TW201805733A - Projection exposure apparatus, and projection exposure method thereof - Google Patents

Abstract

An projection exposure apparatus of this invention includes a turn table 120 formed with a plurality of areas 110, 111 for carrying workpieces and configured to be able to rotate and temporarily stop at predetermined plural stopping positions, a loader capable of loading and unloading workpieces 510, 511 in the plurality of areas 110, 111, a position detection device 210 disposed at the immediate upper portion of the first area 110, a light source 10, a photomask 20 and a projection optical system 50 such disposed as to perform projection exposure at the immediate upper portion of the second area 111, and a controller 410 for controlling the turn table 120 and the respective sections, wherein the controller 410 performs a parallel processing of detecting the carrying position of the workpiece 510 carried in the first area 110 by the position detection device 210 when the workpiece 511 carried in the second area 111 is performed with projection exposure.

Description

Projection exposure device and projection exposure method

The present invention relates to a technique for improving the yield of a projection exposure device, and in particular, a technique for increasing the yield of a quantity by reducing the total projection exposure time.

A projection exposure apparatus that uses a photolithography technology to transfer a pattern on a photomask (reticle) to a workpiece such as a wafer or a substrate is disclosed in, for example, reference 1 or reference 2.

The pattern on the original plate (reticle: photomask) of the cited reference 1 is projected on a turntable (or One of the exposed bodies (workpieces) on the pedestal). The positions of the exposed body (workpiece) in the XY directions are detected by a position detection device using a laser interferometer. Citation 1 discloses a step moving direction in which alignment of a reticle and a wafer with step exposure can be performed with high accuracy, and a wafer moving direction with respect to a laser interferometer of a position detection device.

Reference 2 refers to the turntable (or pedestal) on which a workpiece is placed, which can not only move in the X (horizontal) -Y (vertical) -θ (rotation) direction, but also the photomask (Reticle) The turntable can also be moved in the X (horizontal)-Y (vertical)-θ (rotation) direction. Citation 2 discloses that the scanning direction and scanning speed of the turntables of both sides can be individually set.

Prior technical literature: Patent Literature:

Patent Document 1: JP 2001-203161

Patent Document 2: Japanese Patent Application Laid-Open No. 11-260697

However, if the material of the workpiece is, for example, a brittle material such as a crystalline material or a brittle material such as glass is used even if it is non-crystalline, it must be handled with care, that is, it must be performed at a relatively low time. Therefore, the time required for loading and unloading the workpiece into the exposure area on the pedestal is an extremely long time such as 70 seconds.

In addition, due to the high definition of transfer patterns in recent years, the position detection of the workpiece on the pedestal when the projection exposure device transfers the pattern to the workpiece is also required to be highly accurate, and the time required for the position detection is Has a tendency to increase. In addition, when one side is moved to a plurality of positions such as a stage exposure and a plurality of exposures are performed at the same time, more position detection time is required.

As in the conventional projection exposure apparatuses of Patent Documents 1 and 2, first, a workpiece is loaded on a predetermined position on a pedestal, then the position on the pedestal of the workpiece is detected, and then the pedestal or photomask is positioned on the detected position. After adjusting the position in each direction, exposure is performed. That is, the conventional projection exposure device and its projection exposure method are based on each process being processed by each one. Don't implement them sequentially, and shorten the total processing time only by shortening the time required for each individual process or shortening the transition time between processes.

The present invention was created by the author in view of the above-mentioned problems, and its purpose is to provide a projection exposure device and a projection exposure method thereof, which are the loading / unloading of a workpiece capable of performing projection exposure engineering, and the position of a workpiece placed on a pedestal At least two items of each process of detection and projection exposure corresponding to the position of the workpiece are implemented in parallel, thereby reducing the total processing time more than in the conventional technology.

In order to achieve the above object, one embodiment of the projection exposure apparatus of the present invention is that a predetermined pattern of a photomask is positioned at a predetermined position on a workpiece, and projection exposure is performed with light from a light source, thereby forming the predetermined pattern on the workpiece. The rotary table has a plurality of areas that can be placed simultaneously without overlapping the workpieces, and has a plurality of areas formed on the top of the part for placing the workpieces, and is configured to be able to rotate and temporarily stop at a predetermined position. A plurality of stop positions; a loader capable of loading and unloading the workpiece in the plurality of areas of the turntable; a position detection device temporarily stopping at one of the first areas of the plurality of areas of the turntable When one of the predetermined stopping positions is a first stopping position, it is arranged on the upper part of the first area of the turntable in a manner capable of detecting the placement position of the workpiece placed in the first area; , Reticle and projection optical system are in the aforementioned section of the aforementioned turntable. When an area is temporarily stopped at the first stop position, a second one that is different from the first area among the plurality of areas of the turntable can be projected and exposed on the workpiece placed in the second area. The upper part of the area; and the control unit, which controls: the rotation of the turntable and the stop of the predetermined stop positions, loading and unloading of a plurality of workpieces in each area by the loader, and the position detection device for the The detection of the placement position of each workpiece placed in each area, the processing of the projection exposure performed by the light source, the mask, and the projection optical system on each workpiece placed in each area, and the aforementioned control unit When projecting and exposing the workpiece placed in the second area through the light source, mask and projection optical system, at least the workpiece placed in the first area is detected by the position detection device. Parallel processing of the placement position.

In order to achieve the above object, one embodiment of the projection exposure method of the present invention is a projection exposure method using a projection exposure device that sets a predetermined pattern of a photomask at a predetermined position on a workpiece and uses light from a light source to Projection exposure is performed, whereby the predetermined pattern is formed on the workpiece and a turntable is provided. The turntable is formed in such a manner that a plurality of workpieces can be placed at the same time without overlapping, and a plurality of areas are formed on the part where the workpiece is placed. At the top, and configured to be able to rotate and temporarily stop at a predetermined plurality of stopping positions, the projection exposure method includes: (A) loading the workpiece in a first region of the plurality of regions of the turntable; step; (B) a step of rotating the turntable to temporarily stop the first area at a first stop position among the predetermined stop positions; (C) detecting a placement position of the workpiece in the first area Steps; (D) a step of rotating the turntable again to temporarily stop the first area at a second stop position different from the first stop position among the predetermined stop positions; (E) putting the photomask on The step of projecting and exposing the pattern of the workpiece on the first area; (F) When there is a workpiece on the second area that is different from the first area and the first area and the projected exposure is ended, the same as (E) The projection exposure processing is performed in parallel, the step of unloading the aforementioned workpiece that ends the projection exposure from the second region and ending the first cycle; and (G) the first region of the first cycle of (A) to (F) Replace with the second area, replace the area with the third area when there are more than three areas, or perform the second cycle of processing by replacing the area with the first area when there are only two areas, and for subsequent cycles, In a When three or more areas in ascending order based stepwise manner back to the last area of the substitution area and a first embodiment, or when the system has only two alternative interactive regions and second regions of the first embodiment of the step.

1‧‧‧ projection exposure device

10‧‧‧Light source department

20‧‧‧Photomask (Reticle)

30‧‧‧Mask XYθ stage

40‧‧‧Masking swing stand

50‧‧‧ projection optical system

60‧‧‧Mask XYθ Stage Driver

70‧‧‧Masking swing stand drive unit

110‧‧‧First area for workpiece placement

111‧‧‧Second area for workpiece placement

112‧‧‧Third area for workpiece placement

120‧‧‧ Turntable for workpiece

130‧‧‧Turntable shaft for workpiece

140‧‧‧Z base for workpiece

150‧‧‧Workpiece turntable drive unit

160‧‧‧Z stage drive for workpiece

210‧‧‧Position detection section

310‧‧‧Loader

410‧‧‧Control Department

510‧‧‧First Workpiece

511‧‧‧Second workpiece

512‧‧‧Third Artifact

610‧‧‧First stop position

611‧‧‧Second stop position

612‧‧‧Third stop position

Figures 1 (a) and (b) are diagrams showing a schematic configuration when the turntable of the exposure apparatus according to the first embodiment of the present invention is stopped at the first stop position, and (a) is Side view, (b) is the top view.

Fig. 2 is an operation flowchart of the exposure apparatus according to the first embodiment of the present invention.

3 (a) and (b) are diagrams showing a schematic configuration when the turntable of the exposure apparatus of the second embodiment of the present invention is stopped at the first stop position, (a) is a side view, and (b) is a top view .

FIG. 4 is the first half of the operation flow of the exposure apparatus according to the second embodiment of the present invention.

Fig. 5 is the second half of the operation flow of the exposure apparatus according to the second embodiment of the present invention.

Rough description:

One embodiment of the projection exposure apparatus of the present invention is that the projection exposure apparatus of the present invention is configured to form a predetermined pattern on a workpiece by projecting and exposing the predetermined pattern of the photomask to a predetermined position on the workpiece with light from a light source. The former includes: a turntable, which is capable of being placed simultaneously without overlapping a plurality of workpieces, and has a plurality of areas formed on the top of the part for placing the workpieces, and is configured to be rotatable and temporarily stopped at a predetermined time. A plurality of stop positions; a loader capable of loading and unloading workpieces in a plurality of areas of the turntable; a position detecting device which temporarily stops at a predetermined stop in a first area among the plurality of areas of the turntable When one of the positions is the first stop position, it can detect the placement of the workpiece placed in the first area. The position method is arranged directly above the first area of the turntable; the light source, the mask and the projection optical system are temporarily exposed to the first stop position in the first area of the turntable so as to be able to project and be exposed on the first area. The way of the workpieces in the two areas is arranged on the upper part of the second area which is different from the first area among the plurality of areas of the turntable; and the control part is for controlling: the rotation of the turntable and the stopping of the predetermined stop positions. Loading and unloading of a plurality of workpieces in each area by a loader, detection of the placement position of each workpiece placed in each area by a position detection device, pairing of light sources, masks and projection optical systems For each process of projection exposure performed by each workpiece placed in each area, the control unit performs projection exposure on the workpiece placed in the second area by using a light source, a mask, and a projection optical system. At least parallel processing for detecting the placement position of the workpiece placed in the first area by the position detection device is performed.

According to another embodiment of the projection exposure apparatus of the present invention, the turntable has a third area that is one of the plurality of areas and is different from the first area and the second area. The loader is configured to be located on the first of the turntable. When the area is temporarily stopped at the first stop position, the workpiece is unloaded and / or loaded in the third area of the turntable, and the control unit detects the placement position of the workpiece placed in the first area and detects the loading of the workpiece. When the workpieces placed in the second area are subjected to projection exposure, the unexposed workpieces are loaded in parallel after the unloaded workpieces are loaded after the projected exposed workpieces placed in the third area are unloaded.

Another embodiment of the projection exposure apparatus of the present invention For the turntable, there are n areas (n is an integer of n ≧ 4) as a plurality of areas. When the first area of the turntable is temporarily stopped at the first stop position, the turntable can be detected to be placed in the area. The way of placing the workpieces in the first area is arranged directly above one of the n areas of the turntable. The light source, mask and projection optical system are temporarily stopped in the first area of the turntable. At the stop position, it is arranged on the upper part of the second area which belongs to one of the n areas of the turntable and is different from the first area so as to project and expose the workpiece placed in the second area. When the first area of the turntable is temporarily stopped at the first stop position, the machine can load and unload workpieces in a third area that belongs to one of the n areas of the turntable and is different from the first area and the second area. It is configured in such a manner that the control unit is configured to unload the workpiece placed in the third area when detecting the placement position of the workpiece placed in the first area and performing projection exposure on the workpiece placed in the second area. End projection exposure Embodiment of the parallel processing of a workpiece can be loaded unexposed after the manner of the workpiece.

Another embodiment of the projection exposure apparatus of the present invention is configured to be able to load and unload workpieces in a fourth region to an n-th region that is one of the n regions of the turntable and is different from the first region to the third region. There are a plurality of loaders, and the control unit performs parallel processing by unloading unexposed workpieces after unloading the unexposed workpieces that have been placed in the fourth to nth regions after unloading.

Another embodiment of the projection exposure apparatus of the present invention is that the projection exposure apparatus is an exposure apparatus that exposes a pattern of projection exposure to one workpiece with one shot.

According to another embodiment of the projection exposure device of the present invention, the device that positions the position of the pattern to be projected and exposed to the position of the position-detected workpiece includes moving the mask in the vertical (Y), horizontal (X), and high ( Z), and at least one of the rotation (θ) directions.

According to another embodiment of the projection exposure device of the present invention, the device that positions the position of the pattern to be exposed to the position of the position-detected workpiece is a swing driving device that includes changing the angle of the mask from the vertical plane with respect to the exposure light.

According to another embodiment of the projection exposure apparatus of the present invention, the apparatus that positions the position of the pattern to be projected and exposed to the position of the position-detected workpiece includes moving a pedestal disposed below the turntable to the vertical (Y) and horizontal (Y) X), high (Z), and rotation (θ) directions in at least one of the driving means.

In another embodiment of the projection exposure device of the present invention, the device that positions the position of the pattern to be projected and exposed on the position-detected workpiece includes moving the projection optical system in the vertical (Y), horizontal (X), and high positions. (Z) and at least one of the rotation (θ) directions.

One embodiment of the projection exposure method using the projection exposure device of the present invention uses a projection exposure device which sets a predetermined pattern of a photomask to a predetermined position on a workpiece and performs projection exposure with light from a light source. In this way, a predetermined pattern is formed on the workpiece, and a turntable is formed, and the plurality of workpieces can be placed at the same time without overlapping the workpieces, and a plurality of areas are formed on the top of the part on which the workpieces are placed. And is configured to be able to rotate and temporarily stop at a predetermined plurality of stopping positions, the projection exposure method includes: (A) a step of loading a workpiece in a first region among a plurality of regions of the turntable; (B) making The step of rotating the turntable to temporarily stop the first area at one of the predetermined stopping positions; (C) the step of detecting the placement position of the workpiece in the first area; (D) rotating the turntable again And the step of temporarily stopping the first region at a second stopping position which is different from the first stopping position among the predetermined stopping positions; (E) the step of exposing the pattern on the photomask to the workpiece in the first region; ; (F) When there is a workpiece that ends the projection exposure in a second area that is different from the first area of the turntable, then the projection exposure processing is unloaded from the second area in parallel with the projection exposure processing of (E). And (G) replace the first region of the first cycle of (A) to (F) with the second region, and replace the second region with the first region when there are three or more regions. Three zones, or only two zones The second region is replaced by the first region and the second cycle is processed. For subsequent cycles, when there are more than three regions, the regions are gradually replaced in ascending order and finally returned to the first region. When there are only two regions, the steps are implemented by alternately replacing the first region and the second region.

Effects of the invention:

According to the exposure device of the present invention, the following turntable can be provided: a plurality of areas are formed on the uppermost part of the portion for placing the workpiece in such a manner that a plurality of workpieces can not be placed at the same time, and can be rotated and A rotary device-type turntable temporarily stopped at a predetermined plurality of stopping positions; and, a loader for workpieces, a position detection device for the workpiece on the turntable, and a photomask can be arranged corresponding to different areas on the turntable, respectively. The projected pattern is projected onto the projection optical system of the workpiece, so that each process can be performed in parallel. Accordingly, it is possible to provide a projection exposure device and a projection exposure method capable of reducing the total exposure time toward the workpiece more than conventional techniques.

Explanation of the illustrated embodiment: <First Embodiment>

Hereinafter, a first embodiment of the present invention will be described with reference to the drawings. Figures 1 (a) and (b) show the schematic configuration of the exposure apparatus 1 according to the first embodiment of the present invention. The worktable turntable shaft 130 is disposed above the worktable Z stage 140, and the worktable turntable 120 is provided on Above the worktable turntable shaft 130.

Above the workpiece turntable 120, two workpiece placement first regions 110 and a workpiece placement second region 111 are arranged at both ends of one diameter of the turntable 120. Both end portions of the diameter refer to, for example, a straight line drawn from the center of the turntable 120 to an area of one end portion, and a continuous straight line drawn from the straight line to the opposite side of 180 degrees, and the other area is arranged on the opposite side. Of the end. First area 110 for workpiece placement, and The second region 111 for component placement is larger than the surface area of each of the first workpiece 510 and the second workpiece 511, and each has a sufficient area necessary to mount the respective workpieces. In addition, each region is capable of identifying a position for installation. A mark (ID) or a mark (not shown) indicating a reference point for position measurement is placed at a place that does not interfere with each workpiece.

The worktable turntable shaft 130 is provided in the center of the lower portion of the worktable turntable 120, and is connected to a control unit 410 including a microcomputer or a central computing unit (CPU) with the worktable drive unit 150 as an intermediary. In response to a command from the control unit 410, a driving signal is transmitted from the worktable turntable driving unit 150 to the worktable turntable shaft 130. The worktable turntable shaft 130 can precisely control the rotation angle of the turntable and the stop position on the plane by a stepping motor or the like, which is not shown. In addition, the worktable turntable shaft 130 is connected to a power source (not shown) and supplies power necessary for rotation.

The workpiece Z stage 140 is connected to a control unit 410 including a microcomputer or a central processing unit (CPU) with the workpiece Z stage driving unit 160 as an intermediary. In response to a command from the control unit 410, the driving signal is transmitted from the workpiece Z stage driving unit 160 to the workpiece Z stage 140. The Z stage 140 for workpieces can precisely control the Z (up and down) direction and the up and down stop position by an unillustrated up and down movement mechanism (hydraulic mechanism or electric mechanism, etc.). In addition, the Z stage 140 for the work is connected to a power source (not shown) to supply power necessary for rotation.

The first region 110 for workpiece placement is such that the workpiece turntable 120 controlled by the control unit 410 is rotated to move to the first stop position 610 or the second stop position 611 and stop at the position. Expose The more detailed the predetermined pattern of light is, the more precise control is required to improve the rotation accuracy and stop accuracy. A position detection unit 210 is disposed directly above the first stop position 610, for example. In addition, FIG. 1 (a) shows that the loader 310 is disposed above or near the area stopped at the first stop position 610. The loader 310 is capable of unloading the exposed workpiece from the first region 110 for workpiece placement or the second region 111 for workpiece placement temporarily stopped at the first stop position 610, and can load unexposed workpieces from this region. The exposed workpiece descending from above the workpiece turntable 120 is transferred to the subsequent process, and the unexposed workpiece is moved to the vicinity of the loader 310. For example, a conveyor (not shown) may be used. A projection optical system 50 for exposure is disposed directly above the second stop position 611.

The second area 111 for placing work also rotates the turntable 120 for work controlled by the control unit 410, whereby the first stop position 610 or the second stop position 611 can be moved and stopped at this position. Since the first stop position 610 and the second stop position 611 are disposed at both ends of one diameter of the worktable turntable 120, when the first area 110 for workpiece placement temporarily stops at the first stop position 610, the workpiece The second region 111 for placement is temporarily stopped at the second stop position 611. In contrast, when the second region 111 for workpiece placement is temporarily stopped at the first stop position 610, the first region 110 for workpiece placement is temporarily stopped at the projection optical system 50.

Further above, the projection optical system 50 for exposure is provided with a light source section 10, a mask 20, a mask XYθ stage 30, and a mask swing stage 40. The situation in FIG. 1 (a) is the exposure light from the light source section 10. The source passes through the mask 20 and the projection optical system 50, and exposes the second workpiece 511 of the workpiece mounting second area 111 placed on the second stop position 611, thereby exposing a predetermined pattern on the mask 20. Transfer onto the second workpiece 511.

The mask XYθ pedestal 30 is connected to a control unit 410 including a microcomputer or a central processing unit (CPU) with the mask XYθ pedestal driving unit 60 as an intermediary. According to a command from the control unit 410, the driving signal is transmitted from the mask XYθ pedestal driving unit 60 to the mask XYθ pedestal 30. The mask XYθ pedestal 30 is a mask XYθ pedestal driving unit 60 capable of moving in the X direction (horizontal direction), Y direction (longitudinal direction), and θ (rotation) direction on a pedestal plane (not shown). , Precisely the stop position in the XYθ (vertical, horizontal, rotational) direction on the plane of the console seat. In addition, the mask XYθ stage 30 is also connected to a power source (not shown) to supply power necessary for movement in the XYθ (vertical, horizontal, and rotational) direction.

The mask swing base 40 is connected to a control unit 410 including a microcomputer or a central processing unit (CPU) with the mask swing base drive unit 70 as an intermediary. In response to a command from the control unit 410, a driving signal is transmitted from the mask swing base driving unit 70 to the mask swing base 40. The mask swing base 40 is a mask swing base drive unit 70 that can swing by tilting a plane of a base (not shown) from a vertical angle to the optical axis. The precise console base is tilted (swing). Stop position. In addition, the mask swing base 40 is also connected to a power source (not shown) to supply power necessary for the plane of the swing base.

The control unit 410 is capable of correcting a predetermined pattern on the mask 20. The method of accurately transferring to a predetermined position on the second workpiece 511 controls the position and plane of the rotary table shaft 130 for the workpiece, the Z stage 140 for the workpiece, the XYθ stage 30 for the mask, and the swing stage 40 for the mask. And swing angle. At this time, for example, using a mask microscope (not shown) and a microscope for workpieces, the mask registration mark on the mask (not shown) can be controlled to match the workpiece registration mark on the workpiece. In addition, in response to demand, the projection optical system 50 is also provided with a driving unit to perform control of projecting a predetermined pattern on the photomask to a predetermined position on the workpiece.

Next, the operation of this embodiment will be described using FIG. 2. First, when the control unit 410 starts processing, it is confirmed whether the first area 110 for placing a workpiece on the turntable 120 is temporarily stopped at the first stop position 610 (S1). When the first region 110 for workpiece placement is temporarily stopped in the first stop position 610 (S1: Yes), it is confirmed whether or not an unexposed workpiece is placed in the first region 110 for workpiece placement (S2). If the first area 110 for workpiece placement is not temporarily stopped in the first stop position 610 (S1: No), the first area 110 for workpiece placement is temporarily stopped in the second stop position 611, so it enters Step S7.

When an unexposed workpiece is not placed in the first area 110 for workpiece placement (S2: Yes), the control unit 410 orders the unexposed workpiece into the first area 110 for workpiece placement and orders Output to the loader 310 (S3). When the unexposed workpiece is placed in the first area 110 for workpiece placement (S2: No), since it is not necessary to load the unexposed workpiece, the process proceeds to step S4, and the position detection unit is instructed by the command of the control unit 410. 210 detects the position of the first workpiece 510 in the workpiece placement first region 110 (S4). this In this case, for example, it is also possible to detect the pedestal alignment mark on the pedestal and the work alignment mark on the work using a work microscope.

After detecting the position of the first workpiece 510 of the first region 110 for workpiece placement, the control unit 410 outputs a rotation command to the turntable driving unit 150 (S5). When the first region 110 for workpiece placement on the turntable 120 is rotated, After reaching the second stop position 611, a temporary stop command is output (S6).

After the work placement first area 110 is temporarily stopped at the second stop position 611, it is confirmed whether or not there is an exposed work in the work placement second area 111 at the first stop position 610 (S7). If there is an exposed workpiece in the second region 111 for workpiece placement (S7: Yes), the control unit 410 outputs to the loader 310 and unloads the exposed workpiece from the second region 111 for workpiece placement (S8). A command to load an unexposed workpiece in the workpiece placement second area 111 is output (S9). If there are no exposed workpieces in the second region 111 for workpiece placement (S7: No), since there is no need to unload the workpieces, the process proceeds to step S9, and the unexposed workpieces are loaded in the second region 111 for workpiece placement ( S9).

After the processing of step S7, in parallel with the loading of the workpiece in the second region 111 for workpiece placement, the first workpiece 510 that has been position-detected in the first region 110 for workpiece placement is in the second stop position. 611 performs the transfer of the projection exposure of the predetermined pattern of the photomask 20 onto the first workpiece 510 (S10). When the transfer of the predetermined pattern is completed, the control unit 410 outputs a command for re-rotation to the workpiece turntable driving unit 150 (S11), and when the workpiece loading first area 110 on the turntable 120 reaches the first After the stop position 610, a temporary stop command is output (S12).

After the work placement first area 110 is temporarily stopped at the first stop position 610, it is confirmed whether or not there is an exposed work in the work placement first area 110 at the first stop position 610 (S13). When there is an exposed workpiece in the first region 110 for workpiece placement (S13: Yes), the control unit 410 outputs a command to the loader 310 to unload the exposed workpiece from the first region 110 for workpiece placement. (S14), and it progresses to step S16 and confirms whether an unexposed workpiece | work remains (S16). If there are no exposed workpieces in the first area 110 for workpiece placement (S13: No), the workpiece does not need to be unloaded, so it proceeds to step S16 to check whether unexposed workpieces remain (S16).

Simultaneously with the confirmation of whether or not there is a workpiece in which the exposure has ended in the workpiece placement first region 110 at the first stop position 610 after step S12, the second workpiece 511 whose position detection is completed in the workpiece placement second region 111 At the second stop position 611, the projection exposure of the predetermined pattern of the mask 20 is performed on the second workpiece 511 (S15), and the process proceeds to step S16, and the control unit 410 checks whether an unexposed workpiece remains (S16) ).

If there are no unexposed workpieces remaining (S16: Yes), the process is terminated. If there are remaining unexposed workpieces (S16: No), the process returns to step S1, and it is confirmed whether the first region 110 for workpiece placement is temporarily stopped At the first stop position 610 (S1), the following processing is repeatedly performed.

Therefore, the projection exposure apparatus 1 according to this embodiment sets a predetermined pattern of the mask 20 to a predetermined position on the workpieces 510 and 511, and performs projection exposure with light from the light source 10, thereby forming the predetermined pattern. The projection exposure device 1 on the workpieces 510 and 511 includes a turntable 120, which is formed in a manner that a plurality of workpieces 510 and 511 can be placed at the same time without overlapping, and a plurality of areas 110 and 111 are formed for loading. The workpieces 510 and 511 are placed at the uppermost part, and can be rotated and temporarily stopped at a predetermined plurality of stop positions 610 and 611; the loader 310 can be performed in a plurality of areas 110 and 111 of the turntable 120 Loading and unloading of the workpieces 510 and 511; the position detection device 210 is capable of detecting the loading on the first area 110 when the turntable 120 temporarily stops at one of the predetermined stopping positions 610 and 611. The position of the workpiece 510 inside is arranged directly above one of the first regions 110 of the plurality of regions 110 and 111 of the turntable 120; the light source 10, the mask 20 and the projection optical system 50 are located on the turntable 120. When the first region 110 is temporarily stopped at the first stop position 610, the sum of the plurality of regions 110 and 111 disposed on the turntable 120 is projected and exposed on the workpiece 511 placed in the second region 111. The first area 110 is different The upper part of the two areas 111; and the control unit 410, which controls the rotation of the turntable 120 and the stop at predetermined stop positions 610 and 611, and a plurality of workpieces 510 and 511 in each area 110 and 111 where the loader 310 is. Loading and unloading, position detection by the position detection device 210 for each workpiece 510 and 511 placed in each of the areas 110 and 111, detection of the placement position of the light source 10, the mask 20, and the projection optical system 50 toward each area Each process of projection exposure of each workpiece 510 and 511 in 110 and 111, When the control unit 410 performs projection exposure on the workpiece 511 placed in the second area 111 by the light source 10, the mask 20, and the projection optical system 50, at least the position detection device 210 is used to detect the placement on the first Parallel processing of placement positions of workpieces 510 in a region 110.

In addition, the projection exposure apparatus 1 of this embodiment is an exposure apparatus capable of exposing one workpiece to a pattern that is to be projected and exposed in one shot. In addition, the projection exposure device 1 of each of the above-mentioned embodiments is a device including a position where a pattern to be projected is exposed to a position of a position-detected workpiece, and the mask 20 is moved in the vertical (Y), horizontal (X), and high positions. (Z) and at least one of the rotation (θ) directions of the driving device, and / or includes a swing driving device that changes the angle of the photomask 20 to the exposure light source from a vertical plane, and / or includes a rotating device A driving device that moves the lower stage of 120 in at least one of the vertical (Y), horizontal (X), high (Z), and rotational (θ) directions, and / or includes moving the projection optical system 50 in the vertical direction. A driving device in at least one of (Y), horizontal (X), high (Z), and rotational (θ) directions.

In addition, the projection exposure method of the projection exposure apparatus 1 of this embodiment uses the projection exposure apparatus 1 which sets a predetermined pattern of the mask 20 at a predetermined position on the workpieces 510 and 511, and The light is subjected to projection exposure, thereby forming a predetermined pattern on the workpieces 510 and 511, and having a turntable 120, which forms a plurality of areas 110 in such a manner that a plurality of workpieces 510 and 511 can be placed at the same time without overlapping. The area 111 is at the top of the part on which the workpieces 510 and 511 are placed, and is configured to be rotatable and temporarily stopped at a predetermined plurality of stops. At positions 610 and 611, the projection exposure method includes: (A) loading the workpieces 510 and 511 in one of the plurality of regions 110 and 111 of the turntable 120 in the first region 110; (B) rotating the turntable 120 And step of temporarily stopping the first region 110 at one of the predetermined stopping positions 610 and 611; (C) detecting the placement positions of the workpieces 510 and 511 in the first region 110; (D) a step of rotating the turntable 120 again to temporarily stop the first region 110 at a predetermined second stop position 610 and a second stop position 611 which is different from the first stop position 610; (E) a mask The step of projecting and exposing the pattern on 20 to the workpiece 510 in the first region 110; (F) When there is a workpiece 511 in the second region 111 that is different from the first region 110 in the turntable 120, the sum ( E) The projection exposure processing is performed in parallel, and the first cycle is completed by unloading the workpiece 511 that has completed the projection exposure from the second area 111; and (G) the steps of the first cycle (A) to (F) described above. The first region 110 is replaced with the second region 111, and the region is replaced with only two regions. The first region 110 and a second cycle of processing, and on the subsequent cycles, the interactive system to replace only the first step region 110 and the region 111 of the second embodiment of the embodiment when the two regions.

As in the first embodiment described above, the projection optical system 50, the position detection unit 210, and the loader 310 are each in the first or second position. When the stop position is temporarily stopped, it is possible to perform different processes of loading / unloading, position detection, or projection exposure of different workpieces in different areas on the first or second area for workpiece placement simultaneously. Therefore, compared with the conventional technique of continuously performing each process serially in the same place, this embodiment can perform parallel processing, which can further shorten the processing time.

<Second Embodiment>

Compared to the second embodiment shown in FIGS. 3 to 5 and the first embodiment shown in FIGS. 1 to 2, the stop position is increased from two to three (the first stop position 610 to (Third stop position 612), and along with this, the area for placing workpieces on the workpiece turntable 120 has also been increased from two to three (the first region 110 for workpiece placement to the third region 112 for workpiece placement) . At the same time, three workpieces (the first workpiece 510 to the third workpiece 512) can be placed on the workpiece turntable 120 without overlapping. The other configuration is the same as that of the first embodiment, so the repeated description is omitted.

Each area for placing a workpiece on the workpiece turntable 120 is arranged so that an angle from the center of the workpiece turntable 120 is 120 degrees which is 1/3 of 360 degrees. Therefore, when the first workpiece 510 is placed in the first region 110 for workpiece placement and temporarily stopped at the first stop position 610, the second workpiece 511 in the second region 111 for workpiece placement is temporarily stopped at the second In the stop position 611, the third workpiece 512 on the workpiece placing third region 112 is temporarily stopped at the third stop position 612.

In addition, in FIG. 3 (a), the loader 310 is not located above or near the area stopped at the first stop position 610 but is disposed at The position detection unit 210 stopped at an upper portion of or near the area stopped at the third stop position 612 is disposed at a position different from the position detection unit 210 provided at an upper portion of the area stopped at the first stop position 610. In addition, the loader 310 is capable of unloading the exposed workpiece from the first region 110 for workpiece placement to the third region 112 for workpiece placement temporarily stopped at the third stop position 612, and can unload the unexposed workpiece. The workpiece is loaded in this area.

Next, the operation of this embodiment will be described using FIGS. 4 to 5. First, when the control unit 410 starts processing, it is confirmed whether the first area 110 for placing a workpiece on the turntable 120 is temporarily stopped at the third stop position 612 (S21). When the first region 110 for workpiece placement is temporarily stopped at the third stop position 612 (S21: Yes), it is confirmed whether or not an unexposed workpiece is placed in the first region 110 for workpiece placement (S22). If the first area 110 for workpiece placement is not temporarily stopped at the third stop position 612 (S21: No), the first area 110 for workpiece placement is temporarily stopped at the first stop position 610 or the second stop position. 611, the process proceeds to step S40.

When an unexposed workpiece is not placed in the first region 110 for workpiece placement (S22: Yes), the control unit 410 is configured to place the unexposed workpiece in the first region 110 for workpiece placement and place the unexposed workpiece in the first region 110 for workpiece placement. The command is output to the loader 310 (S23). When an unexposed workpiece is placed in the first area 110 for workpiece placement (S22: No), since it is not necessary to load an unexposed workpiece, the process proceeds to step S24 and the turntable is rotated (S24). When the first area 110 for workpiece placement on the turntable 120 reaches the first stop position 610, a temporary stop command is output (S25).

The first area 110 for workpiece placement is at the first stop position After 610 is temporarily stopped, it is confirmed whether there is a work for detecting the end position in the work placement second area 111 at the second stop position 611 (S26). If there is a workpiece with the end position detection in the second region 111 for workpiece placement (S26: Yes), the control unit 410 detects the first workpiece with the end position in the second region 111 for workpiece placement in the second region. The stop position 611 performs transfer to the workpiece by the projection exposure of the pattern of the mask 20 (S27), and proceeds to step S32 (S32). If there is no work for detecting the end position in the work placement second area 111 (S26: No), the process proceeds to step S32 (S32).

After the processing in step S26, the transfer of the workpiece in which the end position is detected in the second region 111 for workpiece placement is performed simultaneously with the transfer, and it is confirmed whether there is an end of exposure in the third region 112 for workpiece placement in the third stop position 612. Work (S28). If there is a workpiece whose exposure has ended in the third area 112 for workpiece placement (S28: Yes), the control unit 410 unloads the workpiece which has been exposed from the third area 112 for loading of the workpiece to the loader 310 (S29) Then, an unexposed workpiece can be loaded into the third region 112 for workpiece placement, and a command is output (S30). If there are no exposed workpieces in the third region 112 for workpiece placement (S28: No), since there is no need to load the workpiece, the process proceeds to step S30, and the unexposed workpiece is loaded in the third region 112 for workpiece placement ( S30), and the process proceeds to step S32 (S32).

Further, after the processing in step S26, the unexposed in the first region 110 for the workpiece placement of the first stop position 610 is detected in parallel with the transfer of the workpiece detected at the end position in the second region 111 for the workpiece placement. And the workpiece is placed at the position, and the process proceeds to step S32 (S32). After all the simultaneous and parallel processes of steps S27, S30, and S31 described above are completed, Then, the control unit 410 rotates the turntable again (S32). When the workpiece loading first area 110 on the turntable 120 reaches the second stop position 611, a temporary stop command is output (S33).

After the work placement first area 110 is temporarily stopped at the second stop position 611, it is confirmed whether there is an unexposed work in the work placement third area 112 at the third stop position 612 (S34). If there is an unexposed workpiece in the third region 112 for workpiece placement (S34: Yes), the control unit 410 uses the position detection device 210 to detect the position of the unexposed workpiece 512 in the third region 112 for workpiece placement. (S35), and it progresses to step S40 (S40). If there are no unexposed workpieces in the third region 112 for workpiece placement (S34: No), the process proceeds to step S40 (S40).

After the processing of step S34, the position detection processing of the unexposed workpiece in the third region 112 for workpiece placement is performed in parallel with that of the third region 111, and it is confirmed whether or not there is an end of exposure in the second region 111 for workpiece placement at the third stop position 612. Work (S36). If there is an exposed workpiece in the second area 111 for workpiece placement (S36: Yes), the control unit 410 unloads the exposed workpiece from the second area 111 for workpiece placement to the loader 310 (S37) A command is output so that an unexposed workpiece can be loaded into the second region 111 for workpiece placement (S38). If there are no exposed workpieces in the second region 111 for workpiece placement (S36: No), since there is no need to load a workpiece, the process proceeds to step S38, and the unexposed workpiece is loaded in the second region 111 for workpiece placement ( S38), and the process proceeds to step S40 (S40).

In addition, after the processing of step S34, the position detection processing of the unexposed workpiece in the third workpiece mounting area 112 is performed at the same time In parallel, the control unit 410 detects the workpiece at the end position in the first region 110 for workpiece placement, and transfers the workpiece to the workpiece at the second stop position 611 by projecting exposure with a predetermined pattern of the mask 20 (S39). And proceed to step S40 (S40). After all the simultaneous and parallel processes of steps S35, S38, and S39 described above are completed, the control unit 410 rotates the turntable again (S40). When the first area 110 for workpiece placement on the turntable 120 reaches the first stop position 610, a temporary stop command is output (S41). The control unit 410 unloads the exposed workpiece from the loader first area 110 to the loader 310 (S42), and the control unit 410 confirms whether or not there is an unexposed workpiece remaining (S43).

If there are no unexposed workpieces remaining (S43: Yes), the processing is terminated. If there are remaining unexposed workpieces (S43: No), the process returns to step S21 to check whether the first area 110 for workpiece placement is temporarily stopped. In the third stop position 612 (S21), the following processing is repeated.

Therefore, the projection exposure device 1 of the present embodiment 1 is a turntable 120 having a third area 112 which is different from one of the first area 110 and the second area 111 of the plurality of areas 110 and 111, and the loader 310 is the first of the turntable 120. When an area 110 is temporarily stopped at the first stop position 610, it is arranged in such a manner that workpieces 512 can be loaded and / or unloaded into the third area 112 of the turntable 120, and the control unit 410 detects that it is placed in the first area 110 At the same time as the placement position of the workpiece 510 inside, when the workpiece 511 placed in the second area 111 can be projected and exposed, the projected exposure workpiece 512 placed in the third area 112 can be loaded after the unloading is completed. Unexposed workpieces are processed in parallel.

In addition, the projection exposure method of the projection exposure apparatus 1 of this embodiment uses the projection exposure apparatus 1 which sets a predetermined pattern of the mask 20 at a predetermined position on the workpieces 510 and 511, and The light is subjected to projection exposure to thereby form a predetermined pattern on the workpieces 510 and 511, and has a turntable 120. The turntable 120 is formed with a plurality of areas in such a manner that a plurality of workpieces 510 and 511 can be placed simultaneously without overlapping. 110 and 111 are on the top of the part on which the workpieces 510 and 511 are placed, and are configured to be rotatable and temporarily stopped at a predetermined plurality of stopping positions 610 and 611. The projection exposure method has: (A) the workpieces 510 and 511 A step of loading in one of the plurality of regions 110 and 111 of the turntable 120 in the first region 110; (B) rotating the turntable 120 to temporarily stop the first region 110 in each of the predetermined stopping positions 610 and 611; A step of a first stop position 610; (C) a step of detecting the placement positions of the workpieces 510 and 511 in the first region 110; (D) a turn of the turntable 120 again to temporarily stop the first region 110 at a predetermined position Stop position 610 And (611) a step of the second stop position 611 that is different from the first stop position 610; (E) a step of projecting a predetermined pattern on the photomask 20 onto the workpiece 510 in the first area 110; (F) when When there is a workpiece 511 in the second region 111 that is different from the first region 110 in the turntable 120 and the projection exposure is ended, the projection exposure end of the second region 111 is unloaded from the second region 111 in parallel with the projection exposure processing of (E). And (G) replacing the first region 110 in the first cycle of (A) to (F) with the second region 111, and replacing the region with three or more regions. In the third region 112 of the present time, the second cycle of processing is performed, and in the subsequent cycle, the steps are performed by replacing the regions with ascending order when there are three or more regions, and finally returning to the first region 110 to implement.

In addition, the projection exposure apparatus 1 of this embodiment is an exposure apparatus capable of exposing a workpiece to a pattern to be projected and exposed in one shot. In addition, the projection exposure apparatus 1 of each of the embodiments described above may include a device that moves the position of the pattern to be projected to the position of the position-detected workpiece, and may include moving the mask 20 in the vertical (Y), horizontal (X), A driving device in at least one of the high (Z) and rotation (θ) directions, and / or may include a swing driving device that changes the angle of the mask 20 to the exposure light source from a vertical plane, and / or may include A driving device that is arranged below the turntable 120 and moves in at least one of the vertical (Y), horizontal (X), high (Z), and rotational (θ) directions, and / or may include a projection optical system. 50 is a driving device that moves in at least one of the vertical (Y), horizontal (X), high (Z), and rotational (θ) directions.

As in the second embodiment described above, when the projection optical system 50, the position detection unit 210, and the loader 310 are temporarily stopped at each stop position, loading / unloading of different workpieces in different areas can be performed in parallel at the same time. , Different detection of the position of the workpiece, or projection exposure. Therefore, compared with the conventional technique of successively performing each process in the same place, this embodiment can implement parallel processing. It can shorten the processing time.

<Third Embodiment>

In addition, the workpiece placing area on the workpiece turntable 120 and its stopping position are made four or more, and it takes time-consuming processing, such as adding a loader 310 to load a plurality of workpieces in a single loading operation. The sequential implementation of position detection or exposure processing that takes less time can further reduce processing time. In addition, in this case, a position detection unit 210 may be added in accordance with a demand.

Therefore, the projection exposure device 1 of the present embodiment 1 is a turntable 120 having n areas 110, 111, 112 ... (n is an integer of n ≧ 4), and the position detection device 210 is a first area of the turntable 120. When temporarily stopped at the first stop position 610, it is arranged in one of the first areas 110 of the n areas of the turntable 120 so that the placement position of the workpiece 510 placed in the first area 110 can be detected. Directly above, when the light source 10, the mask 20, and the first area 110 of the turntable 120 of the projection optical system 50 temporarily stop at the first stop position 610, the workpiece 511 placed in the second area 111 can be projected and exposed. The method is arranged in the upper part of the second area 111 which is one of the n areas of the turntable 120 and is different from the first area 110. When the loader 310 is temporarily stopped at the first stop position 610, The third area 112, which is one of the n areas of the turntable 120 and is different from the first area 110 and the second area 111, can be configured to load and unload the workpiece 512, and the control unit 410 detects whether it is placed on the first area. While placing the workpiece 510 in a region 110 Can When performing projection exposure on the workpiece 511 placed in the second area 111, parallel processing of unexposed workpieces is loaded after unloading the workpiece 512 placed in the third area 112 and ending the projection exposure.

In addition, the projection exposure apparatus 1 of this embodiment is capable of loading and unloading a workpiece in one of the n regions of the turntable 120 and a fourth region to an n-th region different from the first region 110 to the third region 112. A plurality of loaders 310 are configured in the manner described above, and the control unit 410 performs parallel processing in such a manner that unloaded workpieces can be loaded after unloading the workpieces that have been placed in the fourth region to the n-th region and have completed projection exposure.

In addition, the projection exposure apparatus 1 of this embodiment is an exposure apparatus capable of exposing a workpiece to a pattern to be projected and exposed in one shot. In addition, the projection exposure apparatus 1 of each of the above-described embodiments is an apparatus that can move the position of the pattern to be projected to the position of the position-detected workpiece, which may include moving the mask 20 in the vertical (Y) and horizontal (X) directions. A driving device in at least one of the high (Z) and rotation (θ) directions, and / or may include a swing driving device that changes the angle of the mask 20 to the exposure light source from a vertical plane, and / or may include A driving device for moving the pedestal disposed below the turntable 120 in at least one of the vertical (Y), horizontal (X), high (Z), and rotational (θ) directions, and / or may include a projection optical The system 50 moves the driving device in at least one of the longitudinal (Y), lateral (X), high (Z), and rotational (θ) directions.

1‧‧‧ projection exposure device

10‧‧‧Light source department

20‧‧‧Photomask (Reticle)

30‧‧‧Mask XYθ stage

40‧‧‧Masking swing stand

50‧‧‧ projection optical system

60‧‧‧Mask XYθ Stage Driver

70‧‧‧Masking swing stand drive unit

110‧‧‧First area for workpiece placement

111‧‧‧Second area for workpiece placement

120‧‧‧ Turntable for workpiece

130‧‧‧Turntable shaft for workpiece

140‧‧‧Z base for workpiece

150‧‧‧Workpiece turntable drive unit

160‧‧‧Z stage drive for workpiece

210‧‧‧Position detection section

310‧‧‧Loader

410‧‧‧Control Department

510‧‧‧First Workpiece

511‧‧‧Second workpiece

610‧‧‧First stop position

611‧‧‧Second stop position

Claims (10)

A projection exposure device is a method of projecting and exposing a predetermined pattern of a photomask to a predetermined position on a workpiece with light from a light source, thereby forming the predetermined pattern on the workpiece, including a turntable and a plurality of The workpieces can be placed at the same time without overlapping the workpieces. A plurality of areas are formed on the top of the part on which the workpieces are placed, and they are configured to be able to rotate and temporarily stop at predetermined stopping positions. Loading and unloading of the workpiece in the plurality of areas of the turntable; a position detection device, which temporarily stops one of the first areas of the plurality of areas of the turntable in one of the predetermined stopping positions At the first stop position, it is arranged directly above the first area of the turntable in a manner that can detect the placement position of the workpiece placed in the first area; the light source, mask and projection optical system are attached to When the first area of the turntable is temporarily stopped at the first stop position, it can be projected and exposed to the work carried in the second area. The method is arranged on the upper part of the plurality of areas of the turntable directly above the second area which is different from the first area; and the control section controls: the rotation of the turntable and the stopping of the predetermined stop positions, loading The loading and unloading of a plurality of workpieces in each area by the machine, the detection of the placement position of each workpiece placed in each area by the aforementioned position detection device, the aforementioned light The source, the reticle, and the projection optical system perform various processes of projection exposure on each workpiece placed in each area. The aforementioned control unit is for the workpiece placed in the second area through the light source. When the photomask and the projection optical system perform projection exposure, at least parallel processing for detecting the placement position of the workpiece placed in the first area by the aforementioned position detection device is performed. The projection exposure device according to item 1 of the scope of patent application, wherein the turntable has a third area that belongs to one of the plurality of areas and is different from the first area and the second area, and the loader is configured to When the first area of the turntable is temporarily stopped at the first stop position, the workpiece is unloaded and / or loaded in the third area of the turntable, and the control unit is configured to be placed on the first When a workpiece is placed in an area and projection exposure is performed on the workpiece placed in the second area, the unexposed workpiece is loaded after unloading the workpiece exposed in the third area and ending the projection exposure. Way to implement parallel processing. The projection exposure device according to item 1 or item 2 of the scope of patent application, wherein the aforementioned turntable has n regions (n is an integer of n ≧ 4) as the aforementioned plurality of regions, and the aforementioned position detection device is provided on the aforementioned dial When the first area is temporarily stopped at the first stop position, it is disposed on the turntable in a manner capable of detecting a placement position of a workpiece placed in the first area. Directly above one of the n areas, the light source, mask, and projection optical system are loaded with projection exposure when the first area of the turntable temporarily stops at the first stop position. The way of placing the workpiece in the second area is arranged on the upper part of the second area which belongs to one of the n areas of the turntable and is different from the first area. The loader is on the first section of the turntable. When an area is temporarily stopped at the first stop position, it is configured in such a way that the workpiece can be loaded and unloaded in a third area that belongs to one of the n areas of the turntable and is different from the first area and the second area. The control unit is configured to unload the workpiece placed in the third area when detecting the placement position of the workpiece placed in the first area and performing projection exposure on the workpiece placed in the second area. Parallel processing is performed by loading unexposed workpieces after projecting exposed workpieces in the area. The projection exposure device according to item 3 of the scope of patent application, wherein a fourth area to an nth area capable of being loaded in one of the n areas belonging to the aforementioned turntable and different from the first area to the third area and The loader is unloaded by a plurality of loaders, and the control unit performs parallel processing by unloading the unexposed work piece after unloading the projected work piece that has been placed in the fourth area to the n-th area. The projection exposure device as described in any one of claims 1 to 4 of the scope of patent application, wherein The aforementioned projection exposure device is an exposure device that exposes a workpiece to a pattern to be projected and exposed in one shot. The projection exposure device according to any one of claims 1 to 4, wherein the device for positioning the position of the pattern to be projected and exposed to the position of the position-detected workpiece includes moving the photomask to a vertical position. A driving device in at least one of (Y), horizontal (X), high (Z), and rotational (θ) directions. The projection exposure device according to any one of claims 1 to 4, wherein the device that positions the position of the pattern to be projected against the position of the aforementioned position-detected workpiece includes a mask relative to the exposure A swing driving device that changes the angle of light from a vertical plane. The projection exposure device according to any one of claims 1 to 4, wherein the device for positioning the pattern to be projected and exposed to the position of the position-detected workpiece includes a device disposed on the turntable. The lower base is a driving device that moves in at least one of the vertical (Y), horizontal (X), high (Z), and rotational (θ) directions. The projection exposure device according to any one of claims 1 to 4, wherein the device for positioning the position of the pattern to be projected against the position of the position-detected workpiece includes moving the projection optical system. Between vertical (Y), horizontal (X), high (Z), and rotational (θ) directions Drive device with one less direction. A projection exposure method uses a projection exposure device that sets a predetermined pattern of a photomask at a predetermined position on a workpiece and performs projection exposure with light from a light source, thereby forming the predetermined pattern on the workpiece. And has a turntable, which is formed on the top of the part for placing the workpiece in such a manner that a plurality of workpieces do not overlap and can be placed at the same time, and is configured to be able to rotate and temporarily stop at a predetermined time. The projection exposure method includes: (A) a step of loading the workpiece in a first region of the plurality of regions of the turntable; (B) rotating the turntable to cause the first A step of temporarily stopping an area at a first stop position among the predetermined stop positions; (C) a step of detecting the placement position of the workpiece in the first area; (D) rotating the turntable again and A step of temporarily stopping the first region at a second stop position different from the first stop position among the predetermined stop positions; (E) The step of exposing the pattern on the mask to the aforementioned workpiece in the first region; (F) when there is the aforementioned workpiece in the second region that is different from the first region and the first region, the projected exposure is terminated, and the aforementioned ( E) Parallel projection exposure processing, unloading from the second area and ending the projection And (G) replacing the first region of the first cycle of the aforementioned (A) to (F) with the second region, and when there are three or more regions, Replace with the third area, or perform the second cycle with the first area when there are only two areas. For subsequent cycles, when there are more than three areas, the areas are gradually replaced in ascending order. And finally, it is implemented by returning to the first region, or when there are only two regions, it is implemented by alternately replacing the first region and the second region.