TW201620067A - Substrate processing apparatus and substrate processing method - Google Patents

Abstract

A substrate processing apparatus comprises a first treatment device for performing a first treatment on a sheet-like substrate conveyed in the long belt direction; a second treatment device disposed, staggered with respect to the first treatment device, in a direction intersecting the conveying direction of the sheet-like substrate and configured to perform a second treatment on the sheet-like substrate; a third treatment device, which is provided with a carrying-discharge unit allowing two rows of sheet-like substrates to pass through together in a way of being spaced apart, and to perform a third treatment on the sheet-like substrate after the first treatment, or the sheet-like substrate after the second treatment; and a conveying device comprising: a first conveying unit to convey the sheet-like substrate in the long belt direction after the sheet-like substrate passes the first treatment device and moves toward the third treatment device; a second conveying unit to convey the sheet-like substrate in the long belt direction after the sheet-like substrate passes the third treatment device and moves toward the second treatment device; and a third conveying unit to convey the sheet-like substrate in the long belt direction after the sheet-like substrate passes the second treatment device and moves toward the third treatment device.

Description

Substrate processing apparatus and substrate processing method

The present invention relates to a substrate processing apparatus. The present application claims priority from U.S. Provisional Application No. 61/322,347, filed on Apr. 9, 2010, and U.S. Provisional Application No. 61/322,417, filed on Apr.

Examples of the display element constituting the display device such as a display device include a liquid crystal display element, an organic electroluminescence (organic EL) element, an electrophoresis element for electronic paper, and the like. At present, these display elements are active display elements on which respective display elements are formed after forming a switching element called a thin film transistor (TFT) or an amplifying element or a current driving element on the surface of the substrate. (Active display device) is becoming mainstream.

In recent years, a technique of forming a display element on a sheet-like substrate (for example, a film member or the like) has been proposed. As such a technique, for example, a roll to roll method (hereinafter, abbreviated as "reel method") is widely known (for example, refer to Patent Document 1). In the reel method, a substrate (for example, a strip-shaped film member) wound around a supply roller on the substrate supply side is fed out, and the substrate to be fed is wound around a recovery roller on the substrate recovery side to transport the substrate.

During the transfer from the substrate to the winding, the gate electrode, the gate insulating film, the semiconductor film, and the source-drainage of the TFT are formed by using a plurality of processing devices, for example, using a plurality of transfer rollers. Electrodes, etc., on the processed surface of the substrate It is a constituent element of the display element. For example, in the case of forming an organic EL element, a light-emitting layer, an anode, a cathode, a circuit, and the like are sequentially formed on a substrate.

Patent Document 1: International Publication No. 2006/100868

However, in the above method, since it is necessary to arrange the processing apparatus along the transport path of the substrate, the entire apparatus is increased in size depending on, for example, the transport form of the substrate.

It is an object of the present invention to provide a substrate processing apparatus which can save space.

A substrate processing apparatus according to one aspect is a sheet substrate having a flexible long strip, and includes: a first processing apparatus that applies a first process to the sheet substrate conveyed in the long strip direction; and a second process The apparatus is disposed so as to be shifted in a direction intersecting the transport direction of the sheet substrate with respect to the transport direction of the sheet substrate, and the second processing is performed on the sheet substrate. The third processing device is provided with two rows of the sheet. The substrate is carried into the discharge portion with the gap therebetween, and the third process is performed on the first processed sheet substrate or the second processed sheet substrate; and the transfer device includes: In the transport unit, the sheet substrate is transported in the long strip direction by the first processing device toward the third processing device, and the second transport unit is in the third substrate. After the processing device is moved toward the second processing device, the sheet substrate is transported in the long strip direction; and the third transport portion is directed toward the third processing device after passing through the second processing device. Way, the sheet substrate is transported to the long strip To.

In a method of processing a substrate, a plurality of processes are performed on the sheet substrate while the sheet substrate having the flexible long strip is conveyed in the long strip direction, and the first step is performed to transport the sheet substrate. To the first processing device, and to apply the first surface to the processed surface of the sheet substrate In the second step, the sheet substrate is transferred to the second processing device, and the second processed surface is applied to the processed surface of the sheet substrate that has been subjected to the first processing; and the third step is performed after the first processing The sheet substrate and the sheet substrate after the second treatment are transported to a third processing device including a loading/discharging unit through which the two sheets of the sheet substrate are passed together, and the sheet substrate is processed. The third processing is performed on the surface, and the transporting step is performed by transporting the sheet substrate in the longitudinal direction by the first processing device, the third processing device, the second processing device, and the third processing device. The transfer device transports the sheet substrate.

According to the aspect of the invention, it is possible to provide a substrate processing apparatus which can save space.

FB‧‧‧Flake substrate

SU‧‧‧Substrate Supply Department

PR‧‧‧Substrate Processing Department

CB‧‧‧室

CL‧‧‧Substrate Recycling Department

CONT‧‧‧Control Department

Fp‧‧‧ processed surface

DRM‧‧‧ barrel agency

CYL‧‧‧Cylinder components

CY1‧‧‧ first cylindrical part

CY2‧‧‧Second cylinder

ACT‧‧‧Rotary drive mechanism

C1‧‧‧ first cylindrical member

C2‧‧‧Second cylindrical member

DRM~DRM5‧‧‧ barrel mechanism

42A1, 42A2, 42B1, 42B2, 42C1, 42C2‧‧ ‧ Processing Department

43‧‧‧Drying device

FPA, FPA4, FPA2, FPA3‧‧‧ substrate processing equipment

R101~R106, R111~R114‧‧‧ guide roller

10‧‧‧Supply

11,13,21,111,121‧‧‧ shaft members

12,14,22,112,122‧‧‧Support

20‧‧‧Recycling

30,130,230‧‧‧Transporting device

31,32‧‧‧Processing roller

40,140,241~244‧‧‧Processing device

131,231~233‧‧‧Handling conveyor roller

Fig. 1 is a perspective view showing a configuration of a substrate processing apparatus according to a first embodiment.

Fig. 2 is a plan view showing the configuration of a substrate processing apparatus of the embodiment.

Fig. 3 is a plan view showing the configuration of a substrate processing apparatus according to a second embodiment.

Fig. 4 is a plan view showing a configuration of a substrate processing apparatus according to a third embodiment.

Fig. 5 is a perspective view showing the configuration of a substrate processing apparatus according to a fourth embodiment.

Fig. 6 is a plan view showing the configuration of the substrate processing apparatus of the embodiment.

Fig. 7 is a plan view showing the configuration of a substrate processing apparatus of the embodiment.

Fig. 8 is a plan view showing the configuration of the substrate processing apparatus of the embodiment.

Fig. 9 is a perspective view showing the configuration of a substrate processing apparatus according to a fifth embodiment.

Fig. 10 is a plan view showing the configuration of a substrate processing apparatus according to a sixth embodiment.

Fig. 11 is a plan view showing the configuration of a substrate processing apparatus according to a seventh embodiment.

Fig. 12 is a plan view showing the configuration of a substrate processing apparatus according to another embodiment.

(First embodiment)

Next, a substrate processing apparatus according to the first embodiment will be described. Fig. 1 is a perspective view showing the configuration of a substrate processing apparatus FPA4 of the present embodiment. FIG. 2 is a plan view showing the configuration of the substrate processing apparatus FPA4.

As shown in FIG. 1 and FIG. 2, the substrate processing apparatus FPA has a substrate supply unit SU that supplies a sheet substrate (for example, a strip-shaped film member) FB, and processes the surface (processed surface) Fp of the sheet substrate FB. The substrate processing unit PR, the chamber CB (not shown in FIG. 1) in which the substrate processing unit PR is housed, the substrate collection unit CL that collects the sheet substrate FB, and the control unit CONT that controls the respective units. The substrate processing apparatus FPA is provided, for example, at a factory or the like. In the present embodiment, the sheet substrate FB is supplied, processed, and recovered in an upright state. In the present embodiment, the erected state includes a state in which the processed surface Fp of the sheet substrate FB intersects at a predetermined angle with respect to a horizontal plane (XY plane), for example, a state of being inclined or a state of being substantially perpendicular. In other words, the state in which the substrate processing surface Fp of the sheet substrate FB is erected also includes a state in which the short side direction of the substrate FB is in a non-horizontal posture.

In the following description, the XYZ orthogonal coordinate system is set, and the positional relationship of each member will be described with reference to this XYZ orthogonal coordinate system. Specifically, the predetermined direction on the horizontal plane is the X-axis direction, the direction orthogonal to the X-axis direction on the horizontal plane is the Y-axis direction, and the vertical direction is the Z-axis direction. Further, the directions of rotation (inclination) around the X-axis, the Y-axis, and the Z-axis are θX, θY, and θZ directions, respectively.

Further, in the embodiment, a state in which the substrate-treated surface Fp of the sheet substrate FB is substantially perpendicular to the horizontal plane will be described as an example.

The substrate processing apparatus FPA is sent out from the substrate supply unit SU and wound into a reel The reel-to-reel method (hereinafter, abbreviated as "reel method") for performing various processing on the surface of the sheet-like substrate FB while the sheet-like substrate FB is collected in a reel shape by the substrate-receiving portion CL Device. The substrate processing apparatus FPA can be used to form a display element (electronic element) such as an organic EL element or a liquid crystal display element on the sheet substrate FB. Of course, the substrate processing apparatus FPA may be used in the case of forming an element other than these elements.

As the sheet substrate FB to be processed by the substrate processing apparatus FPA, for example, a resin film or a foil such as stainless steel can be used. As the resin film, for example, a polyethylene resin, a polypropylene resin, a polyester resin, an ethylene vinyl copolymer resin, a polyvinyl chloride resin, a cellulose resin, a polyamide resin, a polyimide resin, or the like may be used. Materials such as polycarbonate resin, polystyrene resin, and vinyl acetate resin.

The dimension in the short-side direction of the sheet-like substrate FB is, for example, about 50 cm to 2 m, and the dimension in the longitudinal direction is formed to be, for example, 10 m or more. Of course, this size is only an example and is not limited to this example. For example, the dimension of the short side direction of the sheet substrate FB may be 50 cm or less, or may be 2 m or more. Further, the dimension of the longitudinal direction of the sheet substrate FB may be 10 m or less.

The sheet substrate FB is formed to have a thickness of, for example, 1 mm or less and has flexibility. Here, the term "flexibility" refers to a property in which the substrate can be bent without being broken or broken by applying a predetermined force to at least its own weight. Further, for example, the property of being bent by the predetermined force described above is also included in the flexibility indicated. Further, the flexibility described above varies depending on the material, size, thickness, temperature, and the like of the substrate. Further, the sheet substrate FB may be a strip-shaped substrate, or a plurality of unit substrates may be connected to form a strip shape.

The sheet substrate FB is subjected to heat of, for example, about 200 ° C, and its size is also substantially A smaller coefficient of thermal expansion without change is preferred. For example, an inorganic filler may be mixed in the resin film to lower the coefficient of thermal expansion. Examples of the inorganic filler include titanium oxide, zinc oxide, aluminum oxide, cerium oxide, and the like.

The substrate supply unit SU has a supply port 10 (not shown in FIG. 1 ) and a shaft member 11 and a support portion 12 disposed in the supply port 10 . The shaft member 11 is formed, for example, in a cylindrical shape, and the central axis is disposed, for example, substantially in parallel with the Z direction. Therefore, in the shaft member 11, the sheet substrate FB is wound in an upright state. The shaft member 11 is detachably attachable to the support portion 12. The support portion 12 rotatably supports the shaft member 11 in the circumferential direction (for example, the θZ direction). The substrate supply unit SU is in a state in which the sheet-like substrate FB wound in the form of a reel is erected in the short-side direction of the sheet-like substrate FB, that is, in a state of being aligned with the Z direction (that is, the sheet-like substrate) The FB is sent to the substrate processing unit PR in a non-horizontal posture.

A shaft member 13 around which a protective substrate PB for protecting the surface Fp of the sheet substrate FB is wound is provided in the supply crucible 10. Further, the shaft member 13 provided in the supply port 10 may be referred to as a protective substrate supply portion. The protective substrate PB is adhered to the substrate of the sheet substrate FB before being recovered by the substrate collecting portion CL after the processing of the substrate processing portion PR is completed. The protective substrate PB is formed in, for example, a strip shape and has flexibility, similar to the sheet substrate FB. The shaft member 13 is formed, for example, in a cylindrical shape, and the central axis is disposed substantially parallel to the Z direction, for example. Therefore, in the shaft member 13, the protective substrate PB is wound in an upright state. The shaft member 13 is rotatably supported in the circumferential direction (for example, the θZ direction) by the support portion 14. The shaft member 13 is detachably attachable to the support portion 14. The substrate supply unit SU sends the protective substrate PB in an upright state and supplies it to the substrate processing unit PR.

The substrate-receiving portion CL is wound and recovered in a state in which the sheet-like substrate FB that has been transported from the substrate processing portion PR in a state in which the protective substrate PB is adhered and erected in the short-side direction of the sheet-like substrate FB and the protective substrate PB. In the recovery 埠 20 of the substrate collection unit CL (not shown in FIG. 1 ), Similarly to the substrate supply unit SU, a shaft member 21 for winding the sheet substrate FB and the protective substrate PB and a support portion 22 for supporting the shaft member 21 so as to be rotatable are provided. The shaft member 21 is detachably attachable to the support portion 22.

The supply cassette 10 of the substrate supply unit SU and the recovery cassette 20 of the substrate collection unit CL are disposed outside the chamber CB that houses the substrate processing unit PR, for example. The supply port 10 and the recovery port 20 are disposed on the surface of the chamber CB, for example, on the -Y side, and are arranged side by side with respect to the substrate processing portion PR, for example, in the X direction. As described above, since the supply port 10 and the recovery cassette 20 are disposed together in one portion, the supply port 10 and the recovery cassette 20 can be accessed with high efficiency.

The substrate processing unit PR transports the sheet substrate FB supplied from the substrate supply unit SU to the substrate collection unit CL in an upright state, and processes the processed surface Fp of the sheet substrate FB in the upright state during the transfer. The substrate processing unit PR includes, for example, a transport device 30 such as a transport mechanism, a processing device 40, and an aligning device (not shown). The substrate processing unit PR is housed in the vacuum chamber CB managed by the air conditioner, and is managed such that the ambient temperature and the ambient humidity are constant and the devices are protected from dust and the like.

As shown in FIGS. 1 and 2, the transport device 30 has a plurality of (for example, six) guide rollers R101 to R106 and two process rollers 31 and 32. The guide rollers R101 to R104 guide the sheet substrate FB from the substrate supply portion SU to the substrate collection portion CL. The guide rollers R105 and R106 guide the protective substrate PB from the substrate supply portion SU to the substrate recovery portion CL in a path different from the sheet substrate FB.

The guide rollers R101 to R106 are arranged such that, for example, the rotation axis is substantially parallel to the Z-axis direction. Therefore, in the guide rollers R101 to R104, the sheet substrate FB is suspended in an upright state (as described above, the short side direction of the substrate FB is substantially non-horizontal). Also, in the guide roller R105 and R106, the protective substrate PB is suspended in an upright state. The guide rollers R101 to R106 may be configured to have a drive mechanism, for example. Since the guide rollers F101 to R104 are wound with the processed surface Fp of the sheet substrate FB, for example, a gas layer forming device (not shown) for forming a gas layer is provided on the cylindrical surface of each of the guide rollers R101 to R104. It can also be constructed. According to the above configuration, the sheet substrate FB is conveyed between at least the guide rollers R101 to R104 while maintaining a predetermined tension.

The processing rollers 31 and 32 are disposed, for example, on a guiding path of the sheet-like substrate FB of the guiding rollers R101 to R104. The processing rollers 31 and 32 are arranged to have the same position in the chamber CB, for example, in the Y direction. In the present embodiment, for example, the processing rolls 31 and 32 are disposed in a substantially central portion of the chamber CB in the Y direction.

Each of the processing drums 31 and 32 is formed in a cylindrical shape (for example, a barrel having a diameter of 1 to several m). The processing drums 31 and 32 are arranged such that, for example, the central axis is substantially parallel to the Z direction, and the sheet substrate FB is suspended in an upright state. The processing rolls 31 and 32 are formed to have a larger diameter than the guide rolls R101 to R104, for example.

The processing rollers 31 and 32 are respectively provided at positions where the supply port SUa connected to the substrate supply unit SU and the recovery port CLa connected to the substrate collection unit CL are sandwiched. More specifically, the processing drum 31 is disposed on the -X side of the supply port SUa, and the processing drum 32 is disposed on the +X side of the recovery port CLa.

The transport direction of the sheet-like substrate FB in the substrate processing unit PR is first transported from the supply port SUa to the +Y direction, for example, by the guide roller R101 in the -X direction (in the direction inclined to the -Y side by 45°). Convert the transfer direction. The sheet substrate FB that has passed through the guide roller R101 is folded back by the process drum 31, and the conveyance direction is converted into the +X direction. The sheet substrate FB that has been folded back from the processing drum 31 in the +X direction is transferred to the +Y direction by the guide roller R102. The conveyance direction is converted to the -Y direction by a portion of the processing device 40 (preparation processing device 44). The sheet-like substrate FB of the preliminary processing device 44 is transferred to the +X direction by the guide roller R103, and is transferred by the processing roller 32, and is transferred to the -X direction (in the direction inclined by 45° toward the +Y side). direction. The sheet substrate FB that has passed through the processing drum 32 is transferred to the recovery port CLa by the guide roller R104 in the -Y direction. In the above-described manner, the transport device 30 frequently switches the transport direction in the X direction and the Y direction in the chamber CB and simultaneously transports the sheet substrate FB.

The processing device 40 is a device for forming, for example, an organic EL element on the processed surface Fp of the sheet substrate FB. In the present embodiment, for example, the cleaning device 41, the TFT layer forming device 42, the drying device (drying portion) 43, the preliminary processing device 44, the light-emitting layer forming device 45, the laminating device 46, and the like are used. Further, other means such as a partition wall forming means (not shown) for forming a partition wall on the surface Fp to be processed may be provided.

As a type of such a processing apparatus 40, for example, a film forming apparatus such as a droplet applying apparatus (for example, an ink jet type coating apparatus or a screen printing type coating apparatus), a vapor deposition apparatus, and a sputtering apparatus, or an exposure apparatus or a developing apparatus are used. Various devices such as surface modification devices and cleaning devices. Each of these devices is suitably provided, for example, on a transport path of the sheet substrate FB.

The cleaning device 41 has a first cleaning device 41A that cleans the sheet substrate FB and a second cleaning device 41B that cleans the protective substrate PB. The first cleaning device 41A is disposed between the transport path of the sheet substrate FB, for example, between the supply port SUa (see FIG. 2) and the process drum 31. Further, the second cleaning device 41B is disposed between the transfer path of the protective substrate PB, for example, between the supply port SUb and the laminating device 46. The cleaning device 41 cleans the sheet substrate FB or the protective substrate PB supplied from the outside of the chamber CB to the inside.

The TFT layer forming device 42 forms a TFT element for driving the organic EL element Piece or electrode device. The TFT layer forming device 42 has, for example, a first forming device 42A, a second forming device 42B, and a third forming device 42C. The first forming device 42A is disposed on the -Y side of the process drum 31. The second forming device 42B is disposed on the -X side of the process drum 31. The third forming device 42C is disposed on the +Y side of the process drum 31. The +X side of the processing drum 31 is empty, and for example, a guide roller R101 is disposed.

The first forming device 42A, the second forming device 42B, and the third forming device 42C are disposed around, for example, the processing drum 31. The step of forming one of the TFT elements and the electrodes is carried out by, for example, the first forming means 42A, the second forming means 42B, and the third forming means 42C.

The first forming device 42A, the second forming device 42B, and the third forming device 42C are respectively directed toward the processing drum 31, and can process the sheet substrate FB wound in the upright state on the processing drum 31. The processing drum 31 serves as a support portion that supports the sheet substrate FB when the TFT layer forming apparatus 42 is processed.

The drying device 43 is a device for stabilizing a TFT element or an electrode formed on the sheet substrate FB by, for example, heating the sheet substrate FB. The drying device 43 is disposed between the conveyance path processing drum 31 of the sheet substrate FB and the processing drum 32. The drying device 43 is disposed so as to overlap a part of the processing drum 31 and the processing drum 32 when viewed from the Y direction, for example.

As shown in FIGS. 1 and 2, the preliminary processing device 44 is a device for performing a preliminary step (for example, an insulating layer forming step) when the light-emitting layer is formed on the sheet substrate FB. The preparatory processing device 44 is disposed between the transport path processing drum 31 and the processing drum 32, for example, the sheet substrate FB, together with the drying device 43. The preliminary processing device 44 has, for example, a first processing device 44A, a second processing device 44B, and a third processing device 44C, and a series of preliminary processing steps are performed in a shared manner.

The light-emitting layer forming device 45 is a device that forms a light-emitting layer of an organic EL element. The light-emitting layer forming device 45 has, for example, a first forming device 45A, a second forming device 45B, and a third forming device 45C. The first forming device 45A, the second forming device 45B, and the third forming device 45C are disposed around, for example, the processing drum 32. The series of steps of forming the light-emitting layer is carried out by, for example, the first forming means 45A, the second forming means 45B, and the third forming means 45C.

The first forming device 45A is disposed on the +Y side of the process drum 32. The second forming device 45B is disposed on the +X side of the process drum 32. The third forming device 45C is disposed on the -Y side of the process drum 32. The -X side of the processing drum 32 is empty, and for example, a guide roller R104 is disposed.

The laminating device 46 is a device that bonds the sheet substrate FB and the protective substrate (protective material) PB. The laminating device 46 is disposed between the processing path of the sheet substrate FB, for example, between the processing drum 32 and the recovery port CLa. The laminating device 46 is configured such that the protective substrate PB is disposed opposite to the surface to be processed Fp of the sheet substrate FB, for example, and is aligned between the sheet substrate FB and the protective substrate PB, and then the sheet substrate FB is placed. It is bonded to the protective substrate PB.

Among the processing devices 40, for example, the first forming device 42A of the TFT layer forming device 42, the first cleaning device 41A, the second cleaning device 41B, and the third forming device 45C of the light-emitting layer forming device 45 are arranged from X. Overlapping when viewing in the direction. Further, the second forming device 42B of the TFT layer forming device 42, the processing roller 31, the processing roller 32, and the second forming device 45B of the light-emitting layer forming device 45 are arranged to overlap when viewed in the X direction. Further, the third forming device 42C of the TFT layer forming device 42, the drying device 43, and the first forming device 45A of the light-emitting layer forming device 45 are arranged to overlap when viewed in the X direction.

Further, for example, the first forming means 42A of the TFT layer forming device 42 and the processing roll The cylinder 31 and the third forming device 42C are arranged to overlap when viewed in the Y direction. Further, for example, the cleaning devices 41A and 41B and the drying device 43 are disposed so as to overlap each other when viewed from the Y direction. Further, the preliminary processing device 44 and the laminating device 46 are disposed so as to overlap each other when viewed in the Y direction. Further, the first forming device 45A, the processing roller 32, and the third forming device 45C of the light-emitting layer forming device 45 are arranged to overlap when viewed in the Y direction. As described above, the conveying device 30 and the processing device 40 are densely arranged so as to increase the number of overlapping portions when viewed in the X direction and the Y direction.

In the substrate processing apparatus FPA configured as described above, a display element (electronic element) such as an organic EL element or a liquid crystal display element is manufactured by a reel method under the control of the control unit CONT. Hereinafter, a procedure of manufacturing a display element using the substrate processing apparatus FPA having the above configuration will be described.

First, the strip-shaped substrate FB in which the shaft member 11 is wound into a roll shape is attached to the support portion 12 in the supply cassette 10 of the substrate supply portion SU. Moreover, the strip-shaped protective substrate PB wound around the shaft member 13 is attached to the support portion 14 in the supply port 10 of the substrate supply portion SU. Further, the shaft member 21 for recovery is attached to the support portion 22 in the recovery cassette 20 of the substrate collecting portion CL.

In this state, the control unit CONT rotates the shaft member 11 through the support portion 12, and sends the sheet substrate FB from the substrate supply portion SU. The sheet substrate FB sent from the substrate supply unit SU is supplied into the chamber CB from the supply port SUa of the substrate processing unit PR. The control unit CONT transports the sheet substrate FB supplied into the chamber CB to the transport device 30 while processing the sheet substrate FB by each processing device 40. In the present embodiment, the control unit CONT controls the motors one by one by applying a predetermined tension to the sheet substrate FB by appropriately providing the rotation rollers for the processing rollers 31 and 32 and the rollers R101 to R106.

By this action, the sheet substrate FB supplied to the substrate processing portion PR is used by The first cleaning device 41A is washed and guided to the processing drum 31 by the guide roller R101. The sheet substrate FB is wound and wound around the processing drum 31 in an upright state so that the processed surface Fp faces the first forming device 42A, the second forming device 42B, and the third forming device 42C of the TFT layer forming device 42, respectively. . A TFT element, wiring, or the like is formed by the TFT layer forming device 42 by winding the processed surface Fp of the sheet substrate FB wound around the processing drum 31.

The sheet substrate FB that has passed through the processing drum 31 is supplied to the drying device 43, and for example, a drying process such as heat treatment is applied. The sheet substrate FB after the drying process is supplied to the preliminary processing device 44 through, for example, the guide roller R102. In the preliminary processing device 44, for example, the first processing device 44A to the third processing device 44C form an insulating film, a hole injection layer, an electron injection layer, or the like on the sheet substrate FB.

The sheet substrate FB after the preliminary processing is guided to the processing drum 32 through, for example, the guide roller R103. The sheet substrate FB is wound around the processing drum 32 in an upright state so that the processed surface Fp faces the first forming device 45A, the second forming device 45B, and the third forming device 45C of the light emitting layer forming device 45, respectively. . The light-emitting layer or the like is formed by the light-emitting layer forming device 45 by winding the processed surface Fp of the sheet substrate FB wound around the processing drum 32.

The sheet substrate FB that has passed through the processing drum 32 is supplied to the laminating device 46, and the protective substrate PB is adhered to the surface Fp to be processed. The sheet substrate FB after the protective substrate (protective material) PB is adhered to the substrate recovery portion CL from, for example, the recovery port CLa. The sheet member FB recovered in the substrate recovery portion CL is wound into a reel shape in the shaft member 21 in the recovery crucible 20. After the sheet member FB of a predetermined amount is wound around the shaft member 21, the sheet substrate FB is cut, for example, and the shaft member 21 around which the sheet substrate FB is wound is removed from the support portion 22. A new shaft member 21, for example, in which the sheet substrate FB is not wound, is attached to the support portion 22.

The control unit CONT forms an element on the processed surface Fp of the sheet substrate FB by performing the above processing.

As described above, according to the present embodiment, the substrate supply unit SU that supplies the sheet substrate FB in the erect state in the short-side direction of the strip-shaped substrate FB is provided, and the substrate supply unit SU is supplied from the substrate supply unit SU. A plurality of processing apparatuses in which the sheet substrate FB is transported in the upright state and the transport path of the sheet substrate FB of the transport apparatus 30 is disposed, and the processed surface Fp of the sheet substrate FB in the upright state is processed. In the substrate processing unit PR of 40, the substrate-receiving portion CL in which the sheet-like substrate FB processed in the substrate processing unit PR is collected in an upright state is easy to move the sheet-like substrate FB in the horizontal direction (X direction). And the composition of the Y direction) conversion.

Therefore, the selection width of the arrangement of the processing device 40 in the X direction and the Y direction can be increased. For example, the arrangement of the processing device 40 can be selected in such a manner as to minimize the device area of the substrate processing device FPA4. Thereby, space saving of the substrate processing apparatus FPA4 can be achieved.

(Second embodiment)

Next, a substrate processing apparatus according to a second embodiment of the present invention will be described.

FIG. 3 is a plan view showing the configuration of the substrate processing apparatus FPA2. In the substrate processing apparatus FPA2, the configuration of the substrate processing unit PR is different from that of the first embodiment. The other configuration can be configured in the same manner as, for example, the first embodiment. In the present embodiment, the difference will be mainly described.

As shown in FIG. 3, the substrate processing apparatus FPA2 includes a substrate supply unit SU, a substrate processing unit PR, a substrate recovery unit CL, a chamber CB, and a control unit CONT. The substrate processing unit PR is housed in the chamber CB. The substrate supply portion SU has a shaft member 111 that is formed in a cylindrical shape and whose central axis is arranged in parallel with the Z direction, and a support portion 112 that supports the shaft member 111 so as to be rotatable. In the shaft member 111, the sheet substrate FB is wound in an upright state. In addition, in order to simplify the description, in FIG. 3, the illustration of the structure which supplies a protective substrate is abbreviate|omitted in the board|substrate supply part SU. The substrate collecting portion CL has a shaft member 121 which is formed in a cylindrical shape and whose central axis is arranged in parallel with the Z direction, and a support portion 122 that supports the shaft member 121 so as to be rotatable.

The conveyance device 130 of the substrate processing unit PR has a processing conveyance roller 131 at the center in a plan view in the chamber CB. The processing conveyance roller 131 is formed, for example, in a cylindrical shape, and is arranged such that the central axis is parallel to the Z direction. The processing conveyance drum 131 is configured to be rotatable in the θZ direction, for example. The sheet substrate FB is suspended from the process conveyance drum 131 in an upright state. As described above, in the substrate processing unit PR, the sheet substrate FB is transported in an upright state.

The processing conveyance drum 131 has a rotation drive mechanism which is not shown, for example. The rotary drive mechanism is controlled by, for example, a control unit CONT. The sheet substrate FB supplied from the supply port SUa is suspended from the process conveyance drum 131 and conveyed to the recovery port CLa. In the processing of the transport roller 131, the sheet substrate FB is suspended such that the processed surface Fp faces outward.

In the substrate processing unit PR, a plurality of processing apparatuses 140 are disposed around the processing conveyance drum 131 so as to follow the cylindrical surface of the processing conveyance drum 131. As the processing device 140, for example, various processing devices described in the first embodiment are used. In the example shown in FIG. 3, each of the processing means for performing the TFT layer forming step, the processing means before the light-emitting layer forming step (preparation step), and the processing for performing the light-emitting layer forming step are performed as the plurality of processing apparatuses 140. The devices are arranged side by side in the circumferential direction of the processing conveyance drum 131. A plurality of processing apparatuses 140 are respectively oriented toward the processing conveyance drum 131.

In the substrate processing apparatus FPA2, the sheet substrate FB is supplied from the substrate supply unit SU to the substrate processing unit PR in an upright state. The sheet substrate FB is attached to the substrate processing unit PR The erected state is suspended in the process transport roller 131 and transported to the substrate collecting portion CL. Further, the plurality of processing apparatuses 140 sequentially process the sheet-like substrate FB suspended in the processing conveyance drum 131 in an upright state, for example.

As described above, according to the present embodiment, the processing conveyance roller 131 has a function of supporting the sheet substrate FB wound in the upright state and a function of transporting the sheet substrate FB in the upright state. Thereby, space saving of the substrate processing apparatus FPA2 can be achieved. Further, since all the steps are performed around one processing conveyance roller 131, the arrangement of the devices in the substrate processing portion PR can be simplified.

(Third embodiment)

Next, a substrate processing apparatus according to a third embodiment of the present invention will be described.

4 is a plan view showing the configuration of the substrate processing apparatus FPA3. In the substrate processing apparatus FPA3, the configuration of the substrate processing unit PR is different from that of the first embodiment. The other configuration can be configured in the same manner as, for example, the first embodiment. In the present embodiment, the difference will be mainly described.

As shown in FIG. 4, the substrate processing apparatus FPA3 is configured such that a plurality of processing conveyance rollers described in the second embodiment are provided in the substrate processing unit PR. In the present embodiment, the transport device 230 of the substrate processing unit PR has the guide rollers R111 to R114 and the process transport rollers 231 to 233.

The guide rollers R111 to R114 and the process transport rollers 231 to 233 are each formed in a cylindrical shape, and are arranged such that the central axes are parallel to the Z direction. The processing conveyance rollers 231 to 233 are formed to have larger diameters than the guide rollers R111 to R114. The sheet substrate FB is suspended from the process conveyance rollers 231 to 233 and the guide rollers R111 to R114 in an upright state. As described above, in the substrate processing unit PR, the sheet substrate FB is transported in an upright state.

As the arrangement of the transporting device 230, for example, the guide rollers R111 to R114 are arranged in a substantially central portion of the chamber CB in a state in which the vertical and horizontal rows are arranged in two rows. Further, the processing conveyance rollers 231 to 233 are arranged to surround the four guide rollers R111 to R114 from three directions (-X direction, +Y direction, and -X direction).

In the substrate processing unit PR, a plurality of processing units 241 to 243 are disposed around the processing transfer rollers 231 to 233 so as to follow the cylindrical surfaces of the processing transport rollers 231 to 233. As the processing devices 241 to 243, for example, various processing devices described in the first embodiment are used. For example, each processing device that performs the TFT layer forming step is used as the processing device 241, and each processing device that performs the light emitting layer forming step pre-processing (preparation step) is used as the processing device 242, and is used as the processing device 243 to emit light. Each processing device of the layer forming step may also be used. Each of the processing apparatuses 241 to 243 faces, for example, the processing conveyance rollers 231 to 233.

In the substrate processing unit PR, the plurality of processing conveyance rollers 231 to 233 are formed, for example, in a cylindrical shape, and the central axis is arranged in parallel with the Z direction. The processing conveyance roller 231 is configured to be rotatable in, for example, the θZ direction.

The processing conveyance rollers 231 to 233 have, for example, a rotation drive mechanism (not shown). The rotary drive mechanism is controlled by, for example, a control unit CONT. The sheet substrate FB supplied from the supply port SUa is suspended from the process conveyance rollers 231 to 233 and transported to the recovery port CLa. In the processing of the transport rollers 231 to 233, the sheet substrate FB is suspended such that the processed surface Fp faces outward. On the other hand, in the guide rollers R111 to R114, the sheet substrate FB is suspended so that the surface to be processed Fp faces inward.

In the substrate processing apparatus FPA3, the sheet substrate FB is supplied from the substrate supply unit SU to the substrate processing unit PR in an upright state. The sheet substrate FB is attached to the substrate processing unit PR The erected state is suspended by the process transport rollers 231 to 233 and transported to the substrate collecting portion CL. Further, the plurality of processing apparatuses 241 to 243 sequentially process the sheet substrates FB suspended in the processing conveyance rollers 231 to 233, for example, in an erect state.

As described above, according to the present embodiment, by using a plurality of process transport rollers 231 to 233, continuous processing can be performed in, for example, a plurality of regions. Thereby, the selection width of the arrangement can be increased. Further, according to the present embodiment, since the guide rollers R111 to R114 are concentrated in the central portion of the chamber CB, for example, by disposing the processing device 244 such as a drying device in the central portion of the chamber CB, for example, The processing such as the drying process of the sheet substrate FB after the respective processing of the transfer rollers 231 to 233 is common. Thereby, space can be saved.

(Fourth embodiment)

Hereinafter, a fourth embodiment of the present invention will be described with reference to the drawings. Hereinafter, the description of the components having the same reference numerals as those of the above embodiment will be omitted as appropriate.

Fig. 5 is a perspective view showing the configuration of the substrate processing apparatus FPA. Fig. 6 is a plan view showing the configuration of the substrate processing apparatus FPA.

In the fourth embodiment, the conveying device 30 has a plurality of (for example, ten) guide rollers R1 to R10, a tub mechanism DRM, and a processing drum 32. The guide rollers R1 to R8 guide the sheet substrate FB from the substrate supply portion SU to the substrate collection portion CL. The guide rollers R9 and R10 guide the protective substrate PB from the substrate supply portion SU to the substrate recovery portion CL in a different path from the sheet substrate FB. Further, the barrel mechanism DRM may be the first barrel mechanism, and the processing drum 32 may be the second barrel mechanism.

The guide rollers R1 to R3 and R6 to R10 are arranged such that, for example, the rotation axis is substantially parallel to the Z-axis direction. Therefore, in the guide rollers R1 to R3, R6 to R8, the sheet substrate FB is suspended in an upright state. Further, in the guide rollers R9 and R10, the protective substrate PB is suspended in an upright state. guide The rollers R1 to R10 may be configured to have, for example, a drive mechanism. The guide rolls R1, R4, R7, and R8 around which the processed surface Fp of the sheet-like substrate FB is wound are provided with a gas layer forming device (not shown) in which a gas layer (air bearing) is formed on the cylindrical surface. It can also be constructed. In any case, in the case of the present embodiment, the sheet substrate FB is conveyed between at least the guide rollers R1 to R9 while maintaining a predetermined tension.

FIG. 7 is a perspective view showing a configuration of the vicinity of the tub mechanism DRM in the substrate processing unit PR.

As shown in Fig. 7, the tub mechanism DRM has a cylindrical member CYL that is disposed such that the central axis of rotation is substantially parallel to the Z direction, and a rotary drive mechanism (drive portion) ACT that supports the cylindrical member CYL so as to be rotatable in the circumferential direction. The cylindrical member CYL has a first cylindrical portion (first roller) CY1, a second cylindrical portion (second roller) CY2, and a guiding portion G.

The first cylindrical portion CY1 and the second cylindrical portion CY2 are each a part of the cylindrical surface of the cylindrical member CYL. Since both the first cylindrical portion CY1 and the second cylindrical portion CY2 are part of one cylindrical member CYL, when the cylindrical member CYL is rotated, the first cylindrical portion CY1 and the second cylindrical portion CY2 are integrally rotated.

The first cylindrical portion CY1 and the second cylindrical portion CY2 are divided in the Z direction by, for example, the guiding portion G. That is, the second cylindrical portion CY2 is different in position in the Z direction with respect to the first cylindrical portion CY1, that is, in a direction intersecting with the horizontal direction. The first cylindrical portion CY1 is disposed on the +Z side (upper side) of the guiding portion G, and the second cylindrical portion CY2 is disposed on the -Z side (lower side) of the guiding portion G. The first cylindrical portion CY1 and the second cylindrical portion CY2 are formed to have, for example, equal diameters to each other. The first cylindrical portion CY1 and the second cylindrical portion CY2 are formed to have a larger diameter (for example, a diameter of 1 m or more) than, for example, the guide rollers R1 to R10. The guiding portion G is a portion of the sheet substrate FB wound around the first cylindrical portion CY1 and a portion wound around the second cylindrical portion CY2 is parallel to the XY plane. Guided by the way of face transfer.

Guide rollers R2 to R5 are disposed between the first cylindrical portion CY1 and the second cylindrical portion CY2 in the transport path of the sheet substrate FB. The guide roller R2 is folded back in the -Y direction by the sheet substrate FB which is folded back into a U shape by the first cylindrical portion CY1 in a half-cycle and transported in the +X direction. The guide roller R3 folds back the sheet substrate FB folded in the -Y direction in the -X direction.

The guide rollers R4 and R5 are disposed, for example, in a state where the end portion on the +Z side is inclined toward the +X side. The guide roller R4 is folded back by the guide roller R3 to the sheet-like substrate FB in the -X direction in the obliquely downward direction (the +X direction and the direction inclined to the -Z side). The guide roller R5 is disposed in the obliquely downward direction (the +X direction and the direction inclined to the -Z side) of the guide roller R4. The guide roller R5 is folded back in the -X direction from the guide roller R4 in the obliquely downward direction so as to be directed toward the second cylindrical portion CY2.

In the case of the configuration of Fig. 7, the guide rollers R4 and R5 are set such that their rotation axes are kept substantially parallel to each other and are inclined in the XZ plane by a predetermined amount.

Further, the guide rollers R4 and R5 are provided with actuators that can adjust, for example, the tilt (inclination amount or tilt direction) of the rotary shaft. By adjusting the tilting state of the rotating shaft of at least one of the guiding rollers R4 and R5, the conveying direction of the sheet substrate FB fed from the guide roller R5 to the -X direction can be horizontal (parallel to the X axis) and simultaneously The position of the sheet substrate in the Z direction is maintained substantially constant. The adjustment of the tilting state of the rotating shaft of at least one of the guide rollers R4 and R5 can be performed by receiving a sensor from the position or position of the sheet substrate FB which is precisely monitored from the guide roller R5 to the -X direction. The control unit CONT of the measurement signal drives the actuator for tilt adjustment to control.

As described above, the guide rollers R2 to R5 are switched in such a manner that the conveyance direction of the sheet-like substrate FB wound around the outer circumferential surface of the first cylindrical portion CY1 is directed toward the second cylindrical portion CY2. The conveying direction of the sheet substrate FB. In particular, it is possible to shift the height position of the Z direction by a predetermined amount without changing the conveyance direction (-X direction) of the sheet substrate FB by the pair of the guide rollers R4 and R5 (in the present embodiment, the sheet substrate) The width of the FB in the Z direction is greater than or equal to). Further, in the case where the sheet substrate is folded back in the Z direction in the same manner as in the present embodiment, the sheet substrate FB is obliquely conveyed in the XZ plane between the guide rollers R4 and R5, but the amount of tilt is based on the sheet. The width of the substrate, the interval between the guiding rollers R4 and R5 in the X direction, the inclination angle or the inclination direction of the central axes of rotation of the guiding rollers R4 and R5 are geometrically determined. Therefore, in the case of the present embodiment, if the guide rollers R4, R5 are juxtaposed in the Z direction so that the respective rotation center axes are inclined by 45 degrees in the XZ plane, the guide rollers R4 and R5 are placed between the guide rollers R4 and R5. The traveling sheet substrate may be vertical (a tilt amount of 90 degrees).

Further, by the guide rollers R2 to R5, the sheet substrate FB is guided to a space on the -Z side (lower side) of the sheet substrate FB guided at the position of the guide roller R1, for example. As described above, in the present embodiment, the winding direction of the sheet substrate FB toward the first cylindrical portion CY1 is the same as the winding direction of the sheet substrate FB toward the second cylindrical portion CY2, and the surface of the sheet substrate FB is the same. The back surface is not reversed, and the sheet substrate FB is guided by the guide rollers R2 to R5.

As shown in FIGS. 5 and 6, the process roller 32 is disposed, for example, on a guide path of the sheet substrate FB of the guide rollers R1 to R4. The processing drum 32 is formed, for example, in a cylindrical shape. The processing drum 32 is disposed such that, for example, the central axis is substantially parallel to the Z direction, and the sheet substrate FB is suspended in an upright state. The processing drum 32 is formed to have a larger diameter than, for example, the guiding rollers R1 to R10. The diameter of the treatment drum 32 may be substantially equal to the first cylindrical portion CY1 and the second cylindrical portion CY2.

The cleaning device 41 is provided to clean the sheet substrate FB or the protective substrate PB supplied from the outside of the chamber CB to the inside, and has a first cleaning device 41A for cleaning the sheet substrate FB and a cleaning protective substrate. The second cleaning device 41B of PB. The first cleaning device 41A is provided at The conveyance path of the sheet substrate FB is, for example, between the supply port SUa (see FIG. 6) and the cylindrical member CYL. Further, the second cleaning device 41B is disposed between the transfer path of the protective substrate PB, for example, between the supply port SUb and the laminating device 46.

The TFT layer forming device 42 disposed around the barrel mechanism DRM forms a device for driving a TFT element or an electrode of an organic EL element, a wiring layer, and the like. The TFT layer forming device 42 has, for example, a first forming device 42A, a second forming device 42B, and a third forming device 42C. The first forming device 42A is disposed on the -Y side of the cylindrical member CYL. The second forming device 42B is disposed on the -X side of the cylindrical member CYL. The third forming device 42C is disposed on the +Y side of the cylindrical member CYL.

As described above, the first forming device 42A, the second forming device 42B, and the third forming device 42C are disposed around the cylindrical member CYL, and a series of steps of forming a TFT element, an electrode, a wiring layer, and the like are performed by, for example, a first forming device. 42A, the second forming device 42B, and the third forming device 42C are shared.

Fig. 8 is a view showing the relationship between the first forming device 42A, the second forming device 42B, and the third forming device 42C and the cylindrical member CYL of the tub mechanism DRM.

As shown in FIG. 8, the first forming device 42A, the second forming device 42B, and the third forming device 42C have two processing units 42A1 and 42A2, processing units 42B1 and 42B2, and processing units 42C1 and 42C2, respectively. The processing units 42A1, 42B1, and 42C1 are disposed to face the first cylindrical portion CY1, respectively, and can process the sheet substrate FB suspended in the first cylindrical portion CY1. The processing units 42A2, 42B2, and 42C2 are disposed opposite to the second cylindrical portion CY2, respectively, and can process the sheet substrate FB suspended in the second cylindrical portion CY2. As described above, the first forming device 42A, the second forming device 42B, and the third forming device 42C can process the sheet substrate FB wound in an upright state. In addition, The first cylindrical portion CY1 and the second cylindrical portion CY2 serve as support portions for supporting the sheet substrate FB when the TFT layer forming apparatus 42 is processed.

Further, the first cylindrical portion CY1 and the second cylindrical portion CY2 may be supported by the support portion of the sheet substrate FB, and the barrel mechanism may be referred to as a support mechanism.

As shown in FIG. 5 to FIG. 7, the drying device 43 is a device for stabilizing a TFT element or an electrode formed on the sheet substrate FB by, for example, heating the sheet substrate FB. On the side of the -X side of the drying device 43, as shown in Fig. 7, two insertion ports 43a and 43b are provided. The insertion port 43a is disposed on the +Z side, and the sheet substrate FB that has passed through the first cylindrical portion CY1 is inserted. The insertion port 43b is disposed on the -Z side, and the sheet substrate FB that has passed through the second cylindrical portion CY2 is inserted.

On the +X side of the drying device 43, two discharge ports 43c and 43d are provided. The discharge port 43c is disposed on the +Z side, and is discharged from the sheet substrate FB inserted into the insertion port 43a and dried. The discharge port 43d is disposed on the -Z side, and is discharged from the sheet substrate FB inserted into the insertion port 43b and dried.

As shown in FIGS. 5 and 6, the preliminary processing device 44 is a device for performing a preliminary step (for example, an insulating layer forming step) when forming a light-emitting layer on the sheet substrate FB. The preliminary processing device 44 is disposed between the cylindrical member CYL of the transport path barrel mechanism DRM of the sheet substrate FB and the processing drum 32 together with the drying device 43. The preliminary processing device 44 has, for example, a first processing device 44A, a second processing device 44B, and a third processing device 44C, and a series of preliminary processing steps are performed in a shared manner.

Among the processing devices 40, for example, the first forming device 42A of the TFT layer forming device 42, the first cleaning device 41A, the second cleaning device 41B, and the third forming device 45C of the light-emitting layer forming device 45 are along the first Direction (in the first embodiment, the first direction is the X direction) Set. Further, the second forming device 42B of the TFT layer forming device 42, the cylindrical member CYL, the processing roller 32, and the second forming device 45B of the light-emitting layer forming device 45 are arranged along the X direction. Further, the third forming device 42C of the TFT layer forming device 42, the drying device 43, and the first forming device 45A of the light-emitting layer forming device 45 are arranged along the X direction.

Further, for example, the first forming device 42A, the cylindrical member CYL, and the third forming device 42C of the TFT layer forming device 42 are arranged along the second direction (the Y direction intersecting the X direction in the present embodiment). Further, for example, the cleaning devices 41A and 41B and the drying device 43 are arranged along the Y direction. Further, the preliminary processing device 44 and the laminating device 46 are arranged along the Y direction. Further, the first forming device 45A, the processing roller 32, and the third forming device 45C of the light-emitting layer forming device 45 are arranged along the Y direction. As described above, since the conveying device 30 and the processing device 40 are arranged along the X direction and the Y direction, they are densely arranged so that the overlapping portions of the respective devices when viewed in the X direction and the Y direction are increased.

In the substrate processing apparatus FPA configured as described above, a display element (electronic element) such as an organic EL element or a liquid crystal display element is manufactured by a reel method under the control of the control unit CONT. Hereinafter, a procedure of manufacturing a display element using the substrate processing apparatus FPA having the above configuration will be described.

First, the strip-shaped substrate FB in which the shaft member 11 is wound into a roll shape is attached to the support portion 12 in the supply cassette 10 of the substrate supply portion SU. Moreover, the strip-shaped protective substrate PB wound around the shaft member 13 is attached to the support portion 14 in the supply port 10 of the substrate supply portion SU. Further, the shaft member 21 for recovery is attached to the support portion 22 in the recovery cassette 20 of the substrate collecting portion CL.

In this state, the control unit CONT rotates the shaft member 11 through the support portion 12, and sends the sheet substrate FB from the substrate supply portion SU. Sheet substrate sent from the substrate supply portion SU FB is supplied into the chamber CB from the supply port SUa of the substrate processing unit PR. The control unit CONT transports the sheet substrate FB supplied into the chamber CB to the transport device 30 while processing the sheet substrate FB by each processing device 40. Further, in advance, the tip end portion and the end portion of the sheet-like substrate FB which is wound in the form of a reel in the form of a reel may be attached to the guide piece for facilitating automatic loading of the sheet-like substrate FB to the processing apparatus FPA.

By this operation, the sheet substrate FB supplied to the substrate processing portion PR is washed by the first cleaning device 41A, and guided to the first cylindrical portion CY1 of the tub mechanism DRM by the guide roller R1. The sheet substrate FB is wound and wound in the first circle in an upright state so that the processed surface Fp faces the first forming device 42A, the second forming device 42B, and the third forming device 42C of the TFT layer forming device 42, respectively. Tube CY1. A TFT element, a wiring, or the like is formed by the TFT layer forming device 42 (for example, the processing portions A1, B1, and C1) by winding the processed surface Fp of the sheet substrate FB wound around the first cylindrical portion CY1.

The sheet substrate FB that has passed through the first cylindrical portion CY1 is supplied from the insertion port 43a on the +Z side of the drying device 43 to the inside of the drying device 43, and, for example, a drying process such as heat treatment is applied. The sheet substrate FB after the drying process is carried out from the discharge port 43c on the +Z side of the drying device 43. The sheet substrate FB that is carried out is guided in the -Y direction by, for example, the guide roller R2, and guided in the -X direction by the guide roller R3. The sheet substrate FB passing through the guide roller R3 is guided by the guide roller R4 in the obliquely downward direction (the +X direction and the direction inclined to the -Z side), and guided by the guide roller R5 in the -X direction.

The sheet substrate FB passing through the guide roller R5 is wound in an erected state around the second cylindrical portion CY2 of the tub mechanism DRM. The TFT-forming device F is formed by winding the processed surface Fp of the sheet substrate FB wound around the second cylindrical portion CY2 (for example, the processing portions A2, B2 and C2) A TFT element or wiring or the like which forms a necessary layer is superposed.

The sheet substrate FB that has passed through the second cylindrical portion CY2 is supplied from the insertion port 43b on the -Z side of the drying device 43 to the inside of the drying device 43, and, for example, a drying process such as heat treatment is applied again. The sheet substrate FB after the drying process is carried out from the discharge port 43d on the -Z side of the drying device 43. The sheet substrate FB that is carried out is supplied to the preliminary processing device 44 by, for example, the guide roller R6. In the preliminary processing device 44, for example, the first processing device 44A to the third processing device 44C form an insulating film, a hole injection layer, an electron injection layer, or the like on the sheet substrate FB.

The sheet substrate FB after the preliminary processing is guided to the processing drum 32 through, for example, the guide roller R7. The sheet substrate FB is wound around the processing drum 32 in an upright state so that the processed surface Fp faces the first forming device 45A, the second forming device 45B, and the third forming device 45C of the light emitting layer forming device 45, respectively. . The light-emitting layer or the like is formed by the light-emitting layer forming device 45 by winding the processed surface Fp of the sheet substrate FB wound around the processing drum 32.

The sheet substrate FB that has passed through the processing drum 32 is supplied to the laminating device 46, and the protective substrate PB is adhered to the surface Fp to be processed. The sheet substrate FB after the protective substrate PB is adhered to the substrate recovery portion CL from, for example, the recovery port CLa. The sheet member FB recovered in the substrate recovery portion CL is wound into a reel shape in the shaft member 21 in the recovery crucible 20. After the sheet member FB of a predetermined amount is wound around the shaft member 21, the sheet substrate FB is cut, for example, and the shaft member 21 around which the sheet substrate FB is wound is removed from the support portion 22. A new shaft member 21, for example, in which the sheet substrate FB is not wound, is attached to the support portion 22.

The control unit CONT forms an element on the processed surface Fp of the sheet substrate FB by performing the above processing.

As described above, according to the present embodiment, the sheet substrate FB is wound around the barrel mechanism. After a part of the outer peripheral surface of the first cylindrical portion CY1 of the DRM, the conveying direction of the sheet substrate FB is switched to the second cylindrical portion CY2, and the sheet substrate FB is wound around the second cylindrical portion CY2, and is wound. The first processed surface Fp of one of the first cylindrical portions CY1 is subjected to the first processing and the second processed surface Fp of the processed portion Fp wound around one of the second cylindrical portions CY2 is performed, so that the high density of the sheet substrate FB can be obtained. Process it. Thereby, space saving of the substrate processing apparatus FPA can be achieved.

Further, in the substrate processing apparatus FPA shown in FIG. 5 and FIG. 6, the sheet substrate FB is wound only once in the processing drum 32, but the first cylindrical portion is provided similarly to the cylindrical member CYL of the barrel mechanism DRM. The cylindrical portion of the second cylindrical portion may be formed, and the sheet substrate FB may be wound around each cylindrical portion. In this configuration, the light-emitting layer forming device 45 may be disposed in the first cylindrical portion and the second cylindrical portion. Further, in the case where the processing drum 32 is constituted by the two-stage cylindrical portion, the guide rollers R4, R5 shown in Fig. 7 may be folded back by the two guide rollers inclined by the respective rotation center axes.

(Fifth Embodiment)

Next, a fifth embodiment of the present invention will be described. In the present embodiment, the configuration of the tub mechanism is different from that of the fourth embodiment. Therefore, the configuration of the tub mechanism will be mainly described. Fig. 9 is a perspective view showing the configuration of the tub mechanism DRM2 of the present embodiment.

In the above embodiment, the configuration in which the first cylindrical portion CY1 and the second cylindrical portion CY2 are formed as a single cylindrical member CYL will be described as an example. However, in the fifth embodiment, as shown in FIG. The first cylindrical portion CY1 and the second cylindrical portion CY2 are formed as different cylindrical members (for example, the first cylindrical member C1 and the second cylindrical member C2).

As shown in FIG. 9, the first cylindrical member C1 and the second cylindrical member C2 are disposed in a state of being separated in the Z direction. End face C1a on the +Z side of the first cylindrical member C1 and the second cylindrical structure The end faces C2a on the -Z side of the piece C2 oppose each other. The center line of the rotating shaft SF is provided to be common between the first cylindrical member C1 and the second cylindrical member C2 (the same position in the XY plane).

In the configuration shown in Fig. 9, for example, the diameter differs between the first cylindrical member C1 and the second cylindrical member C2. Specifically, the diameter D1 of the first cylindrical member C1 is larger than the diameter D2 of the second cylindrical member C2. As described above, the path length of the transport path can be adjusted by the first cylindrical member C1 and the second cylindrical member C2 having different diameters.

The rotation drive mechanism ACT2 may be configured to allow the first cylindrical member C1 and the second cylindrical member C2 to rotate independently. Further, the rotation drive mechanism ACT2 may be configured to rotate only one of the first cylindrical member C1 and the second cylindrical member C2.

According to the configuration shown in Fig. 9, the sheet-like substrate FB, for example, the guide roller R21, is wound and suspended in the first cylindrical portion CY1, and guided to the second cylindrical portion CY2 through the guide rollers (converting portions) R22 and R23. . The sheet substrate FB that is wound and suspended behind the second cylindrical portion CY2 is guided through the guide roller R24.

The difference in diameter between the first cylindrical member C1 and the second cylindrical member C2 may depend on the processing form or processing conditions of various processing devices disposed around each of the cylindrical members C1, C2, and the processing portion (processing head, etc.) The setting size and the like are generated.

In the present embodiment, since the continuous sheet substrate FB is transferred from the first cylindrical member C1 to the second cylindrical member C2, the diameter of each of the cylindrical members C1 and C2 must be different from the difference in diameter. The rotation speed (rpm) also makes a difference.

Further, in the case where the first cylindrical member C1 and the second cylindrical member C2 or the cylindrical member are provided with a motor for rotational driving, the portion contacting the first cylindrical member C1 from the sheet substrate FB Between the portion in contact with the second cylindrical member C2, a predetermined sheet can be given force.

Further, in the configuration shown in Fig. 9, the first cylindrical member C1 is disposed on the -Z side, and the second cylindrical member C2 is disposed on the +Z side. However, the present invention is not limited thereto, and the first cylindrical member C1 is disposed at +Z. On the side, the second cylindrical member C2 may be disposed on the -Z side.

(Sixth embodiment)

Next, a sixth embodiment of the present invention will be described. In the present embodiment, the configuration of the tub mechanism is different from that of the above-described embodiment. Therefore, the configuration of the tub mechanism will be mainly described. Fig. 10 is a perspective view showing the configuration of the tub mechanism DRM3 of the present embodiment.

As shown in FIG. 10, the barrel mechanism DRM3 of the present embodiment is configured such that a plurality of second cylindrical portions (processing reference faces) separated from each other are disposed with respect to the first cylindrical portion (processing reference surface) CY1. Specifically, the barrel mechanism DRM3 is configured such that two second cylindrical portions CY21, CY22 are disposed with respect to the first cylindrical portion CY1. In the present embodiment, the first cylindrical portion CY1 and the second cylindrical portions CY21, CY22 are formed as different cylindrical members (for example, the first cylindrical member C1 and the second cylindrical members C21, C22).

The barrel mechanism DRM3 is configured such that two second cylindrical members C21 and C22 are disposed on the +Z side of the first cylindrical member C1. The two second cylindrical members C21 and C22 are formed, for example, by the same diameters D4 and D5. The diameter D3 of the first cylindrical member C1 is formed to be larger than the equal diameters D4 and D5.

As shown in FIG. 10, the first cylindrical member C1 and the second cylindrical members C21 and C22 are disposed in a state of being separated in the Z direction. The end surface C1a on the +Z side of the first cylindrical member C1 and the end faces C21a and C22a on the -Z side of the second cylindrical members C21 and C22 oppose each other. The first cylindrical member C1 and the second cylindrical members C21, C22 respectively have individual rotation axes SF1 and SF21, SF22. The rotation axis SF1, the rotation axis SF21, and the rotation axis SF22 are disposed in parallel to each other. The rotation drive mechanism ACT3 can control the first cylindrical member C1 and the second cylindrical members C21 and C22 to rotate independently.

According to the configuration shown in Fig. 10, the sheet-like substrate FB, for example, the guide roller R31, is wound and suspended in the first cylindrical portion CY1, and transmitted through the guide rollers R32 and R33 as the conversion portions (additional guide rollers are provided as necessary) Guided to the second cylindrical portion CY2 in the upper portion of the Z direction. The sheet substrate FB that has been wound and suspended by the second cylindrical portion CY2 is wound around the second cylindrical portion CY22 through the guide roller R34, and then guided through the guide roller R35. In the configuration shown in Fig. 10, the first cylindrical member C1 is disposed on the -Z side, and the second cylindrical members C21 and C22 are disposed on the +Z side. However, the present invention is not limited thereto, and the first cylindrical member C1 is disposed at +Z. On the side, the second cylindrical members C21 and C22 may be disposed on the -Z side.

(Seventh embodiment)

Next, a seventh embodiment of the present invention will be described. In the present embodiment, the configuration of the tub mechanism is different from that of the above-described embodiment. Therefore, the configuration of the tub mechanism will be mainly described. Fig. 11 is a perspective view showing the configuration of the tub mechanism DRM4 of the present embodiment.

As shown in Fig. 11, the tub mechanism DRM4 of the present embodiment is provided with a first cylindrical member C1, a second cylindrical member C2, and a third cylindrical member C3. The first cylindrical member C1, the second cylindrical member C2, and the third cylindrical member C3 are arranged in three stages in the Z direction. In the present embodiment, the sheet substrate FB is cradle on the outer circumferential surface of the first cylindrical member C1, that is, the first cylindrical portion CY1, the second cylindrical member CY2, and the second cylindrical portion CY2, and the third surface. A series of processing processes are applied to the outer peripheral surface of the cylindrical member C3, that is, the third cylindrical portion CY3.

The first cylindrical member C1, the second cylindrical member C2, and the third cylindrical member C3 are It is configured in a state of being separated in the Z direction. Adjacent end faces of the first cylindrical member C1, the second cylindrical member C2, and the third cylindrical member C3 face each other. The rotating shaft SF is coaxially arranged between the first cylindrical member C1, the second cylindrical member C2, and the third cylindrical member C3 (the same position in the XY plane).

The first cylindrical member C1, the second cylindrical member C2, and the third cylindrical member C3 are formed to have the same diameter, for example. The tub mechanism DRM4 has a rotary drive mechanism ACT4. The rotation drive mechanism ACT4 may be configured such that the three cylindrical members C1, C2, and C3 are integrally rotated, or may be driven to rotate individually, for the first cylindrical member C1 and the second cylindrical member C2, respectively. The composition of independent rotation is also possible. Further, the rotation drive mechanism ACT4 may be configured to forcibly rotate only one of the three cylindrical members C1, C2, and C3 by a motor or the like.

According to the configuration shown in Fig. 11, the sheet-like substrate FB, for example, the guide roller R41, is wound and suspended in the first cylindrical portion CY1, and guided to the second cylindrical portion CY2 through the guide rollers (conversion portions) R42 to R45. . The sheet substrate FB wound around the second cylindrical portion CY2 is guided to the third cylindrical portion CY3 through the guide rollers (converting portions) R46 to R49. The sheet substrate FB wound around the third cylindrical portion CY3 is guided through the guide roller R50. As described above, in the present embodiment, the rewinding of the sheet substrate FB between the first cylindrical portion CY1 and the second cylindrical portion CY2 is between the second cylindrical portion CY2 and the third cylindrical portion CY3. Since the configuration is repeated in the same manner, the processing procedure using the tub mechanism DRM4 can be further increased in density (the reduction in the bottom area of the processing device).

The technical scope of the present invention is not limited to the above-described embodiments, and may be appropriately modified without departing from the spirit and scope of the invention.

For example, in the above-described embodiment, it is assumed that the processing and processing of the sheet substrate are performed at the positions of the three cylindrical portions CY1, CY2, and CY3, respectively, but for example, from the first cylindrical portion CY1 to the second cylindrical portion CY2. The sheet substrate FB may not be processed. Also, having the merit as a direction conversion unit It is also possible to perform processing on the sheet substrate at the position where the roller can be guided.

As shown in FIG. 12, the sheet substrate FB guided to the tub mechanism DRM5 by the guide roller R51 is wound and suspended in the first cylindrical portion CY1, guided by the guide roller R52, and then guided to the second cylindrical portion. On the path of CY2, the winding is suspended, for example, by a guide roller R53 whose rotation axis is arranged horizontally (parallel to the XY plane). Here, for example, a heating device (a barrel for heating and drying) for heating the sheet substrate FB may be provided in the guide roller R53. That is, the guide roller R53 can be configured as a heating tub. In this case, the portion of the sheet substrate FB that is wound and suspended from the guide roller R53 is heated. As shown in FIG. 12, the guide roller R53 is placed in the erected state in order to feed the sheet-like substrate FB fed from the guide roller R52 in an upright state to the guide roller R54.

For example, in the case where a coating device or the like is used as the processing device 40 in the tub mechanism DRM5, it is preferable to perform drying treatment or the like on the sheet-form substrate FB after the coating treatment, but in this case, the guide roller (heat treatment) The rotating drum) R53 is wound around the sheet substrate one time after the suspension coating step and used in the drying step. The sheet substrate FB after the drying process is guided to the second cylindrical portion CY2 through, for example, the guide roller R54, wound around the second cylindrical portion CY2, and guided by the guide roller R55.

In the above description, the configuration in which the sheet substrate FB is transported in an upright state is described as an example, but the invention is not limited thereto. For example, in at least one of the tub mechanism DRM and the processing drum 32, the processed surface Fp of the sheet substrate FB is conveyed in a state of being perpendicular or inclined with respect to the horizontal plane, and transported to at least one of the tub mechanism DRM and the processing drum 32. In the path, the processed surface Fp of the sheet substrate FB may be disposed substantially parallel to the horizontal plane. Further, in the transport path of the sheet substrate FB, the state in which the sheet substrate FB is erected and the state in the lateral direction may be combined.

In addition, in the case where the sheet substrate FB is conveyed or processed in a state of being inclined at a predetermined angle with respect to the horizontal plane (XY plane) in a non-horizontal posture, for example, the cylinder of the barrel mechanism FD is made. The rotation center axis of the member CYL, the process roller 32, the guide rollers R1, R2, R6, R7, R8 and the like may be inclined with respect to the Z direction.

The technical scope of the present invention is not limited to the above-described embodiments, and may be appropriately modified without departing from the spirit and scope of the invention.

For example, in addition to the configuration of the above-described embodiment, the conveying device 30 shown in Figs. 1, 2, 5, and 6 has an adjustment sheet substrate in addition to the guide rollers R101 to R106 and the processing rollers 31 and 32. The position adjustment roller of the FB posture can also be used.

This posture adjustment roller can be disposed, for example, on the upstream side of the conveyance path processing device 40 of the sheet substrate FB. Further, the posture adjustment roller may be disposed immediately before the processing device 40, for example. The posture adjusting roller is disposed such that the central axis is parallel to the Z direction and is movable in the X direction, the Y direction, and the Z direction. Further, the posture adjustment roller is disposed such that, for example, the central axis is inclined with respect to the Z-axis direction. In this case, the posture of the sheet substrate FB can be adjusted by, for example, changing the inclination or position of the posture adjusting roller. Further, the guide roller or the process roller and the process transport roller may be configured as a posture adjustment roller.

In the above-described embodiment, the processing drum 31 and the processing drum 32 are formed in a cylindrical shape as an example, but the shape is not limited to a cylindrical shape. For example, the shape of the processing drum 31 may be an elliptical or polygonal column, or a curvature surface may be formed on a part of the surface of the processing drum 31. In this case, it is preferable that the processing drum 31 and the processing drum 32 are fixed so that the sheet substrate FB slides on the surfaces of the processing drums 31, 32 in a contact or non-contact manner.

Further, the cylindrical member CYL of the tub mechanism DRM is similarly not limited to the cylindrical member. example For example, instead of the cylindrical member CYL, when each processing device 40 processes the processed surface of the sheet substrate, a guiding member formed with a guiding surface capable of guiding the surface to be processed with a curvature surface or formed with energy is formed. The guiding member that guides the guiding surface of the surface to be processed flatly may also be used. Further, in the case of using the guiding member, it is preferable to slide the sheet substrate FB in a contact or non-contact manner.

In addition, a tip piece having a thickness equal to the thickness of the sheet substrate FB and having a higher rigidity than the sheet substrate may be adhered to the front end of the sheet-like substrate FB provided in the substrate supply portion SU. As described above, when the reel of the new sheet substrate FB is attached to the substrate supply unit SU, the sheet substrate can be automatically loaded into the processing apparatus FPA4.

In the above description, the configuration in which the sheet substrate FB is transported in an upright state is described as an example, but the invention is not limited thereto. For example, in at least one of the processing drum 31 and the processing drum 32, the processed surface Fp of the sheet substrate FB is conveyed in a state of being perpendicular or inclined with respect to the horizontal plane, and is conveyed to at least one of the processing drum 31 and the processing drum 32. In the path, the processed surface Fp of the sheet substrate FB may be disposed substantially parallel to the horizontal plane. Further, in the transport path of the sheet substrate FB, the state in which the sheet substrate FB is erected and the state in the lateral direction may be combined.

In addition, the processing drum 31 and the processing drum are disposed in a state in which the sheet substrate FB is conveyed or processed in a state of being inclined at a predetermined angle with respect to the horizontal plane (XY plane) in a non-horizontal posture, for example, the processed surface Fp of the sheet substrate FB. 32. The center axis of rotation of the guide rollers R101, R102, R103, R104, R8, etc. may be inclined with respect to the Z direction.

FB‧‧‧Flake substrate

SU‧‧‧Substrate Supply Department

PB‧‧‧protective substrate

PR‧‧‧Substrate Processing Department

CL‧‧‧Substrate Recycling Department

CONT‧‧‧Control Department

Fp‧‧‧ processed surface

41‧‧‧cleaning device

41A‧‧‧First cleaning device

41B‧‧‧Second cleaning device

42‧‧‧TFT layer forming device

42A‧‧‧First forming device

42B‧‧‧Second forming device

42C‧‧‧ third forming device

43‧‧‧Drying device

44‧‧‧Preparation processing equipment

44A‧‧‧First processing unit

44B‧‧‧Second processing unit

44C‧‧‧ Third processing unit

45‧‧‧Lighting layer forming device

45A‧‧‧First forming device

45B‧‧‧Second forming device

45C‧‧‧ third forming device

46‧‧‧Laminating device

FPA4‧‧‧ substrate processing device

R101~R106‧‧‧ Guide roller

11,13,21‧‧‧Axis components

12,14,22‧‧‧Support

30‧‧‧Transporting device

31,32‧‧‧Processing roller

Claims (11)

A substrate processing apparatus that processes a sheet-shaped substrate having a flexible long strip, and includes: a first processing device that applies a first process to the sheet substrate conveyed in the long-band direction; and a second processing device The first processing device is disposed so as to be shifted in a direction intersecting the transport direction of the sheet substrate, and the second processing is applied to the sheet substrate. The third processing device includes two rows of the sheet substrate. Carrying in the discharge unit together with the interval therebetween, and applying a third process to the sheet substrate after the first process or the sheet substrate after the second process; and the transfer device includes the first transfer The sheet substrate is conveyed in the long strip direction so that the sheet substrate passes the first processing device toward the third processing device, and the second substrate passes through the third processing device Then, the sheet substrate is conveyed in the long strip direction toward the second processing device, and the third transport unit is directed toward the third processing device after passing through the second processing device. Transfer the sheet substrate to the long strip direction The substrate processing apparatus according to the first aspect of the invention, wherein the first processing device and the second processing device are disposed so as to be shifted from the upper and lower directions in the direction in which the sheet substrate is conveyed. The substrate processing apparatus according to the second aspect of the invention, wherein the loading/discharging unit of the third processing apparatus includes a first loading port into which the sheet-shaped substrate after the first processing is carried and a first row in which the sheet substrate is discharged The second inlet port of the sheet substrate after the second processing and the second discharge port for discharging the sheet substrate are discharged, and the first transfer port and the second transfer port are disposed in the vertical direction, and the first port is placed The discharge port and the second discharge port are disposed in the vertical direction. The substrate processing apparatus according to any one of the first to third aspects of the present invention, wherein the first processing apparatus is configured to support the processed surface of the sheet substrate in a cylindrical shape a first cylindrical member that moves in the direction of the elongate direction, and a first processing unit that is disposed around the first cylindrical member and performs the first process; and the second processing device includes a processed surface on which the sheet substrate is to be processed A second cylindrical member that is supported in a cylindrical shape and that is movable in the longitudinal direction, and a second treatment portion that is disposed around the second cylindrical member and performs the second treatment. The substrate processing apparatus according to claim 4, wherein the first cylindrical member and the second cylindrical member are arranged side by side in the vertical direction, and are configured by a rotary tub that is rotatable about a central axis. The substrate processing apparatus according to the second aspect of the invention, wherein the transport path in the long-band direction of the sheet substrate formed by each of the first transport unit, the second transport unit, and the third transport unit is a plurality of guiding rollers for converting a conveying direction of the sheet substrate; at least two guiding rollers of the plurality of guiding rollers are disposed in a vertical direction of the first processing device and the second processing device It is disposed such that the transport path of the sheet substrate is displaced in the vertical direction. The substrate processing apparatus according to any one of claims 1 to 6, wherein the third processing performed by the third processing apparatus is a process of drying the sheet substrate or heating to a predetermined temperature. . A substrate processing method for performing a plurality of processes on a sheet substrate while transporting a flexible substrate strip in a long strip direction, including: in the first step, transporting the sheet substrate to the first step 1 processing device, and the sheet substrate is The processing surface is subjected to the first processing; in the second step, the sheet substrate is transferred to the second processing device, and the second processing is performed on the processed surface of the sheet substrate that has been subjected to the first processing; and the third step is The sheet-form substrate after the first process and the sheet-form substrate after the second process are transported to a third processing device including a loading/discharging unit through which the two sheets of the sheet-like substrate can pass together, and The processed surface of the sheet substrate is subjected to a third process; and the transporting step is performed in the order of the first processing device, the third processing device, the second processing device, and the third processing device The substrate is conveyed to a conveying device in the long belt direction, and the sheet substrate is conveyed. The substrate processing method according to the eighth aspect of the invention, wherein the third processing performed by the third processing apparatus is a process of drying the sheet substrate or heating to a predetermined temperature. The substrate processing method according to claim 9, wherein the first processing device and the second processing device are disposed so as to be shifted from the upper and lower directions in the direction in which the sheet substrate is conveyed. The substrate processing method according to claim 10, wherein a plurality of guides for switching a conveying direction of the sheet substrate are provided in a conveying path of the sheet substrate formed by the conveying device in a long belt direction a guide roller for transporting the sheet substrate by at least two guide rollers of the plurality of guide rollers so that the first processing device and the second processing device are arranged in a vertical direction Shift in the up and down direction.