KR20080046761A - Apparatus for transferring substrate and apparatus for manufacturing thin film having the same - Google Patents

Abstract

A substrate transfer apparatus and a thin film forming apparatus having the same are provided to transfer a substrate with the tray member which is in magnetic levitation, thereby avoiding generation of particles while minimizing deformation of a substrate. A substrate transfer apparatus comprises a tray member and a guide rail. The tray member comprises a tray part(110) for mounting a substrate(130), and a floating part(120) having first and second floating faces formed by extending one end of the tray part and that are symmetrically inclined to each other around a central shaft of the one end of the tray part. The guide rail is disposed on a moving passage of the tray member, comprising first and second guide rails(210,220) having first and second inclined faces that face the first and second floating faces in parallel to make the tray member float.

Description

Substrate transport apparatus and thin film forming apparatus having the same {APPARATUS FOR TRANSFERRING SUBSTRATE AND APPARATUS FOR MANUFACTURING THIN FILM HAVING THE SAME}

1A is a perspective view of a substrate transfer apparatus according to a first embodiment of the present invention.

1B is a cross-sectional view of the substrate transfer apparatus according to the first embodiment of the present invention.

2A is a perspective view of a substrate transfer apparatus according to a second embodiment of the present invention.

2B is a cross-sectional view of the substrate transfer apparatus according to the second embodiment of the present invention.

3 is a perspective view of a tray member according to a third embodiment of the present invention.

4 is a cross-sectional view of a thin film forming apparatus according to a fourth embodiment of the present invention.

FIG. 5 is an enlarged cross-sectional view of a processing chamber of the thin film forming apparatus illustrated in FIG. 4.

 (Explanation of symbols for the main parts of the drawing)

 110, 120: tray member 110: tray portion

 120: floating portion 122: first magnetic member

 140: heat conduction preventing member 210, 220: guide rail

 210: first guide rail 220: second guide rail

 222: second magnetic member 310, 320: transfer unit

 310: magnetic rail portion 320: coil portion

 330, 340, 350: flow preventing unit 330: third magnetic member

 340: accommodating part 350: fourth magnetic member

 400: sputtering unit 410: loading chamber

 420: buffer chamber 430: processing chamber

 440: rotating chamber

The present invention relates to a substrate transfer apparatus and a thin film forming apparatus having the same, and more particularly, to a non-contact substrate transfer apparatus and a thin film forming apparatus having the same.

A sputtering apparatus is an apparatus for depositing a target material on a substrate by accelerating ions by plasma to cause ions to collide with a target. Such sputtering apparatuses are widely used in semiconductor device production and display device manufacturing because they can form a thin film in a short time with a relatively simple structure.

The sputtering apparatus includes a plurality of chambers. For example, the chamber may include a loading chamber, a buffer chamber, a deposition chamber, a rotating chamber, and the like. Here, according to the arrangement of the chambers constituting the sputtering apparatus, it is classified into a cluster type and an in-line type.

Today, as the size of the substrate becomes larger, the sputtering device has an increasing demand for an inline type that is less bounded by the installation place than the cluster type.

In-line sputtering apparatus has chambers arranged in a row. At this time, the in-line sputtering device moves the substrate to each chamber by transferring the carrier on which the substrate is mounted in a roller manner.

At this time, as the carrier is transported in contact with the roller, the carrier and the roller rub against each other, whereby particles are generated between the carrier and the roller. Such particles create process failures and ultimately reduce production yields. This is because the particles contaminate the substrate and the thin film is formed on the contaminated substrate, thereby deteriorating the characteristics of the thin film. In addition, particles can contaminate the interior of the chamber causing failure of the chamber.

An object of the present invention is to provide a substrate transfer apparatus that can prevent the generation of particles during the transfer of the substrate.

Still another object of the present invention is to provide a thin film forming apparatus including the substrate transfer apparatus.

In order to achieve the above technical problem, an aspect of the present invention provides a substrate transfer device. The substrate transfer apparatus includes a tray on which a substrate is mounted, a tray member having a floating portion having a floating surface formed by extending one end of the tray portion, and an inclined surface disposed in a moving path of the tray member and spaced apart in parallel with the floating surface. And a guide rail for floating the member.

Another aspect of the present invention to achieve the above technical problem provides a thin film forming apparatus. The thin film forming apparatus includes a loading chamber into which a substrate is loaded, a buffer chamber connected to a loading chamber and buffering an environmental atmosphere, a processing chamber connected to a buffer chamber to form a thin film on the substrate, a rotating chamber connected to the processing chamber and rotating the substrate, and loading A guide rail having an inclined surface inclined at an angle with respect to the ground, and a floating surface which is lifted from the guide rail and faces parallel to the inclined surface. And a tray member having a floating portion to be provided and a tray portion connected to the floating portion and to which a substrate for depositing the material to be deposited is mounted.

Hereinafter, with reference to the drawings of the substrate transfer apparatus and the thin film forming apparatus according to the present invention will be described in detail. The following embodiments are provided as examples to sufficiently convey the spirit of the present invention to those skilled in the art. Accordingly, the invention is not limited to the embodiments described below and may be embodied in other forms. In the drawings, the size and thickness of the device may be exaggerated for convenience. Like numbers refer to like elements throughout.

Example  One

1A and 1B are a perspective view and a cross-sectional view of a substrate transfer apparatus according to a first embodiment of the present invention.

1A and 1B, the substrate transfer apparatus includes tray members 110 and 120 and guide rails 210 and 220.

The tray members 110 and 120 include a tray part 110 on which the substrate 130 is mounted and a floating part 120 disposed at one end of the tray part 110.

The tray unit 110 includes an opening 112 formed through a portion of the tray unit 110 to reduce the weight of the tray members 110 and 120. In the drawing, one opening 112 is formed in the center portion of the tray 110, but is not limited thereto. A plurality of openings may be formed in the tray 110. This is because when the tray members 110 and 120 are heavy, it is difficult to float in the air.

The tray unit 110 further includes at least two fixing members 111 for fixing the substrate 130. In this case, the fixing members 111 are disposed on the tray part 110 to fix the substrate 130 on the tray part 110. For example, the fixing members 111 may be clamps. As a result, when the tray members 110 and 120 are moved, the substrate 130 may be prevented from being separated from the tray 110.

The tray unit 110 must be made of a light material in order to float in the air. For example, titanium, aluminum, ceramics, engineering plastics, etc. are mentioned as a raw material of the tray part 110. FIG.

The floating part 120 is disposed at one end of the tray part 110 to float the tray members 110 and 120. The floating part 120 includes floating surfaces 121a and 121b formed by extending one end of the tray part 110. The floating surfaces 121a and 121b may include first and second floating surfaces 121a and 121b inclined at an angle.

In addition, the first and second floating surfaces 121a and 121b are symmetrically disposed with respect to the central axis of the end of the tray 110. As a result, the tray 110 may be stably supported in the vertical direction, thereby forming a uniform thin film on the substrate 130 mounted on the tray 110. For example, the cross-sectional shape of the floating part 120 may be formed in a triangle, a ladder, a pentagon, a hexagon, and the like.

The floating part 120 includes first magnetic members 122 disposed on the floating surfaces 121a and 121b, respectively. The first magnetic members 122 may be permanent magnets or electromagnets. The first magnetic members 122 may be embedded in the floating part 120 or attached by an adhesive member. In addition, the first magnetic members 122 may be arranged in a linear or dotted line along the end of the tray.

The guide rail 210 is disposed in the movement path of the tray members 110 and 120. The guide rail 210 includes inclined surfaces 211a and 211b spaced apart in parallel with the floating surfaces 121a and 121b, respectively. That is, the first and second floating surfaces 121a and 121b and the first and second inclined surfaces 211a and 211b are spaced apart from each other in parallel.

Second magnetic members 222 having polarities different from those of the first magnetic members 122 are disposed on the first and second inclined surfaces 211a and 211b. Thus, due to the repulsive force between the first magnetic member 122 and the second magnetic member 222, the floating part 120 is lifted from the guide rail 210. Thus, the tray members 110 and 120 and the guide rail 210 do not contact each other.

In addition, when the tray members 110 and 120 are provided at the inlet of the guide rail 210, the tray members 110 and 120 are inserted without being in contact with the guide rail 210. This is because the floating surfaces 121a and 121b are inclined at a predetermined angle symmetrically with each other, so that the repulsive force between the first magnetic members 122 and the second magnetic members 222 is uniform to the floating surfaces 121a and 121b, respectively. Because it works.

In addition, the magnetic levitation force between the tray members 110 and 120 and the guide rail 210 is weak, so that the first and second inclined surfaces 211a and 211b may be separated even if the tray member 110 is separated from the guide rail 210. These may support the injured portion 120.

The substrate transfer apparatus further includes transfer units 310 and 320 for moving the tray members 110 and 120.

The transfer units 310 and 320 include a magnetic rail portion 310 disposed on the end of the floating portion 120 and a coil portion 320 spaced in parallel with the magnetic rail portion 310.

In the magnetic rail 310, magnetic members having different polarities are alternately arranged.

The coil unit 320 generates an electric field inverted from the magnetic rail unit 310 to transfer the tray members 110 and 120 on which the magnetic rail unit 310 is formed. The coil part 320 has the same directionality as the guide rail 210 provided in the moving direction of the tray member.

Therefore, as in the above-described embodiment of the present invention, the tray member is magnetically inflated from the guide rail, thereby improving the problem that conventional particles are formed as the tray member is transported without being in contact with other transport means. Can be.

In addition, since the substrate is transported in a state seated on the tray member, deformation of the substrate can be minimized even if the size of the substrate is increased.

Example  2

2A and 2B are a perspective view and a cross-sectional view of a substrate transfer apparatus according to a second embodiment of the present invention.

The substrate transfer apparatus according to the second embodiment of the present invention has the same configuration as the substrate transfer apparatus of the first embodiment described above except for the flow preventing unit. Therefore, in the second embodiment of the present invention, duplicate descriptions of the same components will be omitted, and the same names and reference numerals will be given to the same components.

The substrate transfer apparatus includes tray members 110 and 120, guide rails 210 and 220, transfer units 310 and 320, and flow prevention units 330, 340 and 350.

The tray members 110 and 120 include a tray part 110 on which the substrate 130 is mounted and a floating part 120 disposed on one side of the tray part 110 to float the tray members 110 and 120. The tray unit 110 includes a mounting surface 110a on which the substrate 130 is mounted and a rear surface 110b facing the mounting surface 110a. The floating part 120 has floating surfaces in which the mounting surface 110a and the rear surface 110b are respectively extended to both sides.

The flow preventing units 330, 340, and 350 are disposed at the other side of the tray part 120 facing one side of the tray part 110 connected to the floating part 120. As a result, the flow preventing units 330, 340, and 350 may have the tray members 110 when the tray members 110 and 120 are transferred or when a thin film is formed on the substrate 130 mounted on the tray members 110 and 120. 120) to prevent shaking.

The flow preventing unit 330, 340, 350 includes third magnetic members 330 and fourth magnetic members 350 spaced apart from each other to correspond to each other. The third magnetic members 330 are disposed to correspond to each other on the mounting surface 110a and the rear surface 110b of the tray 110. In this case, the third magnetic members 330 may be embedded in the tray 110. Alternatively, unlike the drawing, the third magnetic member 330 may be disposed on the tray 110 using a separate adhesive member.

The fourth magnetic members 350 face each other in parallel with the third magnetic members 330. In this case, the fourth magnetic members 350 may have the same polarity or different polarities as those of the third magnetic members 330. Therefore, the tray members 110 and 120 are fixed by the attraction force or the repulsive force between the third and fourth magnetic members 330 and 350.

The flow preventing unit 330, 340, 350 may further include an accommodating part 340 for accommodating and supporting the fourth magnetic member 350. The accommodating part 340 may embed the fourth magnetic members 350 or fix the fourth magnetic members 350 to the accommodating part 340 by using an adhesive member. In addition, the accommodating part 340 may be disposed to correspond to the guide rail 210 to prevent the tray members 110 and 120 from being shaken during transportation.

In addition, in the embodiment of the present invention, the shape of the third and fourth magnetic members 330 and 350 is not limited. For example, the third and fourth magnetic members 330 and 350 may have a cross-sectional shape such as a rectangle, a rectangle, a circle, a straight line, and a dotted line.

In the above-described embodiment of the present invention, the substrate transfer device may further include a flow preventing unit to prevent shaking when the tray member is transferred, thereby forming a uniform thin film.

Example  3

3 is a perspective view of a tray member according to a third embodiment of the present invention.

The substrate transfer apparatus according to the third embodiment of the present invention has the same configuration as the substrate transfer apparatus of the second embodiment described above except for the heat conduction preventing member. Therefore, in the second embodiment of the present invention, duplicate descriptions of the same components will be omitted, and the same names and reference numerals will be given to the same components.

The substrate transfer apparatus includes tray members 110 and 120, guide rails 210 and 220, transfer units 310 and 320, flow preventing units 330, 340 and 350, and a heat conduction preventing member 140.

The tray members 110 and 120 include a tray part 110 on which the substrate 130 is mounted, and a floating part 120 disposed on one side of the tray part 110 to float the tray member 110.

The heat conduction preventing member 140 is disposed between the tray part 110 and the floating part 120 to prevent heat from being transferred from the tray part 110 to the floating part 120. This is because the magnetic members decrease in magnetic force as the temperature increases. That is, when the thin film is formed by the substrate 130 mounted on the tray 110, heat is applied to the tray 110. In this case, when the heat of the tray 110 is conducted to the floating part 120, the magnetic force of the first magnetic members 222 disposed on the floating part 120 may be weakened.

The heat conduction preventing member 140 may include a first fastening part 140a to be fastened to the tray part 110. The first fastening part 140a may be a recessed part or a convex part. In this case, the tray part 110 may also include a second fastening part 150 corresponding to the first fastening part 140a. For example, when the first fastening part 140a is a recessed part, the second fastening part 150 may be formed as a convex part. On the other hand, when the first fastening portion 140a is a convex portion, the second fastening portion 150 may be formed as a recessed portion. Therefore, the heat conduction preventing member 140 and the tray part 110 are assembled by combining the first fastening part 140a and the second fastening part 150.

The heat conduction preventing member 140 may be further formed between the tray part 110 and the third magnetic member 330 to prevent the third magnetic members 330 from being reduced in magnetic force by heat.

In the above-described embodiment of the present invention, the substrate transfer device may further include a heat conduction preventing unit, thereby preventing the magnetic levitation force of the tray member from being weakened by the heat generated when the thin film is formed.

Example  4

4 is a cross-sectional view of a thin film forming apparatus according to a fourth embodiment of the present invention.

The thin film forming apparatus according to the fourth embodiment of the present invention includes the substrate transfer apparatus of the third embodiment described above. Therefore, in the fourth embodiment of the present invention, duplicate descriptions of the same elements will be omitted, and the same names and reference numerals will be given to the same elements.

Referring to FIG. 4, the thin film forming apparatus includes a loading chamber 410, a buffer chamber 420, a processing chamber 430, a rotation chamber 440, and a substrate transfer device arranged in line with each other.

The substrate transfer apparatus magnetically floats the substrate 130 and transfers the same to the chambers 410, 420, 430, and 440. At this time, the substrate 130 is transferred in a vertical state.

The substrate transfer apparatus includes a tray member (110, 120) on which the substrate 130 is mounted, a guide rail (210a, 210b) for floating the tray members (110, 120), and a transfer unit for transferring the tray members (110, 120) ( 300).

The guide rails 210a and 210b are installed in a path through which the substrate 130 is transferred. That is, the guide rails 210a and 210b extend in the loading chamber 410, the buffer chamber 420, the processing chamber 430, and the rotation chamber 440. Here, the guide rails 210a and 210b are spaced apart from the first guide rail 210a and the first guide rail 210a having the first inclined surface 211a inclined at an angle with respect to the ground, and the first inclined surface ( And a second guide rail 210b having a second inclined surface 211b symmetric with 211a. In addition, the tray members 110 and 120 include a floating part 120 and a tray part 110 connected to the floating part 120 and on which the substrate 130 is mounted. In this case, the floating part 120 includes first and second floating surfaces 121a and 121b facing in parallel with the first and second inclined surfaces 211a and 211b, respectively.

Therefore, the tray members 110 and 120 float between the first and second guide rails 210a and 210b and are transported in a predetermined direction. Here, the tray members 110 and 120 are transported without being in contact with a separate transport means, so that particles are not formed. Therefore, when the thin film is formed on the substrate 130, the thin film characteristics may be prevented from being degraded by the particles.

In order to form a thin film, the substrate transfer apparatus transfers the substrate 130 to the loading chamber 410 from the outside. In this case, the substrate 130 is mounted on the tray 120 of the tray members 110 and 120 and is transported.

Subsequently, the substrate transfer apparatus transfers the substrate 130 from the loading chamber 410 to the buffer chamber 420. The buffer chamber 420 buffers environmental changes between the loading chamber 410 and the processing chamber 430. For example, environmental changes include vacuum degree, temperature, and gas atmosphere.

FIG. 5 is an enlarged cross-sectional view of a processing chamber of the thin film forming apparatus illustrated in FIG. 4.

Subsequently, referring to FIG. 5, the substrate transfer apparatus transfers the substrate 130 from the buffer chamber 420 to the processing chamber 430. The processing chamber 430 forms a thin film on the substrate 130. For example, the processing chamber 430 includes a sputtering portion 440 for depositing a material to be deposited.

The sputtering unit 440 includes a cathode 446 to which a negative voltage is supplied through the power supply units 361 and 363, and a target provided on the front surface of the cathode 446 to release a substance to be deposited by collision with a cation of gas plasma. 444 and a magnet 447 provided at the rear of the cathode 446 to form a magnetic field around the target 444 to generate more cations. Here, the target 444 is disposed inside the chamber 400 perpendicular to the ground. That is, the substrate 130 is disposed to face the target 444 to deposit a deposition material to be emitted from the target 444. Thus, a thin film is formed on the substrate 130.

Again, referring to FIG. 4, the substrate transfer apparatus transfers the rotating chamber 440 to rotate the substrate 130. The rotation chamber 440 rotates the substrate 130.

Subsequently, the substrate transfer apparatus transfers the substrate 130 to the processing chamber 430, the buffer chamber 420, and the loading chamber 410 and releases the substrate 130 to the outside.

In addition, the thin film forming apparatus further includes a gate 450 disposed between the chambers. The gate 450 may be opened or closed when the tray members 110 and 120 are transferred.

Therefore, as in the above-described embodiment of the present invention, as the substrate 130 is magnetically floated and transferred, particles generated by friction between the transfer units are not formed so as not to contaminate the substrate 130 and the inside of the chamber.

As described above, the substrate transfer apparatus according to the present invention does not form particles as the substrate is magnetically floated and transported, thereby improving production efficiency.

In addition, it is advantageous to transfer a large substrate as the substrate is transported in a seated state on the tray member.

In addition, the floating portion of the tray member has a floating surface that is inclined at a predetermined angle with respect to the ground, so that contact between the tray member and the guide rail can be avoided.

In addition, the substrate transfer device can maintain the balance of the tray member by further installing the flow preventing unit.

In addition, the substrate transfer device can further prevent the magnetic levitation force from being lowered due to heat as the tray member further includes a heat conduction preventing member.

In addition, the thin film forming apparatus including the substrate transfer apparatus described above can minimize process defects caused by particles and improve production efficiency.

Although described above with reference to embodiments of the present invention, those skilled in the art can variously modify and change the present invention without departing from the spirit and scope of the invention described in the claims below. You will understand.

Claims (17)

A tray member having a tray portion on which a substrate is mounted and a floating portion having a floating surface formed by extending one end of the tray portion; And And a guide rail disposed on a movement path of the tray member and having an inclined surface spaced in parallel with the floating surface to float the tray member. The method of claim 1, And the floating surface includes first and second floating surfaces inclined symmetrically with respect to the center axis of the tray end. The method of claim 1, And the guide rail includes first and second guide rails each having first and second inclined surfaces facing in parallel with the first and second floating surfaces, respectively. The method of claim 1, The cross section of the floating portion has a substrate transfer apparatus, characterized in that any one of the shape of a triangle, ladder, pentagon, hexagon. The method of claim 1, And the floating portion includes first magnetic members disposed on the floating surfaces, respectively. The method of claim 5, wherein And the guide rail includes second magnetic members facing each of the first magnetic members and having the same polarity as the first magnetic members. The method of claim 1, And a transfer unit disposed at an end of the floating portion to transfer the tray member. The method of claim 7, wherein The transfer unit A magnetic rail portion disposed on an end portion of the floating portion and having magnetic members having different polarities alternately arranged; And And a coil part disposed in parallel with the magnetic rail part to generate an electric field inverted with the magnetic rail part. The method of claim 1, And a flow preventing unit disposed on the other side of the tray part facing in parallel with one side of the tray part connected to the floating part to prevent shaking of the tray member. The method of claim 9, The flow preventing unit A third magnetic member disposed at an end of the other side of the tray; And And a fourth magnetic member disposed on both sides of the third magnetic member, respectively. The method of claim 1, The tray member further comprises a heat conduction preventing member disposed between the tray portion and the floating portion to prevent heat from being transferred from the tray portion to the floating portion. The method of claim 11, The heat conduction preventing member further comprises a first fastening part for fastening with the tray part, wherein the tray part further comprises a second fastening part coupled with the first fastening part. The method of claim 12, And said first fastening portion has a form of recessed portion, and said second fastening portion has a form of convex portion. The method of claim 12, And said first fastening portion has a form of a convex portion, and said second fastening portion has a form of concave portion. The method of claim 1, The tray member is a substrate transfer device, characterized in that made of at least one material selected from the group consisting of titanium, aluminum, ceramic and engineering plastics. The method of claim 1, And the tray part has an opening through which a portion thereof is formed. A loading chamber into which the substrate is loaded; A buffer chamber connected to the loading chamber and buffering an environmental atmosphere; A processing chamber connected to the buffer chamber and forming a thin film on the substrate; A rotating chamber connected to the processing chamber and rotating the substrate; And A guide rail which is formed to extend in the loading chamber, the buffer chamber, the processing chamber, and the rotation chamber, the guide rail having an inclined surface inclined at an angle with respect to the ground, and the injured and transported in parallel with the inclined surface. And a tray member having a floating portion having faces and a tray portion connected to the floating portion and mounting a substrate for depositing the material to be deposited.

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