TWI730251B - Glass plate with optical film and its manufacturing method - Google Patents

Abstract

The present invention is a glass plate with an optical film and a method of manufacturing the same, including: glass having a pair of front and back main surfaces (2a) and an end surface (2b) connecting the ends of each pair of main surfaces (2a) The glass plate (1) with the optical film of the plate (2) and the optical film (3) formed on both the main surfaces (2a) of the glass plate (2). The optical film (3) is provided with an overflow portion (3a) that extends beyond the main surface (2a) of the glass plate (2) and extends outward.

Description

Glass plate with optical film and its manufacturing method

The present invention relates to a glass plate with an optical film and a manufacturing method thereof.

The spectral sensitivity of solid-state imaging elements such as CCD or CMOS used in digital cameras or camcorders is highly sensitive to light in the near-infrared region. Generally, it is for the spectral sensitivity of such solid-state imaging elements Those who use the visual sensitivity correction component according to the human visual sensitivity characteristics.

As the visual sensitivity correction member, as disclosed in Patent Document 1, for example, a glass plate with an optical film formed on the main surface of the glass plate with an optical film having an infrared shielding function is used. In addition, in order to prevent reflection on the surface of the glass plate, an optical film with anti-reflection function may be formed. [Prior Technical Literature] [Patent Literature]

[Patent Document 1] International Publication No. 2013/077375

[The problem to be solved by the invention]

However, along with the miniaturization of solid-state imaging devices, the miniaturization of glass plates with optical films used has also progressed. Along with this, in order to effectively use the limited area of the glass plate with optical film, it is often required to have uniform optical characteristics up to the vicinity of the end of the main surface of the glass plate.

However, it is customary for the glass plate with optical film to be manufactured after the optical film is formed on the main surface of the original glass plate of the large plate, and then cut to a specific size by a cutting device. On the main surface of the glass plate Film peeling of the optical film accompanied by cutting is likely to occur near the end. When the optical film is not formed near the end of the main surface of the glass plate through such film peeling, the required optical characteristics cannot be sufficiently achieved, and the performance of the glass plate with the optical film may be reduced.

The subject of the present invention is to provide a glass plate with an optical film that reliably forms an optical film near the end of the main surface of the glass plate. To solve the problem

The present invention invented in order to solve the above-mentioned problems is a glass plate having a pair of front and back main surfaces, an end surface connecting the ends of each pair of main surfaces, and an optical film formed on at least one main surface of the glass plate. The glass plate with optical film is characterized in that the optical film is provided with an overflow part that extends beyond the main surface of the glass plate and extends outward. According to such a configuration, the optical film is formed on a wider area than the main surface of the glass plate via the overflow portion, and the optical film is reliably formed near the end of the main surface of the glass plate. However, since the overflow portion is in a state of protruding outward, it is difficult for other members to directly contact the end surface of the glass plate. Along with this, the effect of reducing dust or damage from the end surface of the glass plate can also be expected.

In the above-mentioned configuration, the end surface of the glass plate is used as a chamfer, and the end surface may have a part located outside the overflow portion of the optical film.

In the above configuration, the optical film is preferably at least one of an antireflection film, an infrared shielding film, an ultraviolet shielding film, an ultraviolet and an infrared shielding film. In this case, as the optical film system, for example, a dielectric multilayer film formed by alternately laminating a high refractive index layer and a low refractive index layer can be used.

_{In the above-mentioned structure, the glass plate contains P 2} O ₅ with a mass% of 25% or more in terms of composition.

In the above configuration, the overflow size of the overflow portion of the optical film is 1 μm to 0.1 mm.

The present invention invented to solve the above-mentioned problems is provided with: a glass plate having a pair of front and back main surfaces and an end surface connecting the ends of the respective pair of main surfaces, and an optical film formed on at least one main surface of the glass plate The method for manufacturing a glass plate with an optical film is characterized by: forming an optical film on the main surface of at least one of the glass plates, and contacting at least the end surface of the glass plate with the optical film in contact with the etching solution In the etching process for etching, the glass plate is made of phosphate-based glass, and the etching solution is alkaline detergent. According to such a configuration, in the etching process, only the glass plate reacts with the etching solution, and the optical film system does not react with the etching solution. As a result, when focusing on the end of the glass plate, only the end of the glass plate is removed by the etching solution, and the optical film is left over the end of the main surface of the glass plate and protrudes outward. Along with this, the optical film is formed on a wider area than the main surface of the glass plate through this overflow portion, and the optical film is surely formed near the end of the main surface of the glass plate.

In the above-mentioned configuration, the etching solution is an alkaline salt containing a chelating agent as an alkaline component. In the etching process, the glass plate forming the optical film is preferably immersed in the etching solution.

In the above-mentioned configuration, after the film formation process and before the etching process, there is a cutting process for cutting the glass plate and a chamfering process for chamfering the end surface of the glass plate.

In this case, the cutting process is also a chamfering process, and the chamfering can be performed at the same time as the cutting of the glass plate.

In the above-mentioned configuration, the optical film system may be formed only on the main surface of one of the glass plates.

In the above-mentioned structure, the optical film may be formed on both main surfaces of the glass plate. Invention effect

According to the present invention, it is possible to provide an optical film-attached glass plate with an optical film in the vicinity of the end of the main surface of the glass plate.

Hereinafter, the glass plate with optical film and its manufacturing method related to this embodiment will be described with reference to the drawings.

(First Embodiment) As shown in Figs. 1 and 2, the glass plate 1 with optical film related to the first embodiment includes: a glass plate 2, and an optical film 3, such as a visual sensitivity correction member or cover glass used in a solid-state image sensor Wait.

The glass plate 2 is equipped with the main surface 2a of a pair of front and back, and the end surface 2b which connects the edge part of each two main surface 2a. The glass plate 2 is formed in a quadrangular shape, but it is not limited to this shape, and for example, it may be a triangle or a polygonal shape of a pentagonal shape or more, a circular shape, or the like. In the present embodiment, the end surface 2b is formed on each side of the rectangular glass plate 2 so as to be slightly orthogonal to the main surface 2a.

The thickness of the glass plate 2 is desirably 0.4 mm or less, 0.3 mm or less, and 0.2 mm or less. It is more desirably 0.19 mm or less, still more desirably 0.15 mm or less, and particularly desirably 0.12 mm or less. On the other hand, the thickness of the glass plate 2 is preferably 0.05 mm or more, and more preferably 0.08 mm or more.

In the area of each major surface of the glass plate based 2a 2 may be of a 1mm ² were less than 25000mm ^2. Range over the area of the line of each main surface 2a 3mm ² or less than ² 25000mm, more preferably ² or more and ² or less 25000mm 9mm, more preferably have ² to 15mm ² or less than 25000mm, more particularly preferably ² to 20mm ² or less 25000mm.

The surface roughness Ra of the end surface 2b of the glass plate 2 is preferably 0.1 nm to 10 nm.

The glass plate 2 contains P ^{5+ 5-50} %, Al ^{3+ 2-30} %, R' ⁺ (R' is at least one selected from Li, Na and K) 10～ 50%, and R ²⁺ (R ²⁺ is selected from at least one of Mg ²⁺ , Ca ²⁺ , Sr ²⁺ , Ba ²⁺ and Zn ²⁺ ) 20-50%, Cu ²⁺ 0.5-15% It is displayed as anion %, and contains F ^- 5～80%, and O ^2- 20～95%.

The glass plate 2 is added to the above composition, and it is shown as an anion %, and a composition containing 5 to 80% of ^{F-is also acceptable.}

It is more ideal to be usable as the glass plate 2 series. In terms of composition, it is shown in cationic %, and contains P ⁵⁺ 40-50%, Al ^{3+ 7-12} %, K ⁺ 15-25%, Mg ^{2+ 3-12} %, Ca ²⁺ 3～6%, Ba ²⁺ 7～12%, Cu ²⁺ 1～15%, and displayed as anion%, containing F ^- 5～80%, and O ^2-20 ～95% phosphoric acid Salt glass person.

As an ideal other composition of the glass plate 2 series can be used in cationic% display, containing P ⁵⁺ 20～35%, Al ³⁺ 10～20%, Li ⁺ 20～30%, Na ⁺ 0～10%, Mg ^{2 +} 1～8%, Ca ²⁺ 3～13%, Sr ²⁺ 2～12%, Ba ²⁺ 2～8%, Zn ²⁺ 0～5%, Cu ²⁺ 0.5～5%, and anion% Display, containing F ^- 30 ~ 65%, and O ^2-35 ~ 75% of fluorophosphate glass.

As an ideal other composition glass plate 2 series can be used, shown in cationic %, containing P ⁵⁺ 35～45%, Al ³⁺ 8～12%, Li ⁺ 20～30%, Mg ²⁺ 1～5%, Ca ²⁺ 3～6%, Ba ²⁺ 4～8%, Cu ²⁺ 1～6%, and displayed as anion%, containing F ^- 10～20%, and O ^2- 75～95% fluorophosphate glass By.

As an ideal other composition of the glass plate 2 series can be used in cationic% display, containing P ⁵⁺ 30～45%, Al ³⁺ 15～25%, Li ⁺ 1～5%, Na ⁺ 7～13%, K ⁺ 0.1～5%, Mg ²⁺ 1～8%, Ca ²⁺ 3～13%, Ba ²⁺ 6～12%, Zn ²⁺ 0～7%, Cu ²⁺ 1～5%, and displayed as anion% , Containing F ^- 30 ~ 45%, and O ^2-50 ~ 70% of fluorophosphate glass.

In the following, the glass plate 2 shows an example of the case of phosphate-based glass superior in infrared absorption function.

It is preferable that the phosphate-based glass used for the glass plate 2 does not substantially contain F (fluorine). Here, "substantially not contained" means: it means that 0.1% or less of fluorine may be contained in mass %.

As such a phosphate-based glass system, for example, a structure containing 25% by mass or more of P ₂ O ₅ can be used. Specifically, it can be used in mass%, containing P ₂ O ₅ 25-60%, Al ₂ O ₃ 2-19%, RO (but R is selected from at least one of Mg, Ca, Sr and Ba) 5-45% , ZnO 0～13%, K ₂ O 8～20%, Na ₂ O 0～12%, and CuO 0.3～20%, and the glass does not contain fluorine substantially.

P ₂ O ₅ is a component that forms the glass skeleton. The content of P ₂ O ₅ is in mass %, and is desirably 25-60%, more desirably 30-55%, and still more desirably 40-50%. When the content of P ₂ O ₅ is too small, vitrification may become unstable. On the other hand, _{when the content of P 2} O ₅ is too large, the weather resistance may easily decrease.

Al ₂ O ₃ is a further component that improves weather resistance. The content of Al ₂ O ₃ is in mass %, desirably 2-19%, more desirably 2-15%, more desirably 2.8-14.5%, particularly desirably 3.5-14.0%. When the content of Al ₂ O ₃ is too small, the weather resistance may be insufficient. On the other hand, _{when the content of Al 2} O ₃ is too large, the meltability may decrease and the melting temperature may increase. However, when the melting temperature rises, Cu ions are reduced to easily ^{shift from Cu 2+} to Cu ⁺ , and it may be difficult to obtain desired optical properties. Specifically, there are cases where the light transmittance in the near-ultraviolet to the visible range decreases, and the infrared absorption characteristics tend to decrease.

RO (but R is selected from at least one of Mg, Ca, Sr, and Ba) is a component that improves weather resistance and meltability. The content of RO is in mass %, ideally 5 to 45%, more preferably 7 to 40%, and still more preferably 10 to 35%. When the content of RO is too small, weather resistance and melting properties may be insufficient. On the other hand, when the content of RO is too much, the stability of the glass is likely to decrease, and the crystals caused by the RO component are likely to precipitate.

However, the ideal range of the content of each component of RO is as follows.

MgO is a component that improves weather resistance. The content of MgO is in mass %, ideally 0-15%, more desirably 0-7%. When the content of MgO is too much, the stability of the glass tends to decrease.

CaO is a component that improves weather resistance similarly to MgO. The content of CaO is in mass %, preferably 0-15%, more preferably 0-7%. When the content of CaO is too much, the stability of the glass is likely to decrease.

SrO is a component that improves weather resistance similarly to MgO. The content of SrO is in mass %, preferably 0-12%, more preferably 0-5%. When the content of SrO is too much, the stability of the glass tends to decrease.

BaO is a component that stabilizes the glass and improves the weather resistance. The content of BaO is based on mass %, and is desirably 1-30%, more desirably 2-27%, and still more desirably 3-25%. When the content of BaO is too small, the glass cannot be sufficiently stabilized and the weather resistance cannot be sufficiently improved. On the other hand, when the content of BaO is too large, crystals caused by BaO may easily precipitate during molding.

ZnO is a component that improves the stability and weather resistance of glass. The content of ZnO is in mass %, ideally 0-13%, more desirably 0-12%, and still more desirably 0-10%. When the content of ZnO is too large, the melting property may decrease and the melting temperature may increase, and as a result, it may be difficult to obtain the desired optical properties. In addition, the stability of the glass is reduced, and the crystals caused by the ZnO component are likely to precipitate.

As mentioned above, RO and ZnO have the effect of improving the stability of the glass, especially when P ₂ O _{5 is} low, the effect is easy to enjoy.

However, for the ratio of the content of RO in terms of P ₂ O ₅ (P ₂ O ₅ / RO) over the lines 1.0 to 1.9, and more preferably from 1.2 to 1.8. When the ratio (P ₂ O ₅ /RO) is too small, the liquidus temperature may increase and the devitrification caused by RO may be easily precipitated. On the other hand, when P ₂ O ₅ /RO is too large, the weather resistance tends to decrease.

K ₂ O is a component that lowers the melting temperature. The content of K ₂ O is in mass %, ideally 8-20%, more preferably 12.5-19.5%. When _{the content of K 2} O is too small, the melting temperature may increase and it may be difficult to obtain the desired optical properties. On the other hand, _{when the content of K 2} O is too large, _{crystals caused by K 2} O are likely to be precipitated during molding, and vitrification becomes unstable.

Na ₂ O is also a component that lowers the melting temperature, similarly to _{K 2 O.} The Na ₂ O content is in mass %, preferably 0 to 12%, more preferably 0 to 7%. When the content of Na ₂ O is too much, it may become unstable due to vitrification.

CuO is a component for absorbing near-infrared rays. The content of CuO is in mass %, ideally 0.3 to 20%, more preferably 0.3 to 15%, and still more preferably 0.4 to 13%. When the content of CuO is too small, there are cases where the desired near-infrared absorption characteristics cannot be obtained. On the other hand, when the content of CuO is too large, the light transmittance from ultraviolet to visible range may be easily reduced. In addition, vitrification may become unstable. However, in order to obtain the desired optical properties, the CuO content is preferably adjusted appropriately via the plate thickness.

_{In addition to the above components, B 2} O ₃ , Nb ₂ O ₅ , Y ₂ O ₃ , La ₂ O ₃ , Ta ₂ O ₅ , CeO ₂ or Sb ₂ O are contained within a range that does not impair the effects of the present invention. ₃ grades are also possible. Specifically, the content of these components is in mass %, preferably 0 to 3%, more preferably 0 to 2%.

By using the glass plate 2 as the above composition, both a higher light transmittance in the visible range and a higher light absorption characteristic in the infrared range can be achieved. Specifically, the light transmittance at a wavelength of 400 nm is desirably 78% or more, and more desirably 80% or more, and the light transmittance at a wavelength of 500 nm is desirably 83% or more, and more desirably 85% or more. On the other hand, the light transmittance at a wavelength of 700 nm is desirably 12% or more, and more desirably 9% or less, and the light transmittance at a wavelength of 800 nm is desirably 5% or less, and more desirably 3% or less.

The glass plate 2 of the above composition is formed into a plate shape by, for example, a casting method, a slide-out method, a downward drawing method, a redrawing method, a float method, an overflow method, and other forming methods.

The optical film 3 is each formed on the main surface 2a of both sides of the glass plate 2 in this embodiment. The optical film 3 is provided with an overflow portion 3a that extends beyond the main surface 2a of the glass plate 2 and extends outward.

The overflow portion 3a extends to the outside along the main surface 2a of the glass plate 2, and the front end of the overflow portion 3a is separated from the end surface 2b of the glass plate 2. However, the overflow part 3a does not necessarily have to be parallel to the main surface 2a of the glass plate 2, and the front end may be inclined as a hanging or the like. In addition, even if a part of the base end portion of the overflow portion 3a is in contact with the end surface 2b of the glass plate 2, there is no effect.

The overflow portion 3a is formed in a frame shape to surround the entire circumference of the main surface 2a of the glass plate 2 (refer to the cross-hatched portion in FIG. 2).

The overflow size t1 in the plane direction of the overflow portion 3a is preferably 1 μm to 0.1 mm, and more preferably 3 μm to 20 μm. If it is such an overflow size, the overflow portion 3a is in a state that fully protrudes from the outside, and other components are not easy to directly contact the end surface 2b of the glass plate 2, which can reduce the dust from the end surface 2b of the glass plate 2. Or broken.

The thickness of the optical film 3 is thinner than the thickness of the glass plate 2, and it is preferably less than 10 μm. More preferably, it is 7 μm or less. On the other hand, the thickness of the optical film 3 is preferably 0.1 μm or more, and more preferably 0.2 μm or more.

The optical film 3 is a structure suitably selected according to the application, and for example, functional films such as antireflection film (AR film), infrared shielding film (IR shielding film), ultraviolet shielding film, ultraviolet and infrared shielding film can be cited. In addition, the optical film 3 system may have both functions of an antireflection film and an infrared shielding film. For the optical film 3 having such a function, for example, a dielectric multilayer film formed by alternately laminating a low refractive index layer and a high refractive index layer can be used. As the low refractive index layer, a silicon oxide film or the like is used. As the high refractive index layer system, a metal oxide film made of at least one selected from tantalum oxide, niobium oxide, titanium oxide, hafnium oxide, silicon nitride, and zirconium oxide is used. However, the optical film 3 formed on the main surface 2a of one side of the glass plate 2 and the optical film 3 formed on the main surface 2a of the other side of the glass plate 2 may be films having the same function but different functions. Membrane is also possible. Specifically, the composition of the glass plate 2 with the optical film is, for example, anti-reflection film/glass plate/anti-reflection film, anti-reflection film/glass plate/infrared shielding film, infrared shielding film/glass plate/infrared shielding film, Infrared shielding film/glass plate/ultraviolet and infrared shielding film, etc.

If it is the glass plate 2 with an optical film provided with the above structure, the optical film 3 will be in the state formed in the range wider than the main surface 2a of the glass plate 2 via the overflow part 3a. Accordingly, the optical film 3 can be reliably formed near the end of the main surface 2a of the glass plate 2.

Next, the manufacturing method of the glass plate 2 with an optical film concerning 1st Embodiment is demonstrated.

This manufacturing method includes a film forming process, a cutting process, and an etching process in sequence. In this embodiment, as shown in Figs. 3 and 4, it is shown that the original glass plate laminate 5 including the original glass plate 4 of the large plate adopts a plurality of glass plate laminates 6 including the glass plates 2 of the product size. , An example of so-called chamfering. Of course, for the purpose of trimming, etc., one glass plate laminate 6 may be taken from the original glass plate laminate 5. However, in this manufacturing method, the original glass plate laminate 5 → the glass plate laminate 6 → the optical film-attached glass plate 1 is manufactured in the order.

As shown in FIG. 3, in the film forming process, the optical film 3 is formed on both main surfaces 4a of the original glass plate 4 of a large plate, and the original glass plate laminate 5 is manufactured. The optical film 3 is formed on the entire surface of each main surface 4a of the original glass plate 4. The optical film 3 is formed using, for example, a vacuum vapor deposition method, a sputtering method, or the like.

As shown in FIG. 4, in the cutting process, for example, the original glass plate laminate 5 is cut into a checkerboard shape, and a plurality of glass plate laminates 6 are manufactured. In the example shown in the figure, nine glass plate laminates 6 are taken from one original glass plate laminate 5. The cutting method of the original glass plate laminate 5 is not particularly limited, but, for example, mechanical cutting via a blade of a cutting device, folding cutting, laser cutting, laser fusing, etc. can be used.

As shown in FIG. 5, in the etching process, the glass plate laminated body 6 is immersed in the etching liquid E accommodated in the etching tank (not shown), and it etches.

The etching solution E is composed of the above-mentioned phosphate-based glass for the glass plate 2 contained in the glass plate laminate 6, and is constituted by, for example, an alkaline detergent. Phosphate-based glasses have lower alkali resistance than other glasses such as fluorophosphate-based glasses. The alkaline detergent is not particularly limited, but for example, alkaline components such as Na and K, or surfactants such as triethanolamine, benzyl alcohol, or ethylene glycol, or detergents containing water or alcohol can be used.

As the alkaline component contained in the alkaline detergent, one containing an alkali metal salt of a chelating agent such as an amino polycarboxylic acid is preferred. Examples of the alkali metal salt of amino polycarboxylic acid include sodium and potassium salts of diethyltriaminepentaacetic acid, ethylenediaminetetraacetic acid, triethylenetetraaminehexaacetic acid, nitrilotriacetic acid, and the like. Among them, pentasodium diethyltriaminepentaacetic acid, tetrasodium ethylenediaminetetraacetate, hexasodium triethylenetetraaminehexaacetate, and trisodium nitrotriacetate are ideally used, and diethyltriaminepentaacetic acid pentasodium is particularly desirable. sodium.

The etching solution E reacts with the glass plate 2 but does not substantially react with the optical film 3. In this embodiment, the glass plate 2 contained in the glass plate laminate 6 is formed with the optical films 3 on both main surfaces 2a, and when the glass plate laminate 6 is immersed in the etching solution E, Only the end of the glass plate 2 is in direct contact with the etching solution E and reacts. Along with this, only the end of the glass plate 2 is slowly etched by the etching solution E, and the position of the end surface 2b of the glass plate 2 moves in the A direction. As a result, the optical film 3 remains in its original state, and only the surface layer part X1 (cross-hatched part in FIG. 5) at the end of the glass plate 2 is removed. Subsequently, as shown in FIG. 1, a glass plate 2 with an optical film in which an optical film 3 having an overflow portion 3 a is formed on both main surfaces 2 a of the glass plate 2 is manufactured.

The removal thickness t2 in the plane direction by etching is preferably 1 μm to 0.1 mm, and more preferably 3 μm to 20 μm. The removal thickness t2 is preferably approximately the same as the overflow size t1 of the overflow portion 3a in FIG. 1.

In this manufacturing method, in the state of the glass plate laminate 6, the main surfaces 2a of the glass plate 2 are protected via the optical film 3. Therefore, the thickness of the glass plate 2 can be changed without changing the thickness of the glass plate 2 in the etching process. Those who process the end face of the glass plate 2.

(Second Embodiment) As shown in Fig. 6, the glass plate 1 with optical film related to the second embodiment is different from the glass plate 1 with optical film related to the first embodiment. The end face 2b of the glass plate 2 is used as a chamfer. Point.

The end surface 2b of the glass plate 2 is part of the range of the main surface 2a side of both sides, and has the chamfered part 2c formed by the inclined plane inclined with respect to the main surface 2a. It is preferable that the inclination angle θ of the main surface 2a of the chamfered portion 2c is 20°-60°. However, the shape of the chamfered portion 2c is not particularly limited. For example, it may be formed from a convex curved surface (a circular arc surface or an elliptical arc surface) or a composite plane connecting plural planes with different inclination angles. In addition, the entire end surface 2b of the glass plate 2 may be a convex curved surface, etc., and a chamfered portion may be provided in the entire end surface 2b.

When the chamfered portion 2c is formed on the end surface 2b of the glass plate 2, the end surface 2b may be located at the portion Y (the cross-hatched portion in FIG. 6) outside the overflow portion 3a of the optical film 3. In this case, other components are easily in direct contact with the end surface 2b of the glass plate 2, but the mechanical strength of the end surface 2b is increased through the chamfered portion 2c, and dust or dust from the end surface 2b of the glass plate 2 can be reduced. damaged. However, when the protruding part Y is provided, since the overflow size t3 of the overflow portion 2 can be reduced, the etching time of the etching process described later can be shortened, and the manufacturing efficiency can be improved. Of course, the protruding part Y may not be provided.

In this embodiment, a chamfered portion 3b is formed at the tip of the overflow portion 3a of the optical film 3. The shape of the chamfered portion 3b is not particularly limited, but the same shape as the chamfered portion 2c of the glass plate 2 can be selected. However, the chamfered portion 3b of the optical film 3 is omitted, and only the chamfered portion 2c of the glass plate 2 may be provided.

The overflow size t3 in the plane direction of the overflow portion 3a is preferably 1 μm to 0.1 mm, and more preferably 3 μm to 20 μm.

Next, the manufacturing method of the glass plate 2 with an optical film concerning 2nd Embodiment is demonstrated.

This manufacturing method includes a film forming process, a cutting process, a chamfering process, and an etching process in sequence. In this embodiment, the cutting process is combined with the chamfering process, and an example of chamfering is shown in the process of cutting the original glass plate laminate 5.

In the film forming process, the original glass plate laminate 5 is manufactured through the same method as in the first embodiment (see FIG. 3).

The cutting process is equipped with: as shown in Figs. 7 and 8, the first cutting edge 21 of the cutting device cuts the first surface layer 5s of the original glass plate laminate 5 near the main surface 4a of the original glass plate 4 The process is the second process of cutting the central portion 5c of the original glass plate laminate 5 remaining uncut in the first process via the second blade 22 of the cutting device as shown in FIG. 9.

As shown in FIGS. 7 and 8, the first blade 21 is a disk-shaped rotatably held, and has a cutting blade 21a on its peripheral edge. The cutting edge 21a has a pair of inclined surfaces 21b that are inclined in opposite directions to each other in a V-shaped convex portion.

As shown in Fig. 9, the second blade 22 can also be rotatably held in a disc shape, and has a cutting blade 22a on its peripheral edge. The second blade 22 is thinner than the first blade 21. The shape of the cutting edge 22a is a shape that can cut the original glass plate laminate 5 within the thickness range of the second blade 22, and is not particularly limited. However, instead of the second blade 22, cutting by laser irradiation may be used.

In the first process, first, as shown in FIG. 7, while the first cutting edge 21 is rotated, the surface portion 5s of one side of the original glass plate laminate 5 is cut to cut the surface layer of one side of the original glass plate laminate 5. The portion 5s forms a V-shaped groove 5a corresponding to the shape of the cutting blade 21a. After that, as shown in FIG. 8, the original glass plate laminate 5 formed with the grooves 5a is reversed on the front and back, the first blade 21 is rotated, and the other surface layer portion 5s of the original glass plate laminate 5 is cut. For the other surface layer portion 5s of the original glass plate laminate 5, a V-shaped groove 5a corresponding to the shape of the cutting blade 21a is also formed. Next, in the second process, as shown in FIG. 9, the groove bottoms of the V-shaped grooves 5a that connect the surface layer portions 5s formed on both sides of the original glass plate laminate 5 are connected to each other, so that the second blade 22 While rotating, the central portion 5c of the original glass plate laminate 5 is cut, and the original glass plate laminate 5 is cut (fully cut). As a result, while the glass plate laminate 6 is manufactured from the original glass plate laminate 5, a chamfered portion is formed at the portion of the manufactured glass plate laminate 6 corresponding to the V-shaped groove 5a 2c, 3b.

Of course, the chamfering process may be performed as another process after the cutting process is completed. In this case, as shown in FIG. 10, the chamfering process can be performed using the rotating grindstone 23. In detail, the rotating grindstone 23 is equipped with the processing surface 23a of a pair of conical surface shape which has mutually inclination in the thickness direction of the glass plate laminated body 6 manufactured in a cutting process. The glass plate laminate 6 polished by the rotating grindstone 23 is polished into a shape imitating the processing surface 23a of the rotating grindstone 23. That is, the end surfaces of the glass plate 2 and the optical film 3 are formed with chamfered portions 2c and 3b at positions polished through the processing surface 23a. However, the chamfering process is divided into the first process of forming chamfered portions 2c and 3b on the end surface on the main surface 2a side of one of the glass plate 2, and the first process in which the end surface on the main surface 2a side of the glass plate 2 is formed inverted. The second project of the corners 2c, 3b is also possible.

As shown in FIG. 11, in the etching process, the glass plate laminate 6 in which the chamfered parts 2c and 3b are formed is immersed in the etching liquid E. As shown in FIG. In this way, only the end of the glass plate 2 that is in direct contact with the etching solution E is slowly etched, and the position of the end surface 2b of the glass plate 2 moves in the A direction. As a result, the optical film 3 remains in a state of remaining, and only the surface layer part X2 (cross-hatched part in the figure) at the end of the glass plate 2 is removed. At this time, the position of the end surface 2b is changed, but the shape of the end surface 2b is substantially maintained. Therefore, after the etching process, the chamfered portion 2c of the glass plate 2 also remains. In addition, since the optical film 3 does not react with the etching solution E, the chamfered portion 3b of the optical film 3 after the etching process also remains. Subsequently, as shown in FIG. 6, the optical film 3 having the overflow portion 3a is formed on the main surfaces 2a of both the glass plate 2 and the chamfered portion 2c is formed on the glass plate 2 and the optical film 3. 3b Glass plate 2 with optical film.

The removal thickness t4 in the plane direction by etching is preferably 1 μm to 0.1 mm, and more preferably 3 μm to 20 μm. The removal thickness t4 is preferably approximately the same as the overflow size t3 of the overflow portion 3a in FIG. 6.

(Third Embodiment) As shown in Fig. 12, the glass plate 1 with optical film related to the third embodiment is different from the glass plate 1 with optical film related to the first and second embodiments in that it has an overflow portion 3a. The optical film 3 is formed only at a point on the main surface 2a of one side of the glass plate 2. However, in the example shown in the figure, the chamfered portion is not provided, but the chamfered portion described in the second embodiment may be provided.

The overflow size t5 in the plane direction of the overflow portion 3a is preferably 1 μm to 0.1 mm, and more preferably 3 μm to 20 μm.

The manufacturing method of the optical film-attached glass plate 2 constructed in this way is provided in sequence: a film forming process, a cutting process, and an etching process.

As shown in FIG. 13, in the film forming process, the optical film 3 is formed only on the main surface 4a of one side of the original glass plate 4, and the original glass plate laminate 5 is manufactured. The optical film 3 is formed on the entire surface of the main surface 4 a of one side of the original glass plate 4.

In the cutting process, one or a plurality of glass plate laminates 6 are produced from the original glass plate laminate 5 by the same method as in the first embodiment (see FIG. 4). However, in the manufactured glass plate laminate 6, the optical film 3 is formed only on the main surface 2 a of one of the glass plates 2.

As shown in FIG. 14, in the etching process, the glass plate laminated body 6 is immersed in the etching liquid E. As shown in FIG. In this way, the end of the glass plate 2 directly in contact with the etching solution E and the main surface 2a on the side where the optical film 3 is not formed are slowly etched, and the end surface 2b of the glass plate 2 moves in the A direction at the same time, the main surface of the glass plate 2 The surface 2a moves in the B direction. As a result, the optical film 3 remains in a state of remaining, and the surface portion X3 (cross-hatched portion in the figure) of the end of the glass plate 2 and the surface portion X4 (cross-hatched portion in the figure) of the main surface 2a are removed. ). Then, as shown in FIG. 12, the glass plate 2 with the optical film which formed the optical film 3 which has the overflow part 3a only on the main surface 2a of the glass plate 2 was manufactured.

The removal thickness t6 in the plane direction by etching is preferably 1 μm to 0.1 mm, and more preferably 3 μm to 20 μm. It is preferable that the removal thickness t6 is approximately the same as the overflow size t5 of the overflow portion 3a in FIG. 12. In addition, the removal thickness t7 in the plate thickness direction by etching is preferably 1 μm to 0.1 mm, and more preferably 3 μm to 20 μm.

In this manufacturing method, since only the main surface 2a of one side of the glass plate 2 is protected by the optical film 3, the thickness of the glass plate 2 changes during an etching process. In addition, the end face processing of the glass plate 2 can be used to thin the glass plate 2 (thinning).

However, the present invention is not limited to the constitution of the above-mentioned embodiment, and is not limited to the above-mentioned function and effect. The present invention can be modified in various ways without departing from its gist.

In the above-mentioned embodiment, the case where the film forming process is performed before the cutting process has been described, but the film forming process may be performed after the cutting process (when the chamfering process is performed, it is after the chamfering process).

In the above embodiment, the cutting process is omitted, and the optical film may be directly formed into a glass plate in the product size during the film forming process.

In the above embodiment, after the etching process, the optical film may be removed from the main surface of the glass plate.

In the above-mentioned embodiment, in the cutting process, the cutting part of the original glass plate laminate may be sprayed with a gas while irradiating a laser to laser-fuse the cutting part. In this case, by adjusting the gas injection amount or injection direction, the cut end surface can be processed into a convex curved surface (for example, a circular arc surface). Then, using such a laser fusing, it is also possible to perform chamfering at the same time as the cutting.

In the above embodiment, instead of immersing the entire glass plate laminate in the etching solution, for example, by coating or the like, the etching solution is attached to a part (for example, the end surface) of the glass plate contained in the glass plate laminate. It is also possible to etch a part of the glass plate.

1‧‧‧Glass plate with optical film 2‧‧‧Glass plate 2a‧‧‧Main surface 2b‧‧‧end face 2c‧‧‧Chamfer 3‧‧‧Optical film 3a‧‧‧Overflow 3b‧‧‧Chamfer 4‧‧‧Original glass plate 5‧‧‧Laminated original glass plate 6‧‧‧Glass plate laminate 21‧‧‧First Blade 22‧‧‧Second Blade 23‧‧‧Rotating Millstone E‧‧‧Etching solution

Fig. 1 is a cross-sectional view showing a glass plate with an optical film according to the first embodiment. Fig. 2 is a plan view showing a glass plate with an optical film according to the first embodiment. Fig. 3 is a cross-sectional view showing the film forming process included in the manufacturing method of the optical film-attached glass plate related to the first embodiment. 4 is a plan view showing the cutting process included in the manufacturing method of the optical film-attached glass plate related to the first embodiment. 5 is a cross-sectional view showing the etching process included in the manufacturing method of the optical film-attached glass plate related to the first embodiment. Fig. 6 is a cross-sectional view showing a glass plate with an optical film according to the second embodiment. Fig. 7 is a cross-sectional view showing the preliminary stage state of the cutting process including the chamfering process in the manufacturing method of the optical film-attached glass plate included in the second embodiment. Fig. 8 is a cross-sectional view showing an intermediate stage state of the cutting process including the chamfering process included in the manufacturing method of the optical film-attached glass plate related to the second embodiment. Fig. 9 is a cross-sectional view showing the final stage state of the cutting process including the chamfering process included in the manufacturing method of the optical film-attached glass plate related to the second embodiment. 10 is a cross-sectional view showing a modification of the chamfering process included in the manufacturing method of the optical film-attached glass plate related to the second embodiment. 11 is a cross-sectional view showing the etching process included in the manufacturing method of the optical film-attached glass plate related to the second embodiment. Fig. 12 shows a cross-sectional view of a glass plate with an optical film according to the third embodiment. FIG. 13 is a cross-sectional view showing the film forming process included in the manufacturing method of the optical film-attached glass plate related to the third embodiment. 14 is a cross-sectional view showing the etching process included in the manufacturing method of the optical film-attached glass plate related to the third embodiment.

1‧‧‧Glass plate with optical film

2‧‧‧Glass plate

2a‧‧‧Main surface

2b‧‧‧end face

3‧‧‧Optical film

3a‧‧‧Overflow

Claims (11)

A glass plate with an optical film, comprising: a glass plate having a pair of front and back main surfaces, and an end surface connecting the ends of each of the pair of main surfaces, and an optics formed on the main surface of at least one of the glass plates The film is characterized in that the optical film system is provided with an overflow portion extending outward beyond the end portion of the main surface of the glass plate, and the front end of the overflow portion protrudes outward from the end surface. For example, the glass plate with optical film described in item 1 of the scope of patent application, wherein the aforementioned end surface is chamfered. For the glass plate with optical film described in item 1 or item 2 of the scope of patent application, the optical film is at least one of antireflection film, infrared shielding film, ultraviolet shielding film, ultraviolet and infrared shielding film. For example, the glass plate with optical film described in item 1 or item 2 of the scope of patent application, wherein the aforementioned glass plate contains 25% or more of P ₂ O _{5 by} mass in terms of composition. For example, the glass plate with optical film described in item 1 or item 2 of the scope of patent application, wherein the overflow size of the aforementioned overflow part is 1μm~0.1mm. A method of manufacturing a glass plate with an optical film, comprising: a glass plate having a pair of front and back main surfaces, and an end surface connecting the ends of the pair of main surfaces, and the main body formed on at least one of the glass plates A method for manufacturing a glass plate with an optical film on the surface of an optical film is characterized by an etching process in which at least the end surface of the glass plate on which the optical film is formed is exposed to an etching solution to be etched; the glass plate is made of phosphoric acid It is made of salt-based glass, and the aforementioned etching solution is an alkaline detergent. The method for manufacturing a glass plate with an optical film as described in item 6 of the scope of patent application, wherein the etching solution is an alkaline salt containing a chelating agent as the alkaline component, and during the etching process, the optical film will be formed The glass plate is immersed in the etching solution. For example, the method for manufacturing a glass plate with an optical film as described in item 6 or item 7 of the scope of patent application, which further includes a cutting process for cutting the glass plate forming the optical film before the etching process, and Carry out the chamfering work of chamfering the aforementioned end surface of the aforementioned glass plate. For example, the method for manufacturing a glass plate with an optical film described in item 8 of the scope of patent application, wherein the cutting process is combined with the chamfering process, and the chamfering is performed at the same time as the cutting of the glass plate. The method for manufacturing a glass plate with an optical film as described in item 6 or item 7 of the scope of patent application, wherein the optical film is formed only on the main surface of one of the glass plates. The method for manufacturing a glass plate with an optical film as described in item 6 or item 7 of the scope of patent application, wherein the optical film is formed on the main surfaces of both of the glass plates.

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