CN102161028A - Cleaning device and coating device for slit nozzle - Google Patents

Cleaning device and coating device for slit nozzle Download PDF

Info

Publication number
CN102161028A
CN102161028A CN2011100412633A CN201110041263A CN102161028A CN 102161028 A CN102161028 A CN 102161028A CN 2011100412633 A CN2011100412633 A CN 2011100412633A CN 201110041263 A CN201110041263 A CN 201110041263A CN 102161028 A CN102161028 A CN 102161028A
Authority
CN
China
Prior art keywords
cleaning
nozzle
slit nozzle
slit
unit
Prior art date
Application number
CN2011100412633A
Other languages
Chinese (zh)
Inventor
元田公男
宫崎文宏
小笠原幸雄
Original Assignee
东京毅力科创株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to JP2010-032446 priority Critical
Priority to JP2010032446A priority patent/JP5258811B2/en
Application filed by 东京毅力科创株式会社 filed Critical 东京毅力科创株式会社
Publication of CN102161028A publication Critical patent/CN102161028A/en

Links

Abstract

The invention provides a cleaning device for a slit nozzle, the cleaning device are capable of effectively spray outlet periphery portion of a slit nozzle. A slit nozzle cleaning portion (52) is provided with a slide rack (64) moving along the spray outlet periphery portion of a slit nozzle (32) in a horizontal cleaning scanning direction (Y direction) parallel to a long-side direction of the slit nozzle, in the cleaning scanning direction, a first cleaning unit (70) as a start and followed by a first wiping unit (72), a second cleaning unit (74), a second wiping unit (76), and a drying unit (78), the above units are mounted on the slide rack (64) via arrangement in a line according to the above sequence.

Description

狭缝喷嘴清洗装置和涂覆装置 Slit nozzle cleaning device and coating device

技术领域 FIELD

[0001] 本发明涉及无旋转方式的涂覆装置,特别涉及用于清洗无旋转法的涂覆处理中使用的狭缝喷嘴的喷出口周边部的狭缝喷嘴清洗装置。 Slit spout periphery portion [0001] The embodiment relates to a rotation-coating apparatus according to the present invention, particularly relates to processing for cleaning a slit coating method without rotation of the nozzle used in the nozzle cleaning device.

背景技术 Background technique

[0002] IXD等的平面显示器(FPD)的制造工艺中的图像平版印刷工序中,较多使用无旋转的涂敷法,该使具有狭缝形状的喷出口的长尺型狭缝喷嘴涂敷法相对于玻璃基板等的被处理基板进行相对移动,在基板上涂覆处理液或药液等的涂覆液例如抗蚀剂液。 Long-sized type slit nozzle coating [0002] IXD like flat panel display (FPD) manufacturing process image lithography step, using no more rotary coating method, so that the ejection outlet having a slit-shaped wears move relative to be processed such as a glass substrate, coating treatment or a chemical liquid such as, for example, the resist solution is coated on a substrate.

[0003] 在典型的无旋转涂覆法中,对固定载置在工作台上的基板,通过狭缝喷嘴喷出带状的抗蚀剂液,并使狭缝喷嘴在与喷嘴长边方向正交的水平方向移动。 [0003] In a typical non-spin coating method, the fixed substrate is placed on a work table, the strip through the slit nozzle of the resist solution, and the slit nozzle in the longitudinal direction of the nozzle n post moving horizontally. 这样,从狭缝喷嘴的喷出口向基板上溢出的抗蚀剂液在喷嘴后方平坦地延伸,在基板的一个表面上形成抗蚀剂涂覆膜(例如,专利文献1)。 Thus, the outlet from the discharge slit nozzle extending flatly in the resist solution nozzle rearward overflow on a substrate, forming a resist coating film (e.g., Patent Document 1) on a surface of the substrate.

[0004] 作为其他的代表的无旋转涂覆法,多使用在工作台上在使基板悬浮在空中的状态下沿着水平方向进行输送的(工作台长边方向)的悬浮输送方式。 [0004] As another non-representative spin coating method is often used on the table is conveyed in the horizontal direction in the substrate suspended in the air in the state (the longitudinal direction of the table) was suspended transportation methods. 在该种方式中,设置在悬浮工作台的上方的长尺型的狭缝喷嘴朝向通过其正下方的基板喷出带状的抗蚀剂液,由此在基板的输送方向从基板的前端部向着后端部在基板上的一个表面上形成抗蚀剂涂覆膜(例如,专利文献2)。 Long-sized type slit nozzle in this manner, the suspension is disposed above the table toward the substrate through the resist solution discharge strip immediately below it, whereby in the conveying direction of the substrate from the front end portion of the substrate toward the rear end portion to form a resist coating film (e.g., Patent Document 2) on one surface of the substrate.

[0005] 通常,在狭缝喷嘴中,停止喷出动作时,喷出口附近容易附着或残留抗蚀剂液,如果其原样放置而干燥凝固,则在下一次涂覆处理时妨碍或扰乱抗蚀剂喷出流,有可能引起抗蚀剂膜厚的变动。 When [0005] Generally, the slit nozzle, the ejection operation is stopped, discharge easily adhere to or near the outlet of the residual resist solution, if it is left as it is and then drying and solidifying, the next time when hinder or disturb the resist coating treatment ejection stream, may cause fluctuations in the resist film thickness. 因此,与涂覆处理部邻接设置的喷嘴待机部上,为下一次涂覆处理做准备,设置有用于清洗的狭缝喷嘴的喷出口周边部的狭缝喷嘴清洗装置(例如,专利文献3)。 Thus, the upper portion of the nozzle waiting portion disposed adjacent to the coating process, to prepare for the next coating process, a slit nozzle for cleaning the discharge port peripheral portion of the slit nozzle cleaning device (e.g., Patent Document 3) .

[0006] 现有的狭缝喷嘴清洗装置具有,被定位在喷嘴待机部内的规定位置的、在狭缝喷嘴下方沿着喷嘴的长边方向扫描移动的喷嘴清洗头或滑动架,该滑动架上搭载有分别向着狭缝喷嘴的喷出口周边部分内喷射清洗液(例如稀释液)和干燥用气体(例如N2气体) 的清洗喷嘴和干燥喷嘴。 , The scanning movement along the longitudinal direction of the nozzle below the slit nozzle cleaning nozzle predetermined position [0006] the conventional cleaning device having a slot nozzle is positioned within the head or nozzle standby unit carriage, the carriage respectively, mounted towards the inner peripheral portion of the ejection outlet of the ejection slit nozzle washing liquid (e.g., diluent) and dry gas (e.g., N2 gas) of the drying nozzle and the washing nozzle. 滑动架沿着狭缝喷嘴的喷出口周边部沿着喷嘴长边方向扫描移动,并向着狭缝喷嘴的喷出口周边部的各部,清洗喷嘴首先吹出清洗液,接着干燥喷嘴吹出干燥用气体。 Discharge port peripheral portion of the carriage along the slit nozzle is scanned along the longitudinal direction of the nozzle, and toward the periphery of the discharge port portion departments slit nozzle, blow cleaning nozzle cleaning fluid first, followed by a drying nozzle of the drying gas blown.

[0007] 专利文献 [0007] Patent Document

[0008]【专利文献1】日本特开平10-156255号公报 [0008] [Patent Document 1] Japanese Unexamined Patent Publication No. 10-156255

[0009]【专利文献2】日本特开2005-236092号公报 [0009] [Patent Document 2] Japanese Laid-Open Patent Publication No. 2005-236092

[0010]【专利文献3】日本特开2007-111612号公报 [0010] [Patent Document 3] Japanese Laid-Open Patent Publication No. 2007-111612

发明内容 SUMMARY

[0011] 上述现有的狭缝喷嘴清洗装置,通过一次清洗扫描难以全面清扫狭缝喷嘴的喷出口周边部,因此要反复数次清洗扫描(滑动架的扫描移动),存在喷嘴清洗处理周期时间长,清洗液的消耗量多的问题。 [0011] The conventional slit nozzle cleaning device, cleaning by one scan is difficult to fully clean the ejection outlet slit nozzle peripheral portion, thus repeated several times to wash the scanning (scanning movement of the carriage), the presence of the nozzle cleaning process cycle time long, cleaning fluid consumption and more problems. [0012] 本发明解决上述现有技术的问题点,提供提高清洗效率和清洗能力,实现清洗周期时间的缩短化和清洗液消耗量的节俭的狭缝喷嘴清洗装置和具备该狭缝喷嘴清洗装置的涂覆装置。 [0012] The present invention to solve the problems of the prior art, provide the ability to improve the cleaning efficiency and cleaning, to achieve shortening and economical slits cleaning cycle the washing liquid consumption amount of time and the nozzle cleaning device includes a cleaning device of the slit nozzle the coating apparatus.

[0013] 本发明的狭缝喷嘴清洗装置,用于对涂覆处理中使用的具有狭缝状的喷出口的长尺型狭缝喷嘴的喷出口周边部进行清洗,其包括:沿着上述狭缝喷嘴的喷出口周边部在与上述狭缝喷嘴的长边方向平行的水平的清洗扫描方向移动的滑动架;搭载在上述滑动架上、在上述清洗扫描方向移动并向上述狭缝喷嘴的喷出口周边部吹出清洗液的第一清洗单元;和在上述清洗扫描方向,位于上述清洗单元之后,搭载在上述滑动架上,在上述清洗扫描方向移动并擦去附着在上述狭缝喷嘴的喷出口周边部的液体的第一擦拭单元。 [0013] slit nozzle cleaning device of the present invention, the peripheral portion of the discharge port for the long-sized type slit nozzle having a slit-like discharge port of the coating process used for cleaning, comprising: a slit along the the peripheral portion of the discharge port of the nozzle slit parallel to the movement in the longitudinal direction of the slit nozzle cleaning the horizontal scanning direction of the carriage; the carriage is mounted in the above, and moving the slit in the cleaning spray nozzle scanning direction a first peripheral portion of the outlet is blown out of the washing unit a cleaning liquid; and the cleaning scanning direction, immediately after said cleaning means is mounted on the slide frame, is moved in the scanning direction and the cleaning wipe attached to the discharge outlet of the slit nozzle a first peripheral portion of the wiping unit of the liquid.

[0014] 上述的结构中,在清洗扫描方向,相对于狭缝喷嘴的各位置的喷出口周边部,首先,第一清洗单元喷出清洗液,由此将附着在该喷出口周边部的污垢溶解在清洗液中,污垢液残留在喷出口周边部。 [0014] In the above-described configuration, the scanning direction of the cleaning, the discharge port peripheral portion with respect to the respective positions of the slit nozzle, first, a first cleaning unit discharging the cleaning liquid, thereby the dirt adhering to the discharge port peripheral portion was dissolved in the cleaning solution, the dirt remaining in the liquid discharge port peripheral portion. 随即,第一擦拭单元通过该喷出口周边部,擦去附着在此的污垢液。 Then, the wiping unit through a first peripheral portion of the ejection outlet, liquid wiped off the dirt herein.

[0015] 本发明的涂覆装置包括:具有在涂覆处理中对被处理基板带状喷出涂覆液的狭缝状的喷出口的长尺型狭缝喷嘴;在涂覆处理中向上述狭缝喷嘴供给涂覆液的涂覆液供给部;支撑上述基板的基板支撑部;在涂覆处理中,以上述狭缝喷嘴在上述基板上进行涂覆扫描的方式,在上述狭缝喷嘴和上述基板之间在水平方向进行相对移动的涂覆扫描机构; 和用于在涂覆处理的间歇对上述狭缝喷嘴的喷出口周边部进行清洗的上述狭缝喷嘴清洗装置。 [0015] The coating apparatus of the present invention comprises: a nozzle having a long-sized slits of slit-like discharge port discharging the treated belt-like substrate, a coating liquid in the coating process; in the above-described coating process a coating liquid supply unit supplying a coating liquid slit nozzle; substrate support portion supporting the substrate; the coating process, to the slit nozzle in a scanning manner is coated on the substrate in the slit nozzle and the substrate is coated between the scanning mechanism relatively moving in a horizontal direction; and intermittent coating treatment is performed for cleaning the slit portion of the periphery of the discharge port of the nozzle cleaning device of a slit nozzle.

[0016] 根据本发明的狭缝喷嘴清洗装置,通过上述结构和作用能够提高狭缝喷嘴的清洗效率,实现清洗周期的时间的缩短和清洗液消耗量的降低。 [0016] The slit nozzle cleaning device of the present invention, the above-described structure and operation can be improved cleaning efficiency slit nozzle, and shortening of the cleaning liquid to reduce the consumption of cleaning cycle time. 此外,根据本发明的涂覆装置, 通过具备本发明的狭缝喷嘴清洗装置,能够提高对狭缝喷嘴的清洗功能的清洗能力,改善涂覆处理的品质、成品率、维修成本。 Furthermore, the coating apparatus of the present invention, by the present invention includes a slit nozzle cleaning device, the cleaning ability can be improved slit nozzle cleaning function, improve the quality, yield, maintenance cost of the coating process.

附图说明 BRIEF DESCRIPTION

[0017] 图1为表示能够适用本发明的狭缝喷嘴清洗装置的抗蚀剂涂覆装置的一个结构例的立体图。 [0017] FIG. 1 is a diagram of the present invention can be applied to slit a perspective view showing one example of the resist coating apparatus of the nozzle cleaning device.

[0018] 图2为表示上述抗蚀剂涂覆装置中的狭缝喷嘴的内部结构和基板上形成抗蚀剂涂覆膜的情形的截面图。 [0018] FIG. 2 is a sectional view showing a case where a resist coating film is formed on the internal structure of the substrate and the resist slit nozzle coating device.

[0019] 图3为表示上述抗蚀剂涂覆装置中狭缝喷嘴的外观结构和基板上形成抗蚀剂涂覆膜的样子的主视图。 [0019] FIG. 3 is a front view of the resist coating film appearance of the resist coating device and the substrate is formed on the external configuration of a slit nozzle.

[0020] 图4为表示上述抗蚀剂涂覆装置具备的喷嘴恢复部的结构的局部截面主视图。 [0020] FIG. 4 is a partially cross-sectional configuration of the nozzle recovery portion includes a resist coating apparatus of the front view.

[0021] 图5为表示组装在上述喷嘴恢复部的狭缝喷嘴清洗部的结构的立体图。 [0021] FIG. 5 is a perspective view showing a configuration of the nozzle assembly of the cleaning portion in the slit portion of the nozzle recovery.

[0022] 图6为表示从清洗扫描的斜前方观察的上述狭缝喷嘴清洗部的结构的立体图。 [0022] FIG. 6 is a perspective view of a cleaning nozzle portion observed from the front oblique slits cleaning scan.

[0023] 图7为表示组装在上述狭缝喷嘴清洗部的擦拭单元的主要部分的结构的图。 [0023] FIG. 7 is a diagram showing a configuration of the nozzle assembly of a main part of the cleaning portion of the wiping unit in the slit.

[0024] 图8为表示上述狭缝喷嘴清洗部中进行与狭缝喷嘴的对位的机构的结构的截面图。 [0024] FIG. 8 is a section showing the slit nozzle cleaning mechanism in cross-sectional views of the structure and position of the slit nozzle.

[0025] 图9A为示意性地表示上述狭缝喷嘴清洗部的作用的侧视图。 [0025] FIG. 9A is a diagram schematically showing the cleaning effect of the slit portion of the nozzle side.

[0026] 图9B为示意性地表示上述狭缝喷嘴清洗部的作用的侧视图。 [0026] FIG. 9B is a diagram schematically showing the cleaning effect of the slit portion of the nozzle side. [0027] 图IOA为表示在上述狭缝喷嘴清洗部搭载在滑动架上的单元的组成的变形例的图。 [0027] FIG IOA is showing the slit in the nozzle cleaning unit is mounted in the embodiment of FIG modification unit consisting of the carriage.

[0028] 图IOB是表示上述狭缝喷嘴清洗部中的搭载在滑动架上的单元的组成的变形例的图。 [0028] FIG IOB is a diagram showing a modification of the composition portion of the carriage is mounted in the unit of the slit nozzle cleaning.

[0029] 图IlA是表示上述狭缝喷嘴清洗部中以单触式安装在滑动架上安装擦拭单元的结构例的图。 [0029] FIG IlA is a diagram showing an example of the part to one-touch mounted on the carriage mounting the wiper cleaning unit of the slit nozzle.

[0030] 图IlB是表示上述狭缝喷嘴清洗部中以单触式在滑动架上安装擦拭单元的另一结构例的图。 [0030] FIG IlB shows the slit nozzle cleaning unit mounted to the one-touch wiping another configuration example of the carriage unit.

[0031] 图12为表示上述狭缝喷嘴清洗部的第二实施方式的结构的俯视图。 [0031] FIG. 12 is a plan view showing the second embodiment of the slit nozzle cleaning portion.

[0032] 图13为上述狭缝喷嘴清洗部的第二实施方式的干燥单元的截面图。 Cross-sectional view of the drying unit of the second embodiment [0032] FIG. 13 is a portion of the slit nozzle cleaning.

[0033] 图14为图12的BB的截面图 [0033] FIG. 14 is a BB sectional view of FIG. 12

[0034] 符号说明 [0034] Description of Symbols

[0035] 32狭缝喷嘴 [0035] The slit nozzle 32

[0036] 52狭缝喷嘴清洗部 [0036] 52 slit nozzle cleaning portion

[0037] 60Y方向移动部 [0037] 60Y direction moving unit

[0038] 70、74清洗单元 [0038] The cleaning unit 70, 74

[0039] 72、76擦拭单元 [0039] The wiping unit 72, 76

[0040] 78干燥单元 [0040] The drying unit 78

具体实施方式 Detailed ways

[0041 ] 以下,参照附图,说明本发明的最佳实施方式。 [0041] Hereinafter, with reference to the drawings, preferred embodiments of the present invention.

[0042] 图1为表示本发明的能够适用狭缝喷嘴清洗装置的抗蚀剂涂覆装置的一个结构例。 [0042] FIG. 1 is a diagram showing the structure of a resist coating apparatus of the embodiment of the apparatus of the present invention can be applied to the slit nozzle cleaning.

[0043] 该抗蚀剂涂覆装置包括:通过气体的压力使被处理基板例如FPD用的玻璃基板G 悬浮在空中的悬浮工作台10 ;在该悬浮工作台10上沿着悬浮工作台长边方向(X方向)输送悬浮在空中的基板G的基板输送机构20 ;向在悬浮工作台10上进行输送的基板G的上表面供给抗蚀剂液的狭缝喷嘴32 ;和在涂覆处理的间歇恢复狭缝喷嘴32的喷嘴恢复部42。 [0043] The resist coating apparatus comprising: pressure of the gas to be processed G substrate such as a glass substrate for FPD suspension suspended in the air table 10; along the long side of the table suspended on the suspension stage 10 direction (X direction) of the substrate suspended in the air transport G of the substrate transfer mechanism 20; slit nozzle supplying the resist solution onto the surface of the substrate G is conveyed on the suspension stage 1032; and coating process intermittent recovery nozzles 32 of the slit nozzle recovery unit 42.

[0044] 在悬浮工作台10的上表面设置有向上方喷射规定的气体(例如空气)的多个气体喷射孔12,通过从这些气体喷射孔12喷射的气体的压力,使基板G距离工作台上表面悬浮在一定高度上。 [0044] provided with a predetermined upward injected gas (e.g. air) on the surface of the table 10 in a suspension of a plurality of gas injection holes 12, through which the gas pressure from the gas injection holes 12 is ejected, the substrate G from the stage upper surface suspended over a certain height.

[0045] 基板输送机构20具有:夹持悬浮工作台10在X方向延伸的一对导轨22A、22B,沿着这些导轨22A、22B能够往复移动的一对滑块M ;和在悬浮工作台10上以能够装卸地保持基板G的两侧端部方式设置在滑块M上的吸附垫等的基板保持部件(未图示),通过直进移动机构(未图示)在输送方向(X方向)移动滑块对,由此,在悬浮工作台10上进行基板G的悬浮输送。 [0045] The substrate transfer mechanism 20 has: a pair of sliders 22A pair of guide rails M suspension clamp table 10 extending in the X direction, 22B, along the guide rails 22A, 22B can reciprocate; and a suspension table 10 suction pads on the substrate or the like manner to both end portions detachably holding the substrate G can be provided on the slider holding member M (not shown), through a rectilinear moving mechanism (not shown) in the conveying direction (X-direction ) mobile slide pair, whereby the substrate G is conveyed in suspension in the suspension stage 10.

[0046] 抗蚀剂喷嘴32构成为:沿着与输送方向(X方向)正交的水平方向(Y方向)横跨在悬浮工作台10的上方,通过狭缝状的喷出口对通过其正下方的基板G的上表面(被处理面)喷出带状的抗蚀剂液R。 [0046] The resist nozzle 32 is configured to: along the conveying direction (X direction) perpendicular to the horizontal direction (Y direction) over the suspension across the table 10, through the slit-shaped discharge port through which the pair of positive below the upper surface of the substrate G (surface to be treated) of the resist solution discharge ribbon R. 此外,狭缝喷嘴32构成为,通过例如包括滚珠丝杠机构和导引部件等的喷嘴升降机构26,能够与支撑该喷嘴的喷嘴支撑部件28 一体地沿着铅直方向(Z方向)可移动地升降。 Further, the slit nozzle 32 is configured to be integrally movable along the vertical direction (Z direction) by a lifting mechanism such as a nozzle and the guide member comprises a ball screw mechanism 26 or the like, capable of nozzle support member 28 of the nozzle support to lift. 此外,狭缝喷嘴32通过抗蚀剂供给管30与由抗蚀剂液容器和送液泵等构成的抗蚀剂供给部(未图示)连接。 In addition, the slit 30 of the nozzle 32 is connected to the resist supply unit (not shown) and the resist solution feed pump container or the like is supplied through the resist.

[0047] 与狭缝喷嘴32邻接,在悬浮工作台10的上方设置有喷嘴恢复部42。 [0047] 32 adjacent to the slit nozzle, suspended above the stage 10 is provided with a nozzle recovery unit 42. 该喷嘴恢复部42的详细参照图4和图5在后面详述。 The nozzle recovery portion 42 in detail with reference to FIG. 4 and FIG. 5 described later.

[0048] 在此,说明该抗蚀剂涂覆装置中的抗蚀剂涂覆动作。 [0048] Here, the operation of the resist coating in the resist coating apparatus. 首先,从前段的单元例如热处理单元(未图示),通过分发机构(未图示)将基板G搬入设定在悬浮工作台10的前端侧的搬入区域,在此,待机的滑块M接受并保持基板G。 First, for example, a heat treatment unit (not shown) from the preceding units, by distributing mechanism (not shown) carrying the substrate G is set on the distal end side of the loading area of ​​the suspension of the table 10, this standby slider receiving M and holding the substrate G. 在悬浮工作台10上,基板G受到由气体喷射孔12喷射的气体(例如高压空气)的压力,在大约水平的姿势保持悬浮状态。 In suspending the stage 10, the substrate G by a gas (e.g., high-pressure air) pressure of the gas ejection openings 12 remain suspended in an approximately horizontal posture.

[0049] 如此,基板G在水平姿势下以一定速度在输送方向(χ方向)移动,同时,狭缝喷嘴32向着正下方的基板G以规定的压力或流量喷出带状的抗蚀剂液,由此,如图2和图3所示,从基板G的前端侧向后端侧,形成膜厚均勻的抗蚀剂液涂覆膜。 [0049] Thus, the substrate G at a constant rate ([chi] direction) in the horizontal direction in the conveying posture, while the pressure or flow 32 toward the substrate G directly below the slit nozzle to a predetermined band-shaped resist solution whereby, as shown in FIGS. 2 and 3, from the front end side of the rear end side of the substrate G to form a uniform coating film thickness of the resist solution.

[0050] 如果基板G的后端通过狭缝喷嘴32的下方,则在基板的一表面上形成抗蚀剂涂覆膜。 [0050] If the substrate G passes under the rear end of the slit nozzle 32, the resist coating film is formed on a surface of the substrate. 接着,基板G通过滑块M,在悬浮工作台10上被悬浮输送,由设定在悬浮工作台10后端的搬出区域,通过分发机构(未图示)送到后段的单元(未图示)。 Subsequently, the slider substrate G M, the table 10 is suspended on the suspension conveyed from the rear end of the suspension 10 is set in the unloading area of ​​the table, to the subsequent stage through the distribution unit mechanism (not shown) (not shown ).

[0051 ] 如图2所示,狭缝喷嘴32由在喷嘴长边方向(Y方向)平行延伸的前肋33F和后肋33R构成、将这些一对肋33F、33R对接并用螺栓结合成一体,具有狭缝状的喷出口32a。 [0051] 2, the slit nozzle 32 by the nozzle in the longitudinal direction (Y-direction) extending parallel to the front rib 33F and a rear rib 33R configuration, the pair of the ribs 33F, 33R and bolt abutting combined into one, having a slit-like discharge port 32a. 与狭缝喷嘴32的喷出口3¾平行延伸的两侧的喷嘴侧面32f、32r,形成为朝向喷出口3¾从上向下逐渐变细的锥形状。 Both sides of the slit nozzle orifices 32 extending parallel to the nozzle 3¾ side 32f, 32r, formed in a tapered shape toward the ejection outlet from the 3¾ tapers downwardly. 抗蚀剂涂覆时,不仅仅是喷出口32a,两侧的喷嘴侧面32f、32r 的下端部也被抗蚀剂液R浸润,完成抗蚀剂液涂覆处理后的喷出口3¾和喷嘴侧面32f、32r 的下端部残留有抗蚀剂液R的污垢。 When the resist coating, not only the discharge port 32a, on both sides of the nozzle side surface 32f, 32r of the lower end portion of the resist solution also wetted R, complete ejection outlet side of the nozzle and 3¾ after resist processing liquid coating 32f, 32r of the lower portion remains in the soil resist solution R.

[0052] 图4表示喷嘴恢复部42内的结构。 [0052] FIG. 4 shows the configuration of the nozzle recovery unit 42. 喷嘴恢复部42在一个箱体44内,併设有:向狭缝喷嘴32喷出少量抗蚀剂液以为下次涂覆处理做准备、并卷在启动辊46上的启动处理部48 ;用于以防止干燥为目的而将狭缝喷嘴32的喷出口保持在溶剂蒸汽的气氛中的喷嘴浴室50 ;用于清洗狭缝喷嘴32的喷出口周边部(喷出口32a、喷嘴侧面32f、32r)的狭缝喷嘴清洗部52。 A nozzle recovery unit 42 in the housing 44, and is provided with: a small amount of the resist solution 32 is ejected to the next slit nozzle coating process that prepares, and rolled on to start start-up processing unit 48 of the roller 46; with to prevent drying at the ejection outlet for the purpose of the slit nozzle shower nozzle 32 is maintained in an atmosphere of the solvent vapor 50; slit nozzle for cleaning a peripheral portion of the discharge port (discharge port 32a, the side surface of the nozzle 32f, 32r) 32 of slit nozzle cleaning portion 52.

[0053] 结束一次涂覆处理的狭缝喷嘴32,最初接受由狭缝喷嘴清洗部52进行的清洗处理,接着,在喷嘴浴室50内待机,在下一个涂覆处理即将开始之前接受由启动处理部48进行的启动处理。 [0053] Coating the end of a slit nozzle 32, initially received by the slit cleaning process for cleaning nozzle unit 52, and then, in the shower nozzle 50 stands by the next immediately before coating treatment received by the start-up processing unit 48 start of treatment.

[0054] 使狭缝喷嘴32进入喷嘴恢复部42内的各部(48、50、52),在未图示的控制器的控制下,例如通过由滚珠丝杠机构构成的X方向移动部54,使喷嘴恢复部42整体,即箱体44 在基板输送方向(X方向)移动,并且通过喷嘴升降机构26(图1),在铅直方向(Z方向)移动狭缝喷嘴32。 [0054] The slit nozzle 32 enters the nozzle recovery each part (48,50,52) within the portion 42, under control of controller (not shown), for example, by X-direction moving unit 54 composed of a ball screw mechanism, the overall recovery of the nozzle portion 42, i.e. the housing 44 (X-direction) in the substrate conveying direction, and through the nozzle lift mechanism 26 (FIG. 1), in the vertical direction (Z direction) of the slit nozzle 32.

[0055] 组装在喷嘴恢复部42上的狭缝喷嘴清洗部52,是本发明一实施方式中的狭缝喷嘴清洗装置。 [0055] In the assembled nozzle recovery nozzle portion 42 on slit cleaning unit 52, it is an embodiment of the present invention in a slit nozzle cleaning device. 以下,详细说明狭缝喷嘴清洗部52的结构和作用。 Hereinafter, the detailed description of the structure and function of cleaning the slit nozzle portion 52.

[0056] 如图5所示,狭缝喷嘴清洗部52具有:通过连接部件62与Y方向移动部60结合, 并沿着狭缝喷嘴32的喷出口周边部在与狭缝喷嘴的长边方向平行的水平的清洗扫描方向(Y方向)移动的滑动架64。 [0056] As shown, the slit nozzle 52 having a cleaning unit 5: 62 in combination through the connecting member and the Y-direction moving unit 60, and the periphery of the discharge port portion in the longitudinal direction along the slit of the slit nozzle of the nozzle 32 washing parallel horizontal scanning direction (Y direction) movement of the carriage 64. Y方向移动部60,由例如齿条和小齿轮机构构成,具有:在Y方向延伸的齿条66和内设有在该齿条66上转动的齿轮(未图示)的可动单元68。 Y-direction moving unit 60, for example, a rack and pinion mechanism, and has: a rack 66 and extending in the Y direction, equipped with a gear (not shown) of the movable unit 68 rotates on the rack 66. 滑动架64相对与狭缝喷嘴32的喷出口周边部进行对位后,在清洗扫描方向(Y方向)移动。 64 relative to each carriage, in (Y-direction) movement of the posterior washing scanning direction of the slit discharge port peripheral portion 32 of the nozzle.

7[0057] 狭缝喷嘴清洗部52在清洗扫描方向,按照第一清洗单元70为始,以下为第一擦拭单元72、第二清洗单元74、第二擦拭单元76和干燥单元78的顺序使这些单元并排成一列地搭载在滑动架64上。 7 [0057] In a slit nozzle cleaning unit 52 cleaning the scanning direction, according to the first cleaning unit 70 for the beginning, the first wiping unit 72, the second cleaning unit 74, the wiping unit 76 and the second drying unit 78 so that the order of these cells are arranged in a row and mounted on the carriage 64. 各个单元70〜78,以盒式能够装卸的方式安装在滑动架64上。 Respective units 70~78 in order cassette detachably mounted on the carriage 64.

[0058] 图6是表示从清洗扫描的斜前方观察狭缝喷嘴清洗部52的主要部分的结构。 [0058] FIG. 6 shows a view of the slit nozzle cleaning portion of the structure of the main portion 52 of the cleaning scan from obliquely forward.

[0059] 第一和第二清洗单元70、74分别具有:在上表面具有凹形的槽部的块状的喷嘴保持部7(^、7如;从该喷嘴保持部7(^、743的两侧的内壁突出的多对(或者一对)清洗喷嘴70b、74b ;和通过喷嘴保持部70a、74a内的流路与清洗喷嘴70b、74b连接的配管连接器70c、74c。配管连接器70c、7k分别与来自于清洗液供给部(未图示)的清洗液供给管(未图示)连接。 [0059] The first and second cleaning units 70, 74 each have: a nozzle block having a concave groove portion of the holding portion 7 (upper surface ^, 7; 7 holding portion (^ from the nozzle 743 inner walls on both sides of projecting a plurality of (or a pair of) the cleaning nozzle 70b, 74b;., and through the nozzle holding unit 70a, flow path 74a of the cleaning nozzle 70b, 74b connected to the pipe connector 70c, 74c pipe connector 70c , 7k are connected to a cleaning liquid supply tube (not shown) from the cleaning liquid supply section (not shown).

[0060] 干燥单元78分别具有:在上表面具有凹形槽部的块状的喷嘴保持部78a ;从该喷嘴保持部78a的两侧的内壁突出的多对(或一对)干燥喷嘴78b ;和通过喷嘴保持部78a内的流路与干燥喷嘴78b连接的配管连接器78c。 [0060] The drying unit 78 respectively have: a nozzle block having a concave groove portion of the holding portion 78a in the upper surface; both holding portions 78a of the inner wall of the nozzle from a plurality of projection (or a pair) drying nozzle 78b; and the pipe connector through the passage in the nozzle holding portion 78a and 78b connected to the drying nozzle 78c. 配管连接器78c与来自于干燥气体供给部(未图示)的气体供给管(未图示)连接。 Pipe connector 78c connected to the gas supply tube (not shown) from a dry gas supply to a portion (not shown).

[0061] 第一和第二擦拭单元72,76分别具有:在上表面具有V型槽部的块状的擦拭保持部72a、76a ;和横卧安装在该喷嘴保持部72a、76a的两侧倾斜面的一对(或多对)长边形擦拭部件(72f、72r)、(76f、76r)。 [0061] The first and second wiper units 72, 76 each have: a bulk portion of the wiper holder V-groove portions 72a, 76a on the surface; and lying on both sides of the nozzle holder mounting portions 72a, 76a of One pair (or pairs) long sides of the wiping member formed of an inclined surface (72f, 72r), (76f, 76r).

[0062] 如图6所示,擦拭部件(72f、72r)、(76f、76r)俯视时以V字状延伸。 As shown in [0062] FIG. 6, the wiping member (72f, 72r), (76f, 76r) extending in a V-shape in plan view. 模仿擦拭部件(72f、72r)、(76f、76r)的V形状,喷嘴保持部72a、76a的前部俯视时形成V形状的缺口,该形状缺口部72d、76d下方,通过滑动架64的贯通孔,接通箱体44的底的排水箱80 (图4)。 Imitate the wiping member (72f, 72r), (76f, 76r) of the V-shape, the nozzle 72a, a notch is formed V-shape in plan view the front portion 76a of the holding portion, the shape of the cutout portion 72d, 76d downwardly through the carriage through 64 hole, the bottom of the casing 44 is turned in the drain tank 80 (FIG. 4). 这样,V形状缺口部72d、76d,构成狭缝喷嘴清洗部52的排出口。 Thus, V shaped notch portions 72d, 76d, constituting the discharge port portion 52 of the slit nozzle cleaning.

[0063] 图7表示第一和第二擦拭单元72、76中,擦拭保持部72a、76a的单侧一半和单侧擦拭部件72r、76i•的结构。 [0063] FIG. 7 shows the first and second wiper units 72, 76, the wiper holding one side portion 72a, 76a and the one side half of the wiping member 72r, 76i • configuration. 图7 (a)为立体图,图7 (b)、(c)是图7(a)中从箭头A、B的方向观察的视图。 FIG. 7 (a) is a perspective view, FIG. 7 (b), (c) is in FIG. 7 (a) viewed from the direction of arrows A, B of view.

[0064] 擦拭部件72r(76r)由例如扎拉库(注册商标名)等的含氟弹性体构成,具有:埋入擦拭保持部72a(76a)的倾斜面的基部P ;从该基部P向擦拭保持部72a(76a)的倾斜面上方突出延伸的叶片部Q。 [0064] The wiper member 72r (76r) is constituted by, for example, Zara library (registered trade name) or the like of the fluorine-containing elastomer having: a buried wiper holding portion 72a (76a) of the base of the inclined plane P; P from the base to the wiper blade holding portion portions 72a (76a) on an inclined surface extending projecting Q. 对狭缝喷嘴32进行清洗时,叶片部Q的上边缘部以几乎均勻的压力沿着整个长度抵接狭缝喷嘴32的喷出口周边部(喷出口32a、喷嘴侧面32f、32r)。 When cleaning the slit nozzle 32, the upper edge portion of the blade portion Q is almost uniform pressure along the entire length of the slit abut the periphery of the discharge port 32 of the nozzle portion (discharge port 32a, the side surface of the nozzle 32f, 32r). 擦拭保持部72a (76a)的倾斜面上形成有能够装卸地收纳擦拭部件72r (76r)的基部P用的槽部M。 Holding portions formed wiper 72a (76a) has an inclined surface of the base can be removably housed wiping member 72r (76r) with a groove portion of P M.

[0065] 叶片部Q以相对于擦拭保持部72a(76a)的倾斜面倾斜立起的角度突出。 [0065] Q blade portion with respect to the wiper holder inclined surface portion 72a (76a) of the angle of inclination of the rising projection. 该立起角度α优选30°〜60°的范围,最优选在45°附近。 The preferred range of the rising angle α of 30 ° ~60 °, most preferably around 45 °.

[0066] 此外,擦拭部件72r(76r)在清洗扫描方向以相对于水平面倾斜立起的角度安装在擦拭保持部72a(76a)的倾斜面。 [0066] Further, the wiping member 72r (76r) in the washing scanning direction is inclined with respect to the horizontal plane is mounted on the rising inclined surface wiping holding portion 72a (76a) of. 该立起角度β优选15°〜45°的范围,最优选在30° 附近。 The scope of the rising angle β of preferably 15 ° ~45 °, most preferably around 30 °.

[0067] 擦拭保持部72a、76a的另一侧的一半和另一个的擦拭部件72f、76f也为与上述同样的结构。 [0067] 72a, and the other half of the wiping member 76a of the other side 72f, 76f are also of the same structure as the above-described wiping holding portion.

[0068] 图8表示该实施方式的狭缝喷嘴清洗部52具备的对位机构。 [0068] FIG. 8 shows the embodiment of the slit nozzle alignment mechanism 52 provided in the cleaning unit.

[0069] 狭缝喷嘴32到达狭缝喷嘴清洗部52,如上所述,通过X方向移动部M使喷嘴恢复部42整体在基板输送方向(X方向)移动(图4),并且,通过喷嘴升降机构沈(图1)在铅直方向(Z)方向移动狭缝喷嘴32。 [0069] The slit nozzle cleaning nozzle unit 32 reaches the slit 52, as described above, through the X-direction moving unit M to the nozzle recovery portion 42 integrally in the substrate conveyance direction (X direction) (FIG. 4), and by lifting the nozzle Shen mechanism (FIG. 1) of the slit nozzle 32 in the vertical direction (Z) direction. 这样,如图8所示,在狭缝喷嘴32和狭缝喷嘴清洗部52 之间自动进行对位,使得狭缝喷嘴32的两喷嘴侧面32f、32r和喷出口3¾分别以适度并且均勻的压力与第一和第二擦拭单元72、76的擦拭部件72f(76f)、72r(76r)接触。 Thus, as shown, a slit nozzle 8 between the slit nozzle 32 and the cleaning unit 52 to automatically position, so that two slit nozzle 32 of the nozzle side surface 32f, 32R and the discharge port 3¾ respectively moderate and even pressure , 72r (76r) in contact with the first and second wiping unit wiping member 72f (76f) 72,76 in.

[0070] 如图8所示,滑动架64具有与Y方向移动部60的连接部件62 —体结合的基础板64a、和在与喷嘴长边方向(Y方向)正交的水平方向(X方向)和铅直方向(Z方向)能够变位地安装在该基础板6½上的可动板64b,在可动板64b上,按照下述顺序排列搭载有第一和第二清洗单元70、74、第一和第二擦拭单元72、76和干燥单元78。 [0070] As shown, the carriage 64 has a Y-direction moving member and the connecting portion 60 of 628-- binding base plate 64a, a nozzle and a longitudinal direction (Y direction) perpendicular to the horizontal direction (X direction ) and vertical direction (Z direction) can be displaced mounted on the base plate 6½ movable plate 64b, on the movable plate 64b, arranged in the first and second cleaning units 70, 74 are mounted in the following order first and second wiper units 72, 76 and the drying unit 78. 在基础板6½和可动板64b上,在与第一和第二擦拭单元72、76的V形状缺口部72d、76d对应位置分别形成有排出用的贯通孔64c、64d。 6½ on the base plate and the movable plate 64b, and the V-shape in the notch portion 72d of the first and second wiper units 72, 76, 76d corresponding to the position of the through-holes 64c are formed with a discharge, 64d.

[0071] 在此,可动板64b通过从上到下贯通基础板64a的多个柱塞82,在铅直方向(Z方向)能够弹性变位,并且通过从外侧到内侧贯通固定在基础板6½上表面的块板84的多个柱塞86,能够在X方向弹性变位。 [0071] Here, the movable plate 64b by a plurality of through from top to bottom of the base plate 64a of the plunger 82 in the vertical direction (Z direction) can be displaced elastically, and is fixed by penetrating the base plate from the outside to the inside 6½ plurality of upper plate surface 86 of the ram 84 can be elastically displaced in the X direction. 各柱塞82、86,在躯体(螺栓)中内设有弹簧(未图示), 以点接触的方式加压接触可动板64b的球状的头部通过弹力弹性引退。 Plungers 82, 86, in the body (bolt) is equipped with a spring (not shown), as to a contact point contact pressure of the movable plate 64b of the spherical head by the elastic force of the elastic retirement.

[0072] 如上所述,通过X方向移动部M(图4)和喷嘴升降机构沈(图1),狭缝喷嘴32 到达狭缝喷嘴清洗部52时,以模仿狭缝喷嘴的喷出口周边部(喷出口32a、喷嘴侧面32f、 32r)的方式,第一和第二擦拭单元72、76还有可动板64b通过柱塞82、86,在X方向和Z方向弹性变位。 [0072] As described above, by the X-direction moving section M (FIG. 4) and the nozzle elevating mechanism sink (FIG. 1), the slit nozzle cleaning nozzle 32 reaches the slit portion 52, to mimic the slit nozzle discharge port peripheral portion (discharge port 32a, the side surface of the nozzle 32f, 32r) of the embodiment, the first and second wiper units 72, 76 as well as the movable plate 64b by the plunger 82,86, X and Z directions in the elastically displaced. 由此,第一和第二擦拭单元72、76的擦拭部件(72f、72r)、(76f、76r)沿着其整个长度,以适度均勻的压力紧贴在狭缝喷嘴的喷出口周边部(喷出口32a、喷嘴侧面32f、 32r)。 Thus, the first and second wiper units 72, 76 of the wiping member (72f, 72r), (76f, 76r) along its entire length, to reasonably uniform pressure against the slit nozzle discharge port peripheral portion ( discharge port 32a, the side surface of the nozzle 32f, 32r).

[0073] 在擦拭部件(72f、72r)、(76f、76r)中,不仅能够个别地更换擦拭前肋33F的喷出口3¾与喷嘴侧面32f的擦拭部件72f、76f以及擦拭后肋33R的喷出口3¾与喷嘴侧面32r的擦拭部件72r、76r,还能够分别选定各自的材质,也能够分别设定或调整各自的材质(特别是弹性体)的硬度。 [0073] In the wiping member (72f, 72r), (76f, 76r), not only can be individually replace the wiping member 72f wiper front rib 33F discharge port 3¾ the nozzle side surface 32f, the discharge port 76f and a rear wiper rib 33R of 3¾ nozzle side surface of the wiping member 32r 72r, 76r, can also be selected independently from each material, it is possible to set or adjust the respective materials (particularly elastomer) hardnesses.

[0074] 例如,如图2所示,平流方式的抗蚀剂涂覆处理中使用的狭缝喷嘴32,比起前肋33F的喷嘴侧面32f,后肋33R的喷嘴侧面32r由于抗蚀剂液R迂回,污垢比较多。 [0074] For example, as illustrated, the slit nozzle resist coating process used in advection embodiment 32, the nozzle than the nozzle side of the front side surface 32f of the rib 33F, 33R of the rear rib 32r because the resist solution 2 R circuitous, more dirt. 因此,污垢多的后肋33R侧的擦拭部件72r、76r,基于增大接触摩擦,提高擦拭力的原因而优选其材质硬度较大的材料。 Thus, much dirt wiping member 72r rear-side ribs 33R, 76R, and preferably greater material hardness reasons to increase the contact friction force improve the wiping material. 另一方面,污垢少的前肋33F侧的擦拭部件72f、76f,材质硬度比较小, 能够使接触摩擦小,提高耐久性。 On the other hand, the wiping member 72f 33F front side ribs less dirt, 76f, material hardness is relatively small, enabling the contact friction, improve durability.

[0075] 同样,在第一和第二擦拭部件72、76之间,在清洗扫描方向位于前方的第一擦拭单元72的擦拭部件72f、72r的材质硬度选定的高,位于后面的第二擦拭单元76的擦拭部件76f、76r的材质硬度选定的低。 [0075] Also, between the first and second wiper members 72, 76 in the first scanning direction of the wiper cleaning unit located in front of the wiping member 72f 72, the material hardness of the selected high 72r, is located behind the second wiping unit of the wiping member 76f 76, the hardness of the material selected low 76r.

[0076] 下面,参照图9A和图9B,说明该实施方式的狭缝喷嘴清洗部52的清洗作用。 [0076] Next, with reference to FIGS. 9A and 9B, the embodiment described slit nozzle cleaning portion 52 of the cleaning action.

[0077] 狭缝喷嘴清洗部52中,上述与狭缝喷嘴32的对位完成之后,维持该对位状态(图8的状态),并在未图示的控制器的控制下,使Y方向移动部60动作,滑动架64在清洗扫描方向(Y方向)以一定速度移动。 [0077] The slit nozzle cleaning unit 52, and after said alignment slit nozzle 32 is completed, maintain the alignment state (state of FIG. 8), and under the control of a controller (not shown), the Y-direction mobile unit 60 is operated, the carriage 64 moves at a constant speed in the cleaning scanning direction (Y direction). 在此,狭缝喷嘴32刚完成一次(一个基板)的抗蚀剂涂覆处理,在该喷出口周边部(喷出口32a、喷嘴侧面32f、32r)附着抗蚀剂液R,被污染。 Here, the slit nozzle 32 has just completed a (a substrate) of a resist coating process, the peripheral portion of the discharge port (discharge port 32a, the side surface of the nozzle 32f, 32r) attached to the resist solution R, is contaminated.

[0078] 在滑动架64开始扫描移动的几乎同时,搭载在滑动架64上的全部的单元开始各自的动作。 All of the units [0078] In the scanning carriage 64 starts moving almost simultaneously, is mounted on the carriage 64 start their operation. 更详细而言,第一清洗单元70在滑动架64上的最前面位置,通过清洗喷嘴70b 喷出清洗液例如稀释液S,一边向狭缝喷嘴32的喷出口周边部(喷出口32a、喷嘴侧面32f、 More specifically, the first cleaning unit 70 is in the foremost position on the carriage 64, through the cleaning nozzle 70b discharge the cleaning liquid diluent e.g. S, while the peripheral portion of the discharge port of the slit nozzle 32 (discharge port 32a, nozzle side 32f,

932r)喷出稀释液S,一边在清洗扫描方向(Y方向)移动。 932r) dilution discharge S, while cleaning scanning direction (Y direction).

[0079] 第一擦拭单元72,紧接着第一清洗单元70,一对擦拭部件72f、72r滑动接触狭缝喷嘴32的喷出口周边部(喷出口32a、喷嘴侧面32f、32r),在清洗扫描方向(Y方向)移动。 [0079] The first wiper means 72, next to the first cleaning unit 70, a wiping member 72f, 72r sliding contact with the peripheral portion of the discharge port of the slit nozzle 32 (discharge port 32a, the side surface of the nozzle 32f, 32r), the cleaning scan direction (Y direction).

[0080] 第二清洗单元74,紧接在第一擦拭单元72之后,由清洗喷嘴74b喷出清洗液例如稀释液S,一边向狭缝喷嘴32的喷出口周边部(喷出口32a、喷嘴侧面32f、32f)喷出稀释液S,一边在清洗扫描方向(Y方向)移动。 [0080] The second cleaning unit 74, immediately after the first wiper means 72, the cleaning nozzle 74b by the cleaning liquid is ejected diluent e.g. S, while the peripheral portion of the discharge port of the slit nozzle 32 (discharge port 32a, the side surface of the nozzle 32f, 32f) dilution discharge S, while in (Y-direction) washing the scanning direction.

[0081] 第二擦拭单元76,紧接在第二清洗单元74之后,一对擦拭部件76f、76i•滑动接触狭缝喷嘴32的喷出口周边部(喷出口32a、喷嘴侧面32f、32r),在清洗扫描方向(Y方向) 移动。 [0081] The second wiping unit 76, immediately after the second cleaning unit 74, the pair of wiping members 76f, 76i • sliding contact with the peripheral portion of the discharge port of the slit nozzle 32 (discharge port 32a, the side surface of the nozzle 32f, 32r), cleaning scanning direction (Y direction).

[0082] 干燥单元78,紧接在第二擦拭单元76之后,通过干燥喷嘴78b喷出干燥用气体,例如N2气体,一边向狭缝喷嘴32的喷出口周边部(喷出口32a、喷嘴侧面32f、32r)吹出N2 气体,一边在清洗扫描方向(Y方向)移动。 [0082] The drying unit 78, the second immediately after the wiping unit 76, the drying nozzle 78b through the drying gas discharge, for example N2 gas, while the peripheral portion of the discharge port of the slit nozzle 32 (discharge port 32a, the side surface 32f of the nozzle , 32R) blowing N2 gas, while the cleaning scanning direction (Y direction).

[0083] 图9A和图9B以一定的时间间隔(t1? t2,t3,……)示意性的表示:如上述的狭缝喷嘴清洗部52中,通过清洗扫描,在清洗扫描方向(Y方向)上从一端向另一端连续清洗并清扫狭缝喷嘴32的喷出口周边部(喷出口32a、喷嘴侧面32f、32r)的情形。 [0083] FIGS. 9A and 9B at a certain time interval (? T1 t2, t3, ......) schematic representations: washing as described above slit nozzle portion 52 by scanning washing, cleaning scanning direction (Y direction continuous cleaning and cleaning from one end to the other end of the slit nozzle) portion of the case surrounding the discharge port (discharge port 32a, the side surface of the nozzle 32f, 32r) 32.

[0084] 该清洗扫描中,如果着眼于各位置(例如图的P6的位置)的狭缝喷嘴32的喷出口周边部(喷出口32a、喷嘴侧面32f、32r),首先,通过第一清洗单元70向该喷出口周边部吹出稀释液S,附着在该喷出口周边部的抗蚀剂液R溶解在稀释液S中,混合有两液体R、S 的污垢液残RS留在喷出口周边部。 [0084] This cleaning scan, if focusing on each position (e.g., FIG position P6) of a slit nozzle surrounding the discharge port portion 32 (discharge port 32a, the side surface of the nozzle 32f, 32r), first, a first cleaning unit to the peripheral portion of the discharge port 70 is blown dilutions S, attached to the periphery of the ejection outlet portion of the resist solution R S dissolved in the diluent, the mixing of two liquid R, the RS S dirt liquid residues remaining in the discharge port peripheral portion .

[0085] 随即,使第一擦拭单元72的一对擦拭部件72f、72r滑动接触地通过该喷出口周边部。 [0085] Then, the wiping unit 72 of the first pair of wiping members 72f, 72r pass through the sliding contact portion of the periphery of the discharge port. 擦拭部件72f、72i•—边朝向行进方向以倾斜的角度β立起,并以适度的压力与该喷出口周边部滑动接触,一边向下扫落污垢液RS—边前进。 The wiping member 72f, 72i • - traveling direction side inclination angle β raised, and moderate pressure to the discharge port peripheral portion in sliding contact, while dirt was scraped down RS- forward edge. 扫落的污垢液RS,从排出口72d落入下方的排水箱80。 Scraped dirt liquid RS, falls from the discharge port 72d of the drain tank 80 below. 第一擦拭单元72进行的擦拭效果充分,即使擦拭的污垢液RS附着在第一擦拭单元72通过的路径上,也是少量的。 The first effect of the wiping unit 72 for wiping sufficiently, even when the dirt was wiped RS attached to the wiper unit 72 through the first path, but also a small amount.

[0086] 紧接着,第二清洗单元74向该喷出口周边部吹出稀释液S,由此,在该喷出口周边部附着的擦拭残留的污垢液RS被稀释液S稀释,相对地稀释液S的比率大且污垢少的液体&残留在喷出口周边部。 [0086] Then, the second cleaning unit 74 is blown to the peripheral portion of the discharge port dilutions S, thereby wiping residual dirt diluted in a liquid solution S diluted RS peripheral portion of the discharge port attached oppositely dilutions S the ratio of large and small dirt & remaining liquid discharge port peripheral portion.

[0087] 随即,使第二擦拭单元76的一对擦拭部件76f、76r滑动接触地通过该喷出口周边部。 [0087] Then, the wiping unit 76 of the second pair of wiping members 76f, 76r pass through the sliding contact portion of the periphery of the discharge port. 擦拭部件76f、76r朝向行进方向以倾斜的角度β立起,并以适度的压力与该喷出口周边部滑动接触,一边向下扫落污垢液& 一边前进。 The wiping member 76f, 76r traveling direction rising at an oblique angle β, and a moderate pressure to the discharge port peripheral portion in sliding contact, while dirt was scraped down & moved forward. 扫落的液体&,从排出口76d落入下面的排水箱80。 Liquid & scraped off, falling into the drainage tank 80 from below the discharge port 76d. 第二擦拭单元76进行的擦拭效果充分,即使擦拭的残留液&附着在第二擦拭单元76通过的路径上,也是少量的。 The second effect of the wiping unit 76 for wiping sufficiently, even wiping residual liquid adhering to the path of the second & wiping unit 76 passes, is a small amount.

[0088] 紧接着,干燥单元78向该喷出口周边部吹出N2气体,由此,用风力除去附着在该喷出口周边部的擦拭残留液体&,该喷出口周边部成为洁净并且干燥的状态。 [0088] Then, the drying unit 78 to the peripheral portion of the discharge port N2 gas is blown, thereby removing pneumatically wiping residual liquid adhering to the ejection outlet & peripheral portion, the peripheral portion of the discharge port becomes clean and dry state.

[0089] 从狭缝喷嘴32的一端到另一端沿着全长,在狭缝喷嘴32的清洗扫描方向(Y方向)的各位置的喷出口周边部进行上述那样一连串的处理(第一次的清洗一第一次的擦拭—第二次的清洗一第二次的擦拭一干燥)。 [0089], as the above-described series of processing (in a first discharge port peripheral portion of each slit nozzle cleaning positions 32 scanning direction (Y direction) of the slit nozzle 32 from one end to the other end along the entire length a first cleaning wipes - a second cleaning wipe a second drying).

[0090] 通过进行一次(一个去路)清洗扫描,沿着贯穿狭缝喷嘴32的全长,在各位置充分除去喷出口周边部(喷出口32a、喷嘴侧面32f、32r)的抗蚀剂污垢。 [0090] once cleaned by (a forward path) scanning along the entire length of the slit through the nozzle 32, the discharge port peripheral portion sufficiently removed at each position (discharge port 32a, the side surface of the nozzle 32f, 32r) soil resist agent. 因此,滑动架64达到设定在狭缝喷嘴32的另一端附近的终点时,在此完成喷嘴清洗处理。 Thus, the carriage 64 reaches the end point is set at near the other end of the slit nozzle 32, the nozzle cleaning process is completed here. 随即,在控制器的控制下,喷嘴升降机构38(图1)和X方向移动部M(图4)动作,使狭缝喷嘴32从狭缝喷嘴清洗部52移向邻接的喷嘴浴室50。 Then, under the control of the controller, the nozzle lift mechanism 38 (FIG. 1) and the X-direction moving section M (FIG. 4) operation, the slit nozzle cleaning nozzle 32 is moved from the slit portion 52 adjacent to the nozzles 50 bathrooms.

[0091] 如上所述,该实施方式的狭缝喷嘴清洗部52,将第一和第二清洗单元70、74、第一和第二擦拭单元72、76以及干燥单元78按照上述规定顺序依次搭载在与狭缝喷嘴32的长边方向平行的水平的清洗扫描方向(Y方向)移动的滑动架64上,在清洗扫描方向(Y方向)的移动中,第一和第二清洗单元70、74向狭缝喷嘴32的喷出口周边部吹出清洗液,第一和第二擦拭单元72、76擦去附着在狭缝喷嘴32的喷出口周边部的液体(污垢),干燥单元78向狭缝喷嘴32的喷出口周边部吹出干燥气体。 [0091] As described above, this embodiment of the slit nozzle cleaning unit 52, the first and second cleaning units 70, 74, first and second wiper units 72, 76 and the drying unit 78 in accordance with the predetermined order sequentially mounted in parallel to the longitudinal direction of the slit nozzle 32 cleaning horizontal scanning direction (Y direction) on the carriage 64, the moving cleaning scanning direction (Y direction), the first and second cleaning units 70, 74 blowing the cleaning liquid to the ejection outlet perimeter portion of the slit nozzle 32, the first and second wiper units 72, 76 wipe off the liquid adhering to the discharge port peripheral portion of the slit nozzle 32 (dirt), the drying unit 78 to the slit nozzle the peripheral portion of the discharge port 32 of the drying gas blown. 由此,特别是通过擦拭单元72、76的作用,大大改善了清洗效率,通过一次(一个去路)的清洗扫描,能够充分清洗、清扫狭缝喷嘴32的喷出口周边部,容易达成清洗周期时间的缩短化和清洗液消耗量的节减。 Thus, in particular by the action of the wiping means 72, 76, greatly improved cleaning efficiency, by one (a forward path) of the scanning cleaning, cleaning can be sufficiently cleaning the discharge port peripheral portion of the slit nozzle 32, the cleaning cycle time easy to reach and shortening the cleaning liquid consumption savings.

[0092] 此外,该实施方式的抗蚀剂涂覆装置,在喷嘴恢复部42具备上述狭缝喷嘴清扫部52,由此,能够提高对狭缝喷嘴32的清洗功能的清洗能力,能够改善抗蚀剂涂覆处理的品质、成品率、维修成本。 [0092] Further, the resist coating apparatus of this embodiment, the nozzle recovery unit 42 includes the slit nozzle cleaning unit 52, thereby, possible to improve the cleaning ability of the cleaning function of the slit nozzle 32 can be improved anti corrosion inhibitor coating process quality, yield, maintenance cost.

[0093] 以上,说明了本发明的最佳实施方式,本发明不限于上述实施方式,在其技术思想的范围内能够进行各种变形或变更。 [0093] The above described preferred embodiment of the present invention, the present invention is not limited to the above embodiments, and various variations and modifications within the scope of its technical idea.

[0094] 例如,能够对搭载在滑动架64上的单元的组成方式(清洗单元、擦拭单元和干燥单元的个数、排列顺序等)进行各种变形和变更。 [0094] For example, the composition of the embodiment mounted on the carriage unit 64 (cleaning unit, the drying unit and the wiping unit number, the order and the like) and various modifications and changes.

[0095] 例如,如图IOA的变形例(a)所示,能够纵向接续配置三组清洗单元和擦拭单元[70、72]、[74、76]、[90、92],最后配置干燥单元78。 [0095] For example, modification of the embodiment shown in FIG IOA (a), the longitudinal connection can be arranged three washing unit and the wiping unit [70, 72], [74], [90, 92], and finally a drying unit arranged 78.

[0096] 如图IOA的变形例(b)所示,纵向接续配置2组清洗单元和擦拭单元[70、72]、 [74,76]的结构与上述实施方式相同,但例如第一擦拭单元72内能够设置2对擦拭部件72f、72r。 [0096] Modification of FIG IOA (b), the longitudinal splice 2 of cleaning units and arranged wiping unit [70, 72], [74, 76] in the same structure as the above embodiment, but for example, the first wiping unit It can be provided two pairs of the wiping member 72f, 72r 72.

[0097] 如图IOA的变形例(c)所示,也能够为在滑动架64上搭载1组清洗单元和擦拭单元[70、72]和干燥单元78的结构。 [0097] Modification of FIG IOA (c), it is possible to set the washing unit 1 is mounted and the wiper unit 64 on the carriage structure [70, 72] and the drying unit 78.

[0098] 此外,如图IOA的变形例(d)所示,也能够为省略干燥单元78,在滑动架64上仅搭载1组清洗单元和擦拭单元[70、72]的结构。 [0098] In addition, the modified embodiment shown in FIG IOA (d), can be 78, the drying unit is omitted in the structure of the carriage is equipped with only one set of the washing unit and the wiping unit [70, 72] on 64.

[0099] 此外,不限于上述变形例(a)〜(d),上述实施方式中,多次反复移动滑动架64,反复多次进行清洗扫描也可以。 [0099] Further, the above modification is not limited to (a) ~ (d), the above-described embodiment, the carriage 64 moves repeatedly, repeated washing can be scanned.

[0100] 此外,如图IOB所示,能够在滑动架64上搭载去路用的擦拭单元72和回路用的擦拭单元94,进行去路清洗扫描和回路清洗扫描。 [0100] Further, as shown in FIG lOBs, wiping unit can be mounted on the forward path with the carriage circuit 6472 and the wiping unit 94 with, for cleaning the outward scan and the return scan cleaning. 这种情况下,在去路的清洗扫描方向,去路用擦拭单元72之前配置去路用的清洗单元70和干燥单元96,回路的清洗扫描方向中,在擦拭单元94之前配置回路用的清洗单元98和干燥单元78,在两个擦拭单元72、94之间配置去路/回路兼用的清洗单元74。 In this case the washing unit, washing the outward scanning direction, the outward configuration with the outward washing unit 70 and the drying unit 72 before the wiping unit 96, the scanning direction of the cleaning circuit, the circuit configuration used before the wiping unit 94 and 98 a drying unit 78 disposed outward path / circuit also serves as the cleaning unit 74 between two wiping unit 72,94.

[0101] 进行去路的清洗扫描时,通过例如压气缸使回路用的擦拭单元94下降,从狭缝喷嘴32分离或退避(即成为不使用的状态),并且行进方向前部的回路用干燥单元96和行进方向后部的回路用清洗单元98为关闭状态(即成为不使用状态)。 When [0101] for cleaning the outward scan, for example, lowered by a pressure air cylinder circuit wiping unit 94, or separation from the slit nozzle 32 is retracted (i.e., a state not in use), and the front portion of the traveling direction of the loop by the drying unit circuit 96 and the traveling direction of the rear of the washing unit 98 with the oFF state (i.e., becomes an unused state).

[0102] 进行回路的清洗扫描时,通过例如压气缸使去路用的擦拭单元72下降,从狭缝喷嘴32分离或退避(即成为不使用的状态),并且行进方向前部的去路用干燥单元78和行进 When the [0102] washing scanning circuit, for example, by the outward pressure of the wiping unit with the air cylinder 72 is lowered, or separation from the slit nozzle 32 is retracted (i.e., a state not in use), and the traveling direction of the front portion of the forward path dried unit 78 and travel

11方向后部的回路用清洗单元70为关闭状态(即成为不使用状态)。 Rear direction circuit 11 with the cleaning unit 70 is in a closed state (i.e., becomes an unused state).

[0103] 图IlA和图IlB表示几个以单触式能够装卸地安装在滑动架64上的擦拭单元(作为代表例有擦拭单元72)的结构例。 [0103] FIGS IlA and IlB wiping unit showing a configuration example (a representative example of the wiping unit 72) several single touch is detachably mounted on the carriage 64.

[0104] 图IlA的(a)、(b)所示的结构例,滑动架64构成为上表面开口的截面为-字型的箱体或壳体形状,能够从上面对于滑动架64插拔擦拭单元72。 [0104] FIG IlA of (a), (b) the structure illustrated embodiment, the opening cross section of the carriage 64 is configured on the surface - the shape of the box-shaped housing or can be from the upper carriage 64 for mating wiping unit 72. 优选在滑动架64设置定位用的锥形壁面64a(图IlA(a))或定位销64b (图IlA(b))。 Tapered wall surface 64a (FIG IlA (a)) is preferably provided on the carriage 64 for positioning or locating pin 64b (FIG IlA (b)). 优选采用在滑动架64的两侧壁6½安装柱塞100,在擦拭单元72侧的槽口72η上卡合柱塞100的头部的结构。 Preferably employed in the carriage side walls 6½ 64 is mounted a plunger 100, on the side of the notch 72η 72 wiping unit engaging structure 100 of the head portion of the plunger. 或者,代替柱塞100,可以采用如图IlB的(a)、(b)所示,在滑动架64的两侧壁6½上安装板簧102, 在擦拭单元72的肩部卡止板簧102的结构。 Alternatively, instead of the plunger 100, may be employed FIG IlB of (a), (b), the plate spring 102 is mounted on the carriage side walls 6½ 64, the plate spring 102 in the card 72 of the wiping unit locking shoulder Structure.

[0105] 下面,说明狭缝喷嘴清洗部的第二实施方式。 [0105] Next, a second embodiment of the slit nozzle cleaning portion. 与上述实施方式相同的内容省略说明。 The above-described embodiment content omitted. 图12为狭缝喷嘴清洗部152的俯视图。 FIG 12 is a top view of the slit nozzle 152 of the cleaning unit of FIG. 狭缝喷嘴清洗部152,在清洗扫描方向以第一清洗单元179为始,以下为第一擦拭单元72、第二清洗单元180、第二擦拭单元76、干燥单元78和第二干燥单元178,以该顺序并列排成一列,搭载在滑动架64上。 A slit nozzle cleaning portion 152, the scanning direction of the first cleaning unit 179 for the beginning of the washing, the wiper unit 72 is a first, second cleaning unit 180, a second wiping unit 76, drying unit 78 and the second drying unit 178, in this order in a row in parallel, it is mounted on the carriage 64. 各单元178〜180、 72,76以盒式能够装卸地安装在滑动架64上。 Units 178~180, 72, 76 detachably attached to the cartridge on the carriage 64.

[0106] 图13为图12的AA截面图。 [0106] FIG. 13 is a sectional view AA of Figure 12. 干燥单元78的相面对的一个面上设置干燥喷嘴78b 1、 7油2,从干燥喷嘴78bl、78l32喷出干燥用气体,例如队气体。 A surface of the drying unit 78 disposed facing the drying nozzle 78b 1, 7 2 of oil, from the drying nozzle 78bl, 78l32 discharged drying gas, such as gas team. 干燥单元78的另一个面也同样。 The other face of the drying unit 78 also. 此外,干燥单元178的相面对的一个面设置干燥喷嘴178bl、178b2,从干燥喷嘴178bl、 178b2喷出干燥用气体,例如队气体。 In addition, a surface 178 of the drying unit drying nozzle provided facing 178bl, 178b2, from the drying nozzle 178bl, 178b2 discharged drying gas, such as gas team. 干燥单元178的另一个面也同样。 The other face of the drying unit 178 also.

[0107] 在此,如图13所示,对位于上侧的干燥喷嘴78bl和干燥喷嘴178bl的高度位置进行比较时,干燥喷嘴78bl比干燥喷嘴178bl设置的高。 [0107] Here, as shown in Figure 13, when the height position of the upper side of the drying nozzle and a drying nozzle 78bl 178bl compared, higher than the drying nozzle of the drying nozzle 178bl 78bl disposed. 此外,干燥喷嘴7油2和干燥喷嘴178b2的高度位置设置在相同高度。 Further, the height position of the drying nozzle 7 and the drying nozzle 178b2 oil 2 is disposed at the same height.

[0108] 如此,干燥喷嘴78bl设置在比干燥喷嘴178bl高的位置,相对于喷嘴侧面32f、 32r从上依次吹附气体,因此附着在喷嘴侧面32f、32r的擦拭残留液体能够更有效的流向下方,进行干燥。 [0108] Thus, the drying nozzle 78bl disposed over the drying nozzle 178bl high position, relative to the nozzle side surface 32f, 32r order from the top blown gas thus adhered to the nozzle side surface 32f, the wiper residual liquid 32r can be more effectively flows downward and then dried.

[0109] 此外,如图12所示,第一和第二清洗单元179、180具有:上表面具有凹形槽部的块状的喷嘴保持部179a、180a ;和从该喷嘴保持部179a、180a的两侧的内壁突出的多对清洗喷嘴179b、180b。 [0109] Further, as shown in FIG. 12, the first and second cleaning unit 179, 180: a surface having a block-shaped concave groove portion of the nozzle holding portion 179a, 180a on; and a holding portion through the nozzle 179a, 180a projecting the inner wall of both sides of a plurality of cleaning nozzles 179b, 180b.

[0110] 从上方观察时,清洗喷嘴179b、180b相互错开配置,因此,例如,在狭缝喷嘴32不在凹形的槽部的状态下,即使从清洗喷嘴179b喷出清洗液,从清洗喷嘴179b喷出的清洗液之间也不会相对冲突而飞散。 [0110] When viewed from above, the cleaning nozzle 179b, 180b are arranged alternately, Thus, for example, in a state where the concave groove portion is not slit nozzle 32, discharged from the cleaning nozzle 179b even if the cleaning liquid from the cleaning nozzle 179b between the cleaning liquid is not discharged relatively conflict scattering.

[0111] 接着,图14为图12的BB截面图(第二清洗单元180的截面图)。 [0111] Next, FIG 14 is a sectional view BB of FIG. 12 (a sectional view of a second cleaning unit 180). 从喷嘴保持部180a的内壁上下两列配置清洗喷嘴180b。 Two vertically from the inner wall of the nozzle holding portion 180a is disposed a cleaning nozzle 180b. 此外,第一清洗单元179上也同样,上下两列配置清洗喷嘴179b。 Further, the first cleaning unit 179, similarly, two vertically disposed wash nozzles 179b.

[0112] 此外,不限于本实施例,第一擦拭单元72、第二擦拭单元的擦拭保持部72a、76d能够容易从滑动架64取下,能够仅交换擦拭部件(72f、72r)、(76f、76r),通过将每个擦拭保持部72a、76d交换为新的,能够更容易进行擦拭的交换。 [0112] Further, the present embodiment is not limited to the embodiment, the first wiping unit 72, the wiping unit wiping the second holding portions 72a, 76d can be easily removed from the carriage 64, it is possible to exchange only the wiping member (72f, 72r), (76f , 76R), each of the wiping by the holding portions 72a, 76d to a new exchange, the exchange can be more easily wiped.

[0113] 此外,擦拭部件72r(76r)的立起角度β优选在15°〜45°的范围内,最优选在30°附近,但以立起角度β为30°和44°进行实验时,30°的擦拭性能好。 [0113] Further, the wiping member 72r (76r) of the rising angle β is preferably in the range of 15 ° ~45 °, most preferably around 30 °, but the rising angle β of 30 ° and 44 ° for the experiment, good wiping performance of 30 °. 考察该结果可知,为了擦拭喷嘴侧面32f、32i•的规定区域,立起角度β越小擦拭部件72r(76r)的全长需要越长。 The investigation results, in order to wipe the nozzle side surface 32f, 32i • a predetermined area, the entire length of the rising angle β smaller wiper member 72r (76r) need longer. 因此,立起角度β =30°比立起角度β =44°擦拭长,在擦拭喷嘴侧面32f、32r 的相同区域的情况下,由于擦拭长因此立起角度β =30°的擦拭性能高。 Thus, the rising angle β = 30 ° than the rising angle β = 44 ° length of the wiper, in wiping nozzle side surface 32f, 32r of the case where the same region, since the length of the wiping angle so the rising high wiping performance β = 30 °. 但是,立起角度β比30更小时,则擦拭的全长过长,擦拭阻力增加,不能有效擦拭。 However, the rising angle β smaller than 30, the total length is too long wiping, wiping resistance increases, can not effectively wipe. 因此,立起角度β最优选在30°附近。 Thus, the rising angle β and most preferably around 30 °.

[0114] 作为本发明的涂覆液,除了抗蚀剂液以外,也可以是例如层间绝缘材料、电介质材料、配线材料等的涂覆液,也能够是各种药剂、显影液、漂洗液等。 [0114] As the coating solution of the present invention, in addition to the resist solution, the interlayer may be, for example, an insulating material coating liquid, the dielectric material, wiring material, etc., can also be of various drugs, developer, rinsed liquid. 本发明的被处理基板不限于LCD基板,其他的平面显示器用基板、半导体晶片、CD基板、光蚀刻掩膜、印刷基板等也可以。 The present invention is not limited to the substrate to be processed LCD substrate, other flat panel display substrate, semiconductor wafer, CD substrate, a photo-etching mask, the printed circuit board and the like may be used.

Claims (15)

1. 一种狭缝喷嘴清洗装置,用于对涂覆处理中使用的具有狭缝状的喷出口的长尺型狭缝喷嘴的喷出口周边部进行清洗,该狭缝喷嘴清洗装置的特征在于,包括:沿着所述狭缝喷嘴的喷出口周边部与所述狭缝喷嘴的长边方向平行地在水平的清洗扫描方向上移动的滑动架;搭载在所述滑动架上的、在所述清洗扫描方向上移动得同时向所述狭缝喷嘴的喷出口周边部喷出清洗液的第一清洗单元;和,在所述清洗扫描方向上位于所述清洗单元之后并搭载在所述滑动架上的、在所述清洗扫描方向上移动的同时擦去附着在所述狭缝喷嘴的喷出口周边部的液体的第一擦拭单元。 A slit nozzle cleaning device for the discharge port peripheral portion of the long-sized type slit nozzle having a slit-like discharge port of the coating process used for cleaning, characterized in that the slit nozzle cleaning device is characterized in , comprising: a parallel movement in the horizontal scanning direction of cleaning along the longitudinal direction of the ejection outlet portion of the periphery of the slit nozzle with slit nozzle carriage; the carriage is mounted in the discharge port peripheral portion of said cleaning nozzle simultaneously moves to the scanning direction of the slit discharge the cleaning liquid first cleaning unit; and then, the cleaning unit is positioned in the scan direction and the cleaning slide is mounted in the rack, moves in the scanning direction while the washing wiped off the wiping unit in a first liquid discharge port peripheral portion of the slit nozzle.
2.如权利要求1所述的狭缝喷嘴清洗装置,其特征在于:具有干燥单元,其在所述清洗扫描方向上位于所述第一擦拭单元之后,并搭载在所述滑动架上,在所述清洗扫描方向上移动的同时对所述狭缝喷嘴的喷出口周边部吹出干燥用气体。 2. the slit nozzle cleaning device according to claim 1, characterized in that: after a drying means located in the first unit in the cleaning wiper scanning direction, and is mounted in the carriage, in while the scanning direction of the cleaning ejection outlet portion of the periphery of the slit nozzle for blowing drying gas.
3.如权利要求1所述的狭缝喷嘴清洗装置,其特征在于,具有:在所述清洗扫描方向上位于所述第一擦拭单元之后并搭载在所述滑动架上的、在所述清洗扫描方向上移动的同时对所述狭缝喷嘴的喷出口周边部喷出清洗液的第二清洗单元; 和在所述清洗扫描方向,位于所述第二清洗单元之后,并搭载在所述滑动架上,在所述清洗扫描方向移动并对所述狭缝喷嘴的喷出口周边部附着的液体进行擦拭的第二擦拭单元。 3. The slit nozzle according to claim 1 cleaning apparatus comprising: a first wiper is located after the washing unit in the scanning direction and mounted on said carriage, said cleaning moving the scanning direction while ejecting the washing unit of the second cleaning liquid discharge port peripheral portion of said slit nozzle; and after washing the scanning direction, in the second washing unit, and is mounted on the slide frame, a second wiping unit for wiping the discharge port in the liquid portion of the periphery of the washing and scanning direction of the slit nozzle attached.
4.如权利要求3所述的狭缝喷嘴清洗装置,其特征在于:具有干燥单元,其在所述清洗扫描方向上位于所述第二擦拭单元之后,并搭载在所述滑动架上,在所述清洗扫描方向上移动的同时对所述狭缝喷嘴的喷出口周边部吹出干燥用气体。 4. The slit nozzle of the cleaning device according to claim 3, characterized in that: after a drying unit located on the second unit of the cleaning wiper scanning direction, and is mounted in the carriage, in while the scanning direction of the cleaning ejection outlet portion of the periphery of the slit nozzle for blowing drying gas.
5.如权利要求1所述的狭缝喷嘴清洗装置,其特征在于:在所述狭缝喷嘴的与喷出口平行地延伸的两侧的喷嘴侧面,形成为向着喷出口从上到下逐渐变细的锥形形状,所述清洗单元具有从两侧向所述锥形形状的喷嘴侧面吹附清洗液的多个清洗喷嘴,所述擦拭单元具有以相对于水平面倾斜立起的角度从两侧分别个别地与所述锥形形状的喷嘴侧面滑动接触的一对或多对长尺形擦拭部件。 5. The slit nozzle according to claim 1 cleaning apparatus, wherein: the slit outlet side of the nozzle and on both sides extending parallel to the spray nozzle, toward the ejection outlet is formed gradually increases from top to bottom thin tapered shape, the cleaning unit having a plurality of cleaning liquid from the cleaning nozzle to the nozzle side surface of both sides tapered shape is blown, from both sides of the wiping unit having a horizontal plane with respect to rising angle one or more long-sized shape of the wiping member with each individual nozzle of the tapered shape of the side surface sliding contact.
6.如权利要求5所述的狭缝喷嘴清洗装置,其特征在于:相对于水平面的所述擦拭部件的立起角度为15°〜45°。 6. A slit 5 of the nozzle cleaning device as claimed in claim, wherein: with respect to the horizontal plane of the wiping member rising angle is 15 ° ~45 °.
7.如权利要求5或6的狭缝喷嘴清洗装置,其特征在于:所述擦拭单元具有块状的擦拭保持部,该擦拭保持部具有分别与所述狭缝喷嘴的喷出口和喷嘴侧面平行相对的底部和倾斜面,在所述擦拭保持部的倾斜面安装有所述擦拭部件。 7. The slits 5 or claim 6 nozzle cleaning device, wherein: the wiping unit having a wiping block-holding portion, the holding portion having a wiper are parallel to the discharge port side of the nozzle and the slit nozzle opposite the bottom and the inclined surface, the inclined surface portion holding the wiper is attached to the wiper member.
8.如权利要求7所述的狭缝喷嘴清洗装置,其特征在于:所述擦拭部件具有埋入所述擦拭保持部的倾斜面的基部;和从所述基部向所述保持部的倾斜面上方突出的叶片部。 8. The slit nozzle of the cleaning device according to claim 7, characterized in that: said wiping member has a base portion embedded in the wiper holder inclined surface; and a holding portion from said base portion to said inclined surface the upper blade protruding.
9.如权利要求8所述的狭缝喷嘴清洗装置,其特征在于:所述擦拭部件的叶片部以相对于所述擦拭保持部的倾斜面倾斜立起的角度突出。 9. The slit nozzle of the cleaning device according to claim 8, wherein: the wiper blade portion of the member with respect to the inclined surface of the holding portion of the wiping angle of inclination of the rising projection.
10.如权利要求9所述的狭缝喷嘴清洗装置,其特征在于:相对于所述擦拭保持部的倾斜面的所述叶片部的立起角度为30°〜60°。 10. The slit nozzle according to claim 9, wherein the cleaning device, wherein: the angle of the blade with respect to the rising portion of the inclined surface of the holding portion of the wiper 30 ° ~60 °.
11.如权利要求10所述的狭缝喷嘴清洗装置,其特征在于:在所述擦拭保持部的倾斜面形成有槽部,该槽部用于能够装卸地收纳所述擦拭部件的基部ο The slit nozzle 11. The cleaning apparatus of claim 10, wherein: the wiping inclined surface portion is formed with a holding groove portion, the groove portion for removably receiving the base of the wiper member ο
12.如权利要求5或6所述的狭缝喷嘴清洗装置,其特征在于: 所述擦拭部件由含氟弹性体构成。 12. The slit 5 or claim 6, said nozzle cleaning device, characterized in that: said wiping member is made of fluoroelastomer.
13.如权利要求1〜6中任一项所述的狭缝喷嘴清洗装置,其特征在于: 所述擦拭单元能够装卸地安装在所述滑动架上。 13. 1~6 claimed in any one of the slit nozzle cleaning device, characterized in that: said wiper unit can be detachably mounted on the carriage.
14.如权利要求1〜6中任一项所述的狭缝喷嘴清洗装置,其特征在于:在所述滑动架上具有对位机构,使所述擦拭单元顺着所述狭缝喷嘴的喷出口周边部能够弹性变位。 14. 1~6 as claimed in any one of the claims slit nozzle cleaning device, comprising: a pair of bits in said carriage means, said wiping means along the slit nozzle jet surrounding the outlet portion can be elastically displaced.
15. 一种涂覆装置,其特征在于,包括:具有在涂覆处理中对被处理基板带状地喷出涂覆液的狭缝状的喷出口的长尺型狭缝喷嘴;在涂覆处理中向所述狭缝喷嘴供给涂覆液的涂覆液供给部; 支撑所述基板的基板支撑部;在涂覆处理中,以所述狭缝喷嘴在所述基板上进行涂覆扫描的方式,在所述狭缝喷嘴与所述基板之间在水平的一个方向上进行相对移动的涂覆扫描机构;和用于在涂覆处理的间歇对所述狭缝喷嘴的喷出口周边部进行清洗的权利要求1〜6中任一项所述的狭缝喷嘴清洗装置。 15. A coating apparatus, comprising: a nozzle having a long-sized slits of slit-like discharge port to discharge the treated belt-like substrate coating liquid in the coating process; coated process is supplied to the liquid supply slit nozzle coating a coating liquid portion; a support substrate supporting portion of the substrate; the coating process, to the scanning slit nozzle coating on the substrate embodiment, the scanning mechanism coating relative movement in one direction between said horizontal slit nozzle and the substrate; and intermittent coating process is performed for the discharge port of the peripheral portion of the slit nozzle 1~6 slit claimed in any one of claim cleaning nozzle cleaning device.
CN2011100412633A 2010-02-17 2011-02-17 Cleaning device and coating device for slit nozzle CN102161028A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2010-032446 2010-02-17
JP2010032446A JP5258811B2 (en) 2010-02-17 2010-02-17 Slit nozzle cleaning device and coating device

Publications (1)

Publication Number Publication Date
CN102161028A true CN102161028A (en) 2011-08-24

Family

ID=44462639

Family Applications (1)

Application Number Title Priority Date Filing Date
CN2011100412633A CN102161028A (en) 2010-02-17 2011-02-17 Cleaning device and coating device for slit nozzle

Country Status (4)

Country Link
JP (1) JP5258811B2 (en)
KR (1) KR101737124B1 (en)
CN (1) CN102161028A (en)
TW (1) TWI499457B (en)

Cited By (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102767222A (en) * 2012-06-29 2012-11-07 松下家电研究开发(杭州)有限公司 Nozzle assembly for warm-water toilet-seat device and cleaning method thereof as well as warm-water toilet-seat device
CN103286030A (en) * 2013-06-28 2013-09-11 深圳市华星光电技术有限公司 Slit nozzle cleaning device
CN103331276A (en) * 2013-07-12 2013-10-02 深圳市华星光电技术有限公司 Ultrasonic cleaning device and coating machine with ultrasonic cleaning device
CN103406230A (en) * 2013-08-08 2013-11-27 厦门精恒新自动化科技有限公司 Dispensing cleaning and switching device
CN104106125A (en) * 2012-02-10 2014-10-15 东京毅力科创株式会社 Wiping pad, nozzle maintenance device using pad, and coating processing device
CN105710056A (en) * 2016-03-21 2016-06-29 京东方科技集团股份有限公司 Liquid knife cleaning device and liquid knife
CN105855133A (en) * 2016-06-02 2016-08-17 京东方科技集团股份有限公司 Automatic nozzle cleaning device and automatic nozzle cleaning method
TWI564085B (en) * 2013-03-15 2017-01-01 斯克林集團公司 Nozzle cleaning apparatus, dispensing apparatus, method for nozzle cleaning, and method for dispensing
CN106733358A (en) * 2017-02-06 2017-05-31 京东方科技集团股份有限公司 Nozzle cleaning device and coating solution equipment
CN107433240A (en) * 2016-05-26 2017-12-05 株式会社斯库林集团 Nozzle clearing apparatus, coating unit and Nozzle clearing method
WO2018127058A1 (en) * 2017-01-05 2018-07-12 惠科股份有限公司 Nozzle cleaning device
CN108580133A (en) * 2018-06-01 2018-09-28 深圳市华星光电半导体显示技术有限公司 Coating apparatus mouth gold Wiping mechanism
CN108672214A (en) * 2018-07-25 2018-10-19 朱浩东 Optical cement coating apparatus
CN108873609A (en) * 2018-07-25 2018-11-23 朱浩东 Light blockage coating equipment
CN108873610A (en) * 2018-07-25 2018-11-23 朱浩东 Light blockage coating device
CN108906472A (en) * 2018-07-25 2018-11-30 朱浩东 Optics gum coating apparatus

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5138058B2 (en) * 2011-03-07 2013-02-06 東レ株式会社 Cleaning member and applicator cleaning method, cleaning device, and display member manufacturing method
JP2013071033A (en) * 2011-09-27 2013-04-22 Dainippon Screen Mfg Co Ltd Nozzle washing device and coating applicator with the nozzle washing device
JP5809114B2 (en) 2012-07-10 2015-11-10 東京エレクトロン株式会社 Coating processing apparatus and coating processing method
CN103846183A (en) 2013-12-20 2014-06-11 深圳市华星光电技术有限公司 Coater spraying nozzle cleaning device
KR101578368B1 (en) * 2014-12-04 2015-12-18 주식회사 디엠에스 Apparatus for cleaning nozzle lip and Slit coater using the same
JP6454597B2 (en) * 2015-05-13 2019-01-16 東京応化工業株式会社 Coating apparatus, coating system, and coating method

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001113213A (en) * 1999-10-19 2001-04-24 Toray Ind Inc Cleaning method and cleaning apparatus for coating head, plasma display, and production method and production apparatus for plasma display member
JP2007237122A (en) * 2006-03-10 2007-09-20 Tokyo Ohka Kogyo Co Ltd Apparatus for cleaning slit nozzle
JP2008149247A (en) * 2006-12-15 2008-07-03 Chugai Ro Co Ltd Cleaning device for discharge nozzle
JP2008268906A (en) * 2007-03-27 2008-11-06 Toray Ind Inc Cleaning member, cleaning method of coater, cleaning device thereof and manufacturing method of display member
CN101314153A (en) * 2007-05-28 2008-12-03 大日本网目版制造株式会社 Nozzle cleaning apparatus

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002177848A (en) * 2000-12-15 2002-06-25 Toray Ind Inc Apparatus and method for cleaning coating die, and apparatus and method for manufacturing color filter using them
JP4779234B2 (en) * 2001-06-05 2011-09-28 東レ株式会社 Coating die cleaning method and cleaning apparatus, and color filter manufacturing method and manufacturing apparatus
KR100923022B1 (en) * 2002-06-14 2009-10-22 삼성전자주식회사 Method and apparatus for coating sensitive material
KR100700180B1 (en) * 2004-12-31 2007-03-27 엘지.필립스 엘시디 주식회사 Slit coater having pre-spreading unit and method of coating using thereof
KR100975129B1 (en) * 2008-06-27 2010-08-11 주식회사 디엠에스 Slit coater having nozzle lip cleaner

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001113213A (en) * 1999-10-19 2001-04-24 Toray Ind Inc Cleaning method and cleaning apparatus for coating head, plasma display, and production method and production apparatus for plasma display member
JP2007237122A (en) * 2006-03-10 2007-09-20 Tokyo Ohka Kogyo Co Ltd Apparatus for cleaning slit nozzle
JP2008149247A (en) * 2006-12-15 2008-07-03 Chugai Ro Co Ltd Cleaning device for discharge nozzle
JP2008268906A (en) * 2007-03-27 2008-11-06 Toray Ind Inc Cleaning member, cleaning method of coater, cleaning device thereof and manufacturing method of display member
CN101314153A (en) * 2007-05-28 2008-12-03 大日本网目版制造株式会社 Nozzle cleaning apparatus

Cited By (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104106125B (en) * 2012-02-10 2016-09-28 东京毅力科创株式会社 Cleaning pad, the nozzle maintenance device that uses this pad and coating processing device
CN104106125A (en) * 2012-02-10 2014-10-15 东京毅力科创株式会社 Wiping pad, nozzle maintenance device using pad, and coating processing device
CN102767222B (en) * 2012-06-29 2014-07-23 松下家电研究开发(杭州)有限公司 Nozzle assembly for warm-water toilet-seat device and cleaning method thereof as well as warm-water toilet-seat device
CN102767222A (en) * 2012-06-29 2012-11-07 松下家电研究开发(杭州)有限公司 Nozzle assembly for warm-water toilet-seat device and cleaning method thereof as well as warm-water toilet-seat device
TWI564085B (en) * 2013-03-15 2017-01-01 斯克林集團公司 Nozzle cleaning apparatus, dispensing apparatus, method for nozzle cleaning, and method for dispensing
CN103286030B (en) * 2013-06-28 2016-08-31 深圳市华星光电技术有限公司 A kind of gap nozzle cleaning device
WO2014205872A1 (en) * 2013-06-28 2014-12-31 深圳市华星光电技术有限公司 Slit nozzle cleaning device
CN103286030A (en) * 2013-06-28 2013-09-11 深圳市华星光电技术有限公司 Slit nozzle cleaning device
CN103331276B (en) * 2013-07-12 2016-05-18 深圳市华星光电技术有限公司 Ultrasonic cleaning equipment and the coating machine with this ultrasonic cleaning equipment
CN103331276A (en) * 2013-07-12 2013-10-02 深圳市华星光电技术有限公司 Ultrasonic cleaning device and coating machine with ultrasonic cleaning device
CN103406230A (en) * 2013-08-08 2013-11-27 厦门精恒新自动化科技有限公司 Dispensing cleaning and switching device
CN103406230B (en) * 2013-08-08 2015-11-25 厦门精恒新自动化科技有限公司 A kind of some glue cleaning switching mechanism
CN105710056A (en) * 2016-03-21 2016-06-29 京东方科技集团股份有限公司 Liquid knife cleaning device and liquid knife
CN105710056B (en) * 2016-03-21 2019-01-25 京东方科技集团股份有限公司 Liquid cutter cleaning device and liquid cutter
CN107433240A (en) * 2016-05-26 2017-12-05 株式会社斯库林集团 Nozzle clearing apparatus, coating unit and Nozzle clearing method
CN105855133B (en) * 2016-06-02 2018-06-08 京东方科技集团股份有限公司 Nozzle automatic cleaning apparatus and nozzle automatic cleaning method
CN105855133A (en) * 2016-06-02 2016-08-17 京东方科技集团股份有限公司 Automatic nozzle cleaning device and automatic nozzle cleaning method
WO2018127058A1 (en) * 2017-01-05 2018-07-12 惠科股份有限公司 Nozzle cleaning device
CN106733358A (en) * 2017-02-06 2017-05-31 京东方科技集团股份有限公司 Nozzle cleaning device and coating solution equipment
CN106733358B (en) * 2017-02-06 2019-10-01 京东方科技集团股份有限公司 Nozzle cleaning device and coating fluid coating apparatus
CN108580133A (en) * 2018-06-01 2018-09-28 深圳市华星光电半导体显示技术有限公司 Coating apparatus mouth gold Wiping mechanism
CN108580133B (en) * 2018-06-01 2019-09-24 深圳市华星光电半导体显示技术有限公司 Coating apparatus mouth gold Wiping mechanism
CN108873609A (en) * 2018-07-25 2018-11-23 朱浩东 Light blockage coating equipment
CN108873610A (en) * 2018-07-25 2018-11-23 朱浩东 Light blockage coating device
CN108906472A (en) * 2018-07-25 2018-11-30 朱浩东 Optics gum coating apparatus
CN108672214A (en) * 2018-07-25 2018-10-19 朱浩东 Optical cement coating apparatus

Also Published As

Publication number Publication date
TW201200243A (en) 2012-01-01
JP5258811B2 (en) 2013-08-07
KR20110095133A (en) 2011-08-24
JP2011167607A (en) 2011-09-01
KR101737124B1 (en) 2017-05-17
TWI499457B (en) 2015-09-11

Similar Documents

Publication Publication Date Title
JP4753313B2 (en) Substrate processing equipment
TW573237B (en) Film forming unit
KR100648165B1 (en) Substrate washing apparatus, substrate washing method and media having substrate washing program
JP3653198B2 (en) Nozzle for drying, drying apparatus and cleaning apparatus using the same
US6692165B2 (en) Substrate processing apparatus
CN1250346C (en) Substrate processing device and rinsing apparatus
JP4056858B2 (en) Substrate processing equipment
TWI293578B (en) Nozzle cleaning apparatus and substrate processing apparatus
KR20040041012A (en) A pre-discharging apparatus for a slit coater
JP4003441B2 (en) Surface treatment apparatus and surface treatment method
TWI267129B (en) Coating and developing apparatus, exposure apparatus and resist pattern forming method
KR101099007B1 (en) Preliminary spout apparatus for slit coater
KR20080090070A (en) Air knife and apparatus drying substrates having the same
JP3918401B2 (en) Substrate drying apparatus, drying method, and substrate manufacturing method
KR19990053806A (en) A semiconductor device for manufacturing the developing device, and a method of controlling
KR20010062439A (en) Coating film and forming apparatus
CN1501177A (en) Developing method and apparatus
JP5258811B2 (en) Slit nozzle cleaning device and coating device
JP2005087777A (en) Coating liquid applying method and coating applicator
JP2006187763A (en) Slit coater and method for manufacturing liquid crystal display device using it
JP4523498B2 (en) Development processing apparatus and development processing method
JP4857193B2 (en) Nozzle cleaning device
JP3777542B2 (en) Nozzle device, coating device, and coating method
KR100857635B1 (en) Substrate processing apparatus
JP4334758B2 (en) Film forming device

Legal Events

Date Code Title Description
C06 Publication
C10 Entry into substantive examination
C02 Deemed withdrawal of patent application after publication (patent law 2001)