TW201607666A - 工作台裝置、搬運裝置、半導體製造裝置及檢查裝置 - Google Patents
工作台裝置、搬運裝置、半導體製造裝置及檢查裝置 Download PDFInfo
- Publication number
- TW201607666A TW201607666A TW104110447A TW104110447A TW201607666A TW 201607666 A TW201607666 A TW 201607666A TW 104110447 A TW104110447 A TW 104110447A TW 104110447 A TW104110447 A TW 104110447A TW 201607666 A TW201607666 A TW 201607666A
- Authority
- TW
- Taiwan
- Prior art keywords
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- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68785—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by the mechanical construction of the susceptor, stage or support
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68792—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by the construction of the shaft
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Machine Tool Units (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2014075514A JP5776812B1 (ja) | 2014-04-01 | 2014-04-01 | テーブル装置、及び搬送装置 |
Publications (1)
Publication Number | Publication Date |
---|---|
TW201607666A true TW201607666A (zh) | 2016-03-01 |
Family
ID=54192583
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW104110447A TW201607666A (zh) | 2014-04-01 | 2015-03-31 | 工作台裝置、搬運裝置、半導體製造裝置及檢查裝置 |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP5776812B1 (ja) |
KR (1) | KR101848396B1 (ja) |
CN (1) | CN106457493B (ja) |
TW (1) | TW201607666A (ja) |
WO (1) | WO2015152246A1 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI715728B (zh) * | 2016-03-29 | 2021-01-11 | 日商迪思科股份有限公司 | 移動體進給機構及加工裝置 |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10928744B2 (en) | 2016-10-20 | 2021-02-23 | Molecular Imprints, Inc. | Positioning substrates in imprint lithography processes |
CN106926508B (zh) * | 2017-04-14 | 2018-07-24 | 梁丽明 | 一种液压机移动工作台的导向装置 |
CN107262437B (zh) * | 2017-07-31 | 2019-12-06 | 京东方科技集团股份有限公司 | 一种清洗装置 |
AT520419B1 (de) * | 2017-09-06 | 2019-07-15 | Anton Paar Gmbh | Positioniereinrichtung zum Positionieren eines Funktionskörpers |
JP7011535B2 (ja) * | 2018-06-07 | 2022-01-26 | 株式会社日立ハイテク | ステージ装置、及び荷電粒子線装置 |
CN112388339A (zh) * | 2019-08-15 | 2021-02-23 | 科德数控股份有限公司 | 一种连杆转台及其解耦控制方法 |
JP7435613B2 (ja) * | 2019-09-03 | 2024-02-21 | 株式会社ニコン | 移動体装置及び加工システム |
KR20220164227A (ko) | 2021-06-04 | 2022-12-13 | 지찬혁 | 옷이 엉키지 않는 세탁기 |
CN118204789A (zh) * | 2024-05-21 | 2024-06-18 | 誊展精密科技(深圳)有限公司 | 五轴运动平台 |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62102946A (ja) * | 1985-10-28 | 1987-05-13 | Toyoda Mach Works Ltd | ワ−ク段取補正装置 |
CN2148634Y (zh) * | 1992-05-30 | 1993-12-08 | 李鹏生 | 共基面二维超精密工作台 |
JP3678887B2 (ja) | 1997-03-18 | 2005-08-03 | 株式会社リコー | 三次元形状測定装置 |
JP4335425B2 (ja) | 2000-08-28 | 2009-09-30 | 住友重機械工業株式会社 | ステージ装置 |
JP4160824B2 (ja) | 2002-12-20 | 2008-10-08 | 日本トムソン株式会社 | 昇降用案内ユニット及びそれを組み込んだステージ装置 |
TWI260646B (en) * | 2003-03-28 | 2006-08-21 | Sumitomo Heavy Industries | X-Y axis stage device |
JP4335704B2 (ja) | 2003-03-28 | 2009-09-30 | 住友重機械工業株式会社 | X−yステージ装置 |
JP2007078126A (ja) * | 2005-09-15 | 2007-03-29 | Tokyo Univ Of Science | 非接触支持装置 |
JP4545697B2 (ja) * | 2006-02-17 | 2010-09-15 | 住友重機械工業株式会社 | ステージ装置 |
TWI457193B (zh) * | 2006-03-02 | 2014-10-21 | Sumitomo Heavy Industries | Stage device |
JP2007310019A (ja) * | 2006-05-16 | 2007-11-29 | Nsk Ltd | 位置決めテーブル装置 |
JP4425943B2 (ja) * | 2007-03-19 | 2010-03-03 | 日本精工株式会社 | ワークチャック |
JP4219398B2 (ja) * | 2007-06-08 | 2009-02-04 | 株式会社堀場製作所 | ステージ装置 |
CN101947747A (zh) * | 2010-08-26 | 2011-01-19 | 天津大学 | 机床误差补偿装置及含有该装置的数控机床 |
JP5590187B1 (ja) * | 2013-05-20 | 2014-09-17 | 日本精工株式会社 | テーブル装置、搬送装置、及び半導体製造装置 |
JP5541398B1 (ja) * | 2013-07-02 | 2014-07-09 | 日本精工株式会社 | テーブル装置、及び搬送装置 |
-
2014
- 2014-04-01 JP JP2014075514A patent/JP5776812B1/ja active Active
-
2015
- 2015-03-31 KR KR1020167027172A patent/KR101848396B1/ko active IP Right Grant
- 2015-03-31 CN CN201580016294.XA patent/CN106457493B/zh not_active Expired - Fee Related
- 2015-03-31 WO PCT/JP2015/060137 patent/WO2015152246A1/ja active Application Filing
- 2015-03-31 TW TW104110447A patent/TW201607666A/zh unknown
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI715728B (zh) * | 2016-03-29 | 2021-01-11 | 日商迪思科股份有限公司 | 移動體進給機構及加工裝置 |
Also Published As
Publication number | Publication date |
---|---|
JP2015196222A (ja) | 2015-11-09 |
CN106457493A (zh) | 2017-02-22 |
KR20160127812A (ko) | 2016-11-04 |
JP5776812B1 (ja) | 2015-09-09 |
WO2015152246A1 (ja) | 2015-10-08 |
CN106457493B (zh) | 2018-10-16 |
KR101848396B1 (ko) | 2018-04-12 |
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