TW201538272A - 具有結構化表面之研磨材料 - Google Patents
具有結構化表面之研磨材料 Download PDFInfo
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- TW201538272A TW201538272A TW104102413A TW104102413A TW201538272A TW 201538272 A TW201538272 A TW 201538272A TW 104102413 A TW104102413 A TW 104102413A TW 104102413 A TW104102413 A TW 104102413A TW 201538272 A TW201538272 A TW 201538272A
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- 239000011159 matrix material Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- GVGCUCJTUSOZKP-UHFFFAOYSA-N nitrogen trifluoride Chemical compound FN(F)F GVGCUCJTUSOZKP-UHFFFAOYSA-N 0.000 description 1
- 239000004745 nonwoven fabric Substances 0.000 description 1
- 150000001451 organic peroxides Chemical class 0.000 description 1
- SIWVEOZUMHYXCS-UHFFFAOYSA-N oxo(oxoyttriooxy)yttrium Chemical compound O=[Y]O[Y]=O SIWVEOZUMHYXCS-UHFFFAOYSA-N 0.000 description 1
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 125000004115 pentoxy group Chemical group [*]OC([H])([H])C([H])([H])C([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 150000004714 phosphonium salts Chemical class 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 238000007750 plasma spraying Methods 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920006122 polyamide resin Polymers 0.000 description 1
- 229920000768 polyamine Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229920005749 polyurethane resin Polymers 0.000 description 1
- 229920003226 polyurethane urea Polymers 0.000 description 1
- WVIICGIFSIBFOG-UHFFFAOYSA-N pyrylium Chemical class C1=CC=[O+]C=C1 WVIICGIFSIBFOG-UHFFFAOYSA-N 0.000 description 1
- 238000010526 radical polymerization reaction Methods 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 210000003802 sputum Anatomy 0.000 description 1
- 208000024794 sputum Diseases 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 150000003432 sterols Chemical class 0.000 description 1
- 235000003702 sterols Nutrition 0.000 description 1
- 230000009897 systematic effect Effects 0.000 description 1
- 229910001936 tantalum oxide Inorganic materials 0.000 description 1
- ISXSCDLOGDJUNJ-UHFFFAOYSA-N tert-butyl prop-2-enoate Chemical class CC(C)(C)OC(=O)C=C ISXSCDLOGDJUNJ-UHFFFAOYSA-N 0.000 description 1
- 238000002230 thermal chemical vapour deposition Methods 0.000 description 1
- YRHRIQCWCFGUEQ-UHFFFAOYSA-N thioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3SC2=C1 YRHRIQCWCFGUEQ-UHFFFAOYSA-N 0.000 description 1
- 238000009966 trimming Methods 0.000 description 1
- 239000002966 varnish Substances 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
- 239000000080 wetting agent Substances 0.000 description 1
- 239000002759 woven fabric Substances 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/11—Lapping tools
- B24B37/20—Lapping pads for working plane surfaces
- B24B37/26—Lapping pads for working plane surfaces characterised by the shape of the lapping pad surface, e.g. grooved
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Polishing Bodies And Polishing Tools (AREA)
- Inorganic Chemistry (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201461931136P | 2014-01-24 | 2014-01-24 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TW201538272A true TW201538272A (zh) | 2015-10-16 |
Family
ID=53681879
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW104102413A TW201538272A (zh) | 2014-01-24 | 2015-01-23 | 具有結構化表面之研磨材料 |
Country Status (6)
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI649775B (zh) * | 2018-01-02 | 2019-02-01 | 台灣積體電路製造股份有限公司 | 離子佈植機及離子佈植機腔室的製造方法 |
| TWI791028B (zh) * | 2017-07-11 | 2023-02-01 | 美商3M新設資產公司 | 包括可適形塗層之磨料物品及來自其之拋光系統 |
| TWI803498B (zh) * | 2017-07-11 | 2023-06-01 | 美商3M新設資產公司 | 包括可適形塗層之磨料物品及來自其之拋光系統 |
Families Citing this family (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5921790B1 (ja) * | 2014-07-07 | 2016-05-24 | バンドー化学株式会社 | 研磨フィルム |
| US10967399B2 (en) * | 2016-06-30 | 2021-04-06 | 3M Innovative Properties Company | Fluorocarbon release coating |
| JP6925699B2 (ja) * | 2016-10-04 | 2021-08-25 | 株式会社ディスコ | 平面研削砥石 |
| JP7300441B2 (ja) * | 2017-07-11 | 2023-06-29 | スリーエム イノベイティブ プロパティズ カンパニー | 適合性コーティングを含む研磨物品及びそれらからのポリッシングシステム |
| US12048980B2 (en) * | 2017-08-25 | 2024-07-30 | 3M Innovative Properties Company | Surface projection polishing pad |
| CN110065011A (zh) * | 2018-01-23 | 2019-07-30 | 项刚 | 金刚石砂轮及其制备方法 |
| US11331767B2 (en) | 2019-02-01 | 2022-05-17 | Micron Technology, Inc. | Pads for chemical mechanical planarization tools, chemical mechanical planarization tools, and related methods |
| CN110530313B (zh) * | 2019-07-26 | 2021-05-28 | 西安交通大学 | 一种跨量级多尺度线宽标准器及其制备方法 |
| US20210040608A1 (en) * | 2019-08-05 | 2021-02-11 | GM Global Technology Operations LLC | Method for bonding a polymeric material to a substrate |
| KR102298114B1 (ko) * | 2019-11-05 | 2021-09-03 | 에스케이씨솔믹스 주식회사 | 연마패드, 이의 제조방법 및 이를 이용한 반도체 소자의 제조방법 |
| KR102287923B1 (ko) * | 2019-10-30 | 2021-08-09 | 에스케이씨솔믹스 주식회사 | 연마패드, 이의 제조방법, 및 이를 이용한 반도체 소자의 제조방법 |
| TWI761921B (zh) | 2019-10-30 | 2022-04-21 | 南韓商Ｓｋｃ索密思股份有限公司 | 研磨墊、製造該研磨墊之方法及使用該研磨墊以製造半導體裝置之方法 |
| US20210185793A1 (en) * | 2019-12-13 | 2021-06-17 | Applied Materials, Inc. | Adhesive material removal from photomask in ultraviolet lithography application |
| US20220178017A1 (en) * | 2020-12-03 | 2022-06-09 | Applied Materials, Inc. | Cfx layer to protect aluminum surface from over-oxidation |
| TWI779728B (zh) * | 2021-07-20 | 2022-10-01 | 大陸商廈門佳品金剛石工業有限公司 | 鑽石修整碟及其製造方法 |
| CN116652825B (zh) * | 2023-07-24 | 2023-11-10 | 北京寰宇晶科科技有限公司 | 一种金刚石cmp抛光垫修整器及其制备方法 |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6015597A (en) * | 1997-11-26 | 2000-01-18 | 3M Innovative Properties Company | Method for coating diamond-like networks onto particles |
| US6458018B1 (en) | 1999-04-23 | 2002-10-01 | 3M Innovative Properties Company | Abrasive article suitable for abrading glass and glass ceramic workpieces |
| JP4519970B2 (ja) | 1999-12-21 | 2010-08-04 | スリーエム イノベイティブ プロパティズ カンパニー | 研磨層が立体構造を有する研磨材料 |
| US6821189B1 (en) * | 2000-10-13 | 2004-11-23 | 3M Innovative Properties Company | Abrasive article comprising a structured diamond-like carbon coating and method of using same to mechanically treat a substrate |
| US20050025973A1 (en) | 2003-07-25 | 2005-02-03 | Slutz David E. | CVD diamond-coated composite substrate containing a carbide-forming material and ceramic phases and method for making same |
| US8080073B2 (en) * | 2007-12-20 | 2011-12-20 | 3M Innovative Properties Company | Abrasive article having a plurality of precisely-shaped abrasive composites |
| EP2240298A4 (en) * | 2007-12-31 | 2014-04-30 | 3M Innovative Properties Co | PLASMA TREATED ABRASIVE ARTICLE AND PROCESS FOR PRODUCING THE SAME |
-
2015
- 2015-01-21 JP JP2016548074A patent/JP2017503670A/ja not_active Withdrawn
- 2015-01-21 KR KR1020167022667A patent/KR20160114627A/ko not_active Withdrawn
- 2015-01-21 CN CN201580005532.7A patent/CN106413986A/zh active Pending
- 2015-01-21 WO PCT/US2015/012158 patent/WO2015112540A1/en active Application Filing
- 2015-01-21 US US15/113,244 patent/US20170008143A1/en not_active Abandoned
- 2015-01-23 TW TW104102413A patent/TW201538272A/zh unknown
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI791028B (zh) * | 2017-07-11 | 2023-02-01 | 美商3M新設資產公司 | 包括可適形塗層之磨料物品及來自其之拋光系統 |
| TWI803498B (zh) * | 2017-07-11 | 2023-06-01 | 美商3M新設資產公司 | 包括可適形塗層之磨料物品及來自其之拋光系統 |
| US12043785B2 (en) | 2017-07-11 | 2024-07-23 | 3M Innovative Properties Company | Abrasive articles including conformable coatings and polishing system therefrom |
| TWI649775B (zh) * | 2018-01-02 | 2019-02-01 | 台灣積體電路製造股份有限公司 | 離子佈植機及離子佈植機腔室的製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| CN106413986A (zh) | 2017-02-15 |
| KR20160114627A (ko) | 2016-10-05 |
| US20170008143A1 (en) | 2017-01-12 |
| WO2015112540A1 (en) | 2015-07-30 |
| JP2017503670A (ja) | 2017-02-02 |
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