TW201702392A - Alloy material, contact probe and connecting terminal - Google Patents

Alloy material, contact probe and connecting terminal Download PDF

Info

Publication number
TW201702392A
TW201702392A TW105110500A TW105110500A TW201702392A TW 201702392 A TW201702392 A TW 201702392A TW 105110500 A TW105110500 A TW 105110500A TW 105110500 A TW105110500 A TW 105110500A TW 201702392 A TW201702392 A TW 201702392A
Authority
TW
Taiwan
Prior art keywords
alloy material
contact
weight
plunger
probe
Prior art date
Application number
TW105110500A
Other languages
Chinese (zh)
Inventor
風間俊男
谷幸央
荘司哲
安楽照男
相之谷正之
久保田智大
豊武孝太郎
安部一志
Original Assignee
日本發條股份有限公司
山本貴金屬地金股份有限公司
神鋼金屬製造有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日本發條股份有限公司, 山本貴金屬地金股份有限公司, 神鋼金屬製造有限公司 filed Critical 日本發條股份有限公司
Publication of TW201702392A publication Critical patent/TW201702392A/en

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C9/00Alloys based on copper
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C9/00Alloys based on copper
    • C22C9/06Alloys based on copper with nickel or cobalt as the next major constituent
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R1/00Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
    • G01R1/02General constructional details
    • G01R1/06Measuring leads; Measuring probes
    • G01R1/067Measuring probes
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R1/00Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
    • G01R1/02General constructional details
    • G01R1/06Measuring leads; Measuring probes
    • G01R1/067Measuring probes
    • G01R1/073Multiple probes

Abstract

An alloy material of the present invention comprises copper (Cu) as a main component. Further, 10 to 30 wt% of silver (Ag) and 0.5 to 10 wt% of the nickel (Ni) are added therein. Herewith the material alloy that has no film but excellent Sn corrosion resistance is provided. Also, a contact probe and a connecting terminal comprising the material alloy are provided.

Description

合金材料、接觸探針及連接端子 Alloy material, contact probe and connection terminal

本發明係關於例如合金材料,且關於由該合金材料所構成之用於半導體積體電路或液晶顯示裝置等檢查對象的導電狀態檢查或操作特性檢查之接觸探針,以及連接電接點彼此之間的連接端子。 The present invention relates to, for example, an alloy material, and a contact probe composed of the alloy material for conducting state inspection or operation characteristic inspection of an inspection object such as a semiconductor integrated circuit or a liquid crystal display device, and connecting electric contacts to each other Connection terminal between.

以往,在進行半導體積體電路、液晶面板等檢查對象的導電狀態檢查或操作特性檢查時,使用一種導電性的接觸探針,其係謀求檢查對象與具有輸出檢查用訊號的電路基板之訊號處理裝置之間的電性連接。為了進行正確的導電狀態檢查及操作特性檢查,必須確實地進行透過接觸探針之檢查用訊號的輸出入。 In the past, when conducting a conductive state inspection or an operation characteristic inspection of an inspection object such as a semiconductor integrated circuit or a liquid crystal panel, a conductive contact probe is used, which is intended to perform signal processing of an inspection target and a circuit substrate having an output inspection signal. Electrical connection between the devices. In order to perform an accurate inspection of the conductive state and the inspection of the operational characteristics, it is necessary to surely perform the input and output of the inspection signal through the contact probe.

接觸探針係以反覆接觸於半導體積體電路或液晶顯示裝置等檢查對象物的方式使用。此時,例如由於反覆的使用導致接觸探針劣化時,會對檢查結果造成影響。特別是如鍍錫(Sn)的電極等檢查對象較為柔軟時,電極的鍍Sn容易附著於接觸探針表面,因鍍Sn的附著產生電阻值的改變,而難以進行安定的檢查。因此,接觸探針 所使用的材料,必須是即使反覆接觸仍不易磨損且相較於檢查對象有高的硬度、高的導電性、耐蝕性及良好的耐氧化性。對於此要求,為了提升Sn耐蝕性,例如提出了對接觸探針頭的前端部塗佈碳皮膜之技術或施行鍍覆銠(Rh)之技術等(例如參照專利文獻1、2)。 The contact probe is used in such a manner as to repeatedly contact an object to be inspected such as a semiconductor integrated circuit or a liquid crystal display device. At this time, for example, when the contact probe is deteriorated due to the repeated use, the inspection result is affected. In particular, when the object to be inspected such as a tin-plated (Sn) electrode is relatively soft, the Sn plating of the electrode is likely to adhere to the surface of the contact probe, and the resistance value is changed due to the adhesion of the Sn plating, and it is difficult to perform the stability inspection. Therefore, the contact probe The material to be used must be hard to wear even if it is repeatedly contacted, and has high hardness, high electrical conductivity, corrosion resistance, and good oxidation resistance as compared with the object to be inspected. In order to improve the corrosion resistance of Sn, for example, a technique of applying a carbon film to the tip end portion of the contact probe head or a technique of performing a plating ruthenium (Rh) has been proposed (for example, refer to Patent Documents 1 and 2).

[先前技術文獻] [Previous Technical Literature] [專利文獻] [Patent Literature]

[專利文獻1]日本特開平10-226874號公報 [Patent Document 1] Japanese Patent Laid-Open No. Hei 10-226874

[專利文獻2]日本特開2002-131334號公報 [Patent Document 2] Japanese Patent Laid-Open Publication No. 2002-131334

然而,上述各式的塗佈技術或鍍覆技術中,可能會有因與檢查對象的反覆接觸造成皮膜剝落,以異物附著於檢查對象進而引起導電不良之情況。因此,期望係以沒有皮膜剝落的疑慮之無垢材來製作接觸探針頭。 However, in the coating technique or the plating technique of the above various types, there is a possibility that the film peels off due to the repeated contact with the inspection object, and the foreign matter adheres to the inspection object to cause a conduction failure. Therefore, it is desirable to make a contact probe head with a non-fouling material which has no doubt of peeling off of the film.

本發明係有鑑於上述課題而研發者,其目的在於提供一種不具有皮膜且Sn耐蝕性優異之合金材料、由該合金材料所構成之接觸探針及連接端子。 The present invention has been made in view of the above problems, and an object of the invention is to provide an alloy material which does not have a film and has excellent Sn corrosion resistance, and a contact probe and a connection terminal formed of the alloy material.

為了解決上述課題並達成目的,本發明之合金材料,係以銅(Cu)為主成分,並添加有10至30wt%之銀(Ag)、及0.5至10wt%之鎳(Ni)。 In order to solve the above problems and achieve the object, the alloy material of the present invention contains copper (Cu) as a main component, and 10 to 30% by weight of silver (Ag) and 0.5 to 10% by weight of nickel (Ni) are added.

又,本發明之合金材料係在上述發明中, 更添加有5至20wt%之鈀(Pd)。 Further, the alloy material of the present invention is in the above invention, Further, 5 to 20% by weight of palladium (Pd) is added.

又,本發明之合金材料係在上述發明中,更添加有0.5至5wt%之錫(Sn)。 Further, in the alloy material of the present invention, in the above invention, 0.5 to 5 wt% of tin (Sn) is further added.

又,本發明之合金材料係在上述發明中,更添加有0.01至0.1wt%之銥(Ir)及釕(Ru)中的任一種或該等元素之組合。 Further, in the alloy material of the present invention, in the above invention, 0.01 to 0.1% by weight of any one of iridium (Ir) and ruthenium (Ru) or a combination of the elements is further added.

再者,本發明之接觸探針,係在長度方向的兩端分別與接觸對象接觸之導電性的接觸探針,其至少一部分係使用上述發明之合金材料形成。 Further, the contact probe of the present invention is a conductive contact probe that is in contact with a contact object at both ends in the longitudinal direction, and at least a part thereof is formed using the alloy material of the above invention.

又,本發明之接觸探針係在上述發明中,具有:導電性的第1柱塞,係在一端與一方的接觸對象接觸;導電性的第2柱塞,係在一端與另一方的接觸對象接觸;以及線圈彈簧,係設置於前述第1與第2柱塞之間而伸縮自如地連結該第1與第2柱塞;而前述第1柱塞、前述第2柱塞及前述線圈彈簧中至少一者係由前述合金材料所構成。 Further, in the above-described invention, the contact probe of the present invention has a conductive first plunger that is in contact with one of the contact objects at one end, and a conductive second plunger that is in contact with the other end at one end. And the coil spring is disposed between the first and second plungers to expand and contract the first and second plungers; and the first plunger, the second plunger, and the coil spring At least one of them is composed of the aforementioned alloy material.

又,本發明之連接端子,係在長度方向的兩端分別與接觸對象接觸之導電性的連接端子,其至少一部分係使用上述發明之合金材料形成。 Further, the connection terminal of the present invention is a conductive connection terminal that is in contact with a contact object at both ends in the longitudinal direction, and at least a part thereof is formed using the alloy material of the above invention.

根據本發明,設為以Cu為主成分,並添加有10至30wt%之銀(Ag)、及0.5至10wt%之鎳(Ni),故不具有皮膜,可發揮Sn耐蝕性優異,且可用來作為接觸探針或連接端子而得到導電性/加工性/硬度均為優異之合金材料 的效果。 According to the present invention, since Cu is contained as a main component and 10 to 30% by weight of silver (Ag) and 0.5 to 10% by weight of nickel (Ni) are added, the film is not provided, and Sn corrosion resistance is excellent and available. As a contact probe or a connection terminal, an alloy material excellent in electrical conductivity, workability, and hardness is obtained. Effect.

1‧‧‧插座 1‧‧‧ socket

2‧‧‧接觸探針(探針) 2‧‧‧Contact probe (probe)

3‧‧‧探針支架 3‧‧‧ probe holder

4‧‧‧支架構件 4‧‧‧ bracket components

21‧‧‧第1柱塞 21‧‧‧1st plunger

22‧‧‧第2柱塞 22‧‧‧2nd plunger

23‧‧‧線圈彈簧 23‧‧‧ coil spring

23a‧‧‧緊密捲繞部 23a‧‧‧Compact Winding Department

23b‧‧‧寬鬆捲繞部 23b‧‧‧ Loose winding department

31‧‧‧第1構件 31‧‧‧1st component

32‧‧‧第2構件 32‧‧‧2nd component

33、34‧‧‧支架孔 33, 34‧‧‧ bracket holes

100‧‧‧半導體積體電路 100‧‧‧Semiconductor integrated circuit

101‧‧‧連接用電極 101‧‧‧Connecting electrode

200‧‧‧電路基板 200‧‧‧ circuit substrate

201‧‧‧電極 201‧‧‧ electrodes

第1圖係表示本發明之實施形態的合金材料之一使用態樣的插座之概略構成的透視圖。 Fig. 1 is a perspective view showing a schematic configuration of a socket in which one of the alloy materials according to the embodiment of the present invention is used.

第2圖係表示本發明之實施形態的合金材料之一使用態樣的插座之主要部分的構成之部分剖面圖。 Fig. 2 is a partial cross-sectional view showing the configuration of a main part of a socket in which one of the alloy materials according to the embodiment of the present invention is used.

第3圖係表示本發明之實施形態的合金材料之一使用態樣的插座,在檢查半導體積體電路時之插座的主要部分之構成的部分剖面圖。 Fig. 3 is a partial cross-sectional view showing the configuration of a main portion of a socket when one of the alloy materials of the embodiment of the present invention is used, and the semiconductor integrated circuit is inspected.

以下,將與圖式一起詳細說明用以實施本發明之形態。此外,本發明並非限定於以下的實施形態。又,在以下的說明中所參照的各圖,只不過在能夠理解本發明之內容的程度內概略性地表示形狀、大小及位置關係。亦即,本發明並非只限定於各圖所例示的形狀、大小及位置關係。 Hereinafter, the form for carrying out the invention will be described in detail with reference to the drawings. Further, the present invention is not limited to the following embodiments. In addition, in each of the drawings referred to in the following description, the shape, the size, and the positional relationship are schematically shown to the extent that the contents of the present invention can be understood. That is, the present invention is not limited to the shapes, sizes, and positional relationships illustrated in the respective drawings.

對本發明的實施形態之合金材料加以說明。本發明係以銅(Cu)為主成分的合金材料。Cu雖表現高的導電性,但其耐氧化性稍差、硬度亦低。因此,藉由添加銀(Ag)、鎳(Ni)作為對Cu的添加元素,試圖提升導電性、硬度、耐氧化性及錫(Sn)耐蝕性。 The alloy material of the embodiment of the present invention will be described. The present invention is an alloy material mainly composed of copper (Cu). Although Cu exhibits high conductivity, its oxidation resistance is slightly inferior and its hardness is low. Therefore, by adding silver (Ag) or nickel (Ni) as an additive element to Cu, it is attempted to improve conductivity, hardness, oxidation resistance, and tin (Sn) corrosion resistance.

Ag之導電性/耐氧化性優異,而且,藉由進行時效處理使已固溶於Cu中的Ag析出,可期待硬度提 升。由於時效析出硬化係在Ag添加量少時不易發生,故期望添加10wt%以上之Ag。但添加到超過30wt%時Sn耐蝕性會劣化,因此不佳。 Ag is excellent in conductivity and oxidation resistance, and by performing aging treatment, Ag which has been dissolved in Cu is precipitated, and hardness can be expected Rise. Since the aging precipitation hardening is less likely to occur when the amount of Ag added is small, it is desirable to add 10% by weight or more of Ag. However, when added to more than 30% by weight, Sn corrosion resistance is deteriorated, which is not preferable.

更進一步,在本實施形態之合金材料中添加0.5至10wt%之Ni。Ni具有Sn耐蝕性提升/硬度提升之效果。當未達0.5wt%時無法得到Sn耐蝕性,超過10wt%時加工性會劣化,係屬不佳。 Further, 0.5 to 10% by weight of Ni is added to the alloy material of the present embodiment. Ni has the effect of improving corrosion resistance/hardness of Sn. When it is less than 0.5% by weight, Sn corrosion resistance cannot be obtained, and when it exceeds 10% by weight, workability is deteriorated, which is poor.

又,於上述組成的合金材料中,更可添加5至20wt%之鈀(Pd)。Pd之耐氧化性優異,亦可藉由添加而期待硬度的提升。當Pd添加量少時,對耐氧化性提升/硬度提升並無效果,故期待添加5wt%以上之Pd。但添加到超過20wt%時導電性/Sn耐蝕性會降低,因此不佳。 Further, in the alloy material of the above composition, 5 to 20% by weight of palladium (Pd) may be further added. Pd is excellent in oxidation resistance, and it is also expected to increase hardness by adding. When the amount of Pd added is small, there is no effect on the improvement in oxidation resistance/hardness increase, and it is expected to add Pwt of 5 wt% or more. However, when added to more than 20% by weight, the conductivity/Sn corrosion resistance is lowered, which is not preferable.

又,對於上述組成的合金材料,更可添加0.5至5wt%之Sn。藉由Sn的添加,可抑制來自外部的Sn附著,亦可期待硬度提升。當Sn添加量少時,對Sn耐蝕性提升/硬度提升並無效果,故期待添加0.5wt%以上之Sn。但添加到超過5wt%時加工性會降低,因此不佳。 Further, for the alloy material of the above composition, 0.5 to 5 wt% of Sn may be further added. By the addition of Sn, it is possible to suppress the adhesion of Sn from the outside, and it is also expected to increase the hardness. When the amount of Sn added is small, there is no effect on the improvement of Sn corrosion resistance/hardness increase, so it is expected to add 0.5 wt% or more of Sn. However, when added to more than 5% by weight, workability is lowered, which is not preferable.

又,對於上述組成的合金材料,更可添加有0.01至0.1wt%之銥(Ir)、釕(Ru)中的任一種或該等元素之組合。該等添加金屬係有利於加工性,且相較於未添加者,其減少壓延加工時合金表面產生之細微的裂痕,進而改善加工性。Ir、Ru中的任一種或該等元素之組合的添加量即使超過0.1wt%時仍不會改變效果,故以0.01至0.1wt%為適量。Ir、Ru具有使結晶粒微細化的作用,當結晶粒較 小,在壓延加工時便不易產生粒界裂痕。 Further, for the alloy material having the above composition, 0.01 to 0.1% by weight of any one of iridium (Ir) and ruthenium (Ru) or a combination of these elements may be added. These added metals are advantageous for workability, and compared with those which are not added, they reduce minute cracks generated on the surface of the alloy during the calendering process, thereby improving workability. The addition amount of any of Ir, Ru or a combination of these elements does not change the effect even if it exceeds 0.1% by weight, so it is an appropriate amount of 0.01 to 0.1% by weight. Ir and Ru have the effect of refining crystal grains, when crystal grains are compared Small, it is not easy to produce grain boundary cracks during calendering.

根據上述的實施形態,設為以Cu為主成分,且添加有10至30wt%之Ag、0.5至10wt%之Ni,故可得到於導電性、硬度、耐氧化性、Sn耐蝕性優異的合金材料作為接觸探針。 According to the above-described embodiment, since Cu is contained as a main component and 10 to 30% by weight of Ag and 0.5 to 10% by weight of Ni are added, an alloy excellent in conductivity, hardness, oxidation resistance, and Sn corrosion resistance can be obtained. The material acts as a contact probe.

其次,說明將本實施形態之合金材料作為接觸探針使用的情況。第1圖係表示本發明之實施形態的合金材料之一使用態樣的插座(接觸探針)之概略構成的透視圖。第1圖所示之插座1係在進行作為檢查對象物之半導體積體電路100的電特性檢查時所使用的裝置,且為電性連接半導體積體電路100與朝半導體積體電路100輸出檢查用訊號的電路基板200之間的裝置。 Next, the case where the alloy material of this embodiment is used as a contact probe will be described. Fig. 1 is a perspective view showing a schematic configuration of a socket (contact probe) in which one of the alloy materials according to the embodiment of the present invention is used. The socket 1 shown in FIG. 1 is a device used for performing electrical characteristic inspection of the semiconductor integrated circuit 100 as an inspection object, and is electrically connected to the semiconductor integrated circuit 100 and outputs an inspection to the semiconductor integrated circuit 100. A device between the circuit boards 200 with signals.

插座1係具有:複數個接觸探針2(以下簡稱「探針2」),係在長度方向之一方的端部側與作為被接觸體之半導體積體電路100的一個電極(接觸對象)接觸,而在另一方的端部側分別與電路基板200的電極(接觸對象)接觸;探針支架3,係將複數個探針2依照預定的圖案收納並保持;以及支架構件4,係設置於探針支架3的周圍,在檢查時對與複數個探針2接觸之半導體積體電路100產生位置偏移者予以抑制。 The socket 1 has a plurality of contact probes 2 (hereinafter referred to as "probe 2"), and is in contact with one electrode (contact object) of the semiconductor integrated circuit 100 as a contacted body on one end side in the longitudinal direction. And contacting the electrode (contact object) of the circuit substrate 200 on the other end side; the probe holder 3 houses and holds the plurality of probes 2 in accordance with a predetermined pattern; and the holder member 4 is disposed on Around the probe holder 3, the positional deviation of the semiconductor integrated circuit 100 that is in contact with the plurality of probes 2 is suppressed at the time of inspection.

第2圖係表示有關本實施形態的合金材料之一使用態樣的插座(接觸探針)之主要部分的構成之部分剖面圖,且係表示探針支架3所收納的探針2之詳細構成之圖。第2圖所示之探針2具備:第1柱塞21,係在進行 半導體積體電路100的檢查時,與該半導體積體電路100的連接用電極接觸;第2柱塞22,係與具有檢查電路的電路基板200之電極201接觸;以及線圈彈簧23,係設置於第1柱塞21與第2柱塞22之間而伸縮自如地連結第1柱塞21及第2柱塞22。構成探針2的第1柱塞21及第2柱塞22、以及線圈彈簧23係具有同一軸線。探針2當與半導體積體電路100接觸時,藉由線圈彈簧23向軸線方向進行伸縮,以緩和對於半導體積體電路100的連接用電極之衝撃,同時對半導體積體電路100及電路基板200施加荷重。 Fig. 2 is a partial cross-sectional view showing a configuration of a main portion of a socket (contact probe) in which one of the alloy materials of the present embodiment is used, and shows a detailed configuration of the probe 2 housed in the probe holder 3. Picture. The probe 2 shown in Fig. 2 includes a first plunger 21 and is being carried out. When the semiconductor integrated circuit 100 is inspected, it is in contact with the connection electrode of the semiconductor integrated circuit 100; the second plunger 22 is in contact with the electrode 201 of the circuit substrate 200 having the inspection circuit; and the coil spring 23 is provided in The first plunger 21 and the second plunger 22 are connected to each other between the first plunger 21 and the second plunger 22 so as to be expandable and contractible. The first plunger 21, the second plunger 22, and the coil spring 23 constituting the probe 2 have the same axis. When the probe 2 is in contact with the semiconductor integrated circuit 100, the coil spring 23 expands and contracts in the axial direction to relieve the connection of the connection electrode to the semiconductor integrated circuit 100, and simultaneously the semiconductor integrated circuit 100 and the circuit substrate 200. Apply a load.

第1柱塞21、第2柱塞22及線圈彈簧23之至少一者係使用上述合金材料而形成,且較佳係全部構件均使用該合金材料而形成。又,線圈彈簧23係以下述方式來設計線材的直徑、及經捲繞而成的直徑:施加有預定荷重時之寬鬆捲繞部23b的收縮量處於施加有初始荷重時,例如以成為較在探針2收納於探針支架3的狀態(參照第1圖)時之第2柱塞22的基端部與緊密捲繞部23a之間的最短距離更大的彈簧特性。藉由使用具有該彈簧特性的線圈彈簧23,可在對探針2施加預定荷重時,使基端部滑動接合於緊密捲繞部23a內,而可進行基端部與緊密捲繞部23a之間的電性導電。 At least one of the first plunger 21, the second plunger 22, and the coil spring 23 is formed using the above-described alloy material, and it is preferable that all of the members are formed using the alloy material. Further, the coil spring 23 is designed to have a diameter of the wire and a diameter to be wound in such a manner that the amount of contraction of the loosely wound portion 23b when a predetermined load is applied is when the initial load is applied, for example, When the probe 2 is housed in the state of the probe holder 3 (see FIG. 1 ), the shortest distance between the proximal end portion of the second plunger 22 and the tightly wound portion 23 a is greater. By using the coil spring 23 having the spring characteristic, the base end portion can be slidably engaged in the tightly wound portion 23a when a predetermined load is applied to the probe 2, and the base end portion and the tightly wound portion 23a can be performed. Electrical conduction between.

探針支架3係使用樹脂、可加工陶瓷、矽等絶緣性材料形成,且係第2圖之位於上表面側的第1構件31及位於下表面側的第2構件32積層而成。於第1構件 31及第2構件32中,分別形成相同數量個用以收容複數個探針2之支架孔33及34,而收容探針2的支架孔33及34係以彼此的軸線成一致的方式形成。支架孔33及34的形成位置係因應半導體積體電路100的配線圖案而決定。 The probe holder 3 is formed of an insulating material such as a resin, a machinable ceramic, or a crucible, and is formed by laminating a first member 31 on the upper surface side and a second member 32 on the lower surface side in FIG. The first member In the 31 and the second members 32, the same number of holder holes 33 and 34 for accommodating the plurality of probes 2 are respectively formed, and the holder holes 33 and 34 for accommodating the probes 2 are formed so as to coincide with each other. The positions at which the holder holes 33 and 34 are formed are determined in accordance with the wiring pattern of the semiconductor integrated circuit 100.

第3圖係表示本實施形態的合金材料之一使用態樣的插座(接觸探針),在檢查半導體積體電路時之插座的主要部分之構成的剖面圖,且係表示使用探針支架3的半導體積體電路100在檢查時之狀態的圖。在進行半導體積體電路100的檢查而線圈彈簧23被壓縮時,如第3圖所示,第2柱塞22的基端部會與緊密捲繞部23a的內圓周側滑動接合。此時,自電路基板200供應至半導體積體電路100的檢查用訊號,係經由第2柱塞22、緊密捲繞部23a、第1柱塞21而到達半導體積體電路100的連接用電極101。如此,在探針2中,由於第1柱塞21與第2柱塞22係透過緊密捲繞部23a進行導電,故可將電性訊號的導電路徑設成最小。所以,檢查時將防止訊號流動至寬鬆捲繞部23b,可謀求使電感降低及安定化。此外,在本實施例中,雖採用線圈彈簧具有寬鬆捲繞部與緊密捲繞部者加以說明,但使用僅由寬鬆捲繞部所構成的線圈彈簧亦無妨。 Fig. 3 is a cross-sectional view showing the configuration of a main portion of a socket in the case where the semiconductor integrated circuit is inspected, and shows the use of the probe holder 3 in the socket (contact probe) in which the alloy material of the embodiment is used. A diagram of the state of the semiconductor integrated circuit 100 at the time of inspection. When the coil integrated circuit is inspected and the coil spring 23 is compressed, as shown in FIG. 3, the proximal end portion of the second plunger 22 is slidably engaged with the inner circumferential side of the tightly wound portion 23a. At this time, the inspection signal supplied from the circuit board 200 to the semiconductor integrated circuit 100 reaches the connection electrode 101 of the semiconductor integrated circuit 100 via the second plunger 22, the tightly wound portion 23a, and the first plunger 21 . . As described above, in the probe 2, since the first plunger 21 and the second plunger 22 are electrically conducted through the tightly wound portion 23a, the conductive path of the electrical signal can be minimized. Therefore, during the inspection, the signal is prevented from flowing to the loose winding portion 23b, and the inductance can be lowered and stabilized. Further, in the present embodiment, the coil spring has a loosely wound portion and a tightly wound portion, but a coil spring composed of only a loosely wound portion may be used.

又,由於第1柱塞21的前端係形成為尖細,故即使在連接用電極101的表面形成氧化皮膜時,仍可刺破氧化皮膜,使第1柱塞21的前端與連接用電極101直接接觸。 Further, since the tip end of the first plunger 21 is formed to be tapered, even when an oxide film is formed on the surface of the connection electrode 101, the oxide film can be pierced, and the tip end of the first plunger 21 and the connection electrode 101 can be made. direct contact.

此外,在此所說明的探針2之構成只不過是 其中一例,亦可將上述的合金材料應用於以往已知的各種種類之探針。例如,其不限定於如上述之由柱塞與線圈彈簧所構成者,亦可為將具備管材構件的探針、彈簧針或金屬線撓曲成弓狀而獲得荷重之金屬線探針、連接電接點彼此之間的連接端子(連接器)。 In addition, the configuration of the probe 2 described herein is nothing more than In one example, the above alloy material may be applied to various types of probes known in the prior art. For example, it is not limited to the one described above by the plunger and the coil spring, and may be a wire probe that connects the probe, the pogo pin, or the metal wire having the pipe member into a bow shape to obtain a load. Connection terminals (connectors) between the electrical contacts.

在此,連接端子係連接電接點彼此之間者,例如如上述之探針2,係具備:分別與各電接點接觸之導電性的2個端子、以及可使各端子保持滑動的彈性構件(或保持構件)者。在如此之連接端子中,至少端子係由上述合金材料所構成。 Here, the connection terminal is connected to the electrical contacts, for example, the probe 2 described above, and has two conductive terminals that are in contact with the respective electrical contacts, and the elasticity that allows the terminals to slide. Member (or holding member). In such a connection terminal, at least the terminal is composed of the above alloy material.

(實施例) (Example)

以下將詳細說明本發明的合金材料之實施例及比較例。首先說明本實施例之合金材料的測定內容。 Examples and comparative examples of the alloy material of the present invention will be described in detail below. First, the measurement contents of the alloy material of the present embodiment will be described.

硬度試驗片係在溶解處理及時效處理後,經維氏硬度(時效材硬度)測定。 The hardness test piece was measured by Vickers hardness (hardness of aging material) after dissolution treatment and aging treatment.

導電度用的試驗片係藉由溶解處理及時效處理而製作。然後,使用電阻測定機來測定該導電度用的試驗片之電阻值,而求出導電度。 The test piece for conductivity was produced by a dissolution treatment and a aging treatment. Then, the electric resistance was determined by measuring the electric resistance value of the test piece for the electric conductivity using a resistance measuring machine.

Sn耐蝕性評價用的試驗片係依以下的方式而製作。以使前端直徑成為0.1mm的方式,對預先製作的導電度用之試驗片進行切削加工。藉由預定的彈力使試驗片接觸至鍍Sn板,以SEM觀察試驗片前端。Sn耐蝕性的評價,係以SEM觀察時如無Sn附著者設為○,而觀察到有附著者則設為×。 A test piece for evaluation of Sn corrosion resistance was produced in the following manner. The test piece for conductivity prepared in advance was subjected to cutting processing so that the diameter of the tip end was 0.1 mm. The test piece was brought into contact with the Sn-plated plate by a predetermined elastic force, and the front end of the test piece was observed by SEM. The evaluation of the corrosion resistance of Sn was performed by SEM observation, and if no Sn is attached, it is set to ○, and when it is observed that there is an attachment, it is set to ×.

加工性係依在先前的導電度用試驗片製作時之壓延加工、以及製作Sn耐蝕性評價用試驗片時之切削加工時的加工能否進行來予以評價。關於評價基準,只要進行壓延加工時未斷裂,且切削加工成針形狀時位於加工尺寸公差內就設為○,而位於公差外就設為×。 The workability was evaluated in accordance with the calendering process at the time of producing the test piece for conductivity and the processing at the time of cutting in the case of producing a test piece for evaluation of Sn corrosion resistance. The evaluation standard is set to ○ within the machining dimensional tolerance when the rolling process is not broken, and is within the machining dimensional tolerance when the machining is performed into a needle shape, and is set to × outside the tolerance.

其次,就本實施例之合金材料的各金屬的重量比比率加以說明。表1係表示實施例1至13及比較例1至7之合金材料的重量比比率(組成)與測定結果者。實施例1至13為本實施形態之範圍內的組成。比較例1至7為超出本實施形態之範圍的組成。 Next, the weight ratio of each metal of the alloy material of the present embodiment will be described. Table 1 shows the weight ratio (composition) and measurement results of the alloy materials of Examples 1 to 13 and Comparative Examples 1 to 7. Examples 1 to 13 are compositions within the scope of the present embodiment. Comparative Examples 1 to 7 are compositions which are outside the scope of the present embodiment.

以下就實施例1至13及比較例1至7的測定結果加以說明。實施例1至13為本實施形態之範圍內的組成。由實施例1至13可確認未觀察到Sn的附著而表現高的Sn耐蝕性。又,對於硬度/導電性/加工性仍呈現良好的結果。 The measurement results of Examples 1 to 13 and Comparative Examples 1 to 7 will be described below. Examples 1 to 13 are compositions within the scope of the present embodiment. From Examples 1 to 13, it was confirmed that Sn adhesion was exhibited without exhibiting adhesion of Sn. Also, good results were obtained for hardness/conductivity/processability.

比較例1為Ni添加量少之超出本實施形態之範圍的組成。相較於實施例1至13,比較例1係Sn附著多且Sn耐蝕性低。就比較例1而言,當Ni添加量少時Sn耐蝕性會劣化,可謂不佳。 Comparative Example 1 is a composition in which the amount of Ni added is less than the range of the present embodiment. Compared with Examples 1 to 13, Comparative Example 1 had a large amount of Sn adhesion and a low Sn corrosion resistance. In Comparative Example 1, when the amount of Ni added was small, the corrosion resistance of Sn deteriorated, which was not preferable.

比較例2為Ni添加量多之超出本實施形態之範圍的組成。比較例2並無法施行精密度優良的加工。就比較例2而言,當Ni添加量多時加工性會劣化,可謂不佳。 Comparative Example 2 is a composition in which the amount of addition of Ni is larger than the range of the present embodiment. In Comparative Example 2, it was impossible to perform processing with excellent precision. In Comparative Example 2, when the amount of Ni added was large, the workability was deteriorated, which was not preferable.

比較例3為Ag添加量少之超出本實施形態之範圍的組成。相較於實施例1至13,比較例3係硬度低且作為接觸探針用途方面並不佳。 Comparative Example 3 is a composition in which the amount of Ag added is less than the range of the present embodiment. Compared to Examples 1 to 13, Comparative Example 3 was low in hardness and was not preferable as a contact probe.

比較例4為Ag添加量多之超出本實施形態之範圍的組成。相較於實施例1至13,比較例4係Sn附著多且Sn耐蝕性低。就比較例4而言,當Ag添加量多時Sn耐蝕性會劣化,可謂不佳。 Comparative Example 4 is a composition in which the amount of Ag added is more than the range of the present embodiment. Compared with Examples 1 to 13, Comparative Example 4 has a large amount of Sn adhesion and a low Sn corrosion resistance. In Comparative Example 4, when the amount of Ag added was large, the corrosion resistance of Sn deteriorated, which was not preferable.

比較例5為Pd添加量多之超出本實施形態之範圍的組成。相較於實施例1至13,比較例5係Sn附著多且Sn耐蝕性低。就比較例5而言,當Pd添加量多時Sn耐蝕性會劣化,可謂不佳。 Comparative Example 5 is a composition in which the amount of Pd added is more than the range of the present embodiment. In Comparative Example 5, Sn was more attached and Sn corrosion resistance was lower than in Examples 1 to 13. In Comparative Example 5, when the amount of Pd added was large, the corrosion resistance of Sn deteriorated, which was not preferable.

比較例6為Sn添加量多之超出本實施形態之範圍的組成。比較例6係在壓延加工時產生裂紋,無法施行導電度用試驗片的加工。根據比較例6,可以說當Sn添加量多時加工性會劣化,可謂不佳。 Comparative Example 6 is a composition in which the amount of addition of Sn is much larger than the range of the present embodiment. In Comparative Example 6, cracks occurred during the rolling process, and the test piece for conductivity was not processed. According to Comparative Example 6, it can be said that when the amount of addition of Sn is large, the workability is deteriorated, which is not preferable.

比較例7為由Cu、Ag、Pd、錳(Mn)及Ir所構成之超出本實施形態之範圍的組成。相較於實施例1至13,比較例7係硬度雖大但切削加工性差,Sn耐蝕性亦不佳。就比較例7而言,作為以Sn焊料等低硬度材為對象的接觸探針用途,可謂不佳。 Comparative Example 7 is a composition composed of Cu, Ag, Pd, manganese (Mn), and Ir which is outside the range of the present embodiment. Compared with Examples 1 to 13, Comparative Example 7 has a large hardness but poor machinability, and Sn corrosion resistance is also poor. In Comparative Example 7, the use as a contact probe for a low hardness material such as Sn solder is not preferable.

(產業上之可利用性) (industrial availability)

如以上所述,在導電性、硬度、耐氧化性、Sn耐蝕性方面,本發明之合金材料、由該合金材料所構成之接觸探針及連接端子係可用來作為接觸探針使用。 As described above, the alloy material of the present invention, the contact probe composed of the alloy material, and the connection terminal can be used as a contact probe in terms of conductivity, hardness, oxidation resistance, and Sn corrosion resistance.

1‧‧‧插座 1‧‧‧ socket

2‧‧‧接觸探針(探針) 2‧‧‧Contact probe (probe)

3‧‧‧探針支架 3‧‧‧ probe holder

4‧‧‧支架構件 4‧‧‧ bracket components

100‧‧‧半導體積體電路 100‧‧‧Semiconductor integrated circuit

200‧‧‧電路基板 200‧‧‧ circuit substrate

Claims (11)

一種合金材料,係以銅(Cu)為主成分,並添加有10至30wt%之銀(Ag)、及0.5至10wt%之鎳(Ni)。 An alloy material containing copper (Cu) as a main component and added with 10 to 30% by weight of silver (Ag) and 0.5 to 10% by weight of nickel (Ni). 如申請專利範圍第1項所述之合金材料,更添加有5至20wt%之鈀(Pd)。 For example, the alloy material described in claim 1 is further added with 5 to 20% by weight of palladium (Pd). 如申請專利範圍第2項所述之合金材料,更添加有0.5至5wt%之錫(Sn)。 As the alloy material described in claim 2, 0.5 to 5 wt% of tin (Sn) is further added. 如申請專利範圍第1項所述之合金材料,更添加有0.5至5wt%之錫(Sn)。 For example, the alloy material described in claim 1 is further added with 0.5 to 5 wt% of tin (Sn). 如申請專利範圍第1項所述之合金材料,更添加有0.01至0.1wt%之銥(Ir)及釕(Ru)中的任一種或該等元素之組合。 As the alloy material described in claim 1, the addition of 0.01 to 0.1% by weight of any of Ir(R) and Ru (Ru) or a combination of the elements. 如申請專利範圍第2項所述之合金材料,更添加有0.01至0.1wt%之銥(Ir)及釕(Ru)中的任一種或該等元素之組合。 As the alloy material described in the second aspect of the patent application, 0.01 to 0.1% by weight of any one of iridium (Ir) and ruthenium (Ru) or a combination of the elements is further added. 如申請專利範圍第3項所述之合金材料,更添加有0.01至0.1wt%之銥(Ir)及釕(Ru)中的任一種或該等元素之組合。 As the alloy material described in claim 3, 0.01 to 0.1% by weight of any one of iridium (Ir) and ruthenium (Ru) or a combination of the elements is further added. 如申請專利範圍第4項所述之合金材料,更添加有0.01至0.1wt%之銥(Ir)及釕(Ru)中的任一種或該等元素之組合。 As the alloy material described in claim 4, 0.01 to 0.1% by weight of any of iridium (Ir) and ruthenium (Ru) or a combination of the elements is further added. 一種接觸探針,係在長度方向的兩端分別與接觸對象接觸之導電性的接觸探針,其至少一部分係使用申請專利範圍第1至8中任一項所述之合金材料形成。 A contact probe is a conductive contact probe that is in contact with a contact object at both ends in the longitudinal direction, and at least a part thereof is formed using the alloy material according to any one of claims 1 to 8. 如申請專利範圍第9項所述之接觸探針,其具有:導電性的第1柱塞,係在一端與一方的接觸對象接觸;導電性的第2柱塞,係在一端與另一方的接觸對象接觸;以及線圈彈簧,係設置於前述第1與第2柱塞之間而伸縮自如地連結該第1與第2柱塞;其中,前述第1柱塞、前述第2柱塞及前述線圈彈簧中之至少一者係包含前述合金材料。 The contact probe according to claim 9, comprising: a conductive first plunger that is in contact with one of the contact objects at one end; and the electrically conductive second plunger is one end and the other a contact spring contact; and a coil spring that is coupled between the first and second plungers to expand and contract the first and second plungers; wherein the first plunger, the second plunger, and the At least one of the coil springs comprises the aforementioned alloy material. 一種連接端子,係在長度方向的兩端分別與接觸對象接觸之導電性的連接端子,其至少一部分係使用申請專利範圍第1至8中任一項所述之合金材料形成。 A connection terminal is a conductive connection terminal that is in contact with a contact object at both ends in the longitudinal direction, and at least a part thereof is formed using the alloy material according to any one of claims 1 to 8.
TW105110500A 2015-03-31 2016-03-31 Alloy material, contact probe and connecting terminal TW201702392A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2015074331 2015-03-31

Publications (1)

Publication Number Publication Date
TW201702392A true TW201702392A (en) 2017-01-16

Family

ID=57004414

Family Applications (1)

Application Number Title Priority Date Filing Date
TW105110500A TW201702392A (en) 2015-03-31 2016-03-31 Alloy material, contact probe and connecting terminal

Country Status (3)

Country Link
JP (1) JP6728057B2 (en)
TW (1) TW201702392A (en)
WO (1) WO2016159316A1 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI668459B (en) * 2017-06-14 2019-08-11 日商日本發條股份有限公司 Conductive contact unit
TWI787250B (en) * 2017-04-28 2022-12-21 日商阿德潘鐵斯特股份有限公司 Carriers for electronic component testing devices
TWI787302B (en) * 2017-07-10 2022-12-21 日商聯合精密科技股份有限公司 Method for manufacturing binary copper-silver alloy body, contact pin and device using binary copper-silver alloy

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2023145888A (en) * 2022-03-29 2023-10-12 石福金属興業株式会社 Alloy material for probe pins
JP2023145917A (en) * 2022-03-29 2023-10-12 株式会社ヨコオ probe
KR20230170101A (en) 2022-06-08 2023-12-18 에스더블유씨씨 가부시키가이샤 Conductor for electrical property inspection and method of manufacturing the same

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56133442A (en) * 1980-03-24 1981-10-19 Tanaka Kikinzoku Kogyo Kk Electrical contact material
JPS57171599A (en) * 1981-04-13 1982-10-22 Mitsubishi Metal Corp Low melting point cu-ag system alloy solder with excellent wetting property
JPS6293327A (en) * 1985-10-21 1987-04-28 Tanaka Kikinzoku Kogyo Kk Material for commutator
JP2004061265A (en) * 2002-07-29 2004-02-26 Sumitomo Electric Ind Ltd Minute component for electric contacts, and its manufacturing method
JP4446479B2 (en) * 2005-01-31 2010-04-07 日鉱金属株式会社 Copper alloy for electronic equipment
JP4708833B2 (en) * 2005-04-08 2011-06-22 昭和電線ケーブルシステム株式会社 High strength copper alloy material for precision conductive spring with excellent sag resistance and its manufacturing method
JP4801757B2 (en) * 2009-05-29 2011-10-26 田中貴金属工業株式会社 Probe pins with excellent contact resistance and antifouling properties
JP6280866B2 (en) * 2012-08-03 2018-02-14 Yamakin株式会社 Alloy materials, contact probes and connection terminals
WO2014049874A1 (en) * 2012-09-28 2014-04-03 株式会社徳力本店 Ag-Pd-Cu-Co ALLOY FOR USES IN ELECTRICAL/ELECTRONIC DEVICES

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI787250B (en) * 2017-04-28 2022-12-21 日商阿德潘鐵斯特股份有限公司 Carriers for electronic component testing devices
TWI668459B (en) * 2017-06-14 2019-08-11 日商日本發條股份有限公司 Conductive contact unit
US11293946B2 (en) 2017-06-14 2022-04-05 Nhk Spring Co., Ltd. Conductive contactor unit
TWI787302B (en) * 2017-07-10 2022-12-21 日商聯合精密科技股份有限公司 Method for manufacturing binary copper-silver alloy body, contact pin and device using binary copper-silver alloy

Also Published As

Publication number Publication date
JPWO2016159316A1 (en) 2018-03-08
JP6728057B2 (en) 2020-07-22
WO2016159316A1 (en) 2016-10-06

Similar Documents

Publication Publication Date Title
TW201702392A (en) Alloy material, contact probe and connecting terminal
TWI493050B (en) Alloy material, contact probe and connection terminal
JP6647075B2 (en) Alloy materials, contact probes and connection terminals
KR100718577B1 (en) Material for probe pins
TWI567207B (en) Alloy materials, contact probe and connecting terminal
TWI491883B (en) Electrical test probe
TWI600773B (en) Ag-pd-cu-co alloy for electric/electronic devices
TW201333225A (en) Pd alloy for electronic use
KR102134193B1 (en) Contact probe and electrical connection jig
JP2011038831A (en) Tool for substrate inspection, and method for substrate inspection
JP2001337110A (en) Probe pin and probe card
TWI305839B (en) Contact-making apparatus and method for production of at least one contact element of a contact-making apparatus
JP5966506B2 (en) Manufacturing method of electrical contacts
CN109155208B (en) Coating material for electrical contacts and method for producing said coating material
JP2007053039A (en) Electric connector connection structure and flexible wiring board used for it
JP5926587B2 (en) Electrical contact and socket for electrical parts
KR101416477B1 (en) Probe card
JP2005114393A (en) Contact probe with lead wire, and manufacturing method therefor
JP5154011B2 (en) Flexible flat cable
TWI611029B (en) Nickel-plated copper or copper alloy material, connector terminals, connectors, and electronic components using the same
JP2016212006A (en) Electric contact, and socket for electrical component
JP2015042771A (en) Metal material for electronic component, connector terminal using the same, connector, and electronic component
JP2015161603A (en) contact pin
JP2017027705A (en) Connector terminal and manufacturing method therefor
JP2015042772A (en) Metal material for electronic component, connector terminal using the same, connector, and electronic component