CN109154785A - Projection aligner and exposure method - Google Patents
Projection aligner and exposure method Download PDFInfo
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- CN109154785A CN109154785A CN201780030833.4A CN201780030833A CN109154785A CN 109154785 A CN109154785 A CN 109154785A CN 201780030833 A CN201780030833 A CN 201780030833A CN 109154785 A CN109154785 A CN 109154785A
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- 238000000034 method Methods 0.000 title claims description 17
- 238000012545 processing Methods 0.000 claims abstract description 38
- 230000003287 optical effect Effects 0.000 claims abstract description 30
- 238000001514 detection method Methods 0.000 claims abstract description 23
- 230000033001 locomotion Effects 0.000 claims description 13
- 230000015572 biosynthetic process Effects 0.000 claims 1
- 238000012360 testing method Methods 0.000 description 8
- 238000005516 engineering process Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 238000012546 transfer Methods 0.000 description 3
- 238000012790 confirmation Methods 0.000 description 2
- 239000002178 crystalline material Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000001259 photo etching Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
- G03F7/70725—Stages control
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
A kind of projection aligner, comprising: sliding objective table (120) is formed with the multiple regions (110,111) for loading workpiece；First loader (310) and the second loader (311) can load and unload workpiece (510,511)；First position detection device (210)；Second position detection device (211)；Control light source (10), photomask (20) and projection optical system (50)；And control unit (410), control sliding objective table (120) and each portion, when carrying out projection exposure to the workpiece (511) being placed in second area (111), control unit (410) implements the parallel processing detected to the mounting position for the workpiece (510) being placed in first area (110), when carrying out projection exposure to the workpiece (510) being placed in first area (110), control unit (410) implements the parallel processing detected to the mounting position for the workpiece (511) being placed in second area (111).
Description
Technical field
The present invention relates to the technologies for the handling capacity for improving projection aligner, more particularly to by reducing total projection exposure
Time improves the technology of handling capacity.
Background technique
For example, bibliography 1 or bibliography 2 disclose the pattern made on photomask (light shield) by using photoetching technique
The projection aligner being transferred on the workpiece such as wafer or substrate.
In bibliography 1, pattern on raw sheet (light shield: photomask) is projected to by projecting lens can be along X
One loaded on the mobile objective table (or mounting table) in (rotation) direction (cross)-Y (vertical)-θ is exposed on body (workpiece).Pass through
The position for being exposed body (workpiece) in XY all directions is detected using the location detecting apparatus of laser interferometer.In reference text
It offers in 1, discloses the step-by-step movement moving direction of the contraposition of the light shield and wafer for being accurately proceed in step printing, with
And moving direction of the wafer relative to the laser interferometer of location detecting apparatus.
In ref, the objective table (or mounting table) for not only loading a workpiece can be along X (cross)-Y (vertical)-θ
(rotation) direction is mobile, and the table for loading photomask (light shield) also can be mobile along X (cross) (rotation) direction-Y (vertical)-θ.?
In bibliography 2, the technology of the scanning direction and scanning speed etc. that can individually set two tables is disclosed.
Existing technical literature
Patent document
Patent document 1: Japanese Unexamined Patent Publication 2001-203161
Patent document 2: Japanese Laid-Open Patent Publication 11-260697
However, due to the material as workpiece, sometimes using the material to enbrittle as such as crystalline material or
The brittle material of amorphous such as glass, it is therefore desirable to caution processing, in other words need to come by the slower time into
Row.Therefore, institute can be unloaded in exposure area in exposure area and from mounting table by workpiece being loaded into mounting table
The time needed is very long, such as needs 70 seconds etc..
In addition, due to the High precision of transfer pattern in recent years, for utilizing projection aligner on workpiece
The position detection of workpiece when transferring pattern, in mounting table needs high-precision, and there is increase in the time needed for position detection
Tendency.In addition, such as step printing needs more in the case where implementing multiple exposure while mobile to multiple positions
Multiposition detection time.
In the previous projection aligner of such as patent document 1 and 2, firstly, workpiece to be loaded into the rule in mounting table
Positioning is set, and position of the workpiece in mounting table is then detected, then according to the position that detects by mounting table or photomask
Position be adjusted in all directions and implement to expose.That is, in previous projection aligner and its exposure method
In, due to successively and each processing is implemented separately can only shorten needed for each processing to shorten total processing time
Time, or shorten the switching time between each processing.
Summary of the invention
What the present invention proposed in view of the above problems, it is intended that providing a kind of projection aligner and its projection exposes
Light method, the projection aligner pass through the loading/unloading that can implement workpiece in projection exposure process side by side, in mounting table
The position detection of the workpiece loaded and each processing of projection exposure corresponding with the position of workpiece at least two
Processing, so that compared with the past can shorten total processing time.
In order to achieve the above objectives, in an embodiment of projection aligner according to the present invention, by covering light
The predetermined pattern of mould is aligned with the specified position on workpiece and carries out projection exposure using the light from light source, on workpiece
Form predetermined pattern, wherein the projection aligner includes sliding objective table, on the top surface at the position of mounting workpiece, with two
A workpiece is not overlapped and the mode that can be loaded simultaneously forms first area and the two regions of second area, the sliding loading
Platform, which can replace, slides to opposite direction and can temporarily stop the first stop position as defined in end in all directions and the
On two stop positions；Two the first loaders, can slide and each work is individually loaded and unloaded in each region of objective table
Part；First position detection device is carried in the case where sliding objective table temporarily stops at defined first stop position in sliding
The upper part of the first area of object platform detects the mounting position of the workpiece loaded in the first area；Second position detection is set
It is standby, in the case where sliding objective table temporarily stops at defined second stop position, sliding the second area of objective table
Upper part detects the mounting position of the workpiece loaded in the second area；Light source, photomask and projection optical system,
In the case that sliding objective table temporarily stops at defined first stop position, the second area of objective table can slided just
Top carries out projection exposure to the workpiece that is placed in the second area, and as defined in temporarily stopping in sliding objective table
It, can be in the upper part of the first area of sliding objective table, to being placed in the first area in the case where second stop position
Workpiece carry out projection exposure；And control unit, to sliding objective table sliding and in the stopping of each stop position, by first
The workpiece in each region that loader is carried out to the loading of the workpiece carried out in each region and unloading, by location detecting apparatus
Mounting position detection and by light source, photomask and projection optical system carry out the throwing to workpiece in each region
Each processing such as shadow exposure are controlled, and the control unit implements parallel processing, that is, when passing through light source, photomask and projection
When optical system carries out projection exposure to the workpiece being placed in second area, detects and load in parallel through location detecting apparatus
In the mounting position of the workpiece in first area, on the contrary, when by light source, photomask and projection optical system to being placed in
When workpiece in first area carries out projection exposure, the work being placed in second area is detected in parallel through location detecting apparatus
The mounting position of part.
In order to achieve the above objectives, an embodiment of exposure method of the invention uses projection aligner, should
Projection aligner is by being directed at the predetermined pattern of photomask with the specified position on workpiece and utilizing the light from light source
Projection exposure is carried out, forms predetermined pattern on workpiece, and the projection aligner has sliding objective table, the sliding loading
Platform mounting workpiece position top surface on, formed in such a way that two workpiece are not overlapped and can be loaded simultaneously first area and
The two regions of second area, which, which can replace to opposite direction, slides and can temporarily stop in all directions
On defined first stop position of end and the second stop position, wherein the exposure method includes: that (A) carries sliding
The step of object platform slides, and first area is made temporarily to stop at defined first stop position；(B) workpiece is made to be loaded into sliding loading
Step in the first area of platform；(C) the step of detecting the mounting position of the workpiece in first area；(D) make to slide objective table
The step of sliding again, first area made temporarily to stop at defined second stop position；(E) pattern on photomask is projected and is exposed
The step on workpiece in light to first area；(F) when the workpiece for thering is projection exposure to terminate in the second area of sliding objective table
When, the step of concurrently unloading the workpiece that projection exposure terminates out of described second area with the processing of the projection exposure of step (E)；
And (G) will described in (A)~(F) defined first stop position first area and defined second stop position second
Region carries out the processing of next cycle, and period afterwards, and first area and second area mutually brought implementation processing
The step of.
Detailed description of the invention
Fig. 1 (a)~(c) is to indicate that the sliding objective table of the exposure device when first embodiment of the invention stops at first
The figure of outline structure when stop position, (a) are off the side view in the first stop position, (b) are off and stop second
Side view when stop bit is set is (c) top view.
Fig. 2 is the action flow chart of the exposure device of first embodiment of the invention.
Specific embodiment
Overall description
One embodiment of projection aligner according to the present invention, on the predetermined pattern and workpiece by making photomask
Specified position be aligned and using from light source light carry out projection exposure, predetermined pattern is formed on workpiece, wherein should
Projection aligner includes sliding objective table, on the top surface at the position of mounting workpiece, is not overlapped with two workpiece and can be with
The mode of mounting forms first area and the two regions of second area simultaneously, which can replace sliding to opposite direction
It moves and can temporarily stop on defined first stop position and the second stop position of end in all directions；Two first
Loader can individually load into each region of the sliding objective table and unload each workpiece；First position detection is set
It is standby, in the case where sliding objective table temporarily stops at defined first stop position, in the first area of sliding objective table
Upper part detects the mounting position of the workpiece loaded in the first area；Second position detection device faces in sliding objective table
When stop at as defined in the case where the second stop position, in the upper part of the second area of sliding objective table, detection this
The mounting position of the workpiece loaded in two regions；Light source, photomask and projection optical system temporarily stop in sliding objective table
In the case where defined first stop position, can in the upper part of the second area of sliding objective table, to be placed in this
Workpiece in two regions carries out projection exposure, and is sliding the case where objective table temporarily stops at defined second stop position
Under, projection exposure can be carried out to the workpiece being placed in the first area in the upper part of the first area of sliding objective table；
And control unit, to sliding objective table sliding and the stopping of each stop position, by the first loader in each region
Carry out workpiece loading and unloading, by location detecting apparatus carry out each region in workpiece mounting position detection, with
And each processing such as the projection exposure of workpiece in each region is carried out by what light source, photomask and projection optical system carried out
Control, the control unit implement parallel processing, that is, when by light source, photomask and projection optical system to being placed in second
When workpiece in region carries out projection exposure, the workpiece loaded in first area is detected in parallel through location detecting apparatus
Position is loaded, on the contrary, when carrying out by light source, photomask and projection optical system to the workpiece being placed in first area
When projection exposure, in parallel through the mounting position for the workpiece that location detecting apparatus detection loads in second area.
The other embodiments of projection aligner according to the present invention, projection aligner will by step printing
The pattern of projection exposure is gradually exposed on a workpiece.
The other embodiments of projection aligner according to the present invention make the position of the pattern of projection exposure and are detected
The equipment of the position alignment of the workpiece of out position, including make photomask along at least one of vertical (Y) horizontal (X) height direction (Z)
The driving equipment of direction linear movement.
The other embodiments of projection aligner according to the present invention make the position of the pattern of projection exposure and are detected
The equipment of the position alignment of the workpiece of out position, including making photomask from the inclination of the normal surface change angle orthogonal with exposure light
Driving equipment.
The other embodiments of projection aligner according to the present invention make the position of the pattern of projection exposure and are detected
The equipment of the position alignment of the workpiece of out position, including keeping the base station for the lower section for being configured at sliding objective table high along (Y) horizontal (X) is indulged
Spend the driving equipment of at least one direction linear movement in the direction (Z).
The other embodiments of projection aligner according to the present invention make the position of the pattern of projection exposure and are detected
The equipment of the position alignment of the workpiece of out position includes indulging projection optical system edge along (Y) horizontal (X) height direction (Z) extremely
The driving equipment of few direction linear movement.
In an embodiment using the exposure method of projection aligner of the present invention, the projection aligner is logical
Crossing is directed at the predetermined pattern of photomask with the specified position on workpiece and carries out projection exposure using the light from light source,
Predetermined pattern is formed on workpiece, and the projection aligner has sliding objective table, the sliding objective table is in mounting workpiece
On the top surface at position, formed in such a way that two workpiece are not overlapped and can be loaded simultaneously first area and second area the two
Region, which, which can replace, slides to opposite direction and can temporarily stop as defined in end in all directions the
On one stop position and the second stop position, wherein the exposure method includes: that (A) makes to slide objective table sliding, makes first
Region temporarily stops at the step of defined first stop position；
(B) workpiece is made to be loaded into the step in the first area of sliding objective table；
(C) the step of detecting the mounting position of the workpiece in first area；
(D) make to slide the step of objective table slides again, first area is made temporarily to stop at defined second stop position；
(E) by the step on the workpiece in the pattern projection exposure to first area on photomask；
(F) projection exposure when the workpiece for thering is projection exposure to terminate in the second area for sliding objective table, with step (E)
Processing concurrently unloads the step of workpiece that projection exposure terminates, and (G) (A)~(F) by described in out of described second area
Defined first stop position first area and defined second stop position second area mutually bring carry out it is next
First area and second area are mutually brought the step of implementation is handled by the processing in period, and period afterwards.
Invention effect
Exposure device according to the present invention is not weighed by being arranged on the top surface for loading the position of workpiece with multiple workpiece
Mode that is folded and can loading simultaneously forms multiple regions, can slide and temporarily stop on defined multiple stop positions
Reciprocating motion type slide objective table, and centered on the projection optical system of the pattern on workpiece projection photomask,
The two sides of the glide direction make workpiece the first loader, sliding objective table on workpiece location detecting apparatus respectively with sliding
Different zones on objective table accordingly configure, so as to realize the parallel practice of each processing.Thus, it is possible to provide Yi Zhongyu
Previous projection aligner and its exposure method compared to the total exposure time that can shorten workpiece.
The explanation of embodiment illustrated
First embodiment
Hereinafter, being described with reference to first embodiment of the invention.In Fig. 1 (a), (b), the present invention first is shown
The outline structure of the exposure device 1 of embodiment is provided with substantially rectangular workpiece on workpiece loading base station 140 and slides
Dynamic object stage 120.
In workpiece on sliding objective table 120, workpiece mounting first area 110 and workpiece load and use second area 111
The both ends for the long side that the two regions configured in the sliding objective table 120.Workpiece mounting first area 110 and workpiece load
It is greater than the respective surface area of the first workpiece 510 and second workpiece 511 with second area 111, and is respectively provided with for distinguishing
The sufficient area of each workpiece is loaded, in addition, can set on the position that each workpiece will not Gan Wataru in each region
Set the label (not shown) of the datum mark of locative identification marking (ID) or position finding.
Workpiece by XYZ pitch drives portion 150 and includes microcomputer or central processing unit with sliding objective table 120
(CPU) control unit 410 is connected.According to the order from control unit 410, driving is used from XYZ pitch drives portion 150 and is believed
Number to workpiece with sliding objective table 120 send out.Workpiece sliding can be accurately controlled by driving mechanism (not shown) etc. to carry
The distance and stop position of the sliding of object platform 120 in the plane.In addition, workpiece sliding objective table 120 and power supply (not shown)
It connects and is supplied to the required electric power of sliding.
Workpiece loading base station 140 is used to that workpiece to be made to slide objective table 120 to all directions movement of X, Y, Z or incline
Tiltedly, driving mechanism, guide rail etc. can be set as needed.In the present embodiment, to only to X-direction slide situation say
It is bright, but can be used in the contraposition etc. for exposing predetermined pattern to the movement of other directions or inclined function.
Workpiece mounting first area 110 slides workpiece by the XYZ pitch drives portion 150 controlled by control unit 410
Dynamic object stage 120 is slided, and so as to be moved to the first stop position 610 or the second stop position 611, and is stopped in the position
On.The pattern being exposed is more detailed, more needs to improve sliding precision, stopping accuracy and accurately control.Temporarily stop at
Workpiece mounting when the first stop position 610 upper part of first area 110, for example, configuration first position test section 210.
In addition, the first loader 310 is configured in Fig. 1 (a), workpiece mounting when temporarily stopping at the first stop position 610 is used
The top in the region of first area 110 or near.First loader 310 can stop on the first stop position 610 from temporarily
Workpiece mounting the workpiece of end exposure is unloaded with first area 110, and unexposed workpiece can be loaded into the region.Example
Such as be able to use conveyer belt (not shown), by from workpiece with sliding objective table 120 on be removed come end exposure workpiece
It is transplanted on next process, or is moved to unexposed workpiece near the first loader 310.In addition, in the second stop position
The projection optical system 50 of 611 upper part configuration exposure.
Workpiece mounting second area 111 is sliding also by making the workpiece controlled by control unit 410 use slide objective table 120
It is dynamic, it is moved to the first stop position 610 or the second stop position 611, and stop on the position.Due to the first stop position
610 and second stop position 611 be configured at the substantially rectangular workpiece both ends of the long side of sliding objective table 120, therefore
When temporarily stopping at the first stop position 610, first position test section 210 is configured in workpiece mounting first area 110
Upper part, the first loader 310 are configured in the workpiece mounting top in the region of first area 110 or neighbouring, exposure
Projection optical system 50 is configured in the workpiece mounting upper part of second area 111, and is temporarily stopping at the second stop position
When 611, the configuration of second position test section 211 is configured in the upper part of workpiece mounting second area 111, the second loader 311
It is carried on the workpiece mounting top in the region of second area 111 or neighbouring, exposure the configuration of projection optical system 50 in workpiece
Set the upper part with first area 110.
Light source portion 10, photomask 20, mask XY θ mounting table are configured on the more top of the projection optical system 50 of exposure
30, mask inclination mounting table 40.In the case of Fig. 1 (a), the exposure light from light source portion 10 through photomask 20 and is thrown
Shadow optical system 50, to it is when temporarily stopping at the first stop position 610, be positioned on workpiece mounting second area 111
Second workpiece 511 be exposed, the predetermined pattern on photomask 20 is transferred on second workpiece 511 as a result,.
Mask and includes microcomputer or centre by mask XY θ mounting table driving portion 60 with XY θ mounting table 30
The control unit 410 of reason unit (CPU) is connected.According to the order from control unit 410, driven from mask XY θ mounting table
Portion 60 is sent out by driving signal to mask XY θ mounting table 30.Mask can be by can be (horizontal in X-direction with XY θ mounting table 30
To), the mobile mask XY θ mounting table driving portion 60 in Y-direction (longitudinal direction) and (rotation) direction θ, in mounting table (not shown)
The stop position on XY θ (longitudinal and transverse, rotation) direction in mounting table plane is accurately controlled in plane.In addition, mask XY
θ mounting table 30 is also connected with power supply (not shown) and is supplied to the required electric power of movement in XY θ (longitudinal and transverse, rotation) direction.
Mask by mask inclination mounting table driving portion 70 and includes microcomputer or center with inclination mounting table 40
The control unit 410 of processing unit (CPU) is connected.According to the order from control unit 410, driven from mask inclination mounting table
Dynamic portion 70 is sent out by driving signal to mask inclination mounting table 40.Mask inclination mounting table 40 can be tilted by mask
Mounting table driving portion 70, accurately the stop position of inclined (tilt) state of console plane, the mask are loaded with inclination
Platform driving portion 70 can make (not shown) plane from the angle tilt vertical with optical axis.In addition, mask inclination mounting table 40
Also it is connected with power supply (not shown) and is supplied to the electric power for keeping the inclination of mounting table plane required.
Control unit 410 controls workpiece sliding objective table 120, workpiece loading base station 140, mask XY θ mounting table 30
And the mask position in the plane of inclination mounting table 40, and angle and tilt angle in the plane, so that light is covered
Predetermined pattern on mould 20 is accurately transferred on the defined position on second workpiece 511.At this point, for example, can be used not
The photomask of diagram microscope and workpiece microscope etc. are controlled, so that the still mask pair on photomask (not shown)
Fiducial mark note is aligned with the workpiece alignment label on workpiece.In addition, as needed, can also be arranged in projection optical system 50 and drive
Portion carries out the control for making the predetermined pattern on photomask project the specified position to workpiece using the driving portion.
Illustrate the movement of present embodiment referring next to Fig. 2.Firstly, when starting to process, confirmation sliding objective table 120 is
It is no temporarily to stop on the first stop position 610 (S1).If sliding objective table 120 just temporarily stops at the first stop position
On 610 (S1: yes), then confirm unexposed with whether being placed on first area 110 in the workpiece mounting for sliding objective table 120
Workpiece (S2).If sliding objective table 120 does not stop on the first stop position 610 (S1: no) temporarily, since sliding carries
Object platform 120 is just temporarily stopping on the second stop position 611, therefore enters step S7.
In the case where sliding the workpiece mounting of objective table 120 on first area 110 without loading unexposed workpiece
(S2: yes), control unit 410 are exported to the first loader 310 and are ordered, and unexposed workpiece is loaded into workpiece and loads the firstth area
In domain 110 (S3).In workpiece mounting with (S2: no) in the case where being placed with unexposed workpiece in first area 110, due to nothing
Unexposed workpiece need to be loaded, therefore enters step S4, is detected according to the order of control unit 41 using first position test section 210
The position (S4) of the first workpiece 510 on workpiece mounting first area 110.At this point, for example, can using workpiece with microscope come
Platform alignment mark on monitor station and the workpiece alignment label on workpiece.
If it is detected that the position of the first workpiece 510 in workpiece mounting first area 110, control unit 410 incline to XYZ
Oblique driving portion 150, which exports, makes to slide the order that objective table 120 slides into the second stop position 611 from the first stop position 610
(S5), if throwing of the workpiece mounting on sliding objective table 120 in the case where second stop position 611 of the arrival of first area 110
The positive bottom of shadow optical system 50, then (S6) is temporarily ceased and desisted order in output.
If sliding objective table 120 temporarily stops at the second stop position 611, the sliding of the first stop position 610 is confirmed
Whether the workpiece (S7) of end exposure is had in the workpiece mounting second area 111 of objective table 120.The secondth area is loaded in workpiece
In the case where having the workpiece of end exposure in domain 111 (S7: yes), control unit 410 is exported to the second loader 311 and is ordered, so that
The workpiece (S8) of the end exposure is unloaded with second area 111 from workpiece mounting, and unexposed workpiece is loaded into workpiece and is carried
It sets with second area 111 (S9).In workpiece mounting second area 111 in the case where the not workpiece of end exposure (S7:
It is no), due to unexposed workpiece being loaded into workpiece and entering step S9 and loads the secondth area without unloading workpiece
Domain 111 (S9).
While being loaded into workpiece after the processing of step S7 in workpiece mounting second area 111, concurrently exist
The first workpiece 510 implementation that the position detection in workpiece mounting first area 110 terminates is passed through on second stop position 611
The projection exposure of the predetermined pattern of photomask 20 and transfer (S10) to being carried out on the first workpiece 510.When turning for the predetermined pattern
At the end of print, control unit 410 exports the order (S11) for sliding it again to XYZ pitch drives portion 150, if sliding objective table
120 the first stop positions 610 of arrival then export the order (S12) temporarily stopped.
If sliding objective table 120 temporarily stops at the first stop position 610, the sliding of the first stop position 610 is confirmed
Whether the workpiece (S13) of end exposure is had in the workpiece mounting first area 110 of objective table 120.It loads in workpiece with first
In the case where having the workpiece of end exposure in region 110 (S13: yes), control unit 410 is exported to the first loader 310 and is ordered, with
Make from workpiece mounting first area 110 unload the end exposure workpiece (S14), and enter step S16 be confirmed whether to have it is surplus
Remaining unexposed workpiece (S16).In workpiece mounting first area 110 in the case where the not workpiece of end exposure
(S13: no), due to entering step S16 and being confirmed whether there is remaining unexposed workpiece (S16) without unloading workpiece.
The firstth area of workpiece mounting for the sliding objective table 120 in the first stop position 610 after step s 12
While whether having the confirmation of the workpiece of end exposure in domain 110, concurrently workpiece is loaded on the second stop position 611 and is used
The second workpiece 511 that position detection in second area 111 terminates implements the projection exposure of the predetermined pattern by photomask 20
And the transfer (S15) to being carried out on second workpiece 511, then control unit 410 is confirmed whether there is remaining unexposed workpiece
(S16)。
In the case where no remaining unexposed workpiece (S16: yes), end processing, and it is remaining unexposed having
Workpiece in the case where (S16: no), return step S1 confirms whether workpiece mounting with first area 110 temporarily stops at first
On stop position 610 (S1), and the processing after repetition.
Therefore, the projection aligner 1 of present embodiment, by the predetermined pattern and workpiece 510,511 that make photomask 20
On specified position be aligned and using from light source light carry out projection exposure, thus on workpiece 510,511 formed regulation
Pattern, the projection aligner include sliding objective table 120, on the top surface at the position of mounting workpiece 510,511, with two
Workpiece 510,511 is not overlapped and the mode that can be loaded simultaneously forms first area 110 and the two regions of second area 111,
The sliding objective table, which can replace, to be slided to opposite direction and can temporarily stop as defined in end in all directions first and stop
Stop bit sets 610 and second on stop position 611；First loader 310 and the second loader 311, can be 510,511 points by workpiece
It is not loaded into each region of sliding objective table 120 or is unloaded out of sliding objective table 120 each region；First position inspection
Measurement equipment 210, in the case where sliding objective table 120 temporarily stops at defined first stop position 610, in sliding objective table
The upper part of 120 first area 110 detects the mounting position for the workpiece 510 or 511 being placed in the first area 110；The
Two location detecting apparatus 211, in the case where sliding objective table 120 temporarily stops at defined second stop position 611, in cunning
The upper part of the second area 111 of dynamic object stage 120 detects the load for the workpiece 510 or 511 being placed in the second area 111
Seated position；Light source 10, photomask 20 and projection optical system 50 temporarily stop at defined first in sliding objective table 120
It, can be in the upper part of the second area 111 of sliding objective table 120, to being placed in secondth area in the case where stop position 610
Workpiece 510,511 in domain 111 carries out projection exposure, and temporarily stops at defined second in sliding objective table 120 and stop
It, can be in the upper part of the first area 110 of sliding objective table 120, to being placed in first area 110 in the case where position 611
Interior workpiece 510,511 carries out projection exposure；And control unit 410, to the sliding for sliding objective table 120 and in each stop position
Set the stopping on 610,611, by the first loader 310 to the loading of the workpiece 510,511 carried out in each region and unloading, by
Location detecting apparatus 210,211 carry out each region in workpiece 510,511 mounting position detection and by light source
10, what photomask 20 and projection optical system 50 carried out is each to the projection exposure of workpiece 510,511 in each region etc.
Processing controlled, control unit 410 can implement parallel processing, that is, when pass through light source 10, photomask 20 and projection optics system
When the workpiece 511 that 50 pairs of system is placed in second area 111 carries out projection exposure, examined in parallel through location detecting apparatus 210
The mounting position for the workpiece 510 being placed in first area 110 is surveyed, on the contrary, when passing through light source 10, photomask 20 and projection
When optical system 50 carries out projection exposure to the workpiece 510 being placed in first area 110, in parallel through location detecting apparatus
The mounting position for the workpiece 511 that 211 detections are placed in second area 111.
In addition, the projection aligner 1 of present embodiment can be to a workpiece 510 or 511, it will by step printing
The pattern of projection exposure is wanted gradually to be exposed to the exposure device on a workpiece.In addition, in the projection of above-mentioned each embodiment
In exposure device 1, make the equipment of the position of the pattern of projection exposure with the position alignment for the workpiece 510,511 for being detected position
It may include the driving equipment 60 for making at least one direction linear movement of the photomask 20 in vertical (Y) horizontal (X) height direction (Z),
And/or make the equipment of the position alignment of the position of the pattern of projection exposure and the workpiece 510,511 for being detected position can
Including making photomask 20 from the pitch drives equipment 40,70 for changing angle with the orthogonal normal surface of exposure light, and/or, make
The position of the pattern of projection exposure and the equipment of the position alignment for the workpiece 510,511 for being detected position may include making to be configured at
The platform of the lower section of objective table 120 is slided along the driving for indulging at least one direction linear movement in (Y) horizontal (X) height direction (Z)
Equipment 150, and/or, make the position alignment of the position of the pattern of projection exposure with the workpiece 510,511 for being detected position
Equipment may include that at least one direction of projection optical system 50 in vertical (Y) horizontal (X) height direction (Z) is made to move linearly
Driving equipment.
In addition, the exposure method of the projection aligner 11 of present embodiment uses projection aligner 1, the projection
Exposure device 1 is by being directed at the predetermined pattern of photomask 20 with the specified position on workpiece 510,511 and utilizing from light
The light in source 10 carries out projection exposure, forms predetermined pattern on workpiece 510,511, and the projection aligner 1 has and slides
Dynamic object stage 120, the sliding objective table 120 is on the top surface at the position of mounting workpiece 510,511, with two workpiece 510,511
It is not overlapped and the mode that can be loaded simultaneously forms first area 110 and the two regions of second area 111, the sliding objective table
120 can replace to opposite direction sliding and can temporarily stop the first stop position 610 as defined in end in all directions
On the second stop position 611, which includes: that (A) makes to slide the sliding of objective table 120, faces first area 110
When stop at as defined in the first stop position 610 the step of；(B) workpiece 510,511 is made to be loaded into the first of sliding objective table 120
Step in region 110；(C) the step of detecting the mounting position of the workpiece 510,511 in first area 110；(D) sliding is carried
The step of object platform 120 slides again, and first area 110 is made temporarily to stop at defined second stop position 611；(E) light is covered
Pattern projection exposure on mould 20 is in workpiece 510,511 in first area 110 the step of；(F) when in sliding objective table 120
When workpiece 510,511 for thering is projection exposure to terminate in second area 111, handle with the projection exposure of step (E) concurrently from this
The step of workpiece 510,511 that unloading projection exposure terminates in second area 111；And the regulation of (G) (A)~(F) by described in
The first area 110 of the first stop position 610 and the second area 111 of defined second stop position 611 mutually bring progress
First area 110 and second area 111 are mutually brought the step for implementing processing by the processing of next cycle, and period afterwards
Suddenly.
In first embodiment as described above, projection optical system 50, first position test section 210, the second position
Test section 211, the first loader 310 and the second loader 311 are temporarily stopping at each first stop position or second are stopping
It, being capable of difference in the different zones to workpiece mounting first area or workpiece mounting second area in the case that stop bit is set
Workpiece, loading/unloading of workpiece and position detection or projection exposure these different processing are implemented simultaneously in parallel.Cause
This, with compared with the prior art of each processing is continuously sequentially implemented in identical position, due in the present embodiment can
Enough parallel processings, therefore the processing time can be shortened.
Description of symbols
1 projection aligner 1
10 light source portions
20 photomasks (light shield)
30 masks XY θ mounting table
40 masks inclination mounting table
50 projection optical systems
60 masks XY θ mounting table driving portion
70 masks inclination mounting table driving portion
110 workpiece mounting uses first area
111 workpiece mounting uses second area
120 workpiece sliding objective table
140 workpiece loading base station
150 XYZ pitch drives portions
210 first position test sections
211 second position test sections
310 first loaders
311 second loaders
410 control units
510 first workpiece
511 second workpieces
610 first stop positions
611 second stop positions
Claims (7)
1. a kind of projection aligner is directed at the predetermined pattern of photomask with the specified position on workpiece and utilizes from light
The light in source carries out projection exposure, thus forms the predetermined pattern on the workpiece, wherein
The projection aligner includes
Objective table is slided, on the top surface at position for loading the workpiece, is not overlapped with two workpiece and two can be loaded simultaneously
The mode of a workpiece is formed with two regions in first area and second area, and the sliding objective table can be alternately opposite to each other
Direction slide and can temporarily stop at each direction end defined first stop position with second stopping
On position；
Two the first loaders individually can load and unload each institute in each region to the sliding objective table
State workpiece；
First position detection device, the case where the sliding objective table temporarily stops at defined first stop position
Under, the upper part for the first area configured in the sliding objective table, to detect the workpiece loaded in the first area
Mounting position；
Second position detection device, the case where the sliding objective table temporarily stops at defined second stop position
Under, the upper part for the second area configured in the sliding objective table, to detect the workpiece loaded in the second area
Mounting position；
Light source, photomask and projection optical system temporarily stop at defined described first in the sliding objective table and stop
In the case where position, the upper part for the second area configured in the sliding objective table can be to being placed in secondth area
The workpiece in domain carries out projection exposure, and temporarily stops at defined second stop position in the sliding objective table
In the case where setting, the upper part for the first area configured in the sliding objective table can be to being placed in the first area
The interior workpiece carries out projection exposure；And
Control unit controls following each processing: the sliding sliding of objective table and stopping on each stop position
Only, it is carried out by the first loader to the loading of the workpiece carried out in each region and unloading, by the location detecting apparatus each
The detection of the mounting position of workpiece in a region and pair carried out by the light source, photomask and projection optical system
The projection exposure of workpiece in each region,
The control unit implements parallel processing, that is, when by the light source, photomask and projection optical system to being placed in
When stating the workpiece progress projection exposure in second area, detect in parallel through the location detecting apparatus in the first area
The mounting position of the workpiece of interior mounting, on the contrary, when by the light source, photomask and projection optical system to described the
When the workpiece loaded in one region carries out projection exposure, described second is placed in parallel through location detecting apparatus detection
The mounting position of workpiece in region.
2. projection aligner according to claim 1, wherein
The projection aligner be by step printing will the pattern of projection exposure be gradually exposed on a workpiece
Exposure device.
3. projection aligner according to claim 1 or 2, wherein
Making the position of the pattern of projection exposure and the equipment of the position alignment for the workpiece for being detected position includes: to cover light
Mould along longitudinal direction (Y), laterally (X), at least one direction linear movement in short transverse (Z) driving equipment.
4. projection aligner according to any one of claim 1 to 3, wherein
Making the position of the pattern of projection exposure and the equipment of the position alignment for the workpiece for being detected position includes: to cover light
Mould changes the pitch drives equipment of angle from the normal surface orthogonal with exposure light.
5. projection aligner according to any one of claim 1 to 3, wherein
The equipment for making the position of the pattern of projection exposure and the position alignment for the workpiece for being detected position includes: to make to configure
Base station (Y), laterally (X), at least one direction straight line in short transverse (Z) along longitudinal direction in the lower section of the sliding objective table
Mobile driving equipment.
6. projection aligner according to any one of claim 1 to 3, wherein
Make the equipment of the position of the pattern of projection exposure and the position alignment for the workpiece for being detected position include: make it is described
Projection optical system along longitudinal direction (Y), laterally (X), at least one direction linear movement in short transverse (Z) driving equipment.
7. a kind of exposure method, using projection aligner, the projection aligner make the predetermined pattern of photomask with
Specified position on workpiece is aligned and carries out projection exposure using the light from light source, thus on the workpiece described in formation
Predetermined pattern, also, the projection aligner has sliding objective table, and the sliding objective table is in the portion for loading the workpiece
On the top surface of position, first area and the secondth area are formed in such a way that two workpiece are not overlapped and can load two workpiece simultaneously
The domain region Liang Ge, the sliding objective table can be slided alternately in the opposite directions to each other and can temporarily be stopped at each
On defined first stop position of the end in the direction and the second stop position, wherein the exposure method includes:
(A) step slides the sliding objective table, and the first area is made temporarily to stop at defined first stop position
It sets；
(B) step is loaded into the workpiece in the first area of the sliding objective table；
(C) step detects the mounting position of the workpiece in the first area；
(D) step slides the sliding objective table again, so that the first area is temporarily stopped at defined described second and stops
Stop bit is set；
(E) step, will be on the workpiece in the pattern projection exposure to the first area on photomask；
(F) step, it is and described when the workpiece for thering is projection exposure to terminate in the second area of the sliding objective table
(E) the projection exposure processing of step concurrently unloads the workpiece that projection exposure terminates out of this second area；And
(G) step, the first area of defined first stop position of (A) step~(F) step by described in and rule
The second area of fixed second stop position mutually brings the processing for carrying out next cycle, also, week afterwards
The first area and the second area are mutually brought implementation processing by the phase.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2016-105090 | 2016-05-26 | ||
| JP2016105090A JP6353487B2 (en) | 2016-05-26 | 2016-05-26 | Projection exposure apparatus and projection exposure method |
| PCT/JP2017/018781 WO2017204101A1 (en) | 2016-05-26 | 2017-05-19 | Projection exposure device and projection exposure method therefor |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN109154785A true CN109154785A (en) | 2019-01-04 |
Family
ID=60412760
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201780030833.4A Pending CN109154785A (en) | 2016-05-26 | 2017-05-19 | Projection aligner and exposure method |
Country Status (6)
| Country | Link |
|---|---|
| JP (1) | JP6353487B2 (en) |
| KR (1) | KR102406914B1 (en) |
| CN (1) | CN109154785A (en) |
| SG (1) | SG11201810475VA (en) |
| TW (1) | TWI730104B (en) |
| WO (1) | WO2017204101A1 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113835294A (en) * | 2020-06-23 | 2021-12-24 | 李永春 | Method and apparatus for forming three-dimensional microstructures |
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- 2017-05-19 WO PCT/JP2017/018781 patent/WO2017204101A1/en active Application Filing
- 2017-05-19 CN CN201780030833.4A patent/CN109154785A/en active Pending
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Also Published As
| Publication number | Publication date |
|---|---|
| TWI730104B (en) | 2021-06-11 |
| JP6353487B2 (en) | 2018-07-04 |
| KR102406914B1 (en) | 2022-06-08 |
| WO2017204101A1 (en) | 2017-11-30 |
| SG11201810475VA (en) | 2018-12-28 |
| TW201805740A (en) | 2018-02-16 |
| JP2017211534A (en) | 2017-11-30 |
| KR20190010538A (en) | 2019-01-30 |
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Application publication date: 20190104 |