TW201803693A - Chuck table mechanism to rotatably and suctionably support a chuck table without using a tube and shorten maintenance time - Google Patents

Chuck table mechanism to rotatably and suctionably support a chuck table without using a tube and shorten maintenance time Download PDF

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TW201803693A
TW201803693A TW106119308A TW106119308A TW201803693A TW 201803693 A TW201803693 A TW 201803693A TW 106119308 A TW106119308 A TW 106119308A TW 106119308 A TW106119308 A TW 106119308A TW 201803693 A TW201803693 A TW 201803693A
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chuck table
fixed base
base
suction
fixed
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TW106119308A
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TWI715779B (en
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植山博光
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迪思科股份有限公司
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6838Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67092Apparatus for mechanical treatment
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67126Apparatus for sealing, encapsulating, glassing, decapsulating or the like
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68714Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
    • H01L21/68764Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a movable susceptor, stage or support, others than those only rotating on their own vertical axis, e.g. susceptors on a rotating caroussel

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Dicing (AREA)
  • Mechanical Engineering (AREA)

Abstract

The subject of this invention is to rotatably and suctionably support a chuck table without using a tube and to shorten maintenance time. The solution of this invention is that a chuck table mechanism (50) comprises a fixed base (52) connected to an external suction source (94), a rotating means (51) rotatably disposed to the fixed base, and a chuck table (40) mounted on the upper part of the rotating means so as to be rotatably supported with respect to the fixed base. The rotating means is provided with a rotating base (54) rotatably disposed to the fixed base and an inserting part (55) detachably fixed to the rotational center position of the rotating base. The engagement end part (72) of the inserting part is engaged with the engagement concave part (73) of the fixed base so that the suction path (95) in the inserting part is connected to the communication path (97) of the fixed base and the opposite surfaces of the engaging end part and the engaging concave part are sealed by a seal ring (84).

Description

吸盤台機構 Suction table mechanism

本發明是有關在加工裝置中保持被加工物的吸盤台機構。 The present invention relates to a chuck table mechanism that holds a workpiece in a processing device.

半導體晶圓等的被加工物的表面是藉由格子狀的切道(切斷線)來區劃成複數的領域,在以此切道所區劃的各領域中形成有IC、LSI等的裝置。在裝置製造工程中是沿著切道來切斷被加工物,藉此製造各個的裝置晶片。被加工物的分割是藉由切削裝置或雷射加工裝置等的加工裝置來實施。在各加工裝置是設有將吸引保持被加工物的吸盤台予以可旋轉地配設於固定基台上的吸盤台機構(例如參照專利文獻1)。 The surface of a workpiece such as a semiconductor wafer is divided into a plurality of areas by a grid-like scribe line (cut line), and devices such as ICs and LSIs are formed in each of the areas defined by the scribe line. In the device manufacturing process, the object to be processed is cut along a cutting path, thereby manufacturing each device wafer. The object to be processed is divided by a processing device such as a cutting device or a laser processing device. Each processing device is provided with a chuck table mechanism that rotatably arranges a chuck table that sucks and holds a workpiece (for example, see Patent Document 1).

吸盤台機構是對於固定基台構成可旋轉吸盤台的同時,須使負壓作用於吸盤台的保持面。因此,提案在吸盤台機構採用旋轉接頭(Rotary Joint)構造。在吸盤台與旋轉基台的接頭處設有被設置複數的管(tube)的多接頭,管會從多接頭通過固定基台內來連接至吸引源。吸引力會通過管來賦予吸盤台的保持面,吸盤台的旋轉不會有被管阻礙的情形。 The chuck table mechanism is a rotatable chuck table for a fixed base, and a negative pressure must be applied to the holding surface of the chuck table. Therefore, it is proposed to adopt a rotary joint structure in the chuck table mechanism. Multiple joints are provided at the joint between the sucker stage and the rotating base, and the tubes are connected to the suction source through the fixed base from the multiple joints. The suction force is given to the holding surface of the sucker table through the tube, and the rotation of the sucker table is not hindered by the tube.

[先行技術文獻] [Advanced technical literature] [專利文獻] [Patent Literature]

[專利文獻1]日本特開2015-036179號公報 [Patent Document 1] Japanese Patent Laid-Open No. 2015-036179

可是,在加工動作中,一旦吸盤台旋轉驅動,則隨著吸盤台的旋轉,在各管產生扭轉。一旦加工動作反覆而各管的扭轉被重複,則疲勞會被積蓄於各管而劣化,且管的接頭部分會破損而破片堆積於吸盤台機構內。因此,對於操作員而言,會有管的更換作業或清掃作業煩瑣,須長時間的維修之問題。 However, in the machining operation, once the chuck table is rotationally driven, the tube is twisted as the chuck table is rotated. Once the machining operation is repeated and the twisting of each tube is repeated, fatigue is accumulated in each tube and deteriorates, and the joint portion of the tube is damaged and fragments are accumulated in the sucker table mechanism. Therefore, for the operator, there is a problem that the replacement work or cleaning work of the tube is cumbersome and requires long-term maintenance.

本發明是有鑑於該點而研發者,以提供一種不使用管,可旋轉且可吸引地支撐吸盤台的同時,可縮短維修時間之吸盤台機構作為目的之一。 The present invention has been developed in view of this point, and it is an object of the present invention to provide a suction cup table mechanism that can rotate and attractably support a suction cup table without using a tube, and can shorten the maintenance time.

本發明之一形態的吸盤台機構,係將吸盤台安裝於上部,且可旋轉地支撐,該吸盤台係將被加工物吸引保持於上面,其特徵為具備:固定基台,其係連通至外部吸引源的連通路徑會被形成於內部;及旋轉手段,其係可旋轉地配設於該固定基台的上方,在上部安裝吸盤台, 該旋轉手段係具備:旋轉基台,其係可旋轉地配設於該固定基台上方;及插入部,其係構成為於旋轉中心對該旋轉基台裝卸自如地固定且可插入至該固定基台,該插入部係具備:卡合端部,其係傳達吸引力至該吸盤台上面的吸引路徑會被形成於內部,卡合於該固定基台的卡合凹部,一旦該卡合端部卡合於該卡合凹部,則在該卡合端部的外周壁與該固定基台的該卡合凹部的內壁之間以密封環來密封,且該連通路徑與該吸引路徑會被連結。 A suction cup table mechanism according to one aspect of the present invention is a suction cup table which is mounted on the upper part and rotatably supported. The suction cup table sucks and holds a workpiece to be processed and is characterized by having a fixed base which is connected to The communication path of the external attraction source will be formed inside; and a rotating means, which is rotatably arranged above the fixed base, and a suction cup table is installed on the upper part. The rotating means includes: a rotating base, which is rotatably disposed above the fixed base; and an inserting portion, which is configured to be detachably fixed to the rotating base at a rotation center and can be inserted into the fixing. The abutment, the insertion portion is provided with: an engaging end portion, which is formed to internally attract the suction path to the upper surface of the suction cup table, and is engaged with the engaging recess of the fixed abutment table. Parts are engaged with the engaging recesses, a seal ring is used to seal between an outer peripheral wall of the engaging ends and an inner wall of the engaging recesses of the fixed base, and the communication path and the suction path are sealed by link.

若根據此構成,則旋轉手段會可旋轉地被配設於固定基台的同時,被設於旋轉手段的插入部會插入至固定基台,而插入部的吸引路徑與固定基台的連通路徑會被連通。藉此,來自外部吸引源的吸引力會通過固定基台的連通路徑及插入部的吸引路徑來賦予吸盤台。並且,插入部的卡合端部會被卡合於固定基台的卡合凹部,卡合端部的外周壁與卡合凹部的內壁之間會以密封環來氣密地密封。因此,可不使發生空氣洩漏,可旋轉且可吸引地支撐吸盤台。並且,藉由插入部的吸引路徑及固定基台的連通路徑來形成1條的路徑,因此可減少路徑內的壓力損失而謀求吸引力的提升。而且,藉由從旋轉手段的旋轉基台卸下插入部,從固定基台的卡合凹部拔出插入部的卡合端部之簡易的作業,可由上方容易地更換密封環,可大幅度縮短維修時間。 According to this configuration, while the rotation means is rotatably arranged on the fixed base, the insertion portion provided on the rotation means is inserted into the fixed base, and the suction path of the insertion portion and the communication path of the fixed base Will be connected. Thereby, the attraction | suction by an external attraction | suction source is given to a chuck table via the communication path of a fixed base, and the attraction | suction path of an insertion part. In addition, the engagement end portion of the insertion portion is engaged with the engagement recess portion of the fixed base, and the outer peripheral wall of the engagement end portion and the inner wall of the engagement recess portion are hermetically sealed with a seal ring. Therefore, it is possible to support the chuck table in a rotatable and attractive manner without causing air leakage. In addition, since a single path is formed by the suction path of the insertion portion and the communication path of the fixed base, the pressure loss in the path can be reduced and the attractive force can be improved. In addition, the simple operation of removing the insertion portion from the rotating base of the rotating means and pulling out the engagement end portion of the insertion portion from the engagement recess of the fixed base can easily replace the seal ring from above, which can greatly shorten Repair time.

並且,在本發明之一形態的吸盤台機構中,該旋轉手段是在該固定基台以軸承來保持,在該固定基台是具備使該旋轉手段旋轉的旋轉馬達。 In the chuck table mechanism according to an aspect of the present invention, the rotation means is held by the fixed base with a bearing, and the fixed base is provided with a rotation motor that rotates the rotation means.

若根據本發明,則可不使用管,可旋轉且可吸引地支撐吸盤台。並且,以卸下插入部的簡易作業,可由上方容易更換密封環,因此可大幅度縮短密封環的更換作業所要的維修時間。 According to the present invention, the suction cup table can be supported in a rotatable and attractive manner without using a tube. In addition, since the seal ring can be easily replaced from above by a simple operation of removing the insertion portion, the maintenance time required for the replacement operation of the seal ring can be greatly reduced.

40‧‧‧吸盤台 40‧‧‧ Suction table

41‧‧‧保持面 41‧‧‧ keep face

50‧‧‧吸盤台機構 50‧‧‧ Suction table mechanism

51‧‧‧旋轉手段 51‧‧‧ Rotation means

52‧‧‧固定基台 52‧‧‧ fixed abutment

54‧‧‧旋轉基台 54‧‧‧ Rotary Abutment

55‧‧‧插入部 55‧‧‧ Insertion

57‧‧‧軸承 57‧‧‧bearing

72‧‧‧插入部的卡合端部 72‧‧‧ Engagement end of insertion part

73‧‧‧固定基台的卡合凹部 73‧‧‧ Engagement recess of fixed abutment

78‧‧‧環狀溝 78‧‧‧Circular groove

84‧‧‧密封環 84‧‧‧Sealing ring

91‧‧‧旋轉馬達 91‧‧‧rotating motor

94‧‧‧外部吸引源 94‧‧‧ External Attraction Source

95‧‧‧吸引路徑 95‧‧‧ Attraction Path

97‧‧‧連通路徑 97‧‧‧ Connected Path

W‧‧‧被加工物 W‧‧‧Processed

圖1是本實施形態的切削裝置的立體圖。 FIG. 1 is a perspective view of a cutting device according to this embodiment.

圖2是比較例的吸盤台機構的剖面模式圖。 Fig. 2 is a schematic cross-sectional view of a chuck table mechanism of a comparative example.

圖3是本實施形態的吸盤台機構的剖面模式圖。 Fig. 3 is a schematic cross-sectional view of a chuck table mechanism according to the present embodiment.

圖4是本實施形態的密封環的更換作業的說明圖。 FIG. 4 is an explanatory diagram of the replacement operation of the seal ring of the present embodiment.

以下,參照附圖來說明有關具備本實施形態的吸盤台機構之切削裝置。圖1是本實施形態的切削裝置的立體圖。圖2是比較例的吸盤台機構的剖面模式圖。另外,在以下的說明中,舉例說明在切削裝置具備吸盤台機構的構成,但並非限於此構成。吸盤台機構是例如亦可在雷射加工裝置或研削裝置等的其他的加工裝置中具備。 Hereinafter, a cutting device having a chuck table mechanism according to this embodiment will be described with reference to the drawings. FIG. 1 is a perspective view of a cutting device according to this embodiment. Fig. 2 is a schematic cross-sectional view of a chuck table mechanism of a comparative example. In the following description, a configuration in which the cutting device includes a chuck table mechanism is exemplified, but the configuration is not limited to this. The chuck table mechanism may be provided in, for example, another processing device such as a laser processing device or a grinding device.

如圖1所示般,切削裝置1是構成以切削刀26來切削吸盤台40上的被加工物W,分割成各個的裝置晶片。被加工物W是長方形狀的封裝基板,基板表面是以格子狀的切道來區劃,在以切道所區劃的各領域中形成有各種裝置。另外,被加工物W是不限於CSP(Chip Size Package)基板、晶圓水準CSP(Wafer Level Chip Size Package)基板等的小型的封裝基板,亦可為尺寸比CSP基板等更大的封裝基板。 As shown in FIG. 1, the cutting device 1 is configured to cut a workpiece W on a chuck table 40 with a cutting blade 26 and divide it into individual device wafers. The object to be processed W is a rectangular package substrate, and the surface of the substrate is divided by a grid-like tangent, and various devices are formed in each area divided by the scribe. The processed object W is not limited to a small package substrate such as a CSP (Chip Size Package) substrate and a wafer level chip size package (CSP) substrate, and may be a package substrate having a larger size than a CSP substrate.

在切削裝置1的機殼10的上面是形成有延伸於X軸方向的矩形狀的開口,此開口是藉由可與吸盤台40一起移動的移動板11及蛇腹狀的防水罩12所被覆。在防水罩12的下方是設有使吸盤台40移動於X軸方向之未圖示的滾珠螺桿式的移動機構。在吸盤台40的表面是形成有藉由多數的吸引口來吸引保持被加工物W的保持面41。保持面41是經由吸盤台40內的流體路徑來連接至吸引源,藉由產生於保持面41的負壓來吸引保持被加工物W。 A rectangular opening extending in the X-axis direction is formed on the upper surface of the housing 10 of the cutting device 1, and this opening is covered by a moving plate 11 and a bellows-shaped waterproof cover 12 that can be moved together with the chuck table 40. Below the waterproof cover 12 is provided a ball screw type moving mechanism (not shown) that moves the chuck table 40 in the X-axis direction. A holding surface 41 is formed on the surface of the chuck table 40 to suck and hold the workpiece W by a plurality of suction openings. The holding surface 41 is connected to a suction source via a fluid path in the chuck table 40, and sucks and holds the workpiece W by a negative pressure generated on the holding surface 41.

吸盤台40是在裝置中央的交接位置與面對切削手段24的加工位置之間往復移動。圖1是表示吸盤台40在交接位置待機的狀態。在機殼10中,與此交接位置鄰接的一個角部會下降一段,載置台14可昇降地設於下降之處。在載置台14載置有收容被加工物W的卡匣C。在載置卡匣C的狀態下,藉由載置台14昇降,於高度方向調整被加工物W的抽出位置及推進位置。 The chuck table 40 reciprocates between a transfer position in the center of the apparatus and a processing position facing the cutting means 24. FIG. 1 shows a state in which the chuck table 40 stands by at the transfer position. In the cabinet 10, a corner portion adjacent to the transfer position is lowered by one section, and the mounting table 14 is provided at the lowering position so as to be able to be raised and lowered. A cassette C that houses the workpiece W is placed on the mounting table 14. In the state where the cassette C is placed, the extraction position and the advance position of the workpiece W are adjusted in the height direction by raising and lowering the placement table 14.

在載置台14的後方是設有:平行於Y軸方向的一對的定心器(centering guide)15,及在一對的定心器15與卡匣C之間存取被加工物W的推輓(push-pull)機構16。藉由一對的定心器15來引導推輓機構16之被加工物W的存取,且定位被加工物W的X軸方向。並且,藉由推輓機構16來從卡匣C抽出加工前的被加工物W至一對的定心器15以外,還從一對的定心器15將加工完了的被加工物W推進卡匣C。 A pair of centering guides 15 parallel to the Y-axis direction are provided behind the mounting table 14, and a workpiece W is accessed between the pair of centerers 15 and the cassette C. Push-pull mechanism 16. The pair of centerers 15 guides the access of the workpiece W of the push-pull mechanism 16 and positions the workpiece W in the X-axis direction. In addition, the push-pull mechanism 16 is used to extract the processed object W before processing from the cassette C to the pair of centerers 15, and the processed object W is further pushed into the card from the pair of centerers 15. Box C.

在一對的定心器15的附近是設有在定心器15與吸盤台40之間搬送被加工物W的第1搬送臂17。藉由第1搬送臂17的旋回,以L字狀的臂部18的前端的搬送墊19來搬送被加工物W。並且,在交接位置的吸盤台40的後方設有旋轉器洗淨機構21。旋轉器洗淨機構21是朝旋轉中的旋轉器台22噴射洗淨水來洗淨被加工物W之後,取代洗淨水,噴上乾燥空氣來乾燥被加工物W。 Near the pair of centerers 15 is a first transfer arm 17 for transferring a workpiece W between the centerers 15 and the chuck table 40. The workpiece W is conveyed by the rotation of the first conveying arm 17 with the conveying pad 19 at the tip of the L-shaped arm portion 18. A spinner washing mechanism 21 is provided behind the suction cup table 40 at the transfer position. The spinner washing mechanism 21 sprays washing water on the rotating spinner stage 22 to wash the workpiece W, and then replaces the washing water with spraying dry air to dry the workpiece W.

在機殼10上是設有用以支撐具備切削刀26的切削手段24之支撐台28。切削手段24是在被支撐台28支撐的主軸的前端安裝切削刀26來構成。切削刀26是例如以接合劑來固定鑽石砥粒而形成圓板狀。並且,切削手段24是連結用以使切削刀26移動於Y軸方向及Z軸方向之未圖示的移動機構。切削手段24是從複數的噴射噴嘴噴射洗淨液,使高速旋轉的切削刀26會對於吸盤台40相對移動,藉此切削被加工物W。 The housing 10 is provided with a support base 28 for supporting a cutting means 24 including a cutting blade 26. The cutting means 24 is configured by attaching a cutting blade 26 to the tip of a main shaft supported by a support table 28. The cutting blade 26 is formed into a disc shape by fixing a diamond grain with a bonding agent, for example. The cutting means 24 is a movement mechanism (not shown) that connects the cutting blade 26 in the Y-axis direction and the Z-axis direction. The cutting means 24 sprays the cleaning liquid from a plurality of spray nozzles, and relatively moves the cutting blade 26 rotating at a high speed relative to the chuck table 40, thereby cutting the workpiece W.

在支撐台28的側面29是設有用以在吸盤台 40與旋轉器洗淨機構21之間搬送被加工物W的第2搬送臂31。藉由第2搬送臂31的進退移動,以從支撐台28的側面29傾斜延伸至前方的臂部32的前端的搬送墊33來搬送被加工物W。並且,在支撐台28是設有橫過吸盤台40的移動路徑的上方之伸臂支撐部35,在伸臂支撐部35是攝取被加工物W的攝像部36會被支撐。攝像部36之攝像畫像是被利用在切削手段24與吸盤台40的對準。並且,在支撐台28上是載有顯示加工條件等的監視器37。 On the side 29 of the support table 28 is provided a The second conveying arm 31 that conveys the workpiece W between the 40 and the spinner washing mechanism 21. The workpiece W is transported by the forward and backward movement of the second transport arm 31 with a transport pad 33 that extends obliquely from the side surface 29 of the support base 28 to the front end of the front arm portion 32. Further, the support table 28 is provided with an outrigger support portion 35 that traverses the movement path of the chuck table 40, and the outrigger support portion 35 is an image pickup portion 36 that picks up the object W to be supported. The imaging image of the imaging unit 36 is used for the alignment of the cutting means 24 and the chuck table 40. Further, a monitor 37 that displays processing conditions and the like is mounted on the support table 28.

在機殼10內是收容有只使吸盤台40露出於機殼10上的吸盤台機構50(參照圖3)。吸盤台機構50是藉由使吸盤台40旋轉來將切削刀26定位於正交的切道,且使用以保持被加工物W的負壓作用於吸盤台40的保持面41。因此,在吸盤台機構50是採用旋轉接頭構造,其係對於形成有流體路徑的固定基台,一邊抑制空氣的洩漏,一邊可旋轉地接合吸盤台40。 A suction cup table mechanism 50 (see FIG. 3) is provided in the cabinet 10 so that only the suction cup table 40 is exposed on the cabinet 10. The chuck table mechanism 50 rotates the chuck table 40 to position the cutting blade 26 at an orthogonal tangent path, and is used to hold the negative pressure of the workpiece W on the holding surface 41 of the chuck table 40. Therefore, the chuck table mechanism 50 has a rotary joint structure, and is configured to rotatably engage the chuck table 40 while suppressing air leakage to a fixed base on which a fluid path is formed.

可是,如圖2的比較例所示般,一般性的吸盤台機構100是利用複數的管105來實現旋轉接頭構造。比較例的吸盤台機構100的旋轉接頭構造是支撐吸盤台101的旋轉基台102會被設設成包圍圓筒形狀的固定基台103。在旋轉基台102的中央部分是設置有多接頭104,該多接頭104是連結有複數的管105,各管105是從多接頭104通過固定基台103的內部來連接至外部吸引源(未圖示)。然後,來自外部吸引源的吸引力會經由管105來 賦予吸盤台101的保持面107。 However, as shown in the comparative example of FIG. 2, the general chuck table mechanism 100 uses a plurality of tubes 105 to realize a rotary joint structure. The rotary joint structure of the chuck table mechanism 100 of the comparative example is such that the rotation base 102 supporting the chuck table 101 is provided so as to surround the fixed base 103 having a cylindrical shape. A multi-joint 104 is provided in the center portion of the rotary base 102. The multi-joint 104 is a plurality of tubes 105 connected to each other. Each of the tubes 105 is connected from the multi-joint 104 to an external attraction source (not shown) by fixing the inside of the base 103. Icon). Then, the attraction force from the external attraction source comes through the tube 105. The holding surface 107 of the chuck table 101 is provided.

然而,在此吸盤台機構100中,管105會隨著吸盤台101的旋轉而扭轉,因此管105會經歷歲月劣化而破損,且多接頭104與管105的連結部分恐有破損之虞。此管105或多接頭104的破損所產生的破片會堆積於固定基台103內部,而有管105或多接頭104的更換作業及固定基台103內的清掃作業變煩瑣,須長時間的維修之問題。又,由於來自外部吸引力的吸引力會經由複數的管105來賦予吸盤台101的保持面107,因此在管105的壓力損失會變大而吸引力降低。 However, in this sucker table mechanism 100, the tube 105 is twisted with the rotation of the sucker table 101, so the tube 105 may be deteriorated and damaged over time, and the connection portion between the multi-joint 104 and the tube 105 may be damaged. Fragments generated by the damage of the tube 105 or the multi-joint 104 will accumulate inside the fixed base 103, and the replacement operation of the tube 105 or the multi-joint 104 and the cleaning operation in the fixed base 103 will be cumbersome and require long-term maintenance. problem. In addition, since the attraction force from the external attraction force is given to the holding surface 107 of the chuck table 101 via the plurality of tubes 105, the pressure loss in the tube 105 increases and the attraction force decreases.

於是,在本實施形態中,變更上述比較例的旋轉接頭構造,不使用複數的管105,可旋轉且可吸引地支撐吸盤台40。並且,藉由對於吸盤台機構50的一部分的零件之簡單的卸下作業,可容易更換機構內部的密封環84(參照圖3)等的消耗構件,可大幅度縮短維修時間。而且,以1條的路徑來連接吸盤台40與外部吸引源94(參照圖3),藉此減少流路內的壓力損失,提升吸引力。 Therefore, in the present embodiment, the rotary joint structure of the comparative example described above is changed, and instead of using a plurality of tubes 105, the chuck table 40 is rotatably and attractably supported. In addition, by simply removing a part of the parts of the chuck table mechanism 50, consumable members such as the seal ring 84 (see FIG. 3) inside the mechanism can be easily replaced, and maintenance time can be greatly reduced. In addition, the suction pad stage 40 and the external suction source 94 (see FIG. 3) are connected by a single path, thereby reducing pressure loss in the flow path and increasing suction power.

以下,說明有關本實施形態的吸盤台機構。圖3是本實施形態的吸盤台機構的剖面模式圖。另外,吸盤台機構是只要能夠藉由插入部的裝卸來從上方更換密封環即可,並不限於圖3所示的例子。例如,在以下的說明中雖是舉封裝基板用的吸盤台機構為例,但針對半導體晶圓或光裝置晶圓用的吸盤台機構也可形成同樣的構成。 The chuck table mechanism according to this embodiment will be described below. Fig. 3 is a schematic cross-sectional view of a chuck table mechanism according to the present embodiment. In addition, the chuck table mechanism is not limited to the example shown in FIG. 3 as long as the seal ring can be replaced from above by attaching and detaching the insertion portion. For example, although the chuck table mechanism for a package substrate is taken as an example in the following description, the same configuration can be adopted for a chuck table mechanism for a semiconductor wafer or an optical device wafer.

如圖3所示般,吸盤台機構50是在上部安裝吸盤台40而可旋轉地支撐,該吸盤台40是在上面吸引保持被加工物W,且在固定基台52的上方可旋轉地配設旋轉手段51,該旋轉手段51是在上部安裝吸盤台40。吸盤台40是形成在台座42的上面裝卸自如安裝台本體43的上下分割構造。台本體43是在形成有多數的吸引口44的上段部分的周圍,被固定於台座42的下段部分會被形成凸緣狀。在台本體43的上段部分是藉由多數的吸引口44來形成保持面41,在台本體43的下段部分是形成有螺栓45用的安裝孔46(參照圖4A)。 As shown in FIG. 3, the chuck table mechanism 50 is rotatably supported by mounting a chuck table 40 on the upper portion. The chuck table 40 sucks and holds the workpiece W thereon, and is rotatably arranged above the fixed base 52. A rotation means 51 is provided. The rotation means 51 is provided with a chuck table 40 mounted on the upper part. The chuck table 40 has an upper and lower divided structure formed on the upper surface of the pedestal 42 in a detachable mounting table body 43. The table body 43 is formed around the upper portion of the suction port 44, and the lower portion fixed to the table 42 is formed in a flange shape. In the upper portion of the table body 43, the holding surface 41 is formed by a plurality of suction openings 44. In the lower portion of the table body 43, a mounting hole 46 for a bolt 45 is formed (see FIG. 4A).

並且,台座42是被形成中央開口的環板狀,在對應於台本體43的安裝孔46(參照圖4A)之處形成有螺孔47(參照圖4A)。藉由對於台座42的螺孔47螺合從台本體43的安裝孔46突出的螺栓45的前端,台本體43會被裝卸自如地安裝於台座42。藉由在台座42安裝台本體43,形成使複數的吸引口44連通至旋轉手段51的吸引路徑95之連通室96。並且,在比台座42的螺孔47(參照圖4A)更靠徑方向內側形成有螺栓48用的安裝孔49(參照圖4B)。 In addition, the pedestal 42 is formed into a ring plate having a central opening, and a screw hole 47 (see FIG. 4A) is formed at a position corresponding to the mounting hole 46 (see FIG. 4A) of the table body 43. The front end of the bolt 45 protruding from the mounting hole 46 of the table body 43 is screwed into the screw hole 47 of the table 42, so that the table body 43 is detachably mounted on the table 42. By attaching the table body 43 to the pedestal 42, a communication chamber 96 is formed to communicate the plurality of suction ports 44 to the suction path 95 of the rotating means 51. Further, a mounting hole 49 (see FIG. 4B) for the bolt 48 is formed inward in the radial direction from the screw hole 47 (see FIG. 4A) of the pedestal 42.

旋轉手段51是在可旋轉地配設於固定基台52的上方之旋轉基台54以凸緣板56來連結可插入至固定基台52的插入部55而構成。旋轉基台54是以能夠覆蓋固定基台52的上方部分之方式形成大筒狀,經由設於旋轉基台54與固定基台52的對向面之軸承57來連結至固定 基台52。並且,在旋轉基台54的上面是形成有安裝吸盤台40的台安裝面61,在台安裝面61是在對應於台座42的安裝孔49(參照圖4B)之處形成有螺孔62(參照圖4B)。藉由對於旋轉基台54的螺孔62螺合從台座42的安裝孔49突出的螺栓48的前端,台座42會被裝卸自如地安裝於旋轉基台54的上部。 The rotation means 51 is configured by connecting an insertion portion 55 that can be inserted into the fixed base 52 with a flange plate 56 on a rotating base 54 that is rotatably disposed above the fixed base 52. The rotary base 54 is formed in a large cylindrical shape so as to cover the upper portion of the fixed base 52, and is connected to the fixed base via a bearing 57 provided on the opposite surface of the rotary base 54 and the fixed base 52. Abutment 52. In addition, on the upper surface of the rotary base 54 is a table mounting surface 61 on which the suction pad table 40 is mounted, and on the table mounting surface 61 is formed a screw hole 62 (see FIG. 4B) corresponding to the mounting hole 49 (see FIG. 4B) of the base 42. (See Figure 4B). The front end of the bolt 48 protruding from the mounting hole 49 of the pedestal 42 is screwed into the screw hole 62 of the rotary base 54, so that the pedestal 42 is detachably mounted on the upper portion of the rotary base 54.

在旋轉基台54的上面的徑方向內側,形成比台安裝面61更低一段的板安裝面63安裝有環板狀的凸緣板56。凸緣板56的徑方向外側會被連結至板安裝面63,凸緣板56的徑方向內側會被連結至圓筒形狀的插入部55的上端面。凸緣板56的厚度是與台安裝面61與板安裝面63的階差一致,台安裝面61與凸緣板56的上面會形成面一致。亦即,凸緣板56的上面也形成安裝吸盤台40的台安裝面的一部分。 A ring-shaped flange plate 56 is attached to a plate mounting surface 63 which is one step lower than the table mounting surface 61 on the radially inner side of the upper surface of the rotary base 54. The radial outer side of the flange plate 56 is connected to the plate mounting surface 63, and the radial inner side of the flange plate 56 is connected to the upper end surface of the cylindrical insertion portion 55. The thickness of the flange plate 56 is consistent with the step difference between the table mounting surface 61 and the plate mounting surface 63, and the surface of the table mounting surface 61 and the upper surface of the flange plate 56 are the same. That is, the upper surface of the flange plate 56 also forms a part of the table mounting surface on which the chuck table 40 is mounted.

在凸緣板56的徑方向外側是形成有螺栓64用的安裝孔65(參照圖4C),在板安裝面63是在對應於安裝孔65之處形成有螺孔69(參照圖4C)。藉由對於板安裝面63的螺孔69螺合從凸緣板56的安裝孔65突出的螺栓64的前端,凸緣板56會被裝卸自如地安裝於板安裝面63。並且,凸緣板56的徑方向內側是從台座42的中央的開口露出,在此台座42的露出部分形成有螺栓67用的安裝孔68。 A mounting hole 65 (see FIG. 4C) for the bolt 64 is formed outside the flange plate 56 in the radial direction, and a screw hole 69 (see FIG. 4C) is formed on the plate mounting surface 63 at a position corresponding to the mounting hole 65. The screw hole 69 of the plate mounting surface 63 is screwed to the front end of the bolt 64 protruding from the mounting hole 65 of the flange plate 56, so that the flange plate 56 is detachably mounted on the plate mounting surface 63. The radial inner side of the flange plate 56 is exposed from an opening in the center of the pedestal 42, and a mounting hole 68 for a bolt 67 is formed in the exposed portion of the pedestal 42.

插入部55是形成從凸緣板56朝固定基台52的連通路徑97延伸的圓筒形狀。在插入部55的內部是形 成有將來自固定基台52的連通路徑97之吸引力傳達至吸盤台40的上面之吸引路徑95。在插入部55的上端面是在對應於凸緣板56的安裝孔68(參照圖4C)之處形成有螺孔(未圖示)。藉由對於插入部55的螺孔螺合從凸緣板56的安裝孔68突出的螺栓67的前端,插入部55會被裝卸自如地安裝於凸緣板56。如此插入部55會經由凸緣板56來裝卸自如地固定於旋轉基台54的旋轉中心。 The insertion portion 55 is formed in a cylindrical shape extending from the flange plate 56 toward the communication path 97 of the fixed base 52. It is shaped inside the insertion part 55 A suction path 95 is formed to convey the attractive force of the communication path 97 from the fixed base 52 to the upper surface of the chuck table 40. A screw hole (not shown) is formed on the upper end surface of the insertion portion 55 at a position corresponding to the mounting hole 68 (see FIG. 4C) of the flange plate 56. The front end of the bolt 67 protruding from the mounting hole 68 of the flange plate 56 is screwed into the screw hole of the insertion portion 55, and the insertion portion 55 is detachably mounted on the flange plate 56. In this way, the insertion portion 55 is detachably fixed to the rotation center of the rotation base 54 via the flange plate 56.

在凸緣板56的上面、旋轉基台54的板安裝面63、插入部55的上端面是分別形成有環狀溝75、76、77(參照圖4C),且在各環狀溝75、76、77是安裝有密封環81、82、83。台座42會經由密封環81來密封於台安裝面61,凸緣板56會經由密封環82來密封於板安裝面63,插入部55的上端面會經由密封環83來密封於凸緣板56。藉此,不會有空氣從構件彼此間的接合面洩漏的情形,可抑制吸盤台40的吸引力的降低。 On the upper surface of the flange plate 56, the plate mounting surface 63 of the rotary base 54, and the upper end surface of the insertion portion 55, annular grooves 75, 76, and 77 are respectively formed (see FIG. 4C). 76 and 77 are seal rings 81, 82, and 83, respectively. The pedestal 42 is sealed to the table mounting surface 61 via a seal ring 81, the flange plate 56 is sealed to the plate mounting surface 63 via a seal ring 82, and the upper end surface of the insertion portion 55 is sealed to the flange plate 56 via a seal ring 83. . Thereby, there is no possibility that air leaks from the joint surfaces between the members, and it is possible to suppress a decrease in the attractive force of the chuck table 40.

在插入部55的下端是形成有進入固定基台52的連通路徑97內之卡合端部72。卡合端部72是藉由將插入部55的下端側的外周面縮徑而形成,被卡合於將固定基台52的連通路徑97的上端側擴徑後的卡合凹部73內。在卡合端部72的外周面是形成有環狀溝78,在環狀溝78中安裝有密封環84。一旦卡合端部72卡合於卡合凹部73,則卡合端部72的外周壁與卡合凹部73的內周壁之間會以密封環84來密封。藉此,不會有空氣從卡合端部72與卡合凹部73的接合面洩漏的情形,連通路徑 97與吸引路徑95會被氣密地連結。 At the lower end of the insertion portion 55 is an engagement end portion 72 formed into the communication path 97 of the fixed base 52. The engaging end portion 72 is formed by reducing the diameter of the outer peripheral surface of the lower end side of the insertion portion 55 and is engaged in the engaging recessed portion 73 which is enlarged in diameter at the upper end side of the communication path 97 of the fixed base 52. An annular groove 78 is formed on the outer peripheral surface of the engagement end portion 72, and a seal ring 84 is attached to the annular groove 78. Once the engaging end portion 72 is engaged with the engaging recessed portion 73, a seal ring 84 is sealed between the outer peripheral wall of the engaging end portion 72 and the inner peripheral wall of the engaging recessed portion 73. This prevents air from leaking from the joint surface of the engagement end 72 and the engagement recess 73, and the communication path 97 and the suction path 95 are hermetically connected.

並且,藉由從旋轉基台54卸下吸盤台40,從旋轉基台54及插入部55卸下凸緣板56,密封環81、82、83會被露出至外部。而且,藉由與凸緣板56一起將插入部55從旋轉基台54卸下,密封環84會被露出至外部。因此,不會有從固定基台52卸下旋轉手段51全體的情形,可容易只更換消耗品的密封環81、82、83、84。另外,在密封環81、82、83是使用固定用密封,在密封環84是使用運動用密封,但亦可皆使用O型環。 Further, by removing the chuck table 40 from the rotary base 54 and removing the flange plate 56 from the rotary base 54 and the insertion portion 55, the seal rings 81, 82, and 83 are exposed to the outside. Further, by removing the insertion portion 55 from the rotary base 54 together with the flange plate 56, the seal ring 84 is exposed to the outside. Therefore, there is no case where the entire rotation means 51 is removed from the fixed base 52, and only the consumable seal rings 81, 82, 83, and 84 can be easily replaced. In addition, in the seal rings 81, 82, and 83, a fixed seal is used, and in the seal ring 84, a sports seal is used. However, an O-ring may be used.

固定基台52是在下部基台86上設置上部基台87而構成,在上部基台87及下部基台86的內部形成有連通至外部吸引源94的連通路徑97。並且,固定基台52的連通路徑97是連通至插入部55的吸引路徑95,吸引路徑95是連通至吸盤台40內的連通室96。因為藉由連通路徑97與吸引路徑95來形成1條的路徑,所以不會有發生流路內的壓力損失的情形,可使來自外部吸引源94的吸引力賦予吸盤台40的保持面41。在上部基台87設有軸承57,旋轉基台54會藉由軸承57來可旋轉地保持於固定基台52。 The fixed base 52 is configured by providing an upper base 87 on the lower base 86, and a communication path 97 is formed inside the upper base 87 and the lower base 86 to communicate with an external suction source 94. The communication path 97 of the fixed base 52 is a suction path 95 connected to the insertion portion 55, and the suction path 95 is a communication chamber 96 connected to the inside of the chuck table 40. Since a single path is formed by the communication path 97 and the suction path 95, pressure loss in the flow path does not occur, and the suction force from the external suction source 94 can be given to the holding surface 41 of the chuck table 40. A bearing 57 is provided on the upper base 87, and the rotary base 54 is rotatably held on the fixed base 52 by the bearing 57.

並且,在旋轉基台54及固定基台52是設有使旋轉手段51旋轉的旋轉馬達91。旋轉馬達91是構成被連結至旋轉基台54的轉子93會旋轉於被固定在固定基台52的定子92的周圍。在定子92安裝有線圈巻線等,在轉子93是以能夠空出些微的間隙來與定子92對向的方 式設有複數的磁石。藉由定子92的線圈巻線通電,轉子93會以固定基台52為中心旋轉,被連結至轉子93的旋轉基台54及吸盤台40會一體被旋轉。 In addition, the rotary base 54 and the fixed base 52 are provided with a rotation motor 91 that rotates the rotation means 51. The rotation motor 91 is configured such that a rotor 93 connected to a rotation base 54 rotates around a stator 92 fixed to a fixed base 52. Coil wires and the like are mounted on the stator 92, and the rotor 93 is opposed to the stator 92 with a slight clearance There are plural magnets in the formula. When the coil 巻 of the stator 92 is energized, the rotor 93 rotates around the fixed base 52, and the rotating base 54 and the chuck stage 40 connected to the rotor 93 are rotated integrally.

如此,吸盤台機構50的旋轉接頭是可旋轉地支撐吸盤台40,且不會有使空氣洩漏的情形,可將來自外部吸引源94的吸引力賦予吸盤台40的保持面41。又,由於插入部55的卡合端部72與固定基台52的卡合凹部73會經由密封環84來滑動,因此此滑動處的密封環84特別容易劣化。但,由於插入部55被裝卸自如地安裝於旋轉基台54,因此藉由從旋轉基台54卸下插入部55,可容易更換密封環84。 In this way, the rotary joint of the chuck table mechanism 50 rotatably supports the chuck table 40 without leaking air. The suction force from the external suction source 94 can be given to the holding surface 41 of the chuck table 40. In addition, since the engaging end portion 72 of the insertion portion 55 and the engaging recessed portion 73 of the fixed base 52 slide through the seal ring 84, the seal ring 84 at the sliding portion is particularly liable to deteriorate. However, since the insertion portion 55 is detachably attached to the rotating base 54, the sealing ring 84 can be easily replaced by removing the insertion portion 55 from the rotating base 54.

參照圖4來說明有關密封環的更換作業。圖4是本實施形態的密封環的更換作業的說明圖。另外,圖4A是表示台本體的卸下作業,圖4B是表示台座的卸下作業,圖4C是表示凸緣板及插入部的卸下作業。另外,在以下的說明中是說明有關被設在旋轉手段的卡合端部與固定基台的卡合凹部之間的密封環的更換作業。 The replacement operation of the seal ring will be described with reference to FIG. 4. FIG. 4 is an explanatory diagram of the replacement operation of the seal ring of the present embodiment. In addition, FIG. 4A shows the detaching operation of the table body, FIG. 4B shows the detaching operation of the pedestal, and FIG. 4C shows the detaching operation of the flange plate and the insertion portion. In the following description, the replacement operation of the seal ring provided between the engaging end portion of the rotating means and the engaging recessed portion of the fixed base will be described.

如圖4A所示般,在密封環84(參照圖4C)的更換作業中,首先藉由操作員來緩和台本體43的外周部分的各螺栓45,從台座42的上面卸下台本體43。藉此,躲在台本體43的內側之台座42用的螺栓48會露出至外部。其次,如圖4B所示般,藉由操作員來緩和台座42的各螺栓48,從旋轉基台54的台安裝面61卸下台座42。藉此,躲在台座42的背面側之凸緣板56用的螺栓 64會露出至外部,且被安裝於凸緣板56的上面的環狀溝75之密封環81會露出至外部。 As shown in FIG. 4A, in the replacement operation of the seal ring 84 (see FIG. 4C), first, the operator loosens the bolts 45 on the outer peripheral portion of the stage body 43, and removes the stage body 43 from the upper surface of the stage 42. As a result, the bolts 48 for the stand 42 hidden inside the stand body 43 are exposed to the outside. Next, as shown in FIG. 4B, the bolts 48 of the pedestal 42 are relaxed by the operator, and the pedestal 42 is removed from the pedestal mounting surface 61 of the rotary base 54. Thereby, the bolt for the flange plate 56 hiding on the back side of the pedestal 42 64 is exposed to the outside, and the seal ring 81 of the annular groove 75 attached to the upper surface of the flange plate 56 is exposed to the outside.

其次,如圖4C所示般,藉由操作員來緩和凸緣板56的徑方向外側的各螺栓64,從旋轉基台54的板安裝面63卸下凸緣板56,被固定於凸緣板56的插入部55會從固定基台52拔出。藉此,被安裝於板安裝面63的環狀溝76之密封環82會露出至外部,被安裝於插入部55的卡合端部72的環狀溝78之密封環84會露出至外部。然後,環狀溝78內的劣化後的密封環84卸下,新的密封環84安裝後,以和上述的卸下動作相反的順序來安裝凸緣板56、台座42、台本體43。 Next, as shown in FIG. 4C, the operator loosens the bolts 64 on the radially outer side of the flange plate 56, removes the flange plate 56 from the plate mounting surface 63 of the rotary base 54, and fixes the flange plate 56 to the flange. The insertion portion 55 of the plate 56 is pulled out from the fixed base 52. Thereby, the seal ring 82 of the annular groove 76 attached to the board mounting surface 63 is exposed to the outside, and the seal ring 84 of the annular groove 78 attached to the engaging end portion 72 of the insertion portion 55 is exposed to the outside. Then, the degraded seal ring 84 in the annular groove 78 is removed, and after the new seal ring 84 is installed, the flange plate 56, the pedestal 42, and the table body 43 are attached in the reverse order of the removal operation described above.

另外,在密封環84的更換作業時,亦可更換凸緣板56的上面的環狀溝75的密封環81、板安裝面63的環狀溝76的密封環82。並且,在圖4中是插入部55會被固定於凸緣板56,但亦可從凸緣板56卸下插入部55,更換被安裝於插入部55的上端面的環狀溝77之密封環83。 In addition, during the replacement operation of the seal ring 84, the seal ring 81 of the annular groove 75 on the upper surface of the flange plate 56 and the seal ring 82 of the annular groove 76 on the plate mounting surface 63 may be replaced. In addition, in FIG. 4, the insertion portion 55 is fixed to the flange plate 56. However, the insertion portion 55 may be removed from the flange plate 56 and the seal of the annular groove 77 attached to the upper end surface of the insertion portion 55 may be replaced. Ring 83.

如以上般,本實施形態的吸盤台機構50是旋轉手段51可旋轉地被配設於固定基台52,且被設在旋轉手段51的插入部55會被插入至固定基台52,而插入部55的吸引路徑95與固定基台52的連通路徑97會被連通。藉此,來自外部吸引源94的吸引力會經由固定基台52的連通路徑97及插入部55的吸引路徑95來賦予吸盤台40。並且,插入部55的卡合端部72會被卡合於固定 基台52的卡合凹部73,卡合端部72的外周壁與卡合凹部73的內壁之間會以密封環84來氣密地密封。因此,不會有發生空氣洩漏的情形,可旋轉且可吸引地支撐吸盤台40。並且,因為藉由插入部55的吸引路徑95及固定基台52的連通路徑97來形成1條的路徑,所以可減少在路徑內的壓力損失來謀求吸引力的提升。而且,藉由從旋轉手段51的旋轉基台54卸下插入部55,從固定基台52的卡合凹部73拔出插入部55的卡合端部72之簡易的作業,可容易從上方更換密封環84,可大幅度縮短維修時間。 As described above, the chuck table mechanism 50 of this embodiment is the rotation means 51 rotatably disposed on the fixed base 52, and the insertion portion 55 provided on the rotation means 51 is inserted into the fixed base 52 and inserted. The suction path 95 of the portion 55 and the communication path 97 of the fixed base 52 are communicated. As a result, the suction force from the external suction source 94 is given to the chuck table 40 via the communication path 97 of the fixed base 52 and the suction path 95 of the insertion portion 55. Then, the engaging end portion 72 of the insertion portion 55 is engaged with the fixing portion. The engagement recess 73 of the base 52, the outer peripheral wall of the engagement end 72, and the inner wall of the engagement recess 73 are hermetically sealed with a seal ring 84. Therefore, there is no possibility of air leakage, and the chuck table 40 is rotatably and attractably supported. In addition, since a single path is formed by the suction path 95 of the insertion portion 55 and the communication path 97 of the fixed base 52, the pressure loss in the path can be reduced to improve the attractive force. Furthermore, the simple operation of removing the insertion portion 55 from the rotation base 54 of the rotation means 51 and pulling out the engagement end portion 72 of the insertion portion 55 from the engagement recess 73 of the fixed base 52 can be easily replaced from above. The seal ring 84 can greatly shorten the maintenance time.

另外,上述的實施形態中,在吸盤台40的保持面41形成有多數的吸引口44,但並非限於此構成。吸盤台40的保持面41是亦可以多孔陶瓷來形成多孔質。並且,吸盤台40為將台本體43裝卸自如地安裝於台座42的構成,但台座42與台本體43是亦可一體形成。 In the above-mentioned embodiment, the suction surface 44 is formed in the holding surface 41 of the chuck table 40 in a large number, but the structure is not limited to this. The holding surface 41 of the chuck table 40 may be made of porous ceramics. In addition, the chuck table 40 has a structure in which the table body 43 is detachably attached to the table 42, but the table 42 and the table body 43 may be integrally formed.

又,上述的實施形態中,舉電磁式馬達作為旋轉馬達91進行說明,但並非限於此構成。亦可使用靜電式馬達或超音波式馬達作為旋轉馬達91。 In the above-mentioned embodiment, an electromagnetic motor is used as the rotation motor 91 for description, but the configuration is not limited to this. An electrostatic motor or an ultrasonic motor may be used as the rotation motor 91.

又,上述的實施形態中,凸緣板56會被螺絲固定於旋轉基台54,插入部55會被螺絲固定於凸緣板56,藉此形成插入部55會經由凸緣板56來固定於旋轉基台54的構成,但不限於此構成。插入部55是只要對於旋轉基台54裝卸自如固定即可,對於旋轉基台54怎麼樣固定皆可。 In the above-mentioned embodiment, the flange plate 56 is fixed to the rotary base 54 by screws, and the insertion portion 55 is fixed to the flange plate 56 by screws, thereby forming the insertion portion 55 to be fixed to the flange plate 56 via the flange plate 56. The configuration of the rotary base 54 is not limited to this configuration. The insertion portion 55 may be detachably fixed to the rotary base 54, and may be fixed to the rotary base 54 in any manner.

又,上述的實施形態中,外部吸引源94是只 要能夠經由固定基台52的連通路徑97來將吸引力賦予吸盤台40的保持面41即可,例如亦可以吸引泵或排出器(ejector)來構成。 In the above embodiment, the external attraction source 94 is only It suffices that the suction surface can be imparted to the holding surface 41 of the chuck table 40 via the communication path 97 of the fixed base 52. For example, it may be configured by a suction pump or an ejector.

又,上述的實施形態中,舉封裝基板作為被加工物W,但被加工物W是只要成為加工對象的工件即可,亦可為半導體晶圓或光裝置晶圓。 In the above-mentioned embodiment, the package substrate is used as the workpiece W. The workpiece W may be a workpiece to be processed, and may be a semiconductor wafer or an optical device wafer.

又,上述的實施形態中,形成密封環84會被安裝於在插入部55的卡合端部72的外側面所形成的環狀溝78之構成,但並非限於此構成。密封環84是只要能夠密封卡合凹部73的內周壁與卡合端部72的外周壁之間即可。如圖3所示般,卡合凹部73的上側的開口端凹陷成為階狀,卡合端部72的階部72a會進入此階狀的凹陷73a,但卡合凹部73的階狀的凹陷73a與卡合端部72的階部72a之間亦可以密封環來密封。此情況,亦可在卡合凹部73的階狀的凹陷73a的底面形成安裝密封環的環狀溝,使密封環能夠以卡合凹部73及卡合端部72來從上下方向夾入。即使是如此的構成,也可藉由從旋轉基台54卸下插入部55來使密封環露出至外部。 In the above-mentioned embodiment, the configuration in which the seal ring 84 is formed to be attached to the annular groove 78 formed on the outer side surface of the engagement end portion 72 of the insertion portion 55 is not limited to this configuration. The seal ring 84 is only required to be able to seal the space between the inner peripheral wall of the engaging recessed portion 73 and the outer peripheral wall of the engaging end portion 72. As shown in FIG. 3, the upper open end of the engagement recess 73 is recessed into a step shape, and the step 72a of the engagement end portion 72 enters this step recess 73a. However, the step recess 73a of the engagement recess 73 is recessed. A seal ring may be used to seal the stepped portion 72 a of the engaging end portion 72. In this case, an annular groove for mounting a seal ring may be formed on the bottom surface of the stepped recess 73 a of the engagement recess 73 so that the seal ring can be sandwiched by the engagement recess 73 and the engagement end 72 from the up-down direction. Even with such a configuration, the seal ring can be exposed to the outside by removing the insertion portion 55 from the rotary base 54.

又,雖說明本發明的實施形態及變形例,但本發明的其他的實施形態,亦可全體的或部分地組合上述實施形態及變形例。 In addition, although the embodiments and modifications of the present invention are described, other embodiments of the present invention may be combined with the above-mentioned embodiments and modifications in whole or in part.

又,本發明的實施形態是不限於上述的各實施形態,亦可在不脫離本發明的技術思想的主旨的範圍中實施各種變更、置換、變形。只要能夠藉由技術的進步或 衍生的別的技術,以別的做法來實現本發明的技術思想,亦可使用該方法來實施。因此,申請專利範圍是覆蓋本發明的技術思想的範圍內所含的全部的實施形態。 In addition, the embodiments of the present invention are not limited to the above-described embodiments, and various changes, substitutions, and modifications may be made without departing from the spirit of the technical idea of the present invention. As long as it can be improved by technology or Derived other technologies can be implemented using other methods to implement the technical idea of the present invention. Therefore, the scope of patent application is all embodiments covered by the scope of the technical idea of the present invention.

又,本發明的實施形態中,雖是說明有關將本發明適用於吸盤台機構的構成,但亦可適用於可旋轉且可吸引吸盤台的旋轉接頭構造。 In addition, in the embodiment of the present invention, the configuration in which the present invention is applied to a chuck table mechanism has been described, but it can also be applied to a rotary joint structure that can rotate and attract the chuck table.

[產業上的利用可能性] [Industrial availability]

如以上說明般,本發明是具有不使用管,可旋轉且可吸引地支撐吸盤台的同時,可縮短維修時間之效果,特別是對於封裝基板用的吸盤台機構有用。 As described above, the present invention has the effect of reducing the maintenance time while supporting the chuck table in a rotatable and attractive manner without using a tube, and is particularly useful for a chuck table mechanism for a package substrate.

40‧‧‧吸盤台 40‧‧‧ Suction table

41‧‧‧保持面 41‧‧‧ keep face

42‧‧‧台座 42‧‧‧ pedestal

43‧‧‧台本體 43‧‧‧units

44‧‧‧吸引口 44‧‧‧ Attraction

45‧‧‧螺栓 45‧‧‧ Bolt

48‧‧‧螺栓 48‧‧‧ Bolt

50‧‧‧吸盤台機構 50‧‧‧ Suction table mechanism

51‧‧‧旋轉手段 51‧‧‧ Rotation means

52‧‧‧固定基台 52‧‧‧ fixed abutment

54‧‧‧旋轉基台 54‧‧‧ Rotary Abutment

55‧‧‧插入部 55‧‧‧ Insertion

56‧‧‧凸緣板 56‧‧‧ flange plate

57‧‧‧軸承 57‧‧‧bearing

61‧‧‧台安裝面 61‧‧‧mounting surface

63‧‧‧板安裝面 63‧‧‧Board mounting surface

64‧‧‧螺栓 64‧‧‧ Bolt

67‧‧‧螺栓 67‧‧‧Bolt

72‧‧‧插入部的卡合端部 72‧‧‧ Engagement end of insertion part

72a‧‧‧階部 72a‧‧‧stage

73a‧‧‧階狀的凹陷 73a‧‧‧step depression

73‧‧‧固定機台的卡合凹部 73‧‧‧ Engagement recess of fixed machine

78‧‧‧環狀溝 78‧‧‧Circular groove

81‧‧‧密封環 81‧‧‧sealing ring

82‧‧‧密封環 82‧‧‧sealing ring

83‧‧‧密封環 83‧‧‧Sealing ring

84‧‧‧密封環 84‧‧‧Sealing ring

86‧‧‧下部基台 86‧‧‧Lower abutment

87‧‧‧上部基台 87‧‧‧upper abutment

91‧‧‧旋轉馬達 91‧‧‧rotating motor

92‧‧‧定子 92‧‧‧ Stator

93‧‧‧轉子 93‧‧‧rotor

94‧‧‧外部吸引源 94‧‧‧ External Attraction Source

95‧‧‧吸引路徑 95‧‧‧ Attraction Path

96‧‧‧連通室 96‧‧‧ connecting room

97‧‧‧連通路徑 97‧‧‧ Connected Path

W‧‧‧被加工物 W‧‧‧Processed

Claims (2)

一種吸盤台機構,係將吸盤台安裝於上部,且可旋轉地支撐,該吸盤台係將被加工物吸引保持於上面,其特徵為具備:固定基台,其係連通至外部吸引源的連通路徑會被形成於內部;及旋轉手段,其係可旋轉地配設於該固定基台的上方,在上部安裝吸盤台,該旋轉手段係具備:旋轉基台,其係可旋轉地配設於該固定基台上方;及插入部,其係構成為於旋轉中心對該旋轉基台裝卸自如地固定且可插入至該固定基台,該插入部係具備:卡合端部,其係傳達吸引力至該吸盤台上面的吸引路徑會被形成於內部,卡合於該固定基台的卡合凹部,一旦該卡合端部卡合於該卡合凹部,則在該卡合端部的外周壁與該固定基台的該卡合凹部的內壁之間以密封環來密封,且該連通路徑與該吸引路徑會被連結。 A chuck table mechanism is mounted on an upper part and rotatably supported. The chuck table is used for attracting and holding an object to be processed, and is characterized by: a fixed base, which is connected to an external attraction source. The path will be formed inside; and a rotating means, which is rotatably arranged above the fixed base, and a suction cup stage is mounted on the upper part, the rotating means is provided with: a rotating base, which is rotatably arranged on the Above the fixed abutment; and an insertion portion configured to be detachably fixed to the rotating abutment at a rotation center and insertable into the fixed abutment, the insertion portion is provided with an engaging end portion that conveys attraction The suction path to the upper surface of the chuck table is formed inside, and is engaged with the engaging recess of the fixed base. Once the engaging end is engaged with the engaging recess, it is on the outer periphery of the engaging end. A sealing ring is sealed between the wall and the inner wall of the engaging recess of the fixed base, and the communication path and the suction path are connected. 如申請專利範圍第1項之吸盤台機構,其中,該旋轉手段係以軸承來保持於該固定基台,在該固定基台具備使該旋轉手段旋轉的旋轉馬達。 For example, the chuck table mechanism of the first patent application range, wherein the rotation means is held on the fixed base with a bearing, and the fixed base is provided with a rotation motor that rotates the rotation means.
TW106119308A 2016-07-13 2017-06-09 Suction table mechanism TWI715779B (en)

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JP2016138339A JP6696851B2 (en) 2016-07-13 2016-07-13 Chuck table mechanism
JP2016-138339 2016-07-13

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