TW201708897A - 光照射裝置 - Google Patents
光照射裝置 Download PDFInfo
- Publication number
- TW201708897A TW201708897A TW105106149A TW105106149A TW201708897A TW 201708897 A TW201708897 A TW 201708897A TW 105106149 A TW105106149 A TW 105106149A TW 105106149 A TW105106149 A TW 105106149A TW 201708897 A TW201708897 A TW 201708897A
- Authority
- TW
- Taiwan
- Prior art keywords
- workpiece
- light irradiation
- irradiation device
- holding
- light
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B2006/12166—Manufacturing methods
- G02B2006/12169—Annealing
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Liquid Crystal (AREA)
- Optics & Photonics (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2015075982A JP5983810B1 (ja) | 2015-04-02 | 2015-04-02 | 光照射装置 |
Publications (1)
Publication Number | Publication Date |
---|---|
TW201708897A true TW201708897A (zh) | 2017-03-01 |
Family
ID=56843266
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW105106149A TW201708897A (zh) | 2015-04-02 | 2016-03-01 | 光照射裝置 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP5983810B1 (ja) |
KR (1) | KR20160118943A (ja) |
CN (1) | CN205539851U (ja) |
TW (1) | TW201708897A (ja) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2019123517A1 (ja) * | 2017-12-18 | 2019-06-27 | 株式会社Fuji | 作業装置及びその制御方法 |
CN108594539B (zh) * | 2018-03-12 | 2021-09-17 | 昆山龙腾光电股份有限公司 | 配向方法与配向系统 |
CN108761926A (zh) * | 2018-05-09 | 2018-11-06 | 深圳市华星光电技术有限公司 | 配向微观检测设备及配向检测方法 |
JP7342680B2 (ja) * | 2019-12-18 | 2023-09-12 | ウシオ電機株式会社 | 光照射装置および光照射方法 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05344105A (ja) | 1992-06-08 | 1993-12-24 | Nippon Telegr & Teleph Corp <Ntt> | 誤り除去通信方法 |
JP2009085865A (ja) * | 2007-10-02 | 2009-04-23 | Olympus Corp | 基板検査装置 |
JP4495752B2 (ja) * | 2007-11-06 | 2010-07-07 | 東京エレクトロン株式会社 | 基板処理装置及び塗布装置 |
JP5344105B1 (ja) * | 2013-03-08 | 2013-11-20 | ウシオ電機株式会社 | 光配向用偏光光照射装置及び光配向用偏光光照射方法 |
KR102222005B1 (ko) * | 2014-01-09 | 2021-03-04 | 삼성디스플레이 주식회사 | 노광 장치 및 이를 이용한 노광 방법 |
JP2014123769A (ja) | 2014-03-06 | 2014-07-03 | Tokyo Ohka Kogyo Co Ltd | 紫外線照射装置および紫外線照射方法 |
JP5734494B1 (ja) * | 2014-05-29 | 2015-06-17 | 株式会社飯沼ゲージ製作所 | 光配向処理装置 |
-
2015
- 2015-04-02 JP JP2015075982A patent/JP5983810B1/ja not_active Expired - Fee Related
-
2016
- 2016-03-01 TW TW105106149A patent/TW201708897A/zh unknown
- 2016-03-25 KR KR1020160036282A patent/KR20160118943A/ko unknown
- 2016-04-01 CN CN201620270687.5U patent/CN205539851U/zh active Active
Also Published As
Publication number | Publication date |
---|---|
KR20160118943A (ko) | 2016-10-12 |
JP5983810B1 (ja) | 2016-09-06 |
CN205539851U (zh) | 2016-08-31 |
JP2016197140A (ja) | 2016-11-24 |
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