TW201925323A - 壓印用複製模材料 - Google Patents

壓印用複製模材料 Download PDF

Info

Publication number
TW201925323A
TW201925323A TW107127393A TW107127393A TW201925323A TW 201925323 A TW201925323 A TW 201925323A TW 107127393 A TW107127393 A TW 107127393A TW 107127393 A TW107127393 A TW 107127393A TW 201925323 A TW201925323 A TW 201925323A
Authority
TW
Taiwan
Prior art keywords
component
replica mold
mold material
mass
replica
Prior art date
Application number
TW107127393A
Other languages
English (en)
Chinese (zh)
Inventor
小林淳平
加藤拓
Original Assignee
日商日產化學有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商日產化學有限公司 filed Critical 日商日產化學有限公司
Publication of TW201925323A publication Critical patent/TW201925323A/zh

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C33/00—Moulds or cores; Details thereof or accessories therefor
    • B29C33/38—Moulds or cores; Details thereof or accessories therefor characterised by the material or the manufacturing process
    • B29C33/40—Plastics, e.g. foam or rubber
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Polymerisation Methods In General (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)
TW107127393A 2017-08-07 2018-08-07 壓印用複製模材料 TW201925323A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2017-152458 2017-08-07
JP2017152458 2017-08-07

Publications (1)

Publication Number Publication Date
TW201925323A true TW201925323A (zh) 2019-07-01

Family

ID=65272135

Family Applications (1)

Application Number Title Priority Date Filing Date
TW107127393A TW201925323A (zh) 2017-08-07 2018-08-07 壓印用複製模材料

Country Status (3)

Country Link
JP (1) JP6997417B2 (ja)
TW (1) TW201925323A (ja)
WO (1) WO2019031359A1 (ja)

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5117002B2 (ja) * 2006-07-10 2013-01-09 富士フイルム株式会社 光硬化性組成物およびそれを用いたパターン形成方法
JP5284701B2 (ja) * 2008-07-08 2013-09-11 三菱レイヨン株式会社 硬化性組成物及びパターン形成方法
JP5481861B2 (ja) * 2009-01-09 2014-04-23 日立化成株式会社 光硬化性樹脂組成物、これを用いたパターン形成方法及び微細構造体
US8604096B2 (en) * 2009-11-30 2013-12-10 Hitachi Chemical Company, Ltd. Photosensitive resin composition, photosensitive resin varnish, photosensitive resin film, and photosensitive resin cured product
JP5621458B2 (ja) * 2010-09-22 2014-11-12 三菱瓦斯化学株式会社 光学デバイス
JP6075614B2 (ja) * 2012-11-30 2017-02-08 三菱レイヨン株式会社 被覆材組成物、及び積層物の製造方法
JP6797529B2 (ja) * 2015-01-21 2020-12-09 東洋合成工業株式会社 光学部材の製造方法及びそれに用いられる組成物
JP2016215460A (ja) * 2015-05-19 2016-12-22 東ソー株式会社 レプリカ成型用組成物、該組成物から得られた成型型及び該組成物を用いたレプリカの製造方法

Also Published As

Publication number Publication date
WO2019031359A1 (ja) 2019-02-14
JPWO2019031359A1 (ja) 2020-06-25
JP6997417B2 (ja) 2022-01-17

Similar Documents

Publication Publication Date Title
KR101560249B1 (ko) 저유전율 임프린트 재료
TWI648147B (zh) 具有防污性之具有凹凸形狀之表面的構造體及其製造方法
KR102226670B1 (ko) 실세스퀴옥산 화합물 및 변성 실리콘 화합물을 포함하는 임프린트 재료
TWI476211B (zh) 高硬度壓印材料
KR20160002707A (ko) 임프린트 재료
JP2013095833A (ja) 高屈折率インプリント材料
TWI729185B (zh) 壓印材料
TW201925323A (zh) 壓印用複製模材料
KR20180096614A (ko) 임프린트재료
JP6338061B2 (ja) 低離型力性を有するインプリント材料
TW201925322A (zh) 壓印用複製模材料
JP7288247B2 (ja) インプリント用レプリカモールド及びその作製方法
TW201619274A (zh) 壓印材料