TW201700245A - Scribing device capable of automatically and correctly correcting the inclination of a circular substrate placed on a platform - Google Patents

Scribing device capable of automatically and correctly correcting the inclination of a circular substrate placed on a platform Download PDF

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Publication number
TW201700245A
TW201700245A TW105101355A TW105101355A TW201700245A TW 201700245 A TW201700245 A TW 201700245A TW 105101355 A TW105101355 A TW 105101355A TW 105101355 A TW105101355 A TW 105101355A TW 201700245 A TW201700245 A TW 201700245A
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circular substrate
platform
line
camera
cutter wheel
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TW105101355A
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Chinese (zh)
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TWI681853B (en
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栗山規由
青木仁宏
吉田圭吾
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三星鑽石工業股份有限公司
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B25HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
    • B25HWORKSHOP EQUIPMENT, e.g. FOR MARKING-OUT WORK; STORAGE MEANS FOR WORKSHOPS
    • B25H7/00Marking-out or setting-out work
    • B25H7/04Devices, e.g. scribers, for marking

Abstract

The invention provides a scribing device capable of automatically and correctly correcting the inclination of a circular substrate placed on a platform. The scribing device A loads the circular substrate W on a rotatable platform 1, and scribes along the predetermined scribed lines S1, S2 of the surface using a cutter wheel 10 or a laser, so as to form a crack for breaking. A notch portion K parallel to the predetermined scribed lines S1, S2 is formed on the periphery of the circular substrate W on a line passing through the center point P of the circle. An angle correction camera 15 is provided to observe the circular substrate W placed on the platform 1 for inspecting its outer shape. A control part 18 of a computer C is also provided to analyze and process the image data obtained by the angle correction camera 15 and inspect the inclination angle [alpha] of the predetermined surface lines S1, S2 of the circular substrate W with respect to the scribing direction of the cutter wheel 10, and to rotate the platform 1 to make the inclination angle [alpha] equal to zero.

Description

刻劃裝置 Scribe device

本發明係關於在由玻璃、矽、陶瓷、化合物半導體等之脆性材料構成之圓形基板加工出斷開用龜裂(crack)之刻劃裝置。本發明,尤關於加工出用以從圓形之半導體基板(半導體晶圓)使晶片等之單位製品斷開之龜裂的刻劃裝置。 The present invention relates to a scribing device for processing a crack that is broken in a circular substrate made of a brittle material such as glass, tantalum, ceramics, or a compound semiconductor. The present invention is particularly directed to a scribing apparatus for processing a crack that breaks a unit product such as a wafer from a circular semiconductor substrate (semiconductor wafer).

一般而言從作為母基板之半導體基板切出晶片(單位製品)之製程中,首先,將半導體基板載置於刻劃裝置之吸附平台上,於其表面以刀輪或雷射沿刻劃預定線(刻劃道(street))進行刻劃,據以形成彼此正交之X方向以及Y方向之刻劃線(龜裂)。之後,以裂斷裝置從刻劃線之相反側之面按壓裂斷棒以使基板撓曲,據以使半導體基板斷開成四方形之晶片(參照專利文獻1以及專利文獻2)。 Generally, in the process of cutting out a wafer (unit product) from a semiconductor substrate as a mother substrate, first, the semiconductor substrate is placed on an adsorption platform of the scribing device, and the surface thereof is scheduled by a cutter wheel or a laser along the surface. Lines (streets) are scribed to form scribe lines (cracks) in the X direction and the Y direction orthogonal to each other. After that, the cracking device presses the split rod from the surface opposite to the scribe line to deflect the substrate, thereby breaking the semiconductor substrate into a square wafer (see Patent Document 1 and Patent Document 2).

在將半導體基板載置於刻劃裝置之吸附平台時,必須進行刀輪之行進方向與刻劃預定線之平行度正確一致之定位。 When the semiconductor substrate is placed on the adsorption platform of the scribing device, it is necessary to perform the positioning in which the parallel direction of the traveling direction of the cutter wheel and the predetermined line of scoring is correctly matched.

半導體基板為四方形之情形時,如圖10所示,刻劃預定線S係沿著半導體基板W1之側邊平行設計,因此藉由預先在吸附平台1上設置沿刻劃方向之複數個定位銷30,將側邊對齊於此定位銷30載置半導體基板W1,即能以手簡單的進行定位。 In the case where the semiconductor substrate is square, as shown in FIG. 10, the scribe line S is designed to be parallel along the side of the semiconductor substrate W1, so that a plurality of positioning along the scribe direction are provided on the adsorption platform 1 in advance. The pin 30 is aligned with the side of the positioning pin 30 to mount the semiconductor substrate W1, so that the positioning can be easily performed by hand.

先行技術文獻Advanced technical literature

[專利文獻1]日本特開2015-70135號公報 [Patent Document 1] JP-A-2015-70135

[專利文獻2]日本特開2004-39931號公報 [Patent Document 2] Japanese Patent Laid-Open Publication No. 2004-39931

然而,在半導體基板為圓形之情形時即無法使用上述之定位銷。因此,如圖11所示,過去是對準通過基板W2中心之刻劃預定線S’於基板W2之周緣部設置V槽(notch)或平的缺口(orientation flat)等之作為標記的缺口部K,並於吸附平台1上安裝L型塊32。並將通過缺口部K之刻劃預定線S’與L型塊32之一邊平行之方式一邊看著缺口部K、一邊以手操作進行位置對準。然而,此位置對準作業分常麻煩,且因係以高精度進行因此需要高度熟練之技術。 However, the above-described positioning pin cannot be used when the semiconductor substrate is circular. Therefore, as shown in FIG. 11, in the past, a notch portion as a mark such as a V-notch or a flattening flat is provided on the peripheral edge portion of the substrate W2 through the scribed line S' at the center of the substrate W2. K, and an L-shaped block 32 is mounted on the adsorption platform 1. The alignment line S' is aligned with one side of the L-shaped block 32 so as to be parallel to one side of the L-shaped block 32, and the position is aligned by hand while looking at the notch portion K. However, this position alignment operation is often troublesome, and because of high precision, a highly skilled technique is required.

又,多數的情形中,半導體基板在待斷開之各個晶片表面形成有電路等之電子元件,因此用以區劃此等之刻劃道、亦即刻劃預定線係以格子狀模様顯示而能以目視辨認,但在無法以目視辨認模様之情形時,亦能以設在基板周緣之缺口部等作為一個大概標準來判斷刻劃預定線之方向。 Moreover, in many cases, the semiconductor substrate is formed with electronic components such as circuits on the surface of each of the wafers to be disconnected, so that the scribe lanes, that is, the scribed lines are displayed in a lattice pattern. It is visually recognized, but when it is not possible to visually recognize the mold, the direction of the predetermined line can be judged by using a notch portion provided on the periphery of the substrate as a general standard.

有鑑於上述先前之課題,本發明之目的在提供一種能自動且正確的修正載置於平台上之圓形基板之傾斜的刻劃裝置。 In view of the foregoing prior problems, it is an object of the present invention to provide a scoring apparatus that automatically and correctly corrects the tilt of a circular substrate placed on a platform.

為達成上述目的,本發明採取了下述技術手段。亦即,本發明之刻劃裝置,係將由脆性材料構成之圓形基板載置於可旋轉之平台,於 其表面沿刻劃預定線使用刀輪或雷射進行刻劃以沿刻劃預定線形成斷開用之龜裂,其特徵在於:於該圓形基板之周緣,形成有與該刻劃預定線平行、於通過該圓形基板中心點之線上作為標記之缺口部;設有可觀察載置在該平台上之該圓形基板,以檢測其外形形狀之角度修正用攝影機;具備電腦之控制部,對以該角度修正用攝影機所得之影像資料進行解析處理,以檢測該圓形基板之刻劃預定線相對於該刀輪之刻劃方向的傾斜角度,並對該平台進行旋轉操作以使此傾斜角度為零。 In order to achieve the above object, the present invention adopts the following technical means. That is, the scoring device of the present invention places a circular substrate composed of a brittle material on a rotatable platform. The surface is scored along the line to be scored using a cutter wheel or a laser to form a crack for breaking along a predetermined line, wherein a predetermined line is formed on the periphery of the circular substrate. a notch portion that is parallel to the line passing through the center point of the circular substrate; a lens for observing the circular substrate that is placed on the platform to detect the shape of the lens; and a control unit for the computer And analyzing the image data obtained by the camera with the angle correction to detect an inclination angle of the scribed line of the circular substrate with respect to the scribed direction of the cutter wheel, and rotating the platform to make the The tilt angle is zero.

本發明中,該控制部,係從以該角度修正用攝影機所得之外形形狀求出該圓形基板之中心點,從此中心點與該缺口部之位置檢測該傾斜角度者較佳。 In the present invention, the control unit obtains the center point of the circular substrate from the outer shape obtained by the angle correction camera, and it is preferable to detect the inclination angle from the position of the center point and the notch portion.

根據本發明,於刻劃預定線之刻劃加工前,先自動的修正載置於平台上之半導體基板之傾斜,因此可省略習知之麻煩且耗時之以手作業進行之定位操作的步驟,可迅速進行高效率、高精度之刻劃。 According to the present invention, the inclination of the semiconductor substrate placed on the stage is automatically corrected before the scribe process of the scribe line is scribed, so that the cumbersome and time consuming step of the positioning operation by the hand operation can be omitted. High-efficiency, high-precision scoring can be performed quickly.

又,由於可知道載置於平台上之圓形基板之位置與大小,因此能消除刀輪或雷射之空轉部分僅對圓形基板之圓內區域進行高效率的刻劃。 Moreover, since the position and size of the circular substrate placed on the platform can be known, it is possible to eliminate the idling portion of the cutter wheel or the laser and perform high-efficiency scribing only on the inner region of the circular substrate.

又,本發明中,以設有對用以該角度修正用攝影機之檢測據以修正了傾斜角度之該圓形基板之刻劃預定線,進行該刀輪或雷射之位置對準之精密攝影機之構成較佳。 Further, in the present invention, the precision camera which performs the positional alignment of the cutter wheel or the laser is provided with a predetermined line for the circular substrate on which the detection angle of the camera for correcting the angle correction is corrected. The composition is preferred.

如此,即能使刀輪或雷射沿刻劃預定線正確進行刻劃。 In this way, the cutter wheel or laser can be correctly scored along the scribed line.

A‧‧‧刻劃裝置 A‧‧‧ scoring device

C‧‧‧電腦 C‧‧‧ computer

K‧‧‧缺口部 K‧‧‧Gap section

P‧‧‧中心點 P‧‧‧ Center Point

S1‧‧‧刻劃預定線 S1‧‧‧scribed line

S2‧‧‧刻劃預定線 S2‧‧‧scribed line

W‧‧‧半導體基板(圓形基板) W‧‧‧Semiconductor substrate (round substrate)

α‧‧‧傾斜角度 ‧‧‧‧ tilt angle

1‧‧‧平台 1‧‧‧ platform

10‧‧‧刀輪 10‧‧‧Cutter wheel

14‧‧‧精密攝影機 14‧‧‧Precision camera

15‧‧‧線掃描攝影機(角度修正用攝影機) 15‧‧‧Line Scan Camera (Angle Correction Camera)

圖1係顯示本發明之刻劃裝置之一實施態様的概略前視圖與主要部位的側視圖。 BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a side elevational view and a side elevational view of a main portion showing an embodiment of the scoring apparatus of the present invention.

圖2係以俯視顯示刻劃裝置之動作之第1階段的說明圖。 Fig. 2 is an explanatory view showing a first stage of the operation of the scribing device in a plan view.

圖3與圖2相同之顯示第2階段的說明圖。 Fig. 3 is an explanatory view showing the second stage in the same manner as Fig. 2.

圖4與圖2相同之顯示第3階段的說明圖。 Fig. 4 is an explanatory view showing the third stage in the same manner as Fig. 2.

圖5與圖2相同之顯示第4階段的說明圖。 Fig. 5 is an explanatory view showing the fourth stage in the same manner as Fig. 2.

圖6係顯示使用本發明之刻劃裝置之作業流程的流程圖。 Figure 6 is a flow chart showing the flow of operations using the scoring apparatus of the present invention.

圖7係顯示本發明之刻劃裝置中之電腦的方塊圖。 Figure 7 is a block diagram showing a computer in the scoring apparatus of the present invention.

圖8係顯示線掃描攝影機的影像圖。 Figure 8 is a view showing an image of a line scan camera.

圖9係顯示區域攝影機的影像圖。 Figure 9 is a view showing an image of an area camera.

圖10係顯示習知方形半導體基板之定位手段的立體圖。 Fig. 10 is a perspective view showing a positioning means of a conventional square semiconductor substrate.

圖11係顯示習知圓形半導體基板之定位手段的立體圖。 Figure 11 is a perspective view showing a positioning means of a conventional circular semiconductor substrate.

以下,根據將本發明之詳情顯示於圖式之實施形態,進行說明。本實施例中之刻劃對象之圓形基板,係積層玻璃晶圓與矽晶圓之影像感測器用的半導體基板W。如圖2所示,於半導體基板W配置有格子狀之具備電路等之電子元件的晶片,用以區劃此等晶片之X-Y方向之線為刻劃預定線(刻劃道)S1、S2。並在通過半導體基板W之中心點P之任一方之刻劃預定線,本實施例中係在刻劃預定線S1上且於半導體基板W之周緣部,設有V槽或平缺口等作為標記之缺口部K。 Hereinafter, the details of the present invention will be described based on the embodiments of the drawings. The circular substrate to be scribed in this embodiment is a semiconductor substrate W for an image sensor for a laminated glass wafer and a silicon wafer. As shown in FIG. 2, a wafer having electronic components such as circuits in a grid shape is disposed on the semiconductor substrate W, and lines for arranging the X-Y directions of the wafers are scribed lines (scratches) S1 and S2. A predetermined line is drawn through one of the center points P of the semiconductor substrate W. In the present embodiment, a predetermined groove is formed on the predetermined line S1 and a peripheral portion of the semiconductor substrate W is provided with a V-groove or a flat notch as a mark. The notch K.

圖1(a)、(b)係顯示本發明之刻劃裝置A之一實施例,具備用以載置半導體基板W加以保持之平台1。於平台1表面設有多數個空 氣吸引孔(未圖示),藉由此吸引孔進行空氣吸引據以吸附保持半導體基板W。 1(a) and 1(b) show an embodiment of the scribing apparatus A of the present invention, which is provided with a stage 1 on which a semiconductor substrate W is placed and held. There are many empty spaces on the surface of the platform 1. The gas suction hole (not shown) absorbs and holds the semiconductor substrate W by suctioning the hole.

又,平台1可沿水平的軌道2往Y方向移動,被以馬達3旋轉之螺桿4驅動。進而,平台1可藉由內建馬達之旋轉驅動部5在水平面內旋動。 Further, the platform 1 is movable in the Y direction along the horizontal rail 2, and is driven by the screw 4 which is rotated by the motor 3. Further, the platform 1 can be rotated in a horizontal plane by the rotary drive unit 5 of the built-in motor.

具備隔著平台1設置之兩側的支承柱6、6與於X方向水平延伸之梁7的橋架8,係以跨在平台1上之方式設置。於梁7,設有於X方向水平延伸之導件9。於此導件9,安裝有用以保持對半導體基板W加工出沿刻劃預定線之龜裂之刀輪(cutter wheel)10的刻劃頭11。刻劃頭11可藉由以馬達12為驅動源之移動機構(未圖示)沿導件9往X方向移動。刀輪10形成為可藉由設在刻劃頭11之昇降機構(未圖示)朝向半導體基板W昇降。 The bridge 8 having the support columns 6, 6 disposed on both sides of the platform 1 and the beam 7 extending horizontally in the X direction is disposed to straddle the platform 1. The beam 7 is provided with a guide 9 extending horizontally in the X direction. In this guide member 9, a scribing head 11 for holding a cutter wheel 10 for machining a crack along a predetermined line of the semiconductor substrate W is mounted. The scribing head 11 is movable in the X direction along the guide 9 by a moving mechanism (not shown) that uses the motor 12 as a driving source. The cutter wheel 10 is formed so as to be movable up and down toward the semiconductor substrate W by an elevating mechanism (not shown) provided on the scribing head 11.

又,用以進行刀輪10與刻劃預定線S1、S2之位置對準的精密攝影機14,安裝在上述刀輪10之刻劃頭11。據此,可與刀輪10一起往X方向移動。 Further, a precision camera 14 for aligning the position of the cutter wheel 10 with the planned line S1, S2 is attached to the scribe head 11 of the cutter wheel 10. According to this, it is possible to move in the X direction together with the cutter wheel 10.

進一步的,於平台1之上方設有可檢測半導體基板W之外形形狀的角度修正用攝影機。本實施例中,作為此角度修正用攝影機係使用線掃描攝影機15。線掃描攝影機15被保持在從橋架8往Y方向突出之撐桿16之前端,配置成位在往Y方向移動之平台1之Y軸線上方。 Further, an angle correction camera capable of detecting the shape of the semiconductor substrate W is provided above the stage 1. In the present embodiment, the line scan camera 15 is used as the angle correction camera. The line scan camera 15 is held at the front end of the strut 16 projecting from the bridge 8 in the Y direction, and is disposed above the Y axis of the platform 1 moving in the Y direction.

於線掃描攝影機15,附設有用以照明被拍攝體之拍攝部位的照明燈17。照明燈17係由正反射光光源17a、與擴散反射光光源17b之組合構成,正反射光透過半反射鏡17c照射向作為被拍攝體之半導體基板 W。藉由此二個光源能以小電力有效的照明被拍攝部。又,正反射光亦可不透過半反射鏡17c而直接照射向被拍攝體。 The line scan camera 15 is provided with an illumination lamp 17 for illuminating an imaged portion of the subject. The illuminating lamp 17 is composed of a combination of a specular reflected light source 17a and a diffused reflected light source 17b, and the specular reflected light is transmitted through the half mirror 17c to a semiconductor substrate as a subject. W. The two light sources can effectively illuminate the imaged portion with small electric power. Further, the specular reflected light may be directly irradiated to the subject without passing through the half mirror 17c.

線掃描攝影機15,如圖8之影像圖所示,作為攝影元件使用線感測器(一維CCD)15a,一邊使作為被拍攝體之半導體基板W藉由平台1往箭頭方向(Y方向)移動、一邊一條一條擷取線15b之影像據以組成半導體基板W之整體像。 As shown in the image diagram of FIG. 8, the line scan camera 15 uses a line sensor (one-dimensional CCD) 15a as a photographing element, and causes the semiconductor substrate W as a subject to pass the platform 1 in the arrow direction (Y direction). The image of the line 15b is moved one by one to form an overall image of the semiconductor substrate W.

被拍攝至線掃描攝影機15之影像資料,以附設於刻劃裝置A之電腦C(參照圖7)之控制部18進行運算處理。在刻劃預定線S1、S2相對平台1之X軸或Y軸傾斜之情形時,藉由平台1之旋動加以修正。又,關於其詳情留待後敘。 The image data captured to the line scan camera 15 is subjected to arithmetic processing by the control unit 18 attached to the computer C (see FIG. 7) of the scribing apparatus A. When the planned line S1, S2 is inclined with respect to the X-axis or the Y-axis of the platform 1, it is corrected by the rotation of the platform 1. Also, the details are left to be described later.

附設於刻劃裝置A之電腦C,除上述控制部18外,如圖7之方塊圖所示,亦具備輸入部19、與顯示部20。控制部18係以CPU、RAM、ROM等之電腦硬體來實現,除上述刻劃裝置A之線掃描攝影機15及精密攝影機14之拍攝以及影像資料之運算處理外,亦進行平台1之旋轉及往Y軸方向之移動、以刀輪10進行之刻劃動作等各部機構之動作整體的控制。輸入部19係供作業員對刻劃裝置A輸入各種操作指示及資料,顯示部20則係用以顯示處理選單及動作狀況者。 The computer C attached to the scribing apparatus A includes an input unit 19 and a display unit 20, as shown in the block diagram of FIG. 7, in addition to the control unit 18. The control unit 18 is realized by a computer hardware such as a CPU, a RAM, or a ROM. In addition to the imaging of the line scan camera 15 and the precision camera 14 of the scribing device A and the arithmetic processing of the image data, the rotation of the platform 1 is also performed. The movement of the Y-axis direction and the scribing operation by the cutter wheel 10 control the entire operation of each mechanism. The input unit 19 is for the operator to input various operation instructions and materials to the scribing device A, and the display unit 20 is for displaying the processing menu and the operation status.

其次,根據圖2~圖5之動作說明圖以及圖6之流程圖,說明以上述刻劃裝置A進行之半導體基板W之刻劃動作之流程。首先,如圖1、圖2所示,將半導體基板W載置於平台1上並加以吸附保持(步驟1)。 Next, the flow of the scribing operation of the semiconductor substrate W by the scribing apparatus A will be described based on the operation explanatory diagrams of FIGS. 2 to 5 and the flowchart of FIG. First, as shown in FIGS. 1 and 2, the semiconductor substrate W is placed on the stage 1 and adsorbed and held (step 1).

此時,若係在下一個進行之線掃描攝影機15之拍攝區域範圍內的話,無論載置於平台1上之任何位置皆可,但為減少修正時之平台 旋轉量,以刻劃預定線S1、S2之任一者與平台1之X-Y軸方向大致平行之方式載置較佳。圖2中,係配置成具有缺口部K之刻劃預定線S1與平台1之X軸大致平行。 At this time, if it is within the range of the shooting area of the next line scan camera 15, it may be placed at any position on the platform 1, but to reduce the platform at the time of correction. The amount of rotation is preferably placed so that either of the planned lines S1 and S2 is substantially parallel to the X-Y axis direction of the stage 1. In Fig. 2, the scribed line S1 having the notch portion K is substantially parallel to the X-axis of the stage 1.

接著,如圖3、圖8所示,一邊以平台1使半導體基板W往Y軸方向移動、一邊以線掃描攝影機15掃描半導體基板W。掃描之影像資料以電腦C之控制部18進行運算處理後從整體像之外形形狀求出半導體基板W之中心點P,進而求出從此中心點P連結缺口部K之直線L1、與平台1沿X軸方向之直線L2的角度、亦即半導體基板W之刻劃預定線S1之傾斜角度α(步驟2)。 Next, as shown in FIGS. 3 and 8, the semiconductor substrate W is scanned by the line scan camera 15 while moving the semiconductor substrate W in the Y-axis direction by the stage 1. The scanned image data is subjected to arithmetic processing by the control unit 18 of the computer C, and the center point P of the semiconductor substrate W is obtained from the overall shape of the external image, and the straight line L1 connecting the notch portion K from the center point P and the edge of the platform 1 are obtained. The angle of the straight line L2 in the X-axis direction, that is, the inclination angle α of the predetermined line S1 of the semiconductor substrate W (step 2).

接著,如圖4所示,使平台1反時鐘旋動以使傾斜角度α為零。如此,即能使半導體基板W之刻劃預定線S1與刀輪10之刻劃方向之平行度一致(步驟3)。 Next, as shown in FIG. 4, the platform 1 is rotated counterclockwise so that the tilt angle α is zero. Thus, the parallelism between the scribed line S1 of the semiconductor substrate W and the scribed direction of the cutter wheel 10 can be made uniform (step 3).

之後,如圖5所示,半導體基板W藉由平台1之移動而被送至以刀輪10進行之刻劃位置(步驟4)。 Thereafter, as shown in FIG. 5, the semiconductor substrate W is sent to the scribing position by the cutter wheel 10 by the movement of the stage 1 (step 4).

接著,以精密攝影機14觀察刻劃預定線S1,以控制部18進行刀輪10與刻劃預定線S1之位置對準(步驟5)。 Next, the scoring line S1 is observed by the precision camera 14, and the control unit 18 performs alignment of the cutter wheel 10 with the scribing line S1 (step 5).

由於刻劃預定線之數量及間距係預先決定,因此以精密攝影機14進行之位置對準進行一次即可,使平台1依序移動設定之間距即能刻劃出所有的刻劃預定線S1。刻劃預定線S1之刻劃完成後,使平台1旋轉90度以進行刻劃預定線S2之刻劃(步驟6)。 Since the number and the pitch of the planned lines are determined in advance, the alignment by the precision camera 14 can be performed once, and all the planned line S1 can be scored by sequentially moving the platform 1 by the set distance. After the scribe of the scribe line S1 is completed, the stage 1 is rotated by 90 degrees to perform scribe of the scribe line S2 (step 6).

又,亦可於刻劃預定線S1、S2上預設置能以精密攝影機14觀察之對準標記。 Further, an alignment mark which can be observed by the precision camera 14 can be preliminarily provided on the planned line S1, S2.

如以上所述,本發明之刻劃裝置A,係在以刀輪10進行之刻劃前,先自動的修正載置於平台1上之半導體基板W之傾斜,因此能省去習知之煩雜且耗費時間之手作業的定位操作,迅速進行高精度之刻劃。此外,由於可掌握載置於平台上之圓形基板之位置與大小,因此能消除刀輪或雷射之空轉部分僅對圓形基板之圓內區域有效率的進行刻劃。 As described above, the scribing apparatus A of the present invention automatically corrects the inclination of the semiconductor substrate W placed on the stage 1 before the scribing by the cutter wheel 10, thereby eliminating the cumbersome and conventional The positioning operation of the time-consuming hand operation quickly marks the high-precision. In addition, since the position and size of the circular substrate placed on the platform can be grasped, it is possible to eliminate the idling portion of the cutter wheel or the laser to effectively scribe only the inner region of the circular substrate.

又,上述實施例中,作為角度修正用攝影機雖係使用能以高解析能力得到廣視野區域的線掃描攝影機15,但只要是具有能以良好精度檢測圓形半導體基板W之外形形狀之性能之攝影機的話,無特別限定。例如,亦可使用具備如圖9所示之高精度二維感測器21a之區域攝影機(area camera)21。 Further, in the above-described embodiment, the line scanning camera 15 capable of obtaining a wide field of view with high resolution is used as the angle correction camera, but it is capable of detecting the shape of the circular semiconductor substrate W with good precision. The camera is not particularly limited. For example, an area camera 21 having a high-precision two-dimensional sensor 21a as shown in FIG. 9 can also be used.

又,上述實施例中,作為半導體基板W之刻劃預定線S1、S2之刻劃手段雖係使用刀輪10,但亦可取代此而使用公知之雷射。 Further, in the above-described embodiment, the scribing means 10 is used as the scribing means for the predetermined line S1, S2 of the semiconductor substrate W, but a known laser may be used instead.

以上,針對本發明之代表性的實施例做了說明,但本發明並不特定於上述實施形態,在能達成其目的、不脫離申請專利範圍之範圍內,當然可有適當之修正、變化。 The present invention has been described with reference to the preferred embodiments of the present invention. However, the present invention is not limited to the embodiments described above, and may be appropriately modified or changed without departing from the scope of the invention.

產業上之可利用性Industrial availability

本發明,可利用於進行用以從圓形半導體基板分割出晶片等單位製品之龜裂之加工的刻劃裝置。 The present invention can be utilized in a scribing apparatus for performing a process of dividing a crack of a unit product such as a wafer from a circular semiconductor substrate.

A‧‧‧刻劃裝置 A‧‧‧ scoring device

W‧‧‧半導體基板(圓形基板) W‧‧‧Semiconductor substrate (round substrate)

1‧‧‧平台 1‧‧‧ platform

2‧‧‧軌道 2‧‧‧ Track

3‧‧‧馬達 3‧‧‧Motor

4‧‧‧螺桿 4‧‧‧ screw

5‧‧‧旋轉驅動部 5‧‧‧Rotary drive department

6‧‧‧支承柱 6‧‧‧Support column

7‧‧‧梁 7‧‧ ‧ beams

8‧‧‧橋架 8‧‧‧ Bridge

9‧‧‧導件 9‧‧‧ Guides

10‧‧‧刀輪 10‧‧‧Cutter wheel

11‧‧‧刻劃頭 11‧‧‧Scratch

12‧‧‧馬達 12‧‧‧ motor

14‧‧‧精密攝影機 14‧‧‧Precision camera

15‧‧‧線掃描攝影機(角度修正用攝影機) 15‧‧‧Line Scan Camera (Angle Correction Camera)

16‧‧‧撐桿 16‧‧‧ poles

17‧‧‧照明燈 17‧‧‧Lights

17a‧‧‧正反射光光源 17a‧‧‧Reflective light source

17b‧‧‧擴散反射光光源 17b‧‧‧Diffuse reflected light source

17c‧‧‧半反射鏡 17c‧‧‧half mirror

Claims (5)

一種刻劃裝置,係將由脆性材料構成之圓形基板載置於可旋轉之平台,於其表面沿刻劃預定線使用刀輪或雷射進行刻劃以沿刻劃預定線形成斷開用之龜裂,其特徵在於:於該圓形基板之周緣,形成有與該刻劃預定線平行、於通過該圓形基板中心點之線上作為標記之缺口部;設有可觀察載置在該平台上之該圓形基板,以檢測其外形形狀之角度修正用攝影機;具備電腦之控制部,對以該角度修正用攝影機所得之影像資料進行解析處理,以檢測該圓形基板之刻劃預定線相對於該刀輪之刻劃方向的傾斜角度,並對該平台進行旋轉操作以使此傾斜角度為零。 A scribing device is a circular substrate made of a brittle material placed on a rotatable platform, and is scribbled on a surface thereof along a predetermined line by using a cutter wheel or a laser to form a disconnection along a predetermined line. a crack, characterized in that a peripheral portion of the circular substrate is formed with a notch portion which is parallel to the predetermined line of the scribed line and is marked on a line passing through the center point of the circular substrate; and is disposed to be placed on the platform a circular correction substrate for detecting an angular shape of the circular substrate; and a computer control unit for analyzing the image data obtained by the angle correction camera to detect a predetermined line of the circular substrate The tilting angle with respect to the scoring direction of the cutter wheel, and rotating the platform to make the tilt angle zero. 如申請專利範圍第1項之刻劃裝置,其中,該控制部係從以該角度修正用攝影機所得之外形形狀求出該圓形基板之中心點,從此中心點與該缺口部之位置檢測該傾斜角度。 The scribing device of claim 1, wherein the control unit obtains a center point of the circular substrate from an outer shape obtained by the camera for correcting the angle, and detects the position from the center point and the position of the notch portion slope. 如申請專利範圍第1或2項之刻劃裝置,其中,設有對藉由該角度修正用攝影機之檢測修正了傾斜角度之該圓形基板之刻劃預定線,用以進行該刀輪或雷射之位置對準的精密攝影機。 The scoring device of claim 1 or 2, wherein a scribed line for the circular substrate corrected by the detection of the angle correction camera is provided for performing the cutter wheel or A precision camera with a laser-aligned position. 如申請專利範圍第1或2項之刻劃裝置,其中,該角度修正用攝影機係線掃描攝影機。 The scoring device of claim 1 or 2, wherein the angle correction camera is a line scan camera. 如申請專利範圍第3項之刻劃裝置,其中,該角度修正用攝影機係線掃描攝影機。 The scoring device of claim 3, wherein the angle correction camera is a line scan camera.
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