TW201805740A - Projection exposure device and projection exposure method thereof - Google Patents

Abstract

The projection exposure device of the present invention comprises: a slide table 120 having a plurality of regions 110 and 111 for placing a work-piece thereon; a first loader 310 and a second loader 311 capable of loading and unloading the work-pieces 510 and 511; a first position detection device 210; a second position detection device 211; a light source 10, a photomask 20 and a projection optical system 50; a sliding table 120, and a control unit 410 for controlling each unit, when the control unit 410 projects and exposes the work-piece 511 which is placed in the second area 111, a parallel process of detecting the placement position of the work-piece 510 placed in the first region 110 is performed, when the work-piece 510 which is placed in the first region 110 is projected and exposed, a parallel process of detecting the placement position of the work-piece 511 which is placed in the second area 111 is performed.

Description

Projection exposure device and projection exposure method thereof

The present invention relates to techniques for increasing the mass yield of projection exposure devices, and more particularly to techniques for reducing the total projected projection exposure time while increasing the yield.

A projection exposure apparatus for transferring a pattern on a photomask (a reticle) onto a workpiece such as a wafer or a substrate using photolithography is disclosed, for example, in Reference 1 or Citation 2.

Citation 1 The pattern on the original plate (the reticle: the reticle) is projected by the projection lens and placed on the stage that can be moved in the X (horizontal)-Y (longitudinal)-θ (rotation) direction (or The exposed object (workpiece) of one of the pedestals. The position of each of the XY in the exposed body (workpiece) is detected by a position detecting device using a laser interferometer. Citation 1 discloses a phase moving direction of alignment between a reticle and a wafer which is staged with high precision, and a moving direction of a wafer with respect to a laser interferometer of the position detecting device.

The table (or pedestal) placed on the workpiece of the reference 2 is not only movable in the X (horizontal)-Y (longitudinal)-θ (rotation) direction, but also the reticle The table placed on the line can also move in the X (horizontal)-Y (longitudinal)-θ (rotation) direction. Citation 2 discloses that the scanning direction and scanning speed of each of the stages can be individually set.

[Advanced technical literature] [Patent Literature]

Patent Document 1: Special Opening 2001-203161

Patent Document 2: Japanese Patent Laid-Open No. 11-260697

However, the material of the workpiece is, for example, a material having brittleness such as a crystalline material, or a material which is brittle even if it is amorphous, such as glass, and must be handled with care, that is, it must be carried out at a relatively low speed. Therefore, the time required to load and unload the workpiece on the detachable area on the pedestal is an extremely long time such as 70 seconds.

Further, due to the high refinement of the transfer pattern in recent years, the position detection of the workpiece on the pedestal when the projection exposure apparatus transfers the pattern onto the workpiece is also required to have high precision, and the time necessary for position detection is There is a tendency to increase. Further, when one side of the stage exposure or the like is moved to a plurality of positions and a plurality of exposures are performed, more position detection time is necessary.

As in the conventional projection exposure apparatus of Patent Documents 1 and 2, first, the workpiece is loaded on a specific position on the pedestal, and then the position on the pedestal of the workpiece is detected, and then the pedestal or reticle is placed at the detected position. The position is adjusted in each direction to perform exposure. That is, the conventional projection exposure apparatus and its projection exposure method treat each processing by one The processing time is shortened in order, and the total processing time is shortened only by shortening the time required for each individual processing or shortening the replacement time between processing.

The present invention has been made in view of the above problems, and an object thereof is to provide a projection exposure apparatus and a projection exposure method thereof, which are capable of loading/unloading a workpiece for projection exposure engineering, and a workpiece placed on a pedestal. Parallel implementation of at least two of each of the position detection and the projection exposure corresponding to the position of the workpiece, thereby reducing the total processing time more than in the prior art.

In order to achieve the above object, in one embodiment of the projection exposure apparatus of the present invention, a specific pattern of the reticle is positioned at a specific position on the workpiece, and projection exposure is performed by light from the light source portion, thereby forming a specific pattern on the workpiece. The projection exposure apparatus includes a slide table in which two first workpieces and a second region are formed on the uppermost portion of the portion on which the workpiece is placed, so that the two workpieces can be simultaneously placed without overlapping. The first first loader capable of sliding in the opposite direction and temporarily stopping at the end of each direction and the second stop position; the two first loaders are capable of loading and unloading the workpieces respectively on the slide table In each of the regions, the first position detecting device is disposed on the slide table so as to detect the placement position of the workpiece placed in the first region when the slide is temporarily stopped at the specific first stop position. The upper part of the area; the second position detecting device, the sliding table temporarily stops at the second When the position is stopped, it is disposed at the upper portion of the second region of the slide table so as to detect the placement position of the workpiece placed in the second region; the light source portion, the photomask, and the projection optical system are used as the slide table When temporarily stopped at the specific first stop position, the projection can be projected to the upper portion of the second region of the slide table and is the workpiece in the second region, and when the slide table is temporarily stopped at the specific second When the position is stopped, it can be projected and exposed to the upper portion of the first region of the slide table and arranged for the workpiece in the first region; and the control portion controls the sliding of the slide table and stops at each stop When the position is stopped, the first loader performs loading and unloading of the workpiece in each area, and the position detecting device detects the position of the workpiece in each area, and the light source unit, the photomask, and the projection optical system are performed in each area. The processing of the projection exposure of the workpiece, The control unit is configured to detect, when the projection is performed by the light source unit, the reticle, and the projection optical system on the workpiece placed in the second region, the position detecting device detects the load of the workpiece placed in the first region. Positioning, conversely, detecting the workpiece placed in the second region by the position detecting device when performing projection exposure on the workpiece placed in the first region by the light source portion, the reticle, and the projection optical system Parallel processing of the placement position.

In order to achieve the above object, an embodiment of the projection exposure method of the present invention uses a projection exposure apparatus that projects a specific pattern of a reticle at a specific position on a workpiece and performs projection exposure with light from the light source section. Thereby, a specific pattern is formed on the workpiece, and has a sliding table, which can be simultaneously placed with two workpieces not overlapping In a manner, two first regions and a second region are formed on the uppermost portion of the portion on which the workpiece is placed, and can be alternately slid in the opposite direction and temporarily stopped at the specific first stop position and the second stop position of the end portions in each direction. The projection exposure method has the following steps: (A) sliding the slide table to temporarily stop the first region at the specific first stop position; and (B) loading the workpiece into the first region of the slide table (C) a step of detecting a placement position of the workpiece in the first region; (D) a step of sliding the slide table again to temporarily stop the first region at the specific second stop position; (E) the light The step of projecting the pattern on the cover is exposed to the workpiece in the first area; (F) when there is a workpiece ending the projection exposure in the second area of the slide, in parallel with the projection exposure process of (E), from the second a step of removing the workpiece that ends the projection exposure in the area; and (G) replacing the first region of the specific first stop position of the foregoing (A) to (F) and the second region of the specific second stop position The processing of the cycle, the subsequent cycle interaction The step of changing the first and second regions of the embodiment.

1‧‧‧Projection exposure device

10‧‧‧Light source department

20‧‧‧Photomask (screen)

30‧‧‧Mask with XY θ pedestal

40‧‧‧Swing pedestal for mask

50‧‧‧Projection optical system

60‧‧‧Mask XY θ pedestal drive

70‧‧‧Swing pedestal drive unit for mask

110‧‧‧The first area for workpiece placement

111‧‧‧Second area for workpiece placement

120‧‧‧Workpiece slide table

140‧‧‧Workpiece pedestal abutment

150‧‧‧XYZ swing drive

210‧‧‧First Position Detection Department

211‧‧‧Second position detection department

310‧‧‧First loader

311‧‧‧Second loader

410‧‧‧Control Department

510‧‧‧First workpiece

511‧‧‧second workpiece

610‧‧‧First stop position

611‧‧‧second stop position

1(a) to 1(c) are views showing a schematic configuration of the slide table of the exposure apparatus according to the first embodiment of the present invention when it is stopped at the first stop position, and (a) is a side when the first stop position is used. Figure, (b) is the side when the second stop position Figure, (c) is the above figure.

Fig. 2 is a flowchart showing the operation of the exposure apparatus according to the first embodiment of the present invention.

The general description:

According to an embodiment of the projection exposure apparatus of the present invention, in the projection exposure apparatus of the present invention, the specific pattern of the mask is placed at a specific position on the workpiece, and the light from the light source unit is projected and exposed, whereby the specific pattern is formed on the workpiece. The workpiece has a slide table in which two workpieces can be placed at the same time without overlapping, and two first regions and a second region are formed on the uppermost portion of the workpiece, and can interact with each other. a first sliding position that is slid in the opposite direction and temporarily stopped at a specific first stop position and a second stop position in each direction; the two first loaders are capable of loading and unloading the workpieces in each area of the slide table The first position detecting device is disposed in the first region of the slide table to detect the placement position of the workpiece placed in the first region when the slide is temporarily stopped at the specific first stop position. a second position detecting device, wherein the slide table is disposed at the second position of the slide table to detect the placement position of the workpiece placed in the second region when the slide table is temporarily stopped at the specific second stop position Field immediately above; a light source unit, mask, and a projection optical system, when the system in order to temporarily stop the slide to a specific station of a first stop position, the projection exposure can be placed to slide The upper portion of the second region of the table is the workpiece in the second region, and when the sliding table is temporarily stopped at the specific second stop position, the projection can be projected to the upper portion of the first region placed on the slide table And arranging the workpiece in the first region; and the control unit controls the sliding of the sliding table and the stopping at each stop position, loading and unloading of the workpiece in each region of the first loader, The detection of the placement position of the workpiece in each region of the position detecting device, and the processing of the projection exposure of the light source portion, the photomask, and the workpiece in each region of the projection optical system are performed in the pair. When the workpiece in the two regions is projected and exposed by the light source portion, the photomask, and the projection optical system, the position detecting device detects the placement position of the workpiece placed in the first region, and the opposite is placed on the workpiece. When the workpiece in the first region is subjected to projection exposure by the light source unit, the photomask, and the projection optical system, the position detecting device detects the parallel processing of the placement position of the workpiece placed in the second region.

In another embodiment of the projection exposure apparatus of the present invention, the projection exposure apparatus is an exposure apparatus that exposes a pattern to be projected and exposed to a plurality of workpieces in a plurality of stages.

Another embodiment of the projection exposure apparatus of the present invention is a device for projecting the position of the exposed pattern to the position of the position-detected workpiece, including moving the mask to a vertical (Y) horizontal (X) height. A driver of at least one of the (Z) directions.

Another embodiment of the projection exposure apparatus of the present invention is to position the pattern to be projected and exposed to the position of the position-detected workpiece. The device to be placed is a swing driving device that includes an angle between the reticle and the exposure light source unit from the vertical plane.

In another embodiment of the projection exposure apparatus of the present invention, the position of the pattern to be projected and exposed is the position of the position-detected workpiece, and the pedestal disposed below the slide table is linearly moved to the longitudinal direction (Y). a driving device for at least one of the horizontal (X) high (Z) directions.

Another embodiment of the projection exposure apparatus of the present invention is a device for projecting the position of the exposed pattern to the position of the position-detected workpiece, including moving the projection optical system linearly (Y) horizontally (X) A drive device in at least one of the high (Z) directions.

An embodiment of the projection exposure method using the projection exposure apparatus of the present invention uses a projection exposure apparatus that performs a specific pattern on the workpiece against a specific position on the workpiece by light from the light source section. Projection exposure, whereby a specific pattern is formed on the workpiece, and has a sliding table, wherein the two first and second regions are formed in such a manner that the two workpieces can be simultaneously placed without overlapping a configuration in which the uppermost portion of the workpiece is placed and can be alternately slid in the opposite direction and temporarily stopped at the specific first stop position and the second stop position in the respective end portions, the projection exposure method having: (A) The step of sliding the slide to temporarily stop the first region at the specific first stop position; (B) the step of loading the workpiece into the first region of the slide; and (C) detecting the placement of the workpiece in the first region Step of location; (D) the step of sliding the slide table again to temporarily stop the first region at the specific second stop position; (E) the step of projecting the pattern on the reticle to the workpiece in the first region; (F) When there is a workpiece ending the projection exposure in the second region of the slide table, in parallel with the projection exposure processing of (E), the step of ending the projection exposure of the workpiece from the second region is removed; and (G) replacing the foregoing (A) a process of continuing the cycle of the first region of the specific first stop position and the second region of the specific second stop position, and replacing the first region and the second region with respect to the subsequent cycle And the steps to implement.

The effect of the invention:

According to the exposure apparatus of the present invention, it is possible to provide a plurality of regions that can be simultaneously placed without overlapping, and to form a plurality of regions on the uppermost portion of the portion on which the workpiece is placed, and to slide and temporarily stop at a specific one. A reciprocating slide type having a plurality of stop positions can be arranged at the same time as the projection optical system for projecting the pattern on the reticle to the workpiece, and corresponding to the different regions on the slide table. Both sides of the direction can be used in parallel for each process. Accordingly, it is possible to provide a projection exposure apparatus and a projection exposure method thereof which are capable of shortening the total exposure time to the workpiece more than the prior art.

Description of the embodiment shown:

<First Embodiment>

Hereinafter, a first embodiment of the present invention will be described with reference to the drawings. FIGS. 1(a) and 1(b) are schematic diagrams showing a schematic configuration of an exposure apparatus 1 according to a first embodiment of the present invention, and a substantially rectangular workpiece slide table. The 120 series is disposed above the workpiece base pedestal 140.

Two workpiece placement first regions 110 and a workpiece placement second region 111 are disposed on both ends of the long side of the slide table 120 above the workpiece slide table 120. The first region 110 for workpiece placement and the second region 111 for workpiece placement are larger than the respective surface areas of the first workpiece 510 and the second workpiece 511, and each has a sufficient area for mounting the workpieces. Further, each region may be provided with an identification mark (ID) of a position or a mark (not shown) indicating a reference point of the position measurement at a place where the workpieces are not interfered.

The workpiece slide table 120 is connected to the control unit 410 including a microcomputer or a central calculation unit (CPU) via the XYZ swing drive unit 150. The drive signal is transmitted from the XYZ yaw drive unit 150 to the workpiece slide 120 in response to a command from the control unit 410. The workpiece slide table 120 can precisely control the sliding distance and the stop position on the plane of the slide table by a drive mechanism or the like (not shown). Further, the workpiece slide table 120 is connected to a power source (not shown) to supply electric power necessary for sliding.

The workpiece base pedestal 140 is used to swing the workpiece slide table 120 in the bases of the X, Y, and Z directions, and a drive mechanism, a guide rail, or the like may be provided depending on the demand. In the present embodiment, the case of sliding only in the X direction is described. However, it is also possible to use the alignment for exposing a specific pattern. In other ways, the function of swinging in another direction.

In the first region 110 for workpiece placement, the workpiece slide table 120 is slid by the XYZ swing drive unit 150 controlled by the control unit 410, whereby the first stop position 610 or the second stop position can be moved. 611, and stops at this position. The more specific patterns of exposure are to form a detailed pattern, the more precise control is required at the same time to improve the sliding accuracy and the stopping accuracy. The first position detecting unit 210 is disposed, for example, in the upper portion of the first region 110 for workpiece placement when the first stop position 610 is temporarily stopped. In addition, in the first diagram (a), the first loader 310 is disposed above or near the region of the first region 110 for workpiece placement that is temporarily stopped at the first stop position 610. The first loader 310 is capable of detaching the exposed workpiece from the first region 110 for workpiece placement temporarily stopped at the first stop position 610, and can load the unexposed workpiece from the region. The exposed workpiece descending from above the workpiece slide table 120 is transferred to the continuous project, and the unexposed workpiece is moved to the vicinity of the first loader 310, for example, a conveyor belt (not shown) or the like can be used. . Further, the projection optical system 50 for exposure is disposed directly above the second stop position 611.

The workpiece mounting second region 111 is also slid by the workpiece slide table 120 controlled by the control unit 410, whereby it can be moved to the first stop position 610 or the second stop position 611 and stopped at this position. Since the first stop position 610 and the second stop position 611 are disposed at both end portions of the long side of the substantially rectangular workpiece slide table 120, when temporarily stopped at the first stop position 610, the first position detecting portion The 210 series is disposed directly above the first region 110 for workpiece placement, and the first loader 310 is disposed. In the upper portion or the vicinity of the region of the first region 110 for workpiece placement, the projection optical system 50 for exposure is disposed directly above the second region 111 for workpiece placement, but is temporarily stopped at the second stop position 611. The second position detecting unit 211 is disposed directly above the workpiece mounting second region 111, and the second loader 311 is disposed above or near the region of the workpiece mounting second region 111, and the projection for exposure is used. The optical system 50 is disposed directly above the first region 110 for workpiece placement.

The light source unit 10, the mask 20, the XY θ pedestal 30 for the mask, and the oscillating pedestal 40 for the mask are disposed on the upper portion of the projection optical system 50 for exposure. In the case of the first embodiment (a), the exposure light source unit from the light source unit 10 is the transmission mask 20 and the projection optical system 50, and is placed in the second region 111 for workpiece placement when temporarily stopped at the first stop position 610. The second workpiece 511 is exposed, whereby a specific pattern on the reticle 20 is transferred onto the second workpiece 511.

The XY θ pedestal 30 for the mask is connected to the control unit 410 including the microcomputer or the central processing unit (CPU) via the XY θ pedestal driving unit 60 for the mask. The drive signal is transmitted from the mask XY θ pedestal drive unit 60 to the mask XY θ pedestal 30 in response to a command from the control unit 410. The mask XY θ pedestal 30 is driven by an XY θ pedestal that can move in the X direction (lateral direction), the Y direction (longitudinal direction), and the θ (rotation) direction on a pedestal plane (not shown). The portion 60 is a stop position in the XY θ (vertical, lateral, and rotational) directions on the seat plane of the console. Further, the mask XY θ pedestal 30 is also connected to a power source (not shown) to supply electric power necessary for movement in the XY θ (vertical, lateral, and rotational) directions.

The mask oscillating pedestal 40 is connected to the control unit 410 including a microcomputer or a central processing unit (CPU) via the oscillating pedestal driving unit 70. The drive signal is transmitted from the mask swing base drive unit 70 to the mask swing mount 40 in response to a command from the control unit 410. The mask oscillating pedestal 40 is capable of accurately tilting the seat plane to the tilt (swing) by the oscillating pedestal driving unit 70 that can swing the pedestal plane (not shown) at an angle perpendicular to the optical axis. The stop position of the state. Further, the mask swinging pedestal 40 is also connected to a power source (not shown) to supply electric power necessary for swinging the pedestal plane.

The control unit 410 controls the workpiece slide table 120, the workpiece pedestal base 140, and the mask XY θ pedestal so that the specific pattern on the reticle 20 can be accurately transferred to a specific position on the second workpiece 511. And the position on the plane of the oscillating pedestal 40 for the mask, and the angle and the swing angle on the plane. In this case, for example, a mask for a mask (not shown) and a microscope for a workpiece can be used, that is, the mask alignment mark on the mask (not shown) can be controlled in accordance with the workpiece registration mark on the workpiece. Further, in accordance with the demand, the projection optical system 50 is also provided with a driving portion for performing control for projecting a specific pattern on the reticle to a specific position on the workpiece.

Next, the operation of this embodiment will be described using Fig. 2 . First, when the processing is started, it is confirmed whether or not the slide table 120 is temporarily stopped at the first stop position 610 (S1). When the slide table 120 is temporarily stopped at the first stop position 610 (S1: Yes), it is confirmed whether or not the unexposed workpiece is placed on the workpiece placement first region 110 of the slide table 120 (S2). If the slide table 120 is not temporarily stopped at the first stop position 610 (S1: No), since the slide table 120 Since it is temporarily stopped at the second stop position 611, the process proceeds to step S7.

When the unexposed workpiece is not placed on the workpiece placement first region 110 of the slide table 120 (S2: Yes), the control unit 410 can load the unexposed workpiece on the workpiece placement first region 110. The internal mode outputs a command to the first loader 310 (S3). When the unexposed workpiece is placed on the workpiece mounting first region 110 (S2: No), since it is not necessary to load the unexposed workpiece, the process proceeds to step S4, and the first position is based on the command of the control unit 410. The detecting unit 210 detects the position of the first workpiece 510 of the first region 110 for workpiece placement (S4). At this time, for example, a workpiece can be used to detect the pedestal alignment mark on the pedestal and the workpiece alignment mark on the workpiece.

After detecting the position of the first workpiece 510 of the first region 110 for workpiece placement, the control unit 410 outputs a command to slide the slide table 120 from the first stop position 610 to the second stop position 611 to the XYZ swing drive unit 150 ( S5), after the first region 110 on the slide table 120 reaches the lower portion of the projection optical system 50 when the first region 110 reaches the second stop position 611, a command to temporarily stop is output (S6).

After the slide table 120 is temporarily stopped at the second stop position 611, it is checked whether or not the exposed workpiece is present in the second region 111 for workpiece placement of the slide table 120 at the first stop position 610 (S7). When there is an exposed workpiece in the second region 111 for workpiece placement (S7: Yes), the control unit 410 outputs the exposed workpiece to the second loader 311 from the second region 111 for workpiece placement. (S8), and the unexposed workpiece is loaded on the workpiece placement second region 111 (S9). If there is no second region 111 for workpiece placement In the case of the exposed workpiece (S7: No), since it is not necessary to remove the workpiece, the process proceeds to step S9, and the unexposed workpiece is loaded in the second region 111 for workpiece placement (S9).

After the process of step S7, in parallel with the process of loading the workpiece in the second region 111 for workpiece placement, the first workpiece 510 having been subjected to position detection in the first region 110 for mounting the workpiece is stopped at the second. The position 611 performs a transfer exposure on the first workpiece 510 to a specific pattern of the mask 20 (S10). When the transfer of the specific pattern is completed, the control unit 410 outputs a command to re-slide to the XYZ swing drive unit 150 (S11), and when the slide table 120 reaches the first stop position 610, a command to temporarily stop is output (S12). ).

After the slide table 120 is temporarily stopped at the first stop position 610, it is confirmed whether or not the exposed workpiece is present in the first region 110 for workpiece placement of the slide table 120 of the first stop position 610 (S13). When there is an exposed workpiece in the first region 110 for workpiece placement (S13: Yes), the control unit 410 outputs the exposed workpiece to the first loader 310 from the first region 110 for workpiece placement. (S14), the process proceeds to step S16 to confirm whether or not the unexposed workpiece remains (S16). When there is no exposed workpiece in the first region 110 for workpiece placement (S13: No), since it is not necessary to remove the workpiece, the process proceeds to step S16 to confirm whether or not the unexposed workpiece remains (S16).

It is confirmed that the processing of the exposed workpiece in the first region 110 for the workpiece mounting of the slide table 120 at the first stop position 610 after the step S12 is simultaneously performed, and the position in the second region 111 for the workpiece mounting is performed. The detected second workpiece 511 is implemented at the second stop position 611 The transfer on the second workpiece 511 by the projection exposure of the specific pattern of the photomask 20 (S15), the control unit 410 confirms whether or not the unexposed workpiece remains (S16).

If there is no remaining unexposed workpiece (S16: Yes), the process is terminated. If there is any unexposed workpiece remaining (S16: No), the process returns to step S1, and it is confirmed whether or not the first region 110 for workpiece placement is temporarily suspended. The first stop position 610 is stopped (S1), and the subsequent processing is repeated.

Therefore, in the projection exposure apparatus 1 of the present embodiment, the specific pattern of the mask 20 is placed at a specific position on the workpieces 510 and 511, and the light from the light source unit 10 is projected and exposed, whereby the specific pattern is formed on the workpiece 510 and The projection exposure apparatus 1 of FIG. 511 has a slide table 120 in which two first regions 110 and a second region 111 are formed in such a manner that two workpieces 510 and 511 are not overlapped and can be simultaneously placed. a configuration in which the uppermost portion of the workpieces 510 and 511 are placed and can be alternately slid in the opposite direction and temporarily stopped at the specific first stop position 610 and the second stop position 611 in each direction end; the first load of the two loads The machine 310 and the second loader 311 are capable of loading and unloading the workpieces 510 and 511 in the respective regions of the slide table 120. The first position detecting device 210 is temporarily stopped at the specific position. When the stop position 610 is stopped, it is disposed at the upper portion of the first region 110 of the slide table 120 so as to be capable of detecting the placement position of the workpiece 510 or 511 placed in the first region 110; the second position detecting device 211 , the sliding table 120 is temporarily stopped at the special When the second stop position 611, to be able to detect the workpiece is placed within the region 111 of the second embodiment of the mounting position 510 or 511 is disposed in the slider The upper portion of the second region 111 of 120; the light source portion 10, the reticle 20, and the projection optical system 50 are capable of being projected to the loading position when the slide table 120 is temporarily stopped at the specific first stop position 610. The upper portion of the second region 111 of the slide table 120 is the workpieces 510, 511 in the second region 111, and when the slide table 120 is temporarily stopped at the specific second stop position 611, it can be projected to the placement. The upper portion of the first region 110 of the slide table 120 is disposed in the manner of the workpieces 510 and 511 in the first region 110; and the control portion 410 controls the sliding of the slide table 120 and at each stop position 610. When the 611 is stopped, the first loader 310 performs the detection of the mounting positions of the workpieces 510 and 511 in the respective areas by loading and unloading the workpieces 510 and 511 and the position detecting devices 210 and 211 in the respective areas, and the light source unit 10 and the light. The cover 20 and the projection optical system 50 perform respective processes of projecting exposure of the workpieces 510 and 511 in the respective regions, and the control unit 410 performs the light source portion 10 and the light on the workpiece placed in the second region 111. When the cover 20 and the projection optical system 50 perform projection exposure, the position is checked. The device 210 detects the placement position of the workpiece 510 placed in the first region 110, and conversely on the workpiece 510 placed in the first region 110, by the light source portion 10, the reticle 20, and the projection optical system. When the projection exposure is performed 50, the position detecting means 211 detects the parallel processing of the placement position of the workpiece 511 placed in the second region 111.

Further, the projection exposure apparatus 1 of the present embodiment is an exposure apparatus capable of performing stepwise exposure of a pattern of projection exposure on a single workpiece 510 or 511 by a plurality of shots. In addition, the projection of each of the above embodiments The exposure apparatus 1 is a device that positions the position of the projection exposure pattern against the positions of the workpieces 510 and 511 for position detection, and includes moving the mask 20 linearly in the vertical (Y) horizontal (X) height (Z) direction. The driving device 60 in at least one direction and/or the position of the pattern of the projected exposure to the position of the workpieces 510 and 511 located at the position detection includes changing the angle of the mask 20 to the exposure light source from the vertical plane. The swing driving devices 40, 70, and/or the position of the pattern of the projected exposure pair on the positions of the position-detected workpieces 510, 511 are linearly moved to the pedestal disposed below the slide table 120. (Y) the driving device 150 in the direction of at least one of the horizontal (X) height (Z) direction, and/or the device for locating the position of the projected image to the position of the workpieces 510 and 511 for position detection, including The driving optical system 50 is linearly moved in a direction in which at least one of the vertical (Y) horizontal (X) high (Z) direction is formed.

Further, in the projection exposure method of the projection exposure apparatus 11 of the present embodiment, a specific pattern is placed on the workpieces 510 and 511 by a specific pattern of the mask 20, and the light from the light source unit 10 is projected and exposed, thereby designating a specific pattern. The workpieces 510 and 511 are formed so that the two workpieces 510 and 511 can be simultaneously placed without overlapping, and the two first regions 110 and the second regions 111 are formed on the portions on which the workpieces 510 and 511 are placed. The projection exposure apparatus 1 of the slide table 120 having the uppermost position and capable of sliding in the opposite direction and temporarily stopping at the specific first stop position 610 and the second stop position 612 of the end portions in each direction, the projection exposure method has: (A) a step of sliding the slide table 120 to temporarily stop the first region 110 at the specific first stop position 610; (B) a step of loading the workpieces 510, 511 in the first region 110 of the slide table 120; (C) a step of detecting the placement positions of the workpieces 510, 511 in the first region 110; (D) again making the slide table The step of sliding 120 to temporarily stop the first region 110 at the specific second stop position 611; (E) the step of projecting the pattern on the photomask 20 to the workpieces 510, 511 in the first region 110; (F) When there is a workpiece ending the projection exposure in the second region 111 of the slide table 120, the step of ending the projection exposure of the workpieces 510, 511 from the second region 111 is performed in parallel with the projection exposure processing of (E); (G) a process of replacing the first region 110 of the specific first stop position 610 of the above (A) to (F) and the second region 111 of the specific second stop position 611 for the continuation cycle, with respect to the subsequent The cycle is performed by alternately replacing the first region 110 and the second region 111.

According to the first embodiment described above, when the projection optical system 50, the position detecting unit 210, the first loader 310, and the second loader 311 are temporarily stopped at the first or second stop positions, the workpiece is placed on the workpiece. Different workpieces on different regions of the first or second can simultaneously perform different processes of loading/unloading of the workpiece, position detection, or projection exposure. Therefore, in the present embodiment, since the parallel processing can be performed in comparison with the conventional techniques for performing the respective processes in the same place, the processing time can be further shortened.

1‧‧‧Projection exposure device

10‧‧‧Light source department

20‧‧‧Photomask (screen)

30‧‧‧Mask with XY θ pedestal

40‧‧‧Swing pedestal for mask

50‧‧‧Projection optical system

60‧‧‧Mask XY θ pedestal drive

70‧‧‧Swing pedestal drive unit for mask

110‧‧‧The first area for workpiece placement

111‧‧‧Second area for workpiece placement

120‧‧‧Workpiece slide table

140‧‧‧Workpiece pedestal abutment

150‧‧‧XYZ swing drive

210‧‧‧First Position Detection Department

211‧‧‧Second position detection department

310‧‧‧First loader

311‧‧‧Second loader

410‧‧‧Control Department

510‧‧‧First workpiece

511‧‧‧second workpiece

610‧‧‧First stop position

611‧‧‧second stop position

Claims (7)

A projection exposure apparatus for projecting and exposing a specific pattern of a reticle to a specific position on a workpiece with light from a light source portion, thereby forming the specific pattern on the workpiece, the projection exposure apparatus having: The sliding table is formed such that two workpieces can be simultaneously placed without overlapping, and two first regions and second regions are formed on the uppermost portion of the portion on which the workpiece is placed, and can be mutually slid in the opposite direction and temporarily Stopping at a specific first stop position and a second stop position of the end portions in the respective directions; and the two first loaders are capable of loading and unloading the workpieces in the respective regions of the slide table; The first position detecting device is configured to be disposed on the slide table so as to detect a placement position of a workpiece placed in the first region when the slide table is temporarily stopped at the specific first stop position. An upper portion of the region; the second position detecting device is configured to detect the workpiece placed in the second region when the sliding table is temporarily stopped at the specific second stopping position Positioned at a position directly above the second region of the slide table; the light source portion, the reticle, and the projection optical system are capable of projecting exposure when the slide table is temporarily stopped at the specific first stop position Up to the upper portion of the second region of the slide table and the aforementioned workpiece in the second region, and when the slide table is temporarily stopped at the foregoing When the second stop position is specified, it can be projected and exposed to the upper portion of the first region of the slide table and disposed as the workpiece in the first region; and the control portion controls the foregoing Sliding of the slide table and stopping at each stop position, the first loader performs loading and unloading of the workpiece in each area, detection of the position of the workpiece in each area by the position detecting device, the light source unit, and the photomask And the projection optical system performs processing for projecting and exposing the workpieces in the respective regions, wherein the control unit performs the light source portion, the photomask, and the projection optical system on the workpiece placed in the second region When the projection exposure is performed, the position detecting device detects the placement position of the workpiece placed in the first region, and conversely, the workpiece placed in the first region, by the light source portion, When the mask and the projection optical system perform projection exposure, the position detecting means detects the parallel processing of the placement position of the workpiece placed in the second region. The projection exposure apparatus according to claim 1, wherein the projection exposure apparatus is an exposure apparatus that performs step exposure on a workpiece to be projected and exposed in a plurality of shots. The projection exposure apparatus according to claim 1 or 2, wherein the means for projecting the position of the exposed pattern to the position of the workpiece detected by the position includes linearly moving the mask to the longitudinal direction ( Y) A driving device in the direction of at least one of the horizontal (X) height (Z) direction. The projection exposure apparatus according to any one of claims 1 to 3, wherein the position of the pattern to be projected to be exposed to the position of the workpiece detected by the aforementioned position comprises a pair of reticle The oscillating drive device that changes the angle from the vertical surface of the exposure light source unit. The projection exposure apparatus according to any one of claims 1 to 3, wherein the position of the pattern to be projected and the position of the image to be detected by the position detection device is included in the foregoing The pedestal below the slide table is driven by a linear movement in at least one of the longitudinal (Y) transverse (X) high (Z) direction. The projection exposure apparatus according to any one of the preceding claims, wherein the position of the pattern to be projected and the position of the workpiece to be detected by the position detection includes the projection optical The system drives the drive unit linearly in the direction of at least one of the longitudinal (Y) transverse (X) high (Z) direction. A projection exposure method is a projection exposure apparatus that performs projection exposure on a specific position on a workpiece by aligning a specific pattern of a photomask with light from a light source section, thereby forming the specific pattern on the specific pattern The workpiece has a slide table, wherein the two first workpieces and the second region are formed on the uppermost portion of the portion on which the workpiece is placed, so that the two workpieces can be simultaneously placed without overlapping. And can slide in the opposite direction and temporarily stop at the specific end of each of the aforementioned directions a first stop position and a second stop position; the projection exposure method includes: (A) a step of sliding the slide to temporarily stop the first region at the specific first stop position; (B) making the aforementioned a step of loading a workpiece in the first region of the slide table; (C) a step of detecting a placement position of the workpiece in the first region; (D) sliding the slide table again to temporarily suspend the first region a step of stopping at the specific second stop position; (E) a step of projecting a pattern on the reticle to the workpiece in the first region; (F) having an end in the second region of the slide table When projecting the aforementioned workpiece, in parallel with the projection exposure processing of (E) above, the step of ending the projection of the workpiece from the second region is removed; and (G) replacing the aforementioned (A) to (F) a process of continuing the cycle of the first region of the specific first stop position and the second region of the specific second stop position, and replacing the first region and the second region with respect to a subsequent cycle and Shi step.