JPWO2020116524A1 - Detergent composition for removing flux residue - Google Patents

Abstract

In one aspect, there is provided a cleaning agent composition for removing a flux residue, which is excellent in flux removing property and tin removing property while ensuring a stable liquid state.
In one embodiment, the present disclosure comprises a solvent (component A), an amine (component B) having a Hansen solubility parameter polarity term (δp) of 7.8 or less, and a diphosphonic acid represented by the following formula (VI). The present invention relates to a flux residue removing detergent composition containing the component C), or a flux residue removing cleaning agent composition obtained by blending the component A, the component B, and the component C.

Description

The present disclosure relates to a cleaning agent composition for removing a flux residue, a cleaning method using the cleaning agent composition, and a method for manufacturing an electronic component.

In recent years, with respect to mounting electronic components on printed wiring boards and ceramic substrates, the components have become smaller from the viewpoints of low power consumption and high-speed processing, and the gaps to be cleaned have become narrower when cleaning solder flux. In addition, lead-free solder has come to be used from the viewpoint of environmental safety, and rosin-based flux has been used accordingly.

For example, International Publication No. 2011/027673 (Patent Document 1) discloses a lead-free solder water-soluble flux removing detergent containing 5 to 100 parts by weight of a glycol ether compound with respect to 100 parts by weight of water. There is.
According to International Publication No. 2005/021700 (Patent Document 2), when the content of the glycol compound is less than 1% by weight, the content of benzyl alcohol is 70 to 99.9% by weight based on the total amount. The range and the content of amino alcohol are in the range of 0.1 to 30% by weight, and when the content of glycol compound is 1 to 40% by weight, the content of benzyl alcohol is in the range of 15 to 99% by weight and amino. A cleaning agent for removing solder flux, which comprises an alcohol content in the range of 0.1 to 30% by weight, is disclosed.
Japanese Unexamined Patent Publication No. 2004-2688 (Patent Document 3) contains an organic solvent, 5 to 30% by weight of glyceryl ether having an alkyl group or an alkenyl group having 4 to 12 carbon atoms, and 5% by weight or more of water. Water-containing detergent compositions for precision parts such as metal parts, electronic parts, semiconductor parts and liquid crystal display panels are disclosed.
Japanese Patent Application Laid-Open No. 2018-21093 (Patent Document 4) describes an amine or a salt thereof having a solubility in 100 g of water at 25 ° C. or a salt thereof, a solvent having a solubility in 100 g of water at 25 ° C. of 0.02 g or more and less than 10 g, and water. The cleaning agent composition for a screen plate is disclosed, wherein the amine is at least one selected from a primary amine, a secondary amine and a tertiary amine having 6 or more and 26 or less carbon atoms.

上記式（ＶＩ）において、Ｘは炭素数１以上６以下のアルキレン基又はヒドロキシアルキレン基である。In one embodiment, the present disclosure comprises a solvent (component A), an amine (component B) having a Hansen solubility parameter polarity term (δp) of 7.8 or less, and a diphosphonic acid represented by the following formula (VI). The present invention relates to a flux residue removing detergent composition containing the component C), or a flux residue removing cleaning agent composition obtained by blending the component A, the component B, and the component C.

In the above formula (VI), X is an alkylene group or a hydroxyalkylene group having 1 or more and 6 or less carbon atoms.

The present disclosure relates to a cleaning method comprising, in one aspect, cleaning an object to be cleaned having a flux residue with the cleaning agent composition of the present disclosure.

In one aspect, the present disclosure is for mounting at least one component selected from a semiconductor chip, a chip type capacitor, and a circuit board on a circuit board by soldering using a flux, and for connecting the components and the like. The cleaning method of the present disclosure comprises at least one step selected from the steps of forming the solder bumps on the circuit board, and at least one selected from the circuit board on which the components are mounted and the circuit board on which the solder bumps are formed. The present invention relates to a method for manufacturing an electronic component, including a step of cleaning by.

In recent years, due to the miniaturization of semiconductor package substrates, the miniaturization of solder bumps and the gap between connected components have become narrower. Further, due to the miniaturization of the solder bumps and the narrowing of the gaps between the connecting parts, the cleaning agent composition disclosed in the above patent document lacks the removability of the flux residue (flux removability) and is detergency. Is no longer sufficient. Further, the detergent composition is also required to have improved removability (tin removability) for tin oxide and tin salts generated during reflow. Further, the detergent composition is required to be able to secure a stable liquid state without separation.

Therefore, the present disclosure provides a cleaning agent composition for removing a flux residue, which is excellent in flux removing property and tin removing property while ensuring a stable liquid state, a cleaning method using the same, and a method for manufacturing an electronic component.

According to the present disclosure, it is possible to provide a cleaning agent composition for removing a flux residue, which is excellent in flux removing property and tin removing property while ensuring a stable liquid state.

The present disclosure is a detergent composition containing a specific solvent (component A), a specific amine (component B), and a specific diphosphonic acid (component C), or a component A, a component B, and a component C. It is based on the finding that the flux removability and tin removability are improved as compared with the conventional case while ensuring a stable liquid state by using a cleaning agent composition containing the above.

That is, in the present disclosure, in one or more embodiments, the solvent (component A), the amine (component B) having the polarity term (δp) of the Hansen solubility parameter of 7.8 or less, and the above formula (VI) are used. A detergent composition for removing a flux residue containing the diphosphonic acid (component C) represented, or a detergent composition for removing a flux residue obtained by blending a component A, a component B, and a component C (hereinafter referred to as a cleaning agent composition for removing a flux residue). These are collectively referred to as "the detergent composition of the present disclosure"). According to the present disclosure, the flux residue can be efficiently removed in one or more embodiments. Further, according to the present disclosure, in one or more embodiments, tin oxide and tin salts generated during reflow can be efficiently removed. Further, according to the present disclosure, in one or more embodiments, a highly stable and uniformly transparent cleaning agent composition for removing flux residues can be obtained.

The details of the mechanism of action of the effect in the detergent composition of the present disclosure are unknown, but it is presumed as follows.
That is, in the detergent composition of the present disclosure, the component A (solvent) permeates the flux and the flux residue deteriorated by reflow or the like to lower the viscosity and facilitate the flow, and the component B (amine) acts to act on the flux. And the flux residue is decomposed or made hydrophilic so that it can be easily dissolved in the detergent composition.
Further, the component B (amine) increases the solubility of the flux and the flux residue in water in the rinsing step after washing, can improve the flux removability by rinsing, and can reduce the residual flux residue after washing and rinsing. It is presumed.
Further, when the component B and the component C form a salt in the cleaning agent composition of the present disclosure, a salt of the component B (amine) and the component C (diphosphonic acid) having a high affinity with tin is generated by reflow. It acts on tin oxide and tin salts adhering to the flux residue and on the object to be cleaned, making it easily soluble in the cleaning agent composition. Further, the salt of the component B and the component C increases the solubility of tin oxide or tin salt in water in the rinsing step after washing to improve the tin removal property, and tin oxide or tin salt after washing and rinsing. It is presumed that the residual of can be reduced.
Then, regarding the salt of the component B and the component C, since the polarity term (δp) of the Hansen solubility parameter of the component B (amine) is 7.8 or less, the salt with the component C (diphosphonic acid) is added to the component A ( It is presumed that it can be dissolved in a solvent) to obtain a uniform and stable detergent composition.
However, the present disclosure may not be construed as being limited to this mechanism.

In the present disclosure, the "flux" contains a rosin or a rosin derivative used for soldering, which is used to remove oxides that hinder the connection between a metal such as an electrode or wiring and a solder metal, and to promote the connection. A rosin-based flux, a rosin-free water-soluble flux, or the like, and in the present disclosure, "soldering" includes reflow method and flow method soldering. In the present disclosure, the "solder flux" refers to a mixture of solder and flux. In the present disclosure, the “flux residue” refers to a flux-derived residue remaining on a substrate after forming solder bumps using flux and / or a substrate after soldering using flux. For example, when other components (for example, semiconductor chips, chip type capacitors, other circuit boards, etc.) are stacked and mounted on a circuit board, a space (gap) is created between the circuit board and the other components. It is formed. The flux used for mounting may remain in this gap as a flux residue after being soldered by reflow or the like. In the present disclosure, the "flux residue removing cleaning agent composition" refers to a cleaning agent composition for removing flux residue after forming and / or soldering solder bumps using flux or solder flux. The solder is preferably a lead (Pb) -free solder containing tin, from the viewpoint of exhibiting a remarkable detergency effect by the detergent composition of the present disclosure.

In the present disclosure, the Hansen solubility parameter (hereinafter, also referred to as "HSP") is a value announced by Charles M. Hansen in 1967 and used for predicting the solubility of a substance. Two substances with similar interactions between molecules are easily soluble in each other. " HSP is composed of the following three parameters (unit: MPa ^0.5 ).
δd: Energy due to dispersion force between molecules δp: Energy due to dipole interaction between molecules δh: Energy due to hydrogen bonds between molecules There is a detailed explanation in the March 2010 issue of Chemical Industry (Chemical Industry Co., Ltd.), etc. The Hansen solubility parameter of various substances can be obtained by using the software "HSPiP: Hansen Solubility Parameters in Practice".

[Component A: Solvent]
In one or more embodiments, the component A in the detergent composition of the present disclosure includes a compound represented by the following formula (I), a compound represented by the following formula (II), and a compound represented by the following formula (II) from the viewpoint of improving flux removability. It is preferably at least one solvent selected from the compounds represented by the following formula (III).

R ¹ −O − (AO) _n −R ² (I)

In the above formula (I), R ¹ is a phenyl group or an alkyl group having 1 or more and 8 or less ^{carbon atoms, R 2} is a hydrogen atom or an alkyl group having 1 or more and 4 or less carbon atoms, and AO is an ethylene oxide group or propylene oxide. It is a group, and n is the number of added moles of AO, which is an integer of 1 or more and 3 or less.

In the above formula (I), R ¹ is a phenyl group or an alkyl group having 1 or more and 8 or less carbon atoms, and from the viewpoint of improving flux removability, a phenyl group or an alkyl group having 4 or more and 6 or less carbon atoms is preferable, and carbon. Alkyl groups having a number of 4 or more and 6 or less are more preferable. R ² is a hydrogen atom or an alkyl group having 1 or more and 4 or less carbon atoms, and from the same viewpoint, a hydrogen atom or an alkyl group having 2 or more and 4 or less carbon atoms is preferable, and a hydrogen atom or an n-butyl group is more preferable. AO is an ethylene oxide group or a propylene oxide group, and an ethylene oxide group is preferable from the same viewpoint. n is an integer of 1 or more and 3 or less, and from the same viewpoint, 1 or 2 is preferable, and 2 is more preferable.

Examples of the compound represented by the above formula (I) include monophenyl ethers such as ethylene glycol monophenyl ether, diethylene glycol monophenyl ether, and triethylene glycol monophenyl ether, and ethylene having an alkyl group having 1 to 8 carbon atoms. Monoalkyl ethers such as glycol monoalkyl ethers, diethylene glycol monoalkyl ethers and triethylene glycol monoalkyl ethers, ethylene glycol dialkyl ethers having an alkyl group having 1 to 8 carbon atoms and an alkyl group having 1 to 4 carbon atoms, diethylene glycol dialkyl Dialkyl ethers such as ethers and triethylene glycol dialkyl ethers, ethylene glycol phenylalkyl ethers having a phenyl group and an alkyl group having 1 to 4 carbon atoms, phenylalkyl ethers such as diethylene glycol phenylalkyl ethers and triethylene glycol phenylalkyl ethers. Can be mentioned. Examples of the compound represented by the above formula (I) include ethylene glycol monobutyl ether, diethylene glycol monobutyl ether, triethylene glycol monobutyl ether, ethylene glycol monohexyl ether, diethylene glycol monohexyl ether, and ethylene glycol mono from the viewpoint of improving flux removal. At least one selected from phenyl ether, diethylene glycol monophenyl ether, propylene glycol monobutyl ether, dipropylene glycol monobutyl ether, tripropylene glycol monobutyl ether, ethylene glycol dibutyl ether, diethylene glycol dibutyl ether and triethylene glycol dibutyl ether is preferable, and diethylene glycol mono At least one selected from butyl ether, diethylene glycol monohexyl ether, diethylene glycol monophenyl ether, dipropylene glycol monobutyl ether and diethylene glycol dibutyl ether is more preferable, and at least one selected from diethylene glycol monobutyl ether, dipropylene glycol monobutyl ether and diethylene glycol dibutyl ether. Is more preferable.

R ^3- CH ₂ OH (II)

In the above formula (II), R ³ represents a phenyl group, a benzyl group, a cyclohexyl group, a frill group, a tetrahydrofuryl group, a furfuryl group or a tetrahydrofurfuryl group, and from the viewpoint of improving flux removability, a phenyl group, a cyclohexyl group or A tetrahydrofuryl group is preferable, and a phenyl group or a tetrahydrofuryl group is more preferable.

Examples of the compound represented by the above formula (II) include benzyl alcohol, phenethyl alcohol, cyclohexanemethanol, furfuryl alcohol and tetrahydrofurfuryl alcohol. As the compound represented by the above formula (II), at least one selected from benzyl alcohol, furfuryl alcohol and tetrahydrofurfuryl alcohol is preferable, and it is selected from benzyl alcohol and tetrahydrofurfuryl alcohol from the viewpoint of improving flux removal property. At least one of these is more preferred.

In the above formula (III), R ⁴ , R ⁵ , R ⁶ and R ⁷ are independently composed of a hydrogen atom, a hydrocarbon group having 1 or more and 8 or less carbon atoms, and a hydroxyalkyl group or hydroxyl group having 1 or more and 3 or less carbon atoms. From the viewpoint of improving flux removability, ^{it is preferable that any one of R 4} , R ⁵ , R ⁶ and R ⁷ is a hydrocarbon group having 1 or more and 8 or less carbon atoms, and carbon dioxide having 1 or more and 6 or less carbon atoms. It is more preferably a hydrogen group, and further preferably any one of a methyl group, an ethyl group, and a vinyl group.

Examples of the compound represented by the above formula (III) include 2-pyrrolidone, 1-methyl-2-pyrrolidone, 1-ethyl-2-pyrrolidone, 1-vinyl-2-pyrrolidone, 1-phenyl-2-pyrrolidone. , 1-Cyclohexyl-2-pyrrolidone, 1-octyl-2-pyrrolidone, 3-hydroxypropyl-2-pyrrolidone, 4-hydroxy-2-pyrrolidone, 4-phenyl-2-pyrrolidone, 5-methyl-2-pyrrolidone, etc. Can be mentioned. Examples of the compound represented by the above formula (III) include 2-pyrrolidone, 1-methyl-2-pyrrolidone, 1-ethyl-2-pyrrolidone, 1-vinyl-2-pyrrolidone, 1 from the viewpoint of improving flux removal property. At least one selected from −phenyl-2-pyrrolidone, 1-cyclohexyl-2-pyrrolidone, 1-octyl-2-pyrrolidone and 5-methyl-2-pyrrolidone is preferable, and 1-methyl-2-pyrrolidone and 1-ethyl At least one selected from -2-pyrrolidone and 1-vinyl-2-pyrrolidone is more preferable, and 1-methyl-2-pyrrolidone is even more preferable.

The component A may be a combination of one type, two types, or a combination of more than one type. When the component A is a combination of two types, the component A includes, for example, a combination of a compound represented by the formula (I) and a compound represented by the formula (II).

As the component A, at least one selected from diethylene glycol monobutyl ether, dipropylene glycol monobutyl ether, diethylene glycol dibutyl ether, benzyl alcohol, tetrahydrofurfuryl alcohol and 1-methyl-2-pyrrolidone is preferable from the viewpoint of improving flux removability. , Diethylene glycol monobutyl ether, benzyl alcohol, tetrahydrofurfuryl alcohol and at least one selected from 1-methyl-2-pyrrolidone are more preferred.

The content of component A in the detergent composition of the present disclosure is preferably 70% by mass or more, more preferably 75% by mass or more, further preferably 78% by mass or more, and 99. 5% by mass or less is preferable, 95% by mass or less is more preferable, and 90% by mass or less is further preferable. More specifically, the content of component A in the detergent composition of the present disclosure is preferably 70% by mass or more and 99.5% by mass or less, more preferably 75% by mass or more and 95% by mass or less, and 78% by mass or more. 90% by mass or less is more preferable. When the component A is a combination of two or more types, the content of the component A means the total content thereof.

[Component B: Amine]
The component B in the detergent composition of the present disclosure is an amine having a polar term (δp) of the Hansen solubility parameter of 7.8 or less. Examples of the amine having a δp of 7.8 or less (component B) include amines represented by the following formula (IV) or (V) in one or more embodiments. The component B may be a combination of one type, two types, or a combination of more than one type.

In the above formula (IV), R ⁸ is a hydrogen atom, an alkyl group having 1 or more and 6 or less carbon atoms, a phenyl group, a benzyl group, a hydroxyethyl group or a hydroxypropyl group, and R ⁹ and R ¹⁰ have independent carbon atoms. It is an alkyl group of 1 or more and 6 or less, a hydroxyethyl group, or a hydroxypropyl group. From the viewpoint of improving the flux removal property and the tin removal property, R ⁸ is preferably a hydrogen atom, an alkyl group having 2 or more and 6 or less carbon atoms, a phenyl group, or a benzyl group.

The polar term (δp) of the Hansen solubility parameter is 7.8 or less, and examples of the amine represented by the above formula (IV) include alkanolamines such as dibutylmonoethanolamine, butyldiethanolamine, and diisopropanolamine, and dimethylbenzylamine. Such as aromatic amines. As a specific example of the amine represented by the above formula (IV), at least one selected from dibutylmonoethanolamine, butyldiethanolamine, diisopropanolamine and dimethylbenzylamine from the viewpoint of improving flux removal property and tin removal property. Is preferable, and at least one selected from dibutylmonoethanolamine, butyldiethanolamine and dimethylbenzylamine is more preferable.

In the above formula (V), R ¹¹ is an alkyl group having 1 or more carbon atoms and 4 or less carbon atoms, and R ¹² is a hydrogen atom or a methyl group. From the viewpoint of improving the flux removability and the tin removability, R ¹¹ is preferably a methyl group or an isobutyl group, and R ¹² is preferably a methyl group.

The polarity term (δp) of the Hansen solubility parameter is 7.8 or less, and the amine represented by the above formula (V) includes imidazoles such as 1,2-dimethylimidazole and 1-isobutyl-2-methylimidazole. Can be mentioned. As a specific example of the amine represented by the above formula (V), at least one selected from 1,2-dimethylimidazole and 1-isobutyl-2-methylimidazole from the viewpoint of improving flux removability and tin removability. Is preferable, and 1,2-dimethylimidazole is more preferable.

The polarity term (δp) of the Hansen solubility parameter of component B is 7.8 or less, preferably 7.7 or less, more preferably 6 or less, and further 5 or less, from the viewpoint of improving flux removability and stability. It is preferable, and 1 or more is preferable from the viewpoint of improving the flux removability. More specifically, the polarity term (δp) of the Hansen solubility parameter of component B is preferably 1 or more and 7.7 or less, more preferably 1 or more and 6 or less, and further preferably 1 or more and 5 or less.

As the component B, at least one selected from dibutylmonoethanolamine, butyldiethanolamine, diisopropanolamine, dimethylbenzylamine, 1,2-dimethylimidazole and 1-isobutyl-2-methylimidazole is used from the viewpoint of improving stability. Preferably, at least one selected from dibutylmonoethanolamine, dimethylbenzylamine and 1-isobutyl-2-methylimidazole is more preferable, and at least one selected from dibutylmonoethanolamine and dimethylbenzylamine is even more preferable. The component B is at least selected from dibutylmonoethanolamine, butyldiethanolamine, diisopropanolamine, dimethylbenzylamine, 1,2-dimethylimidazole and 1-isobutyl-2-methylimidazole from the viewpoint of improving rosin-based flux removability. One is preferred, at least one selected from dibutylmonoethanolamine, dimethylbenzylamine, 1,2-dimethylimidazole and 1-isobutyl-2-methylimidazole is more preferred, and 1,2-dimethylimidazole is even more preferred.

The content of component B in the cleaning agent composition of the present disclosure is preferably 0.2% by mass or more, more preferably 0.3% by mass or more, and more preferably 0.4% by mass, from the viewpoint of improving the flux removing property and the tin removing property. By mass% or more is further preferable, 0.5% by mass or more is further preferable, and from the same viewpoint, 15% by mass or less is preferable, 10% by mass or less is more preferable, 5% by mass or less is further preferable, and 3% by mass is preferable. % Or less is even more preferable. More specifically, the content of component B in the cleaning agent composition of the present disclosure is preferably 0.2% by mass or more and 15% by mass or less, more preferably 0.3% by mass or more and 10% by mass or less, and 0. It is more preferably 4% by mass or more and 5% by mass or less, and even more preferably 0.5% by mass or more and 3% by mass or less. When the component B is a combination of two or more types, the content of the component B means the total content thereof.

In the detergent composition of the present disclosure, the mass ratio (A / B) of the component A to the component B is preferably 5 or more, more preferably 8 or more, still more preferably 10 or more, from the viewpoint of improving tin removability. From the same viewpoint, 60 or less is preferable, 45 or less is more preferable, and 20 or less is further preferable. More specifically, the mass ratio (A / B) is preferably 5 or more and 60 or less, more preferably 8 or more and 45 or less, and further preferably 10 or more and 20 or less.

[Component C: Diphosphonic acid (Component C)]
The component C in the detergent composition of the present disclosure is a diphosphonic acid represented by the following formula (VI). The component C may be a combination of one type, two types, or a combination of more than one type.

In the above formula (VI), X is an alkylene group or a hydroxyalkylene group having 1 or more and 6 or less carbon atoms. From the viewpoint of improving tin removal property, X is preferably a hydroxyalkylene group. Further, from the viewpoint of improving the flux removability, the carbon number of X is preferably 1 or more and 4 or less, and more preferably 1 or more and 2 or less.

Specific examples of the component C include 1-hydroxyethylidene-1,1-diphosphonic acid, methylene diphosphonic acid, 1,2-ethylene diphosphonic acid, and 1,3-propylene diphosphonic acid from the viewpoint of improving flux removability. At least one diphosphonic acid selected from phosphonic acid, 1,4-butylenediphosphonic acid, 1,5-pentylene diphosphonic acid and 1,6-hexylene diphosphonic acid is preferred, with 1-hydroxyethylidene-1,1 -At least one diphosphonic acid selected from diphosphonic acid and methylene diphosphonic acid is more preferable, and 1-hydroxyethylidene-1,1-diphosphonic acid is further preferable.

The content of component C in the cleaning agent composition of the present disclosure is preferably 0.1% by mass or more, more preferably 0.3% by mass or more, and more preferably 0.5, from the viewpoint of improving the flux removability and tin removability. It is more preferably mass% or more, and from the viewpoint of improving flux removability and stability, it is preferably 3% by mass or less, more preferably 2% by mass or less, further preferably 1.5% by mass or less, and 1% by mass or less. Is even more preferable. More specifically, the content of the component C is preferably 0.1% by mass or more and 3% by mass or less, more preferably 0.3% by mass or more and 2% by mass or less, and 0.3% by mass or more and 1.5% by mass. % Or less is more preferable, and 0.5% by mass or more and 1% by mass or less is even more preferable. When the component C is a combination of two or more types, the content of the component C means the total content thereof.

In the detergent composition of the present disclosure, it is considered that the salt of the component B and the component C is involved in the removal of the flux and tin, and the molar ratio B / C of the component B and the component C is a factor for removing these. Inferred. The molar ratio B / C of component B to component C in the detergent composition of the present disclosure is preferably 4 or more, more preferably 4.5 or more, and 4.8 or more, from the viewpoint of improving flux removability and tin removability. More preferably, 7 or more is further preferable, 10 or more is further preferable, 40 or less is more preferable, 30 or less is more preferable, 25 or less is further preferable, 22 or less is further preferable, and 18 or less is further preferable. More specifically, the molar ratio B / C is preferably 4 or more and 40 or less, more preferably 4.5 or more and 30 or less, further preferably 4.8 or more and 25 or less, further preferably 7 or more and 22 or less, and 10 or more. 18 or less is even more preferable.

In the detergent composition of the present disclosure, from the viewpoint of improving the flux removing property and the tin removing property, at least a part of the component B forms a salt with the component C at the time of washing, and at least a part of the component B is a component. It is preferable that C does not form a salt. That is, in one or more embodiments, the detergent composition of the present disclosure contains a salt of component B and component C at the time of cleaning, and also contains a component B that does not form a salt with component C. The content of the salt of the component B and the component C in the cleaning agent composition of the present disclosure is preferably 0.1% by mass or more, preferably 0.3% by mass or more, from the viewpoint of improving the flux removability and the tin removability. More preferably, 0.7% by mass or more is further preferable, 10% by mass or less is preferable, 5% by mass or less is more preferable, and 3% by mass or less is further preferable. More specifically, the salt content of the component B and the component C is preferably 0.1% by mass or more and 10% by mass or less, more preferably 0.3% by mass or more and 5% by mass or less, and 0.7% by mass. % Or more and 3% by mass or less are more preferable.

[Component D: Water]
The detergent composition of the present disclosure may further contain water (component D) in one or more embodiments. As the component D, ion-exchanged water, RO water, distilled water, pure water, ultrapure water and the like can be used. The content of component D in the detergent composition of the present disclosure is preferably 1% by mass or more, more preferably 5% by mass or more, further preferably 8% by mass or more, and flux removability from the viewpoint of lowering the flash point. From the viewpoint of improvement and stability improvement, 20% by mass or less is preferable, 15% by mass or less is more preferable, and 10% by mass or less is further preferable. More specifically, the content of component D in the detergent composition of the present disclosure is preferably 1% by mass or more and 20% by mass or less, more preferably 5% by mass or more and 15% by mass or less, and 8% by mass or more and 10% by mass. % Or less is more preferable.

When the detergent composition of the present disclosure contains component D, from the viewpoint of improving stability, the component A contained in the detergent composition of the present disclosure is a component A other than diethylene glycol monobutyl ether and the diethylene glycol monobutyl ether. It is preferable to use in combination with.

[Other ingredients]
In addition to the above-mentioned components A to D, the detergent composition of the present disclosure may further contain or contain other components as needed. The content of other components in the cleaning agent composition of the present disclosure is preferably 0% by mass or more and 10% by mass or less, more preferably 0% by mass or more and 8% by mass or less, and further preferably 0% by mass or more and 5% by mass or less. , 0% by mass or more and 2% by mass or less is more preferable.

Examples of other components in the detergent composition of the present disclosure include a surfactant (component E) from the viewpoint of improving stability. From the same viewpoint, the component E is a nonionic surfactant such as a polyoxyalkylene alkyl ether, a polyoxyalkylene alkyl amine, a glycerin fatty acid ester, a sorbitan fatty acid ester, a sucrose fatty acid ester, an alkyl glucoside, and an alkyl glyceryl ether. Is preferable, and polyoxyalkylene alkyl ether and alkyl glyceryl ether are more preferable. Specific examples of the component E include polyoxyethylene decyl ether and 2-ethylhexyl glyceryl ether. From the viewpoint of improving stability, the content of component E in the detergent composition of the present disclosure is preferably 0.5% by mass or more, more preferably 0.8% by mass or more, and preferably 5% by mass or less. 3% by mass or less is more preferable, and 2% by mass or less is further preferable. More specifically, the content of the component E in the detergent composition of the present disclosure is preferably 0.5% by mass or more and 5% by mass or less, more preferably 0.5% by mass or more and 3% by mass or less, and 0. More preferably, it is 8% by mass or more and 2% by mass or less.

As a further other component, the detergent composition of the present disclosure is, if necessary, hydroxyethylaminoacetic acid, hydroxyethylimino2acetic acid, ethylenediaminetetra, which are usually used in the detergent, as long as the effects of the present disclosure are not impaired. Chelating compounds such as aminocarboxylic acid salts such as acetic acid, rust preventives such as benzotriazoles, thickeners, dispersants, basic substances other than component B, polymer compounds, solubilizers, preservatives, sterilizers Agents, antibacterial agents, antifoaming agents, and antioxidants can be appropriately blended or contained.

[Manufacturing method of detergent composition]
The detergent composition of the present disclosure can be produced, for example, by blending component A, component B, component C and, if necessary, the above-mentioned component D and other components by a known method. In one or more embodiments, the detergent composition of the present disclosure may consist of at least a blend of component A, component B and component C. Therefore, the present disclosure is also referred to as a method for producing a cleaning agent composition (hereinafter, also referred to as "method for producing a cleaning agent composition of the present disclosure"), which comprises, in one aspect, at least a step of blending component A, component B, and component C. ). In the method for producing the detergent composition of the present disclosure, the component B and the component C may be blended separately, or may be blended as a salt of the component B and the component C. In the method for producing a detergent composition of the present disclosure, in one or more embodiments, component B and component C may be blended, and then component A and, if necessary, the above-mentioned component D and other components may be blended. can. In the present disclosure, "blending" includes mixing component A, component B, component C and, if necessary, component D and other components simultaneously or in any order. In the method for producing the detergent composition of the present disclosure, the blending amount of each component can be the same as the content of each component of the detergent composition of the present disclosure described above.

In the present disclosure, the "content of each component in the detergent composition" refers to the content of each component at the time of cleaning, that is, at the time when the detergent composition is used for cleaning.

The detergent composition of the present disclosure may be produced and stored as a concentrate from the viewpoint of addition work, storage and transportation. Examples of the dilution ratio of the concentrate of the detergent composition of the present disclosure include 3 times or more and 30 times or less. The concentrate of the detergent composition of the present disclosure contains the above-mentioned contents (that is, the contents at the time of cleaning) of the component A, the component B, the component C, and the component D and other components to be blended as needed at the time of use. It can be used by diluting it with water (component D) so as to become.

[PH of detergent composition]
The detergent composition of the present disclosure is preferably alkaline, for example, pH 8 or more and pH 14 or less, from the viewpoint of improving the removability of the flux residue. If necessary, the pH may be set to inorganic acids such as nitrate and sulfuric acid, organic acids such as oxycarboxylic acid, polyvalent carboxylic acid, aminopolycarboxylic acid and amino acids, and metal salts and ammonium salts thereof, ammonia, sodium hydroxide and water. It can be adjusted by appropriately blending a basic substance other than the component B such as potassium oxide and amine in a desired amount.

[Item to be cleaned]
The detergent composition of the present disclosure is used for cleaning an object to be cleaned having a flux residue. Examples of the object to be cleaned having the flux residue include an object to be cleaned having the reflowed solder. Specific examples of the object to be cleaned include, for example, an electronic component and its manufacturing intermediate, specifically, a soldered electronic component and its manufacturing intermediate, and more specifically, the component is soldered. Soldered electronic components and their manufacturing intermediates, electronic components to which the components are connected via solder and their manufacturing intermediates, electronic components containing flux residues in the gaps between the soldered components and their manufacturing intermediates, Examples thereof include electronic parts containing flux residues in the gaps between parts connected via solder and their manufacturing intermediates. The manufacturing intermediate is an intermediate product in the manufacturing process of an electronic component including a semiconductor package or a semiconductor device, and is at least selected from a semiconductor chip, a chip type capacitor, and a circuit board by soldering using a flux, for example. A circuit board on which one component is mounted and / or a circuit board on which a solder bump for soldering the component is formed is included. The gap in the object to be cleaned is, for example, a space formed between a circuit board and a component (semiconductor chip, chip type capacitor, circuit board, etc.) soldered and mounted on the circuit board. A space having a height (distance between parts) of, for example, 5 to 500 μm, 10 to 250 μm, or 20 to 100 μm. The width and depth of the gap depend on the size and spacing of the mounted components and the electrodes (lands) on the circuit board.

[Washing method]
In one aspect, the present disclosure includes a cleaning method for removing a flux residue, which comprises contacting an object to be cleaned having a flux residue with the cleaning agent composition of the present disclosure (hereinafter, also referred to as "cleaning method of the present disclosure"). Regarding). The cleaning method of the present disclosure includes, in one or more embodiments, a step of cleaning an object to be cleaned with a flux residue with the cleaning agent composition of the present disclosure. As a method of contacting the cleaning agent composition of the present disclosure with the object to be cleaned, or a method of cleaning the object to be cleaned with the cleaning agent composition of the present disclosure, for example, a method of contacting the object to be cleaned in a bathtub of an ultrasonic cleaning device, a method of contacting the object to be cleaned with the cleaning agent composition of the present disclosure. Examples thereof include a method (shower method) in which the cleaning agent composition is sprayed and brought into contact with each other. The detergent composition of the present disclosure can be used as it is for cleaning without being diluted. The cleaning method of the present disclosure preferably includes a step of bringing the object to be cleaned into contact with the detergent composition, rinsing with water, and drying. According to the cleaning method of the present disclosure, the flux residue remaining in the gaps between the soldered parts can be efficiently cleaned. The solder is preferably lead (Pb) -free solder from the viewpoint of exhibiting a remarkable effect of detergency and penetration into narrow gaps by the cleaning method of the present disclosure. Further, from the same viewpoint, the cleaning methods of the present disclosure include International Publication No. 2006/0252224, Japanese Patent Application Laid-Open No. 6-75796, Japanese Patent Application Laid-Open No. 2014-144473, Japanese Patent Application Laid-Open No. 2004-230426, Japanese Patent Application Laid-Open No. 2013- It is preferable to use it for electronic components solder-connected using the flux described in Japanese Patent Application Laid-Open No. 188761, Japanese Patent Application Laid-Open No. 2013-173184, and the like. In the cleaning method of the present disclosure, it is preferable to irradiate ultrasonic waves at the time of contact between the cleaning agent composition of the present disclosure and the object to be cleaned, because the cleaning power of the cleaning agent composition of the present disclosure is easily exhibited. It is more preferable that the ultrasonic waves are relatively strong. From the same viewpoint, the frequency of the ultrasonic wave is preferably 26 to 72 Hz and 80 to 1500 W, more preferably 36 to 72 Hz and 80 to 1500 W.

[Manufacturing method of electronic parts]
In one aspect, the present disclosure is for mounting at least one component selected from a semiconductor chip, a chip type capacitor, and a circuit board on a circuit board by soldering using a flux, and for connecting the components and the like. The cleaning method of the present disclosure comprises at least one step selected from the steps of forming the solder bumps on the circuit board, and at least one selected from the circuit board on which the components are mounted and the circuit board on which the solder bumps are formed. The present invention relates to a method for manufacturing an electronic component (hereinafter, also referred to as “the method for manufacturing an electronic component of the present disclosure”), which includes a step of cleaning by. Soldering using flux is performed by, for example, lead-free soldering, and may be a reflow method or a flow method. Electronic components include a semiconductor package on which a semiconductor chip is not mounted, a semiconductor package on which a semiconductor chip is mounted, and a semiconductor device. The method for manufacturing the electronic components of the present disclosure is caused by the fact that by performing the cleaning method of the present disclosure, the flux residue remaining in the gaps of the soldered parts, the periphery of the solder bumps, etc. is reduced, and the flux residue remains. Since short circuits and poor adhesion between the soldering electrodes are suppressed, highly reliable electronic components can be manufactured. Further, by performing the cleaning method of the present disclosure, it becomes easy to clean the flux residue remaining in the gaps of the soldered parts, so that the cleaning time can be shortened and the manufacturing efficiency of the electronic parts can be improved.

[kit]
The present disclosure relates, in one aspect, to a kit for use in the cleaning method of the present disclosure and / or the method of manufacturing the electronic components of the present disclosure (hereinafter, also referred to as "kit of the present disclosure"). The kits of the present disclosure are kits for producing the detergent compositions of the present disclosure in one or more embodiments.

In one embodiment of the kit of the present disclosure, the solution containing the component A (liquid 1) and the solution containing component B and component C (liquid 2) are not mixed with each other. Examples thereof include a kit (two-component detergent composition) in which the first solution and the second solution are mixed at the time of use. The first liquid and the second liquid may each contain the above-mentioned component D and other components, if necessary. At least one of the first liquid and the second liquid can contain a part or all of the component D (water) in one or more embodiments. In one or more embodiments, the first liquid and the second liquid may be mixed and then diluted with component D (water), if necessary.

上記式（ＶＩ）において、Ｘは炭素数１以上６以下のアルキレン基又はヒドロキシアルキレン基である。The present disclosure further relates to one or more embodiments below.
<1> Solvent (component A) and
Amine (component B) having a polarity term (δp) of 7.8 or less in the Hansen solubility parameter,
A detergent composition for removing a flux residue containing diphosphonic acid (component C) represented by the following formula (VI), or for removing a flux residue obtained by blending component A, component B and component C. Detergent composition.

In the above formula (VI), X is an alkylene group or a hydroxyalkylene group having 1 or more and 6 or less carbon atoms.

上記式（ＩＩＩ）において、Ｒ⁴、Ｒ⁵、Ｒ⁶、Ｒ⁷はそれぞれ独立に、水素原子、炭素数１以上８以下の炭化水素基、炭素数１以上３以下のヒドロキシアルキル基又は水酸基である。
＜３＞ 上記式（Ｉ）において、Ｒ¹はフェニル基又は炭素数１以上８以下のアルキル基であって、フェニル基又は炭素数４以上６以下のアルキル基が好ましく、炭素数４以上６以下のアルキル基がより好ましい、＜２＞に記載の洗浄剤組成物。
＜４＞ 上記式（Ｉ）において、Ｒ²は水素原子又は炭素数１以上４以下のアルキル基であって、水素原子又は炭素数２以上４以下のアルキル基が好ましく、水素原子又はｎ−ブチル基がより好ましい、＜２＞又は＜３＞に記載の洗浄剤組成物。
＜５＞ 上記式（Ｉ）において、ＡＯはエチレンオキシド基又はプロピレンオキシド基であって、エチレンオキシド基が好ましい、＜２＞から＜４＞のいずれかに記載の洗浄剤組成物。
＜６＞ 上記式（Ｉ）において、ｎは１以上３以下の整数であって、１又は２が好ましく、２がより好ましい、＜２＞から＜５＞のいずれかに記載の洗浄剤組成物。
＜７＞ 上記式（ＩＩ）において、Ｒ³はフェニル基、ベンジル基、シクロヘキシル基、フリル基、テトラヒドロフリル基、フルフリル基又はテトラヒドロフルフリル基であって、フェニル基、シクロヘキシル基又はテトラヒドロフリル基が好ましく、フェニル基又はテトラヒドロフリル基がより好ましい、＜２＞から＜６＞のいずれかに記載の洗浄剤組成物。
＜８＞ 上記式（ＩＩＩ）において、Ｒ⁴、Ｒ⁵、Ｒ⁶、Ｒ⁷はそれぞれ独立に、水素原子、炭素数１以上８以下の炭化水素基、炭素数１以上３以下のヒドロキシアルキル基又は水酸基であって、Ｒ⁴、Ｒ⁵、Ｒ⁶、Ｒ⁷のいずれか一つが炭素数１以上８以下の炭化水素基であることが好ましく、炭素数１以上６以下の炭化水素基であることがより好ましく、メチル基、エチル基、ビニル基のいずれかであることが更に好ましい、＜２＞から＜７＞のいずれかに記載の洗浄剤組成物。
＜９＞ 成分Ａは、式（Ｉ）で表される化合物と式（ＩＩ）で表される化合物との組合せである、＜２＞から＜８＞のいずれかに記載の洗浄剤組成物。
＜１０＞ 成分Ａは、ジエチレングリコールモノブチルエーテル、ジプロピレングリコールモノブチルエーテル、ジエチレングリコールジブチルエーテル、ベンジルアルコール、テトラヒドロフルフリルアルコール及び１−メチル−２−ピロリドンから選ばれる少なくとも１種が好ましく、ジエチレングリコールモノブチルエーテル、ベンジルアルコール、テトラヒドロフルフリルアルコール及び１−メチル−２−ピロリドンから選ばれる少なくとも１種がより好ましい、＜１＞から＜８＞のいずれかに記載の洗浄剤組成物。
＜１１＞ 成分Ａの含有量は、７０質量％以上が好ましく、７５質量％以上がより好ましく、７８質量％以上が更に好ましい、＜１＞から＜１０＞のいずれかに記載の洗浄剤組成物。
＜１２＞ 成分Ａの含有量は、９９．５質量％以下が好ましく、９５質量％以下がより好ましく、９０質量％以下が更に好ましい、＜１＞から＜１１＞のいずれかに記載の洗浄剤組成物。
＜１３＞ 成分Ａの含有量は、７０質量％以上９９．５質量％以下が好ましく、７５質量％以上９５質量％以下がより好ましく、７８質量％以上９０質量％以下が更に好ましい、＜１＞から＜１２＞のいずれかに記載の洗浄剤組成物。
＜１４＞ アミン（成分Ｂ）は、下記式（ＩＶ）又は（Ｖ）で表されるアミンである、＜１＞から＜１３＞のいずれかに記載の洗浄剤組成物。

上記式（ＩＶ）において、Ｒ⁸は水素原子、炭素数１以上６以下のアルキル基、フェニル基、ベンジル基、ヒドロキシエチル基又はヒドロキシプロピル基であり、Ｒ⁹及びＲ¹⁰はそれぞれ独立に炭素数１以上６以下のアルキル基、ヒドロキシエチル基又はヒドロキシプロピル基である。

上記式（Ｖ）において、Ｒ¹¹は炭素数１以上４以下のアルキル基であり、Ｒ¹²は水素原子又はメチル基である。
＜１５＞ 成分Ｂは、ジブチルモノエタノールアミン、ブチルジエタノールアミン、ジイソプロパノールアミン、ジメチルベンジルアミン、１，２−ジメチルイミダゾール及び１−イソブチル−２−メチルイミダゾールから選ばれる少なくとも１種が好ましく、ジブチルモノエタノールアミン、ジメチルベンジルアミン及び１−イソブチル−２−メチルイミダゾールから選ばれる少なくとも１種がより好ましく、ジブチルモノエタノールアミン及びジメチルベンジルアミンから選ばれる少なくとも１種が更に好ましい、＜１＞から＜１４＞のいずれかに記載の洗浄剤組成物。
＜１６＞ 成分Ｂの含有量は、０．２質量％以上が好ましく、０．３質量％以上がより好ましく、０．４質量％以上が更に好ましく、０．５質量％以上がより更に好ましい、＜１＞から＜１５＞のいずれかに記載の洗浄剤組成物。
＜１７＞ 成分Ｂの含有量は、１５質量％以下が好ましく、１０質量％以下がより好ましく、５質量％以下が更に好ましく、３質量％以下がより更に好ましい、＜１＞から＜１６＞のいずれかに記載の洗浄剤組成物。
＜１８＞ 成分Ｂの含有量は、０．２質量％以上１５質量％以下が好ましく、０．３質量％以上１０質量％以下がより好ましく、０．４質量％以上５質量％以下が更に好ましく、０．５質量％以上３質量％以下がより更に好ましい、＜１＞から＜１７＞のいずれかに記載の洗浄剤組成物。
＜１９＞ 成分Ａと成分Ｂとの質量比（Ａ／Ｂ）は、５以上が好ましく、８以上がより好ましく、１０以上が更に好ましい、＜１＞から＜１８＞のいずれかに記載の洗浄剤組成物。
＜２０＞ 成分Ａと成分Ｂとの質量比（Ａ／Ｂ）は、６０以下が好ましく、４５以下がより好ましく、２０以下が更に好ましい、＜１＞から＜１９＞のいずれかに記載の洗浄剤組成物。
＜２１＞ 成分Ａと成分Ｂとの質量比（Ａ／Ｂ）は、５以上６０以下が好ましく、８以上４５以下がより好ましく、１０以上２０以下が更に好ましい、＜１＞から＜２０＞のいずれかに記載の洗浄剤組成物。
＜２２＞ 上記式（ＶＩ）において、Ｘは炭素数１以上６以下のアルキレン基又はヒドロキシアルキレン基であって、ヒドロキシアルキレン基が好ましい、＜１＞から＜２１＞のいずれかに記載の洗浄剤組成物。
＜２３＞ 上記式（ＶＩ）において、Ｘの炭素数は１以上４以下が好ましく、１以上２以下がより好ましい、＜１＞から＜２２＞のいずれかに記載の洗浄剤組成物。
＜２４＞ 成分Ｃは、１−ヒドロキシエチリデン−１，１−ジホスホン酸、メチレンジホスホン酸、１，２−エチレンジホスホン酸、１，３−プロピレンジホスホン酸、１，４−ブチレンジホスホン酸、１，５−ペンチレンジホスホン酸及び１，６−ヘキシレンジホスホン酸から選ばれる少なくとも１種のジホスホン酸が好ましく、１−ヒドロキシエチリデン−１，１−ジホスホン酸及びメチレンジホスホン酸から選ばれる少なくとも１種のジホスホン酸がより好ましく、１−ヒドロキシエチリデン−１，１−ジホスホン酸が更に好ましい、＜１＞から＜２３＞のいずれかに記載の洗浄剤組成物。
＜２５＞ 成分Ｃの含有量は、０．１質量％以上が好ましく、０．３質量％以上がより好ましく、０．５質量％以上が更に好ましい、＜１＞から＜２４＞のいずれかに記載の洗浄剤組成物。
＜２６＞ 成分Ｃの含有量は、３質量％以下が好ましく、２質量％以下がより好ましく、１．５質量％以下が更に好ましく、１質量％以下がより更に好ましい、＜１＞から＜２５＞のいずれかに記載の洗浄剤組成物。
＜２７＞ 成分Ｃの含有量は、０．１質量％以上３質量％以下が好ましく、０．３質量％以上２質量％以下がより好ましく、０．３質量％以上１．５質量％以下が更に好ましく、０．５質量％以上１質量％以下がより更に好ましい、＜１＞から＜２６＞のいずれかに記載の洗浄剤組成物。
＜２８＞ 成分Ａの含有量が７０質量％以上９９．５質量％以下であり、成分Ｂの含有量が０．２質量％以上１５質量％以下であり、成分Ｃの含有量が０．１質量％以上３質量％以下である、＜１＞から＜２７＞のいずれかに記載の洗浄剤組成物。
＜２９＞ 成分Ｂと成分Ｃとのモル比Ｂ／Ｃは、４以上が好ましく、４．５以上より好ましく、４．８以上が更に好ましく、７以上がより更に好ましく、１０以上がより更に好ましい、＜１＞から＜２８＞のいずれかに記載の洗浄剤組成物。
＜３０＞ 成分Ｂと成分Ｃとのモル比Ｂ／Ｃは、４０以下が好ましく、３０以下がより好ましく、２５以下が更に好ましく、２２以下がより更に好ましく、１８以下がより更に好ましい、＜１＞から＜２９＞のいずれかに記載の洗浄剤組成物。
＜３１＞ 成分Ｂと成分Ｃとのモル比Ｂ／Ｃは、４以上４０以下が好ましく、４．５以上３０以下がより好ましく、４．８以上２５以下が更に好ましく、７以上２２以下がより更に好ましく、１０以上１８以下がより更に好ましい、＜１＞から＜３０＞のいずれかに記載の洗浄剤組成物。
＜３２＞ 成分Ｂの少なくとも一部は、成分Ｃと塩を形成しており、成分Ｂの少なくとも一部は、成分Ｃと塩を形成していない、＜１＞から＜３１＞のいずれかに記載の洗浄剤組成物。
＜３３＞ 成分Ｂと成分Ｃとの塩の含有量は、０．１質量％以上が好ましく、０．３質量％以上がより好ましく、０．７質量％以上が更に好ましい、＜３２＞に記載の洗浄剤組成物。
＜３４＞ 成分Ｂと成分Ｃとの塩の含有量は、１０質量％以下が好ましく、５質量％以下がより好ましく、３質量％以下が更に好ましい、＜３２＞又は＜３３＞に記載の洗浄剤組成物。
＜３５＞ 成分Ｂと成分Ｃとの塩の含有量は、０．１質量％以上１０量％以下が好ましく、０．３質量％以上５質量％以下がより好ましく、０．７質量％以上３質量％以下が更に好ましい、＜３２＞から＜３４＞のいずれかに記載の洗浄剤組成物。
＜３６＞ 水（成分Ｄ）をさらに含む、＜１＞から＜３５＞のいずれかに記載の洗浄剤組成物。
＜３７＞ 成分Ｄの含有量は、１質量％以上が好ましく、５質量％以上がより好ましく、８質量％以上が更に好ましい、＜３６＞に記載の洗浄剤組成物。
＜３８＞ 成分Ｄの含有量は、２０質量％以下が好ましく、１５質量％以下がより好ましく、１０質量％以下が更に好ましい、＜３６＞又は＜３７＞に記載の洗浄剤組成物。
＜３９＞ 成分Ｄの含有量は、１質量％以上２０質量％以下が好ましく、５質量％以上１５質量％以下がより好ましく、８質量％以上１０質量％以下が更に好ましい、＜３６＞から＜３８＞のいずれかに記載の洗浄剤組成物。
＜４０＞ 界面活性剤（成分Ｅ）をさらに含有する、＜１＞から＜３９＞のいずれかに記載の洗浄剤組成物。
＜４１＞ キレート力を持つ化合物、ベンゾトリアゾール等の防錆剤、増粘剤、分散剤、成分Ｂ以外の塩基性物質、高分子化合物、可溶化剤、防腐剤、殺菌剤、抗菌剤、消泡剤、及び酸化防止剤から選ばれる少なくとも１種をさらに含有する、＜１＞から＜４０＞のいずれかに記載の洗浄剤組成物。
＜４２＞ フラックス残渣を有する被洗浄物を＜１＞から＜４１＞のいずれかに記載の洗浄剤組成物で洗浄する工程を含む、洗浄方法。
＜４３＞ 被洗浄物が、半田付け電子部品の製造中間物である、＜４２＞に記載の洗浄方法。
＜４４＞ 半導体チップ、チップ型コンデンサ、及び回路基板から選ばれる少なくとも１つの部品を、フラックスを使用した半田付けにより回路基板上に搭載する工程、並びに前記部品等を接続するための半田バンプを回路基板上に形成する工程から選ばれる少なくとも１つの工程と、前記部品が搭載された回路基板及び前記半田バンプが形成された回路基板から選ばれる少なくとも１つを＜４２＞又は＜４３＞に記載の洗浄方法により洗浄する工程とを含む、電子部品の製造方法。<2> The solvent (component A) is at least one solvent selected from a compound represented by the following formula (I), a compound represented by the following formula (II), and a compound represented by the following formula (III). The cleaning agent composition according to <1>.
R ¹ −O − (AO) _n −R ² (I)
In the above formula (I), R ¹ is a phenyl group or an alkyl group having 1 or more and 8 or less ^{carbon atoms, R 2} is a hydrogen atom or an alkyl group having 1 or more and 4 or less carbon atoms, and AO is an ethylene oxide group or propylene oxide. It is a group, and n is the number of added moles of AO, which is an integer of 1 or more and 3 or less.
R ^3- CH ₂ OH (II)
In the above formula (II), R ³ is a phenyl group, a benzyl group, a cyclohexyl group, a frill group, a tetrahydrofuryl group, a furfuryl group or a tetrahydrofurfuryl group.

In the above formula (III), R ⁴ , R ⁵ , R ⁶ and R ⁷ are independently composed of a hydrogen atom, a hydrocarbon group having 1 or more and 8 or less carbon atoms, and a hydroxyalkyl group or hydroxyl group having 1 or more and 3 or less carbon atoms. be.
<3> In the above formula (I), R ¹ is a phenyl group or an alkyl group having 1 or more and 8 or less carbon atoms, preferably a phenyl group or an alkyl group having 4 or more and 6 or less carbon atoms, and 4 or more and 6 or less carbon atoms. The cleaning agent composition according to <2>, wherein the alkyl group of <2> is more preferable.
<4> In the above formula (I), R ² is a hydrogen atom or an alkyl group having 1 or more and 4 or less carbon atoms, preferably a hydrogen atom or an alkyl group having 2 or more and 4 or less carbon atoms, and is a hydrogen atom or n-butyl. The cleaning composition according to <2> or <3>, wherein the group is more preferable.
<5> The detergent composition according to any one of <2> to <4>, wherein in the above formula (I), AO is an ethylene oxide group or a propylene oxide group, preferably an ethylene oxide group.
<6> The detergent composition according to any one of <2> to <5>, wherein n is an integer of 1 or more and 3 or less, preferably 1 or 2, more preferably 2 in the above formula (I). ..
<7> In the above formula (II), R ³ is a phenyl group, a benzyl group, a cyclohexyl group, a frill group, a tetrahydrofuryl group, a furfuryl group or a tetrahydrofurfuryl group, and the phenyl group, the cyclohexyl group or the tetrahydrofuryl group is present. The cleaning composition according to any one of <2> to <6>, preferably in which a phenyl group or a tetrahydrofuryl group is more preferable.
<8> In the above formula (III), R ⁴ , R ⁵ , R ⁶ and R ⁷ are independently hydrogen atoms, hydrocarbon groups having 1 to 8 carbon atoms, and hydroxyalkyl groups having 1 to 3 carbon atoms. Alternatively, ^{it is preferable that any one of R 4} , R ⁵ , R ⁶ , and R ⁷ is a hydrocarbon group having 1 or more and 8 or less carbon atoms, and is a hydrocarbon group having 1 or more and 6 or less carbon atoms. The cleaning composition according to any one of <2> to <7>, more preferably any of a methyl group, an ethyl group and a vinyl group.
<9> The detergent composition according to any one of <2> to <8>, wherein the component A is a combination of the compound represented by the formula (I) and the compound represented by the formula (II).
<10> As the component A, at least one selected from diethylene glycol monobutyl ether, dipropylene glycol monobutyl ether, diethylene glycol dibutyl ether, benzyl alcohol, tetrahydrofurfuryl alcohol and 1-methyl-2-pyrrolidone is preferable, and diethylene glycol monobutyl ether and benzyl are preferable. The cleaning composition according to any one of <1> to <8>, wherein at least one selected from alcohol, tetrahydrofurfuryl alcohol and 1-methyl-2-pyrrolidone is more preferable.
<11> The detergent composition according to any one of <1> to <10>, wherein the content of the component A is preferably 70% by mass or more, more preferably 75% by mass or more, still more preferably 78% by mass or more. ..
<12> The cleaning agent according to any one of <1> to <11>, wherein the content of the component A is preferably 99.5% by mass or less, more preferably 95% by mass or less, still more preferably 90% by mass or less. Composition.
<13> The content of the component A is preferably 70% by mass or more and 99.5% by mass or less, more preferably 75% by mass or more and 95% by mass or less, further preferably 78% by mass or more and 90% by mass or less, <1>. The cleaning agent composition according to any one of <12>.
<14> The detergent composition according to any one of <1> to <13>, wherein the amine (component B) is an amine represented by the following formula (IV) or (V).

In the above formula (IV), R ⁸ is a hydrogen atom, an alkyl group having 1 or more and 6 or less carbon atoms, a phenyl group, a benzyl group, a hydroxyethyl group or a hydroxypropyl group, and R ⁹ and R ¹⁰ have independent carbon atoms. It is an alkyl group of 1 or more and 6 or less, a hydroxyethyl group, or a hydroxypropyl group.

In the above formula (V), R ¹¹ is an alkyl group having 1 or more carbon atoms and 4 or less carbon atoms, and R ¹² is a hydrogen atom or a methyl group.
<15> As the component B, at least one selected from dibutylmonoethanolamine, butyldiethanolamine, diisopropanolamine, dimethylbenzylamine, 1,2-dimethylimidazole and 1-isobutyl-2-methylimidazole is preferable, and dibutylmonoethanol is preferable. Of <1> to <14>, at least one selected from amines, dimethylbenzylamine and 1-isobutyl-2-methylimidazole is more preferred, and at least one selected from dibutylmonoethanolamine and dimethylbenzylamine is even more preferred. The cleaning agent composition according to any one.
<16> The content of the component B is preferably 0.2% by mass or more, more preferably 0.3% by mass or more, further preferably 0.4% by mass or more, still more preferably 0.5% by mass or more. The detergent composition according to any one of <1> to <15>.
<17> The content of the component B is preferably 15% by mass or less, more preferably 10% by mass or less, further preferably 5% by mass or less, still more preferably 3% by mass or less, of <1> to <16>. The cleaning agent composition according to any one.
<18> The content of component B is preferably 0.2% by mass or more and 15% by mass or less, more preferably 0.3% by mass or more and 10% by mass or less, and further preferably 0.4% by mass or more and 5% by mass or less. , 0.5% by mass or more and 3% by mass or less, more preferably, the cleaning agent composition according to any one of <1> to <17>.
<19> The cleaning according to any one of <1> to <18>, wherein the mass ratio (A / B) of the component A to the component B is preferably 5 or more, more preferably 8 or more, still more preferably 10 or more. Agent composition.
<20> The cleaning according to any one of <1> to <19>, wherein the mass ratio (A / B) of the component A to the component B is preferably 60 or less, more preferably 45 or less, still more preferably 20 or less. Agent composition.
<21> The mass ratio (A / B) of the component A to the component B is preferably 5 or more and 60 or less, more preferably 8 or more and 45 or less, further preferably 10 or more and 20 or less, <1> to <20>. The detergent composition according to any one.
<22> In the above formula (VI), X is an alkylene group or a hydroxyalkylene group having 1 to 6 carbon atoms, preferably a hydroxyalkylene group, according to any one of <1> to <21>. Composition.
<23> The detergent composition according to any one of <1> to <22>, wherein the carbon number of X is preferably 1 or more and 4 or less, more preferably 1 or more and 2 or less in the above formula (VI).
<24> Component C is 1-hydroxyethylidene-1,1-diphosphonic acid, methylene diphosphonic acid, 1,2-ethylene diphosphonic acid, 1,3-propylene diphosphonic acid, 1,4-butylenediphosphonic acid. , 1,5-Pentylene diphosphonic acid and at least one diphosphonic acid selected from 1,6-hexylene diphosphonic acid is preferred, and 1-hydroxyethylidene-1,1-diphosphonic acid and methylene diphosphonic acid are selected. The cleaning composition according to any one of <1> to <23>, wherein at least one diphosphonic acid is more preferable, and 1-hydroxyethylidene-1,1-diphosphonic acid is further preferable.
<25> The content of the component C is preferably 0.1% by mass or more, more preferably 0.3% by mass or more, still more preferably 0.5% by mass or more, any of <1> to <24>. The cleaning agent composition according to the above.
<26> The content of the component C is preferably 3% by mass or less, more preferably 2% by mass or less, further preferably 1.5% by mass or less, still more preferably 1% by mass or less, <1> to <25. > The cleaning agent composition according to any one of.
<27> The content of component C is preferably 0.1% by mass or more and 3% by mass or less, more preferably 0.3% by mass or more and 2% by mass or less, and 0.3% by mass or more and 1.5% by mass or less. The cleaning agent composition according to any one of <1> to <26>, more preferably 0.5% by mass or more and 1% by mass or less.
<28> The content of component A is 70% by mass or more and 99.5% by mass or less, the content of component B is 0.2% by mass or more and 15% by mass or less, and the content of component C is 0.1. The cleaning agent composition according to any one of <1> to <27>, which is equal to or more than 3% by mass and not more than 3% by mass.
<29> The molar ratio B / C of the component B to the component C is preferably 4 or more, more preferably 4.5 or more, further preferably 4.8 or more, further preferably 7 or more, still more preferably 10 or more. , <1> to <28>.
<30> The molar ratio B / C of the component B to the component C is preferably 40 or less, more preferably 30 or less, further preferably 25 or less, further preferably 22 or less, still more preferably 18 or less, <1. > To <29>.
<31> The molar ratio B / C of component B to component C is preferably 4 or more and 40 or less, more preferably 4.5 or more and 30 or less, further preferably 4.8 or more and 25 or less, and more preferably 7 or more and 22 or less. The detergent composition according to any one of <1> to <30>, more preferably 10 or more and 18 or less.
<32> Any of <1> to <31>, in which at least a part of the component B forms a salt with the component C and at least a part of the component B does not form a salt with the component C. The cleaning agent composition according to the above.
<33> The salt content of the component B and the component C is preferably 0.1% by mass or more, more preferably 0.3% by mass or more, still more preferably 0.7% by mass or more, according to <32>. Detergent composition.
<34> The cleaning according to <32> or <33>, wherein the salt content of the component B and the component C is preferably 10% by mass or less, more preferably 5% by mass or less, still more preferably 3% by mass or less. Agent composition.
<35> The salt content of component B and component C is preferably 0.1% by mass or more and 10% by mass or less, more preferably 0.3% by mass or more and 5% by mass or less, and 0.7% by mass or more 3 The cleaning composition according to any one of <32> to <34>, more preferably by mass or less.
<36> The detergent composition according to any one of <1> to <35>, further comprising water (component D).
<37> The detergent composition according to <36>, wherein the content of the component D is preferably 1% by mass or more, more preferably 5% by mass or more, and further preferably 8% by mass or more.
<38> The detergent composition according to <36> or <37>, wherein the content of the component D is preferably 20% by mass or less, more preferably 15% by mass or less, still more preferably 10% by mass or less.
<39> The content of the component D is preferably 1% by mass or more and 20% by mass or less, more preferably 5% by mass or more and 15% by mass or less, further preferably 8% by mass or more and 10% by mass or less, from <36> to <. 38> The cleaning agent composition according to any one of.
<40> The detergent composition according to any one of <1> to <39>, which further contains a surfactant (component E).
<41> Compounds with chelating power, rust preventives such as benzotriazole, thickeners, dispersants, basic substances other than component B, polymer compounds, solubilizers, preservatives, bactericides, antibacterial agents, defoamers The detergent composition according to any one of <1> to <40>, which further contains at least one selected from a foaming agent and an antioxidant.
<42> A cleaning method comprising a step of cleaning an object to be cleaned having a flux residue with the detergent composition according to any one of <1> to <41>.
<43> The cleaning method according to <42>, wherein the object to be cleaned is an intermediate product for manufacturing soldered electronic components.
<44> A process of mounting at least one component selected from a semiconductor chip, a chip-type capacitor, and a circuit board on a circuit board by soldering using a flux, and a circuit of solder bumps for connecting the components and the like. <42> or <43> describes at least one step selected from the steps of forming on the substrate, and at least one selected from the circuit board on which the component is mounted and the circuit board on which the solder bump is formed. A method for manufacturing an electronic component, which includes a step of cleaning by a cleaning method.

Hereinafter, the present disclosure will be specifically described with reference to Examples, but the present disclosure is not limited to these Examples.

1. 1. Preparation of detergent composition (Examples 1 to 18, Comparative Examples 1 to 10)
The detergent compositions of Examples 1 to 18 and Comparative Examples 1 to 10 were prepared by blending each component into a 100 mL glass beaker so as to have the composition shown in Table 2 below and mixing under the following conditions. Unless otherwise specified, the numerical values of each component in Table 2 indicate the content (mass%) in the prepared detergent composition.
<Mixed conditions>
Liquid temperature: 25 ° C
Stirrer: Magnetic stirrer (50 mm rotor)
Rotation speed: 300 rpm
Stirring time: 10 minutes

The following are used as components of the detergent composition.
(Component A)
A1: Tetrahydrofurfuryl alcohol [manufactured by Fuji Film Wako Pure Chemical Industries, Ltd.]
A2: Diethylene glycol monobutyl ether [Butyl diglycol (BDG) manufactured by Nippon Emulsifier Co., Ltd.]
A3: Dipropylene glycol monobutyl ether [Butylpropylene diglycol (BFDG) manufactured by Nippon Emulsifier Co., Ltd.]
A4: Diethylene glycol dibutyl ether [dibutyl diglycol (DBDG) manufactured by Nippon Emulsifier Co., Ltd.]
A5: 1-Methyl-2-pyrrolidone [manufactured by Fuji Film Wako Pure Chemical Industries, Ltd.]
A6: Benzyl alcohol [manufactured by LANXESS Co., Ltd.]
(Component B)
B1: N, N-dibutylmonoethanolamine [Amino Alcohol 2B, manufactured by Nippon Emulsifier Co., Ltd.]
B2: N, N-dimethylbenzylamine [Kao Corporation, Kaorizer No. 20]
B3: 1,2-dimethylimidazole [manufactured by Tokyo Chemical Industry Co., Ltd.]
B4: 1-Isobutyl-2-methylimidazole [Kao Corporation, Kaorizer No. 120]
B5: Diisopropanolamine [Diisopropanolamine (DIPA) manufactured by Mitsui Kagaku Fine Co., Ltd.]
B6: Nn-Butyldiethanolamine [Amino Alcohol MBD, manufactured by Nippon Emulsifier Co., Ltd.]
(Non-component B)
B7: Triethanolamine [manufactured by Nippon Shokubai Co., Ltd.]
B8: Methyldiethanolamine [Amino Alcohol MDA, manufactured by Nippon Emulsifier Co., Ltd.]
B9: 2-Ethyl-4-methylimidazole [manufactured by Fuji Film Wako Pure Chemical Industries, Ltd.]
B10: 2-Methylimidazole [manufactured by Fuji Film Wako Pure Chemical Industries, Ltd.]
B11: Monoethanolamine [manufactured by Nippon Shokubai Co., Ltd.]
(Component C)
C1: 1-Hydroxyethylidene-1,1-diphosphonic acid [manufactured by Italmatch Japan Co., Ltd., Dayquest 2010, solid content 60% by mass]
C2: Methylene diphosphonic acid [manufactured by Fuji Film Wako Pure Chemical Industries, Ltd.]
(Component D)
Water [Pure water of 1 μS / cm or less manufactured by the pure water device G-10DSTSET manufactured by Organo Corporation]
(Component E)
E1: Polyoxyethylene decyl ether [BASF, Lutensol XL40, 10-carbon gelbealcohol ethylene oxide adduct with an average of 4 mol]
E2: 2-Ethylhexyl glyceryl ether (manufactured by the following manufacturing method)
130 g of 2-ethylhexanol and 2.84 g of boron trifluoride ether complex are cooled to 0 ° C. with stirring. While maintaining the temperature at 0 ° C., 138.8 g of epichlorohydrin is added dropwise over 1 hour. After completion of the dropping, excess alcohol is distilled off at 100 ° C. under reduced pressure (13 to 26 Pa). The reaction mixture is cooled to 50 ° C., 125 g of a 48% sodium hydroxide aqueous solution is added dropwise over 1 hour while maintaining 50 ° C., the mixture is stirred for 3 hours, and then 200 mL of water is added to separate the layers. After removing the aqueous layer, the mixture is further washed twice with 100 mL of water to obtain 208 g of crude 2-ethylhexyl glycidyl ether. 208 g of this crude 2-ethylhexyl glycidyl ether, 104.8 g of water, 5.82 g of lauric acid and 18.5 g of potassium hydroxide are placed in an autoclave and stirred at 140 ° C. for 5 hours. After dehydration at 100 ° C. under reduced pressure (6.67 kPa), 9.7 g of lauric acid and 2.72 g of potassium hydroxide were added, reacted at 160 ° C. for 15 hours, and then distilled under reduced pressure (53 to 67 Pa, 120 to 123 ° C.). To obtain 110.2 g of 2-ethylhexyl glyceryl ether.
(Other ingredients)
Benzotriazole [manufactured by Tokyo Chemical Industry Co., Ltd., 1,2,3-benzotriazole]

[Physical characteristics of amines (component B, non-component B)]
Table 1 shows the polarity term (δp) of the Hansen solubility parameter of the amine (component B, non-component B) used in the preparation of the detergent composition. The polarity term (δp) was calculated using the personal computer software “HSPiP: Hansen Solubility Parameters in Practice”.

2. Evaluation of detergent composition [Liquid state of detergent composition]
The liquid state of the detergent composition after preparation was visually observed at 25 ° C. Table 2 shows the results, with A being uniformly transparent and B being separated and not uniformly transparent. A can be determined that a stable liquid state is secured, and B can be determined that the liquid state is unstable.

[Evaluation of detergency]
The cleaning properties of the prepared detergent compositions of Examples 1 to 18 and Comparative Examples 1 to 10 were tested and evaluated.

<Test board>
The following solder paste is applied onto a copper wiring printed circuit board (10 mm × 15 mm) using a screen plate. A test substrate is prepared by reflowing at 250 ° C. in a nitrogen atmosphere.

<Composition of flux>
Completely hydrogenated rosin (manufactured by Eastman Chemical Company, Foral AX-E) 58.0% by mass
N, N'-diphenylguanidine hydrobromide (manufactured by Wako Chemical Co., Ltd.) 0.5% by mass
Adipic acid (manufactured by Wako Pure Chemical Industries, Ltd.) 0.5% by mass
Hardened castor oil (manufactured by Toyokuni Oil Co., Ltd.) 6.0% by mass
Hexyl glycol (manufactured by Nippon Emulsifier Co., Ltd.) 35.0% by mass

<Flux manufacturing method>
A flux having the above composition was obtained by adding the remaining other components to the solvent hexyl glycol and dissolving the components.

<Manufacturing method of solder paste>
11.0 g of the above flux and 89.0 g of solder powder [M705 (Sn / Ag / Cu = 96.5 / 3 / 0.5)] manufactured by Senju Metal Industry Co., Ltd. were kneaded for 1 hour to prepare.

<Washing test>
The cleaning test was carried out according to the following procedure.
First, an ultrasonic cleaning tank, a first rinse tank, and a second rinse tank are prepared under the following conditions. The ultrasonic cleaning tank is set to a frequency of 40 kHz and an output of 200 W. It was obtained by adding 100 g of each detergent composition to a 50 mL glass beaker, putting it in an ultrasonic cleaning layer, and heating it to 60 ° C. For the first rinse tank and the second rinse tank, prepare two 100 mL glass beakers containing one 50 mm rotor, add 100 g of pure water to each, put them in a warm bath, and stir at a rotation speed of 100 rpm to 40. Obtained by heating to ° C.
Next, the test substrate is held by tweezers, inserted into the ultrasonic cleaning tank, and immersed for 1 minute. Next, the test substrate is held by tweezers, inserted into the first rinse tank, and immersed for 1 minute while stirring at a rotation speed of 100 rpm.
Further, the test substrate is held by tweezers, inserted into the second rinse tank, and immersed for 1 minute while stirring at a rotation speed of 100 rpm.
Finally, the test substrate is nitrogen purged and dried.

<Evaluation of detergency (flux removal)>
After cleaning, the test substrate is observed with a desktop microscope Miniscope TM3030 (manufactured by Hitachi High-Technologies Corporation), and the presence or absence of flux residue remaining on any 9-point solder bump is visually confirmed, and the number of solder bumps on which the flux residue remains. Counted. The results are shown in Table 2.
Furthermore, the test substrate was observed with an optical microscope VHX-2000 (manufactured by KEYENCE CORPORATION), the presence or absence of flux residue remaining in the vicinity of the solder bump was visually confirmed, and the number of solder bumps in which the flux residue remained in the vicinity of the solder bump was counted. .. The results are shown in Table 2.

<Evaluation of detergency (tin removal property)>
In order to confirm the detergency for tin oxide generated in the vicinity of the solder bumps during reflow, the solubility of tin oxide and the reprecipitation inhibitory property after dissolution were evaluated by the following methods.
20 g of the detergent composition was added to a 50 mL glass beaker, 1 g of tin (IV) oxide was added, and the mixture was stirred at 25 ° C. for 3 hours using a stirrer. Then, the supernatant obtained by precipitating undissolved tin oxide (IV) by centrifugation was diluted 2-fold with 1-methyl-2-pyrrolidone to obtain a measurement solution. The Sn concentration in the measuring solution was measured using an ICP emission spectrophotometer (Agilent 5110 ICP-OES, manufactured by Agilent), and the amount of Sn dissolved in the cleaning agent composition (ppm) was calculated. The results are shown in Table 2.

<Evaluation of detergency (rosin solubility)>
In order to confirm the affinity of the flux, the solubility of rosin acid used as a component of the flux was evaluated by the following method.
100 g of a cleaning agent composition and 1 g of rosinic acid were added to a 50 mL glass beaker, and ultrasonic treatment was performed at 25 ° C. for 1 hour under the condition that the frequency was set to 40 kHz and the output was 200 W using an ultrasonic cleaning tank. When the rosin acid was dissolved, 1 g of the rosin acid was further added, and the same operation was performed. The solubility was estimated by repeating this operation until the rosin acid became undissolved. It can be evaluated that the higher the solubility, the better the rosin-based flux removability. From the viewpoint of rosin-based flux removability, the solubility is preferably 40% by mass or more, more preferably 50% by mass or more, further preferably 55% by mass or more, and further preferably 60% by mass or more.
[Evaluation criteria]
A: Solubility is 60% by mass or more B: Solubility is 50% by mass or more and less than 60% by mass C: Solubility is 40% by mass or more and less than 50% by mass D: Solubility is less than 40% by mass

As shown in Table 2 above, the detergent compositions of Examples 1 to 18 have a flux while ensuring a stable liquid state as compared with Comparative Examples 1 to 10 in which at least one of the components A to C is not blended. It was excellent in removability and tin removability. Further, the detergent compositions of Examples 1 to 9, 12, 14 to 18 have a high solubility of logonic acid of 50% by mass or more, and are excellent in rosin-based flux removability as compared with Examples 10 to 11 and 13. It turned out.

By using the cleaning agent composition of the present disclosure, the flux residue can be washed satisfactorily. Therefore, for example, the cleaning process of the flux residue in the manufacturing process of the electronic component can be shortened, and the performance and reliability of the manufactured electronic component can be shortened. Can be improved, and the productivity of semiconductor devices can be improved.

Claims (15)

Solvent (component A) and
Amine (component B) having a polarity term (δp) of 7.8 or less in the Hansen solubility parameter,
A detergent composition for removing a flux residue, which comprises a diphosphonic acid (component C) represented by the following formula (VI).

In the above formula (VI), X is an alkylene group or a hydroxyalkylene group having 1 or more and 6 or less carbon atoms. Solvent (component A) and
Amine (component B) having a polarity term (δp) of 7.8 or less in the Hansen solubility parameter,
A detergent composition for removing a flux residue, which comprises a diphosphonic acid (component C) represented by the following formula (VI).

In the above formula (VI), X is an alkylene group or a hydroxyalkylene group having 1 or more and 6 or less carbon atoms. The detergent composition according to claim 1 or 2, wherein the molar ratio B / C of the component B to the component C is 4 or more and 40 or less. The content of component A is 70% by mass or more and 99.5% by mass or less.
The content of component B is 0.2% by mass or more and 15% by mass or less.
The detergent composition according to any one of claims 1 to 3, wherein the content of the component C is 0.1% by mass or more and 3% by mass or less. The solvent (component A) is at least one solvent selected from the compound represented by the following formula (I), the compound represented by the following formula (II), and the compound represented by the following formula (III). The detergent composition according to any one of claims 1 to 4.
R ¹ −O − (AO) _n −R ² (I)
In the above formula (I), R ¹ is a phenyl group or an alkyl group having 1 or more and 8 or less ^{carbon atoms, R 2} is a hydrogen atom or an alkyl group having 1 or more and 4 or less carbon atoms, and AO is an ethylene oxide group or propylene oxide. It is a group, and n is the number of added moles of AO, which is an integer of 1 or more and 3 or less.
R ^3- CH ₂ OH (II)
In the above formula (II), R ³ is a phenyl group, a benzyl group, a cyclohexyl group, a frill group, a tetrahydrofuryl group, a furfuryl group or a tetrahydrofurfuryl group.

In the above formula (III), R ⁴ , R ⁵ , R ⁶ and R ⁷ are independently composed of a hydrogen atom, a hydrocarbon group having 1 or more and 8 or less carbon atoms, and a hydroxyalkyl group or hydroxyl group having 1 or more and 3 or less carbon atoms. be. The cleaning composition according to any one of claims 1 to 5, wherein the amine (component B) is an amine represented by the following formula (IV) or (V).

In the above formula (IV), R ⁸ is a hydrogen atom, an alkyl group having 1 or more and 6 or less carbon atoms, a phenyl group, a benzyl group, a hydroxyethyl group or a hydroxypropyl group, and R ⁹ and R ¹⁰ have independent carbon atoms. It is an alkyl group of 1 or more and 6 or less, a hydroxyethyl group, or a hydroxypropyl group.

In the above formula (V), R ¹¹ is an alkyl group having 1 or more carbon atoms and 4 or less carbon atoms, and R ¹² is a hydrogen atom or a methyl group. The detergent composition according to any one of claims 1 to 6, further comprising water (component D). The cleaning composition according to claim 7, wherein the content of the component D is 20% by mass or less. The cleaning composition according to claim 7 or 8, wherein the content of the component D is 1% by mass or more. The cleaning composition according to any one of claims 1 to 9, wherein the mass ratio (A / B) of the component A to the component B is 5 or more and 60 or less. Claims 1 to 10, wherein the component B is at least one selected from dibutylmonoethanolamine, butyldiethanolamine, diisopropanolamine, dimethylbenzylamine, 1,2-dimethylimidazole and 1-isobutyl-2-methylimidazole. The cleaning agent composition according to any one. A cleaning method comprising a step of cleaning an object to be cleaned having a flux residue with the detergent composition according to any one of claims 1 to 11. The cleaning method according to claim 12, wherein the object to be cleaned is an intermediate for manufacturing soldered electronic components. A process of mounting at least one component selected from a semiconductor chip, a chip-type capacitor, and a circuit board on the circuit board by soldering using a flux, and a solder bump for connecting the components and the like on the circuit board. The cleaning method according to claim 12 or 13 is used to clean at least one step selected from the forming steps, and at least one selected from the circuit board on which the component is mounted and the circuit board on which the solder bumps are formed. A method of manufacturing an electronic component, including a process. Use of the cleaning agent composition according to any one of claims 1 to 11 as a flux cleaning agent for an object to be cleaned having a flux residue.