TWI730104B - Projection exposure device and projection exposure method thereof - Google Patents

Abstract

The projection exposure device of the present invention comprises: a slide table 120 having a plurality of regions 110 and 111 for placing a work-piece thereon; a first loader 310 and a second loader 311 capable of loading and unloading the work-pieces 510 and 511; a first position detection device 210; a second position detection device 211; a light source 10, a photomask 20 and a projection optical system 50; a sliding table 120, and a control unit 410 for controlling each unit, when the control unit 410 projects and exposes the work-piece 511 which is placed in the second area 111, a parallel process of detecting the placement position of the work-piece 510 placed in the first region 110 is performed, when the work-piece 510 which is placed in the first region 110 is projected and exposed, a parallel process of detecting the placement position of the work-piece 511 which is placed in the second area 111 is performed.

Description

Projection exposure device and projection exposure method thereof

The present invention relates to a technology for increasing the mass production rate of projection exposure devices, and particularly relates to a technology for reducing the total number of projection exposure times and increasing the mass production rate.

A projection exposure device that uses photolithography technology to transfer a pattern on a photomask (reticle) onto a workpiece such as a wafer or a substrate is disclosed in Citation 1 or Citation 2, for example.

Cited Document 1 is that the pattern on the original plate (reticle: mask) is projected on a table (or horizontal) that can be moved in the X (horizontal)-Y (vertical)-θ (rotation) direction using a projection lens as an intermediary. One of the exposed objects (workpieces) on the pedestal. The position of the exposed object (workpiece) in each of the XY directions is detected by a position detection device using a laser interferometer. Reference 1 discloses a stepwise movement direction for positioning a reticle and a wafer for high-precision stepwise exposure, and a movement direction of the wafer relative to the laser interferometer of the position detection device.

Reference 2 is that the stage (or pedestal) on which one workpiece is placed is not only capable of moving in the X (horizontal)-Y (longitudinal)-θ (rotation) direction, but also the mask (standard) The table on which the wire sheet is placed can also move in the X (horizontal)-Y (longitudinal)-θ (rotation) direction. Reference 2 discloses that the scanning direction and scanning speed of both stages can be individually set.

[Advanced Technical Literature]

[Patent Literature]

Patent Document 1: JP 2001-203161

Patent Document 2: JP 11-260697

However, when the material of the workpiece is used, for example, a brittle material such as a crystalline material, or a brittle material such as glass even if it is non-crystalline, it must be handled carefully, that is, it must be performed at a relatively low speed. Therefore, the time required for loading and unloading the workpiece on the exposure area on the pedestal is an extremely long time such as 70 seconds.

In addition, due to the high definition of transfer patterns in recent years, the position detection of the workpiece on the pedestal when the projection exposure apparatus transfers the pattern to the workpiece is also required to be highly accurate, and the time required for position detection is required. There is a tendency to increase. In addition, when one side is moved to a plurality of positions and the side is exposed for a plurality of times, such as step exposure, more position detection time is required.

For example, in the conventional projection exposure apparatus of Patent Documents 1 and 2, first, the workpiece is loaded on a specific position on the pedestal, and then the position of the workpiece on the pedestal is detected, and then the pedestal or mask is placed on the detected position. After adjusting the position in each direction, the exposure is carried out. That is, in the conventional projection exposure apparatus and projection exposure method, each process is divided into 1 process. Don’t implement it in order. The only way to shorten the total processing time is to shorten the time required for each individual process or shorten the replacement time between each process.

The present invention was created in view of the above-mentioned problems, and its purpose is to provide a projection exposure apparatus and a projection exposure method, which can carry out the loading/unloading of the workpiece in the projection exposure process, and the workpiece placed on the pedestal At least two of the processing of position detection and projection exposure corresponding to the position of the workpiece are implemented in parallel, thereby shortening the total processing time compared to the prior art.

In order to achieve the above object, an embodiment of the projection exposure apparatus of the present invention is to project a specific pattern of the mask on a specific position on the workpiece, and use light from the light source to perform projection exposure, thereby forming the specific pattern on the workpiece Furthermore, the projection exposure apparatus has: a sliding table, which forms two first and second regions on the top of the part where the workpieces are placed in such a way that the two workpieces do not overlap and can be placed at the same time, and It is a structure that can alternately slide in the opposite direction and temporarily stop at the specific first stop position and second stop position at the end of each direction; the two first loaders are capable of loading and unloading workpieces on the sliding table. In each area; the first position detection device, when the sliding table is temporarily stopped at a specific first stop position, is arranged on the first position of the sliding table in a way to detect the placement position of the workpiece placed in the first area The upper part of an area; the second position detection device, the sliding table is temporarily stopped at a specific second At the stop position, it is arranged on the upper part of the second area of the sliding table in a way of detecting the placement position of the workpiece placed in the second area; the light source part, the mask and the projection optical system are used as the sliding table When temporarily stopping at a specific first stop position, the projection exposure can be projected to the workpiece placed on the second area of the slide table and is within the second area, and when the slide table is temporarily stopped at the specific second area In the stop position, it can be projected and exposed to the upper part of the first area of the sliding table and configured for the workpiece in the first area; and the control part controls: the sliding of the sliding table and stopping at each The position is stopped, the first loader performs loading and unloading of the workpiece in each area, the position detection device detects the placement position of the workpiece in each area, the light source unit, the reticle, and the projection optical system perform the inspection of the workpiece in each area. Each process of projection exposure of the workpiece is implemented by the control unit: when the workpiece placed in the second area is projected and exposed by the light source, the mask and the projection optical system, the position detection device detects that the workpiece is placed The placement position of the workpiece in the first area, on the contrary, when the workpiece placed in the first area is projected and exposed by the light source, the mask and the projection optical system, the position detection device detects the loaded position. Parallel processing of the placement position of the workpiece placed in the second area.

In order to achieve the above object, an embodiment of the projection exposure method of the present invention uses a projection exposure device that applies a specific pattern of a mask to a specific position on the workpiece and performs projection exposure with light from the light source. , To form a specific pattern on the workpiece, and has a sliding table, the sliding table is in a way that two workpieces do not overlap and can be placed at the same time, forming two first area and second area where the workpiece is placed Part of The structure of the first stop position and the second stop position that can alternately slide in the opposite direction and temporarily stop at the end of each direction. The projection exposure method has: (A) Sliding the slide table The step of temporarily stopping the first area at a specific first stop position; (B) the step of loading the workpiece in the first area of the sliding table; (C) the step of detecting the placement position of the workpiece in the first area; (D) The step of sliding the sliding table again to temporarily stop the first area at a specific second stop position; (E) The step of projecting and exposing the pattern on the mask to the workpiece in the first area; (F) When there is a workpiece in the second area of the slide table that ends the projection exposure, it is parallel to the projection exposure process of (E), and the step of unloading the workpiece that ends the projection exposure from the second area; and (G) replace the aforementioned ( A) to (F), the first area of the specific first stop position and the second area of the specific second stop position are processed for the period of the continuation, and the subsequent period is to alternately replace the first area and the second area Regionally implemented steps.

1: Projection exposure device

10: Light source

20: Mask (reticle)

30: XY θ pedestal for mask

40: Tilt pedestal for mask

50: Projection optical system

60: XY θ pedestal drive unit for mask

70: Tilt pedestal drive unit for mask

110: The first area for workpiece placement

111: The second area for workpiece placement

120: Sliding table for workpiece

140: Pedestal abutment for workpiece

150: XYZ tilt drive unit

210: The first position detection unit

211: The second position detection unit

310: The first loader

311: Second Loader

410: Control Department

510: First Workpiece

511: The second workpiece

610: first stop position

611: second stop position

Figure 1 (a) to (c) are diagrams showing the schematic configuration when the slide table of the exposure apparatus of the first embodiment of the present invention is stopped at the first stop position, and (a) is the side view at the first stop position In the figure, (b) is a side view at the second stop position, and (c) is a top view.

Fig. 2 is an operation flowchart of the exposure apparatus according to the first embodiment of the present invention.

General description:

An embodiment of the projection exposure apparatus of the present invention. The projection exposure apparatus of the present invention uses light from the light source to project and expose a specific pattern of the mask to a specific position on the workpiece, thereby forming the specific pattern on the workpiece. On the workpiece, it has: a sliding table, which forms two first and second regions on the top of the part where the workpiece is placed, and can interact with each other in a way that two workpieces do not overlap and can be placed at the same time. Sliding in the opposite direction and temporarily stopping at the specific first stop position and second stop position at the end of each direction; two first loaders, which can load and unload workpieces on each area of the sliding table respectively Inside; the first position detection device, when the sliding table is temporarily stopped at a specific first stop position, it is arranged in the first area of the sliding table in a way to detect the placement position of the workpiece placed in the first area Right upper part; the second position detection device is arranged in the second area of the sliding table by detecting the placement position of the workpiece placed in the second area when the sliding table is temporarily stopped at a specific second stop position The light source, the mask, and the projection optical system are designed to project exposure to the upper part of the second area placed on the sliding table when the sliding table is temporarily stopped at a specific first stop position. The workpiece in the second area, and when sliding When the table is temporarily stopped at a specific second stop position, it can be projected and exposed to the upper part of the first area of the slide table and configured for the workpiece in the first area; and the control unit, which controls The sliding of the sliding table and the stop at each stop position, the loading and unloading of the workpiece in each area of the first loader, the detection of the placement position of the workpiece in each area of the position detection device, the light source, the light For each process of projection exposure of the workpiece in each area of the mask and the projection optical system, the control unit is implemented to project the workpiece placed in the second area by the light source unit, the mask, and the projection optical system During exposure, the position detection device is used to detect the placement position of the workpiece placed in the first area. On the contrary, the workpiece placed in the first area is performed by the light source, the mask, and the projection optical system. During projection exposure, parallel processing of detecting the placement position of the workpiece placed in the second area by the position detection device.

Another embodiment of the projection exposure device of the present invention is that the projection exposure device is an exposure device that performs stepwise exposure of a pattern to be projected and exposed by taking multiple shots of a workpiece.

Another embodiment of the projection exposure apparatus of the present invention is a device that sets the position of the pattern to be projected and exposed to the position of the workpiece whose position is detected, and includes a linear movement of the mask in the vertical (Y) and horizontal (X) heights. (Z) A driving device in at least one of the directions.

Another embodiment of the projection exposure device of the present invention is a device that sets the position of the pattern to be projected and exposed to the position of the workpiece whose position is detected, and includes changing the angle of the mask to the exposure light source from the vertical plane The tilt drive device.

Another embodiment of the projection exposure apparatus of the present invention is a device that adjusts the position of the pattern to be projected to be exposed to the position of the workpiece whose position is detected, and includes linearly moving the pedestal arranged under the slide table in the vertical direction (Y ) A drive device in at least one of the horizontal (X) and high (Z) directions.

Another embodiment of the projection exposure apparatus of the present invention is a device that moves the position of the pattern to be projected and exposed to the position of the workpiece whose position is detected, and includes a linear movement of the projection optical system in the vertical (Y) and horizontal (X) directions. A drive device in at least one of the high (Z) directions.

An embodiment of the projection exposure method using the projection exposure device of the present invention uses a projection exposure device that aligns a specific pattern of a mask at a specific position on a workpiece and performs light from a light source part Projection exposure, by which a specific pattern is formed on the workpiece, and has a sliding table. The sliding table forms two first and second regions in a way that the two workpieces do not overlap and can be placed at the same time. The uppermost part of the part where the workpiece is placed, and can alternately slide in the opposite direction and temporarily stop at the specific first stop position and second stop position at the end of each direction. The projection exposure method has: (A) Make The step of sliding the slide table to temporarily stop the first area at a specific first stop position; (B) the step of loading the workpiece in the first area of the slide table; (C) detecting the placement of the workpiece in the first area Positioning steps; (D) Make the sliding table slide again so that the first area temporarily stops at a specific The step of the second stop position; (E) the step of projecting and exposing the pattern on the mask to the workpiece in the first area; (F) when there is a workpiece in the second area of the slide table that ends the projection exposure, then and ( E) The projection exposure process is parallel, the step of unloading the workpiece for the projection exposure from the second area; and (G) replacing the first area and the specific first stop position of the specific first stop position in (A) to (F) The second area of the second stop position is processed for the continued cycle, and the subsequent cycle is the step of alternately replacing the first area and the second area.

The effect of invention:

According to the exposure device of the present invention, it is possible to install a plurality of workpieces without overlapping and to be placed at the same time, forming a plurality of areas on the top of the part where the workpieces are placed, and being able to slide and temporarily stop at a specific one. The reciprocating sliding table composed of plural stop positions can also be centered on the projection optical system that projects the pattern on the mask on the workpiece, and is arranged on the sliding table corresponding to different areas on the sliding table. Both sides of the direction can be implemented in parallel by this. Accordingly, it is possible to provide a projection exposure device and a projection exposure method that can shorten the total exposure time to the workpiece more than the conventional technology.

Description of the implementation form shown in the figure: <First Embodiment>

Hereinafter, the first embodiment of the present invention will be described with reference to the drawings. Figures 1 (a) and (b) show the schematic structure of the exposure apparatus 1 of the first embodiment of the present invention, which is a roughly rectangular workpiece slide table. The system 120 is installed above the pedestal base 140 for the workpiece.

Above the slide table 120 for a workpiece, two first regions 110 for mounting a workpiece and a second region 111 for mounting a workpiece are arranged on both ends of the long side of the slide table 120. The first area 110 for placing the workpiece and the second area 111 for placing the workpiece are larger than the respective surface areas of the first workpiece 510 and the second workpiece 511, and each have a sufficient area for placing the respective workpieces. In addition, each area can be provided with a position identification stamp (ID) or a mark (not shown) indicating a reference point for position measurement in a place that does not interfere with each workpiece.

The work slide 120 is connected to a control unit 410 including a microcomputer or a central calculation unit (CPU) through the XYZ tilt driving unit 150 as an intermediary. In accordance with a command from the control unit 410, the driving signal is transmitted from the XYZ tilt driving unit 150 to the work slide 120. The sliding table 120 for the workpiece can precisely control the sliding distance and the stop position of the sliding table on the plane of the sliding table by a driving mechanism not shown in the figure. In addition, the work slide 120 is connected to a power source (not shown) to supply electric power necessary for sliding.

The base 140 for the workpiece is a base for tilting the slide 120 for the workpiece in each direction of X, Y, and Z. According to requirements, a driving mechanism or a guide rail can also be provided. Although the present embodiment describes the case of sliding only in the X direction, it is also possible to use the function of tilting in another direction by means of alignment for exposing a specific pattern.

The first area 110 for workpiece placement uses the XYZ tilt driving unit 150 controlled by the control unit 410 as an intermediary to slide the workpiece slide 120, thereby being able to move to the first stop position 610 or the second stop position 611, and stopped at this position. The more detailed the pattern of the exposed specific pattern is, the more precise control must be made at the same time to improve the sliding accuracy and stopping accuracy. The first position detection unit 210 is arranged, for example, directly on the upper part of the first region 110 for workpiece placement when temporarily stopped at the first stop position 610. In addition, FIG. 1(a) shows that the first loader 310 is arranged above or near the area of the first area 110 for placing the workpiece when it is temporarily stopped at the first stop position 610. The first loader 310 is capable of unloading exposed workpieces from the first region 110 for workpiece placement temporarily stopped at the first stop position 610, and can load unexposed workpieces from this region. The exposed work piece descending from the upper part of the work slide table 120 is transferred to the continuation process, and the unexposed work piece is moved to the vicinity of the first loader 310. For example, a conveyor belt not shown in the figure can be used. . Moreover, the projection optical system 50 for exposure is arrange|positioned directly on the upper part of the 2nd stop position 611.

The second area 111 for placing the workpiece also slides the slide 120 for the workpiece controlled by the control unit 410, thereby being able to move to the first stop position 610 or the second stop position 611 and stop at this position. Since the first stop position 610 and the second stop position 611 are arranged at both ends of the long side of the slide 120 for the workpiece which is slightly rectangular, when temporarily stopped at the first stop position 610, the first position detection unit 210 is arranged directly above the first area 110 for workpiece placement, and the first loader 310 is arranged above or near the area of the first area 110 for workpiece placement, for exposure The projection optical system 50 is arranged directly above the second area for workpiece placement 111, but when temporarily stopped at the second stop position 611, the second position detection unit 211 is arranged in the second area for workpiece placement The second loader 311 is arranged above or near the area of the second area 111 for workpiece placement, and the projection optical system 50 for exposure is placed directly above the area of the first area 110 for workpiece placement.

In the upper part of the projection optical system 50 for exposure, the light source part 10, the mask 20, the XY θ pedestal 30 for masks, and the inclined pedestal 40 for masks are arrange|positioned. The situation in Figure 1(a) is that the exposure light source unit from the light source unit 10 is the transmission mask 20 and the projection optical system 50, and is placed in the second area 111 for workpiece placement when temporarily stopped at the first stop position 610 The second workpiece 511 is exposed, thereby transferring the specific pattern on the photomask 20 to the second workpiece 511.

The mask XY θ pedestal 30 is connected to a control unit 410 including a microcomputer or a central calculation unit (CPU) through the mask XY θ pedestal drive unit 60 as an intermediary. In accordance with a command from the control unit 410, the driving signal is transmitted from the mask XY θ pedestal drive unit 60 to the mask XY θ pedestal 30. The mask XY θ pedestal 30 is driven by the mask XY θ pedestal which can move in the X direction (horizontal direction), Y direction (vertical direction), and theta (rotation) direction on the pedestal plane not shown in the figure. The part 60 precisely controls the stop position in the XY θ (vertical, horizontal, and rotational) direction on the plane of the base. In addition, the XY θ pedestal 30 for the mask is also connected to a power source not shown, and is supplied with electric power necessary for movement in the XY θ (vertical, horizontal, and rotational) directions.

Tilt base 40 for mask is driven by tilt base for mask The unit 70 is an intermediary and is connected to the control unit 410 including a microcomputer or a central calculation unit (CPU). In accordance with a command from the control unit 410, the driving signal is transmitted from the mask tilt pedestal drive unit 70 to the mask tilt pedestal 40. The tilt pedestal 40 for the mask is a tilt pedestal drive unit 70 that can tilt the pedestal plane not shown in the figure from an angle perpendicular to the optical axis, and can precisely control the tilt of the pedestal plane. The stop position of the state. In addition, the tilt pedestal 40 for the mask is also connected to a power source (not shown) to be supplied with electric power necessary for the tilt pedestal plane.

The control unit 410 controls the slide table 120 for the workpiece, the pedestal base 140 for the workpiece, and the XY θ pedestal 30 for the mask so that the specific pattern on the mask 20 can be accurately transferred to the specific position on the second workpiece 511. , And the position on the plane of the inclined pedestal 40 for the mask, and the angle and inclination angle on the plane. At this time, for example, using a microscope for a mask and a microscope for a workpiece, etc., not shown, the mask alignment mark on the mask not shown can be controlled to match the workpiece alignment mark on the workpiece. In addition, in response to demand, the projection optical system 50 is also provided with a driving unit to perform control of projecting a specific pattern on the mask to a specific position on the workpiece.

Next, the operation of this embodiment will be explained using Fig. 2. First, when the process is started, it is confirmed whether the slide table 120 is temporarily stopped at the first stop position 610 (S1). If the slide table 120 is temporarily stopped at the first stop position 610 (S1: Yes), it is checked whether an unexposed workpiece is placed on the first area 110 for workpiece placement of the slide table 120 (S2). If the slide table 120 is not temporarily stopped at the first stop position 610 (S1: No), since the slide table 120 is temporarily stopped at the second stop position 611, the process proceeds to step S7.

If the unexposed work is not placed in the first work placement area 110 of the slide table 120 (S2: Yes), the control unit 410 can load the unexposed work in the first work placement area 110 The command is output to the first loader 310 (S3). If the unexposed workpiece is placed in the first area 110 for workpiece placement (S2: No), since there is no need to load the unexposed workpiece, the process proceeds to step S4, and according to the command of the control unit 410, the first position The detection part 210 detects the position of the 1st workpiece|work 510 in the 1st workpiece|work mounting area 110 (S4). At this time, for example, a microscope for the workpiece may be used to detect the pedestal alignment mark on the pedestal and the workpiece alignment mark on the workpiece.

After detecting the position of the first workpiece 510 in the first region 110 for workpiece placement, the control unit 410 outputs a command for sliding the slide table 120 from the first stop position 610 to the second stop position 611 to the XYZ tilt driving unit 150 ( S5). After the first area 110 for workpiece placement on the slide table 120 reaches the right lower part of the projection optical system 50 when the second stop position 611 is reached, a temporary stop command is output (S6).

After the slide table 120 is temporarily stopped at the second stop position 611, it is confirmed whether there is an exposed workpiece in the second area 111 for the workpiece placement of the slide table 120 at the first stop position 610 (S7). If there is an exposed workpiece in the second region 111 for workpiece placement (S7: Yes), the control unit 410 outputs to the second loader 311 to unload the exposed workpiece from the second region 111 for workpiece placement (S8), and load the unexposed workpiece in the second region 111 for workpiece placement (S9). If there is no exposed workpiece in the second area 111 for workpiece placement (S7: No), there is no need to unload the workpiece, so proceed Proceed to step S9, and load the unexposed workpiece on the second region 111 for workpiece placement (S9).

After the processing of step S7, and the processing of loading the workpiece in the second region 111 for workpiece placement simultaneously, the first workpiece 510 whose position has been detected in the first region 110 for workpiece placement is stopped at the second The position 611 implements the transfer on the first work 510 which is the projection exposure of the specific pattern of the mask 20 (S10). When the transfer of the specific pattern is finished, the control unit 410 outputs a command to slide again to the XYZ tilt driving unit 150 (S11), and when the slide table 120 reaches the first stop position 610, it outputs a command to temporarily stop (S12) ).

After the slide table 120 is temporarily stopped at the first stop position 610, it is confirmed whether there is an exposed workpiece in the first area 110 for workpiece placement of the slide table 120 at the first stop position 610 (S13). If there is an exposed workpiece in the first region 110 for workpiece placement (S13: Yes), the control unit 410 outputs to the first loader 310 to unload the exposed workpiece from the first region 110 for workpiece placement (S14), and proceed to step S16 to confirm whether an unexposed workpiece remains (S16). If there is no exposed workpiece in the first region 110 for workpiece placement (S13: No), since there is no need to unload the workpiece, it proceeds to step S16 to confirm whether an unexposed workpiece remains (S16).

Parallel to the process of confirming whether there is an exposed workpiece in the first region 110 for workpiece placement of the slide table 120 at the first stop position 610 after step S12, the position in the second region 111 for workpiece placement is performed simultaneously. The second workpiece 511 to be detected is transferred to the second workpiece 511 for projection exposure of the specific pattern of the mask 20 at the second stop position 611 (S15), the control unit 410 confirms whether or not an unexposed workpiece remains (S16).

If there are no unexposed workpieces remaining (S16: Yes), the process ends, and if there are unexposed workpieces remaining (S16: No), return to step S1 to confirm whether the first area 110 for workpiece placement is temporarily Stop at the first stop position 610 (S1), and repeat the subsequent processing.

Therefore, the projection exposure apparatus 1 of the present embodiment uses the light from the light source unit 10 to project and expose the specific pattern of the mask 20 to specific positions on the workpieces 510 and 511, thereby forming the specific pattern on the workpieces 510 and 511. The projection exposure device 1 on the 511 has: a sliding table 120, which forms two first regions 110 and second regions 111 in a manner that the two workpieces 510 and 511 do not overlap and can be placed at the same time. The structure of the uppermost part where the workpieces 510 and 511 are placed, and can alternately slide in the opposite direction and temporarily stop at the end of each direction at the specific first stop position 610 and second stop position 611; two first loads The machine 310 and the second loader 311 are capable of loading and unloading the workpieces 510 and 511 in each area of the sliding table 120, respectively; the first position detection device 210, which is temporarily stopping the sliding table 120 at a specific first position At a stop position 610, it is arranged on the upper part of the first area 110 of the slide table 120 in a manner capable of detecting the placement position of the workpiece 510 or 511 placed in the first area 110; the second position detecting device 211 , Which is when the sliding table 120 is temporarily stopped at a specific second stop position 611, it is arranged on the first section of the sliding table 12.0 in a manner that can detect the placement position of the workpiece 510 or 511 placed in the second area 111 The upper part of the second area 111; The light source unit 10, the mask 20, and the projection optical system 50 are designed to allow projection exposure to the front of the second area 111 placed on the slide table 120 when the slide table 120 is temporarily stopped at a specific first stop position 610 The upper part is the workpieces 510 and 511 in the second area 111, and when the slide table 120 is temporarily stopped at a specific second stop position 611, it can be projected and exposed to the front of the first area 110 placed on the slide table 120. The upper part is configured in the manner of the workpieces 510 and 511 in the first area 110; and the control part 410, which controls: the sliding of the sliding table 120 and the stopping at each stop position 610 and 611, and the first loader 310 The loading and unloading of the workpieces 510 and 511 in each area, the position detection devices 210 and 211 for the detection of the placement positions of the workpieces 510 and 511 in each area, the light source unit 10, the mask 20, and the projection optical system 50 Each process of projection exposure of the workpieces 510 and 511 in the area is implemented by the control unit 410: the workpiece placed in the second area 111 is subjected to projection exposure through the light source unit 10, the mask 20 and the projection optical system 50 At this time, the position detection device 210 detects the placement position of the workpiece 510 placed in the first area 110. On the contrary, the workpiece 510 placed in the first area 110 is detected by the light source unit 10 and the photomask. When 20 and the projection optical system 50 perform projection exposure, the position detection device 211 detects the placement position of the workpiece 511 placed in the second area 111 in parallel processing.

In addition, the projection exposure apparatus 1 of the present embodiment is an exposure apparatus that can perform stepwise exposure of a pattern of projection exposure by multiple shots of a workpiece 510 or 511. In addition, the projection exposure apparatus 1 of each of the above-mentioned embodiments aligns the position of the pattern for projection exposure to the position detection The device for the positions of the workpieces 510 and 511 includes a drive device 60 that linearly moves the mask 20 in at least one of the vertical (Y), horizontal (X), and high (Z) directions, and/or exposes the projection The device for the position of the pattern to the position of the workpiece 510, 511 for position detection includes tilt driving devices 40, 70 that change the angle of the mask 20 to the exposure light source from the vertical, and/or the pattern for projection exposure The device for positioning the positions of the workpieces 510 and 511 that have been detected by the position includes moving the pedestal arranged under the slide table 120 linearly at least in the vertical (Y), horizontal (X), and high (Z) directions The driving device 150 in one direction, and/or the device that moves the position of the projected exposure pattern to the position of the workpiece 510, 511 for position detection, includes the linear movement of the projection optical system 50 in the vertical (Y) horizontal ( X) A drive device in at least one of the high (Z) directions.

In addition, the projection exposure method of the projection exposure apparatus 11 of the present embodiment uses a specific pattern of the mask 20 to a specific position on the workpiece 510, 511, and projection exposure with light from the light source unit 10, thereby exposing the specific pattern It is formed on the workpieces 510 and 511, and has the first region 110 and the second region 111 formed on the positions where the workpieces 510 and 511 are placed in such a way that the two workpieces 510 and 511 do not overlap and can be placed at the same time. The projection exposure apparatus 1 of the slide table 120 composed of the topmost, and can slide in the opposite direction and temporarily stop at the end of each direction at the specific first stop position 610 and the second stop position 612, the projection exposure method has: (A) The step of sliding the sliding table 120 to temporarily stop the first area 110 at a specific first stop position 610; (B) Loading the workpieces 510 and 511 on the first area 110 of the sliding table 120 Steps within; (C) the step of detecting the placement positions of the workpieces 510 and 511 in the first area 110; (D) sliding the slide table 120 again to temporarily stop the first area 110 at the specific second stop position 611 The steps; (E) the step of projecting and exposing the pattern on the mask 20 to the workpieces 510 and 511 in the first area 110; (F) when there is a workpiece in the second area 111 of the slide table 120 that ends the projection exposure, Then, in parallel with the projection exposure processing of (E), the step of unloading the workpieces 510 and 511 for the projection exposure from the second area 111; and (G) replacing the specific first stop in (A) to (F) above The first area 110 of the position 610 and the second area 111 of the specific second stop position 611 are processed for the continuous cycle, and the subsequent cycle is a step implemented by alternately replacing the first area 110 and the second area 111.

As in the above-mentioned first embodiment, when the projection optical system 50, the position detection unit 210, the first loader 310, and the second loader 311 are temporarily stopped at each of the first or second stop positions, they are used for workpiece placement. Different workpieces on different areas of the first or second can simultaneously implement different processing of loading/unloading of the workpieces, position detection, or projection exposure. Therefore, compared with the conventional technique of continuously performing each process in a series at the same place, the present embodiment can perform parallel processing, so that the processing time can be further shortened.

1: Projection exposure device

10: Light source

20: Mask (reticle)

30: XY θ pedestal for mask

40: Tilt pedestal for mask

50: Projection optical system

60: XY θ pedestal drive unit for mask

70: Tilt pedestal drive unit for mask

110: The first area for workpiece placement

111: The second area for workpiece placement

120: Sliding table for workpiece

140: Pedestal abutment for workpiece

150: XYZ tilt drive unit

210: The first position detection unit

211: The second position detection unit

310: The first loader

311: Second Loader

410: Control Department

510: First Workpiece

511: The second workpiece

610: first stop position

611: second stop position

Claims (5)

A projection exposure device that projects a specific pattern of a photomask to a specific position on a workpiece with light from a light source, thereby forming the aforementioned specific pattern on the aforementioned workpiece. The projection exposure device has: The sliding table is a way that the two workpieces do not overlap and can be placed at the same time. The two first and second regions are formed on the top of the part where the aforementioned workpieces are placed, and can alternately slide in opposite directions and temporarily Stop at the specific first stop position and second stop position at the ends of the aforementioned directions; two first loaders, which can load and unload the aforementioned workpieces in the aforementioned areas of the aforementioned sliding table, respectively; The first position detection device is configured to detect the placement position of the workpiece placed in the first area when the slide table is temporarily stopped at the specific first stop position. The upper part of an area; the second position detection device is arranged in a manner to detect the placement position of the workpiece placed in the second area when the sliding table is temporarily stopped at the specific second stop position The upper part of the second area of the slide table; the light source, the mask, and the projection optical system are designed to be projectively exposed to the slide table when the slide table is temporarily stopped at the specific first stop position. The upper part of the aforementioned second area of the table is the aforementioned workpiece in the second area, and when the aforementioned sliding table is temporarily stopped at the aforementioned characteristic When the second stop position is set, the projection exposure can be placed on the upper part of the first area of the slide table and arranged in the manner of the workpiece in the first area; the position of the pattern to be projected and exposed is aligned A device located at the position of the workpiece detected by the aforementioned position; and a control unit that controls: the sliding of the aforementioned sliding table and the stop at each stop position, the first loader performs loading and unloading of the workpiece in each area, and the aforementioned position detection The device detects the placement position of the workpiece in each area, and the aforementioned light source, mask, and projection optical system performs the position of the pattern to be projected and exposed on the workpiece in each area to the position of the workpiece that is detected by the aforementioned position. Each process of projection exposure; the device for making the position of the pattern to be projected and exposed to the position of the workpiece detected by the aforementioned position includes: linearly moving the mask in the vertical (Y), horizontal (X), and high (Z) directions At least one direction of the drive device and the tilt drive device that changes the angle of the mask to the exposure light source portion from the vertical plane; the aforementioned control portion is implemented: the workpiece placed in the aforementioned second area, by the aforementioned When the light source, the mask, and the projection optical system perform projection exposure, the position detection device detects the placement position of the workpiece placed in the first area. Conversely, when the pair is placed in the first area When the workpiece is projected and exposed by the light source unit, the mask and the projection optical system, the position detection device detects the placement position of the workpiece placed in the second area in parallel processing. The projection exposure device described in item 1 of the scope of patent application, wherein The aforementioned projection exposure device is an exposure device that performs stepwise exposure of patterns to be projected and exposed by taking multiple shots of a workpiece. The projection exposure device described in the first or second item of the scope of patent application, wherein the device for making the position of the pattern to be projected and exposed to the position of the workpiece detected by the aforementioned position includes a device arranged under the aforementioned sliding table A driving device that linearly moves the pedestal in at least one of the vertical (Y), horizontal (X), and high (Z) directions. The projection exposure device described in the first or second item of the scope of patent application, wherein the device for making the position of the pattern to be projected and exposed to the position of the workpiece detected by the aforementioned position includes linearly moving the aforementioned projection optical system A drive device in at least one of the vertical (Y), horizontal (X), and high (Z) directions. A projection exposure method that uses a projection exposure device that exposes a specific pattern of a mask to a specific position on a workpiece with light from a light source, thereby forming the aforementioned specific pattern on the workpiece. There is a sliding table on the aforementioned workpiece, and the sliding table forms two first and second regions on the uppermost part of the position where the aforementioned workpiece is placed in such a way that the two workpieces do not overlap and can be placed at the same time. And can alternately slide in the opposite direction and temporarily stop at the specific first stop position and second stop position at the end of each direction; the projection exposure method has: (A) slide the slide table to make the first stop Zone temporarily suspended Step in the aforementioned specific first stop position; (B) Step in loading the workpiece in the first area of the slide table; (C) Step in detecting the placement position of the workpiece in the first area; (D) The step of sliding the slide table again to temporarily stop the first area at the specific second stop position; (E) aligning the pattern on the mask so that the position of the pattern to be projected and exposed The method of detecting the position of the work piece is the step of projecting and exposing the work piece in the first area; (F) when there is the work piece for which the projection exposure is finished in the second area of the slide table, it is the same as the above (E) The projection exposure processing is in parallel, the step of removing the workpiece that has ended the projection exposure from the second area; and (G) replacing the first area and the first area at the specific first stop position of the aforementioned (A) to (F) The second area of the specific second stop position is processed for the cycle of the continuation, and the subsequent cycle is the step of alternately replacing the first area and the second area; so that the pattern to be projected and exposed The step of projection exposure of the position to the position of the workpiece detected by the aforementioned position includes: linearly moving the mask in at least one of the vertical (Y), horizontal (X), and high (Z) directions, and moving The angle of the mask to the exposure light source is changed from the vertical plane.

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