CN110813887A - Hydrofluoric acid cleaning device and hydrofluoric acid cleaning method for display panel - Google Patents
Hydrofluoric acid cleaning device and hydrofluoric acid cleaning method for display panel Download PDFInfo
- Publication number
- CN110813887A CN110813887A CN201911002330.3A CN201911002330A CN110813887A CN 110813887 A CN110813887 A CN 110813887A CN 201911002330 A CN201911002330 A CN 201911002330A CN 110813887 A CN110813887 A CN 110813887A
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- CN
- China
- Prior art keywords
- hydrofluoric acid
- display panel
- unit
- process chamber
- cleaning
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B13/00—Accessories or details of general applicability for machines or apparatus for cleaning
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/02—Cleaning by the force of jets or sprays
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F26—DRYING
- F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
- F26B21/00—Arrangements or duct systems, e.g. in combination with pallet boxes, for supplying and controlling air or gases for drying solid materials or objects
- F26B21/001—Drying-air generating units, e.g. movable, independent of drying enclosure
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- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Cleaning By Liquid Or Steam (AREA)
Abstract
The invention relates to a hydrofluoric acid cleaning device for a display panel, which comprises a cleaning unit, wherein the cleaning unit comprises: the display panel is arranged on the conveying assembly, and the conveying speed of the conveying assembly is adjustable; and the spraying assembly is used for spraying treatment liquid to the upper surface of the display panel, and the treatment liquid comprises hydrofluoric acid. Also provided is a hydrofluoric acid cleaning method for a display panel, comprising: enabling the display panel to enter a spraying area at a high speed and move in the spraying area at a low speed; and spraying treatment liquid to the upper surface of the display panel, wherein the treatment liquid comprises hydrofluoric acid. The hydrofluoric acid cleaning quality can be improved.
Description
Technical Field
The invention belongs to the technical field of display panel process equipment, relates to a display panel hydrofluoric acid cleaning device and further relates to a display panel hydrofluoric acid cleaning method.
Background
Hydrofluoric acid cleaning is used as a key link in an LTPS (Low Temperature polysilicon) manufacturing process, and the cleaning effect directly influences the final performance, efficiency and stability of a TFT device structure and is related to the yield of a final product. The hydrofluoric acid cleaning is required to remove impurities on the surface of the active layer and passivate the surface, so that the adsorption capacity of interface impurities is reduced, the requirement on the cleanliness of the surface is very strict, any particles, metal ions, organic adhesion, water vapor and an oxidation layer are not allowed to exist theoretically, the surface is required to have atomic-level flatness, and the process reliability of a post-processing procedure is guaranteed.
Disclosure of Invention
The invention aims to provide a hydrofluoric acid cleaning device for a display panel, which can improve the cleaning quality of hydrofluoric acid.
In order to achieve the purpose, the invention adopts the technical scheme that:
the invention provides a hydrofluoric acid cleaning device for a display panel, which comprises a cleaning unit, wherein the cleaning unit comprises:
the display panel is arranged on the conveying assembly, and the conveying speed of the conveying assembly is adjustable;
and the spraying assembly is used for spraying treatment liquid to the upper surface of the display panel, and the treatment liquid comprises hydrofluoric acid.
Optionally, the spray assembly comprises a nozzle, a reservoir and a pump mechanism, the nozzle is a circular nozzle, the reservoir is used for storing the treatment liquid, and the pump mechanism is connected between the nozzle and the reservoir.
Optionally, the spray assembly comprises a plurality of nozzles, the plurality of nozzles are divided into a plurality of zones according to a spray range, and spray parameters of the nozzles of a single zone are individually controlled.
Optionally, the conveying direction of the conveying assembly is switchable between a positive direction and a negative direction.
Optionally, the cleaning unit includes an ozonated water process chamber and a hydrofluoric acid process chamber, the processing liquids sprayed by the ozonated water process chamber and the hydrofluoric acid process chamber are ozone water and hydrofluoric acid, respectively, and a water washing process chamber is further disposed between the ozonated water process chamber and the hydrofluoric acid process chamber.
Optionally, the washing machine further comprises a conveying unit arranged in front of the washing unit, the conveying unit is arranged above the washing unit, and a lifting unit is arranged between the conveying unit and the washing unit.
Further, a magnetic wheel and an ion bar are arranged in the conveying unit.
Optionally, the washing device further comprises a water washing unit arranged behind the washing unit, wherein the water washing unit comprises an ultrahigh pressure micro-jet washing mechanism and/or a two-fluid washing mechanism.
Optionally, the nozzle is swingably arranged.
The invention also provides a hydrofluoric acid cleaning method for the display panel, which comprises the following steps:
enabling the display panel to enter a spraying area at a high speed and move in the spraying area at a low speed;
and spraying treatment liquid to the upper surface of the display panel, wherein the treatment liquid comprises hydrofluoric acid.
Optionally, it further comprises:
the display panel is moved under the shower area in a manner of switching between a forward direction and a reverse direction.
Due to the application of the technical scheme, compared with the prior art, the invention has the following advantages:
according to the hydrofluoric acid cleaning device and the hydrofluoric acid cleaning method for the display panel, the transmission speed of the conveying assembly is adjustable, so that the display panel can enter the spraying area at a high speed and move in the spraying area at a low speed by adjusting the transmission speed, and the front part and the rear part of the display panel in the transmission direction can be cleaned to the same degree. The cleaning quality is improved.
Drawings
Some specific embodiments of the invention will be described in detail hereinafter, by way of illustration and not limitation, with reference to the accompanying drawings. The same reference numbers in the drawings identify the same or similar elements or components. Those skilled in the art will appreciate that the drawings are not necessarily drawn to scale. In the drawings:
FIG. 1 is a schematic structural diagram of a hydrofluoric acid cleaning apparatus for a display panel according to a preferred embodiment of the present invention;
FIG. 2 is a schematic view of the structure of the washing unit of FIG. 1;
wherein the reference numerals are as follows:
1. a feeding unit;
2. a transfer unit;
3. a lifting unit;
4. an isolation unit;
5. a cleaning unit;
6. a water washing unit;
7. a drying unit;
8. a discharging unit;
9. a delivery assembly;
10. a spray assembly;
11. a nozzle;
12. an ozone water process chamber;
13. a hydrofluoric acid process chamber;
14. washing the process chamber with water;
15. an ultrahigh pressure microjet cleaning mechanism;
16. a second fluid cleaning mechanism;
17. an air knife;
18. liquid knife;
19. downward spraying;
20. a display panel.
Detailed Description
The technical solutions of the present invention will be described clearly and completely with reference to the accompanying drawings, and it should be understood that the described embodiments are some, but not all embodiments of the present invention. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
In the description of the present invention, it should be noted that the terms "center", "upper", "lower", "left", "right", "vertical", "horizontal", "inner", "outer", etc., indicate orientations or positional relationships based on the orientations or positional relationships shown in the drawings, and are only for convenience of description and simplicity of description, but do not indicate or imply that the device or element being referred to must have a particular orientation, be constructed and operated in a particular orientation, and thus, should not be construed as limiting the present invention. Furthermore, the terms "first," "second," and "third" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance.
In addition, the technical features involved in the different embodiments of the present invention described below may be combined with each other as long as they do not conflict with each other.
As shown in fig. 1, the hydrofluoric acid cleaning device for the display panel comprises a feeding unit 1, a conveying unit 2, a lifting unit 3, an isolating unit 4, a cleaning unit 5, a water washing unit 6, a drying unit 7 and a discharging unit 8 which are arranged in sequence. Each unit is provided with a conveying assembly 9, and adjacent conveying assemblies 9 form a continuous conveying line in a butt joint mode. The conveying assembly 9 is a plurality of rollers arranged in parallel in the conveying direction, and the display panel is placed on the rollers for conveying.
The display panel is a glass substrate, and the glass is referred to as the display panel.
The display panel of preceding processing procedure is from pan feeding unit 1 material loading, gets into isolation unit 4 after the conveying of conveying unit 2 and lift unit 3, washs, water washing, weathers through cleaning unit 5, washing unit 6, drying unit 7 in proper order afterwards, and 8 ejection of compact from ejection of compact unit are followed at last.
The transmission unit 2 is provided with a magnetic wheel, and the display panel is transmitted by the magnetic wheel, so that the defects that particles are easy to generate and the surface of glass is polluted in a bevel gear transmission mode are effectively avoided.
The transmission unit 2 is provided with an ion bar, and the positive and negative charge air mass generated by the ion bar is utilized to reduce the static electricity on the surface of the display panel.
If the cleaning unit 5, the water washing unit 6, and the drying unit 7 are referred to as process zones, the transfer unit 2 is disposed above the process zones. The display panel is transferred from the upper transfer unit 2 to the lower process field by the elevating unit 3. This arrangement effectively utilizes the upper space, thereby making the apparatus more compact.
The isolation unit 4 is arranged in the front of the cleaning unit 5 and mainly used for isolating the medicine gas and preventing the medicine gas in the subsequent process units from diffusing outwards, for example, the medicine gas in the cleaning unit 5 diffuses towards the lifting unit 3.
The isolation unit 4 is configured selectively, and in other embodiments, the isolation unit 4 may not be provided.
As shown in fig. 2, the cleaning unit 5 includes four process chambers (see fig. 1), which are an ozonated water process chamber 12, a hydrofluoric acid process chamber 13, a water washing process chamber 14, and an ozonated water process chamber 12 (different from the former one) in sequence. Each process chamber has disposed therein a transfer assembly 9 and a spray assembly 10. The conveyance unit 9 conveys the display panel 20 (glass), and the shower unit 10 sprays a treatment liquid (ozone water, hydrofluoric acid, or pure water) onto the surface of the glass.
The shower assembly 10 includes a nozzle 11, a reservoir (not shown) for storing the treatment liquid, and a pump mechanism (not shown). The pump mechanism is connected between the nozzle 11 and the reservoir tank, and feeds the processing liquid in the reservoir tank to the nozzle 11. The nozzle 11 sprays the treatment liquid onto the glass surface.
At the inlet of the cleaning unit 5, also at the inlet of each process chamber, there is provided an air knife 17 for preventing the diffusion of the drug gas out of the chamber. And a liquid knife 18 is also arranged at the inlet of each process chamber, the liquid knife 18 is arranged at the subsequent stage of the air knife 17, the liquid knife 18 is supplied with treatment liquid, and the treatment liquid is sprayed to the glass surface at a high speed through the liquid knife 18 to quickly wet the glass surface.
The four process chambers are an ozonated water process chamber 12, a hydrofluoric acid process chamber 13, a water washing process chamber 14, and an ozonated water process chamber 12 (different from the other ozonated water process chamber of the previous ozonated water process chamber) in sequence. The ozone water is sprayed to the glass surface by the nozzle 11 in the ozone water process chamber 12, the hydrofluoric acid is sprayed to the glass surface by the nozzle 11 in the hydrofluoric acid process chamber 13, and the pure water is sprayed to the glass surface by the nozzle 11 in the water washing process chamber 14 for washing. The front-to-back order of the ozonated water process chamber 12 and the hydrofluoric acid process chamber 13 is not limited. The water washing process chamber 14 is provided for the purpose of quickly replacing the preceding chamber treatment liquid (e.g., hydrofluoric acid) on the glass surface with pure water without affecting the function of the subsequent treatment liquid (e.g., ozone water). In other embodiments, the water wash process chamber 14 may not be provided. In other embodiments, it is even possible to clean the glass surface with hydrofluoric acid alone without providing the ozonated water process chamber 12.
The spraying component 10 adopts the circular nozzle 11, utilizes the characteristic that the spraying flow distribution is equal, and reasonably arranges the spraying component to improve the surface uniformity of the glass.
The nozzle 11 is controlled independently in multiple zones. The spray nozzles 11 are divided into a plurality of areas according to the spray range, the spray parameters (flow and pressure) of the spray nozzles 11 in a single area are independently controlled, and each area is provided with an independent digital flow meter, an independent digital pressure meter and an independent adjusting valve which can be independently adjusted to ensure the uniformity of the spray flow.
The nozzle 11 is provided with a swing function to realize a swing of the nozzle 11 perpendicular to the traveling direction of the display panel, thereby spraying the treatment liquid more uniformly.
The transport speed of the conveying assembly 9 is set adjustably, so that the transport speed can be designed more flexibly. For example, in this case, the glass enters the respective process chambers (the ozonated water process chamber 12 or the hydrofluoric acid process chamber 13 or the water washing process chamber 14) of the cleaning unit 5 at a high speed, that is, enters the shower area, and moves in the shower area at a low speed. And accelerating to flush out the process chamber after spraying. This makes it possible to achieve the same degree of cleaning of the front and rear portions of the glass in the conveying direction, thereby improving uniformity.
The conveying direction of the conveying assembly 9 is switchable between a positive direction and a negative direction, so that the glass conveying can be configured more flexibly. For example, in this embodiment, after the glass reaches a predetermined spraying position, the conveying direction of the conveying unit 9 is sequentially switched between the forward direction and the reverse direction, so that the conveying unit 9 reciprocates to convey the glass back and forth, and the reciprocating conveyance can improve the uniformity of cleaning the surface of the glass because the adjacent nozzles 11 are always at a constant pitch.
The subsequent ozonated water process chamber 12 (the right ozonated water process chamber 12 in fig. 2) is further provided with a lower shower 19 for showering the lower surface of the glass, thereby cleaning the lower surface of the glass and making the glass cleaner. The lower spray 19 is an optional configuration, and in other embodiments, the lower spray 19 may not be provided.
After the hydrofluoric acid cleaning is finished, the glass sequentially enters the water washing unit 6 for complete water washing, enters the drying unit 7 for drying, and is discharged from the discharging unit 8, as shown in fig. 1.
Referring to fig. 1, the water washing unit 6 includes three process chambers, a first sequential process chamber is provided with an ultra-High Pressure Micro Jet washing mechanism 15 (HPMJ: High Pressure Micro Jet), a second sequential process chamber is provided with a two-fluid washing mechanism 16 (BJ: Bubble Jet), and the two Pressure modules utilize the High Pressure atomization principle and the physical impact force under High output kinetic energy to improve the product washing capability. The ultrahigh pressure micro-jet cleaning mechanism 15 and the two-fluid cleaning mechanism 16 are selectively configured, and may be provided with only one or both of them, and the distribution and the front-back sequence in the process chamber are not limited.
A liquid storage tank (not shown) below the water washing unit 6 adopts a step-by-step overflow mode, so that the use efficiency of pure water is improved. Namely, the cleaning liquid flowing out after being cleaned in the subsequent process chamber is conveyed to the previous process chamber for spraying and cleaning. This is because the cleaning fluid in the subsequent process chamber is relatively clean and can be used again as cleaning water to clean the glass.
The embodiment also relates to a hydrofluoric acid cleaning method for the display panel, which comprises the following steps:
enabling the display panel to enter a spraying area at a high speed and move in the spraying area at a low speed;
and spraying treatment liquid to the upper surface of the display panel, wherein the treatment liquid comprises hydrofluoric acid.
Optionally, it further comprises:
the display panel is moved under the shower area in a manner of switching between a forward direction and a reverse direction.
The above embodiments are merely illustrative of the technical concept and features of the present invention, and the purpose thereof is to enable those skilled in the art to understand the content of the present invention and implement the invention, and not to limit the scope of the invention, and all equivalent changes or modifications made according to the spirit of the present invention should be covered by the scope of the present invention.
Claims (10)
1. A display panel hydrofluoric acid cleaning apparatus comprising a cleaning unit (5), wherein the cleaning unit (5) comprises:
the display panel is arranged on the conveying assembly (9), and the conveying speed of the conveying assembly (9) is adjustable;
the spraying assembly (10), spraying assembly (10) are used for spraying treatment liquid to display panel upper surface, treatment liquid includes hydrofluoric acid.
2. The hydrofluoric acid cleaning apparatus for a display panel according to claim 1, wherein: the spray assembly (10) comprises a nozzle (11), a liquid storage tank and a pump mechanism, wherein the nozzle (11) is a circular nozzle, the liquid storage tank is used for storing processing liquid, and the pump mechanism is connected between the nozzle (11) and the liquid storage tank.
3. The hydrofluoric acid cleaning apparatus for a display panel according to claim 1, wherein: the spray assembly (10) comprises a plurality of spray nozzles (11), the spray nozzles (11) are divided into a plurality of areas according to a spray range, and the spray parameters of the spray nozzles (11) of the single area are controlled independently.
4. The hydrofluoric acid cleaning apparatus for a display panel according to claim 1, wherein: the transmission direction of the conveying assembly (9) is switchable between a positive direction and a negative direction.
5. The hydrofluoric acid cleaning apparatus for a display panel according to claim 1, wherein: the cleaning unit (5) comprises an ozone water process chamber (12) and a hydrofluoric acid process chamber (13), treating liquids sprayed by the ozone water process chamber (12) and the hydrofluoric acid process chamber (13) are ozone water and hydrofluoric acid respectively, and a water washing process chamber (14) is further arranged between the ozone water process chamber (12) and the hydrofluoric acid process chamber (13).
6. The hydrofluoric acid cleaning apparatus for a display panel according to claim 1, wherein: the cleaning device is characterized by further comprising a conveying unit (2) arranged in the front of the cleaning unit (5), wherein the conveying unit (2) is arranged above the cleaning unit (5), and a lifting unit (3) is arranged between the conveying unit (2) and the cleaning unit (5).
7. The hydrofluoric acid cleaning apparatus for a display panel according to claim 6, wherein: the transmission unit (2) is internally provided with a magnetic wheel and an ion bar.
8. The hydrofluoric acid cleaning apparatus for a display panel according to claim 1, wherein: it still includes the setting and is in wash unit (6) of cleaning unit (5) sequent, wash unit (6) including superhigh pressure microjet wiper mechanism (15) and/or two fluid washing mechanism (16).
9. A method for cleaning a display panel by hydrofluoric acid is characterized by comprising the following steps:
enabling the display panel to enter a spraying area at a high speed and move in the spraying area at a low speed;
and spraying treatment liquid to the upper surface of the display panel, wherein the treatment liquid comprises hydrofluoric acid.
10. The hydrofluoric acid cleaning method for display panel according to claim 9, further comprising:
the display panel is moved under the shower area in a manner of switching between a forward direction and a reverse direction.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201911002330.3A CN110813887A (en) | 2019-10-21 | 2019-10-21 | Hydrofluoric acid cleaning device and hydrofluoric acid cleaning method for display panel |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201911002330.3A CN110813887A (en) | 2019-10-21 | 2019-10-21 | Hydrofluoric acid cleaning device and hydrofluoric acid cleaning method for display panel |
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| Publication Number | Publication Date |
|---|---|
| CN110813887A true CN110813887A (en) | 2020-02-21 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201911002330.3A Pending CN110813887A (en) | 2019-10-21 | 2019-10-21 | Hydrofluoric acid cleaning device and hydrofluoric acid cleaning method for display panel |
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| CN (1) | CN110813887A (en) |
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| CN208527494U (en) * | 2017-11-24 | 2019-02-22 | 天津环鑫科技发展有限公司 | A kind of silicon chip cleaning device |
| CN109727844A (en) * | 2018-11-14 | 2019-05-07 | 北京北方华创微电子装备有限公司 | The cleaning method of chip |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102005386A (en) * | 2009-09-01 | 2011-04-06 | 中芯国际集成电路制造(上海)有限公司 | Method for reducing particle defect in sidewall spacing technology |
| CN102463237A (en) * | 2010-11-17 | 2012-05-23 | 三星移动显示器株式会社 | System and method for cleaning substrate |
| CN104752196A (en) * | 2013-12-31 | 2015-07-01 | 中芯国际集成电路制造(上海)有限公司 | Post-treatment method for removing photoresist and manufacturing method of semiconductor device |
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Application publication date: 20200221 |