TW201533787A - Dividing device - Google Patents

Dividing device Download PDF

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Publication number
TW201533787A
TW201533787A TW103141227A TW103141227A TW201533787A TW 201533787 A TW201533787 A TW 201533787A TW 103141227 A TW103141227 A TW 103141227A TW 103141227 A TW103141227 A TW 103141227A TW 201533787 A TW201533787 A TW 201533787A
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Taiwan
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workpiece
dividing
holding
ceramic capacitor
wafer
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TW103141227A
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Chinese (zh)
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TWI633592B (en
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Ryugo Oba
Saki Kimura
Kazunari Tanaka
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Disco Corp
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  • Ceramic Capacitors (AREA)
  • Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
  • Processing Of Stones Or Stones Resemblance Materials (AREA)

Abstract

To provide a dividing device which can divide efficiently a plate-like workpiece containing a ceramic condenser substrate without causing deterioration in the quality of chips. A dividing device to divide a plate-like workpiece into a plurality of chips, comprising: a cassette mounting region for mounting a cassette; a temporary placing means which carries out temporary placement of the workpiece before processing; a workpiece carrying means which takes the workpiece stored in the cassette before processing and carries it to the temporary placing means; a holding table which carries out suction holding of the workpiece before processing, a transportation device which moves the holding table to a carrying-in/taking-out region in which a workpiece is carried in or taken out, and a processing area; a workpiece carrying-in means which conveys the workpiece before processing already taken out to the temporary placing means to the holding table positioned in the carrying-in/taking-out region; a laser-beam irradiation means to irradiate laser beams on the workpiece before processing, which is arranged in the processing area and sucked to be held by the holding table, and to form on the workpiece the division grooves to be used as the fracture starting point for cutting into chips; a division means to apply external force to the workpiece on which division grooves used as the fracture starting point were formed, and to divide a workpiece into a plurality of chips along the division grooves; an accommodating means which accommodates a plurality of chips divided by the division means; a chip dropping means which drops the plurality of chips divided by the division means into the accommodating means.

Description

分割裝置 Split device 發明領域 Field of invention

本發明是有關於一種將板狀的被加工物分割成複數個晶片之分割裝置。 The present invention relates to a dividing device for dividing a plate-shaped workpiece into a plurality of wafers.

發明背景 Background of the invention

將金屬箔與絕緣體交互地積層而構成的陶瓷電容(ceramic condenser)基板,是透過分割裝置以分割成一個個的晶片電容而被廣泛地應用於手機或電腦等的電氣機器上。 A ceramic capacitor substrate in which a metal foil and an insulator are laminated to each other is widely used in an electric device such as a mobile phone or a computer by a dividing device to be divided into individual chip capacitors.

作為可將陶瓷電容基板分割成一個個的晶片電容的分割裝置,一般是使用具備切削刀的切削裝置(參照例如,專利文獻1)。 As a dividing device that can divide the ceramic capacitor substrate into individual chip capacitors, a cutting device including a cutting blade is generally used (see, for example, Patent Document 1).

又,作為可將陶瓷電容基板分割成一個個的晶片電容的分割方法,目前也被嘗試使用的有,將對陶瓷電容基板具有吸收性之波長的雷射光沿著分割預定線進行照射,並沿著分割預定線將陶瓷電容基板切斷之方法。 Further, as a method of dividing a ceramic capacitor substrate into individual wafer capacitors, it has been attempted to irradiate laser light having an absorptive wavelength to a ceramic capacitor substrate along a predetermined dividing line. A method of cutting a ceramic capacitor substrate by dividing a predetermined line.

先前技術文獻 Prior technical literature 專利文獻 Patent literature

專利文獻1:日本專利特開2003-142334號公報 Patent Document 1: Japanese Patent Laid-Open Publication No. 2003-142334

發明概要 Summary of invention

然而,當陶瓷電容基板是在預定溫度下被燒結時,就會變成硬質,且當以切削刀切斷陶瓷電容基板時,就會有使切削刀急劇烈地耗損,並且發生破損的情形,而且還有所謂的生產性變差的問題。 However, when the ceramic capacitor substrate is sintered at a predetermined temperature, it becomes hard, and when the ceramic capacitor substrate is cut by the cutter, the cutter is violently depleted and damaged, and There is also the problem of so-called poor productivity.

又,當對陶瓷電容基板照射雷射光而分割成一個個的晶片電容時,會有所謂的熔融物(熔渣(dross))附著在晶片電容的側面上而使品質降低的問題。 Further, when the ceramic capacitor substrate is irradiated with laser light and divided into individual wafer capacitors, there is a problem that a so-called melt (dross) adheres to the side surface of the wafer capacitor to lower the quality.

此外,為了在將陶瓷電容基板分割成一個個的晶片電容之後也能容易地進行搬送等的處理,會以保持基板或者是膠帶等支撐構件支撐陶瓷電容基板,因此必須進行支撐構件的貼著與剝離的步驟,而有所謂的生產性變差的問題。 In addition, in order to facilitate the processing such as transport after dividing the ceramic capacitor substrate into individual wafer capacitors, the ceramic capacitor substrate is supported by a support member such as a substrate or a tape, and therefore it is necessary to attach the support member. The step of peeling off, there is a problem of so-called deterioration in productivity.

本發明是有鑑於上述事實而作成的,其主要的技術課題在於,提供不會使晶片的品質下降並能有效率地分割含有陶瓷電容基板的板狀被加工物的分割裝置。 The present invention has been made in view of the above-described circumstances, and a main technical object thereof is to provide a dividing device capable of efficiently dividing a plate-shaped workpiece including a ceramic capacitor substrate without deteriorating the quality of the wafer.

為了解決上述主要的技術課題,依據本發明所提供的分割裝置,是將板狀被加工物分割成複數個晶片的分割裝置,特徵在於,其具備:收納盒載置區域,用於載置已收容有加工前之被加工物的收納盒;暫置手段,用於暫置加工前之被加工物; 被加工物搬出手段,將被載置在該收納盒載置區域中的收納盒中所收容的加工前之被加工物搬出至暫置手段;保持台,用於吸引保持加工前之被加工物;移動手段,使該保持台移動至將被加工物搬入以及搬出的搬入搬出區域與加工區域;被加工物搬入手段,將已搬出至該暫置手段的加工前之被加工物搬送到已被定位在該搬入搬出區域之該保持台上;雷射光照射手段,將雷射光照射在配置於該加工區域且被該保持台所吸引保持的加工前之被加工物上,並在被加工物上形成成為用來分割成晶片之破斷起點的分割溝;分割手段,對形成有可變成破斷起點之分割溝的被加工物賦予外力,並沿著分割溝將被加工物分割成複數個晶片;收容手段,收容以該分割手段所分割的複數個晶片;以及晶片落入手段,將以該分割手段所分割的複數個晶片落入至該收容手段。 In order to solve the above-mentioned main technical problems, the dividing device according to the present invention is a dividing device that divides a plate-shaped workpiece into a plurality of wafers, and is characterized in that it includes a storage box mounting region for mounting a storage box containing the processed object before processing; and a temporary means for temporarily processing the workpiece before processing; The workpiece carrying-out means transports the workpiece before processing stored in the storage box placed in the storage box mounting area to the temporary means, and the holding table is for sucking and holding the workpiece before processing And a moving means for moving the holding table to a loading/unloading area and a processing area for loading and unloading the workpiece; and the workpiece loading means transporting the workpiece before being processed to the temporary means to the processed object Positioned on the holding stage of the loading/unloading area; the laser beam irradiation means irradiates the laser beam onto the workpiece before processing which is placed in the processing area and is sucked and held by the holding stage, and is formed on the workpiece a dividing groove for dividing into a breaking starting point of the wafer; and a dividing means for applying an external force to the workpiece formed with the dividing groove which becomes the breaking starting point, and dividing the workpiece into a plurality of wafers along the dividing groove; a receiving means for accommodating a plurality of wafers divided by the dividing means; and a wafer dropping means for dropping a plurality of wafers divided by the dividing means into the receiving means

由於依據本發明之分割裝置是如上所述地被構成,且是藉由雷射光照射手段對被加工物照射雷射光以形成可變成應分割成晶片之破斷起點的分割溝,因此不會有像以切削刀進行切斷之以往的切割方法一樣因為切削刀的耗損以及破損而導致的生產性降低的情形。 Since the dividing device according to the present invention is configured as described above, the laser beam is irradiated to the workpiece by the laser light irradiation means to form a dividing groove which can be broken into a starting point of the wafer, so that there is no In the same manner as the conventional cutting method in which the cutting is performed by the cutter, the productivity is deteriorated due to the wear and tear of the cutting blade.

又,由於以雷射光照射手段進行的雷射加工,會在被加工物上形成可變成應分割成晶片之破斷起點的分割溝,因此不會有像熔融物(熔渣)附著在晶片的側壁上這樣的情形。 Further, since the laser processing by the laser light irradiation means forms a dividing groove which can be divided into the breaking starting point of the wafer, the molten material (slag) does not adhere to the wafer. This is the case on the side wall.

此外,因為形成有可變成應分割成晶片的破斷起點之分割溝的被加工物在藉由分割手段分割成一個個的晶片後,會被收容至收容手段中,因此在不必將被加工物支撐於保持基板或者是膠帶等的支撐構件上的情形下,變成不需要進行支撐構件的貼著以及剝離的步驟,且可提升生產性。 In addition, since the workpiece to be divided into the dividing grooves which should be divided into the breaking starting points of the wafer is formed into the individual wafers by the dividing means, the processed objects are accommodated in the housing means, so that it is not necessary to process the workpiece. In the case of being supported on a support member such as a substrate or a tape, the step of attaching and peeling off the support member is not required, and productivity can be improved.

10‧‧‧陶瓷電容基板 10‧‧‧Ceramic capacitor substrate

10a‧‧‧表面 10a‧‧‧ surface

101‧‧‧第1分割預定線 101‧‧‧1st dividing line

102‧‧‧第2分割預定線 102‧‧‧2nd dividing line

103‧‧‧晶片電容 103‧‧‧Wafer capacitance

104‧‧‧分割溝 104‧‧‧dividing trench

11‧‧‧分割手段 11‧‧‧ Segmentation

111‧‧‧被加工物載置構件 111‧‧‧Worked objects mounting members

112‧‧‧加壓滾輪 112‧‧‧Pressure roller

113‧‧‧滾輪收容殼體 113‧‧‧Roller housing

12‧‧‧被加工物搬送手段 12‧‧‧Transportation means

13‧‧‧成批收容手段 13‧‧‧Batch means

131‧‧‧晶片落下構件 131‧‧‧ wafer drop member

131a‧‧‧開口部 131a‧‧‧ openings

132‧‧‧晶片收容容器 132‧‧‧ wafer storage container

133‧‧‧抽屜 133‧‧‧Drawers

14‧‧‧晶片落入手段 14‧‧‧ wafer drop-in means

141‧‧‧晶片落入拭除具 141‧‧‧The wafer falls into the eraser

2‧‧‧裝置殼體 2‧‧‧ device housing

20‧‧‧控制手段 20‧‧‧Control means

201‧‧‧中央處理器(CPU) 201‧‧‧Central Processing Unit (CPU)

202‧‧‧唯讀記憶體(ROM) 202‧‧‧Reading Memory (ROM)

203‧‧‧隨機存取記憶體(RAM) 203‧‧‧ Random Access Memory (RAM)

204‧‧‧輸入介面 204‧‧‧Input interface

205‧‧‧輸出介面 205‧‧‧Output interface

3‧‧‧被加工物保持機構 3‧‧‧Processed object retention mechanism

31‧‧‧保持台 31‧‧‧ Keeping the table

311‧‧‧吸附夾頭 311‧‧‧Adsorption chuck

32‧‧‧保持台支撐手段 32‧‧‧Maintenance support means

4‧‧‧雷射光照射手段 4‧‧‧Laser light irradiation

41‧‧‧聚光器 41‧‧‧ concentrator

5‧‧‧收納盒 5‧‧‧ storage box

5a‧‧‧收納盒載置區域 5a‧‧‧ Storage box mounting area

50‧‧‧收納盒台 50‧‧‧ storage box

6‧‧‧暫置手段 6‧‧‧ temporary means

7‧‧‧被加工物搬出手段 7‧‧‧Removal of processed objects

8‧‧‧被加工搬入手段 8‧‧‧Processing and moving means

81、121‧‧‧吸引保持墊 81, 121‧‧‧ attraction holding mat

82、122‧‧‧氣缸機構 82, 122‧‧ ‧ cylinder mechanism

83、123、142‧‧‧作動臂 83, 123, 142‧‧‧

9‧‧‧攝像手段 9‧‧‧Photography

P‧‧‧聚光點 P‧‧‧ spotlight

X、Y、Z‧‧‧方向 X, Y, Z‧‧ Direction

X1‧‧‧方向 X1‧‧‧ direction

圖1是藉由本發明所構成之分割裝置的立體圖。 BRIEF DESCRIPTION OF THE DRAWINGS Figure 1 is a perspective view of a dividing device constructed by the present invention.

圖2是構成裝設於圖1所示之分割裝置上的成批(bulk)收容手段的晶片落下構件以及晶片收容容器的立體圖。 Fig. 2 is a perspective view of a wafer dropping member and a wafer housing container constituting a bulk housing means mounted on the dividing device shown in Fig. 1.

圖3是裝設於圖1所示之分割裝置的控制手段的方塊構成圖。 Fig. 3 is a block diagram showing the control means of the dividing device shown in Fig. 1.

圖4(a)-(c)是藉圖1所示之分割裝置所實施的雷射加工步驟的說明圖。 4(a)-(c) are explanatory views of a laser processing step performed by the dividing device shown in Fig. 1.

圖5是作為板狀被加工物的陶瓷電容基板的立體圖。 Fig. 5 is a perspective view of a ceramic capacitor substrate as a plate-like workpiece.

用以實施發明之形態 Form for implementing the invention

以下,針對依照本發明所構成的分割裝置的合適的實施型態,參照附加圖式進行更進一步的詳細說明。 Hereinafter, a suitable embodiment of the dividing device constructed in accordance with the present invention will be described in further detail with reference to the additional drawings.

圖5中所示為,作為板狀被加工物的陶瓷電容基板的立體圖。圖5所示之陶瓷電容基板10是,以厚度為500 μm左右形成為矩形,且在表面10a上將沿預定方向延伸的複數條第1分割預定線101,以及沿與該第1分割預定線101垂直相交的方向延伸的複數條第2分割預定線102形成為格子狀。在以第1分割預定線101與第2分割預定線102所劃分出的複數個區域中形成有晶片電容103。如此所形成的陶瓷電容基板10是,沿著第1分割預定線101以及第2分割預定線102而被分割成一個個的晶片電容103。 Fig. 5 is a perspective view showing a ceramic capacitor substrate as a plate-like workpiece. The ceramic capacitor substrate 10 shown in FIG. 5 has a thickness of 500 A plurality of first divided planned lines 101 extending in a predetermined direction on the surface 10a, and a plurality of second divided planned lines 102 extending in a direction perpendicular to the first divided planned line 101 are formed on the surface 10a. Formed in a lattice shape. A wafer capacitor 103 is formed in a plurality of regions divided by the first division planned line 101 and the second division planned line 102. The ceramic capacitor substrate 10 thus formed is a wafer capacitor 103 that is divided into individual pieces along the first dividing line 101 and the second dividing line 102.

圖1中所示為,用於將上述陶瓷電容基板10沿著第1分割預定線101以及第2分割預定線102分割的依照本發明所構成的分割裝置的立體圖。 FIG. 1 is a perspective view showing a dividing device according to the present invention for dividing the ceramic capacitor substrate 10 along the first dividing line 101 and the second dividing line 102.

圖1所示之分割裝置具備有裝置殼體2。在此裝置殼體2的中央部上配置有,用於保持被加工物的被加工物保持機構3,以及對被保持在該被加工物保持機構3上的被加工物照射雷射光的雷射光照射手段4。被加工物保持機構3具備,用於吸引保持上述作為板狀被加工物的陶瓷電容基板10的保持台31,以及可支撐該保持台31的保持台支撐手段32。保持台31配置有,如圖1所示形成為矩形且用於將上述陶瓷電容基板10吸引保持在表面中央部上之藉由多孔陶瓷(porous ceramics)所形成的吸附夾頭311。並且,將吸附夾頭311連接到圖未示之吸引手段。因此,藉由將陶瓷電容基板10載置於吸附夾頭311上,並作動圖未示之吸引手段,就能將陶瓷電容基板10吸引保持於吸附夾頭311上。 The dividing device shown in Fig. 1 is provided with a device casing 2. A workpiece holding mechanism 3 for holding a workpiece and a laser beam that irradiates the workpiece to be held on the workpiece holding mechanism 3 with laser light are disposed at a central portion of the apparatus casing 2. Irradiation means 4. The workpiece holding mechanism 3 includes a holding table 31 for sucking and holding the ceramic capacitor substrate 10 as a plate-shaped workpiece, and a holding table supporting means 32 for supporting the holding table 31. The holding table 31 is provided with an adsorption chuck 311 formed of porous ceramics, which is formed in a rectangular shape as shown in FIG. 1 and which is used to attract and hold the ceramic capacitor substrate 10 on the central portion of the surface. Further, the adsorption chuck 311 is connected to a suction means not shown. Therefore, the ceramic capacitor substrate 10 can be attracted and held by the chuck 13 by placing the ceramic capacitor substrate 10 on the chuck 311 and moving the suction means (not shown).

構成被加工物保持機構3的保持台支撐手段32具備,使保持台31繞相對於作為上表面之保持面垂直的軸周 圍轉動的圖未示之旋轉驅動手段。並將如此所構成的保持台支撐手段32構成為,可將保持台31移動至圖1所示之將被加工物搬入以及搬出的搬入搬出區域與透過雷射光照射手段4形成的加工區域,並變成可藉由圖未示之X軸方向移動手段使其在箭頭X所示之加工傳送方向(X軸方向)上移動。 The holding table support means 32 constituting the workpiece holding mechanism 3 is provided so that the holding table 31 is wound around a circumference perpendicular to the holding surface as the upper surface. The rotary driving diagram is not shown. The holding table support means 32 configured as described above is configured to move the holding table 31 to the loading/unloading area in which the workpiece is carried in and out as shown in FIG. 1 and the processing area formed by the laser beam irradiation means 4, and It is moved in the machining conveyance direction (X-axis direction) indicated by the arrow X by means of an X-axis direction moving means not shown.

可對保持在構成上述被加工物保持機構3的保持台31上的陶瓷電容基板10照射雷射光的雷射光照射手段4具備,可發射脈衝雷射光的雷射光發射手段(圖未示),以及可將以該雷射光發射手段所發出的雷射光聚集的聚光器41,且將聚光器41配置於加工區域。 The laser light irradiation means 4 that irradiates the ceramic capacitor substrate 10 on the holding stage 31 of the workpiece holding mechanism 3 with the laser light, and the laser light emitting means (not shown) capable of emitting pulsed laser light, and The concentrator 41 that collects the laser light emitted by the laser light emitting means can be disposed, and the concentrator 41 can be disposed in the processing area.

在上述被加工物保持機構3的Y軸方向的其中一方之側上設有,可供已收容加工前之作為板狀被加工物之陶瓷電容基板10的收納盒載置的收納盒載置區域5a,且在收納盒載置區域5a上配置有可藉由圖未示之升降手段使其沿著箭頭Z所示的上下方向(Z軸方向)移動的收納盒台50。並將已收容有複數片作為被加工物的上述陶瓷電容基板10的收納盒5載置於這個收納盒台50上。在收納盒載置區域5a的前側配置有,可供收容在收納盒5中的陶瓷電容基板10暫置,並且進行位置校準的暫置手段6,以及將收容在收納盒5中的陶瓷電容基板10搬出至暫置手段6的被加工物搬出手段7。 A storage box mounting area on which the storage case of the ceramic capacitor substrate 10 as a plate-shaped workpiece before the processing is stored is provided on one side of the Y-axis direction of the workpiece holding mechanism 3 In the storage box mounting area 5a, the storage cassette 50 that can be moved in the vertical direction (Z-axis direction) indicated by the arrow Z by the lifting means (not shown) is disposed. The storage case 5 of the above-described ceramic capacitor substrate 10 in which a plurality of sheets are stored as workpieces is placed on the storage cassette stage 50. The ceramic capacitor substrate 10 accommodated in the storage case 5 is temporarily placed on the front side of the storage case mounting area 5a, and the positional means 6 for position alignment and the ceramic capacitor substrate housed in the storage case 5 are disposed. 10 The workpiece carrying-out means 7 of the temporary means 6 is carried out.

在上述暫置手段6與搬入搬出區域之間配置有被加工物搬入手段8,該加工物搬入手段8能夠將被搬出至暫置手段6且進行過位置校準的加工前之作為板狀被加工物 的陶瓷電容基板10、搬送至被定位在搬入搬出區域之構成被加工物保持機構3的保持台31之作為上表面之保持面上。這個被加工物搬入手段8是由,可將陶瓷電容基板10的上表面吸引保持住的吸引保持墊81、可支撐該吸引保持墊81且將吸引保持墊81沿上下方向(Z軸方向)移動的氣缸機構82、可支撐該氣缸機構82的作動臂83,以及可使該作動臂83在Y軸方向上移動之圖未示的移動手段所形成。並將如此所構成的被加工物搬入手段8的吸引保持墊81連接到圖未示之吸引手段。 The workpiece loading means 8 is disposed between the temporary placement means 6 and the loading/unloading area, and the workpiece loading means 8 can be processed as a plate shape before being processed out of the temporary means 6 and subjected to the positional alignment. Object The ceramic capacitor substrate 10 is transported to a holding surface on the upper surface of the holding table 31 which is positioned in the loading/unloading area and which constitutes the workpiece holding mechanism 3. This workpiece loading means 8 is a suction holding pad 81 that can hold and hold the upper surface of the ceramic capacitor substrate 10, can support the suction holding pad 81, and moves the suction holding pad 81 in the vertical direction (Z-axis direction). The cylinder mechanism 82, the actuator arm 83 that can support the cylinder mechanism 82, and the moving means that can move the actuator arm 83 in the Y-axis direction are not shown. The suction holding pad 81 of the workpiece carrying device 8 thus constructed is connected to a suction means not shown.

圖示的實施形態中的分割裝置具備攝像手段9,是裝設於上述被加工物搬入手段8之氣缸機構82並且可對作為板狀被加工物的陶瓷電容基板10之應加工區域進行檢測,且是將該陶瓷電容基板10保持在被定位於搬入搬出區域的保持台31上。此攝像手段9是由顯微鏡或是CCD攝影機等的光學手段所形成,並可將所拍攝到的影像信號傳送至後述的控制手段。 The dividing device in the illustrated embodiment includes the imaging device 9 and is a cylinder mechanism 82 that is attached to the workpiece loading device 8 and can detect a processing region of the ceramic capacitor substrate 10 as a plate-shaped workpiece. Further, the ceramic capacitor substrate 10 is held by the holding table 31 positioned in the loading/unloading area. The imaging means 9 is formed by an optical means such as a microscope or a CCD camera, and can transmit the captured image signal to a control means to be described later.

在上述被加工物保持機構3的Y軸方向中的另一方之側上配置有,用於將在加工區域中被雷射加工過的作為板狀被加工物之陶瓷電容基板10分割成一個個的晶片電容的分割手段11。分割手段11具備,配置在被加工物保持機構3的Y軸方向中的另一方之側上的被加工物載置構件111、可對載置於該被加工物載置構件111上之雷射加工過的作為板狀被加工物之陶瓷電容基板10賦予外力的加壓滾輪(roller)112,以及將該加壓滾輪112收容成可進行出入的 滾輪收容殼體113。被加工物載置構件111是藉由橡膠等的柔軟構件形成為矩形。並將加壓滾輪112構成為,可一邊對載置在被加工物載置構件111上的陶瓷電容基板10的上表面進行加壓,一邊使其可在X軸方向上轉動。 The other side of the workpiece holding mechanism 3 in the Y-axis direction is disposed so that the ceramic capacitor substrate 10 as a plate-shaped workpiece processed by laser processing in the processing region is divided into individual pieces. The dividing means of the chip capacitance is 11. The dividing means 11 includes a workpiece placing member 111 disposed on the other of the Y-axis directions of the workpiece holding mechanism 3, and a laser that can be placed on the workpiece loading member 111. The processed ceramic capacitor substrate 10 as a plate-like workpiece 10 is provided with a roller 112 for external force, and the pressure roller 112 is accommodated to be accessible. The roller houses the housing 113. The workpiece mounting member 111 is formed in a rectangular shape by a flexible member such as rubber. The pressure roller 112 is configured to be rotatable in the X-axis direction while pressurizing the upper surface of the ceramic capacitor substrate 10 placed on the workpiece mounting member 111.

圖示的實施形態中的分割裝置具備被加工物搬送手段12,可將雷射加工過之作為板狀被加工物的陶瓷電容基板10搬送到構成上述分割手段11的被加工物載置構件111上,且是將該陶瓷電容基板10載置在被定位於搬入搬出區域之構成被加工物保持機構3的保持台31上。此被加工物搬送手段12是由以下構件所構成:可將載置在保持台31上之被雷射加工過的作為板狀被加工物之陶瓷電容基板10的上表面吸引保持住的吸引保持墊121、可支撐該吸引保持墊121並將吸引保持墊121沿上下方向(Z軸方向)移動的氣缸機構122、可支撐該氣缸機構122的作動臂123,以及使該作動臂123在Y軸方向上移動的圖未示之移動手段。並將如此構成的被加工物搬送手段12的吸引保持墊121連接到圖未示之吸引手段。 In the division device of the embodiment, the workpiece transfer means 12 is provided, and the ceramic capacitor substrate 10 which is a plate-shaped workpiece which has been subjected to laser processing can be transported to the workpiece mounting member 111 which constitutes the division means 11 In addition, the ceramic capacitor substrate 10 is placed on the holding table 31 of the workpiece holding mechanism 3 that is positioned in the loading/unloading area. The workpiece conveyance means 12 is constituted by a member capable of sucking and holding the upper surface of the ceramic capacitor substrate 10 which is a laser-processed plate-shaped workpiece placed on the holding table 31. a pad 121, a cylinder mechanism 122 that can support the suction holding pad 121 and move the suction holding pad 121 in the up and down direction (Z-axis direction), an actuator arm 123 that can support the cylinder mechanism 122, and the actuator arm 123 on the Y-axis The figure moving in the direction is not shown as a moving means. The suction holding pad 121 of the workpiece conveying means 12 thus constituted is connected to a suction means not shown.

圖示的實施形態中的分割裝置具備,鄰接於構成上述分割手段11的被加工物載置構件111而配置並可成批收容分割成一個個的複數個晶片電容的成批收容手段13。成批收容手段13具備晶片落下構件131,該晶片落下構件131設有鄰接於被加工載置構件111而形成開口之開口部131a。如圖2所示,這個晶片落下構件131是從開口部131a朝向下方而形成為漏斗狀。在如此構成的晶片落下構件131 的下側配置有晶片收容容器132。如圖1所示,在像這樣配置了由晶片落下構件131與晶片收容容器132所形成的成批收容手段13的裝置殼體2的前壁上,設置有用以供晶片收容容器132進出的抽屜133。 The dividing device according to the embodiment of the present invention includes a batch storage means 13 which is disposed adjacent to the workpiece mounting member 111 constituting the dividing means 11 and can accommodate a plurality of wafer capacitors divided into a plurality of wafer capacitors. The bulk storage means 13 includes a wafer dropping member 131 provided with an opening portion 131a that is formed adjacent to the workpiece mounting member 111 to form an opening. As shown in FIG. 2, this wafer dropping member 131 is formed in a funnel shape from the opening 131a toward the lower side. The wafer dropping member 131 thus constructed A wafer storage container 132 is disposed on the lower side. As shown in FIG. 1, on the front wall of the apparatus casing 2 in which the mass storage means 13 formed by the wafer dropping member 131 and the wafer storage container 132 are disposed, a drawer for inserting and receiving the wafer storage container 132 is provided. 133.

參照圖1繼續說明,圖示的實施形態中的分割裝置具備晶片落入手段14,該晶片落入手段14是用於供位在構成上述分割手段11的被加工物載置構件111上之陶瓷電容基板10所分割成的複數個晶片電容、落入構成上述成批收容手段13的晶片落入構件131之開口部131a中。此晶片落入手段14是由,晶片落入拭除具(wiper)141、支撐晶片落入拭除具141的作動臂142,以及使該作動臂142在Y軸方向上移動的圖未示之移動手段所形成。 With reference to Fig. 1, the dividing device in the illustrated embodiment includes a wafer dropping means 14 for ceramics to be placed on the workpiece mounting member 111 constituting the dividing means 11. The plurality of wafer capacitors divided by the capacitor substrate 10 fall into the opening portion 131a of the wafer drop member 131 constituting the batch storage means 13. The wafer drop-in means 14 is such that the wafer falls into the wiper 141, the support wafer falls into the actuator arm 142 of the wiper 141, and the actuator arm 142 is moved in the Y-axis direction. Formed by moving means.

圖示的實施形態中的分割裝置具備有圖3所示之控制手段20。控制手段20是藉由電腦所構成,並具備,可依照控制程式(program)進行演算處理的中央處理器(CPU)201、可存放控制程式等的唯讀記憶體(ROM)202、可存放演算結果等的可讀寫之隨機存取記憶體(RAM)203、輸入介面204以及輸出介面205。可在如此構成的控制手段20的輸入介面204中,輸入來自上述攝像手段9等的檢測訊號。並且,是將來自控制手段20的輸出介面205的控制訊號輸出到上述被加工物保持機構3、雷射光照射手段4、被加工物搬出手段7、被加工物搬入手段8、分割手段11、被加工物搬送手段12等。 The dividing device in the illustrated embodiment is provided with the control means 20 shown in FIG. The control means 20 is constituted by a computer, and includes a central processing unit (CPU) 201 capable of performing calculation processing in accordance with a control program, a read-only memory (ROM) 202 capable of storing a control program, and the like, and a storable calculation The result is a readable and writable random access memory (RAM) 203, an input interface 204, and an output interface 205. The detection signal from the imaging means 9 or the like can be input to the input interface 204 of the control means 20 thus constructed. Further, the control signal from the output interface 205 of the control means 20 is output to the workpiece holding mechanism 3, the laser beam irradiation means 4, the workpiece carrying-out means 7, the workpiece carrying means 8, the dividing means 11, and the The workpiece transport means 12 and the like.

圖示的實施形態中的分割裝置是由以上方式所 構成,且以下將針對其作用進行說明。 The dividing device in the illustrated embodiment is in the above manner The configuration will be described below with respect to its action.

在配置於收納盒載置區域5a的收納盒台50上所載置之收納盒5中所收容的加工前之陶瓷電容基板10,是藉由以圖未示之升降手段在Z軸方向上作上下移動而被定位到搬出位置。接著,控制手段20將被加工物搬出手段7進退作動以將被定位於搬出位置的陶瓷電容基板10搬出至暫置手段6上。被搬出至暫置手段6的陶瓷電容基板10是在此進行位置校準。接著,控制手段20會作動被加工物搬入手段8以藉由吸引保持墊81對已在暫置手段6上進行過位置校準之陶瓷電容基板10的上表面進行吸引保持,並將其搬送至被定位於搬入搬出區域之構成被加工物保持機構3的保持台31的吸附夾頭311之上表面之保持面上。如此進行,而將陶瓷電容基板10載置在保持台31的吸附夾頭311上之後,就能藉由控制手段20作動圖未示之吸引手段,以將陶瓷電容基板10吸引保持在保持台31的吸附夾頭311的上表面之保持面上(被加工物保持步驟)。 The ceramic capacitor substrate 10 before processing stored in the storage case 5 placed on the storage cassette 50 placed in the storage cassette mounting area 5a is formed in the Z-axis direction by a lifting means not shown. Move up and down to be positioned to the carry-out position. Next, the control means 20 moves the workpiece carrying-out means 7 forward and backward to carry out the ceramic capacitor substrate 10 positioned at the carry-out position to the temporary means 6. The ceramic capacitor substrate 10 that has been carried out to the temporary means 6 is positionally calibrated here. Next, the control means 20 activates the workpiece loading means 8 to suck and hold the upper surface of the ceramic capacitor substrate 10 which has been positionally aligned on the temporary means 6 by the suction holding pad 81, and transports it to the object. The holding surface of the upper surface of the chuck 311 of the holding table 31 of the workpiece holding mechanism 3 is placed in the loading/unloading area. In this manner, after the ceramic capacitor substrate 10 is placed on the chuck 311 of the holding table 31, the attraction means (not shown) can be moved by the control means 20 to attract and hold the ceramic capacitor substrate 10 to the holding stage 31. The holding surface of the upper surface of the adsorption chuck 311 (the workpiece holding step).

當如上述地將陶瓷電容基板10吸引保持在保持台31的吸附夾頭311的上表面之保持面上之後,控制手段20會作動被加工物搬入手段8,以將裝設於氣缸機構82上的攝像手段9定位到保持台31所保持的陶瓷電容基板10的上側。接著,控制手段20會作動攝像手段9,以使其對保持台31所保持的陶瓷電容基板10上所形成的第1分割預定線101以及第2分割預定線102進行拍攝,並實施確認第1分割預定線101以及第2分割預定線102是否與X軸方向以及Y軸方向平 行的校準(alignment)作業。若是在第1分割預定線101以及第2分割預定線102並非與X軸方向以及Y軸方向平行的情況中,則控制手段20會控制可使構成被加工物保持機構3之保持台支撐手段32旋轉的圖未示之旋轉驅動手段,以將於保持台31所保持的陶瓷電容基板10上所形成的第1分割預定線101以及第2分割預定線102調整成與X軸方向以及Y軸方向平行(校準步驟)。 When the ceramic capacitor substrate 10 is sucked and held on the holding surface of the upper surface of the chuck 311 of the holding table 31 as described above, the control means 20 actuates the workpiece carrying means 8 to be mounted on the cylinder mechanism 82. The imaging means 9 is positioned on the upper side of the ceramic capacitor substrate 10 held by the holding stage 31. Then, the control means 20 activates the imaging means 9 to image the first division planned line 101 and the second division planned line 102 formed on the ceramic capacitor substrate 10 held by the holding table 31, and performs the first confirmation. Whether the division planned line 101 and the second division planned line 102 are flat with the X-axis direction and the Y-axis direction Line alignment work. When the first division planned line 101 and the second division planned line 102 are not parallel to the X-axis direction and the Y-axis direction, the control means 20 controls the holding table support means 32 constituting the workpiece holding mechanism 3. In the rotation driving means (not shown), the first dividing line 101 and the second dividing line 102 formed on the ceramic capacitor substrate 10 held by the holding table 31 are adjusted so as to be in the X-axis direction and the Y-axis direction. Parallel (calibration step).

當如上述地實施過校準步驟後,控制手段20就會作動圖未示之X軸方向移動手段而將保持台31移動至加工區域,並如圖4(a)所示地將預定的第1分割預定線101的一端(在圖4(a)中的左端)定位至雷射光照射手段4的聚光器41的正下方。並且,將從聚光器41所照射出的脈衝雷射光的聚光點P對準至陶瓷電容基板10的表面10a(上表面)附近。接著,控制手段20會作動雷射光照射手段4,以一邊將對陶瓷電容基板10具有吸收性之波長的脈衝雷射光從聚光器41照射出,一邊作動圖未示之X軸方向移動手段而使保持台31以預定的加工傳送速度朝圖4(a)中以箭頭X1所示之方向移動。並且,當第1分割預定線101的另一端(在圖4(b)中的右端)到達聚光器41的正下方後,即停止脈衝雷射光的照射,同時停止保持台31的移動。其結果為,如圖4(b)以及圖4(c)所示,在陶瓷電容基板10上形成有,可沿著第1分割預定線101變成破斷起點的分割溝104(雷射加工步驟)。再者,分割溝104是在下述加工條件下形成50μm左右的深度。 When the calibration step is performed as described above, the control means 20 moves the holding stage 31 to the processing area by moving the X-axis direction moving means not shown, and sets the predetermined first one as shown in Fig. 4(a). One end of the division planned line 101 (the left end in FIG. 4(a)) is positioned directly below the concentrator 41 of the laser light irradiation means 4. Then, the condensed spot P of the pulsed laser light irradiated from the concentrator 41 is aligned to the vicinity of the surface 10a (upper surface) of the ceramic capacitor substrate 10. Next, the control means 20 activates the laser beam irradiation means 4 to illuminate the pulsed laser light having a wavelength which is absorptive to the ceramic capacitor substrate 10 from the concentrator 41, and to move the X-axis direction moving means not shown. The holding table 31 is moved in a direction indicated by an arrow X1 in Fig. 4(a) at a predetermined processing conveyance speed. Further, when the other end of the first division planned line 101 (the right end in FIG. 4(b)) reaches directly below the concentrator 41, the irradiation of the pulsed laser light is stopped, and the movement of the holding stage 31 is stopped. As a result, as shown in FIG. 4(b) and FIG. 4(c), the ceramic capacitor substrate 10 is formed with a dividing groove 104 that can be broken along the first dividing line 101 (the laser processing step). ). Further, the dividing groove 104 is formed to have a depth of about 50 μm under the following processing conditions.

再者,上述雷射加工步驟是以例如以下的加工條 件進行。 Furthermore, the above laser processing step is, for example, the following processing strip Pieces are carried out.

波長:355nm Wavelength: 355nm

重複頻率:10kHz Repeat frequency: 10kHz

平均輸出:5W Average output: 5W

聚光點:φ 10μm Converging point: φ 10μm

加工傳送速度:50mm/秒 Processing transfer speed: 50mm / sec

當沿著在陶瓷電容基板10上於預定方向上所形成的所有第1分割預定線101都實施過上述雷射加工步驟後,控制手段20就會作動圖未示之旋轉驅動手段以將保持台31轉動90度。並且,在保持台31上沿著在與上述第1分割預定線101垂直相交的方向上所形成的所有第2分割預定線102實施上述雷射加工步驟。其結果為,在保持台31上所保持的陶瓷電容基板10形成有,可沿著所有的第1分割預定線101以及第2分割預定線102變成破斷起點之分割溝104。 When the above-described laser processing steps are performed along all of the first division planned lines 101 formed on the ceramic capacitor substrate 10 in a predetermined direction, the control means 20 activates a rotation driving means not shown to hold the holding table. 31 turns 90 degrees. Further, the above-described laser processing step is performed on the holding stage 31 along all of the second division planned lines 102 formed in the direction perpendicular to the first division planned line 101. As a result, the ceramic capacitor substrate 10 held on the holding stage 31 is formed so as to be a dividing groove 104 which is a breaking starting point along all of the first dividing line 101 and the second dividing line 102.

如以上進行以將保持有實施過雷射加工步驟的陶瓷電容基板10的保持台31,從加工區域移動至搬入搬出區域。並且,當保持台31到達圖1所示的搬入搬出區域後,即停止保持台31的移動。接著,解除保持台31上所保持的陶瓷電容基板10的吸引保持。 As described above, the holding table 31 holding the ceramic capacitor substrate 10 on which the laser processing step has been performed is moved from the processing region to the loading/unloading region. Then, when the holding table 31 reaches the loading/unloading area shown in FIG. 1, the movement of the holding table 31 is stopped. Next, the suction holding of the ceramic capacitor substrate 10 held on the holding table 31 is released.

接著,控制手段20會作動被加工物搬送手段12的圖未示之移動手段,以將吸引保持墊121定位到已被定位在搬入搬出區域的保持台31上所載置的陶瓷電容基板10的正上方,同時作動氣缸機構122以使吸引保持墊121的下表面之吸引保持面接觸陶瓷電容基板10的上表面。並且,藉 由作動圖未示之吸引手段,以將陶瓷電容基板10吸引保持在吸引保持墊121的下表面之吸引保持面上。 Next, the control means 20 activates the moving means of the workpiece conveying means 12, not shown, to position the suction holding pad 121 to the ceramic capacitor substrate 10 placed on the holding table 31 that has been positioned in the loading/unloading area. Directly above, the cylinder mechanism 122 is actuated simultaneously so that the suction holding surface of the lower surface of the suction holding pad 121 contacts the upper surface of the ceramic capacitor substrate 10. And borrow The ceramic capacitor substrate 10 is sucked and held by the suction holding surface of the lower surface of the suction holding pad 121 by a suction means not shown in the operation diagram.

當如上述地將陶瓷電容基板10吸引保持在吸引保持墊121上之後,控制手段20就會作動被加工物搬送手段12之圖未示之移動手段,以將吸引保持墊121上所吸引保持的陶瓷電容基板10定位到構成分割手段11的被加工物載置構件111的正上方,同時作動氣缸機構122以將吸引保持墊121降下,且將吸引保持墊121上所吸引保持的陶瓷電容基板10定位於構成分割手段11的被加工物載置構件111的上表面。並且,將透過吸引保持墊121對陶瓷電容基板10形成的吸引保持解除。其結果為,陶瓷電容基板10會被載置於構成分割手段11的被加工物載置構件111上。 When the ceramic capacitor substrate 10 is sucked and held by the suction holding pad 121 as described above, the control means 20 activates the moving means of the workpiece conveying means 12, not shown, to attract and hold the suction holding pad 121. The ceramic capacitor substrate 10 is positioned directly above the workpiece mounting member 111 constituting the dividing means 11, while the cylinder mechanism 122 is actuated to lower the suction holding pad 121, and the ceramic capacitor substrate 10 sucked and held by the suction holding pad 121 is held. The upper surface of the workpiece mounting member 111 constituting the dividing means 11 is positioned. Further, the suction formed by the suction holding pad 121 on the ceramic capacitor substrate 10 is released. As a result, the ceramic capacitor substrate 10 is placed on the workpiece mounting member 111 constituting the dividing means 11.

接著,控制手段20會作動構成分割手段11的加壓滾輪112以一邊對被加工物載置構件111上所載置的陶瓷電容基板10的上表面加壓,並一邊使其在X軸方向上轉動。其結果為,在陶瓷電容基板10中由於形成有可沿著第1分割預定線101以及第2分割預定線102變成破斷起點的分割溝104,因此可將陶瓷電容基板10沿著已形成分割溝104的第1分割預定線101以及第2分割預定線102進行破斷,以分割成一個個的晶片電容103(分割步驟)。 Then, the control means 20 activates the pressure roller 112 constituting the dividing means 11 to pressurize the upper surface of the ceramic capacitor substrate 10 placed on the workpiece mounting member 111 while being in the X-axis direction. Turn. As a result, the ceramic capacitor substrate 10 is formed with the division grooves 104 which can be broken along the first division planned line 101 and the second division planned line 102. Therefore, the ceramic capacitor substrate 10 can be divided along the formed. The first dividing line 101 and the second dividing line 102 of the groove 104 are broken to be divided into individual wafer capacitors 103 (dividing step).

當實施過上述分割步驟後,控制手段20會作動晶片落入手段14之圖未示之移動手段,以使裝設在作動臂142上的晶片落入拭除具141朝向構成成批收容手段13的晶片落下構件131的開口部131a移動。其結果為,在被加工物載 置構件111上被分割成一個個的複數個晶片電容103會通過開口部121a而被收容在晶片收容容器132中。 After the above-described dividing step is performed, the control means 20 actuates the moving means of the wafer drop-in means 14 not shown, so that the wafer mounted on the operating arm 142 falls into the wiping tool 141 toward the bulk receiving means 13 The opening portion 131a of the wafer dropping member 131 moves. The result is that the workpiece is loaded The plurality of wafer capacitors 103, which are divided into individual pieces, are housed in the wafer storage container 132 through the opening 121a.

如以上所述,由於在圖示之實施形態中的分割裝置是,透過以雷射光照射手段4沿著在陶瓷電容基板10上的第1分割預定線101以及第2分割預定線102照射將雷射光以形成可變成破斷起點的分割溝104,因此不會有像以切削刀進行切斷之以往的分割方法一樣因為切削刀的耗損以及破損而導致生產性降低的情形。 As described above, the dividing device in the embodiment shown in the figure transmits the laser beam to the first dividing line 101 and the second dividing line 102 on the ceramic capacitor substrate 10 by the laser beam irradiation means 4. Since the light is formed to form the dividing groove 104 which can be the starting point of the breaking, there is no possibility that the productivity is lowered due to the wear and breakage of the cutting blade like the conventional dividing method which is cut by the cutting blade.

又,由於以雷射光照射手段4進行的雷射加工是,沿著在陶瓷電容基板10上的第1分割預定線101以及第2分割預定線102形成可變成破斷起點的分割溝104,因此不會有像熔融物(熔渣)附著在晶片電容的側壁上這樣的情形。 In the laser processing by the laser beam irradiation means 4, the first dividing line 101 and the second dividing line 102 on the ceramic capacitor substrate 10 form a dividing groove 104 which can be a breaking starting point. There is no such thing as a melt (slag) adhering to the sidewall of the wafer capacitor.

此外,由於沿著第1分割預定線101以及第2分割預定線102形成有可變成破斷起點的分割溝104之陶瓷電容基板10,是在藉由分割手段11分割成一個個的晶片電容103後,才收容至晶片收容容器132中,因此在不必將陶瓷電容基板10支撐於保持基板或者是膠帶等的支撐構件上的情形下,變成不需要進行支撐構件的黏貼以及剝離步驟,且可提升生產性。 In addition, the ceramic capacitor substrate 10 in which the dividing groove 104 which can be broken as the starting point is formed along the first dividing line 101 and the second dividing line 102 is divided into individual wafer capacitors 103 by the dividing means 11. Then, it is accommodated in the wafer storage container 132. Therefore, in the case where the ceramic capacitor substrate 10 does not have to be supported on the support member such as the holding substrate or the tape, the bonding and peeling steps of the support member are not required, and the lifting can be performed. Productive.

再者,雖然在上述實施形態中,是以將作為板狀被加工物之陶瓷電容基板10沿著第1分割預定線101以及第2分割預定線102分割成一個個的晶片電容103之例來表示,但是根據本發明之分割裝置,即使要將作為板狀被加工物而未形成有分割預定線之玻璃基板分割成複數個晶片也可 得到同樣的作用效果。 In the above-described embodiment, the ceramic capacitor substrate 10 as a plate-shaped workpiece is divided into the wafer capacitors 103 along the first dividing line 101 and the second dividing line 102. According to the dividing device of the present invention, even if a glass substrate which is a plate-shaped workpiece and is not formed with a predetermined dividing line is divided into a plurality of wafers, Get the same effect.

2‧‧‧裝置殼體 2‧‧‧ device housing

3‧‧‧被加工物保持機構 3‧‧‧Processed object retention mechanism

31‧‧‧保持台 31‧‧‧ Keeping the table

311‧‧‧吸附夾頭 311‧‧‧Adsorption chuck

32‧‧‧保持台支持手段 32‧‧‧ Maintaining support means

4‧‧‧雷射光照射手段 4‧‧‧Laser light irradiation

41‧‧‧聚光器 41‧‧‧ concentrator

5‧‧‧收納盒 5‧‧‧ storage box

5a‧‧‧收納盒載置區域 5a‧‧‧ Storage box mounting area

50‧‧‧收納盒台 50‧‧‧ storage box

6‧‧‧暫置手段 6‧‧‧ temporary means

7‧‧‧被加工物搬出手段 7‧‧‧Removal of processed objects

8‧‧‧被加工物搬入手段 8‧‧‧Means of moving objects

81、121‧‧‧吸引保持墊 81, 121‧‧‧ attraction holding mat

82、122‧‧‧氣缸機構 82, 122‧‧ ‧ cylinder mechanism

83、123、142‧‧‧作動臂 83, 123, 142‧‧‧

9‧‧‧攝像手段 9‧‧‧Photography

11‧‧‧分割手段 11‧‧‧ Segmentation

111‧‧‧被加工物載置構件 111‧‧‧Worked objects mounting members

112‧‧‧加壓滾輪 112‧‧‧Pressure roller

113‧‧‧滾輪收容殼體 113‧‧‧Roller housing

12‧‧‧被加工物搬送手段 12‧‧‧Transportation means

13‧‧‧成批收容手段 13‧‧‧Batch means

131‧‧‧晶片落下構件 131‧‧‧ wafer drop member

131a‧‧‧開口部 131a‧‧‧ openings

133‧‧‧抽屜 133‧‧‧Drawers

14‧‧‧晶片落入手段 14‧‧‧ wafer drop-in means

141‧‧‧晶片落入拭除具 141‧‧‧The wafer falls into the eraser

X、Y、Z‧‧‧方向 X, Y, Z‧‧ Direction

Claims (1)

一種分割裝置,是可將板狀的被加工物分割成複數個晶片之分割裝置,特徵在於,其具備:收納盒載置區域,用於載置已收容有加工前之被加工物的收納盒;暫置手段,用於暫置加工前之被加工物;被加工物搬出手段,將被載置在該收納盒載置區域中的收納盒中所收容的加工前之被加工物搬出至暫置手段;保持台,用於吸引保持加工前之被加工物;移動手段,使該保持台移動至將被加工物搬入以及搬出的搬入搬出區域與加工區域;被加工物搬入手段,將已搬出至該暫置手段的加工前之被加工物搬送至已被定位在該搬入搬出區域之該保持台上;雷射光照射手段,將雷射光照射在配置於該加工區域且被該保持台所吸引保持的加工前之被加工物上,並在被加工物上形成成為用來分割成晶片之破斷起點的分割溝;分割手段,對形成有可變成破斷起點之分割溝的被加工物賦予外力,並沿著分割溝將被加工物分割成複數個晶片;收容手段,收容以該分割手段所分割的複數個晶片; 以及晶片落入手段,將以該分割手段所分割的複數個晶片落入至該收容手段。 A dividing device is a dividing device that can divide a plate-shaped workpiece into a plurality of wafers, and is characterized in that it includes a storage box mounting area for placing a storage box in which a workpiece before processing is accommodated The temporary means is used for the workpiece to be processed before the temporary processing; the workpiece is carried out, and the workpiece before being processed stored in the storage box placed in the storage box mounting area is carried out to the temporary a holding means for sucking and holding a workpiece before processing; and a moving means for moving the holding table to a loading/unloading area and a processing area for loading and unloading the workpiece; and the workpiece loading means is carried out The workpiece before processing to the temporary means is transported to the holding table that has been positioned in the loading/unloading area; the laser beam irradiation means irradiates the laser beam to the processing area and is sucked and held by the holding stage In the workpiece before processing, a dividing groove is formed on the workpiece to be used as a starting point for breaking into a wafer; and the dividing means forms a segment which can be broken into a starting point. The external force given workpiece, along the dividing grooves and the object to be processed is divided into a plurality of wafers; storage means to the receiving means of the divided plurality of segmented wafer; And a wafer dropping means for dropping a plurality of wafers divided by the dividing means into the receiving means.
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