TW201529835A - Cleaning agent composition for removing solder flux residues - Google Patents

Abstract

The present invention provides a cleaning agent composition for flux suitable for cleaning the flux residues in the gap of soldered parts. In one or multiple embodiments, the cleaning agent composition for removing solder flux residues comprises the (poly) ethylene glycol mono-alkyl ether (ingredient A) shown by the formula (I), the alkanolamine (ingredient B) as shown by the formula (II), the alkyl benzenesulfonic acid and/or its salt containing the alkyl group with carbon number 1 to 6 (ingredient C), and water (ingredient D), wherein the content of ingredient A is above 88.0 mass% and below 94.4 mass%, the content of diethylene glycol butyl ether in the ingredient A is above 90.0 mass% and below 100.0 mass%, the content of ingredient B is above 0.3 mass% and below 5.0 mass%, and the content of ingredient C is above 0.3 mass% and below 5.0 mass%.

Description

Solder flux residue removal detergent composition

The present invention relates to a detergent composition for removing a flux flux residue, a method for cleaning a solder flux residue, and a method for producing an electronic component.

In recent years, regarding the mounting of electronic components on printed circuit boards and ceramic substrates, components have been miniaturized from the viewpoint of low power consumption and high-speed processing, and cleaning is required in the cleaning of solder fluxes. The gap gradually narrows. In addition, from the viewpoint of environmental safety, lead-free solder has been gradually used, and rosin-based flux has been used.

Patent Document 1 discloses a detergent composition for a flux which is suitable for cleaning a flux residue remaining in a gap of a welded member, and contains a specific glycol ether, an alkanolamine, and a carbon number of 1 A detergent composition for a flux of -6 alkyl alkylbenzenesulfonic acid and/or a salt thereof and water.

In the case of the patent document 2, the cleaning residue adhered to the flux residue is not only excellent in the detergency of the flux residue existing in the narrow gap, but also excellent in the cleaning property by water, and the foaming is suppressed. In the washing method, it is disclosed that the washing is carried out using water containing 2% by mass or more and 10% by mass or less, 50% by mass or more and less than 97.75% by mass, and 0.05% by mass or more and 5% by mass or less of the amine compound. A method of washing with a specific washing condition and a washing device.

Prior technical literature

Patent literature

Patent Document 1: Japanese Patent Laid-Open Publication No. 2009-298940

Patent Document 2: WO2011/081071

With the lead-free in recent years, 1) the high temperature of the reflow temperature, and 2) the increase in the tin content in the solder metal is an incentive for increasing the tin salt of rosin acid or the like which is difficult to remove in the flux residue, and thus remains in the existing The problem in detergents. On the other hand, a substance having good detergency causes such a problem of corroding copper for an electrode. Further, from the viewpoint of low power consumption and high-speed processing, the components are miniaturized, and the gap to be washed is gradually narrowed. The detergent having a low surface tension has a high penetration force and can dissolve the flux residue in the narrow gap. However, since the surface tension of the water used in the washing step is high, the permeation rate into the gap is slow and cannot be sufficiently cleaned. Such problems. It is also desired to further improve the detergency and cleanability in the detergent of Patent Document 1.

Therefore, in one or more embodiments of the present invention, a detergent composition for removing a flux flux residue is provided, which is excellent in the detergency of a substrate after reflow using a solder flux. Further, in one or more embodiments of the present invention, there is provided a detergent composition for removing a flux flux residue, which is excellent in the detergency of a substrate after reflow using a solder flux and in a narrow gap. It is excellent in the properties and cleanability, and exhibits excellent corrosion inhibition, foaming resistance, and safety (lower flammability).

In one or more embodiments, the present invention relates to a detergent composition for removing a flux flux residue, which comprises a compound represented by the following formula (I) (component A) and represented by the following formula (II) a compound (ingredient B), an alkylbenzenesulfonic acid having an alkyl group having 1 to 6 carbon atoms, and/or a salt thereof (ingredient C), and water (ingredient D), The content of the component A is 88.0% by mass or more and 94.4% by mass or less. In the component A, the content of the diethylene glycol monobutyl ether is 90.0% by mass or more and 100.0% by mass or less, and the content of the component B is 0.3% by mass or more and 5.0. The content of the component C is 0.3% by mass or more and 5.0% by mass or less.

[In the above formula (I), R represents a hydrocarbon group having 3 to 7 carbon atoms, and n is 1 to 5. ]

[In the above formula (II), R ₁ is a hydrogen atom, a methyl group, an ethyl group or an aminoethyl group, R ₂ is a hydrogen atom, a hydroxyethyl group, a hydroxypropyl group, a methyl group or an ethyl group, and R ₃ is a hydroxy group B. Base or hydroxypropyl. ]

According to still another embodiment of the present invention, in the method of cleaning a solder flux residue, the method of cleaning a material having a solder after reflow using the detergent composition of the present invention .

In another one or more embodiments, the present invention relates to a method of manufacturing an electronic component including the following steps, that is, at least one selected from the group consisting of a semiconductor wafer, a wafer type capacitor, and a circuit substrate by soldering using a flux. A step of mounting a component on a circuit board; and a step of cleaning the package by the method of cleaning the flux residue of the present invention.

According to the present invention, in one or more embodiments, it is possible to provide a detergent flux-removing detergent composition excellent in detergency of a substrate after reflow using a solder flux, and a cleaning method using the same And a method of manufacturing an electronic component using the same. Further, according to the present invention, in one or more embodiments, it is possible to provide a cleansing property of a substrate after reflow using a solder flux, and a permeability and cleaning into a narrow gap. A detergent composition for removing solder flux residue which exhibits excellent copper corrosion resistance, foaming resistance, and safety (lower flammability), a cleaning method using the same, and a cleaning method using the same A method of manufacturing an electronic component using the same.

The present invention is based on the insight that a detergent composition prepared by blending a large amount of glycol ether containing diethylene glycol monobutyl ether as a main component has improved detergency as compared with the prior art. Further, the present invention is also based on the insight that the detergent composition has good copper corrosion resistance, foaming inhibition, and safety (decreased flammability), and is in a narrow gap in addition to the detergency. The permeability and cleaning properties can also be improved.

In one embodiment of the present invention, the detergent flux removal composition for solder flux residue (hereinafter also referred to as "the detergent composition of the present invention") contains the above formula (I). a compound (ingredient A), a compound represented by the above formula (II) (ingredient B), an alkylbenzenesulfonic acid having an alkyl group having 1 to 6 carbon atoms, and/or a salt thereof (ingredient C), and Water (component D), the content of the component A is 88.0% by mass or more and 94.4% by mass or less, and the content of the diethylene glycol monobutyl ether in the component A is 90.0% by mass or more and 100.0% by mass or less, and the content of the component B is 0.3% by mass or more and 5.0% by mass or less, and the content of the component C is 0.3% by mass or more and 5.0% by mass or less.

Although the details of the mechanism of action of the detergent composition of the present invention are not clear, they can be estimated as follows. In other words, diethylene glycol monobutyl ether is considered to have high affinity with the solder flux, so that the glycol ether (ingredient A) containing diethylene glycol monobutyl ether as a main component is contained in a large amount, so that the cleaning is performed. The surface tension of the agent composition is lowered, and the solder flux residue in the narrow gap is dissolved and washed, and as a result, the use is based on the specific alkanol. The swelling by the penetration of the amine (ingredient B) and the alkylbenzenesulfonic acid or its salt (ingredient C) into the solder flux residue improves the detergency based on the component A. Further, it is also considered that when washing with water, the specific alkanolamine (component B) and the alkylbenzenesulfonic acid or its salt (component C) and water (component D) in the detergent composition of the present invention are The affinity between diethylene glycol monobutyl ether and washing water is improved, and the cleaning property is excellent. Further, by setting the alkanolamine (component B) to a specific range, corrosion of copper is suppressed. Further, by setting each component to a specific amount, the foaming property and safety are favorably maintained. However, the invention may also be construed without being limited to this mechanism.

In the present invention, "flux" means a rosin-based flux containing rosin or a rosin derivative used in welding, and "welding" in the present invention includes reflow type and fluid type welding. In the present invention, "solder flux" means a mixture of solder and flux. When another member (for example, a semiconductor wafer, a wafer type capacitor, or another circuit board) is mounted on a circuit board and mounted, a space (gap) is formed between the circuit board and the other member. The solder used for the above-described soldering is soldered by reflow or the like, and remains in the gap as a flux residue. In the present invention, the "cleaner composition for removing solder flux residue" means a detergent composition for cleaning a flux residue after soldering using a flux or a solder flux. The solder is preferably a lead-free (Pb) solder from the viewpoint of exhibiting a remarkable effect of the detergency of the detergent composition of the present invention and the permeability to a narrow gap.

[ingredient A]

Component A in the detergent composition of the present invention is one or more (poly)ethylene glycol monoalkyl ethers represented by the following formula (I).

In the formula (I), R represents a hydrocarbon group having 3 to 7 carbon atoms, and n is 1 to 5. ]

In the above formula (I), from the viewpoint of improving the detergency of the flux residue remaining in the gap, R is preferably a hydrocarbon group having 3 to 7 carbon atoms, preferably a hydrocarbon group having 3 to 6 carbon atoms, and more preferably Good for A hydrocarbon group having 4 to 6 carbon atoms. R, in one or more embodiments, includes propyl, butyl, pentyl, hexyl. The average addition mole number n is from 1 to 5, preferably from 1 to 3, more preferably 2 or 3 from the viewpoint of improving the detergency of the flux residue remaining in the gap. The hydrocarbon group is preferably an alkyl group, an alkenyl group and an aryl group, more preferably an alkyl group.

Component A in the detergent composition of the present invention contains at least diethylene glycol monobutyl ether (in the formula (I), R is a butyl group, n = 2). In the present invention, the butyl group means n-butyl group unless otherwise specified.

In the one or more embodiments, the component A other than the diethylene glycol monobutyl ether is preferably a diethylene glycol single from the viewpoint of improving the detergency of the flux residue remaining in the gap. Diethylene glycol monoalkyl ether such as diisopropyl ether, diethylene glycol monoisobutyl ether or diethylene glycol monohexyl ether; diethylene glycol monoalkenyl ether such as diethylene glycol monoallyl ether; a diethylene glycol monoaryl ether such as diol monobenzyl ether; a triethylene glycol monoalkyl ether such as triethylene glycol monoisopropyl ether, triethylene glycol monobutyl ether or triethylene glycol monoisobutyl ether; Triethylene glycol monoalkenyl ether such as triethylene glycol monoallyl ether; tetraethylene glycol monoalkyl ether such as tetraethylene glycol monobutyl ether; pentaethylene glycol monoalkyl group such as pentaethylene glycol monobutyl ether ether. Among these ethers, diethylene glycol monoisopropyl ether, diethylene glycol monoisobutyl ether, diethylene glycol monohexyl ether, and triethylene glycol monoisopropyl ether are more preferable from the same viewpoint. Further, in the one or more embodiments, the component A other than the diethylene glycol monobutyl ether is preferably triethylene glycol monobutyl ether from the viewpoint of improving the permeability to the narrow gap.

Further, in the component A of the detergent composition of the present invention, as a component other than diethylene glycol monobutyl ether (flash point 120 ° C), in one or more embodiments, the self-flash point is high. Further, it is excellent in safety and excellent in the detergency of the flux residue remaining in the gap, preferably diethylene glycol monoisobutyl ether (flash point 112 ° C), diethylene glycol alone Ether (flash point 141 ° C), diethylene glycol monobenzyl ether (flash point 158 ° C), triethylene glycol monoisopropyl ether, triethylene glycol monobutyl ether (flash point 156 ° C), triethylene glycol single Isobutyl ether, triethylene glycol monoallyl ether. Among these ethers, from the same viewpoint, it is more preferably diethylene glycol monobutyl ether, Diethylene glycol monoisobutyl ether, diethylene glycol monohexyl ether, triethylene glycol monoisopropyl ether.

Further, in the component A of the detergent composition of the present invention, as a component other than diethylene glycol monobutyl ether, in one or more embodiments, safety from not only the distance from the flash point but also From the viewpoint of excellent detergency of the flux residue remaining in the gap, excellent water solubility, and excellent formulation, diethylene glycol monoisobutyl ether, diethylene glycol monobenzyl ether, and three are preferable. Ethylene glycol monoisopropyl ether, triethylene glycol monobutyl ether, triethylene glycol monoisobutyl ether, triethylene glycol monoallyl ether. Among these ethers, from the same viewpoint, it is more preferably diethylene glycol monobutyl ether, diethylene glycol monoisobutyl ether, diethylene glycol monobenzyl ether, triethylene glycol monoisopropyl ether, triethyl The diol monobutyl ether, triethylene glycol monoisobutyl ether, triethylene glycol monoallyl ether, further preferably diethylene glycol monobutyl ether, diethylene glycol monoisobutyl ether, triethylene glycol single Isopropyl ether.

In the one or more embodiments, the content of the component A in the detergent composition of the present invention is 88.0 by mass from the viewpoint of improving the detergency of the flux residue remaining in the gap. % or more, preferably 88.5 mass% or more, more preferably 89.0 mass% or more, further preferably 89.4 mass% or more. Further, the content of the component A is, in one or more embodiments, from the same viewpoint, it is 94.4% by mass or less, preferably 93.0% by mass or less, more preferably 92.0% by mass or less, further preferably It is 91.0% by mass or less. In addition, in one or more embodiments, the content of the component A is from 88.0% by mass to 94.4% by mass, preferably from 8.85% by mass to 93.0% by mass, more preferably from the same viewpoint. It is preferably 89.0% by mass or more and 92.0% by mass or less, and more preferably 89.4% by mass or more and 91.0% by mass or less. As described above, the component A contains diethylene glycol monobutyl ether, but may be diethylene glycol monobutyl ether alone or may contain the above formula (I) other than diethylene glycol monobutyl ether. One or more compounds.

In the case of the content of the diethylene glycol monobutyl ether in the detergent composition of the present invention in the component A, in one or more embodiments, the cleaning of the flux residue remaining in the gap is improved. From the viewpoint of properties, it is 90.0% by mass or more, preferably 93.0% by mass. The amount is more preferably 94.0% by mass or more, further preferably 96.0% by mass or more, and still more preferably 98.0% by mass or more. Further, the content of the diethylene glycol monobutyl ether in the component A is, in one or more embodiments, 100.0% by mass or less from the same viewpoint.

For the content of diethylene glycol monobutyl ether in the detergent composition of the present invention, in one or more embodiments, self-improving the flux residue remaining in the gap The viewpoint of the detergency is preferably 88.0% by mass or more, more preferably 88.5 mass% or more, further preferably 89.0 mass% or more, and still more preferably 89.4 mass% or more. Further, the content of the diethylene glycol monobutyl ether in the detergent composition is preferably, in one or more embodiments, from the same viewpoint, it is preferably 94.4% by mass or less, more preferably 93.0% by mass. The amount is more preferably 92.0% by mass or less, and still more preferably 91.0% by mass or less. In addition, in one or more embodiments, the content of diethylene glycol monobutyl ether is preferably 88.0% by mass or more and 94.4% by mass or less, and more preferably 88.5 % by mass or more from the same viewpoint. Further, it is 93.0% by mass or less, more preferably 89.0% by mass or more and 92.0% by mass or less, and still more preferably 89.4% by mass or more and 91.0% by mass or less.

In the case where the component A other than diethylene glycol monobutyl ether is contained in the detergent composition of the present invention, the content thereof in the component A (in the case of a plurality of cases, the total content) is In one or more embodiments, from the viewpoint of preventing the improvement of the detergency of the flux residue remaining in the gap, it is preferably 10% by mass or less, more preferably 7.0% by mass or less, further preferably 6.0% by mass or less, more preferably 4.0% by mass or less, still more preferably 2.0% by mass or less.

In the case where the detergent composition of the present invention contains the component A other than diethylene glycol monobutyl ether, its content in the detergent composition (in a plurality of cases, the total content) In one or more embodiments, from the viewpoint of not impeding the improvement of the detergency of the flux residue remaining in the gap, it is preferably 8.0% by mass or less, more preferably 6.0% by mass or less, and more preferably 5.0% by mass or less. Further, in the case where the detergent composition of the present invention contains the component A other than diethylene glycol monobutyl ether, its content in the detergent composition (in a plurality of cases, the total content) In one or more embodiments, it is preferably 1.0% by mass or more, more preferably 2.0% by mass or more, and still more preferably 3.0% by mass or more.

[ingredient B]

Component B in the detergent composition of the present invention is one or more of the alkanolamines represented by the following formula (II).

[In the above formula (II), R ₁ is a hydrogen atom, a methyl group, an ethyl group or an aminoethyl group, R ₂ is a hydrogen atom, a hydroxyethyl group, a hydroxypropyl group, a methyl group or an ethyl group, and R ₃ is a hydroxy group B. Base or hydroxypropyl. ]

As the alkanolamine of the component B, in one or more embodiments, monoethanolamine, diethanolamine, an alkylate thereof, and an aminoalkylate may be mentioned, since the flux residue remaining in the gap is increased. From the viewpoint of detergency, preferred are monoethanolamine, diethanolamine, monomethylmonoethanolamine, monomethyldiethanolamine, dimethylmonoethanolamine, monoethylmonoethanolamine, monoethyldiethanolamine, and monoamine B. The isopropanolamine is more preferably diethanolamine, monoethylmonoethanolamine, monomethyldiethanolamine or monoaminoethylisopropanolamine, and further preferably monoethylmonoethanolamine and monomethyldiethanolamine.

In the one or more embodiments, the content of the component B in the detergent composition of the present invention is 0.3 mass from the viewpoint of improving the detergency of the flux residue remaining in the gap. % or more, preferably 0.5% by mass or more, more preferably 1.0% by mass or more, and still more preferably 1.5% by mass or more. In addition, in one or more embodiments, the content of the component B is 5.0% by mass or less, preferably 4.5% by mass or less, more preferably 4.0% by mass or less, further preferably from the same viewpoint. Is 3.5% by mass under. In addition, in one or more embodiments, the content of the component B is 0.3% by mass or more and 5.0% by mass or less, preferably 0.5% by mass or more and 4.5% by mass or less, more preferably from the same viewpoint. It is preferably 1.0% by mass or more and 4.0% by mass or less, and more preferably 1.5% by mass or more and 3.5% by mass or less. As described above, the component B may be a single compound represented by the above formula (II), or may contain a plurality of compounds represented by the above formula (II).

[ingredient C]

The component C in the detergent composition of the present invention contains one or more alkylbenzenesulfonic acids having an alkyl group having 1 to 6 carbon atoms and/or a salt thereof. The alkylbenzenesulfonic acid may have a plurality of alkyl groups, and in this case, the total number of carbon atoms of the plurality of alkyl groups is 1-6. With respect to the carbon number of the alkyl group in the alkylbenzenesulfonic acid of the component C and/or its salt, in one or more embodiments, the viewpoint of improving the detergency of the flux residue remaining in the gap Starting, it is 1-6, preferably 1-4, more preferably 1-3, still more preferably 1 or 2, still more preferably 1. The salt of an alkylbenzenesulfonic acid having an alkyl group having 1 to 6 carbon atoms is preferably an alkali metal salt such as sodium or potassium, an ammonium salt or an organic amine salt, from the viewpoint of allowing the composition to be a detergent. From the viewpoint of the stability of the semiconductor quality, an ammonium salt or an organic amine salt in which metal ions do not remain is more preferable. Further, the organic amine salt may also be a salt based on the component B.

The alkylbenzenesulfonic acid and/or its salt contained in the component C may, in one or more embodiments, be a toluene from the viewpoint of improving the detergency of the flux residue remaining in the gap. Sulfonic acid, xylenesulfonic acid, ethylbenzenesulfonic acid, propylbenzenesulfonic acid, cumenesulfonic acid, butylbenzenesulfonic acid, pentylbenzenesulfonic acid, hexylbenzenesulfonic acid, 2,4-dimethyl Alkylbenzenesulfonic acid, dipropylbenzenesulfonic acid, and/or a salt thereof, which may be any of an ortho, meta or para. In one or more embodiments, component C is more preferably p-toluenesulfonic acid, xylenesulfonic acid, ethylbenzenesulfonic acid, butylbenzenesulfonic acid, and/or a salt thereof from the same viewpoint, and further preferably. For p-toluenesulfonic acid.

In one or more embodiments, the content of the component C in the detergent composition of the present invention is 0.3% by mass or more and 5.0% by mass or less. From the viewpoint of the cleaning power of the flux residue, it is preferably 0.4% by mass or more, more preferably 0.5% by mass or more, and from the viewpoint of improving the permeability of the detergent composition in the gap, It is preferably 4.5% by mass or less, more preferably 4.0% by mass or less, still more preferably 3.0% by mass or less. As described above, the component C may be a single compound or may contain a plurality of compounds. The content of the component C in the case where the component C is a salt is calculated in terms of an acid form.

[ingredient D]

Component D in the detergent composition of the present invention is water. As the water, distilled water, ion-exchanged water, or ultrapure water can be used. In one or more embodiments, the content of the component D in the detergent composition of the present invention is preferably 5.0% by mass or more, and more preferably 5.5% by mass from the viewpoint of reducing flammability. The above is more preferably 6.5 mass% or more. In addition, the content of the component D is preferably 10.0% by mass or less, more preferably 9.0, from the viewpoint of improving the detergency of the flux residue remaining in the gap in one or more embodiments. The mass% or less is more preferably 8.0 mass% or less. In one or more embodiments, the content of the component D is preferably 5.0% by mass or more from the viewpoint of improving the detergency of the flux residue remaining in the gap and reducing the flammability. Further, it is 10.0% by mass or less, more preferably 5.5% by mass or more and 9.0% by mass or less, further preferably 6.5% by mass or more and 8.0% by mass or less.

In the one or more embodiments, the mass ratio [A/D] of the component A to the component D is preferably 10.0 or more from the viewpoint of improving the detergency of the flux residue remaining in the gap. More preferably, it is 11.0 or more, and further preferably 12.0 or more. In the mass ratio [A/D] of the component A to the component D, in one or more embodiments, the safety is improved from the viewpoint of improving the detergency of the flux residue remaining in the gap and reducing the flash point. From the viewpoint of properties, it is preferably 19.0 or less, more preferably 17.0 or less, still more preferably 14.0 or less.

The mass ratio of the components A, B and C in the detergent composition of the present invention (ingredient A/forming In the case of the component B or the component C), it is preferred from the viewpoint of improving the handleability of the detergent composition and improving the detergency of the flux residue remaining in the gap in one or more embodiments. 89.7-99.4/0.3-5.4/0.3-5.4, more preferably 91.0-98.6/1.0-5.0/0.4-4.0, further preferably 94.0-98.0/1.5-4.0/0.5-2.0. The total of the component A, the component B, and the component C was 100.0.

[Other components of the detergent composition]

With respect to the total content of the components A, B, C and D in the detergent composition of the present invention, in one or more embodiments, the viewpoint of improving the detergency of the flux residue remaining in the gap The starting point is preferably 98.0% by mass or more and 100% by mass or less, more preferably 99.0% by mass or more and 100% by mass or less, further preferably 99.5% by mass or more and 100% by mass or less, and still more preferably 99.7% by mass or more. And 100% by mass or less. Therefore, in the one or more embodiments, the detergent composition of the present invention may preferably be 0% by mass or more and 2.0% by mass or less, more preferably 0% by mass or more and 1.0% by mass or less. Further, it is more preferably 0% by mass or more and 0.3% by mass or less, and still more preferably 0% by mass or more and 0.1% by mass or less.

The other component in the detergent composition of the present invention may, in one or more embodiments, be a polyalkylene glycol alkylamine type nonionic surfactant from the viewpoint of improving the cleaning property. The polyalkylene glycol alkylamine type nonionic surfactant may, in one or more embodiments, be a compound represented by the following formula (III).

In the formula (III), R ₄ represents a hydrocarbon group having a carbon number of 8 to 18, EO represents an oxyethylene group, and n and m each represent an average addition molar number of EO. ]

In the above formula (III), R _{4 is} preferably a hydrocarbon group having 10 to 14 carbon atoms from the viewpoint of improving the cleaning property, and from the same viewpoint, n + m is preferably 3 or more and 6 or less.

As other components in the detergent composition of the present invention, in one or more other In the embodiment, from the viewpoint of suppressing foaming property, a hydrocarbon having 10 to 18 carbon atoms with or without an unsaturated bond can be cited. As a hydrocarbon, in one or more embodiments, dodecene and tetradecene are mentioned from the same viewpoint.

The other component in the detergent composition of the present invention may, for example, be a nonionic surfactant represented by the following formula (IV).

In the formula (IV), R ₅ represents a hydrocarbon group having a carbon number of 8 to 18, EO represents an oxyethylene group, and PO represents an oxypropylene group. p, q, and r represent the average addition moles of EO and PO, respectively, which are 0-15, and p and r are different at 0, and q is 0. p+r 30, r=0 in the case of q=0. ]

Further, as the other component, the detergent composition of the present invention can be used in combination with hydroxyethylaminoacetic acid or hydroxyethyl group which is usually used in a detergent as appropriate within the range which does not impair the effects of the present invention. Chelating compound, preservative, rust inhibitor, bactericide, antibacterial agent, anthrone ketone antifoaming agent, antioxidant, coconut oil fatty acid A, such as amino carboxylic acid such as aminodiacetic acid and ethylenediaminetetraacetic acid An ester or an alcohol such as an ester or a benzyl acetate.

In the case where the detergent composition of the present invention contains an anthrone-based antifoaming agent, the content thereof is preferably an effective amount which exhibits an effect of suppressing foaming property, and more preferably 0.01% by mass or more and 0.6% by mass. In the following, it is more preferably 0.03 mass% or more and 0.5 mass% or less, and still more preferably 0.05 mass% or more and 0.3 mass% or less.

[Preparation method of detergent composition]

The preparation method of the detergent composition in the present invention is not limited, and it can be prepared by mixing the component A, the component B, the component C, and the component D.

[pH of detergent composition]

In the one or more embodiments, the pH of the detergent composition of the present invention is preferably pH 8 or higher and pH 14 or lower from the viewpoint of improving the cleaning power of the flux residue remaining in the gap. . The pH can be appropriately mixed with the nitrate according to the required amount as needed. An organic acid other than the component C such as an inorganic acid such as an acid or a sulfuric acid, a hydroxycarboxylic acid, a polyvalent carboxylic acid, an amine polycarboxylic acid or an amino acid, and a metal salt or an ammonium salt thereof, ammonia, sodium hydroxide or potassium hydroxide. The amine or the like is adjusted in addition to the basic substance other than the component B.

[Washing method of flux residue]

In another embodiment of the present invention, a method of cleaning a solder flux residue (hereinafter also referred to as a cleaning method of the present invention) includes: washing a solder having a reflowed solder and the washing of the present invention The step of contacting the detergent composition. In one or more embodiments, the cleaning method of the present invention has a step of washing the washed product having the solder after reflow using the detergent composition of the present invention. As a method of bringing the object to be washed into contact with the detergent composition of the present invention or a method of washing the object to be washed by the detergent composition of the present invention, in one or more embodiments, A method of contacting in a bath of an ultrasonic cleaning device, a method of spraying the detergent composition in a spray form and bringing it into contact (spraying method), and the like are exemplified. The detergent composition of the present invention can be used directly for washing without dilution. The cleaning method of the present invention preferably comprises the steps of: after contacting the detergent composition with the object to be washed, rinsing with water and drying. According to the cleaning method of the present invention, it is possible to effectively clean the flux residue remaining in the gap between the welded components. The solder is preferably a lead-free (Pb) solder from the viewpoint of the detergency of the cleaning method according to the present invention and the permeability to the narrow gap. In one or more embodiments, the cleaning method of the present invention is preferably a detergent composition and a laundry according to the present invention from the viewpoint of easily exhibiting the detergency of the detergent composition of the present invention. When the contact is irradiated with ultrasonic waves, it is better that the ultrasonic wave is stronger. As the above ultrasonic wave, in one or more embodiments, it is preferably 26-72 Hz, 80-1500 W, more preferably 36-72 Hz, or 80-1500 W.

[washed]

The detergent composition of the present invention is used in the cleaning of electronic components in one or more embodiments. In one or more embodiments, the object to be washed may be a washed object having solder after reflow, and in one or more embodiments, a part may be mentioned. An intermediate for manufacturing an electronic component obtained by soldering, or a manufacturing intermediate containing a flux residue in a gap between the components after soldering. The above-described manufacturing intermediate is an intermediate product in a manufacturing step of an electronic component including a semiconductor component or a semiconductor device, and includes, for example, a semiconductor wafer, a wafer type capacitor, and a circuit mounted on a circuit substrate by soldering using a flux. An object made of a substrate or the like. The gap in the object to be cleaned is, for example, a space formed between a circuit board and a member (a semiconductor wafer, a chip capacitor, a circuit board, or the like) that is mounted on the circuit board by soldering, and the height (parts) The distance between them is, for example, a space of 5 to 500 μm, 10 to 250 μm, or 20 to 100 μm. The width and depth of the gap depend on the size and spacing of the components to be mounted and the electrodes (land) on the circuit substrate.

[Manufacturing method of electronic components]

A method of manufacturing an electronic component according to the present invention includes the steps of: mounting at least one member selected from the group consisting of a semiconductor wafer, a wafer type capacitor, and a circuit substrate on a circuit substrate by soldering using a flux; and by the present invention The cleaning method is a step of washing the above-mentioned mounted object. In the case of soldering using a flux, in one or more embodiments, the lead-free solder may be used, and the reflow method may be a fluid method. The electronic component includes a semiconductor component in which a semiconductor wafer is not mounted, a semiconductor component on which a semiconductor wafer is mounted, and a semiconductor device. The method for producing an electronic component of the present invention reduces the flux residue remaining in the gap of the soldered component by performing the cleaning method of the present invention, and suppresses the short circuit between the electrodes due to the residue of the flux residue or The adhesion is poor, whereby the manufacture of highly reliable electronic components can be performed. Further, by performing the cleaning method of the present invention, it is easy to wash the flux residue remaining in the gap between the welded components, whereby the cleaning time can be shortened, and the manufacturing efficiency of the electronic component can be improved. .

The invention also relates to one or more of the embodiments described below.

<1> A detergent composition for removing a flux flux residue, which contains the following formula a compound (component A) represented by the formula (I), a compound represented by the following formula (II) (component B), an alkylbenzenesulfonic acid having an alkyl group having 1 to 6 carbon atoms, and/or a salt thereof (component C) And water (component D), the content of the component A is 88.0% by mass or more and 94.4% by mass or less, and the content of the diethylene glycol monobutyl ether in the component A is 90.0% by mass or more and 100.0% by mass or less, and the component B The content of the component C is 0.3% by mass or more and 5.0% by mass or less, and the content of the component C is 0.3% by mass or more and 5.0% by mass or less.

[In the above formula (I), R represents a hydrocarbon group having 3 to 7 carbon atoms, and n is 1 to 5. ]

[In the above formula (II), R ₁ is a hydrogen atom, a methyl group, an ethyl group or an aminoethyl group, R ₂ is a hydrogen atom, a hydroxyethyl group, a hydroxypropyl group, a methyl group or an ethyl group, and R ₃ is a hydroxy group B. Base or hydroxypropyl. ]

<2> The detergent composition according to <1>, wherein the content of the component A is preferably 88.0% by mass or more, more preferably 88.5 mass% or more, further preferably 89.0 mass% or more, and further preferably further It is 89.4% by mass or more.

<3> The detergent composition according to <1> or <2>, wherein the content of the component A is preferably 94.4% by mass or less, more preferably 93.0% by mass or less, still more preferably 92.0% by mass or less. Further, it is more preferably 91.0% by mass or less.

The detergent composition according to any one of the aspects of the present invention, wherein the content of the component A is preferably 88.5 mass% or more and 93.0 mass% or less, more preferably 89.0 mass% or more. Further, it is 92.0% by mass or less, and more preferably 89.4% by mass or more and 91.0% by mass or less.

The detergent composition according to any one of <1> to <4>, wherein the content of diethylene glycol monobutyl ether as one of the components A in the component A is preferably 93.0% by mass The amount is more preferably 94.0% by mass or more, further preferably 96.0% by mass or more, still more preferably 98.0% by mass or more, and 100.0% by mass or less.

The detergent composition according to any one of the above-mentioned items, wherein the content of diethylene glycol monobutyl ether as one of the components A is preferably 88.0% by mass or more. More preferably, it is 88.5 mass% or more, further preferably 89.0 mass% or more, and still more preferably 89.4 mass% or more.

The detergent composition according to any one of the above-mentioned items, wherein the content of diethylene glycol monobutyl ether as one of the components A is preferably 94.4% by mass or less. More preferably, it is 93.0 mass% or less, further preferably 92.0 mass% or less, and still more preferably 91.0 mass% or less.

The detergent composition according to any one of the above-mentioned items, wherein the content of the diethylene glycol monobutyl ether as one of the components A is preferably 88.0% by mass or more. Further, it is 94.4% by mass or less, more preferably 88.5 mass% or more and 93.0 mass% or less, further preferably 89.0 mass% or more and 92.0 mass% or less, and still more preferably 89.4 mass% or more and 91.0 mass% or less.

The detergent composition according to any one of <1> to <8> wherein, in the case of the component A other than diethylene glycol monobutyl ether, it is in the component A. The content is preferably 10% by mass or less, more preferably 7.0% by mass or less, still more preferably 6.0% by mass or less, still more preferably 4.0% by mass or less, and still more preferably 2.0% by mass or less.

The detergent composition according to any one of <1> to <9> wherein, in the case of the component A other than diethylene glycol monobutyl ether, the content is preferably 8.0. The mass% or less, more preferably 6.0% by mass or less, further preferably 5.0% by mass or less.

The detergent composition according to any one of <1> to <10> wherein, in the case of the component A other than diethylene glycol monobutyl ether, the content is preferably 1.0. The mass% or more, more preferably 2.0% by mass or more, further preferably 3.0% by mass or more.

The detergent composition according to any one of <1> to <11>, wherein, in the formula (I), R is preferably a hydrocarbon group having a carbon number of 3 to 6, more preferably a carbon number of 4 a hydrocarbon group of -6.

The detergent composition according to any one of <1> to <12> wherein, in the formula (I), the average addition molar number n is preferably 1-3, more preferably 2 Or 3.

The detergent composition according to any one of the aspects of the present invention, wherein the content of the component B is preferably 0.3% by mass or more, more preferably 0.5% by mass or more, further preferably 1.0% by mass or more, and more preferably 1.5% by mass or more.

The detergent composition according to any one of the aspects of the present invention, wherein the content of the component B is preferably 5.0% by mass or less, more preferably 4.5% by mass or less, further preferably 4.0% by mass or less, and more preferably 3.5% by mass or less.

The detergent composition according to any one of the aspects of the present invention, wherein the content of the component B is preferably 0.5% by mass or more and 4.5% by mass or less, more preferably 1.0% by mass or more. It is 4.0% by mass or less, and more preferably 1.5% by mass or more and 3.5% by mass or less.

The detergent composition according to any one of <1> to <16>, wherein the content of the component C is preferably 0.4% by mass or more, more preferably 0.5% by mass or more.

The detergent composition according to any one of the aspects of the present invention, wherein the content of the component C is preferably 4.5% by mass or less, more preferably 4.0% by mass or less, further preferably 3.0% by mass or less.

The detergent composition according to any one of the aspects of the present invention, wherein the content of the component D is preferably 5.0% by mass or more, more preferably 5.5% by mass or more, and still more preferably 6.5 mass% or more.

The detergent composition according to any one of the aspects of the present invention, wherein the content of the component D is preferably 10.0% by mass or less, more preferably 9.0% by mass or less, further preferably 8.0% by mass or less.

The detergent composition according to any one of <1> to <20>, wherein the content of the component D is preferably 5.0% by mass or more and 10.0% by mass or less, more preferably 5.5% by mass. The amount is 9.0% by mass or less, and more preferably 6.5 mass% or more and 8.0 mass% or less.

The detergent composition according to any one of <1> to <21>, wherein the mass ratio of the component A to the component D [component A/component D] is preferably 10.0 or more, more preferably 11.0 or more, further preferably 12.0 or more.

The detergent composition according to any one of the above aspects, wherein the mass ratio of the component A to the component D [component A/component D] is preferably 19.0 or less, more preferably 17.0 or less, further preferably 14.0 or less.

The detergent composition according to any one of <1> to <22> wherein the mass ratio of the components A, B and C (component A/component B/component C) is preferably 89.7- 99.4/0.3-5.4/0.3-5.4, more preferably 91.0-98.6/1.0-5.0/0.4-4.0, further preferably 94.0-98.0/1.5-4.0/0.5-2.0, component A, component B and component C The total is 100.0.

<25> The detergent composition according to any one of <1> to <23> which further comprises a polyalkylene glycol alkylamine type nonionic surfactant.

The detergent composition according to any one of <1> to <25> wherein the solder is a lead-free (Pb) solder.

<27> A method of cleaning a solder flux residue, which has the following steps: using the detergent composition according to any one of <1> to <26> for a washed product having a solder after reflow Wash it out.

<28> The cleaning method according to <27>, wherein the object to be cleaned is an intermediate material for manufacturing an electronic component obtained by using a solder joint member.

<29> A method of manufacturing an electronic component, comprising the steps of: mounting at least one member selected from the group consisting of a semiconductor wafer, a wafer type capacitor, and a circuit substrate on a circuit board by soldering using a flux; The step of washing the mounted material by the method of cleaning the flux residue as described in <27> or <28>.

The detergent composition according to any one of <1> to <26>, which is washed in the electronic component Application in .

Example 1. Preparation of detergent composition (Examples 1-16, Comparative Examples 1-16)

The detergent compositions of Examples 1 to 16 and Comparative Examples 1 to 16 were prepared by mixing the components A-D shown in the following Tables 1 and 2 and the other components (Table 1 and Table 2) as needed. The values of the components A-D and other components in the following Tables 1 and 2 indicate the content (% by mass) in the prepared detergent composition.

The substances represented by "*1", "*2" and "*3" in Tables 1 and 2 as the other components are the following compounds.

Component *1: a polyalkylene glycol alkylamine type nonionic surfactant represented by the following formula (III). Among them, a compound in which R ₄ is a hydrocarbon group having 12 carbon atoms and n + m is 4 is used.

In the formula (III), R ₄ represents a hydrocarbon group having a carbon number of 8 to 18, EO represents an oxyethylene group, and n and m each represent an average addition molar number of EO. ]

Component *2: A polyoxyethylene oxypropylene alkyl ether type nonionic surfactant represented by the following formula (IV). Among them, a compound in which R ₅ is a hydrocarbon group having 12 or 14 carbon atoms, p = 5, q = 2, and r = 5 is used.

In the formula (IV), R ₅ represents a hydrocarbon group having a carbon number of 8 to 18, EO represents an oxyethylene group, and PO represents an oxypropylene group. p, q, and r represent the average addition moles of EO and PO, respectively, which are 0-15, and p and r are different at 0, and q is 0. p+r 30. In the case of q=0, r=0. ]

Component *3: a polyoxyethylene oxypropylene alkyl ether type nonionic surfactant represented by the above formula (IV). Among them, a compound in which R ₅ is a secondary hydrocarbon group having 12 carbon atoms and p = 7 and q = r = 0 is used.

2. Evaluation of detergent composition

Using the prepared detergent compositions of Examples 1 to 16 and Comparative Examples 1 to 16, the test substrate was cleaned (detergency 1 and 2), glass capillary test, cleaning property, corrosiveness, foaming Sex, and safety were tested and evaluated. The results are shown in Tables 1 and 2.

[washability test (detergency 1)]

The detergency test of the cleaning test substrate was carried out under the following conditions.

[Test substrate]

A test substrate (50 mm × 50 mm, and a gap between the wafer capacitor and the substrate of about 50 μm) equipped with 10 wafer capacitors (0816) was used. The flux used was lead-free ECO SOLDER M705-BPS (manufactured by Senju Metal Industry Co., Ltd.), and the reflow furnace used ECO-REFLOW SNR825 (manufactured by Senju Metal Industry Co., Ltd.) at a reflow peak temperature of 240 ° C, a solder melting time of 45 seconds, and a nitrogen atmosphere. Lower (oxygen concentration: 100 ppm), solder connection.

[Washing method]

Wash and spray to wash. For the wafer capacitor of the test substrate, the soldering surface is facing up, and the fan-shaped nozzle VVP9060 (manufactured by IKEUCHI) is pressed at a pressure of 0.3 MPa (flow rate: 6 liters/min), and sprayed from top to bottom (distance: 5 cm) to make the test substrate 0.5 m. /minute to move left and right, and wash for 2 minutes. After washing, pre-rinsing and final washing were carried out under the conditions of one each. The test substrate was fixed for 2 minutes between the nozzles with a full-cone nozzle (manufactured by IKEUCHI) having a horizontally opposed distance of 27 cm and a pressure of 0.3 MPa (flow rate of 0.6 liter/min). After the final rinse, the test substrate was dried using a blow dryer (85 ° C, 15 minutes). Further, each of the detergent compositions used and the ion exchange water for washing were heated to 60 °C.

[evaluation of detergency]

The wafer capacitor was peeled off from the dried test substrate, and the presence or absence of the residue of the flux was confirmed by an optical microscope. The evaluation criteria are as follows. The results are shown in the column of "Detergency 1" in Tables 1 and 2.

A: 0 of the 10 residues

B: 1 of the 10 residues

C: 2 or more of the remaining residues are more than 2

[washability test (detergency 2)]

The washing time was shortened to 1 minute by the same method as the above-described detergency test (detergency 1), and the evaluation was performed. The results are shown in the column of "Detergency 2" in Tables 1 and 2.

[Glass Capillary Test]

ECO SOLDER M705-BPS (manufactured by Senju Metal Industry Co., Ltd.) was heated at 250 ° C for 30 minutes on a copper plate under a nitrogen atmosphere to separate and collect a liquid flux residue. A glass microcapacitor (glass capillary) (length 32 mm, inner diameter 140 μm) manufactured by DRUMMOND was filled with the flux residue prepared by the above method, and one opening was sealed to prepare a test piece. 100 g of each of the detergent composition and the ion exchange water for washing was placed in a 100 mL beaker and heated to 60 °C. The test piece was immersed in each of the detergent compositions and irradiated for 5 minutes for ultrasonic waves (40 kHz, 200 W), and then transferred to ion-exchange water for washing and irradiated for 5 minutes for ultrasonic waves (40 kHz, 200 W), and then taken out. The taken test piece was observed with an optical microscope, and the distance of the dissolved flux residue from the opening was measured, and the average value of 5 points was calculated. It can be evaluated that the longer the distance after the flux residue is dissolved, the faster the dissolution rate and the better the detergency. The results are shown in Tables 1 and 2.

[cleaning property]

Under a nitrogen atmosphere, ECO SOLDER M705-BPS (manufactured by Senju Metal Industry Co., Ltd.) was heated on a copper plate at 250 ° C for 30 minutes to separate and collect a liquid flux residue. The flux residue was mixed with each detergent composition to prepare a 1% by mass mixed liquid. About 0.1 g of the mixture prepared by the above method was added dropwise to a cover slip (18 mm × 18 mm, manufactured by Songlang Glass Industry Co., Ltd.), and another cover glass was overlapped thereon, using a clip ( A test piece was prepared by sandwiching one side and fixing it by a width of 19 mm and a Kokuyo (manufactured by Kokuyo Co., Ltd.). 100 g of ion-exchanged water for washing was placed in a 100 mL beaker and heated to 60 °C. use While holding the test piece, the tweezers were immersed for 1 minute while shaking up and down for 10 times in the ion exchange water for washing, and taken out. The taken-out test piece was dried using a vacuum dryer (120 ° C, 15 minutes). The test piece was observed, and the number of times of washing until there was no residue between the coverslips of the square was calculated. It can be evaluated that the less the number of cleanings, the better the cleaning performance. The results are shown in Tables 1 and 2. In addition, the case where the cleaning cannot be performed after 5 times of cleaning is set to ">5".

[corrosive]

Each of the detergent compositions was filled in a 1 L beaker and heated to 60 ° C, and a copper plate (30 mm × 50 mm) having a thickness of 1 mm was placed therein and immersed for 10 minutes. Then, it was sufficiently washed with ion-exchanged water, and dried by a blow dryer (85 ° C, 15 minutes) to observe the surface state of the copper plate. The evaluation criteria are as follows. The results are shown in Tables 1 and 2.

A: no discoloration

B: There is discoloration

[foaming property]

ECO SOLDER M705-BPS (manufactured by Senju Metal Industry Co., Ltd.) was heated at 250 ° C for 30 minutes on a copper plate under a nitrogen atmosphere to separate and collect a liquid flux residue. Each of the detergent compositions containing 1% by mass of the flux residue prepared under the above conditions was diluted 10 times with ion-exchanged water, and 50 mL of the detergent composition was added to a 200 mL stoppered volumetric flask, and heated to 60 ° C. Oscillation 30 times. The bubble height after 1 minute was measured and evaluated based on the following criteria. The results are shown in Tables 1 and 2.

A: no bubble

B: less than 5mL

C: 5mL or more

[safety]

The evaluation as described below was carried out based on the flash point of each detergent composition. In addition, when ignition is performed at 100 ° C of the boiling point of water, the risk of fire formation becomes high. The safety evaluation was performed based on the flash point based on 110 ° C which is 10 ° C higher than the boiling point of water. Table 1 and The results are shown in Table 2.

A: The flash point is above 110 °C

B: The flash point is less than 110 ° C

As shown in the above Tables 1 and 2, the detergent compositions of Examples 1 to 16 exhibited superior detergency and glass compared with the detergent compositions of Comparative Examples 1-10 and 12-16. The results of the capillary test (permeability) and cleanability also showed generally excellent results. Further, the detergent compositions of Examples 1 to 13 were superior in safety (high flash point) as compared with the detergent composition of Comparative Example 11.

As shown in Tables 1 and 2 above, a polyalkylene glycol alkylamine type nonionic boundary is added. The detergent composition of Example 8 of the surfactant was particularly excellent in cleanability. Further, the detergent compositions of Examples 7 and 12 containing a hydrocarbon or an anthrone-based antifoaming agent are particularly excellent in low foaming property.

Industrial availability

By using the present invention, the cleaning of the flux residue remaining in the gap of the welded component can be performed satisfactorily, and thus, for example, the step of cleaning the flux residue in the manufacturing process of the electronic component can be shortened and the manufacturing can be improved. The performance reliability of the electronic component can improve the productivity of the semiconductor device.

Claims (16)

A detergent composition for removing a flux flux residue, which comprises a compound represented by the following formula (I) (component A), a compound represented by the following formula (II) (ingredient B), and having a carbon number of 1 The alkylbenzenesulfonic acid having a -6 alkyl group and/or a salt thereof (component C) and water (component D) have a content of the component A of 88.0% by mass or more and 94.4% by mass or less, and the component A, the second component The content of the alcohol monobutyl ether is 90.0% by mass or more and 100.0% by mass or less, the content of the component B is 0.3% by mass or more and 5.0% by mass or less, and the content of the component C is 0.3% by mass or more and 5.0% by mass or less. In the formula (I), R represents a hydrocarbon group having 3 to 7 carbon atoms, and n is 1 to 5, In the formula (II), R ₁ is a hydrogen atom, a methyl group, an ethyl group or an aminoethyl group, R ₂ is a hydrogen atom, a hydroxyethyl group, a hydroxypropyl group, a methyl group or an ethyl group, and R ₃ is a hydroxyethyl group. Or hydroxypropyl. The detergent composition of claim 1, wherein the content of the component D is 5.0% by mass or more and 10.0% by mass or less. The detergent composition of claim 1, wherein the content of the component D is 5.0% by mass or more and 9.0% by mass or less. The detergent composition of claim 1, wherein the mass ratio of the component A to the component D, that is, the component A/component D is 10.0 or more and 19.0 or less. The detergent composition of claim 1, wherein the mass ratio of the component A to the component D, that is, the component A/component D is 11.0 or more and 19.0 or less. The detergent composition of claim 1, wherein in the detergent composition, component A, The total content of B, C and D is 99.0% by mass or more and 100% by mass or less. The detergent composition according to claim 1, wherein the total content of the components A, B, C and D in the detergent composition is 99.5% by mass or more and 100% by mass or less. The detergent composition of claim 1, which further contains an anthrone-based antifoaming agent, and the content of the antifoaming agent in the detergent composition is 0.01% by mass or more and 0.6% by mass or less. The detergent composition of claim 1, wherein component A comprises diethylene glycol monobutyl ether and triethylene glycol monobutyl ether. The detergent composition according to claim 9, wherein the content of the triethylene glycol monobutyl ether in the detergent composition is 1.0% by mass or more and 8.0% by mass or less. A detergent composition according to claim 1, wherein component B contains monoethylmonoethanolamine and monomethyldiethanolamine. The detergent composition according to any one of claims 1 to 11, wherein the detergent composition further comprises a polyalkylene glycol alkylamine type nonionic surfactant. A method of cleaning a solder flux residue, comprising the step of washing a washed product having a solder after reflow using the detergent composition according to any one of claims 1 to 12. The cleaning method of claim 13, wherein the object to be cleaned is an intermediate for manufacturing an electronic component obtained by using a soldered component. A method of manufacturing an electronic component, comprising the steps of: mounting at least one component selected from the group consisting of a semiconductor wafer, a wafer type capacitor, and a circuit substrate on a circuit substrate by soldering using a flux; and The method of cleaning the flux residue of claim 13 is a step of washing the mounted object. Use of the detergent composition according to any one of claims 1 to 12 for the cleaning of electronic components.