HK1219171A1 - Substrate processing device and substrate processing method - Google Patents

Substrate processing device and substrate processing method

Info

Publication number
HK1219171A1
HK1219171A1 HK16107072.8A HK16107072A HK1219171A1 HK 1219171 A1 HK1219171 A1 HK 1219171A1 HK 16107072 A HK16107072 A HK 16107072A HK 1219171 A1 HK1219171 A1 HK 1219171A1
Authority
HK
Hong Kong
Prior art keywords
substrate processing
processing device
processing method
substrate
processing
Prior art date
Application number
HK16107072.8A
Other languages
Chinese (zh)
Inventor
浜田智秀
奈良圭
增川孝志
木內徹
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of HK1219171A1 publication Critical patent/HK1219171A1/en

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65H—HANDLING THIN OR FILAMENTARY MATERIAL, e.g. SHEETS, WEBS, CABLES
    • B65H23/00—Registering, tensioning, smoothing or guiding webs
    • B65H23/04—Registering, tensioning, smoothing or guiding webs longitudinally
    • B65H23/32—Arrangements for turning or reversing webs
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67098—Apparatus for thermal treatment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65H—HANDLING THIN OR FILAMENTARY MATERIAL, e.g. SHEETS, WEBS, CABLES
    • B65H2301/00—Handling processes for sheets or webs
    • B65H2301/50—Auxiliary process performed during handling process
    • B65H2301/51—Modifying a characteristic of handled material
    • B65H2301/517—Drying material
HK16107072.8A 2010-04-09 2013-02-20 Substrate processing device and substrate processing method HK1219171A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US32234710P 2010-04-09 2010-04-09
US32241710P 2010-04-09 2010-04-09

Publications (1)

Publication Number Publication Date
HK1219171A1 true HK1219171A1 (en) 2017-03-24

Family

ID=44763067

Family Applications (2)

Application Number Title Priority Date Filing Date
HK16107072.8A HK1219171A1 (en) 2010-04-09 2013-02-20 Substrate processing device and substrate processing method
HK13102160.5A HK1175059A1 (en) 2010-04-09 2013-02-20 Substrate processing device

Family Applications After (1)

Application Number Title Priority Date Filing Date
HK13102160.5A HK1175059A1 (en) 2010-04-09 2013-02-20 Substrate processing device

Country Status (6)

Country Link
JP (2) JP5708642B2 (en)
KR (4) KR101887856B1 (en)
CN (2) CN105632978B (en)
HK (2) HK1219171A1 (en)
TW (3) TWI557834B (en)
WO (1) WO2011126132A1 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106185413B (en) * 2012-04-13 2017-11-07 株式会社尼康 Box device
KR102314386B1 (en) * 2012-05-24 2021-10-19 가부시키가이샤 니콘 Device manufacturing method
JP6744720B2 (en) 2016-01-05 2020-08-19 住友化学株式会社 Organic device manufacturing method and roll
KR102420594B1 (en) 2018-05-24 2022-07-13 주식회사 엘지에너지솔루션 Seperator for lithium sulfur battery and lithium sulfur battery comprising the same

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07294122A (en) * 1994-04-21 1995-11-10 Murata Mfg Co Ltd Ceramic green sheet drying apparatus and ceramic green sheet drying method
JP2001129460A (en) * 1999-11-09 2001-05-15 Fuji Photo Film Co Ltd Liquid coating device
WO2001054187A1 (en) * 2000-01-17 2001-07-26 Ebara Corporation Wafer transfer control apparatus and method for transferring wafer
US7367601B2 (en) * 2000-06-29 2008-05-06 Shibaura Mechatronics Corporation Substrate transfer apparatus and substrate transfer method
JP2002367774A (en) 2001-06-04 2002-12-20 Sony Corp Thin-film pattern forming method and thin-film pattern forming device
JP5022552B2 (en) * 2002-09-26 2012-09-12 セイコーエプソン株式会社 Electro-optical device manufacturing method and electro-optical device
KR101129101B1 (en) * 2003-02-18 2012-03-23 코니카 미놀타 홀딩스 가부시키가이샤 Organic Thin-Film Transistor Device and Method for Manufacturing Same
JP2004307890A (en) * 2003-04-03 2004-11-04 Toppan Printing Co Ltd Vacuum film deposition system
WO2006100868A1 (en) 2005-03-18 2006-09-28 Konica Minolta Holdings, Inc. Method of forming organic compound layer, process for producing organic el device, and organic el device
US8080277B2 (en) * 2005-03-18 2011-12-20 Konica Minolta Holdings, Inc. Method of forming organic compound layer, method of manufacturing organic EL element and organic EL element
JP4845746B2 (en) * 2006-06-20 2011-12-28 株式会社オーク製作所 Transport device
JP5109301B2 (en) * 2006-07-27 2012-12-26 富士電機株式会社 Film forming apparatus and film forming method
CN101796216B (en) * 2008-03-31 2012-01-25 富士电机株式会社 Production equipment and method of thin-film laminate
KR100926437B1 (en) * 2008-11-17 2009-11-13 에스엔유 프리시젼 주식회사 Deposition material supply apparatus and Equipment for treating substrate having the same

Also Published As

Publication number Publication date
CN105632978A (en) 2016-06-01
JPWO2011126132A1 (en) 2013-07-11
KR20180058853A (en) 2018-06-01
JP5858068B2 (en) 2016-02-10
KR101887856B1 (en) 2018-08-10
TWI587433B (en) 2017-06-11
TWI557834B (en) 2016-11-11
WO2011126132A1 (en) 2011-10-13
TW201620067A (en) 2016-06-01
KR101756496B1 (en) 2017-07-10
KR20170049634A (en) 2017-05-10
KR101868304B1 (en) 2018-06-15
CN105632978B (en) 2018-10-30
CN102835189A (en) 2012-12-19
JP2014195070A (en) 2014-10-09
TWI611500B (en) 2018-01-11
TW201731010A (en) 2017-09-01
HK1175059A1 (en) 2013-06-21
KR20170082652A (en) 2017-07-14
KR101756628B1 (en) 2017-07-26
CN102835189B (en) 2016-06-29
KR20130041777A (en) 2013-04-25
TW201218305A (en) 2012-05-01
JP5708642B2 (en) 2015-04-30

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Legal Events

Date Code Title Description
PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)

Effective date: 20230407