KR102406914B1 - Projection exposure apparatus and projection exposure method thereof - Google Patents

Abstract

A sliding table 120 in which a plurality of regions 110 and 111 for mounting a workpiece are formed, a first loader 310 and a second loader 311 capable of loading and unloading the workpieces 510 and 511, and a second 1 position detection device 210 , a second position detection device 211 , a light source 10 , a photomask 20 and a projection optical system 50 , a sliding table 120 , and a control unit for controlling each part With 410 , the control unit 410 detects a mounting position of the work 510 mounted in the first area 110 when the control unit 410 performs projection exposure with respect to the work 511 mounted in the second area 111 . performing a parallel processing to perform a parallel processing of detecting the mounting position of the workpiece 511 mounted in the second area 111 when projection exposure is performed with respect to the workpiece 510 mounted in the first area 110 is performed do.

Description

Projection exposure apparatus and projection exposure method thereof

FIELD OF THE INVENTION The present invention relates to a technique for improving the throughput of a projection exposure apparatus, and more particularly, to a technique for improving the throughput by reducing an overall projection exposure time.

A projection exposure apparatus for transferring a pattern on a photomask (reticle) onto a workpiece such as a wafer or a substrate by using photolithography technology is disclosed in, for example, Reference 1 or Reference 2.

In Citation 1, a pattern on an original plate (reticle: photomask) is placed on a table (or stage) movable in the X (horizontal)-Y (vertical)-θ (rotational) direction through a projection lens. (被) It is projected on the exposure body (workpiece). The position of each XY direction of the to-be-exposed object (workpiece) is detected by the position detection device using a laser interferometer. Reference 1 discloses a step movement direction for accurately aligning a reticle and a wafer in step exposure, and a movement direction of the wafer with respect to the laser interferometer of the position detection device.

In Citation 2, not only the table (or stage) on which one workpiece is placed is movable in the X (horizontal)-Y (vertical)-θ (rotational) direction, It is movable in the -Y (vertical)-θ (rotational) direction. In Cited Document 2, it is disclosed that the scan direction and scan speed of both tables can be individually set.

Japanese Patent Laid-Open No. 2001-203161 Japanese Patent Laid-Open No. 11-260697

However, as the material of the workpiece, for example, a brittle material such as a crystalline material or a brittle material such as glass even if it is amorphous may be used. have. Therefore, the time required for loading and unloading the workpiece in the exposable area on the stage is a very long time, for example 70 seconds or the like.

In addition, due to the recent high-definition transfer pattern, high precision is required for position detection of a workpiece on a stage when a pattern is transferred on a workpiece in a projection exposure apparatus, and the time required for position detection tends to increase There is this. In addition, when exposure is performed multiple times while moving to a plurality of positions, such as step exposure, more time for position detection is required.

In the conventional projection exposure apparatuses such as Patent Document 1 and Patent Document 2, first, a work is loaded at a predetermined position on the stage, then the position of the work is detected on the stage, and then the stage is matched to the detected position. Alternatively, after adjusting the position of the photomask in each direction, further exposure was performed. That is, in the conventional projection exposure apparatus and its projection exposure method, each process is individually and sequentially performed one by one, and in order to shorten the total processing time, the time required for each individual processing is shortened, or There was no other way than to shorten the time to switch between each treatment.

The present invention has been made to solve the above problems, and parallel implementation of at least two of each process of loading/unloading a workpiece in the projection exposure process, detecting the position of the workpiece placed on the stage, and projection exposure corresponding to the position of the workpiece An object of the present invention is to provide a projection exposure apparatus and a projection exposure method thereof, which can reduce the overall processing time compared to the prior art by enabling .

In order to achieve the above object, one embodiment of a projection exposure apparatus according to the present invention is a projection that forms a predetermined pattern on a workpiece by projecting exposure with light from a light source by matching a predetermined pattern of a photomask to a predetermined position on a workpiece. As an exposure apparatus, two first and second regions are formed on the uppermost surface of a site for mounting a workpiece so that the two workpieces do not overlap and can be mounted at the same time, and alternately slide in the reverse direction and end ( a sliding table configured to be capable of temporarily stopping to a predetermined first stop position and a second stop position of the body; two first loaders capable of individually loading and unloading a workpiece into each region of the sliding table; , first position detection arranged so as to detect a mounting position of a workpiece mounted in the first region directly above the first region of the sliding table when the sliding table is temporarily stopped at the first predetermined stop position a second device and a second disposed so as to detect a mounting position of a workpiece mounted in the second region directly above the second region of the sliding table when the sliding table is temporarily stopped at the second predetermined stop position When the position detecting device and the sliding table are temporarily stopped at the first predetermined stop position, a work piece mounted in the second area as a portion directly above the second area in the sliding table can be projected onto exposure, and A light source, a photomask, and a projection disposed directly above a first area of the sliding table to enable projection exposure to a workpiece mounted in the first area when the sliding table is temporarily stopped at the second predetermined stop position Optical system, sliding of the sliding table and stopping at each stop position, loading and unloading of the work piece into each area by the first loader, detection of the mounting position of the work piece in each area by a position detection device, light source, photomask and a control unit for controlling each process of projection exposure to the workpiece in each area by the projection optical system, wherein the control unit is mounted in the second area. When the work piece is subjected to projection exposure by the light source, the photomask and the projection optical system, the position detecting device detects the mounting position of the work piece mounted in the first area, and conversely, the light source, the photomask and the work piece mounted in the first area are subjected to projection exposure. In the case of projection exposure by the projection optical system, parallel processing of detecting the mounting position of the workpiece mounted in the second area with the position detecting device is performed.

In order to achieve the above object, one embodiment of a projection exposure method according to the present invention is to form a predetermined pattern on a workpiece by projecting exposure with light from a light source by matching a predetermined pattern of a photomask to a predetermined position on a workpiece; On the uppermost surface of the site for mounting the workpiece, two first and second regions are formed so that the two workpieces do not overlap and can be mounted at the same time, so that they slide alternately in the reverse direction and a predetermined first stop position and a first stop position at the ends in each direction 2. A projection exposure method using a projection exposure apparatus having a sliding table configured to be able to temporarily stop to a two stop position, comprising the steps of: (A) sliding the sliding table to temporarily stop a first area at a predetermined first stop position; (B) loading a workpiece in a first area of the sliding table, (C) detecting a mounting position of the workpiece in the first area, and (D) sliding the sliding table again to a predetermined second stop position. Pausing the first area temporarily, (E) projecting and exposing a pattern on the photomask on the workpiece in the first area, and (F) in the second area of the sliding table, when there is a workpiece whose projection exposure has been completed , (E) uploading the workpiece for which the projection exposure has been completed from the second area in parallel with the projection exposure processing of (E); and changing the area and the second area of the predetermined second stop position.

1(a) to 1(c) are diagrams showing a schematic configuration when the sliding table of the exposure apparatus according to the first embodiment of the present invention is stopped at the first stop position; (a) is a side view when it is a 1st stop position, (b) of FIG. 1 is a side view when it is a 2nd stop position, (c) is a top view.
Fig. 2 is an operation flowchart of the exposure apparatus according to the first embodiment of the present invention.

<General Description>

In one embodiment of the projection exposure apparatus according to the present invention, the projection exposure apparatus of the present invention aligns a predetermined pattern of a photomask to a predetermined position on the workpiece and performs projection exposure with light from a light source to provide a predetermined image on the workpiece. A projection exposure apparatus for forming a pattern, wherein two first and second regions are formed on an uppermost surface of a portion for mounting a workpiece so that the two workpieces do not overlap and can be mounted at the same time, and alternately slide in reverse directions and end in each direction A sliding table configured to enable temporary stopping to a predetermined first stop position and a second stop position of a first position detecting device disposed directly above a first area of the sliding table to detect a mounting position of a workpiece mounted in the first area when temporarily stopped at this predetermined first stop position; A second position detecting device disposed directly above the second area of the sliding table to detect the mounting position of the work mounted in the second area when the sliding table is temporarily stopped at the second predetermined stop position and, when the sliding table is temporarily stopped at a predetermined first stop position, a work piece mounted in the second area as a portion directly above the second area of the sliding table can be projected onto exposure, and the sliding table is a light source, a photomask, and a projection optical system disposed directly above the first area of the sliding table so that projection exposure is possible on a work mounted in the first area when temporarily stopped at the second predetermined stop position; Sliding of the sliding table and stopping at each stop position, loading and unloading of the work piece into each area by the first loader, detection of the mounting position of the work piece in each area by a position detection device, light source, photomask and projection optical system and a control unit for controlling each process of projection exposure to a workpiece in each area by When the light source, the photomask, and the projection optical system perform projection exposure to water, the position detecting device detects the mounting position of the workpiece mounted in the first area, and conversely, with respect to the workpiece mounted in the first area, the light source, the photomask and In the case of projection exposure by the projection optical system, the parallel processing of detecting the mounting position of the workpiece mounted in the second area with the position detection device is performed.

Another embodiment of the projection exposure apparatus according to the present invention is that the projection exposure apparatus is an exposure apparatus in which a single work piece is subjected to step exposure of a pattern for projection exposure in a plurality of shots.

In another embodiment of the projection exposure apparatus according to the present invention, the device for aligning the position of the pattern for projection exposure with the position of the position-detected work piece moves the photomask in the vertical (Y), horizontal (X), and height (Z) directions. It will include a driving device for moving linearly in at least one direction.

In another embodiment of the projection exposure apparatus according to the present invention, the device for aligning the position of the projection exposure pattern with the position of the position-detected workpiece changes the angle of the photomask from a plane perpendicular to the exposure light. It includes a tilt drive device.

In another embodiment of the projection exposure apparatus according to the present invention, the device for aligning the position of the projection exposure pattern to the position of the position-detected work piece sets the stage arranged under the sliding table vertically (Y), horizontally (X), It includes a driving device that moves linearly in at least one of the height (Z) directions.

In another embodiment of the projection exposure apparatus according to the present invention, the device for aligning the position of the pattern to be projected onto the position of the position-detected work piece moves the projection optical system in the vertical (Y), horizontal (X), and height (Z) directions. It will include a driving device for moving linearly in at least one direction.

In one embodiment of the projection exposure apparatus according to the present invention, a predetermined pattern is formed on a workpiece by projection exposure with light from a light source by matching a predetermined pattern of a photomask to a predetermined position on a workpiece, and the uppermost surface of a site on which the workpiece is mounted In this case, two first and second regions are formed so that the two workpieces do not overlap and can be mounted at the same time, so that they alternately slide in reverse directions and temporarily stop at predetermined first and second stop positions at the ends of each direction. A projection exposure method using a projection exposure apparatus having a sliding table configured to be capable of loading the workpiece in the first area; (C) detecting the mounting position of the workpiece in the first area; and (D) sliding the sliding table again to temporarily stop the first area at a predetermined second stop position. (E) projection exposure of a pattern on a photomask onto a workpiece in a first area; (F) projection exposure of (E) when there is a workpiece whose projection exposure has been completed in a second area of the sliding table. In parallel to the processing, the step of uploading the workpiece for which the projection exposure has been completed from the second area; This includes the step of performing the processing of the next cycle by changing the position of the second region, and alternately performing the first region and the second region for subsequent cycles.

<Effect of the invention>

According to the exposure apparatus of the present invention, a plurality of regions are formed on the uppermost surface of a site for mounting a workpiece so that a plurality of workpieces can be mounted simultaneously without overlapping, so that sliding and temporary stopping to a plurality of predetermined stop positions are possible. A reciprocating sliding table configured is provided, and a projection optical system for projecting a pattern on a photomask on a workpiece is a center, and a first loader of the workpiece and a position detection device of the workpiece on the sliding table are installed on both sides in the sliding direction of the sliding table. By arranging each of the different regions of the image corresponding to each other, parallel execution of each process becomes possible. Thereby, the projection exposure apparatus and the projection exposure method which can shorten the total exposure time of the workpiece|work can be provided compared with the prior art.

[Description of the embodiment described for use]

<First embodiment>

EMBODIMENT OF THE INVENTION Hereinafter, 1st Embodiment which concerns on this invention is demonstrated, referring drawings. 1(a) and 1(b), the schematic configuration of the exposure apparatus 1 of the first embodiment of the present invention is shown, and a substantially rectangular shape is shown on a stage base 140 for a work. A sliding table 120 for the workpiece is installed.

On the sliding table 120 for a workpiece, two workpiece|work mounting 1st area|region 110 and the workpiece|work mounting 2nd area|region 111 are arrange|positioned at the both ends of the long side of the said sliding table 120. As shown in FIG. The first region 110 for mounting the workpiece and the second region 111 for mounting the workpiece are larger than respective surface areas of the first and second workpieces 510 and 511, and are sufficient to respectively mount the respective workpieces. It has an area, and each area may be provided with a position recognition mark (ID) or a marker (not shown) indicating a reference point for position measurement in a place where each work does not interfere.

The sliding table 120 for a work piece is connected to a control unit 410 including a microcomputer or a central arithmetic unit (CPU) via the XYZ tilt driving unit 150 . In response to a command from the control unit 410 , a driving signal is transmitted from the XYZ tilt driving unit 150 to the sliding table 120 for a work piece. The sliding table 120 for a work can precisely control the sliding distance and the stop position on the plane of the sliding table by a drive mechanism (not shown) or the like. In addition, the sliding table 120 for a work is connected to a power supply (not shown), and power necessary for sliding is supplied.

The stage base 140 for a work is a base for tilting or each direction of X, Y, and Z of the sliding table 120 for a work, and a drive mechanism, a guide rail, etc. may be provided as needed. Although the case of sliding only in the X direction is described in the present embodiment, other directions and functions of tilt can be used in positioning for exposing a predetermined pattern or the like.

The first area for mounting the workpiece 110 is the first stop position 610 or the second by sliding the sliding table 120 for the workpiece via the XYZ tilt driving unit 150 controlled by the control unit 410 . It can move to the stop position 611 and stop at that position. As the pattern to be exposed becomes a detailed pattern, sliding precision and stopping precision are made high, and precise control is required. A first position detection unit 210 is disposed, for example, directly above the first area for mounting a workpiece 110 when temporarily stopped at the first stop position 610 . In addition, in FIG. 1(a), the 1st loader 310 is arrange|positioned above or near the area|region of the 1st area|region 110 for workpiece|work mounting when it temporarily stops at the 1st stop position 610. As shown in FIG. The first loader 310 may unload an exposed workpiece from the first area for mounting a workpiece 110 temporarily stopped at the first stop position 610, and may load an unexposed workpiece from the area. . For example, a conveyor (not shown) can be used to send the exposed workpiece lowered from the sliding table 120 for the workpiece to the next process or to move the unexposed workpiece to the vicinity of the first loader 310 . have. Moreover, the projection optical system 50 for exposure is arrange|positioned directly above the 2nd stop position 611 .

The second area for mounting the workpiece 111 also moves to the first stop position 610 or the second stop position 611 by sliding the sliding table 120 for the workpiece controlled by the control unit 410 and , can stop at that position. Since the 1st stop position 610 and the 2nd stop position 611 are arrange|positioned at the both ends of the long side of the sliding table 120 for a substantially rectangular work piece, when temporarily stopping at the 1st stop position 610, A first position detection unit 210 is disposed directly above the first region 110 for mounting a workpiece, and a first loader 310 is disposed above or near the region of the first region 110 for mounting a workpiece, and the workpiece The projection optical system 50 for exposure is disposed directly above the second area for mounting 111 . When temporarily stopped at the second stop position 611 , it is directly above the second area for mounting the work piece 111 . A second position detection unit 211 is disposed, a second loader 311 is disposed above or near the area of the second area 111 for mounting a workpiece, and a second loader 311 is disposed directly above the first area for mounting a workpiece 110 for exposure A projection optical system 50 of

Above the projection optical system 50 for exposure, a light source unit 10 , a photomask 20 , an XYθ stage 30 for a mask, and a tilt stage 40 for a mask are further disposed. In the case of (a) of FIG. 1 , the exposure light from the light source unit 10 passes through the photomask 20 and the projection optical system 50 , and the workpiece is mounted while it is temporarily stopped at the first stop position 610 . The second work piece 511 mounted on the second area 111 for use is exposed, whereby a predetermined pattern on the photomask 20 is transferred onto the second work piece 511 .

The XYθ stage 30 for masks is connected to a control unit 410 including a microcomputer or a central arithmetic unit (CPU) via the XYθ stage driving unit 60 for masks. In response to a command from the control unit 410 , a driving signal is transmitted from the XYθ stage driving unit 60 for masks to the XYθ stage 30 for masks. The XYθ stage 30 for a mask is an XYθ stage drive unit 60 for a mask that can move in the X direction (horizontal direction), Y direction (vertical direction) and θ (rotation) directions on a stage plane (not shown). , it is possible to precisely control the stop position in the XYθ (vertical, horizontal, rotational) direction on the stage plane. Moreover, the XY(theta) stage 30 for masks is also connected to the power supply (not shown), and the electric power required for movement in the XY(theta) (vertical, horizontal, rotation) direction is supplied.

The tilt stage 40 for a mask is connected to the control part 410 which includes a microcomputer or a central arithmetic unit (CPU) via the tilt stage drive part 70 for a mask. In response to a command from the control unit 410 , a driving signal is transmitted from the mask tilt stage driving unit 70 to the mask tilt stage 40 . The tilt stage 40 for a mask uses a tilt stage drive unit 70 for a mask that can tilt a stage plane (not shown) obliquely from an angle perpendicular to the optical axis to precisely tilt (tilt) the stage plane. position can be controlled. In addition, the tilt stage 40 for a mask is also connected to the power supply (not shown), and the electric power required in order to incline a stage plane is supplied.

The control unit 410 controls the sliding table 120 for the work, the stage base 140 for the work, and the XYθ stage for the mask so that a predetermined pattern on the photomask 20 is accurately transferred to a predetermined position on the second work 511 . (30) and the position on the plane of the tilt stage 40 for the mask, the angle on the plane, and the tilt angle are controlled. At that time, for example, using a microscope for a photomask and a microscope (not shown), control is performed so that the mask alignment mark on the photomask (not shown) coincides with the alignment mark on the workpiece on the workpiece. can be done In addition, if necessary, a driving unit may be provided in the projection optical system 50 as well, and it can be used for control for projecting a predetermined pattern on the photomask to a predetermined position on the work piece.

Next, the operation of the present embodiment will be described with reference to FIG. 2 . First, when the process starts, it is checked whether the sliding table 120 is temporarily stopped at the first stop position 610 (S1). When the sliding table 120 is temporarily stopped at the first stop position 610 (S1: Yes), whether an unexposed workpiece is not mounted on the first area for mounting the workpiece 110 of the sliding table 120 to confirm (S2). If the sliding table 120 is not temporarily stopped at the first stop position 610 (S1: No), it means that the sliding table 120 is temporarily stopped at the second stop position 611, so the process proceeds to step S7. .

When an unexposed workpiece is not mounted on the first area for workpiece mounting 110 of the sliding table 120 ( S2: Yes), the control unit 410 places the unexposed workpiece on the first loader 310 . A command is output to load into the first region 110 for use (S3). In the case where an unexposed work piece is mounted on the first area for mounting the work piece (S2: No), there is no need to load the unexposed work piece, so the process proceeds to step S4, and the command of the control unit 41 is followed. Thus, the first position detecting unit 210 detects the position of the first work 510 in the work mounting first area 110 ( S4 ). In that case, you may make it detect the stage position adjustment mart on a stage, and the work position adjustment mark on a workpiece|work with the microscope for a work, for example.

If the position of the first work 510 in the work mounting first area 110 can be detected, the control unit 410 moves the sliding table 120 to the XYZ tilt drive unit 150 to the first stop position ( A command to slide from 610 to the second stop position 611 is output (S5), and the projection optical system when the first area for mounting a workpiece 110 on the sliding table 120 is the second stop position 611 ( 50), a command to temporarily stop is output (S6).

If the sliding table 120 is temporarily stopped at the second stop position 611, it is determined whether there is an exposed workpiece in the second area for mounting the workpiece 111 of the sliding table 120 at the first stop position 610. Confirm (S7). When there is an exposed work piece in the second work piece mounting area 111 (S7: Yes), the control unit 410 sends the exposed work piece to the second loader 311 in the work piece mounting second area 111 . ), and outputs a command to load the unexposed workpiece into the second area 111 for mounting the workpiece (S9). When there is no exposed workpiece in the second area for mounting the workpiece 111 (S7: No), there is no need to unload the workpiece, so the process proceeds to step S9 to remove the unexposed workpiece from the second area for loading the workpiece 111 . to (S9).

After the processing of step S7, in parallel with loading the work in the second area for mounting the work 111, the position of the first work 510 in the first area for mounting the work 110 has been detected, the second stop At the position 611, a predetermined pattern of the photomask 20 is transferred onto the first work piece 510 by projection exposure (S10). When the transfer of the predetermined pattern is finished, the control unit 410 outputs a command to slide again to the XYZ tilt driving unit 150 ( S11 ), and when the sliding table 120 reaches the first stop position 610 , it temporarily stops to output a command (S12).

If the sliding table 120 is temporarily stopped at the first stop position 610, it is determined whether there is an exposed workpiece in the first area for mounting the workpiece 110 of the sliding table 120 at the first stop position 610. Confirm (S13). When there is an exposed work piece in the first area for mounting the work (S13: Yes), the control unit 410 sends the exposed work to the first loader 310 to the first area for mounting the work (S13: Yes). ) to output a command to unload (S14), and the flow proceeds to step S16 to check whether there is no remaining unexposed workpiece (S16). If there is no exposed workpiece in the first area for mounting the workpiece (S13: No), there is no need to unload the workpiece, so the flow proceeds to step S16 to check whether or not there is any remaining unexposed workpiece (S13: No). S16).

At the same time as checking whether or not there is an exposed work piece in the work-piece mounting first area 110 of the sliding table 120 at the first stop position 610 after step S12, in parallel with the second work-piece mounting area With respect to the second work 511 whose position has been detected in (111), a predetermined pattern of the photomask 20 is transferred onto the second work 511 by projection exposure at the second stop position 611. and (S15), the control unit 410 checks whether there is no remainder of the unexposed workpiece (S16).

When there is no remaining unexposed workpiece (S16: Yes), the process is terminated. When there is a remaining unexposed workpiece (S16: No), the flow returns to step S1 and the first area for mounting the workpiece 110 ) is temporarily stopped at the first stop position 610 ( S1 ), and the subsequent processing is repeated.

Accordingly, the projection exposure apparatus 1 of the present embodiment aligns a predetermined pattern of the photomask 20 with a predetermined position on the workpieces 510 and 511 and performs projection exposure with light from a light source onto the workpieces 510 and 511 . A projection exposure apparatus (1) for forming a predetermined pattern, on the uppermost surface of a site on which the workpieces (510, 511) are mounted, two first regions (110) such that the two workpieces (510, 511) do not overlap and can be mounted simultaneously ) and second regions 111 are formed so that it is possible to alternately slide in the reverse direction and temporarily stop at predetermined first stop positions 610 and second stop positions 611 at the ends of each direction. Sliding table 120 And, two first loaders 310 and second loaders 311 capable of individually loading and unloading the workpieces 510 and 511 in each area of the sliding table 120, and the sliding table 120 When temporarily stopped at the predetermined first stop position 610 , the workpiece 510 or 511 mounted in the first region 110 directly above the first region 110 of the sliding table 120 . ), when the first position detecting device 210 arranged to detect the mounting position of the sliding table 120 and the sliding table 120 temporarily stop at the predetermined second stop position 611, A second position detecting device 211 disposed directly above the second region 111 to detect a mounting position of a workpiece 510 or 511 mounted in the second region 111 , and a sliding table 120 are provided. When temporarily stopped at a predetermined first stop position 610 , the workpieces 510 , 511 mounted in the second region 111 as a portion directly above the second region 111 in the sliding table 120 . ), and when the sliding table 120 temporarily stops at a predetermined second stop position 611, as a portion directly above the first area 110 in the sliding table 120, Workpieces 510 , 5 mounted in the first region 110 . 11 ), the light source 10 , the photomask 20 , and the projection optical system 50 arranged so as to be capable of projection exposure, and the sliding table 120 , and stops at respective stop positions 610 and 611 , and the first Loading and unloading of the workpieces 510, 511 into each area by the loader 310, detection of the mounting position of the workpieces 510, 511 in each area by the position detecting device 210, 211, the light source 10 , a control unit 410 that controls each process of projection exposure to the workpieces 510 and 511 in each region by the photomask 20 and the projection optical system 50 , wherein the control unit 410 includes the second region 111 ), when performing projection exposure with the light source 10, the photomask 20, and the projection optical system 50 with respect to the workpiece 511 mounted in the , the mounting position of the workpiece 510 mounted in the first area 110 Detected by the position detecting device 210 and, conversely, when the work 510 mounted in the first region 110 is subjected to projection exposure by the light source 10 , the photomask 20 and the projection optical system 50 , the first Parallel processing of detecting the mounting position of the workpiece 511 mounted in the two regions 111 with the position detecting device 211 can be performed.

In addition, the projection exposure apparatus 1 of this embodiment can be an exposure apparatus which carries out step exposure of the pattern to project exposure with respect to one workpiece|work 510 or 511 in multiple shots. In addition, in the projection exposure apparatus 1 of each embodiment described above, the device for aligning the position of the pattern to be projected onto the position of the position-detected workpieces 510 and 511 sets the photomask 20 vertically (Y), The driving device 60 may include a driving device 60 for linearly moving in at least one of the horizontal (X) and height (Z) directions, and/or the position of the position-detected workpieces 510 and 511 of the pattern for projection exposure. The positioning device may include a tilt drive device (40, 70) for changing the angle of the photomask (20) from an orthogonal plane with respect to the exposure light, and/or a position-detected workpiece (510, 511). A device for aligning the position of the projection exposure pattern to the position of the driving device for linearly moving the stage disposed under the sliding table 120 in at least one of the vertical (Y), horizontal (X), and height (Z) directions 150 , and/or a device for aligning the position of the projection exposure pattern to the position of the position-detected workpieces 510 , 511 to set the projection optical system 50 vertically (Y), horizontally (X) ), and may include a driving device that moves linearly in at least one of the height (Z) directions.

Further, in the projection exposure method of the projection exposure apparatus 11 of the present embodiment, a predetermined pattern of the photomask 20 is aligned with a predetermined position on the workpieces 510 and 511 to project exposure with light from the light source 10, whereby the workpiece is exposed. A predetermined pattern is formed on (510, 511), and on the uppermost surface of a site for mounting the workpieces (510, 511), the two first areas (110) so that the two workpieces (510, 511) do not overlap and can be mounted at the same time ) and second regions 111 are formed so that it is possible to alternately slide in the reverse direction and temporarily stop at predetermined first stop positions 610 and second stop positions 611 at the ends of each direction. Sliding table 120 A projection exposure method using a projection exposure apparatus (1) having B) loading the workpieces (510, 511) in a first area (110) of the sliding table (120) and (C) detecting the mounting positions of the workpieces (510, 511) in the first area (110) and (D) sliding the sliding table 120 again to temporarily stop the first area 110 at a predetermined second stop position 611 , and (E) the work piece 510 in the first area 110 . , 511) the steps of projecting and exposing the pattern on the photomask 20, and (F) the second area 111 of the sliding table 120. In parallel with the projection exposure processing of (E), unloading the workpieces 510 and 511 for which the projection exposure has been completed from within the second area 111 thereof; (G) the predetermined steps of (A) to (F) above The first area 110 of the first stop position 610 and the second area 111 of the second predetermined stop position 611 of (110) and the second region (111) comprising the step of alternately carried out.

As described above, in the first embodiment, the projection optical system 50 , the first position detection unit 210 , the second position detection unit 211 , the first loader 310 , and the second loader 311 are the first or second When temporarily stopped at each stop position, load/unload and position detection of the workpiece, or projection exposure, and different processing are performed simultaneously for different workpieces on the first or second different areas for workpiece mounting can do. Therefore, compared with the conventional case in which each process is continuously performed in series at the same place, in the present embodiment, parallel processing is possible, so that the processing time can be shortened.

1: projection exposure apparatus
10: light source unit
20: photomask (reticle)
30: XYθ stage for mask
40: tilt stage for mask
50: projection optical system
60: XYθ stage driving unit for mask
70: tilt stage driver for mask
110: first area for mounting the workpiece
111: second area for mounting the workpiece
120: sliding table for workpiece
140: anticipation of the stage for the workpiece
150: XYZ tilt driving unit
210: first position detection unit
211: second position detection unit
310: first loader
311: second loader
410: control unit
510: first workpiece
511: second work piece
610: first stop position
611: second stop position

Claims (7)

A projection exposure apparatus for forming the predetermined pattern on the workpiece by projecting and exposing a predetermined pattern of a photomask to a predetermined position on the workpiece with light from a light source, comprising:
Two first and second regions are formed on the uppermost surface of the site for mounting the workpiece so that the two workpieces do not overlap and can be mounted at the same time. a sliding table configured to be capable of temporarily stopping the ends at predetermined first and second stop positions;
two first loaders each capable of individually loading and unloading said workpiece within said respective region of said sliding table;
a first disposed on the sliding table directly above the first area to detect a mounting position of a workpiece mounted in the first area when the sliding table temporarily stops at the first predetermined stop position 1 position detection device;
a first disposed on the sliding table directly above the second area to detect a mounting position of a workpiece mounted in the second area when the sliding table temporarily stops at the second predetermined stop position 2 position detection device;
When the sliding table is temporarily stopped at the first predetermined stop position, a portion directly above the second area of the sliding table, the work piece mounted in the second area can be projected onto exposure; and , arranged so that, when the sliding table is temporarily stopped at the second predetermined stop position, a portion of the sliding table directly above the first area and projected exposure to the work mounted in the first area is possible. light source, photomask and projection optics;
a device for aligning a position of a pattern for projection exposure to the position of the position-detected workpiece; and
Sliding of the sliding table and stopping at each stop position, loading and unloading of the work piece into each area by the first loader, detection of the mounting position of the work piece in each area by the position detecting device, the light source, the photo A control unit for controlling each process of projection exposure by matching the position of a pattern for projection exposure with the position of the position-detected work piece with the work piece in each area by the mask and the projection optical system
including,
A device for aligning the position of the pattern for projection exposure with the position of the position-detected work piece, a driving device for linearly moving the photomask in at least one of the vertical (Y), horizontal (X), and height (Z) directions; a tilt drive device for changing the angle of the mask from an orthogonal plane with respect to the exposure light;
When the control unit performs projection exposure with respect to the work mounted in the second area by the light source, the photomask and the projection optical system, the position detecting device detects the mounting position of the work mounted in the first area, and vice versa performing parallel processing of detecting the mounting position of the work mounted in the second area with the position detection device when projection exposure of the work mounted in the first area is performed by the light source, the photomask and the projection optical system;
projection exposure apparatus. According to claim 1,
The projection exposure apparatus is an exposure apparatus for step-exposing a pattern to be projected onto a single workpiece in a plurality of shots. 3. The method of claim 1 or 2,
A device for aligning the position of the projection exposure pattern with the position of the position-detected workpiece linearly moves the stage disposed under the sliding table in at least one of vertical (Y), horizontal (X), and height (Z) directions A projection exposure apparatus comprising a driving device that causes 3. The method of claim 1 or 2,
A device for aligning the position of the pattern for projection exposure with the position of the position-detected workpiece includes a driving device for linearly moving the projection optical system in at least one of the vertical (Y), horizontal (X), and height (Z) directions which is a projection exposure apparatus. By projecting and exposing a predetermined pattern of a photomask to a predetermined position on the work piece with light from a light source, the predetermined pattern is formed on the work piece, and the two work pieces can be mounted simultaneously without overlapping on the top surface of the site where the work piece is to be mounted. A sliding table configured so as to enable two first and second regions to be formed so as to be able to alternately slide in reverse directions and temporarily stop each end at predetermined first and second rest positions in each of the reverse directions. A projection exposure method using a projection exposure apparatus having
(A) sliding the sliding table to temporarily stop the first area at the predetermined first stop position;
(B) loading the workpiece into the first area of the sliding table;
(C) detecting a mounting position of the workpiece within the first area;
(D) sliding the sliding table again to temporarily stop the first area at the predetermined second stop position;
(E) projecting the pattern on the photomask onto the work piece in the first area by aligning the position of the projected exposure pattern with the position of the position-detected work piece;
(F) When there is the work piece whose projection exposure has been completed in the second area of the sliding table, in parallel with the projection exposure process of (E) above, the work piece for which the projection exposure has been completed from within the second area of the sliding table is removed unloading; and
(G) The processing of the next cycle is performed by exchanging the first area at the first predetermined stop position in (A) to (F) and the second area at the second predetermined stop position, and in the subsequent cycle for the step of alternately performing the first area and the second area
including,
In the step of aligning the position of the pattern for projection exposure to the position of the position-detected work piece and performing projection exposure, the photomask is linearly moved in at least one of the vertical (Y), horizontal (X), and height (Z) directions; changing the angle of the photomask from an orthogonal plane with respect to the exposure light;
Projection exposure method. delete delete

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