KR101756628B1 - Substrate processing device - Google Patents

Abstract

A substrate feeding portion for feeding the substrate in a state in which the substrate is formed in a short direction and a conveying portion for conveying the substrate supplied from the substrate feeding portion in a standing state and a conveying portion for conveying the substrate by the conveying portion A substrate processing unit having a plurality of processing units for performing a process on a surface to be processed of a substrate in a standing state and a substrate recovery unit for recovering the substrate in a state in which the substrate is processed by the substrate processing unit.

Description

[0001] SUBSTRATE PROCESSING DEVICE [0002]

The present invention relates to a substrate processing apparatus.

The present application claims priority based on U.S. Provisional Application No. 61/322347, filed on April 9, 2010, and U.S. Provisional Application No. 61/322417, filed on April 9, 2010, the contents of which are incorporated herein by reference.

BACKGROUND ART As display elements constituting a display device such as a display device, there are known liquid crystal display elements, organic electroluminescence (EL) elements, electrophoretic elements used in electronic paper, and the like. At present, as a display element of these, a switching element, an amplifying element or a current driving element called a thin film transistor (TFT) is formed on the substrate surface, and an active display element Active display devices) have become mainstream.

Recently, a technique for forming a display element on a sheet-like substrate (e.g., a film member or the like) has been proposed. As such a technique, for example, a technique called a roll-to-roll process (hereinafter simply referred to as "roll process") is known (see, for example, Patent Document 1). In the roll method, a substrate (for example, a strip-shaped film member) wound around a supply roller on a substrate supply side is fed, and the substrate is transported while the transported substrate is wound around a return roller on the substrate recovery side.

Then, while the substrate is transported by using, for example, a plurality of transport rollers or the like, until the substrate is fed out and wound up, a plurality of processing devices are used to form a gate electrode, a gate insulating film, , Source and drain electrodes, and the like, and the constituent elements of the display element are sequentially formed on the surface of the substrate to be processed. For example, in the case of forming an organic EL device, a light emitting layer, a cathode, a cathode, an electric circuit and the like are sequentially formed on a substrate.

Patent Document 1: International Publication No. 2006/100868 pamphlet

However, in the above-described method, since it is necessary to dispose the processing device along the conveying path of the substrate, the entire apparatus becomes larger in size depending on, for example, the conveying mode of the substrate.

An aspect of the present invention is to provide a substrate processing apparatus capable of saving space.

A substrate processing apparatus according to one aspect of the present invention is a substrate processing apparatus for carrying a substrate formed in a strip shape in a longitudinal direction and processing a surface to be processed of the substrate in a state in which a short direction of the substrate crosses a horizontal direction, A substrate processing apparatus comprising: a substrate supply section for supplying a substrate; a transfer section for transferring the substrate supplied from the substrate supply section in an intersecting manner; and a transfer section for transferring the substrate A substrate processing section having a plurality of processing sections for carrying out processing with respect to the rear surface, and a substrate collecting section for collecting the substrates that have been processed by the substrate processing section in the crossed state.

A substrate processing apparatus according to one aspect of the present invention is a substrate processing apparatus for carrying a substrate formed in a strip shape in the longitudinal direction and processing a surface to be processed of the substrate, comprising: a support mechanism having a first support portion and a second support portion; A first transfer mechanism for transferring the substrate to the first supporting portion, a conversion portion for converting the conveying direction of the substrate toward the second supporting portion after the surface to be processed of the substrate is transferred to the first supporting portion, A first processing unit that performs a first process on an object surface supported by the first support unit of the substrate; and a second processing unit that performs a second process on an object surface supported by the second support unit of the substrate.

According to the aspect of the present invention, it is possible to provide a substrate processing apparatus capable of saving space.

1 is a perspective view showing a configuration of a substrate processing apparatus according to a first embodiment;
2 is a plan view showing a configuration of a substrate processing apparatus according to the embodiment;
3 is a plan view showing a configuration of a substrate processing apparatus according to a second embodiment;
4 is a plan view showing a configuration of a substrate processing apparatus according to the third embodiment;
5 is a perspective view showing a configuration of a substrate processing apparatus according to a fourth embodiment;
6 is a plan view showing a configuration of a substrate processing apparatus according to the embodiment;
7 is a plan view showing a configuration of a substrate processing apparatus according to the embodiment;
8 is a plan view showing a configuration of the substrate processing apparatus according to the embodiment.
9 is a perspective view showing a configuration of a substrate processing apparatus according to a fifth embodiment;
10 is a plan view showing a configuration of a substrate processing apparatus according to a sixth embodiment;
11 is a plan view showing a configuration of a substrate processing apparatus according to a seventh embodiment;
12 is a plan view showing a configuration of a substrate processing apparatus according to another embodiment;

[First Embodiment]

Next, a substrate processing apparatus according to the first embodiment will be described. 1 is a perspective view showing a configuration of a substrate processing apparatus (FPA4) of the present embodiment. 2 is a plan view showing a configuration of the substrate processing apparatus FPA4.

1 and 2, the substrate processing apparatus FPA includes a substrate supply section SU for supplying a sheet substrate (for example, a strip-shaped film member FB) A chamber CB (not shown in Fig. 1) for accommodating the substrate processing unit PR, a substrate recovery unit CL for recovering the sheet substrate FB, And a control unit CONT for controlling each of these units. The substrate processing apparatus (FPA) is installed in, for example, a factory. In the present embodiment, the sheet substrate FB is supplied in a raised state, processed and recovered. In the present embodiment, the upright state is a state in which the surface to be processed Fp of the sheet substrate FB is crossed at a predetermined angle with respect to the horizontal plane (XY plane), for example, State. In other words, the state in which the substrate-processed surface Fp of the sheet substrate FB is held includes a state in which the short side direction (short direction) of the substrate FB is in a non-horizontal (non-horizontal) posture.

In the following description, the XYZ orthogonal coordinate system is set, and the positional relationship of the respective members is described with reference to this XYZ orthogonal coordinate system. More specifically, the predetermined direction on the horizontal plane is the X-axis direction, the direction orthogonal to the X-axis direction on the horizontal plane is the Y-axis direction, and the vertical direction is the Z-axis direction. The directions of rotation (inclination) around the X-axis, Y-axis, and Z-axis are θX, θY, and θZ directions, respectively.

In the embodiment, a case where the substrate-processed surface Fp of the sheet substrate FB is substantially perpendicular to the horizontal plane will be described as an example.

The substrate processing apparatus FPA has a function of holding the sheet substrate FB in a roll state after the sheet substrate FB wound in a roll form is fed from the substrate feed unit SU and the sheet substrate FB is recovered in a roll form by the substrate collecting unit CL (Hereinafter simply referred to as " roll system ") for performing various processes on the surface of the sheet substrate FB. The substrate processing apparatus FPA can be used in the case of forming display elements (electronic devices) such as organic EL elements and liquid crystal display elements on the sheet substrate FB. Of course, a substrate processing apparatus (FPA) may be used in the case of forming elements other than these elements.

As the sheet substrate FB to be processed in the substrate processing apparatus (FPA), for example, a foil (foil) such as resin film or stainless steel can be used. For example, the resin film may be formed of a resin such as polyethylene resin, polypropylene resin, polyester resin, ethylene vinyl copolymer resin, polyvinyl chloride resin, cellulose resin, polyamide resin, polyimide resin, polycarbonate resin, polystyrene resin, A resin or the like can be used.

The dimension of the sheet substrate FB in the short side direction is, for example, about 50 cm to 2 m, and the dimension of the long side direction (longitudinal direction) is, for example, 10 m or more. Of course, this dimension is merely an example, and the present invention is not limited thereto. For example, the dimension of the sheet substrate in the short direction may be 50 cm or less, and it may be 2 m or more. The size of the sheet substrate FB in the longitudinal direction may be 10 m or less.

The sheet substrate FB has a thickness of, for example, 1 mm or less and is formed to have flexibility. Here, the flexibility refers to a property that, for example, a predetermined force of at least its own weight is applied to the substrate, not breaking or breaking the substrate, but bending the substrate. Also, for example, the property of bending by the predetermined force is included in the flexibility. The flexibility depends on the material, size, thickness, temperature, etc. of the substrate, and the like. As the sheet substrate FB, one strip-shaped substrate may be used, but a configuration in which a plurality of unit substrates are connected and formed in a band shape may be employed.

It is preferable that the sheet substrate FB has a small coefficient of thermal expansion so that the dimension does not substantially change even if it receives heat of, for example, about 200 캜. For example, an inorganic filler may be mixed with a resin film to reduce the thermal expansion coefficient. Examples of the inorganic filler include titanium oxide, zinc oxide, alumina, silicon oxide and the like.

The substrate supply section SU has a supply port 10 (not shown in FIG. 1), a shaft member 11 and a support section 12 disposed in the supply port 10. The shaft member 11 is formed, for example, in a columnar shape, and is arranged so that its central axis is, for example, substantially parallel to the Z direction. Therefore, the sheet substrate FB is wound on the shaft member 11 in a standing state. The shaft member 11 is detachably provided to the support portion 12, for example. The support portion 12 rotatably supports the shaft member 11 in the circumferential direction (e.g., the? Z direction). The substrate supply section SU is a state in which the sheet substrate FB wound, for example, in the form of a roll is placed in a state in which the short side direction of the sheet substrate FB is set, that is, in a state coinciding with the Z direction FB) to the substrate processing unit PR in a non-horizontal posture).

The supply port 10 is provided with a shaft member 13 on which a protective substrate PB for protecting the surface Fp of the sheet substrate FB is wound. Further, the shaft member 13 provided in the supply port 10 may be referred to as a protective substrate supply portion. The protective substrate PB is a substrate to be bonded to the sheet substrate FB before being recovered by the substrate recovery unit CL after the processing in the substrate processing unit PR is completed. Like the sheet substrate FB, the protective substrate PB is formed in a band shape, for example, and has a flexible structure. The shaft member 13 is formed, for example, in a cylindrical shape, and is arranged so that its central axis is, for example, substantially parallel to the Z direction. Therefore, the protection substrate PB is wound on the shaft member 13 in a standing state. The shaft member 13 is rotatably supported by the support portion 14 in the circumferential direction (e.g., the? Z direction). The shaft member 13 is detachably provided to the support portion 14, for example. The substrate supply unit SU supplies the substrate S to the substrate processing unit PR in a state where the protective substrate PB is standing up.

The substrate recovery section CL is configured such that the sheet substrate FB conveyed from the substrate processing section PR in a state in which the protective substrate PB is stuck is held in a state in which the short side direction of the sheet substrate FB and the protective substrate PB is maintained And recovered. The recovery port 20 (not shown in FIG. 1) of the substrate recovery section CL is provided with a shaft member 21 for winding the sheet substrate FB and the protective substrate PB similarly to the substrate supply section SU, And a support portion 22 for rotatably supporting the shaft member 21 is provided. The shaft member 21 is detachably provided to the support portion 22, for example.

The supply port 10 of the substrate supply section SU and the recovery port 20 of the substrate recovery section CL are disposed outside the chamber CB that houses the substrate processing section PR, for example. The supply port 10 and the recovery port 20 are arranged on the -Y side surface of the chamber CB and arranged in the X direction with respect to the substrate processing section PR, for example. Since the supply port 10 and the recovery port 20 are collectively arranged at one location as described above, access to the supply port 10 and the recovery port 20 can be efficiently performed have.

The substrate processing section PR transports the sheet substrate FB fed from the substrate feeding section SU to the substrate collecting section CL in a standing state, (Fp). The substrate processing section PR has, for example, a transport apparatus 30 such as a transport mechanism, a processing apparatus 40, and an alignment apparatus (not shown). The substrate processing section PR is accommodated in the clean room CB controlled for air conditioning, and is managed so that the environmental temperature and the environmental humidity are kept constant, and each of the devices is protected from dust or the like.

As shown in Figs. 1 and 2, the carrying apparatus 30 has a plurality of (for example, six) guide rollers R101 to R106 and two treatment rollers 31 and 32. [ The guide rollers R101 to R104 guide the sheet substrate FB from the substrate supply section SU to the substrate collection section CL. The guide rollers R105 and R106 guide the protective substrate PB in a path different from the sheet substrate FB from the substrate supply section SU to the substrate recovery section CL.

The guide rollers R101 to R106 are arranged such that, for example, the rotation axis is substantially parallel to the Z-axis direction. Therefore, in the guide rollers R101 to R104, the sheet substrate FB is hooked in a standing state (as described above, a substantially non-horizontal posture direction of the substrate FB). Further, in the guide rollers R105 and R106, the protective substrate PB is held in a standing state. The guide rollers R101 to R106 may be of a structure provided with, for example, a drive mechanism. The guide rollers R101 to R104 are provided on the outer circumferential surfaces of the guide rollers R101 to R104 so that the surface Fp of the sheet substrate FB is wound, A layer forming apparatus may be provided. With such a configuration, the sheet substrate FB is fed with at least a predetermined tension between the guide rollers R101 to R104.

The treatment rollers 31 and 32 are arranged, for example, in the guide path of the sheet substrate FB by the guide rollers R101 to R104. The treatment rollers 31 and 32 are arranged so that the positions in the Y direction in the chamber CB are the same. In the present embodiment, for example, the processing rollers 31 and 32 are disposed together in a substantially central portion in the Y direction in the chamber CB.

The treatment rollers 31 and 32 are each formed into a cylindrical shape (for example, a drum shape having a diameter of 1 to several meters). The treatment rollers 31 and 32 are arranged such that, for example, the central axis is substantially parallel to the Z direction, and the sheet substrate FB is held in a standing state. The treatment rollers 31 and 32 are formed to have a larger diameter than, for example, the guide rollers R101 to R104.

The treatment rollers 31 and 32 are respectively provided at a position between a supply port SUa connected to the substrate supply section SU and a recovery port CLa connected to the substrate recovery section CL. More specifically, the treatment roller 31 is disposed on the -X side of the supply port SUa, and the treatment roller 32 is disposed on the + X side of the recovery port CLa.

In the conveying direction of the sheet substrate FB in the substrate processing section PR is firstly carried out in the + Y direction from the supply port SUa and then in the -X direction (on the -Y side) by the guide roller R101 45 DEG inclined). The sheet substrate FB passed through the guide roller R101 is folded by the processing roller 31 and the conveying direction is changed in the + X direction. The conveying direction of the folded sheet substrate FB in the + X direction from the processing roller 31 is switched by the guide roller R102 in the + Y direction and is fed by a part of the processing device 40 The transport direction is changed to the -Y direction. The sheet substrate FB passed through the preliminary processing device 44 is conveyed in the + X direction by the guide roller R103 and is folded by the processing roller 32 in the -X direction The direction of the image is changed). The conveying direction of the sheet substrate FB via the processing roller 32 is changed in the -Y direction by the guide roller R104 and is conveyed to the recovery port CLa. Thus, the conveying device 30 conveys the sheet substrate FB while frequently changing the conveying direction in the X and Y directions in the chamber CB.

The processing apparatus 40 is an apparatus for forming, for example, an organic EL element on the surface Fp of the sheet substrate FB. In the present embodiment, for example, a cleaning apparatus 41, a TFT layer forming apparatus 42, a drying apparatus (drying section 43), a preliminary processing apparatus 44, a light emitting layer A device 45, a lamination device 46, and the like are used. In addition, other devices such as a partition forming device (not shown) for forming a partition on the surface to be processed Fp may be provided.

Examples of the type of the processing apparatus 40 include a film forming apparatus such as a droplet applying apparatus (for example, an ink jet type applying apparatus, a screen printing type applying apparatus, etc.), a vapor deposition apparatus, a sputtering apparatus, , A developing device, a surface modifying device, and a cleaning device are used. Each of these devices is suitably provided on, for example, a conveyance path of the sheet substrate FB.

The cleaning device 41 has a first cleaning device 41A for cleaning the sheet substrate FB and a second cleaning device 41B for cleaning the protective substrate PB. The first cleaning device 41A is provided between the supply port SUa (see FIG. 2) and the processing roller 31 in the conveying path of the sheet substrate FB, for example. The second cleaning device 41B is provided between the supply port SUb and the laminating device 46 in the transport path of the protective substrate PB, for example. The cleaning device 41 cleans the sheet substrate FB and the protective substrate PB supplied from the outside of the chamber CB to the inside.

The TFT layer forming apparatus 42 is a device for forming TFT elements and electrodes for driving organic EL elements. The TFT layer forming apparatus 42 has, for example, a first forming apparatus 42A, a second forming apparatus 42B, and a third forming apparatus 42C. The first forming device 42A is disposed on the -Y side of the processing roller 31. [ The second forming device 42B is disposed on the -X side of the processing roller 31. [ The third forming device 42C is disposed on the + Y side of the processing roller 31. [ The + X side of the treatment roller 31 is in an empty state, for example, a guide roller R101 is disposed.

The first forming device 42A, the second forming device 42B and the third forming device 42C are provided around the processing roller 31, for example. The series of steps for forming the TFT element and the electrodes are performed by the first forming device 42A, the second forming device 42B and the third forming device 42C, for example.

The first forming device 42A, the second forming device 42B and the third forming device 42C are disposed on the sheet substrate FB wound on the processing roller 31 in the standing state, Can be processed. The processing roller 31 is a supporting portion for supporting the sheet substrate FB when the processing by the TFT layer forming device 42 is performed.

The drying device 43 is a device for stabilizing TFT elements and electrodes formed on the sheet substrate FB by, for example, heating the sheet substrate FB. The drying device 43 is disposed between the processing roller 31 and the processing roller 32 in the conveying path of the sheet substrate FB. The drying device 43 is arranged so as to partially overlap the treatment roller 31 and the treatment roller 32, for example, as viewed in the Y direction.

1 and 2, the preliminary machining apparatus 44 is a device for performing a preliminary process (for example, an insulating layer forming process) when forming a light emitting layer on a sheet substrate FB. The preliminary processing device 44 is arranged between the processing roller 31 and the processing roller 32 together with the drying device 43 in the conveying path of the sheet substrate FB. The preliminary machining device 44 has, for example, a first machining device 44A, a second machining device 44B, and a third machining device 44C, and a series of preliminary machining steps are performed in a shared manner .

The light emitting layer forming device 45 is a device for forming a light emitting layer constituting the organic EL device. The light emitting layer forming device 45 has, for example, a first forming device 45A, a second forming device 45B and a third forming device 45C. The first forming apparatus 45A, the second forming apparatus 45B and the third forming apparatus 45C are provided around the processing roller 32, for example. The series of steps for forming the light emitting layer is performed by the first forming device 45A, the second forming device 45B and the third forming device 45C, for example.

The first forming apparatus 45A is disposed on the + Y side of the processing roller 32. [ The second forming device 45B is disposed on the + X side of the processing roller 32. [ The third forming apparatus 45C is disposed on the -Y side of the processing roller 32. [ The -X side of the processing roller 32 is in an empty state, and for example, a guide roller R104 is disposed.

The laminate device 46 is a device for bonding the sheet substrate FB and the protection substrate (protection member, PB). The laminate device 46 is disposed, for example, between the processing roller 32 and the recovery port CLa in the conveying path of the sheet substrate FB. The laminate device 46 is constituted by arranging a protective substrate PB on the side of the object side Fp of the sheet substrate FB so as to face the sheet substrate FB and the protective substrate PB And then the sheet substrate FB and the protective substrate PB are bonded to each other.

The first cleaning device 41A, the second cleaning device 41B, and the light-emitting layer forming device 42A of the TFT layer forming device 42 among the above- And the third forming device 45C of the second forming device 45 are arranged so as to overlap in the X direction. The second forming device 42B of the TFT layer forming device 42, the processing roller 31, the processing roller 32 and the second forming device 45B of the light emitting layer forming device 45 are arranged in the X direction As shown in Fig. The third forming device 42C of the TFT layer forming device 42, the drying device 43 and the first forming device 45A of the light emitting layer forming device 45 are arranged so as to overlap in the X direction .

The first forming device 42A of the TFT layer forming device 42, the processing roller 31 and the third forming device 42C are arranged so as to overlap in the Y direction. Further, for example, the cleaning devices 41A and 41B and the drying device 43 are arranged so as to overlap in the Y direction. Further, the preliminary machining apparatus 44 and the lamination apparatus 46 are arranged so as to overlap in the Y direction. In addition, the first forming device 45A of the light emitting layer forming device 45, the treating roller 32 and the third forming device 45C are arranged so as to overlap in the Y direction. As described above, the transport apparatus 30 and the processing apparatus 40 are closely arranged so as to overlap with each other when viewed in the X direction and the Y direction.

The substrate processing apparatus FPA configured as described above produces a display element (electronic device) such as an organic EL element or a liquid crystal display element by a roll system under the control of the control unit CONT. Hereinafter, a process for manufacturing a display device using the substrate processing apparatus (FPA) having the above-described structure will be described.

First, a band-shaped sheet substrate FB wound in a roll shape is attached to the shaft member 11 to the support portion 12 in the supply port 10 of the substrate supply portion SU. A strip-shaped protective substrate PB wound around the shaft member 13 is mounted on the support portion 14 in the supply port 10 of the substrate supply portion SU. In addition, the rotation shaft member 21 is mounted on the support portion 22 in the recovery port 20 of the substrate recovery portion CL.

The control unit CONT rotates the shaft member 11 from this state through the support unit 12 and feeds the sheet substrate FB from the substrate supply unit SU. The sheet substrate FB delivered from the substrate supply section SU is supplied from the supply port SUa of the substrate processing section PR into the chamber CB. The control unit CONT causes the processing apparatus 40 to perform processing on the sheet substrate FB while feeding the sheet substrate FB fed into the chamber CB to the conveying apparatus 30. [ In the present embodiment, the control section CONT controls the rotation of the respective motors R111 to R106 so that a predetermined tension is applied to the sheet substrate FB by the rotation drive motor suitably provided on the processing rollers 31 and 32 and the rollers R101 to R106. Respectively.

With this operation, the sheet substrate FB fed to the substrate processing portion PR is cleaned by the first cleaning device 41A and guided to the treatment roller 31 by the guide roller R101. The sheet substrate FB is processed such that the processed surface Fp is directed to the first forming device 42A, the second forming device 42B and the third forming device 42C of the TFT layer forming device 42 And is wound around the roller 31 in a standing state. TFT elements, wirings, and the like are formed on the surface Fp of the sheet substrate FB wound around the processing roller 31 by the TFT layer forming device 42. [

The sheet substrate FB passed through the processing roller 31 is supplied to the drying device 43 and subjected to drying treatment such as heat treatment. The sheet substrate FB after the drying treatment is supplied to the preliminary processing device 44 through a guide roller R102, for example. In the preliminary processing device 44, for example, an insulating film, a hole injection layer, an electron injection layer, or the like is formed on the sheet substrate FB in the first processing device 44A to the third processing device 44C do.

The preliminarily processed sheet substrate FB is guided to the processing roller 32 through a guide roller R103, for example. The sheet substrate FB is set so that the surface to be processed Fp faces the first forming device 45A, the second forming device 45B and the third forming device 45C of the light emitting layer forming device 45, (32). A light emitting layer or the like is formed on the surface Fp of the sheet substrate FB wound around the processing roller 32 by the light emitting layer forming device 45. [

The sheet substrate FB via the processing roller 32 is supplied to the lamination device 46 and the protective substrate PB is attached to the surface Fp to be processed. The sheet substrate FB after the protection substrate (protection member, PB) is attached is recovered, for example, from the recovery port (CLa) to the substrate recovery section (CL). The sheet substrate FB recovered by the substrate recovery unit CL is rolled into a shaft member 21 in the recovery port 20. The sheet substrate FB is cut on the surface of the sheet member FB on which the sheet member FB is wound on the shaft member 21 and the shaft member 21 on which the sheet substrate FB is wound is removed from the support member 22 . A new shaft member 21 on which the sheet substrate FB is not wound, for example, is mounted on the support portion 22.

The control unit CONT forms devices on the processed surface Fp of the sheet substrate FB by performing such a process.

As described above, according to the present embodiment, the substrate feeding section (SU) for feeding the sheet substrate FB in a state in which the sheet substrate FB formed in a band shape is standing in the short direction, Of the sheet substrate FB in a state in which it is disposed along the conveying path of the sheet substrate FB by the conveying device 30 by the conveying device 30 for conveying the sheet substrate FB in a standing state, A substrate recovery section PR for recovering the sheet substrate FB processed in the substrate processing section PR in a standing state is provided with a substrate processing section PR having a plurality of processing devices 40, It is possible to easily convert the conveying direction of the sheet substrate FB into the horizontal direction (X direction and Y direction).

Therefore, the width of the layout in the X direction and the Y direction of the processing apparatus 40 can be widened. For example, in the processing apparatus 40 such that the apparatus area of the substrate processing apparatus FPA4 is as small as possible, May be selected. As a result, the space saving of the substrate processing apparatus (FPA4) can be achieved.

[Second Embodiment]

Next, a substrate processing apparatus according to a second embodiment of the present invention will be described.

3 is a plan view showing a configuration of the substrate processing apparatus FPA2. In the substrate processing apparatus FPA2, the configuration of the substrate processing unit PR is different from that of the first embodiment. Other configurations may be the same as those of the first embodiment, for example. In the present embodiment, the differences will be mainly described.

3, the substrate processing apparatus FPA2 has a substrate supply unit SU, a substrate processing unit PR, a substrate recovery unit CL, a chamber CB, and a control unit CONT. The substrate processing section PR is accommodated in the chamber CB. The substrate supply unit SU has a shaft member 111 which is formed in a cylindrical shape so that the central axis thereof is parallel to the Z direction and a support portion 112 which rotatably supports the shaft member 111. On the shaft member 111, a sheet substrate FB is wound up in a standing state. For the sake of simplicity, FIG. 3 shows a configuration in which the protective substrate is supplied from the substrate supply unit SU is omitted. The substrate recovery unit CL has a shaft member 121 which is formed in a cylindrical shape so that the central axis thereof is parallel to the Z direction and a support member 122 which rotatably supports the shaft member 121 .

The conveying device 130 of the substrate processing part PR has a treatment conveying roller 131 at the center when viewed in a plane in the chamber CB. The processing conveying roller 131 is formed, for example, in a cylindrical shape, and is arranged so that its central axis is parallel to the Z direction. The processing conveying roller 131 is rotatably provided in, for example, the? Z direction. The sheet substrate FB is hooked on the processing conveying roller 131 in a standing state. In this way, in the substrate processing section PR, the sheet substrate FB is conveyed in a standing state.

The treatment conveying roller 131 has, for example, a rotation drive mechanism not shown. The rotation driving mechanism is controlled by, for example, a control unit CONT. The sheet substrate FB supplied from the supply port SUa is caught by the treatment conveying roller 131 and conveyed to the recovery port CLa. The sheet conveying roller 131 is engaged with the sheet substrate FB so that the surface to be processed Fp is directed to the outside.

A plurality of processing apparatuses 140 are disposed around the processing conveying roller 131 so as to follow the cylindrical surface of the processing conveying roller 131 in the substrate processing unit PR. As the processing apparatus 140, for example, various processing apparatuses described in the first embodiment are used. In the example shown in Fig. 3, as the plurality of processing apparatuses 140, each processing apparatus for performing the TFT layer forming step, each processing apparatus for performing the pre-processing (preliminary processing) of the light-emitting layer forming step, Each processing apparatus is arranged in a line along the circumferential direction of the process conveying roller 131. Each of the plurality of processing apparatuses 140 is directed to the processing conveying roller 131.

In the above-described substrate processing apparatus FPA2, the sheet substrate FB is fed from the substrate supply unit SU to the substrate processing unit PR in a standing state. The sheet substrate FB is conveyed to the substrate collecting section CL by hanging up on the process conveying roller 131 in the substrate processing section PR. Further, the plurality of processing apparatuses 140 sequentially perform processing on the sheet substrate FB hanged on the processing conveying roller 131 in a standing state, for example.

As described above, according to the present embodiment, the processing conveying roller 131 also has a function of supporting the sheet substrate FB wound up in a standing state and a function of conveying the sheet substrate FB in a standing state. As a result, the space saving of the substrate processing apparatus FPA2 can be achieved. In addition, since the entire process is performed around one processing conveying roller 131, the layout of the apparatus in the substrate processing section PR can be simplified.

[Third embodiment]

Next, a substrate processing apparatus according to a third embodiment of the present invention will be described.

4 is a plan view showing a configuration of the substrate processing apparatus FPA3. In the substrate processing apparatus FPA3, the configuration of the substrate processing unit PR is different from that of the first embodiment. Other configurations may be the same as those of the first embodiment, for example. In the present embodiment, the differences will be mainly described.

As shown in Fig. 4, the substrate processing apparatus FPA3 has a configuration in which a plurality of the processing conveying rollers described in the second embodiment are provided in the substrate processing section PR. In the present embodiment, the transport apparatus 230 of the substrate processing section PR has guide rollers R111 to R114 and process transport rollers 231 to 233.

The guide rollers R111 to R114 and the process conveying rollers 231 to 233 are each formed in a cylindrical shape and arranged so that the central axes thereof are parallel to the Z direction. The treatment conveying rollers 231 to 233 are formed so as to have a larger diameter than the guide rollers R111 to R114. The sheet substrate FB is held in a standing state on the process conveying rollers 231 to 233 and the guide rollers R111 to R114. In this way, in the substrate processing section PR, the sheet substrate FB is conveyed in a standing state.

As the arrangement of the conveying device 230, for example, the guide rollers R111 to R114 are arranged in two rows in the vertical direction at almost the center of the chamber CB. The processing conveying rollers 231 to 233 are arranged so as to surround the four guide rollers R111 to R114 in three directions (-X direction, + Y direction and -X direction).

The substrate processing section PR includes a plurality of processing devices 241 to 243 disposed around the processing conveying rollers 231 to 233 so as to follow the cylindrical surfaces of the processing conveying rollers 231 to 233, respectively. As the processing apparatuses 241 to 243, for example, various processing apparatuses described in the first embodiment are used. For example, each processing apparatus for performing the TFT layer forming process is used as the processing apparatus 241, and each processing apparatus for performing the pre-processing (preliminary process) of the light emitting layer forming process is used as the processing apparatus 242, 243) may be used as the light-emitting layer forming process. Each of the processing apparatuses 241 to 243 faces, for example, the processing conveying rollers 231 to 233.

In the substrate processing section PR, the plurality of processing conveying rollers 231 to 233 are formed, for example, in a cylindrical shape and arranged such that the central axis thereof is parallel to the Z direction. The processing conveying roller 131 is rotatably provided in, for example, the? Z direction.

The treatment conveying rollers 231 to 233 have, for example, unillustrated rotation drive mechanisms. The rotation driving mechanism is controlled by, for example, a control unit CONT. The sheet substrate FB supplied from the supply port SUa is caught by the corresponding treatment conveying rollers 231 to 233 and conveyed to the recovery port CLa. The sheet conveying rollers 231 to 233 are hooked on the sheet substrate FB so that the surface to be processed Fp is directed to the outside. On the other hand, on the guide rollers R111 to R114, the sheet substrate FB is engaged so that the surface to be processed Fp is directed inward.

In the above-described substrate processing apparatus FPA3, the sheet substrate FB is fed from the substrate supply unit SU to the substrate processing unit PR in a raised state. The sheet substrate FB is transferred from the substrate processing section PR to the substrate transport section 231 through 233 in a standing state and transported to the substrate transport section CL. The plurality of processing apparatuses 241 to 243 sequentially process the sheet substrates FB stuck on the processing conveying rollers 231 to 233, for example.

As described above, according to the present embodiment, by using the plurality of processing conveying rollers 231 to 233, continuous processing can be performed in a plurality of areas, for example. As a result, the range of selection of the layout becomes wider. In this embodiment, the guide rollers R111 to R114 are arranged at the central portion of the chamber CB. For example, a processing device 244 such as a drying device is provided at the center of the chamber CB The processing such as drying processing of the sheet substrate FB processed by the respective processing conveying rollers 231 to 233 can be made common. Thus, space saving can be achieved.

[Fourth Embodiment]

Hereinafter, a fourth embodiment of the present invention will be described with reference to the drawings. Hereinafter, the components having the same reference numerals as those in the above embodiment will be appropriately omitted.

5 is a perspective view showing a configuration of a substrate processing apparatus (FPA). 6 is a plan view showing a configuration of a substrate processing apparatus (FPA).

In the fourth embodiment, the transport apparatus 30 has a plurality of (for example, ten) guide rollers R1 to R10, a drum mechanism DRM, and a processing roller 32. [ The guide rollers R1 to R8 guide the sheet substrate FB from the substrate supply section SU to the substrate recovery section CL. The guide rollers R9 and R10 guide the protective substrate PB by a path different from the sheet substrate FB from the substrate supply section SU to the substrate collection section CL. The drum mechanism DRM may be the first drum mechanism and the processing roller 32 may be the second drum mechanism.

The guide rollers R1 to R3 and R6 to R10 are arranged such that, for example, the rotation axis is substantially parallel to the Z axis direction. Therefore, in the guide rollers R1 to R3 and R6 to R8, the sheet substrate FB is engaged in a standing state. In the guide rollers R9 and R10, the protective substrate PB is held in a standing state. The guide rollers R1 to R10 may be provided with a drive mechanism, for example. For example, with respect to the guide rollers R1, R4, R7, and R8 on which the surface Fp of the sheet substrate FB is wound, a base layer forming device (not shown) for forming a base layer (air bearing) May be provided. Regardless of the method, in the case of the present embodiment, the sheet substrate FB is fed at least between the guide rollers R1 to R9 while maintaining a predetermined tension.

Fig. 7 is a perspective view showing the configuration of the vicinity of the drum mechanism DRM in the substrate processing section PR.

7, the drum mechanism DRM includes a cylindrical member CYL arranged such that its central axis of rotation is substantially parallel to the Z direction, and a rotation member (not shown) for supporting the cylindrical member CYL in a circumferential direction And has a driving mechanism (driving part, ACT). The cylindrical member CYL has a first cylindrical portion (first roller, CY1), a second cylindrical portion (second roller, CY2), and a guide portion (G).

The first cylindrical portion CY1 and the second cylindrical portion CY2 are part of the cylindrical surface of the corresponding cylindrical member CYL. Since the first cylindrical portion CY1 and the second cylindrical portion CY2 are part of one cylindrical member CYL together, when the cylindrical member CYL rotates, the first cylindrical portion CY1 and the second cylindrical portion CY2, (CY2) are integrally rotated.

The first cylindrical portion CY1 and the second cylindrical portion CY2 are divided in the Z direction by a guide portion G, for example. In other words, the position of the second cylindrical portion CY2 in the Z direction with respect to the first cylindrical portion CY1, that is, the position in the direction intersecting with the horizontal direction, is different. The first cylindrical portion CY1 is disposed on the + Z side (upper side) of the guide portion G and the second cylindrical portion CY2 is disposed on the -Z side (lower side) of the guide portion G. The first cylindrical portion CY1 and the second cylindrical portion CY2 are formed to have the same diameter, for example. The first cylindrical portion CY1 and the second cylindrical portion CY2 are formed to be larger in diameter than the guide rollers R1 to R10 (for example, 1 m or more in diameter). The guide portion G guides the portion of the sheet substrate FB wound around the first cylindrical portion CY1 and the portion wrapped around the second cylindrical portion CY2 along the plane parallel to the XY plane.

Guide rollers R2 to R5 are disposed between the first cylindrical portion CY1 and the second cylindrical portion CY2 in the conveying path of the sheet substrate FB. The guide roller R2 folds the sheet substrate FB which is folded in a U-shape by about a half turn by the first cylindrical portion CY1 and is transported in the + X direction in the -Y direction. The guide roller R3 folds the folded sheet substrate FB in the -Y direction in the -X direction.

The guide rollers R4 and R5 are disposed, for example, in such a manner that the end on the + Z side is inclined to the + X side. The guide roller R4 folds the sheet substrate FB which has been guided in the -X direction through the guide roller R3 in a tilted downward direction (a direction inclined to the -Z side as the + X direction). The guide roller R5 is disposed on the inclined lower side of the guide roller R4 (inclined to the -Z side as the + X direction). The guide roller R5 folds the sheet substrate FB conveyed in the downward direction inclined from the guide roller R4 in the -X direction so as to face the second cylindrical portion CY2.

In the configuration of Fig. 7, the guide rollers R4 and R5 are set such that their axes of rotation are substantially parallel to each other and inclined by a predetermined amount in the XZ plane. The guide rollers R4 and R5 are provided with actuators for adjusting the inclination (inclination or inclination direction) of the rotation shaft, for example. The feeding direction of the sheet substrate FB fed out from the guide roller R5 in the -X direction is horizontal (parallel to the X axis) by adjusting the inclination state of the corresponding rotation axis of at least one of the guide rollers R4 and R5, The position of the sheet substrate in the Z direction can be kept substantially constant. Adjustment of the inclination state of at least one of the rotation axes of the guide rollers R4 and R5 can be performed by monitoring the change in posture or position of the sheet substrate FB sent out in the -X direction from the guide roller R5, The control section CONT which receives the measurement signal from the sensor which is used for controlling the inclination can be controlled by driving the actuator for adjusting the inclination.

As described above, the guide rollers R2 to R5 are disposed on the sheet substrate FB (front side) so that the conveying direction of the sheet substrate FB after being wound around the outer peripheral surface of the first cylindrical portion CY1 is the direction toward the second cylindrical portion CY2. In the transport direction. Particularly, the pair of guide rollers R4 and R5 do not change the feed direction (-X direction) of the sheet substrate FB, but change the height position in the Z direction by a predetermined amount (width in the Z direction of the sheet substrate in this embodiment, Length min (minutes) or more) can be shifted. In the case where the sheet substrate is folded and shifted in parallel in the Z direction as in the present embodiment, the sheet substrate FB is inclined in the XZ plane between the guide roller R4 and the guide roller R5, Is determined geometrically by the width of the sheet substrate, the spacing of the guide rollers R4 and R5 in the X direction, the inclination angle of the axis of rotation of the guide rollers R4 and R5, and the like. Therefore, in the case of this embodiment, when the guide rollers R4 and R5 are juxtaposed on the upper and lower sides in the Z direction so that the respective central axes of rotation are inclined 45 degrees in the XZ plane together, (Inclined amount 90 degrees) can be set.

The guide rollers R2 to R5 guide the sheet substrate FB to the -Z side (lower) space of the sheet substrate FB which is guided at the position of the guide roller R1 . As described above, in the present embodiment, the winding direction of the sheet substrate FB to the second cylindrical portion CY2 in the winding direction of the sheet substrate FB to the first cylindrical portion CY1 is the same direction, The sheet substrate FB is guided by the guide rollers R2 to R5 such that the front and back sides of the sheets FB are not reversed.

As shown in Figs. 5 and 6, the processing roller 32 is disposed, for example, in the guide path of the sheet substrate FB by the guide rollers R1 to R4. The treatment roller 32 is formed, for example, in a cylindrical shape. The treatment roller 32 is arranged so that the central axis thereof is substantially parallel to the Z direction, for example, so that the sheet substrate FB is hung in a standing state. The processing roller 32 is formed to have a larger diameter than, for example, the guide rollers R1 to R10. The diameter of the processing roller 32 may be substantially the same as the diameters of the first cylindrical portion CY1 and the second cylindrical portion CY2.

The cleaning device 41 is provided for cleaning the sheet substrate FB and the protective substrate PB supplied from the outside of the chamber CB and includes a first cleaning device 41A for cleaning the sheet substrate FB And a second cleaning device 41B for cleaning the protective substrate PB. The first cleaning device 41A is provided between the supply port SUa (see FIG. 6) and the cylindrical member CYL in the conveyance path of the sheet substrate FB, for example. The second cleaning device 41B is provided between the supply port SUb and the laminating device 46 in the transport path of the protective substrate PB, for example.

The TFT layer forming apparatus 42 disposed around the drum mechanism DRM is an apparatus for forming TFT elements, electrodes, wiring layers, and the like for driving organic EL elements. The TFT layer forming apparatus 42 has, for example, a first forming apparatus 42A, a second forming apparatus 42B, and a third forming apparatus 42C. The first forming device 42A is disposed on the -Y side of the cylindrical member CYL. The second forming device 42B is disposed on the -X side of the cylindrical member CYL. The third forming device 42C is disposed on the + Y side of the cylindrical member CYL.

In this way, the first forming device 42A, the second forming device 42B and the third forming device 42C are provided around the cylindrical member CYL to form a series of processes for forming TFT elements, electrodes, For example, by the first forming device 42A, the second forming device 42B and the third forming device 42C.

8 is a view showing the relationship between the first forming device 42A, the second forming device 42B and the third forming device 42C and the cylindrical member CYL of the drum mechanism DRM.

8, each of the first forming device 42A, the second forming device 42B and the third forming device 42C includes two processing sections 42A1 and 42A2, processing sections 42B1 and 42B2, (42C1 and 42C2). The processing sections 42A1, 42B1 and 42C1 are provided so as to oppose the first cylindrical section CY1 and can process the sheet substrate FB caught in the first cylindrical section CY1. The processing sections 42A2, 42B2 and 42C2 are provided opposite to the second cylindrical section CY2 and are capable of processing the sheet substrate FB caught in the second cylindrical section CY2. As described above, the first forming device 42A, the second forming device 42B, and the third forming device 42C are capable of processing the sheet substrate FB wound in a standing state. The first cylindrical portion CY1 and the second cylindrical portion CY2 are support portions for supporting the sheet substrate FB when the processing by the TFT layer forming device 42 is performed.

When the first cylindrical portion CY1 and the second cylindrical portion CY2 support the sheet substrate FB, the drum mechanism may be referred to as a support mechanism.

5 to 7, the drying device 43 is a device for stabilizing TFT elements and electrodes formed on the sheet substrate FB by, for example, heating the sheet substrate FB. On the surface on the -X side of the drying device 43, as shown in Fig. 7, two insertion ports 43a and 43b are provided. The insertion port 43a is disposed on the + Z side, and the sheet substrate FB passed through the first cylindrical portion CY1 is inserted. The insertion port 43b is disposed on the -Z side, and the sheet substrate FB passed through the second cylindrical portion CY2 is inserted.

On the surface of the drying device 43 on the + X side, two outlets 43c and 43d are provided. The discharge port 43c is disposed on the + Z side, and the sheet substrate FB which has been inserted from the insertion port 43a and subjected to the drying process is discharged. The discharge port 43d is disposed on the -Z side, and the sheet substrate FB which is inserted from the insertion port 43b and subjected to the drying process is discharged.

5 and 6, the preliminary machining apparatus 44 is a device for performing a preliminary step (for example, an insulating layer forming step) when forming a light emitting layer on a sheet substrate FB. The preliminary processing device 44 is disposed between the cylindrical member CYL of the drum mechanism DRM and the processing roller 32 together with the drying device 43 in the conveying path of the sheet substrate FB . The preliminary machining device 44 has, for example, a first machining device 44A, a second machining device 44B, and a third machining device 44C, and a series of preliminary machining steps are performed in a shared manner .

The first cleaning device 41A, the second cleaning device 41B, and the light-emitting layer forming device 42A of the TFT layer forming device 42 among the above- And the third forming device 45C of the second holding member 45 is arranged along the first direction (X direction as the first direction in this embodiment). The second forming device 42B of the TFT layer forming device 42, the cylindrical member CYL, the treating roller 32 and the second forming device 45B of the light emitting layer forming device 45 are arranged in the X direction Respectively. The third forming device 42C of the TFT layer forming device 42, the drying device 43 and the first forming device 45A of the light emitting layer forming device 45 are arranged along the X direction.

The first forming device 42A, the cylindrical member CYL and the third forming device 42C of the TFT layer forming device 42 are arranged in the second direction (in this embodiment, Y direction). Further, for example, the cleaning devices 41A and 41B and the drying device 43 are arranged along the Y direction. Further, the preliminary processing device 44 and the lamination device 46 are arranged along the Y direction. In addition, the first forming device 45A, the processing roller 32 and the third forming device 45C of the light emitting layer forming device 45 are arranged along the Y direction. Since the transport apparatus 30 and the processing apparatus 40 are arranged along the X direction and the Y direction, the transport apparatus 30 and the processing apparatus 40 are closely arranged so that the units overlap each other when viewed from the X direction and the Y direction .

The substrate processing apparatus FPA configured as described above produces a display element (electronic device) such as an organic EL element or a liquid crystal display element by a roll system under the control of the control unit CONT. Hereinafter, a process for manufacturing a display device using the substrate processing apparatus (FPA) having the above-described structure will be described.

First, a band-shaped sheet substrate FB wound in a roll shape is attached to the shaft member 11 to the support portion 12 in the supply port 10 of the substrate supply portion SU. A strip-shaped protective substrate PB wound around the shaft member 13 is mounted on the support portion 14 in the supply port 10 of the substrate supply portion SU. In addition, the rotation shaft member 21 is mounted on the support portion 22 in the recovery port 20 of the substrate recovery portion CL.

The control unit CONT rotates the shaft member 11 through the support unit 12 from this state so that the sheet substrate FB is fed from the substrate feed unit SU. The sheet substrate FB delivered from the substrate supply section SU is supplied from the supply port SUa of the substrate processing section PR into the chamber CB. The control unit CONT causes the processing apparatus 40 to perform processing on the sheet substrate FB while feeding the sheet substrate FB fed into the chamber CB to the conveying apparatus 30. [ A reader / sheet may be attached to the front end and the end of the sheet substrate FB wound on the shaft member 11 in the form of a roll to facilitate automatic loading of the sheet substrate into the processing apparatus FPA .

The sheet substrate FB fed to the substrate processing section PR is cleaned by the first cleaning device 41A and is guided by the guide roller R1 to the first cylindrical section of the drum mechanism DRM CY1. The sheet substrate FB is moved so that the surface to be processed Fp faces the first forming device 42A, the second forming device 42B and the third forming device 42C of the TFT layer forming device 42, 1 cylindrical portion CY1. The TFT element and the wiring (not shown) are formed on the surface Fp of the sheet substrate FB wound around the first cylindrical portion CY1 by the corresponding TFT layer forming device 42 (for example, the processing portions A1, And so on.

The sheet substrate FB passed through the first cylindrical portion CY1 is fed into the drying device 43 from the + Z insertion opening 43a of the drying device 43 and is dried Processing is carried out. The sheet substrate FB after the drying process is taken out from the discharge port 43c on the + Z side of the drying device 43. The taken-out sheet substrate FB is guided in the -Y direction by the guide roller R2, for example, and guided in the -X direction by the guide roller R3. The sheet substrate FB having passed through the guide roller R3 is guided in a downwardly inclined direction (inclined to the -Z side as the + X direction) by the guide roller R4 and is guided by the guide roller R5 to the -X Direction.

The sheet substrate FB having passed through the guide roller R5 is wound around the second cylindrical portion CY2 of the drum mechanism DRM in a standing state. A TFT element or wiring (not shown) is formed on the surface Fp of the sheet substrate FB wound around the second cylindrical portion CY2 by the corresponding TFT layer forming device 42 (for example, processing portions A2, B2 and C2) And the like.

The sheet substrate FB passed through the second cylindrical portion CY2 is supplied from the -Z side insertion port 43b of the drying device 43 to the inside of the drying device 43, The drying treatment is carried out again. The sheet substrate FB after the drying process is taken out from the -X side outlet 43d of the drying device 43. [ The taken-out sheet substrate FB is supplied to the pre-processing device 44 through, for example, a guide roller R6. In the preliminary processing device 44, for example, an insulating film, a hole injection layer, an electron injection layer, or the like is formed on the sheet substrate FB in the first processing device 44A to the third processing device 44C.

The preliminarily processed sheet substrate FB is guided to the processing roller 32 through a guide roller R7, for example. The sheet substrate FB is set so that the surface to be processed Fp faces the first forming device 45A, the second forming device 45B and the third forming device 45C of the light emitting layer forming device 45, (32). A light emitting layer or the like is formed on the surface Fp of the sheet substrate FB wound around the processing roller 32 by the light emitting layer forming device 45. [

The sheet substrate FB via the processing roller 32 is supplied to the lamination device 46 and the protective substrate PB is attached to the surface Fp to be processed. The sheet substrate FB after the protective substrate PB is attached is collected, for example, from the recovery port CLa to the substrate recovery section CL. The sheet substrate FB recovered by the substrate recovery unit CL is rolled into a shaft member 21 in the recovery port 20. The sheet substrate FB is cut on the surface of the sheet member FB on which the sheet member FB is wound on the shaft member 21 and the shaft member 21 on which the sheet substrate FB is wound is removed from the support member 22 . A new shaft member 21 on which the sheet substrate FB is not wound, for example, is mounted on the support portion 22.

The control section CONT causes the elements to be formed on the surface Fp of the sheet substrate FB to be processed in this manner.

As described above, according to the present embodiment, after the sheet substrate FB is wound around a part of the outer peripheral surface of the first cylindrical portion CY1 of the drum mechanism DRM, the conveying direction of the sheet substrate FB is the second cylindrical And the sheet substrate FB is wound on the second cylindrical portion CY2 so that the processed surface Fp wound around a portion of the first cylindrical portion CY1 is subjected to the first treatment And the second process is performed on the object side Fp wound around a part of the second cylindrical portion, the sheet substrate FB can be processed at high density. This makes it possible to save space in the substrate processing apparatus (FPA).

In the substrate processing apparatus FPA shown in Figs. 5 and 6, the sheet substrate FB is wound only once on the treatment roller 32, but like the cylindrical member CYL of the drum mechanism DRM , A second cylindrical portion having a first cylindrical portion and a second cylindrical portion, and the sheet substrate FB may be wound around each cylindrical portion. In addition, in this configuration, the light-emitting layer forming device 45 may be disposed in the first cylindrical portion and the second cylindrical portion. When the processing roller 32 is constituted by two cylindrical portions, the sheet substrate FB is formed by using two guide rollers whose angular centers of rotation are inclined, like the guide rollers R4 and R5 shown in Fig. 7, Can be folded.

[Fifth Embodiment]

Next, a fifth embodiment of the present invention will be described. In the present embodiment, the configuration of the drum mechanism is different from that of the fourth embodiment, and hence the configuration of the drum mechanism will be mainly described. Fig. 9 is a perspective view showing a configuration of the drum mechanism DRM2 according to the present embodiment.

In the above-described embodiment, the configuration in which the first cylindrical portion CY1 and the second cylindrical portion CY2 are formed in a single cylindrical member CYL has been described as an example. However, in the fifth embodiment, And the first cylindrical portion CY1 and the second cylindrical portion CY2 are formed in different cylindrical members (for example, the first cylindrical member C1 and the second cylindrical member C2).

As shown in Fig. 9, the first cylindrical member C1 and the second cylindrical member C2 are arranged in a state of being apart in the Z direction. The cross section C1a on the + Z side of the first cylindrical member C1 and the cross section C2a on the -Z side of the second cylindrical member C2 are opposed to each other. The center line of the rotary shaft SF is provided so as to be common (the same position in the XY plane) between the first cylindrical member C1 and the second cylindrical member C2.

In the configuration shown in Fig. 9, for example, diameters are different between the first cylindrical member C1 and the second cylindrical member C2. Specifically, the diameter D1 of the first cylindrical member C1 is larger than the diameter D2 of the second cylindrical member C2. As such, since the first cylindrical member C1 and the second cylindrical member C2 have different diameters, the path length of the conveyance path can be adjusted.

The rotary drive mechanism ACT2 may be configured so that the first cylindrical member C1 and the second cylindrical member C2 can rotate independently of each other. The rotary drive mechanism ACT2 may be configured to rotate only one of the first cylindrical member C1 and the second cylindrical member C2.

9, for example, the sheet substrate FB having passed through the guide roller R21 is wound around the first cylindrical portion CY1, and is guided to the second cylindrical portion CY1 through the guide rollers (the converting portions R22 and R23) And is guided to the cylindrical portion CY2. The sheet substrate FB wound around the second cylindrical portion CY2 is guided through the guide roller R24.

The difference in diameter between the first cylindrical member C1 and the second cylindrical member C2 is determined by the machining configuration and machining conditions of various processing apparatuses disposed around the respective cylindrical members C1 and C2, And the like), and the like.

In the present embodiment, since the continuous sheet substrate FB is sent from the first cylindrical member C1 to the second cylindrical member C2, when the diameters of the respective cylindrical members C1 and C2 are different from each other, It is necessary to make a difference in the rotation speed (rpm) corresponding to the difference of the diameters.

When a rotary driving motor is provided on each of the first cylindrical member C1 and the second cylindrical member C2 or on either one of the cylindrical members, the first cylindrical member C1 of the sheet substrate FB To a portion in contact with the second cylindrical member C2 and a portion contacting the second cylindrical member C2.

9, the first cylindrical member C1 is arranged on the -Z side and the second cylindrical member C2 is arranged on the + Z side. However, the present invention is not limited to this, The one-cylinder member C1 may be disposed on the + Z side, and the second cylindrical member C2 may be disposed on the -Z side.

[Sixth Embodiment]

Next, a sixth embodiment of the present invention will be described. In this embodiment, since the configuration of the drum mechanism is different from that of the above-described embodiment, the configuration of the drum mechanism will be mainly described. 10 is a perspective view showing a configuration of the drum mechanism DRM3 according to the present embodiment.

As shown in Fig. 10, the drum mechanism DRM3 according to the present embodiment has a configuration in which a plurality of second cylindrical portions (working standard surfaces) separated from each other are arranged with respect to the first cylindrical portion (working standard surface, CY1) . Specifically, the drum mechanism DRM3 is configured such that two second cylindrical portions CY21 and CY22 are disposed with respect to the first cylindrical portion CY1. In the present embodiment, the first cylindrical portion CY1 and the second cylindrical portions CY21 and CY22 are connected to other cylindrical members (for example, the first cylindrical member C1 and the second cylindrical members C21 and C22) Respectively.

The drum mechanism DRM3 is configured such that two second cylindrical members C21 and C22 are disposed on the + Z side of the first cylindrical member C1. The two second cylindrical members C21 and C22 are formed to have, for example, the same diameters D4 and D5. The diameter D3 of the first cylindrical member C1 is formed to be larger than the diameters D4 and D5.

As shown in Fig. 10, the first cylindrical member C1 and the second cylindrical members C21 and C22 are arranged apart from each other in the Z direction. The cross section C1a on the + Z side of the first cylindrical member C1 and the cross sections C21a and C22a on the -Z side of the second cylindrical members C21 and C22 are opposed to each other. The first cylindrical member C1 and the second cylindrical members C21 and C22 have separate rotation shafts SF1 and SF21 and SF22, respectively. The rotation axis SF1, the rotation axis SF21, and the rotation axis SF22 are arranged so as to be parallel to each other. The rotation driving mechanism ACT3 can independently control the rotation of the first cylindrical member C1 and the second cylindrical members C21 and C22.

10, for example, the sheet substrate FB having passed through the guide roller R31 is wound around the first cylindrical portion CY1, and the guide rollers R32 and R33 as the converting portion, (Provided with guide rollers) to the second cylindrical portion CY2 at the upper end in the Z direction. The sheet substrate FB wound around the second cylindrical portion CY2 is wound around the second cylindrical portion CY22 through the guide roller R34 and then guided through the guide roller R35. 10, the first cylindrical member C1 is arranged on the -Z side and the second cylindrical members C21 and C22 are arranged on the + Z side. However, the present invention is not limited to this, The one-cylinder member C1 may be disposed on the + Z side, and the second cylindrical members C21 and C22 may be disposed on the -Z side.

[Seventh Embodiment]

Next, a seventh embodiment of the present invention will be described. In this embodiment, since the configuration of the drum mechanism is different from that of the above-described embodiment, the configuration of the drum mechanism will be mainly described. 11 is a perspective view showing the structure of the drum mechanism DRM4 according to the present embodiment.

As shown in Fig. 11, the drum mechanism DRM4 according to the present embodiment is provided with a first cylindrical member C1, a second cylindrical member C2, and a third cylindrical member C3. The first cylindrical member C1, the second cylindrical member C2, and the third cylindrical member C3 are arranged in three stages in the Z direction. In this embodiment, the first cylindrical portion CY1 which is the outer peripheral surface of the first cylindrical member C1, the second cylindrical portion CY2 which is the outer peripheral surface of the second cylindrical member C2 and the outer peripheral surface of the third cylindrical member C3 And the third cylinder CY3, and a series of processing and processing is performed.

The first cylindrical member C1, the second cylindrical member C2, and the third cylindrical member C3 are arranged apart from each other in the Z direction. Adjacent cross sections of the first cylindrical member C1, the second cylindrical member C2, and the third cylindrical member C3 are opposed to each other. The rotary shaft SF is provided such that the common shaft (position in the XY plane is the same) between the first cylindrical member C1, the second cylindrical member C2, and the third cylindrical member C3.

The first cylindrical member C1, the second cylindrical member C2, and the third cylindrical member C3 are formed so as to have the same diameter, for example. The drum mechanism DRM4 has a rotation drive mechanism ACT4. The rotation driving mechanism ACT4 may be constituted by rotating the three cylindrical members C1, C2, C3 integrally or by rotationally driving them individually, for example. The first cylindrical member C1, And the second cylindrical member C2 may be independently rotated. The rotary drive mechanism ACT4 may be configured such that only one of the three cylindrical members C1, C2, C3 is forcibly rotated by a motor or the like.

11, for example, the sheet substrate FB having passed through the guide roller R41 is wound around the first cylindrical portion CY1, and is guided by the guide roller (converting portion, R42 to R45) And is guided to the cylindrical portion CY2. The sheet substrate FB wound around the second cylindrical portion CY2 is guided to the third cylindrical portion CY3 through the guide rollers (conversion portions R46 through R49). The sheet substrate FB wound around the third cylindrical portion CY3 is guided through the guide roller R50. As described above, in the present embodiment, the guide structure of the sheet substrate between the first cylindrical portion CY1 and the second cylindrical portion CY2 is the same as the guide structure of the second cylindrical portion CY2 with respect to the third cylindrical portion CY3 The processing steps using the drum mechanism DRM4 can be further densified (the floor space for installation of the processing apparatus can be reduced).

The technical scope of the present invention is not limited to the above-described embodiment, but can be appropriately changed within the scope not deviating from the gist of the present invention.

For example, in the above-described embodiment, the processing and machining are performed on the sheet substrate at the respective positions of the three cylindrical portions CY1, CY2, and CY3. For example, the first cylindrical portion CY1 The processing may not be performed on the sheet substrate FB between the first cylindrical portion CY1 and the second cylindrical portion CY2. It is also possible to adopt a configuration in which processing is performed on the sheet substrate at the position of the guide roller having the function as the direction changing section.

The sheet substrate FB guided by the drum mechanism DRM5 by the guide roller R51 is wound around the first cylindrical portion CY1 and guided through the guide roller R52 And is wound around a guide roller R53 arranged so as to be horizontal (parallel to the XY plane), for example, in a path until reaching the second cylindrical portion CY2. Here, for example, the heating roller (heating / drying drum) for heating the sheet substrate FB may be provided on the guide roller R53. That is, the guide roller R53 can be configured as a heating drum. In this case, the portion of the sheet substrate FB wound around the guide roller R53 is heated. As shown in Fig. 12, the guide roller R53 is arranged so as to twist the sheet substrate FB fed in a raised state from the guide roller R52, in a standing state on the guide roller R54.

For example, in the case of using a coating apparatus or the like as the processing apparatus 40 in the drum mechanism DRM5, it is preferable to perform the drying treatment or the like on the sheet substrate FB after the coating treatment. In such a case, The sheet substrate immediately after the coating process can be wound around the rollers (rotary drum for heat treatment, R53) and used for the drying process. The sheet substrate FB after the drying treatment is guided to the second cylindrical portion CY2 through the guide roller R54 and wound around the second cylindrical portion CY2 and then guided by the guide roller R55 do.

In the above description, for example, the configuration in which the sheet substrate FB is conveyed in a standing state has been described as an example, but the present invention is not limited thereto. For example, at least one of the drum mechanism DRM and the processing roller 32 conveys the object surface Fp of the sheet substrate FB in a state of being perpendicular or inclined with respect to the horizontal plane, The object surface Fp of the sheet substrate FB may be arranged substantially parallel to the horizontal plane in the conveying path for conveying to at least one of the processing rollers 32. [ It is also possible to adopt a configuration in which the state in which the sheet substrate FB is raised and the state in which the sheet substrate FB is in the side is combined in the conveyance path of the sheet substrate FB.

When the sheet substrate FB is conveyed or processed in a non-horizontal posture such as a state in which the surface to be processed Fp of the sheet substrate FB is inclined at a predetermined angle with respect to the horizontal plane (XY plane) The rotational center axis of the cylindrical member CYL of the mechanism DRM, the processing roller 32 and the guide rollers R1, R2, R6, R7 and R8 may be inclined with respect to the Z direction.

The technical scope of the present invention is not limited to the above-described embodiment, but can be appropriately changed within the scope not deviating from the gist of the present invention.

1, 2, 5 and 6, in addition to the guide rollers R101 to R106 and the processing rollers 31 and 32, the sheet substrate FB And a posture adjusting roller for adjusting the posture of the posture adjusting roller.

The posture adjusting roller can be disposed, for example, on the upstream side of the processing apparatus 40 in the conveyance path of the sheet substrate FB. Alternatively, for example, the configuration may be such that the posture adjusting roller is disposed immediately before the processing apparatus 40. [ The posture adjusting roller is disposed, for example, so that the central axis thereof is parallel to the Z direction, and is movable in the X direction, the Y direction and the Z direction. The posture adjusting roller is arranged, for example, such that the central axis thereof is inclined with respect to the Z-axis direction. In this case, the posture of the sheet substrate FB can be adjusted, for example, by changing the inclination or position of the posture adjusting roller. The above-described guide roller, treatment roller, and treatment conveyance roller may also serve as the posture adjusting roller.

In the above-described embodiment, the example in which the treatment roller 31 and the treatment roller 32 are formed in a cylindrical shape has been described. However, the present invention is not limited to a cylindrical shape. For example, the treatment roller 31 may have an elliptical or polygonal shape, or a curvature surface may be formed on a part of the surface of the treatment roller 31. In this case, it is preferable that the treatment roller 31 and the treatment roller 32 are fixed, and the surface of the treatment rollers 31 and 32 slides on the sheet substrate FB in contact or noncontact.

The cylindrical member CYL of the drum mechanism DRM is also not limited to the cylindrical member. For example, instead of the cylindrical member CYL, a guide member in which a guide surface capable of guiding a surface to be processed to a curved surface is formed when each treatment apparatus 40 processes the surface to be treated of the sheet substrate, It is also possible to use a guide member having a guide surface that can guide the flat surface smoothly. Further, in the case of using the guide member, it is preferable that the sheet substrate FB is slid in contact or non-contact.

Even if a leader sheet having a thickness substantially equal to that of the sheet substrate FB and having a stiffness higher than that of the sheet substrate is attached to the front end of the roll-shaped sheet substrate FB provided on the substrate supply section SU with a predetermined length good. By doing so, it becomes possible to automatically load the sheet substrate into the processing apparatus FPA4 when the roll of the new sheet substrate FB is mounted on the substrate supply unit SU.

In the above description, for example, the configuration in which the sheet substrate FB is conveyed in a standing state has been described as an example, but the present invention is not limited thereto. For example, at least one of the processing roller 31 and the processing roller 32 conveys the processed surface Fp of the sheet substrate FB in a state of being vertically or inclined with respect to the horizontal plane, The surface to be processed Fp of the sheet substrate FB may be arranged substantially parallel to the horizontal plane in the conveying path to be transported to at least one of the processing rollers 32. [ It is also possible to adopt a configuration in which the state in which the sheet substrate FB is raised and the state in which the sheet substrate FB is in the side is combined in the conveyance path of the sheet substrate FB.

In the case where the sheet substrate FB is conveyed or processed in a non-horizontal posture such as a state in which the surface to be processed Fp of the sheet substrate FB is inclined at a predetermined angle with respect to the horizontal plane (XY plane) The rotation center axis of the roller 31, the processing roller 32, the guide rollers R101, R102, R103, R104 and R8 may be inclined with respect to the Z direction.

FB ... Sheet substrate SU ... The substrate-
PR ... Substrate processing part CB ... chamber
CL ... Substrate recovery part CONT ... The control unit
Fp ... The DRM ... Drum mechanism
CYL ... The cylindrical member CY1 ... The first cylindrical portion
CY2 ... The second cylindrical portion ACT ... Rotation drive mechanism
C1 ... The first cylindrical member C2 ... The second cylindrical member
DRM ~ DRM5 ... Drum mechanism
42A1, 42A2, 42B1, 42B2, 42C1, 42C2 ... Processing unit
43 ... Drying device
FPA, FPA4, FPA2, FPA3 ... Substrate processing apparatus
R101 to R106, R111 to R114, Guide roller 10 ... Supply ports 11, 13, 21, 111, 121 ... Shaft member
12, 14, 22, 112, 122 ... The support 20 ... Recovery port
30, 130, 230 ... The conveying devices 31, 32 ... Processing roller
40, 140, 241 to 244 ... Processing device
131, 231 to 233 ... The processing conveying roller

Claims (11)

1. A substrate processing apparatus for processing a long sheet substrate having flexibility,
A first processing device for performing a first process on the sheet substrate sent in a longitudinal direction,
A second processing device arranged to be shifted from the first processing device in a direction intersecting with the conveying direction of the sheet substrate and performing a second process on the sheet substrate,
A third processing apparatus having a carry-in / discharge unit provided so as to pass through each of two rows of the sheet substrate, the third processing apparatus performing the third process on the sheet substrate after the first process or the sheet substrate after the second process,
A first conveying section for conveying the sheet substrate in the longitudinal direction so that the sheet substrate is directed to the third processing apparatus through the first processing apparatus; A second conveying section for conveying the sheet substrate in the longitudinal direction so as to face the processing apparatus; and a second conveying section for conveying the sheet substrate in the longitudinal direction so as to face the third processing apparatus behind the second processing apparatus And a third transporting section for transporting the substrate. The method according to claim 1,
Wherein the first processing apparatus and the second processing apparatus are disposed shifted in the vertical direction intersecting with the conveying direction of the sheet substrate. The method according to claim 1,
Wherein the carry-in / discharge unit of the third processing apparatus includes a first inlet for feeding the sheet substrate after the first processing, a first outlet for discharging the sheet substrate, and a second inlet for feeding the sheet substrate after the second processing, And a second outlet for discharging the sheet substrate. The method according to any one of claims 1 to 3,
The first processing apparatus includes a first cylindrical member that supports the object surface of the sheet substrate in a cylindrical shape while being movable in the longitudinal direction, and a second cylindrical member which is disposed around the first cylindrical member, And a first processing unit,
The second processing apparatus includes a second cylindrical member that supports the object surface of the sheet substrate in a cylindrical shape while being movable in the longitudinal direction and a second cylindrical member which is disposed around the second cylindrical member and performs the second process And a second processing unit. The method of claim 4,
Wherein the first cylindrical member and the second cylindrical member are constituted by a rotary drum arranged in parallel in the vertical direction and rotatable about a central axis. The method of claim 2,
A plurality of guide rollers for converting the conveyance direction of the sheet substrate are provided in the conveyance path in the longitudinal direction of the sheet substrate formed by each of the first conveyance portion, the second conveyance portion, and the third conveyance portion And,
At least two guide rollers of the plurality of guide rollers are arranged so that the conveying path of the sheet substrate is shifted in the vertical direction in accordance with the deviation of the vertical arrangement of the first processing apparatus and the second processing apparatus Device. The method according to any one of claims 1 to 3,
Wherein the third process by the third processing apparatus is a process of drying the sheet substrate or a process of heating the sheet substrate to a predetermined temperature. A substrate processing method for carrying out a plurality of processes on a sheet substrate while conveying a long sheet substrate having flexibility in a long direction,
A first step of sending the sheet substrate to a first processing apparatus and performing a first process on a surface to be processed of the sheet substrate,
A second step of sending the sheet substrate to a second processing apparatus and performing a second process on a surface to be processed of the sheet substrate subjected to the first process,
The sheet substrate after the first process and the sheet substrate after the second process are sent to a third processing apparatus having a carry-in / discharge unit provided so as to pass through each of two rows of the sheet substrates, A third step of performing a third process,
And a transporting step of transporting the sheet substrate by a transporting device that sends the sheet substrate in the longitudinal direction in the order of the first processing device, the third processing device, the second processing device, and the third processing device Processing method. The method of claim 8,
Wherein the third process by the third processing apparatus is a process of drying the sheet substrate or a process of heating the sheet substrate to a predetermined temperature. The method of claim 9,
Wherein the first processing apparatus and the second processing apparatus are disposed shifted in the vertical direction crossing the conveying direction of the sheet substrate. The method of claim 10,
A plurality of guide rollers for converting the conveying direction of the sheet substrate are provided in the conveying path in the longitudinal direction of the sheet substrate formed by the conveying device,
A substrate processing method for shifting the conveying path of the sheet substrate in the vertical direction by at least two guide rollers among the plurality of guide rollers, in accordance with the deviation of the vertical arrangement of the first processing apparatus and the second processing apparatus .

Images