TW201600930A - 半導體裝置的製造方法及半導體裝置 - Google Patents
半導體裝置的製造方法及半導體裝置 Download PDFInfo
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- TW201600930A TW201600930A TW104109458A TW104109458A TW201600930A TW 201600930 A TW201600930 A TW 201600930A TW 104109458 A TW104109458 A TW 104109458A TW 104109458 A TW104109458 A TW 104109458A TW 201600930 A TW201600930 A TW 201600930A
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- 235000013769 triethyl citrate Nutrition 0.000 description 1
- JOHWNGGYGAVMGU-UHFFFAOYSA-N trifluorochlorine Chemical compound FCl(F)F JOHWNGGYGAVMGU-UHFFFAOYSA-N 0.000 description 1
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- WLOQLWBIJZDHET-UHFFFAOYSA-N triphenylsulfonium Chemical compound C1=CC=CC=C1[S+](C=1C=CC=CC=1)C1=CC=CC=C1 WLOQLWBIJZDHET-UHFFFAOYSA-N 0.000 description 1
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Classifications
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- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
- H01L21/0272—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers for lift-off processes
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- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
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- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
- H01L21/308—Chemical or electrical treatment, e.g. electrolytic etching using masks
- H01L21/3081—Chemical or electrical treatment, e.g. electrolytic etching using masks characterised by their composition, e.g. multilayer masks, materials
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- B08B3/04—Cleaning involving contact with liquid
- B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect
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- B08B7/0035—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like
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- G03F7/422—Stripping or agents therefor using liquids only
- G03F7/425—Stripping or agents therefor using liquids only containing mineral alkaline compounds; containing organic basic compounds, e.g. quaternary ammonium compounds; containing heterocyclic basic compounds containing nitrogen
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- G03F7/26—Processing photosensitive materials; Apparatus therefor
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- G03F7/427—Stripping or agents therefor using plasma means only
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- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
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- H01L21/02057—Cleaning during device manufacture
- H01L21/0206—Cleaning during device manufacture during, before or after processing of insulating layers
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- H—ELECTRICITY
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- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
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- H01L21/263—Bombardment with radiation with high-energy radiation
- H01L21/265—Bombardment with radiation with high-energy radiation producing ion implantation
- H01L21/266—Bombardment with radiation with high-energy radiation producing ion implantation using masks
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- H01—ELECTRIC ELEMENTS
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- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/3105—After-treatment
- H01L21/31058—After-treatment of organic layers
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
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- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
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- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/3105—After-treatment
- H01L21/311—Etching the insulating layers by chemical or physical means
- H01L21/31105—Etching inorganic layers
- H01L21/31111—Etching inorganic layers by chemical means
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/3105—After-treatment
- H01L21/311—Etching the insulating layers by chemical or physical means
- H01L21/31105—Etching inorganic layers
- H01L21/31111—Etching inorganic layers by chemical means
- H01L21/31116—Etching inorganic layers by chemical means by dry-etching
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
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- Inorganic Chemistry (AREA)
- High Energy & Nuclear Physics (AREA)
- Toxicology (AREA)
- Health & Medical Sciences (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
- Materials For Photolithography (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Silicon Polymers (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Paints Or Removers (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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JP2014063391 | 2014-03-26 | ||
JP2014063390 | 2014-03-26 |
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TW104109458A TW201600930A (zh) | 2014-03-26 | 2015-03-25 | 半導體裝置的製造方法及半導體裝置 |
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EP (1) | EP3125274B1 (de) |
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CN (1) | CN106133876A (de) |
TW (1) | TW201600930A (de) |
WO (1) | WO2015146749A1 (de) |
Cited By (2)
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TWI743243B (zh) * | 2016-11-07 | 2021-10-21 | 美商康寧公司 | 於基板上創造流體組裝結構之系統及方法 |
TWI845756B (zh) * | 2019-09-11 | 2024-06-21 | 日商東麗股份有限公司 | 感光性樹脂組成物、硬化膜及硬化膜之製造方法、以及顯示裝置 |
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KR102443985B1 (ko) * | 2014-09-30 | 2022-09-16 | 도레이 카부시키가이샤 | 감광성 수지 조성물, 경화막, 경화막을 구비하는 소자 및 반도체 장치의 제조 방법 |
JP2017097240A (ja) * | 2015-11-26 | 2017-06-01 | Jsr株式会社 | ケイ素含有膜形成用材料及びパターン形成方法 |
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US10269566B2 (en) | 2016-04-29 | 2019-04-23 | Lam Research Corporation | Etching substrates using ale and selective deposition |
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US10832909B2 (en) | 2017-04-24 | 2020-11-10 | Lam Research Corporation | Atomic layer etch, reactive precursors and energetic sources for patterning applications |
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DE102018106643B4 (de) * | 2017-11-22 | 2020-09-24 | Taiwan Semiconductor Manufacturing Co., Ltd. | Verfahren zum herstellen einer halbleitervorrichtung und verfahren zum reinigen eines substrats |
US10468243B2 (en) | 2017-11-22 | 2019-11-05 | Taiwan Semiconductor Manufacturing Co., Ltd. | Method of manufacturing semiconductor device and method of cleaning substrate |
JP7024744B2 (ja) * | 2018-02-22 | 2022-02-24 | 信越化学工業株式会社 | レジスト材料及びこれを用いたパターン形成方法 |
KR102650216B1 (ko) * | 2018-03-09 | 2024-03-21 | 삼성전자주식회사 | 산화물층의 형성 방법 및 반도체 소자의 제조 방법 |
KR102649087B1 (ko) * | 2018-03-30 | 2024-03-20 | 도레이 카부시키가이샤 | 포지티브형 감광성 수지 조성물, 그의 경화막 및 그것을 구비하는 고체 촬상 소자 |
JP7219947B2 (ja) * | 2018-05-22 | 2023-02-09 | 国立大学法人九州工業大学 | 表面処理方法 |
KR102638639B1 (ko) * | 2018-05-28 | 2024-02-22 | 삼성전자주식회사 | 반도체 소자의 제조 방법 |
JP7219606B2 (ja) * | 2018-12-21 | 2023-02-08 | 東京応化工業株式会社 | 半導体基板の製造方法 |
KR102031251B1 (ko) * | 2019-03-06 | 2019-10-11 | 영창케미칼 주식회사 | 실리콘질화막 식각 조성물 |
KR20220028142A (ko) * | 2019-07-18 | 2022-03-08 | 매슨 테크놀로지 인크 | 수소 라디칼 및 오존 가스를 사용한 워크피스의 처리 |
CN110544721A (zh) * | 2019-08-21 | 2019-12-06 | 大同新成新材料股份有限公司 | 一种半导体材料的制备方法 |
CN113636533B (zh) * | 2021-08-17 | 2023-11-10 | 湖南法恩莱特新能源科技有限公司 | 一种二氟磷酸锂的制备方法 |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3877980A (en) * | 1972-01-18 | 1975-04-15 | Philips Corp | Methods of producing phosphosilicate glass patterns |
US3928082A (en) * | 1973-12-28 | 1975-12-23 | Texas Instruments Inc | Self-aligned transistor process |
JPS61216429A (ja) * | 1985-03-22 | 1986-09-26 | Fujitsu Ltd | レジスト膜の剥離方法 |
US5114826A (en) * | 1989-12-28 | 1992-05-19 | Ibm Corporation | Photosensitive polyimide compositions |
JP4523094B2 (ja) * | 1999-10-19 | 2010-08-11 | 東京エレクトロン株式会社 | プラズマ処理方法 |
US6531260B2 (en) * | 2000-04-07 | 2003-03-11 | Jsr Corporation | Polysiloxane, method of manufacturing same, silicon-containing alicyclic compound, and radiation-sensitive resin composition |
KR100499630B1 (ko) * | 2002-10-08 | 2005-07-05 | 주식회사 하이닉스반도체 | 반도체소자의 제조방법 |
JP2006013190A (ja) * | 2004-06-28 | 2006-01-12 | Rohm Co Ltd | 半導体装置の製造方法 |
JP2006041166A (ja) * | 2004-07-27 | 2006-02-09 | Matsushita Electric Ind Co Ltd | イオン注入マスクの形成方法及び炭化珪素デバイス |
JP4853228B2 (ja) * | 2006-10-25 | 2012-01-11 | 東レ株式会社 | 感光性シロキサン組成物、それから形成された硬化膜、および硬化膜を有する素子、並びにパターン形成方法 |
US8895962B2 (en) * | 2010-06-29 | 2014-11-25 | Nanogram Corporation | Silicon/germanium nanoparticle inks, laser pyrolysis reactors for the synthesis of nanoparticles and associated methods |
WO2012039337A1 (ja) * | 2010-09-21 | 2012-03-29 | 日産化学工業株式会社 | 保護された脂肪族アルコールを含有する有機基を有するシリコン含有レジスト下層膜形成組成物 |
KR101997485B1 (ko) * | 2011-12-26 | 2019-07-08 | 도레이 카부시키가이샤 | 감광성 수지 조성물 및 반도체 소자의 제조 방법 |
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- 2015-03-18 KR KR1020167024700A patent/KR20160136303A/ko unknown
- 2015-03-18 US US15/128,585 patent/US20170243737A1/en not_active Abandoned
- 2015-03-18 JP JP2015515337A patent/JP5846335B1/ja not_active Expired - Fee Related
- 2015-03-18 EP EP15769513.1A patent/EP3125274B1/de not_active Not-in-force
- 2015-03-18 CN CN201580016327.0A patent/CN106133876A/zh active Pending
- 2015-03-18 WO PCT/JP2015/058089 patent/WO2015146749A1/ja active Application Filing
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI743243B (zh) * | 2016-11-07 | 2021-10-21 | 美商康寧公司 | 於基板上創造流體組裝結構之系統及方法 |
TWI845756B (zh) * | 2019-09-11 | 2024-06-21 | 日商東麗股份有限公司 | 感光性樹脂組成物、硬化膜及硬化膜之製造方法、以及顯示裝置 |
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WO2015146749A1 (ja) | 2015-10-01 |
JP5846335B1 (ja) | 2016-01-20 |
US20170243737A1 (en) | 2017-08-24 |
KR20160136303A (ko) | 2016-11-29 |
EP3125274B1 (de) | 2018-09-12 |
JPWO2015146749A1 (ja) | 2017-04-13 |
EP3125274A1 (de) | 2017-02-01 |
EP3125274A4 (de) | 2017-09-13 |
CN106133876A (zh) | 2016-11-16 |
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