TW201534400A - Coating apparatus - Google Patents

Coating apparatus Download PDF

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Publication number
TW201534400A
TW201534400A TW103143582A TW103143582A TW201534400A TW 201534400 A TW201534400 A TW 201534400A TW 103143582 A TW103143582 A TW 103143582A TW 103143582 A TW103143582 A TW 103143582A TW 201534400 A TW201534400 A TW 201534400A
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Taiwan
Prior art keywords
substrate
coating
axis direction
along
nozzles
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TW103143582A
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Chinese (zh)
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TWI569884B (en
Inventor
Jung-Sik Lee
Chul-Yeon Lee
Nam-Sik Lee
Chan-Su Park
Hwang-Sub Koo
Hyun-Je Kim
Hee-Seok Jung
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Gigalane Co Ltd
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Publication of TW201534400A publication Critical patent/TW201534400A/en
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Publication of TWI569884B publication Critical patent/TWI569884B/en

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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05BSPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B13/00Machines or plants for applying liquids or other fluent materials to surfaces of objects or other work by spraying, not covered by groups B05B1/00 - B05B11/00
    • B05B13/02Means for supporting work; Arrangement or mounting of spray heads; Adaptation or arrangement of means for feeding work
    • B05B13/04Means for supporting work; Arrangement or mounting of spray heads; Adaptation or arrangement of means for feeding work the spray heads being moved during spraying operation
    • B05B13/0405Means for supporting work; Arrangement or mounting of spray heads; Adaptation or arrangement of means for feeding work the spray heads being moved during spraying operation with reciprocating or oscillating spray heads
    • B05B13/041Means for supporting work; Arrangement or mounting of spray heads; Adaptation or arrangement of means for feeding work the spray heads being moved during spraying operation with reciprocating or oscillating spray heads with spray heads reciprocating along a straight line
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05BSPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B1/00Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means
    • B05B1/14Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means with multiple outlet openings; with strainers in or outside the outlet opening
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05BSPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B13/00Machines or plants for applying liquids or other fluent materials to surfaces of objects or other work by spraying, not covered by groups B05B1/00 - B05B11/00
    • B05B13/02Means for supporting work; Arrangement or mounting of spray heads; Adaptation or arrangement of means for feeding work
    • B05B13/0221Means for supporting work; Arrangement or mounting of spray heads; Adaptation or arrangement of means for feeding work characterised by the means for moving or conveying the objects or other work, e.g. conveyor belts
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05BSPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B15/00Details of spraying plant or spraying apparatus not otherwise provided for; Accessories
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05BSPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B9/00Spraying apparatus for discharge of liquids or other fluent material, without essentially mixing with gas or vapour
    • B05B9/03Spraying apparatus for discharge of liquids or other fluent material, without essentially mixing with gas or vapour characterised by means for supplying liquid or other fluent material
    • B05B9/04Spraying apparatus for discharge of liquids or other fluent material, without essentially mixing with gas or vapour characterised by means for supplying liquid or other fluent material with pressurised or compressible container; with pump
    • B05B9/0403Spraying apparatus for discharge of liquids or other fluent material, without essentially mixing with gas or vapour characterised by means for supplying liquid or other fluent material with pressurised or compressible container; with pump with pumps for liquids or other fluent material
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/14Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by electrical means
    • B05D3/141Plasma treatment
    • B05D3/142Pretreatment
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/001General methods for coating; Devices therefor
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C5/00Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
    • B05C5/02Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
    • B05C5/0254Coating heads with slot-shaped outlet
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C5/00Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
    • B05C5/02Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
    • B05C5/027Coating heads with several outlets, e.g. aligned transversally to the moving direction of a web to be coated

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Coating Apparatus (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)

Abstract

A coating apparatus according to the present invention includes: a coater which includes a spray unit which has multiple nozzles arranged on a substrate to spray a coating agent; and a coating feeder which horizontally moves the coater in X-axis and Y-axis directions. The multiple nozzles are arranged to be separated mutually by being arranged in X-axis and Y-axis directions. Positions of the different axis directions of the multiple nozzles, arranged in any one axis direction between the X-axis and Y-axis, are different mutually. In the arrangement of the multiple nozzles forming the spray unit by embodiments of the present invention, the positions of the multiple nozzles which are arranged in any one axis direction between the X-axis and the Y-axis are different from positions of nozzles in the other axis. Thereby multiple dotted drops do not overlap each other as in the past when a coating agent is discharged from each of the multiple nozzles and is dotted on a substrate.

Description

塗層裝置Coating device

本發明涉及塗層裝置,更具體地涉及可提高塗層膜品質的塗層裝置。The present invention relates to a coating apparatus, and more particularly to a coating apparatus which can improve the quality of a coating film.

在手機、MP3、顯示裝置等電子産品的玻璃蓋板(cover glass)或表面窗口(window)上塗層有防指紋貼膜等功能性塗層膜。其中,用於形成防指紋貼膜的塗層劑主要使用氟類物質。A functional coating film such as an anti-fingerprint film is coated on a cover glass or a window of an electronic product such as a mobile phone, an MP3, or a display device. Among them, a coating agent for forming an anti-fingerprint film mainly uses a fluorine-based substance.

在玻璃蓋板(cover glass)或表面窗口(window)等的被處理物上,即,在基板上形成功能性塗層膜的塗層裝置可以采用藉由噴射固體氟塗層劑來進行塗層的幹式塗層方法和噴射液狀的氟塗層劑的濕式塗層方法。A coating device for forming a functional coating film on a substrate such as a cover glass or a window, or a coating device for forming a functional coating film on the substrate, may be coated by spraying a solid fluorine coating agent. A dry coating method and a wet coating method of spraying a liquid fluorine coating agent.

幹式塗層裝置是將固體的氟塗層劑以真空氛圍的化學氣相沉積(CVD:Chemical Vapor Deposition)方法來向基板表面進行沉積的方法。由於化學氣相沉積方法在真空腔內實施,因此,存在工序不易實施的局限性,進而導致出現生産性低下的問題。The dry coating apparatus is a method of depositing a solid fluorine coating agent onto a surface of a substrate by a chemical vapor deposition (CVD) method in a vacuum atmosphere. Since the chemical vapor deposition method is carried out in a vacuum chamber, there are limitations in that the process is difficult to implement, and the problem of low productivity is caused.

相比於幹式塗層方法,濕式塗層方法的工序成本低廉,容易實現針對大面積基板的批量塗層,相比於幹式方法,具有價格競爭力强以及生産性好的優點。如同韓國公開專利2012-0120031中所公開。Compared with the dry coating method, the wet coating method has a low process cost and is easy to realize batch coating for a large-area substrate, and has the advantages of high price competitiveness and good productivity compared to the dry method. As disclosed in Korean Laid-Open Patent Publication No. 2012-0120031.

濕式塗層裝置包括:輸送機,用於使安置有基板的托盤向塗層工序進行方向輸送;等離子處理機,設置於基板的輸送進行路徑上;塗層劑噴射部以及烤爐。其中,借助輸送機來向基板工序進行方向進行輸送,通過等離子處理機下側並實施等離子表面處理後,藉由塗層劑噴射部下側的同時,向表面噴射塗層劑。之後,借助輸送機被輸送到烤爐,從而完成乾燥過程。The wet coating apparatus comprises: a conveyor for conveying the tray on which the substrate is placed in the direction of the coating process; a plasma processing machine disposed on the conveying path of the substrate; a coating agent spraying portion and an oven. Among them, the substrate is transported in the direction of the substrate process by the conveyor, and after the plasma surface treatment is performed on the lower side of the plasma processor, the coating agent is sprayed onto the surface while the lower side of the coating agent ejecting portion. Thereafter, it is conveyed to the oven by means of a conveyor to complete the drying process.

一方面,在濕式塗層方法中,如上所述,一邊借助輸送機輸送基板,一邊完成塗層。但由於輸送機以恒定等速輸送基板,會出現難以變更工序條件或難以按各工序區間控制速度的難題。並且,輸送機因其驅動工作,會自主發生振動,而輸送機的振動會向基板傳遞。這會成爲塗層劑不均勻地塗層在基板上的因素,由此導致出現塗層膜的品質下降的問題。On the one hand, in the wet coating method, as described above, the coating is completed while transporting the substrate by means of a conveyor. However, since the conveyor conveys the substrate at a constant constant speed, it is difficult to change the process conditions or to control the speed in each process section. Moreover, the conveyor will spontaneously vibrate due to its driving operation, and the vibration of the conveyor will be transmitted to the substrate. This may become a factor in which the coating agent is unevenly coated on the substrate, thereby causing a problem that the quality of the coating film is lowered.

並且,塗層噴射部具有複數個噴嘴,如第15圖所示,複數個噴嘴512間隔配置,使得沿著一方向排列。更具體而言,複數個噴嘴512沿著X軸方向排列配置,此時,複數個噴嘴512在Y軸方向上的位置相同。並且,當從複數個噴嘴512向基板滴塗(dotting)塗層劑時,滴塗在基板上的滴點D大致呈半球形狀。此時,半球形狀的滴點D以從中心部向外圍邊緣其高度逐漸變低的形狀形成滴塗。當以這種狀態向基板S塗層時,會導致形成具有不均勻的厚度的塗層膜。對此,以往爲了在基板S上以均勻的厚度形成塗層膜,如第16圖所示,配置有複數個噴嘴512,使得相鄰的噴嘴512之間的滴塗範圍重疊。更具體而言,對於分別從兩個噴嘴512滴塗的滴點D,以滴點D的邊緣可相互重疊的方式配置噴嘴512。Further, the coating spray portion has a plurality of nozzles, and as shown in Fig. 15, a plurality of nozzles 512 are spaced apart so as to be aligned in one direction. More specifically, a plurality of nozzles 512 are arranged side by side in the X-axis direction, and at this time, the positions of the plurality of nozzles 512 in the Y-axis direction are the same. Further, when the coating agent is dotting from the plurality of nozzles 512 to the substrate, the dropping point D dropped on the substrate is substantially hemispherical. At this time, the dropping point D of the hemispherical shape is dripped in a shape whose height gradually decreases from the center portion to the peripheral edge. When the substrate S is coated in this state, a coating film having a non-uniform thickness is formed. On the other hand, in order to form a coating film with a uniform thickness on the substrate S, as shown in Fig. 16, a plurality of nozzles 512 are disposed so that the dispensing ranges between adjacent nozzles 512 overlap. More specifically, for the dropping point D which is dispensed from the two nozzles 512, respectively, the nozzle 512 is disposed such that the edges of the dropping point D can overlap each other.

但是,在這種情况下,各噴嘴512的噴射壓力會對相鄰的噴嘴512的滴塗造成影響,導致塗層膜的形成不均勻,由此成爲塗層膜品質下降的另一因素。However, in this case, the ejection pressure of each of the nozzles 512 affects the dripping of the adjacent nozzles 512, resulting in uneven formation of the coating film, thereby becoming another factor for deteriorating the quality of the coating film.

現有技術文獻Prior art literature

專利文獻Patent literature

專利文獻 1:韓國公開專利2012-0120031Patent Document 1: Korean Open Patent 2012-0120031

本發明提供可提高塗層膜品質並可縮短塗層時間的塗層裝置。The present invention provides a coating apparatus which can improve the quality of a coating film and can shorten the coating time.

並且,本發明提供易於調節基板的輸送速度並可均勻地控制塗層液塗布量的塗層裝置。Further, the present invention provides a coating apparatus which can easily adjust the conveying speed of the substrate and can uniformly control the coating amount of the coating liquid.

根據本發明的塗層裝置包括:塗層機,具有噴射單元,噴射單元設有用於向基板噴射塗層劑的複數個噴嘴;以及塗層輸送機,使塗層機沿著X軸及Y軸方向進行水平移動,且複數個噴嘴沿著X軸及Y軸方向排列,並相互間隔配置,沿著X軸及Y軸中的一個軸方向排列的複數個噴嘴在另一軸方向上的位置相互不同。The coating apparatus according to the present invention comprises: a coating machine having a spraying unit provided with a plurality of nozzles for spraying a coating agent onto the substrate; and a coating conveyor for causing the coating machine to move along the X-axis and the Y-axis The direction is horizontally moved, and a plurality of nozzles are arranged along the X-axis and the Y-axis direction, and are spaced apart from each other, and the positions of the plurality of nozzles arranged along one of the X-axis and the Y-axis are different from each other in the other axial direction. .

根據本發明的塗層裝置包括:基板輸送機,具有導軌以及基板輸送部,導軌沿著在基板上形成塗層膜的塗層工序進行方向延伸而成,基板輸送部的上部安置有基板,並沿著導軌向塗層工序進行方向移動;等離子處理機,設置於塗層工序進行方向路徑上,並向基板實施等離子表面處理;以及塗層機,在塗層工序進行路徑上與等離子處理機間隔設置,並具有噴射單元,噴射單元設有向基板噴射塗層劑的複數個噴嘴。A coating apparatus according to the present invention includes: a substrate conveyor having a guide rail and a substrate conveying portion, wherein the guide rail extends in a direction of a coating process for forming a coating film on the substrate, and a substrate is disposed on an upper portion of the substrate conveying portion, and Moving along the guide rail in the direction of the coating process; the plasma processor is disposed in the direction of the coating process and performing plasma surface treatment on the substrate; and the coating machine is spaced from the plasma processor in the path of the coating process Provided with a spray unit, the spray unit is provided with a plurality of nozzles that spray a coating agent onto the substrate.

本發明的塗層裝置包括:塗層機,具有噴射單元,噴射單元設有用於向基板噴射塗層劑的複數個噴嘴,且複數個噴嘴分別沿著X軸及Y 軸方向排列並相互間隔設置,其設置成使得由沿著X軸及Y 軸方向中的一軸方向排列的複數個噴嘴分別形成的塗布線與由配置於X軸及Y 軸方向中的另一軸方向上的至少一個噴嘴塗布的塗布線沿著X軸及Y 軸方向中的一軸方向以重疊方式形成,並使沿著X軸及Y 軸方向中的另一方向排列的複數個噴嘴沿著X軸及Y 軸方向中的一軸方向的位置相互不同 。The coating apparatus of the present invention comprises: a coating machine having a spraying unit, the spraying unit is provided with a plurality of nozzles for spraying a coating agent onto the substrate, and the plurality of nozzles are arranged along the X-axis and the Y-axis direction and are spaced apart from each other Provided such that a coating line formed by a plurality of nozzles arranged in one of the X-axis and Y-axis directions is coated with at least one nozzle disposed in the other of the X-axis and Y-axis directions The coating line is formed in an overlapping manner along one of the X-axis and Y-axis directions, and a plurality of nozzles arranged in the other of the X-axis and Y-axis directions are along one of the X-axis and the Y-axis directions The positions of the directions are different from each other.

包括:基板輸送機,具有導軌以及基板輸送部,導軌沿著在基板上形成塗層膜的塗層工序進行方向延伸而成,基板輸送部的上部安置有基板,並沿著導軌向塗層工序進行方向移動;以及等離子處理機,設置於塗層工序進行方向路徑上,並向基板實施等離子表面處理,且噴射單元在塗層工序進行路徑上與等離子處理機間隔設置。The method includes a substrate conveyor, a guide rail and a substrate conveying portion, wherein the guide rail extends along a coating process for forming a coating film on the substrate, and a substrate is disposed on the upper portion of the substrate conveying portion, and the coating process is performed along the guide rail. The direction movement is performed; and the plasma processing machine is disposed on the direction path of the coating process, and performs plasma surface treatment on the substrate, and the ejection unit is disposed on the path of the coating process from the plasma processing machine.

設置成使得由沿著X軸及Y 軸方向中的一軸方向排列的複數個噴嘴分別形成的塗布線與由配置於X軸及Y 軸方向中的另一軸方向上的至少一個噴嘴塗布的塗布線沿著X軸及Y 軸方向中的一軸方向以重疊方式形成,並使沿著X軸及Y 軸方向中的另一方向排列的複數個噴嘴沿著X軸及Y 軸方向中的一軸方向的位置相互不同 。a coating line formed by a plurality of nozzles arranged in one of the X-axis and Y-axis directions, and a coating line coated by at least one nozzle disposed in the other of the X-axis and Y-axis directions. Formed in an overlapping manner along one of the X-axis and Y-axis directions, and a plurality of nozzles arranged in the other of the X-axis and Y-axis directions along one of the X-axis and Y-axis directions The locations are different from each other.

包括:塗層輸送機,使塗層機沿著X軸及Y軸方向進行水平移動,且複數個噴嘴沿著X軸及Y軸方向排列,並相互間隔配置,沿著X軸及Y軸中的一個軸方向排列的複數個噴嘴在另一軸方向上的位置相互不同。Including: coating conveyor, the coating machine moves horizontally along the X-axis and Y-axis directions, and a plurality of nozzles are arranged along the X-axis and the Y-axis direction, and are arranged at intervals, along the X-axis and the Y-axis The positions of the plurality of nozzles arranged in one axial direction are different from each other in the other axial direction.

配置成使得由沿著X軸及Y 軸方向中的一軸方向排列的複數個噴嘴分別形成的塗布線與由配置於X軸及Y 軸方向中的另一軸方向上的至少一個噴嘴塗布的塗布線沿著X軸及Y 軸方向中的一軸方向以重疊方式形成,並使沿著X軸及Y 軸方向中的另一方向排列的複數個噴嘴沿著X軸及Y 軸方向中的一軸方向的位置相互不同。a coating line formed by a plurality of nozzles arranged in one of the X-axis and Y-axis directions, and a coating line coated by at least one nozzle disposed in the other of the X-axis and Y-axis directions Formed in an overlapping manner along one of the X-axis and Y-axis directions, and a plurality of nozzles arranged in the other of the X-axis and Y-axis directions along one of the X-axis and Y-axis directions The locations are different from each other.

包括塗層輸送機,使塗層機沿著X軸及Y軸方向進行水平移動,包括基板輸送機,具有導軌以及基板輸送部,導軌沿著在基板上形成塗層膜的塗層工序進行方向延伸而成,基板輸送部的上部安置有基板,並沿著導軌向塗層工序進行方向移動;以及等離子處理機,設置於塗層工序進行方向路徑上,並向基板實施等離子表面處理,且塗層機在塗層工序進行路徑上與等離子處理機間隔設置。The coating conveyor is arranged to horizontally move the coating machine along the X-axis and the Y-axis direction, including the substrate conveyor, having a guide rail and a substrate conveying portion, and the guide rail is oriented along a coating process for forming a coating film on the substrate. Extending, a substrate is disposed on an upper portion of the substrate transporting portion, and moves along a guide rail in a direction of a coating process; and a plasma processing machine is disposed on the directional path of the coating process, and performs plasma surface treatment on the substrate, and is coated The laminator is placed on the path of the coating process at a distance from the plasma processor.

配置成從複數個噴嘴吐出而在基板上滴塗複數個塗層劑時,使所形成的複數個滴點相互形成間隔,並且以沿著X軸方向排列的複數個噴嘴在Y軸方向上的位置相互不同。When a plurality of coating agents are dispensed from a plurality of nozzles and a plurality of coating agents are dispensed on the substrate, the plurality of formed dropping points are spaced apart from each other, and the plurality of nozzles arranged along the X-axis direction are in the Y-axis direction. The locations are different from each other.

噴射單元一邊沿著X 軸方向進行水平移動,一邊向基板噴射塗層劑,在基板上形成有塗布線,塗布線借助分別從複數個噴嘴吐出並連續被滴塗的滴點來形成,並且各自以沿著X軸方向延伸的方式而形成,且配置成使得從各個噴嘴塗裝而成的塗布線的部分區域與從沿著X軸方向間隔配置的其他噴嘴塗布而成的塗布線中的至少一個沿著Y軸方向以重疊方式形成,並使沿著X軸方向排列的複數個噴嘴在Y軸方向的位置相互不同。The ejecting unit ejects the coating agent onto the substrate while horizontally moving in the X-axis direction, and a coating line is formed on the substrate, and the coating line is formed by dropping dots successively discharged from a plurality of nozzles and continuously dripped, and each of them It is formed to extend in the X-axis direction, and is disposed such that at least a part of the coating line coated from each nozzle and at least one of the coating lines coated from the other nozzles spaced apart from each other in the X-axis direction are disposed. One is formed in an overlapping manner along the Y-axis direction, and the positions of the plurality of nozzles arranged in the X-axis direction are different from each other in the Y-axis direction.

沿著X軸方向排列的複數個噴嘴以在Y軸方向的位置相互不同的方式配置,使得塗布線的沿著Y軸方向的重疊區域爲35%至45%。The plurality of nozzles arranged in the X-axis direction are disposed so as to be different from each other in the Y-axis direction such that the overlapping area of the coating line in the Y-axis direction is 35% to 45%.

配置於X軸方向的相互不同的位置且沿著Y軸方向相鄰地配置的一噴嘴的中心和另一噴嘴的中心之間的距離爲重疊面積的1.3至1.7倍。The distance between the center of one nozzle and the center of the other nozzle disposed at mutually different positions in the X-axis direction and adjacently arranged in the Y-axis direction is 1.3 to 1.7 times the overlap area.

包括複數個噴嘴組,分別具有沿著Y軸方向排列並間隔設置的複數個噴嘴,複數個噴嘴組沿著X軸方向排列並相互間隔配置,沿著X軸方向排列的複數個噴嘴組在Y軸方向上的位置相互不同。The invention includes a plurality of nozzle groups respectively having a plurality of nozzles arranged along the Y-axis direction and spaced apart, the plurality of nozzle groups being arranged along the X-axis direction and spaced apart from each other, and the plurality of nozzle groups arranged along the X-axis direction are in the Y The positions in the axial direction are different from each other.

複數個噴嘴組以之字形配置。A plurality of nozzle groups are arranged in a zigzag shape.

配置複數個噴嘴組,使得從隔著一噴嘴組並且分別構成沿著X軸方向的兩側間隔配置的兩個噴嘴組的一噴嘴塗布的塗布線的一部分沿著Y軸方向相互重疊。A plurality of nozzle groups are disposed such that a part of a nozzle-coated coating line from two nozzle groups arranged to be spaced apart from each other along the X-axis direction is overlapped with each other in the Y-axis direction.

基板輸送機包括:第一基板輸送機,具有第一導軌和第一基板輸送部,第一導軌從擬形成塗層膜的基板被引入的區域向噴射單元所在位置的方向延伸而成,第一基板輸送部的上部安置有基板,並能夠沿著第一導軌進行水平移動;以及第二基板輸送機,具有第二導軌和至少一個基板輸送部,第二導軌從形成塗層膜的基板被引出的區域向等離子處理機所在位置的方向延伸而成,至少一個基板輸送部的上部安置有基板,並能夠沿著第二導軌進行水平移動。The substrate conveyor includes: a first substrate conveyor having a first rail and a first substrate conveying portion, wherein the first rail extends from a region where the substrate on which the coating film is to be formed is introduced to a position where the ejection unit is located, first a substrate is disposed at an upper portion of the substrate conveying portion and is horizontally movable along the first rail; and a second substrate conveyor has a second rail and at least one substrate conveying portion, and the second rail is taken out from the substrate on which the coating film is formed The area extends toward the position of the plasma processing machine, and the upper portion of the at least one substrate conveying portion is provided with the substrate and is horizontally movable along the second rail.

第一基板輸送部安置爲了形成塗層膜而被引入的基板,從而向等離子處理機所在方向進行移動,第一基板輸送機包括:第一水平驅動部,以與第一基板輸送部相連接的方式設置,提供使第一基板輸送部沿著第一導軌進行水平移動的驅動力;以及第一動力源,與第一水平驅動部相連接,使第一水平驅動部旋轉工作,第一水平驅動部爲滾珠絲桿。The first substrate conveying portion houses the substrate introduced to form the coating film to move in the direction of the plasma processing machine, and the first substrate conveyor includes: a first horizontal driving portion to be connected to the first substrate conveying portion Providing a driving force for horizontally moving the first substrate conveying portion along the first rail; and a first power source connected to the first horizontal driving portion to rotate the first horizontal driving portion, the first horizontal driving The part is a ball screw.

第一基板輸送部包括:一對移動塊,以分別安裝於一對第一導軌的方式設置,並能夠沿著一對第一導軌進行水平移動;基板安放台,安裝於移動塊的上側,在上部安放有基板;以及升降驅動部,與基板安放台相連接,使基板安放台進行升降。The first substrate transporting portion includes: a pair of moving blocks disposed to be respectively mounted on the pair of first rails, and capable of horizontally moving along the pair of first rails; the substrate mounting table is mounted on the upper side of the moving block, A substrate is placed on the upper portion, and a lifting and lowering drive unit is connected to the substrate mounting table to raise and lower the substrate mounting table.

基板安放台在爲了形成塗層膜而引入基板的基板引入區域中,借助升降驅動部來進行升降,從而使被引入基板引入區域的基板安放在基板安放臺上。The substrate mounting table is lifted and lowered by the elevation driving portion in the substrate introduction region into which the substrate is introduced to form the coating film, so that the substrate introduced into the substrate introduction region is placed on the substrate mounting table.

本發明包括:基板傳遞部,設置於第一基板輸送部的水平移動路徑上,爲了向第二基板輸送機的基板輸送部傳遞基板,支撑從第一基板輸送部移動的基板;以及塗層支撑部,設置於第二基板輸送機的移動路徑上,在上部安置有基板從而實施塗層工序。The present invention includes a substrate transfer portion that is disposed on a horizontal movement path of the first substrate transfer portion, supports a substrate that is moved from the first substrate transfer portion to transfer the substrate to the substrate transfer portion of the second substrate conveyor, and a coating support The portion is disposed on a moving path of the second substrate conveyor, and a substrate is disposed on the upper portion to perform a coating process.

第二基板輸送機包括:第二基板輸送部,安置支撑於基板傳遞部之上的基板,從而使之向噴射單元所在方向移動;第三基板輸送部,在第二導軌之上,設置於第二基板輸送部的前方,沿著第二導軌進行水平移動,從而安置支撑於塗層支撑部的基板,使之向基板引出區域移動;固定條,以連接第二基板輸送部和第三基板輸送部之間的方式設置;第二水平驅動部,以與第二基板輸送部及第三基板輸送部中的任意一個相連接的方式設置,提供第二基板輸送部及第三基板輸送部能夠沿著第二導軌進行水平移動的驅動力;以及第二動力源,與第二水平驅動部相連接,使第二水平驅動部旋轉工作。The second substrate conveyor includes: a second substrate conveying portion, the substrate supported on the substrate transmitting portion is disposed to move in the direction of the spraying unit; and the third substrate conveying portion is disposed on the second rail The front side of the two substrate conveying portion is horizontally moved along the second guiding rail to thereby position the substrate supported by the coating support portion to move toward the substrate lead-out area; the fixing strip is connected to the second substrate conveying portion and the third substrate conveying portion Provided in a manner between the portions; the second horizontal driving portion is disposed to be connected to any one of the second substrate conveying portion and the third substrate conveying portion, and the second substrate conveying portion and the third substrate conveying portion are provided along a driving force for horizontal movement of the second rail; and a second power source connected to the second horizontal driving portion to rotate the second horizontal driving portion.

第二水平驅動部爲滾珠絲桿。The second horizontal drive portion is a ball screw.

第二基板輸送部及第三基板輸送部包括:移動塊,以分別安裝於一對第二導軌的方式設置,並能夠沿著一對第二導軌進行水平移動;基板安放台,安裝於移動塊的上側,在上部安放有基板;以及升降驅動部,與基板安放台相連接,使基板安放台進行升降。The second substrate transporting portion and the third substrate transporting portion include: moving blocks that are respectively mounted on the pair of second rails and are horizontally movable along the pair of second rails; the substrate mounting table is mounted on the moving block On the upper side, a substrate is placed on the upper portion; and the elevation drive unit is connected to the substrate mounting table to raise and lower the substrate mounting table.

在支撑於基板傳遞部之上的基板下側,藉由由第二基板輸送部的升降驅動部對第二基板輸送部的基板安放台進行升降,來使支撑於基板傳遞部之上的基板安置於第二基板輸送部的基板安放台;在支撑於塗層支撑部的基板下側,藉由由第三基板輸送部的升降驅動部對第三基板輸送部的基板安放台進行升降,來使支撑於塗層支撑部的基板安置於第三基板輸送部的基板安放台。On the lower side of the substrate supported on the substrate transfer portion, the substrate mounting table of the second substrate transfer portion is lifted and lowered by the elevation drive portion of the second substrate transfer portion to place the substrate supported on the substrate transfer portion a substrate mounting table on the second substrate transporting portion; and a lower surface of the substrate supported by the coating support portion, the substrate mounting table of the third substrate transporting portion is lifted and lowered by the elevation driving portion of the third substrate transporting portion The substrate supported on the coating support portion is disposed on the substrate mounting table of the third substrate conveying portion.

塗層輸送機包括:第一導件,位於塗層支撑部的上側,並使噴射單元沿著X 軸方向進行水平移動;以及第二導件,與第一導件的兩端相連接,向Y軸方向延伸而成,使第一導件和噴射單元沿著Y軸方向進行水平移動。The coating conveyor includes: a first guide member located on an upper side of the coating support portion and horizontally moving the spray unit along the X-axis direction; and a second guide member connected to both ends of the first guide member The Y-axis direction is extended to horizontally move the first guide and the ejection unit in the Y-axis direction.

複數個噴嘴分別包括:塗層劑供給管,與從塗層劑罐供給塗層劑的注射泵相連接;氣體供給管,與從氣體罐供給氣體的流量控制部相連接;以及止回閥,具有阻斷部件和彈簧,阻斷部件在複數個噴嘴和塗層劑供給管之間用於阻斷塗層劑或氣體的回流,彈簧與阻斷部件相連接。The plurality of nozzles respectively include: a coating agent supply tube connected to a syringe pump that supplies a coating agent from the coating agent tank; a gas supply tube that is connected to a flow rate control portion that supplies gas from the gas tank; and a check valve, There is a blocking member and a spring for blocking the backflow of the coating agent or gas between the plurality of nozzles and the coating agent supply tube, and the spring is connected to the blocking member.

根據本發明的實施形態,在對構成噴射單元的複數個噴嘴進行配置時,將沿著X軸及Y軸中的一個軸方向排列的複數個噴嘴在另一軸方向上的位置相互不同。由此,當從複數個噴嘴分別排出塗層劑並滴塗(dotting)到基板時,滴塗的複數個滴點不會像以往一樣重疊。According to the embodiment of the present invention, when a plurality of nozzles constituting the ejection unit are arranged, the positions of the plurality of nozzles arranged along one of the X-axis and the Y-axis in the other axial direction are different from each other. Thus, when the coating agent is discharged from a plurality of nozzles and dotting to the substrate, the plurality of dropping points of the dispensing do not overlap as in the past.

並且,當以一邊沿著X軸方向進行水平移動噴射單元並且一邊從複數個噴嘴分別噴射塗層劑的方式噴塗塗層劑時,連續地塗布分別從複數個噴嘴吐出的滴點,並塗布成沿著X軸方向延伸的線形狀。此時,借助各噴嘴來被噴塗的塗布線沿著Y軸方向與複數個塗布線重疊。由此,當使噴射單元沿著X軸方向移動一次時,在一區域中將均勻地形成塗層膜,進而具有可提高塗層膜品質的效果。Further, when the coating agent is sprayed in such a manner that the coating unit is horizontally moved in the X-axis direction and the coating agent is sprayed from the plurality of nozzles, the dropping points respectively discharged from the plurality of nozzles are continuously applied and coated. A line shape extending along the X-axis direction. At this time, the coating line to be sprayed by the respective nozzles overlaps the plurality of coating lines in the Y-axis direction. Thereby, when the ejection unit is moved once in the X-axis direction, the coating film is uniformly formed in one region, and the effect of improving the quality of the coating film is further obtained.

在本發明中,作爲向噴嘴供給塗層劑的手段而使用注射泵,由此,可以精確地控制塗層劑的噴射量,利用流量控制部(MFC),可以控制向噴嘴供給的氣體的投入量。因此,具有可易於控制塗層劑的噴射角度及粒子大小的優點。In the present invention, a syringe pump is used as means for supplying a coating agent to the nozzle, whereby the amount of injection of the coating agent can be accurately controlled, and the flow of the gas supplied to the nozzle can be controlled by the flow rate control unit (MFC). the amount. Therefore, there is an advantage that the spray angle and particle size of the coating agent can be easily controlled.

並且,在用於向噴嘴供給塗層劑的塗層劑供給管上設置止回閥,可防止當從噴嘴無法噴射出塗層劑時,塗層劑從塗層劑供給管流入從而能夠防止向噴嘴外側自然掉落,或者殘留在噴嘴的塗層劑向塗層劑供給管回流。Further, by providing a check valve on the coating agent supply pipe for supplying the coating agent to the nozzle, it is possible to prevent the coating agent from flowing from the coating agent supply pipe when the coating agent cannot be ejected from the nozzle, thereby preventing the The outside of the nozzle is naturally dropped, or the coating agent remaining in the nozzle is returned to the coating agent supply pipe.

以下,將詳細說明本發明的實施例。但是,本發明並不限定於在下述中所公開的實施例,而是能夠以各種不同的形態實現,本實施例僅僅是爲了使本發明的公開更加全面,爲使所屬技術領域中具有通常知識者更加完整地理解本發明的範圍。Hereinafter, embodiments of the present invention will be described in detail. However, the present invention is not limited to the embodiments disclosed in the following, but can be implemented in various different forms, and the present embodiment is merely for making the disclosure of the present invention more comprehensive, and has a general knowledge in the technical field. The scope of the invention is more fully understood.

本發明是向基板表面噴射塗層劑來形成塗層膜的塗層裝置。作爲更具體地例子,本發明的實施例的塗層裝置是向用於手機、MP3、顯示裝置等電子産品的玻璃蓋板(cover glass)或表面窗口(window)的玻璃(glass)基板表面噴塗功能性膜(或者功能性薄膜)的裝置。並且,噴塗於基板表面的功能性膜可以是防指紋貼膜,用於形成防指紋(ANTI-FINGERPRINT)塗層膜的塗層劑使用氟類的液狀材料。即,根據本發明的塗層裝置能夠是在可形成指紋的表面之上形成防指紋塗層膜的裝置。The present invention is a coating apparatus which sprays a coating agent onto a surface of a substrate to form a coating film. As a more specific example, the coating apparatus of the embodiment of the present invention sprays the surface of a glass substrate of a cover glass or a window for an electronic product such as a mobile phone, an MP3, a display device, or the like. A device for a functional membrane (or functional membrane). Further, the functional film sprayed on the surface of the substrate may be an anti-fingerprint film, and the coating agent for forming an anti-fingerprint (ANTI-FINGERPRINT) coating film may be a fluorine-based liquid material. That is, the coating device according to the present invention can be a device for forming an anti-fingerprint coating film over a surface on which a fingerprint can be formed.

第1圖爲以模塊化方式表示根據本發明的實施例的塗層裝置的重要部分的示意圖。第2圖爲表示根據本發明的實施例的塗層裝置的立體圖。第3圖爲以模塊化方式表示根據本發明的實施例的塗層機的重要部分的示意圖。第4圖爲表示根據本發明的實施例的止回閥的剖視圖。第5圖爲表示根據本發明的實施例的噴射單元的立體圖。爲了便於說明,省略圖示出與複數個噴嘴分別相連接的複數個第二供給管和複數個氣體供給管的附圖。第6圖爲表示根據本發明的第一實施例的複數個噴嘴的配置結構和從複數個噴嘴分別向基板噴塗(dotting)的滴點的俯視圖。第7圖爲表示根據第一實施例的變形例的複數個噴嘴的配置結構和從複數個噴嘴分別向基板噴塗(dotting)的滴點的俯視圖。第8圖爲表示根據本發明的第一實施例的複數個噴嘴的配置結構和借助複數個噴嘴來塗布的塗布線的一部分的俯視圖。第9圖爲表示根據本發明的第二實施例的複數個噴嘴的配置結構和從複數個噴嘴分別向基板噴塗(dotting)的滴點的俯視圖。第10圖爲表示根據本發明的第二實施例的複數個噴嘴的配置結構和借助複數個噴嘴來塗布的塗布線的一部分的俯視圖。第11圖至第13圖爲用於說明根據本發明的實施例的塗層裝置的工作的立體圖。第14圖爲以模式化方式表示根據本發明的實施例的噴射單元的水平移動的示意圖。Fig. 1 is a schematic view showing a significant portion of a coating apparatus according to an embodiment of the present invention in a modular manner. Fig. 2 is a perspective view showing a coating apparatus according to an embodiment of the present invention. Fig. 3 is a schematic view showing a significant portion of a coater according to an embodiment of the present invention in a modular manner. Fig. 4 is a cross-sectional view showing a check valve according to an embodiment of the present invention. Fig. 5 is a perspective view showing a spray unit according to an embodiment of the present invention. For convenience of explanation, the drawings in which a plurality of second supply pipes and a plurality of gas supply pipes respectively connected to a plurality of nozzles are omitted are illustrated. Fig. 6 is a plan view showing the arrangement structure of a plurality of nozzles according to the first embodiment of the present invention and the dropping points which are dotting from the plurality of nozzles to the substrate, respectively. Fig. 7 is a plan view showing an arrangement structure of a plurality of nozzles according to a modification of the first embodiment and a dropping point which is dotting from the plurality of nozzles to the substrate. Fig. 8 is a plan view showing a configuration of a plurality of nozzles according to a first embodiment of the present invention and a part of a coating line coated by a plurality of nozzles. Fig. 9 is a plan view showing an arrangement structure of a plurality of nozzles and a dropping point which is dotting from a plurality of nozzles to a substrate according to a second embodiment of the present invention. Fig. 10 is a plan view showing a configuration of a plurality of nozzles according to a second embodiment of the present invention and a part of a coating line coated by a plurality of nozzles. 11 to 13 are perspective views for explaining the operation of the coating apparatus according to the embodiment of the present invention. Fig. 14 is a schematic view showing the horizontal movement of the ejection unit according to an embodiment of the present invention in a patterning manner.

以下,關於前方及後方的描述,爲了塗層而輸送基板的方向或塗層進行方向稱爲前方,其相反方向稱爲後方。Hereinafter, regarding the front and rear descriptions, the direction in which the substrate is transported for coating or the direction in which the coating is applied is referred to as the front side, and the opposite direction is referred to as the rear side.

參照第1圖及第2圖,根據本發明的實施例的塗層裝置包括:工作臺1000,用於在其上部實施塗層作業;等離子處理機2000,設置於工作臺1000上部的塗層工序進行路徑上,藉由生成等離子(plasma)來處理基板S表面;塗層機3000,在塗層工序進行方向上沿著等離子處理機2000的前方間隔設置,具有用於向基板S噴射塗層劑的噴射單元3100;塗層輸送機7000,使塗層機3000沿著X軸及Y 軸方向進行水平移動;基板輸送機6000,設置於工作臺1000的上部,輸送基板S,使得基板S通過等離子處理機2000及塗層機3000。並且,雖未圖示,還可以包括烤爐(oven),烤爐設置於工作臺1000的外側,用於乾燥完成塗層的基板S,烤爐例如可以是熱風式或紅外線乾燥式的烘箱(dry oven)。Referring to Figures 1 and 2, a coating apparatus according to an embodiment of the present invention includes a table 1000 for performing a coating operation on an upper portion thereof, a plasma processing machine 2000, and a coating process disposed on an upper portion of the table 1000. On the path of the substrate, the surface of the substrate S is processed by generating a plasma; the coating machine 3000 is disposed along the front of the plasma processing machine 2000 in the direction of the coating process, and has a coating agent for spraying the substrate S. The spraying unit 3100; the coating conveyor 7000 moves the coating machine 3000 horizontally along the X-axis and the Y-axis direction; the substrate conveyor 6000 is disposed at the upper portion of the table 1000, and transports the substrate S such that the substrate S passes the plasma Processor 2000 and coating machine 3000. Moreover, although not shown, an oven may be further included, and the oven is disposed outside the table 1000 for drying the substrate S on which the coating is completed, and the oven may be, for example, a hot air or an infrared drying oven ( Dry oven).

等離子處理機2000用於在塗層之前對基板S的塗層面,例如對基板S的上部表面進行事先處理,根據實施例的等離子處理機2000是以常壓等離子處理基板S表面的手段。這種等離子處理機2000設置於工作臺1000的上部,面向基板S釋放或輻射等離子的墻體或面,以與工作臺1000的上部表面相隔規定距離的方式間隔設置。即,等離子處理機2000以從工作臺1000上部相隔規定距離的方式設置。由此,基板S借助基板輸送機6000而向等離子處理機2000下側進行輸送的同時,依次實施等離子處理。The plasma processor 2000 is used to pre-treat the coated surface of the substrate S, for example, the upper surface of the substrate S, before the coating, and the plasma processing machine 2000 according to the embodiment is a means for treating the surface of the substrate S with atmospheric pressure plasma. The plasma processor 2000 is disposed on the upper portion of the table 1000, and the wall or surface that faces or discharges the plasma toward the substrate S is spaced apart from the upper surface of the table 1000 by a predetermined distance. That is, the plasma processing machine 2000 is provided to be spaced apart from the upper portion of the table 1000 by a predetermined distance. Thereby, the substrate S is transported to the lower side of the plasma processing machine 2000 by the substrate conveyor 6000, and plasma processing is sequentially performed.

塗層機3000藉由向由等離子處理機2000完成表面處理的基板S的表面噴射塗層劑,來形成功能性膜,例如防指紋貼膜。如第1圖至第3圖所示,這種塗層機3000包括:噴射單元3100,具有用於向基板S上噴射塗層劑的複數個噴嘴3120;複數個注射泵3200,分別與複數個噴嘴3120相連接;塗層劑罐3300,儲藏有塗層劑;氣體罐3400,儲藏有用於向複數個噴嘴3120分別供給的氣體;第一塗層劑供給管3500,用於分別連接塗層劑罐3300和複數個注射泵3200;複數個第二塗層劑供給管3600,用於分別以一對一方式連接複數個注射泵3200和複數個噴嘴3120;止回閥3700,設置於複數個第二塗層劑供給管3600;複數個氣體供給管3800,用於分別連接氣體罐3400和複數個噴嘴3120;流量控制部(Mass flow control:MFC)3900,設置於各氣體供給管3800,用於控制向噴嘴3120供給的氣體的流量。The coater 3000 forms a functional film such as an anti-fingerprint film by spraying a coating agent onto the surface of the substrate S which is surface-treated by the plasma processor 2000. As shown in FIGS. 1 to 3, the coater 3000 includes a spray unit 3100 having a plurality of nozzles 3120 for spraying a coating agent onto the substrate S, and a plurality of syringe pumps 3200, respectively, and a plurality of The nozzles 3120 are connected; the coating agent tank 3300 stores a coating agent; the gas tank 3400 stores a gas for supplying to the plurality of nozzles 3120, respectively; and the first coating agent supply tube 3500 is used for respectively connecting the coating agent a tank 3300 and a plurality of syringe pumps 3200; a plurality of second coating agent supply tubes 3600 for respectively connecting a plurality of syringe pumps 3200 and a plurality of nozzles 3120 in a one-to-one manner; the check valves 3700 are disposed in the plurality of a second coating agent supply pipe 3600; a plurality of gas supply pipes 3800 for respectively connecting the gas tank 3400 and the plurality of nozzles 3120; a flow control unit (MFC) 3900, which is disposed in each gas supply pipe 3800, for The flow rate of the gas supplied to the nozzle 3120 is controlled.

如第3圖所示,注射泵3200包括注射器主體3210具有內部空間;以及桿3220,可在注射器主體3210內進行前進/後退移動。根據這種注射泵3200,當使第3圖(b)部分所示的桿3220後退時,注射器主體3210和第一塗層劑供給管3500之間相連通,塗層劑罐3300的塗層劑經過第一塗層劑供給管3500而向注射器主體3210內供給。之後,如第3圖(c)部分所示,當使桿3220前進時,注射器主體3210和第二塗層劑供給管3600之間相連通,注射器主體3210內部的塗層劑向注射器主體3210的外部排出,並經過第二塗層劑供給管3600而向噴嘴3120移動。As shown in Fig. 3, the syringe pump 3200 includes a syringe body 3210 having an internal space, and a rod 3220 for performing forward/backward movement within the syringe body 3210. According to this syringe pump 3200, when the rod 3220 shown in part (b) of Fig. 3 is retracted, the syringe body 3210 and the first coating agent supply tube 3500 are in communication with each other, and the coating agent of the coating agent tank 3300 is applied. The first coating agent supply tube 3500 is supplied into the syringe main body 3210. Thereafter, as shown in part (c) of FIG. 3, when the rod 3220 is advanced, the syringe body 3210 and the second coating agent supply tube 3600 are in communication with each other, and the coating agent inside the syringe body 3210 is directed to the syringe body 3210. The outside is discharged and moved to the nozzle 3120 through the second coating agent supply pipe 3600.

止回閥3700通過控制第二塗層劑供給管3600和噴嘴3120之間的連通,向噴嘴3120供給由注射泵3200提供的塗層劑,防止塗層結束時的塗層劑殘留物或者氣體回流。如第4圖所示,這種止回閥3700具有內部空間,包括:本體3710,設有用於使塗層劑流入的流入口3711h和用於將塗層劑向噴嘴3120方向排出的排出口3712h;阻斷部件3720,設置於本體3710內部,可沿著流入口3711h及排出口3712h方向移動;以及彈簧3730,設置於本體3710內部,一端與阻斷部件3720相連接,另一端與排出口3712h周邊的內壁相連接。其中, 相比於流入口3711h及排出口3712h,阻斷部件3720具有大的直徑,其形狀例如可以是團狀或球狀。The check valve 3700 supplies the coating agent supplied from the syringe pump 3200 to the nozzle 3120 by controlling the communication between the second coating agent supply pipe 3600 and the nozzle 3120, preventing the coating agent residue or the gas from flowing back at the end of the coating. . As shown in Fig. 4, such a check valve 3700 has an internal space including: a body 3710 provided with an inflow port 3711h for allowing a coating agent to flow in, and a discharge port 3712h for discharging the coating agent toward the nozzle 3120. The blocking member 3720 is disposed inside the body 3710 and movable along the inflow port 3711h and the discharge port 3712h; and the spring 3730 is disposed inside the body 3710, one end is connected to the blocking member 3720, and the other end is connected to the discharge port 3712h. The inner walls of the perimeter are connected. The blocking member 3720 has a large diameter compared to the inflow port 3711h and the discharge port 3712h, and its shape may be, for example, a cluster shape or a spherical shape.

以下,將簡要說明這種止回閥3700的工作。首先,藉由使注射泵3200和第二塗層劑供給管3600相連通,使注射泵3200的塗層劑向噴嘴3120方向輸送。此時,借助塗層劑向噴嘴3120方向被輸送的力,如第4圖(a)部分所示,阻斷流入口3711h的阻斷部件3720向下側移動,並開放流入口3711h,借助施加於阻斷部件3720的力,彈簧3730向排出口3712h方向收縮。由此,塗層劑經過止回閥3700的本體3710內部,並藉由排出口3712h被排出後,向噴嘴3120進行供給,此時,當藉由氣體供給管3800向噴嘴3120內部供給氣體時,塗層劑從噴嘴3120排出並向基板S上噴射。相反地,當塗層工序結束時,將停止注射泵3200的工作及氣體供給。此時,由於不存在施加於彈簧3730方向的力,如第4圖(b)部分所示,借助彈簧3730試圖恢復原狀的彈性力,彈簧3730向阻斷部件3720所在方向舒張。由此,支撑於彈簧3730的阻斷部件3720向流入口3711h移動,並堵住流入口3711h。由此,在爲了停止塗層工序而停止注射泵3200及氣體供給的狀態下,可以阻斷殘留在噴嘴3120的塗層劑及氣體向注射泵3200方向回流。Hereinafter, the operation of such a check valve 3700 will be briefly explained. First, by bringing the syringe pump 3200 and the second coating agent supply tube 3600 into communication, the coating agent of the syringe pump 3200 is conveyed in the direction of the nozzle 3120. At this time, the force which is conveyed toward the nozzle 3120 by the coating agent, as shown in part (a) of Fig. 4, the blocking member 3720 which blocks the inlet 3711h moves to the lower side, and opens the inlet 3711h by means of application. The spring 3730 contracts in the direction of the discharge port 3712h by the force of the blocking member 3720. Thereby, the coating agent passes through the inside of the main body 3710 of the check valve 3700, is discharged through the discharge port 3712h, and is supplied to the nozzle 3120. At this time, when the gas is supplied to the inside of the nozzle 3120 by the gas supply pipe 3800, The coating agent is discharged from the nozzle 3120 and ejected onto the substrate S. Conversely, when the coating process is completed, the operation of the syringe pump 3200 and the gas supply will be stopped. At this time, since there is no force applied in the direction of the spring 3730, as shown in part (b) of Fig. 4, the spring 3730 is attempted to return to the original elastic force by the spring 3730, and the spring 3730 is relaxed toward the blocking member 3720. Thereby, the blocking member 3720 supported by the spring 3730 moves toward the inflow port 3711h and blocks the inflow port 3711h. Thereby, in a state in which the syringe pump 3200 and the gas supply are stopped in order to stop the coating step, the coating agent and the gas remaining in the nozzle 3120 can be blocked from flowing back toward the syringe pump 3200.

如第5圖所示,噴射單元3100包括:複數個噴嘴3120,用於向基板S表面噴射塗層劑;以及噴嘴支撑部3110,用於固定地支撑複數個噴嘴3120,沿著塗層輸送機7000進行水平移動。噴嘴支撑部3110包括:固定部件3111,沿著上下方向延伸而成,並與塗層輸送機7000相連接;以及噴嘴支撑部件3112,與固定部件3111的下部相連接,固定設置複數個噴嘴3120,使複數個噴嘴3120相互間隔。當然,噴嘴支撑部3110不限定於的形狀及結構,可以設置複數個噴嘴3120,也可以進行多種變更,使得能夠與塗層輸送機7000相連接。As shown in FIG. 5, the spraying unit 3100 includes: a plurality of nozzles 3120 for spraying a coating agent onto the surface of the substrate S; and a nozzle supporting portion 3110 for fixedly supporting the plurality of nozzles 3120 along the coating conveyor 7000 moves horizontally. The nozzle support portion 3110 includes a fixing member 3111 extending in the up-and-down direction and connected to the coating conveyor 7000, and a nozzle supporting member 3112 connected to the lower portion of the fixing member 3111 to fix a plurality of nozzles 3120. The plurality of nozzles 3120 are spaced apart from each other. Of course, the nozzle support portion 3110 is not limited to the shape and configuration, and a plurality of nozzles 3120 may be provided, or may be variously modified so as to be connectable to the coating conveyor 7000.

並且,噴射單元3100可以向Z 軸方向移動,即能夠進行升降。爲此,固定部件3111上可以設有用於使沿著Z 軸方向升降或滑動的升降驅動手段。Further, the injection unit 3100 can be moved in the Z-axis direction, that is, can be moved up and down. To this end, the fixing member 3111 may be provided with an elevation driving means for moving up or down along the Z-axis direction.

如第5圖所示,以沿著上下方向貫通噴嘴支撑部件3112的方式固定設置複數個噴射噴嘴3120,並且相互間隔設置。並且,如第3圖所示,複數個噴嘴3120各自與第二塗層劑供給管3600和氣體供給管3800相連接。由此,借助注射泵3200的工作,塗層劑藉由第二塗層劑供給管3600而向噴嘴3120供給,借助從氣體供給管3800向噴嘴3120供給的氣體,噴嘴3120內的塗層劑向基板S噴射。As shown in FIG. 5, a plurality of injection nozzles 3120 are fixedly disposed so as to penetrate the nozzle support member 3112 in the vertical direction, and are provided at intervals. Further, as shown in FIG. 3, each of the plurality of nozzles 3120 is connected to the second coating agent supply pipe 3600 and the gas supply pipe 3800. Thus, with the operation of the syringe pump 3200, the coating agent is supplied to the nozzle 3120 by the second coating agent supply tube 3600, and the coating agent in the nozzle 3120 is supplied by the gas supplied from the gas supply tube 3800 to the nozzle 3120. The substrate S is ejected.

塗層輸送機7000是用於使塗層機3000沿著X軸及Y 軸方向進行水平移動的手段,參照第2圖,包括:第一塗層導軌7100,在塗層工序進行方向,向等離子處理機2000的前方間隔設置,沿著與基板S的輸送方向相交叉的方向延伸設置;一對第二塗層導軌7200,分別設置於第一塗層導軌7100的兩端,沿著基板S的輸送方向或者基板輸送機6000的延伸方向延伸而成;支撑部7300,以使工作臺1000上部和第二塗層導軌7200之間相連接的方式設置,並支撑第二塗層導軌7200;第一塗層移動塊7400,以使噴嘴支撑部3110和第一塗層導軌7100之間相連接的方式設置,並沿著第一塗層導軌7100進行水平移動;第二塗層移動塊7500,安裝於第一塗層導軌7100的兩端,並沿著第二塗層導軌7200進行水平移動。The coating conveyor 7000 is a means for horizontally moving the coater 3000 along the X-axis and Y-axis directions. Referring to FIG. 2, the first coating guide 7100 is included in the direction of the coating process to the plasma. The front side of the processor 2000 is spaced apart and extends along a direction intersecting the conveying direction of the substrate S; a pair of second coating rails 7200 are respectively disposed at both ends of the first coating rail 7100 along the substrate S. The conveying direction or the extending direction of the substrate conveyor 6000 is extended; the supporting portion 7300 is disposed to connect the upper portion of the table 1000 and the second coating rail 7200, and supports the second coating rail 7200; The coating moving block 7400 is disposed in such a manner as to connect the nozzle supporting portion 3110 and the first coating guide rail 7100, and moves horizontally along the first coating guide rail 7100; the second coating moving block 7500 is mounted on Both ends of the first coated rail 7100 are horizontally moved along the second coated rail 7200.

其中,第一塗層導軌7100的延伸的方向可以是X軸方向,而第二塗層導軌7200延伸的方向可以是Y 軸方向。並且,第一塗層導軌7100及第二塗層導軌7200,例如可以是直線導軌。由此,噴射單元3100沿著第一塗層導軌7100而向X軸方向進行水平移動,沿著第二塗層導軌7200而向Y軸方向進行水平移動。Wherein, the direction in which the first coating rail 7100 extends may be the X-axis direction, and the direction in which the second coating rail 7200 extends may be the Y-axis direction. Moreover, the first coated rail 7100 and the second coated rail 7200 may be, for example, linear guides. Thereby, the ejection unit 3100 horizontally moves in the X-axis direction along the first coating guide rail 7100, and horizontally moves in the Y-axis direction along the second coating guide rail 7200.

以下,將對根據本發明的第一實施例的複數個噴嘴的配置進行說明。此時,爲了說明第6圖及第8圖所示的複數個噴嘴3120的配置結構,將複數個噴嘴附圖標記稱爲3121a、3121b、3121c、3122a、3122b、3122c、3123a、3123b、3123c、3124a、3124b、3124c進行說明。Hereinafter, the configuration of a plurality of nozzles according to the first embodiment of the present invention will be described. At this time, in order to explain the arrangement structure of the plurality of nozzles 3120 shown in FIGS. 6 and 8, a plurality of nozzle reference numerals are referred to as 3121a, 3121b, 3121c, 3122a, 3122b, 3122c, 3123a, 3123b, 3123c, 3124a, 3124b, and 3124c will be described.

參照第6圖及第8圖,複數個噴嘴3120沿著X軸及Y 軸方向排列,並相互間隔配置。若進行更具體地舉例說明,在X軸方向的相同位置上,三個噴嘴沿著Y軸方向相互間隔排列,如此配置的三個噴嘴稱爲“噴嘴組”。噴嘴組沿著X軸方向排列的方式配置,例如,具有由三個噴嘴構成的四個噴嘴組(以下,成爲第一噴嘴組至第四噴嘴組3121、3122、3123、3124),以下爲了便於說明,分別將第一噴嘴組3121的三個噴嘴3121a、3121b、3121c稱爲第一噴嘴至第三噴嘴3121a、3121b、3121c,將第二噴嘴組3122的三個噴嘴3122a、3122b、3122c稱爲第四噴嘴至第六噴嘴3122a、3122b、3122c,將第三噴嘴組3123的三個噴嘴3123a、3123b、3123c稱爲第七噴嘴至第九噴嘴3123a、3123b、3123c,將第四噴嘴組3124的三個噴嘴3124a、3124b、3124c稱爲第十噴嘴至第十二噴嘴3124a、3124b、3124c。Referring to FIGS. 6 and 8, a plurality of nozzles 3120 are arranged along the X-axis and Y-axis directions, and are arranged at intervals. For more specific illustration, the three nozzles are spaced apart from each other along the Y-axis direction at the same position in the X-axis direction, and the three nozzles thus arranged are referred to as "nozzle groups". The nozzle groups are arranged in the X-axis direction, for example, having four nozzle groups composed of three nozzles (hereinafter, the first nozzle group to the fourth nozzle group 3121, 3122, 3123, 3124), for convenience The three nozzles 3121a, 3121b, and 3121c of the first nozzle group 3121 are referred to as first to third nozzles 3121a, 3121b, and 3121c, respectively, and the three nozzles 3122a, 3122b, and 3122c of the second nozzle group 3122 are referred to as The fourth nozzle to the sixth nozzles 3122a, 3122b, and 3122c, the three nozzles 3123a, 3123b, and 3123c of the third nozzle group 3123 are referred to as the seventh nozzle to the ninth nozzles 3123a, 3123b, and 3123c, and the fourth nozzle group 3124 is The three nozzles 3124a, 3124b, 3124c are referred to as tenth to twelfth nozzles 3124a, 3124b, 3124c.

第一噴嘴組至第四噴嘴組3121、3122、3123、3124沿著X 軸方向間隔排列配置,此時,第一噴嘴組至第四噴嘴組3121、3122、3123、3124以之字形(zigzag)形態排列。換句話說,沿著X 軸方向排列的分別構成第一噴嘴組至第四噴嘴組3121、3122、3123、3124的噴嘴3121a、3121b、3121c、3122a、3122b、3122c、3123a、3123b、3123c、3124a、3124b、3124c在Y 軸方向上的位置不同。更具體地說,第一噴嘴組3121的第一噴嘴至第三噴嘴3121a、3121b、3121c和第二噴嘴組3122的第四噴嘴至第六噴嘴3122a、3122b、3122c、第三噴嘴組3123的第七噴嘴至第九噴嘴3123a、3123b、3123c、第四噴嘴組3124的第十噴嘴至第十二噴嘴3124a、3124b、3124c各自在Y 軸方向的位置相互不同。若從各噴嘴3121a、3121b、3121c、3122a、3122b、3122c、3123a、3123b、3123c、3124a、3124b、3124c的中心(C)位置來進行說明,第一噴嘴組3121的第一噴嘴至第三噴嘴3121a、3121b、3121c、第二噴嘴組3122的第四噴嘴至第六噴嘴3122a、3122b、3122c、第三噴嘴組3123的第七噴嘴至第九噴嘴3123a、3123b、3123c、第四噴嘴組3124的第十噴嘴至第十二噴嘴3124a、3124b、3124c的Y 軸方向上的中心(C)位置相互不同。The first nozzle group to the fourth nozzle group 3121, 3122, 3123, 3124 are arranged alternately along the X-axis direction, and at this time, the first nozzle group to the fourth nozzle group 3121, 3122, 3123, 3124 are zigzag (zigzag) Morphological arrangement. In other words, the nozzles 3121a, 3121b, 3121c, 3122a, 3122b, 3122c, 3123a, 3123b, 3123c, 3124a constituting the first to fourth nozzle groups 3121, 3122, 3123, 3124, which are arranged along the X-axis direction, respectively. The positions of 3124b and 3124c are different in the Y-axis direction. More specifically, the first to third nozzles 3121a, 3121b, and 3121c of the first nozzle group 3121 and the fourth to sixth nozzles 3122a, 3122b, 3122c, and the third nozzle group 3123 of the second nozzle group 3122 are The tenth nozzle to the twelfth nozzles 3124a, 3124b, and 3124c of the seven nozzles to the ninth nozzles 3123a, 3123b, 3123c, and the fourth nozzle group 3124 are different from each other in the Y-axis direction. The first nozzle to the third nozzle of the first nozzle group 3121 will be described from the center (C) position of each of the nozzles 3121a, 3121b, 3121c, 3122a, 3122b, 3122c, 3123a, 3123b, 3123c, 3124a, 3124b, 3124c. 3121a, 3121b, 3121c, fourth to sixth nozzles 3122a, 3122b, 3122c of the second nozzle group 3122, and seventh to ninth nozzles 3123a, 3123b, 3123c, and fourth nozzle group 3124 of the third nozzle group 3123 The positions of the centers (C) in the Y-axis direction of the tenth to twelfth nozzles 3124a, 3124b, and 3124c are different from each other.

因此,在與構成第一噴嘴組3121的第一噴嘴至第三噴嘴3121a、3121b、3121c之間的空間相對應的位置上,配置用以構成第二噴嘴組3122的第四噴嘴至第六噴嘴3122a、3122b、3122c,在與構成第二噴嘴組3122的第四噴嘴至第六噴嘴3122a、3122b、3122c之間的空間相對應的位置上,配置用以構成第三噴嘴組3123的第七噴嘴至第九噴嘴3123a、3123b、3123c。同樣地,在與構成第三噴嘴組3123的第七噴嘴至第九噴嘴3123a、3123b、3123c之間的空間相對應的位置上,配置用以構成第四噴嘴組3124的第十噴嘴至第十二噴嘴3124a、3124b、3124c。對於此若用更具體地例進行說明,在與構成第一噴嘴組3121的第一噴嘴3121a和第二噴嘴3121b之間的空間相對應的X 軸方向的位置上,配置用以構成第二噴嘴組3122的第五噴嘴3122b,在與第二噴嘴3121b和第三噴嘴3121c之間的空間相對應的X 軸方向的位置上,配置第六噴嘴3122c,第四噴嘴3122a位於第十噴嘴3124a和第十一噴嘴3124b之間。Therefore, the fourth to sixth nozzles constituting the second nozzle group 3122 are disposed at positions corresponding to the spaces between the first nozzles to the third nozzles 3121a, 3121b, and 3121c constituting the first nozzle group 3121. 3122a, 3122b, 3122c, at a position corresponding to a space between the fourth nozzle to the sixth nozzles 3122a, 3122b, 3122c constituting the second nozzle group 3122, a seventh nozzle configured to constitute the third nozzle group 3123 To the ninth nozzles 3123a, 3123b, 3123c. Similarly, at the position corresponding to the space between the seventh nozzle to the ninth nozzles 3123a, 3123b, and 3123c constituting the third nozzle group 3123, the tenth nozzle to the tenth for constituting the fourth nozzle group 3124 are disposed. Two nozzles 3124a, 3124b, 3124c. In this case, a more specific example will be described to configure the second nozzle at a position corresponding to the space between the first nozzle 3121a and the second nozzle 3121b constituting the first nozzle group 3121 in the X-axis direction. The fifth nozzle 3122b of the group 3122 has a sixth nozzle 3122c disposed at a position corresponding to the space between the second nozzle 3121b and the third nozzle 3121c in the X-axis direction, and the fourth nozzle 3122a is located at the tenth nozzle 3124a and the Between eleven nozzles 3124b.

並且,在與構成第二噴嘴組3122的第四噴嘴3122a和第五噴嘴3122b之間的空間相對應的X 軸方向的位置上,配置用以構成第三噴嘴組3123的第七噴嘴3123a,第八噴嘴3123b位於與第五噴嘴3122b和第六噴嘴3122c之間的空間相對應的X 軸方向的位置,第九噴嘴3123c位於第二噴嘴3121b和第三噴嘴3121c之間。Further, at a position corresponding to the space between the fourth nozzle 3122a and the fifth nozzle 3122b constituting the second nozzle group 3122 in the X-axis direction, a seventh nozzle 3123a for constituting the third nozzle group 3123 is disposed, The eight nozzles 3123b are located in the X-axis direction corresponding to the space between the fifth nozzle 3122b and the sixth nozzle 3122c, and the ninth nozzle 3123c is located between the second nozzle 3121b and the third nozzle 3121c.

以下,將省略有關其他噴嘴的具體配置的說明,如上所述,設置成使噴嘴位於X軸方向的用以構成其他噴嘴組的複數個噴嘴組之間的空間。Hereinafter, the description of the specific arrangement of the other nozzles will be omitted, and as described above, the space between the plurality of nozzle groups for constituting the other nozzle groups in the X-axis direction is set.

由複數個噴嘴3121a、3121b、3121c、3122a、3122b、3122c、3123a、3123b、3123c、3124a、3124b、3124c各自排出塗層劑並向基板S上滴塗(dotting)或噴射時,如第6圖所示,以規定形狀,例如以水滴形狀滴塗在基板S上,滴塗的複數個滴點D分別位於基板上面的相應噴嘴的位置上。即,滴塗在基板S上的複數個滴點D沿著X軸及Y 軸方向而相互間隔排列。此時,沿著X軸及Y 軸方向排列的複數個滴點D不會重疊。這是由於,分別構成第一噴嘴組至第四噴嘴組3121、3122、3123、3124 的複數個噴嘴3121a、3121b、3121c、3122a、3122b、3122c、3123a、3123b、3123c、3124a、3124b、3124c在Y 軸方向的位置或其中心(C)位置不相同,它們以之字形配置。When a plurality of nozzles 3121a, 3121b, 3121c, 3122a, 3122b, 3122c, 3123a, 3123b, 3123c, 3124a, 3124b, 3124c each discharge the coating agent and dotting or spraying onto the substrate S, as shown in FIG. As shown, it is dripped on the substrate S in a predetermined shape, for example, in the shape of a water drop, and the plurality of drop points D dispensed are respectively located at the positions of the respective nozzles on the substrate. That is, a plurality of dropping points D dropped onto the substrate S are arranged at intervals in the X-axis and Y-axis directions. At this time, the plurality of dropping points D arranged along the X-axis and the Y-axis direction do not overlap. This is because the plurality of nozzles 3121a, 3121b, 3121c, 3122a, 3122b, 3122c, 3123a, 3123b, 3123c, 3124a, 3124b, 3124c constituting the first to fourth nozzle groups 3121, 3122, 3123, 3124, respectively, are The position in the Y-axis direction or the center (C) position is different, and they are arranged in a zigzag shape.

若將具有這種配置結構的複數個噴嘴3121a、3121b、3121c、3122a、3122b、3122c、3123a、3123b、3123c、3124a、3124b、3124c的噴射單元3100藉由塗層輸送機7000沿著X軸方向進行水平移動,則會連續滴塗複數個滴點D於基板S上,進而塗布成線形狀。並且,由各個噴嘴3121a、3121b、3121c、3122a、3122b、3122c、3123a、3123b、3123c、3124a、3124b、3124c向基板S上滴塗的滴點D的直徑大於各個噴嘴3121a、3121b、3121c、3122a、3122b、3122c、3123a、3123b、3123c、3124a、3124b、3124c的直徑。因此,當使噴射單元3100沿著X 軸方向進行水平移動時,複數個滴點D沿著X 軸方向連續地形成,進而形成塗布線,此時,如第8圖所示,塗布線沿著Y 軸方向出現部分重疊。例如,借助第一噴嘴組3121的第一噴嘴3122a而被噴塗的第一塗布線L1的部分區域與借助第三噴嘴組3123的第七噴嘴3123a而被噴塗的第七塗布線L7的部分區域沿著Y 軸方向重疊,第一塗布線L1的其他部分區域與借助第四噴嘴組3124的第十一噴嘴3124b而被噴塗的第十一塗布線L11的部分區域沿著Y 軸方向重疊。若舉另一例,雖未圖示,借助第一噴嘴組3121的第二噴嘴3121b而被噴塗的第二塗布線的部分區域與借助第三噴嘴組3123的第八噴嘴3123b而被噴塗的第八塗布線的部分區域沿著Y 軸方向重疊,第一塗布線L1的其他部分區域與借助第四噴嘴組3124的第十二噴嘴124c而被噴塗的第十一塗布線L11的部分區域沿著Y 軸方向重疊。作爲再一例,借助第二噴嘴組3122的第四噴嘴3122a而被噴塗的第四塗布線的部分區域與借助第三噴嘴組3123的第七噴嘴3123a而被噴塗的第七塗布線的部分區域沿著Y 軸方向重疊,第四塗布線的其他部分區域與借助第四噴嘴組3124的第十噴嘴3124a而被噴塗的第十塗布線的部分區域沿著Y 軸方向重疊。If the ejection unit 3100 having the plurality of nozzles 3121a, 3121b, 3121c, 3122a, 3122b, 3122c, 3123a, 3123b, 3123c, 3124a, 3124b, 3124c having such an arrangement is along the X-axis direction by the coating conveyor 7000 When the horizontal movement is performed, a plurality of dropping points D are continuously applied onto the substrate S, and further coated into a line shape. Further, the diameter of the dropping point D which is dropped onto the substrate S by the respective nozzles 3121a, 3121b, 3121c, 3122a, 3122b, 3122c, 3123a, 3123b, 3123c, 3124a, 3124b, 3124c is larger than the respective nozzles 3121a, 3121b, 3121c, 3122a Diameter of 3122b, 3122c, 3123a, 3123b, 3123c, 3124a, 3124b, 3124c. Therefore, when the ejection unit 3100 is horizontally moved in the X-axis direction, a plurality of dropping points D are continuously formed along the X-axis direction to form a coating line, and as shown in Fig. 8, the coating line is along Partial overlap occurs in the Y-axis direction. For example, a partial region of the first coating line L1 sprayed by the first nozzle 3122a of the first nozzle group 3121 and a partial region of the seventh coating line L7 sprayed by the seventh nozzle 3123a of the third nozzle group 3123 The Y-axis direction overlaps, and the other partial region of the first coating line L1 overlaps with the partial region of the eleventh coating line L11 sprayed by the eleventh nozzle 3124b of the fourth nozzle group 3124 in the Y-axis direction. As another example, although not shown, a partial region of the second coating line that is sprayed by the second nozzle 3121b of the first nozzle group 3121 and an eighth region that is sprayed by the eighth nozzle 3123b of the third nozzle group 3123 Partial regions of the coating line overlap in the Y-axis direction, and other partial regions of the first coating line L1 and a partial region of the eleventh coating line L11 that is sprayed by the twelfth nozzle 124c of the fourth nozzle group 3124 are along Y The axis directions overlap. As a further example, a partial region of the fourth coating line sprayed by the fourth nozzle 3122a of the second nozzle group 3122 and a partial region of the seventh coating line sprayed by the seventh nozzle 3123a of the third nozzle group 3123 The Y-axis direction overlaps, and the other partial region of the fourth coating line overlaps with the partial region of the tenth coating line that is sprayed by the tenth nozzle 3124a of the fourth nozzle group 3124 in the Y-axis direction.

以下,雖未說明分別與借助第三噴嘴3121c、第五噴嘴至第十二噴嘴(3122b, 3122c, 3123a, 3123b, 3123c, 3124a, 3124b, 3124c)而被噴塗的第三塗布線、第五塗布線至第十二塗布線相重疊的塗布線,但是在第三塗布線、第五塗布線至第十二塗布線中的除了存在於軸的兩端的第三塗布線和第十塗布線之外,均分別與兩個塗布線沿著Y 軸方向重疊。Hereinafter, the third coating line and the fifth coating which are respectively sprayed by the third nozzle 3121c, the fifth nozzle to the twelfth nozzle (3122b, 3122c, 3123a, 3124b, 3124c) are not described. a coating line in which the line to the twelfth coating line overlap, but in addition to the third coating line and the tenth coating line existing at both ends of the shaft in the third coating line, the fifth coating line to the twelfth coating line , respectively, overlap with the two coating lines along the Y-axis direction.

由此,當使噴射單元3100沿著X 軸方向移動一次時,針對一區域,可以形成均勻的塗層膜,進而具有可提高塗層膜品質的效果。Thus, when the ejection unit 3100 is moved once in the X-axis direction, a uniform coating film can be formed for one region, and the effect of improving the quality of the coating film can be obtained.

如上所述,在本發明中,由各個噴嘴3121a、3121b、3121c、3122a、3122b、3122c、3123a、3123b、3123c、3124a、3124b、3124c噴塗而形成的塗布線的部分區域與由沿著X軸方向間隔配置的其他噴嘴3121a、3121b、3121c、3122a、3122b、3122c、3123a、3123b、3123c、3124a、3124b、3124c噴塗而成的塗布線中的至少一個塗布線沿著Y軸方向以重疊方式形成,優選地,一塗布線與另一塗布線之間的重疊面積爲一塗布線的寬度的35%至45%,更優選爲40%。As described above, in the present invention, a partial region of the coating line formed by spraying each of the nozzles 3121a, 3121b, 3121c, 3122a, 3122b, 3122c, 3123a, 3123b, 3123c, 3124a, 3124b, 3124c is along the X-axis At least one of the coating lines sprayed by the other nozzles 3121a, 3121b, 3121c, 3122a, 3122b, 3122c, 3123a, 3123b, 3123c, 3124a, 3124b, 3124c arranged in the direction interval is formed in an overlapping manner along the Y-axis direction. Preferably, the area of overlap between one coating line and the other coating line is from 35% to 45%, more preferably 40%, of the width of a coating line.

這種塗布線之間的重疊面積隨著沿Y軸方向相鄰並且配置於相互不同的X軸方向上的一噴嘴與另一噴嘴之間的相隔距離而發生變化。更具體地,這種面積隨著沿Y軸方向相鄰並且配置於相互不同的X軸方向的一噴嘴的中心和另一噴嘴的中心之間的相隔距離而發生變化。並且,由一噴嘴噴塗而成的塗布線的寬度隨著噴嘴的內徑、基板與噴嘴之間的相隔距離、塗層劑的黏度及氣體噴射壓而發生變化。The overlapping area between such coating lines changes with a distance between one nozzle and the other nozzle which are adjacent in the Y-axis direction and disposed in mutually different X-axis directions. More specifically, such an area changes with a distance between the center of one nozzle and the center of the other nozzle which are adjacent to each other in the Y-axis direction and disposed in mutually different X-axis directions. Further, the width of the coating line sprayed by one nozzle varies depending on the inner diameter of the nozzle, the distance between the substrate and the nozzle, the viscosity of the coating agent, and the gas injection pressure.

因此,塗布線的寬度以假定噴嘴的內徑、基板與噴嘴之間的相隔距離、塗層劑的黏度及氣體噴射壓爲規定值的狀態進行說明。例如,在實施例中,在基板S上形成的塗布線的寬度(或滴點的直徑)爲噴嘴內徑的12倍至13倍。Therefore, the width of the coating line will be described in a state in which the inner diameter of the nozzle, the distance between the substrate and the nozzle, the viscosity of the coating agent, and the gas injection pressure are set to predetermined values. For example, in the embodiment, the width (or the diameter of the dropping point) of the coating line formed on the substrate S is 12 to 13 times the inner diameter of the nozzle.

並且,沿Y軸方向相鄰並且配置於相互不同的X軸方向的一噴嘴的中心和另一噴嘴的中心之間的距離配置爲重疊區域(A)的寬度(或重疊面積)的1.3倍至1.7倍,更優選爲1.5倍。Further, the distance between the center of one nozzle adjacent to each other in the Y-axis direction and disposed in the mutually different X-axis directions and the center of the other nozzle is configured to be 1.3 times the width (or overlap area) of the overlap region (A) to 1.7 times, more preferably 1.5 times.

參照第8圖,若更爲具體地進行說明,則第一噴嘴組3121的第一噴嘴3121a的中心和第四噴嘴組3124的第十一噴嘴3124b的中心之間的相隔距離(B)爲重疊區域(A)的寬度(或重疊面積)的1.3倍至1.7倍,更優選爲1.5倍。Referring to Fig. 8, the more detailed description, the distance (B) between the center of the first nozzle 3121a of the first nozzle group 3121 and the center of the eleventh nozzle 3124b of the fourth nozzle group 3124 is overlapped. The width (or overlap area) of the region (A) is 1.3 to 1.7 times, more preferably 1.5 times.

如此,在本發明的實施例中,藉由調整沿Y軸方向相鄰並且配置於相互不同的X軸方向的一噴嘴的中心和另一噴嘴的中心之間的相隔距離(B),來使得一塗布線與另一塗布線之間的重疊面積爲一塗布線的寬度的35%至45%,更優選爲40%。如上所述,這種重疊面積的調節可隨著噴嘴的內徑、基板與噴嘴之間的相隔距離、塗層劑的黏度及氣體噴射壓而發生變化。由此,若變更噴嘴的內徑、基板與噴嘴之間的相隔距離、塗層劑的黏度及氣體噴射壓中的一個,也會使基板與噴嘴之間的相隔距離、沿Y軸方向相鄰並且配置於相互不同的X軸方向的一噴嘴的中心和另一噴嘴的中心之間的相隔距離發生變化。Thus, in the embodiment of the present invention, by adjusting the distance (B) between the center of one nozzle and the center of the other nozzle which are adjacent in the Y-axis direction and arranged in mutually different X-axis directions, The area of overlap between one coated line and the other coated line is from 35% to 45%, more preferably 40%, of the width of a coated line. As described above, the adjustment of the overlap area may vary depending on the inner diameter of the nozzle, the distance between the substrate and the nozzle, the viscosity of the coating agent, and the gas injection pressure. Therefore, if the inner diameter of the nozzle, the distance between the substrate and the nozzle, the viscosity of the coating agent, and the gas injection pressure are changed, the distance between the substrate and the nozzle is also adjacent to each other along the Y-axis direction. Further, the distance between the center of one nozzle disposed in the mutually different X-axis direction and the center of the other nozzle is changed.

因此,在滴塗塗層劑時,不重疊滴點D,而利用重疊塗布線方法,既不受相鄰噴嘴的影響,又可以解决半球形狀的滴點D的高度從中心部向外圍邊緣越來越低的問題,進而可以針對一區域,形成均勻的塗層膜,使得具有提高塗層膜的品質的效果。Therefore, when the coating agent is dispensed, the dropping point D is not overlapped, and the overlapping coating line method is used, which is not affected by the adjacent nozzles, and can solve the height of the hemispherical shaped dropping point D from the central portion to the peripheral edge. The lower the problem, the more uniform the coating film can be formed for a region, so that the effect of improving the quality of the coating film is obtained.

在第6圖所示的第一實施例中,對以第一噴嘴組3121、第二噴嘴組3122、第三噴嘴組3123、第四噴嘴組3124的順序依次進行的配置進行了說明。但不受限於此,可以改變第一噴嘴組至第四噴嘴組3121、3122、3123、3124的順序。例如,第7圖所示,可以按照第一噴嘴組3121、第三噴嘴組3123、第二噴嘴組3122、第四噴嘴組3124的順序進行配置。此時,根據變形例的第一噴嘴組3121和第三噴嘴組3123之間的距離與第6圖所示的根據第一實施例的第一噴嘴組3121和第三噴嘴組3123之間的距離相同,在第一噴嘴組3121和第三噴嘴組3123之間不設置其他噴嘴組。並且,第三噴嘴組3123和第二噴嘴組3122之間的相隔距離能夠與第一噴嘴組3121和第三噴嘴組3123之間的距離相同,在第三噴嘴組3123和第四噴嘴組3124之間配置第二噴嘴組3122。由此,根據變形例的噴射單元3100的X 軸方向的大小大於第一實施例,大約爲2倍。In the first embodiment shown in Fig. 6, the arrangement in which the first nozzle group 3121, the second nozzle group 3122, the third nozzle group 3123, and the fourth nozzle group 3124 are sequentially performed is described. However, without being limited thereto, the order of the first to fourth nozzle groups 3121, 3122, 3123, 3124 may be changed. For example, as shown in FIG. 7, the first nozzle group 3121, the third nozzle group 3123, the second nozzle group 3122, and the fourth nozzle group 3124 may be arranged in this order. At this time, the distance between the first nozzle group 3121 and the third nozzle group 3123 according to the modification and the distance between the first nozzle group 3121 and the third nozzle group 3123 according to the first embodiment shown in FIG. 6 Similarly, no other nozzle groups are provided between the first nozzle group 3121 and the third nozzle group 3123. Also, the distance between the third nozzle group 3123 and the second nozzle group 3122 can be the same as the distance between the first nozzle group 3121 and the third nozzle group 3123, and the third nozzle group 3123 and the fourth nozzle group 3124 A second nozzle group 3122 is disposed therebetween. Thus, the magnitude of the ejection unit 3100 according to the modification in the X-axis direction is larger than that of the first embodiment, and is approximately twice.

以上,對噴射單元3100具有第一噴嘴組至第四噴嘴組3121、3122、3123、3124的情况進行了說明。但不受此限定,可具有四個噴嘴組3121、3122、3123、3124以下或以上。The case where the ejection unit 3100 has the first to fourth nozzle groups 3121, 3122, 3123, and 3124 has been described above. Without being limited thereto, it is possible to have four nozzle groups 3121, 3122, 3123, 3124 below or above.

並且,如第9圖所示的第二實施例,可設置兩個第一噴嘴組至第四噴嘴組3121、3122、3123、3124。即,具有與第一噴嘴組至第四噴嘴組3121、3122、3123、3124相同的配置結構的第五噴嘴組至第八噴嘴組3125、3126、3127、3128,沿著X 軸方向間隔相隔配置第一噴嘴組至第八噴嘴組3121、3122、3123、3124、3125、3126、3127、3128。Also, as in the second embodiment shown in Fig. 9, two first nozzle groups to third nozzle groups 3121, 3122, 3123, 3124 may be provided. That is, the fifth to eighth nozzle groups 3125, 3126, 3127, and 3128 having the same arrangement configuration as the first to fourth nozzle groups 3121, 3122, 3123, and 3124 are arranged along the X-axis direction. The first to eighth nozzle groups 3121, 3122, 3123, 3124, 3125, 3126, 3127, 3128.

此時,第八噴嘴組至第十二噴嘴組3125、3126、3127、3128以沿著X 軸方向間隔排列的方式設置,此時,第八噴嘴組至第十二噴嘴組3125、3126、3127、3128以之字形排列配置。換句話說,分別構成沿著X 軸方向排列的第五噴嘴組至第八噴嘴組3125、3126、3127、3128的噴嘴3125a、3125b、3125c、3126a、3126b、3126c、3127a、3127b、3127c、3128a、3128b、3128c在Y 軸方向的位置不同。更具體地,第五噴嘴組3125的第十三噴嘴至第十五噴嘴3125a、3125b、3125c和第六噴嘴組3126的第十六噴嘴至第十八噴嘴3126a、3126b、3126c、第七噴嘴組3127的第十九噴嘴至第二十一噴嘴3127a、3127b、3127c、第八噴嘴組3128的第二十二噴嘴至第二十四噴嘴3128a、3128b、3128c各自在Y 軸方向的位置不同。從各噴嘴3125a、3125b、3125c、3126a、3126b、3126c、3127a、3127b、3127c、3128a、3128b、3128c的中心(C)位置來說,第五噴嘴組3125的第十三噴嘴至第十五噴嘴3125a、3125b、3125c、第六噴嘴組3126的第十六噴嘴至第十八噴嘴3126a、3126b、3126c、第七噴嘴組3127的第十九噴嘴至第二十一噴嘴3127a、3127b、3127c、第八噴嘴組3128的第二十二噴嘴至第二十四噴嘴3128、3128b、3128c在Y 軸方向的中心(C)位置相互不同。At this time, the eighth nozzle group to the twelfth nozzle group 3125, 3126, 3127, 3128 are arranged at intervals in the X-axis direction, and at this time, the eighth nozzle group to the twelfth nozzle group 3125, 3126, 3127 3128 is arranged in a zigzag arrangement. In other words, the nozzles 3125a, 3125b, 3125c, 3126a, 3126b, 3126c, 3127a, 3127b, 3127c, 3128a, respectively, constituting the fifth to eighth nozzle groups 3125, 3126, 3127, 3128 arranged in the X-axis direction are formed. The positions of 3128b and 3128c are different in the Y-axis direction. More specifically, the thirteenth to thirteenth nozzles 3125a, 3125b, 3125c of the fifth nozzle group 3125 and the sixteenth to eighteenth nozzles 3126a, 3126b, 3126c, and the seventh nozzle group of the sixth nozzle group 3126 The twenty-second nozzle to the twenty-first nozzles 3127a, 3127b, 3127c, and the twenty-second nozzle to the twenty-fourth nozzles 3128a, 3128b, and 3128c of the eleventh nozzles 3127a, 3127b, and 3127c and the third nozzle group 3128 are different in position in the Y-axis direction. From the center (C) position of each of the nozzles 3125a, 3125b, 3125c, 3126a, 3126b, 3126c, 3127a, 3127b, 3127c, 3128a, 3128b, 3128c, the thirteenth nozzle to the fifteenth nozzle of the fifth nozzle group 3125 The thirteenth nozzle to the eighteenth nozzles 3126a, 3126b, 3126c of the third nozzle group 3126, the thirteenth nozzle to the eleventh nozzles 3127a, 3127b, 3127c, and the eleventh nozzles 3127a, 3127b, 3127c, 3125a, 3125b, 3125c The twenty-second nozzle to the twenty-fourth nozzles 3128, 3128b, and 3128c of the eight nozzle group 3128 are different from each other in the center (C) position in the Y-axis direction.

因此,第十三噴嘴至第二十四噴嘴3125a、3125b、3125c、3126a、3126b、3126c、3127a、3127b、3127c、3128a、3128b、3128c 各自排出塗層劑並向基板S上滴塗(dotting)或噴射時,如第9圖所示,以規定形狀,例如以水滴形狀滴塗在基板S上,滴塗的複數個滴點D分別位於基板上面的相應噴嘴的位置上。即,滴塗在基板S上的複數個滴點D沿著X軸及Y 軸方向而相互間隔排列。此時,沿著X軸及Y 軸方向排列的複數個滴點D不會重疊。這是由於,分別構成第五噴嘴組至第八噴嘴組3125、3126、3127、3128的複數個噴嘴3125a、3125b、3125c、3126a、3126b、3126c、3127a、3127b、3127c、3128a、3128b、3128c在Y 軸方向的位置或其中心(C)位置不相同,它們以之字形配置,使得相互之間的位置不同。Therefore, the thirteenth to twenty-fourth nozzles 3125a, 3125b, 3125c, 3126a, 3126b, 3126c, 3127a, 3127b, 3127c, 3128a, 3128b, 3128c each discharge the coating agent and dotting onto the substrate S Alternatively, as shown in Fig. 9, the substrate S is dripped in a predetermined shape, for example, in the shape of a water drop, and a plurality of dropped dots D are respectively placed at positions of the respective nozzles on the substrate. That is, a plurality of dropping points D dropped onto the substrate S are arranged at intervals in the X-axis and Y-axis directions. At this time, the plurality of dropping points D arranged along the X-axis and the Y-axis direction do not overlap. This is because the plurality of nozzles 3125a, 3125b, 3125c, 3126a, 3126b, 3126c, 3127a, 3127b, 3127c, 3128a, 3128b, 3128c constituting the fifth nozzle group to the eighth nozzle group 3125, 3126, 3127, 3128, respectively, are The positions in the Y-axis direction or the center (C) positions are different, and they are arranged in a zigzag shape so that the positions are different from each other.

並且,根據第二實施例,構成第一噴嘴組3121的第一噴嘴至第三噴嘴3121、3121b、3121c與構成第五噴嘴組3125的第十三噴嘴至第十五噴嘴3125a、3125b、3125c在Y 軸方向的位置相同,構成第二噴嘴組3122的第四噴嘴至第六噴嘴3122a、3122b、3122c與構成第六噴嘴組3126的第十六噴嘴至第十八噴嘴3126a、3126b、3126c在Y 軸方向的位置相同。並且,構成第三噴嘴組3123的第七噴嘴至第九噴嘴3123a、3123b、3123c與構成第七噴嘴組3127的第十九噴嘴至第二十一噴嘴3127a、3127b、3127c在Y 軸方向的位置相同,構成第四噴嘴組3124的第十噴嘴至第十二噴嘴3124a、3124b、3124c與構成第八噴嘴組3128的第二十二噴嘴至第二十四噴嘴3128a、3128b、3128c在Y 軸方向的位置相同。Further, according to the second embodiment, the first to third nozzles 3121, 3121b, and 3121c constituting the first nozzle group 3121 and the thirteenth to fifteenth nozzles 3125a, 3125b, and 3125c constituting the fifth nozzle group 3125 are The positions in the Y-axis direction are the same, and the fourth to sixth nozzles 3122a, 3122b, and 3122c constituting the second nozzle group 3122 and the sixteenth to eighteenth nozzles 3126a, 3126b, and 3126c constituting the sixth nozzle group 3126 are in the Y The position in the axial direction is the same. Further, the positions of the seventh to ninth nozzles 3123a, 3123b, and 3123c constituting the third nozzle group 3123 and the nineteenth nozzle to the eleventh nozzles 3127a, 3127b, and 3127c constituting the seventh nozzle group 3127 are in the Y-axis direction. Similarly, the tenth to twelfth nozzles 3124a, 3124b, and 3124c constituting the fourth nozzle group 3124 and the twenty-second nozzle to the twenty-fourth nozzles 3128a, 3128b, and 3128c constituting the eighth nozzle group 3128 are in the Y-axis direction. The same location.

由此,由第一噴嘴組3121的第一噴嘴3121a塗布的第一塗布線L1的部分區域與第七塗布線L7及第十九塗布線L19重疊,第一塗布線L1的其他區域與第十一塗布線L11及第二十三塗布線L23重疊。並且,與此同時,第一塗布線L1與由第十三噴嘴3125a噴塗的第十三塗布線L13的全部區域重疊。如此,在第二實施例中,在由一個噴嘴塗布的塗布線中,除了存在於Y軸的兩端的第三塗布線、第十塗布線、第十五塗布線及第二十二塗布線以外,分別與五個塗布線重疊。因此,沿著X軸移動一次時,相比於根據第一實施例的噴射單元3100,根據第二實施例的噴射單元3100可以形成更厚的塗層膜,並且,爲了形成相同厚度的塗層膜,具有可以减少沿著X軸的移動次數的效果。Thereby, a partial region of the first coating line L1 coated by the first nozzle 3121a of the first nozzle group 3121 overlaps with the seventh coating line L7 and the nineteenth coating line L19, and other regions of the first coating line L1 and the tenth A coating line L11 and a twenty-third coating line L23 overlap. Further, at the same time, the first coating line L1 overlaps with the entire area of the thirteenth coating line L13 sprayed by the thirteenth nozzle 3125a. Thus, in the second embodiment, in the coating line coated by one nozzle, in addition to the third coating line, the tenth coating line, the fifteenth coating line, and the twenty-second coating line existing at both ends of the Y-axis , overlapping with five coating lines, respectively. Therefore, when moving once along the X axis, the ejection unit 3100 according to the second embodiment can form a thicker coating film than the ejection unit 3100 according to the first embodiment, and, in order to form a coating of the same thickness The film has an effect of reducing the number of movements along the X axis.

基板輸送機6000是將基板S向工序進行方向輸送的手段,在托盤T上安置基板S,基板輸送機6000輸送托盤T。基板輸送機6000實質上提供支撑並進行輸送的對象是托盤T,但爲了便於說明,以“基板”作爲對象進行說明。The substrate conveyor 6000 is a means for transporting the substrate S in the process direction, and the substrate S is placed on the tray T, and the substrate conveyor 6000 transports the tray T. The substrate conveyor 6000 is substantially provided with support and is transported by the tray T. However, for convenience of explanation, the "substrate" will be described as an object.

基板輸送機6000設置於工作臺1000的上部,延伸形成,使其用於將基板S向等離子處理機2000和噴射單元3100輸送。即,基板輸送機6000在工作臺1000的上部延伸而成,從基板S被引入的區域延伸到使完成等離子表面處理及塗層工序的基板S向工作臺1000外側引出的區域。The substrate conveyor 6000 is disposed at an upper portion of the table 1000 and is extended to transport the substrate S to the plasma processing machine 2000 and the ejection unit 3100. That is, the substrate conveyor 6000 extends over the upper portion of the table 1000, and extends from a region where the substrate S is introduced to a region where the substrate S that has completed the plasma surface treatment and the coating step is taken out to the outside of the table 1000.

基板輸送機6000包括:第一基板輸送機4000,從基板S被引入的區域延伸到噴射單元3100的前端,輸送基板S使其通過等離子處理機2000的下側;以及第二基板輸送機5000,從第一基板輸送機4000延伸到基板S被引出的區域,輸送基板S使其通過噴射單元3100下側。The substrate conveyor 6000 includes a first substrate conveyor 4000 extending from a region where the substrate S is introduced to a front end of the ejection unit 3100, transporting the substrate S to pass through a lower side of the plasma processing machine 2000, and a second substrate conveyor 5000, The first substrate conveyor 4000 is extended to a region where the substrate S is taken out, and the substrate S is transported to pass through the lower side of the ejection unit 3100.

第一基板輸送機4000包括:基板引入部4100,設置於塗層工序進行方向上的等離子處理機的後方,用於臨時支撑被引入的基板S;第一水平驅動部4200,在從基板S被引入的區域到噴射單元3100之間的區域上延伸而成;第一動力源4300,與第一水平驅動部4200相連接,用於運行第一水平驅動部4200;一對第一導軌4400,沿著第一水平驅動部4200的兩側平行地設置;第一基板輸送部4500,以與第一水平驅動部4200及第一導軌4400相連接的方式設置,借助第一水平驅動部4200的驅動來沿著第一導軌4400進行水平移動;基板傳遞部4600,從第一基板輸送部4500接收完成等離子處理的基板S並提供支撑。The first substrate conveyor 4000 includes a substrate introduction portion 4100 disposed at the rear of the plasma processing machine in the direction in which the coating process is performed, for temporarily supporting the introduced substrate S; the first horizontal driving portion 4200 is The introduced area extends to a region between the spraying units 3100; the first power source 4300 is connected to the first horizontal driving portion 4200 for operating the first horizontal driving portion 4200; a pair of first guiding rails 4400, along The two sides of the first horizontal driving portion 4200 are disposed in parallel; the first substrate conveying portion 4500 is disposed in connection with the first horizontal driving portion 4200 and the first rail 4400, and is driven by the driving of the first horizontal driving portion 4200. The horizontal movement is performed along the first rail 4400; the substrate transfer portion 4600 receives the substrate S that has completed the plasma processing from the first substrate transport portion 4500 and provides support.

基板引入部4100包括:一對支撑部件4110,在第一水平驅動部4200的兩側方向相互並排地設置;以及複數個滾子4120,分別設置於一對支撑部件4110,並在上部具有托盤T,托盤用於支撑爲了塗層而被引入的基板S。其中,安置有基板S的托盤T安放在複數個滾子4120上。The substrate introduction portion 4100 includes a pair of support members 4110 disposed side by side in the direction of both sides of the first horizontal drive portion 4200, and a plurality of rollers 4120 respectively provided to the pair of support members 4110 and having the tray T at the upper portion The tray is used to support the substrate S introduced for the coating. Among them, the tray T on which the substrate S is placed is placed on a plurality of rollers 4120.

第一水平驅動部4200設置於一對支撑部件4110之間,一端與第一動力源4300相連接。根據實施例的第一水平驅動部4200爲滾珠絲桿,第一動力源4300可以是使滾珠絲桿旋轉的馬達。The first horizontal driving portion 4200 is disposed between the pair of supporting members 4110, and one end thereof is connected to the first power source 4300. The first horizontal driving portion 4200 according to the embodiment is a ball screw, and the first power source 4300 may be a motor that rotates the ball screw.

一對第一導軌4400分別向第一水平驅動部4200的兩側間隔設置,並沿著第一水平驅動部4200的延伸方向延伸而成。並且,一對第一導軌4400位於構成基板引入部4100的一對支撑部件4110之間。即,一對第一導軌4400之間的相隔距離小於一對支撑部件4400之間的相隔距離。根據實施例的第一導軌4400例如可以是直線導軌。The pair of first rails 4400 are respectively spaced apart from the two sides of the first horizontal driving portion 4200 and extend along the extending direction of the first horizontal driving portion 4200. Further, the pair of first rails 4400 are located between the pair of support members 4110 constituting the substrate introduction portion 4100. That is, the distance between the pair of first rails 4400 is smaller than the distance between the pair of support members 4400. The first rail 4400 according to an embodiment may be, for example, a linear guide.

第一基板輸送部4500在上部安置基板S,並沿著第一導軌4400進行水平移動,使基板S向釋放或輻射等離子的等離子處理機2000下側進行水平移動。根據實施例的第一基板輸送部4500包括:一對移動塊4520,分別安裝在一對第一導軌4400的上部並進行滑動;基板安放台4510,位於一對移動塊4520的上側,安放有用於支撑基板S的托盤T;固定部件4530,用於連接移動塊4520和基板安放台4510之間;以及升降驅動部4540,設置於移動塊4520和基板安放台4510,用於使基板安放台4510進行升降。The first substrate transporting portion 4500 is disposed on the upper portion of the substrate S and horizontally moved along the first rail 4400 to horizontally move the substrate S toward the lower side of the plasma processing machine 2000 that releases or radiates plasma. The first substrate transporting portion 4500 according to the embodiment includes a pair of moving blocks 4520 that are respectively mounted on the upper portions of the pair of first rails 4400 and slid; the substrate mounting table 4510 is located on the upper side of the pair of moving blocks 4520, and is placed for mounting on the upper side of the pair of moving blocks 4520 a tray T supporting the substrate S; a fixing member 4530 for connecting between the moving block 4520 and the substrate mounting table 4510; and a lifting driving portion 4540 disposed on the moving block 4520 and the substrate mounting table 4510 for the substrate mounting table 4510 Lifting.

第一基板輸送部4500的一對移動塊4520包括:連接部件4550,以在第一導軌4400的上側沿著與第一導軌4400相對應的方向延伸的方式設置,其延伸長度短於第一導軌4400,用於連接一對移動塊4520之間;以及水平移動部件(未圖示),以將連接部件4550和第一水平驅動部4200之間相連接的方式進行設置,並沿著第一水平驅動部4200進行水平移動。The pair of moving blocks 4520 of the first substrate conveying portion 4500 include: a connecting member 4550 to be disposed on the upper side of the first rail 4400 in a direction extending corresponding to the first rail 4400, the extension length being shorter than the first rail 4400 for connecting between a pair of moving blocks 4520; and a horizontal moving member (not shown) for setting the connection between the connecting member 4550 and the first horizontal driving portion 4200, and along the first level The drive unit 4200 performs horizontal movement.

當然,連接部件4550及第一水平驅動部4200不受此限定,可使用能夠使移動塊4520進行水平移動的各種手段。Of course, the connecting member 4550 and the first horizontal driving portion 4200 are not limited thereto, and various means capable of horizontally moving the moving block 4520 can be used.

第一基板輸送部4500的基板安放台4510作爲爲了對基板S表面實施等離子處理而使基板S藉由等離子處理機2000的手段,以借助升降驅動部4540及固定部件4530來與移動塊4520相連接的方式設置。根據實施例的基板安放台4510分別位於一對移動塊4520的上側。The substrate mounting table 4510 of the first substrate transport unit 4500 is connected to the moving block 4520 by means of the elevation driving unit 4540 and the fixing member 4530 by means of plasma processing on the surface of the substrate S to cause the substrate S to be processed by the plasma processing machine 2000. Way to set. The substrate mounting table 4510 according to the embodiment is located on the upper side of the pair of moving blocks 4520, respectively.

當然,基板安放台4510不限定於上述的結構及形狀,可借助移動塊4520來沿著第一導軌4400進行水平移動,可實施各種變更,使得在上部安放基板S。Needless to say, the substrate mounting table 4510 is not limited to the above-described configuration and shape, and can be horizontally moved along the first rail 4400 by the moving block 4520, and various modifications can be made so that the substrate S is placed on the upper portion.

第一基板輸送部4500的升降驅動部4540將基板安置在基板安放台4510,並爲了將所安置的基板S向基板傳遞部4600傳遞,使基板安放台4510升降。根據實施例的升降驅動部4540可以是汽缸和活塞的組合結構。The elevation drive unit 4540 of the first substrate conveyance unit 4500 places the substrate on the substrate mounting table 4510, and lifts the substrate placement table 4510 in order to transfer the disposed substrate S to the substrate transfer portion 4600. The elevation drive portion 4540 according to an embodiment may be a combined structure of a cylinder and a piston.

第一基板輸送部4500的固定部件4530在升降驅動部4540工作時起到防止基板安放台4510左右流動的嚮導作用。The fixing member 4530 of the first substrate conveying portion 4500 functions as a guide for preventing the substrate mounting table 4510 from flowing to the left and right when the lifting/lowering driving unit 4540 is operated.

當然,升降驅動部4540及固定部件4530不受此限定,可使用能夠使基板安放台4510升降的各種手段。Of course, the elevation drive unit 4540 and the fixing member 4530 are not limited thereto, and various means capable of raising and lowering the substrate mounting table 4510 can be used.

基板傳遞部4600設置於第一基板輸送部4500的水平移動路徑上,接收經過等離子處理的基板S並提供臨時支撑。這種基板傳遞部4600包括:一對支撑部件4610,在上部支撑有基板S;以及固定部件4620,分別將一對支撑部件4610固定在工作臺1000的上部。一對支撑部件4610分別位於一對第一導軌4400各自的外側,沿著第一導軌4400延伸方向延伸而延伸,長度短於第一導軌4400。此時,一對支撑部件4610之間的間隔大於構成第一基板輸送部4500的一對基板安放台4510之間的間隔。即,相比於第一基板輸送部4500的基板安放台4510,基板傳遞部4600的支撑部件4610位於相對外側。The substrate transfer portion 4600 is disposed on the horizontal movement path of the first substrate transfer portion 4500, receives the plasma-treated substrate S, and provides temporary support. The substrate transfer portion 4600 includes a pair of support members 4610 that support the substrate S at the upper portion, and a fixing member 4620 that fixes the pair of support members 4610 to the upper portion of the table 1000, respectively. The pair of support members 4610 are respectively located outside the pair of first rails 4400, extend along the extending direction of the first rail 4400, and have a shorter length than the first rail 4400. At this time, the interval between the pair of supporting members 4610 is larger than the interval between the pair of substrate placing tables 4510 constituting the first substrate conveying portion 4500. That is, the support member 4610 of the substrate transfer portion 4600 is located on the opposite side than the substrate mounting table 4510 of the first substrate transport portion 4500.

第二基板輸送機5000包括:第二水平驅動部5200,從完成塗層工序的基板S被引出的區域向等離子處理機2000之間的區域延伸而成;第二動力源5300,與第二水平驅動部5200相連接,並使第二水平驅動部5200運行;一對第二導軌5400,沿著第二水平驅動部5200的兩側平行地設置;第二基板輸送部5500,可沿著第二導軌5400輸送;第三基板輸送部5800,設置於第二基板輸送部5500的前方,以與第二水平驅動部5200及第二導軌5400相連接的方式設置,並可沿著第二導軌5400輸送;固定條5700,用於連接第二基板輸送部5500和第三基板輸送部5800;塗層支撑部5600,從第二基板輸送部5500接收完成塗層工序的基板S並提供支撑,在上部實施基板S塗層工序;基板引出部5900,設置於塗層輸送機7000的前方,通過支撑已完成塗層的基板S並使基板S引出。The second substrate conveyor 5000 includes: a second horizontal driving portion 5200 extending from a region where the substrate S in which the coating process is completed is extended to a region between the plasma processing machines 2000; and a second power source 5300, and a second level The driving portion 5200 is connected and the second horizontal driving portion 5200 is operated; a pair of second rails 5400 are disposed in parallel along both sides of the second horizontal driving portion 5200; and the second substrate conveying portion 5500 is along the second The guide rail 5400 is transported; the third substrate transport unit 5800 is disposed in front of the second substrate transport unit 5500, and is disposed in connection with the second horizontal drive unit 5200 and the second guide rail 5400, and can be transported along the second guide rail 5400. a fixing strip 5700 for connecting the second substrate conveying portion 5500 and the third substrate conveying portion 5800, and a coating supporting portion 5600 for receiving the substrate S that completes the coating process from the second substrate conveying portion 5500 and providing support, and implementing the upper portion The substrate S coating step; the substrate lead-out portion 5900 is disposed in front of the coating conveyor 7000, and supports the substrate S having completed the coating to take the substrate S out.

第二水平驅動部5200位於等離子處理機2000的前方,並從塗層輸送機7000到基板S引出區域延伸而成。並且,第二水平驅動部5200位於一對第二導軌5400之間,並沿著塗層工序進行方向延伸而成。根據實施例的第二水平驅動部5200爲滾珠絲桿,第二動力源5300可以是使滾珠絲桿旋轉的馬達。The second horizontal driving portion 5200 is located in front of the plasma processing machine 2000 and extends from the coating conveyor 7000 to the substrate S lead-out area. Further, the second horizontal driving portion 5200 is located between the pair of second guide rails 5400 and extends in the direction in which the coating step is performed. The second horizontal driving portion 5200 according to the embodiment is a ball screw, and the second power source 5300 may be a motor that rotates the ball screw.

一對第二導軌5400分別沿著第二水平驅動部5200的兩側間隔設置,並沿著第二水平驅動部5200的延伸方向進行延伸。根據實施例的第二導軌5400例如爲直線導軌。The pair of second rails 5400 are respectively spaced apart along both sides of the second horizontal driving portion 5200 and extend along the extending direction of the second horizontal driving portion 5200. The second rail 5400 according to the embodiment is, for example, a linear guide.

使基板S安置在第二基板輸送部5500的上部,沿著第二導軌5400進行水平移動,使基板S向噴射單元3100的下側進行水平移動。根據實施例的第二基板輸送部5500具有與前述的第一基板輸送部4500相似的結構。即,第二基板輸送部5500包括:一對移動塊5520,分別安裝在一對第二導軌5400的上部並進行滑動;基板安放台5510,位於一對移動塊5520的上側,安放有用於支撑基板S的托盤T;固定部件5530,用於連接移動塊5520和基板安放台5510之間;以及升降驅動部5540,設置於移動塊5520和基板安放台5510,用於使基板安放台5510升降。The substrate S is placed on the upper portion of the second substrate transport portion 5500, horizontally moved along the second rail 5400, and the substrate S is horizontally moved to the lower side of the ejection unit 3100. The second substrate conveying portion 5500 according to the embodiment has a structure similar to that of the aforementioned first substrate conveying portion 4500. That is, the second substrate transporting portion 5500 includes a pair of moving blocks 5520 that are respectively mounted on the upper portions of the pair of second rails 5400 and slid; the substrate mounting table 5510 is located on the upper side of the pair of moving blocks 5520, and is mounted for supporting the substrate. A tray T of S; a fixing member 5530 for connecting between the moving block 5520 and the substrate mounting table 5510; and a lifting drive portion 5540 disposed on the moving block 5520 and the substrate mounting table 5510 for lifting the substrate mounting table 5510.

這種第二基板輸送部5500借助固定條5700而與第三基板輸送部5800相連接,借助第三基板輸送部5800的水平移動來移動。The second substrate conveyance portion 5500 is connected to the third substrate conveyance portion 5800 via the fixing bar 5700, and is moved by the horizontal movement of the third substrate conveyance portion 5800.

第二基板輸送部5500的一對移動塊5520包括連接部件5550,在第二導軌5400的上側沿著與第二導軌5400相對應的方向延伸設置,延伸長度短於第二導軌5400,用於連接一對移動塊5520之間。The pair of moving blocks 5520 of the second substrate conveying portion 5500 includes a connecting member 5550 extending in a direction corresponding to the second rail 5400 on the upper side of the second rail 5400, the extending length being shorter than the second rail 5400 for connecting A pair of moving blocks 5520.

連接部件5550包括固定條5700,固定條5700與第三基板輸送部5800相連接。The connecting member 5550 includes a fixing strip 5700 that is coupled to the third substrate conveying portion 5800.

連接部件5550及固定條5700不受此限定,可使用能夠使移動塊5520進行水平移動的各種手段。The connecting member 5550 and the fixing bar 5700 are not limited thereto, and various means capable of horizontally moving the moving block 5520 can be used.

第二基板輸送部5500的基板安放台5510作爲使經過等離子表面處理的基板向塗層機3000進行水平移動的手段,以借助升降驅動部5540及固定部件5530來與移動塊5520相連接的方式設置。根據實施例的基板安放台5510分別位於一對移動塊5520的上側。The substrate mounting table 5510 of the second substrate transport unit 5500 is provided as a means for horizontally moving the substrate subjected to the plasma surface treatment to the coating machine 3000, and is connected to the moving block 5520 by the elevation driving unit 5540 and the fixing member 5530. . The substrate mounting table 5510 according to the embodiment is located on the upper side of the pair of moving blocks 5520, respectively.

當然,基板安放台5510不限定於上述的結構及形狀,可借助移動塊5520來沿著第二導軌5400進行水平移動,可實施各種變更,使得在上部安放基板S。Of course, the substrate mounting table 5510 is not limited to the above-described configuration and shape, and can be horizontally moved along the second rail 5400 by the moving block 5520, and various modifications can be made to place the substrate S on the upper portion.

第二基板輸送部5500的升降驅動部5540將基板安置在基板安放台5510,並爲了將所安置的基板S向塗層支撑部5600傳遞,使基板安放台5510升降。根據實施例的升降驅動部5540可以是汽缸和活塞的組合結構。The elevation drive unit 5540 of the second substrate conveyance unit 5500 places the substrate on the substrate mounting table 5510, and lifts the substrate placement table 5510 in order to transfer the disposed substrate S to the coating support portion 5600. The lift driving portion 5540 according to the embodiment may be a combined structure of a cylinder and a piston.

第二基板輸送部5500的固定部件5530在升降驅動部5540工作時起到防止基板安放台5510左右流動的嚮導作用。The fixing member 5530 of the second substrate conveying unit 5500 serves as a guide for preventing the substrate mounting table 5510 from flowing to the left and right when the lifting/lowering driving unit 5540 is operated.

當然,升降驅動部5540及固定部件5530不受此限定,可使用能夠使基板安放台5510升降的各種手段。Of course, the elevation drive unit 5540 and the fixing member 5530 are not limited thereto, and various means capable of raising and lowering the substrate mounting table 5510 can be used.

塗層支撑部5600設置於第二基板輸送部5500和第三基板輸送部5800的水平移動路徑上,接收經過等離子處理的基板S並提供臨時支撑。這種塗層支撑部5600包括:一對支撑部件5610,在上部支撑有基板S;以及固定部件5620,分別將一對支撑部件5610固定在工作臺1000的上部。一對支撑部件5610分別位於一對第二導軌5400各自的外側,沿著第二導軌5400延伸方向延伸而成,長度短於第二導軌5400。此時,一對支撑部件5610之間的間隔大於構成第二基板輸送部5500的一對基板安放台5510之間的間隔。即,相比於第二基板輸送部5500的基板安放台5510,塗層支撑部5600的支撑部件5610位於相對外側。The coating support portion 5600 is disposed on the horizontal movement path of the second substrate conveying portion 5500 and the third substrate conveying portion 5800, receives the plasma-treated substrate S and provides temporary support. The coating support portion 5600 includes a pair of support members 5610 on which the substrate S is supported, and a fixing member 5620 that fixes the pair of support members 5610 to the upper portion of the table 1000, respectively. The pair of support members 5610 are respectively located outside the pair of second guide rails 5400, and extend along the extending direction of the second guide rail 5400, and have a shorter length than the second guide rail 5400. At this time, the interval between the pair of supporting members 5610 is larger than the interval between the pair of substrate placing tables 5510 constituting the second substrate conveying portion 5500. That is, the support member 5610 of the coating support portion 5600 is located on the opposite side than the substrate mounting table 5510 of the second substrate conveyance portion 5500.

第三基板輸送部5800沿著第二導軌5400向塗層支撑部5600的支撑部件5610下側移動,將支撑於塗層支撑部5610上的基板S安置在上部後,沿著基板引出部5900方向進行水平移動。這種第三基板輸送部5800具有與第一基板輸送部4500相同的結構。即,第三基板移送部5800包括:一對移動塊5820,分別安裝在一對第二導軌5400的上部並進行滑動;基板安放台5810,位於一對移動塊5820的上側,安放有用於支撑基板S的托盤T;固定部件5830,用於連接移動塊5820和基板安放台5810之間;以及升降驅動部5840,設置於移動塊5820和基板安放台5810,用於使基板安放台5810升降。The third substrate transporting portion 5800 moves along the second rail 5400 toward the lower side of the support member 5610 of the coating support portion 5600, and the substrate S supported on the coating support portion 5610 is placed on the upper portion, along the direction of the substrate lead portion 5900. Make horizontal movements. This third substrate conveying portion 5800 has the same structure as the first substrate conveying portion 4500. That is, the third substrate transfer portion 5800 includes a pair of moving blocks 5820 that are respectively mounted on the upper portions of the pair of second guide rails 5400 and slid; the substrate mounting table 5810 is located on the upper side of the pair of moving blocks 5820, and is mounted for supporting the substrate. A tray T of S; a fixing member 5830 for connecting between the moving block 5820 and the substrate mounting table 5810; and a lifting drive portion 5840 disposed on the moving block 5820 and the substrate mounting table 5810 for lifting the substrate mounting table 5810.

第三基板移送部5800的一對移動塊5820包括連接部件5850,在第二導軌5400的上側沿著與第二導軌5400相對應的方向延伸設置,延伸長度短於第二導軌5400,用於連接一對移動塊5820之間;以及水平移動部件(未圖示),以將連接部件5850和第二水平驅動部5200之間相連接的方式進行設置,並沿著第二水平驅動部5200進行水平移動。The pair of moving blocks 5820 of the third substrate transfer portion 5800 includes a connecting member 5850 extending in a direction corresponding to the second rail 5400 on the upper side of the second rail 5400, the extension length being shorter than the second rail 5400 for connection A pair of moving blocks 5820; and a horizontal moving member (not shown) are provided to connect the connecting member 5850 and the second horizontal driving portion 5200, and are horizontally arranged along the second horizontal driving portion 5200. mobile.

連接部件5850包括固定條5700,固定條5700與第三基板輸送部5800相連接。The connecting member 5850 includes a fixing strip 5700 that is coupled to the third substrate conveying portion 5800.

當然,連接部件5850及固定條5700不受此限定,可使用能夠使移動塊5820進行水平移動的各種手段。Of course, the connecting member 5850 and the fixing bar 5700 are not limited thereto, and various means capable of horizontally moving the moving block 5820 can be used.

第三基板輸送部5800的基板安放台5810作爲對經過塗層處理的基板進行輸送的手段,以借助升降驅動部5840及固定部件5830來與移動塊5820相連接的方式設置。根據實施例的基板安放台5810分別位於一對移動塊5820的上側。The substrate mounting table 5810 of the third substrate transport unit 5800 is provided as a means for transporting the coated substrate, and is connected to the moving block 5820 by means of the elevation drive unit 5840 and the fixing member 5830. The substrate mounting tables 5810 according to the embodiment are respectively located on the upper side of the pair of moving blocks 5820.

當然,基板安放台5810不限定於上述的結構及形狀,可借助移動塊5820來沿著第二導軌5400進行水平移動,可實施各種變更,使得在上部安放基板S。Of course, the substrate mounting table 5810 is not limited to the above-described configuration and shape, and can be horizontally moved along the second rail 5400 by the moving block 5820, and various modifications can be made so that the substrate S is placed on the upper portion.

第三基板輸送部5800的升降驅動部5840將基板S安置在基板安放台5810,並爲了將所安置的基板S向基板引出區域傳遞,使基板安放台5810升降。實施例的升降驅動部5840可以是汽缸和活塞的組合結構。The elevation drive unit 5840 of the third substrate conveyance unit 5800 places the substrate S on the substrate placement table 5810, and lifts and lowers the substrate placement table 5810 in order to transfer the disposed substrate S to the substrate lead-out area. The lift drive portion 5840 of the embodiment may be a combined structure of a cylinder and a piston.

第三基板輸送部5800的固定部件5830在升降驅動部5840工作時起到防止基板安放台5810左右流動的嚮導作用。The fixing member 5830 of the third substrate conveying unit 5800 functions as a guide for preventing the substrate mounting table 5810 from flowing to the left and right when the lifting/lowering driving unit 5840 is operated.

當然,升降驅動部5840及固定部件5830不受此限定,可使用能夠使基板安放台5810升降的各種手段。Of course, the elevation drive unit 5840 and the fixing member 5830 are not limited thereto, and various means capable of raising and lowering the substrate mounting table 5810 can be used.

基板引出部臨時支撑借助第三基板輸送部而向基板引出區域被輸送的基板,並使基板向工作臺的外側引出。其中,在基板引出部的外側可以設置烤爐,從基板引出部被引出的基板,可裝入烤爐進行乾燥。基板引出部包括:一對支撑部件5910,在第二導軌5400的兩側方向相互並排地設置;複數個連接條5920,各自用於連接一對支撑部件5910之間,以沿著一對支撑部件5910的延伸方向排列的方式相互間隔設置;以及複數個滾子5930,分別安裝在複數個連接條5920,在上部安置有托盤。The substrate lead-out portion temporarily supports the substrate that is transported to the substrate lead-out region by the third substrate transport portion, and guides the substrate to the outside of the table. In addition, an oven may be provided outside the substrate lead-out portion, and the substrate taken out from the substrate lead-out portion may be placed in an oven to be dried. The substrate take-up portion includes: a pair of support members 5910 disposed side by side in the direction of both sides of the second guide rail 5400; a plurality of connecting strips 5920 each for connecting between the pair of support members 5910 to follow a pair of support members The extending direction of the 5910 is arranged to be spaced apart from each other; and a plurality of rollers 5930 are respectively mounted on the plurality of connecting bars 5920, and the tray is disposed at the upper portion.

以下,將參照第1圖至第13圖,對根據本發明的實施例的塗層裝置的工作進行說明。Hereinafter, the operation of the coating apparatus according to the embodiment of the present invention will be described with reference to Figs. 1 to 13.

首先,將擬在上部噴塗塗層膜的基板S安置在托盤T上,使托盤T安放在基板引入部4100的複數個滾子4120上。並且,運行第一基板輸送部4500的升降驅動部4540,使基板安放台4510上升,使得位於基板引入部4100的複數個滾子4120的上側。由此,安放在基板引入部4100的複數個滾子4120上的托盤T置於第一基板輸送部4500的基板安放台4510。First, the substrate S on which the coating film is to be sprayed on the upper portion is placed on the tray T, and the tray T is placed on the plurality of rollers 4120 of the substrate introduction portion 4100. Then, the elevation drive unit 4540 of the first substrate conveyance unit 4500 is operated to raise the substrate mounting table 4510 so as to be positioned above the plurality of rollers 4120 of the substrate introduction portion 4100. Thereby, the tray T placed on the plurality of rollers 4120 of the substrate introduction portion 4100 is placed on the substrate mounting table 4510 of the first substrate conveyance portion 4500.

並且,利用第一動力源4300運行第一水平驅動部4400,使第一基板輸送部4500沿著塗層工序進行方向進行水平移動。此時,如第11圖所示,第一基板輸送部4500經過等離子處理機2000的下側,並水平移動到等離子處理機2000的前方或基板傳遞部4600的位置。更具體地,當利用第一動力源4300運行第一水平驅動部4200時,與第一基板輸送部4500的連接部件4550相連接的水平移動部件沿著第一水平驅動部4200移動,由此,第一基板輸送部4500的移動塊4520隨著第一導軌4400移動。此時,第一基板輸送部4500以經過等離子處理機2000下側的方式進行水平移動,借助由等離子處理機2000釋放或輻射的等離子來被進行表面處理。Then, the first horizontal drive unit 4400 is operated by the first power source 4300, and the first substrate transport unit 4500 is horizontally moved in the direction in which the coating process is performed. At this time, as shown in FIG. 11, the first substrate conveyance unit 4500 passes the lower side of the plasma processing machine 2000 and horizontally moves to the front of the plasma processing machine 2000 or the position of the substrate transfer portion 4600. More specifically, when the first horizontal driving portion 4200 is operated by the first power source 4300, the horizontal moving member connected to the connecting member 4550 of the first substrate conveying portion 4500 moves along the first horizontal driving portion 4200, thereby The moving block 4520 of the first substrate conveying portion 4500 moves with the first rail 4400. At this time, the first substrate conveying portion 4500 is horizontally moved so as to pass through the lower side of the plasma processing machine 2000, and is subjected to surface treatment by plasma released or radiated by the plasma processing machine 2000.

如上所述,在向一基板S表面實施等離子處理期間,首先,經等離子處理的基板S,能夠以安放在塗層支撑部5600的狀態,借助塗層機3000來實施塗層工序。以下,將對塗層工序進行詳細說明。As described above, during the plasma treatment on the surface of one substrate S, first, the plasma-treated substrate S can be subjected to the coating process by the coater 3000 in a state where the substrate S is placed on the coating support portion 5600. Hereinafter, the coating process will be described in detail.

借助第一基板輸送部4500來進行水平移動並且完成等離子處理的基板S,如第11圖所示,處於水平移動到位於等離子處理機2000的前方的基板傳遞部4600的位置的狀態。The substrate S that has been horizontally moved by the first substrate transport portion 4500 and has completed the plasma processing is in a state of being horizontally moved to the position of the substrate transfer portion 4600 located in front of the plasma processing machine 2000 as shown in FIG.

當結束針對一基板S表面的等離子處理時,如第12圖所示,將安放在第一基板輸送部4500上的基板S置於基板傳遞部4600。爲此,利用第一基板輸送部4500的升降驅動部4540,使基板安放台4510下降,使其位置低於基板傳遞部4600的支撑部件4610,基板S支撑於基板傳遞部4600的支撑部件4610上。When the plasma treatment for the surface of one substrate S is finished, as shown in Fig. 12, the substrate S placed on the first substrate transport portion 4500 is placed in the substrate transfer portion 4600. Therefore, the substrate mounting table 4510 is lowered by the elevation driving portion 4540 of the first substrate conveying portion 4500 so as to be lower than the supporting member 4610 of the substrate transmitting portion 4600, and the substrate S is supported on the supporting member 4610 of the substrate transmitting portion 4600. .

接著,使第二基板輸送部5500和第三基板輸送部5800移動,並使安放在基板傳遞部4600上的基板S移動,如第13圖所示,將基板S安放在塗層支撑部5600上,將經塗層並置於塗層支撑部5600上的基板S安放在基板引出部5900上。爲此,如第12圖所示,使第二基板輸送部5500及第三基板輸送部5800後退,使第二基板輸送部5500位於基板傳遞部4600的位置,並使第三基板輸送部5800位於塗層支撑部5600的位置。爲了運行第二基板輸送部5500及第三基板輸送部 5600,驅動第二動力源5300及第二水平驅動部5200。由此,與第三基板輸送部5800的連接部件5850相連接的水平移動部件(未圖示)沿著第二水平驅動部5200而向塗層支撑部5600所在方向進行水平移動,此時,第三基板輸送部5800的移動塊5820沿著第二導軌5400而向塗層支撑部5600所在方向進行水平移動。並且,在本發明中,第三基板輸送部5800和第二基板輸送部5500借助固定條5700來相連接,因此,第三基板輸送部5800被輸送到塗層支撑部5600的力,通過固定條5700來向第二基板輸送部5500傳遞。因此,第二基板輸送部5500沿著第二導軌5400向基板傳遞部4600進行水平移動。Next, the second substrate transporting portion 5500 and the third substrate transporting portion 5800 are moved, and the substrate S placed on the substrate transmitting portion 4600 is moved, and as shown in FIG. 13, the substrate S is placed on the coating supporting portion 5600. The substrate S coated and placed on the coating support portion 5600 is placed on the substrate lead-out portion 5900. Therefore, as shown in Fig. 12, the second substrate transport unit 5500 and the third substrate transport unit 5800 are retracted, the second substrate transport unit 5500 is placed at the position of the substrate transfer unit 4600, and the third substrate transport unit 5800 is placed. The position of the coating support 5600. In order to operate the second substrate transfer unit 5500 and the third substrate transfer unit 5600, the second power source 5300 and the second horizontal drive unit 5200 are driven. Thereby, the horizontal moving member (not shown) connected to the connecting member 5850 of the third substrate conveying portion 5800 horizontally moves in the direction of the coating support portion 5600 along the second horizontal driving portion 5200. The moving block 5820 of the three-substrate conveying portion 5800 horizontally moves in the direction in which the coating support portion 5600 is located along the second rail 5400. Further, in the present invention, the third substrate conveying portion 5800 and the second substrate conveying portion 5500 are connected by the fixing bar 5700, and therefore, the force that the third substrate conveying portion 5800 is conveyed to the coating supporting portion 5600 passes through the fixing bar. 5700 is transmitted to the second substrate transfer unit 5500. Therefore, the second substrate transport portion 5500 horizontally moves toward the substrate transfer portion 4600 along the second rail 5400.

當第二基板輸送部5500被輸送向基板傳遞部4600,並且第三基板輸送部5800被輸送向塗層支撑部5600時,使基板S分別安放在第二基板輸送部5500及第三基板輸送部5800。爲此,運行第二基板輸送部5500的升降驅動部5540,並使基板安放台5510位於比基板傳遞部4600的支撑部件4610更高的位置時,基板S置於第二基板輸送部5500的基板安放台5510上。並且,當運行第三基板輸送部5800的升降驅動部5840,並使基板安放台5810位於比塗層支撑部5600的支撑部件5610更高的位置時,基板S置於第三基板輸送部5800的基板安放台5810上。When the second substrate transporting portion 5500 is transported to the substrate transfer portion 4600 and the third substrate transport portion 5800 is transported to the coating support portion 5600, the substrate S is placed on the second substrate transport portion 5500 and the third substrate transport portion, respectively. 5800. For this reason, when the elevation driving portion 5540 of the second substrate conveying portion 5500 is operated and the substrate mounting table 5510 is positioned higher than the supporting member 4610 of the substrate transmitting portion 4600, the substrate S is placed on the substrate of the second substrate conveying portion 5500. Placed on the platform 5510. Further, when the elevation driving portion 5840 of the third substrate conveying portion 5800 is operated and the substrate mounting table 5810 is positioned higher than the supporting member 5610 of the coating supporting portion 5600, the substrate S is placed at the third substrate conveying portion 5800. The substrate is placed on the stage 5810.

並且,再次反向運行第二動力源5300及第二水平驅動部5200,使第二基板輸送部5500向塗層支撑部5600的位置進行水平移動,並使第三基板輸送部5800向基板引出部5900的位置進行水平移動。之後,使第二基板安放台5510及基板安放台5810下降,如第13圖所示,第二基板安放台5110的基板S放在塗層支撑部5600上,第三基板安放台5810的基板S放在基板引出部5900上。放在基板引出部5900上的基板S借助複數個滾子5930而向外側方向移動後被引出。並且,被引出的基板S移動到位於工作臺1000外側的烤爐進行乾燥,或者自然乾燥。當然,乾燥方式不受此限定,可以設置其它烤爐,能夠藉由人力或其它的機構來將經塗層的基板S輸送到烤爐後,在烤爐中進行乾燥。Then, the second power source 5300 and the second horizontal drive unit 5200 are again operated in the reverse direction, the second substrate transport unit 5500 is horizontally moved to the position of the coating support portion 5600, and the third substrate transport unit 5800 is guided to the substrate lead-out portion. The position of the 5900 is moved horizontally. Thereafter, the second substrate mounting table 5510 and the substrate mounting table 5810 are lowered. As shown in FIG. 13, the substrate S of the second substrate mounting table 5110 is placed on the coating support portion 5600, and the substrate S of the third substrate mounting table 5810 is placed. It is placed on the substrate lead-out portion 5900. The substrate S placed on the substrate lead-out portion 5900 is moved outward by a plurality of rollers 5930 and then taken out. Further, the taken-out substrate S is moved to an oven located outside the table 1000 to be dried or naturally dried. Of course, the drying method is not limited thereto, and other ovens may be provided, and the coated substrate S can be dried in an oven after being conveyed to the oven by a human or other mechanism.

將基板S安置在塗層支撑部5600時,利用塗層機3000向基板S表面噴射塗層劑,例如噴射用於防指紋貼膜的氟類塗層劑,來形成塗層膜。參照第14圖進一步具體說明如下,首先,噴射單元3100一邊沿著塗層輸送機7000的第一塗層導軌7100而向X軸方向進行水平移動,一邊向基板S表面噴射塗層劑,來形成塗層膜。之後,爲了將噴射單元3100輸送到下一塗層區域,使噴射單元3100沿著第二塗層導軌7200向Y軸方向進行規定距離的移動。並且,再次一邊沿著第一塗層導軌7100向X軸方向進行水平移動,一邊向基板S噴射塗層劑,來形成塗層膜。即,噴射單元3100分别沿着第一塗層導軌7100 和第二塗層導軌7200進行水平移動來形成塗層膜,如第14圖所示,噴射單元3100 的移动形狀能夠是以“ㄹ”形狀進行反覆。When the substrate S is placed on the coating support portion 5600, a coating agent is sprayed onto the surface of the substrate S by the coater 3000, for example, by spraying a fluorine-based coating agent for the anti-fingerprint film to form a coating film. More specifically, referring to Fig. 14, first, the ejecting unit 3100 is formed by ejecting a coating agent onto the surface of the substrate S while moving horizontally in the X-axis direction along the first coating guide rail 7100 of the coating conveyor 7000. Coating film. Thereafter, in order to convey the ejection unit 3100 to the next coating region, the ejection unit 3100 is moved along the second coating guide rail 7200 by a predetermined distance in the Y-axis direction. Then, the coating agent is sprayed onto the substrate S while moving horizontally along the first coating guide rail 7100 in the X-axis direction to form a coating film. That is, the spraying unit 3100 is horizontally moved along the first coating rail 7100 and the second coating rail 7200 to form a coating film, as shown in Fig. 14, the moving shape of the spraying unit 3100 can be in the shape of "ᄅ" Repeat.

噴射單元具有複數個噴嘴3120:3121a、3121b、3121c、3122a、3122b、3122c、3123a、3123b、3123c、3124a、3124b、3124c,如第6圖及第8圖所示,根據第一實施例的複數個噴嘴3121a、3121b、3121c、3122a、3122b、3122c、3123a、3123b、3123c、3124a、3124b、3124c設置成在Y 軸方向的位置或其中心(C)的位置不相同。即,分別構成第一噴嘴組至第四噴嘴組3121、3122、3123、3124 的複數個噴嘴3121a、3121b、3121c、3122a、3122b、3122c、3123a、3123b、3123c、3124a、3124b、3124c在Y 軸方向的位置或其中心(C)的位置不相同,而且以之字形配置,使得具有互不相同的位置。因此,由複數個噴嘴3121a、3121b、3121c、3122a、3122b、3122c、3123a、3123b、3123c、3124a、3124b、3124c 分別排出塗層劑並向基板S滴塗(dotting)時,如第6圖所示,所滴塗的複數個滴點D不重疊。The spraying unit has a plurality of nozzles 3120: 3121a, 3121b, 3121c, 3122a, 3122b, 3122c, 3123a, 3123b, 3123c, 3124a, 3124b, 3124c, as shown in FIGS. 6 and 8, the plural according to the first embodiment The nozzles 3121a, 3121b, 3121c, 3122a, 3122b, 3122c, 3123a, 3123b, 3123c, 3124a, 3124b, 3124c are disposed such that the position in the Y-axis direction or the position of the center (C) thereof is different. That is, the plurality of nozzles 3121a, 3121b, 3121c, 3122a, 3122b, 3122c, 3123a, 3123b, 3123c, 3124a, 3124b, 3124c constituting the first nozzle group to the fourth nozzle group 3121, 3122, 3123, 3124 are respectively on the Y axis. The positions of the directions or the positions of the centers (C) thereof are different, and are arranged in a zigzag shape so as to have mutually different positions. Therefore, when a plurality of nozzles 3121a, 3121b, 3121c, 3122a, 3122b, 3122c, 3123a, 3123b, 3123c, 3124a, 3124b, 3124c respectively discharge the coating agent and dotting to the substrate S, as shown in FIG. It is shown that the plurality of drop points D that are dispensed do not overlap.

並且,當一邊使噴射單元3100沿著X軸方向進行水平移動,一邊從複數個噴嘴3121a、3121b、3121c、3122a、3122b、3122c、3123a、3123b、3123c、3124a、3124b、3124c各自噴射塗層劑時,從複數個噴嘴3121a、3121b、3121c、3122a、3122b、3122c、3123a、3123b、3123c、3124a、3124b、3124c 各自連續地噴塗滴點D,進而塗布成沿著X 軸方向延伸的線形狀。此時,借助各噴嘴3121a、3121b、3121c、3122a、3122b、3122c、3123a、3123b、3123c、3124a、3124b、3124c來噴塗的塗布線中,除了借助第三噴嘴3121c及第十噴嘴3124a來噴塗的塗布線之外,分別與兩個塗布線沿著Y 軸方向重疊。並且,優選地,藉由將噴射單元3100沿著Y軸方向進行規定距離的移動,使得沿著X軸方向進行水平移動而最新形成的借助第十噴嘴3124a來噴塗的塗布線與沿著X 軸方向進行一次移動時所形成的借助第三噴嘴3124a來噴塗的塗布線重疊,使得借助第三噴嘴3121c及第十噴嘴3124a噴塗的塗布線也與兩個塗布線沿著Y軸方向重疊。由此,將噴射單元3100沿著X軸方向進行一次移動時,可針對一區域形成均勻的塗層膜,進而具有可提高塗層膜品質的效果。Further, the coating unit 3100a, 3121b At this time, the plurality of nozzles 3121a, 3121b, 3121c, 3122a, 3122b, 3122c, 3123a, 3123b, 3123c, 3124a, 3124b, and 3124c are continuously sprayed with the dropping point D, and are further applied in a line shape extending in the X-axis direction. At this time, the coating lines sprayed by the respective nozzles 3121a, 3121b, 3121c, 3122a, 3122b, 3122c, 3123a, 3123b, 3123c, 3124a, 3124b, 3124c are sprayed by the third nozzle 3121c and the tenth nozzle 3124a. In addition to the coating line, the two coating lines are respectively overlapped in the Y-axis direction. Further, preferably, by spraying the ejection unit 3100 at a predetermined distance in the Y-axis direction, the coating line sprayed by the tenth nozzle 3124a newly formed along the X-axis direction and horizontally moved is along the X-axis. The coating lines sprayed by the third nozzle 3124a formed when the direction is moved once are overlapped, so that the coating lines sprayed by the third nozzles 3121c and the tenth nozzles 3124a are also overlapped with the two coating lines in the Y-axis direction. Thereby, when the ejection unit 3100 is moved once in the X-axis direction, a uniform coating film can be formed for one region, and the effect of improving the quality of the coating film can be obtained.

附圖文字Drawing text

第1圖:Figure 1:

3300:塗層劑罐3300: coating agent tank

3400:氣體罐3400: Gas tank

第3圖:Figure 3:

3300:塗層劑罐3300: coating agent tank

3400:氣體罐3400: Gas tank

3300:塗層劑罐3300: coating agent tank

3300:塗層劑罐3300: coating agent tank

第8圖:Figure 8:

塗布線重疊區域Coating line overlap area

第10圖:Figure 10:

塗布線重疊區域Coating line overlap area

1000‧‧‧工作臺
2000‧‧‧等離子處理機
3100‧‧‧噴射單元
3110‧‧‧噴嘴支撑部
3111、4530、4620、5530、5620、5830‧‧‧固定部件
3112‧‧‧噴嘴支撑部件
3120、3121a、3121b、3121c、3122a、3122b、3122c、3123a、3123b、3123c、3124a、3124b、3124c、3125a、3125b、3125c、3126a、3126b、3126c、3127a、3127b、3127c、3128a、3128b、3128c、512‧‧‧噴嘴
3121、3122、3123、3124、3125、3126、3127、3128‧‧‧噴嘴組
3210‧‧‧注射器主體
3220‧‧‧桿
3200‧‧‧注射泵
3300‧‧‧塗層劑罐
3400‧‧‧氣體罐
3500、3600‧‧‧塗層劑供給管
3700‧‧‧止回閥
3710‧‧‧本體
3711h‧‧‧流入口
3712h‧‧‧排出口
3720‧‧‧阻斷部件
3730‧‧‧彈簧
3800‧‧‧氣體供給管
3900、MFC‧‧‧流量控制部
4000、5000、6000‧‧‧基板輸送機
4100‧‧‧基板引入部
4110、4610、5610、5910‧‧‧支撑部件
4120、5930‧‧‧滾子
4200、5200‧‧‧水平驅動部
4300、5300‧‧‧動力源
4400、5400‧‧‧導軌
4500、5500、5800‧‧‧基板輸送部
4510、5510、5810‧‧‧基板安放台
4520、5520、5820‧‧‧移動塊
4540、5540、5840‧‧‧升降驅動部
4550、5550、5850‧‧‧連接部件
4600‧‧‧基板傳遞部
5600‧‧‧塗層支撑部
5700‧‧‧固定條
5900‧‧‧基板引出部
5920‧‧‧連接條
7000‧‧‧塗層輸送機
7100、7200‧‧‧塗層導軌
7300‧‧‧支撑部
7400、7500‧‧‧塗層移動塊
A‧‧‧重疊區域
B‧‧‧相隔距離
C‧‧‧中心
D‧‧‧滴點
L1~L23‧‧‧塗布線
S‧‧‧基板
T‧‧‧托盤
X‧‧‧X軸
Y‧‧‧Y軸
1000‧‧‧Workbench
2000‧‧‧plasma processor
3100‧‧‧Spray unit
3110‧‧‧Nozzle support
3111, 4530, 4620, 5530, 5620, 5830‧‧‧ fixed parts
3112‧‧‧Nozzle support parts
3120, 3121a, 3121b, 3121c, 3122a, 3122b, 3122c, 3123a, 3123b, 3123c, 3124a, 3124b, 3124c, 3125a, 3125b, 3125c, 3126a, 3126b, 3126c, 3127a, 3127b, 3127c, 3128a, 3128b, 3128c, 512‧‧‧ nozzle
3121, 3122, 3123, 3124, 3125, 3126, 3127, 3128‧‧‧ nozzle groups
3210‧‧‧Syringe body
3220‧‧‧ rod
3200‧‧‧Syringe pump
3300‧‧‧ Coating agent tank
3400‧‧‧ gas tank
3500, 3600‧‧‧ coating agent supply tube
3700‧‧‧ check valve
3710‧‧‧ Ontology
3711h‧‧‧flow entrance
3712h‧‧‧Export
3720‧‧‧Blocking parts
3730‧‧ Spring
3800‧‧‧ gas supply pipe
3900, MFC‧‧‧Flow Control Department
4000, 5000, 6000‧‧‧ substrate conveyor
4100‧‧‧Substrate introduction
4110, 4610, 5610, 5910‧‧‧ support parts
4120, 5930‧‧ ‧rollers
4200, 5200‧‧‧ horizontal drive department
4300, 5300‧‧‧ power source
4400, 5400‧‧‧ rails
4500, 5500, 5800‧‧‧ substrate transport department
4510, 5510, 5810‧‧‧ substrate mounting table
4520, 5520, 5820‧‧‧ moving blocks
4540, 5540, 5840‧‧‧ Lifting and driving department
4550, 5550, 5850‧‧‧ connecting parts
4600‧‧‧Substrate transfer department
5600‧‧‧Coated support
5700‧‧‧Fixed strip
5900‧‧‧Substrate lead-out
5920‧‧‧Connecting strip
7000‧‧‧Coating conveyor
7100, 7200‧‧‧ coated rail
7300‧‧‧Support
7400, 7500‧‧‧ coated moving blocks
A‧‧‧Overlapping area
B‧‧‧ separation distance
C‧‧‧ Center
D‧‧‧ drops
L1~L23‧‧‧ Coating line
S‧‧‧Substrate
T‧‧‧Tray
X‧‧‧X axis
Y‧‧‧Y axis

第1圖爲以模塊化方式表示根據本發明的實施例的塗層裝置的重要部分的示意圖。Fig. 1 is a schematic view showing a significant portion of a coating apparatus according to an embodiment of the present invention in a modular manner.

第2圖爲表示根據本發明的實施例的塗層裝置的立體圖。Fig. 2 is a perspective view showing a coating apparatus according to an embodiment of the present invention.

第3圖爲以模塊化方式表示根據本發明的實施例的塗層機的重要部分的示意圖。Fig. 3 is a schematic view showing a significant portion of a coater according to an embodiment of the present invention in a modular manner.

第4圖爲表示根據本發明的實施例的止回閥的剖視圖。第5圖爲表示根據本發明的實施例的噴射單元的立體圖。Fig. 4 is a cross-sectional view showing a check valve according to an embodiment of the present invention. Fig. 5 is a perspective view showing a spray unit according to an embodiment of the present invention.

爲了便於說明,省略圖示出與複數個噴嘴分別相連接的複數個第二供給管和複數個氣體供給管的附圖。For convenience of explanation, the drawings in which a plurality of second supply pipes and a plurality of gas supply pipes respectively connected to a plurality of nozzles are omitted are illustrated.

第6圖爲表示根據本發明的第一實施例的複數個噴嘴的配置結構和從複數個噴嘴分別向基板噴塗(dotting)的滴點的俯視圖。Fig. 6 is a plan view showing the arrangement structure of a plurality of nozzles according to the first embodiment of the present invention and the dropping points which are dotting from the plurality of nozzles to the substrate, respectively.

第7圖爲表示根據第一實施例的變形例的複數個噴嘴的配置結構和從複數個噴嘴分別向基板噴塗(dotting)的滴點的俯視圖。Fig. 7 is a plan view showing an arrangement structure of a plurality of nozzles according to a modification of the first embodiment and a dropping point which is dotting from the plurality of nozzles to the substrate.

第8圖爲表示根據本發明的第一實施例的複數個噴嘴的配置結構和借助複數個噴嘴來塗布的塗布線的一部分的俯視圖。Fig. 8 is a plan view showing a configuration of a plurality of nozzles according to a first embodiment of the present invention and a part of a coating line coated by a plurality of nozzles.

第9圖爲表示根據本發明的第二實施例的複數個噴嘴的配置結構和從複數個噴嘴分別向基板噴塗(dotting)的滴點的俯視圖。Fig. 9 is a plan view showing an arrangement structure of a plurality of nozzles and a dropping point which is dotting from a plurality of nozzles to a substrate according to a second embodiment of the present invention.

第10圖爲表示根據本發明的第二實施例的複數個噴嘴的配置結構和借助複數個噴嘴來塗布的塗布線的一部分的俯視圖。Fig. 10 is a plan view showing a configuration of a plurality of nozzles according to a second embodiment of the present invention and a part of a coating line coated by a plurality of nozzles.

第11圖至第13圖爲用於說明根據本發明的實施例的塗層裝置的工作的立體圖。11 to 13 are perspective views for explaining the operation of the coating apparatus according to the embodiment of the present invention.

第14圖爲以模式化方式表示根據本發明的實施例的噴射單元的水平移動的示意圖。Fig. 14 is a schematic view showing the horizontal movement of the ejection unit according to an embodiment of the present invention in a patterning manner.

第15圖爲表示用於說明以往的複數個噴嘴配置結構和借助複數個噴嘴配置結構的滴點的重疊的示意圖。Fig. 15 is a schematic view showing the overlapping of a plurality of conventional nozzle arrangement structures and dropping points by a plurality of nozzle arrangement structures.

2000‧‧‧等離子處理機 2000‧‧‧plasma processor

3100‧‧‧噴射單元 3100‧‧‧Spray unit

3200‧‧‧注射泵 3200‧‧‧Syringe pump

3300‧‧‧塗層劑罐 3300‧‧‧ Coating agent tank

3400‧‧‧氣體罐 3400‧‧‧ gas tank

3500‧‧‧第一塗層劑供給管 3500‧‧‧First coating agent supply tube

3600‧‧‧第二塗層劑供給管 3600‧‧‧Second coating agent supply tube

3700‧‧‧止回閥 3700‧‧‧ check valve

3800‧‧‧氣體供給管 3800‧‧‧ gas supply pipe

3900‧‧‧流量控制部 3900‧‧‧Flow Control Department

4400‧‧‧第一導軌 4400‧‧‧First rail

4500‧‧‧第一基板輸送 4500‧‧‧First substrate transport

4510‧‧‧基板安放台 4510‧‧‧Substrate placement table

4520‧‧‧移動塊 4520‧‧‧moving block

5400‧‧‧第二導軌 5400‧‧‧Second rail

5500‧‧‧第二基板輸送部 5500‧‧‧Second substrate conveying department

5510‧‧‧基板安放台 5510‧‧‧Substrate placement table

5520‧‧‧移動塊 5520‧‧‧moving block

5530‧‧‧固定部件 5530‧‧‧Fixed parts

MFC‧‧‧流量控制部 MFC‧‧‧Flow Control Department

S‧‧‧基板 S‧‧‧Substrate

T‧‧‧托盤 T‧‧‧Tray

Claims (25)

一種塗層裝置,其包括: 一塗層機,具有一噴射單元,該噴射單元設有用於向一基板噴射一塗層劑的複數個噴嘴;以及 一塗層輸送機,使該塗層機沿著一X軸及一Y軸方向進行水平移動, 該複數個噴嘴沿著該X軸及該Y軸方向排列,並相互間隔配置, 沿著該X軸及該Y軸中的一個軸方向排列的該複數個噴嘴在另一軸方向上的位置相互不同。A coating apparatus comprising: a coating machine having a spraying unit provided with a plurality of nozzles for spraying a coating agent onto a substrate; and a coating conveyor for causing the coating machine to Horizontally moving in an X-axis and a Y-axis direction, the plurality of nozzles are arranged along the X-axis and the Y-axis direction, and are spaced apart from each other, and arranged along one of the X-axis and the Y-axis The positions of the plurality of nozzles in the other axial direction are different from each other. 一種塗層裝置,其包括: 一基板輸送機,具有一導軌以及一基板輸送部,該導軌沿著在一基板上形成一塗層膜的一塗層工序進行方向延伸而成,該基板輸送部的上部安置有該基板,並沿著該導軌向該塗層工序進行方向移動; 一等離子處理機,設置於該塗層工序進行方向路徑上,並向該基板實施等離子表面處理;以及 一塗層機,在該塗層工序進行路徑上與該等離子處理機間隔設置,並具有一噴射單元,該噴射單元設有向該基板噴射一塗層劑的複數個噴嘴, 該基板輸送機包括: 一第一基板輸送機,具有一第一導軌和一第一基板輸送部,該第一導軌從擬形成該塗層膜的該基板被引入的區域向該噴射單元所在位置的方向延伸而成,該第一基板輸送部的上部安置有該基板,並能夠沿著該第一導軌進行水平移動;以及 一第二基板輸送機,具有一第二導軌和至少一個基板輸送部,該第二導軌從形成該塗層膜的該基板被引出的區域向該等離子處理機所在位置的方向延伸而成,至少一個該基板輸送部的上部安置有該基板,並能夠沿著該第二導軌進行水平移動。A coating device comprising: a substrate conveyor having a guide rail and a substrate conveying portion, the guide rail extending along a coating process for forming a coating film on a substrate, the substrate conveying portion The substrate is disposed on the upper portion and moves along the guide rail to the coating process; a plasma processing machine is disposed on the coating process to perform a directional path, and performs plasma surface treatment on the substrate; and a coating And spaced apart from the plasma processing machine in the path of the coating process, and having a spraying unit, the spraying unit is provided with a plurality of nozzles for spraying a coating agent onto the substrate, the substrate conveyor comprises: a substrate conveyor having a first guide rail and a first substrate conveying portion, the first guide rail extending from a region where the substrate on which the coating film is to be formed is introduced to a position where the injection unit is located, the first a substrate is disposed on an upper portion of the substrate conveying portion and is horizontally movable along the first rail; and a second substrate conveyor has a second rail and a substrate conveying portion that extends from a region where the substrate on which the coating film is drawn is directed to a position of the plasma processing machine, at least one of the substrate conveying portion is disposed on the substrate, and Horizontal movement along the second rail is possible. 一種塗層裝置,其中,包括: 一塗層機,具有一噴射單元,該噴射單元設有用於向一基板噴射一塗層劑的複數個噴嘴, 該複數個噴嘴分別沿著一X軸及一Y 軸方向排列並相互間隔設置, 其設置成使得由沿著該X軸及該Y 軸方向中的一軸方向排列的該複數個噴嘴分別形成的一塗布線與由配置於該X軸及該Y 軸方向中的另一軸方向上的該複數個噴嘴中至少一個塗布的一塗布線沿著該X軸及該Y 軸方向中的一軸方向以重疊方式形成,並使沿著該X軸及該Y 軸方向中的另一方向排列的該複數個噴嘴沿著該X軸及該Y 軸方向中的一軸方向的位置相互不同。A coating apparatus comprising: a coating machine having a spraying unit, the spraying unit being provided with a plurality of nozzles for spraying a coating agent onto a substrate, the plurality of nozzles respectively along an X-axis and a The Y-axis directions are arranged and spaced apart from each other, and are disposed such that a coating line formed by the plurality of nozzles arranged along one of the X-axis and the Y-axis direction is disposed on the X-axis and the Y a coating line coated by at least one of the plurality of nozzles in the other axial direction of the axial direction is formed in an overlapping manner along an axial direction of the X-axis and the Y-axis direction, and along the X-axis and the Y The positions of the plurality of nozzles arranged in the other of the axial directions are different from each other along the one of the X-axis and the Y-axis direction. 如申請專利範圍第1項所述之塗層裝置,其中,包括: 一基板輸送機,具有一導軌以及一基板輸送部,該導軌沿著在該基板上形成一塗層膜的一塗層工序進行方向延伸而成,該基板輸送部的上部安置有該基板,並沿著該導軌向該塗層工序進行方向移動;以及 一等離子處理機,設置於該塗層工序進行方向路徑上 ,並向該基板實施等離子表面處理, 該噴射單元在該塗層工序進行路徑上與該等離子處理機間隔設置。The coating device of claim 1, comprising: a substrate conveyor having a guide rail and a substrate conveying portion, the rail along a coating process for forming a coating film on the substrate Extending the direction, the substrate is disposed on the upper portion of the substrate transporting portion, and moves along the guide rail in the direction of the coating process; and a plasma processing machine is disposed on the directional path of the coating process, and The substrate is subjected to a plasma surface treatment, and the ejection unit is disposed on the path of the coating process from the plasma processing machine. 如申請專利範圍第4項所述之塗層裝置,其中,其設置成使得由沿著該X軸及該Y 軸方向中的一軸方向排列的該複數個噴嘴分別形成的一塗布線與由配置於該X軸及該Y 軸方向中的另一軸方向上的該複數個噴嘴中至少一個塗布的一塗布線沿著該X軸及該Y 軸方向中的一軸方向以重疊方式形成,並使沿著該X軸及該Y 軸方向中的另一方向排列的該複數個噴嘴沿著該X軸及該Y 軸方向中的一軸方向的位置相互不同。The coating device of claim 4, wherein the coating device is disposed such that a plurality of nozzles are arranged by the plurality of nozzles arranged along one of the X-axis and the Y-axis direction a coating line coated by at least one of the plurality of nozzles in the other of the X-axis direction and the Y-axis direction is formed in an overlapping manner along an axial direction of the X-axis and the Y-axis direction, and is formed along the same The plurality of nozzles arranged in the other of the X-axis and the Y-axis direction are different from each other in the one-axis direction of the X-axis and the Y-axis direction. 如申請專利範圍第2項所述之塗層裝置,其中,包括: 一塗層輸送機,使該塗層機沿著一X軸及一Y軸方向進行水平移動, 該複數個噴嘴沿著該X軸及該Y軸方向排列,並相互間隔配置, 沿著該X軸及該Y軸中的一個軸方向排列的該複數個噴嘴在另一軸方向上的位置相互不同。The coating device of claim 2, comprising: a coating conveyor for horizontally moving the coating machine along an X-axis and a Y-axis direction, the plurality of nozzles along the The X-axis and the Y-axis direction are arranged and spaced apart from each other, and the positions of the plurality of nozzles arranged along one of the X-axis and the Y-axis are different from each other in the other axial direction. 如申請專利範圍第6項所述之塗層裝置,其中,其設置成使得由沿著該X軸及該Y 軸方向中的一軸方向排列的該複數個噴嘴分別形成的一塗布線與由配置於該X軸及該Y 軸方向中的另一軸方向上的該複數個噴嘴中至少一個塗布的一塗布線沿著該X軸及該Y 軸方向中的一軸方向以重疊方式形成,並使沿著該X軸及該Y 軸方向中的另一方向排列的該複數個噴嘴沿著該X軸及該Y 軸方向中的一軸方向的位置相互不同。The coating device of claim 6, wherein the coating device is disposed such that a plurality of nozzles are arranged by the plurality of nozzles arranged along one of the X-axis and the Y-axis direction a coating line coated by at least one of the plurality of nozzles in the other of the X-axis direction and the Y-axis direction is formed in an overlapping manner along an axial direction of the X-axis and the Y-axis direction, and is formed along the same The plurality of nozzles arranged in the other of the X-axis and the Y-axis direction are different from each other in the one-axis direction of the X-axis and the Y-axis direction. 如申請專利範圍第3項所述之塗層裝置,其中,包括: 一塗層輸送機,使該塗層機沿著該X軸及該Y軸方向進行水平移動, 其中,包括: 一基板輸送機,具有一導軌以及一基板輸送部,該導軌沿著在該基板上形成一塗層膜的一塗層工序進行方向延伸而成,該基板輸送部的上部安置有該基板,並沿著該導軌向該塗層工序進行方向移動;以及 一等離子處理機,設置於該塗層工序進行方向路徑上,並向該基板實施等離子表面處理, 該塗層機在該塗層工序進行路徑上與該等離子處理機間隔設置。The coating device of claim 3, comprising: a coating conveyor for horizontally moving the coating machine along the X-axis and the Y-axis direction, wherein: The machine has a guide rail and a substrate conveying portion extending along a coating process for forming a coating film on the substrate, the substrate is disposed on the upper portion of the substrate conveying portion, and along the The guide rail moves in the direction of the coating process; and a plasma processing machine is disposed on the directional path of the coating process, and performs a plasma surface treatment on the substrate, wherein the coating machine performs the path on the coating process Plasma processor interval setting. 如申請專利範圍第1項至第8項中之任一項所述的塗層裝置,其中,其配置成從該複數個噴嘴吐出而在該基板上滴塗複數個該塗層劑時,使所形成的複數個滴點相互形成間隔,並且以沿著該X軸方向排列的該複數個噴嘴在該Y軸方向上的位置相互不同。The coating device according to any one of claims 1 to 8, wherein the coating device is configured to eject from the plurality of nozzles to dispense a plurality of the coating agents on the substrate, thereby The plurality of drop points formed are spaced apart from each other, and the positions of the plurality of nozzles arranged along the X-axis direction in the Y-axis direction are different from each other. 如申請專利範圍第9項所述之塗層裝置,其中, 該噴射單元一邊沿著該X 軸方向進行水平移動,一邊向該基板噴射該塗層劑, 在該基板上形成有該塗布線,該塗布線借助分別從該複數個噴嘴吐出並連續被滴塗的該複數個滴點來形成,並且各自以沿著該X軸方向延伸的方式而形成, 其配置成使得從該複數個噴嘴中每一個塗布而成的該塗布線的部分區域與從沿著該X軸方向間隔配置的該複數個噴嘴中其他塗布而成的該塗布線中的至少一個沿著該Y軸方向以重疊方式形成,並使沿著該X軸方向排列的該複數個噴嘴在該Y軸方向的位置相互不同。The coating apparatus according to claim 9, wherein the spraying unit sprays the coating agent onto the substrate while horizontally moving along the X-axis direction, and the coating line is formed on the substrate. The coating line is formed by the plurality of dropping points respectively ejected from the plurality of nozzles and continuously dripped, and each formed in a manner extending along the X-axis direction, configured to be from the plurality of nozzles a portion of each of the coated coating lines is formed in an overlapping manner along at least one of the other coated coating lines of the plurality of nozzles spaced apart along the X-axis direction along the Y-axis direction. And the positions of the plurality of nozzles arranged along the X-axis direction in the Y-axis direction are different from each other. 如申請專利範圍第10項所述之塗層裝置,其中,沿著該X軸方向排列的該複數個噴嘴以在該Y軸方向的位置相互不同的方式配置,使得該塗布線的沿著該Y軸方向的重疊區域爲35%至45%。The coating device according to claim 10, wherein the plurality of nozzles arranged along the X-axis direction are disposed in such a manner that positions in the Y-axis direction are different from each other such that the coating line is along the same The overlap area in the Y-axis direction is 35% to 45%. 如申請專利範圍第11項所述之塗層裝置,其中,配置於該X軸方向的相互不同的位置且沿著該Y軸方向相鄰地配置的一噴嘴的中心和另一噴嘴的中心之間的距離爲該重疊面積的1.3至1.7倍。The coating apparatus according to claim 11, wherein the center of one nozzle and the center of the other nozzle are disposed at mutually different positions in the X-axis direction and adjacent to each other along the Y-axis direction. The distance between the two is 1.3 to 1.7 times the overlap area. 如申請專利範圍第9項所述之塗層裝置,其中, 包括複數個噴嘴組,分別具有沿著該Y軸方向排列並間隔設置的該複數個噴嘴, 該複數個噴嘴組沿著該X軸方向排列並相互間隔配置, 沿著該X軸方向排列的該複數個噴嘴組在該Y軸方向上的位置相互不同。The coating device of claim 9, wherein the plurality of nozzle groups respectively have the plurality of nozzles arranged along the Y-axis direction and spaced apart, the plurality of nozzle groups along the X-axis The directions are arranged and spaced apart from each other, and the positions of the plurality of nozzle groups arranged along the X-axis direction are different from each other in the Y-axis direction. 如申請專利範圍第13項所述之塗層裝置,其中,該複數個噴嘴組以之字形配置。The coating device of claim 13, wherein the plurality of nozzle groups are arranged in a zigzag shape. 如申請專利範圍第14項所述之塗層裝置,其中,其配置該複數個噴嘴組,使得從隔著該複數個噴嘴組中的一個並且分別構成沿著該X軸方向的兩側間隔配置的該複數個噴嘴組中的兩個的該複數個噴嘴中的一個塗布的該塗布線的一部分沿著該Y軸方向相互重疊。The coating apparatus of claim 14, wherein the plurality of nozzle groups are disposed such that a space is disposed from one of the plurality of nozzle groups and respectively disposed along the X-axis direction A portion of the coating line coated by one of the plurality of nozzles of the plurality of nozzle groups overlaps each other along the Y-axis direction. 如申請專利範圍第2項或第4項至第8項中的任一項所述之塗層裝置,其中, 該基板輸送機包括: 一第一基板輸送機,具有一第一導軌和一第一基板輸送部,該第一導軌從擬形成該塗層膜的該基板被引入的區域向該噴射單元所在位置的方向延伸而成,該第一基板輸送部的上部安置有該基板,並能夠沿著該第一導軌進行水平移動;以及 一第二基板輸送機,具有一第二導軌和至少一個基板輸送部,該第二導軌從形成該塗層膜的該基板被引出的區域向該等離子處理機所在位置的方向延伸而成,至少一個該基板輸送部的上部安置有該基板,並能夠沿著該第二導軌進行水平移動。The coating device according to any one of claims 2 to 4, wherein the substrate conveyor comprises: a first substrate conveyor having a first guide rail and a first a substrate transporting portion, the first guide rail is extended from a region where the substrate on which the coating film is to be formed is introduced to a position where the ejection unit is located, and the substrate is disposed at an upper portion of the first substrate transporting portion, and is capable of Horizontally moving along the first rail; and a second substrate conveyor having a second rail and at least one substrate transporting portion, the second rail being directed to the plasma from a region where the substrate forming the coating film is taken out The direction of the position of the processor extends, at least one of the upper portion of the substrate conveying portion is disposed with the substrate, and is horizontally movable along the second rail. 如申請專利範圍第16項所述之塗層裝置,其中,該第一基板輸送部安置爲了形成該塗層膜而被引入的該基板,從而向該等離子處理機所在方向進行移動, 該第一基板輸送機包括: 一第一水平驅動部,以與該第一基板輸送部相連接的方式設置,提供使該第一基板輸送部沿著該第一導軌進行水平移動的驅動力;以及 一第一動力源,與該第一水平驅動部相連接,使該第一水平驅動部旋轉工作, 該第一水平驅動部爲滾珠絲桿。The coating device of claim 16, wherein the first substrate transporting portion places the substrate introduced to form the coating film, thereby moving toward the plasma processing machine, the first The substrate conveyor includes: a first horizontal driving portion disposed in connection with the first substrate conveying portion, and a driving force for horizontally moving the first substrate conveying portion along the first guiding rail; and a first A power source is coupled to the first horizontal driving portion to rotate the first horizontal driving portion, and the first horizontal driving portion is a ball screw. 如申請專利範圍第17項所述之塗層裝置,其中,該第一基板輸送部包括: 一移動塊,以分別安裝於該第一導軌的方式設置,並能夠沿著該第一導軌進行水平移動; 一基板安放台,安裝於該移動塊的上側,在上部安放有該基板;以及 一升降驅動部,與該基板安放台相連接,使該基板安放台進行升降。The coating device of claim 17, wherein the first substrate conveying portion comprises: a moving block disposed to be respectively mounted on the first rail, and capable of being horizontal along the first rail Moving; a substrate mounting table mounted on the upper side of the moving block, the substrate is placed on the upper portion; and a lifting drive portion connected to the substrate mounting table to raise and lower the substrate mounting table. 如申請專利範圍第18項所述之塗層裝置,其中,該基板安放台在爲了形成該塗層膜而引入該基板的一基板引入區域中,借助該升降驅動部來進行升降,從而使被引入該基板引入區域的該基板安放在該基板安放臺上。The coating apparatus according to claim 18, wherein the substrate mounting table is lifted in a substrate introduction region of the substrate for forming the coating film, and the lifting and lowering driving portion is used for lifting and lowering The substrate introduced into the substrate lead-in area is placed on the substrate mounting table. 如申請專利範圍第19項所述之塗層裝置,其中,包括: 一基板傳遞部,設置於該第一基板輸送部的水平移動路徑上,爲了向該第二基板輸送機的該基板輸送部傳遞該基板,支撑從該第一基板輸送部移動的該基板;以及 一塗層支撑部,設置於該第二基板輸送機的移動路徑上,在上部安置有該基板從而實施該塗層工序。The coating device of claim 19, comprising: a substrate transfer portion disposed on a horizontal movement path of the first substrate transport portion, and the substrate transport portion for the second substrate conveyor The substrate is transferred to support the substrate moving from the first substrate conveying portion; and a coating support portion is disposed on the moving path of the second substrate conveyor, and the substrate is disposed on the upper portion to perform the coating process. 如申請專利範圍第20項所述之塗層裝置,其中, 該第二基板輸送機包括: 一第二基板輸送部,安置支撑於該基板傳遞部之上的該基板,從而使之向該噴射單元所在方向移動; 一第三基板輸送部,在該第二導軌之上,設置於該第二基板輸送部的前方,沿著該第二導軌進行水平移動,從而安置支撑於該塗層支撑部的該基板,使之向一基板引出區域移動; 一固定條,以連接該第二基板輸送部和該第三基板輸送部之間的方式設置; 一第二水平驅動部,以與該第二基板輸送部及該第三基板輸送部中的任意一個相連接的方式設置,提供該第二基板輸送部及該第三基板輸送部能夠沿著該第二導軌進行水平移動的驅動力;以及 一第二動力源,與該第二水平驅動部相連接,使該第二水平驅動部旋轉工作, 該第二水平驅動部爲滾珠絲桿。The coating device of claim 20, wherein the second substrate conveyor comprises: a second substrate conveying portion, the substrate supported on the substrate transmitting portion is disposed to be sprayed thereto Moving in a direction of the unit; a third substrate conveying portion disposed on the second rail in front of the second substrate conveying portion and horizontally moving along the second rail to be supported and supported on the coating supporting portion The substrate is moved to a substrate lead-out area; a fixing strip is disposed to connect between the second substrate transport portion and the third substrate transport portion; a second horizontal driving portion, and the second Providing a connection between the substrate transporting portion and the third substrate transporting portion to provide a driving force capable of horizontally moving the second substrate transporting portion and the third substrate transporting portion along the second rail; and The second power source is connected to the second horizontal driving unit to rotate the second horizontal driving unit, and the second horizontal driving unit is a ball screw. 如申請專利範圍第21項所述之塗層裝置,其中,該第二基板輸送部及該第三基板輸送部包括: 一移動塊,以分別安裝於該第二導軌的方式設置,並能夠沿著該第二導軌進行水平移動; 一基板安放台,安裝於該移動塊的上側,在上部安放有該基板;以及 一升降驅動部,與該基板安放台相連接,使該基板安放台進行升降。The coating device of claim 21, wherein the second substrate conveying portion and the third substrate conveying portion comprise: a moving block disposed to be respectively mounted on the second rail, and capable of being along The second guide rail is horizontally moved; a substrate mounting table is mounted on the upper side of the moving block, the substrate is placed on the upper portion; and a lifting drive portion is connected to the substrate mounting table to cause the substrate mounting table to be lifted and lowered . 如申請專利範圍第22項所述之塗層裝置,其中, 在支撑於該基板傳遞部之上的該基板下側,藉由由該第二基板輸送部的該升降驅動部對該第二基板輸送部的該基板安放台進行升降,來使支撑於該基板傳遞部之上的該基板安置於該第二基板輸送部的該基板安放台, 在支撑於該塗層支撑部的該基板下側,藉由由該第三基板輸送部的該升降驅動部對該第三基板輸送部的該基板安放台進行升降,來使支撑於該塗層支撑部的該基板安置於該第三基板輸送部的該基板安放台。The coating device of claim 22, wherein the lower substrate is supported on the substrate transfer portion, and the second substrate is supported by the elevation drive portion of the second substrate transfer portion The substrate mounting table of the conveying portion is raised and lowered to position the substrate supported on the substrate transmitting portion on the substrate mounting table of the second substrate conveying portion, and the lower side of the substrate supported on the coating supporting portion And the substrate mounting table of the third substrate conveying portion is lifted and lowered by the lifting and lowering driving portion of the third substrate conveying portion, so that the substrate supported by the coating supporting portion is disposed on the third substrate conveying portion The substrate is placed on the stage. 如申請專利範圍第20項所述之塗層裝置,其中,該塗層輸送機包括: 一第一導件,位於該塗層支撑部的上側,並使該噴射單元沿著該X 軸方向進行水平移動;以及 一第二導件,與該第一導件的兩端相連接,向該Y軸方向延伸而成,使該第一導件和該噴射單元沿著該Y軸方向進行水平移動。The coating device of claim 20, wherein the coating conveyor comprises: a first guiding member located on an upper side of the coating support portion and causing the spraying unit to perform along the X-axis direction Moving horizontally; and a second guiding member connected to both ends of the first guiding member and extending in the Y-axis direction to horizontally move the first guiding member and the spraying unit along the Y-axis direction . 如申請專利範圍第9項所述之塗層裝置,其中,該複數個噴嘴分別包括: 一塗層劑供給管,與從一塗層劑罐供給該塗層劑的一注射泵相連接; 一氣體供給管,與從一氣體罐供給一氣體的一流量控制部相連接;以及 一止回閥,具有一阻斷部件和一彈簧,該阻斷部件在該複數個噴嘴和該塗層劑供給管之間用於阻斷該塗層劑或該氣體的回流,該彈簧與該阻斷部件相連接。The coating device of claim 9, wherein the plurality of nozzles respectively comprise: a coating agent supply tube connected to a syringe pump that supplies the coating agent from a coating agent tank; a gas supply pipe connected to a flow control unit that supplies a gas from a gas tank; and a check valve having a blocking member and a spring, the blocking member being supplied to the plurality of nozzles and the coating agent Between the tubes is used to block the return of the coating agent or the gas, the spring being connected to the blocking member.
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