TWI730251B - Glass plate with optical film and its manufacturing method - Google Patents
Glass plate with optical film and its manufacturing method Download PDFInfo
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- TWI730251B TWI730251B TW107132196A TW107132196A TWI730251B TW I730251 B TWI730251 B TW I730251B TW 107132196 A TW107132196 A TW 107132196A TW 107132196 A TW107132196 A TW 107132196A TW I730251 B TWI730251 B TW I730251B
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- Prior art keywords
- glass plate
- optical film
- item
- manufacturing
- glass
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- 239000011521 glass Substances 0.000 title claims abstract description 264
- 239000012788 optical film Substances 0.000 title claims abstract description 119
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 31
- 238000000034 method Methods 0.000 claims description 75
- 238000005530 etching Methods 0.000 claims description 54
- 238000005520 cutting process Methods 0.000 claims description 47
- 239000010408 film Substances 0.000 claims description 45
- 239000000203 mixture Substances 0.000 claims description 11
- 239000003599 detergent Substances 0.000 claims description 6
- 239000002738 chelating agent Substances 0.000 claims description 3
- 159000000011 group IA salts Chemical class 0.000 claims description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims 2
- 229910000147 aluminium phosphate Inorganic materials 0.000 claims 1
- 150000003839 salts Chemical class 0.000 claims 1
- 230000003287 optical effect Effects 0.000 description 19
- 239000000243 solution Substances 0.000 description 18
- 230000007423 decrease Effects 0.000 description 10
- 239000011734 sodium Substances 0.000 description 10
- 238000002844 melting Methods 0.000 description 8
- 230000008018 melting Effects 0.000 description 8
- 230000000694 effects Effects 0.000 description 7
- 229910052708 sodium Inorganic materials 0.000 description 7
- 239000002344 surface layer Substances 0.000 description 7
- 238000002834 transmittance Methods 0.000 description 7
- 229910019142 PO4 Inorganic materials 0.000 description 6
- 239000002253 acid Substances 0.000 description 6
- 150000001450 anions Chemical class 0.000 description 6
- 229910052788 barium Inorganic materials 0.000 description 6
- 229910052791 calcium Inorganic materials 0.000 description 6
- 239000010410 layer Substances 0.000 description 6
- 229910052749 magnesium Inorganic materials 0.000 description 6
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 6
- 239000010452 phosphate Substances 0.000 description 6
- 230000035945 sensitivity Effects 0.000 description 6
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 5
- 229910052802 copper Inorganic materials 0.000 description 5
- 125000002091 cationic group Chemical group 0.000 description 4
- 239000013078 crystal Substances 0.000 description 4
- 239000000428 dust Substances 0.000 description 4
- 229910052744 lithium Inorganic materials 0.000 description 4
- 229910052700 potassium Inorganic materials 0.000 description 4
- 230000000007 visual effect Effects 0.000 description 4
- 238000004017 vitrification Methods 0.000 description 4
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 3
- -1 Ta 2 O 5 Inorganic materials 0.000 description 3
- 238000010521 absorption reaction Methods 0.000 description 3
- 229910052731 fluorine Inorganic materials 0.000 description 3
- 239000011737 fluorine Substances 0.000 description 3
- 239000005303 fluorophosphate glass Substances 0.000 description 3
- 238000003384 imaging method Methods 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 229910052712 strontium Inorganic materials 0.000 description 3
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 2
- 229910052783 alkali metal Inorganic materials 0.000 description 2
- 238000002347 injection Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- 238000010030 laminating Methods 0.000 description 2
- 238000000465 moulding Methods 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 230000003595 spectral effect Effects 0.000 description 2
- 229910052725 zinc Inorganic materials 0.000 description 2
- KCXVZYZYPLLWCC-UHFFFAOYSA-N EDTA Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O KCXVZYZYPLLWCC-UHFFFAOYSA-N 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- 229910021193 La 2 O 3 Inorganic materials 0.000 description 1
- 238000006124 Pilkington process Methods 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 239000006059 cover glass Substances 0.000 description 1
- 238000004031 devitrification Methods 0.000 description 1
- DWYMPOCYEZONEA-UHFFFAOYSA-L fluoridophosphate Chemical compound [O-]P([O-])(F)=O DWYMPOCYEZONEA-UHFFFAOYSA-L 0.000 description 1
- 229910000449 hafnium oxide Inorganic materials 0.000 description 1
- WIHZLLGSGQNAGK-UHFFFAOYSA-N hafnium(4+);oxygen(2-) Chemical compound [O-2].[O-2].[Hf+4] WIHZLLGSGQNAGK-UHFFFAOYSA-N 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 238000003698 laser cutting Methods 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910000484 niobium oxide Inorganic materials 0.000 description 1
- URLJKFSTXLNXLG-UHFFFAOYSA-N niobium(5+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Nb+5].[Nb+5] URLJKFSTXLNXLG-UHFFFAOYSA-N 0.000 description 1
- MGFYIUFZLHCRTH-UHFFFAOYSA-N nitrilotriacetic acid Chemical compound OC(=O)CN(CC(O)=O)CC(O)=O MGFYIUFZLHCRTH-UHFFFAOYSA-N 0.000 description 1
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- WVDDGKGOMKODPV-ZQBYOMGUSA-N phenyl(114C)methanol Chemical compound O[14CH2]C1=CC=CC=C1 WVDDGKGOMKODPV-ZQBYOMGUSA-N 0.000 description 1
- 150000003016 phosphoric acids Chemical class 0.000 description 1
- 159000000001 potassium salts Chemical class 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 229910001936 tantalum oxide Inorganic materials 0.000 description 1
- UEUXEKPTXMALOB-UHFFFAOYSA-J tetrasodium;2-[2-[bis(carboxylatomethyl)amino]ethyl-(carboxylatomethyl)amino]acetate Chemical compound [Na+].[Na+].[Na+].[Na+].[O-]C(=O)CN(CC([O-])=O)CCN(CC([O-])=O)CC([O-])=O UEUXEKPTXMALOB-UHFFFAOYSA-J 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 238000009966 trimming Methods 0.000 description 1
- SOBHUZYZLFQYFK-UHFFFAOYSA-K trisodium;hydroxy-[[phosphonatomethyl(phosphonomethyl)amino]methyl]phosphinate Chemical compound [Na+].[Na+].[Na+].OP(O)(=O)CN(CP(O)([O-])=O)CP([O-])([O-])=O SOBHUZYZLFQYFK-UHFFFAOYSA-K 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/28—Interference filters
- G02B5/281—Interference filters designed for the infrared light
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B3/00—Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar shape; Layered products comprising a layer having particular features of form
- B32B3/02—Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar shape; Layered products comprising a layer having particular features of form characterised by features of form at particular places, e.g. in edge regions
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B7/00—Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
- B32B7/02—Physical, chemical or physicochemical properties
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B7/00—Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
- B32B7/02—Physical, chemical or physicochemical properties
- B32B7/023—Optical properties
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B33/00—Severing cooled glass
- C03B33/02—Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3657—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating having optical properties
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C19/00—Surface treatment of glass, not in the form of fibres or filaments, by mechanical means
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/097—Glass compositions containing silica with 40% to 90% silica, by weight containing phosphorus, niobium or tantalum
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/12—Silica-free oxide glass compositions
- C03C3/16—Silica-free oxide glass compositions containing phosphorus
- C03C3/17—Silica-free oxide glass compositions containing phosphorus containing aluminium or beryllium
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/22—Absorbing filters
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/28—Interference filters
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/28—Interference filters
- G02B5/283—Interference filters designed for the ultraviolet
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Geochemistry & Mineralogy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Optics & Photonics (AREA)
- General Physics & Mathematics (AREA)
- Mechanical Engineering (AREA)
- Ceramic Engineering (AREA)
- Surface Treatment Of Glass (AREA)
- Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
- Optical Filters (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Glass Compositions (AREA)
Abstract
本發明係一種附有光學膜之玻璃板及其製造方法,其中,具備:具有表裏一對主表面(2a)、及連結各個一對主表面(2a)之端部的端面(2b)的玻璃板(2)、和形成於玻璃板(2)之雙方之主表面(2a)的光學膜(3)之附有光學膜之玻璃板(1)。光學膜(3)係具備越過玻璃板(2)之主表面(2a)之端部,向外側伸出之溢出部(3a)。The present invention is a glass plate with an optical film and a method of manufacturing the same, including: glass having a pair of front and back main surfaces (2a) and an end surface (2b) connecting the ends of each pair of main surfaces (2a) The glass plate (1) with the optical film of the plate (2) and the optical film (3) formed on both the main surfaces (2a) of the glass plate (2). The optical film (3) is provided with an overflow portion (3a) that extends beyond the main surface (2a) of the glass plate (2) and extends outward.
Description
本發明係有關附有光學膜之玻璃板及其製造方法。The present invention relates to a glass plate with an optical film and a manufacturing method thereof.
利用於數位相機或攝錄放影機之CCD或CMOS等之固體攝像元件的分光感度係對於近紅外線域的光而言,具有強感度之故,一般為了將此等之固體攝像元件的分光感度配合人的視感度特性而使用視感度校正構件者。The spectral sensitivity of solid-state imaging elements such as CCD or CMOS used in digital cameras or camcorders is highly sensitive to light in the near-infrared region. Generally, it is for the spectral sensitivity of such solid-state imaging elements Those who use the visual sensitivity correction component according to the human visual sensitivity characteristics.
作為視感度校正構件,例如,如專利文獻1所揭示地,利用形成具有紅外線遮蔽機能之光學膜於玻璃板之主表面的附有光學膜之玻璃板。另外,為了防止玻璃板表面的反射,亦有形成有具有反射防止機能之光學膜的情況。
[先前技術文獻]
[專利文獻]As the visual sensitivity correction member, as disclosed in
[專利文獻1]國際公開第2013/077375號[Patent Document 1] International Publication No. 2013/077375
[發明欲解決之課題][The problem to be solved by the invention]
但伴隨著固體攝像元件的小型化,亦進展著所使用之附有光學膜之玻璃板的小型化。隨之,附有光學膜之玻璃板係為了將所侷限的面積做有效利用,至玻璃板的主表面之端部附近為止,多要求均一之光學特性者。However, along with the miniaturization of solid-state imaging devices, the miniaturization of glass plates with optical films used has also progressed. Along with this, in order to effectively use the limited area of the glass plate with optical film, it is often required to have uniform optical characteristics up to the vicinity of the end of the main surface of the glass plate.
但附有光學膜之玻璃板係在形成光學膜於大板的原玻璃板之主表面之後,以切割裝置而切斷成特定尺寸而加以製造之情況則為慣例,而在玻璃板的主表面之端部附近容易產生有伴隨著切斷之光學膜的膜剝離。當經由如此之膜剝離而未形成有光學膜於玻璃板的主表面之端部附近之狀態時,無法充分地實現所要求之光學特性,而有招致附有光學膜之玻璃板的性能降低。However, it is customary for the glass plate with optical film to be manufactured after the optical film is formed on the main surface of the original glass plate of the large plate, and then cut to a specific size by a cutting device. On the main surface of the glass plate Film peeling of the optical film accompanied by cutting is likely to occur near the end. When the optical film is not formed near the end of the main surface of the glass plate through such film peeling, the required optical characteristics cannot be sufficiently achieved, and the performance of the glass plate with the optical film may be reduced.
本發明之課題係提供:在玻璃板的主表面之端部附近,確實地形成光學膜之附有光學膜之玻璃板者。 為了解決課題之手段The subject of the present invention is to provide a glass plate with an optical film that reliably forms an optical film near the end of the main surface of the glass plate. To solve the problem
為了解決上述之課題所發明之本發明係具有表裏一對主表面、及連結各個一對主表面之端部的端面的玻璃板、和形成於玻璃板之至少一方之主表面的光學膜的附有光學膜之玻璃板,其特徵係光學膜係具備越過玻璃板之主表面之端部,向外側伸出之溢出部。如根據如此之構成,經由溢出部,光學膜則成為形成於較玻璃板的主表面為廣的範圍之狀態之故,而在玻璃板的主表面之端部附近,確實地形成有光學膜。然而,溢出部係因成為向外側突出之狀態之故,其他構件則不易直接接觸於玻璃板的端面。隨之,亦可期待降低來自玻璃板的端面之起塵或破損的效果。The present invention invented in order to solve the above-mentioned problems is a glass plate having a pair of front and back main surfaces, an end surface connecting the ends of each pair of main surfaces, and an optical film formed on at least one main surface of the glass plate. The glass plate with optical film is characterized in that the optical film is provided with an overflow part that extends beyond the main surface of the glass plate and extends outward. According to such a configuration, the optical film is formed on a wider area than the main surface of the glass plate via the overflow portion, and the optical film is reliably formed near the end of the main surface of the glass plate. However, since the overflow portion is in a state of protruding outward, it is difficult for other members to directly contact the end surface of the glass plate. Along with this, the effect of reducing dust or damage from the end surface of the glass plate can also be expected.
在上述的構成中,玻璃板的端面則作為倒角,其端面具有位於較光學膜之溢出部更外側之部分亦可。In the above-mentioned configuration, the end surface of the glass plate is used as a chamfer, and the end surface may have a part located outside the overflow portion of the optical film.
在上述的構成中,光學膜則為反射防止膜、紅外線遮蔽膜、紫外線遮蔽膜、紫外線及紅外線遮蔽膜之至少一種者為佳。此情況,作為光學膜係例如,可使用交互層積高折射率層與低折射率層所成之介電體多層膜者。In the above configuration, the optical film is preferably at least one of an antireflection film, an infrared shielding film, an ultraviolet shielding film, an ultraviolet and an infrared shielding film. In this case, as the optical film system, for example, a dielectric multilayer film formed by alternately laminating a high refractive index layer and a low refractive index layer can be used.
在上述的構成中,玻璃板就組成而言,包含質量%為25%以上之P2 O5 。 In the above-mentioned structure, the glass plate contains P 2 O 5 with a mass% of 25% or more in terms of composition.
在上述的構成中,光學膜的溢出部之溢出尺寸為1μm~0.1mm。In the above configuration, the overflow size of the overflow portion of the optical film is 1 μm to 0.1 mm.
為了解決上述之課題所發明之本發明係具備:具有表裏一對主表面、及連結各個一對主表面之端部的端面的玻璃板、和形成於玻璃板之至少一方之主表面的光學膜之附有光學膜之玻璃板之製造方法,其特徵係具備:於玻璃板之至少一方之主表面,形成光學膜的成膜工程,將形成有光學膜之玻璃板之至少端面,接觸蝕刻液加以蝕刻之蝕刻工程,玻璃板係由磷酸鹽系玻璃所成,蝕刻液為鹼性洗滌劑。如根據如此之構成,在蝕刻工程中,僅玻璃板與蝕刻液反應,而光學膜係未與蝕刻液反應。其結果,當著眼於玻璃板的端部時,僅玻璃板之端部則經由蝕刻液而加以除去,光學膜則以越過玻璃板之主表面之端部,向外側伸出之狀態而殘留。隨之,經由此溢出部,光學膜則成為形成於較玻璃板的主表面為廣的範圍之狀態之故,而在玻璃板的主表面之端部附近,確實地形成有光學膜。The present invention invented to solve the above-mentioned problems is provided with: a glass plate having a pair of front and back main surfaces and an end surface connecting the ends of the respective pair of main surfaces, and an optical film formed on at least one main surface of the glass plate The method for manufacturing a glass plate with an optical film is characterized by: forming an optical film on the main surface of at least one of the glass plates, and contacting at least the end surface of the glass plate with the optical film in contact with the etching solution In the etching process for etching, the glass plate is made of phosphate-based glass, and the etching solution is alkaline detergent. According to such a configuration, in the etching process, only the glass plate reacts with the etching solution, and the optical film system does not react with the etching solution. As a result, when focusing on the end of the glass plate, only the end of the glass plate is removed by the etching solution, and the optical film is left over the end of the main surface of the glass plate and protrudes outward. Along with this, the optical film is formed on a wider area than the main surface of the glass plate through this overflow portion, and the optical film is surely formed near the end of the main surface of the glass plate.
在上述的構成中,蝕刻液係作為鹼性成分包含螯合劑之鹼性鹽,在蝕刻工程中,將形成光學膜之玻璃板,浸漬於蝕刻液者為佳。In the above-mentioned configuration, the etching solution is an alkaline salt containing a chelating agent as an alkaline component. In the etching process, the glass plate forming the optical film is preferably immersed in the etching solution.
在上述的構成中,在成膜工程之後,且蝕刻工程之前,更具備切斷玻璃板之切斷工程、和將玻璃板之端面進行倒角之倒角工程。In the above-mentioned configuration, after the film formation process and before the etching process, there is a cutting process for cutting the glass plate and a chamfering process for chamfering the end surface of the glass plate.
此情況,切斷工程兼具倒角工程,作為呈與玻璃板之切斷同時,進行倒角亦可。In this case, the cutting process is also a chamfering process, and the chamfering can be performed at the same time as the cutting of the glass plate.
在上述的構成中,光學膜係僅形成於玻璃板之一方之主表面亦可。In the above-mentioned configuration, the optical film system may be formed only on the main surface of one of the glass plates.
在上述的構成中,光學膜則形成於玻璃板之雙方之主表面亦可。 發明效果In the above-mentioned structure, the optical film may be formed on both main surfaces of the glass plate. Invention effect
如根據本發明,可提供:在玻璃板的主表面之端部附近,確實地形成光學膜之附有光學膜之玻璃板者。According to the present invention, it is possible to provide an optical film-attached glass plate with an optical film in the vicinity of the end of the main surface of the glass plate.
以下,對於有關本實施形態之附有光學膜之玻璃板及其製造方法,參照圖面同時加以說明。Hereinafter, the glass plate with optical film and its manufacturing method related to this embodiment will be described with reference to the drawings.
(第一實施形態)
如圖1及圖2所示,有關第一實施形態之附有光學膜之玻璃板1係具備:玻璃板2,和光學膜3,例如利用於固體攝像元件之視感度校正構件或外蓋玻璃等。(First Embodiment)
As shown in Figs. 1 and 2, the
玻璃板2係具備:表裏一對的主表面2a,和連結各雙方之主表面2a之端部的端面2b。玻璃板2係形成為四角形狀,但未限定於此形狀,而例如亦可為三角形或五角形以上之多角形或圓形等。在本實施形態中,端面2b係在四角形狀的玻璃板2之各邊,呈與主表面2a略正交地加以形成。The
玻璃板2之厚度係理想為0.4mm以下、0.3mm以下、0.2mm以下。更理想為0.19mm以下,又更理想為0.15mm以下、特別理想為0.12mm以下。另一方面,玻璃板2之厚度係0.05mm以上為佳,而0.08mm以上為更佳。The thickness of the
在玻璃板2之各主表面2a的面積係可作為1mm2
以上25000mm2
以下者。各主表面2a之面積的理想範圍係3mm2
以上25000mm2
以下、而更理想為9mm2
以上25000mm2
以下、有更理想為15mm2
以上25000mm2
以下、特別理想為20mm2
以上25000mm2
以下。In the area of each major surface of the glass plate based
玻璃板2之端面2b的表面粗度Ra係0.1nm~10nm為佳。The surface roughness Ra of the
玻璃板2係就組成而言以陽離子%,含有P5+
5~50%、Al3+
2~30%、R’+
(R’係選自Li、Na及K之至少1種)10~50%、及R2+
(R2+
係選自Mg2+
、Ca2+
、Sr2+
、Ba2+
及Zn2+
之至少1種)20~50%、Cu2+
0.5~15%且以陰離子%顯示、含有F-
5~80%、及O2-
20~95%。The
玻璃板2係加上於上述組成,作為更以陰離子%顯示,含有F-
5~80%之組成亦可。The
作為玻璃板2係更理想為可使用就組成而言,以陽離子%顯示,含有P5+
40~50%、Al3+
7~12%、K+
15~25%、Mg2+
3~12%、Ca2+
3~6%、Ba2+
7~12%、Cu2+
1~15%,且以陰離子%顯示、含有F-
5~80%、及O2-
20~95%之磷酸鹽玻璃者。It is more ideal to be usable as the
作為理想之其他組成的玻璃板2係可使用以陽離子%顯示,含有P5+
20~35%、Al3+
10~20%、Li+
20~30%、Na+
0~10%、Mg2+
1~8%、Ca2+
3~13%、Sr2+
2~12%、Ba2+
2~8%、Zn2+
0~5%、Cu2+
0.5~5%,且以陰離子%顯示、含有F-
30~65%、及O2-
35~75%之氟磷酸玻璃者。As an ideal other composition of the
作為理想之其他組成的玻璃板2係可使用,以陽離子%顯示,含有P5+
35~45%、Al3+
8~12%、Li+
20~30%、Mg2+
1~5%、Ca2+
3~6%、Ba2+
4~8%、Cu2+
1~6%,且以陰離子%顯示、含有F-
10~20%、及O2-
75~95%之氟磷酸玻璃者。As an ideal other
作為理想之其他組成的玻璃板2係可使用以陽離子%顯示,含有P5+
30~45%、Al3+
15~25%、Li+
1~5%、Na+
7~13%、K+
0.1~5%、Mg2+
1~8%、Ca2+
3~13%、Ba2+
6~12%、Zn2+
0~7%、Cu2+
1~5%,且以陰離子%顯示、含有F-
30~45%、及O2-
50~70%之氟磷酸玻璃者。As an ideal other composition of the
在以下中,玻璃板2則顯示對於紅外線吸收機能優越之磷酸鹽系玻璃情況的例。In the following, the
使用於玻璃板2之磷酸鹽系玻璃係實質上未含有F(氟)者為佳。在此,「實質上未含有」係指:意味以質量%含有0.1%以下的氟亦可者。It is preferable that the phosphate-based glass used for the
作為如此之磷酸鹽系玻璃係例如,可使用含有25質量%以上P2 O5 之構成者。具體而言,可使用以質量%,含有P2 O5 25~60%、Al2 O3 2~19%、RO(但R選自Mg、Ca、Sr及Ba之至少一種)5~45%、ZnO 0~13%、K2 O 8~20%、Na2 O 0~12%、及CuO 0.3~20%,而實質上未含有氟之玻璃者。As such a phosphate-based glass system, for example, a structure containing 25% by mass or more of P 2 O 5 can be used. Specifically, it can be used in mass%, containing P 2 O 5 25-60%, Al 2 O 3 2-19%, RO (but R is selected from at least one of Mg, Ca, Sr and Ba) 5-45% , ZnO 0~13%, K 2 O 8~20%, Na 2 O 0~12%, and CuO 0.3~20%, and the glass does not contain fluorine substantially.
P2 O5 係形成玻璃骨架之成分。P2 O5 之含有量係以質量%,理想為25~60%、而更理想為30~55%、又更理想為40~50%。當P2 O5 之含有量過少時,而有玻璃化成為不安定之情況。另一方面,P2 O5 之含有量過多時,有著耐候性容易下降之情況。P 2 O 5 is a component that forms the glass skeleton. The content of P 2 O 5 is in mass %, and is desirably 25-60%, more desirably 30-55%, and still more desirably 40-50%. When the content of P 2 O 5 is too small, vitrification may become unstable. On the other hand, when the content of P 2 O 5 is too large, the weather resistance may easily decrease.
Al2 O3 係更一層提升耐候性的成分。Al2 O3 之含有量係以質量%,理想為2~19%、更理想為2~15%、有更理想為2.8~14.5%、特別理想為3.5~14.0%。Al2 O3 之含有量過少時,有著耐候性不充分之情況。另一方面,Al2 O3 之含有量過多時,而有熔融性降低而熔融溫度上升之情況。然而,當熔融溫度上升時,加以還原Cu離子而成為容易自Cu2+ 位移至Cu+ 之故,而有不易得到所期望的光學特性之情況。具體而言,有著在近紫外線~可視域之光透過率降低,以及紅外線吸收特性容易下降之情況。Al 2 O 3 is a further component that improves weather resistance. The content of Al 2 O 3 is in mass %, desirably 2-19%, more desirably 2-15%, more desirably 2.8-14.5%, particularly desirably 3.5-14.0%. When the content of Al 2 O 3 is too small, the weather resistance may be insufficient. On the other hand, when the content of Al 2 O 3 is too large, the meltability may decrease and the melting temperature may increase. However, when the melting temperature rises, Cu ions are reduced to easily shift from Cu 2+ to Cu + , and it may be difficult to obtain desired optical properties. Specifically, there are cases where the light transmittance in the near-ultraviolet to the visible range decreases, and the infrared absorption characteristics tend to decrease.
RO(但R選自Mg、Ca、Sr及Ba之至少一種)係改善耐候性之同時,提升熔融性之成分。RO之含有量係以質量%,理想為5~45%、而更理想為7~40%、又更理想為10~35%。當RO之含有量過少時,有著耐候性及熔融性不充分之情況。另一方面,RO之含有量過多時,有著玻璃的安定性容易下降,而RO成分引起之結晶容易析出之情況。RO (but R is selected from at least one of Mg, Ca, Sr, and Ba) is a component that improves weather resistance and meltability. The content of RO is in mass %, ideally 5 to 45%, more preferably 7 to 40%, and still more preferably 10 to 35%. When the content of RO is too small, weather resistance and melting properties may be insufficient. On the other hand, when the content of RO is too much, the stability of the glass is likely to decrease, and the crystals caused by the RO component are likely to precipitate.
然而,RO之各成分的含有量之理想範圍係如以下。However, the ideal range of the content of each component of RO is as follows.
MgO係改善耐候性的成分。MgO之含有量係以質量%,理想為0~15%、更理想為0~7%。當MgO之含有量過多時,有著玻璃的安定性容易下降之情況。MgO is a component that improves weather resistance. The content of MgO is in mass %, ideally 0-15%, more desirably 0-7%. When the content of MgO is too much, the stability of the glass tends to decrease.
CaO係與MgO同樣地使耐候性改善的成分。CaO之含有量係以質量%,理想為0~15%、更理想為0~7%。當CaO之含有量過多時,有著玻璃的安定性容易下降之情況。CaO is a component that improves weather resistance similarly to MgO. The content of CaO is in mass %, preferably 0-15%, more preferably 0-7%. When the content of CaO is too much, the stability of the glass is likely to decrease.
SrO係與MgO同樣地使耐候性改善的成分。SrO之含有量係以質量%,理想為0~12%、更理想為0~5%。當SrO含有量過多時,有著玻璃的安定性容易下降之情況。SrO is a component that improves weather resistance similarly to MgO. The content of SrO is in mass %, preferably 0-12%, more preferably 0-5%. When the content of SrO is too much, the stability of the glass tends to decrease.
BaO係安定化玻璃之同時,使耐候性提升的成分。BaO之含有量係以質量%,理想為1~30%、而更理想為2~27%、又更理想為3~25%。BaO之含有量過少時,有著無法充分安定化玻璃,以及無法充分提升耐候性之情況。另一方面,BaO之含有量過多時,在成形中有著BaO引起之結晶容易析出之情況。BaO is a component that stabilizes the glass and improves the weather resistance. The content of BaO is based on mass %, and is desirably 1-30%, more desirably 2-27%, and still more desirably 3-25%. When the content of BaO is too small, the glass cannot be sufficiently stabilized and the weather resistance cannot be sufficiently improved. On the other hand, when the content of BaO is too large, crystals caused by BaO may easily precipitate during molding.
ZnO係改善玻璃之安定性及耐候性的成分。ZnO之含有量係以質量%,理想為0~13%、而更理想為0~12%、又更理想為0~10%。ZnO之含有量過多時,有著熔融性下降而熔融溫度變高,以及作為結果不易得到所期望之光學特性的情況。另外,有著玻璃之安定性下降,而ZnO成分引起的結晶容易析出之情況。ZnO is a component that improves the stability and weather resistance of glass. The content of ZnO is in mass %, ideally 0-13%, more desirably 0-12%, and still more desirably 0-10%. When the content of ZnO is too large, the melting property may decrease and the melting temperature may increase, and as a result, it may be difficult to obtain the desired optical properties. In addition, the stability of the glass is reduced, and the crystals caused by the ZnO component are likely to precipitate.
如以上,RO及ZnO係有著改善玻璃之安定化的效果,特別是在P2 O5 少的情況,容易享受其效果。As mentioned above, RO and ZnO have the effect of improving the stability of the glass, especially when P 2 O 5 is low, the effect is easy to enjoy.
然而,對於RO而言之P2 O5 之含有量的比(P2 O5 /RO)係理想為1.0~1.9、而更理想為1.2~1.8。當比(P2 O5 /RO)過小時,有著液相溫度變高而RO引起之失透容易析出之情況。另一方面,P2 O5 /RO過大時,有著耐候性容易下降之情況。However, for the ratio of the content of RO in terms of P 2 O 5 (P 2 O 5 / RO) over the lines 1.0 to 1.9, and more preferably from 1.2 to 1.8. When the ratio (P 2 O 5 /RO) is too small, the liquidus temperature may increase and the devitrification caused by RO may be easily precipitated. On the other hand, when P 2 O 5 /RO is too large, the weather resistance tends to decrease.
K2 O係使熔融溫度下降之成分。K2 O之含有量係以質量%,理想為8~20%、更理想為12.5~19.5%。當K2 O之含有量過少時,有著熔融溫度變高而不易得到所期望的光學特性之情況。另一方面,K2 O之含有量過多時,有著K2 O引起的結晶則容易在成形中析出,而玻璃化則成為不安定之情況。K 2 O is a component that lowers the melting temperature. The content of K 2 O is in mass %, ideally 8-20%, more preferably 12.5-19.5%. When the content of K 2 O is too small, the melting temperature may increase and it may be difficult to obtain the desired optical properties. On the other hand, when the content of K 2 O is too large, crystals caused by K 2 O are likely to be precipitated during molding, and vitrification becomes unstable.
Na2 O亦與K2 O同樣地,使熔融溫度下降的成分。Na2 O含有量係以質量%,理想為0~12%、更理想為0~7%。Na2 O之含有量過多時,有著玻璃化成為不安定之情況。Na 2 O is also a component that lowers the melting temperature, similarly to K 2 O. The Na 2 O content is in mass %, preferably 0 to 12%, more preferably 0 to 7%. When the content of Na 2 O is too much, it may become unstable due to vitrification.
CuO係為了吸收近紅外線的成分。CuO之含有量係以質量%,理想為0.3~20%、而更理想為0.3~15%、又更理想為0.4~13%。當CuO之含有量過少時,有著無法得到所期望之近紅外線吸收特性的情況。另一方面,CuO之含有量過多時,有著紫外線~可視域之光透過性容易下降之情況。另外,有著玻璃化成為不安定之情況。然而,為了得到所期望的光學特性之CuO的含有量係經由板厚而做適宜調整者為佳。CuO is a component for absorbing near-infrared rays. The content of CuO is in mass %, ideally 0.3 to 20%, more preferably 0.3 to 15%, and still more preferably 0.4 to 13%. When the content of CuO is too small, there are cases where the desired near-infrared absorption characteristics cannot be obtained. On the other hand, when the content of CuO is too large, the light transmittance from ultraviolet to visible range may be easily reduced. In addition, vitrification may become unstable. However, in order to obtain the desired optical properties, the CuO content is preferably adjusted appropriately via the plate thickness.
另外,除了上述成分以外,在未損及本發明之效果的範圍而含有B2 O3 、Nb2 O5 、Y2 O3 、La2 O3 、Ta2 O5 、CeO2 或Sb2 O3 等亦可。具體而言,此等成分之含有量係各以質量%,理想為0~3%、更理想為0~2%。 In addition to the above components, B 2 O 3 , Nb 2 O 5 , Y 2 O 3 , La 2 O 3 , Ta 2 O 5 , CeO 2 or Sb 2 O are contained within a range that does not impair the effects of the present invention. 3 grades are also possible. Specifically, the content of these components is in mass %, preferably 0 to 3%, more preferably 0 to 2%.
經由將玻璃板2作為上述組成之時,可達成在可視域更一層之高光透過率與在紅外線域更一層優越之光吸收特性的兩者。具體而言,在波長400nm之光透過率係理想為78%以上,而更理想為80%以上,而在波長500nm之光透過率係理想為83%以上,而更理想為85%以上。另一方面,在波長700nm之光透過率係理想為12%以上,而更理想為9%以下,而在波長800nm之光透過率係理想為5%以下,而更理想為3%以下。By using the
上述之組成的玻璃板2係例如,經由澆鑄法,滑出法,下拉伸法,重拉伸法,浮製法,溢流法等之成形方法而成形為板狀。The
光學膜3係在本實施形態中,各形成於玻璃板2之雙方的主表面2a。光學膜3係具備越過玻璃板2之主表面2a之端部,向外側伸出之溢出部3a。The
溢出部3a係沿著玻璃板2之主表面2a而延伸於外側,溢出部3a之前端部係自玻璃板2之端面2b離開。然而,溢出部3a係未必必須與玻璃板2之主表面2a平行,而前端作為垂下等而傾斜亦可。另外,溢出部3a之基端部的一部分則即使與玻璃板2之端面2b接觸亦未有影響。The
溢出部3a係呈圍繞玻璃板2之主表面2a的全周圍地形成為框緣狀(參照圖2之交叉影線部)。The
溢出部3a之平面方向的溢出尺寸t1係1μm~0.1mm為佳,而3μm~20μm為更佳。如為如此之溢出尺寸,溢出部3a則因呈為充分地突出於外側之狀態之故,其他構件則不易直接接觸於玻璃板2之端面2b,可降低來自玻璃板2之端面2b之起塵或破損。The overflow size t1 in the plane direction of the
光學膜3之厚度係較玻璃板2之厚度為薄,而10μm以下者為佳。更理想係7μm以下。另一方面,光學膜3之厚度係0.1μm以上者為佳,而更理想為0.2μm以上。The thickness of the
光學膜3係因應用途而加以適宜選擇之構成,例如,可舉出反射防止膜(AR膜)、紅外線遮蔽膜(IR遮蔽膜)、紫外線遮蔽膜、紫外線及紅外線遮蔽膜等之機能膜。另外,光學膜3係亦可為具備反射防止膜及紅外線遮蔽膜之雙方的機能者。對於具有如此機能之光學膜3係例如,可使用交互層積低折射率層與高折射率層所成之介電體多層膜者。作為低折射率層係使用氧化矽膜等。作為高折射率層係加以使用選自氧化鉭,氧化鈮,氧化鈦,氧化鉿,氮化矽,氧化鋯之至少1種所成之金屬氧化膜等。然而,形成於玻璃板2之一方的主表面2a之光學膜3,和形成於玻璃板2之另一方的主表面2a之光學膜3係亦可為具有相同機能的膜,而具有不同機能的膜亦可。具體而言,附有光學膜之玻璃板2之構成係例如,反射防止膜/玻璃板/反射防止膜、反射防止膜/玻璃板/紅外線遮蔽膜、紅外線遮蔽膜/玻璃板/紅外線遮蔽膜、紅外線遮蔽膜/玻璃板/紫外線及紅外線遮蔽膜等。The
如為具備如以上構成之附有光學膜之玻璃板2,光學膜3則成為經由溢出部3a而形成於較玻璃板2之主表面2a為寬的範圍之狀態。隨之,可在玻璃板2之主表面2a的端部附近,確實地形成光學膜3者。If it is the
接著,說明有關第一實施形態之附有光學膜之玻璃板2的製造方法。Next, the manufacturing method of the
本製造方法係依序具備成膜工程,和切斷工程,和蝕刻工程。在本實施形態中,如圖3及圖4所示,顯示自包含大板的原玻璃板4之原玻璃板層積體5採取複數片包含製品尺寸之玻璃板2的玻璃板層積體6,進行所謂倒角的例。當然,以修整等為目的,作為呈自原玻璃板層積體5採取一片玻璃板層積體6亦可。然而,在本製造方法中,依原玻璃板層積體5→玻璃板層積體6→附有光學膜之玻璃板1的順序加以製造。This manufacturing method includes a film forming process, a cutting process, and an etching process in sequence. In this embodiment, as shown in Figs. 3 and 4, it is shown that the original
如圖3所示,在成膜工程中,於大板的原玻璃板4之雙方的主表面4a,形成光學膜3,製造原玻璃板層積體5。光學膜3係形成於原玻璃板4之各主表面4a的全面。光學膜3係例如,使用真空蒸鍍法或濺鍍法等而加以形成。As shown in FIG. 3, in the film forming process, the
如圖4所示,在切斷工程中,例如將原玻璃板層積體5切斷成棋盤格狀,製造複數片玻璃板層積體6。在圖示例中,自一片的原玻璃板層積體5,採取9片玻璃板層積體6。原玻璃板層積體5之切斷方法係無特別加以限定,但例如,可使用經由切割裝置之刀刃等之機械性切斷,折切割斷,雷射割斷,雷射熔斷等。As shown in FIG. 4, in the cutting process, for example, the original
如圖5所示,在蝕刻工程中,將玻璃板層積體6浸漬於收容於蝕刻槽(未圖示)之蝕刻液E而進行蝕刻。As shown in FIG. 5, in the etching process, the glass plate laminated
蝕刻液E係對於含於玻璃板層積體6之玻璃板2則為如上述之磷酸鹽系玻璃之情況,例如經由鹼性洗滌劑而加以構成。磷酸鹽系玻璃係與如氟磷酸鹽系之其他的玻璃做比較,耐鹼性為低之故。作為鹼性洗滌劑係無特別加以限定,但例如可使用Na、K等之鹼性成分,或三乙醇胺,苯甲醇或乙二醇等之界面活性劑,或含有水或醇等之洗滌劑。The etching solution E is composed of the above-mentioned phosphate-based glass for the
作為含於鹼性洗滌劑之鹼性成分,包含有胺基聚羧酸等之螯合劑的鹼金屬鹽者為佳。作為胺基聚羧酸之鹼金屬鹽係可舉出:二乙基三胺五乙酸,乙二胺四乙酸,三乙四胺六乙酸,氮基三乙酸等之鈉鹽及鉀鹽。其中,理想使用二乙基三胺五乙酸五鈉,乙二胺四乙酸四鈉,三乙四胺六乙酸六鈉,氮基三乙酸三鈉,而特別理想使用二乙基三胺五乙酸五鈉。As the alkaline component contained in the alkaline detergent, one containing an alkali metal salt of a chelating agent such as an amino polycarboxylic acid is preferred. Examples of the alkali metal salt of amino polycarboxylic acid include sodium and potassium salts of diethyltriaminepentaacetic acid, ethylenediaminetetraacetic acid, triethylenetetraaminehexaacetic acid, nitrilotriacetic acid, and the like. Among them, pentasodium diethyltriaminepentaacetic acid, tetrasodium ethylenediaminetetraacetate, hexasodium triethylenetetraaminehexaacetate, and trisodium nitrotriacetate are ideally used, and diethyltriaminepentaacetic acid pentasodium is particularly desirable. sodium.
蝕刻液E係與玻璃板2反應,但實質上未與光學膜3反應。在本實施形態中,含於玻璃板層積體6之玻璃板2係於兩方的主表面2a形成有光學膜3之故,而當將玻璃板層積體6浸漬於蝕刻液E時,僅玻璃板2之端部與蝕刻液E直接接觸而進行反應。隨之,僅玻璃板2的端部,經由蝕刻液E而被徐緩地浸蝕,而玻璃板2之端面2b的位置則移動於A方向。其結果,光學膜3係以保持原來殘留之狀態,僅除去玻璃板2之端部的表層部X1(圖5之交叉影線部)。隨之,製造如圖1所示,形成具有溢出部3a之光學膜3於玻璃板2之雙方的主表面2a之附有光學膜之玻璃板2。The etching solution E reacts with the
經由蝕刻之平面方向的除去厚度t2係1μm~0.1mm為佳,而3μm~20μm為更佳。此除去厚度t2係與圖1之溢出部3a的溢出尺寸t1大約一致者為佳。The removal thickness t2 in the plane direction by etching is preferably 1 μm to 0.1 mm, and more preferably 3 μm to 20 μm. The removal thickness t2 is preferably approximately the same as the overflow size t1 of the
在本製造方法中,在玻璃板層積體6之狀態,經由光學膜3而加以保護玻璃板2之雙方的主表面2a之故,在蝕刻工程中,未使玻璃板2之厚度變化而可進行玻璃板2之端面加工者。In this manufacturing method, in the state of the
(第二實施形態)
如圖6所示,有關第二實施形態之附有光學膜之玻璃板1則與有關第一實施形態之附有光學膜之玻璃板1不同處,係將玻璃板2之端面2b作為倒角的點。(Second Embodiment)
As shown in Fig. 6, the
玻璃板2之端面2b係於雙方的主表面2a側之一部分範圍,具有對於主表面2a而言傾斜之傾斜平面所成之倒角部2c。對於倒角部2c之主表面2a而言之傾斜角度θ係為20°~60°者為佳。然而,倒角部2c之形狀係無特別加以限定,而例如自凸曲面(圓弧面或橢圓弧面)或連結傾斜角度不同之複數的平面之複合平面等而加以形成亦可。另外,將玻璃板2之端面2b全體作為成凸曲面等,於端面2b全體設置倒角部亦可。The
於玻璃板2之端面2b形成倒角部2c之情況,具有端面2b則位置於較光學膜3之溢出部3a為外側之部分Y(圖6之交叉影線部)亦可。如作為如此,其他構件則成為容易直接接觸於玻璃板2之端面2b,但經由倒角部2c而端面2b之機械性強度則提升之故,可降低來自玻璃板2之端面2b的起塵或破損。然而,設置突出之部分Y之情況,因可縮小溢出部2之溢出尺寸t3之故,可縮短在後述之蝕刻工程的蝕刻時間,而提升製造效率者。當然,未設置突出之部分Y亦可。When the chamfered
在本實施形態中,對於光學膜3之溢出部3a的前端,形成有倒角部3b。倒角部3b之形狀係未特別加以限定,但可選擇與玻璃板2之倒角部2c同樣的形狀。然而,光學膜3之倒角部3b係省略,僅設置玻璃板2之倒角部2c亦可。In this embodiment, a chamfered
溢出部3a之平面方向的溢出尺寸t3係1μm~0.1mm為佳,而3μm~20μm為更佳。The overflow size t3 in the plane direction of the
接著,說明有關第二實施形態之附有光學膜之玻璃板2的製造方法。Next, the manufacturing method of the
本製造方法係依序具備成膜工程,和切斷工程,和倒角工程,和蝕刻工程。在本實施形態中,切斷工程則兼具倒角工程,顯示在切斷原玻璃板層積體5之過程,進行倒角的例。This manufacturing method includes a film forming process, a cutting process, a chamfering process, and an etching process in sequence. In this embodiment, the cutting process is combined with the chamfering process, and an example of chamfering is shown in the process of cutting the original
在成膜工程中,經由與第一實施形態同樣的方法,製造原玻璃板層積體5(參照圖3)。In the film forming process, the original
切斷工程係具備:如圖7及圖8所示,經由切割裝置的第一刀刃21,切削包含原玻璃板4之主表面4a附近之原玻璃板層積體5的表層部5s之第一工程,和如圖9所示,經由切割裝置的第二刀刃22,切削在第一工程未切削而殘留之原玻璃板層積體5之中央部5c的第二工程。The cutting process is equipped with: as shown in Figs. 7 and 8, the
如圖7及圖8所示,第一刀刃21係可旋轉地加以保持之圓盤狀,於其周緣部具有切斷刃21a。切斷刃21a係呈構成V字狀的凸部地具有相互逆向傾斜之一對的傾斜面21b。As shown in FIGS. 7 and 8, the
如圖9所示,第二刀刃22亦可旋轉地加以保持之圓盤狀,於其周緣部具有切斷刃22a。第二刀刃22係較第一刀刃21為薄。切斷刃22a之形狀係如為可在第二刀刃22之厚度的範圍內切削原玻璃板層積體5之形狀,未特別加以限定。然而,取代第二刀刃22而使用經由雷射照射的切斷亦可。As shown in Fig. 9, the
在第一工程中,首先,如圖7所示,使第一刀刃21旋轉之同時,切削原玻璃板層積體5之一方的表層部5s,於原玻璃板層積體5之一方的表層部5s,形成因應切斷刃21a之形狀的V字狀的溝5a。之後,如圖8所示,使形成有溝5a之原玻璃板層積體5表裏反轉,使第一刀刃21旋轉之同時,切削原玻璃板層積體5之另一方的表層部5s,對於原玻璃板層積體5之另一方的表層部5s,亦形成因應切斷刃21a之形狀的V字狀的溝5a。接著,在第二工程中,如圖9所示,呈連繫形成於原玻璃板層積體5之雙方的表層部5s之V字狀的溝5a的溝底部彼此地,使第二刀刃22旋轉之同時,切削原玻璃板層積體5之中央部5c,切斷(全切割)原玻璃板層積體5。經由此,自原玻璃板層積體5加以製造玻璃板層積體6之同時,對於所製造之玻璃板層積體6係於對應於V字狀的溝5a之部分,形成有倒角部2c,3b。In the first process, first, as shown in FIG. 7, while the
當然,倒角工程係在切斷工程結束之後,作為另外的工程而進行亦可。此情況,如圖10所示,倒角工程係可使用旋轉磨石23而進行者。詳細來說,旋轉磨石23係具備對於在切斷工程所製造之玻璃板層積體6之板厚方向而言,具有相互逆方向之傾斜的一對之圓錐面狀的加工面23a。經由旋轉磨石23所研磨之玻璃板層積體6係研磨成仿照旋轉磨石23之加工面23a的形狀。即,對於玻璃板2及光學膜3之端面係形成有倒角部2c,3b於經由加工面23a所研磨之位置。然而,倒角工程係分割成於玻璃板2之一方的主表面2a側的端面形成倒角部2c,3b之第一工程,和於玻璃板2之另一方的主表面2a側的端面形成倒角部2c,3b之第二工程亦可。Of course, the chamfering process may be performed as another process after the cutting process is completed. In this case, as shown in FIG. 10, the chamfering process can be performed using the
如圖11所示,在蝕刻工程中,將形成有倒角部2c,3b之玻璃板層積體6浸漬於蝕刻液E。如此,僅與蝕刻液E直接接觸之玻璃板2的端部,則被徐緩地浸蝕,而玻璃板2之端面2b的位置則移動於A方向。其結果,光學膜3係以保持殘留之狀態,僅除去玻璃板2之端部的表層部X2(圖中之交叉影線部)。此時,端面2b的位置係產生變化,但大致維持端面2b之形狀。因此,蝕刻工程之後,玻璃板2之倒角部2c係亦殘留。另外,光學膜3係因未與蝕刻液E反應之故,蝕刻工程後之光學膜3的倒角部3b亦殘留。隨之,加以製造如圖6所示,於玻璃板2之雙方的主表面2a,形成具有溢出部3a之光學膜3之同時,於玻璃板2及光學膜3,形成有倒角部2c,3b之附有光學膜之玻璃板2。As shown in FIG. 11, in the etching process, the
經由蝕刻之平面方向的除去厚度t4係1μm~0.1mm為佳,而3μm~20μm為更佳。此除去厚度t4係與圖6之溢出部3a的溢出尺寸t3大約一致者為佳。The removal thickness t4 in the plane direction by etching is preferably 1 μm to 0.1 mm, and more preferably 3 μm to 20 μm. The removal thickness t4 is preferably approximately the same as the overflow size t3 of the
(第三實施形態)
如圖12所示,有關第三實施形態之附有光學膜之玻璃板1則與有關第一實施形態及第二實施形態之附有光學膜之玻璃板1不同處,係具有溢出部3a之光學膜3則僅形成於玻璃板2之一方的主表面2a的點。然而,在圖示例中,雖未設置倒角部,但設置如在第二實施形態所說明之倒角部亦可。(Third Embodiment)
As shown in Fig. 12, the
溢出部3a之平面方向的溢出尺寸t5係1μm~0.1mm為佳,而3μm~20μm為更佳。The overflow size t5 in the plane direction of the
如此所構成之附有光學膜之玻璃板2的製造方法係依序具備:成膜工程,和切斷工程,和蝕刻工程。The manufacturing method of the optical film-attached
如圖13所示,在成膜工程中,僅於原玻璃板4之一方的主表面4a,形成光學膜3,製造原玻璃板層積體5。光學膜3係形成於原玻璃板4之一方的主表面4a的全面。As shown in FIG. 13, in the film forming process, the
在切斷工程中,經由與第一實施形態同樣的方法,自原玻璃板層積體5製造一片或複數片之玻璃板層積體6(參照圖4)。但,所製造之玻璃板層積體6係僅於玻璃板2之一方的主表面2a形成光學膜3。In the cutting process, one or a plurality of
如圖14所示,在蝕刻工程中,將玻璃板層積體6浸漬於蝕刻液E。如此,與蝕刻液E直接接觸之玻璃板2之端部及未形成光學膜3側之主表面2a則被徐緩浸蝕,玻璃板2之端面2b則移動於A方向之同時,玻璃板2之主表面2a則移動於B方向。其結果,光學膜3係在保持殘留之狀態,加以除去玻璃板2之端部的表層部X3(圖中之交叉影線部)與主表面2a的表層部X4(圖中之交叉影線部)。隨之,製造如圖12所示,形成僅於玻璃板2之一方的主表面2a具有溢出部3a之光學膜3之附有光學膜之玻璃板2。As shown in FIG. 14, in the etching process, the glass plate laminated
經由蝕刻之平面方向的除去厚度t6係1μm~0.1mm為佳,而3μm~20μm為更佳。此除去厚度t6係與圖12之溢出部3a的溢出尺寸t5大約一致者為佳。另外,經由蝕刻之板厚方向的除去厚度t7係1μm~0.1mm為佳,而3μm~20μm為更佳。The removal thickness t6 in the plane direction by etching is preferably 1 μm to 0.1 mm, and more preferably 3 μm to 20 μm. It is preferable that the removal thickness t6 is approximately the same as the overflow size t5 of the
在本製造方法中,僅玻璃板2之一方的主表面2a,經由光學膜3而加以保護之故,在蝕刻工程中,玻璃板2之厚度則產生變化。隨之,加上於玻璃板2之端面加工,可進行玻璃板2之薄化加工(薄板化)者。In this manufacturing method, since only the
然而,本發明係不限定於上述實施形態之構成者,而未限定於上述之作用效果者。本發明係可在不脫離其主旨之範圍做種種變形。However, the present invention is not limited to the constitution of the above-mentioned embodiment, and is not limited to the above-mentioned function and effect. The present invention can be modified in various ways without departing from its gist.
在上述實施形態中,說明過將成膜工程在切斷工程之前進行之情況,但將成膜工程在切斷工程之後(進行倒角工程之情況係倒角工程之後)進行亦可。In the above-mentioned embodiment, the case where the film forming process is performed before the cutting process has been described, but the film forming process may be performed after the cutting process (when the chamfering process is performed, it is after the chamfering process).
在上述實施形態中,省略切斷工程,呈在成膜工程直接形成光學膜於製品尺寸之玻璃板亦可。In the above embodiment, the cutting process is omitted, and the optical film may be directly formed into a glass plate in the product size during the film forming process.
在上述實施形態中,在蝕刻工程之後,自玻璃板之主表面除去光學膜亦可。In the above embodiment, after the etching process, the optical film may be removed from the main surface of the glass plate.
在上述實施形態中,呈在切斷工程,噴射氣體於原玻璃板層積體的切斷部之同時,照射雷射,將切斷部進行雷射熔斷亦可。此情況,由調整氣體的噴射量或噴射方向者,可將所切斷之端面加工成凸曲面(例如,圓弧面)者。隨之,使用如此之雷射熔斷,亦可與切斷同時進行倒角者。In the above-mentioned embodiment, in the cutting process, the cutting part of the original glass plate laminate may be sprayed with a gas while irradiating a laser to laser-fuse the cutting part. In this case, by adjusting the gas injection amount or injection direction, the cut end surface can be processed into a convex curved surface (for example, a circular arc surface). Then, using such a laser fusing, it is also possible to perform chamfering at the same time as the cutting.
在上述實施形態中,取代將玻璃板層積體全體浸漬於蝕刻液,而例如經由塗佈等而附著蝕刻液於含於玻璃板層積體之玻璃板的一部分(例如,端面)等,僅蝕刻玻璃板之一部分亦可。In the above embodiment, instead of immersing the entire glass plate laminate in the etching solution, for example, by coating or the like, the etching solution is attached to a part (for example, the end surface) of the glass plate contained in the glass plate laminate. It is also possible to etch a part of the glass plate.
1‧‧‧附有光學膜之玻璃板
2‧‧‧玻璃板
2a‧‧‧主表面
2b‧‧‧端面
2c‧‧‧倒角部
3‧‧‧光學膜
3a‧‧‧溢出部
3b‧‧‧倒角部
4‧‧‧原玻璃板
5‧‧‧原玻璃板層積體
6‧‧‧玻璃板層積體
21‧‧‧第一刀刃
22‧‧‧第二刀刃
23‧‧‧旋轉磨石
E‧‧‧蝕刻液1‧‧‧Glass plate with
圖1係顯示有關第一實施形態之附有光學膜之玻璃板的剖面圖。 圖2係顯示有關第一實施形態之附有光學膜之玻璃板的平面圖。 圖3係顯示含於有關第一實施形態之附有光學膜之玻璃板之製造方法的成膜工程之剖面圖。 圖4係顯示含於有關第一實施形態之附有光學膜之玻璃板之製造方法的切斷工程之平面圖。 圖5係顯示含於有關第一實施形態之附有光學膜之玻璃板之製造方法的蝕刻工程之剖面圖。 圖6係顯示有關第二實施形態之附有光學膜之玻璃板的剖面圖。 圖7係顯示含於有關第二實施形態之附有光學膜之玻璃板的製造方法,兼具倒角工程之切斷工程的初步階段狀態之剖面圖。 圖8係顯示含於有關第二實施形態之附有光學膜之玻璃板的製造方法,兼具倒角工程之切斷工程的中間階段狀態之剖面圖。 圖9係顯示含於有關第二實施形態之附有光學膜之玻璃板的製造方法,兼具倒角工程之切斷工程的最終階段狀態之剖面圖。 圖10係顯示含於有關第二實施形態之附有光學膜之玻璃板之製造方法的倒角工程之變形例的剖面圖。 圖11係顯示含於有關第二實施形態之附有光學膜之玻璃板之製造方法的蝕刻工程之剖面圖。 圖12係顯示有關第三實施形態之附有光學膜之玻璃板的剖面圖。 圖13係顯示含於有關第三實施形態之附有光學膜之玻璃板之製造方法的成膜工程之剖面圖。 圖14係顯示含於有關第三實施形態之附有光學膜之玻璃板之製造方法的蝕刻工程之剖面圖。Fig. 1 is a cross-sectional view showing a glass plate with an optical film according to the first embodiment. Fig. 2 is a plan view showing a glass plate with an optical film according to the first embodiment. Fig. 3 is a cross-sectional view showing the film forming process included in the manufacturing method of the optical film-attached glass plate related to the first embodiment. 4 is a plan view showing the cutting process included in the manufacturing method of the optical film-attached glass plate related to the first embodiment. 5 is a cross-sectional view showing the etching process included in the manufacturing method of the optical film-attached glass plate related to the first embodiment. Fig. 6 is a cross-sectional view showing a glass plate with an optical film according to the second embodiment. Fig. 7 is a cross-sectional view showing the preliminary stage state of the cutting process including the chamfering process in the manufacturing method of the optical film-attached glass plate included in the second embodiment. Fig. 8 is a cross-sectional view showing an intermediate stage state of the cutting process including the chamfering process included in the manufacturing method of the optical film-attached glass plate related to the second embodiment. Fig. 9 is a cross-sectional view showing the final stage state of the cutting process including the chamfering process included in the manufacturing method of the optical film-attached glass plate related to the second embodiment. 10 is a cross-sectional view showing a modification of the chamfering process included in the manufacturing method of the optical film-attached glass plate related to the second embodiment. 11 is a cross-sectional view showing the etching process included in the manufacturing method of the optical film-attached glass plate related to the second embodiment. Fig. 12 shows a cross-sectional view of a glass plate with an optical film according to the third embodiment. FIG. 13 is a cross-sectional view showing the film forming process included in the manufacturing method of the optical film-attached glass plate related to the third embodiment. 14 is a cross-sectional view showing the etching process included in the manufacturing method of the optical film-attached glass plate related to the third embodiment.
1‧‧‧附有光學膜之玻璃板 1‧‧‧Glass plate with optical film
2‧‧‧玻璃板 2‧‧‧Glass plate
2a‧‧‧主表面 2a‧‧‧Main surface
2b‧‧‧端面 2b‧‧‧end face
3‧‧‧光學膜 3‧‧‧Optical film
3a‧‧‧溢出部 3a‧‧‧Overflow
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