CN108212921A - Cleaning device - Google Patents
Cleaning device Download PDFInfo
- Publication number
- CN108212921A CN108212921A CN201810085607.2A CN201810085607A CN108212921A CN 108212921 A CN108212921 A CN 108212921A CN 201810085607 A CN201810085607 A CN 201810085607A CN 108212921 A CN108212921 A CN 108212921A
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- CN
- China
- Prior art keywords
- cleaning
- unit
- substrate
- cleaning device
- cleaning unit
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B13/00—Accessories or details of general applicability for machines or apparatus for cleaning
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/02—Cleaning by the force of jets or sprays
- B08B3/022—Cleaning travelling work
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/041—Cleaning travelling work
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
- B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
- B08B3/123—Cleaning travelling work, e.g. webs, articles on a conveyor
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Cleaning By Liquid Or Steam (AREA)
Abstract
The present invention relates to base-plate cleaning technical fields, a kind of disclosed cleaning device includes the conveying mechanism for conveying substrate to be cleaned along the first direction, megasonic cleaning unit, liquid cleaning unit, two fluid purge units, pure water cleaning unit and the drying unit for being oppositely arranged with the conveying mechanism and being set gradually along the first direction.The cleaning device is treated cleaning base plate by multiple cleaning links and is cleaned as a result, can thoroughly clean the polishing fluid of substrate surface remnants, improve the yield of substrate, avoids that organic electroluminescence device using effect is caused to be deteriorated due to remaining slurry on substrate.
Description
Technical field
The present invention relates to base-plate cleaning technical fields, and in particular to a kind of cleaning device.
Background technology
With the development of information technology, organic electroluminescence device is because it is with high contrast, wide viewing angle, low-power consumption, body
The advantages that product is thin, it has also become one of technology of greatest concern in flat panel display at present.
During organic electroluminescence device is manufactured, in order to enable organic electroluminescence device substrate planarization, leads to
(CMP) process can be often chemically-mechanicapolish polished to it.CMP process is the " buffing being utilized in abrasion
Principle firmly " forms one layer of polishing fluid fluid film first on polished substrate, chemical composition and substrate surface in polishing fluid
Material chemically reacts, and insoluble substance is converted into readily soluble substance or softens substance with high hardness, Ran Houtong
The micromechanics rubbing action for crossing abrasive grain removes these chemical reactants from substrate surface, dissolves in the liquid of flowing and takes away, i.e.,
The purpose of polishing is realized in chemical striping and mechanical striping alternation procedure.
Substrate surface after polishing has remaining polishing fluid, needs to use after cleaning it.At present to throwing
The minimum pure water cleaning of cost is usually used in the mode that substrate after light is cleaned, but only can not be thorough by pure water cleaning
The polishing fluid of substrate surface remnants is cleaned at bottom, and then greatly reduces the use of the yield and organic electroluminescence device of substrate
Effect.
Invention content
For this purpose, the technical problems to be solved by the invention are how to solve the polishing fluid residual on polishing metacoxal plate surface.
In order to solve the above technical problems, the technical solution adopted by the present invention is as follows：
The present invention provides a kind of cleaning device, including：
For conveying the conveying mechanism of substrate to be cleaned along the first direction；
Megasonic cleaning unit, the liquid for being oppositely arranged with the conveying mechanism and being set gradually along the first direction are clear
Wash unit, two fluid purge units, pure water cleaning unit and drying unit.
Optionally, the conveying mechanism includes：
Transmission parts, for placing the substrate to be cleaned；
Actuator is connect with the transmission parts, for the transmission parts to be driven to operate.
Optionally, the transmission parts are included along the spaced conveying roller of the first direction.
Optionally, the transmission parts are conveyer belt.
Optionally, it is additionally provided with pressure pulse cleaning list between the megasonic cleaning unit and the liquid cleaning unit
Member.
Optionally, pure water infusion unit is additionally provided with before the megasonic cleaning unit.
Optionally, the drying unit includes air knife and the gas storage part being attached thereto.
Optionally, it is all provided in the liquid cleaning unit, two fluid purge unit and the pure water cleaning unit
There are spray assemblies.
Optionally, the spray assemblies include：
Nozzle, for spraying the liquid cleaning unit, two fluid purge unit and the pure water cleaning unit
In treatment fluid；
Flow-rate adjustment part is connect with the nozzle, for adjusting the fountain height of the nozzle.
Optionally, the spray assemblies further include：
Angle adjusting piece is connect with the nozzle, for adjusting the spray angle of the nozzle.
Technical scheme of the present invention has the following advantages that：
Cleaning device provided by the invention, substrate to be cleaned pass through ultrasonic cleaning respectively under the conveying of conveying mechanism
Unit, liquid cleaning unit and two fluid purge units carry out pure water cleaning through over cleaning and then by pure water cleaning unit,
Processing most is dried to the substrate after cleaning through drying unit afterwards.The cleaning device is treated by multiple cleaning links as a result,
Cleaning base plate is cleaned, and can thoroughly be cleaned the polishing fluid of substrate surface remnants, be improved the yield of substrate, avoid because of substrate
Upper remaining slurry and cause organic electroluminescence device using effect be deteriorated.
In addition, ultrasonic cleaning is to utilize cavitation, acceleration effect and the direct flow effect of ultrasonic wave in a liquid
Liquid and dirt directly, are indirectly acted on, crud layer is made to be disperseed, emulsified, removed, so as to achieve the purpose that cleaning.Using
Ultrasonic cleaning technology cleans substrate, and cleaning speed is fast, and ensure that good cleaning performance, and cleannes are high and treat clear
Washing the cleannes at each position of substrate can be consistent.
Cleaning device provided by the invention, conveying mechanism are included for placing the transmission parts of substrate to be cleaned and for driving
The actuator of transmission parts operating.As a result, under the driving effect of actuator, transmission parts drive substrate to be cleaned successively by each
Cleaning unit is cleaned, and improves the degree of automation of cleaning device and property easy to use.
Cleaning device provided by the invention, transmission parts include spaced conveying roller along the first direction or to transmit
Band can be selected according to actual demand, and transfer structure is relatively simple, the ease of use of transmission parts be improved, conducive to extensive
Using.
Cleaning device provided by the invention, it is clear between megasonic cleaning unit and liquid cleaning unit to be additionally provided with bubbling
Unit is washed, further enhances the cleaning dynamics to substrate.
Cleaning device provided by the invention is additionally provided with pure water infusion unit, i.e., clear before megasonic cleaning unit
Substrate is impregnated first before washing substrate, helps to be got rid of in advance by the impurity soluble easily in water of part on substrate.
Cleaning device provided by the invention, in liquid cleaning unit, two fluid purge units and pure water cleaning unit
Equipped with spray assemblies.In this way, substrate can be carried out by spray assemblies the cleaning of links, be conducive to save cleaning solution
Dosage, and using more convenient.
Cleaning device provided by the invention, spray assemblies are included for spraying the nozzle for the treatment of fluid and for adjusting nozzle
The flow-rate adjustment part of fountain height.The fountain height of nozzle can be adjusted by flow-rate adjustment part according to actual demand as a result, so that processing
The usage amount of liquid can be adjusted.On the one hand when larger to treatment fluid demand, the fountain height of nozzle can be increased, ensure base
Plate is fully cleaned；On the other hand when smaller to treatment fluid demand, the fountain height of nozzle can be reduced, ensure treatment fluid
It will not be wasted.
Cleaning device provided by the invention, spray assemblies further include for adjust nozzle spray angle angular adjustment
Part.The spray angle of nozzle can be adjusted by angle adjusting piece, thus, it can be achieved that the uniform sprinkling to substrate surface is clear
It washes, the polishing fluid being further ensured that on substrate is thoroughly cleaned up.
Description of the drawings
It, below will be to specific in order to illustrate more clearly of the specific embodiment of the invention or technical solution of the prior art
Embodiment or attached drawing needed to be used in the description of the prior art are briefly described, it should be apparent that, in being described below
Attached drawing is some embodiments of the present invention, for those of ordinary skill in the art, before not making the creative labor
It puts, can also be obtained according to these attached drawings other attached drawings.
Fig. 1 is the structure diagram of cleaning device provided in an embodiment of the present invention；
Fig. 2 is the structure diagram of conveying mechanism in cleaning device provided in an embodiment of the present invention；
Fig. 3 is another structure diagram of conveying mechanism in cleaning device provided in an embodiment of the present invention；
Fig. 4 is the structure diagram of spray assemblies in cleaning device provided in an embodiment of the present invention；
Fig. 5 is the structure diagram of drying unit in cleaning device provided in an embodiment of the present invention；
Reference numeral：
1- conveying mechanisms；101- transmission parts；1011- swing arms；1012- guide rails；1013- fixtures；102- actuators；2- feedings
Unit；3- pure water infusion units；4- megasonic cleaning units；5- pressure pulse cleaning units；6- liquid cleaning units；Bis- fluids of 7- are clear
Wash unit；8- pure water cleaning units；9- drying units；901- air knives；902- gas storage parts；10- blanking units；1101- nozzles；
1102- flow-rate adjustment parts；1103- angle adjusting pieces；12- control cabinets.
Specific embodiment
Technical scheme of the present invention is clearly and completely described below in conjunction with attached drawing, it is clear that described implementation
Example is part of the embodiment of the present invention, instead of all the embodiments.Based on the embodiments of the present invention, ordinary skill
Personnel's all other embodiments obtained without making creative work, shall fall within the protection scope of the present invention.
In the description of the present invention, it should be noted that term " on ", " under ", " vertical ", " level ", " interior ", " outer " etc.
The orientation or position relationship of instruction are based on orientation shown in the drawings or position relationship, are for only for ease of the description present invention and letter
Change description rather than instruction or imply signified device or element must have specific orientation, with specific azimuth configuration and
Operation, therefore be not considered as limiting the invention.
In the description of the present invention, it should be noted that unless otherwise clearly defined and limited, term " installation ", " phase
Even ", " connection " should be interpreted broadly, for example, it may be being fixedly connected or being detachably connected or be integrally connected；It can
To be mechanical connection or be electrically connected；It can be directly connected, can also be indirectly connected by intermediary, it can be with
It is the connection inside two elements, can is wireless connection or wired connection.For those of ordinary skill in the art
For, the concrete meaning of above-mentioned term in the present invention can be understood with concrete condition.
As long as in addition, technical characteristic involved in invention described below different embodiments non-structure each other
It can be combined with each other into conflict.
Embodiment
An embodiment of the present invention provides a kind of cleaning devices, are mainly used in and the substrate after polishing is cleaned.Such as figure
Shown in 1-2, including conveying mechanism 1 and the megasonic cleaning unit set gradually along the first direction 4, liquid cleaning unit 6, two
Fluid purge unit 7, pure water cleaning unit 8 and drying unit 9.
Conveying mechanism 1 is used to convey substrate to be cleaned along the first direction.Wherein, first direction refers to the cleaning in Fig. 1
The assembly line direction of device.
As a kind of preferred embodiment, as shown in Fig. 2, conveying mechanism 1 includes transmission parts 101 and actuator 102.Its
In,
Transmission parts 101 are used to place substrate to be cleaned.In the present embodiment, between transmission parts 101 can include along the first direction
Every the conveying roller of arrangement.
As alternative embodiments, transmission parts 101 can also be the conveyer belt being distributed along the first direction.It can realize
The object of the invention belongs to the scope of protection of the present invention.
Conveyer structure in the present embodiment is relatively simple, improves its ease of use, conducive to extensive use, conveyer belt
Concrete structure can selection setting be carried out according to actual demand.
Actuator 102 is connect with transmission parts 101, for transmission parts 101 to be driven to operate.In the present embodiment, actuator 102 can
Think the equipment that motor or cylinder etc. can realize driving effect.
As alternative embodiments, as shown in figure 3, in the present embodiment, transmission parts 101 include swing arm 1011, guide rail
1012 and fixture 1013；Actuator 102 is servo motor.
Wherein, the output terminal of one end connection servo motor of swing arm 1011, servo motor can control swing arm 1011 along water
Square to swing；The other end connection guide rail 1012 of swing arm 1011, while fixture 1013 is provided on guide rail 1012, in servo electricity
Under the driving of machine, fixture 1013 can move in the vertical direction on guide rail 1012；Fixture 1013 is used to clamp substrate to be detected.
During work, servo motor can control swing arm horizontal hunting, and to the surface of target cleaning unit, then driving is pressed from both sides
Tool is moved downward to along guide rail in target cleaning unit, is cleaned；When cleaning finishes, servo motor drive fixture to along guide rail to
On be moved to elemental height, swing arm is then driven to be rocked to next cleaning unit again and carries out cleaning process.
As a result, under the driving effect of actuator 102, transmission parts 101 drive substrate to be cleaned to pass through each cleaning successively
Unit is cleaned, and improves the degree of automation of cleaning device and property easy to use.
Cleaning device provided by the invention, substrate to be cleaned pass through ultrasonic cleaning respectively under the conveying of conveying mechanism 1
Unit 4,6 and two fluid purge unit 7 of liquid cleaning unit carry out pure water through over cleaning and then by pure water cleaning unit 8
Cleaning, is most dried processing through drying unit 9 to the substrate after cleaning afterwards.The cleaning device passes through multiple cleaning rings as a result,
Section is treated cleaning base plate and is cleaned, and can thoroughly clean the polishing fluid of substrate surface remnants, improve the yield of substrate, avoid
Organic electroluminescence device using effect is caused to be deteriorated due to remaining slurry on substrate.
In addition, ultrasonic cleaning is to utilize cavitation, acceleration effect and the direct flow effect of ultrasonic wave in a liquid
Liquid and dirt directly, are indirectly acted on, crud layer is made to be disperseed, emulsified, removed, so as to achieve the purpose that cleaning.Using
Ultrasonic cleaning technology cleans substrate, and cleaning speed is fast, and ensure that good cleaning performance, and cleannes are high and treat clear
Washing the cleannes at each position of substrate can be consistent.
As a kind of preferred embodiment, in liquid cleaning unit 6, two fluid purge units 7 and pure water cleaning unit 8
It is equipped with spray assemblies.In this way, substrate can be carried out by spray assemblies the cleaning of links, be conducive to save cleaning solution
Dosage, and using more convenient.
In the present embodiment, as shown in figure 4, spray assemblies include nozzle 1101 and flow-rate adjustment part 1102.Wherein,
Nozzle 1101 is used for substrate sprinkling liquid cleaning unit 6, two fluid purge units 7 and pure water cleaning unit 8
In treatment fluid.Wherein, the treatment fluid in liquid cleaning unit 6 is ammonium hydroxide, neutral lotion, aqueous slkali etc.；The cleaning of two fluids is single
Treatment fluid in member 7 is generally high-pressure gaseous fluid and the mixed drop of fluid liquid；Treatment fluid in pure water cleaning unit 8
For pure water.
Flow-rate adjustment part 1102 is connect with nozzle 1101, for adjusting the fountain height of nozzle 1101.It as a result, can be according to reality
Demand adjusts the fountain height of nozzle 1101 by flow-rate adjustment part 1102 so that the usage amount for the treatment of fluid can be adjusted.One side
Face can increase the fountain height of nozzle 1101, ensure that substrate is fully cleaned when larger to treatment fluid demand；The opposing party
Face can reduce the fountain height of nozzle 1101 when smaller to treatment fluid demand, ensure that treatment fluid will not be wasted.
As a kind of preferred embodiment, as shown in figure 4, angle adjusting piece 1103 is further included in spray assemblies, angle tune
Section part 1103 is connect with nozzle 1101, for adjusting the spray angle of nozzle 1101.It can be adjusted by angle adjusting piece 1103
The spray angle of nozzle 1101 is saved, thus, it can be achieved that the uniform sprinkling to substrate surface is cleaned, the throwing being further ensured that on substrate
Light liquid is thoroughly cleaned up.
As a kind of preferred embodiment, as shown in figure 5, drying unit 9 includes air knife 901 and the gas storage being attached thereto
Part 902.Gas storage part 902 is used to provide pressure-air for air knife 901, and air knife 901 is used to pressure-air being sprayed onto after cleaning
On substrate, achieve the purpose that dry substrate.
As a kind of preferred embodiment, as shown in Figure 1, between megasonic cleaning unit 4 and liquid cleaning unit 6 also
Pressure pulse cleaning unit 5 is provided with, further enhances the cleaning dynamics to substrate.
As a kind of preferred embodiment, as shown in Figure 1, being additionally provided with pure water immersion before megasonic cleaning unit 4
Unit 3.Substrate is impregnated first before cleaning base plate, helps to get rid of part on substrate in advance soluble easily in water
Impurity.
In the present embodiment, as shown in Figure 1, further including feeding unit material 2 and blanking unit 10, feeding unit material 2 is clear for that will treat
The assembly line that substrate is delivered to the cleaning device is washed, blanking unit 10 is used for flowing water of the substrate after cleaning from the cleaning device
It is exported on line.
As a kind of preferred embodiment, as shown in Figure 1, further including control cabinet 12 in the cleaning device, control cabinet 12 divides
Not with above-mentioned feeding unit material 2, pure water infusion unit 3, megasonic cleaning unit 4, pressure pulse cleaning unit 5, liquid cleaning unit
6th, two fluid purge units 7, pure water cleaning unit 8, drying unit 9 and blanking unit 10 connect.Control cabinet 12 is used to control
The working condition of above-mentioned each unit, for example, substrate in the time that substrate impregnates in pure water infusion unit 3, pressure pulse cleaning unit 5
The bubbling time, the liquid scavenging period in liquid cleaning unit 6, temperature, liquor strength etc..
It is a kind of specific cleaning process below：
(1) substrate to be cleaned is input to the pure water infusion unit of the cleaning device by conveying mechanism 1 through feeding unit material 2
3 impregnate 10 minutes.
It treats cleaning base plate in advance to be impregnated, helps to remove impurity softening water-soluble on substrate, after mitigation
The intensity of continuous cleaning process.
(2) after completing pure water immersion, conveying mechanism 1 delivers the substrate to megasonic cleaning unit 4, and ultrasound is carried out to substrate
Wave cleans 5-20 minutes.
In the cleaning process, worked in coordination by physical action and chemical action and the substrate to be cleaned impregnated is carried out
Cleaning, cleaning strength is larger, can wash most of polishing fluid of substrate surface.Wherein, 5-20 minutes are best surpass
Sound wave scavenging period.
(3) after completing ultrasonic cleaning, conveying mechanism 1 delivers the substrate to pressure pulse cleaning unit 5, and bubbling is carried out to substrate
Cleaning 15-20 minutes.
In the cleaning process, rolled, scrubbed and the physical cleanings mode such as spraying technique carries out substrate by bubble
Further cleaning helps to remove the obstinate impurity for being still deposited in substrate surface, further improves the cleannes of substrate.Its
In, 15-20 minutes are the best pressure pulse cleaning time.
(4) after completing pressure pulse cleaning, conveying mechanism 1 delivers the substrate to NaOH liquids cleaning unit 6, and medicine is carried out to substrate
Liquid cleans 3-5 minutes, 35-45 DEG C of temperature, liquor strength 3%-5%.
In the cleaning process, substrate is placed in liquid, by liquid and substrate surface polishing fluid or other impurities it
Between chemical reaction effect so that be difficult to be eliminated by the substance that physical cleaning mode is removed.Wherein, 3-5 minutes are best
Liquid scavenging period, 35-45 DEG C be best fluid temperature, 3%-5% be best liquor strength.
(5) after completing liquid cleaning, substrate is delivered to two fluid purge units 7, pure water cleaning list by conveying mechanism 1 successively
Member 8, drying unit 9.
The cleaning of two fluids is made again by superonic flow nozzzle after mixing a kind of high-pressure gaseous fluid and a kind of fluid liquid
The drop that high pressure gas is formed with cleaning solution at a high speed sprays, when the drop ejected from nozzle is ejected into substrate to be cleaned
It will be disintegrated when upper and treat cleaning base plate and generate powerful impact, the ultra micro little particle adhered on substrate to be cleaned is in two-fluid
It is removed under the shock wave that cleaning solution generates when spraying.Two fluid cleaning techniques not only have good removing microfine
The effect of son, it is also more water-saving than general pure water jet cleaning, thus reduce cleaning cost.
After substrate to be cleaned is cleaned through two fluid purge units, the impurity on surface is cleaned substantially, at this point,
By pure water cleaning unit, to its surface, possible remaining cleaning solution is rinsed, then residual by drying unit removal substrate surface
The pure water stayed.
(6) after completing drying, conveying mechanism 1 exports substrate through blanking unit 10 from washing flow line.
Obviously, the above embodiments are merely examples for clarifying the description, and is not intended to limit the embodiments.It is right
For those of ordinary skill in the art, can also make on the basis of the above description it is other it is various forms of variation or
It changes.There is no necessity and possibility to exhaust all the enbodiments.And the obvious variation thus extended out or
Among changing still in the protection domain of the invention.
Claims (10)
1. a kind of cleaning device, which is characterized in that including：
For conveying the conveying mechanism of substrate to be cleaned (1) along the first direction；
Megasonic cleaning unit (4), the liquid for being oppositely arranged with the conveying mechanism (1) and being set gradually along the first direction
Cleaning unit (6), two fluid purge units (7), pure water cleaning unit (8) and drying unit (9).
2. cleaning device according to claim 1, which is characterized in that the conveying mechanism (1) includes：
Transmission parts (101), for placing the substrate to be cleaned；
Actuator (102) is connect with the transmission parts (101), for the transmission parts (101) to be driven to operate.
3. cleaning device according to claim 2, which is characterized in that the transmission parts (101) are including along the first party
To spaced conveying roller.
4. cleaning device according to claim 2, which is characterized in that the transmission parts (101) are conveyer belt.
5. cleaning device according to claim 1, which is characterized in that in the megasonic cleaning unit (4) and the medicine
Pressure pulse cleaning unit (5) is additionally provided between liquid cleaning unit (6).
6. cleaning device according to claim 1, which is characterized in that also set up before the megasonic cleaning unit (4)
There is pure water infusion unit (3).
7. cleaning device according to claim 1, which is characterized in that the drying unit (9) including air knife (901) and
The gas storage part (902) being attached thereto.
8. cleaning device according to claim 1, which is characterized in that the liquid cleaning unit (6), two fluid are clear
It washes in unit (7) and the pure water cleaning unit (8) and is equipped with spray assemblies.
9. cleaning device according to claim 8, which is characterized in that the spray assemblies include：
Nozzle (1101), for spraying the liquid cleaning unit (6), two fluid purge unit (7) and the pure water
Treatment fluid in cleaning unit (8)；
Flow-rate adjustment part (1102) is connect with the nozzle (1101), for adjusting the fountain height of the nozzle (1101).
10. cleaning device according to claim 9, which is characterized in that the spray assemblies further include：
Angle adjusting piece (1103) is connect with the nozzle (1101), for adjusting the spray angle of the nozzle (1101).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810085607.2A CN108212921A (en) | 2018-01-29 | 2018-01-29 | Cleaning device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810085607.2A CN108212921A (en) | 2018-01-29 | 2018-01-29 | Cleaning device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN108212921A true CN108212921A (en) | 2018-06-29 |
Family
ID=62669229
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201810085607.2A Withdrawn CN108212921A (en) | 2018-01-29 | 2018-01-29 | Cleaning device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN108212921A (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109166815A (en) * | 2018-09-18 | 2019-01-08 | 福建闽芯科技有限公司 | A kind of cleaning device and its cleaning method for CMP processing procedure |
| CN110544648A (en) * | 2018-12-11 | 2019-12-06 | 北京北方华创微电子装备有限公司 | Metal interconnection cleaning device and cleaning method |
| CN110813887A (en) * | 2019-10-21 | 2020-02-21 | 苏州晶洲装备科技有限公司 | Hydrofluoric acid cleaning device and hydrofluoric acid cleaning method for display panel |
| CN111029423A (en) * | 2019-12-16 | 2020-04-17 | 凯盛光伏材料有限公司 | Surface treatment device for absorption layer of copper indium gallium selenide thin-film solar cell |
| CN112474464A (en) * | 2020-10-09 | 2021-03-12 | 宜兴高泰克精密机械有限公司 | Cleaning line with multiple clearance function |
-
2018
- 2018-01-29 CN CN201810085607.2A patent/CN108212921A/en not_active Withdrawn
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109166815A (en) * | 2018-09-18 | 2019-01-08 | 福建闽芯科技有限公司 | A kind of cleaning device and its cleaning method for CMP processing procedure |
| CN110544648A (en) * | 2018-12-11 | 2019-12-06 | 北京北方华创微电子装备有限公司 | Metal interconnection cleaning device and cleaning method |
| CN110813887A (en) * | 2019-10-21 | 2020-02-21 | 苏州晶洲装备科技有限公司 | Hydrofluoric acid cleaning device and hydrofluoric acid cleaning method for display panel |
| CN111029423A (en) * | 2019-12-16 | 2020-04-17 | 凯盛光伏材料有限公司 | Surface treatment device for absorption layer of copper indium gallium selenide thin-film solar cell |
| CN111029423B (en) * | 2019-12-16 | 2021-04-06 | 凯盛光伏材料有限公司 | Surface treatment device for absorption layer of copper indium gallium selenide thin-film solar cell |
| CN112474464A (en) * | 2020-10-09 | 2021-03-12 | 宜兴高泰克精密机械有限公司 | Cleaning line with multiple clearance function |
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Address after: No. 3168, Fuyuan Third Road, high tech Zone, Zaozhuang City, Shandong Province Applicant after: Zaozhuang Ruinuo Electronic Technology Co., Ltd Address before: 277000, No. 15, building 322, Internet Town, Zaozhuang hi tech Zone, Shandong Applicant before: ZAOZHUANG VISIONOX ELECTRONIC TECHNOLOGY Co.,Ltd. |
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Application publication date: 20180629 |
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| WW01 | Invention patent application withdrawn after publication |