TW201531444A - 硫酸－過氧化氫溶液中去除過氧化氫之方法及其處理劑 - Google Patents

硫酸－過氧化氫溶液中去除過氧化氫之方法及其處理劑 Download PDF

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Publication number
TW201531444A
TW201531444A TW103104478A TW103104478A TW201531444A TW 201531444 A TW201531444 A TW 201531444A TW 103104478 A TW103104478 A TW 103104478A TW 103104478 A TW103104478 A TW 103104478A TW 201531444 A TW201531444 A TW 201531444A
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TW
Taiwan
Prior art keywords
hydrogen peroxide
sulfuric acid
solution
acid
concentration
Prior art date
Application number
TW103104478A
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English (en)
Chinese (zh)
Other versions
TWI511934B (ko
Inventor
Shi-Bao Jian
Yan-Cheng Chen
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Trusval Technology Co Ltd
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Publication date
Application filed by Trusval Technology Co Ltd filed Critical Trusval Technology Co Ltd
Priority to TW103104478A priority Critical patent/TW201531444A/zh
Priority to KR1020150016677A priority patent/KR101641959B1/ko
Priority to SG10201500906WA priority patent/SG10201500906WA/en
Publication of TW201531444A publication Critical patent/TW201531444A/zh
Application granted granted Critical
Publication of TWI511934B publication Critical patent/TWI511934B/zh

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D17/00—Separation of liquids, not provided for elsewhere, e.g. by thermal diffusion

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  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Removal Of Specific Substances (AREA)
TW103104478A 2014-02-11 2014-02-11 硫酸－過氧化氫溶液中去除過氧化氫之方法及其處理劑 TW201531444A (zh)

Priority Applications (3)

Application Number Priority Date Filing Date Title
TW103104478A TW201531444A (zh) 2014-02-11 2014-02-11 硫酸－過氧化氫溶液中去除過氧化氫之方法及其處理劑
KR1020150016677A KR101641959B1 (ko) 2014-02-11 2015-02-03 황산-과산화수소 용액으로부터 과산화수소를 제거하는 방법 및 그 처리제
SG10201500906WA SG10201500906WA (en) 2014-02-11 2015-02-05 Method for removing hydrogen peroxide and processing agent for removing hydrogen peroxide

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW103104478A TW201531444A (zh) 2014-02-11 2014-02-11 硫酸－過氧化氫溶液中去除過氧化氫之方法及其處理劑

Publications (2)

Publication Number Publication Date
TW201531444A true TW201531444A (zh) 2015-08-16
TWI511934B TWI511934B (ko) 2015-12-11

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TW103104478A TW201531444A (zh) 2014-02-11 2014-02-11 硫酸－過氧化氫溶液中去除過氧化氫之方法及其處理劑

Country Status (3)

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KR (1) KR101641959B1 (ko)
SG (1) SG10201500906WA (ko)
TW (1) TW201531444A (ko)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102578578B1 (ko) * 2016-02-03 2023-09-14 삼성전자주식회사 암모니아수 내의 불순물 검출방법
KR102047212B1 (ko) * 2019-07-03 2019-11-20 정영남 황산폐산 내의 과산화수소를 제거하기 위한 활성탄 촉매 분해방법
KR102091728B1 (ko) 2019-08-27 2020-05-29 정영남 활성탄을 이용하여 황산폐산 내 과산화수소를 제거하는 체류형 연속식 분해조장치
KR102527318B1 (ko) 2020-10-16 2023-04-27 육근세 정제 황산을 이용한 항균 및 항진균 기능성 α형 반수석고 및 그 제조방법
CN114858990B (zh) * 2022-04-21 2024-09-10 广州亿新建设集团有限公司 一种消除过氧化氢对cod测定影响的方法及其装置

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0839079A (ja) * 1994-07-28 1996-02-13 Kurita Water Ind Ltd 過酸化水素含有酸性水の処理方法
JP5124946B2 (ja) * 2006-01-12 2013-01-23 栗田工業株式会社 超純水製造装置における超純水中の過酸化水素の除去方法
KR101165323B1 (ko) * 2011-10-26 2012-07-18 소광민 과산화수소에 오염된 폐황산의 재활용 장치

Also Published As

Publication number Publication date
TWI511934B (ko) 2015-12-11
KR20150094514A (ko) 2015-08-19
KR101641959B1 (ko) 2016-07-22
SG10201500906WA (en) 2015-09-29

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