接著劑層與評價用基板的印刷電路充分地接觸。As shown in Tables 1 and 2, it can be seen that when the electromagnetic wave shielding films with transfer films of Examples 1-1 to 1-3 and Examples 2-1 to 2-3 are used, a low connection resistance state can be formed. That is, in Examples 1-1 to 1-3 and Examples 2-1 to 2-3, it was shown that the adhesive layer of the electromagnetic wave shielding film with transfer film was sufficiently in contact with the printed circuit of the evaluation substrate.
10、110、210‧‧‧附轉印膜之電磁波屏蔽膜
20、120、220‧‧‧轉印膜
30、130、230‧‧‧電磁波屏蔽膜
31、131、231‧‧‧保護層
32、232‧‧‧屏蔽層
33、133、233‧‧‧接著劑層
50、250‧‧‧印刷配線板
51、251‧‧‧基底膜
52、252‧‧‧印刷電路
52a‧‧‧接地電路
53、253‧‧‧覆蓋層
54、254‧‧‧孔
60‧‧‧屏蔽印刷配線板
270‧‧‧電阻計10, 110, 210 ‧‧‧ electromagnetic wave shielding film with
圖1為截面圖,其示意顯示本發明第1實施形態之附轉印膜之電磁波屏蔽膜之一例。 圖2為步驟圖,其示意顯示本發明第1實施形態之屏蔽印刷配線板之製造方法中印刷配線板準備步驟之一例。 圖3為步驟圖,其示意顯示本發明第1實施形態之屏蔽印刷配線板之製造方法中附轉印膜之電磁波屏蔽膜準備步驟之一例。 圖4為步驟圖,其示意顯示本發明第1實施形態之屏蔽印刷配線板之製造方法中壓接步驟之一例。 圖5為步驟圖,其示意顯示本發明第1實施形態之屏蔽印刷配線板之製造方法中剝離步驟之一例。 圖6為截面圖,其示意顯示本發明第2實施形態之附轉印膜之電磁波屏蔽膜之一例。 圖7(a)及圖7(b)為步驟圖,其示意顯示實施例1之評價用基板之製作方法。 圖8為示意圖,其示意顯示連接電阻試驗中實施例1-1之評價用基板之連接電阻測定方法。1 is a cross-sectional view schematically showing an example of an electromagnetic wave shielding film with a transfer film according to the first embodiment of the present invention. FIG. 2 is a step diagram schematically showing an example of a preparation step of a printed wiring board in the method for manufacturing a shielded printed wiring board according to the first embodiment of the present invention. 3 is a step diagram schematically showing an example of a preparation step of an electromagnetic wave shielding film with a transfer film in the method for manufacturing a shielded printed wiring board according to the first embodiment of the present invention. Fig. 4 is a step diagram schematically showing an example of the pressure bonding step in the method for manufacturing a shielded printed wiring board according to the first embodiment of the present invention. 5 is a step diagram schematically showing an example of a peeling step in the method for manufacturing a shielded printed wiring board according to the first embodiment of the present invention. 6 is a cross-sectional view schematically showing an example of an electromagnetic wave shielding film with a transfer film according to a second embodiment of the present invention. 7(a) and 7(b) are step diagrams schematically showing the method for manufacturing the evaluation substrate of Example 1. FIG. 8 is a schematic diagram schematically showing a method for measuring the connection resistance of the evaluation substrate of Example 1-1 in the connection resistance test.
10‧‧‧附轉印膜之電磁波屏蔽膜 10‧‧‧Electromagnetic wave shielding film with transfer film
20‧‧‧轉印膜 20‧‧‧Transfer film
30‧‧‧電磁波屏蔽膜 30‧‧‧Electromagnetic shielding film
31‧‧‧保護層 31‧‧‧Protection layer
32‧‧‧屏蔽層 32‧‧‧Shield
33‧‧‧接著劑層 33‧‧‧ Adhesive layer
Claims (9)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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JP2018-160342 | 2018-08-29 | ||
JP2018160342A JP7256618B2 (en) | 2018-08-29 | 2018-08-29 | Electromagnetic wave shielding film with transfer film, method for producing electromagnetic wave shielding film with transfer film, and method for producing shield printed wiring board |
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JP (1) | JP7256618B2 (en) |
KR (1) | KR102558230B1 (en) |
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TWI764350B (en) * | 2020-10-30 | 2022-05-11 | 臻鼎科技股份有限公司 | Electromagnetic shielding film and manufacturing method |
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KR102558151B1 (en) * | 2021-06-15 | 2023-07-21 | (주)와이솔 | Flexible printed circuit board with emi shielding sheet and method of fabricating thereof |
CN113539549B (en) * | 2021-07-15 | 2023-08-01 | 江西古川胶带有限公司 | Thermosetting conductive adhesive film and preparation method and application thereof |
TW202335576A (en) * | 2021-12-06 | 2023-09-01 | 日商拓自達電線股份有限公司 | Transfer film and electromagnetic wave shield film provided with transfer film |
KR102591392B1 (en) * | 2022-11-16 | 2023-10-19 | (주)와이솔 | Flexible printed circuit board with emi shielding sheet and method of fabricating thereof |
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JP2000269632A (en) | 1999-03-17 | 2000-09-29 | Tatsuta Electric Wire & Cable Co Ltd | Shield flexible printed wiring board, manufacture thereof and reinforcing shield film therefor |
JP4360774B2 (en) | 2002-03-29 | 2009-11-11 | タツタ電線株式会社 | Reinforcing shield film and shield flexible printed wiring board |
JP2005056906A (en) * | 2003-08-05 | 2005-03-03 | Reiko Co Ltd | Electromagnetic wave shielding transfer film |
JP4319167B2 (en) * | 2005-05-13 | 2009-08-26 | タツタ システム・エレクトロニクス株式会社 | Shield film, shield printed wiring board, shield flexible printed wiring board, shield film manufacturing method, and shield printed wiring board manufacturing method |
JP5143196B2 (en) * | 2009-09-28 | 2013-02-13 | 日東電工株式会社 | Film for semiconductor devices |
JP4976531B2 (en) * | 2010-09-06 | 2012-07-18 | 日東電工株式会社 | Film for semiconductor devices |
JP4991921B2 (en) * | 2010-09-06 | 2012-08-08 | 日東電工株式会社 | Film for semiconductor device and semiconductor device |
JP2012062351A (en) | 2010-09-14 | 2012-03-29 | Nitto Denko Corp | Optical adhesive sheet |
JP6200171B2 (en) * | 2012-06-04 | 2017-09-20 | キヤノン株式会社 | Radiation detection apparatus and imaging system |
TWI599277B (en) * | 2012-09-28 | 2017-09-11 | 新日鐵住金化學股份有限公司 | Flexible copper-clad laminate |
KR102084815B1 (en) * | 2012-10-17 | 2020-03-04 | 도레이 카부시키가이샤 | Laminated film |
JP6014680B2 (en) * | 2012-11-19 | 2016-10-25 | タツタ電線株式会社 | Laminated film and shield printed wiring board |
WO2014080931A1 (en) * | 2012-11-21 | 2014-05-30 | 株式会社カネカ | Heat dissipation structure |
JP6264214B2 (en) * | 2013-03-29 | 2018-01-24 | 大日本印刷株式会社 | Thermal transfer film and hard coat body using the same |
TWI715913B (en) * | 2013-05-29 | 2021-01-11 | 日商大自達電線股份有限公司 | Method for electromagnetic shielding film |
JP2015109404A (en) | 2013-10-24 | 2015-06-11 | 信越ポリマー株式会社 | Electromagnetic wave shield film, flexible printed wiring board with electromagnetic wave shield film, and manufacturing method thereof |
CN105705334B (en) * | 2013-11-01 | 2018-03-20 | 杜邦-东丽株式会社 | Graphite layered product |
JP6249820B2 (en) * | 2014-02-27 | 2017-12-20 | 住友化学株式会社 | Manufacturing method of polarizing plate and polarizing plate |
JP6251111B2 (en) | 2014-04-10 | 2017-12-20 | フジコピアン株式会社 | Double-sided adhesive film and protective member for information display screen using the same |
JP6028290B2 (en) | 2014-12-11 | 2016-11-16 | 東洋インキScホールディングス株式会社 | Electromagnetic shielding sheet and printed wiring board |
TWI641494B (en) * | 2015-11-04 | 2018-11-21 | 日商琳得科股份有限公司 | Sheet for forming first protective film, method for forming first protective film and method for manufacturing semiconductor chip |
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JP2017125184A (en) | 2016-01-07 | 2017-07-20 | 東レ株式会社 | Polypropylene film and mold release film |
CN108026420B (en) * | 2016-05-12 | 2020-11-06 | 日本Mektron株式会社 | Conductive adhesive and shielding film |
JP7081186B2 (en) * | 2017-02-17 | 2022-06-07 | 東レ株式会社 | Polyester film |
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2018
- 2018-08-29 JP JP2018160342A patent/JP7256618B2/en active Active
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TWI764350B (en) * | 2020-10-30 | 2022-05-11 | 臻鼎科技股份有限公司 | Electromagnetic shielding film and manufacturing method |
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KR102558230B1 (en) | 2023-07-20 |
JP2020035858A (en) | 2020-03-05 |
TWI846693B (en) | 2024-07-01 |
KR20200026065A (en) | 2020-03-10 |
JP7256618B2 (en) | 2023-04-12 |
CN110876256A (en) | 2020-03-10 |
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