TW201501814A - Exhaust valve system - Google Patents

Exhaust valve system Download PDF

Info

Publication number
TW201501814A
TW201501814A TW103120367A TW103120367A TW201501814A TW 201501814 A TW201501814 A TW 201501814A TW 103120367 A TW103120367 A TW 103120367A TW 103120367 A TW103120367 A TW 103120367A TW 201501814 A TW201501814 A TW 201501814A
Authority
TW
Taiwan
Prior art keywords
exhaust
coating liquid
manifold
pressure
air
Prior art date
Application number
TW103120367A
Other languages
Chinese (zh)
Other versions
TWI615206B (en
Inventor
Nobuo Horiuchi
Original Assignee
Toray Eng Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toray Eng Co Ltd filed Critical Toray Eng Co Ltd
Publication of TW201501814A publication Critical patent/TW201501814A/en
Application granted granted Critical
Publication of TWI615206B publication Critical patent/TWI615206B/en

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C11/00Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C11/00Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
    • B05C11/10Storage, supply or control of liquid or other fluent material; Recovery of excess liquid or other fluent material
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C5/00Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
    • B05C5/02Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
    • B05C5/0254Coating heads with slot-shaped outlet
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C9/00Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important
    • B05C9/08Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important for applying liquid or other fluent material and performing an auxiliary operation
    • B05C9/10Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important for applying liquid or other fluent material and performing an auxiliary operation the auxiliary operation being performed before the application
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303Apparatus specially adapted to the manufacture of LCDs
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps

Landscapes

  • Coating Apparatus (AREA)

Abstract

The purpose of the present invention is to provide an exhaust valve system which can perform an exhaust valve processing in a short period of time, and inhibit degrading of coating liquid so as to reutilize the coating liquid exhausted by the exhaust valve processing. The present invention discloses an exhaust valve system for a coating device. The coating device makes use of a mouth-shaped plate part having a manifold stored therein the coating liquid and a slit nozzle to eject the coating liquid from the slit nozzle, and performs a scanning to form a coating on a substrate. The exhaust valve system is constituted by: a coating liquid supply hole arranged in the mouth-shaped plate part for supplying the coating liquid to the manifold; and an exhaust valve hole for exhausting the air existed in the manifold by supplying the coating liquid from the coating liquid supply hole. The exhaust valve system includes: an exhaust valve slot for storing the coating liquid containing the air exhausted from the exhaust valve hole; and a pressure reducer for reducing the pressure of the exhaust valve slot.

Description

排氣弁系統 Exhaust system

本發明係關於將塗佈液塗佈於基板上之塗佈裝置之排氣弁系統者,尤其是為排出存在於口型板內之空氣所使用者。 The present invention relates to an exhaust system of a coating apparatus for applying a coating liquid onto a substrate, and more particularly to a user who discharges air present in the die plate.

於液晶顯示器或電漿顯示器等平面顯示器中,使用將抗蝕劑液塗佈於由玻璃等組成之基板上者(稱作塗佈基板)。此塗佈基板係藉由均勻地塗佈抗蝕劑液(以下,稱作塗佈液)之塗佈裝置形成。即,塗佈裝置具有載置基板之台板、及具有噴出塗佈液之口型板部之塗佈單元,且藉由進行一邊自口型板部之狹縫噴嘴噴出塗佈液,一邊使基板與塗佈單元相對移動之塗佈動作,而於基板上形成特定厚度之塗佈膜。 In a flat panel display such as a liquid crystal display or a plasma display, a resist liquid is applied to a substrate composed of glass or the like (referred to as a coated substrate). This coated substrate is formed by a coating device that uniformly applies a resist liquid (hereinafter referred to as a coating liquid). In other words, the coating apparatus includes a platen on which the substrate is placed, and a coating unit having a die-shaped plate portion for discharging the coating liquid, and the coating liquid is ejected from the slit nozzle of the die plate portion while being performed. A coating operation in which the substrate and the coating unit are relatively moved, and a coating film having a specific thickness is formed on the substrate.

一般,於此種塗佈動作之前,進行例如下述專利文獻1所示之排氣弁處理。即,於口型板部中,設置有暫時貯留藉由泵等供給之塗佈液之岐管,以於該岐管混有氣泡或氣阱等空氣之狀態進行塗佈動作時,噴出塗佈液之壓力容易產生變動,而成為塗佈不均勻之重要因素。因此,藉由進行排氣弁處理排出存在於岐管之空氣,可自狹縫噴嘴穩定地噴出塗佈液,而抑制塗佈不均勻之發生。 In general, for example, the exhaust gas enthalpy treatment shown in Patent Document 1 below is performed before such a coating operation. In other words, in the die plate portion, a manifold for temporarily storing a coating liquid supplied by a pump or the like is provided, and when the nozzle is mixed with air such as a bubble or a gas trap, the coating operation is performed, and the coating is performed. The pressure of the liquid is liable to change, and it becomes an important factor in uneven coating. Therefore, by discharging the air existing in the manifold by performing the exhaust enthalpy treatment, the coating liquid can be stably ejected from the slit nozzle, and the occurrence of coating unevenness can be suppressed.

具體而言,如圖5所示,於口型板部100中,除了供給塗佈液之塗佈液供給孔101以外,設置有複數個排出岐管102之空氣之排氣弁孔103。接著,分別對該等排氣弁孔103設置有排氣弁槽104,該等排氣弁孔103與排氣弁槽104係通過排氣弁配管105以1對1連結。於排氣弁 處理中,藉由自塗佈液供給孔101供給塗佈液,自狹縫噴嘴106及排氣弁孔103將存在於岐管102之空氣與塗佈液一起排出。接著,藉由自塗佈液供給孔101繼續供給塗佈液,全部排出岐管102之空氣而以塗佈液充滿岐管102。於該排氣弁處理完成後,進行塗佈動作,藉此於基板上形成穩定之塗佈膜。 Specifically, as shown in FIG. 5, in the die plate portion 100, in addition to the coating liquid supply hole 101 for supplying the coating liquid, a plurality of exhaust vent holes 103 for discharging the air of the manifold 102 are provided. Next, the exhaust boring holes 103 are provided with the exhaust boring grooves 104, and the exhaust boring holes 103 and the exhaust boring grooves 104 are connected in a one-to-one manner by the exhaust enthalpy piping 105. Exhaust gas In the treatment, the coating liquid is supplied from the coating liquid supply hole 101, and the air existing in the manifold 102 is discharged together with the coating liquid from the slit nozzle 106 and the exhaust boring 103. Then, the coating liquid is continuously supplied from the coating liquid supply hole 101, and all of the air of the manifold 102 is discharged to fill the manifold 102 with the coating liquid. After the exhaust enthalpy treatment is completed, a coating operation is performed to form a stable coating film on the substrate.

[先前技術文獻] [Previous Technical Literature] [專利文獻] [Patent Literature]

[專利文獻1]日本特開2009-131788號公報 [Patent Document 1] Japanese Patent Laid-Open Publication No. 2009-131788

先前,廢棄貯留於排氣弁槽之塗佈液(包含空氣之塗佈液)。然而,近年來隨著液晶面板之價格下降,有欲再利用貯留於排氣弁槽之塗佈液之需求。因此,將貯留於排氣弁槽之塗佈液通過氣泡去除裝置完全去除塗佈液中之空氣後(脫氣後),返回於將塗佈液供給於岐管之泵而實現再利用。 Previously, the coating liquid (including the coating liquid of air) stored in the exhaust gutter was discarded. However, in recent years, as the price of the liquid crystal panel has decreased, there is a demand for reusing the coating liquid stored in the exhaust gutter. Therefore, the coating liquid stored in the exhaust grate is completely removed by the bubble removing device (after degassing), and returned to the pump that supplies the coating liquid to the manifold to be reused.

然而,於塗佈前進行之排氣弁處理花費時間,且將貯留於排氣弁槽之塗佈液通過氣泡去除裝置實現再利用係需要較多之時間。其結果,有導致塗佈裝置整體之生產作業時間延長之問題。又,花費時間後,由於貯留於排氣弁槽之塗佈液長時間暴露於大氣而引起塗佈液劣化。若再利用此種塗佈液則存在有對塗佈膜之品質造成影響之虞之問題。 However, it takes time to perform the exhaust gas treatment before the coating, and it takes a long time to realize the recycling of the coating liquid stored in the exhaust gas discharge tank by the bubble removing device. As a result, there is a problem that the production work time of the entire coating apparatus is prolonged. Moreover, after taking time, the coating liquid stored in the exhaust gutter is exposed to the atmosphere for a long time, and the coating liquid is deteriorated. If such a coating liquid is reused, there is a problem that the quality of the coating film is affected.

本發明係鑑於上述之問題點而完成者,目的在於提供一種可以短時間進行排氣弁處理,可抑制塗佈液劣化而再利用以排氣弁處理排出之塗佈液之排氣弁系統。 The present invention has been made in view of the above problems, and it is an object of the invention to provide an exhaust gas enthalpy system which can perform exhaust gas enthalpy treatment in a short period of time and can suppress deterioration of a coating liquid and reuse a coating liquid discharged and discharged by an exhaust gas.

為解決上述問題,本發明之排氣弁系統其特徵在於:其係一種 塗佈裝置之排氣弁系統,該塗佈裝置係藉由使具有貯留塗佈液之岐管與狹縫噴嘴之口型板部自上述狹縫噴嘴噴出塗佈液且進行掃描而於基板上形成塗佈膜,該排氣弁系統係於上述口型板部中,設置有將塗佈液供給於岐管之塗佈液供給孔、及藉由自該塗佈液供給孔供給塗佈液而排出存在於上述岐管之空氣之排氣弁孔,且具備:排氣弁槽,其貯留自上述排氣弁孔排出之包含空氣之塗佈液;減壓器,其係將上述排氣弁槽之壓力減壓。 In order to solve the above problems, the exhaust enthalpy system of the present invention is characterized in that it is a type An exhausting system of a coating apparatus for spraying a coating liquid from the slit nozzle and scanning the substrate by a die plate portion having a manifold and a slit nozzle for storing the coating liquid on the substrate A coating film is formed in the mouth plate portion, and a coating liquid supply hole for supplying a coating liquid to the manifold and a coating liquid supplied from the coating liquid supply hole are provided. And discharging an exhaust boring hole of the air existing in the manifold, and comprising: an exhaust sump that stores a coating liquid containing air discharged from the exhaust boring hole; and a pressure reducing device that exhausts the exhaust The pressure of the gutter is decompressed.

依據上述排氣弁系統,藉由利用上述減壓器將排氣弁槽之壓力減壓,於自排氣弁孔排出空氣及包含空氣之塗佈液(空氣混入液)時,由於排氣弁槽之壓力較以大氣壓進行排氣弁處理之情形低,故容易以短時間將空氣混入液自排氣弁孔排出。 According to the exhaust enthalpy system, the pressure of the exhaust sump is decompressed by the pressure reducer, and when the air and the coating liquid (air mixture) containing air are discharged from the exhaust boring hole, Since the pressure of the tank is lower than that in the case of exhaust gas treatment at atmospheric pressure, it is easy to discharge the air mixed liquid from the exhaust port in a short time.

接著,由於藉由將排氣弁槽減壓,貯留於排氣弁槽之塗佈液暴露於較大氣壓低之壓力狀態,故而與排氣弁槽為大氣壓之情形相比較,容易排出塗佈液中所包含之空氣(容易脫氣),而可以短時間去除塗佈液所包含之空氣。另,藉由仍將排氣弁槽繼續減壓,亦可去除於大氣壓中難以消除之溶存於塗佈液之空氣。因此,可以短時間進行排氣弁處理,且於再利用排氣弁槽內之塗佈液之情形時,亦可抑制該塗佈液劣化。 Then, by depressurizing the exhaust sump, the coating liquid stored in the exhaust sump is exposed to a pressure state in which the atmospheric pressure is low, so that the coating liquid is easily discharged as compared with the case where the exhaust sump is at atmospheric pressure. The air contained in the air (easy to degas), and the air contained in the coating liquid can be removed in a short time. Further, by continuously reducing the pressure in the exhaust gutter, it is possible to remove the air dissolved in the coating liquid which is difficult to remove at atmospheric pressure. Therefore, the exhaust gas enthalpy treatment can be performed in a short time, and when the coating liquid in the exhaust gas sump is reused, deterioration of the coating liquid can be suppressed.

又,亦可設為如下構成:於上述口型板中,設置有複數個排氣弁孔,藉由將各排氣弁孔與上述排氣弁槽以配管連接,將自各個排氣弁孔排出之包含空氣之塗佈液貯留於共通之排氣弁槽。 Further, a configuration may be adopted in which a plurality of exhaust boring holes are provided in the die plate, and each of the exhaust boring holes is connected to the exhaust sump by a pipe, and each of the exhaust boring holes is bored. The discharged coating liquid containing air is stored in a common exhaust sump.

依據此構成,與相對於排氣弁孔分別設置排氣弁槽之情形相比較,可實現省空間化。另一方面,若設置複數個排氣弁槽,則為配合自各個排氣弁孔排出之塗佈液之量,需要個別實施排氣弁槽減壓時之壓力設定。根據該觀點,亦期望構成為將自各個排氣弁孔排出之包含空氣之塗佈液貯留於共通之排氣弁槽。 According to this configuration, space saving can be achieved as compared with the case where the exhaust sump is provided separately from the exhaust boring. On the other hand, if a plurality of exhaust gutters are provided, it is necessary to individually perform the pressure setting at the time of decompressing the exhaust grate in order to match the amount of the coating liquid discharged from each of the exhaust ports. From this point of view, it is also desirable to store the coating liquid containing air discharged from each of the exhaust boring holes in the common exhaust sump.

又,亦可設為如下構成:具備將上述排氣弁槽之壓力加壓之加壓器,藉由使該加壓器將上述排氣弁槽內加壓,使脫氣後之上述排氣弁槽內之塗佈液返回於上述口型板部之岐管。 Further, a configuration may be adopted in which a pressurizer that pressurizes the pressure of the exhaust gutter is provided, and the pressurizer pressurizes the exhaust chute to deaerate the exhaust gas. The coating liquid in the gutter is returned to the manifold of the above-mentioned lip plate portion.

依據此構成,貯留於排氣弁槽之塗佈液係於脫氣完成後,藉由上述加壓器將排氣弁槽內加壓,而可返回於岐管。即,由於排氣弁槽內之塗佈液係於脫氣完成後,不經由氣泡去除裝置,而可立刻返回於岐管,故可使脫氣後之塗佈液暴露於大氣之時間為較短時間,而可極力抑制塗佈液劣化而返回於岐管。 According to this configuration, after the degassing is completed, the coating liquid stored in the exhaust grate is pressurized by the pressurizing device to return to the manifold. That is, since the coating liquid in the exhaust grate is returned to the manifold immediately after the completion of the degassing without passing through the bubble removing device, the exposure time of the degassed coating liquid to the atmosphere is relatively high. In a short time, it is possible to suppress the deterioration of the coating liquid as much as possible and return to the manifold.

又,亦可設為如下構成:上述減壓器與上述加壓器係共通之壓力調整器。 Further, a pressure regulator in which the pressure reducer and the pressurizer are common may be used.

依據此構成,藉由將壓力器與加壓器設為共通之壓力調整器,可減少裝置之零件數量而抑制成本。 According to this configuration, by providing the pressure regulator and the pressurizer as common pressure regulators, the number of parts of the apparatus can be reduced and the cost can be suppressed.

依據本發明之排氣弁系統,可以短時間進行排氣弁處理,且可抑制塗佈液劣化而再利用以排氣弁處理排出之塗佈液。 According to the exhaust gas enthalpy system of the present invention, the exhaust gas enthalpy treatment can be performed in a short time, and the coating liquid can be prevented from being deteriorated, and the coating liquid discharged by the exhaust gas treatment can be reused.

2‧‧‧基台 2‧‧‧Abutment

10‧‧‧基板 10‧‧‧Substrate

21‧‧‧台板 21‧‧‧ board

22‧‧‧軌道 22‧‧‧ Track

25‧‧‧廢液托盤 25‧‧‧ Waste tray

30‧‧‧塗佈單元 30‧‧‧ Coating unit

31‧‧‧腿部 31‧‧‧ legs

33‧‧‧線性馬達 33‧‧‧Linear motor

34‧‧‧口型板部 34‧‧‧Mouth plate department

34a‧‧‧狹縫噴嘴 34a‧‧‧Slit nozzle

35‧‧‧滑動器 35‧‧‧ slider

37‧‧‧軌道 37‧‧‧ Track

41‧‧‧岐管 41‧‧‧岐管

41a‧‧‧中央部 41a‧‧‧Central Department

41b‧‧‧側端部 41b‧‧‧Side end

42‧‧‧塗佈液供給孔 42‧‧‧ Coating solution supply hole

43‧‧‧排氣弁孔 43‧‧‧Exhaust boring

43L‧‧‧排氣弁孔 43L‧‧‧Exhaust boring

43R‧‧‧排氣弁孔 43R‧‧‧Exhaust boring

44‧‧‧排氣孔 44‧‧‧ venting holes

51‧‧‧塗佈液供給用泵 51‧‧‧ Coating liquid supply pump

51a‧‧‧配管 51a‧‧‧Pipe

51b‧‧‧閥門 51b‧‧‧Valves

52‧‧‧排氣配管 52‧‧‧Exhaust piping

52a‧‧‧排氣閥門 52a‧‧‧Exhaust valve

53‧‧‧排氣弁配管 53‧‧‧Exhaust gas piping

53a‧‧‧排氣弁閥門 53a‧‧‧Exhaust valve

54‧‧‧接頭 54‧‧‧Connectors

55‧‧‧供給配管 55‧‧‧Supply piping

60‧‧‧排氣弁槽 60‧‧‧Exhaust trough

70‧‧‧壓力調整器 70‧‧‧pressure regulator

70a‧‧‧真空噴射器 70a‧‧‧Vacuum ejector

71‧‧‧真空埠 71‧‧‧vacuum

71a‧‧‧真空配管 71a‧‧‧Vacuum piping

72‧‧‧壓空埠 72‧‧‧ Pressure space

72a‧‧‧壓空配管 72a‧‧‧Square piping

73‧‧‧排氣埠 73‧‧‧Exhaust gas

73a‧‧‧排氣配管 73a‧‧‧Exhaust piping

73b‧‧‧排氣閥門 73b‧‧‧Exhaust valve

74‧‧‧壓空泵 74‧‧‧Air pump

100‧‧‧口型板部 100‧‧‧ mouth plate department

101‧‧‧塗佈液供給孔 101‧‧‧ Coating solution supply hole

102‧‧‧岐管 102‧‧‧岐管

103‧‧‧排氣弁孔 103‧‧‧Exhaust boring

104‧‧‧排氣弁槽 104‧‧‧Exhaust gutter

105‧‧‧排氣弁配管 105‧‧‧Exhaust gas piping

106‧‧‧狹縫噴嘴 106‧‧‧Slit nozzle

531‧‧‧平行部分 531‧‧‧ parallel part

532‧‧‧垂直部分 532‧‧‧ vertical part

X‧‧‧軸方向 X‧‧‧axis direction

Y‧‧‧軸方向 Y‧‧‧ axis direction

Z‧‧‧軸方向 Z‧‧‧Axis direction

圖1係顯示本發明之實施形態之塗佈裝置之立體圖。 Fig. 1 is a perspective view showing a coating apparatus according to an embodiment of the present invention.

圖2係顯示塗佈單元之腿部附近之概略圖。 Fig. 2 is a schematic view showing the vicinity of the leg portion of the coating unit.

圖3係概略性顯示口型板部及排氣弁槽之配管路徑之圖。 Fig. 3 is a view schematically showing a piping path of the lip plate portion and the exhaust chute.

圖4係顯示口型板部之岐管之圖。 Fig. 4 is a view showing the manifold of the lip plate portion.

圖5係顯示先前之塗佈裝置之口型板部及排氣弁槽之構成之圖。 Fig. 5 is a view showing the configuration of a lip plate portion and an exhaust gutter of the prior coating device.

使用圖式對本發明之實施形態進行說明。 Embodiments of the present invention will be described using the drawings.

圖1係概略性顯示設置有本發明之排氣弁槽之塗佈裝置之立體圖,圖2係顯示塗佈裝置之塗佈單元之腿部附近之圖,圖3係概略性顯示口型板部及排氣弁槽之配管路徑之圖,圖4係顯示口型板部之岐管 之圖。 BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a perspective view schematically showing a coating device provided with an exhaust groove of the present invention, Fig. 2 is a view showing a vicinity of a leg portion of a coating unit of a coating device, and Fig. 3 is a schematic view showing a die plate portion. And the piping path of the exhaust gutter, and FIG. 4 shows the manifold of the lip plate. Picture.

如圖1~圖4所示,塗佈裝置係於基板10上形成藥液或抗蝕劑液等液狀物(以下稱為塗佈液)之塗佈膜者,且具備基台2、用以載置基板10之台板21、構成為可相對於該台板21於特定方向移動之塗佈單元30。 As shown in FIG. 1 to FIG. 4, the coating apparatus is formed on a substrate 10 to form a coating film of a liquid material (hereinafter referred to as a coating liquid) such as a chemical liquid or a resist liquid, and is provided with a base 2 and The platen 21 on which the substrate 10 is placed is configured as a coating unit 30 that is movable in a specific direction with respect to the platen 21.

另,於以下之說明中,將塗佈單元30移動之方向作為X軸方向,將與其於水平面上正交之方向作為Y軸方向,將與X軸及Y軸方向之雙方正交之方向作為Z軸方向而進行說明。 In the following description, the direction in which the coating unit 30 is moved is referred to as the X-axis direction, and the direction orthogonal to the horizontal plane is referred to as the Y-axis direction, and the direction orthogonal to both the X-axis and the Y-axis direction is defined as The Z axis direction will be described.

於上述基台2,於其中央部分配置有台板21。該台板21係載置所搬入之基板10者。於該台板21,設置有基板保持機構,藉由該基板保持機構保持基板10。具體而言,形成有形成於台板21之表面之複數個吸引孔,藉由使該吸引孔產生吸引力而可將基板10吸附保持於台板21之表面。 In the base 2 described above, a platen 21 is disposed at a central portion thereof. The platen 21 is placed on the substrate 10 to be loaded. A substrate holding mechanism is provided on the platen 21, and the substrate 10 is held by the substrate holding mechanism. Specifically, a plurality of suction holes formed on the surface of the platen 21 are formed, and the substrate 10 can be adsorbed and held on the surface of the platen 21 by causing attraction to the suction holes.

又,於台板21中,設置有使基板10升降動作之基板升降機構。具體而言,於台板21之表面形成有複數個銷孔,於該銷孔中埋設有可於Z軸方向升降動作之提升銷(未圖示)。即,於使提升銷自台板21之表面突出之狀態下搬入基板10時,提升銷之前端部分抵接於基板10而可保持基板10。接著,藉由自該狀態使提升銷下降而收納於銷孔,可將基板10載置於台板21之表面。 Further, a plate elevating mechanism for moving the substrate 10 up and down is provided in the platen 21. Specifically, a plurality of pin holes are formed in the surface of the platen 21, and a lift pin (not shown) that can be moved up and down in the Z-axis direction is embedded in the pin hole. In other words, when the lift pin is carried into the substrate 10 while protruding from the surface of the platen 21, the front end portion of the lift pin abuts against the substrate 10 to hold the substrate 10. Then, the lift pins are lowered in this state and housed in the pin holes, whereby the substrate 10 can be placed on the surface of the platen 21.

又,塗佈單元30係將塗佈液噴出於基板10上且形成塗佈膜者。該塗佈單元30係如圖1、圖2所示,具有與基台2連結之腿部31及朝Y軸方向延伸之口型板部34,且安裝為可以於Y軸方向跨越基台2上之狀態朝X軸方向移動。具體而言,於基台2之Y軸方向兩端部分分別設置有朝X軸方向延伸之軌道22,且將腿部31以自由滑動之方式安裝於該軌道22。接著,於腿部31中安裝有線性馬達33,藉由驅動控制該線性馬達33,可使塗佈單元30朝X軸方向移動,並於任意之位置停止。 Further, the coating unit 30 is a person who sprays a coating liquid onto the substrate 10 and forms a coating film. As shown in FIGS. 1 and 2, the coating unit 30 has a leg portion 31 coupled to the base 2 and a lip plate portion 34 extending in the Y-axis direction, and is mounted so as to be able to span the base 2 in the Y-axis direction. The upper state moves in the X-axis direction. Specifically, the rails 22 extending in the X-axis direction are respectively provided at both end portions of the base 2 in the Y-axis direction, and the leg portions 31 are attached to the rails 22 so as to be freely slidable. Next, a linear motor 33 is attached to the leg portion 31, and by driving the linear motor 33, the coating unit 30 can be moved in the X-axis direction and stopped at an arbitrary position.

又,於塗佈單元30之腿部31中,如圖2所示,安裝有塗佈塗佈液之口型板部34。具體而言,於該腿部31中設置有朝Z軸方向延伸之軌道37、及沿著該軌道37滑動之滑動器35,且將該等滑動器35與口型板部34連結。接著,於滑動器35中安裝有藉由伺服馬達驅動之滾珠螺杆機構,藉由驅動控制該伺服馬達,使滑動器35朝Z軸方向移動,且可於任意之位置停止。即,支持口型板部34使其可相對於保持於台板21之基板10相接或離開。 Further, in the leg portion 31 of the coating unit 30, as shown in Fig. 2, a die-shaped plate portion 34 to which a coating liquid is applied is attached. Specifically, the leg portion 31 is provided with a rail 37 extending in the Z-axis direction and a slider 35 sliding along the rail 37, and the slider 35 is coupled to the lip plate portion 34. Next, a ball screw mechanism driven by a servo motor is attached to the slider 35, and the servo motor is driven to move the slider 35 in the Z-axis direction and can be stopped at an arbitrary position. That is, the lip plate portion 34 is supported so as to be in contact with or away from the substrate 10 held by the platen 21.

又,口型板部34係噴出塗佈液且於基板10上形成塗佈膜者。該口型板部34係具有朝一個方向延伸之形狀之柱狀構件,且係以與塗佈單元30之行走方向大致正交之方式設置。於該口型板部34中,形成有朝長邊方向延伸之狹縫噴嘴34a,將供給於口型板部34之塗佈液自狹縫噴嘴34a遍及長邊方向相同地噴出。因此,藉由以自該狹縫噴嘴34a噴出塗佈液之狀態使塗佈單元30朝X軸方向行走,遍及狹縫噴嘴34a之長邊方向於基板10上形成一定厚度之塗佈膜。另,於本實施形態中,將為塗佈塗佈液而以自狹縫噴嘴34a噴出塗佈液之狀態使塗佈單元30移動之動作稱為塗佈動作。 Further, the lip plate portion 34 is a method in which a coating liquid is discharged and a coating film is formed on the substrate 10. The lip plate portion 34 has a columnar member having a shape extending in one direction, and is provided to be substantially orthogonal to the traveling direction of the coating unit 30. In the die plate portion 34, a slit nozzle 34a extending in the longitudinal direction is formed, and the coating liquid supplied to the die plate portion 34 is ejected from the slit nozzle 34a in the same direction in the longitudinal direction. Therefore, the coating unit 30 is moved in the X-axis direction in a state where the coating liquid is ejected from the slit nozzle 34a, and a coating film having a constant thickness is formed on the substrate 10 in the longitudinal direction of the slit nozzle 34a. In the present embodiment, the operation of moving the coating unit 30 in a state where the coating liquid is ejected from the slit nozzle 34a by applying the coating liquid is referred to as a coating operation.

又,如圖3、圖4所示,口型板部34具有:岐管41,其貯留塗佈液;塗佈液供給孔42,其將塗佈液供給於該岐管41;排氣弁孔43,其排出存在於岐管41之氣泡或氣阱等空氣。此處,排氣弁孔43係將朝向紙面位於左側之排氣弁孔43特別稱為排氣弁孔43L,將位於右側之排氣弁孔43特別稱為排氣弁孔43R,於各者所指無區別之情形時,簡稱為排氣弁孔43。 Further, as shown in FIGS. 3 and 4, the die plate portion 34 has a manifold 41 for storing a coating liquid, and a coating liquid supply hole 42 for supplying a coating liquid to the manifold 41; The hole 43 discharges air such as a bubble or a gas trap existing in the manifold 41. Here, the exhaust boring hole 43 is specifically referred to as an exhaust boring hole 43L on the left side toward the paper surface, and the exhaust boring hole 43 on the right side is specifically referred to as an exhaust boring hole 43R, in each case. In the case of an indistinguishable case, it is simply referred to as an exhaust bore 43.

岐管41係暫時貯留所供給之塗佈液之部分,於本實施形態中,係沿著長邊方向形成於口型板部34之內部。具體而言,具有沿著口型板部34之長邊方向延伸之形狀,且形成為於長邊方向中央部41a部分之中央部41a最高,於長邊方向兩端部分之側端部41b變低,下側部分 連通於狹縫噴嘴34a。中央部41a之頂上部分與排氣孔44連通,於該排氣孔44之下側部分連通有塗佈液供給孔42。該塗佈液供給孔42係與供給塗佈液之塗佈液供給用泵51以供給配管55連結,使塗佈液供給用泵51作動而供給塗佈液時,自塗佈液供給孔42將塗佈液供給於岐管41。接著,岐管41內之空氣、及所供給之塗佈液中之空氣係與供給塗佈液同時,藉由浮力彙集於中央部41a,且通過排氣孔44排出。 The manifold 41 temporarily stores the portion of the coating liquid supplied, and in the present embodiment, is formed inside the lip plate portion 34 along the longitudinal direction. Specifically, it has a shape extending in the longitudinal direction of the lip plate portion 34, and is formed to be the highest in the central portion 41a of the central portion 41a in the longitudinal direction, and is formed at the side end portion 41b of the both end portions in the longitudinal direction. Low, lower part It is connected to the slit nozzle 34a. The upper portion of the central portion 41a communicates with the exhaust hole 44, and the coating liquid supply hole 42 communicates with the lower portion of the exhaust hole 44. The coating liquid supply hole 42 is connected to the supply pipe 55 by the application liquid supply pump 51 that supplies the coating liquid, and when the coating liquid supply pump 51 is actuated to supply the coating liquid, the coating liquid supply hole 42 is supplied. The coating liquid is supplied to the manifold 41. Then, the air in the manifold 41 and the air supplied to the coating liquid are simultaneously collected by the buoyancy force in the center portion 41a and discharged through the exhaust hole 44.

又,排氣孔44係連接於排氣配管52,該排氣配管52係連接於排氣弁槽60。即,岐管41之空氣及混入有空氣之塗佈液(亦稱為空氣混入液)係隨著塗佈液之供給,通過排氣孔44穿通排氣配管52,排出於該排氣弁槽60。於該配管中,設置有排氣閥門52a。塗佈動作係以關閉該排氣閥門52a之狀態進行,藉此塗佈動作中所供給之塗佈液不會通過排氣孔44漏出。 Further, the exhaust hole 44 is connected to the exhaust pipe 52, and the exhaust pipe 52 is connected to the exhaust port 60. That is, the air of the manifold 41 and the coating liquid (also referred to as air mixing liquid) in which the air is mixed are supplied through the exhaust pipe 44 through the exhaust hole 44, and are discharged to the exhaust port. 60. In the piping, an exhaust valve 52a is provided. The coating operation is performed in a state in which the exhaust valve 52a is closed, whereby the coating liquid supplied during the coating operation does not leak through the exhaust hole 44.

排氣弁槽60係儲存岐管41之空氣、及於塗佈液混在有氣泡之塗佈液者。於本實施形態中,該排氣弁槽60係於塗佈裝置僅設置有1個,且設置於塗佈單元30之腿部31(參照圖2)。於該排氣弁槽60,連接有與口型板部34連接之排氣配管52、後述之排氣弁配管53,使自岐管41排出之空氣及包含空氣之塗佈液收集於排氣弁槽60。另,由於排氣弁槽60安裝於腿部31,故即使塗佈單元30移動,口型板部34與排氣弁槽60之距離亦不變。因此,連接於排氣弁槽60之排氣配管52、排氣弁配管53係保持於一定之長度。又,於本實施形態中,排氣弁槽60與塗佈液供給用泵51係以配管51a連結。於該配管51a中,設置有閥門52b,藉由開閉閥門52b,可控制排氣弁槽60與塗佈液供給用泵51之連接狀態。 The exhaust gutter 60 is a type of air for storing the manifold 41 and a coating liquid mixed with the coating liquid. In the present embodiment, the exhaust gutter 60 is provided only in one coating device, and is provided in the leg portion 31 of the coating unit 30 (see FIG. 2). An exhaust pipe 52 connected to the die plate portion 34 and an exhaust port pipe 53 to be described later are connected to the exhaust groove 60, and the air discharged from the manifold 41 and the coating liquid containing air are collected in the exhaust gas.弁 60. Further, since the exhaust groove 60 is attached to the leg portion 31, even if the coating unit 30 moves, the distance between the lip plate portion 34 and the exhaust groove 60 does not change. Therefore, the exhaust pipe 52 and the exhaust manifold 53 connected to the exhaust sump 60 are held at a constant length. Further, in the present embodiment, the exhaust sump 60 and the coating liquid supply pump 51 are connected by a pipe 51a. In the pipe 51a, a valve 52b is provided, and by opening and closing the valve 52b, the connection state of the exhaust port 60 and the coating liquid supply pump 51 can be controlled.

排氣弁孔43係用以於排氣弁處理中排出岐管41內之空氣者,逐一設置於口型板部34之長邊方向兩端部,共計2個。此處,所謂排氣弁處理係以不會將空氣自狹縫噴嘴34a噴出於基板10上之方式去除岐 管41之空氣之處理,通常於進行塗佈動作之前進行。具體而言,係於洗淨岐管41後,或,將口型板部34更換為新口型板部34後,藉由自塗佈液供給孔42供給塗佈液而進行。即,藉由自塗佈液供給孔42供給塗佈液,將岐管41之空氣及包含空氣之塗佈液自狹縫噴嘴34a、排氣孔44、排氣弁孔43擠壓出,藉此,自岐管41排出空氣。 The exhaust boring holes 43 are provided for exhausting the air in the manifold 41 during the exhaust enthalpy treatment, and are provided one by one in the longitudinal direction of the lip plate portion 34, for a total of two. Here, the exhaust enthalpy treatment is performed so as not to spray air from the slit nozzle 34a onto the substrate 10. The treatment of the air of the tube 41 is usually carried out prior to the coating operation. Specifically, after the sputum tube 41 is washed, or the lip plate portion 34 is replaced with the new slab portion 34, the coating liquid is supplied from the coating liquid supply hole 42. In other words, the coating liquid is supplied from the coating liquid supply hole 42, and the air of the manifold 41 and the coating liquid containing air are extruded from the slit nozzle 34a, the exhaust hole 44, and the exhaust port 43. Thus, air is exhausted from the manifold 41.

該排氣弁孔43係連通於岐管41而形成,且連接於排氣弁配管53。藉此,於排氣弁處理時,岐管41之空氣及包含空氣之塗佈液自排氣弁孔43通過排氣弁配管53排出於排氣弁槽60。該等排氣弁配管53係連接於共通之排氣弁槽60,自任一者之排氣弁孔43排出之空氣及包含空氣之塗佈液,皆排出於排氣弁槽60。該排氣弁配管53具有沿著口型板部34延伸之平行部分531、及與其正交之垂直部分532。即,於連接於排氣弁孔43之側之相反側之平行部分531中,連結有改變90度方向之接頭54,連結於該接頭54之垂直部分532係連接於排氣弁槽60。藉此,自排氣弁孔43排出之空氣及包含空氣之塗佈液經由平行部分531及垂直部分532,排出於排氣弁槽60。 The exhaust bore 43 is formed to communicate with the manifold 41 and is connected to the exhaust manifold 53. Thereby, the air of the manifold 41 and the coating liquid containing air are discharged from the exhaust port 43 through the exhaust manifold 53 to the exhaust pocket 60 during the exhaust gas treatment. The exhaust manifolds 53 are connected to the common exhaust pockets 60, and the air discharged from either of the exhaust bores 43 and the coating liquid containing the air are discharged to the exhaust pockets 60. The exhaust manifold 53 has a parallel portion 531 extending along the lip plate portion 34 and a vertical portion 532 orthogonal thereto. That is, the joint 54 which is changed in the direction of 90 degrees is connected to the parallel portion 531 which is opposite to the side connected to the exhaust bore 43, and the vertical portion 532 which is connected to the joint 54 is connected to the exhaust pocket 60. Thereby, the air discharged from the exhaust boring hole 43 and the coating liquid containing air are discharged to the exhaust sump 60 via the parallel portion 531 and the vertical portion 532.

又,排氣弁配管53係以使該排氣弁配管53中產生之壓力損失相等之方式設定。具體而言,藉由調節排氣弁配管53之配管直徑、配管長度而設定壓力損失。即,如圖3所示,排氣弁配管53係使用其平行部分531為相同直徑者(於圖3中,表示排氣弁配管53之線之粗度係表示配管直徑)。由於排氣弁槽60設置於排氣弁孔43R之附近,故排氣弁配管53之平行部分531係與連結於排氣弁孔43L者相比較,連接於排氣弁孔43R者更短。因此,於僅比較該平行部分531之情形時,壓力損失為排氣弁孔43L較大。另一方面,於比較垂直部分532之情形時,連接於排氣弁孔43R之排氣弁配管53係形成為較連接於排氣弁孔43L之排氣弁配管53更小直徑。即,垂直部分532之壓力損失係以使連結於排氣弁孔43R之排氣弁配管53為較大之方式設定。即,由於將排氣弁 槽60設為共通而使連接於排氣弁孔43之排氣弁配管53之長度不同,故藉由將排氣弁配管53之一部分形成為小直徑,而設定為排氣弁配管53整體產生之壓力損失於任一者之排氣弁配管53中皆相等。於本實施形態中,連接於排氣弁孔43之排氣弁配管53之平行部分531使用相同直徑之配管,僅垂直部分532使用直徑不同之排氣弁配管53調節壓力損失。如此,藉由將直接連接於排氣弁孔43之排氣弁配管53之平行部分531設為相同直徑,可降低口型板部34之製作成本,且變化垂直部分532之直徑者易於進行壓力損失之調節。另,所謂將壓力損失設定為相等,並非僅完全一致之情形,只要設定為自任一者之排氣弁孔43皆順暢地排出空氣,且排出之程度為相同程度即可。 Further, the exhaust manifold 53 is set such that the pressure loss generated in the exhaust manifold 53 is equal. Specifically, the pressure loss is set by adjusting the pipe diameter and the pipe length of the exhaust port piping 53. In other words, as shown in FIG. 3, the exhaust manifold 53 is the same diameter as the parallel portion 531 (in FIG. 3, the thickness of the line of the exhaust manifold 53 indicates the diameter of the pipe). Since the exhaust groove 60 is provided in the vicinity of the exhaust bore 43R, the parallel portion 531 of the exhaust manifold 53 is shorter than the one connected to the exhaust bore 43L and connected to the exhaust bore 43R. Therefore, when only the parallel portion 531 is compared, the pressure loss is such that the exhaust bore 43L is large. On the other hand, in the case of comparing the vertical portion 532, the exhaust manifold 53 connected to the exhaust bore 43R is formed to have a smaller diameter than the exhaust manifold 53 connected to the exhaust bore 43L. That is, the pressure loss of the vertical portion 532 is set such that the exhaust manifold 53 connected to the exhaust bore 43R is large. That is, due to the exhaust 弁 The grooves 60 are provided in common, and the lengths of the exhaust manifolds 53 connected to the exhaust ports 43 are different. Therefore, by forming one portion of the exhaust manifold 53 into a small diameter, the exhaust manifold 53 is integrally formed. The pressure loss is equal in any of the exhaust manifolds 53. In the present embodiment, the parallel portion 531 of the exhaust manifold 53 connected to the exhaust bore 43 uses a pipe of the same diameter, and only the vertical portion 532 adjusts the pressure loss using the exhaust manifold 53 having a different diameter. Thus, by making the parallel portion 531 of the exhaust manifold 53 directly connected to the exhaust bore 43 the same diameter, the manufacturing cost of the lip plate portion 34 can be reduced, and the diameter of the vertical portion 532 can be easily changed. Adjustment of loss. Further, the pressure loss is set to be equal, and it is not only completely identical, and it is only necessary to smoothly discharge the air from the exhaust boring holes 43 of either one, and the degree of discharge is the same.

再者,於本實施形態中,該等全部排氣弁配管53中產生之壓力損失之合計值係以不自狹縫噴嘴34a吸入空氣之範圍,設定為小於狹縫噴嘴34a中產生之壓力損失。藉此,於排氣弁處理時,可抑制將供給之塗佈液自狹縫噴嘴34a無用地排出之量。即,於排氣弁處理時,自塗佈液供給孔42供給塗佈液時,存在於岐管41之空氣自狹縫噴嘴34a、排氣孔及排氣弁孔43排出,塗佈液貯留於岐管41時,空氣藉由浮力上升,且空氣及包含空氣之塗佈液自排氣孔及排氣弁孔43排出。於此狀態下,相較於全部排氣弁配管53中產生之壓力損失之合計值,狹縫噴嘴34a中產生之壓力損失值越小,則相較於自排氣弁孔43排出,越容易自狹縫噴嘴34a排出。然而,由於空氣以浮力上升,故而導致自容易排出之狹縫噴嘴34a大量排出未混入空氣之塗佈液。因此,藉由將排氣弁配管53中產生之壓力損失之合計值,以自狹縫噴嘴34a不吸入空氣之範圍,設定為小於狹縫噴嘴34a中產生之壓力損失,不易自狹縫噴嘴34a排出,即使空氣藉由浮力上升,亦可抑制來自狹縫噴嘴34a之排出,防止塗佈液被胡亂地捨弃。 Further, in the present embodiment, the total value of the pressure loss generated in all of the exhaust manifolds 53 is set to be smaller than the pressure loss generated in the slit nozzle 34a so as not to take in the air from the slit nozzle 34a. . Thereby, it is possible to suppress the amount by which the supplied coating liquid is unnecessarily discharged from the slit nozzle 34a during the exhaust gas enthalpy treatment. In other words, when the coating liquid is supplied from the coating liquid supply hole 42 during the exhaust gas treatment, the air existing in the manifold 41 is discharged from the slit nozzle 34a, the exhaust hole, and the exhaust port 43, and the coating liquid is stored. At the time of the tube 41, the air rises by buoyancy, and the air and the coating liquid containing the air are discharged from the exhaust hole and the exhaust port 43. In this state, the smaller the pressure loss value generated in the slit nozzles 34a, the smaller the pressure loss value generated in the slit nozzles 34a, the easier it is to discharge than the self-venting bores 43. It is discharged from the slit nozzle 34a. However, since the air rises in buoyancy, a large amount of the coating liquid which is not mixed with air is discharged from the slit nozzles 34a which are easily discharged. Therefore, the total value of the pressure loss generated in the exhaust manifold 53 is set to be smaller than the pressure loss generated in the slit nozzle 34a from the range in which the air is not sucked from the slit nozzle 34a, and is not easily obtained from the slit nozzle 34a. Exhaust, even if the air rises by buoyancy, the discharge from the slit nozzle 34a can be suppressed, and the coating liquid can be prevented from being discarded indiscriminately.

又,此處所言之來自狹縫噴嘴34a之空氣之吸入,係於後述之排 氣弁閥門53a打開之全部排氣弁配管53之壓力損失之合計值顯著小於狹縫噴嘴34a中產生之壓力損失之情形時,自狹縫噴嘴34a吸入空氣,且液體流動向排氣弁配管53之現象,通常藉由塗佈液供給孔42供給之塗液根據壓損之比率,分配於狹縫噴嘴34a與排氣弁配管53,於此情形時,較自塗佈液供給孔42供給之塗佈液,液體較多流動向排氣弁配管53。即,所謂不自狹縫噴嘴34a吸入空氣之範圍係指自塗佈液供給孔42供給之塗佈液於不自狹縫噴嘴34a吸入空氣之程度,最大限度地將空氣及包含空氣之塗佈液排出於排氣弁配管53之狀態。 Moreover, the suction of the air from the slit nozzle 34a as described herein is as follows. When the total value of the pressure loss of all the exhaust gas exhaust pipes 53 opened by the gas valve 53a is significantly smaller than the pressure loss generated in the slit nozzle 34a, the air is taken in from the slit nozzle 34a, and the liquid flows to the exhaust gas pipe 53. In other cases, the coating liquid supplied from the coating liquid supply hole 42 is distributed to the slit nozzle 34a and the exhaust manifold 56 in accordance with the ratio of the pressure loss. In this case, the coating liquid is supplied from the coating liquid supply hole 42. In the coating liquid, a large amount of liquid flows to the exhaust manifold 53. In other words, the range in which the air is not sucked from the slit nozzle 34a means that the coating liquid supplied from the coating liquid supply hole 42 is not sucked into the air from the slit nozzle 34a, and the air and the air containing coating are applied to the maximum extent. The liquid is discharged to the state of the exhaust manifold 53.

另,於該排氣弁配管53中,設置有排氣弁閥門53a。塗佈動作中係藉由以關閉該排氣弁閥門53a之狀態進行,使塗佈動作中供給之塗佈液不會通過排氣弁孔43漏出。 Further, an exhaust port valve 53a is provided in the exhaust port pipe 53. In the coating operation, the coating liquid supplied during the coating operation is prevented from leaking through the exhaust bore 43 by closing the exhaust port valve 53a.

又,於排氣弁槽60中,連接有壓力調整器70。該壓力調整器70係調整排氣弁槽60之壓力者,可進行排氣弁槽60內之減壓或加壓。 Further, a pressure regulator 70 is connected to the exhaust sump 60. The pressure regulator 70 adjusts the pressure of the exhaust grate 60 to perform decompression or pressurization in the exhaust grate 60.

於本實施形態中,作為壓力調整器70使用真空噴射器70a。該真空噴射器70a係安裝於廢液托盤25,且藉由使真空噴射器70a作動,可將排氣弁槽60內減壓或加壓。 In the present embodiment, the vacuum ejector 70a is used as the pressure regulator 70. The vacuum ejector 70a is attached to the waste liquid tray 25, and by actuating the vacuum ejector 70a, the inside of the exhaust sump 60 can be decompressed or pressurized.

該真空噴射器70a具有3個埠,即真空埠71、壓空埠72、及排氣埠73。接著,自壓空埠72供給經壓縮之空氣(壓空)並自排氣埠73排出時,可於真空埠71產生負壓。 The vacuum injector 70a has three turns, that is, a vacuum port 71, a pressure port 72, and an exhaust port 73. Next, when the compressed air (pressure) is supplied from the pressure chamber 72 and discharged from the exhaust port 73, a negative pressure can be generated in the vacuum port 71.

於本實施形態中,於真空埠71中連結有真空配管71a,真空埠71係通過真空配管71a與排氣弁槽60連通。即,空氣可通過真空配管71a往復於真空噴射器70a與排氣弁槽60。 In the present embodiment, the vacuum manifold 71 is connected to the vacuum port 71, and the vacuum port 71 communicates with the exhaust port 60 through the vacuum pipe 71a. That is, air can be reciprocated to and from the vacuum ejector 70a and the exhaust sump 60 through the vacuum piping 71a.

又,於壓空埠72中連結有壓空配管72a,壓空埠72係通過壓空配管72a連結於壓空泵74。即,可自壓空泵74將經壓縮之空氣(壓空)通過壓空配管72a、壓空埠72供給於真空噴射器70a內。另,期望該壓空泵74可控制供給於真空噴射器70a之壓空之壓力值。即,將排氣弁槽 60內減壓、加壓時之壓力值係與供給於真空噴射器70a之壓空之壓力值大致成比例。又,亦可設為於壓空配管72a之間設置調整壓力之調節器(未圖示)之構成,而可控制供給於真空噴射器70a之壓空之壓力值。 Further, a pressure pipe 72a is connected to the pressure chamber 72, and the pressure port 72 is connected to the pressure pump 74 through the pressure pipe 72a. That is, the compressed air (pressure) can be supplied from the pressure air pump 74 to the vacuum injector 70a through the pressure pipe 72a and the pressure chamber 72. Further, it is desirable that the pressure pump 74 can control the pressure value of the pressure supplied to the vacuum injector 70a. That is, the exhaust sump The pressure value during the decompression and pressurization in 60 is approximately proportional to the pressure value of the pressure supplied to the vacuum injector 70a. Further, a regulator (not shown) for adjusting the pressure may be provided between the pressure pipings 72a, and the pressure value of the pressure supplied to the vacuum injectors 70a may be controlled.

又,於排氣埠73中連結有排氣配管73a。於該排氣配管73a中,安裝有排氣閥門73b,藉由將排氣閥門73b設為打開狀態,可排出真空噴射器70a內之空氣。因此,於打開排氣閥門73b之狀態下,藉由自壓空泵74供給空氣且自排氣配管73a排出,可於真空配管71a產生負壓,而可使排氣弁槽60內減壓(作為減壓器之真空噴射器70a)。又,於關閉排氣閥門73b之狀態下,自壓空泵74供給空氣時,於真空噴射器70a內部無處可去之空氣通過真空配管71a供給於排氣弁槽60,藉此可使排氣弁槽60內加壓(作為加壓器之真空噴射器70a)。 Further, an exhaust pipe 73a is connected to the exhaust port 73. An exhaust valve 73b is attached to the exhaust pipe 73a, and the air in the vacuum injector 70a can be discharged by opening the exhaust valve 73b. Therefore, when the air is supplied from the pressure air pump 74 and discharged from the exhaust pipe 73a in a state where the exhaust valve 73b is opened, a negative pressure can be generated in the vacuum pipe 71a, and the pressure in the exhaust groove 60 can be decompressed ( A vacuum ejector 70a) as a pressure reducer. Further, when the air is supplied from the pressure air pump 74 in a state where the exhaust valve 73b is closed, air that is not available inside the vacuum ejector 70a is supplied to the exhaust sump 60 through the vacuum pipe 71a, thereby allowing the platoon to be discharged. The air sump 60 is pressurized (the vacuum ejector 70a as a pressurizer).

另,於不將壓空供給於該真空噴射器70a時,藉由打開後述之排氣閥門73b,亦可將排氣弁槽60設定為大氣開放狀態。即,藉由適當控制對真空噴射器70a之壓空供給及排氣閥門73b,可根據需要將排氣弁槽之壓力狀態設定為減壓、加壓、大氣開放狀態之任一者。假設將排氣弁槽設定為大氣開放狀態,藉此亦可實施通常之虹吸效應之排氣弁。 Further, when the vacuum ejector 70a is not supplied to the vacuum ejector 70a, the exhaust sump 60 can be set to the atmosphere open state by opening the exhaust valve 73b to be described later. That is, by appropriately controlling the pressure supply to the vacuum injector 70a and the exhaust valve 73b, the pressure state of the exhaust manifold can be set to any of a reduced pressure, a pressurized, and an open air state as needed. It is assumed that the exhaust gutter is set to an open atmosphere, whereby an exhaust enthalpy of the usual siphon effect can also be implemented.

藉由使該真空噴射器70a作動,可進行排氣弁處理之輔助。即,藉由排氣弁處理自塗佈液供給孔42供給塗佈液時,岐管41之空氣及包含空氣之塗佈液自狹縫噴嘴34a、排氣孔44、排氣弁孔43擠壓出。此時,若使真空噴射器70a作動而使排氣弁槽60內減壓,則與排氣弁槽60內為大氣壓之情形相比較,更容易自排氣孔44及排氣弁孔43排出空氣及包含空氣之塗佈液。即,由於自排氣孔44及排氣弁孔43排出之空氣及包含空氣之塗佈液係通過排氣弁配管53、排氣配管52藉由虹吸效應流向於排氣弁槽60,故藉由使排氣弁槽60內減壓,可促進其流動。 即,可增大每單位時間之空氣及包含空氣之塗佈液之量。因此,藉由使真空噴射器70a作為減壓器發揮作用,與不使真空噴射器70a作動而排氣弁槽60為大氣壓之情形相比較,可提前完成排氣弁處理。又,相對於藉由使真空噴射器70a作動而於排氣弁處理時藉由塗佈液供給用泵51供給於岐管41之塗佈液之總量,可增加自排氣弁孔43排出之塗佈液之比例。即,由於存在於口型板部34之岐管41之包含空氣之塗佈液更容易自排氣弁配管53積極地排出,故可抑制胡亂地排出之塗佈液之量。 By actuating the vacuum ejector 70a, it is possible to perform the exhaust enthalpy treatment. In other words, when the coating liquid is supplied from the coating liquid supply hole 42 by the exhaust enthalpy treatment, the air of the manifold 41 and the coating liquid containing air are squeezed from the slit nozzle 34a, the exhaust hole 44, and the exhaust boring hole 43. Press out. At this time, when the vacuum ejector 70a is actuated to decompress the inside of the exhaust sump 60, it is easier to discharge from the vent hole 44 and the exhaust boring hole 43 as compared with the case where the inside of the exhaust sump 60 is at atmospheric pressure. Air and coating liquid containing air. In other words, the air discharged from the exhaust port 44 and the exhaust port 43 and the coating liquid containing the air flow through the exhaust manifold 53 and the exhaust pipe 52 to the exhaust slot 60 by the siphon effect. The pressure in the exhaust grate 60 is reduced to promote the flow thereof. That is, the amount of air per unit time and the coating liquid containing air can be increased. Therefore, by operating the vacuum ejector 70a as a pressure reducer, the exhaust enthalpy treatment can be completed in advance as compared with the case where the vacuum ejector 70a is not actuated and the exhaust sump 60 is at atmospheric pressure. In addition, the total amount of the coating liquid supplied to the manifold 41 by the coating liquid supply pump 51 during the exhaust gas treatment by the vacuum ejector 70a can be increased from the exhaust boring hole 43. The ratio of the coating liquid. In other words, since the coating liquid containing air present in the manifold 41 of the lip plate portion 34 is more easily discharged from the exhaust manifold 53, the amount of the coating liquid discharged indiscriminately can be suppressed.

又,藉由使該真空噴射器70a作動,可於排氣弁處理中同時對貯留於排氣弁槽60之包含空氣之塗佈液進行氣泡去除處理。即,進行排氣弁處理時,於排氣弁槽60中貯留包含空氣之塗佈液(空氣混入液)。此時,藉由使真空噴射器70a作為減壓器作動,排氣弁槽60內減壓,且保持於較大氣壓更低之壓力。因此,貯留於排氣弁槽60之空氣混入液中之空氣(氣泡)係容易上浮至液面,且上浮之氣泡於液面消失。即,藉由將排氣弁槽60內減壓,與排氣弁槽60內為大氣壓之情形相比較,促進空氣混入液中之氣泡(空氣)之去除,即使於排氣弁處理中亦同時進行氣泡去除處理。藉此,由於藉由於排氣弁處理中同時進行該氣泡去除處理,故可於包含空氣之塗佈液於排氣弁槽60內較少之狀態時開始進行脫氣處理,故而較於排氣弁槽60貯藏一定量塗佈液後進行減壓、脫氣,可更有效地進行氣泡去除處理。 Further, by operating the vacuum ejector 70a, the air-containing coating liquid stored in the exhaust sump 60 can be simultaneously subjected to bubble removal treatment in the exhaust enthalpy treatment. That is, when the exhaust gas enthalpy treatment is performed, the coating liquid (air mixture liquid) containing air is stored in the exhaust sump 60. At this time, by operating the vacuum ejector 70a as a pressure reducer, the inside of the exhaust sump 60 is decompressed and maintained at a pressure lower than a larger air pressure. Therefore, the air (bubbles) stored in the air mixed in the exhaust grate 60 is likely to float up to the liquid surface, and the floating bubbles disappear in the liquid surface. In other words, by decompressing the inside of the exhaust grate 60, the bubble (air) in the air mixture is promoted as compared with the case where the inside of the exhaust grate 60 is at atmospheric pressure, even in the exhaust gas treatment. The bubble removal process is performed. Therefore, since the bubble removing process is simultaneously performed in the exhaust gas enthalpy treatment, the degassing process can be started when the coating liquid containing air is less in the exhaust sump 60, so that it is more exhausted than the exhaust gas. The gutter 60 stores a certain amount of the coating liquid, and then depressurizes and degassing, so that the bubble removal treatment can be performed more efficiently.

接著,口型板部34之岐管41內之空氣之去除完成,且空氣及包含空氣之塗佈液之朝排氣弁槽60之排出結束後,亦藉由繼續作動真空噴射器70a,繼續進行對排氣弁槽60內之包含空氣之塗佈液之氣泡去除處理。即,無需將排氣弁槽60內之包含空氣之塗佈液轉移至其他氣泡去除裝置而可進行氣泡去除處理。因此,可極力抑制由塗佈液接觸大氣引起之塗佈液之劣化,可以短時間進行塗佈液之再生。 Then, the removal of the air in the manifold 41 of the lip plate portion 34 is completed, and after the discharge of the air and the coating liquid containing the air toward the exhaust gutter 60 is completed, the vacuum injector 70a is continued to be continued. The bubble removing process of the coating liquid containing air in the exhaust gutter 60 is performed. That is, it is not necessary to transfer the coating liquid containing air in the exhaust grate 60 to another bubble removing device, and the bubble removing process can be performed. Therefore, the deterioration of the coating liquid caused by the contact of the coating liquid with the atmosphere can be suppressed as much as possible, and the regeneration of the coating liquid can be performed in a short time.

又,作為壓力調整器70之真空噴射器70a亦可作為加壓器發揮作用。具體而言,將排氣配管73a之排氣閥門73b設為關閉狀態且自壓空泵74供給空氣時,為防止自真空噴射器70a朝排氣配管73a之流動,故將來自壓空泵74之空氣供給於真空配管71a。即,藉由將空氣供給於真空配管71a,空氣流向於排氣弁槽60,而可將排氣弁槽60內加壓。另,此時,配管51a之閥門51b關閉。 Further, the vacuum ejector 70a as the pressure regulator 70 can also function as a pressurizer. Specifically, when the exhaust valve 73b of the exhaust pipe 73a is in the closed state and air is supplied from the pressure pump 74, the flow from the vacuum pump 70a is prevented from flowing from the vacuum injector 70a to the exhaust pipe 73a. The air is supplied to the vacuum piping 71a. That is, by supplying air to the vacuum piping 71a, the air flows to the exhaust sump 60, and the inside of the exhaust sump 60 can be pressurized. Further, at this time, the valve 51b of the pipe 51a is closed.

藉由使該真空噴射器70a作為加壓器作動,塗佈液之脫氣處理結束後,可立刻再利用該塗佈液。具體而言,排氣弁處理及脫氣處理結束後,將排氣閥門52a及排氣弁閥門53a設為關閉狀態而切斷岐管與排氣弁槽60之連通。接著,將排氣閥門73b設為關閉狀態且自壓力泵供給壓空時,來自壓空泵74之空氣通過真空配管71a流向於排氣弁槽60,將排氣弁槽60內加壓。接著,於閥門51b為打開狀態且將排氣弁槽60內加壓時,排氣弁槽60內之已去除氣泡之塗佈液通過配管51a供給於塗佈液供給用泵51。即,由於排氣弁槽60內之塗佈液不暴露於大氣中而供給於塗佈液供給用泵51且返回於岐管41,故不會使排氣弁槽60內之塗佈液發生氧化等劣化而可再利用。 By operating the vacuum ejector 70a as a pressurizer, the coating liquid can be reused immediately after the degassing treatment of the coating liquid is completed. Specifically, after the exhaust gas enthalpy treatment and the degassing treatment are completed, the exhaust valve 52a and the exhaust gas damper valve 53a are closed, and the communication between the manifold and the exhaust sump 60 is cut off. Next, when the exhaust valve 73b is in the closed state and the pressure is supplied from the pressure pump, the air from the pressure pump 74 flows into the exhaust pocket 60 through the vacuum piping 71a, and pressurizes the inside of the exhaust pocket 60. Then, when the valve 51b is in the open state and the inside of the exhaust sump 60 is pressurized, the coating liquid for removing air bubbles in the exhaust sump 60 is supplied to the coating liquid supply pump 51 through the pipe 51a. In other words, the coating liquid in the exhaust sump 60 is supplied to the coating liquid supply pump 51 and returned to the manifold 41 without being exposed to the atmosphere, so that the coating liquid in the exhaust sump 60 is not generated. Degradation by oxidation or the like can be reused.

另,廢液托盤25係接收排氣弁處理時自狹縫噴嘴34a排出之塗佈液者。真空噴射器70a係以排氣配管73a埠朝向於廢液托盤25之中央側之姿勢安裝。藉此,即使於為將排氣弁槽60內減壓而於真空配管71a吸引包含空氣之塗佈液且自排氣配管73a排出之情形,亦可防止由於將包含空氣之塗佈液排出於廢液托盤25而弄髒設置有塗佈裝置之底板。 Further, the waste liquid tray 25 receives the coating liquid discharged from the slit nozzle 34a at the time of exhaust gas treatment. The vacuum ejector 70a is attached in a posture in which the exhaust pipe 73a is oriented toward the center side of the waste liquid tray 25. Therefore, even if the coating liquid containing air is sucked into the vacuum piping 71a and discharged from the exhaust pipe 73a in order to depressurize the inside of the exhaust grate 60, it is possible to prevent the coating liquid containing the air from being discharged. The waste tray 25 is soiled to the bottom plate on which the coating device is disposed.

依據上述實施形態之塗佈裝置,藉由利用上述減壓器使排氣弁槽60之壓力減壓,而自排氣弁孔排出空氣及包含空氣之塗佈液(空氣混入液)時,與排氣弁槽60之壓力為大氣壓之情形相比較,空氣混入液更容易以短時間自排氣弁孔43排出。接著,由於藉由將排氣弁槽60 減壓,貯留於排氣弁槽60之塗佈液暴露於較大氣壓更低之壓力狀態,故而塗佈液中之空氣與排氣弁槽60為大氣壓之情形相比較更容易排出(容易脫氣),而可以短時間去除塗佈液之空氣。因此,可以短時間進行排氣弁處理,且再利用排氣弁槽60內之塗佈液之情形時,亦可抑制該塗佈液劣化。 According to the coating apparatus of the above embodiment, when the pressure of the exhaust grate 60 is reduced by the pressure reducer, and the air and the coating liquid (air mixture) containing air are discharged from the exhaust port, As compared with the case where the pressure of the exhaust sump 60 is atmospheric pressure, the air mixed liquid is more likely to be discharged from the exhaust boring hole 43 in a short time. Then, by venting the exhaust groove 60 Under reduced pressure, the coating liquid stored in the exhaust grate 60 is exposed to a relatively low pressure, so that the air in the coating liquid is more easily discharged than the case where the exhaust gutter 60 is at atmospheric pressure (easy to degas) ), and the air of the coating liquid can be removed in a short time. Therefore, when the exhaust gas enthalpy treatment can be performed in a short time and the coating liquid in the exhaust sump 60 is reused, deterioration of the coating liquid can be suppressed.

又,於上述實施形態中,已對使用具備減壓器及加壓器之兩種功能之壓力調整器70之例進行說明,亦可分別另行設置減壓器或加壓器。於分別設置之情形時,例如,可構成為使真空泵通過配管連通於排氣弁槽60作為減壓器,且使壓空泵74通過配管連通於排氣弁槽60作為加壓器。 Further, in the above-described embodiment, an example in which the pressure regulator 70 having two functions of a pressure reducer and a pressurizer is used may be separately provided, and a pressure reducer or a pressurizer may be separately provided. In the case of being separately provided, for example, the vacuum pump may be configured to communicate with the exhaust manifold 60 as a pressure reducer through a pipe, and the pressure pump 74 may be communicated to the exhaust groove 60 as a pressurizer through a pipe.

又,於上述實施形態中,已對僅以加壓器將脫氣後之排氣弁槽60內之塗佈液返回於岐管41之例進行說明,亦可為藉由塗佈液供給用泵51自排氣弁槽60返回脫氣後之塗佈液之構成。即,藉由將閥門51b設為打開狀態且使塗佈液供給用泵51進行吸引,而將排氣弁槽60之塗佈液暫時貯留於塗佈液供給用泵51內,此後,藉由使塗佈液供給用泵51排出動作,可將脫氣後之塗佈液返回於岐管41。此時,亦可使用加壓器輔助塗佈液供給用泵51之吸引動作。又,亦可設為使排氣弁槽60自身移動而將脫氣後之排氣弁槽60內之塗佈液返回於岐管41之構成。 Further, in the above-described embodiment, the application of the coating liquid in the exhaust sump 60 after degassing by the pressurizer is returned to the manifold 41, and the coating liquid may be supplied. The pump 51 is returned from the exhaust grate 60 to the composition of the coating liquid after degassing. In other words, the coating liquid supply pump 51 is sucked by the valve 51b in the open state, and the coating liquid of the exhaust gas groove 60 is temporarily stored in the coating liquid supply pump 51, and thereafter, The coating liquid supply pump 51 is discharged, and the degassed coating liquid can be returned to the manifold 41. At this time, the suction operation of the coating liquid supply pump 51 can be assisted by the pressurizer. Further, the exhaust sump 60 itself may be moved to return the coating liquid in the exhaust sump 60 after degassing to the manifold 41.

又,於上述實施形態中,已對使用共通之排氣弁槽60之例進行說明,亦可為對各個排氣弁孔43使用排氣弁槽60者。於此情形時,亦必須以使排氣弁配管53、排氣配管52之壓力損失分別相同之方式適當調節排氣弁配管53及排氣配管52之直徑及長度。 Further, in the above embodiment, an example in which the common exhaust groove 60 is used has been described, and the exhaust groove 60 may be used for each of the exhaust holes 43. In this case, the diameters and lengths of the exhaust port piping 53 and the exhaust pipe 52 must be appropriately adjusted so that the pressure losses of the exhaust manifold 53 and the exhaust pipe 52 are the same.

25‧‧‧廢液托盤 25‧‧‧ Waste tray

34‧‧‧口型板部 34‧‧‧Mouth plate department

34a‧‧‧狹縫噴嘴 34a‧‧‧Slit nozzle

42‧‧‧塗佈液供給孔 42‧‧‧ Coating solution supply hole

43‧‧‧排氣弁孔 43‧‧‧Exhaust boring

43L‧‧‧排氣弁孔 43L‧‧‧Exhaust boring

43R‧‧‧排氣弁孔 43R‧‧‧Exhaust boring

44‧‧‧排氣孔 44‧‧‧ venting holes

51‧‧‧塗佈液供給用泵 51‧‧‧ Coating liquid supply pump

51a‧‧‧配管 51a‧‧‧Pipe

51b‧‧‧閥門 51b‧‧‧Valves

52‧‧‧排氣配管 52‧‧‧Exhaust piping

52a‧‧‧排氣閥門 52a‧‧‧Exhaust valve

53‧‧‧排氣弁配管 53‧‧‧Exhaust gas piping

53a‧‧‧排氣弁閥門 53a‧‧‧Exhaust valve

54‧‧‧接頭 54‧‧‧Connectors

60‧‧‧排氣弁槽 60‧‧‧Exhaust trough

70‧‧‧壓力調整器 70‧‧‧pressure regulator

70a‧‧‧真空噴射器 70a‧‧‧Vacuum ejector

71‧‧‧真空埠 71‧‧‧vacuum

71a‧‧‧真空配管 71a‧‧‧Vacuum piping

72‧‧‧壓空埠 72‧‧‧ Pressure space

72a‧‧‧壓空配管 72a‧‧‧Square piping

73‧‧‧排氣埠 73‧‧‧Exhaust gas

73a‧‧‧排氣配管 73a‧‧‧Exhaust piping

73b‧‧‧排氣閥門 73b‧‧‧Exhaust valve

74‧‧‧壓空泵 74‧‧‧Air pump

531‧‧‧平行部分 531‧‧‧ parallel part

532‧‧‧垂直部分 532‧‧‧ vertical part

Claims (5)

一種排氣弁系統,其特徵在於:其係一種塗佈裝置之排氣弁系統,該塗佈裝置係藉由使具有貯留塗佈液之岐管及狹縫噴嘴之口型板部自上述狹縫噴嘴噴出塗佈液且進行掃描而於基板上形成塗佈膜,且該排氣弁系統係於上述口型板部中,設置有將塗佈液供給於岐管之塗佈液供給孔、及藉由自該塗佈液供給孔供給塗佈液而排出存在於上述岐管之空氣之排氣弁孔,且該排氣弁系統包含:排氣弁槽,其貯留自上述排氣弁孔排出之包含空氣之塗佈液;及減壓器,其將上述排氣弁槽之壓力減壓。 An exhaust gas enthalpy system, characterized in that it is an exhaust enthalpy system of a coating device, which is formed by a stencil portion having a manifold and a slit nozzle for storing a coating liquid The slit nozzle ejects the coating liquid and scans to form a coating film on the substrate, and the exhaust port system is provided in the mouth plate portion, and a coating liquid supply hole for supplying the coating liquid to the manifold is provided. And discharging the coating liquid from the coating liquid supply hole to discharge the exhaust hole of the air existing in the manifold, and the exhaust gas system includes: an exhaust gas groove, which is stored from the exhaust gas orifice a discharge liquid containing air; and a pressure reducer that decompresses the pressure of the exhaust gas sump. 如請求項1之排氣弁系統,其中於上述口型板部設置有複數個排氣弁孔,且藉由將各排氣弁孔與上述排氣弁槽以配管連結,將自各個排氣弁孔排出之包含空氣之塗佈液貯留於共通之排氣弁槽。 The exhaust enthalpy system of claim 1, wherein a plurality of exhaust boring holes are provided in the mouth plate portion, and each exhaust vent is connected to the exhaust sump by a pipe, and each exhaust gas is exhausted. The coating liquid containing air discharged from the bore is stored in the common exhaust sump. 如請求項1之排氣弁系統,其中包含將上述排氣弁槽之壓力加壓之加壓器,藉由使該加壓器將上述排氣弁槽內加壓,將脫氣後之上述排氣弁槽內之塗佈液返回於上述口型板部之岐管。 The exhaust gas system of claim 1, comprising a pressurizing device that pressurizes the pressure of the exhaust gas groove, wherein the pressurizer pressurizes the exhaust gas groove, and the gas is degassed. The coating liquid in the exhaust gutter is returned to the manifold of the above-mentioned lip plate portion. 如請求項2之排氣弁系統,其中包含將上述排氣弁槽之壓力加壓之加壓器,藉由使該加壓器將上述排氣弁槽內加壓,將脫氣後之上述排氣弁槽內之塗佈液返回於上述口型板部之岐管。 The exhaust gas system of claim 2, comprising a pressurizing device for pressurizing the pressure of the exhaust gas groove, wherein the pressurizing device pressurizes the exhaust gas groove to remove the gas after the degassing The coating liquid in the exhaust gutter is returned to the manifold of the above-mentioned lip plate portion. 如請求項1至4中任一項之排氣弁系統,其中上述減壓器及上述加壓器係共通之壓力調整器。 The exhaust gas system of any one of claims 1 to 4, wherein the pressure reducer and the pressurizer are common pressure regulators.
TW103120367A 2013-07-12 2014-06-12 Exhaust system TWI615206B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2013146853A JP6218219B2 (en) 2013-07-12 2013-07-12 Air vent system

Publications (2)

Publication Number Publication Date
TW201501814A true TW201501814A (en) 2015-01-16
TWI615206B TWI615206B (en) 2018-02-21

Family

ID=52250904

Family Applications (1)

Application Number Title Priority Date Filing Date
TW103120367A TWI615206B (en) 2013-07-12 2014-06-12 Exhaust system

Country Status (4)

Country Link
JP (1) JP6218219B2 (en)
KR (1) KR102188024B1 (en)
CN (1) CN104275278B (en)
TW (1) TWI615206B (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6454597B2 (en) * 2015-05-13 2019-01-16 東京応化工業株式会社 Coating apparatus, coating system, and coating method
CN104907224B (en) * 2015-06-03 2017-04-12 宜昌劲森光电科技股份有限公司 Glue pouring method for quantum dot colloid
JP6576146B2 (en) * 2015-07-31 2019-09-18 株式会社Screenホールディングス Coating apparatus and coating method
WO2023079893A1 (en) * 2021-11-02 2023-05-11 東レ株式会社 Mouth part

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3807864B2 (en) * 1999-03-12 2006-08-09 ソニーケミカル株式会社 Manufacturing method of coated body
JP2005209778A (en) * 2004-01-21 2005-08-04 Hitachi Maxell Ltd Resist applying system, photoresist applying method, and manufacturing method for optical disc
KR100934834B1 (en) * 2005-06-20 2009-12-31 엘지디스플레이 주식회사 Coating liquid coating device and manufacturing method of liquid crystal display device using the same
JP4809699B2 (en) * 2006-03-20 2011-11-09 東京エレクトロン株式会社 Coating method and coating apparatus
JP5023565B2 (en) * 2006-06-15 2012-09-12 東レ株式会社 Coating apparatus and coating method, and display member manufacturing method and manufacturing apparatus
SG136106A1 (en) * 2006-03-31 2007-10-29 Toray Industries Coating method and coating apparatus, and manufacturing method and manufacturing apparatus of the components for displays
JP5041827B2 (en) * 2007-02-23 2012-10-03 東京応化工業株式会社 Coating device
JP5278646B2 (en) 2007-11-30 2013-09-04 凸版印刷株式会社 Slit coater and coating method
DE102008000451A1 (en) * 2008-02-29 2009-09-03 Voith Patent Gmbh coating station
JP5566829B2 (en) * 2010-09-16 2014-08-06 武蔵エンジニアリング株式会社 Liquid automatic supply mechanism and coating apparatus provided with the same

Also Published As

Publication number Publication date
CN104275278B (en) 2017-12-26
KR20150007945A (en) 2015-01-21
JP6218219B2 (en) 2017-10-25
TWI615206B (en) 2018-02-21
JP2015016454A (en) 2015-01-29
CN104275278A (en) 2015-01-14
KR102188024B1 (en) 2020-12-07

Similar Documents

Publication Publication Date Title
JP4832945B2 (en) Syringe pump and substrate processing apparatus
JP5307970B2 (en) Method and apparatus for peeling large glass substrate
JP4564454B2 (en) Coating method, coating apparatus, and coating program
TWI568505B (en) Coating apparatus and washing method
KR101325034B1 (en) Coating method and coating device, manufacturing method and manufacturing equipment of member for display
TW201501814A (en) Exhaust valve system
US20140283878A1 (en) Nozzle cleaning unit and nozzle cleaning method
US8974046B2 (en) Liquid circulation unit, liquid circulation apparatus and method of manufacturing coated body
TW201641161A (en) Treatment liquid supplying apparatus and controlling method of treatment liquid supplying apparatus
CN107537705B (en) Flux coating method and flux coating device
JP2014180604A (en) Intermittent coating apparatus and intermittent coating method and method for manufacturing displaying member
TW201511841A (en) Coating apparatus and coating method
JP2008114137A (en) Coater, coating apparatus and method, and apparatus and method of manufacturing member for display
JP5023565B2 (en) Coating apparatus and coating method, and display member manufacturing method and manufacturing apparatus
WO2013121814A1 (en) Coating device
JP4715144B2 (en) Slit nozzle application system
US20090201352A1 (en) Ink jet system and method for removing air bubbles inside of an ink jet nozzle
KR20170033563A (en) Apparatus for treating a substrate
KR20170029380A (en) Coating device
JP2018008206A (en) Coating pretreatment method
JP2015178066A (en) Coating applicator
KR20220094897A (en) Inkjet printing device and cleaning method thereof
KR101741164B1 (en) Inline type substrate coater apparatus
TW201946793A (en) Ink removing device, ink discharging device, and ink removing method comprising a driving mechanism that presses a liquid-absorbing member toward a discharging surface of an ink jetting head from which ink is jetted
JP2010131493A (en) Liquid discharge apparatus