TW201924916A - Glass sheet provided with optical film, and method for manufacturing same - Google Patents

Abstract

A glass sheet 1 provided with an optical film, the glass sheet 1 provided with an optical film being provided with a glass sheet 2 having a pair of main surfaces 2a on the front and back thereof and an end surface 2b connecting end parts of each of the pair of main surfaces 2a, and optical films 3 formed on both main surfaces 2a of the glass sheet 2. The optical film 3 is provided with protruding parts 3a protruding outward past end parts of the main surfaces 2a of the glass sheet 2.

Description

Glass plate with optical film and manufacturing method thereof

The invention relates to a glass plate with an optical film and a manufacturing method thereof.

The spectroscopic sensitivity of solid-state imaging devices such as CCD or CMOS used in digital cameras or camcorders is strong for near-infrared light, so it is generally used for the spectroscopic sensitivity of such solid-state imaging devices Those who use the visual acuity correction member in accordance with the visual acuity characteristics of a person.

As the visual acuity correcting member, for example, as disclosed in Patent Document 1, a glass plate with an optical film on which an optical film having an infrared shielding function is formed on the main surface of the glass plate is used. In addition, in order to prevent reflection on the surface of the glass plate, an optical film having an anti-reflection function may be formed.
[Prior Technical Literature]
[Patent Literature]

[Patent Literature 1] International Publication No. 2013/077375

[Problem to be solved by invention]

However, with the miniaturization of solid-state imaging elements, the miniaturization of glass plates with optical films used has also progressed. Along with this, in order to make effective use of the limited area, the glass plate with the optical film is required to have uniform optical characteristics until near the end of the main surface of the glass plate.

However, it is common practice to form a glass plate with an optical film after the optical film is formed on the main surface of the original glass plate of the large plate and cut to a specific size with a cutting device, and the main surface of the glass plate In the vicinity of the end portion, film peeling accompanying the cut optical film is likely to occur. When the film is peeled off without forming an optical film near the end of the main surface of the glass plate, the required optical characteristics cannot be sufficiently achieved, and the performance of the glass plate with the optical film is reduced.

An object of the present invention is to provide an optical film-attached glass plate that reliably forms an optical film near the end of the main surface of the glass plate.

To solve the problem

In order to solve the above-mentioned problems, the invention invented is a glass plate having a pair of main surfaces, an end surface connecting the ends of the pair of main surfaces, and an optical film formed on at least one main surface of the glass plate. A glass plate with an optical film is characterized in that the optical film is provided with an overflow portion that extends beyond the end of the main surface of the glass plate and extends outward. According to such a configuration, the optical film is formed in a wider range than the main surface of the glass plate via the overflow portion, and the optical film is reliably formed near the end of the main surface of the glass plate. However, because the overflow portion is in a state of protruding outward, it is difficult for other members to directly contact the end surface of the glass plate. Along with this, the effect of reducing dusting or breakage from the end surface of the glass plate can also be expected.

In the above-mentioned configuration, the end surface of the glass plate is used as a chamfer, and the end surface may have a portion located outside the overflow portion of the optical film.

In the above configuration, the optical film is preferably at least one of an anti-reflection film, an infrared shielding film, an ultraviolet shielding film, an ultraviolet ray, and an infrared shielding film. In this case, as the optical film, for example, a dielectric multilayer film formed by alternately stacking a high refractive index layer and a low refractive index layer can be used.

In the above-mentioned configuration, the glass plate contains P ₂ O ₅ with a mass% of 25% or more in terms of composition.

In the above configuration, the overflow size of the overflow portion of the optical film is 1 μm to 0.1 mm.

The present invention invented to solve the above-mentioned problems includes a glass plate having a pair of front and back main surfaces, an end surface connecting the ends of each pair of main surfaces, and an optical film formed on at least one main surface of the glass plate A manufacturing method of a glass plate with an optical film is characterized by comprising: forming a film forming process of forming an optical film on at least one main surface of the glass plate, contacting at least the end surface of the glass plate with the optical film in contact with an etching solution In the etching process of etching, the glass plate is made of phosphate glass, and the etching solution is alkaline detergent. According to such a configuration, in the etching process, only the glass plate reacts with the etchant, but the optical film system does not react with the etchant. As a result, when focusing on the end of the glass plate, only the end of the glass plate is removed by the etching solution, and the optical film remains beyond the end of the main surface of the glass plate and extends outward. Along with this overflowing portion, the optical film is formed in a wider range than the main surface of the glass plate, and the optical film is reliably formed near the end of the main surface of the glass plate.

In the above-mentioned configuration, the etching solution is an alkaline salt containing a chelating agent as an alkaline component. In the etching process, the glass plate forming the optical film is preferably immersed in the etching solution.

In the above-mentioned configuration, after the film forming process and before the etching process, a cutting process for cutting the glass plate and a chamfering process for chamfering the end surface of the glass plate are further provided.

In this case, the cutting process also has a chamfering process, and the chamfering may be performed simultaneously with the cutting of the glass plate.

In the above-mentioned configuration, the optical film system may be formed only on one main surface of the glass plate.

In the above configuration, the optical film may be formed on the main surfaces of both sides of the glass plate.

Invention effect

According to the present invention, it is possible to provide a glass plate with an optical film to which an optical film is reliably formed near the end of the main surface of the glass plate.

Hereinafter, the optical film-attached glass plate of the present embodiment and the manufacturing method thereof will be described with reference to the drawings.

(First embodiment)
As shown in FIGS. 1 and 2, the glass plate 1 with an optical film according to the first embodiment includes a glass plate 2 and an optical film 3, such as a visual acuity correction member or cover glass used for a solid-state imaging element Wait.

The glass plate 2 includes a pair of front and back main surfaces 2a, and an end surface 2b that connects the ends of the main surfaces 2a of both sides. The glass plate 2 is formed into a quadrangular shape, but it is not limited to this shape, and may be, for example, a triangle or a polygon or more than a pentagon or a circle. In this embodiment, the end surface 2b is formed on each side of the rectangular glass plate 2 and is formed to be slightly orthogonal to the main surface 2a.

The thickness of the glass plate 2 is desirably 0.4 mm or less, 0.3 mm or less, and 0.2 mm or less. It is more desirably 0.19 mm or less, still more desirably 0.15 mm or less, and particularly desirably 0.12 mm or less. On the other hand, the thickness of the glass plate 2 is preferably 0.05 mm or more, and more preferably 0.08 mm or more.

In the area of each major surface of the glass plate based 2a 2 may be of a 1mm ² were less than 25000mm ^2. Range over the area of the line of each main surface 2a 3mm ² or less than ² 25000mm, more preferably ² or more and ² or less 25000mm 9mm, more preferably have ² to 15mm ² or less than 25000mm, more particularly preferably ² to 20mm ² or less 25000mm.

The surface roughness Ra of the end surface 2b of the glass plate 2 is preferably 0.1 nm to 10 nm.

The glass plate 2 series contains P ^{5+ 5-50} %, Al ^{3+ 2-30} %, R ′ ⁺ (R ′ is at least one kind selected from Li, Na, and K) 10% in terms of composition in terms of cationic% 50%, and R ²⁺ (R ²⁺ is selected from at least one of Mg ²⁺ , Ca ²⁺ , Sr ²⁺ , Ba ^2+, and Zn ²⁺ ) 20-50%, Cu ²⁺ 0.5-15% It is displayed in% of anion, contains F ^- 5 to 80%, and O ^{2 to} 20 to 95%.

The glass plate 2 is added to the above composition, and it is shown as anion% more, and a composition containing F ^- 5 to 80% may be used.

It is more ideal as a glass plate 2 series and can be used. In terms of composition, it is shown as cation%, containing P ⁵⁺ 40-50%, Al ^{3+ 7-12} %, K ⁺ 15-25%, Mg ^{2+ 3-12} %, Ca ²⁺ 3 to 6%, Ba ²⁺ 7 to 12%, Cu ²⁺ 1 to 15%, and displayed as anionic%, containing F ^- 5 to 80%, and O ^{2 to} 20 to 95% phosphoric acid Salt glass.

As an ideal glass plate 2 of other composition, it can be displayed as cation%, containing P ⁵⁺ 20-35%, Al ³⁺ 10-20%, Li ⁺ 20-30%, Na ⁺ 0-10%, Mg ^{2 +} 1 ～ 8%, Ca ²⁺ 3 ～ 13%, Sr ²⁺ 2 ～ 12%, Ba ²⁺ 2 ～ 8%, Zn ²⁺ 0 ～ 5%, Cu ²⁺ 0.5 ～ 5%, and the anion% Display and contain F ^- 30 ～ 65%, and O ^2-35 ～ 75% fluorophosphate glass.

The ideal glass plate 2 of other composition can be used, shown as cation%, containing P ⁵⁺ 35-45%, Al ³⁺ 8-12%, Li ⁺ 20-30%, Mg ²⁺ 1-5%, Ca ²⁺ 3 ～ 6%, Ba ²⁺ 4 ～ 8%, Cu ²⁺ 1 ～ 6%, and displayed as anion%, containing F ^- 10 ～ 20%, and O ^2- 75 ～ 95% of fluorophosphate glass By.

As an ideal glass plate 2 of other composition, it can be displayed in cation%, containing P ⁵⁺ 30-45%, Al ³⁺ 15-25%, Li ⁺ 1-5%, Na ⁺ 7-13%, K ⁺ 0.1 ～ 5%, Mg ²⁺ 1 ～ 8%, Ca ²⁺ 3 ～ 13%, Ba ²⁺ 6 ～ 12%, Zn ²⁺ 0 ～ 7%, Cu ²⁺ 1 ～ 5%, and displayed as anion% , Containing F ^- 30 ~ 45%, and O ^2- 50 ~ 70% fluorophosphate glass.

In the following, the glass plate 2 shows an example of a phosphate-based glass having excellent infrared absorption function.

The phosphate-based glass used in the glass plate 2 does not substantially contain F (fluorine). Here, "substantially not contained" refers to those that mean that 0.1% or less of fluorine is contained in mass%.

As such a phosphate-based glass system, for example, a composition containing 25% by mass or more of P ₂ O ₅ can be used. Specifically, it can be used in mass%, containing P ₂ O ₅ 25 to 60%, Al ₂ O ₃ 2 to 19%, RO (but R is selected from at least one of Mg, Ca, Sr, and Ba) 5 to 45% , ZnO 0 to 13%, K ₂ O 8 to 20%, Na ₂ O 0 to 12%, and CuO 0.3 to 20%, and glass that does not substantially contain fluorine.

P ₂ O ₅ is a component that forms a glass skeleton. The content of P ₂ O ₅ is in mass%, preferably 25 to 60%, more preferably 30 to 55%, and still more preferably 40 to 50%. When the content of P ₂ O ₅ is too small, vitrification may become unstable. On the other hand, when the content of P ₂ O ₅ is too large, the weather resistance tends to decrease.

Al ₂ O ₃ is an additional layer to improve weather resistance. The content of Al ₂ O ₃ is in mass%, preferably 2 to 19%, more preferably 2 to 15%, more preferably 2.8 to 14.5%, and particularly preferably 3.5 to 14.0%. When the content of Al ₂ O ₃ is too small, the weather resistance may be insufficient. On the other hand, when the content of Al ₂ O ₃ is too large, the meltability may decrease and the melting temperature may increase. However, when the melting temperature rises, Cu ions are reduced to easily shift from Cu ²⁺ to Cu ⁺ , and it may be difficult to obtain desired optical characteristics. Specifically, there are cases where the light transmittance in the near-ultraviolet to visible range is lowered, and the infrared absorption characteristics are easily lowered.

RO (but R is selected from at least one of Mg, Ca, Sr, and Ba) is a component that improves weather resistance and enhances meltability. The content of RO is based on mass%, ideally 5 to 45%, more preferably 7 to 40%, and more preferably 10 to 35%. When the content of RO is too small, the weather resistance and meltability may be insufficient. On the other hand, when the RO content is too large, the stability of the glass is likely to decrease, and the crystals caused by the RO component are likely to precipitate.

However, the ideal range of the content of each component of RO is as follows.

MgO is a component that improves weather resistance. The content of MgO is based on mass%, ideally 0 to 15%, more preferably 0 to 7%. When the content of MgO is too much, the stability of the glass tends to decrease.

The CaO-based component improves weather resistance like MgO. The content of CaO is in mass%, preferably 0 to 15%, more preferably 0 to 7%. When the content of CaO is too much, the stability of the glass tends to decrease.

The SrO system is a component that improves weather resistance like MgO. The content of SrO is in mass%, preferably 0-12%, more preferably 0-5%. When the SrO content is too large, the stability of the glass is likely to decrease.

BaO is a component that improves weather resistance while stabilizing glass. The content of BaO is in mass%, ideally 1-30%, more preferably 2-27%, and still more preferably 3-25%. If the content of BaO is too small, the glass may not be sufficiently stabilized, and the weather resistance may not be sufficiently improved. On the other hand, if the content of BaO is too large, crystals caused by BaO may be easily precipitated during molding.

ZnO is a component that improves the stability and weather resistance of glass. The content of ZnO is in mass%, ideally 0 to 13%, and more desirably 0 to 12%, and more desirably 0 to 10%. If the content of ZnO is too large, the meltability may decrease and the melting temperature may become high, and as a result, the desired optical characteristics may not be easily obtained. In addition, there are cases where the stability of the glass decreases and the crystals caused by the ZnO component are likely to precipitate.

As mentioned above, RO and ZnO series have the effect of improving the stability of glass, especially when P ₂ O _{5 is} small, it is easy to enjoy the effect.

However, the ratio of the P ₂ O ₅ content (P ₂ O ₅ / RO) for RO is preferably 1.0 to 1.9, and more preferably 1.2 to 1.8. When the ratio (P ₂ O ₅ / RO) is too small, there is a case where devitrification caused by RO is likely to be precipitated because the liquidus temperature becomes high. On the other hand, when P ₂ O ₅ / RO is too large, the weather resistance tends to decrease.

K ₂ O is a component that lowers the melting temperature. The content of K ₂ O is in mass%, ideally 8-20%, more preferably 12.5-19.5%. When the content of K ₂ O is too small, there are cases where the melting temperature becomes high and it is difficult to obtain desired optical characteristics. On the other hand, when the content of K ₂ O is too large, crystals caused by K ₂ O are likely to be precipitated during molding, and vitrification becomes unstable.

Na ₂ O is a component that lowers the melting temperature in the same way as K ₂ O. The Na ₂ O content is in mass%, ideally 0-12%, more preferably 0-7%. When the content of Na ₂ O is excessive, vitrification may become unstable.

CuO is a component for absorbing near infrared rays. The content of CuO is in mass%, ideally 0.3 to 20%, more preferably 0.3 to 15%, and still more preferably 0.4 to 13%. When the content of CuO is too small, the desired near-infrared absorption characteristics may not be obtained. On the other hand, when the content of CuO is too large, the light transmittance in the ultraviolet to visible range is likely to decrease. In addition, there is a case where vitrification becomes unstable. However, in order to obtain the desired optical characteristics, the content of CuO is preferably adjusted appropriately through the plate thickness.

In addition to the above components, B ₂ O ₃ , Nb ₂ O ₅ , Y ₂ O ₃ , La ₂ O ₃ , Ta ₂ O ₅ , CeO ₂ or Sb ₂ O are contained in a range that does not impair the effects of the present invention ₃ can also be. Specifically, the content of these components is in mass%, preferably 0 to 3%, more preferably 0 to 2%.

By using the glass plate 2 as the above-mentioned composition, it is possible to achieve both high light transmittance in the visible region and superior light absorption characteristics in the infrared region. Specifically, the light transmittance at a wavelength of 400 nm is preferably 78% or more, and more preferably 80% or more, and the light transmittance at a wavelength of 500 nm is preferably 83% or more, and more preferably 85% or more. On the other hand, the light transmittance at a wavelength of 700 nm is desirably 12% or more, and more preferably 9% or less, and the light transmittance at a wavelength of 800 nm is desirably 5% or less, and more desirably 3% or less.

The glass plate 2 having the above-mentioned composition is formed into a plate shape by, for example, a casting method, a slide-out method, a down-drawing method, a redrawing method, a float method, an overflow method, or the like.

In the present embodiment, the optical film 3 is formed on both main surfaces 2a of the glass plate 2. The optical film 3 includes an overflow portion 3a that extends beyond the end of the main surface 2a of the glass plate 2 and extends outward.

The overflow portion 3a extends outside along the main surface 2a of the glass plate 2. The front end of the overflow portion 3a is separated from the end surface 2b of the glass plate 2. However, the overflow portion 3a does not necessarily have to be parallel to the main surface 2a of the glass plate 2, and the tip may be inclined as hanging down or the like. In addition, a part of the base end portion of the overflow portion 3a does not affect even if it contacts the end surface 2b of the glass plate 2.

The overflow portion 3a is formed in a frame shape around the entire circumference of the main surface 2a of the glass plate 2 (refer to the cross-hatched portion in FIG. 2).

The overflow dimension t1 in the plane direction of the overflow portion 3a is preferably 1 μm to 0.1 mm, and more preferably 3 μm to 20 μm. If it is such an overflow size, the overflow portion 3a is sufficiently protruded from the outside, and other members are less likely to directly contact the end surface 2b of the glass plate 2, which can reduce dusting from the end surface 2b of the glass plate 2. Or damaged.

The thickness of the optical film 3 is thinner than the thickness of the glass plate 2, and preferably 10 μm or less. More preferably, it is 7 μm or less. On the other hand, the thickness of the optical film 3 is preferably 0.1 μm or more, and more preferably 0.2 μm or more.

The optical film 3 is a structure appropriately selected according to the application, and examples thereof include functional films such as an anti-reflection film (AR film), an infrared shielding film (IR shielding film), an ultraviolet shielding film, an ultraviolet and infrared shielding film, and the like. In addition, the optical film 3 may be a function provided with both an anti-reflection film and an infrared shielding film. For the optical film 3 having such a function, for example, a dielectric multilayer film formed by alternately laminating a low refractive index layer and a high refractive index layer can be used. As the low refractive index layer system, a silicon oxide film or the like is used. As the high refractive index layer, a metal oxide film formed of at least one selected from tantalum oxide, niobium oxide, titanium oxide, hafnium oxide, silicon nitride, and zirconium oxide is used. However, the optical film 3 formed on one main surface 2a of the glass plate 2 and the optical film 3 formed on the other main surface 2a of the glass plate 2 may also be films having the same function and different functions Membrane is also available. Specifically, the composition of the glass plate 2 with an optical film is, for example, antireflection film / glass plate / antireflection film, antireflection film / glass plate / infrared shielding film, infrared shielding film / glass plate / infrared shielding film, Infrared shielding film / glass plate / ultraviolet and infrared shielding film, etc.

If the glass plate 2 with an optical film configured as described above is provided, the optical film 3 is in a state of being formed in a wider range than the main surface 2a of the glass plate 2 via the overflow portion 3a. Along with this, the optical film 3 can be reliably formed near the end of the main surface 2a of the glass plate 2.

Next, a method of manufacturing the optical film-attached glass plate 2 according to the first embodiment will be described.

The manufacturing method includes a film forming process, a cutting process, and an etching process in order. In this embodiment, as shown in FIGS. 3 and 4, a plurality of glass plate laminates 6 including glass plates 2 of product size are taken from the original glass plate laminate 5 of the original glass plate 4 including the large plate , An example of so-called chamfering. Of course, for the purpose of trimming, etc., one glass sheet laminate 6 may be adopted as the original glass sheet laminate 5. However, in the present manufacturing method, the original glass plate laminate 5 → glass plate laminate 6 → glass plate with optical film 1 is manufactured in this order.

As shown in FIG. 3, in the film forming process, the optical film 3 is formed on the main surfaces 4 a of both the large original glass plates 4, and the original glass plate laminate 5 is manufactured. The optical film 3 is formed on the entire main surface 4 a of the original glass plate 4. The optical film 3 is formed using, for example, a vacuum deposition method or a sputtering method.

As shown in FIG. 4, in the cutting process, for example, the original glass plate laminate 5 is cut into a checkerboard shape, and a plurality of glass plate laminates 6 are manufactured. In the example shown in the figure, from one piece of original glass plate laminate 5, 9 pieces of glass plate laminate 6 are taken. The cutting method of the original glass plate laminate 5 is not particularly limited, but for example, mechanical cutting through a blade of a cutting device, fold cutting, laser cutting, laser fusing, etc. can be used.

As shown in FIG. 5, in the etching process, the glass plate laminate 6 is immersed in the etching solution E contained in an etching tank (not shown) to perform etching.

The etchant E is a case where the glass plate 2 contained in the glass plate laminate 6 is the phosphate-based glass as described above, and is constituted by, for example, an alkaline detergent. The phosphate-based glass is compared with other glasses such as the fluorophosphate-based glass because the alkali resistance is low. The alkaline detergent is not particularly limited, but, for example, alkaline components such as Na and K, surfactants such as triethanolamine, benzyl alcohol, and ethylene glycol, or detergents containing water or alcohol can be used.

As the alkaline component contained in the alkaline detergent, an alkali metal salt containing a chelating agent such as amino polycarboxylic acid is preferred. Examples of the alkali metal salts of aminopolycarboxylic acids include sodium and potassium salts of diethyltriaminepentaacetic acid, ethylenediaminetetraacetic acid, triethylenetetraaminehexaacetic acid, and nitrogen triacetic acid. Among them, it is desirable to use pentasodium diethyltriaminepentaacetic acid, tetrasodium ethylenediaminetetraacetic acid, hexasodium triethylenetetraaminehexaacetic acid, trisodium nitrilotriacetate, and particularly ideal to use pentaacetic acid diethyltriaminepentaacetic acid. sodium.

The etchant E reacted with the glass plate 2 but did not substantially react with the optical film 3. In this embodiment, the glass plates 2 contained in the glass plate laminate 6 are formed with optical films 3 on both main surfaces 2a. When the glass plate laminate 6 is immersed in the etching solution E, Only the end of the glass plate 2 is in direct contact with the etchant E to react. Along with this, only the end of the glass plate 2 is slowly etched through the etching solution E, and the position of the end surface 2b of the glass plate 2 moves in the direction A. As a result, the optical film 3 is left as it is, and only the surface layer portion X1 (cross-hatched portion in FIG. 5) of the end portion of the glass plate 2 is removed. Along with this, as shown in FIG. 1, the optical film-attached glass plate 2 having the optical film 3 having the overflow portion 3 a on both main surfaces 2 a of the glass plate 2 is formed.

The removal thickness t2 in the planar direction by etching is preferably 1 μm to 0.1 mm, and more preferably 3 μm to 20 μm. This removed thickness t2 is preferably approximately the same as the overflow size t1 of the overflow portion 3a of FIG.

In this manufacturing method, in the state of the glass plate laminate 6, the main surfaces 2a of both sides of the glass plate 2 are protected via the optical film 3, and the thickness of the glass plate 2 may not be changed during the etching process. Those who process the end face of the glass plate 2.

(Second embodiment)
As shown in FIG. 6, the glass plate 1 with an optical film related to the second embodiment is different from the glass plate 1 with an optical film related to the first embodiment, and the end surface 2b of the glass plate 2 is used as a chamfer Point.

The end surface 2b of the glass plate 2 is a partial range on both sides of the main surface 2a side, and has a chamfered portion 2c formed by an inclined plane inclined to the main surface 2a. For the main surface 2a of the chamfered portion 2c, the inclination angle θ is preferably 20 ° to 60 °. However, the shape of the chamfered portion 2c is not particularly limited, and may be formed by, for example, a self-convex curved surface (circular arc surface or elliptical arc surface) or a composite plane connecting plural planes having different inclination angles. In addition, the entire end surface 2b of the glass plate 2 may be a convex curved surface or the like, and a chamfered portion may be provided on the entire end surface 2b.

In the case where the chamfered portion 2c is formed on the end surface 2b of the glass plate 2, the end surface 2b may be located at a portion Y (cross-hatched portion in FIG. 6) that is outside the overflow portion 3a of the optical film 3. As such, other members can easily directly contact the end surface 2b of the glass plate 2. However, the mechanical strength of the end surface 2b is improved through the chamfered portion 2c, so that dust or dust from the end surface 2b of the glass plate 2 damaged. However, when the protruding portion Y is provided, since the overflow size t3 of the overflow portion 2 can be reduced, the etching time in the etching process described later can be shortened, and the manufacturing efficiency can be improved. Of course, it is not necessary to provide the protruding portion Y.

In this embodiment, a chamfered portion 3b is formed at the tip of the overflow portion 3a of the optical film 3. The shape of the chamfered portion 3b is not particularly limited, but the same shape as the chamfered portion 2c of the glass plate 2 may be selected. However, the chamfered portion 3b of the optical film 3 is omitted, and only the chamfered portion 2c of the glass plate 2 may be provided.

The overflow dimension t3 in the plane direction of the overflow portion 3a is preferably 1 μm to 0.1 mm, and more preferably 3 μm to 20 μm.

Next, a method of manufacturing the optical film-attached glass plate 2 according to the second embodiment will be described.

The manufacturing method includes a film forming process, a cutting process, a chamfering process, and an etching process in order. In the present embodiment, the cutting process also has a chamfering process, and an example of chamfering is performed in the process of cutting the original glass plate laminate 5.

In the film forming process, the raw glass plate laminate 5 is manufactured by the same method as in the first embodiment (see FIG. 3).

The cutting process includes: as shown in FIGS. 7 and 8, the first blade 21 of the cutting device cuts the first surface portion 5s including the original glass plate laminate 5 near the main surface 4 a of the original glass plate 4. In the process, as shown in FIG. 9, the second process of cutting the central portion 5c of the original glass plate laminate 5 left uncut by the first process through the second blade 22 of the cutting device.

As shown in FIGS. 7 and 8, the first blade 21 is a disk shape rotatably held, and has a cutting blade 21 a at the peripheral edge portion. The cutting blade 21a has a pair of inclined surfaces 21b inclined in opposite directions to form a V-shaped convex portion.

As shown in FIG. 9, the second blade 22 can also be rotatably held in a disk shape, and has a cutting blade 22 a at its peripheral edge. The second blade 22 is thinner than the first blade 21. The shape of the cutting edge 22a is not particularly limited as long as it can cut the original glass plate laminate 5 within the range of the thickness of the second blade 22. However, instead of the second blade 22, cutting by laser irradiation may be used.

In the first process, first, as shown in FIG. 7, while rotating the first blade 21, the surface layer portion 5s on one side of the original glass plate laminate 5 is cut to the surface layer on one side of the original glass plate laminate 5 The portion 5s is formed with a V-shaped groove 5a corresponding to the shape of the cutting blade 21a. After that, as shown in FIG. 8, the original glass plate laminate 5 in which the groove 5 a is formed is reversed, and while the first blade 21 is rotated, the other surface layer portion 5 s of the original glass plate laminate 5 is cut. The other surface layer portion 5s of the original glass plate laminate 5 is also formed with a V-shaped groove 5a corresponding to the shape of the cutting edge 21a. Next, in the second process, as shown in FIG. 9, the groove bottom portions of the V-shaped grooves 5 a formed in the surface layer portions 5 s of both original glass plate laminates 5 are connected to each other, and the second blade 22 is made While rotating, the central portion 5c of the original glass plate laminate 5 is cut to cut (full cut) the original glass plate laminate 5. As a result, while manufacturing the glass plate laminate 6 from the original glass plate laminate 5, a chamfered portion is formed in the portion corresponding to the V-shaped groove 5 a for the manufactured glass plate laminate 6 2c, 3b.

Of course, the chamfering process may be performed as another process after the cutting process is completed. In this case, as shown in FIG. 10, the rotating chamfer 23 can be used for the chamfering process. In detail, the rotating grindstone 23 is provided with a pair of conical surface-shaped processing surfaces 23a which are inclined in opposite directions with respect to the thickness direction of the glass plate laminate 6 manufactured in the cutting process. The glass plate laminate 6 polished by the rotary grindstone 23 is ground into a shape imitating the processing surface 23a of the rotary grindstone 23. That is, the end surfaces of the glass plate 2 and the optical film 3 are formed with chamfered portions 2c and 3b at positions polished through the processed surface 23a. However, the chamfering process is divided into the first step of forming chamfered portions 2c, 3b on the end surface of one side of the main surface 2a side of the glass plate 2, and forming the chamfer on the end surface of the other main surface 2a side of the glass plate 2. The second project of the corners 2c and 3b is also acceptable.

As shown in FIG. 11, in the etching process, the glass plate laminate 6 having the chamfered portions 2 c and 3 b is immersed in the etching solution E. In this way, only the end of the glass plate 2 directly in contact with the etchant E is slowly etched, and the position of the end surface 2b of the glass plate 2 moves in the A direction. As a result, the optical film 3 is left as it is, and only the surface layer portion X2 (cross-hatched portion in the figure) of the end portion of the glass plate 2 is removed. At this time, the position of the end surface 2b changes, but the shape of the end surface 2b is substantially maintained. Therefore, after the etching process, the chamfered portion 2c of the glass plate 2 also remains. In addition, since the optical film 3 does not react with the etching solution E, the chamfered portion 3b of the optical film 3 after the etching process also remains. Along with this, as shown in FIG. 6, on both main surfaces 2a of the glass plate 2, an optical film 3 having an overflow portion 3a is formed, and at the same time, a chamfered portion 2c is formed on the glass plate 2 and the optical film 3. 3b's glass plate 2 with an optical film.

The removal thickness t4 in the planar direction by etching is preferably 1 μm to 0.1 mm, and more preferably 3 μm to 20 μm. This removed thickness t4 is preferably approximately the same as the overflow size t3 of the overflow portion 3a of FIG.

(Third Embodiment)
As shown in FIG. 12, the glass plate 1 with an optical film related to the third embodiment is different from the glass plate 1 with an optical film related to the first and second embodiments, and has an overflow portion 3a. The optical film 3 is formed only at the point of the main surface 2a on one side of the glass plate 2. However, in the illustrated example, although the chamfered portion is not provided, the chamfered portion as described in the second embodiment may be provided.

The overflow dimension t5 in the plane direction of the overflow portion 3a is preferably 1 μm to 0.1 mm, and more preferably 3 μm to 20 μm.

The manufacturing method of the glass plate 2 with an optical film thus constituted is sequentially provided with: a film forming process, a cutting process, and an etching process.

As shown in FIG. 13, in the film forming process, the optical film 3 is formed only on one main surface 4 a of the original glass plate 4 to manufacture the original glass plate laminate 5. The optical film 3 is formed over the entire main surface 4a of one side of the original glass plate 4.

In the cutting process, one or more glass plate laminates 6 (see FIG. 4) are manufactured from the original glass plate laminate 5 by the same method as in the first embodiment. However, in the manufactured glass plate laminate 6, the optical film 3 is formed only on one main surface 2 a of the glass plate 2.

As shown in FIG. 14, in the etching process, the glass plate laminate 6 is immersed in the etchant E. In this way, the end of the glass plate 2 directly in contact with the etching solution E and the main surface 2a on the side where the optical film 3 is not formed are slowly etched, and the end surface 2b of the glass plate 2 moves in the direction A while the main surface of the glass plate 2 The surface 2a moves in the direction B. As a result, the optical film 3 is left as it is, and the surface layer portion X3 (cross-hatched portion in the figure) and the surface layer portion X4 (cross-hatched portion in the figure) of the main surface 2a are removed at the end of the glass plate 2 ). Along with this, as shown in FIG. 12, the optical film-attached glass plate 2 formed with the optical film 3 having the overflow portion 3 a on only one main surface 2 a of the glass plate 2 is manufactured.

The removal thickness t6 in the planar direction by etching is preferably 1 μm to 0.1 mm, and more preferably 3 μm to 20 μm. This removed thickness t6 is preferably approximately the same as the overflow size t5 of the overflow portion 3a of FIG. In addition, the removed thickness t7 in the plate thickness direction by etching is preferably 1 μm to 0.1 mm, and more preferably 3 μm to 20 μm.

In this manufacturing method, only one of the main surfaces 2a of the glass plate 2 is protected by the optical film 3, and the thickness of the glass plate 2 changes during the etching process. Along with this, it is added to the processing of the end face of the glass plate 2 to allow the glass plate 2 to be thinned (thinned).

However, the present invention is not limited to those of the above-mentioned embodiments, but not limited to the above-mentioned functions and effects. The present invention can be modified in various ways without departing from the gist.

In the above embodiment, the case where the film forming process is performed before the cutting process has been described, but the film forming process may be performed after the cutting process (when performing the chamfering process is after the chamfering process).

In the above embodiment, the cutting process is omitted, and the optical film may be formed directly on the glass plate of the product size in the film forming process.

In the above embodiment, after the etching process, the optical film may be removed from the main surface of the glass plate.

In the above-described embodiment, in the cutting process, a jet of gas is applied to the cutting portion of the original glass plate laminate, and the laser is irradiated to melt the cutting portion by laser. In this case, by adjusting the amount or direction of gas injection, the cut end surface can be processed into a convex curved surface (for example, a circular arc surface). Along with this, if such a laser fuse is used, it can be chamfered simultaneously with the cutting.

In the above-mentioned embodiment, instead of immersing the entire glass plate laminate in an etching solution, for example, the etching solution is adhered to a part (eg, end surface) of the glass plate contained in the glass plate laminate by coating or the like, It is also possible to etch a part of the glass plate.

1‧‧‧ Glass plate with optical film

2‧‧‧Glass plate

2a‧‧‧Main surface

2b‧‧‧End

2c‧‧‧Chamfer

3‧‧‧Optical film

3a‧‧‧Overflow Department

3b‧‧‧Chamfer

4‧‧‧Original glass plate

5‧‧‧ original glass laminate

6‧‧‧Glass plate laminate

21‧‧‧First Blade

22‧‧‧second blade

23‧‧‧ Rotating grindstone

E‧‧‧Etching solution

FIG. 1 is a cross-sectional view showing a glass plate with an optical film according to the first embodiment.

Fig. 2 is a plan view showing a glass plate with an optical film according to the first embodiment.

3 is a cross-sectional view showing a film forming process included in the method for manufacturing a glass plate with an optical film according to the first embodiment.

4 is a plan view showing a cutting process included in the manufacturing method of the optical film-attached glass plate according to the first embodiment.

FIG. 5 is a cross-sectional view showing an etching process included in the method for manufacturing a glass plate with an optical film according to the first embodiment.

6 is a cross-sectional view showing a glass plate with an optical film according to the second embodiment.

7 is a cross-sectional view showing the state of the preliminary stage of the cutting process including the chamfering process included in the manufacturing method of the glass plate with an optical film according to the second embodiment.

8 is a cross-sectional view showing a state of an intermediate stage of a cutting process including a chamfering process included in the manufacturing method of a glass plate with an optical film according to the second embodiment.

9 is a cross-sectional view showing the state of the final stage of the cutting process including the chamfering process included in the manufacturing method of the glass plate with an optical film according to the second embodiment.

10 is a cross-sectional view showing a modification of the chamfering process included in the manufacturing method of the optical film-attached glass plate according to the second embodiment.

11 is a cross-sectional view showing an etching process included in the manufacturing method of the optical film-attached glass plate according to the second embodiment.

12 is a cross-sectional view showing a glass plate with an optical film according to the third embodiment.

13 is a cross-sectional view showing a film-forming process included in the method for manufacturing a glass plate with an optical film according to the third embodiment.

14 is a cross-sectional view showing an etching process included in the manufacturing method of the optical film-attached glass plate according to the third embodiment.

Claims (11)

A glass plate with an optical film, comprising: a glass plate having a pair of front and back main surfaces, an end surface connecting the ends of the pair of main surfaces, and an optical surface formed on at least one of the glass plates Membrane, its characteristics The optical film includes an overflow portion that extends outward from the end portion of the main surface of the glass plate. The glass plate with an optical film as recited in item 1 of the scope of the patent application, wherein the end surface has a chamfer, and the end surface has a portion located outside the overflow portion. The glass plate with an optical film as described in Item 1 or 2 of the patent application range, wherein the optical film is at least one of an anti-reflection film, an infrared shielding film, an ultraviolet shielding film, ultraviolet rays, and an infrared shielding film. The glass plate with an optical film as described in any one of claims 1 to 3, wherein the glass plate contains P ₂ O ₅ with a mass% of 25% or more in terms of composition. The glass plate with an optical film as described in any one of items 1 to 4 of the patent application scope, wherein the overflow size of the overflow portion is 1 μm to 0.1 mm. A method for manufacturing a glass plate with an optical film, comprising: a glass plate having a pair of front and back main surfaces, and an end surface connecting the ends of the pair of main surfaces, and the main surface formed on at least one of the glass plates The manufacturing method of the glass plate with optical film on the surface of the optical film is characterized by Provided with: a film forming process for forming the optical film on the main surface of at least one of the glass plates, An etching process of etching at least the end surface of the glass plate on which the optical film is formed by contacting with an etching solution; The glass plate is made of phosphate-based glass, and the etching solution is an alkaline detergent. The method for manufacturing a glass plate with an optical film as described in item 6 of the patent application scope, wherein the etching solution is an alkaline salt containing a chelating agent as the alkaline component, In the etching process, the glass plate forming the optical film is immersed in the etching solution. The method for manufacturing a glass plate with an optical film as described in item 6 or 7 of the patent application scope, wherein after the film forming process and before the etching process, a cutting process for cutting the glass plate is further provided , And the chamfering process of chamfering the end face of the glass plate. The method for manufacturing a glass plate with an optical film as described in item 8 of the patent application scope, wherein the cutting process also includes the chamfering process, and chamfering is performed simultaneously with the cutting of the glass plate. The method for manufacturing a glass plate with an optical film as described in any one of claims 6 to 9 in the patent application range, wherein the optical film is formed only on the main surface of one of the glass plates. The method for manufacturing a glass plate with an optical film as described in any one of claims 6 to 9 in the patent application range, wherein the optical film is formed on the main surfaces of both the glass plates.