TW201727864A - 三維小型系統級封裝架構 - Google Patents
三維小型系統級封裝架構 Download PDFInfo
- Publication number
- TW201727864A TW201727864A TW105132078A TW105132078A TW201727864A TW 201727864 A TW201727864 A TW 201727864A TW 105132078 A TW105132078 A TW 105132078A TW 105132078 A TW105132078 A TW 105132078A TW 201727864 A TW201727864 A TW 201727864A
- Authority
- TW
- Taiwan
- Prior art keywords
- package
- component
- coupled
- die
- components
- Prior art date
Links
- 238000000034 method Methods 0.000 claims description 47
- 230000008878 coupling Effects 0.000 claims description 17
- 238000010168 coupling process Methods 0.000 claims description 17
- 238000005859 coupling reaction Methods 0.000 claims description 17
- 239000000725 suspension Substances 0.000 claims description 13
- 150000001875 compounds Chemical class 0.000 claims description 11
- 238000000465 moulding Methods 0.000 claims description 6
- 230000005540 biological transmission Effects 0.000 claims description 3
- 238000010586 diagram Methods 0.000 description 15
- 229910000679 solder Inorganic materials 0.000 description 13
- 238000004891 communication Methods 0.000 description 7
- 239000003990 capacitor Substances 0.000 description 6
- 239000010453 quartz Substances 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 5
- 238000004590 computer program Methods 0.000 description 4
- 239000013078 crystal Substances 0.000 description 4
- 238000012806 monitoring device Methods 0.000 description 3
- 239000002390 adhesive tape Substances 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 238000012544 monitoring process Methods 0.000 description 2
- 230000036961 partial effect Effects 0.000 description 2
- 230000003068 static effect Effects 0.000 description 2
- 238000012546 transfer Methods 0.000 description 2
- 230000002860 competitive effect Effects 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 229920006336 epoxy molding compound Polymers 0.000 description 1
- 239000000446 fuel Substances 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 230000001939 inductive effect Effects 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000005404 monopole Effects 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 238000005192 partition Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000002829 reductive effect Effects 0.000 description 1
- -1 resistors Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L25/00—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof
- H01L25/16—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof the devices being of types provided for in two or more different main groups of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. forming hybrid circuits
- H01L25/162—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof the devices being of types provided for in two or more different main groups of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. forming hybrid circuits the devices being mounted on two or more different substrates
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/18—High density interconnect [HDI] connectors; Manufacturing methods related thereto
- H01L24/19—Manufacturing methods of high density interconnect preforms
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/52—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
- H01L23/538—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames the interconnection structure between a plurality of semiconductor chips being formed on, or in, insulating substrates
- H01L23/5385—Assembly of a plurality of insulating substrates
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/18—High density interconnect [HDI] connectors; Manufacturing methods related thereto
- H01L24/20—Structure, shape, material or disposition of high density interconnect preforms
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/18—High density interconnect [HDI] connectors; Manufacturing methods related thereto
- H01L24/23—Structure, shape, material or disposition of the high density interconnect connectors after the connecting process
- H01L24/24—Structure, shape, material or disposition of the high density interconnect connectors after the connecting process of an individual high density interconnect connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/73—Means for bonding being of different types provided for in two or more of groups H01L24/10, H01L24/18, H01L24/26, H01L24/34, H01L24/42, H01L24/50, H01L24/63, H01L24/71
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/93—Batch processes
- H01L24/95—Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips
- H01L24/96—Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips the devices being encapsulated in a common layer, e.g. neo-wafer or pseudo-wafer, said common layer being separable into individual assemblies after connecting
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L25/00—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof
- H01L25/03—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes
- H01L25/10—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices having separate containers
- H01L25/105—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices having separate containers the devices being of a type provided for in group H01L27/00
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L25/00—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof
- H01L25/50—Multistep manufacturing processes of assemblies consisting of devices, each device being of a type provided for in group H01L27/00 or H01L29/00
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
- H01L21/56—Encapsulations, e.g. encapsulation layers, coatings
- H01L21/568—Temporary substrate used as encapsulation process aid
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2223/00—Details relating to semiconductor or other solid state devices covered by the group H01L23/00
- H01L2223/58—Structural electrical arrangements for semiconductor devices not otherwise provided for
- H01L2223/64—Impedance arrangements
- H01L2223/66—High-frequency adaptations
- H01L2223/6661—High-frequency adaptations for passive devices
- H01L2223/6677—High-frequency adaptations for passive devices for antenna, e.g. antenna included within housing of semiconductor device
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L2224/04105—Bonding areas formed on an encapsulation of the semiconductor or solid-state body, e.g. bonding areas on chip-scale packages
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/12—Structure, shape, material or disposition of the bump connectors prior to the connecting process
- H01L2224/12105—Bump connectors formed on an encapsulation of the semiconductor or solid-state body, e.g. bumps on chip-scale packages
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/15—Structure, shape, material or disposition of the bump connectors after the connecting process
- H01L2224/16—Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
- H01L2224/161—Disposition
- H01L2224/16151—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/16221—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/16225—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
- H01L2224/16227—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation the bump connector connecting to a bond pad of the item
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/18—High density interconnect [HDI] connectors; Manufacturing methods related thereto
- H01L2224/23—Structure, shape, material or disposition of the high density interconnect connectors after the connecting process
- H01L2224/24—Structure, shape, material or disposition of the high density interconnect connectors after the connecting process of an individual high density interconnect connector
- H01L2224/241—Disposition
- H01L2224/24135—Connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip
- H01L2224/24137—Connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip the bodies being arranged next to each other, e.g. on a common substrate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/18—High density interconnect [HDI] connectors; Manufacturing methods related thereto
- H01L2224/23—Structure, shape, material or disposition of the high density interconnect connectors after the connecting process
- H01L2224/24—Structure, shape, material or disposition of the high density interconnect connectors after the connecting process of an individual high density interconnect connector
- H01L2224/241—Disposition
- H01L2224/24135—Connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip
- H01L2224/24145—Connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip the bodies being stacked
- H01L2224/24146—Connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip the bodies being stacked the HDI interconnect connecting to the same level of the lower semiconductor or solid-state body at which the upper semiconductor or solid-state body is mounted
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/18—High density interconnect [HDI] connectors; Manufacturing methods related thereto
- H01L2224/23—Structure, shape, material or disposition of the high density interconnect connectors after the connecting process
- H01L2224/24—Structure, shape, material or disposition of the high density interconnect connectors after the connecting process of an individual high density interconnect connector
- H01L2224/241—Disposition
- H01L2224/24151—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/24153—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being arranged next to each other, e.g. on a common substrate
- H01L2224/24155—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being arranged next to each other, e.g. on a common substrate the item being non-metallic, e.g. insulating substrate with or without metallisation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/18—High density interconnect [HDI] connectors; Manufacturing methods related thereto
- H01L2224/23—Structure, shape, material or disposition of the high density interconnect connectors after the connecting process
- H01L2224/24—Structure, shape, material or disposition of the high density interconnect connectors after the connecting process of an individual high density interconnect connector
- H01L2224/241—Disposition
- H01L2224/24151—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/24153—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being arranged next to each other, e.g. on a common substrate
- H01L2224/24195—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being arranged next to each other, e.g. on a common substrate the item being a discrete passive component
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/73—Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
- H01L2224/732—Location after the connecting process
- H01L2224/73201—Location after the connecting process on the same surface
- H01L2224/73209—Bump and HDI connectors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/73—Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
- H01L2224/732—Location after the connecting process
- H01L2224/73251—Location after the connecting process on different surfaces
- H01L2224/73267—Layer and HDI connectors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2225/00—Details relating to assemblies covered by the group H01L25/00 but not provided for in its subgroups
- H01L2225/03—All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00
- H01L2225/10—All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices having separate containers
- H01L2225/1005—All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices having separate containers the devices being of a type provided for in group H01L27/00
- H01L2225/1011—All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices having separate containers the devices being of a type provided for in group H01L27/00 the containers being in a stacked arrangement
- H01L2225/1017—All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices having separate containers the devices being of a type provided for in group H01L27/00 the containers being in a stacked arrangement the lowermost container comprising a device support
- H01L2225/1035—All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices having separate containers the devices being of a type provided for in group H01L27/00 the containers being in a stacked arrangement the lowermost container comprising a device support the device being entirely enclosed by the support, e.g. high-density interconnect [HDI]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2225/00—Details relating to assemblies covered by the group H01L25/00 but not provided for in its subgroups
- H01L2225/03—All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00
- H01L2225/10—All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices having separate containers
- H01L2225/1005—All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices having separate containers the devices being of a type provided for in group H01L27/00
- H01L2225/1011—All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices having separate containers the devices being of a type provided for in group H01L27/00 the containers being in a stacked arrangement
- H01L2225/1047—Details of electrical connections between containers
- H01L2225/1058—Bump or bump-like electrical connections, e.g. balls, pillars, posts
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/498—Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
- H01L23/49811—Additional leads joined to the metallisation on the insulating substrate, e.g. pins, bumps, wires, flat leads
- H01L23/49816—Spherical bumps on the substrate for external connection, e.g. ball grid arrays [BGA]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/52—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
- H01L23/538—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames the interconnection structure between a plurality of semiconductor chips being formed on, or in, insulating substrates
- H01L23/5389—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames the interconnection structure between a plurality of semiconductor chips being formed on, or in, insulating substrates the chips being integrally enclosed by the interconnect and support structures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/151—Die mounting substrate
- H01L2924/153—Connection portion
- H01L2924/1532—Connection portion the connection portion being formed on the die mounting surface of the substrate
- H01L2924/15321—Connection portion the connection portion being formed on the die mounting surface of the substrate being a ball array, e.g. BGA
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/151—Die mounting substrate
- H01L2924/153—Connection portion
- H01L2924/1532—Connection portion the connection portion being formed on the die mounting surface of the substrate
- H01L2924/1533—Connection portion the connection portion being formed on the die mounting surface of the substrate the connection portion being formed both on the die mounting surface of the substrate and outside the die mounting surface of the substrate
- H01L2924/15331—Connection portion the connection portion being formed on the die mounting surface of the substrate the connection portion being formed both on the die mounting surface of the substrate and outside the die mounting surface of the substrate being a ball array, e.g. BGA
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/181—Encapsulation
- H01L2924/1815—Shape
- H01L2924/1816—Exposing the passive side of the semiconductor or solid-state body
- H01L2924/18162—Exposing the passive side of the semiconductor or solid-state body of a chip with build-up interconnect
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/19—Details of hybrid assemblies other than the semiconductor or other solid state devices to be connected
- H01L2924/191—Disposition
- H01L2924/19101—Disposition of discrete passive components
- H01L2924/19105—Disposition of discrete passive components in a side-by-side arrangement on a common die mounting substrate
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Production Of Multi-Layered Print Wiring Board (AREA)
Abstract
實施例一般針對三維小型系統級封裝架構。一種裝置的實施例包括具有第一側及相對的第二側的第一封裝,第一封裝包括多數個嵌入式電子元件及一或多個通孔條,每一通孔條包括多數個貫通孔;以及具有第一側及相對的第二側的第二封裝,第二封裝包括多數個嵌入式電子元件,其中第一封裝的第一側與第二封裝的第二側藉由多數個連接共同耦合,該等多數個連接至少包括將第二封裝連接到第一封裝的第一元件的第一連接以及將第二封裝連接一或多個的第一通孔條的第二連接。
Description
本文描述的實施例一般有關於電子裝置領域,且尤有關於三維小型系統級封裝架構。
行動裝置,諸如智慧型電話或穿戴式裝置,供日益複雜的操作使用。此外,電子器件安裝於例如使用物聯網(IoT)網路之較不傳統的裝置中,其在提供新功能、監測及控制方面給予大好的願景。
因為給電路板的實際空間非常有限,此種裝置需要高程度整合於很小的尺寸中。此外,此等裝置一般需要不同大小的異質電子元件的整合以提供需要的功能性,因而複雜化了電子裝置的高效設計。
然而,由IC及大量關聯的被動元件(諸如電容器、電感器及電阻器)組成以及使用傳統封裝技術(諸如使用中介板方法的板級組件及封裝堆疊)製造的無線系統SiP(系統級封裝)的尺寸可能太大而在新電子裝置的相關市場方面不具競爭力,會需要非常小型及高效的製
程。
100‧‧‧三維(3D)堆疊式系統級封裝
105‧‧‧第二封裝
110‧‧‧第一封裝
115‧‧‧懸掛晶粒
125‧‧‧球柵陣列(BGA)
130‧‧‧通孔條
150‧‧‧主機板
210‧‧‧第一封裝/底部封裝
215‧‧‧懸掛/負鼠晶粒
230‧‧‧通孔條
305‧‧‧第二封裝/頂部封裝
320‧‧‧焊球連接
400‧‧‧3D堆疊式封裝
425‧‧‧BGA元件
450‧‧‧主機板
500‧‧‧底部封裝/第一封裝
510‧‧‧通孔條
520‧‧‧RFIC BLE(RF電路晶粒低功耗藍牙)
530‧‧‧BLUN(平衡-不平衡器)
540‧‧‧石英振盪器
600‧‧‧頂部封裝
610‧‧‧加速器封裝/加速器
620‧‧‧直流對直流(DC-DC)轉換器
630‧‧‧電池充電器
640‧‧‧石英
700‧‧‧3D堆疊式封裝的製程
702、704、706、708、710、712、714、716、718、720、722‧‧‧製程
800‧‧‧第一封裝/底部封裝
802‧‧‧被動元件
804‧‧‧通孔條
805‧‧‧主動或積體電路元件
806‧‧‧封裝的元件
810‧‧‧黏著帶
812‧‧‧模塑承載體
814‧‧‧包覆模製
820‧‧‧墊
822‧‧‧介電層/焊球
824‧‧‧RDL層
826‧‧‧阻焊層
828‧‧‧接觸開口
840‧‧‧懸掛晶粒
850‧‧‧第二封裝/頂部封裝
860‧‧‧堆疊式封裝
870‧‧‧主機板/主要PCB
900‧‧‧電子裝置
910‧‧‧顯示器
912‧‧‧電池
920‧‧‧堆疊式封裝
922‧‧‧匯流排
924‧‧‧控制器/處理器
926‧‧‧記憶體
928‧‧‧非揮發性記憶體(NVM)
930‧‧‧唯讀記憶體(ROM)
932‧‧‧發射器或接收器
934‧‧‧埠
936‧‧‧主機板/天線
938‧‧‧感測器
此處所述的實施例係藉由範例而非藉由附圖中的限制來加以說明,圖式中同樣的參考標號意指類似的元件。
圖1是根據實施例之三維堆疊式系統級封裝的圖;圖2是根據實施例之三維堆疊式系統級封裝的第一封裝的圖;圖3是根據實施例之三維堆疊式系統級封裝的第二封裝的圖;圖4是根據實施例之三維堆疊式系統級封裝的圖;圖5是根據實施例之三維堆疊式系統級封裝的底部封裝的佈局的圖;圖6是根據實施例之三維堆疊式系統級封裝的頂部封裝的佈局的圖;圖7是根據實施例之三維堆疊式系統級封裝的製程的流程圖;圖8A至8M是根據實施例之三維堆疊式系統級封裝的製程的圖。
圖9是包括根據實施例之三維堆疊式系統級封裝的電子裝置的元件的圖。
此處描述的實施例一般針對三維小型系統級封裝架構。
如此處所使用者:
「行動裝置(mobile device)」或「行動電子裝置(mobile electronic device)」表示智慧型電話、智慧型手錶、平板電腦、筆記型電腦或膝上型電腦、手持式電腦、行動網際網路裝置、穿戴式技術、或包括處理能力及通訊能力的其他行動裝置。
「穿戴式電子裝置(wearable electronics)」或「穿戴式裝置(wearables)」指的是至少部分整合成一件可被使用者穿戴的物件的電子裝置。穿戴式電子可包括獨立操作的電子裝置以及連同例如行動裝置的第二電子裝置操作的電子裝置。
「電子裝置(electronic device)」包括任何具有提供一或多個功能之電子系統的設備、裝置或系統,功能包括但不侷限於行動裝置及穿戴式裝置。
在一些實施例中,電子裝置包括以非常小形狀因數整合許多不同電子組件的三維(3D)堆疊式系統級封裝(SiP)。積體電路(IC)、封裝及被動元件針對穿戴式裝置及其他用於行動及其他應用的高度整合異質系統被整合且組裝於狹小空間中。然而,即使有高度整合的系統,電子裝置覆蓋區可能變得太大而無法納入穿戴式裝置
中,穿戴式裝置包括但不侷限於包括手錶、袖口及其他健康監測裝置的智慧型手錶及健康監測裝置。
因為SiP的所有必要元件無法獨立製造(即由不同製造商而非SiP的製造商製造),市面上可買到的元件通常從外部來源取得。因為封裝的元件、積體電路、主動元件及被動元件增加且可給封裝組件用的覆蓋區減少,所以需要新的架構。在一些實施例中,提供一種用以嵌入不同尺寸的不同元件的創新架構及方法。在一些實施例中,提出一種用於製造3D堆疊式系統級封裝以產生極小尺寸SiP適用的超小型行動裝置的新製程。
在一些實施例中,架構及製程包括使用例如e-WLB(embedded Wafer Level Ball Grid Array(BGA),嵌入式晶圓級球柵陣列)及e-PLB(embedded Panel Level BGA,嵌入式面板級BGA)基板技術來嵌入不同尺寸及配置的不同元件。在一些實施例中,製程包括組裝3D堆疊式系統級封裝以製造適於穿戴式裝置及其他超小型行動裝置的極小型SiP。
在一些實施例中,3D堆疊式SiP架構包括:
(1)第一封裝(其亦可稱為底部封裝),其中至少一元件具有與封裝中的貫通孔條(through via bar)相同高度,其中至少一元件為WLCSP(Wafer Level Chip Scale Package,晶圓級晶片尺寸封裝)或覆晶(Flip Chip)格式。
如此處所使用者,通孔條包括任何成群的二
或多個通孔。雖然此處以包括一定數目之配置成一行的通孔的特定形式繪示通孔條,實施例不侷限於在封裝中任何特定數目的通孔、任何特定配置的一群通孔、或該群通孔的任何特定設置。
(2)至少一矽SoC(系統單晶片)晶粒,附接在第一封裝的底側並直接耦合到第一封裝中的至少一元件。
(3)球柵陣列(BGA),附接在第一封裝的底側用以將第一封裝組裝到主機板。
(4)選擇矽SoC晶粒厚度及BGA球高度使得矽SoC晶粒不與第一封裝附接的主機板接觸。
(5)第二封裝(其亦稱為頂部封裝),附接在第一封裝的頂側,第二封裝直接連接到第一封裝中的至少一元件。
(6)至少一貫通孔條(包括二或三個通孔的任何群組),包含在連接到第二封裝中的電路的第一封裝中。
(7)具有比第一封裝中最高元件還要更大高度的任何3D系統級封裝的元件被嵌入第二封裝中。
(8)二或更多射頻(RF)元件一起成群且互相鄰接地設置於第一(底部)封裝中。
圖1是根據實施例之三維堆疊式封裝的圖。在一些實施例中,三維堆疊式系統級封裝100包括第一封裝110(其亦稱為底部封裝),其與第二封裝105(頂部
封裝)耦合。在一些實施例中,堆疊式系統級封裝100進一步包括懸掛晶粒115(其亦可稱為負鼠裝置(opossum device)),其與第一封裝110耦合。在一些實施例中,第一封裝110透過球柵陣列(BGA)125與主機板150耦合。
在一些實施例中,第一封裝110包括一或多個通孔條(或一或多個任何群組的多貫通孔)130。在一些實施例中,第一封裝110和第二封裝105的每一者包括多個嵌入式電子元件,其中該等元件可包括一或多個封裝的元件、一或多個主動元件或積體電路、以及一或多個被動元件。在一些實施例中,可重新配置分區及堆疊以針對特定產品的實施最佳化形狀因數要件。參照圖2及3詳述第一封裝110和第二封裝105的元件,參照圖4詳述堆疊式系統級封裝100。
圖2是根據實施例之三維堆疊式系統級封裝的第一封裝的圖。在一些實施例中,3D堆疊式系統級封裝的第一封裝(或底部封裝)210包括一或多個嵌入式通孔條(各包含多數個貫通孔)230(其在一可行的範例中,可包括四個通孔條以在每一角落提供一個通孔條,每一通孔條包括5個通孔)、以及多個可包括一或多個封裝的元件(此範例中的元件U11)的嵌入式電子元件,一或多個主動裝置或積體電路(此範例中的元件U6及U7)、以及一或多個被動元件(諸如此範例中的電容器C23)。
在一些實施例中,底部封裝210(U11具0.6
mm的高度(其例如可能為石英振盪器))的最高元件(Z方向上最大者,其中X及Y方向為沿著封裝的橫向的方向)以及一或多個通孔條230被選為具有相同高度。第一封裝210中的所有其他元件具有小於或等於U11的高度。
在一些實施例中,諸如SoC晶粒(SB WLCSP)215的封裝以懸掛晶粒的方式選配地附接在第一封裝210的底側上的接觸墊。在繪示的範例中,WLCSP格式的懸掛晶粒元件215,與面向上的接觸墊一起設置以利與第一封裝210的直接連接。關於底部封裝210的連接的進一步細節說明於圖8A-8M。
在一些實施例中,一或多個元件為以射頻操作的RF(射頻)元件。在繪示於圖2的範例中,二元件U6(例如藍牙LE)及U7(例如BLUN元件)以RF頻率操作,且為了最大化輸出功率效率,此等元件儘可能靠近懸掛晶粒215地互相鄰接設置以便最大化對天線的功率傳輸。
圖3是根據實施例之三維堆疊式系統級封裝的第二封裝的圖。在一些實施例中,三維堆疊式系統級封裝的第二封裝(或頂部封裝)305被製造用以附接在第一/底部封裝210的頂表面上,如圖2所繪示。在一些實施例中,第二/底部封裝305包含多個嵌入式電子元件,其等可包括一或多個封裝的元件、一或多個主動元件或積體電路(此範例中的U9及U1)、以及一或多個被動元件(此
範例中的電容器C20和C21以及電感器U1)。
在一些實施例中,多數個連接,諸如焊球連接320,為了將頂部封裝305與圖2的底部封裝210耦合之目的將要與頂部封裝305耦合,耦合的封裝繪示於圖4。關於針對頂部封裝305的連接的進一步細節說明於圖8A-8M。
在一些實施例中,堆疊式系統級封裝的最高元件或最高的幾個元件將包含於頂部封裝305中。在圖3的範例中,堆疊式系統級封裝的最高元件是U9,封裝U9在z軸上的高度大於底部封裝210的U11的高度,U9因而將被設置於頂部封裝305中。在一特定範例中,U9是可以使用於許多行動及穿戴式裝置的密封加速計(AXL)。
圖4是根據實施例之三維堆疊式系統級封裝的圖。在一些實施例中,具有選配耦合的懸掛/負鼠晶粒(WLCSP晶粒)215的底部封裝210(如圖2所繪示)與頂部封裝305(如圖3所繪示)耦合以形成3D堆疊式封裝400。
在一些實施例中,多數個諸如焊球連接320的連接將頂部封裝305與底部封裝210耦合。在一些實施例中,頂部封裝305至少與底部晶粒210的一元件(此範例中的U11)電耦合且電耦合至底部晶粒210的通孔條230,像是使用焊球附接法的封裝的耦合。
在一些實施例中,亦與底部封裝210耦合的
是用以提供與主機板450(諸如繪示於圖1中的主機板150)耦合的球柵陣列(BGA)425的多個球,其中BGA元件425的直徑足夠大以致於能防止懸掛晶粒215與耦合的主機板450的接觸,亦即,直徑大於懸掛晶粒215的高度。在一些實施例中,BGA球沿著第一封裝210的周邊在附接在其底側,此為懸掛晶粒215附接的同一側。在懸掛晶粒215與底部封裝210耦合的一特定範例中,選擇BGA高度及懸掛晶粒厚度以便當第一/底部晶粒210組裝到主機板450上時在懸掛晶粒215與主機板450之間提供約70至100um的間隙(clearance)。然而,實施例並不侷限於在懸掛晶粒215與主機板450之間的特定間隙距離。在一些實施例中,BGA球提供在底部封裝210的通孔230與主機板450之間的電氣連接。
圖5是根據實施例之三維堆疊式系統級封裝的底部封裝的佈局的圖。在一些實施例中,繪示於圖5的底部封裝500(亦稱為第一封裝)與繪示於圖6的頂部封裝600耦合。在一些實施例中,底部封裝包括多個嵌入式電子元件,其中該等元件可包括一或多個封裝的元件、一或多個主動元件或積體電路、以及一或多個被動元件。
在此範例中,通孔條510被設計成其高度等於塑模化合物(mold compound)的高度,塑模化合物繼而由塑模中的WLCSP元件(U11)所決定。每一通孔條510各具有5個通孔,因而在底部封裝500與頂部封裝600之間可以有20個互連。
一組RF電路晶粒(其可稱為RFIC)、BLE(Bluetooth Low Energy,低功耗藍牙)520及BLUN 530(亦稱為平衡-不平衡器(balun),一種在平衡信號與不平衡信號之間轉換的裝置)儘可能靠近地設置以實現用以最大化功率輸出的最短互連距離。底部封裝可進一步包括諸如石英振盪器540的元件。
在一些實施例中,SoC晶粒(未示於圖5中)以負鼠晶粒(或懸掛晶粒)的方式附接在第一封裝500的底部,諸如圖2所示者。此獨特的配置可以在矽SoC與嵌入於就在其上方的塑模中的被動和主動元件之間有最短互連。在一些實施例中,RFIC BLE 520和BLUN 530互相非常接近地設置並透過匹配的差動對來連接以使性能最大化。在一些實施例中,2個通孔條各設置於封裝的第一部位(諸如北側)且2個通孔條各設置於封裝的第二部位(諸如相對的南側)以促進頂部封裝的連接。在一些實施例中,被動元件設置在封裝中的最佳位置以縮小互連距離。
在一些實施例中,元件之間的互連透過在該等封裝的一或多個表面上的一或多個互連金屬層(每一者約10-20um厚)及一或多個介電層(每一者約10-20um厚)加以實現。BGA(未繪示於圖5中)在第一封裝的周邊上組裝以附接至主機板上。選取BGA的高度和間距(pitch)使得負鼠晶粒有足夠的間隙且亦允許金屬層的佈線(routing)。在此特定範例中所製造的頂部封裝500的
尺寸可以是5.5mm X 6mm X 0.9mm。
圖6是根據實施例之三維堆疊式系統級封裝的頂部封裝的佈局的圖。在一些實施例中,頂部封裝600包括多個嵌入式電子元件,其中該等元件可包括一或多個封裝的元件、一或多個主動元件或積體電路、以及一或多個被動元件。在此範例中,頂部封裝600以不同尺寸的三個積體電路及十四個被動裝置(電感器、電容器、電阻器及石英)組成。舉例來說,以密封方式密封的加速器封裝610嵌入於塑模化合物中。身為最高元件的加速器610(在z方向~0.8mm的高度)支配了頂部封裝600的整體高度。在此特定範例中,可沉積900um厚的塑模化合物以提供100um包覆膜(overmold)於加速器610的頂部上。此外,皆為裸晶(bare die)格式的直流對直流(DC-DC)轉換器620與電池充電器630被嵌入且互連以便連同封裝中的石英640、一電感器、4電阻器及10電容器達到最小形狀因數。在此範例中,所製造的頂部封裝的尺寸可以是5.5mm X 6.0mm X 0.9mm。在一些實施例中,BGA球(其可大約100um直徑)附接在頂部封裝600的底部以將其附接在底部封裝500中的通孔條及WLCSP元件,如圖5所示者。
圖5及6說明3D堆疊式系統級封裝(3D SiP)的一特定範例,其包括6個積體電路以及26個不同尺寸的被動元件,結果的系統適於穿戴式電子裝置及健康監測裝置。此等類型的裝置需要整合大量不同的小型元
件。此種SiP可用於手錶、袖口、戒子及穿戴式健康監測與健身追蹤系統。然而,實施例並不侷限於此特定類型的架構及製造方法,而是能適用於其他小型系統。
圖7是根據實施例之三維堆疊式系統級封裝的製程的流程圖。圖8A至8M是根據實施例之三維堆疊式系統級封裝的製程的圖。然而,實施例並不侷限於圖7及8A至8M所繪示之特定方法。如圖8A至8M所繪示者,底部封裝亦可稱為Pkg1且頂部封裝亦可稱為Pkg2。
在一些實施例中,3D堆疊式封裝的製程700包括但不侷限於下述方法:
702:挑選並設置電子元件(包括一或多個封裝的元件806、主動或積體電路元件805、或被動元件802、以及一或多個通孔條804(例如,使用BGA焊球))於模塑承載體812上,電子元件可藉由黏著帶810或其他手段保持在位置上,以形成第一/底部封裝800的晶圓。(圖8A)
704:晶圓的包覆模製814(例如,使用環氧塑模化合物)以嵌入用於第一封裝800的電子元件及通孔條。(圖8B)
706:模塑承載體的剝離及用於第一封裝800之模製的晶圓的翻轉。(圖8C)
708:介電晶粒層的施加(針對製程為可選的);以及第一重佈層(redistribution layer,RDL)及墊820的施加與結構化。(圖8D)
710:第二組介電層822及RDL層824的可選的施加。(圖8E)
712:翻轉晶圓回到第一方位並薄化(thinning)第一封裝的塑模化合物以露出預封裝化合物的BGA焊球及通孔條墊。(圖8F)
714:阻焊層826施加到第一封裝800的晶圖的頂側。(圖8G)製程可進一步包括介電質及RDL層824施加到晶圓的頂側,此未顯示。
716:焊球822的施加及懸掛/負鼠晶粒840可選的附接於第一封裝800的底側,第一封裝800繪示為透過焊球附接而被耦合。(圖8H)
718:接觸的開口,顯示為阻焊層826中的接觸開口828。(圖8I)
720:第二/頂部封裝850施加於底部封裝800的嵌入式封裝的墊及/或BGA球上以形成堆疊式封裝860。(圖8J)
722:堆疊式封裝耦合到主要PCB(印刷電路板,亦稱為主機板870)。此連接提供預封裝元件經由頂部封裝到通孔條進入主要PCB 870的互連(圖8K)
也說明的是以下的替代實施例:
除了耦合懸掛晶粒840至第一封裝800的底側以外,還耦合額外的懸掛/負鼠晶粒880至第二封裝850的底側,從而提供封裝層之間具有多個懸掛晶粒的堆疊式封裝。(圖8L)此外,實施例不侷限於所繪示的封裝。
在一些實施例中,第二封裝850可進一步包括通孔條,且額外的第三封裝(未繪示於此)可以相同或類似於耦合第一與第二封裝的方式與第二封裝耦合。再者,可選的第三懸掛晶粒可與第三封裝的底側耦合。
用替代的熱壓接合(thermal compression bonding)組裝頂部封裝850與底部封裝800。(圖8M)在一些實施例中,可替代地實施此種組裝於使用圖8J所繪示的焊球附接法的耦合。
圖9是包括根據實施例之三維堆疊式系統級封裝的電子裝置的組件的圖。在一些實施例中,電子裝置900包括與主機板936耦合的堆疊式封裝920。
在一些實施例中,堆疊式封裝920可包括一或多個耦合至一或多個一般顯示為匯流排922的匯流排或互連的控制器、控制邏輯、或處理器(一般指控制器)924。在一些實施例中,控制器924可包括一或多個通用(general-purpose)處理器或專用(special-purpose)處理器。
在一些實施例中,匯流排922是供資料傳輸之用的通訊手段。為簡明緣故,匯流排922繪示為單一匯流排,但可代表多個不同的互連(包括RDL及通孔)或匯流排,且與此等互連或匯流排的元件連接可能會有所不同。顯示於圖9的匯流排922是代表任何一或多個透過適合的橋接器、轉接器或控制器所連接的獨立的實體匯流排、點對點連接、或兩者的抽象概念。
在一些實施例中,堆疊式封裝920進一步包含記憶體926,用以儲存要被控制器924執行的資訊及指令。記憶體926可包括但不侷限於動態隨機存取記憶體(DRAM)。
堆疊式封裝920亦可包含非揮發性記憶體(NVM)928;以及唯讀記憶體(ROM)930或其他用以儲存靜態資訊及指令的靜態儲存裝置。
在一些實施例中,堆疊式封裝920包括耦合至匯流排922供無線通訊之用的一或多個發射器或接收器932。在一些實施例中,堆疊式封裝920可包括一或多個埠934供透過有線通訊的資料傳送及接收之用。無線通訊包括但不侷限於Wi-Fi、藍牙TM、近場通訊、及其他無線通訊標準。
在一些實施例中,堆疊式封裝可包括一或多個用以感測環境因子的感測器938,其中該一或多個感測器可包括加速器、溫度感測器、電壓感測器、或其他感測器。
在一些實施例中,電子裝置可包括其他元件,像是例如,供透過無線通訊之資料的傳送及接收之用的諸如液晶顯示器(LCD)的顯示器910、一或多個諸如偶極或單極天線的天線936、以及用以供電給電子裝置900之諸如電池912的電源。電源可進一步包括太陽能電池、燃料電池、充電電容器、近場感應耦合、或其他用以提供或產生電力的系統或裝置。由電源提供的電力可依要
求被分配到電子裝置900的元件。
在上述說明中,為了達到說明的目的,敘述許多技術的細節,以提供對本發明的內容的徹底瞭解。然而,該領域具有通常知識者在沒有某些特定細節下亦可實施本發明。此外,周知的構造與結構以方塊圖呈現。圖中所示的構件之間可能還有中間結構。所描述或繪示的構件還可能包括其他未繪示或描述的額外輸入或輸出。
各種實施態樣可能包含不同的程序。該等程序可能藉由硬體構件執行或實施於電腦程式或機器可執行指令,該等指令可用於通用或專用處理器,或一可使用該等指令程式化的邏輯電路以執行上述程序。另一方面,該等程序也可藉由軟硬體結合而執行。
各種實施例的部分內容可作為電腦程式產品而被提供,該電腦程式產品可能包含一存有上述電腦程式指令的電腦可讀儲存媒體,該等指令可由一或多個處理器執行以編程該電腦,而執行某些實施態樣中的程序。該電腦可讀儲存媒體可包括磁碟片、光碟、唯讀記憶光碟(CD-ROM)、磁光碟(magneto-optical disk)、唯讀記憶體(ROM)、隨機存取記憶體(RAM)、可抹除可編程唯讀記憶體(EPROM)、電抹除式可編程唯讀記憶體(EEPROM)、磁卡或光卡(optical card)、快閃記憶體或其他可儲存電子指令的電腦可讀媒體。進一步來說,部分實施例也可以經由下載而成為電腦程式產品,該程式可由一遠端電腦傳輸至一請求下載電腦。
上述的方法多以其最基礎的形式進行描述,但在不背離本發明的基礎範圍的前提下,上述方法的程序可予以增減,且上述訊息也可以增減其內的資訊。本領域具有通常知識者可知,上述內容可進行進一步的調整或改編。上述的特定實施例僅用於說明,不能以此限制本發明的範圍。本發明的實施範圍應以申請專利範圍為主,不應以特定的實施例為限。
上述說明段落中,元件A耦接至或與元件B耦接,可能是指元件A直接與元件B耦接,或是指元件A透過元件C而間接耦接於元件B。於專利範圍中的請求項中,若敘明一構件、特徵、結構、程序或特徵A「致能」一構件、特徵、結構、程序或特徵B,意指A至少部分致能B,但還可能有其他構件、特徵、結構、程序或特徵亦致能B。若一說明指出一構件、特徵、結構、程序或特徵「可」、「可能」、「可以」,其意指該特定構件、特徵、結構、程序或特徵非必然含括在內。於實施態樣或請求項提到「一個」元件,亦非指該元件的數量僅為一個。
一實施例是本發明的一實施態樣或範例。前述內容所指的「一實施例」、「一實施態樣」、「部分實施態樣」或「其他實施態樣」,意指一特定之特徵、結構或特性係至少與部分實施態樣具有關聯性,但不一定實施於所有實施態樣中。此外,「一實施例」、「一實施態樣」或「部分實施態樣」也不必然意指相同的實施例。前
述於本發明的示例實施態樣中,為了簡化及助於瞭解本發明的各種實施態樣,部分特徵有時會在單一實施例中成組實施。然而,不能以此種說明方式,而認為各請求項所述的發明內容需要更多的技術特徵。更確切地說,本發明各請求項反映的發明態樣係少於前述揭露之實施例所包含的所有特徵。也就是說,依據此處之陳述內容,本發明的請求項係各自獨立主張一發明態樣。
在一些實施例中,一種裝置包括具有第一側及相對的第二側的第一封裝,第一封裝包括多數個嵌入式電子元件及一或多個嵌入式通孔條,每一通孔條包括多數個貫通孔;以及具有第一側及相對的第二側的第二封裝,第二封裝包括多數個嵌入式電子元件,其中第一封裝的第一側與第二封裝的第二側藉由多數個連接而被耦合在一起,該等多數個連接至少包括第一連接以及第二連接,該第一連接將第二封裝連接到第一封裝的第一元件,該第二連接將第二封裝連接至一或多個通孔條的第一通孔條。
在一些實施例中,用於第一封裝及第二封裝的每一者的多數個嵌入式電子元件包括一或多個以下任意者:封裝的元件、主動或積體電路元件,或被動元件。
在一些實施例中,該第一封裝及該第二封裝的該第一側是頂側,且其中,該第一封裝及該第二封裝的該第二側是底側。
在一些實施例中,該裝置進一步包括與該第一封裝之該第二側耦合的懸掛晶粒。
在一些實施例中,該裝置進一步包括耦合至該第一封裝之該第二側的球柵陣列(BGA),其中,該BGA的每一球的直徑大於該懸掛晶粒的高度。
在一些實施例中,該第一封裝透過該BGA與主機板的表面耦合。
在一些實施例中,該懸掛晶粒的第一側與該第一封裝的該第二側耦合,且其中,在該懸掛晶粒的第二側之間有間隙,該懸掛晶粒的該第二側相對於該懸掛晶粒的該第一側,使得該懸掛晶粒不與該主機板的該表面接觸。
在一些實施例中,該第一封裝的第一元件的高度與該一或多個通孔條的高度相同。
在一些實施例中,該第一封裝包括二或多個射頻(RF)元件,該等RF元件在該第一封裝中互相鄰接。
在一些實施例中,該裝置包含三維系統級封裝(SiP)。
在一些實施例中,一種電子裝置包括:堆疊式系統級封裝(SiP),該堆疊式系統級封裝包括第一封裝、第二封裝及主要印刷電路板(PCB),該第一封裝包括多數個嵌入式電子元件及一或多個嵌入式通孔條,每一通孔條包括多數個貫通孔,該第一封裝具有第一側及相對的第二側;該第二封裝包括多數個嵌入式電子元件,該第二封裝具有第一側及相對的第二側;以及該第一封裝與該
主要PCB耦合。該堆疊式系統級封裝包括接收器、發射器、或二者,且其中,該電子裝置包括一或多個天線,其包括供資料的傳輸之用的偶極天線。在一些實施例中,其中,該第一封裝的第一側及該第二封裝的第二側藉由多數個連接而被耦合在一起,該等多數個連接至少包括第一連接以及第二連接,該第一連接將該第二封裝連接到該第一封裝的第一元件,該第二連接將該第二封裝連接到該一或多個通孔條的第一通孔條。
在一些實施例中,用於該第一封裝及該第二封裝的每一者的該多數個嵌入式電子元件包括一或多個以下任意者:封裝的元件、主動或積體電路元件,或被動元件。
在一些實施例中,該電子裝置進一步包括與該第一封裝之該第二側耦合的懸掛晶粒。
在一些實施例中,該電子裝置進一步包括耦合至該第一封裝之該第二側的球柵陣列(BGA),其中,該BGA的每一球的直徑大於該懸掛晶粒的高度,且其中,該第一封裝透過該BGA與該主要PCB耦合。
在一些實施例中,該第一封裝的第一元件的高度與該一或多個通孔條的高度相同。
在一些實施例中,該電子裝置是行動電子裝置。在一些實施例中,該電子裝置是穿戴式電子裝置。
在一些實施例中,一種方法包括:設置多數個電子元件及一或多個通孔條在模塑承載體上以形成第一
封裝的晶圓;使用塑模化合物包覆模製該第一封裝的該晶圓以嵌入該等電子元件及通孔條;剝離用於該第一封裝的該模塑承載體;薄化該第一封裝的該晶圓的該塑模化合物以露出該第一封裝之頂側上的該等通孔條與第一電子元件的連接;以及施加第二封裝於該第一封裝的該第一電子元件與該等通孔條的該等連接上以形成堆疊式封裝。
在一些實施例中,設置該多數個電子元件包括設置一或多個以下任意者:封裝的元件、主動或積體電路元件,或被動元件。
在一些實施例中,該第一封裝的該第一元件的高度與該第一封裝的該一或多個通孔條的高度相同。
在一些實施例中,該方法進一步包括施加介電晶粒層及重佈層(RDL)於該第一封裝的該底側上。
在一些實施例中,該方法進一步包括可選地施加介電層及RDL層於該第一封裝的頂側上。
在一些實施例中,該方法進一步包括耦合該第一封裝與主機板。
在一些實施例中,該方法進一步包括耦合懸掛晶粒與該第一封裝的該底側。
在一些實施例中,耦合該懸掛晶粒與該第一封裝的該底側包括在該懸掛晶粒與該主機板之間維持一間隙,使得該懸掛晶粒不與該主機板的表面接觸。
在一些實施例中,一種系統級封裝係藉由一種方法所製造,該方法包括:設置多數個電子元件及一或
多個通孔條在模塑承載體上以形成第一封裝的晶圓;使用塑模化合物包覆模製用於該第一封裝的該晶圓以嵌入該等電子元件及通孔條;剝離用於該第一封裝的該模塑承載體;薄化該第一封裝的該晶圓的該塑模化合物以露出該第一封裝之頂側上的通孔條與第一電子元件的連接;以及施加第二封裝於該第一封裝的該等第一電子元件及該等通孔條的連接上以形成堆疊式封裝。
在一些實施例中,該第一封裝的該第一元件的高度與該第一封裝的該一或多個通孔條的高度相同。
在一些實施例中,該方法進一步包括施加介電晶粒層及重佈層(RDL)於該第一封裝的該底側上。
在一些實施例中,該方法進一步包括施加介電層及RDL層於該第一封裝的頂側上。
在一些實施例中,該方法進一步包括耦合該第一封裝與主機板。
在一些實施例中,該方法進一步包括耦合懸掛晶粒與該第一封裝的該底側。在一些實施例中,耦合該懸掛晶粒與該第一封裝的該底側包括在該懸掛晶粒與該主機板之間維持一間隙,使得該懸掛晶粒不與該主機板的表面接觸。
100‧‧‧三維(3D)堆疊式系統級封裝
105‧‧‧第二封裝
110‧‧‧第一封裝
115‧‧‧懸掛晶粒
125‧‧‧球柵陣列(BGA)
130‧‧‧通孔條
150‧‧‧主機板
Claims (25)
- 一種裝置,包含第一封裝,具有第一側及相對的第二側,該第一封裝包括:多數個電子元件;以及一或多個通孔條,每一通孔條包括多數個貫通孔;以及第二封裝,具有第一側及相對的第二側,該第二封裝包括:多數個電子元件,其中,該第一封裝的第一側與該第二封裝的第二側藉由多數個連接而被耦合在一起,該等多數個連接至少包括第一連接以及第二連接,該第一連接將該第二封裝連接到該第一封裝的第一元件,該第二連接將該第二封裝連接至該一或多個通孔條的第一通孔條。
- 如申請專利範圍第1項之裝置,其中,用於該第一封裝及該第二封裝的每一者的多數個電子元件包括一或多個以下任意者:封裝的元件;主動或積體電路元件;或被動元件。
- 如申請專利範圍第1項之裝置,其中,該第一封裝及該第二封裝的該第一側是頂側,且其中,該第一封裝及該第二封裝的該第二側是底側。
- 如申請專利範圍第1項之裝置,進一步包括與該第一封裝之該第二側耦合的懸掛晶粒。
- 如申請專利範圍第4項之裝置,進一步包含耦合至該第一封裝之該第二側的球柵陣列(BGA),其中,該BGA的每一球的直徑大於該懸掛晶粒的高度。
- 如申請專利範圍第5項之裝置,其中,該第一封裝透過該BGA與主機板的表面耦合。
- 如申請專利範圍第6項之裝置,其中,該懸掛晶粒的第一側與該第一封裝的該第二側耦合,且其中,在該懸掛晶粒的第二側之間有間隙,該懸掛晶粒的該第二側相對於該懸掛晶粒的該第一側,使得該懸掛晶粒不與該主機板的該表面接觸。
- 如申請專利範圍第1項之裝置,其中,該第一封裝的第一元件的高度與該一或多個通孔條的高度相同。
- 如申請專利範圍第1項之裝置,其中,該第一封裝包括二或多個射頻(RF)元件,該等RF元件在該第一封裝中互相鄰接。
- 如申請專利範圍第1項之裝置,其中,該裝置包含三維系統級封裝(SiP)。
- 一種電子裝置,包含:堆疊式系統級封裝(SiP),該堆疊式系統級封裝包括:第一封裝,包括多數個電子元件及一或多個通孔條,每一通孔條包括多數個貫通孔,該第一封裝具有第一 側及相對的第二側;以及第二封裝,包括多數個電子元件,該第二封裝具有第一側及相對的第二側;以及主要印刷電路板(PCB),該第一封裝與該主要PCB耦合,其中,該堆疊式系統級封裝包括接收器、發射器、或二者,且其中,該電子裝置包括一或多個天線,其包括供資料的傳輸之用的偶極天線,且其中,該第一封裝的第一側及該第二封裝的第二側透過多數個連接而被耦合在一起,該等多數個連接至少包括第一連接以及第二連接,該第一連接將該第二封裝連接到該第一封裝的第一元件,該第二連接將該第二封裝連接到該一或多個通孔條的第一通孔條。
- 如申請專利範圍第11項之電子裝置,其中,用於該第一封裝及該第二封裝的每一者的該多數個電子元件包括一或多個以下任意者:封裝的元件;主動或積體電路元件;或被動元件。
- 如申請專利範圍第11項之電子裝置,進一步包括與該第一封裝之該第二側耦合的懸掛晶粒。
- 如申請專利範圍第11項之電子裝置,進一步包含耦合至該第一封裝之該第二側的球柵陣列(BGA),其中,該BGA的每一個球的直徑大於該懸掛晶粒的高度, 且其中,該第一封裝透過該BGA與該主要PCB耦合。
- 如申請專利範圍第11項之電子裝置,其中,該第一封裝的第一元件的高度與該一或多個通孔條的高度相同。
- 如申請專利範圍第11項之電子裝置,其中,該電子裝置是行動電子裝置。
- 如申請專利範圍第16項之電子裝置,其中,該電子裝置是穿戴式電子裝置。
- 一種方法,包含:設置多數個電子元件及一或多個通孔條在模塑承載體上以形成第一封裝的晶圓;使用塑模化合物包覆模製該第一封裝的該晶圓;剝離用於該第一封裝的該模塑承載體;薄化該第一封裝的該晶圓的該塑模化合物以露出該第一封裝之頂側上的該等通孔條與第一電子元件的連接;以及施加第二封裝於該第一封裝的該第一電子元件與該等通孔條的該等連接上以形成堆疊式封裝。
- 如申請專利範圍第18項之方法,其中,設置該多數個電子元件包括設置一或多個以下任意者:封裝的元件;主動或積體電路元件;或被動元件。
- 如申請專利範圍第18項之方法,其中,該第一 封裝的該第一元件的高度與該第一封裝的該一或多個通孔條的高度相同。
- 如申請專利範圍第18項之方法,進一步包括含施加介電晶粒層及重佈層(RDL)於該第一封裝的底側上。
- 如申請專利範圍第21項之方法,進一步包括可選地施加介電層及RDL層於該第一封裝的頂側上。
- 如申請專利範圍第18項之方法,進一步包括耦合該第一封裝與主機板。
- 如申請專利範圍第23項之方法,進一步包括耦合懸掛晶粒與該第一封裝的該底側。
- 如申請專利範圍第24項之方法,其中,耦合該懸掛晶粒與該第一封裝的該底側包括在該懸掛晶粒與該主機板之間維持一間隙,使得該懸掛晶粒不與該主機板的表面接觸。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
WOPCT/US15/59088 | 2015-11-04 | ||
PCT/US2015/059088 WO2017078709A1 (en) | 2015-11-04 | 2015-11-04 | Three-dimensional small form factor system in package architecture |
Publications (2)
Publication Number | Publication Date |
---|---|
TW201727864A true TW201727864A (zh) | 2017-08-01 |
TWI715642B TWI715642B (zh) | 2021-01-11 |
Family
ID=58662270
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW105132078A TWI715642B (zh) | 2015-11-04 | 2016-10-04 | 三維封裝裝置及其方法與電子裝置 |
Country Status (3)
Country | Link |
---|---|
US (1) | US10483250B2 (zh) |
TW (1) | TWI715642B (zh) |
WO (1) | WO2017078709A1 (zh) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI795100B (zh) * | 2020-12-04 | 2023-03-01 | 聯發科技股份有限公司 | 具有改進的可靠性的半導體封裝 |
TWI808115B (zh) * | 2018-04-04 | 2023-07-11 | 美商英特爾公司 | 半導體封裝體、半導體封裝系統及形成半導體封裝體之方法 |
Families Citing this family (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10483250B2 (en) * | 2015-11-04 | 2019-11-19 | Intel Corporation | Three-dimensional small form factor system in package architecture |
US9825597B2 (en) | 2015-12-30 | 2017-11-21 | Skyworks Solutions, Inc. | Impedance transformation circuit for amplifier |
US10062670B2 (en) | 2016-04-18 | 2018-08-28 | Skyworks Solutions, Inc. | Radio frequency system-in-package with stacked clocking crystal |
DE102016110862B4 (de) * | 2016-06-14 | 2022-06-30 | Snaptrack, Inc. | Modul und Verfahren zur Herstellung einer Vielzahl von Modulen |
US10515924B2 (en) * | 2017-03-10 | 2019-12-24 | Skyworks Solutions, Inc. | Radio frequency modules |
US10943869B2 (en) | 2017-06-09 | 2021-03-09 | Apple Inc. | High density interconnection using fanout interposer chiplet |
CN111133575A (zh) | 2017-12-29 | 2020-05-08 | 英特尔公司 | 具有通信网络的微电子组件 |
SG11202004563VA (en) | 2017-12-29 | 2020-07-29 | Intel Corp | Patch accomodating embedded dies having different thicknesses |
US11342305B2 (en) | 2017-12-29 | 2022-05-24 | Intel Corporation | Microelectronic assemblies with communication networks |
US10742217B2 (en) | 2018-04-12 | 2020-08-11 | Apple Inc. | Systems and methods for implementing a scalable system |
US10535608B1 (en) * | 2018-07-24 | 2020-01-14 | International Business Machines Corporation | Multi-chip package structure having chip interconnection bridge which provides power connections between chip and package substrate |
US10803548B2 (en) | 2019-03-15 | 2020-10-13 | Intel Corporation | Disaggregation of SOC architecture |
CN112490129A (zh) * | 2019-09-11 | 2021-03-12 | 华邦电子股份有限公司 | 半导体封装及其制造方法 |
JP2021048567A (ja) * | 2019-09-20 | 2021-03-25 | 株式会社村田製作所 | 高周波モジュールおよび通信装置 |
CN112563249A (zh) * | 2019-09-25 | 2021-03-26 | 江苏长电科技股份有限公司 | 集成封装结构 |
US11164817B2 (en) | 2019-11-01 | 2021-11-02 | International Business Machines Corporation | Multi-chip package structures with discrete redistribution layers |
US11094637B2 (en) | 2019-11-06 | 2021-08-17 | International Business Machines Corporation | Multi-chip package structures having embedded chip interconnect bridges and fan-out redistribution layers |
JP2021145290A (ja) * | 2020-03-13 | 2021-09-24 | 株式会社村田製作所 | 高周波モジュールおよび通信装置 |
WO2024036450A1 (zh) * | 2022-08-15 | 2024-02-22 | 广东省科学院半导体研究所 | 填埋式三维扇出封装结构及其制备方法 |
Family Cites Families (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20070163109A1 (en) * | 2005-12-29 | 2007-07-19 | Hem Takiar | Strip for integrated circuit packages having a maximized usable area |
US7741707B2 (en) | 2006-02-27 | 2010-06-22 | Stats Chippac Ltd. | Stackable integrated circuit package system |
TWI305407B (en) * | 2006-05-22 | 2009-01-11 | Advanced Semiconductor Eng | Package structure and lead frame using the same |
DE102006059317A1 (de) * | 2006-07-04 | 2008-01-10 | Evonik Degussa Gmbh | Verfahren zur Herstellung von β-Amino-α-hydroxy-carbonsäureamiden |
US8548140B2 (en) * | 2007-06-13 | 2013-10-01 | I D You, Llc | Providing audio announcement to called parties |
KR20100046760A (ko) * | 2008-10-28 | 2010-05-07 | 삼성전자주식회사 | 반도체 패키지 |
US8866301B2 (en) * | 2010-05-18 | 2014-10-21 | Taiwan Semiconductor Manufacturing Company, Ltd. | Package systems having interposers with interconnection structures |
JP6025307B2 (ja) * | 2011-06-01 | 2016-11-16 | キヤノン株式会社 | 画像形成装置、画像形成装置の制御方法、及びプログラム |
US9128123B2 (en) * | 2011-06-03 | 2015-09-08 | Taiwan Semiconductor Manufacturing Company, Ltd. | Interposer test structures and methods |
US9881894B2 (en) * | 2012-03-08 | 2018-01-30 | STATS ChipPAC Pte. Ltd. | Thin 3D fan-out embedded wafer level package (EWLB) for application processor and memory integration |
ITVI20120060A1 (it) * | 2012-03-19 | 2013-09-20 | St Microelectronics Srl | Sistema elettronico avente un' aumentata connessione tramite l'uso di canali di comunicazione orizzontali e verticali |
US10115671B2 (en) * | 2012-08-03 | 2018-10-30 | Snaptrack, Inc. | Incorporation of passives and fine pitch through via for package on package |
US8975726B2 (en) | 2012-10-11 | 2015-03-10 | Taiwan Semiconductor Manufacturing Company, Ltd. | POP structures and methods of forming the same |
US9196586B2 (en) * | 2014-02-13 | 2015-11-24 | Taiwan Semiconductor Manufacturing Company, Ltd. | Semiconductor package including an embedded surface mount device and method of forming the same |
US10381326B2 (en) * | 2014-05-28 | 2019-08-13 | Invensas Corporation | Structure and method for integrated circuits packaging with increased density |
US20160086930A1 (en) * | 2014-09-24 | 2016-03-24 | Freescale Semiconductor, Inc. | Fan-out wafer level package containing back-to-back embedded microelectronic components and assembly method therefor |
CN107924899B (zh) * | 2015-08-27 | 2023-05-02 | 英特尔公司 | 多管芯封装 |
US9780077B2 (en) * | 2015-09-10 | 2017-10-03 | Nxp Usa, Inc. | System-in-packages containing preassembled surface mount device modules and methods for the production thereof |
US10483250B2 (en) * | 2015-11-04 | 2019-11-19 | Intel Corporation | Three-dimensional small form factor system in package architecture |
KR20170075125A (ko) * | 2015-12-22 | 2017-07-03 | 에스케이하이닉스 주식회사 | 반도체 패키지 및 제조 방법 |
US9984992B2 (en) * | 2015-12-30 | 2018-05-29 | Invensas Corporation | Embedded wire bond wires for vertical integration with separate surface mount and wire bond mounting surfaces |
US10050024B2 (en) * | 2016-06-17 | 2018-08-14 | Taiwan Semiconductor Manufacturing Company Ltd. | Semiconductor package and manufacturing method of the same |
US10181456B2 (en) * | 2017-03-16 | 2019-01-15 | Intel Corporation | Multi-package integrated circuit assembly with package on package interconnects |
US10475766B2 (en) * | 2017-03-29 | 2019-11-12 | Intel Corporation | Microelectronics package providing increased memory component density |
US11304290B2 (en) * | 2017-04-07 | 2022-04-12 | Taiwan Semiconductor Manufacturing Company, Ltd. | Semiconductor structures and methods |
-
2015
- 2015-11-04 US US15/765,992 patent/US10483250B2/en active Active
- 2015-11-04 WO PCT/US2015/059088 patent/WO2017078709A1/en active Application Filing
-
2016
- 2016-10-04 TW TW105132078A patent/TWI715642B/zh active
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI808115B (zh) * | 2018-04-04 | 2023-07-11 | 美商英特爾公司 | 半導體封裝體、半導體封裝系統及形成半導體封裝體之方法 |
US11735570B2 (en) | 2018-04-04 | 2023-08-22 | Intel Corporation | Fan out packaging pop mechanical attach method |
TWI795100B (zh) * | 2020-12-04 | 2023-03-01 | 聯發科技股份有限公司 | 具有改進的可靠性的半導體封裝 |
US11854924B2 (en) | 2020-12-04 | 2023-12-26 | Mediatek Inc. | Semiconductor package with improved reliability |
Also Published As
Publication number | Publication date |
---|---|
US20180286840A1 (en) | 2018-10-04 |
WO2017078709A1 (en) | 2017-05-11 |
US10483250B2 (en) | 2019-11-19 |
TWI715642B (zh) | 2021-01-11 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
TWI715642B (zh) | 三維封裝裝置及其方法與電子裝置 | |
US9839127B2 (en) | System of package (SoP) module and mobile computing device having the SoP | |
US9633973B2 (en) | Semiconductor package | |
TWI497672B (zh) | 堆疊器件中之信號傳遞 | |
US9653372B2 (en) | Method for fabricating fan-out wafer level package and fan-out wafer level package fabricated thereby | |
EP2956962B1 (en) | Semiconductor device having stacked memory elements and method of stacking memory elements on a semiconductor device | |
EP3198643A1 (en) | Integration of electronic elements on the backside of a semiconductor die | |
TW201724926A (zh) | 具有被動元件的低剖面封裝 | |
CN105720049A (zh) | 负鼠晶片封装叠加设备 | |
CN104966702A (zh) | 半导体封装件 | |
US20200066640A1 (en) | Hybrid technology 3-d die stacking | |
US20140374900A1 (en) | Semiconductor package and method of fabricating the same | |
US20180286780A1 (en) | Integrated antenna for direct chip attach connectivity module package structures | |
CN103869331A (zh) | 一种卫星导航三维芯片及其制造方法 | |
CN203054227U (zh) | 一种射频、基带一体化的卫星导航接收芯片 | |
US20170372989A1 (en) | Exposed side-wall and lga assembly | |
US20230230923A1 (en) | Microelectronic die including swappable phy circuitry and semiconductor package including same | |
US20140239434A1 (en) | Semiconductor package | |
CN103872035A (zh) | 一种卫星导航三维芯片及其制造方法 | |
JP5966252B2 (ja) | 通信モジュール | |
WO2024065390A1 (en) | Methods and apparatus to manufacture coupled inductor | |
WO2023129783A9 (en) | Microelectronic die including swappable phy circuitry and semiconductor package including same | |
KR20160071701A (ko) | 반도체 패키지, 모듈 기판 및 이를 포함하는 반도체 패키지 모듈 | |
CN117795670A (zh) | 包括可交换phy电路装置的微电子管芯和包括该微电子管芯的半导体封装 |