TW201631690A - Substrate transfer apparatus - Google Patents

Substrate transfer apparatus Download PDF

Info

Publication number
TW201631690A
TW201631690A TW104139527A TW104139527A TW201631690A TW 201631690 A TW201631690 A TW 201631690A TW 104139527 A TW104139527 A TW 104139527A TW 104139527 A TW104139527 A TW 104139527A TW 201631690 A TW201631690 A TW 201631690A
Authority
TW
Taiwan
Prior art keywords
tray
magnetic
transfer
magnet
substrate
Prior art date
Application number
TW104139527A
Other languages
Chinese (zh)
Other versions
TWI575643B (en
Inventor
金正健
金善吉
金南訓
金鍾大
高元一
蘇秉鎬
孫承京
李起泰
李尚浩
千敏鎬
韓應龍
Original Assignee
Ulvac韓國股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ulvac韓國股份有限公司 filed Critical Ulvac韓國股份有限公司
Publication of TW201631690A publication Critical patent/TW201631690A/en
Application granted granted Critical
Publication of TWI575643B publication Critical patent/TWI575643B/en

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2221/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
    • H01L2221/67Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2221/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
    • H01L2221/67Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
    • H01L2221/683Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping

Abstract

Provided is a substrate transfer apparatus including a tray on which a substrate is mounted, a magnetic transfer part which is disposed under the tray, magnetically levitates the tray, and transfers the tray by a magnetic force, a guide unit which guides the transfer of the tray without contacting the tray, and a gap maintaining member provided on at least one region between the magnetic transfer part and the guide unit.

Description

轉移基板的裝置Device for transferring substrates

本發明是關於基板轉移裝置,且更明確而言是關於經由無接觸方法轉移安裝了基板的托盤的基板轉移裝置。The present invention relates to a substrate transfer device, and more particularly to a substrate transfer device that transfers a tray on which a substrate is mounted via a contactless method.

大體而言,平板顯示器件(flat panel display devices;FPD)(諸如液晶顯示器件(liquid crystal display devices;LCD)、電漿顯示面板器件(plasma display panel device;PDP)、場發射顯示器件(field emission display device;FED)以及電致發光顯示器件(electro luminescence display device;ELD))是藉由在基板上執行多個製程而製造。亦即,在基板上,重複進行沈積製程、光微影製程以及蝕刻製程多次,且另外執行清潔、附接以及切割製程以製造平板顯示器件。In general, flat panel display devices (FPD) (such as liquid crystal display devices (LCD), plasma display panel devices (PDP), field emission display devices (field emission) A display device (FED) and an electro luminescence display device (ELD) are manufactured by performing a plurality of processes on a substrate. That is, on the substrate, the deposition process, the photolithography process, and the etching process are repeated a plurality of times, and a cleaning, attaching, and dicing process is additionally performed to manufacture a flat panel display device.

平板顯示器件的此等製造過程是在其中準備了最佳環境的多個腔室內部執行。為此,設想了線內方法,其中基板安裝於托盤上,且所述托盤接著被垂直或傾斜豎立地轉移以便通過所述多個腔室的內部。These manufacturing processes of the flat panel display device are performed inside a plurality of chambers in which an optimum environment is prepared. To this end, an in-line method is envisaged in which the substrate is mounted on a tray and the tray is then transferred vertically or obliquely upright to pass through the interior of the plurality of chambers.

用於轉移基板的轉移裝置可包含基板安裝在其上的托盤,及接觸所述托盤的底部並由馬達旋轉以藉此將推力提供至所述托盤的驅動滾筒。亦即,現有技術轉移裝置藉由設在腔室的下部部分上並接觸托盤底部的驅動滾筒的力矩轉移托盤。此等轉移裝置的實例揭露於韓國專利申請特許公開案第2003-0068292號中。The transfer device for transferring the substrate may include a tray on which the substrate is mounted, and a drive roller that contacts the bottom of the tray and is rotated by the motor to thereby provide thrust to the tray. That is, the prior art transfer device transfers the tray by a torque provided on the lower portion of the chamber and contacting the drive roller at the bottom of the tray. An example of such a transfer device is disclosed in Korean Patent Application Laid-Open No. 2003-0068292.

然而,存在限制,因為隨著驅動滾筒與托盤底部之間的摩擦增加而產生顆粒。所述顆粒附著至經轉移基板,藉此產生顯示器件中的缺陷,並根據高規格/高效能器件的開發而引起缺陷器件。又,顆粒被引入用於在腔室內部形成真空的真空泵中,導致真空泵的故障。However, there is a limit because particles are generated as the friction between the drive roller and the bottom of the tray increases. The particles adhere to the transferred substrate, thereby causing defects in the display device, and causing defective devices in accordance with the development of high specification/high performance devices. Also, the particles are introduced into a vacuum pump for forming a vacuum inside the chamber, causing malfunction of the vacuum pump.

本發明提供由於在不接觸托盤的情況下轉移基板而能夠防止顆粒產生的基板轉移裝置。The present invention provides a substrate transfer device capable of preventing generation of particles by transferring a substrate without contacting the tray.

本發明亦提供由於托盤在被磁性懸浮的同時進行轉移而能夠防止顆粒產生的基板轉移裝置。The present invention also provides a substrate transfer device capable of preventing the generation of particles due to the transfer of the tray while being magnetically suspended.

根據例示性實施例,基板轉移裝置包含:托盤,基板安裝在所述托盤上;磁性轉移單元,其安置在所述托盤下方,磁性地使所述托盤懸浮,並藉由磁力轉移所述托盤;以及導引單元,其在不接觸所述托盤的情況下導引所述托盤的轉移。According to an exemplary embodiment, a substrate transfer apparatus includes: a tray on which the substrate is mounted; a magnetic transfer unit disposed under the tray, magnetically suspending the tray, and transferring the tray by magnetic force; And a guiding unit that guides the transfer of the tray without contacting the tray.

基板轉移裝置可進一步包含轉移基底,其包含經提供以接觸所述托盤的下側的接觸區域以及自接觸區域兩側向下延伸的延伸區域。The substrate transfer device can further include a transfer substrate including a contact region provided to contact the underside of the tray and an extended region extending downwardly from both sides of the contact region.

磁性轉移單元可包含:磁性懸浮部分,其安置於轉移基底的一個區域上並磁性地使托盤懸浮;以及磁性轉移部分,其安置在磁性懸浮部分下方以在一個方向中轉移由磁力懸浮的托盤。The magnetic transfer unit may include: a magnetic suspension portion disposed on one region of the transfer substrate and magnetically suspending the tray; and a magnetic transfer portion disposed under the magnetic suspension portion to transfer the magnetically suspended tray in one direction.

磁性懸浮部分可包含:第一磁性懸浮部分,其接觸轉移基底,並包含至少一個磁體;以及第二磁性懸浮部分,其與第一磁性懸浮部分隔開,並包含將被施加來自第一磁性懸浮部分的吸力及斥力中的至少任一者的至少一個磁體。The magnetic suspension portion may include: a first magnetic suspension portion contacting the transfer substrate and including at least one magnet; and a second magnetic suspension portion spaced apart from the first magnetic suspension portion and containing the first magnetic suspension to be applied At least one magnet of at least one of a portion of the suction and repulsive force.

磁性轉移部分可包含:旋轉軸;磁性旋轉部分,其包含經安置以環繞所述旋轉軸的多個磁體;以及磁性轉移部分,其與磁性旋轉部分隔開並包含多個磁體。The magnetic transfer portion may include: a rotating shaft; a magnetic rotating portion including a plurality of magnets disposed to surround the rotating shaft; and a magnetic transfer portion spaced apart from the magnetic rotating portion and including a plurality of magnets.

基板轉移裝置可進一步包含容納部分,其在內部容納磁性旋轉部分,其中所述容納部分的上部部分接觸第二磁性懸浮部分。The substrate transfer device may further include a accommodating portion that accommodates the magnetic rotating portion inside, wherein an upper portion of the accommodating portion contacts the second magnetic levitation portion.

磁性轉移部分的所述多個磁體可設在轉移基底的延伸區域的至少一個區域上,所述一個區域面對磁性旋轉部分。The plurality of magnets of the magnetic transfer portion may be disposed on at least one region of the extended region of the transfer substrate, the one region facing the magnetic rotating portion.

磁性旋轉部分的所述多個磁體可經提供以使得具有彼此不同極性的磁體被交替地安置,以便以預定角度環繞旋轉軸,且磁性轉移部分的所述多個磁體可經提供以使得具有彼此不同極性的磁體被交替地安置,以便具有與磁性旋轉部分的角度相同的角度。The plurality of magnets of the magnetic rotating portion may be provided such that magnets having different polarities from each other are alternately disposed to surround the rotating shaft at a predetermined angle, and the plurality of magnets of the magnetic transfer portion may be provided to have each other Magnets of different polarities are alternately placed so as to have the same angle as the angle of the magnetic rotating portion.

導引單元可包含:第一導引磁體,其耦接至托盤的上部部分;以及第二導引磁體,其設在腔室的上壁上以與第一導引磁體隔開預定距離,其中第一導引磁體及第二導引磁體被施加吸力或斥力中的至少任一者。The guiding unit may include: a first guiding magnet coupled to the upper portion of the tray; and a second guiding magnet disposed on the upper wall of the chamber to be spaced apart from the first guiding magnet by a predetermined distance, wherein The first guiding magnet and the second guiding magnet are applied with at least one of suction or repulsive force.

導引單元可進一步包含設在托盤與腔室內壁之間的轉移導引件。The guiding unit may further comprise a transfer guide disposed between the tray and the inner wall of the chamber.

轉移導引件可設在延伸區域與腔室內壁之間。The transfer guide can be disposed between the extended region and the inner wall of the chamber.

基板轉移裝置可進一步包含設在磁性轉移單元與導引單元之間的至少一個區域上的間隙維持構件。The substrate transfer device may further include a gap maintaining member provided on at least one region between the magnetic transfer unit and the guiding unit.

間隙維持構件可設在延伸區域與磁性懸浮部分之間的區域或延伸區域與轉移導引件之間的區域中的至少一者上。The gap maintaining member may be disposed on at least one of a region between the extended region and the magnetic suspension portion or a region between the extended region and the transfer guide.

轉移導引件的至少一部分可在接近托盤的方向中及在遠離托盤的方向中移動。At least a portion of the transfer guide is movable in a direction approaching the tray and in a direction away from the tray.

當托盤被轉移時,設在橫移腔室中的轉移導引件可位於鄰近於托盤的第一位置處,且當托盤被返回時,轉移導引件可位於遠離托盤的第二位置處。The transfer guide disposed in the traverse chamber may be located at a first position adjacent to the tray when the tray is transferred, and the transfer guide may be located at a second position away from the tray when the tray is returned.

下文中,將參看附圖更詳細地描述例示性實施例。然而,本發明可呈不同形式,且不應被理解為限於本文中所闡述的實施例。確切而言,提供此等實施例以使得本發明將為透徹且完整的,且將向熟習此項技術者充分傳達本發明的範疇。Hereinafter, the exemplary embodiments will be described in more detail with reference to the accompanying drawings. However, the invention may be embodied in different forms and should not be construed as being limited to the embodiments set forth herein. Rather, the embodiments are provided so that this disclosure will be thorough and complete, and the scope of the invention will be fully conveyed by those skilled in the art.

圖1是根據第一例示性實施例的基板轉移裝置的正視圖,且圖2是說明根據第一例示性實施例的基板轉移裝置的側視圖。亦即,自安裝基板的方向來看,圖1是正視圖,且圖2是側視圖。又,圖3是說明根據第一例示性實施例的基板轉移裝置的磁性轉移單元的側視圖,且圖4是說明根據第一例示性實施例的基板轉移裝置的磁性轉移部分的示意圖。1 is a front elevational view of a substrate transfer apparatus according to a first exemplary embodiment, and FIG. 2 is a side view illustrating a substrate transfer apparatus according to a first exemplary embodiment. That is, FIG. 1 is a front view from the direction in which the substrate is mounted, and FIG. 2 is a side view. 3 is a side view illustrating a magnetic transfer unit of the substrate transfer device according to the first exemplary embodiment, and FIG. 4 is a schematic view illustrating a magnetic transfer portion of the substrate transfer device according to the first exemplary embodiment.

參看圖1至圖4,根據例示性實施例的基板轉移裝置可包含:托盤100,其轉移安裝在其上的基板;磁性轉移單元200,其安置在所述托盤100下方,磁性地使所述托盤100懸浮,並藉由磁力轉移所述托盤100;以及導引單元300,其安置在所述托盤100上方以導引所述托盤100的轉移。Referring to FIGS. 1 through 4, a substrate transfer apparatus according to an exemplary embodiment may include a tray 100 that transfers a substrate mounted thereon, and a magnetic transfer unit 200 disposed under the tray 100 to magnetically cause the The tray 100 is suspended, and the tray 100 is transferred by magnetic force; and a guiding unit 300 disposed above the tray 100 to guide the transfer of the tray 100.

托盤100是以中空矩形框架的形狀提供,且基板安裝在其上。亦即,托盤100可以中空矩形框架的形狀製造,以使得具有預定長度的四個條設在上部側、下部側、左側以及右側上,彼此隔開預定距離,且條的末端彼此接觸。又,用於可拆卸地夾持基板的多個夾具可設在托盤100上。此處,基板的邊緣可按預定寬度接觸托盤100的四個側,且基板可藉由夾具固定。此托盤100是在基板安裝於其上且所述托盤垂直地或傾斜地豎立的狀態中進行轉移。亦即,多個腔室在一個方向上連接,且在其上安裝有基板的托盤100移動穿過所述多個腔室的內部的同時,在基板上執行諸如薄膜沈積製程的預定製程。托盤100所移動穿過的所述多個腔室可包含:裝載腔室,在其中基板被安裝於托盤100上;以及多個沈積腔室,在其中預定薄膜沈積於安裝在托盤100上的基板上;以及橫移腔室,在其中托盤100被提昇且托盤100的位置被移動。亦即,基板在裝載腔室中安裝於托盤100上,接著在托盤移動穿過所述多個沈積腔室的同時多個薄膜沈積於基板上,且接著在橫移腔室中移動托盤的位置以使得托盤可朝向裝載腔室移動。此處,裝載腔室、所述多個沈積腔室以及橫移腔室可維持真空狀態。又,基板可為用於製造包含液晶顯示器件的平板顯示器件的各種基板,且可由包含(例如)玻璃、塑膠、薄膜或類似者的材料製成。另外,接觸轉移單元200的部分的轉移基底110可設在托盤100下方。轉移基底110可設在托盤100底部的整個區域上。亦即,轉移基底110可具有與托盤100底部的長度相同的長度,且可連接至托盤100的底部以在向下方向上具有預定厚度。此轉移基底110可包含具有與托盤100寬度相同的寬度的第一區域111,及設在第一區域111下方並具有小於托盤100寬度的寬度(例如,托盤100的一半寬度)的第二區域112。此處,磁性轉移單元200的部分可接觸第二區域112。當然,可以各種形狀提供轉移基底110。The tray 100 is provided in the shape of a hollow rectangular frame on which the substrate is mounted. That is, the tray 100 may be manufactured in the shape of a hollow rectangular frame such that four strips having a predetermined length are provided on the upper side, the lower side, the left side, and the right side, spaced apart from each other by a predetermined distance, and the ends of the strips are in contact with each other. Further, a plurality of jigs for detachably holding the substrate may be provided on the tray 100. Here, the edges of the substrate may contact the four sides of the tray 100 by a predetermined width, and the substrate may be fixed by a jig. This tray 100 is transferred in a state in which the substrate is mounted thereon and the tray is vertically or obliquely erected. That is, a plurality of chambers are connected in one direction, and a predetermined process such as a thin film deposition process is performed on the substrate while the tray 100 on which the substrate is mounted moves through the inside of the plurality of chambers. The plurality of chambers through which the tray 100 moves may include: a loading chamber in which the substrate is mounted on the tray 100; and a plurality of deposition chambers in which a predetermined film is deposited on the substrate mounted on the tray 100 And traversing the chamber in which the tray 100 is lifted and the position of the tray 100 is moved. That is, the substrate is mounted on the tray 100 in the loading chamber, and then a plurality of thin films are deposited on the substrate while the tray moves through the plurality of deposition chambers, and then the position of the tray is moved in the traverse chamber So that the tray can be moved towards the loading chamber. Here, the loading chamber, the plurality of deposition chambers, and the traverse chamber may maintain a vacuum state. Also, the substrate may be various substrates for manufacturing a flat panel display device including a liquid crystal display device, and may be made of a material including, for example, glass, plastic, film, or the like. In addition, the transfer substrate 110 that contacts a portion of the transfer unit 200 may be disposed under the tray 100. The transfer substrate 110 may be disposed on the entire area of the bottom of the tray 100. That is, the transfer substrate 110 may have the same length as the length of the bottom of the tray 100, and may be coupled to the bottom of the tray 100 to have a predetermined thickness in the downward direction. The transfer substrate 110 may include a first region 111 having the same width as the width of the tray 100, and a second region 112 disposed below the first region 111 and having a width smaller than the width of the tray 100 (eg, half the width of the tray 100). . Here, a portion of the magnetic transfer unit 200 may contact the second region 112. Of course, the transfer substrate 110 can be provided in a variety of shapes.

磁性轉移單元200磁性地使托盤100懸浮並轉移托盤100同時維持與托盤100的無接觸狀態。此磁性轉移單元200可包含磁性地使托盤100懸浮的磁性懸浮部分210,及磁性轉移部分220,磁性轉移部分220藉由被施加來自磁性懸浮部分210的吸力或斥力而轉移由磁性懸浮部分210磁性地懸浮的托盤100。The magnetic transfer unit 200 magnetically suspends the tray 100 and transfers the tray 100 while maintaining a non-contact state with the tray 100. The magnetic transfer unit 200 may include a magnetic suspension portion 210 that magnetically suspends the tray 100, and a magnetic transfer portion 220 that is transferred by the magnetic suspension portion 210 by being applied with suction or repulsive force from the magnetic suspension portion 210. The suspended tray 100.

磁性懸浮部分210可包含經提供以接觸轉移基底110的第一磁性懸浮部分211,及經提供以與第一磁性懸浮部分211隔開的第二磁性懸浮部分212。此處,第二磁性懸浮部分212可設在托盤100與托盤100轉移穿過的所述多個腔室的內壁之間。此處,第二磁性懸浮部分212可固定至托盤100轉移穿過的所述多個腔室的內壁,並固定在距腔室底部部分的預定高度處。亦即,其上安裝有基板的托盤100可經轉移穿過串聯連接的多個腔室,第一磁性懸浮部分211可耦接至在托盤100下方的轉移基底110的第二區域112的兩個側表面,且第二磁性懸浮部分212可設在托盤100與腔室之間以面對第一磁性懸浮部分211並可耦接至腔室的內壁或底部表面。The magnetic suspension portion 210 can include a first magnetic suspension portion 211 that is provided to contact the transfer substrate 110, and a second magnetic suspension portion 212 that is provided to be spaced apart from the first magnetic suspension portion 211. Here, the second magnetic suspension portion 212 may be disposed between the tray 100 and the inner wall of the plurality of chambers through which the tray 100 is transferred. Here, the second magnetic suspension portion 212 may be fixed to an inner wall of the plurality of chambers through which the tray 100 is transferred, and fixed at a predetermined height from a bottom portion of the chamber. That is, the tray 100 on which the substrate is mounted may be transferred through a plurality of chambers connected in series, and the first magnetic suspension portion 211 may be coupled to two of the second regions 112 of the transfer substrate 110 below the tray 100. The side surface, and the second magnetic suspension portion 212 may be disposed between the tray 100 and the chamber to face the first magnetic suspension portion 211 and may be coupled to the inner or bottom surface of the chamber.

如圖3中所說明,第一磁性懸浮部分211可包含:固定至轉移基底110的第二區域112的兩個側表面的第一固定構件211a、設在第一固定構件211a的側表面的預定區域上的至少一個第一磁體211b,以及設在第一固定構件211a的底部表面的預定區域上的至少一個第二磁體211c。亦即,第一磁體211b及第二磁體211c中的每一者可經提供為單一磁體,或第一磁體211b及第二磁體211c中的至少任一者可經提供為兩個或大於兩個磁體。舉例而言,第一磁體211b可經提供為單一磁體,且第二磁體211c可經提供為兩個或大於兩個磁體。第一固定構件211a可以具有預定高度及寬度的大致六面體形狀提供,且可沿轉移基底110的第二區域112具有與第二區域112的長度相同的長度並具有與第二區域112的凹陷深度相同的寬度。因此,第一磁性懸浮部分211可與轉移基底110共面。亦即,藉由第一固定構件211a及位於第一固定構件之間的第二區域112界定的寬度可與轉移基底110的第一區域111的寬度相同或與托盤100的寬度相同。當然,藉由第二區域112及在第二區域112的一側及另一側的第一磁性懸浮部分211界定的寬度亦可大於或小於轉移基底110的寬度或托盤100的寬度。又,第一磁體211b及第二磁體211c可經提供以嵌入於第一固定構件211a中達預定深度。亦即,第一磁體211b及第二磁體211c可設在第一固定構件211a中預定深度處,使得第一磁體211b及第二磁體211c的表面可與第一固定構件211a的表面共面。第一固定構件211a可由諸如對由磁體產生的磁力不作出回應的金屬、陶瓷、塑膠或類似者的材料形成,且可由(例如)鎢形成。As illustrated in FIG. 3, the first magnetic floating portion 211 may include: a first fixing member 211a fixed to both side surfaces of the second region 112 of the transfer substrate 110, and a predetermined portion provided on a side surface of the first fixing member 211a At least one first magnet 211b on the area, and at least one second magnet 211c provided on a predetermined area of the bottom surface of the first fixing member 211a. That is, each of the first magnet 211b and the second magnet 211c may be provided as a single magnet, or at least any one of the first magnet 211b and the second magnet 211c may be provided as two or more than two magnet. For example, the first magnet 211b can be provided as a single magnet, and the second magnet 211c can be provided as two or more than two magnets. The first fixing member 211a may be provided in a substantially hexahedral shape having a predetermined height and width, and may have the same length as the length of the second region 112 along the second region 112 of the transfer substrate 110 and have a depression with the second region 112 The same width as the depth. Therefore, the first magnetic floating portion 211 can be coplanar with the transfer substrate 110. That is, the width defined by the first fixing member 211a and the second region 112 between the first fixing members may be the same as the width of the first region 111 of the transfer substrate 110 or the same as the width of the tray 100. Of course, the width defined by the second region 112 and the first magnetic floating portion 211 on one side and the other side of the second region 112 may also be greater or smaller than the width of the transfer substrate 110 or the width of the tray 100. Also, the first magnet 211b and the second magnet 211c may be provided to be embedded in the first fixing member 211a to a predetermined depth. That is, the first magnet 211b and the second magnet 211c may be disposed at a predetermined depth in the first fixing member 211a such that the surfaces of the first magnet 211b and the second magnet 211c may be coplanar with the surface of the first fixing member 211a. The first fixing member 211a may be formed of a material such as metal, ceramic, plastic, or the like that does not respond to the magnetic force generated by the magnet, and may be formed of, for example, tungsten.

第二磁性懸浮部分212可經提供以與第一磁性懸浮部分211隔開預定距離並面對第一磁性懸浮部分211。亦即,第二磁性懸浮部分212可設在腔室的內壁側面上並與第一磁性懸浮部分211隔開,使得其內表面面對第一磁性懸浮部分211。此第二磁性懸浮部分212可包含:與第一磁性懸浮部分211的第一固定構件211a隔開預定距離並面對其的第二固定構件212a,以及分別面對第一磁性懸浮部分211的第一磁體211b及第二磁體211c的第三磁體212b及第四磁體212c。此處,第三磁體212b及第四磁體212c中的每一者可經提供為單一磁體,或第三磁體212b及第四磁體212c中的至少一者可經提供為對應於第一磁體211b及第二磁體211c的數目的兩個或大於兩個磁體。舉例而言,當提供一個第一磁體211b及兩個或大於兩個第二磁體211c時,可提供一個第三磁體212b及兩個或大於兩個第四磁體212c。又,第二固定構件212a可連接至腔室的內壁或底部表面並固定至其,並可經提供以使得一側具有「└」形狀且另一側具有「┘」形狀以便與具有矩形橫截面的第一固定構件211a隔開預定距離。第一磁體211b及第三磁體212b可具有彼此不同的極性且吸力可在其間起作用。然而,第二磁體211c及第四磁體212c可具有彼此相同的極性,且斥力可在其間起作用。斥力在第二磁體211c與第四磁體212c之間起作用,且因此托盤100可被懸浮。又,吸力在第一磁體211b與第三磁體212b之間起作用,且因此可防止托盤100向上及向下移動。亦即,托盤100可藉由第二磁體211c與第四磁體212c之間的斥力而被磁性地懸浮並向上移動,所述斥力可藉由在第一磁體211b與第三磁體212b之間起作用的吸力抑制。類似於第一固定構件211a,第二固定構件212a可由諸如對由磁體產生的磁力不作出回應的金屬、陶瓷、塑膠或類似者的材料形成,且可由(例如)鎢形成。The second magnetic suspension portion 212 may be provided to be spaced apart from the first magnetic suspension portion 211 by a predetermined distance and to face the first magnetic suspension portion 211. That is, the second magnetic suspension portion 212 may be disposed on the inner wall side of the chamber and spaced apart from the first magnetic suspension portion 211 such that the inner surface thereof faces the first magnetic suspension portion 211. The second magnetic suspension portion 212 may include a second fixing member 212a spaced apart from and facing the first fixing member 211a of the first magnetic suspension portion 211, and a first surface facing the first magnetic suspension portion 211, respectively. A magnet 211b and a third magnet 212b and a fourth magnet 212c of the second magnet 211c. Here, each of the third magnet 212b and the fourth magnet 212c may be provided as a single magnet, or at least one of the third magnet 212b and the fourth magnet 212c may be provided to correspond to the first magnet 211b and Two or more than the number of the second magnets 211c. For example, when one first magnet 211b and two or more second magnets 211c are provided, one third magnet 212b and two or more than four fourth magnets 212c may be provided. Further, the second fixing member 212a may be coupled to and fixed to the inner wall or the bottom surface of the chamber, and may be provided such that one side has a "└" shape and the other side has a "┘" shape so as to have a rectangular cross shape. The first fixing members 211a of the cross section are spaced apart by a predetermined distance. The first magnet 211b and the third magnet 212b may have different polarities from each other and suction may function therebetween. However, the second magnet 211c and the fourth magnet 212c may have the same polarity as each other, and the repulsive force may function therebetween. The repulsive force acts between the second magnet 211c and the fourth magnet 212c, and thus the tray 100 can be suspended. Also, the suction acts between the first magnet 211b and the third magnet 212b, and thus the tray 100 can be prevented from moving up and down. That is, the tray 100 can be magnetically suspended and moved upward by the repulsive force between the second magnet 211c and the fourth magnet 212c, and the repulsive force can be acted between the first magnet 211b and the third magnet 212b. Suction inhibition. Similar to the first fixing member 211a, the second fixing member 212a may be formed of a material such as metal, ceramic, plastic, or the like that does not respond to the magnetic force generated by the magnet, and may be formed of, for example, tungsten.

第一磁性懸浮部分211可在托盤100的長度方向上(亦即,在托盤100的轉移方向上)設在轉移基底110的整個區域上,且第二磁性懸浮部分212可設在托盤100移動穿過的整個區域上。亦即,由於托盤100通過所述多個腔室的內部,因此第二磁性懸浮部分212可設在所述多個腔室的內壁的面對第一磁性懸浮部分211的區域上。然而,第一磁性懸浮部分211及第二磁性懸浮部分212中的至少任一者可被提供多個,以使得第一磁性懸浮部分211及第二磁性懸浮部分212中的至少任一者的該多個以預定間隔配置。舉例而言,第二磁性懸浮部分212可在長度方向上設在整個區域上,且可提供多個第一磁性懸浮部分211以使得所述多個第一磁性懸浮部分211以預定間隔配置。又,第一磁性懸浮部分211的第一磁體211b及第二磁體211c以及第二磁性懸浮部分212的第三磁體212b及第四磁體212c可在長度方向上設在整個區域上,且亦可被提供多個而按預定間隔隔開。舉例而言,第一磁體211b及第二磁體211c亦可設在整個區域之上,且亦可以預定間隔提供第三磁體212b及第四磁體212c。The first magnetic suspension portion 211 may be disposed on the entire area of the transfer substrate 110 in the longitudinal direction of the tray 100 (that is, in the transfer direction of the tray 100), and the second magnetic suspension portion 212 may be disposed on the tray 100 to be worn. Over the entire area. That is, since the tray 100 passes through the inside of the plurality of chambers, the second magnetic suspension portion 212 may be provided on a region of the inner wall of the plurality of chambers facing the first magnetic suspension portion 211. However, at least any one of the first magnetic suspension portion 211 and the second magnetic suspension portion 212 may be provided in plurality such that the at least one of the first magnetic suspension portion 211 and the second magnetic suspension portion 212 A plurality of are arranged at predetermined intervals. For example, the second magnetic floating portion 212 may be disposed over the entire area in the length direction, and a plurality of first magnetic floating portions 211 may be provided to cause the plurality of first magnetic floating portions 211 to be disposed at predetermined intervals. Moreover, the first magnet 211b and the second magnet 211c of the first magnetic suspension portion 211 and the third magnet 212b and the fourth magnet 212c of the second magnetic suspension portion 212 may be disposed on the entire area in the longitudinal direction, and may also be Multiples are provided and separated by predetermined intervals. For example, the first magnet 211b and the second magnet 211c may also be disposed over the entire area, and the third magnet 212b and the fourth magnet 212c may also be provided at predetermined intervals.

又,用於維持第一磁性懸浮部分211與第二磁性懸浮部分212之間的間隙的間隙維持構件213可設在第一磁性懸浮部分211與第二磁性懸浮部分212之間。亦即,由於吸力在彼此面對的第一磁體211b與第三磁體212b之間起作用,因此第一磁性懸浮部分211與第二磁性懸浮部分212之間的間隙減少或第一磁體211b及第三磁體212b可彼此附著。可藉由提供間隙維持構件213而維持第一磁性懸浮部分211與第二磁性懸浮部分212之間的間隙。此間隙維持構件213可設在第一磁體211b及第三磁體212b下方的區域上。亦即,間隙維持構件213可設在第一磁性懸浮部分211的外表面與第二磁性懸浮部分212的內表面之間。又,間隙維持構件213可設在第一磁性懸浮部分211與第二磁性懸浮部分212之間在長度方向上的整個區域上,且可以預定間隔提供多個間隙維持構件213。Also, a gap maintaining member 213 for maintaining a gap between the first magnetic floating portion 211 and the second magnetic floating portion 212 may be disposed between the first magnetic floating portion 211 and the second magnetic floating portion 212. That is, since the suction acts between the first magnet 211b and the third magnet 212b facing each other, the gap between the first magnetic suspension portion 211 and the second magnetic suspension portion 212 is reduced or the first magnet 211b and the first The three magnets 212b may be attached to each other. The gap between the first magnetic suspension portion 211 and the second magnetic suspension portion 212 can be maintained by providing the gap maintaining member 213. The gap maintaining member 213 may be disposed on a region below the first magnet 211b and the third magnet 212b. That is, the gap maintaining member 213 may be disposed between the outer surface of the first magnetic floating portion 211 and the inner surface of the second magnetic floating portion 212. Also, the gap maintaining member 213 may be provided over the entire area in the longitudinal direction between the first magnetic floating portion 211 and the second magnetic floating portion 212, and a plurality of gap maintaining members 213 may be provided at predetermined intervals.

磁性轉移部分220可包含:經提供以與轉移基底110的底面隔開預定距離的磁性旋轉部分221,及設在轉移基底110下方以與磁性旋轉部分221隔開預定距離的磁性轉移部分222。The magnetic transfer portion 220 may include a magnetic rotating portion 221 provided to be spaced apart from the bottom surface of the transfer substrate 110 by a predetermined distance, and a magnetic transfer portion 222 disposed under the transfer substrate 110 to be spaced apart from the magnetic rotating portion 221 by a predetermined distance.

磁性旋轉部分221可經提供以與轉移基底110的底面隔開預定距離。此處,磁性旋轉部分221可具有與托盤100寬度相同的寬度,且亦可具有大於或小於托盤100寬度的寬度。如圖3及圖4中所說明,此磁性旋轉部分221可包含旋轉軸221a及形成於旋轉軸221a的表面上的多個第五磁體221b。旋轉軸221a可具有大致圓形條之形狀並藉由旋轉馬達(未圖示)在一個或另一個方向上旋轉。又,所述多個第五磁體221b可以按預定角度環繞軸的形狀設在旋轉軸221a的表面上,且舉例而言,可具有螺紋形狀。亦即,可在旋轉軸221a上提供多個所述第五磁體221b(如圖4中所說明)以按角度(例如,45°)環繞軸。此處,所述多個第五磁體221b可經提供以使得S極及N極在按角度(例如,45°)環繞旋轉軸的同時被交替地提供。The magnetic rotating portion 221 may be provided to be spaced apart from the bottom surface of the transfer substrate 110 by a predetermined distance. Here, the magnetic rotating portion 221 may have the same width as the width of the tray 100, and may also have a width larger or smaller than the width of the tray 100. As illustrated in FIGS. 3 and 4, the magnetic rotating portion 221 may include a rotating shaft 221a and a plurality of fifth magnets 221b formed on a surface of the rotating shaft 221a. The rotating shaft 221a may have a substantially circular strip shape and be rotated in one or the other direction by a rotary motor (not shown). Also, the plurality of fifth magnets 221b may be provided on the surface of the rotating shaft 221a around the axis at a predetermined angle, and may have a thread shape, for example. That is, a plurality of the fifth magnets 221b (as illustrated in FIG. 4) may be provided on the rotating shaft 221a to surround the shaft at an angle (for example, 45°). Here, the plurality of fifth magnets 221b may be provided such that the S poles and the N poles are alternately provided while being rotated around the rotation axis by an angle (for example, 45°).

磁性轉移部分222可設在轉移基底110下方。亦即,磁性轉移部分222可設在磁性懸浮部分210之間的轉移基底110的第二區域112下方。在此磁性轉移部分222中,具有彼此不同極性的磁體可交替地安置。亦即,如圖4中所說明,磁性轉移部分222可包含固定至轉移基底110的第二區域112的底面的第三固定構件222a,及設在第三固定構件222a的一個表面上的多個第六磁體222b,其中極性彼此不同,亦即,S極及N極可被交替地提供至所述多個第六磁體222b。此處,可提供磁性轉移部分222的多個第六磁體222b以具有與磁性旋轉部分221的所述多個第五磁體221b的角度相同的角度(例如,45°)。因此,由於歸因於磁性旋轉部分221的旋轉的極性及磁性轉移部分222的極性彼此不同或相同,且吸力或斥力藉此起作用,因此磁性轉移部分222根據磁性旋轉部分221的旋轉在一個方向上移動。亦即,磁性旋轉部分221的旋轉轉換為磁性轉移部分222的線性運動以移動磁性懸浮的托盤100。The magnetic transfer portion 222 may be disposed under the transfer substrate 110. That is, the magnetic transfer portion 222 may be disposed under the second region 112 of the transfer substrate 110 between the magnetic suspension portions 210. In this magnetic transfer portion 222, magnets having different polarities from each other are alternately disposed. That is, as illustrated in FIG. 4, the magnetic transfer portion 222 may include a third fixing member 222a fixed to the bottom surface of the second region 112 of the transfer substrate 110, and a plurality of surfaces provided on one surface of the third fixing member 222a. The sixth magnet 222b, in which the polarities are different from each other, that is, the S pole and the N pole may be alternately supplied to the plurality of sixth magnets 222b. Here, the plurality of sixth magnets 222b of the magnetic transfer portion 222 may be provided to have the same angle (for example, 45°) as the angle of the plurality of fifth magnets 221b of the magnetic rotating portion 221. Therefore, since the polarity due to the rotation of the magnetic rotating portion 221 and the polarity of the magnetic transfer portion 222 are different or the same from each other, and the suction or repulsive force acts thereby, the magnetic transfer portion 222 is in one direction according to the rotation of the magnetic rotating portion 221. Move on. That is, the rotation of the magnetic rotating portion 221 is converted into linear motion of the magnetic transfer portion 222 to move the magnetically suspended tray 100.

導引單元300可包含耦接至托盤100的上部部分的第一導引磁體310,及設在腔室的上壁上以與第一導引磁體310隔開預定距離的第二導引磁體320。此處,第一導引磁體310及第二導引磁體320可具有相同的極性以使得斥力在其間起作用,或可具有彼此不同的極性以使得吸力在其間起作用。又,可以各種形狀提供第一導引磁體310及第二導引磁體320。舉例而言,可以直線形狀彼此面對地提供第一導引磁體310及第二導引磁體320。又,第一導引磁體310可以圓形條形狀提供,且第二導引磁體320可具有例如以‘∩’形狀彎曲的橫截面以自導引磁體310上方環繞第一導引磁體310。亦即,第二導引磁體320可經提供以環繞第一導引磁體310同時與第一導引磁體310隔開預定距離。因此,托盤100的上部末端經導引以使得托盤100在被轉移的同時不落下,這是因為第二導引磁體320在第一導引磁體310兩側對第一導引磁體310施加推力或拉力。The guiding unit 300 may include a first guiding magnet 310 coupled to an upper portion of the tray 100, and a second guiding magnet 320 disposed on an upper wall of the chamber to be spaced apart from the first guiding magnet 310 by a predetermined distance . Here, the first guiding magnet 310 and the second guiding magnet 320 may have the same polarity such that the repulsive force acts therebetween, or may have different polarities from each other such that the suction acts therebetween. Further, the first guiding magnet 310 and the second guiding magnet 320 may be provided in various shapes. For example, the first guiding magnet 310 and the second guiding magnet 320 may be provided in a straight shape facing each other. Also, the first guiding magnet 310 may be provided in a circular strip shape, and the second guiding magnet 320 may have a cross section curved, for example, in a '∩' shape to surround the first guiding magnet 310 above the self-guide magnet 310. That is, the second guiding magnet 320 may be provided to surround the first guiding magnet 310 while being spaced apart from the first guiding magnet 310 by a predetermined distance. Therefore, the upper end of the tray 100 is guided so that the tray 100 does not fall while being transferred, because the second guiding magnet 320 applies a thrust to the first guiding magnet 310 on both sides of the first guiding magnet 310 or pull.

其中組合鐵芯及線圈的電磁體、永久磁體或電磁體與永久磁體的組合可用作例示性實施例的磁體。An electromagnet in which a core and a coil are combined, a permanent magnet or a combination of an electromagnet and a permanent magnet can be used as the magnet of the exemplary embodiment.

如上文所描述,根據例示性實施例的基板轉移裝置具備安置在托盤100下方並磁性地懸浮及轉移托盤100的磁體轉移單元200,及安置在托盤100之上並導引托盤100的導引單元300。又,磁體轉移單元200包含磁性地使托盤100懸浮的磁性懸浮部分210,及歸因於磁力將旋轉轉換成線性運動以轉移磁性懸浮的托盤100的磁性轉移部分220。因此,根據例示性實施例的基板轉移裝置藉由磁性懸浮部分210磁性地使托盤100懸浮,且接著磁性旋轉部分220在一個方向上旋轉以在一個方向上轉移磁性懸浮的托盤100。在此例示性實施例中,由於並未在托盤100與磁性轉移單元200之間產生摩擦,因此不產生顆粒。因此,並未產生歸因於顆粒的產品缺陷,且不發生諸如真空泵的零件的故障。As described above, the substrate transfer apparatus according to the exemplary embodiment includes the magnet transfer unit 200 disposed under the tray 100 and magnetically suspending and transferring the tray 100, and a guide unit disposed above the tray 100 and guiding the tray 100 300. Also, the magnet transfer unit 200 includes a magnetic suspension portion 210 that magnetically suspends the tray 100, and a magnetic transfer portion 220 of the tray 100 that is converted into linear motion due to magnetic force to transfer the magnetic suspension. Therefore, the substrate transfer apparatus according to the exemplary embodiment magnetically suspends the tray 100 by the magnetic suspension portion 210, and then the magnetic rotating portion 220 is rotated in one direction to transfer the magnetically suspended tray 100 in one direction. In this exemplary embodiment, since no friction is generated between the tray 100 and the magnetic transfer unit 200, no particles are generated. Therefore, product defects due to the particles are not generated, and failure of parts such as a vacuum pump does not occur.

根據例示性實施例的基板轉移裝置可經由在托盤100下方磁性地使托盤100懸浮及藉由使用磁力轉移托盤100的各種方法來實施。亦即,在托盤100下方的結構可以不同方式受到修改。此另一例示性實例是在圖5及圖6中說明。圖5是說明根據第二例示性實施例的基板轉移裝置的磁性轉移單元的側視圖,且將藉由使用此圖5在下文描述第二例示性實施例。The substrate transfer device according to the exemplary embodiment can be implemented by magnetically suspending the tray 100 under the tray 100 and by various methods using the magnetic transfer tray 100. That is, the structure under the tray 100 can be modified in different ways. Another illustrative example of this is illustrated in Figures 5 and 6. FIG. 5 is a side view illustrating a magnetic transfer unit of a substrate transfer apparatus according to a second exemplary embodiment, and a second exemplary embodiment will be described below by using this FIG. 5.

參看圖5,根據第二例示性實施例的基板轉移裝置可包含:托盤100,其轉移安裝在其上的基板;磁性轉移單元200,其安置在托盤100下方以藉由磁性懸浮轉移托盤100;以及導引單元300,其安置在托盤100之上以導引托盤100的轉移。此處,將不描述或簡單地描述與第一例示性實施例相同的組態。Referring to FIG. 5, a substrate transfer apparatus according to a second exemplary embodiment may include: a tray 100 that transfers a substrate mounted thereon; a magnetic transfer unit 200 disposed under the tray 100 to transfer the tray 100 by magnetic suspension; And a guiding unit 300 disposed above the tray 100 to guide the transfer of the tray 100. Here, the same configuration as the first exemplary embodiment will not be described or simply described.

轉移基底110設在托盤100下方,且轉移基底110可包含具有與托盤100寬度相同的寬度的第一區域111、安置在第一區域111下方並具有小於第一區域111寬度的第二區域112,以及設在第二區域112下方以環繞磁性旋轉部分222的第三區域113。第三區域113可包含自第二區域112向下延伸的延伸部分、水平地設在延伸部分下方的水平部分113a,以及自水平部分113a的兩側向下延伸的垂直部分113b及113c。此處,水平部分113a經提供以具有大於磁性旋轉部分221的寬度的寬度且垂直部分113b及113c經提供以具有大於磁性旋轉部分221的高度的高度。因此,水平部分113a以及在水平部分兩側的垂直部分113b及113c經提供以環繞磁性旋轉部分221的上部部分及側部分。The transfer substrate 110 is disposed under the tray 100, and the transfer substrate 110 may include a first region 111 having the same width as the width of the tray 100, a second region 112 disposed below the first region 111 and having a width smaller than the first region 111, And a third region 113 disposed under the second region 112 to surround the magnetic rotating portion 222. The third region 113 may include an extending portion extending downward from the second region 112, a horizontal portion 113a horizontally disposed below the extending portion, and vertical portions 113b and 113c extending downward from both sides of the horizontal portion 113a. Here, the horizontal portion 113a is provided to have a width larger than the width of the magnetic rotating portion 221 and the vertical portions 113b and 113c are provided to have a height larger than the height of the magnetic rotating portion 221. Therefore, the horizontal portion 113a and the vertical portions 113b and 113c on both sides of the horizontal portion are provided to surround the upper portion and the side portion of the magnetic rotating portion 221.

此磁性轉移單元200可包含磁性地使托盤100懸浮的磁性懸浮部分210,及藉由允許吸力或斥力在磁性轉移單元200與磁性懸浮部分210之間起作用而轉移藉由磁性懸浮部分210磁性懸浮的托盤100的磁性轉移部分220。The magnetic transfer unit 200 may include a magnetic suspension portion 210 that magnetically suspends the tray 100, and is magnetically suspended by the magnetic suspension portion 210 by allowing suction or repulsive force to act between the magnetic transfer unit 200 and the magnetic suspension portion 210. The magnetic transfer portion 220 of the tray 100.

磁性懸浮部分210可包含設在轉移基底110的第二區域112上的第一磁性懸浮部分211、經提供以與第一磁性懸浮部分211隔開的第二磁性懸浮部分212、用於維持第一磁性懸浮部分211與第二磁性懸浮部分212之間的間隙的間隙維持構件213,以及支撐第二磁性懸浮部分212的支撐構件214。第一磁性懸浮部分211可包含:固定至轉移基底110的第二區域112的側表面及底部表面的第一固定構件211a、設在第一固定構件211a的側表面的預定區域上的至少一個第一磁體211b,以及設在第一固定構件211a的底部表面的預定區域上的至少一個第二磁體211c。第一固定構件211a可經提供以具有具有「└」形狀的一個側面及具有「┘」形狀的另一側面。此處,第一固定構件211a可經提供以自轉移基底110的第一區域111突出。亦即,藉由第一固定構件211a及在第一固定構件之間的第二區域112所界定的寬度可大於轉移基底110的第一區域111的寬度或托盤100的寬度。又,第一磁體211b及第二磁體211c中的每一者可經提供為單一磁體,或第一磁體211b及第二磁體211c中的至少任一者可以兩個或大於兩個磁體提供。舉例而言,第一磁體211b可經提供為單一磁體,且第二磁體211c可經提供為兩個或大於兩個磁體。第二磁性懸浮部分212可經提供以與第一磁性懸浮部分211隔開預定距離以面對第一磁性懸浮部分211。此第二磁性懸浮部分212可包含與第一磁性懸浮部分211的第一固定構件211a隔開預定距離並面向其的第二固定構件212a,以及分別面對第一磁性懸浮部分211的第一磁體211b及第二磁體211c的第三磁體212b及第四磁體212c。此處,第三磁體212b及第四磁體212c中的每一者可以單一磁體提供,或第三磁體212b及第四磁體212c中的至少一者可以對應於第一磁體211b及第二磁體211c的數目的兩個或大於兩個磁體提供。舉例而言,當提供一個第一磁體211b以及兩個或大於兩個第二磁體211c時,可提供一個第三磁體212b及兩個或大於兩個第四磁體212c。又,第二固定構件212a可經提供以具有具有「└」形狀的一個側面及具有「┘」形狀的另一側面以便與第一固定構件211a隔開預定距離。支撐構件214可設在第二磁性懸浮部分212下方以支撐第二磁性懸浮部分212。亦即,支撐構件214可設在第二磁性懸浮部分212的水平部分與腔室底部之間以支撐第二磁性懸浮部分212的水平部分。支撐構件214支撐第二磁性懸浮部分212的水平部分,且因此第二磁性懸浮部分212可被更穩定地支撐。亦即,第二磁性懸浮部分212的垂直部分是藉由腔室的內壁固定且第二磁性懸浮部分212的水平部分是藉由支撐構件214支撐,且因此第二磁性懸浮部分212可被更穩定地實施。轉移基底110的一部分及磁性轉移部分220可設在支撐構件214的內部。亦即,轉移基底110的第三區域113可設在支撐構件214的內部,且磁性轉移部分220可設在第三區域113的內部。The magnetic suspension portion 210 can include a first magnetic suspension portion 211 disposed on the second region 112 of the transfer substrate 110, a second magnetic suspension portion 212 provided to be spaced apart from the first magnetic suspension portion 211, for maintaining the first A gap maintaining member 213 of the gap between the magnetic suspension portion 211 and the second magnetic suspension portion 212, and a support member 214 supporting the second magnetic suspension portion 212. The first magnetic suspension portion 211 may include: a first fixing member 211a fixed to a side surface and a bottom surface of the second region 112 of the transfer substrate 110, at least one on a predetermined region of a side surface of the first fixing member 211a A magnet 211b, and at least one second magnet 211c provided on a predetermined area of the bottom surface of the first fixing member 211a. The first fixing member 211a may be provided to have one side having a "└" shape and another side having a "┘" shape. Here, the first fixing member 211a may be provided to protrude from the first region 111 of the transfer substrate 110. That is, the width defined by the first fixing member 211a and the second region 112 between the first fixing members may be greater than the width of the first region 111 of the transfer substrate 110 or the width of the tray 100. Also, each of the first magnet 211b and the second magnet 211c may be provided as a single magnet, or at least any one of the first magnet 211b and the second magnet 211c may be provided by two or more than two magnets. For example, the first magnet 211b can be provided as a single magnet, and the second magnet 211c can be provided as two or more than two magnets. The second magnetic floating portion 212 may be provided to be spaced apart from the first magnetic floating portion 211 by a predetermined distance to face the first magnetic floating portion 211. The second magnetic suspension portion 212 may include a second fixing member 212a spaced apart from and facing the first fixing member 211a of the first magnetic suspension portion 211, and a first magnet facing the first magnetic suspension portion 211, respectively The third magnet 212b and the fourth magnet 212c of the second magnet 211c. Here, each of the third magnet 212b and the fourth magnet 212c may be provided by a single magnet, or at least one of the third magnet 212b and the fourth magnet 212c may correspond to the first magnet 211b and the second magnet 211c Two or more than two magnets are provided. For example, when one first magnet 211b and two or more second magnets 211c are provided, one third magnet 212b and two or more than four fourth magnets 212c may be provided. Further, the second fixing member 212a may be provided to have one side having a "└" shape and another side having a "┘" shape to be spaced apart from the first fixing member 211a by a predetermined distance. A support member 214 may be disposed under the second magnetic suspension portion 212 to support the second magnetic suspension portion 212. That is, the support member 214 may be disposed between the horizontal portion of the second magnetic suspension portion 212 and the bottom of the chamber to support the horizontal portion of the second magnetic suspension portion 212. The support member 214 supports the horizontal portion of the second magnetic suspension portion 212, and thus the second magnetic suspension portion 212 can be more stably supported. That is, the vertical portion of the second magnetic suspension portion 212 is fixed by the inner wall of the chamber and the horizontal portion of the second magnetic suspension portion 212 is supported by the support member 214, and thus the second magnetic suspension portion 212 can be further Implemented steadily. A portion of the transfer substrate 110 and the magnetic transfer portion 220 may be disposed inside the support member 214. That is, the third region 113 of the transfer substrate 110 may be disposed inside the support member 214, and the magnetic transfer portion 220 may be disposed inside the third region 113.

磁性轉移部分220可包含磁性旋轉部分221及與磁性旋轉部分221隔開預定距離的磁性轉移部分222。磁性旋轉部分221可設在水平部分113a以及垂直部分113b及113c的內部以與其隔開預定距離。磁性轉移部分222可設在水平部分113a以及垂直部分113b及113c的至少一個區域上。類似於例示性實施例,磁性旋轉部分221包含旋轉軸221a,以及經提供以按預定角度環繞旋轉軸221a的表面的多個第五磁體221b。磁性轉移部分222可經提供至垂直部分113b及113c。亦即,磁性轉移部分222可經提供至磁性旋轉部分221的兩側。當然,磁性轉移部分222亦可經提供至水平部分113a,且亦經提供至水平部分113a以及垂直部分113b及113c兩者。此磁性轉移部分222可具備預定固定構件,且S極及N極可交替地設在固定構件上。此處,磁性轉移部分222可經提供以具有與磁性旋轉部分221的所述多個第五磁體221b的角度相同的角度(例如45°)。因此,由於歸因於磁性旋轉部分221的旋轉的極性及磁性轉移部分222的極性彼此相同,且吸力藉此起作用,因此磁性轉移部分222根據磁性旋轉部分221的旋轉在一個方向上移動。亦即,磁性旋轉部分221的旋轉轉換為磁性轉移部分222的線性運動以移動磁性懸浮的托盤100。The magnetic transfer portion 220 may include a magnetic rotating portion 221 and a magnetic transfer portion 222 spaced apart from the magnetic rotating portion 221 by a predetermined distance. The magnetic rotating portion 221 may be provided inside the horizontal portion 113a and the vertical portions 113b and 113c to be spaced apart therefrom by a predetermined distance. The magnetic transfer portion 222 may be provided on at least one of the horizontal portion 113a and the vertical portions 113b and 113c. Similar to the exemplary embodiment, the magnetic rotating portion 221 includes a rotating shaft 221a, and a plurality of fifth magnets 221b provided to surround the surface of the rotating shaft 221a at a predetermined angle. The magnetic transfer portion 222 can be provided to the vertical portions 113b and 113c. That is, the magnetic transfer portion 222 may be provided to both sides of the magnetic rotating portion 221. Of course, the magnetic transfer portion 222 can also be provided to the horizontal portion 113a and also to both the horizontal portion 113a and the vertical portions 113b and 113c. The magnetic transfer portion 222 may be provided with a predetermined fixing member, and the S pole and the N pole may be alternately provided on the fixing member. Here, the magnetic transfer portion 222 may be provided to have the same angle (for example, 45°) as the angle of the plurality of fifth magnets 221b of the magnetic rotating portion 221. Therefore, since the polarity due to the rotation of the magnetic rotating portion 221 and the polarity of the magnetic transfer portion 222 are identical to each other, and the suction is thereby actuated, the magnetic transfer portion 222 moves in one direction according to the rotation of the magnetic rotating portion 221. That is, the rotation of the magnetic rotating portion 221 is converted into linear motion of the magnetic transfer portion 222 to move the magnetically suspended tray 100.

圖6是說明根據第三例示性實施例的基板轉移裝置的磁性轉移單元的側視圖。FIG. 6 is a side view illustrating a magnetic transfer unit of a substrate transfer device according to a third exemplary embodiment.

參看圖6,根據第三例示性實施例的基板轉移裝置可包含:托盤100,其轉移安裝在其上的基板;磁性轉移單元200,其安置在托盤100下方以藉由磁性懸浮轉移托盤100;以及導引單元300,其安置在托盤100之上以導引托盤100的轉移。此處,在第三例示性實施例中,磁性轉移單元200的磁性懸浮部分210的結構不同於使用圖5描述的第二例示性實施例的結構,且此將主要利用另一例示性實施例而描述如下。Referring to FIG. 6, a substrate transfer apparatus according to a third exemplary embodiment may include: a tray 100 that transfers a substrate mounted thereon; a magnetic transfer unit 200 disposed under the tray 100 to transfer the tray 100 by magnetic suspension; And a guiding unit 300 disposed above the tray 100 to guide the transfer of the tray 100. Here, in the third exemplary embodiment, the structure of the magnetic suspension portion 210 of the magnetic transfer unit 200 is different from that of the second exemplary embodiment described using FIG. 5, and this will mainly utilize another exemplary embodiment. The description is as follows.

磁性轉移單元200的磁性懸浮部分210可包含:第一磁性懸浮部分211,其設在轉移基底110的第二區域112上;第二磁性懸浮部分212,其經提供以與第一磁性懸浮部分211隔開;間隙維持構件213,其用於維持第一磁性懸浮部分211與第二磁性懸浮部分212之間的間隙;以及支撐構件214,其支撐第二磁性懸浮部分212。第一磁性懸浮部分211可包含:第一固定構件211a,其固定至轉移基底110的第二區域112的側表面及底部表面,並具有具有「└」形狀的一個側面及具有「┘」形狀的另一側面;至少一個第一磁體211b,其設在第一固定構件211a的上表面的預定區域上;以及至少一個第二磁體211c,其設在第一固定構件211a的底部表面的預定區域上。亦即,儘管第一磁體211b在第一及第二例示性實施例中設在第一固定構件211a的側表面上,但在第三實施例中第一磁體211b可設在第一固定構件211a的上表面上。此處,第一磁體211b可設在第一固定構件211a的上表面上同時與轉移基底110的第一區域111的側表面隔開。又,第二磁性懸浮部分212可經提供以與第一磁性懸浮部分211隔開預定距離以面對第一磁性懸浮部分211。此第二磁性懸浮部分212可包含與第一磁性懸浮部分211的第一固定構件211a隔開預定距離並面對其的第二固定構件212a,以及分別面對第一磁性懸浮部分211的第一磁體211b及第二磁體211c的第三磁體212b及第四磁體212c。此處,第二固定構件212a可與第一固定構件211a隔開預定距離並面對其,且可經提供以具有具有「ㄷ」形狀的一個側面及具有「コ」形狀的另一側面以便面對第一固定構件211a的上表面。第二固定構件212a可經提供以具有短上部側面及長下部側面,並在其整個區域之內與第一固定構件211a隔開相同距離。此處,第一磁體211b及第三磁體212b彼此可具有不同極性,且吸力可藉此起作用。第二磁體211c及第四磁體212c彼此可具有相同極性,且斥力可藉此起作用。又,在其之間吸力起作用的磁體可進一步設在第一固定構件211a的側表面及第二固定構件212a的側表面上。The magnetic suspension portion 210 of the magnetic transfer unit 200 may include a first magnetic suspension portion 211 disposed on the second region 112 of the transfer substrate 110, and a second magnetic suspension portion 212 provided with the first magnetic suspension portion 211 Separated; a gap maintaining member 213 for maintaining a gap between the first magnetic floating portion 211 and the second magnetic floating portion 212; and a support member 214 supporting the second magnetic floating portion 212. The first magnetic suspension portion 211 may include: a first fixing member 211a fixed to a side surface and a bottom surface of the second region 112 of the transfer substrate 110, and having one side having a "└" shape and having a "┘" shape The other side; at least one first magnet 211b provided on a predetermined area of the upper surface of the first fixing member 211a; and at least one second magnet 211c provided on a predetermined area of the bottom surface of the first fixing member 211a . That is, although the first magnet 211b is provided on the side surface of the first fixing member 211a in the first and second exemplary embodiments, the first magnet 211b may be provided in the first fixing member 211a in the third embodiment. On the upper surface. Here, the first magnet 211b may be disposed on the upper surface of the first fixing member 211a while being spaced apart from the side surface of the first region 111 of the transfer substrate 110. Also, the second magnetic suspension portion 212 may be provided to be spaced apart from the first magnetic suspension portion 211 by a predetermined distance to face the first magnetic suspension portion 211. The second magnetic suspension portion 212 may include a second fixing member 212a spaced apart from and facing the first fixing member 211a of the first magnetic suspension portion 211, and a first surface facing the first magnetic suspension portion 211, respectively. The magnet 211b and the third magnet 212b and the fourth magnet 212c of the second magnet 211c. Here, the second fixing member 212a may be spaced apart from and facing the first fixing member 211a by a predetermined distance, and may be provided to have one side having a "ᄃ" shape and another side having a "コ" shape to face The upper surface of the first fixing member 211a. The second fixing member 212a may be provided to have a short upper side surface and a long lower side surface, and spaced apart from the first fixing member 211a by the same distance within the entire area thereof. Here, the first magnet 211b and the third magnet 212b may have different polarities from each other, and the suction force may act thereby. The second magnet 211c and the fourth magnet 212c may have the same polarity with each other, and the repulsive force may function thereby. Further, a magnet in which the suction force acts may be further provided on the side surface of the first fixing member 211a and the side surface of the second fixing member 212a.

圖7是說明根據例示性實施例的導引單元300的側視圖。FIG. 7 is a side view illustrating a guiding unit 300 in accordance with an exemplary embodiment.

參看圖7,根據例示性實施例的導引單元300可包含:第一板311,其耦接至托盤100的上部;第一導引磁體310,其設在第一板311上;第二板321,其固定至腔室的上壁;第二導引磁體320,其與第一導引磁體310隔開預定距離並設在第二板321上;側板330,其自第二板321的側表面向下延伸;第三導引磁體340,其設在第一板311的側表面上;第四導引磁體350,其與第三導引磁體340隔開預定距離並面對第三導引磁體340且設在側板330上;以及第二間隙維持構件360,其設在側板330的預定區域上以維持側板330與導引磁體310、320、340以及350之間的間隙。此處,第三導引磁體340及第四導引磁體350亦可設在第二導引磁體320之上的第二板321與面對第二板的側板330之間,且亦可設在第一板311與面對第一板的側板330之間及第二板321與面對第二板的側板330之間的兩個區域上。又,第一導引磁體310及第二導引磁體320可具有相同極性以使得斥力在其間起作用,或可具有彼此不同的極性以使得吸力在其間起作用。又,第三導引磁體340及第四導引磁體350可具有相同極性以使得斥力在其間起作用。因此,托盤100的上部末端部分可藉由第一導引磁體310與第二導引磁體320之間的吸力及第三導引磁體340與第四導引磁體350之間的斥力而轉移同時被導引而不落下。亦即,由於斥力是由第三導引磁體340及第四導引磁體350自側表面施加,因此與使用第一導引磁體310及第二導引磁體320的狀況相比,托盤100的垂直姿勢轉移可更容易執行。又,由於進一步提供第二間隙維持構件360,因此托盤100的搖動寬度可被均勻地維持,且因此托盤100的垂直姿勢轉移可更容易執行。Referring to FIG. 7, the guiding unit 300 according to an exemplary embodiment may include: a first board 311 coupled to an upper portion of the tray 100; a first guiding magnet 310 disposed on the first board 311; and a second board The holder is fixed to the upper wall of the chamber; the second guiding magnet 320 is spaced apart from the first guiding magnet 310 by a predetermined distance and is disposed on the second plate 321; the side plate 330 is from the side of the second plate 321 The surface extends downward; a third guiding magnet 340 is disposed on a side surface of the first plate 311; and a fourth guiding magnet 350 is spaced apart from the third guiding magnet 340 by a predetermined distance and faces the third guiding The magnet 340 is also disposed on the side plate 330; and a second gap maintaining member 360 is provided on a predetermined area of the side plate 330 to maintain a gap between the side plate 330 and the guiding magnets 310, 320, 340, and 350. Here, the third guiding magnet 340 and the fourth guiding magnet 350 may also be disposed between the second plate 321 above the second guiding magnet 320 and the side plate 330 facing the second plate, and may also be disposed at The first plate 311 is spaced between the side plate 330 facing the first plate and the second plate 321 and the side plate 330 facing the second plate. Also, the first guiding magnet 310 and the second guiding magnet 320 may have the same polarity such that the repulsive force acts therebetween, or may have different polarities from each other such that the suction acts therebetween. Also, the third guiding magnet 340 and the fourth guiding magnet 350 may have the same polarity such that the repulsive force acts therebetween. Therefore, the upper end portion of the tray 100 can be transferred by the suction between the first guiding magnet 310 and the second guiding magnet 320 and the repulsive force between the third guiding magnet 340 and the fourth guiding magnet 350. Guide without falling. That is, since the repulsive force is applied from the side surface by the third guiding magnet 340 and the fourth guiding magnet 350, the vertical direction of the tray 100 is compared with the case where the first guiding magnet 310 and the second guiding magnet 320 are used. Posture shifting is easier to perform. Also, since the second gap maintaining member 360 is further provided, the swing width of the tray 100 can be uniformly maintained, and thus the vertical posture shift of the tray 100 can be performed more easily.

導引托盤100的轉移的轉移導引件可進一步設在托盤100下方。轉移導引件可經提供以與托盤100隔開預定距離,其中托盤100安置在其間。轉移導引件可設在托盤100與腔室的內壁之間。亦即,兩個轉移導引件可經提供以在腔室的側表面與托盤100之間與托盤100隔開預定距離。舉例而言,在圖3、圖5,以及圖6中,轉移導引件可設在磁性懸浮部分210的外部。亦即,轉移導引件可設在磁性懸浮部分210的第二磁性懸浮部分212與腔室的內壁之間。當轉移導引件設在第二磁性懸浮部分212與腔室的內壁之間時,可自腔室的底部表面固定第二磁性懸浮部分212。將在下文使用圖8及圖9描述具備此轉移導引件的基板轉移裝置。The transfer guide of the transfer tray 100 can be further disposed under the tray 100. The transfer guide can be provided to be spaced apart from the tray 100 by a predetermined distance with the tray 100 disposed therebetween. A transfer guide can be provided between the tray 100 and the inner wall of the chamber. That is, two transfer guides may be provided to be spaced apart from the tray 100 by a predetermined distance between the side surface of the chamber and the tray 100. For example, in FIGS. 3, 5, and 6, the transfer guide may be disposed outside of the magnetic suspension portion 210. That is, the transfer guide may be disposed between the second magnetic suspension portion 212 of the magnetic suspension portion 210 and the inner wall of the chamber. The second magnetic suspension portion 212 can be secured from the bottom surface of the chamber when the transfer guide is disposed between the second magnetic suspension portion 212 and the inner wall of the chamber. A substrate transfer device including the transfer guide will be described below using Figs. 8 and 9.

圖8是說明根據第四例示性實施例的基板轉移裝置的磁性轉移單元的側視圖。FIG. 8 is a side view illustrating a magnetic transfer unit of a substrate transfer device according to a fourth exemplary embodiment.

參看圖8,根據第四例示性實施例的基板轉移裝置可包含:托盤100,其轉移安裝在其上的基板;磁性轉移單元200,其安置在托盤100下方以藉由磁性懸浮轉移托盤100;以及導引單元300,其用於導引托盤100。導引單元300可設在托盤100之上及下方。圖7中描述及說明的組態可設在托盤100之上,且用於導引托盤100的轉移的轉移導引件370可設在托盤100下方。此處,在第四例示性實施例中,與第一至第三例示性實施例中的組態相同的組態將被簡單描述或將不被描述。Referring to FIG. 8, a substrate transfer apparatus according to a fourth exemplary embodiment may include: a tray 100 that transfers a substrate mounted thereon; a magnetic transfer unit 200 disposed under the tray 100 to transfer the tray 100 by magnetic suspension; And a guiding unit 300 for guiding the tray 100. The guiding unit 300 can be disposed above and below the tray 100. The configuration described and illustrated in FIG. 7 can be disposed above the tray 100, and a transfer guide 370 for guiding the transfer of the tray 100 can be disposed under the tray 100. Here, in the fourth exemplary embodiment, configurations identical to those in the first to third exemplary embodiments will be briefly described or will not be described.

轉移基底110設在托盤100下方,且轉移基底100可包含:第一區域111,其具有與托盤100寬度相同的寬度;以及延伸區域114,其設在第一區域111的側表面上並環繞磁性旋轉部分221。亦即,延伸區域114可經提供以自第一區域111的側表面向下延伸。此處,延伸區域114可經提供以具有大於磁性旋轉部分221的寬度的寬度,以便與磁性旋轉部分221隔開預定距離。可以具有預定寬度及長度的板形狀提供此延伸區域114。又,間隙維持構件213可設在延伸區域114內部的預定區域上。亦即,在使用圖6描述的第三例示性實施例中,間隙維持構件213設在第一磁性懸浮部分211與第二磁性懸浮部分212之間以維持在第一磁性懸浮部分211與第二磁性懸浮部分212之間的間隙。在第四例示性實施例中,間隙維持構件213可設在延伸區域114內部在延伸區域114與磁性轉移部分220之間。當然,間隙維持構件213亦可設在磁性轉移部分220的一個區域上。亦即,間隙維持構件213可設在延伸區域114與磁性轉移部分220之間,或經提供以固定至磁性轉移部分220的預定區域。至少一個第七磁體115可設在延伸區域114的至少一個區域上,亦即設在延伸區域的外部區域上。The transfer substrate 110 is disposed under the tray 100, and the transfer substrate 100 may include: a first region 111 having the same width as the width of the tray 100; and an extension region 114 disposed on a side surface of the first region 111 and surrounding the magnetic The portion 221 is rotated. That is, the extended region 114 can be provided to extend downward from the side surface of the first region 111. Here, the extended region 114 may be provided to have a width larger than the width of the magnetic rotating portion 221 so as to be spaced apart from the magnetic rotating portion 221 by a predetermined distance. This extended region 114 may be provided in a plate shape having a predetermined width and length. Also, the gap maintaining member 213 may be provided on a predetermined area inside the extended region 114. That is, in the third exemplary embodiment described using FIG. 6, the gap maintaining member 213 is provided between the first magnetic floating portion 211 and the second magnetic floating portion 212 to be maintained at the first magnetic floating portion 211 and the second. A gap between the magnetic suspension portions 212. In the fourth exemplary embodiment, the gap maintaining member 213 may be disposed inside the extended region 114 between the extended region 114 and the magnetic transfer portion 220. Of course, the gap maintaining member 213 may also be provided on one area of the magnetic transfer portion 220. That is, the gap maintaining member 213 may be provided between the extended region 114 and the magnetic transfer portion 220, or provided to be fixed to a predetermined region of the magnetic transfer portion 220. At least one seventh magnet 115 may be disposed on at least one region of the extended region 114, that is, on an outer region of the extended region.

磁性轉移單元200可包含磁性懸浮托盤100的磁性懸浮部分210,及藉由允許吸力或斥力在磁性轉移單元200與磁性懸浮部分210之間起作用而轉移由磁性懸浮部分210磁性懸浮的托盤100的磁性轉移部分220。磁性懸浮部分210可包含經提供以固定至轉移基底110的第一區域111的第一磁性懸浮部分211,以及經提供以與第一磁性懸浮部分211隔開的第二磁性懸浮部分212。第一磁性懸浮部分211可包含固定至轉移基底110的第一區域111的下表面的第一固定構件211a,以及設在第一固定構件211a的下表面的預定區域上的至少一個第一磁體211b。其上部部分固定至第一區域111的下部部分的第一固定構件211a以及其底部表面可為水平的。此處,可提供大於第一區域111的寬度的第一固定構件211a的寬度。由於第一固定構件211a經提供以具有大於第一區域111的寬度的寬度,因此接觸第一固定構件211a的側表面的延伸區域114可經提供以具有大於第一區域111寬度的寬度。又,至少一個第一磁體211b可設在第一固定構件211a下方,例如可提供三個磁體同時維持其間的相同間隔。第二磁性懸浮部分212可經提供以與第一磁性懸浮部分211隔開預定距離以面對第一磁性懸浮部分211。此第二磁性懸浮部分212可包含與第一磁性懸浮部分211的第一固定構件211a隔開預定距離並面對其的第二固定構件212a,以及面對第一磁性懸浮部分211的至少一個第一磁體211b的至少一個第三磁體212b。又,第二固定構件212a可經提供以具有與第一固定構件211a的形狀相同的形狀,以便與第一固定構件211a隔開預定距離。舉例而言,第一固定構件211a及第二固定構件212a可具有矩形橫截面形狀。此處,第二磁性懸浮部分212的第二固定構件212a可固定至磁性轉移部分220的一個區域。The magnetic transfer unit 200 may include a magnetic suspension portion 210 of the magnetic suspension tray 100, and transfer the tray 100 magnetically suspended by the magnetic suspension portion 210 by allowing suction or repulsive force to act between the magnetic transfer unit 200 and the magnetic suspension portion 210. Magnetic transfer portion 220. The magnetic suspension portion 210 can include a first magnetic suspension portion 211 that is provided to be secured to the first region 111 of the transfer substrate 110, and a second magnetic suspension portion 212 that is provided to be spaced apart from the first magnetic suspension portion 211. The first magnetic suspension portion 211 may include a first fixing member 211a fixed to a lower surface of the first region 111 of the transfer substrate 110, and at least one first magnet 211b provided on a predetermined region of a lower surface of the first fixing member 211a . The first fixing member 211a whose upper portion is fixed to the lower portion of the first region 111 and the bottom surface thereof may be horizontal. Here, the width of the first fixing member 211a larger than the width of the first region 111 may be provided. Since the first fixing member 211a is provided to have a width larger than the width of the first region 111, the extended region 114 contacting the side surface of the first fixing member 211a may be provided to have a width larger than the width of the first region 111. Also, at least one first magnet 211b may be disposed under the first fixing member 211a, for example, three magnets may be provided while maintaining the same interval therebetween. The second magnetic floating portion 212 may be provided to be spaced apart from the first magnetic floating portion 211 by a predetermined distance to face the first magnetic floating portion 211. The second magnetic suspension portion 212 may include a second fixing member 212a spaced apart from and facing the first fixing member 211a of the first magnetic suspension portion 211, and at least one facing the first magnetic suspension portion 211 At least one third magnet 212b of a magnet 211b. Also, the second fixing member 212a may be provided to have the same shape as that of the first fixing member 211a so as to be spaced apart from the first fixing member 211a by a predetermined distance. For example, the first fixing member 211a and the second fixing member 212a may have a rectangular cross-sectional shape. Here, the second fixing member 212a of the second magnetic floating portion 212 may be fixed to one region of the magnetic transfer portion 220.

磁性轉移部分220可包含磁性旋轉部分221、與磁性旋轉部分221隔開預定距離的磁性轉移部分222,以及其中容納磁性旋轉部分221的容納構件223。容納構件223在內部容納磁性旋轉部分221,且其下部部分可固定至腔室底部。此處,容納構件223可經提供以具有中空形狀以使得磁性旋轉部分221可以可旋轉方式容納於其中。又,可提供容納構件223以使得在其側表面曝露磁性轉移部分222的至少一部分。又,第二磁性懸浮部分212可設在容納構件223的上表面上。亦即,第二磁性懸浮部分212的第二固定構件212a可固定至容納構件223的上部部分。磁性轉移部分222可包含至少一個磁體,且可設在面對磁性旋轉部分221的延伸區域114上。亦即,延伸區域114可設在容納構件223外部以與容納構件223隔開預定距離,且包含至少一個磁體的磁性轉移部分222可設在延伸區域114內部以便面對容納於容納構件223中的磁性旋轉部分221。The magnetic transfer portion 220 may include a magnetic rotating portion 221, a magnetic transfer portion 222 spaced apart from the magnetic rotating portion 221 by a predetermined distance, and a receiving member 223 in which the magnetic rotating portion 221 is accommodated. The accommodating member 223 accommodates the magnetic rotating portion 221 inside, and the lower portion thereof can be fixed to the bottom of the chamber. Here, the receiving member 223 may be provided to have a hollow shape such that the magnetic rotating portion 221 may be rotatably accommodated therein. Also, the accommodating member 223 may be provided such that at least a portion of the magnetic transfer portion 222 is exposed at its side surface. Also, the second magnetic suspension portion 212 may be provided on the upper surface of the accommodating member 223. That is, the second fixing member 212a of the second magnetic suspension portion 212 may be fixed to the upper portion of the accommodating member 223. The magnetic transfer portion 222 may include at least one magnet and may be disposed on the extended region 114 facing the magnetic rotating portion 221. That is, the extension region 114 may be disposed outside the accommodation member 223 to be spaced apart from the accommodation member 223 by a predetermined distance, and the magnetic transfer portion 222 including at least one magnet may be disposed inside the extension region 114 so as to face the accommodation member 223 Magnetic rotating portion 221.

轉移導引件370可設在磁性轉移單元200與腔室之間。亦即,導引單元300可在托盤100之上及下方導引托盤100的轉移。轉移導引件370可設在托盤100下方以自磁性轉移單元200的側表面導引磁性轉移單元200的轉移。此轉移導引件370可設在磁性轉移單元200與腔室的內表面之間,且可具有預定寬度及高度。又,至少一個磁體設在轉移導引件370的內部側面上的預定區域上。亦即,轉移導引件370可包含在高度方向上設在磁性轉移單元200與腔室之間的垂直板371,以及設在垂直板371的預定區域上的至少一個第八磁體372。垂直板371可經提供以具有例如第一磁性懸浮部分211的高度。亦即,垂直板371可經提供以具有直至轉移基底110的第一區域111與第一磁性懸浮部分211的第一固定構件211a之間的邊界表面的高度。又,至少一個第八磁體372經提供至垂直板371。第八磁體372可經提供以面對設在延伸區域114上的第七磁體115。此處,延伸區域114的第七磁體115及垂直板371的第八磁體372可具有彼此不同的極性或相同的極性,且吸力或斥力可藉此起作用。在沈積腔室內部的轉移導引件370可為固定的,且在橫移腔室內部的轉移導引件370可在接近托盤100或遠離托盤100的方向上移動。此處,在橫移腔室內部的轉移導引件可使用磁性懸浮而無接觸地移動。亦即,與使用圖4描述的磁性轉移部分中的原理相同的原理可應用於橫移腔室的轉移導引件370。舉例而言,具備旋轉軸(未圖示)及設在旋轉軸的表面上的多個磁體(未圖示)的磁性旋轉部分(未圖示)可設在垂直板371下方以與垂直板371隔開,且具有彼此不同極性的磁體可以預定間隔設在垂直板371的下表面上以與磁性旋轉部分隔開。因此,歸因於在垂直板371下方的磁性旋轉部分的旋轉的極性與在磁性旋轉部分之上的磁性轉移部分的極性可彼此不同或彼此相同。由於吸力或斥力藉此起作用,因此磁性轉移部分根據磁性旋轉部分的旋轉在一個或另一個方向上移動。亦即,磁性旋轉部分的旋轉轉換為磁性轉移部分的線性運動,且因此移動磁性懸浮的垂直板371。A transfer guide 370 can be disposed between the magnetic transfer unit 200 and the chamber. That is, the guiding unit 300 can guide the transfer of the tray 100 above and below the tray 100. The transfer guide 370 may be disposed under the tray 100 to guide the transfer of the magnetic transfer unit 200 from the side surface of the magnetic transfer unit 200. The transfer guide 370 can be disposed between the magnetic transfer unit 200 and the inner surface of the chamber, and can have a predetermined width and height. Also, at least one magnet is provided on a predetermined area on the inner side surface of the transfer guide 370. That is, the transfer guide 370 may include a vertical plate 371 disposed between the magnetic transfer unit 200 and the chamber in the height direction, and at least one eighth magnet 372 provided on a predetermined region of the vertical plate 371. The vertical plate 371 may be provided to have a height such as the first magnetic suspension portion 211. That is, the vertical plate 371 may be provided to have a height up to a boundary surface between the first region 111 of the transfer substrate 110 and the first fixing member 211a of the first magnetic suspension portion 211. Also, at least one eighth magnet 372 is provided to the vertical plate 371. The eighth magnet 372 can be provided to face the seventh magnet 115 disposed on the extended region 114. Here, the seventh magnet 115 of the extended region 114 and the eighth magnet 372 of the vertical plate 371 may have different polarities or the same polarity from each other, and suction or repulsive force may function thereby. The transfer guide 370 inside the deposition chamber may be fixed, and the transfer guide 370 inside the traverse chamber may move in a direction approaching or away from the tray 100. Here, the transfer guide inside the traverse chamber can be moved without contact using magnetic suspension. That is, the same principle as that used in the magnetic transfer portion described using FIG. 4 can be applied to the transfer guide 370 of the traverse chamber. For example, a magnetic rotating portion (not shown) including a rotating shaft (not shown) and a plurality of magnets (not shown) provided on the surface of the rotating shaft may be provided below the vertical plate 371 to be opposed to the vertical plate 371. Magnets spaced apart and having different polarities from each other may be provided on the lower surface of the vertical plate 371 at a predetermined interval to be spaced apart from the magnetic rotating portion. Therefore, the polarity due to the rotation of the magnetic rotating portion below the vertical plate 371 and the polarity of the magnetic transfer portion above the magnetic rotating portion may be different from each other or the same as each other. Since the suction or repulsive force acts thereby, the magnetic transfer portion moves in one direction or the other according to the rotation of the magnetic rotating portion. That is, the rotation of the magnetic rotating portion is converted into linear motion of the magnetic transfer portion, and thus the magnetically suspended vertical plate 371 is moved.

圖9是說明根據第五例示性實施例的基板轉移裝置的磁性轉移單元的側視圖。9 is a side view illustrating a magnetic transfer unit of a substrate transfer device according to a fifth exemplary embodiment.

參看圖9,根據第五例示性實施例的基板轉移裝置可包含:托盤100,其轉移安裝在其上的基板;磁性轉移單元200,其安置在托盤100下方以藉由磁性懸浮轉移托盤100;以及導引單元300,其用於導引托盤100。導引單元300可設在托盤100之上及下方。圖7中描述及說明的組態可設在托盤100之上,且導引托盤100的轉移的轉移導引件370可設在托盤100下方。此處,在第五例示性實施例中,間隙維持構件213的安置位置不同於使用圖8描述的第四例示性實施例的安置位置。亦即,除間隙維持構件213設在轉移導引件370與延伸區域114之間的差異以外,根據第五例示性實施例的基板轉移裝置具有與根據第四例示性實施例的基板轉移裝置完全相同的組態。間隙維持構件213可設在轉移導引件370與延伸區域114之間的延伸區域114上或設在轉移導引件370的預定區域上。舉例而言,間隙維持構件213可設在延伸區域114的第七磁體115下方。因此,間隙維持構件213可設在磁性轉移單元200與轉移導引件370之間,且因此即使當磁性轉移單元200搖動時仍可在轉移導引件370內部轉移磁性轉移單元200。當然,間隙維持構件213可不僅設在轉移導引件370與延伸區域114之間,而且可設在延伸區域114與磁性轉移部分220之間。亦即,至少兩個或大於兩個間隙維持構件213可設在至少兩個或大於兩個區域上。Referring to FIG. 9, a substrate transfer apparatus according to a fifth exemplary embodiment may include: a tray 100 that transfers a substrate mounted thereon; a magnetic transfer unit 200 disposed under the tray 100 to transfer the tray 100 by magnetic suspension; And a guiding unit 300 for guiding the tray 100. The guiding unit 300 can be disposed above and below the tray 100. The configuration described and illustrated in FIG. 7 can be disposed above the tray 100, and the transferred transfer guide 370 of the guide tray 100 can be disposed below the tray 100. Here, in the fifth exemplary embodiment, the placement position of the gap maintaining member 213 is different from the seating position of the fourth exemplary embodiment described using FIG. That is, the substrate transfer device according to the fifth exemplary embodiment has the same with the substrate transfer device according to the fourth exemplary embodiment except that the gap maintaining member 213 is provided between the transfer guide 370 and the extended region 114. The same configuration. The gap maintaining member 213 may be provided on the extended region 114 between the transfer guide 370 and the extended region 114 or on a predetermined region of the transfer guide 370. For example, the gap maintaining member 213 may be disposed under the seventh magnet 115 of the extended region 114. Therefore, the gap maintaining member 213 can be disposed between the magnetic transfer unit 200 and the transfer guide 370, and thus the magnetic transfer unit 200 can be transferred inside the transfer guide 370 even when the magnetic transfer unit 200 is shaken. Of course, the gap maintaining member 213 may be provided not only between the transfer guide 370 and the extended region 114 but also between the extended region 114 and the magnetic transfer portion 220. That is, at least two or more than two gap maintaining members 213 may be provided on at least two or more than two regions.

轉移導引件370的至少一部分可在一個方向上或在與所述一個方向相反的另一方向上移動。舉例而言,在沈積腔室內部的轉移導引件為固定的,且在橫移腔室內部的轉移導引件可為可移動的。亦即,當托盤100自沈積腔室轉移時,設在橫移腔室內部的轉移導引件藉由維持距托盤100的第一間隙而導引托盤100的轉移,且當托盤100的轉移完成且托盤朝向裝載腔室返回時,設在橫移腔室內部的轉移導引件朝向腔室的內壁移動並維持距托盤100的大於第一間隙的第二間隙。轉移導引件在橫移腔室內部移動,且因此當托盤100的位置移動時托盤100的移動裕度可得以增加。亦即,托盤100可脫離磁性力的作用,且因此有可能實現容易的橫移(亦即,改道(lane change))。將在下文使用圖10及圖11描述此轉移導引件370在其中移動的基板轉移裝置。At least a portion of the transfer guide 370 can be moved in one direction or in another direction opposite the one direction. For example, the transfer guide inside the deposition chamber is fixed, and the transfer guide inside the traverse chamber can be movable. That is, when the tray 100 is transferred from the deposition chamber, the transfer guide provided inside the traverse chamber guides the transfer of the tray 100 by maintaining the first gap from the tray 100, and when the transfer of the tray 100 is completed And when the tray returns toward the loading chamber, the transfer guide disposed inside the traverse chamber moves toward the inner wall of the chamber and maintains a second gap from the tray 100 that is larger than the first gap. The transfer guide moves inside the traverse chamber, and thus the movement margin of the tray 100 can be increased as the position of the tray 100 moves. That is, the tray 100 can be decoupled from the magnetic force, and thus it is possible to achieve easy traverse (i.e., lane change). The substrate transfer device in which the transfer guide 370 is moved will be described below using FIGS. 10 and 11.

參看圖10及圖11,根據第六例示性實施例的基板轉移裝置可包含:托盤100,其轉移安裝在其上的基板;磁性轉移單元200,其安置在托盤100下方以藉由磁性懸浮轉移托盤100;以及導引單元300,其包含安置在托盤100下方以導引托盤100的轉移的轉移導引件370。轉移導引件370可在彼此相反的一個方向及另一方向上移動,且可在接近托盤100的方向上及在遠離托盤100的方向上移動。此可移動轉移導引件370可至少設在橫移腔室內部。10 and 11, the substrate transfer apparatus according to the sixth exemplary embodiment may include: a tray 100 that transfers a substrate mounted thereon; and a magnetic transfer unit 200 disposed under the tray 100 to be transferred by magnetic levitation A tray 100; and a guiding unit 300 including a transfer guide 370 disposed under the tray 100 to guide the transfer of the tray 100. The transfer guides 370 are movable in one direction and the other direction opposite to each other, and are movable in a direction approaching the tray 100 and in a direction away from the tray 100. The movable transfer guide 370 can be disposed at least within the traverse chamber.

轉移導引件370可包含垂直板371a及水平板371b,且垂直板371a可設在水平板371b之上。The transfer guide 370 may include a vertical plate 371a and a horizontal plate 371b, and the vertical plate 371a may be disposed above the horizontal plate 371b.

亦即,可自水平板371b的預定區域在向上方向上垂直地提供垂直板371a。又,在垂直板371a中,可提供至少一個第八磁體372以便面對設在托盤100的延伸區域114上的第七磁體115。水平板371b可設在垂直板371a下方並可被水平地提供。此處,可移動部分395可設在水平板371b下方。可移動部分395可經提供以使得其下部區域的至少一部分圍繞導軌390,且可沿著導軌390在彼此相反的一個及另一個方向上移動。當可移動部分395移動時,位於其上方的轉移導引件370移動。支撐部分380設在導軌390下方。支撐部分380支撐導軌390及在導軌之上的轉移導引件370。又,用於驅動可移動部分395的驅動單元(未圖示)可設在支撐部分380內部。驅動單元包含汽缸、馬達或類似者,且在如圖10中所說明接近托盤100的一個方向上及在如圖11中所說明遠離托盤100的另一個方向上移動可移動部分395。此處,當自沈積腔室轉移托盤100時,轉移導引件371位於接近托盤100的第一位置處。在執行改道(亦即,橫移以使托盤100朝向裝載腔室返回)的情況下,可移動部分395由驅動單元驅動以使得轉移導引件371在遠離托盤100的方向上移動以位於第二位置處。在轉移導引件371移動之後,托盤100被提昇,且接著朝向裝載腔室返回。接著,轉移導引件371再次被移動至第一位置。That is, the vertical plate 371a may be vertically provided in the upward direction from a predetermined area of the horizontal plate 371b. Also, in the vertical plate 371a, at least one eighth magnet 372 may be provided to face the seventh magnet 115 provided on the extended region 114 of the tray 100. The horizontal plate 371b may be disposed below the vertical plate 371a and may be provided horizontally. Here, the movable portion 395 may be disposed below the horizontal plate 371b. The movable portion 395 can be provided such that at least a portion of its lower region surrounds the rail 390 and can move along one and the other direction opposite each other along the rail 390. When the movable portion 395 moves, the transfer guide 370 located above it moves. The support portion 380 is disposed below the guide rail 390. The support portion 380 supports the rail 390 and the transfer guide 370 above the rail. Further, a driving unit (not shown) for driving the movable portion 395 may be provided inside the support portion 380. The drive unit includes a cylinder, a motor or the like, and moves the movable portion 395 in one direction approaching the tray 100 as illustrated in FIG. 10 and in another direction away from the tray 100 as illustrated in FIG. Here, when the tray 100 is transferred from the deposition chamber, the transfer guide 371 is located at a first position close to the tray 100. In the case where the redirection is performed (that is, traversed to return the tray 100 toward the loading chamber), the movable portion 395 is driven by the driving unit such that the transfer guide 371 moves in a direction away from the tray 100 to be located at the second Location. After the transfer guide 371 is moved, the tray 100 is lifted and then returned toward the loading chamber. Then, the transfer guide 371 is again moved to the first position.

根據例示性實施例的基板轉移裝置包含:磁性轉移部分,其在托盤下方,所述磁性轉移部分磁性地懸浮並轉移其上安裝基板的托盤;以及導引單元,其在托盤之上並在托盤的側表面上,導引單元導引托盤的移動。因此,由於並未在托盤與磁性轉移部分之間產生摩擦,因此不產生顆粒,且因此不會出現由顆粒引起的產品缺陷且不會出現諸如真空泵的零件的故障。A substrate transfer apparatus according to an exemplary embodiment includes: a magnetic transfer portion below the tray, the magnetic transfer portion magnetically suspending and transferring a tray on which the substrate is mounted; and a guiding unit above the tray and on the tray On the side surface, the guiding unit guides the movement of the tray. Therefore, since friction is not generated between the tray and the magnetic transfer portion, no particles are generated, and thus product defects caused by the particles do not occur and failure of parts such as a vacuum pump does not occur.

在根據例示性實施例的基板轉移裝置中,導引托盤的轉移的轉移導引件的至少一部分可在接近托盤的方向上及在遠離托盤的方向上移動。亦即,當托盤被轉移時,橫移腔室的轉移導引件接近於托盤而安置,且當托盤被返回時,橫移腔室的轉移導引件遠離托盤而安置以允許托盤的位置被容易地移動。因此,當在橫移腔室中移動托盤的位置時,可增加托盤的移動裕度。In the substrate transfer device according to the exemplary embodiment, at least a portion of the transfer guide of the transfer tray may be moved in a direction approaching the tray and in a direction away from the tray. That is, when the tray is transferred, the transfer guide of the traverse chamber is placed close to the tray, and when the tray is returned, the transfer guide of the traverse chamber is placed away from the tray to allow the position of the tray to be Move easily. Therefore, when the position of the tray is moved in the traverse chamber, the movement margin of the tray can be increased.

如上文所描述,已關於上述實施例特定地描述本發明的技術思想,但應注意前述實施例僅經提供用於說明而不限制本發明。可提供各種實施例以允許熟習此項技術者理解本發明的範疇,但本發明不限於此。As described above, the technical idea of the present invention has been specifically described with respect to the above embodiments, but it should be noted that the foregoing embodiments are provided only for the purpose of illustration and not limitation. Various embodiments may be provided to allow those skilled in the art to understand the scope of the invention, but the invention is not limited thereto.

100‧‧‧托盤
110‧‧‧轉移基底
111‧‧‧第一區域
112‧‧‧第二區域
113a‧‧‧水平部分
113b‧‧‧垂直部分
113c‧‧‧垂直部分
114‧‧‧延伸區域
115‧‧‧第七磁體
200‧‧‧磁性轉移單元
210‧‧‧磁性懸浮部分
211‧‧‧第一磁性懸浮部分
211a‧‧‧第一固定構件
211b‧‧‧第一磁體
211c‧‧‧第二磁體
212‧‧‧第二磁性懸浮部分
212a‧‧‧第二固定構件
212b‧‧‧第三磁體
212c‧‧‧第四磁體
213‧‧‧間隙維持構件
214‧‧‧支撐構件
220‧‧‧磁性轉移部分
221‧‧‧磁性旋轉部分
221a‧‧‧旋轉軸
221b‧‧‧第五磁體
222‧‧‧磁性轉移部分
222a‧‧‧第三固定構件
222b‧‧‧第六磁體
223‧‧‧容納構件
300‧‧‧導引單元
310‧‧‧第一導引磁體
311‧‧‧第一板
320‧‧‧第二導引磁體
321‧‧‧第二板
330‧‧‧側板
340‧‧‧第三導引磁體
350‧‧‧第四導引磁體
360‧‧‧第二間隙維持構件
370‧‧‧轉移導引件
371‧‧‧垂直板
371a‧‧‧垂直板
371b‧‧‧水平板
372‧‧‧第八磁體
380‧‧‧支撐部分
390‧‧‧導軌
395‧‧‧可移動部分
100‧‧‧Tray
110‧‧‧Transfer substrate
111‧‧‧First area
112‧‧‧Second area
113a‧‧‧ horizontal section
113b‧‧‧ vertical part
113c‧‧‧ vertical part
114‧‧‧Extended area
115‧‧‧ seventh magnet
200‧‧‧Magnetic transfer unit
210‧‧‧Magnetic suspension
211‧‧‧First magnetic suspension section
211a‧‧‧First fixed component
211b‧‧‧First magnet
211c‧‧‧second magnet
212‧‧‧Second magnetic suspension section
212a‧‧‧Second fixed component
212b‧‧‧third magnet
212c‧‧‧fourth magnet
213‧‧‧Gap maintenance component
214‧‧‧Support members
220‧‧‧Magnetic transfer part
221‧‧‧Magnetic rotating part
221a‧‧‧Rotary axis
221b‧‧‧ fifth magnet
222‧‧‧Magnetic Transfer Section
222a‧‧‧ third fixed member
222b‧‧‧ sixth magnet
223‧‧‧ accommodating components
300‧‧‧Guide unit
310‧‧‧First guiding magnet
311‧‧‧ first board
320‧‧‧Second guiding magnet
321‧‧‧ second board
330‧‧‧ side panels
340‧‧‧ Third Guide Magnet
350‧‧‧4th guiding magnet
360‧‧‧Second gap maintenance member
370‧‧‧Transfer guides
371‧‧‧ vertical board
371a‧‧‧ vertical board
371b‧‧‧ horizontal board
372‧‧‧8th magnet
380‧‧‧Support section
390‧‧‧rails
395‧‧‧ movable part

自結合附圖進行的以下描述可更詳細地理解例示性實施例,其中: 圖1是根據例示性實施例的基板轉移裝置的正視圖。 圖2是說明根據例示性實施例的基板轉移裝置的側視圖。 圖3是說明根據第一例示性實施例的基板轉移裝置的磁性轉移單元的側視圖。 圖4是說明根據第一例示性實施例的基板轉移裝置的磁性轉移部分的示意圖。 圖5是說明根據第二例示性實施例的基板轉移裝置的磁性轉移單元的側視圖。 圖6是說明根據第三例示性實施例的基板轉移裝置的磁性轉移單元的側視圖。 圖7是說明根據例示性實施例的基板轉移裝置的導引單元的側視圖。 圖8是說明根據第四例示性實施例的基板轉移裝置的磁性轉移單元的側視圖。 圖9是說明根據第五例示性實施例的基板轉移裝置的磁性轉移單元的側視圖。 圖10及圖11是說明根據第六例示性實施例的基板轉移裝置的側視圖。The exemplary embodiments may be understood in more detail in the following description in conjunction with the accompanying drawings in which: FIG. 1 is a front elevational view of a substrate transfer apparatus in accordance with an exemplary embodiment. 2 is a side view illustrating a substrate transfer device in accordance with an exemplary embodiment. 3 is a side view illustrating a magnetic transfer unit of a substrate transfer device according to a first exemplary embodiment. 4 is a schematic view illustrating a magnetic transfer portion of a substrate transfer device according to a first exemplary embodiment. FIG. 5 is a side view illustrating a magnetic transfer unit of a substrate transfer device according to a second exemplary embodiment. FIG. 6 is a side view illustrating a magnetic transfer unit of a substrate transfer device according to a third exemplary embodiment. FIG. 7 is a side view illustrating a guiding unit of a substrate transfer device, according to an exemplary embodiment. FIG. 8 is a side view illustrating a magnetic transfer unit of a substrate transfer device according to a fourth exemplary embodiment. 9 is a side view illustrating a magnetic transfer unit of a substrate transfer device according to a fifth exemplary embodiment. 10 and 11 are side views illustrating a substrate transfer device according to a sixth exemplary embodiment.

100‧‧‧托盤 100‧‧‧Tray

110‧‧‧轉移基底 110‧‧‧Transfer substrate

111‧‧‧第一區域 111‧‧‧First area

114‧‧‧延伸區域 114‧‧‧Extended area

115‧‧‧第七磁體 115‧‧‧ seventh magnet

211‧‧‧第一磁性懸浮部分 211‧‧‧First magnetic suspension section

211a‧‧‧第一固定構件 211a‧‧‧First fixed component

211b‧‧‧第一磁體 211b‧‧‧First magnet

212‧‧‧第二磁性懸浮部分 212‧‧‧Second magnetic suspension section

212a‧‧‧第二固定構件 212a‧‧‧Second fixed component

212b‧‧‧第三磁體 212b‧‧‧third magnet

213‧‧‧間隙維持構件 213‧‧‧Gap maintenance component

221‧‧‧磁性旋轉部分 221‧‧‧Magnetic rotating part

221a‧‧‧旋轉軸 221a‧‧‧Rotary axis

221b‧‧‧第五磁體 221b‧‧‧ fifth magnet

222‧‧‧磁性轉移部分 222‧‧‧Magnetic Transfer Section

223‧‧‧容納構件 223‧‧‧ accommodating components

370‧‧‧轉移導引件 370‧‧‧Transfer guides

371‧‧‧垂直板 371‧‧‧ vertical board

372‧‧‧第八磁體 372‧‧‧8th magnet

Claims (15)

一種基板轉移裝置,包括: 托盤,基板安裝在所述托盤上; 磁性轉移單元,其安置在所述托盤下方,並經組態以磁性地使所述托盤懸浮並藉由磁力轉移所述托盤;以及 導引單元,其經組態以導引所述托盤的所述轉移而不接觸所述托盤。A substrate transfer device comprising: a tray on which a substrate is mounted; a magnetic transfer unit disposed under the tray and configured to magnetically suspend the tray and transfer the tray by magnetic force; And a guiding unit configured to direct the transfer of the tray without contacting the tray. 如申請專利範圍第1項所述的基板轉移裝置,其進一步包括轉移基底,所述轉移基底包含經提供以接觸所述托盤的下部側面的接觸區域,以及自所述接觸區域的兩側向下延伸的延伸區域。The substrate transfer device of claim 1, further comprising a transfer substrate comprising a contact region provided to contact a lower side of the tray, and downward from both sides of the contact region Extended extension area. 如申請專利範圍第2項所述的基板轉移裝置,其中所述磁性轉移單元包括: 磁性懸浮部分,其安置於所述轉移基底的一個區域上以磁性地使所述托盤懸浮;以及 磁性轉移部分,其安置在所述磁性懸浮部分下方以在一個方向上轉移藉由磁力懸浮的所述托盤。The substrate transfer device of claim 2, wherein the magnetic transfer unit comprises: a magnetic suspension portion disposed on a region of the transfer substrate to magnetically suspend the tray; and a magnetic transfer portion It is placed below the magnetic suspension portion to transfer the tray suspended by magnetic force in one direction. 如申請專利範圍第3項所述的基板轉移裝置,其中所述磁性懸浮部分包括: 第一磁性懸浮部分,其經組態以接觸所述轉移基底,並包括至少一個磁體;以及 第二磁性懸浮部分,其與所述第一磁性懸浮部分隔開,並包含將被施加來自所述第一磁性懸浮部分的吸力及斥力中的至少任一者的至少一個磁體。The substrate transfer device of claim 3, wherein the magnetic suspension portion comprises: a first magnetic suspension portion configured to contact the transfer substrate and including at least one magnet; and a second magnetic suspension a portion that is spaced apart from the first magnetically suspended portion and that includes at least one magnet that is to be applied with at least one of a suction force and a repulsive force from the first magnetically suspended portion. 如申請專利範圍第4項所述的基板轉移裝置,其中所述磁性轉移部分包括: 旋轉軸; 磁性旋轉部分,其包含經安置以環繞所述旋轉軸的多個磁體;以及 磁性轉移部分,其與所述磁性旋轉部分隔開,並包含多個磁體。The substrate transfer device of claim 4, wherein the magnetic transfer portion comprises: a rotating shaft; a magnetic rotating portion including a plurality of magnets disposed to surround the rotating shaft; and a magnetic transfer portion It is spaced apart from the magnetic rotating portion and includes a plurality of magnets. 如申請專利範圍第5項所述的基板轉移裝置,其進一步包括經組態以在內部容納所述磁性旋轉部分的容納部分,其中所述容納部分的上部部分接觸所述第二磁性懸浮部分。The substrate transfer device of claim 5, further comprising a receiving portion configured to accommodate the magnetic rotating portion therein, wherein an upper portion of the receiving portion contacts the second magnetic floating portion. 如申請專利範圍第6項所述的基板轉移裝置,其中所述磁性轉移部分的所述多個磁體設在所述轉移基底的所述延伸區域的至少一個區域上,所述一個區域面對所述磁性旋轉部分。The substrate transfer device of claim 6, wherein the plurality of magnets of the magnetic transfer portion are provided on at least one region of the extended region of the transfer substrate, the one region facing the The magnetic rotating part is described. 如申請專利範圍第7項所述的基板轉移裝置,其中 所述磁性旋轉部分的所述多個磁體經提供以使得具有彼此不同極性的所述磁體被交替地安置以便以預定角度環繞所述旋轉軸,且 所述磁性轉移部分的所述多個磁體經提供以使得具有彼此不同極性的所述磁體被交替地安置以便具有與所述磁性旋轉部分的角度相同的角度。The substrate transfer device of claim 7, wherein the plurality of magnets of the magnetic rotating portion are provided such that the magnets having different polarities from each other are alternately disposed to surround the rotation at a predetermined angle a shaft, and the plurality of magnets of the magnetic transfer portion are provided such that the magnets having different polarities from each other are alternately disposed so as to have the same angle as the angle of the magnetic rotating portion. 如申請專利範圍第2項所述的基板轉移裝置,其中所述導引單元包括: 第一導引磁體,其耦接至所述托盤的上部部分;以及 第二導引磁體,其設在腔室的上壁上以與所述第一導引磁體隔開預定距離, 其中所述第一導引磁體及所述第二導引磁體被施加吸力或斥力中的至少任一者。The substrate transfer device of claim 2, wherein the guiding unit comprises: a first guiding magnet coupled to an upper portion of the tray; and a second guiding magnet disposed in the cavity The upper wall of the chamber is spaced apart from the first guiding magnet by a predetermined distance, wherein the first guiding magnet and the second guiding magnet are applied with at least one of suction or repulsive force. 如申請專利範圍第9項所述的基板轉移裝置,其中所述導引單元進一步包括設在所述托盤與所述腔室的內壁之間的轉移導引件。The substrate transfer device of claim 9, wherein the guiding unit further comprises a transfer guide disposed between the tray and an inner wall of the chamber. 如申請專利範圍第10項所述的基板轉移裝置,其中所述轉移導引件設在所述延伸區域與所述腔室的所述內壁之間。The substrate transfer device of claim 10, wherein the transfer guide is disposed between the extended region and the inner wall of the chamber. 如申請專利範圍第11項所述的基板轉移裝置,其進一步包括設在所述磁性轉移單元與所述導引單元之間的至少一個區域上的間隙維持構件。The substrate transfer device of claim 11, further comprising a gap maintaining member provided on at least one region between the magnetic transfer unit and the guiding unit. 如申請專利範圍第12項所述的基板轉移裝置,其中所述間隙維持構件設在所述延伸區域與所述磁性懸浮部分之間的區域或所述延伸區域與所述轉移導引件之間的區域中的至少一者上。The substrate transfer device of claim 12, wherein the gap maintaining member is disposed between a region between the extended region and the magnetic suspension portion or between the extended region and the transfer guide At least one of the areas. 如申請專利範圍第11項所述的基板轉移裝置,其中所述轉移導引件的至少一部分在接近所述托盤的方向上及在遠離所述托盤的方向上移動。The substrate transfer device of claim 11, wherein at least a portion of the transfer guide moves in a direction approaching the tray and in a direction away from the tray. 如申請專利範圍第14項所述的基板轉移裝置,其中 當所述托盤被轉移時,設在橫移腔室中的所述轉移導引件位於鄰近於所述托盤的第一位置處,且 當所述托盤被返回時,所述轉移導引件位於遠離所述托盤的第二位置處。The substrate transfer device of claim 14, wherein the transfer guide disposed in the traverse chamber is located at a first position adjacent to the tray when the tray is transferred, and The transfer guide is located at a second position away from the tray when the tray is returned.
TW104139527A 2014-11-27 2015-11-27 Substrate transfer apparatus TWI575643B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1020140167325 2014-11-27
KR1020150131585A KR20160063969A (en) 2014-11-27 2015-09-17 Apparatus for transferring substrate

Publications (2)

Publication Number Publication Date
TW201631690A true TW201631690A (en) 2016-09-01
TWI575643B TWI575643B (en) 2017-03-21

Family

ID=56193018

Family Applications (1)

Application Number Title Priority Date Filing Date
TW104139527A TWI575643B (en) 2014-11-27 2015-11-27 Substrate transfer apparatus

Country Status (3)

Country Link
KR (1) KR20160063969A (en)
CN (1) CN105993068B (en)
TW (1) TWI575643B (en)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102359244B1 (en) 2016-11-21 2022-02-08 한국알박(주) Film Deposition Method
CN109484794A (en) * 2017-09-13 2019-03-19 京东方科技集团股份有限公司 A kind of base plate transfer device
CN107808835B (en) * 2017-10-20 2020-07-10 深圳市华星光电技术有限公司 Magnetic conduction plate and device transfer device
CN107783331B (en) * 2017-10-20 2020-12-04 深圳市华星光电技术有限公司 Device transfer apparatus, method of transferring device, and device transfer board
KR20190058443A (en) * 2017-10-27 2019-05-29 어플라이드 머티어리얼스, 인코포레이티드 Apparatus for non-contact delivery of a carrier in a deposition system, system for non-contact delivery of a carrier, carrier for non-contact delivery in a deposition system, and method for contactless transfer of a carrier in a deposition system
KR102213655B1 (en) * 2017-12-28 2021-02-08 (주)가온솔루션 Magnetic levitation transportation apparatus
KR101958411B1 (en) 2018-08-28 2019-03-14 한국알박(주) Film Deposition Apparatus and Method
CN109019028A (en) * 2018-09-10 2018-12-18 京东方科技集团股份有限公司 Base plate transmission device
CN218069804U (en) * 2019-05-13 2022-12-16 应用材料公司 Magnetic levitation system for transporting a carrier, base structure therefor and vacuum deposition system
KR102232179B1 (en) * 2020-12-23 2021-03-26 (주)가온솔루션 Magnetic levitation transportation apparatus
CN113098330B (en) * 2021-05-21 2022-06-07 上海隐冠半导体技术有限公司 Displacement device

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3919464B2 (en) * 2001-04-27 2007-05-23 東京エレクトロン株式会社 Conveying device, cleaning device and developing device
JP2003168716A (en) * 2001-12-03 2003-06-13 Dia Shinku Kk Component transport and component storage device using it
JP4471708B2 (en) * 2004-03-31 2010-06-02 キヤノンアネルバ株式会社 Substrate transfer device
KR100707390B1 (en) * 2005-12-19 2007-04-13 주식회사 아바코 Apparatus for carring glass
KR20080046761A (en) * 2006-11-23 2008-05-28 엘지디스플레이 주식회사 Apparatus for transferring substrate and apparatus for manufacturing thin film having the same
KR101409524B1 (en) * 2007-05-28 2014-06-20 엘지디스플레이 주식회사 Apparatus for transferring substrates
KR100880877B1 (en) * 2007-11-02 2009-01-30 한국기계연구원 Maglev-type substrate transfer apparatus
JP2011047515A (en) * 2009-07-28 2011-03-10 Canon Anelva Corp Driving device and vacuum processing apparatus
KR101271112B1 (en) * 2011-02-01 2013-06-04 (주)이루자 Vaccum processing apparatus

Also Published As

Publication number Publication date
KR20160063969A (en) 2016-06-07
TWI575643B (en) 2017-03-21
CN105993068A (en) 2016-10-05
CN105993068B (en) 2019-05-31

Similar Documents

Publication Publication Date Title
TWI575643B (en) Substrate transfer apparatus
KR101848849B1 (en) Apparatus for transferring substrate
TWI552254B (en) Magnetically levitated transportation apparatus
KR101386685B1 (en) Apparatus for processing substrate
TWI635192B (en) Apparatus and method for transportation of a carrier or a substrate
JP6092349B2 (en) Substrate transfer device
KR101854034B1 (en) Contactless driving module and transfer apparatus having the same
KR100707390B1 (en) Apparatus for carring glass
KR102107973B1 (en) Apparatus and system for processing a substrate in a vacuum chamber, and method of aligning a substrate carrier with respect to a mask carrier
CN102849462B (en) Device used for conveying substrate
KR20130128117A (en) Non-contact magnetic levitation stage for substrate transfer
CN107062828B (en) Vacuum drying device
KR101353527B1 (en) Apparatus for transferring substrate
KR101318173B1 (en) Apparatus for transferring substrates
KR101708710B1 (en) Apparatus for transferring substrate
KR20120016835A (en) Non-rail and non-contact moving system using magnet
JP2009290038A (en) Chuck opening/closing mechanism using magnetic force
JP4116167B2 (en) Static pressure air bearing linear guide device
KR101767667B1 (en) Apparatus for transferring substrate and the method for transferring substrate using it
KR101688199B1 (en) Substrate tray handling apparatus and deposition apparatus comprising the same, and substrate tray handling method
KR20150124379A (en) Method and apparatus of transporting brittle material substrate
KR102001970B1 (en) Apparatus for transferring substrate by a non-contact
KR101226473B1 (en) Method for transferring carrier and vacuum processing apparatus using thereof
KR20220123048A (en) A carrier transport system, a carrier for a substrate, a vacuum processing apparatus, and a method of transporting a carrier in a vacuum chamber
JP6119660B2 (en) Transport device