TWI633592B - Split device - Google Patents
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- TWI633592B TWI633592B TW103141227A TW103141227A TWI633592B TW I633592 B TWI633592 B TW I633592B TW 103141227 A TW103141227 A TW 103141227A TW 103141227 A TW103141227 A TW 103141227A TW I633592 B TWI633592 B TW I633592B
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Abstract
本發明的課題為提供一種分割裝置,其不會使晶片的品質下降並能有效率地分割含有陶瓷電容基板的板狀被加工物。解決手段為,將板狀被加工物分割成複數個晶片之分割裝置,其具備:用於載置收納盒的收納盒載置區域、用於暫置加工前之被加工物的暫置設備、將收納於收納盒的加工前之被加工物搬出至暫置設備的被加工物搬出設備、用於吸引保持加工前之被加工物的保持台、使保持台移動至將被加工物搬入及搬出的搬入搬出區域與加工區域的移動設備、將已搬出至暫置設備的加工前之被加工物搬送至已定位在搬入搬出區域之保持台上的被加工物搬入設備、將雷射光照射在配置於加工區域且被保持台吸引保持的加工前之被加工物上,並在被加工物上形成可變成應分割成晶片之破斷起點的分割溝的雷射光照射設備、對形成有變成破斷起點之分割溝的被加工物賦予外力,且沿著分割溝將被加工物分割成複數個晶片的分割設備、收納以分割設備所分割的複數個晶片的收納設備,以及將以分割設備所分割的複數個晶片落入至收納設備的晶片落入設備。 An object of the present invention is to provide a dividing device capable of efficiently dividing a sheet-like workpiece including a ceramic capacitor substrate without degrading the quality of the wafer. A dividing device for dividing a plate-shaped workpiece into a plurality of wafers, comprising: a storage box mounting area on which the storage case is placed, a temporary device for temporarily storing the workpiece before processing, and The workpiece carrying-out device that has been processed before the processing of the storage box is carried out to the workpiece carrying-out device of the temporary equipment, the holding table for sucking and holding the workpiece before processing, and the holding table is moved to carry in and carry out the workpiece The moving equipment of the loading and unloading area and the processing area, and the workpiece before the processing that has been carried out to the temporary equipment are transported to the workpiece carrying equipment that has been positioned on the holding table of the loading/unloading area, and the laser beam is irradiated. A laser light irradiation device that can be divided into a dividing groove that should be divided into a breaking starting point of the wafer is formed on the workpiece before processing, which is sucked and held by the holding table, and becomes broken. An external force is applied to the workpiece in the dividing groove of the starting point, and the workpiece is divided into a plurality of wafers along the dividing groove, and a plurality of wafers divided by the dividing device are accommodated. Storage device, and a separating apparatus will be divided into a plurality of wafer dropping storage device wafer dropping device.
Description
本發明是有關於一種將板狀的被加工物分割成複數個晶片之分割裝置。 The present invention relates to a dividing device for dividing a plate-shaped workpiece into a plurality of wafers.
將金屬箔與絕緣體交互地積層而構成的陶瓷電容(ceramic condenser)基板,是透過分割裝置以分割成一個個的晶片電容而被廣泛地應用於手機或電腦等的電氣機器上。 A ceramic capacitor substrate in which a metal foil and an insulator are laminated to each other is widely used in an electric device such as a mobile phone or a computer by a dividing device to be divided into individual chip capacitors.
作為可將陶瓷電容基板分割成一個個的晶片電容的分割裝置,一般是使用具備切削刀的切削裝置(參照例如,專利文獻1)。 As a dividing device that can divide the ceramic capacitor substrate into individual chip capacitors, a cutting device including a cutting blade is generally used (see, for example, Patent Document 1).
又,作為可將陶瓷電容基板分割成一個個的晶片電容的分割方法,目前也被嘗試使用的有,將對陶瓷電容基板具有吸收性之波長的雷射光沿著分割預定線進行照射,並沿著分割預定線將陶瓷電容基板切斷之方法。 Further, as a method of dividing a ceramic capacitor substrate into individual wafer capacitors, it has been attempted to irradiate laser light having an absorptive wavelength to a ceramic capacitor substrate along a predetermined dividing line. A method of cutting a ceramic capacitor substrate by dividing a predetermined line.
專利文獻1:日本專利特開2003-142334號公報 Patent Document 1: Japanese Patent Laid-Open Publication No. 2003-142334
然而,當陶瓷電容基板是在預定溫度下被燒結時,就會變成硬質,且當以切削刀切斷陶瓷電容基板時,就會有使切削刀急劇烈地耗損,並且發生破損的情形,而且還有所謂的生產性變差的問題。 However, when the ceramic capacitor substrate is sintered at a predetermined temperature, it becomes hard, and when the ceramic capacitor substrate is cut by the cutter, the cutter is violently depleted and damaged, and There is also the problem of so-called poor productivity.
又,當對陶瓷電容基板照射雷射光而分割成一個個的晶片電容時,會有所謂的熔融物(熔渣(dross))附著在晶片電容的側面上而使品質降低的問題。 Further, when the ceramic capacitor substrate is irradiated with laser light and divided into individual wafer capacitors, there is a problem that a so-called melt (dross) adheres to the side surface of the wafer capacitor to lower the quality.
此外,為了在將陶瓷電容基板分割成一個個的晶片電容之後也能容易地進行搬送等的處理,會以保持基板或者是膠帶等支撐構件支撐陶瓷電容基板,因此必須進行支撐構件的貼著與剝離的步驟,而有所謂的生產性變差的問題。 In addition, in order to facilitate the processing such as transport after dividing the ceramic capacitor substrate into individual wafer capacitors, the ceramic capacitor substrate is supported by a support member such as a substrate or a tape, and therefore it is necessary to attach the support member. The step of peeling off, there is a problem of so-called deterioration in productivity.
本發明是有鑑於上述事實而作成的,其主要的技術課題在於,提供不會使晶片的品質下降並能有效率地分割含有陶瓷電容基板的板狀被加工物的分割裝置。 The present invention has been made in view of the above-described circumstances, and a main technical object thereof is to provide a dividing device capable of efficiently dividing a plate-shaped workpiece including a ceramic capacitor substrate without deteriorating the quality of the wafer.
為了解決上述主要的技術課題,依據本發明所提供的分割裝置,是將板狀被加工物分割成複數個晶片的分割裝置,特徵在於,其具備:收納盒載置區域,用於載置已收納有加工前之被加工物的收納盒;暫置設備,用於暫置加工前之被加工物; 被加工物搬出設備,將被載置在該收納盒載置區域中的收納盒中所收納的加工前之被加工物搬出至暫置設備;保持台,用於吸引保持加工前之被加工物;移動設備,使該保持台移動至將被加工物搬入以及搬出的搬入搬出區域與加工區域;被加工物搬入設備,將已搬出至該暫置設備的加工前之被加工物搬送到已被定位在該搬入搬出區域之該保持台上;雷射光照射設備,將雷射光照射在配置於該加工區域且被該保持台所吸引保持的加工前之被加工物上,並在被加工物上形成成為用來分割成晶片之破斷起點的分割溝;分割設備,對形成有可變成破斷起點之分割溝的被加工物賦予外力,並沿著分割溝將被加工物分割成複數個晶片;收納設備,收納以該分割設備所分割的複數個晶片;以及晶片落入設備,將以該分割設備所分割的複數個晶片落入至該收納設備。 In order to solve the above-mentioned main technical problems, the dividing device according to the present invention is a dividing device that divides a plate-shaped workpiece into a plurality of wafers, and is characterized in that it includes a storage box mounting region for mounting a storage box that stores the processed object before processing; and a temporary device for temporarily processing the workpiece before processing; The workpiece is carried out of the apparatus, and the workpiece before being processed stored in the storage box placed in the storage box mounting area is carried out to the temporary equipment; and the holding table is used to suck and hold the workpiece before processing. The mobile device moves the holding table to the loading/unloading area and the processing area for loading and unloading the workpiece, and the workpiece is carried into the apparatus, and the workpiece before being processed to be transported to the temporary equipment is transported to the processed object. Positioned on the holding stage of the loading/unloading area; the laser beam irradiation device irradiates the laser beam onto the workpiece before being processed and held by the holding table, and is formed on the workpiece. a dividing groove for dividing into a breaking starting point of the wafer; the dividing device applies an external force to the workpiece formed with the dividing groove that can become the breaking starting point, and divides the workpiece into a plurality of wafers along the dividing groove; a storage device that accommodates a plurality of wafers divided by the dividing device; and a wafer falling into the device, into which the plurality of wafers divided by the dividing device are dropped
由於依據本發明之分割裝置是如上所述地被構成,且是藉由雷射光照射設備對被加工物照射雷射光以形成可變成應分割成晶片之破斷起點的分割溝,因此不會有像以切削刀進行切斷之以往的切割方法一樣因為切削刀的耗損以及破損而導致的生產性降低的情形。 Since the dividing device according to the present invention is constructed as described above, the laser beam is irradiated to the workpiece by the laser light irradiation device to form a dividing groove which can be broken into a starting point of the wafer, so there is no In the same manner as the conventional cutting method in which the cutting is performed by the cutter, the productivity is deteriorated due to the wear and tear of the cutting blade.
又,由於以雷射光照射設備進行的雷射加工,會在被加工物上形成可變成應分割成晶片之破斷起點的分割溝,因此不會有像熔融物(熔渣)附著在晶片的側壁上這樣的情形。 Further, since the laser processing by the laser light irradiation device forms a dividing groove which can be divided into the breaking starting point of the wafer, there is no like that the molten material (melt) adheres to the wafer. This is the case on the side wall.
此外,因為形成有可變成應分割成晶片的破斷起點之分割溝的被加工物在藉由分割設備分割成一個個的晶片後,會被收納至收納設備中,因此在不必將被加工物支撐於保持基板或者是膠帶等的支撐構件上的情形下,變成不需要進行支撐構件的貼著以及剝離的步驟,且可提升生產性。 In addition, since the workpiece to be divided into the dividing grooves to be divided into the breaking starting points of the wafer is formed into a single wafer by the dividing device, it is stored in the storage device, so that it is not necessary to process the workpiece. In the case of being supported on a support member such as a substrate or a tape, the step of attaching and peeling off the support member is not required, and productivity can be improved.
10‧‧‧陶瓷電容基板 10‧‧‧Ceramic capacitor substrate
10a‧‧‧表面 10a‧‧‧ surface
101‧‧‧第1分割預定線 101‧‧‧1st dividing line
102‧‧‧第2分割預定線 102‧‧‧2nd dividing line
103‧‧‧晶片電容 103‧‧‧Wafer capacitance
104‧‧‧分割溝 104‧‧‧dividing trench
11‧‧‧分割設備 11‧‧‧Segmentation equipment
111‧‧‧被加工物載置構件 111‧‧‧Worked objects mounting members
112‧‧‧按壓輥 112‧‧‧Press roller
113‧‧‧滾輪收納殼體 113‧‧‧Roller housing
12‧‧‧被加工物搬送設備 12‧‧‧Processed material handling equipment
13‧‧‧成批收納設備 13‧‧‧Batch storage equipment
131‧‧‧晶片落下構件 131‧‧‧ wafer drop member
131a‧‧‧開口部 131a‧‧‧ openings
132‧‧‧晶片收納容器 132‧‧‧ wafer storage container
133‧‧‧抽屜 133‧‧‧Drawers
14‧‧‧晶片落入設備 14‧‧‧ wafers fall into the device
141‧‧‧晶片落入拭除具 141‧‧‧The wafer falls into the eraser
2‧‧‧裝置殼體 2‧‧‧ device housing
20‧‧‧控制設備 20‧‧‧Control equipment
201‧‧‧中央處理器(CPU) 201‧‧‧Central Processing Unit (CPU)
202‧‧‧唯讀記憶體(ROM) 202‧‧‧Reading Memory (ROM)
203‧‧‧隨機存取記憶體(RAM) 203‧‧‧ Random Access Memory (RAM)
204‧‧‧輸入介面 204‧‧‧Input interface
205‧‧‧輸出介面 205‧‧‧Output interface
3‧‧‧被加工物保持機構 3‧‧‧Processed object retention mechanism
31‧‧‧保持台 31‧‧‧ Keeping the table
311‧‧‧吸附夾頭 311‧‧‧Adsorption chuck
32‧‧‧保持台支撐設備 32‧‧‧Maintenance support equipment
4‧‧‧雷射光照射設備 4‧‧‧Laser light irradiation equipment
41‧‧‧聚光器 41‧‧‧ concentrator
5‧‧‧收納盒 5‧‧‧ storage box
5a‧‧‧收納盒載置區域 5a‧‧‧ Storage box mounting area
50‧‧‧收納盒台 50‧‧‧ storage box
6‧‧‧暫置設備 6‧‧‧Preliminary equipment
7‧‧‧被加工物搬出設備 7‧‧‧Worked objects moved out of the equipment
8‧‧‧被加工搬入設備 8‧‧‧Processed loading equipment
81、121‧‧‧吸引保持墊 81, 121‧‧‧ attraction holding mat
82、122‧‧‧氣缸機構 82, 122‧‧ ‧ cylinder mechanism
83、123、142‧‧‧作動臂 83, 123, 142‧‧‧
9‧‧‧攝像設備 9‧‧‧Photography equipment
P‧‧‧聚光點 P‧‧‧ spotlight
X、Y、Z‧‧‧方向 X, Y, Z‧‧ Direction
X1‧‧‧方向 X1‧‧‧ direction
圖1是藉由本發明所構成之分割裝置的立體圖。 BRIEF DESCRIPTION OF THE DRAWINGS Figure 1 is a perspective view of a dividing device constructed by the present invention.
圖2是構成裝設於圖1所示之分割裝置上的成批(bulk)收納設備的晶片落下構件以及晶片收納容器的立體圖。 Fig. 2 is a perspective view of a wafer dropping member and a wafer storage container constituting a bulk storage device mounted on the dividing device shown in Fig. 1;
圖3是裝設於圖1所示之分割裝置的控制設備的方塊構成圖。 Fig. 3 is a block diagram showing the configuration of a control device installed in the dividing device shown in Fig. 1.
圖4(a)-(c)是藉圖1所示之分割裝置所實施的雷射加工步驟的說明圖。 4(a)-(c) are explanatory views of a laser processing step performed by the dividing device shown in Fig. 1.
圖5是作為板狀被加工物的陶瓷電容基板的立體圖。 Fig. 5 is a perspective view of a ceramic capacitor substrate as a plate-like workpiece.
以下,針對依照本發明所構成的分割裝置的合適的實施型態,參照附加圖式進行更進一步的詳細說明。 Hereinafter, a suitable embodiment of the dividing device constructed in accordance with the present invention will be described in further detail with reference to the additional drawings.
圖5中所示為,作為板狀被加工物的陶瓷電容基板的立體圖。圖5所示之陶瓷電容基板10是,以厚度為500 μm左右形成為矩形,且在表面10a上將沿預定方向延伸的複數條第1分割預定線101,以及沿與該第1分割預定線101垂直相交的方向延伸的複數條第2分割預定線102形成為格子狀。在以第1分割預定線101與第2分割預定線102所劃分出的複數個區域中形成有晶片電容103。如此所形成的陶瓷電容基板10是,沿著第1分割預定線101以及第2分割預定線102而被分割成一個個的晶片電容103。 Fig. 5 is a perspective view showing a ceramic capacitor substrate as a plate-like workpiece. The ceramic capacitor substrate 10 shown in FIG. 5 has a thickness of 500 A plurality of first divided planned lines 101 extending in a predetermined direction on the surface 10a, and a plurality of second divided planned lines 102 extending in a direction perpendicular to the first divided planned line 101 are formed on the surface 10a. Formed in a lattice shape. A wafer capacitor 103 is formed in a plurality of regions divided by the first division planned line 101 and the second division planned line 102. The ceramic capacitor substrate 10 thus formed is a wafer capacitor 103 that is divided into individual pieces along the first dividing line 101 and the second dividing line 102.
圖1中所示為,用於將上述陶瓷電容基板10沿著第1分割預定線101以及第2分割預定線102分割的依照本發明所構成的分割裝置的立體圖。 FIG. 1 is a perspective view showing a dividing device according to the present invention for dividing the ceramic capacitor substrate 10 along the first dividing line 101 and the second dividing line 102.
圖1所示之分割裝置具備有裝置殼體2。在此裝置殼體2的中央部上配置有,用於保持被加工物的被加工物保持機構3,以及對被保持在該被加工物保持機構3上的被加工物照射雷射光的雷射光照射設備4。被加工物保持機構3具備,用於吸引保持上述作為板狀被加工物的陶瓷電容基板10的保持台31,以及可支撐該保持台31的保持台支撐設備32。保持台31配置有,如圖1所示形成為矩形且用於將上述陶瓷電容基板10吸引保持在表面中央部上之藉由多孔陶瓷(porous ceramics)所形成的吸附夾頭311。並且,將吸附夾頭311連接到圖未示之吸引設備。因此,藉由將陶瓷電容基板10載置於吸附夾頭311上,並作動圖未示之吸引設備,就能將陶瓷電容基板10吸引保持於吸附夾頭311上。 The dividing device shown in Fig. 1 is provided with a device casing 2. A workpiece holding mechanism 3 for holding a workpiece and a laser beam that irradiates the workpiece to be held on the workpiece holding mechanism 3 with laser light are disposed at a central portion of the apparatus casing 2. Irradiation device 4. The workpiece holding mechanism 3 includes a holding table 31 for sucking and holding the ceramic capacitor substrate 10 as a plate-shaped workpiece, and a holding table supporting device 32 that can support the holding table 31. The holding table 31 is provided with an adsorption chuck 311 formed of porous ceramics, which is formed in a rectangular shape as shown in FIG. 1 and which is used to attract and hold the ceramic capacitor substrate 10 on the central portion of the surface. Also, the adsorption chuck 311 is attached to a suction device not shown. Therefore, the ceramic capacitor substrate 10 can be attracted and held by the chuck 13 by placing the ceramic capacitor substrate 10 on the chuck 311 and moving the suction device (not shown).
構成被加工物保持機構3的保持台支撐設備32具備,使保持台31繞相對於作為上表面之保持面垂直的軸周 圍轉動的圖未示之旋轉驅動設備。並將如此所構成的保持台支撐設備32構成為,可將保持台31移動至圖1所示之將被加工物搬入以及搬出的搬入搬出區域與透過雷射光照射設備4形成的加工區域,並變成可藉由圖未示之X軸方向移動設備使其在箭頭X所示之加工傳送方向(X軸方向)上移動。 The holding table support device 32 constituting the workpiece holding mechanism 3 is provided so that the holding table 31 is wound around a circumference perpendicular to the holding surface as the upper surface. The rotation of the figure is not shown in the rotary drive device. The holding table support device 32 configured as described above is configured to move the holding table 31 to the loading/unloading area in which the workpiece is carried in and out as shown in FIG. 1 and the processing area formed by the laser beam irradiation device 4, and It becomes possible to move the apparatus in the X-axis direction (not shown) to move it in the processing conveyance direction (X-axis direction) shown by the arrow X.
可對保持在構成上述被加工物保持機構3的保持台31上的陶瓷電容基板10照射雷射光的雷射光照射設備4具備,可發射脈衝雷射光的雷射光發射設備(圖未示),以及可將以該雷射光發射設備所發出的雷射光聚集的聚光器41,且將聚光器41配置於加工區域。 The laser light irradiation device 4 that irradiates the ceramic capacitor substrate 10 that is held on the holding table 31 of the workpiece holding mechanism 3 with the laser light, and a laser light emitting device (not shown) that can emit pulsed laser light, and The concentrator 41 that collects the laser light emitted from the laser light emitting device can be disposed, and the concentrator 41 is disposed in the processing region.
在上述被加工物保持機構3的Y軸方向的其中一方之側上設有,可供已收納加工前之作為板狀被加工物之陶瓷電容基板10的收納盒載置的收納盒載置區域5a,且在收納盒載置區域5a上配置有可藉由圖未示之升降設備使其沿著箭頭Z所示的上下方向(Z軸方向)移動的收納盒台50。並將已收納有複數片作為被加工物的上述陶瓷電容基板10的收納盒5載置於這個收納盒台50上。在收納盒載置區域5a的前側配置有,可供收納在收納盒5中的陶瓷電容基板10暫置,並且進行位置校準的暫置設備6,以及將收納在收納盒5中的陶瓷電容基板10搬出至暫置設備6的被加工物搬出設備7。 A storage box mounting area on which the storage case of the ceramic capacitor substrate 10 as a plate-shaped workpiece before storage is placed is provided on one side of the Y-axis direction of the workpiece holding mechanism 3 In the storage box mounting area 5a, a storage cassette 50 that can be moved in the vertical direction (Z-axis direction) indicated by the arrow Z by a lifting device (not shown) is disposed. The storage case 5 of the above-described ceramic capacitor substrate 10 in which a plurality of sheets are stored as workpieces is placed on the storage cassette stage 50. The ceramic capacitor substrate 10 accommodated in the storage case 5 is temporarily placed on the front side of the storage case mounting area 5a, and the positional device 6 for position alignment and the ceramic capacitor substrate to be housed in the storage case 5 are disposed. 10 The workpiece is carried out to the temporary equipment 6 and the equipment 7 is carried out.
在上述暫置設備6與搬入搬出區域之間配置有被加工物搬入設備8,該加工物搬入設備8能夠將被搬出至暫置設備6且進行過位置校準的加工前之作為板狀被加工物 的陶瓷電容基板10、搬送至被定位在搬入搬出區域之構成被加工物保持機構3的保持台31之作為上表面之保持面上。這個被加工物搬入設備8是由,可將陶瓷電容基板10的上表面吸引保持住的吸引保持墊81、可支撐該吸引保持墊81且將吸引保持墊81沿上下方向(Z軸方向)移動的氣缸機構82、可支撐該氣缸機構82的作動臂83,以及可使該作動臂83在Y軸方向上移動之圖未示的移動設備所形成。並將如此所構成的被加工物搬入設備8的吸引保持墊81連接到圖未示之吸引設備。 The workpiece loading device 8 is disposed between the temporary storage device 6 and the loading/unloading area, and the workpiece loading device 8 can be processed as a plate before being processed out of the temporary device 6 and subjected to position calibration. Object The ceramic capacitor substrate 10 is transported to a holding surface on the upper surface of the holding table 31 which is positioned in the loading/unloading area and which constitutes the workpiece holding mechanism 3. This workpiece loading device 8 is a suction holding pad 81 that can hold and hold the upper surface of the ceramic capacitor substrate 10, can support the suction holding pad 81, and move the suction holding pad 81 in the vertical direction (Z-axis direction). The cylinder mechanism 82, the actuator arm 83 that can support the cylinder mechanism 82, and the moving device that can move the actuator arm 83 in the Y-axis direction are not shown. The suction holding pad 81 that carries the workpiece to be processed into the apparatus 8 is connected to a suction device (not shown).
圖示的實施形態中的分割裝置具備攝像設備9,是裝設於上述被加工物搬入設備8之氣缸機構82並且可對作為板狀被加工物的陶瓷電容基板10之應加工區域進行檢測,且是將該陶瓷電容基板10保持在被定位於搬入搬出區域的保持台31上。此攝像設備9是由顯微鏡或是CCD攝影機等的光學設備所形成,並可將所拍攝到的影像信號傳送至後述的控制設備。 The dividing device in the illustrated embodiment includes the imaging device 9 and is a cylinder mechanism 82 that is attached to the workpiece loading device 8 and can detect a processing region of the ceramic capacitor substrate 10 as a plate-shaped workpiece. Further, the ceramic capacitor substrate 10 is held by the holding table 31 positioned in the loading/unloading area. The imaging device 9 is formed by an optical device such as a microscope or a CCD camera, and can transmit the captured image signal to a control device to be described later.
在上述被加工物保持機構3的Y軸方向中的另一方之側上配置有,用於將在加工區域中被雷射加工過的作為板狀被加工物之陶瓷電容基板10分割成一個個的晶片電容的分割設備11。分割設備11具備,配置在被加工物保持機構3的Y軸方向中的另一方之側上的被加工物載置構件111、可對載置於該被加工物載置構件111上之雷射加工過的作為板狀被加工物之陶瓷電容基板10賦予外力的按壓輥(roller)112,以及將該按壓輥112收納成可進行出入的滾輪 收納殼體113。被加工物載置構件111是藉由橡膠等的柔軟構件形成為矩形。並將按壓輥112構成為,可一邊對載置在被加工物載置構件111上的陶瓷電容基板10的上表面進行按壓,一邊使其可在X軸方向上轉動。 The other side of the workpiece holding mechanism 3 in the Y-axis direction is disposed so that the ceramic capacitor substrate 10 as a plate-shaped workpiece processed by laser processing in the processing region is divided into individual pieces. The wafer capacitor is divided by the device 11. The dividing device 11 includes a workpiece placing member 111 disposed on the other of the Y-axis directions of the workpiece holding mechanism 3, and a laser that can be placed on the workpiece loading member 111. A processed roller 112 that imparts an external force to the ceramic capacitor substrate 10 as a plate-shaped workpiece, and a roller that accommodates the pressing roller 112 as an input and exit roller The housing 113 is housed. The workpiece mounting member 111 is formed in a rectangular shape by a flexible member such as rubber. The pressing roller 112 is configured to be rotatable in the X-axis direction while pressing the upper surface of the ceramic capacitor substrate 10 placed on the workpiece mounting member 111.
圖示的實施形態中的分割裝置具備被加工物搬送設備12,可將雷射加工過之作為板狀被加工物的陶瓷電容基板10搬送到構成上述分割設備11的被加工物載置構件111上,且是將該陶瓷電容基板10載置在被定位於搬入搬出區域之構成被加工物保持機構3的保持台31上。此被加工物搬送設備12是由以下構件所構成:可將載置在保持台31上之被雷射加工過的作為板狀被加工物之陶瓷電容基板10的上表面吸引保持住的吸引保持墊121、可支撐該吸引保持墊121並將吸引保持墊121沿上下方向(Z軸方向)移動的氣缸機構122、可支撐該氣缸機構122的作動臂123,以及使該作動臂123在Y軸方向上移動的圖未示之移動設備。並將如此構成的被加工物搬送設備12的吸引保持墊121連接到圖未示之吸引設備。 The dividing device according to the embodiment of the present invention includes the workpiece transporting device 12, and the ceramic capacitor substrate 10 as a plate-shaped workpiece that has been subjected to laser processing can be transported to the workpiece mounting member 111 that constitutes the dividing device 11 In addition, the ceramic capacitor substrate 10 is placed on the holding table 31 of the workpiece holding mechanism 3 that is positioned in the loading/unloading area. The workpiece transporting apparatus 12 is composed of a member that can attract and hold the upper surface of the ceramic capacitor substrate 10 which is a laser-processed sheet-like workpiece placed on the holding table 31. a pad 121, a cylinder mechanism 122 that can support the suction holding pad 121 and move the suction holding pad 121 in the up and down direction (Z-axis direction), an actuator arm 123 that can support the cylinder mechanism 122, and the actuator arm 123 on the Y-axis A mobile device that is not shown in the figure moving in the direction. The suction holding pad 121 of the workpiece conveying device 12 thus constructed is connected to a suction device (not shown).
圖示的實施形態中的分割裝置具備,鄰接於構成上述分割設備11的被加工物載置構件111而配置並可成批收納分割成一個個的複數個晶片電容的成批收納設備13。成批收納設備13具備晶片落下構件131,該晶片落下構件131設有鄰接於被加工載置構件111而形成開口之開口部131a。如圖2所示,這個晶片落下構件131是從開口部131a朝向下方而形成為漏斗狀。在如此構成的晶片落下構件131 的下側配置有晶片收納容器132。如圖1所示,在像這樣配置了由晶片落下構件131與晶片收納容器132所形成的成批收納設備13的裝置殼體2的前壁上,設置有用以供晶片收納容器132進出的抽屜133。 The dividing device according to the embodiment of the present invention includes a batch storage device 13 that is disposed adjacent to the workpiece mounting member 111 that constitutes the dividing device 11 and that can store a plurality of wafer capacitors that are divided into a plurality of wafer capacitors. The bulk storage device 13 includes a wafer dropping member 131 that is provided with an opening 131a that is formed to open adjacent to the workpiece to be processed 111. As shown in FIG. 2, this wafer dropping member 131 is formed in a funnel shape from the opening 131a toward the lower side. The wafer dropping member 131 thus constructed A wafer storage container 132 is disposed on the lower side. As shown in FIG. 1, on the front wall of the apparatus casing 2 in which the batch storage apparatus 13 formed of the wafer dropping member 131 and the wafer storage container 132 is disposed, a drawer for inserting and receiving the wafer storage container 132 is provided. 133.
參照圖1繼續說明,圖示的實施形態中的分割裝置具備晶片落入設備14,該晶片落入設備14是用於供位在構成上述分割設備11的被加工物載置構件111上之陶瓷電容基板10所分割成的複數個晶片電容、落入構成上述成批收納設備13的晶片落入構件131之開口部131a中。此晶片落入設備14是由,晶片落入拭除具(wiper)141、支撐晶片落入拭除具141的作動臂142,以及使該作動臂142在Y軸方向上移動的圖未示之移動設備所形成。 Referring to Fig. 1, the dividing device in the illustrated embodiment is provided with a wafer dropping device 14 for ceramics to be placed on the workpiece mounting member 111 constituting the dividing device 11. The plurality of wafer capacitors divided by the capacitor substrate 10 fall into the opening portion 131a of the wafer drop member 131 constituting the batch storage device 13. The wafer is dropped into the apparatus 14 by the wafer falling into the wiper 141, the supporting wafer falling into the actuator 142 of the wiper 141, and the movement of the actuator arm 142 in the Y-axis direction. The mobile device is formed.
圖示的實施形態中的分割裝置具備有圖3所示之控制設備20。控制設備20是藉由電腦所構成,並具備,可依照控制程式(program)進行演算處理的中央處理器(CPU)201、可存放控制程式等的唯讀記憶體(ROM)202、可存放演算結果等的可讀寫之隨機存取記憶體(RAM)203、輸入介面204以及輸出介面205。可在如此構成的控制設備20的輸入介面204中,輸入來自上述攝像設備9等的檢測訊號。並且,是將來自控制設備20的輸出介面205的控制訊號輸出到上述被加工物保持機構3、雷射光照射設備4、被加工物搬出設備7、被加工物搬入設備8、分割設備11、被加工物搬送設備12等。 The dividing device in the illustrated embodiment is provided with the control device 20 shown in FIG. The control device 20 is constituted by a computer, and includes a central processing unit (CPU) 201 that can perform calculation processing in accordance with a control program, a read-only memory (ROM) 202 that can store a control program, and the like, and a storage calculus The result is a readable and writable random access memory (RAM) 203, an input interface 204, and an output interface 205. The detection signal from the above-described imaging device 9 or the like can be input to the input interface 204 of the control device 20 thus constructed. Further, the control signal from the output interface 205 of the control device 20 is output to the workpiece holding mechanism 3, the laser beam irradiation device 4, the workpiece carrying device 7, the workpiece loading device 8, the dividing device 11, and the The workpiece transporting device 12 and the like.
圖示的實施形態中的分割裝置是由以上方式所 構成,且以下將針對其作用進行說明。 The dividing device in the illustrated embodiment is in the above manner The configuration will be described below with respect to its action.
在配置於收納盒載置區域5a的收納盒台50上所載置之收納盒5中所收納的加工前之陶瓷電容基板10,是藉由以圖未示之升降設備在Z軸方向上作上下移動而被定位到搬出位置。接著,控制設備20將被加工物搬出設備7進退作動以將被定位於搬出位置的陶瓷電容基板10搬出至暫置設備6上。被搬出至暫置設備6的陶瓷電容基板10是在此進行位置校準。接著,控制設備20會作動被加工物搬入設備8以藉由吸引保持墊81對已在暫置設備6上進行過位置校準之陶瓷電容基板10的上表面進行吸引保持,並將其搬送至被定位於搬入搬出區域之構成被加工物保持機構3的保持台31的吸附夾頭311之上表面之保持面上。如此進行,而將陶瓷電容基板10載置在保持台31的吸附夾頭311上之後,就能藉由控制設備20作動圖未示之吸引設備,以將陶瓷電容基板10吸引保持在保持台31的吸附夾頭311的上表面之保持面上(被加工物保持步驟)。 The ceramic capacitor substrate 10 before processing stored in the storage case 5 placed on the storage cassette 50 placed in the storage cassette mounting area 5a is formed in the Z-axis direction by a lifting device not shown. Move up and down to be positioned to the carry-out position. Next, the control device 20 moves the workpiece carry-out device 7 forward and backward to carry out the ceramic capacitor substrate 10 positioned at the carry-out position to the temporary device 6. The ceramic capacitor substrate 10 that has been carried out to the temporary device 6 is positionally calibrated here. Next, the control device 20 activates the workpiece loading device 8 to suck and hold the upper surface of the ceramic capacitor substrate 10 that has been positionally aligned on the temporary device 6 by the suction holding pad 81, and transports it to the object. The holding surface of the upper surface of the chuck 311 of the holding table 31 of the workpiece holding mechanism 3 is placed in the loading/unloading area. In this manner, after the ceramic capacitor substrate 10 is placed on the chuck 311 of the holding table 31, the suction device (not shown) can be actuated by the control device 20 to attract and hold the ceramic capacitor substrate 10 at the holding stage 31. The holding surface of the upper surface of the adsorption chuck 311 (the workpiece holding step).
當如上述地將陶瓷電容基板10吸引保持在保持台31的吸附夾頭311的上表面之保持面上之後,控制設備20會作動被加工物搬入設備8,以將裝設於氣缸機構82上的攝像設備9定位到保持台31所保持的陶瓷電容基板10的上側。接著,控制設備20會作動攝像設備9,以使其對保持台31所保持的陶瓷電容基板10上所形成的第1分割預定線101以及第2分割預定線102進行拍攝,並實施確認第1分割預定線101以及第2分割預定線102是否與X軸方向以及Y軸方向平 行的校準(alignment)作業。若是在第1分割預定線101以及第2分割預定線102並非與X軸方向以及Y軸方向平行的情況中,則控制設備20會控制可使構成被加工物保持機構3之保持台支撐設備32旋轉的圖未示之旋轉驅動設備,以將於保持台31所保持的陶瓷電容基板10上所形成的第1分割預定線101以及第2分割預定線102調整成與X軸方向以及Y軸方向平行(校準步驟)。 After the ceramic capacitor substrate 10 is attracted and held on the holding surface of the upper surface of the chuck 311 of the holding table 31 as described above, the control device 20 moves the workpiece into the apparatus 8 to be mounted on the cylinder mechanism 82. The image pickup apparatus 9 is positioned to the upper side of the ceramic capacitor substrate 10 held by the holding stage 31. Next, the control device 20 activates the imaging device 9 to image the first divided planned line 101 and the second divided planned line 102 formed on the ceramic capacitor substrate 10 held by the holding table 31, and performs the first confirmation. Whether the division planned line 101 and the second division planned line 102 are flat with the X-axis direction and the Y-axis direction Line alignment work. When the first division planned line 101 and the second division planned line 102 are not parallel to the X-axis direction and the Y-axis direction, the control device 20 controls the holding table supporting device 32 that constitutes the workpiece holding mechanism 3. The rotary drive device (not shown) is rotated so that the first division planned line 101 and the second division planned line 102 formed on the ceramic capacitor substrate 10 held by the holding stage 31 are adjusted to be in the X-axis direction and the Y-axis direction. Parallel (calibration step).
當如上述地實施過校準步驟後,控制設備20就會作動圖未示之X軸方向移動設備而將保持台31移動至加工區域,並如圖4(a)所示地將預定的第1分割預定線101的一端(在圖4(a)中的左端)定位至雷射光照射設備4的聚光器41的正下方。並且,將從聚光器41所照射出的脈衝雷射光的聚光點P對準至陶瓷電容基板10的表面10a(上表面)附近。接著,控制設備20會作動雷射光照射設備4,以一邊將對陶瓷電容基板10具有吸收性之波長的脈衝雷射光從聚光器41照射出,一邊作動圖未示之X軸方向移動設備而使保持台31以預定的加工傳送速度朝圖4(a)中以箭頭X1所示之方向移動。並且,當第1分割預定線101的另一端(在圖4(b)中的右端)到達聚光器41的正下方後,即停止脈衝雷射光的照射,同時停止保持台31的移動。其結果為,如圖4(b)以及圖4(c)所示,在陶瓷電容基板10上形成有,可沿著第1分割預定線101變成破斷起點的分割溝104(雷射加工步驟)。再者,分割溝104是在下述加工條件下形成50μm左右的深度。 When the calibration step is carried out as described above, the control device 20 moves the holding unit 31 to the processing area by moving the X-axis direction moving device not shown, and sets the predetermined first one as shown in Fig. 4(a). One end of the division planned line 101 (the left end in FIG. 4(a)) is positioned directly below the concentrator 41 of the laser light irradiation apparatus 4. Then, the condensed spot P of the pulsed laser light irradiated from the concentrator 41 is aligned to the vicinity of the surface 10a (upper surface) of the ceramic capacitor substrate 10. Next, the control device 20 activates the laser light irradiation device 4 to illuminate the pulsed laser light having a wavelength that is absorptive to the ceramic capacitor substrate 10 from the concentrator 41 while moving the device in the X-axis direction not shown. The holding table 31 is moved in a direction indicated by an arrow X1 in Fig. 4(a) at a predetermined processing conveyance speed. Further, when the other end of the first division planned line 101 (the right end in FIG. 4(b)) reaches directly below the concentrator 41, the irradiation of the pulsed laser light is stopped, and the movement of the holding stage 31 is stopped. As a result, as shown in FIG. 4(b) and FIG. 4(c), the ceramic capacitor substrate 10 is formed with a dividing groove 104 that can be broken along the first dividing line 101 (the laser processing step). ). Further, the dividing groove 104 is formed to have a depth of about 50 μm under the following processing conditions.
再者,上述雷射加工步驟是以例如以下的加工條 件進行。 Furthermore, the above laser processing step is, for example, the following processing strip Pieces are carried out.
波長:355nm Wavelength: 355nm
重複頻率:10kHz Repeat frequency: 10kHz
平均輸出:5W Average output: 5W
聚光點:φ 10μm Converging point: φ 10μm
加工傳送速度:50mm/秒 Processing transfer speed: 50mm / sec
當沿著在陶瓷電容基板10上於預定方向上所形成的所有第1分割預定線101都實施過上述雷射加工步驟後,控制設備20就會作動圖未示之旋轉驅動設備以將保持台31轉動90度。並且,在保持台31上沿著在與上述第1分割預定線101垂直相交的方向上所形成的所有第2分割預定線102實施上述雷射加工步驟。其結果為,在保持台31上所保持的陶瓷電容基板10形成有,可沿著所有的第1分割預定線101以及第2分割預定線102變成破斷起點之分割溝104。 When the above-described laser processing steps are performed along all of the first division planned lines 101 formed on the ceramic capacitor substrate 10 in a predetermined direction, the control device 20 activates a rotary driving device not shown to hold the holding table. 31 turns 90 degrees. Further, the above-described laser processing step is performed on the holding stage 31 along all of the second division planned lines 102 formed in the direction perpendicular to the first division planned line 101. As a result, the ceramic capacitor substrate 10 held on the holding stage 31 is formed so as to be a dividing groove 104 which is a breaking starting point along all of the first dividing line 101 and the second dividing line 102.
如以上進行以將保持有實施過雷射加工步驟的陶瓷電容基板10的保持台31,從加工區域移動至搬入搬出區域。並且,當保持台31到達圖1所示的搬入搬出區域後,即停止保持台31的移動。接著,解除保持台31上所保持的陶瓷電容基板10的吸引保持。 As described above, the holding table 31 holding the ceramic capacitor substrate 10 on which the laser processing step has been performed is moved from the processing region to the loading/unloading region. Then, when the holding table 31 reaches the loading/unloading area shown in FIG. 1, the movement of the holding table 31 is stopped. Next, the suction holding of the ceramic capacitor substrate 10 held on the holding table 31 is released.
接著,控制設備20會作動被加工物搬送設備12的圖未示之移動設備,以將吸引保持墊121定位到已被定位在搬入搬出區域的保持台31上所載置的陶瓷電容基板10的正上方,同時作動氣缸機構122以使吸引保持墊121的下表面之吸引保持面接觸陶瓷電容基板10的上表面。並且,藉 由作動圖未示之吸引設備,以將陶瓷電容基板10吸引保持在吸引保持墊121的下表面之吸引保持面上。 Next, the control device 20 activates the mobile device (not shown) of the workpiece transporting device 12 to position the suction holding pad 121 to the ceramic capacitor substrate 10 placed on the holding table 31 that has been positioned in the loading/unloading region. Directly above, the cylinder mechanism 122 is actuated simultaneously so that the suction holding surface of the lower surface of the suction holding pad 121 contacts the upper surface of the ceramic capacitor substrate 10. And borrow A suction device (not shown) is used to attract and hold the ceramic capacitor substrate 10 on the suction holding surface of the lower surface of the suction holding pad 121.
當如上述地將陶瓷電容基板10吸引保持在吸引保持墊121上之後,控制設備20就會作動被加工物搬送設備12之圖未示之移動設備,以將吸引保持墊121上所吸引保持的陶瓷電容基板10定位到構成分割設備11的被加工物載置構件111的正上方,同時作動氣缸機構122以將吸引保持墊121降下,且將吸引保持墊121上所吸引保持的陶瓷電容基板10定位於構成分割設備11的被加工物載置構件111的上表面。並且,將透過吸引保持墊121對陶瓷電容基板10形成的吸引保持解除。其結果為,陶瓷電容基板10會被載置於構成分割設備11的被加工物載置構件111上。 After the ceramic capacitor substrate 10 is attracted and held on the suction holding pad 121 as described above, the control device 20 activates the mobile device not shown in the workpiece transporting device 12 to attract and hold the suction holding pad 121. The ceramic capacitor substrate 10 is positioned directly above the workpiece mounting member 111 constituting the dividing device 11, while the cylinder mechanism 122 is actuated to lower the suction holding pad 121, and the ceramic capacitor substrate 10 sucked and held by the suction holding pad 121 is attracted. The upper surface of the workpiece mounting member 111 constituting the dividing device 11 is positioned. Further, the suction formed by the suction holding pad 121 on the ceramic capacitor substrate 10 is released. As a result, the ceramic capacitor substrate 10 is placed on the workpiece mounting member 111 constituting the dividing device 11.
接著,控制設備20會作動構成分割設備11的按壓輥112以一邊對被加工物載置構件111上所載置的陶瓷電容基板10的上表面按壓,並一邊使其在X軸方向上轉動。其結果為,在陶瓷電容基板10中由於形成有可沿著第1分割預定線101以及第2分割預定線102變成破斷起點的分割溝104,因此可將陶瓷電容基板10沿著已形成分割溝104的第1分割預定線101以及第2分割預定線102進行破斷,以分割成一個個的晶片電容103(分割步驟)。 Then, the control device 20 activates the pressing roller 112 constituting the dividing device 11 to press the upper surface of the ceramic capacitor substrate 10 placed on the workpiece mounting member 111 while rotating in the X-axis direction. As a result, the ceramic capacitor substrate 10 is formed with the division grooves 104 which can be broken along the first division planned line 101 and the second division planned line 102. Therefore, the ceramic capacitor substrate 10 can be divided along the formed. The first dividing line 101 and the second dividing line 102 of the groove 104 are broken to be divided into individual wafer capacitors 103 (dividing step).
當實施過上述分割步驟後,控制設備20會作動晶片落入設備14之圖未示之移動設備,以使裝設在作動臂142上的晶片落入拭除具141朝向構成成批收納設備13的晶片落下構件131的開口部131a移動。其結果為,在被加工物載 置構件111上被分割成一個個的複數個晶片電容103會通過開口部121a而被收納在晶片收納容器132中。 After the above-described dividing step is performed, the control device 20 moves the wafer into the mobile device (not shown) of the device 14, so that the wafer mounted on the actuator arm 142 falls into the wiper 141 toward the bulk storage device 13. The opening portion 131a of the wafer dropping member 131 moves. The result is that the workpiece is loaded The plurality of wafer capacitors 103 that are divided into individual pieces in the placing member 111 are housed in the wafer storage container 132 through the opening 121a.
如以上所述,由於在圖示之實施形態中的分割裝置是,透過以雷射光照射設備4沿著在陶瓷電容基板10上的第1分割預定線101以及第2分割預定線102照射將雷射光以形成可變成破斷起點的分割溝104,因此不會有像以切削刀進行切斷之以往的分割方法一樣因為切削刀的耗損以及破損而導致生產性降低的情形。 As described above, the dividing device in the illustrated embodiment transmits the laser beam irradiation device 4 along the first dividing line 101 and the second dividing line 102 on the ceramic capacitor substrate 10. Since the light is formed to form the dividing groove 104 which can be the starting point of the breaking, there is no possibility that the productivity is lowered due to the wear and breakage of the cutting blade like the conventional dividing method which is cut by the cutting blade.
又,由於以雷射光照射設備4進行的雷射加工是,沿著在陶瓷電容基板10上的第1分割預定線101以及第2分割預定線102形成可變成破斷起點的分割溝104,因此不會有像熔融物(熔渣)附著在晶片電容的側壁上這樣的情形。 In the laser processing by the laser beam irradiation device 4, the first dividing line 101 and the second dividing line 102 on the ceramic capacitor substrate 10 form the dividing groove 104 which can be the starting point of the breaking. There is no such thing as a melt (slag) adhering to the sidewall of the wafer capacitor.
此外,由於沿著第1分割預定線101以及第2分割預定線102形成有可變成破斷起點的分割溝104之陶瓷電容基板10,是在藉由分割設備11分割成一個個的晶片電容103後,才收納至晶片收納容器132中,因此在不必將陶瓷電容基板10支撐於保持基板或者是膠帶等的支撐構件上的情形下,變成不需要進行支撐構件的黏貼以及剝離步驟,且可提升生產性。 In addition, the ceramic capacitor substrate 10 in which the dividing groove 104 which can be broken as the starting point is formed along the first dividing line 101 and the second dividing line 102 is divided into individual wafer capacitors 103 by the dividing device 11. After that, it is stored in the wafer storage container 132. Therefore, when the ceramic capacitor substrate 10 does not have to be supported on a holding member such as a holding substrate or a tape, the bonding and peeling steps of the supporting member do not need to be performed, and the lifting can be performed. Productive.
再者,雖然在上述實施形態中,是以將作為板狀被加工物之陶瓷電容基板10沿著第1分割預定線101以及第2分割預定線102分割成一個個的晶片電容103之例來表示,但是根據本發明之分割裝置,即使要將作為板狀被加工物而未形成有分割預定線之玻璃基板分割成複數個晶片也可 得到同樣的作用效果。 In the above-described embodiment, the ceramic capacitor substrate 10 as a plate-shaped workpiece is divided into the wafer capacitors 103 along the first dividing line 101 and the second dividing line 102. According to the dividing device of the present invention, even if a glass substrate which is a plate-shaped workpiece and is not formed with a predetermined dividing line is divided into a plurality of wafers, Get the same effect.
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