TW201530255A - 形成正面遮光層的著色感光性樹脂組合物和顯示裝置 - Google Patents

形成正面遮光層的著色感光性樹脂組合物和顯示裝置 Download PDF

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Publication number
TW201530255A
TW201530255A TW103136525A TW103136525A TW201530255A TW 201530255 A TW201530255 A TW 201530255A TW 103136525 A TW103136525 A TW 103136525A TW 103136525 A TW103136525 A TW 103136525A TW 201530255 A TW201530255 A TW 201530255A
Authority
TW
Taiwan
Prior art keywords
display device
shielding layer
resin composition
photosensitive resin
front light
Prior art date
Application number
TW103136525A
Other languages
English (en)
Chinese (zh)
Inventor
Seung-Hyun Cho
Hun-Sik Kim
Seul-Ki Park
Original Assignee
Dongwoo Fine Chem Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dongwoo Fine Chem Co Ltd filed Critical Dongwoo Fine Chem Co Ltd
Publication of TW201530255A publication Critical patent/TW201530255A/zh

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/201—Filters in the form of arrays
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G02B5/223—Absorbing filters containing organic substances, e.g. dyes, inks or pigments
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
TW103136525A 2014-01-24 2014-10-22 形成正面遮光層的著色感光性樹脂組合物和顯示裝置 TW201530255A (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020140008907A KR102130533B1 (ko) 2014-01-24 2014-01-24 디스플레이 장치의 전면 차광층 형성용 감광성 수지 조성물

Publications (1)

Publication Number Publication Date
TW201530255A true TW201530255A (zh) 2015-08-01

Family

ID=53693392

Family Applications (1)

Application Number Title Priority Date Filing Date
TW103136525A TW201530255A (zh) 2014-01-24 2014-10-22 形成正面遮光層的著色感光性樹脂組合物和顯示裝置

Country Status (3)

Country Link
KR (1) KR102130533B1 (ko)
CN (1) CN104808437B (ko)
TW (1) TW201530255A (ko)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102170123B1 (ko) * 2016-12-14 2020-10-26 주식회사 엘지화학 차광막이 형성되어 있는 도파관 및 이의 제조방법

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4837297B2 (ja) * 2005-03-09 2011-12-14 富士フイルム株式会社 遮光画像付き基板及び遮光画像の形成方法、転写材料、カラーフィルター、並びに表示装置
WO2006120887A1 (ja) 2005-05-12 2006-11-16 Nippon Kayaku Kabushiki Kaisha 感光性樹脂組成物、その硬化物及びそれを含有するフィルム
WO2007032144A1 (ja) * 2005-09-16 2007-03-22 Fujifilm Corporation 着色組成物及び感光性転写材料
WO2007072682A1 (ja) * 2005-12-22 2007-06-28 Fujifilm Corporation 感光性転写材料、表示装置用部材及びその製造方法、ブラックマトリクス、カラーフィルタ及びその製造方法、表示装置用基板、並びに表示装置
JP4757732B2 (ja) * 2006-08-02 2011-08-24 富士フイルム株式会社 感光性組成物及びそれを用いた感光性転写材料、表示装置用遮光膜及びその形成方法、遮光膜付基板並びに表示装置
KR100961818B1 (ko) * 2007-02-21 2010-06-08 주식회사 엘지화학 블랙 매트릭스용 감광성 수지 조성물, 이에 의해 형성되는블랙 매트릭스 및 이를 포함하는 액정표시소자
JP5546734B2 (ja) 2007-03-29 2014-07-09 東京応化工業株式会社 着色感光性樹脂組成物、ブラックマトリックス、カラーフィルター、及び液晶表示ディスプレイ
KR20130108759A (ko) * 2012-03-26 2013-10-07 동우 화인켐 주식회사 흑색 감광성 수지 조성물, 이를 이용하여 제조된 블랙 매트릭스 및 이를 포함하는 컬러 필터
KR20130115410A (ko) 2012-04-12 2013-10-22 삼성전기주식회사 프리프레그 및 이를 포함하는 인쇄회로기판 및 인쇄회로기판의 제조방법

Also Published As

Publication number Publication date
CN104808437A (zh) 2015-07-29
KR20150088507A (ko) 2015-08-03
KR102130533B1 (ko) 2020-07-06
CN104808437B (zh) 2019-11-01

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