TW201633638A - Method of manufacturing connector, method for connecting electronic component, and connector - Google Patents

Method of manufacturing connector, method for connecting electronic component, and connector Download PDF

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Publication number
TW201633638A
TW201633638A TW104133331A TW104133331A TW201633638A TW 201633638 A TW201633638 A TW 201633638A TW 104133331 A TW104133331 A TW 104133331A TW 104133331 A TW104133331 A TW 104133331A TW 201633638 A TW201633638 A TW 201633638A
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circuit
adhesive
electronic component
film
substrate
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TW104133331A
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Chinese (zh)
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TWI688176B (en
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Kosuke Asaba
Shinichi Hayashi
Yusuke Tanaka
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Dexerials Corp
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    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/30Assembling printed circuits with electric components, e.g. with resistor
    • H05K3/32Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
    • H05K3/321Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by conductive adhesives
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J5/00Adhesive processes in general; Adhesive processes not provided for elsewhere, e.g. relating to primers
    • C09J5/06Adhesive processes in general; Adhesive processes not provided for elsewhere, e.g. relating to primers involving heating of the applied adhesive
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J11/00Features of adhesives not provided for in group C09J9/00, e.g. additives
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J11/00Features of adhesives not provided for in group C09J9/00, e.g. additives
    • C09J11/02Non-macromolecular additives
    • C09J11/06Non-macromolecular additives organic
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J201/00Adhesives based on unspecified macromolecular compounds
    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/14Structural association of two or more printed circuits
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/14Structural association of two or more printed circuits
    • H05K1/147Structural association of two or more printed circuits at least one of the printed circuits being bent or folded, e.g. by using a flexible printed circuit
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/30Assembling printed circuits with electric components, e.g. with resistor
    • H05K3/32Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/36Assembling printed circuits with other printed circuits
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/36Assembling printed circuits with other printed circuits
    • H05K3/361Assembling flexible printed circuits with other printed circuits

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Theoretical Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Human Computer Interaction (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Combinations Of Printed Boards (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Wire Bonding (AREA)
  • Electric Connection Of Electric Components To Printed Circuits (AREA)
  • Non-Insulated Conductors (AREA)

Abstract

In order to ensure the adhesive strength of an electronic component through the formation of a fillet and to prevent the contamination of a support, the adhesion of a board and an increase in contact resistance of the electronic component, which are caused by a binder resin, this method comprises: an adhesive disposing step for disposing, on a circuit board 2 having optical transparency, a circuit-connecting adhesive 6 containing a photopolymerization initiator; and a press-bonding step in which an electronic component 5 is disposed on the circuit board 2 by means of the circuit-connecting adhesive 6 and the circuit-connecting adhesive 6 is cured while the electronic component 5 is being hot-pressed against the circuit board 2, wherein the circuit-connecting adhesive 6 has a melt viscosity of 4,000 pa.s or less at a heating temperature in the press-bonding step.

Description

連接體之製造方法、電子零件之連接方法、連接體 Manufacturing method of connector, connection method of electronic component, connector

本發明係關於一種介隔含有光聚合起始劑之電路連接用接著劑於透明基板上連接電子零件而成之連接體之製造方法、介隔含有光聚合起始劑之電路連接用接著劑於透明基板上連接電子零件之連接方法、及使用其而製造之連接體。 The present invention relates to a method for producing a connector in which an electronic component is connected to a transparent substrate via an adhesive for connecting a circuit containing a photopolymerization initiator, and an adhesive for connecting a circuit containing a photopolymerization initiator. A method of connecting electronic components to a transparent substrate, and a connector manufactured using the same.

本申請案以在日本於2014年10月16日申請之日本專利申請號特願2014-212108為基礎而主張優先權,藉由參照而將該申請援引至本申請案中。 The present application claims priority on the basis of Japanese Patent Application No. 2014-212108, filed on Jan.

習知,於連接玻璃基板或玻璃環氧基板等剛性基板與可撓性基板或IC晶片等電子零件時,係使用使分散有導電性粒子之黏合劑樹脂膜狀地成形而成之異向性導電膜作為接著劑。若以連接可撓性基板之連接端子與剛性基板之連接端子之情形時為例進行說明,則如圖6(A)所示,於形成有可撓性基板51與剛性基板54之兩連接端子52、55之區域之間,配置異向性導電膜53,並且配置適當之緩衝材料50,藉由熱壓接工具56自可撓性基板51之上方進行熱加壓。如此,如圖6(B)所示,黏合劑樹脂表現出流動性,自可撓性基板51之連接端子52與剛性基板54之連接端子55之間流出,並且異向性導電膜53中之導電性粒子被夾入至兩連接端子間並 且被壓扁。 In the case of connecting a rigid substrate such as a glass substrate or a glass epoxy substrate to an electronic component such as a flexible substrate or an IC wafer, an anisotropic property is obtained by forming a film of a binder resin in which conductive particles are dispersed. The conductive film serves as an adhesive. When the connection terminal of the flexible substrate and the connection terminal of the rigid substrate are connected as an example, as shown in FIG. 6(A), the two connection terminals of the flexible substrate 51 and the rigid substrate 54 are formed. Between the regions 52 and 55, an anisotropic conductive film 53 is disposed, and an appropriate buffer material 50 is disposed, and is thermally pressurized from above the flexible substrate 51 by the thermocompression bonding tool 56. Thus, as shown in FIG. 6(B), the adhesive resin exhibits fluidity, flows out from the connection terminal 52 of the flexible substrate 51 and the connection terminal 55 of the rigid substrate 54, and is in the anisotropic conductive film 53. The conductive particles are sandwiched between the two connection terminals and And it is squashed.

結果,可撓性基板51之連接端子52與剛性基板54之連接端子55介隔導電性粒子電性連接,於該狀態下,使黏合劑樹脂硬化。不存在於兩連接端子52、55之間之導電性粒子分散至黏合劑樹脂,維持電性絕緣之狀態。藉此,僅於可撓性基板51之連接端子52與剛性基板54之連接端子55之間,實現電性導通。 As a result, the connection terminal 52 of the flexible substrate 51 and the connection terminal 55 of the rigid substrate 54 are electrically connected to each other via the conductive particles, and in this state, the adhesive resin is cured. The conductive particles that are not present between the two connection terminals 52, 55 are dispersed in the adhesive resin to maintain electrical insulation. Thereby, electrical conduction is achieved only between the connection terminal 52 of the flexible substrate 51 and the connection terminal 55 of the rigid substrate 54.

又,於剛性基板54之側面,黏合劑樹脂自剛性基板54與可撓性基板51之間溢出,於與可撓性基板51之連接面之間形成細帶(ferret),藉此使接著強度提高。 Further, on the side surface of the rigid substrate 54, the adhesive resin overflows between the rigid substrate 54 and the flexible substrate 51, and a ferret is formed between the connection surface with the flexible substrate 51, thereby achieving the bonding strength. improve.

近年來,例如於液晶面板之玻璃基板與可撓性基板之連接中,玻璃基板之薄型化發展,並且隨著液晶畫面相對於電子機器外框之大型化,使畫面之外緣部分即所謂之邊框部變窄之窄邊框化不斷發展。因此,使用熱硬化型異向性導電膜之連接方法,因熱加壓溫度高,對玻璃基板或可撓性基板之熱衝擊大。並且,於連接異向性導電膜之後,使溫度降低至常溫時,因其溫度差,使黏合劑收縮,可能會於薄型化之玻璃基板發生翹曲。因此,有引起顯示不均或可撓性基板之連接不良等問題之隱憂。 In recent years, for example, in the connection between a glass substrate of a liquid crystal panel and a flexible substrate, the thinning of the glass substrate has progressed, and as the liquid crystal screen is enlarged relative to the outer frame of the electronic device, the outer edge portion of the screen is called The narrow frame of the narrowing of the frame portion is constantly developing. Therefore, in the connection method using the thermosetting type anisotropic conductive film, the thermal shock temperature is high, and the thermal shock to the glass substrate or the flexible substrate is large. Further, when the temperature is lowered to the normal temperature after the connection of the anisotropic conductive film, the adhesive shrinks due to the temperature difference, and warpage may occur in the thinned glass substrate. Therefore, there are concerns about problems such as display unevenness or poor connection of the flexible substrate.

[專利文獻1]日本特開2005-26577號公報 [Patent Document 1] Japanese Patent Laid-Open Publication No. 2005-26577

因此,亦提出有使用紫外線硬化型接著劑來代替此種使用熱硬化型接著劑之異向性導電膜的連接方法。於使用紫外線硬化型接著劑之 連接方法中,接著劑因熱而軟化流動,僅加熱至對於“將導電性粒子捕捉至玻璃基板與可撓性基板之各電極間”而言充分之溫度,藉由紫外線照射使接著劑硬化。 Therefore, a method of connecting an anisotropic conductive film using a thermosetting adhesive is also used instead of the ultraviolet curable adhesive. For the use of UV-curing adhesives In the connection method, the adhesive softens and flows by heat, and is heated only to a temperature sufficient for "capturing the conductive particles between the glass substrate and the electrodes of the flexible substrate", and the adhesive is cured by ultraviolet irradiation.

於該使用紫外線硬化型接著劑之連接方法中,無需為了使黏合劑樹脂硬化而施加高熱,能夠防止因對玻璃基板或可撓性基板之熱衝擊而引起之變形等問題。 In the connection method using the ultraviolet curable adhesive, it is not necessary to apply high heat in order to cure the adhesive resin, and it is possible to prevent problems such as deformation due to thermal shock to the glass substrate or the flexible substrate.

又,近年來,隨著攜帶型電子機器等中之顯示器之大型化,使用輕量且具有可撓性之塑膠基板。塑膠基板與玻璃基板等相比,對熱衝擊之耐性亦較低,於使用紫外線硬化型接著劑之連接步驟中,要求於更加低溫低壓下之連接。 In recent years, with the increase in the size of displays in portable electronic devices and the like, lightweight and flexible plastic substrates have been used. The plastic substrate is less resistant to thermal shock than the glass substrate or the like, and is required to be connected at a lower temperature and a lower pressure in the connection step using the ultraviolet curable adhesive.

此處,由於進行使用紫外線硬化型接著劑之低溫連接,一方面因低溫下而能夠防止熱衝擊,另一方面,接著劑之黏合劑之流動不足,於端子部上發生導電性粒子之壓入不足,而有導通可靠性欠佳之虞。因此,紫外線硬化型接著劑需要使黏合劑樹脂之黏度本身降低。 Here, by performing the low-temperature connection using the ultraviolet curable adhesive, on the one hand, thermal shock can be prevented at a low temperature, and on the other hand, the flow of the adhesive of the adhesive is insufficient, and the intrusion of conductive particles occurs at the terminal portion. Insufficient, and there is a lack of reliability. Therefore, the ultraviolet curable adhesive needs to lower the viscosity of the binder resin itself.

然而,若降低黏合劑樹脂之黏度,則於搭載可撓性基板等電子零件,藉由熱壓接工具抵壓時,有熔融之黏合劑樹脂自基板之側面溢出,流回至基板之背面側之虞。而且,由於黏合劑樹脂流入至基板之背面,有污損支持基板之支持台,又,剝離附著於支持台之基板時基板破損之虞。 However, when the viscosity of the adhesive resin is lowered, when an electronic component such as a flexible substrate is mounted and pressed by a thermocompression bonding tool, the melted adhesive resin overflows from the side surface of the substrate and flows back to the back side of the substrate. After that. Further, since the binder resin flows into the back surface of the substrate, the support table of the support substrate is stained, and the substrate is damaged when the substrate attached to the support table is peeled off.

若為了防止此種黏合劑樹脂之溢出,而提高黏合劑樹脂之熔融黏度,則會阻礙細帶之形成,接著強度不足。又,於低溫低壓條件下,可撓性基板等電子零件之壓入不足,會導致導通電阻之上升。 If the melt viscosity of the binder resin is increased in order to prevent the overflow of the binder resin, the formation of the ribbon is inhibited, and the strength is insufficient. Further, under low temperature and low pressure conditions, insufficient press-fitting of electronic components such as flexible substrates causes an increase in on-resistance.

而且,此種課題不僅於使用光硬化型異向性導電接著劑之情 形時,而且於使用熱硬化型及光、熱硬化型異向性導電接著劑之情形時亦可能發生。 Moreover, this problem is not only the use of photohardenable anisotropic conductive adhesives. It may also occur in the case of a shape, and in the case of using a thermosetting type and a light or thermosetting anisotropic conductive adhesive.

本發明係解決上述課題者,其目的在於提供一種確保利用形成細帶的電子零件之接著強度,並且防止因黏合劑樹脂而產生之支持台之污損或基板接著及電子零件之連接電阻之上升的連接體之製造方法、電子零件之連接方法、及使用其而製造之連接體。 The present invention has been made in an effort to solve the above problems, and an object of the invention is to provide an adhesive strength for securing an electronic component formed by a thin ribbon, and to prevent contamination of a support table due to a binder resin or an increase in connection resistance of a substrate and an electronic component. A method of manufacturing a connector, a method of connecting electronic components, and a connector manufactured using the same.

為了解決上述課題,本發明之連接體之製造方法具有下述步驟:接著劑配置步驟,係將含有光聚合起始劑之電路連接用接著劑設置於具有透光性之電路基板上;及壓接步驟,係介隔上述電路連接用接著劑,於上述電路基板上配置電子零件,將上述電子零件朝上述電路基板加熱抵壓,並且使上述電路連接用接著劑硬化;且上述電路連接用接著劑於上述壓接步驟中之加熱溫度下之熔融黏度在4000Pa.s以下。 In order to solve the above problems, the method for producing a connector of the present invention has the following steps: an adhesive disposing step of disposing a circuit connecting adhesive containing a photopolymerization initiator on a circuit board having light transmissivity; In the step of disposing the electronic component on the circuit board, the electronic component is placed on the circuit board, and the electronic component is heated and pressed against the circuit board, and the circuit connecting adhesive is cured; and the circuit connection is followed by The melt viscosity of the agent at the heating temperature in the above crimping step is 4000 Pa. s below.

又,本發明之電子零件之連接方法具有下述步驟:接著劑配置步驟,係將含有光聚合起始劑之電路連接用接著劑設置於具有透光性之電路基板上;及壓接步驟,係介隔上述電路連接用接著劑,於上述電路基板上配置電子零件,將上述電子零件朝上述電路基板加熱抵壓,並且使上述電路連接用接著劑硬化;且上述電路連接用接著劑於上述壓接步驟中之加熱溫度下之熔融黏度在4000Pa.s以下。 Moreover, the method of connecting an electronic component according to the present invention has the following steps: an adhesive disposing step of disposing a circuit connecting adhesive containing a photopolymerization initiator on a light-transmitting circuit substrate; and a crimping step, Interposing the above-mentioned circuit-connecting adhesive, disposing an electronic component on the circuit board, heating and pressing the electronic component toward the circuit board, and curing the circuit-connecting adhesive; and the circuit-connecting adhesive is as described above The melt viscosity at the heating temperature in the crimping step is 4000 Pa. s below.

又,本發明之連接體係藉由上述記載之製造方法而製成。 Further, the connection system of the present invention is produced by the above-described production method.

根據本發明,正式壓接步驟之加熱溫度下之熔融黏度係設在4000Pa.s以下,故而能夠藉由黏合劑樹脂之排除而充分地壓入導電性粒 子,從而能夠獲得良好之導通可靠性。又,根據本發明,於電路基板與電子零件之間形成之細帶之溢出寬度W亦成為適當者,能夠實現電路基板與電子零件之連接強度之提高,並且亦防止支持台之污損。 According to the invention, the melt viscosity at the heating temperature of the formal crimping step is set at 4000 Pa. s or less, so that the conductive particles can be sufficiently pressed by the exclusion of the binder resin. Son, so that good conduction reliability can be obtained. Moreover, according to the present invention, the overflow width W of the thin strip formed between the circuit board and the electronic component is also suitable, and the connection strength between the circuit board and the electronic component can be improved, and the contamination of the support table can be prevented.

1‧‧‧觸控感測器 1‧‧‧Touch sensor

2‧‧‧透明膜 2‧‧‧Transparent film

3‧‧‧連接端子 3‧‧‧Connecting terminal

4‧‧‧構裝部 4‧‧‧Construction Department

5、51‧‧‧可撓性基板 5, 51‧‧‧Flexible substrate

6、53‧‧‧異向性導電膜 6, 53‧‧‧ anisotropic conductive film

7、52、55‧‧‧連接端子 7, 52, 55‧‧‧ connection terminals

8‧‧‧覆蓋層 8‧‧‧ Coverage

9‧‧‧基板 9‧‧‧Substrate

10‧‧‧配線圖案 10‧‧‧Wiring pattern

12‧‧‧外緣部 12‧‧‧The outer edge

20、56‧‧‧熱壓接工具 20, 56‧‧‧Hot crimping tools

21‧‧‧細帶 21‧‧‧Strip

22、50‧‧‧緩衝材料 22, 50‧‧‧ cushioning materials

23‧‧‧紫外線照射器 23‧‧‧UV illuminator

24‧‧‧支持台 24‧‧‧Support desk

54‧‧‧剛性基板 54‧‧‧Rigid substrate

圖1係表示應用本發明之連接體之製造方法之一例之剖面圖。 Fig. 1 is a cross-sectional view showing an example of a method of manufacturing a connecting body to which the present invention is applied.

圖2係表示應用本發明之連接體之製造方法之一例之立體圖。 Fig. 2 is a perspective view showing an example of a method of manufacturing a connecting body to which the present invention is applied.

圖3係表示異向性導電膜之一形態之側視圖。 Fig. 3 is a side view showing one form of an anisotropic conductive film.

圖4係示意性地表示正式壓接步驟之剖面圖。 Fig. 4 is a cross-sectional view schematically showing a formal crimping step.

圖5係示意性地表示連接體之導電性粒子之面密度分佈之俯視圖。 Fig. 5 is a plan view schematically showing the areal density distribution of the conductive particles of the bonded body.

圖6係表示習知之連接體之製造方法之剖面圖,(A)為分解剖面圖,(B)為正式壓接時之剖面圖。 Fig. 6 is a cross-sectional view showing a conventional method of manufacturing a connector, wherein (A) is an exploded cross-sectional view and (B) is a cross-sectional view at the time of final pressure bonding.

以下,一面參照圖式,一面對應用本發明之連接體之製造方法、電子零件之連接方法、連接體進行詳細說明。再者,本發明並不僅限定於以下之實施形態,當然能夠於不脫離本發明之主旨之範圍內進行各種變更。又,圖式係示意性者,存在各尺寸之比率等與現實者不同之情況。具體之尺寸等當參酌以下之說明而進行判斷。又,當然,於圖式相互間亦包含相互之尺寸之關係或比率不同之部分。 Hereinafter, a method of manufacturing a connector to which the present invention is applied, a method of connecting electronic components, and a connector will be described in detail with reference to the drawings. The present invention is not limited to the embodiments described below, and various modifications can be made without departing from the spirit and scope of the invention. Further, the drawings are schematic, and there is a case where the ratio of each size is different from the actual one. The specific dimensions and the like are judged based on the following description. Further, of course, the drawings also include portions in which the relationship or ratio of the dimensions is different from each other.

應用本發明之連接體係於具有透光性之電路基板,介隔異向 性導電接著劑連接可撓性基板等電子零件而成之連接體,例如可用於內置於電視或PC、智慧型手機、行動電話、遊戲機、影音設備、輸入板終端、可佩戴終端、車輛用監視器等顯示裝置或觸控面板、其他所有電子機器之基板。於此種基板中,就微間距化、輕量薄型化等觀點而言,係採用將形成有IC晶片或各種電路之可撓性基板直接安裝至具有透光性之電路基板上即所謂之COF(chip on film)、COG(chip on glass)、FOF(film on film)、FOG(film on glass)。又,作為用於各種基板與IC晶片或可撓性基板等之接合的接合膜,較常使用“於黏合劑樹脂層分散有導電性粒子”之異向性導電膜(ACF:anisotropic conductive film)。 Applying the connection system of the present invention to a circuit board having light transmissivity, intervening in the opposite direction A conductive connecting agent is connected to an electronic component such as a flexible substrate, and can be used, for example, in a television or a PC, a smart phone, a mobile phone, a game machine, an audio-visual device, an input terminal, a wearable terminal, or a vehicle. A display device such as a monitor or a touch panel, and a substrate of all other electronic devices. In such a substrate, from the viewpoints of fine pitch, light weight, and the like, a flexible substrate on which an IC chip or various circuits are formed is directly mounted on a circuit board having light transmissibility, that is, a so-called COF (chip on film), COG (chip on glass), FOF (film on film), FOG (film on glass). Further, as a bonding film for bonding various substrates to an IC chip or a flexible substrate or the like, an anisotropic conductive film (ACF: anisotropic conductive film) in which "conductive particles are dispersed in a binder resin layer" is often used. .

以下,作為應用本發明之連接體之一例,對作為輸入器件而組入至各種監視器(monitor)之觸控感測器1進行說明。作為觸控感測器1,普遍使用將形成有電極圖案之膜或塑膠等基體之2片組合而成者,或於1片基體之兩面形成有電極圖案者。 Hereinafter, as an example of a connector to which the present invention is applied, a touch sensor 1 incorporated as an input device to various monitors will be described. As the touch sensor 1, a film in which an electrode pattern or a substrate such as a plastic is formed is generally used, or an electrode pattern is formed on both surfaces of a substrate.

於成為基體之透明膜2中,成為感測器部之電極圖案被形成為矩陣狀,各電極圖案介隔配線圖案與形成於透明膜2之外緣部之連接端子3連接。而且,如圖1、圖2所示,觸控感測器1中可撓性基板5與有多個連接端子3並聯之構裝部4連接,該可撓性基板5係與位置檢測用控制器連接者。 In the transparent film 2 to be a substrate, the electrode patterns to be the sensor portions are formed in a matrix shape, and the electrode pattern intervening wiring patterns are connected to the connection terminals 3 formed on the outer edge portion of the transparent film 2. Further, as shown in FIGS. 1 and 2, the flexible substrate 5 of the touch sensor 1 is connected to a configuration portion 4 in which a plurality of connection terminals 3 are connected in parallel, and the flexible substrate 5 is controlled by position detection. Connector.

成為觸控感測器1之基體之透明膜2,例如可使用PET(聚對苯二甲酸乙二酯)、聚碳酸酯、藉由對PET膜貼合聚醯亞胺膜而補強者、或對環烯系樹脂添加彈性體等使其分散而成之環烯系樹脂組成物膜等由透明合成樹脂構成之膜材。作為構成感測器部之電極圖案,可使用以有機導 電性高分子為主劑之透明導電材料。例如可列舉至少含有聚噻吩衍生物聚合物、水溶性有機化合物、及摻雜材料之組成物。將由此種有機導電性高分子構成之漿料用作印刷油墨,例如藉由網版印刷直接圖案化,藉此能夠於透明膜2之表面形成特定形狀之電極圖案。或,將有機導電性高分子塗佈至透明膜2之兩面之後,藉由含酸或鹼性試劑之透明印刷油墨,使有機導電性高分子之層局部地劣化,藉此亦能夠形成電極圖案。此外,於電極圖案之圖案化,可使用凹版印刷、噴墨印刷等各種方法。又,亦可使用藉由將塗佈有感光性物質之基體之表面圖案狀地曝光,而形成特定之圖案之光微影法等。即,只要能夠形成以有機導電性高分子為主劑之透明導電材料作為電極圖案,便可使用上述方法以外之方法。 The transparent film 2 which becomes the base of the touch sensor 1 can be reinforced by, for example, PET (polyethylene terephthalate), polycarbonate, or a polyimide film adhered to the PET film, or A film made of a transparent synthetic resin such as a cycloolefin-based resin composition film obtained by dispersing an elastomer or the like with a cycloolefin-based resin. As an electrode pattern constituting the sensor portion, an organic guide can be used. A transparent conductive material mainly composed of an electrical polymer. For example, a composition containing at least a polythiophene derivative polymer, a water-soluble organic compound, and a dopant material may be mentioned. A slurry composed of such an organic conductive polymer is used as a printing ink, and is directly patterned by screen printing, for example, whereby an electrode pattern having a specific shape can be formed on the surface of the transparent film 2. Alternatively, after the organic conductive polymer is applied to both surfaces of the transparent film 2, the layer of the organic conductive polymer is locally deteriorated by a transparent printing ink containing an acid or an alkaline agent, whereby an electrode pattern can also be formed. . Further, various methods such as gravure printing and inkjet printing can be used for patterning the electrode pattern. Further, a photolithography method in which a specific pattern is formed by exposing a surface of a substrate coated with a photosensitive material in a pattern may be used. That is, as long as a transparent conductive material containing an organic conductive polymer as a main component can be formed as an electrode pattern, a method other than the above method can be used.

介隔配線圖案而與各電極圖案連接之多個連接端子3,例如可藉由如下方法而形成,即,藉由濺鍍或真空蒸鍍等公知之方法而製造ITO透明導電膜,或藉由銀漿之網版印刷而直接圖案化,或蝕刻銅箔等。多個連接端子3例如大致形成為矩形,如圖2所示,於透明膜2之外緣部跨及與長度方向正交之方向排列多個而形成,藉此構成供連接可撓性基板5之構裝部4。 The plurality of connection terminals 3 connected to the respective electrode patterns via the wiring pattern can be formed, for example, by a known method such as sputtering or vacuum deposition to produce an ITO transparent conductive film, or by using a known method such as sputtering or vacuum deposition. The silver paste is directly patterned by screen printing, or etched copper foil or the like. The plurality of connection terminals 3 are formed substantially in a rectangular shape, for example, and are formed by arranging a plurality of outer edges of the transparent film 2 and a direction orthogonal to the longitudinal direction as shown in FIG. 2, thereby constituting the flexible substrate 5 for connection. The mounting portion 4.

於連接該構裝部4與可撓性基板5時,係使用異向性導電膜(ACF:anisotropic conductive film)6作為導電性接著劑。異向性導電膜6如下述般於黏合劑樹脂含有導電性粒子,使可撓性基板5之連接端子7與形成於透明膜2之連接端子3介隔導電性粒子電性連接。 When the structure 4 and the flexible substrate 5 are connected, an anisotropic conductive film (ACF) 6 is used as a conductive adhesive. The anisotropic conductive film 6 contains conductive particles in the binder resin as described below, and the connection terminals 7 of the flexible substrate 5 and the connection terminals 3 formed on the transparent film 2 are electrically connected to each other via conductive particles.

[可撓性基板] [Flexible substrate]

連接於透明膜2之構裝部4之可撓性基板5被連接於未圖示之位置檢 測用控制器,且成為將針對構成感測器部之每一個電極圖案而設置之連接端子3與該控制器連接之連接器。如圖2所示,可撓性基板5於聚醯亞胺等具有可撓性之基板9之一面9a上,排列形成有多個供與透明膜2之連接端子3連接之連接端子7。連接端子7例如藉由使銅箔等圖案化,並且適當對表面實施鍍鎳鍍金等鍍敷塗佈處理而形成,與連接端子3同樣地,例如形成為大致矩形,跨及與長度方向正交之方向排列形成有多個。連接端子7之寬度與連接端子3之寬度、及相鄰接之連接端子7間之間隔與相鄰接之連接端子3間之間隔,呈大致相同圖案排列,連接端子7與連接端子3介隔異向性導電膜6而重疊。 The flexible substrate 5 connected to the mounting portion 4 of the transparent film 2 is connected to a position not shown. The measuring controller is a connector that connects the connection terminal 3 provided for each of the electrode patterns constituting the sensor portion to the controller. As shown in FIG. 2, the flexible substrate 5 is formed with a plurality of connection terminals 7 for connecting to the connection terminals 3 of the transparent film 2, on one surface 9a of the flexible substrate 9 such as polyimide. The connection terminal 7 is formed by, for example, patterning a copper foil or the like, and is subjected to a plating treatment such as nickel plating or gold plating on the surface, and is formed into a substantially rectangular shape, for example, orthogonal to the longitudinal direction, similarly to the connection terminal 3 . A plurality of directions are formed. The width of the connection terminal 7 and the width of the connection terminal 3, and the interval between the adjacent connection terminals 7 and the interval between the adjacent connection terminals 3 are arranged in substantially the same pattern, and the connection terminal 7 is separated from the connection terminal 3. The anisotropic conductive film 6 overlaps.

[覆蓋層] [coverage layer]

再者,可撓性基板5於連接端子7之附近設置有覆蓋層8。覆蓋層8係保護形成於基板9之與透明膜2連接之一面9a之其他配線圖案者,於絕緣性之基底膜之一面設置有接著劑層,藉由該接著劑層貼附至基板9之一面9a。 Further, the flexible substrate 5 is provided with a cover layer 8 in the vicinity of the connection terminal 7. The cover layer 8 protects other wiring patterns formed on the one surface 9a of the substrate 9 connected to the transparent film 2, and an adhesive layer is provided on one surface of the insulating base film, and the adhesive layer is attached to the substrate 9 One side 9a.

觸控感測器1中,使透明膜2之設置有連接端子3之構裝部4或可撓性基板5之設置有連接端子7之外緣部狹小化,故而如圖2所示,包含覆蓋至可撓性基板5之外緣附近之覆蓋層8之一部分在內,進行介隔異向性導電膜6之連接。藉此,觸控感測器1確保透明膜2與可撓性基板5之電性、機械性連接之可靠性。 In the touch sensor 1, the outer peripheral portion of the connecting portion 7 in which the connecting portion 3 of the transparent film 2 is provided with the connection terminal 3 or the flexible substrate 5 is narrowed is provided, and as shown in FIG. The connection of the anisotropic conductive film 6 is performed by covering a portion of the cover layer 8 near the outer edge of the flexible substrate 5. Thereby, the touch sensor 1 ensures the reliability of the electrical and mechanical connection of the transparent film 2 and the flexible substrate 5.

[異向性導電膜] [Anisotropic Conductive Film]

異向性導電膜6係光硬化型接著劑,藉由利用下述熱壓接工具20使之受到熱加壓而流動化,導電性粒子16於透明膜2及可撓性基板5之各連接 端子3、7之間被壓扁,藉由光照射,於導電性粒子16被壓扁之狀態下硬化。藉此,異向性導電膜6將透明膜2與可撓性基板5電性、機械性連接。 The anisotropic conductive film 6 is a photocurable adhesive which is fluidized by thermal compression by the following thermocompression bonding tool 20, and the conductive particles 16 are connected to each of the transparent film 2 and the flexible substrate 5. The terminals 3 and 7 are crushed, and are irradiated with light to be cured in a state where the conductive particles 16 are crushed. Thereby, the anisotropic conductive film 6 electrically and mechanically connects the transparent film 2 and the flexible substrate 5.

異向性導電膜6係例如圖3所示,於黏合劑樹脂15(接著劑)分散有導電性粒子16而成,藉由將該熱硬化性接著材料組成物塗佈至基底膜17上而成型為膜狀者。 The anisotropic conductive film 6 is formed by dispersing the conductive particles 16 in the binder resin 15 (adhesive) as shown in FIG. 3, and applying the thermosetting adhesive material composition to the base film 17. Formed into a film shape.

基底膜17例如係對PET(poly ethylene terephthalate)、OPP(oriented polypropylene)、PMP(poly-4-methylpentene-1)、PTFE(polytetrafluoroethylene)等塗佈聚矽氧等剝離劑而成。 The base film 17 is formed by, for example, applying a stripping agent such as poly(ethylene terephthalate), OPP (oriented polypropylene), PMP (poly-4-methylpentene-1), or PTFE (polytetrafluoroethylene) to polyfluorene.

黏合劑榭脂15只要為光硬化型,則並無特別限定,可使用自由基聚合型、陽離子聚合型等。以下,對自由基聚合型黏合劑樹脂進行說明。 The binder rouge 15 is not particularly limited as long as it is photocurable, and a radical polymerization type, a cationic polymerization type, or the like can be used. Hereinafter, the radical polymerization type binder resin will be described.

自由基聚合型黏合劑樹脂含有膜形成樹脂、自由基硬化性化合物、自由基聚合起始劑。作為膜形成樹脂,可使用苯氧樹脂、環氧樹脂、聚酯樹脂、聚胺酯樹脂(polyurethane resin)、聚醯胺、EVA等熱塑性彈性體等。該等之中,就耐熱性、接著性而言,較佳為使用自雙酚A與表氯醇合成之雙酚A型苯氧樹脂。 The radical polymerizable binder resin contains a film-forming resin, a radical curable compound, and a radical polymerization initiator. As the film-forming resin, a thermoplastic elastomer such as a phenoxy resin, an epoxy resin, a polyester resin, a polyurethane resin, a polyamide or EVA can be used. Among these, in terms of heat resistance and adhesion, it is preferred to use a bisphenol A type phenoxy resin synthesized from bisphenol A and epichlorohydrin.

作為自由基聚合性化合物,可自於接著劑等領域中使用之(甲基)丙烯酸酯適當選擇而使用。再者,於本說明書中,(甲基)丙烯酸酯係意指包含丙烯酸酯(acrylate)與甲基丙烯酸酯(methacrylate)。 The radically polymerizable compound can be appropriately selected from (meth) acrylate which is used in the field of an adhesive or the like. Further, in the present specification, the (meth) acrylate system means acrylate and methacrylate.

作為自由基聚合性化合物之具體例,可列舉:環氧丙烯酸酯、異三聚氰酸EO改質二丙烯酸酯、三環癸烷二甲醇二丙烯酸酯、二羥甲基-三環癸烷二丙烯酸酯、聚乙二醇二丙烯酸酯、丙烯酸胺酯、丙烯酸2-羥 基乙酯、丙烯酸2-羥基丙酯、丙烯酸4-羥基丁酯、丙烯酸異丁酯、丙烯酸第三丁酯、丙烯酸異辛酯、雙苯氧基乙醇茀二丙烯酸酯(bisphenoxyethanolfluorene diacrylate)、琥珀酸2-丙烯醯氧基乙酯、丙烯酸月桂酯、丙烯酸硬脂酯、丙烯酸異莰酯、丙烯酸環己酯、三(2-羥乙基)異氰尿酸三丙烯酸酯、丙烯酸四氫糠酯、鄰苯二甲酸二縮水甘油醚丙烯酸酯、乙氧化雙酚A二甲基丙烯酸脂、雙酚A型環氧丙烯酸酯、及與其等相當之(甲基)丙烯酸酯等;可使用其等中之1種或2種以上。該等中,較佳使用丙烯酸酯或丙烯酸胺酯等。作為能夠於市場中獲得之具體例,可列舉東亞合成工業股份有限公司製造之商品名「M-315」或「M1600」等。 Specific examples of the radically polymerizable compound include epoxy acrylate, isomeric cyanuric acid EO modified diacrylate, tricyclodecane dimethanol diacrylate, and dimethylol-tricyclodecane II. Acrylate, polyethylene glycol diacrylate, urethane acrylate, 2-hydroxy acrylate Ethyl ethyl ester, 2-hydroxypropyl acrylate, 4-hydroxybutyl acrylate, isobutyl acrylate, tert-butyl acrylate, isooctyl acrylate, bisphenoxyethanol fluorene diacrylate, succinic acid 2-propenyloxyethyl ester, lauryl acrylate, stearyl acrylate, isodecyl acrylate, cyclohexyl acrylate, tris(2-hydroxyethyl)isocyanuric acid triacrylate, tetrahydrofurfuryl acrylate, adjacent Diglycidyl ether acrylate, ethoxylated bisphenol A dimethacrylate, bisphenol A epoxy acrylate, and the like (meth) acrylate, etc.; Kind or more than two. Among these, acrylate or acrylate or the like is preferably used. Specific examples which can be obtained in the market include the trade name "M-315" or "M1600" manufactured by Toagosei Co., Ltd.

光自由基聚合起始劑可自公知之自由基聚合起始劑中適當選擇而使用。 The photoradical polymerization initiator can be appropriately selected from known radical polymerization initiators.

作為光聚合型自由基聚合起始劑,可列舉:乙酮、1-[9-乙基-6-(2-甲基苯甲醯基)-9H-咔唑-3-基]-1-(0-乙醯肟)、二苯甲酮、4,4-雙(二乙基胺基)二苯甲酮、2,4,6-二甲基二苯甲酮等9-氧硫(thioxanthone)類;二乙氧基苯乙酮、2-羥基-2-甲基-1-苯基丙烷-1-酮、苯偶醯二甲基縮酮等苯乙酮類;安息香甲醚、安息香乙醚、安息香異丙醚等安息香醚類;2,4,6-三甲基苯甲醯基二苯基氧化膦、雙(2,6-二甲氧基苯甲醯基)-2,4,4-二甲基戊基氧化膦、雙(2,4,6-三甲基苯甲醯基)-苯基氧化膦等醯基氧化膦類等。 As a photopolymerization type radical polymerization initiator, ethyl ketone, 1-[9-ethyl-6-(2-methylbenzylidene)-9H-carbazol-3-yl]-1- 9-oxosulfuric acid such as (0-acetamidine), benzophenone, 4,4-bis(diethylamino)benzophenone, 2,4,6-dimethylbenzophenone (thioxanthone); acetophenones such as diethoxyacetophenone, 2-hydroxy-2-methyl-1-phenylpropan-1-one, benzoin dimethyl ketal; benzoin methyl ether, Benzoin ethers such as benzoin ethyl ether and benzoin isopropyl ether; 2,4,6-trimethylbenzimidyl diphenylphosphine oxide, bis(2,6-dimethoxybenzylidene)-2,4 a fluorenylphosphine oxide such as 4-dimethylpentylphosphine oxide or bis(2,4,6-trimethylbenzylidene)-phenylphosphine oxide.

該等自由基聚合起始劑可單獨使用1種,或併用2種以上。該等中,較佳使用1,1-二(過氧化第三丁基)環己烷、雙(2,4,6-三甲基苯甲醯基)-苯基氧化膦等。作為能夠於市場中獲得之具體例,可列舉BASF Japan(股)之商品名「IRGACURE OXE02」等。 These radical polymerization initiators may be used alone or in combination of two or more. Among these, 1,1-di(t-butylperoxy)cyclohexane, bis(2,4,6-trimethylbenzylidene)-phenylphosphine oxide, and the like are preferably used. Specific examples of the product that can be obtained in the market include the trade name "IRGACURE OXE02" of BASF Japan.

又,作為與電路連接材料摻合之其他添加物,可視需要含有矽烷偶合劑、無機填料、丙烯酸橡膠、各種丙烯酸單體等稀釋用單體、填充劑、軟化劑、著色劑、難燃劑、觸變劑等。 Further, as an additional additive to be mixed with the circuit connecting material, a halogen monomer, an inorganic filler, an acrylic rubber, a dilute monomer such as various acrylic monomers, a filler, a softener, a colorant, a flame retardant, or the like may be contained as needed. Thixotropic agents, etc.

作為矽烷偶合劑,並無特別限定,例如可列舉:環氧系、胺系、巰基-硫醚系、醯脲系等。藉由添加矽烷偶合劑,能夠提高有機材料與無機材料之界面之接著性。 The decane coupling agent is not particularly limited, and examples thereof include epoxy-based, amine-based, thiol-thioether-based, and guanidine-based. By adding a decane coupling agent, the adhesion of the interface between the organic material and the inorganic material can be improved.

又,作為無機填料,並無特別限定,可使用氧化矽、滑石、氧化鈦、碳酸鈣、氧化鎂等。藉由添加無機填料,能夠控制黏合劑樹脂15之流動性,從而提高粒子捕捉率。 Further, the inorganic filler is not particularly limited, and cerium oxide, talc, titanium oxide, calcium carbonate, magnesium oxide or the like can be used. By adding an inorganic filler, the fluidity of the binder resin 15 can be controlled, thereby increasing the particle trapping rate.

作為導電性粒子16,可列舉於異向性導電膜6中使用之公知之任何導電性粒子。作為導電性粒子16,例如可列舉:鎳、鐵、銅、鋁、錫、鉛、鉻、鈷、銀、金等各種金屬或金屬合金之粒子;對金屬氧化物、碳、石墨、玻璃、陶瓷、塑膠等粒子之表面塗佈金屬而成者;或對該等粒子之表面進而塗佈絕緣薄膜而成者等。於為對樹脂粒子之表面塗佈金屬而成者之情形時,作為樹脂粒子,例如可列舉:環氧樹脂、酚系樹脂、丙烯酸樹脂、丙烯腈-苯乙烯(AS)樹脂、苯胍樹脂(benzoguanamine resin)、二乙烯苯系樹脂、苯乙烯系樹脂等粒子。 The conductive particles 16 include any of the known conductive particles used in the anisotropic conductive film 6. Examples of the conductive particles 16 include particles of various metals such as nickel, iron, copper, aluminum, tin, lead, chromium, cobalt, silver, gold, or metal alloys; and metal oxides, carbon, graphite, glass, and ceramics. The surface of the particles such as plastic is coated with a metal; or the surface of the particles is coated with an insulating film. In the case where a metal is applied to the surface of the resin particle, examples of the resin particle include an epoxy resin, a phenol resin, an acrylic resin, an acrylonitrile-styrene (AS) resin, and a benzoquinone. Particles such as a benzoguanamine resin, a divinylbenzene resin, or a styrene resin.

再者,就使用之容易性、保存穩定性等觀點而言,異向性導電膜6亦可設為如下構成:於與積層有基底膜17之面為相反之面側設置覆蓋膜。又,異向性導電膜6之形狀並無特別限定,例如可設為能夠捲繞至捲盤18之長條帶形狀,並且可切下特定之長度使用。 In addition, the anisotropic conductive film 6 may be configured to provide a cover film on the side opposite to the surface on which the base film 17 is laminated, from the viewpoints of easiness of use, storage stability, and the like. Further, the shape of the anisotropic conductive film 6 is not particularly limited, and for example, it can be formed into a long strip shape that can be wound around the reel 18, and can be used by cutting a specific length.

又,本發明之異向性導電膜6亦可設為:使含有導電性粒子 16之黏合劑樹脂層、與由不含有導電性粒子之絕緣性之接著劑組成物構成之絕緣性接著劑層積層而成的多層構造之異向性導電膜。又,用於可撓性基板5之連接之異向性導電接著劑除成形為膜狀地之異向性導電膜6外,亦可使用糊狀之異向性導電漿料。 Further, the anisotropic conductive film 6 of the present invention may be formed to contain conductive particles. An anisotropic conductive film having a multilayer structure in which an adhesive resin layer of 16 and an insulating adhesive composed of an insulating adhesive composition containing no conductive particles are laminated. Further, in addition to the anisotropic conductive film 6 to be bonded to the flexible substrate 5, a paste-like anisotropic conductive paste may be used in addition to the anisotropic conductive film 6 formed into a film shape.

[熔融黏度] [melt viscosity]

此處,本技術之異向性導電膜6於下述可撓性基板5之正式壓接步驟中之利用熱壓接工具20之加熱溫度下之熔融黏度在4000Pa.s以下。藉由將正式壓接步驟之加熱溫度下的異向性導電膜6之熔融黏度設為該範圍,於使用光硬化型異向性導電膜6之低溫低壓下之正式壓接步驟中,黏合劑樹脂15亦表現出適度之流動性,藉由利用連接端子3、7充分地壓入導電性粒子16,能夠確保導通可靠性。 Here, the refractive conductivity of the anisotropic conductive film 6 of the present technology at the heating temperature of the thermocompression bonding tool 20 in the final crimping step of the flexible substrate 5 described below is 4000 Pa. s below. By setting the melt viscosity of the anisotropic conductive film 6 at the heating temperature of the final pressure bonding step to the range, in the final pressure bonding step using the photocurable anisotropic conductive film 6 under low temperature and low pressure, the adhesive The resin 15 also exhibits moderate fluidity, and the conductive particles 16 are sufficiently pressed by the connection terminals 3 and 7, so that the conduction reliability can be ensured.

又,黏合劑樹脂15表現出適度之流動性,藉此,黏合劑樹脂自可撓性基板5突出之透明膜2之側面2a適度溢出,藉由紫外光之照射形成細帶21。藉此,透明膜2及可撓性基板5之間之黏合劑樹脂15之接觸面積增加,並且黏合劑樹脂15與透明膜2或可撓性基板5之基材貼近、並加以硬化,藉此發揮所謂之錨固效應,藉此,能夠實現接著強度之提高。 Further, the adhesive resin 15 exhibits a moderate fluidity, whereby the side surface 2a of the transparent film 2 from which the adhesive resin protrudes from the flexible substrate 5 is moderately overflowed, and the fine tape 21 is formed by irradiation of ultraviolet light. Thereby, the contact area of the adhesive resin 15 between the transparent film 2 and the flexible substrate 5 is increased, and the adhesive resin 15 is adhered to and hardened to the substrate of the transparent film 2 or the flexible substrate 5, whereby The so-called anchoring effect is exerted, whereby the improvement of the bonding strength can be achieved.

又,本技術之異向性導電膜6較佳為可撓性基板5之正式壓接步驟中之利用熱壓接工具20之加熱溫度下之熔融黏度在1000Pa.s以上。藉由將正式壓接步驟中之加熱溫度下之異向性導電膜6之熔融黏度設在該範圍,藉由使黏合劑樹脂15溢出至透明膜2之可撓性基板5突出之側面2a而形成之細帶21其溢出寬度W成為適當之長度,能夠實現因與黏合劑樹脂15之連接面積增加所產生之接著強度提高,並且亦防止黏合劑樹脂15自透 明膜2之側面2a流回至背面而污染支持台。 Moreover, the anisotropic conductive film 6 of the present technology is preferably a melt viscosity at a heating temperature of the thermal bonding tool 20 in the final crimping step of the flexible substrate 5 at 1000 Pa. s above. By setting the melt viscosity of the anisotropic conductive film 6 at the heating temperature in the final pressure bonding step to this range, the adhesive resin 15 is allowed to overflow to the side 2a of the flexible substrate 5 on which the transparent film 2 protrudes. The formed fine tape 21 has an overflow width W of an appropriate length, and can achieve an increase in the adhesion strength due to an increase in the connection area with the adhesive resin 15, and also prevent the adhesive resin 15 from being self-transparent. The side 2a of the clear film 2 flows back to the back side to contaminate the support table.

尤其是,本技術之異向性導電膜6於正式壓接步驟中之利用熱壓接工具20之加熱溫度為100℃以下之低溫壓接步驟中,將該加熱溫度下之熔融黏度設為1000Pa.s以上且4000Pa.s以下,藉此,能夠實現導通可靠性之確保及與可撓性基板5之接著強度之提高,並且亦抑制對透明膜2或可撓性基板5之熱衝擊,從而防止變形等問題。 In particular, in the low-temperature pressure bonding step in which the heating temperature of the thermocompression bonding tool 20 is 100° C. or less in the final pressure bonding step, the refractive index at the heating temperature is set to 1000 Pa. . Above s and 4000Pa. In the following, it is possible to secure the conduction reliability and the adhesion strength to the flexible substrate 5, and also to suppress thermal shock to the transparent film 2 or the flexible substrate 5, thereby preventing deformation and the like.

[製造步驟] [manufacturing steps]

繼而,對觸控感測器1之製造步驟進行說明。觸控感測器1之製造步驟具有:接著劑配置步驟,係將異向性導電膜6配置於透明膜2之構裝部4上;及正式壓接步驟,其係介隔異向性導電膜6,於透明膜2上配置可撓性基板5,將可撓性基板5朝透明膜2加熱抵壓,並且照射紫外光,而使異向性導電膜6硬化。 Next, the manufacturing steps of the touch sensor 1 will be described. The manufacturing step of the touch sensor 1 has an adhesive arrangement step of disposing the anisotropic conductive film 6 on the structure 4 of the transparent film 2, and a formal crimping step of isotropic conduction. In the film 6, the flexible substrate 5 is placed on the transparent film 2, and the flexible substrate 5 is heated and pressed against the transparent film 2, and ultraviolet light is irradiated to cure the anisotropic conductive film 6.

[暫時貼附步驟] [temporary attachment step]

首先,將異向性導電膜6暫時貼至透明膜2上(接著劑配置步驟)。暫時貼附異向性導電膜6之方法係於透明膜2之連接端子3上,以使黏合劑樹脂15成為連接端子3側之方式,配置異向性導電膜6。於將黏合劑樹脂15配置於連接端子3上之後,自基底膜17側,利用熱壓接工具加熱及加壓,將黏合劑樹脂15轉接著至透明膜2,將基底膜17自黏合劑樹脂15剝離。 First, the anisotropic conductive film 6 is temporarily attached to the transparent film 2 (adhesive arrangement step). The method of temporarily attaching the anisotropic conductive film 6 is performed on the connection terminal 3 of the transparent film 2, and the anisotropic conductive film 6 is disposed such that the adhesive resin 15 is on the side of the connection terminal 3. After the adhesive resin 15 is placed on the connection terminal 3, the adhesive resin 15 is transferred to the transparent film 2 from the base film 17 side by heating and pressurization using a thermocompression bonding tool, and the base film 17 is self-adhesive. The resin 15 was peeled off.

[對準步驟/暫時壓接步驟] [Alignment step / temporary crimping step]

繼而,一面以使透明電極6與可撓性基板5之連接端子7介隔黏合劑樹脂15相對向之方式,進行可撓性基板5之對準,一面於透明膜2上配置可撓性基板5,於黏合劑樹脂15表現出流動性之程度之低溫低壓下,進行 可撓性基板5之暫時壓接。藉此,將透明膜2之翹曲抑制為最小,又,亦不會對可撓性基板5造成因熱而引起之損傷。 Then, the transparent substrate 6 and the connection terminal 7 of the flexible substrate 5 are opposed to each other with the adhesive resin 15 interposed therebetween, and the flexible substrate 5 is aligned, and the flexible substrate 2 is placed on the transparent film 2 5, under the low temperature and low pressure of the binder resin 15 exhibiting fluidity Temporary crimping of the flexible substrate 5. Thereby, the warpage of the transparent film 2 is suppressed to the minimum, and damage to the flexible substrate 5 due to heat is not caused.

[正式壓接步驟] [Formal crimping step]

繼而,如圖4所示,將可撓性基板5相對於透明膜2加熱抵壓,並且照射紫外光,藉此將其等電性、機械性連接(正式壓接步驟)。於正式壓接步驟中,藉由熱壓接工具20,加熱至使黏合劑樹脂15流動之低溫,並且以將導電性粒子4夾入至可撓性基板5之連接端子7及透明膜2之連接端子3之間之特定之壓力加壓。再者,於熱壓接工具20之熱加壓面,介存有矽橡膠等片狀之彈性劑構成之緩衝材料22。 Then, as shown in FIG. 4, the flexible substrate 5 is heated and pressed against the transparent film 2, and is irradiated with ultraviolet light, whereby it is electrically and mechanically connected (formal pressure bonding step). In the final pressure bonding step, the thermocompression bonding tool 20 is heated to a low temperature at which the binder resin 15 flows, and the conductive particles 4 are sandwiched between the connection terminal 7 of the flexible substrate 5 and the transparent film 2 The specific pressure between the connection terminals 3 is pressurized. Further, on the hot pressing surface of the thermocompression bonding tool 20, a cushioning material 22 composed of a sheet-like elastic agent such as ruthenium rubber is interposed.

又,於正式壓接步驟中,藉由紫外線照射器23,自透明膜2之背面側照射紫外光。自紫外線照射器23發出之紫外線穿透支持透明膜2之玻璃等透明之支持台24,照射至黏合劑樹脂15。 Further, in the final pressure bonding step, ultraviolet light is irradiated from the back side of the transparent film 2 by the ultraviolet ray irradiator 23. The ultraviolet rays emitted from the ultraviolet illuminator 23 penetrate the transparent support table 24 such as glass supporting the transparent film 2, and are irradiated to the binder resin 15.

作為紫外線照射器23,可使用LED燈、水銀燈、金屬鹵化物燈等。又,紫外線照射器23配置於支持台24之背面側,與利用熱壓接工具20之可撓性基板5之加熱抵壓之開始同時,或自加熱抵壓之開始延遲特定之時間,而開始紫外線之照射。藉此,紫外線照射器23於如下時點進行紫外線之照射而使黏合劑樹脂15硬化,即,該時間點為:藉由利用熱壓接工具20加熱抵壓使黏度降低,利用透明膜2之連接端子3與可撓性基板5之連接端子7夾著導電性粒子16,並且黏合劑樹脂15溢出至透明膜2之側面。 As the ultraviolet ray irradiator 23, an LED lamp, a mercury lamp, a metal halide lamp or the like can be used. Further, the ultraviolet ray irradiator 23 is disposed on the back side of the support table 24, and starts at the same time as the start of the heating pressing of the flexible substrate 5 by the thermocompression bonding tool 20, or a predetermined time from the start of the heating pressing, and starts. Irradiation of ultraviolet light. Thereby, the ultraviolet ray irradiator 23 is irradiated with ultraviolet rays to cure the adhesive resin 15 at the time point, that is, the pressure is lowered by the heat pressing of the thermocompression bonding tool 20, and the connection by the transparent film 2 is used. The conductive particles 16 are interposed between the terminal 3 and the connection terminal 7 of the flexible substrate 5, and the adhesive resin 15 overflows to the side surface of the transparent film 2.

藉此,形成可撓性基板5電性、機械性連接至透明膜2上,並且設置有細帶21,接著強度提高之觸控感測器1。 Thereby, the touch panel 1 in which the flexible substrate 5 is electrically and mechanically connected to the transparent film 2 and provided with the thin strip 21 and then increased in strength is formed.

此處,如上所述,異向性導電膜6之利用熱壓接工具20之加熱溫度下之熔融黏度係設在4000Pa.s以下。因此,根據本技術,於未達10MPa例如3~5MPa等之低壓下之正式壓接步驟中,黏合劑樹脂15亦表現出適度之流動性,並且藉由連接端子3、7可充分地壓入導電性粒子16。 Here, as described above, the melt viscosity of the anisotropic conductive film 6 at the heating temperature by the thermocompression bonding tool 20 is set at 4000 Pa. s below. Therefore, according to the present technology, the adhesive resin 15 exhibits a moderate fluidity in the formal crimping step at a low pressure of less than 10 MPa, for example, 3 to 5 MPa, etc., and can be sufficiently pressed by the connection terminals 3, 7. Conductive particles 16.

另一方面,若異向性導電膜6之利用熱壓接工具20之加熱溫度下之熔融黏度高於4000Pa.s,則黏合劑樹脂15之流動性較低,連接端子3、7間之黏合劑樹脂之排除不足,故而導電性粒子16之壓入不足,而損及導通可靠性。 On the other hand, if the anisotropic conductive film 6 is heated by the thermocompression bonding tool 20, the melt viscosity is higher than 4000 Pa. s, the fluidity of the binder resin 15 is low, and the removal of the binder resin between the connection terminals 3 and 7 is insufficient, so that the press-fitting of the conductive particles 16 is insufficient, and the conduction reliability is impaired.

又,藉由將異向性導電膜6之利用熱壓接工具20之加熱溫度下之熔融黏度設為1000Pa.s以上,溢出至可撓性基板5突出之透明膜2之側面的黏合劑樹脂15之溢出寬度W成為適當之長度,能夠藉由紫外光之照射形成適度大小之細帶21,從而能夠提高接著強度。 Moreover, the melt viscosity at the heating temperature of the anisotropic conductive film 6 by the thermocompression bonding tool 20 is set to 1000 Pa. s or more, the overflow width W of the adhesive resin 15 overflowing to the side surface of the transparent film 2 on which the flexible substrate 5 protrudes is an appropriate length, and an appropriate size of the thin strip 21 can be formed by irradiation of ultraviolet light, thereby improving the subsequent strength.

另一方面,若異向性導電膜6之利用熱壓接工具20之加熱溫度下之熔融黏度低於1000Pa.s,則黏合劑樹脂15會流回至透明膜2之背面,由此可能會發生透明支持台24之污損或於剝離接著於支持台24之透明膜2時發生透明膜2破損之危險。 On the other hand, if the anisotropic conductive film 6 is heated by the thermocompression bonding tool 20, the melt viscosity is less than 1000 Pa. s, the binder resin 15 will flow back to the back surface of the transparent film 2, whereby the contamination of the transparent support table 24 may occur or the transparent film 2 may be damaged when the transparent film 2 of the support table 24 is peeled off.

進而,根據本技術,作為正式壓接步驟,於進行利用熱壓接工具20之加熱溫度為100℃以下例如80℃等之低溫壓接之情形時,藉由將該加熱溫度下之熔融黏度設為1000Pa.s以上且4000Pa.s以下,能夠實現導通可靠性之確保及與可撓性基板5之接著強度之提高,並且亦抑制對透明膜2或可撓性基板5之熱衝擊,從而防止變形等問題。 Further, according to the present technology, when the heating temperature of the thermocompression bonding tool 20 is 50 ° C or lower, for example, 80 ° C or the like, the melting viscosity is set as the final pressure bonding step. It is 1000Pa. Above s and 4000Pa. In the following, it is possible to ensure the reliability of the conduction and the improvement of the adhesion strength with the flexible substrate 5, and also to suppress thermal shock to the transparent film 2 or the flexible substrate 5, thereby preventing deformation and the like.

[導電性粒子之面密度分佈] [area density distribution of conductive particles]

此處,藉由本製造步驟而製造之觸控感測器1,藉由熱壓接工具20壓接後之導電性粒子16呈現特定之面密度分佈,藉此實現接著強度及導通可靠性之提高。具體而言,如圖5所示,於觸控感測器1中,關於將透明膜2與可撓性基板5連接後之導電性粒子16之面密度分佈,於將自熱壓接工具20抵壓可撓性基板5及異向性電膜6之構裝部4跨及至形成有細帶21之透明膜2之外側緣之外緣部12中的粒子密度設為(a),將經熱壓接工具20抵壓之構裝部4中之兩連接端子3、7上之粒子密度設為(b)時,成為a>b。 Here, the touch sensor 1 manufactured by the manufacturing step exhibits a specific areal density distribution after the conductive particles 16 crimped by the thermocompression bonding tool 20, thereby improving the bonding strength and the conduction reliability. . Specifically, as shown in FIG. 5 , in the touch sensor 1 , the surface density distribution of the conductive particles 16 after connecting the transparent film 2 and the flexible substrate 5 is performed on the self-heating bonding tool 20 . The density of particles in the outer edge portion 12 of the outer edge of the transparent film 2 on which the flexible substrate 5 and the anisotropic film 6 are formed is set to (a), and the When the particle density on the two connection terminals 3 and 7 in the mounting portion 4 where the thermocompression bonding tool 20 is pressed is (b), a>b is obtained.

此處,面密度分佈係指上述外緣部12及構裝部4於同一平面上之導電性粒子16之密度a、b之分佈,係對外緣部12與構裝部4中之兩連接端子3、7上之各粒子密度a、b進行比較,且外緣部12與於構裝部4中導電性粒子16夾入至兩連接端子3、7間之平面為同一平面上。 Here, the areal density distribution refers to the distribution of the density a and b of the conductive particles 16 on the same plane of the outer edge portion 12 and the configuration portion 4, and is the connection terminal between the outer edge portion 12 and the configuration portion 4. The respective particle densities a and b on the third and seventh sides are compared, and the outer edge portion 12 and the conductive particles 16 in the constitution portion 4 are sandwiched by the plane between the two connection terminals 3 and 7 on the same plane.

本發明之主要目的在於:藉由熱壓接工具20之加熱抵壓使異向性導電膜6之黏合劑樹脂15流動,並且於透明膜2之側面形成細帶21,藉此實現導通可靠性與接著強度之兼顧。而且,若藉由紫外線照射使細帶21適當硬化,則外緣部12中之流動被阻礙,故而於同一平面上具有不同流動性,導電性粒子16於外緣部12最多地沈積,藉此變得高密度。於在兩連接端子3、7間夾著導電性粒子16之構裝部4,藉由熱壓接工具20之熱加壓而黏合劑樹脂15被擠出,故而粒子密度相對較小。 The main object of the present invention is to cause the adhesive resin 15 of the anisotropic conductive film 6 to flow by the heat pressing of the thermocompression bonding tool 20, and to form the thin strip 21 on the side of the transparent film 2, thereby achieving conduction reliability. With the strength of the next. Further, when the fine tape 21 is appropriately cured by ultraviolet irradiation, the flow in the outer edge portion 12 is hindered, so that the fluidity is different on the same plane, and the conductive particles 16 are deposited at the outer edge portion 12 at the most Become high density. The bonding portion of the conductive particles 16 between the two connection terminals 3 and 7 is thermally pressed by the thermocompression bonding tool 20, whereby the binder resin 15 is extruded, so that the particle density is relatively small.

藉由具備此種導電性粒子16之密度分佈,異向性導電膜6於透明膜2與可撓性基板5之間,適當地形成利用黏合劑樹脂15之細帶21,能夠提高接著強度。即,根據異向性導電膜6,外緣部12中之導電性粒子 16之密度(a)高於構裝部4中之導電性粒子之密度(b),自該情況可知於外緣部12,更多之黏合劑樹脂15流動並硬化。而且,如圖4所示,藉由流動至外緣部12之黏合劑樹脂15,跨及透明膜2與可撓性基板5之間而形成細帶21。藉此,異向性導電膜6能夠將透明膜2與可撓性基板5牢固地接合。 By providing the density distribution of the conductive particles 16 and the anisotropic conductive film 6 between the transparent film 2 and the flexible substrate 5, the fine tape 21 using the adhesive resin 15 is appropriately formed, whereby the bonding strength can be improved. That is, according to the anisotropic conductive film 6, the conductive particles in the outer edge portion 12 The density (a) of 16 is higher than the density (b) of the conductive particles in the constitution portion 4, and it is understood from this case that the outer edge portion 12 flows and hardens more of the binder resin 15. Further, as shown in FIG. 4, the fine tape 21 is formed between the transparent film 2 and the flexible substrate 5 by the adhesive resin 15 flowing to the outer edge portion 12. Thereby, the anisotropic conductive film 6 can firmly bond the transparent film 2 and the flexible substrate 5.

又,藉由具備此種導電性粒子16之密度分佈,於異向性導電膜6中,黏合劑樹脂15自兩連接端子3、7間適度流出,故而藉由利用熱壓接工具20之壓入,能夠確實地夾著導電性粒子16,從而能夠提高導通可靠性。 Further, by providing the density distribution of the conductive particles 16, the adhesive resin 15 is appropriately discharged from the connection terminals 3 and 7 in the anisotropic conductive film 6, so that the pressure is applied by the thermocompression bonding tool 20. In addition, the conductive particles 16 can be surely interposed, and the conduction reliability can be improved.

亦即,藉由確認該構裝部4與外緣部12中之導電性粒子16之面密度分佈,能夠簡單地檢查實現接著性與功能性之兼顧。亦即,無需進行如剝離強度檢查般之破壞性檢查,藉由測定粒子面密度便可知:藉由細帶部位之局部強度之提高,補強作為剝離開始點之端部,並且於藉由熱壓接工具20抵壓之構裝部4,導電性粒子16被適當地夾於兩連接端子3、7間,藉此實現導電性粒子16之不均的存在,以良好地保持異向導電性,從而能非破壞性且簡單地進行透明膜2與可撓性基板5之接著強度及導通可靠性之檢查。 In other words, by confirming the areal density distribution of the conductive particles 16 in the structure 4 and the outer edge portion 12, it is possible to easily check the balance between the adhesion and the functionality. That is, it is not necessary to perform a destructive inspection such as peel strength inspection, and by measuring the surface density of the particles, it is known that the reinforcing portion is the end portion of the peeling start point by the increase in the local strength of the thin strip portion, and is subjected to hot pressing. When the bonding tool 20 is pressed against the bonding portion 4, the conductive particles 16 are appropriately sandwiched between the connection terminals 3 and 7, whereby the unevenness of the conductive particles 16 is achieved, and the anisotropic conductivity is favorably maintained. Therefore, the inspection of the adhesion strength and the conduction reliability of the transparent film 2 and the flexible substrate 5 can be performed non-destructively and simply.

[其他] [other]

上述係以使用可撓性基板5作為電子零件之情形時為例進行了說明,但本發明除可撓性基板5外,亦可使用IC晶片或可撓性扁平電纜、剛性基板、捲帶式基板封裝體(TCP)等。 The above description has been made by using the flexible substrate 5 as an electronic component. However, in addition to the flexible substrate 5, the present invention can also use an IC chip or a flexible flat cable, a rigid substrate, and a tape-reel type. Substrate package (TCP) or the like.

[實施例] [Examples]

繼而,對本發明之實施例進行說明。於本實施例中,使用含有光硬化型或加熱硬化型硬化劑之異向性導電膜,形成於評價用塑膠膜基板連接評價用可撓性基板而成之連接體樣本。針對各連接體樣本,進行導通可靠性評價、細帶之溢出寬度(mm)之測定、粒子面密度(pcs/200×200μm)之測定、及壓接步驟後之塑膠膜基板之變形評價。 Next, an embodiment of the present invention will be described. In the present embodiment, an anisotropic conductive film containing a photocurable or heat-curing type hardener is used, and a molded body sample in which the evaluation plastic substrate is connected to the evaluation flexible substrate is used. For each of the connected body samples, the conduction reliability evaluation, the measurement of the overflow width (mm) of the fine tape, the measurement of the particle areal density (pcs/200×200 μm), and the deformation evaluation of the plastic film substrate after the pressure bonding step were performed.

[異向性導電膜] [Anisotropic Conductive Film]

各實施例及比較例之連接體樣本之製造中使用之異向性導電膜,係根據表1所示之成分(單位:質量份),準備A~D4種。成分A~C之異向性導電膜係光硬化型接著劑,成分D之異向性導電膜係加熱硬化型接著劑。 The anisotropic conductive film used for the production of the sample of the connector of each of the examples and the comparative examples was prepared in accordance with the components (unit: parts by mass) shown in Table 1. The anisotropic conductive film of the components A to C is a photocurable adhesive, and the anisotropic conductive film of the component D is a heat-curing adhesive.

將A~D之各成分之混合溶液塗佈至PET膜上,利用烘箱乾燥,藉此成形為厚度16μm、寬度20cm、長度30cm之膜狀。A~D之各成分之異向性導電膜之壓接前之導電性粒子之密度為20pcs/200×200μm。 The mixed solution of the components of A to D was applied onto a PET film, and dried in an oven to form a film having a thickness of 16 μm, a width of 20 cm, and a length of 30 cm. The density of the conductive particles before the pressure bonding of the anisotropic conductive film of each of the components A to D was 20 pcs/200×200 μm.

[評價用可撓性基板] [Flexible substrate for evaluation]

評價用可撓性基板係於厚度25μm之聚醯亞胺基板之一面形成有實施鍍銅而成之厚度12μm之銅配線圖案者。配線間距為400μm,且L/S=1/1。 In the evaluation flexible substrate, a copper wiring pattern having a thickness of 12 μm formed by copper plating was formed on one surface of a polyimide substrate having a thickness of 25 μm. The wiring pitch is 400 μm and L/S = 1/1.

[評價用塑膠膜基板] [Plastic film substrate for evaluation]

作為用於異向性導電膜之評價用電路基板,係使用於厚度50μm之PET膜設置ITO電極,於其上積層Cu電極而成之透明塑膠膜(電極之厚度分別為0.1μm)。配線間距為400μm,且L/S=1/1。 The circuit board for evaluation of the anisotropic conductive film is a transparent plastic film (the thickness of the electrode is 0.1 μm) in which an ITO electrode is provided on a PET film having a thickness of 50 μm and a Cu electrode is laminated thereon. The wiring pitch is 400 μm and L/S = 1/1.

對該塑膠膜基板進行上述異向性導電膜之暫時貼附、及評價用可撓性基板之暫時壓接之後,一面併用利用熱壓接工具之熱加壓、及利用紫外線照射器(ZUV-C30H:OMRON股份有限公司製造)之紫外線照射,一面進行正式壓接,而形成連接體樣本。 After the temporary attachment of the anisotropic conductive film to the plastic film substrate and the temporary pressure bonding of the evaluation flexible substrate, heat pressing using a thermocompression bonding tool and using an ultraviolet ray irradiator (ZUV- C30H: OMRON Co., Ltd.) UV irradiation, and formal crimping is performed to form a connector sample.

熱壓接工具之正式壓接溫度於實施例1、2、比較例1、3設為80℃,於比較例2、4設為130℃。又,熱壓接工具之正式壓接壓力及時間於各實施例及各比較例均為4MPa、5秒,於熱壓接工具之熱加壓面,介存有厚度450μm之矽橡膠之緩衝材料。又,紫外線照射器配置於支持透明塑膠膜基板之透明支持台之背面側,除了比較例3以外,於利用熱壓接工具之可撓性基板之加熱抵壓開始4秒後,開始紫外線之照射,照射1秒鐘。照射之結束係與利用熱壓接工具之熱加壓之結束同時。又,紫外線之照度設為180mW/cm2(峰值波長:365nm)。 The actual crimping temperature of the thermocompression bonding tool was set to 80 ° C in Examples 1 and 2, Comparative Examples 1 and 3, and 130 ° C in Comparative Examples 2 and 4. Moreover, the final crimping pressure and time of the thermocompression bonding tool were 4 MPa and 5 seconds in each of the examples and the comparative examples, and a buffer material of 矽 rubber having a thickness of 450 μm was deposited on the hot pressing surface of the thermocompression bonding tool. . Further, the ultraviolet ray irradiator was placed on the back side of the transparent support table supporting the transparent plastic film substrate, and in addition to Comparative Example 3, ultraviolet ray irradiation was started 4 seconds after the heating and pressing of the flexible substrate by the thermocompression bonding tool was started. , irradiated for 1 second. The end of the irradiation is simultaneously with the end of the thermal pressurization using the thermocompression bonding tool. Further, the illuminance of the ultraviolet ray was set to 180 mW/cm 2 (peak wavelength: 365 nm).

繼而,針對各實施例及比較例之連接體樣本,測定初始導通電阻值(Ω)及可靠性試驗後之導通電阻值(Ω)。可靠性試驗之條件係60℃、95%RH、100hr。導通電阻值之測定係對與評價用可撓性基板之連接端子連接之透明塑膠膜基板之ITO電極或Cu電極連接數位萬用表,利用所謂之四端子法,測定流動電流2mA時之電阻值30次,將其平均值設為導通電阻值。關於導通可靠性評價,將5Ω以下設為OK,將較其大之情形時設 為NG。 Then, the initial on-resistance value (Ω) and the on-resistance value (Ω) after the reliability test were measured for the connected body samples of the respective examples and comparative examples. The conditions of the reliability test were 60 ° C, 95% RH, and 100 hr. The measurement of the on-resistance value is performed by connecting a ITO electrode or a Cu electrode of a transparent plastic film substrate connected to the connection terminal of the evaluation flexible substrate to a digital multimeter, and measuring the resistance value at a flow current of 2 mA by a so-called four-terminal method. Then, the average value is set as the on-resistance value. For the reliability evaluation of conduction, set 5 Ω or less to OK, and set it to be larger. For NG.

連接體樣本之細帶之溢出寬度W係藉由測定自可撓性基板突出之塑膠膜基板之側面於面方向上形成之細帶之寬度W(參照圖4)而進行。繼而,於連接後,將連接體樣本自透明支持台上拉,若於連接體樣本之透明塑膠膜基板側(與熱壓接工具之熱加壓面接觸之面之相反側)或透明支持台本身未附著有溢出之黏合劑,則認定為OK,若於連接體樣本之透明塑膠膜基板側或透明支持台本身中之任一者附著有溢出之黏合劑,則認定為NG。 The overflow width W of the thin strip of the connector sample is measured by measuring the width W (see FIG. 4) of the thin strip formed in the surface direction of the side surface of the plastic film substrate protruding from the flexible substrate. Then, after the connection, the connector sample is pulled up from the transparent support table, on the transparent plastic film substrate side of the connector sample (on the opposite side of the surface in contact with the hot pressing surface of the thermocompression bonding tool) or the transparent support table. If the adhesive which does not adhere to the overflow itself is confirmed to be OK, it is considered to be NG if any of the transparent plastic film substrate side of the connection sample or the transparent support itself adheres to the adhesive.

關於連接體樣本之導電性粒子之面密度分佈,將自熱壓接工具之抵壓區域跨及至形成有細帶之透明塑膠膜基板之外側緣之外緣區域中之粒子密度設為(a),將利用熱壓接工具之抵壓區域中之粒子密度設為(b),於各區域200×200μm,測定同一平面上之粒子密度。 Regarding the areal density distribution of the conductive particles of the bonded body sample, the particle density in the outer edge region of the outer edge of the transparent plastic film substrate on which the self-heating crimping tool is formed is set to (a) The particle density in the pressing region of the thermocompression bonding tool was set to (b), and the particle density on the same plane was measured at 200 × 200 μm in each region.

以目視進行壓接後之透明塑膠膜之變形之確認,將於利用熱壓接工具之抵壓區域出現外觀上之起伏紋路之情形時設為×,將未確認到起伏紋路,呈現與抵壓區域外相同之外觀之情形時設為○。 The confirmation of the deformation of the transparent plastic film after the crimping by visual inspection is set to × when the appearance of the undulating texture in the pressing region of the thermocompression bonding tool is used, and the undulating texture is not confirmed, and the pressing region is presented. In the case of the same external appearance, it is set to ○.

[實施例1] [Example 1]

於實施例1中,係使用成分A之光硬化型異向性導電膜。成分A之異向性導電膜於正式壓接步驟中之加熱溫度(80℃)下之熔融黏度為1000Pa.s。實施例1之連接體樣本之導通可靠性評價為5Ω以下(OK),細帶之溢出寬度W為550μm(OK)。又,外緣區域中之粒子密度(a)為12.1pcs/200×200μm,抵壓區域中之粒子密度(b)為4.2pcs/200×200μm。進而,亦未確認到連接體樣本之透明塑膠膜之變形。 In Example 1, a photocurable anisotropic conductive film of Component A was used. The melt viscosity of the anisotropic conductive film of component A at a heating temperature (80 ° C) in the final crimping step is 1000 Pa. s. The continuity reliability of the connector sample of Example 1 was 5 Ω or less (OK), and the overflow width W of the ribbon was 550 μm (OK). Further, the particle density (a) in the outer peripheral region was 12.1 pcs/200 × 200 μm, and the particle density (b) in the pressed region was 4.2 pcs/200 × 200 μm. Further, the deformation of the transparent plastic film of the bonded body sample was not confirmed.

[實施例2] [Embodiment 2]

於實施例2中,係使用成分B之光硬化型異向性導電膜。成分A之異向性導電膜之正式壓接步驟中之加熱溫度(80℃)下之熔融黏度為4000Pa.s。實施例2之連接體樣本之導通可靠性評價為5Ω以下(OK),細帶之溢出寬度W為400μm(OK)。又,外緣區域中之粒子密度(a)為11.1pcs/200×200μm,抵壓區域中之粒子密度(b)為4.5pcs/200×200μm。進而,亦未確認到連接體樣本之透明塑膠膜之變形。 In Example 2, a photocurable anisotropic conductive film of Component B was used. The melting viscosity at a heating temperature (80 ° C) in the formal crimping step of the anisotropic conductive film of the component A is 4000 Pa. s. The conduction reliability of the sample of the joint of Example 2 was evaluated to be 5 Ω or less (OK), and the overflow width W of the fine tape was 400 μm (OK). Further, the particle density (a) in the outer peripheral region was 11.1 pcs/200 × 200 μm, and the particle density (b) in the pressed region was 4.5 pcs/200 × 200 μm. Further, the deformation of the transparent plastic film of the bonded body sample was not confirmed.

[比較例1] [Comparative Example 1]

於比較例1中,係使用成分C之光硬化型異向性導電膜。成分C之異向性導電膜之正式壓接步驟中之加熱溫度(80℃)下之熔融黏度為10000Pa.s。比較例1之連接體樣本之導通可靠性評價為20Ω以上(NG),細帶之溢出寬度W為200μm(OK)。又,外緣區域中之粒子密度(a)為8.4pcs/200×200μm,抵壓區域中之粒子密度(b)為4.2pcs/200×200μm。再者,未確認到連接體樣本之透明塑膠膜之變形。 In Comparative Example 1, a photocurable anisotropic conductive film of Component C was used. The melting viscosity at a heating temperature (80 ° C) in the formal crimping step of the anisotropic conductive film of component C is 10000 Pa. s. The conduction reliability of the sample of the connector of Comparative Example 1 was evaluated to be 20 Ω or more (NG), and the overflow width W of the ribbon was 200 μm (OK). Further, the particle density (a) in the outer peripheral region was 8.4 pcs/200 × 200 μm, and the particle density (b) in the pressed region was 4.2 pcs/200 × 200 μm. Furthermore, the deformation of the transparent plastic film of the bonded body sample was not confirmed.

[比較例2] [Comparative Example 2]

於比較例2中,係使用成分C之光硬化型異向性導電膜。又,於比較例2中,將正式壓接步驟中之加熱溫度設為130℃。比較例2之連接體樣本之導通可靠性評價為5Ω以下(OK),細帶之溢出寬度W為350μm(OK)。又,外緣區域中之粒子密度(a)為11.5pcs/200×200μm,抵壓區域中之粒子密度(b)為4.6pcs/200×200μm。再者,確認到連接體樣本之透明塑膠膜之變形。 In Comparative Example 2, a photocurable anisotropic conductive film of Component C was used. Further, in Comparative Example 2, the heating temperature in the final pressure bonding step was 130 °C. The continuity reliability of the connector sample of Comparative Example 2 was 5 Ω or less (OK), and the overflow width W of the ribbon was 350 μm (OK). Further, the particle density (a) in the outer peripheral region was 11.5 pcs/200 × 200 μm, and the particle density (b) in the pressed region was 4.6 pcs/200 × 200 μm. Furthermore, the deformation of the transparent plastic film of the connector sample was confirmed.

[比較例3] [Comparative Example 3]

於比較例3中,係使用成分D之加熱硬化型異向性導電膜。成分D之異向性導電膜之正式壓接步驟中之加熱溫度(80℃)下之熔融黏度為1000Pa.s。比較例3之連接體樣本之導通可靠性評價為20Ω以上(NG),細帶之溢出寬度W為550μm(OK)。又,外緣區域中之粒子密度(a)為13.5pcs/200×200μm,抵壓區域中之粒子密度(b)為5.1pcs/200×200μm。再者,未確認到連接體樣本之透明塑膠膜之變形。 In Comparative Example 3, a heat-curable anisotropic conductive film of the component D was used. The melting viscosity at a heating temperature (80 ° C) in the final crimping step of the anisotropic conductive film of component D is 1000 Pa. s. The continuity reliability of the sample of the connector of Comparative Example 3 was 20 Ω or more (NG), and the overflow width W of the ribbon was 550 μm (OK). Further, the particle density (a) in the outer peripheral region was 13.5 pcs/200 × 200 μm, and the particle density (b) in the pressed region was 5.1 pcs/200 × 200 μm. Furthermore, the deformation of the transparent plastic film of the bonded body sample was not confirmed.

[比較例4] [Comparative Example 4]

於比較例4中,係使用成分A之光硬化型異向性導電膜。又,於比較例4中,將正式壓接步驟中之加熱溫度設為130℃。比較例4之連接體樣本之導通可靠性評價為5Ω以下(OK),細帶之溢出寬度W寬至900μm(NG)。又,外緣區域中之粒子密度(a)為12.9pcs/200×200μm,抵壓區域中之粒子密度(b)為4.7pcs/200×200μm。再者,確認到連接體樣本之透明塑膠膜之變形。 In Comparative Example 4, a photocurable anisotropic conductive film of Component A was used. Further, in Comparative Example 4, the heating temperature in the final pressure bonding step was set to 130 °C. The conduction reliability of the connector sample of Comparative Example 4 was evaluated to be 5 Ω or less (OK), and the overflow width W of the fine tape was 900 μm (NG). Further, the particle density (a) in the outer peripheral region was 12.9 pcs/200 × 200 μm, and the particle density (b) in the pressed region was 4.7 pcs/200 × 200 μm. Furthermore, the deformation of the transparent plastic film of the connector sample was confirmed.

如表2所示,於實施例1及實施例2之連接體樣本中,使正式壓接步驟之加熱溫度下之熔融黏度為1000~4000Pa.s,故而能夠藉由黏合劑樹脂之排除,將導電性粒子充分地壓入,從而獲得良好之導通可靠性。 又,於實施例1及實施例2之連接體樣本中,細帶之溢出寬度W亦成為適當者,從而實現塑膠膜基板與可撓性基板之連接強度之提高。其根據實施例1及實施例2之連接體樣本之粒子密度分佈亦能夠確認。進而,於實施例1及實施例2之連接體樣本中,亦未確認到塑膠膜基板之變形。 As shown in Table 2, in the sample of the joint of Example 1 and Example 2, the melt viscosity at the heating temperature of the final crimping step was 1000-4000 Pa. s, therefore, the conductive particles can be sufficiently pressed by the removal of the binder resin, thereby obtaining good conduction reliability. Further, in the sample of the joint of the first embodiment and the second embodiment, the overflow width W of the fine tape was also suitable, and the connection strength between the plastic film substrate and the flexible substrate was improved. The particle density distribution of the sample of the connector according to Example 1 and Example 2 can also be confirmed. Further, in the sample of the joint of Example 1 and Example 2, the deformation of the plastic film substrate was not confirmed.

另一方面,於比較例1之連接體樣本中,正式壓接步驟之加熱溫度下之熔融黏度高至10000Pa.s,導電性粒子之壓入不足,由此使導通可靠性評價降低,又,黏合劑樹脂之溢出寬度W亦較少,連接強度亦降低。 On the other hand, in the sample of the connector of Comparative Example 1, the melt viscosity at the heating temperature of the final crimping step was as high as 10,000 Pa. s, when the conductive particles are insufficiently pressed, the conduction reliability evaluation is lowered, and the gap width W of the binder resin is also small, and the connection strength is also lowered.

又,於比較例2之連接體樣本中,與比較例1相比,使正式壓接步驟中之壓接溫度上升,藉此提高黏合劑樹脂之流動性,故而於導通可靠性及細帶之溢出寬度W觀察到改善,但於壓接後之塑膠膜基板出現變形。 Further, in the sample of the connector of Comparative Example 2, the pressure-bonding temperature in the final pressure-bonding step was increased as compared with Comparative Example 1, whereby the fluidity of the adhesive resin was improved, so that the conduction reliability and the fine band were The overflow width W was observed to be improved, but the plastic film substrate after the crimping was deformed.

於使用熱硬化型異向性導電膜之比較例3之連接體樣本中,因80℃之低溫加熱而硬化反應變得不充分,經由可靠性試驗而發現導通信賴性評價降低。 In the sample of the connector of Comparative Example 3 using the thermosetting anisotropic conductive film, the curing reaction was insufficient due to the low-temperature heating at 80 ° C, and the evaluation of the communication communication was found to be lowered by the reliability test.

於比較例4之連接體樣本中,使用80℃下之熔融黏度低至1000Pa.s之成分A之異向性導電膜,將正式壓接步驟中之壓接溫度升高至130℃,故而黏合劑樹脂之流動性過剩,細帶之溢出寬度W較大,黏合劑樹脂流回至塑膠膜基板之背面,此外,於壓接後之塑膠膜基板出現變形。 In the sample of the connector of Comparative Example 4, the melt viscosity at 80 ° C was used as low as 1000 Pa. The anisotropic conductive film of the component A of s, the crimping temperature in the final crimping step is raised to 130 ° C, so the fluidity of the adhesive resin is excessive, the overflow width W of the fine ribbon is large, and the adhesive resin flows back. To the back of the plastic film substrate, in addition, the plastic film substrate after the crimping is deformed.

2‧‧‧透明膜 2‧‧‧Transparent film

2a‧‧‧透明膜之側面 2a‧‧‧Side of the transparent film

3‧‧‧連接端子 3‧‧‧Connecting terminal

4‧‧‧構裝部 4‧‧‧Construction Department

5‧‧‧可撓性基板 5‧‧‧Flexible substrate

6‧‧‧異向性導電膜 6‧‧‧ Anisotropic conductive film

7‧‧‧連接端子 7‧‧‧Connecting terminal

20‧‧‧熱壓接工具 20‧‧‧Hot crimping tools

22‧‧‧緩衝材料 22‧‧‧ cushioning material

24‧‧‧支持台 24‧‧‧Support desk

Claims (9)

一種連接體之製造方法,其具有下述步驟:接著劑配置步驟,係將含有光聚合起始劑之電路連接用接著劑設置於具有透光性之電路基板上;及壓接步驟,係介隔上述電路連接用接著劑,於上述電路基板上配置電子零件,將上述電子零件朝上述電路基板加熱抵壓,並且使上述電路連接用接著劑硬化;且上述電路連接用接著劑於上述壓接步驟中之加熱溫度下之熔融黏度在4000Pa.s以下。 A method for producing a connector, comprising the steps of: providing an adhesive for circuit connection containing a photopolymerization initiator on a circuit board having light transmissivity; and a step of crimping The electronic component is placed on the circuit board, and the electronic component is heated and pressed against the circuit board, and the circuit connecting adhesive is cured; and the circuit connecting adhesive is bonded to the bonding device. The melt viscosity at the heating temperature in the step is 4000 Pa. s below. 如申請專利範圍第1項之連接體之製造方法,其中,上述電路連接用接著劑於上述壓接步驟中之加熱溫度下之熔融黏度在1000Pa.s以上。 1. The method of manufacturing a connector according to claim 1, wherein the adhesive for the circuit connection has a melt viscosity of 1000 Pa at a heating temperature in the crimping step. s above. 如申請專利範圍第1或2項之連接體之製造方法,其中,上述電路基板係塑膠膜基板,上述壓接步驟中,以100℃以下之溫度加熱上述電子零件。 The method of manufacturing a connector according to the first or second aspect of the invention, wherein the circuit substrate is a plastic film substrate, and the electronic component is heated at a temperature of 100 ° C or lower in the pressure bonding step. 如申請專利範圍第1或2項之連接體之製造方法,其中,於上述壓接步驟中,上述電路連接用接著劑溢出至上述電子零件突出之上述電路基板之側面,而形成細帶,且壓接步驟後,上述細帶區域之上述電路連接用接著劑所含的導電性粒子之粒子密度高於上述電子零件之抵壓區域。 The method of manufacturing a connector according to the first or second aspect of the invention, wherein in the crimping step, the circuit-connecting adhesive overflows to a side surface of the circuit board on which the electronic component protrudes to form a thin strip, and After the pressure bonding step, the particle density of the conductive particles contained in the above-mentioned circuit-connecting adhesive agent in the thin band region is higher than the pressure-receiving region of the electronic component. 如申請專利範圍第3項之連接體之製造方法,其中,於上述壓接步驟中,上述電路連接用接著劑溢出至上述電子零件突出之上述電路基板之側面,而形成細帶,且 壓接步驟後,上述細帶區域之上述電路連接用接著劑所含的導電性粒子之粒子密度高於上述電子零件之抵壓區域。 The method of manufacturing a connector according to claim 3, wherein in the crimping step, the circuit-connecting adhesive overflows to a side surface of the circuit board on which the electronic component protrudes to form a thin strip, and After the pressure bonding step, the particle density of the conductive particles contained in the above-mentioned circuit-connecting adhesive agent in the thin band region is higher than the pressure-receiving region of the electronic component. 如申請專利範圍第1或2項之連接體之製造方法,其中,上述電路基板為觸控面板之感測器膜。 The method of manufacturing a connector according to claim 1 or 2, wherein the circuit substrate is a sensor film of a touch panel. 如申請專利範圍第1或2項之連接體之製造方法,其中,上述電子零件為可撓性基板。 The method of manufacturing a connector according to claim 1 or 2, wherein the electronic component is a flexible substrate. 一種電子零件之連接方法,其具有下述步驟:接著劑配置步驟,係將含有光聚合起始劑之電路連接用接著劑設置於具有透光性之電路基板上;及壓接步驟,係介隔上述電路連接用接著劑,於上述電路基板上配置電子零件,將上述電子零件朝上述電路基板加熱抵壓,並且使上述電路連接用接著劑硬化;且上述電路連接用接著劑於上述壓接步驟中之加熱溫度下之熔融黏度在4000Pa.s以下。 A method for connecting electronic components, comprising the steps of: providing an adhesive for circuit connection containing a photopolymerization initiator on a circuit board having light transmissivity; and a step of crimping The electronic component is placed on the circuit board, and the electronic component is heated and pressed against the circuit board, and the circuit connecting adhesive is cured; and the circuit connecting adhesive is bonded to the bonding device. The melt viscosity at the heating temperature in the step is 4000 Pa. s below. 一種連接體,係藉由申請專利範圍第1至7項中任一項之連接體之製造方法製成。 A connector produced by the method of manufacturing a connector according to any one of claims 1 to 7.
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