TW201805733A - 投影曝光裝置及其投影曝光方法 - Google Patents

投影曝光裝置及其投影曝光方法 Download PDF

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Publication number
TW201805733A
TW201805733A TW106117387A TW106117387A TW201805733A TW 201805733 A TW201805733 A TW 201805733A TW 106117387 A TW106117387 A TW 106117387A TW 106117387 A TW106117387 A TW 106117387A TW 201805733 A TW201805733 A TW 201805733A
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TW
Taiwan
Prior art keywords
area
workpiece
turntable
projection exposure
region
Prior art date
Application number
TW106117387A
Other languages
English (en)
Chinese (zh)
Inventor
小谷秀人
田中良和
正
Original Assignee
薩瑪精密股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 薩瑪精密股份有限公司 filed Critical 薩瑪精密股份有限公司
Publication of TW201805733A publication Critical patent/TW201805733A/zh

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
TW106117387A 2016-05-26 2017-05-25 投影曝光裝置及其投影曝光方法 TW201805733A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2016105089A JP2017211533A (ja) 2016-05-26 2016-05-26 投影露光装置及びその投影露光方法
JP2016-105089 2016-05-26

Publications (1)

Publication Number Publication Date
TW201805733A true TW201805733A (zh) 2018-02-16

Family

ID=60412283

Family Applications (1)

Application Number Title Priority Date Filing Date
TW106117387A TW201805733A (zh) 2016-05-26 2017-05-25 投影曝光裝置及其投影曝光方法

Country Status (3)

Country Link
JP (1) JP2017211533A (fr)
TW (1) TW201805733A (fr)
WO (1) WO2017204100A1 (fr)

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10223519A (ja) * 1997-02-04 1998-08-21 Nikon Corp 投影露光装置
JP2001235507A (ja) * 1999-12-14 2001-08-31 Ibiden Co Ltd プリント配線板の導通検査装置及び導通検査方法
JP2011049285A (ja) * 2009-08-26 2011-03-10 Nikon Corp マスク形状計測方法及び装置、並びに露光方法及び装置
JP5818524B2 (ja) * 2011-06-16 2015-11-18 日置電機株式会社 検査装置および検査システム
WO2013151146A1 (fr) * 2012-04-06 2013-10-10 Ｎｓｋテクノロジー株式会社 Dispositif d'exposition et procédé d'exposition

Also Published As

Publication number Publication date
JP2017211533A (ja) 2017-11-30
WO2017204100A1 (fr) 2017-11-30

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