JP2014180604A - Intermittent coating apparatus and intermittent coating method and method for manufacturing displaying member - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide an intermittent coating apparatus and an intermittent coating method that enable instantaneous supply start and stop of a constant amount of coating liquid to a nozzle to be stably executed repeatedly by using an intermittent constant volume pump of high precision and high quantitativity to realize an intermittent coating that enable plural cutting for taking product regions of uniform film thickness and high quality in a short tact time and high productivity, and without using a circulation circuit where a degraded coating liquid and a coating liquid with a different time history are mixed.SOLUTION: In an intermittent coating apparatus, which includes a coater equipped with a discharge opening and coating liquid supply means that supplies a coating liquid intermittently to the coater, the coating liquid supply means comprises an intermittent constant volume pump that supplies a coating liquid to the coater at a prescribed flow rate, a storage tank of the coating liquid, pipelines that communicate with the intermittent constant volume pump and the storage tank and an upstream open/close valve, and pipelines that communicate with the intermittent constant volume pump and the coater and two open/close valves of first downstream and second downstream from the upstream side.

Description

  The present invention is used in the field of manufacturing optical filters, printed circuit boards, integrated circuits, semiconductors, etc. in addition to the field of manufacturing display members such as color filters for color liquid crystal displays, organic EL, and plasma displays. It is. More specifically, the present invention relates to an intermittent coating apparatus and an intermittent coating method capable of intermittently stably and highly accurately forming a surface or stripe-shaped coating film on a surface of a coated member such as a glass substrate, and an improvement in a method for manufacturing a display member. .

  As conventionally known, a color liquid crystal display is composed of a color filter, a TFT array substrate, and the like. Both the color filter and the TFT array substrate include many manufacturing processes in which a low-viscosity liquid material is applied and dried to form a coating film.

  For example, in a color filter manufacturing process, a black photoresist material coating film is formed on a glass substrate, and the coating film is processed into a lattice shape by a photolithographic method, and then red, blue, and green photoresist materials are formed between the lattices. The coating film is sequentially formed.

  As a coating apparatus for forming the coating film, a slit coater (for example, Patent Document 1) has been frequently used in recent years. This known slit coater has a slit nozzle as a coating head, that is, a coating device, and discharges the coating liquid from a slit-like long discharge port provided in the slit nozzle, while the sheet substrate such as a glass substrate traveling in one direction is used. A coating film is formed on the member to be coated.

  In the organic EL, there is a step of filling a coating solution between polyimide banks arranged at equal pitches to form a coating film in a linear stripe shape.

  As a means for forming such a stripe-shaped coating film on a coated member such as a glass substrate by coating, a nozzle having a large number of discharge ports provided in accordance with the stripe arrangement pitch is used as a coating device. There is a continuous discharge nozzle method (e.g., Patent Document 2) that applies to a member to be applied that travels relatively while continuously discharging, and a coater that embodies it is put to practical use.

  In manufacturing a display using such a nozzle, so-called multi-sided processing, in which a plurality of rectangular coating films having a size corresponding to the display is formed on an ultra-large substrate of 2 m square or more, is improved in productivity and low. From the viewpoint of cost reduction, it has become mainstream.

  The coating film formation on each surface when performing this multi-surface chamfering is performed by discharging / stopping the coating liquid from the nozzles for each of the plurality of coating films as if a single coating film is formed on one substrate. There is also a method of repeating the start / end of travel of the coated member.

  However, in order to shorten the tact time and improve productivity, the member to be coated is relatively continuously driven at a constant speed, and the coating liquid is intermittently discharged / stopped from the nozzle at a position corresponding to each product surface. Intermittent application is required.

  The greatest requirement for intermittent application is to supply a predetermined amount of application liquid stably and intermittently to the nozzle and to start and stop application by instantaneously starting and stopping the supply of a certain amount of application liquid. In other words, the defective film thickness region deviating from the target film thickness in the portion is minimized so that a product region having a uniform film thickness can be made large.

  In this respect, the point is a coating liquid supply means for supplying the coating liquid to the nozzle. As a known application liquid supply means for performing such intermittent application, a circuit for supplying the application liquid stored in the tank to the nozzle with a pump and a circulation circuit for returning the liquid to the tank are prepared, and the switching valve is switched. In some cases, the coating liquid is supplied to the nozzle during coating, and the coating liquid is returned by a circulation circuit during non-coating in which the supply of the coating liquid to the nozzle is stopped.

  In this case, the pump is operated continuously without resting regardless of whether it is applied or not. Furthermore, in order to shorten the defective film thickness area at the start / end of coating, the capacity adjustment is made between the pump and nozzle of the above coating liquid supply circuit so that the supply of a constant amount of coating liquid can be started and stopped instantaneously. There are those to which a possible piston is added (for example, Patent Document 3) and those to which a special valve for generating a negative pressure at the nozzle when a coating liquid is blocked from the nozzle (for example, Patent Document 4).

  In the known coating liquid supply means, the coating liquid at the time of non-coating is returned to the original tank as a system, so that the coating liquid is not wasted, but the coating liquid is in contact with air and deteriorated on the way back, Since a deteriorated coating solution or a coating solution having a different time history is mixed in the tank, there is a problem that it cannot be applied to formation of a coating film that requires high quality.

  Although the coating liquid is supplied by a continuous pump, only the MONO pump has high sealing performance and quantitativeness with the continuous pump, but even in this case, the outer cylinder is elastic to maintain the sealing performance. This elastic body is deformed when the load pressure fluctuates, and its quantitativeness is lower than that of an intermittent constant capacity pump such as a syringe pump.

  Furthermore, with the MONO pump, if the coating solution is fed under the actual conditions and the amount is not measured and calibrated, the supply amount and supply speed of the coating solution necessary for forming the coating film cannot be set. Compared with an intermittent constant-capacity pump such as a syringe pump that can easily calculate the supply amount and supply speed of the coating liquid from the moving speed, it is inferior in terms of function, performance, and operability.

  The known application liquid supply means for intermittently supplying the application liquid uses a high-precision intermittent constant capacity pump such as a syringe pump, which is excellent in quantitative performance, and is applied with deteriorated application liquids and different time histories. The actual situation is that there is no one that can repeatedly and stably start and stop supplying a constant amount of coating liquid instantaneously without using a circulation circuit in which the liquid is mixed.

  Since there is no optimal coating solution supply means for intermittent application, it is possible to realize intermittent application with a short tact time and high productivity, and with a small defective film thickness area and a uniform film thickness that can increase the quality of product areas. Absent.

JP-A-6-339656 JP 2007-187948 A JP 2009-95752 A JP 2001-38276 A

  The present invention has been conceived based on the above situation. The object of the present invention is that a plurality of intermittently applied areas have a uniform film thickness in the section from the beginning of application to the end of application, guaranteeing application of a coating solution without any deterioration factor, and providing a high quality product area. The aim is to achieve intermittent coating that can perform large chamfering with high productivity and short tact time.

  For this reason, the present invention uses an intermittent constant capacity pump with high accuracy and high quantitativeness, and without using a circulating circuit in which a deteriorated coating liquid or a coating liquid having a different time history is mixed. Provided are an intermittent coating apparatus and an intermittent coating method capable of repeatedly and stably starting and stopping the supply of a coating liquid to a nozzle. Furthermore, the manufacturing method of the display member which can manufacture a high quality display member with high productivity using this intermittent application method is provided.

  The object of the present invention is achieved by the means described below.

The intermittent coating apparatus according to the present invention is
An applicator provided with a discharge port for discharging the coating liquid onto the coated member at the tip;
A mounting table for holding the coated member;
A coating liquid supply means for intermittently supplying the coating liquid to the applicator;
A moving means for relatively moving at least one of the applicator and the mounting table, and an intermittent coating apparatus that intermittently forms a plurality of coating films on the coated member,
The coating liquid supply means includes
An intermittent constant-capacity pump that supplies the coating liquid at a predetermined flow rate to the applicator;
A storage tank for storing the coating liquid;
An upstream pipe disposed on the upstream side of the intermittent constant capacity pump and communicating the intermittent constant capacity pump and the storage tank;
An upstream open / close valve provided in the upstream pipe;
A downstream pipe disposed on the downstream side of the intermittent constant capacity pump and communicating the intermittent constant capacity pump and the applicator;
Two on-off valves provided in the downstream pipe, a downstream first on-off valve and a downstream second on-off valve;
It is characterized by having.

  Here, it is preferable that the downstream first opening / closing valve is a suck-back valve that is provided upstream from the downstream second opening / closing valve, and draws the coating liquid upstream from the applicator when the valve is closed.

The intermittent coating method according to the present invention is:
The pipe between the applicator provided with the discharge port and the storage tank for storing the coating liquid is provided with an application means having an upstream open / close valve, an intermittent constant capacity pump, a downstream first open / close valve, and a downstream second open / close valve from the upstream side. An intermittent coating method for intermittently forming a plurality of coating films on a member to be coated,
Opening the downstream first opening / closing valve, closing the second downstream opening / closing valve and the upstream opening / closing valve, and applying pressure from the intermittent constant capacity pump to the coating liquid;
An application step of applying by opening the downstream second on-off valve;
It has a coating end process of closing the downstream first open / close valve while drawing the coating liquid upstream.

  Here, in the coating end step, it is preferable that the upstream opening / closing valve is further opened and the coating liquid is sent from the intermittent constant capacity pump toward the storage tank.

  The display member manufacturing method according to the present invention is characterized in that the display member is manufactured using the intermittent coating method described above.

  By using the intermittent coating apparatus and the intermittent coating method according to the present invention, while supplying a predetermined flow rate of coating liquid continuously from an intermittent constant volume pump that is highly accurate and excellent in quantitative performance, By supplying the open / close valve, the application liquid can be intermittently supplied to the applicator. Since it did in this way, the several coating film of a highly accurate and uniform film thickness can be formed by multi-cham on one to-be-coated member.

  Further, when the supply of the coating liquid to the applicator during intermittent coating is stopped, the coating liquid is returned to the upstream side as it is from an intermittent constant capacity pump that operates continuously. By doing in this way, deterioration of the coating liquid by air contact does not arise. That is, there is no possibility that a deteriorated coating solution or a coating solution having a different time history is mixed as in the case of using a circulation circuit. Therefore, a high quality coating film can be formed by intermittent coating.

  Furthermore, in order to instantaneously stop the application liquid supply to the applicator during intermittent application, a suck back valve is introduced that draws the application liquid upstream from the applicator when the valve is closed. In addition, an open / close valve including a suck valve is provided so that the supply of the coating liquid to the applicator can be repeated intermittently. With this configuration, it is possible to minimize the defective film thickness region that is outside the allowable value from the target film thickness at the start and end of application, and to increase the product area with a uniform film thickness even by intermittent application.

  According to the method for producing a display member according to the present invention, the display member is produced by using the above-described excellent intermittent coating method. A high-quality display member having a thickness can be manufactured at low cost.

1 is a schematic front view of a slit coater 1 according to the present invention. 2 is a schematic cross-sectional view showing a configuration of a suck back valve 120. FIG. It is a time diagram which shows the operation | movement condition of the main operation | movement part with the coating method which concerns on this invention. It is the schematic diagram which showed typically the operation | movement condition of the main operation | movement part with the coating method which concerns on this invention corresponding to FIG. It is another time line diagram of the supply capacity | capacitance speed | velocity | rate of the syringe pump 50 with the coating method which concerns on this invention.

  Hereinafter, a preferred embodiment of the present invention will be described with reference to the drawings. The following description exemplifies an embodiment of the present invention, and is not limited to the following description. The following embodiments can be modified without departing from the gist of the present invention. FIG. 1 is a schematic front view of a slit coater 1 according to the present invention.

  First, referring to FIG. 1, a slit coater 1 which is a coating apparatus provided with a coating liquid supply apparatus 40 according to the present invention is shown. The slit coater 1 includes a base 2, and a mounting base 6 is disposed on the base 2 as a holder for a substrate A that is a member to be coated. The upper surface 8 of the mounting table 6 is provided with suction holes and suction grooves so that the substrate lower surface RP, which is the lower surface of the substrate A, can be sucked and fixed by vacuum suction, and is configured as a suction surface.

  On the base 2, a pair of guide rails 4 are further provided on both sides in the width direction, which is a direction perpendicular to the paper surface of the mounting table 6. On the pair of guide rails 4, a portal gantry 10 is also mounted via a pair of bearings 14 so as to be guided in the X direction indicated by arrows.

  The portal gantry 10 includes a pair of traveling portions 16 that are fixed on a pair of bearings 14 on both sides in the width direction, and a stay 12 that connects the pair of traveling portions 16 to each other, and is configured in a portal shape. . A pair of traveling units 16 of the portal gantry 10 is provided with a pair of vertical lifting units 70 that function as lifting means corresponding to both longitudinal ends of the slit nozzle 20 that is an applicator.

  The slit nozzle 20 is attached to the pair of upper and lower lifting / lowering units 70 via a suspension holding base 80 so as to be positioned above the mounting table 6. The longitudinal direction of the slit nozzle 20 is a direction perpendicular to the paper surface and coincides with the width direction described above. Since the portal gantry 10 is driven by a linear motor (not shown), the slit nozzle 20 mounted on the portal gantry 10 can freely reciprocate in the X direction indicated by an arrow in FIG.

  A slit nozzle 20 shown in FIG. 1 has a front lip 22 and a rear lip 24 that extend in the width direction (perpendicular to the paper surface) perpendicular to the X direction, overlapped in the X direction via shims 32, and are not shown It is configured to be integrally coupled with a connecting bolt. A manifold 26 is formed at the center of the slit nozzle 20, and the manifold 26 also extends in the longitudinal direction of the slit nozzle 20, that is, in the width direction.

  A slit 28 is formed below the manifold 26 so as to communicate therewith. The slit 28 is also extended in the longitudinal direction of the slit nozzle 20. The lower end of the slit 28 opens at the lowermost end surface of the slit nozzle 20, that is, the discharge port surface 36 which is the tip portion located on the lowermost side, thereby forming the discharge port 34.

  Since the slit 28 is formed by sandwiching the shim 32, the gap (measured in the X direction) of the slit 28 is equal to the thickness of the shim 32. On both sides of the discharge port surface 36, slopes 38 are formed that are obliquely upward.

  The vertical lift unit 70 that lifts and lowers the slit nozzle 20 includes a lift 78 that lifts a suspension holding base 80 that holds the slit nozzle 20 in a suspended manner, a guide 74 that guides the lift 78 in the vertical direction, and a motor 72. The ball screw 76 converts the rotary motion into the linear motion of the lifting platform 78.

  A pair of upper and lower lifting units 70 are arranged so as to support both ends of the slit nozzle 20 in the longitudinal direction (coating width direction). Corresponding to this, a pair of right and left elevators 78, guides 74, motors 72, and ball screws 76 are also arranged.

  Since the pair of upper and lower lifting / lowering units 70 can be moved up and down independently on the left and right in the application width direction, an inclination angle with respect to the horizontal in the longitudinal direction of the slit nozzle 20 can be arbitrarily set. Accordingly, the discharge port surface 36 of the slit nozzle 20 and the surface CP of the substrate A can be made substantially parallel over the longitudinal direction of the slit nozzle 20.

  Further, the vertical lift unit 70 allows the clearance between the discharge port surface 36 of the slit nozzle 20 and the surface CP of the substrate A, that is, the clearance CL to be an arbitrary size in the vertical direction of the slit nozzle 20. The position in a certain Z direction can be adjusted.

  The vertical elevating unit 70 described in detail above and the portal gantry 10 that can reciprocate in the X direction serve as moving means for moving the slit nozzle 20 relative to the mounting table 6.

  Further, when the left end portion of the base 2 is viewed in FIG. 1, a wiping unit 90 is mounted on the base 2. The slit nozzle 20 that engages with the wiping head 92 can be moved by the portal gantry 10 to above the wiping head 92 of the wiping unit 90.

  The wiping unit 90 discharges the coating liquid 66 from the slit nozzle 20, and then removes the coating liquid 66 remaining on the discharge port surface 36 and the inclined surface 38, which is the periphery of the discharge port 34. 66 is satisfied. Making the slit nozzle 20 in this state is called initialization of the slit nozzle 20.

  By always performing the initialization of the slit nozzle 20 before each intermittent application, the slit nozzle 20 can always start the first intermittent application in the same state, and even if intermittent application is performed on a large number of substrates. The same uniform coating film can be formed with good reproducibility on all the substrates.

  In the wiping unit 90, a wiping head 92 having a shape that engages with the periphery of the discharge port 34 of the slit nozzle 20 is attached to the slider 96 via an elevating cylinder 104 and a bracket 94.

  The wiping head 92 can be moved up and down freely by a lifting cylinder 104 in the vertical direction. The slider 96 is freely moved by the drive unit 98 in the longitudinal direction of the slit nozzle 20, that is, in the Y direction. The drive unit 98 and the tray 100 are fixed on a table 102.

  When wiping is performed, the portal gantry 10 is moved in the X direction to a position where the slit nozzle 20 is engaged with the wiping head 92, and the wiping head 92 is raised by the lifting cylinder 104 to be engaged with the slit nozzle 20.

  Then, when the drive unit 98 is driven to slide the wiping head 92 in the longitudinal direction of the slit nozzle 20, the coating liquid 66 remaining in the periphery of the discharge port 34 of the slit nozzle 20 is removed, and the slit nozzle 20 initializations can be performed.

  The removed coating liquid 66 is collected in the tray 100. The tray 100 is connected to a discharge line (not shown) and can discharge and collect a liquid such as the coating liquid 66 accumulated inside. The tray 100 can also be used for recovering the coating liquid 66 discharged from the slit nozzle 20 by air bleeding or the like.

  Specifically, the wiping head 92 is preferably a synthetic resin blade that is in line contact with the slit nozzle 20, but is an elastic blade such as rubber so that it can be evenly engaged with the surface of the slit nozzle 20. Also good. Further, when the coating liquid 66 has a high viscosity, the wiping head 92 may hold the cloth soaked with the solvent with an elastic body.

  Next, when viewing the slit nozzle 20 in FIG. 1, the upstream side of the manifold 26 of the slit nozzle 20 is connected to a supply hose 60 connected to a coating liquid supply device 40 functioning as a coating liquid supply means via an internal passage (not shown). Always connected. Thereby, the coating liquid 66 can be supplied from the coating liquid supply apparatus 40 to the manifold 26. The coating liquid 66 that has entered the manifold 26 is uniformly widened in the longitudinal direction of the slit nozzle 20 and is discharged from the discharge port 34 through the slit 28. In addition, including the present specification and claims, the direction in which the coating liquid 66 flows is called the upstream side, and the flowing direction is called the downstream side. That is, the tank 64 is the most upstream, and the discharge port 34 of the slit nozzle 20 is the most downstream.

  The coating liquid supply apparatus 40 includes a filter 46, a supply valve 42, a suck back valve 120, a syringe pump 50, a suction valve 44, a suction hose 62, and a tank 64 on the upstream side of the supply hose 60. The supply hose 60 is a downstream pipe, and the suction hose 62 is an upstream pipe. The tank 64 is a storage tank.

  A coating liquid 66 is stored in the tank 64, and a back pressure of an arbitrary magnitude can be applied to the coating liquid 66 by being connected to a pressure air source 68. The coating liquid 66 in the tank 64 is supplied to the syringe pump 50 through the suction hose 62. In the syringe pump 50, a syringe 52 and a piston 54 are attached to the main body 56. Here, the piston 54 can reciprocate freely in the vertical direction by a drive source (not shown).

  The syringe pump 50 intermittently supplies the coating liquid 66 into the syringe 52 having a constant inner diameter, pushes it out by the piston 54, and supplies the coating liquid 66 in an amount for coating one substrate A to the slit nozzle 20. It is a drive constant capacity type pump, that is, an intermittent constant capacity pump.

  When filling the syringe 52 with the coating liquid 66, the suction valve 44 is opened, the supply valve 42 is closed, and the piston 54 is moved downward. By this operation, the coating liquid 66 in the tank 64 is introduced into the syringe 52. When supplying the coating liquid 66 filled in the syringe 52 toward the slit nozzle 20, the suction valve 44 is closed, the suck back valve 120 and the supply valve 42 are opened, and the piston 54 is moved upward. By this operation, the coating liquid 66 in the syringe 52 is discharged and fed toward the slit nozzle 20.

  Thus, the supply hose 60 is preferably made of a resin such as Teflon (registered trademark) so that the supply hose 60 is elastically deformed and expanded due to an increase in internal pressure, and the coating liquid 66 is stored.

  Of the valves, the supply valve 42 and the suction valve 44 may be of any type as long as they can switch the passage (valve opening) / shutoff (valve closing) of the application liquid 66, but preferably the application valve. A valve with a small capacity change due to switching of passage / shutoff of the liquid 66 is used.

  Specific examples of the valve include a ball valve, a cork valve, and a valve whose valve seat moves in a flow path. The suction valve 44 disposed on the upstream side of the syringe pump 50 is an upstream open / close valve, the suck back valve 120 on the upstream side downstream of the syringe pump 50 is the first downstream open / close valve, and the supply valve 42 on the downstream side thereof. Becomes the downstream second open / close valve.

  Further, as the suck back valve 120, a valve is used that pulls back the coating liquid 66 from the downstream side when the passage of the coating liquid 66 is blocked, that is, when the valve is closed. A specific configuration will be described in detail with reference to FIG.

  FIG. 2 is a schematic cross-sectional view showing a specific configuration of the suck back valve 120. 2A shows a valve open state in which the coating liquid 66 can pass, and FIG. 2B shows a valve closed state in which the passage of the coating liquid 66 is blocked.

  As shown in FIG. 2A, the suck back valve 120 mainly includes a body A 122, a body B 123, a blocking bar 124, and a diaphragm 126. An inlet 134 for the application liquid 66 is provided at the center on the right side of the body A 122, and an outlet 136 for the application liquid 66 is provided at the lower side. In addition, there is a flow path 138 that allows the inlet 134 and the outlet 136 to communicate with each other.

  Accordingly, the coating liquid 66 that has flowed in from the inlet 134 with the inlet 134 as the upstream side passes through the flow path 138 and exits from the outlet 136 to the outside of the suck back valve 120 to the downstream side. In addition, the flow path 138 is a part shown with an oblique line, and all the coating liquids 66 are filled here.

  In the middle of the flow path 138, there is a blocking portion 140, between the blocking convex surface 130 below the blocking bar 124 and the blocking concave surface 132 provided inside the body A 122, as shown in FIG. If there is a gap, the valve is opened, and the coating liquid 66 that has flowed in from the inlet 134 passes through the blocking portion 140 toward the outlet 136.

  As shown in FIG. 2B, when the blocking bar 124 is moved upward to bring the blocking convex surface 130 and the blocking concave surface 132 into close contact with each other, the coating liquid 66 does not pass through the blocking portion 140 and the valve is closed. The blocking convex surface 130 and the blocking concave surface 132 are both conical surfaces. The blocking bar 124 is supported by the body B123 so as to be movable only in the vertical direction, and is connected to a linear drive source (not shown).

  Therefore, the vertical movement of the blocking bar 124 by a drive source (not shown) allows the coating liquid 66 to pass / block, that is, to open / close the valve automatically. A diaphragm 126, which is a thin metal disk, is attached to the central portion of the blocking bar 124 in the vertical direction. The outer peripheral portion of the diaphragm 126 is fixed to the body B123 by a hollow cylindrical holding plate 128.

  The diaphragm 126 blocks the internal flow path 138 from the outside, and the coating liquid 66 in the flow path 138 leaks to the outside through the outer periphery of the diaphragm 126 and the portion where the diaphragm 126 is attached to the blocking bar 124. It is well sealed to prevent it from happening. The body A 122 and the body B 123 are also fastened and fixed so that the coating liquid 66 does not leak to the outside from the contact surfaces of both of them near the diaphragm 126.

  As described above, since the diaphragm 126 is a thin metal plate, it is easily elastically deformed, and when the valve in FIG. 2 (a) is opened, the shape that is convex downward moves the blocking bar 124 upward in FIG. 2 (b). When the valve is closed, the shape is convex upward. Since the volume in the flow path 138 changes due to the deformation of the diaphragm 126, the diaphragm 126 has a pumping action.

  That is, since the volume of the flow path 138 increases when the valve is opened in FIG. 2 (a) to the valve closed state in FIG. 2 (b), if the inlet 134 is closed, the coating can be applied from the outlet 136. The liquid 66 is sucked, that is, the coating liquid 66 on the downstream side of the suck back valve 120 is pulled back to the upstream side.

  When the valve closed state in FIG. 2B is changed to the valve open state in FIG. 2A, the volume of the flow path 138 becomes small. Therefore, if the inlet 134 is closed, the coating liquid 66 is discharged from the outlet 136. Is discharged. That is, the coating liquid 66 in the suck back valve 120 is pushed out from the outlet 136 to the downstream side.

  As described above, the suck back valve 120 can be said to have a function of drawing back the coating liquid 66 from the downstream side when the valve is closed, that is, a valve having a suck back function. The amount of the application liquid that pulls back the application liquid 66, that is, the amount of suck back, is determined by the amount of deformation of the diaphragm 126 when the valve is opened and closed, and can be uniquely determined by the amount of vertical movement of the blocking bar 124.

  In FIG. 2A, when the upper end 142 of the blocking bar 124 reaches the upper limit position, it is indicated by a one-dot chain line, and the length to the current position and the upper limit position is indicated by a movement amount S. The upper limit position of the upper end 142 is when the blocking convex surface 130 and the blocking concave surface 132 come into contact with each other and the valve is closed, and is a fixed position. Therefore, the suck back amount Qs can be uniquely determined by the movement amount S.

  The amount of extrusion that excessively pushes the coating liquid 66 downstream when the valve is opened is exactly the same as the suckback amount Qs if the movement amount S is determined, and cannot be set individually independently.

  Since the upper limit position of the upper end 142 of the blocking bar 124 is fixed, the movement amount S is adjusted by changing the position where the blocking bar 124 moves downward. This is synonymous with adjusting the distance between the blocking convex surface 130 and the blocking concave surface 132 of the blocking portion 140.

  Returning to FIG. 1 again, the linear motor, the motor 72, the coating liquid supply device 40, the wiping unit 90, and the like that are operated by the control signal are all electrically connected to the control device 110. Then, a control command signal is transmitted to each device in accordance with an automatic operation program incorporated in the control device 110 to perform a predetermined operation. When changing the conditions, if a change parameter is appropriately input to the operation panel 112, it is transmitted to the control device 110, and the change of the driving operation can be realized.

  Next, an intermittent coating method for forming two coating films for two product surfaces using the slit coater 1 of the present invention will be described in detail with reference to FIGS. 1, 3 and 4. FIG. Here, FIG. 3 is a time line diagram showing the operation status of the main operation unit in the coating method according to the present invention, and FIG. 4 corresponds to FIG. 3 the operation status of the main operation unit in the coating method according to the present invention. It is the schematic diagram typically shown.

  In FIG. 4, the supply hose 60, the supply valve 42, the suck back valve 120, the syringe pump 50, the suction valve 44, among the substrate A, the slit nozzle 20, and the coating liquid supply device that supplies the coating liquid 66 to the slit nozzle 20. A suction hose 62 and a tank 64 are schematically shown.

  As shown in FIG. 1, first, as a preparatory work before application, when the origin of each operation part of the slit coater 1 is returned, the portal gantry 10 is located above the wiping head 92 with the discharge port 34 of the slit nozzle 20 on the left side. Move to come to the origin position. Here, the coating liquid 66 is already filled from the tank 64 to the slit nozzle 20, and the work of discharging residual air in the path from the tank 64 to the slit nozzle 20 has already been completed.

  At this time, the coating liquid supply device 40 is in a state where the syringe 52 is filled with the coating liquid 66, the suction valve 44 is closed, the suck back valve 120 and the supply valve 42 are opened, and the piston 54 is at the lowermost position. The coating liquid 66 can be supplied to the slit nozzle 20. Note that the movement amount S of the suck back valve 120 is set so as to be a predetermined suck back amount Qs.

  Next, lift pins (not shown) are raised on the upper surface 8 that is the suction surface of the mounting table 6, and the substrate A is placed on the lift pins from a loader (not shown). Next, the lift pins are lowered to place the substrate A on the upper surface 8 of the placing table 6 and simultaneously hold it by suction. The height H from the upper surface 8 of the surface CP of the substrate A is measured by a height sensor (not shown).

  The height H is the thickness of the substrate A. Using the measured height H of the substrate A, a position separated from the surface CP of the substrate A by a clearance amount CL given in advance, that is, a position of height Hn = H + CL from the upper surface 8 is set as the application position. And the Z direction coordinate value of the up-and-down lift unit 70 is determined so that the discharge port surface 36 of the slit nozzle 20 can move to this application position.

  In parallel with this, the coating liquid supply device 40 is operated to discharge a small amount of the coating liquid 66 from the slit nozzle 20, and then the drive unit 98 is driven so that the wiping head 92 is at the longitudinal end of the slit nozzle 20. Move to the sliding start position and stop.

  The elevating cylinder 104 is driven to raise the wiping head 92 and engage the wiping head 92 with the discharge port 34 and its periphery of the slit nozzle 20, and then the wiping head 92 is slid in the longitudinal direction of the slit nozzle 20. The vicinity of the discharge port 34 of the nozzle 20 is wiped over the longitudinal direction of the slit nozzle 20 to initialize the slit nozzle 20.

  When the initialization of the slit nozzle 20 is completed, the supply valve 42 is closed, and then the suction valve 44 is opened. The elevating cylinder 104 is driven to the opposite side, and after the wiping head 92 is lowered, the wiping head 92 is returned to the initial position in the longitudinal direction.

  This completes the preparation for coating. The situation at this time is the situation at time t = t0 in FIG. That is, the portal gantry 10 equipped with the slit nozzle 20 is stopped, and the slit nozzle 20 is at the wiping position which is the origin in the X direction and at the highest origin position in the Z direction. The syringe pump 50 is stopped, the suction valve 44 is opened, the supply valve 42 is closed, and the suck back valve 120 is opened.

  FIG. 4 schematically shows the relative position of the slit nozzle 20 shown in FIG. 3 with respect to the substrate A, the opening / closing status of each valve, and the flow status of the coating liquid 66. FIG. The situation at t = t0 is shown.

  In FIG. 4, “open” indicates a valve open state, and “closed” indicates a valve closed state. In addition, when the valve is opened, a diagram schematically showing the corresponding valve is filled. In the line connecting the tank 64 to the syringe pump 50 to the slit nozzle 20, the thick line indicates the range of the coating liquid 66 supplied from the syringe pump 50 and the coating liquid 66 sucked into the syringe pump 50. An arrow indicates an operation direction of the piston 54 of the syringe pump 50.

  Next, after confirming that the substrate A is attracted and held on the upper surface 8 of the mounting table 6 and is stationary, the coating speed of the portal gantry 10 (slit nozzle 20) toward the right in the X direction at t = t1. Driving is started at VC, and the slit nozzle 20 is started to move to the first application start position of the substrate A. At the same time, the height H of the substrate A sucked and held on the mounting table 6 is measured, and the slit nozzle 20 is started to descend in the Z direction to a predetermined application position.

  At the same time, the syringe pump 50 starts to drive, and the coating liquid 66 is returned to the tank 64 side (the situation at t = t1 in FIG. 3 is FIG. 4B). After the supply volume speed of the syringe pump 50 reaches the supply capacity speed VP, the suction valve 44 is closed at the timing t = t2, and the closed state in which the coating liquid 66 supplied from the syringe pump 50 cannot go anywhere. produce. That is, after opening the downstream first open / close valve (suck back valve) 120, the downstream second open / close valve (supply valve) 42 and the upstream open / close valve (suction valve) 44 are closed, and the intermittent constant capacity pump (syringe pump). The pressure is applied from 50 to the coating liquid 66. This is called a pre-application process.

  At this time, the slit nozzle 20 has reached the application position in the Z direction. The supply capacity speed VP of the syringe pump 50 is calculated by the wet thickness of the coating film × the coating width of the coating film × the coating speed (the situation at t = t2 in FIG. 3 is FIG. 4C).

  When the discharge port 34 of the slit nozzle 20 reaches the first application start position of the substrate A at t = t3, the supply valve 42 is opened and the excess application stored in the supply hose 60 at the closing time ta = t3-t2. The surplus coating liquid of the liquid amount Qe is momentarily added to the coating liquid 66 supplied from the syringe pump 50 at the supply capacity speed VP, and supply to the slit nozzle 20 is started instantaneously.

  As a result, the application liquid 66 is instantaneously started to be discharged from the slit nozzle 20, and a bead B as a liquid pool is formed instantaneously between the discharge port surface 36 and the surface CP of the substrate A, and application is started (t in FIG. 3). = T3 is shown in FIG. 4 (d)). This is called a coating process.

  When the first coating film C1 is formed on the substrate A, and the discharge port 34 of the slit nozzle 20 reaches the first coating end position of the substrate A at t = t4, the suck back valve 120 is closed and suction is performed. Valve 44 is opened. At the same time, the slit nozzle 20 starts to rise to the standby position in the Z direction. That is, the downstream first opening / closing valve (suck back valve) 120 was closed while drawing the coating liquid 66 upstream. This is called a coating end process.

  Since the suction valve 44 is opened, the coating liquid 66 supplied from the syringe pump 50 returns to the tank 64. Further, the coating liquid 66 having a predetermined suck back amount Qs is drawn back from the slit nozzle 20 by the suck back valve 120, and the coating liquid supply to the slit nozzle 20 is instantaneously stopped, whereby the coating liquid from the slit nozzle 20 is stopped. 66 discharge stops instantaneously. That is, the upstream opening / closing valve (suction valve) 44 is opened, and the coating liquid 66 is returned from the intermittent constant capacity pump (syringe pump) 50 to the tank 64.

  By stopping the discharge of the coating liquid 66 and raising the slit nozzle 20, the bead B is cut off, and the coating is completed in an instant (the situation at t = t4 in FIG. 3 is shown in FIG. 4E).

  In a situation where the suck back valve 120 is closed and the coating liquid 66 supplied from the syringe pump 50 passes through the suction valve 44 and is returned to the tank 64, the supply valve 42 is closed at t = t5, and then t = T6, the suck back valve 120 is opened.

  The extrusion amount (= suckback amount Qs) generated by opening the suckback valve 120 is directed toward the suction valve 44 on the upstream side (the situation at t = t5 in FIG. 3 is FIG. 4 (f), The situation at t = t6 in FIG. 3 is shown in FIG.

  The suction valve 44 is closed at the timing t = t7 to create a closed state where the coating liquid 66 supplied from the syringe pump 50 cannot go anywhere. At the same time, the slit nozzle 20 is started to descend to the application position in the Z direction. The lowering of the slit nozzle 20 may be started at t = t6 (the situation at t = t7 in FIG. 3 is FIG. 4 (h)).

  When the discharge port 34 of the slit nozzle 20 reaches the second application start position of the substrate A at t = t8, the supply valve 42 is opened. Then, the surplus coating liquid 66 of the surplus coating liquid amount Qe stored in the supply hose 60 in the closing time of ta = t8−t7 is momentarily added to the coating liquid 66 supplied from the syringe pump 50 at the supply capacity speed VP to form a slit nozzle. 20, a bead B as a liquid reservoir is formed instantaneously between the discharge port surface 36 and the surface CP of the substrate A, and application is started (the situation at t = t8 in FIG. 3 is shown in FIG. 4 (i)). ).

  When the second coating film C2 is formed on the substrate A, and the discharge port 34 of the slit nozzle 20 reaches the second coating end position of the substrate A at t = t9, the suck back valve 120 is closed and suction is performed. The valve 44 is opened, and at the same time, the slit nozzle 20 starts to rise to the standby position in the Z direction.

  Since the suction valve 44 is opened, the coating liquid 66 supplied from the syringe pump 50 returns to the tank 64. The sucking back valve 120 pulls back the coating liquid 66 having a predetermined sucking amount Qs from the slit nozzle 20 to stop the discharge of the coating liquid 66 from the slit nozzle 20 instantaneously. Is cut off, and the application is completed in an instant (the situation at t = t9 in FIG. 3, FIG. 4 (j)).

  The portal gantry 10 continues to move even after the application is completed, and the slit nozzle 20 and the portal gantry 10 move toward the end point in the X direction. Meanwhile, at t = t10, the syringe pump 50 is stopped and the supply valve 42 is closed. Thereafter, the suck-back valve 120 is opened at t = t11 (the situation at t = t10 in FIG. 3 is FIG. 4 (k)).

  When the slit nozzle 20 reaches the end point position in the X direction at t = t12, the portal gantry 10 is stopped, the slit nozzle 20 starts to rise in the Z direction to the origin position, and the syringe pump 50 is moved to the opposite side at the filling speed. The driving is started, and a required amount of coating liquid 66 is sucked from the tank 64 and filled.

  At the same time, the adsorption of the substrate A by the mounting table 6 is released, lift pins (not shown) are raised to lift the substrate A, and the substrate A is carried out to the next step by an unloader (not shown). Then, after the next substrate A is placed on the upper part of the lift pin from a loader (not shown), the lift pin is lowered to place the next substrate A on the upper surface 8 of the placing table 6 and simultaneously sucked and held.

  Then, the height H from the upper surface 8 of the surface CP of the next substrate A is measured by a height sensor (not shown) to determine the application position. (The situation at t = t12 in FIG. 3 is FIG. 4 (l)).

  When the filling of the application liquid 66 of the syringe pump 50 is completed, the suction valve 44 is closed, and then the supply valve 42 is opened. The portal gantry 10 is driven in the reverse direction at a return speed, and moves the slit nozzle 20 until the discharge port 34 reaches the origin position above the wiping head 92. When the movement is completed, the coating liquid supply device 40 is operated to discharge a small amount of the coating liquid 66 from the slit nozzle 20, and then the slit nozzle 20 is initialized in the same procedure as the preparation operation at t = t13 (t in FIG. 3). = Situation of t13 is FIG. 4 (m)).

  When the initialization of the slit nozzle 20 is completed, the supply valve 42 is closed, and then the suction valve 44 is opened, and then waiting at t = t14 (the situation at t = t14 in FIG. n)).

  Since t = 14 and the same situation as t = t0, the procedure from t = t0 is repeated thereafter.

  The above coating method is a coating method that can be carried out only with an intermittent constant-capacity pump, whereby it is possible to intermittently and continuously form a highly accurate coating film with small film thickness unevenness. Furthermore, since the coating liquid 66 is returned to the tank 64 from the downstream side when not applied, there is no deterioration due to air contact of the coating liquid 66 or quality deterioration due to mixing of the coating liquids 66 having different time histories, and high quality application. Film formation is also possible.

  Further, at each application start position, the application liquid supply to the slit nozzle 20 can be started instantaneously by adjusting the closing time ta that is directly connected to the excess application liquid amount Qe. On the other hand, at each application end position, the application liquid supply to the slit nozzle 20 can be stopped instantaneously by adjusting the suck back amount Qs of the suck back valve 120. As described above, it is possible to minimize a film thickness defect region at each application start and end in intermittent application.

  In the above coating method, two coating films are formed by intermittently ejecting the coating liquid 66 from the slit nozzle 20 while moving the slit nozzle 20 relative to the substrate A in the X direction at a constant speed. However, the number of coating films formed is not limited.

  For example, when n coating films are formed, the procedure performed from the first coating end position to the second coating start position in the above coating method is followed by the completion of the formation of the i-th coating film of the n coating films. This may be applied to the start of forming the i + 1th coating film. Note that, during the formation of the first to nth coating films, the wiping unit 90 does not wipe the slit nozzle 20, that is, the slit nozzle 20 is not initialized.

  In the above application method, the slit nozzle 20 is raised in the Z direction at the end of application. However, the slit nozzle 20 may not be raised and may remain in the application position.

  Further, the initialization of the slit nozzle 20 before the start of intermittent application is performed by wiping with the wiping head 92, but may be performed by preliminarily applying to a roll or a plate.

  It is preferable to finely adjust the suck back amount Qs by the coating method according to the length of the defective film thickness region at the end of the applied coating film. When the defective film thickness region is long, the suck back amount Qs is increased. On the other hand, when sucking air or the like from the discharge port 34 of the slit nozzle 20 by suck back, the suck back amount Qs is reduced.

  In the present invention, since the supply valve 42 which is an opening / closing valve is arranged further downstream of the suck back valve 120 arranged on the downstream side of the syringe pump 50, there is a capacity change which is a return operation of the suck back valve 120. Even if the valve is opened, the supply valve 42 is closed and the supply of the coating liquid to the slit nozzle 20 is shut off, so that the influence is not exerted.

  The fact that the suck back valve 120 can be restored in this way means that the suck back valve 120, which is essential for intermittent application liquid supply, can be used repeatedly. As a result, coating using the suck back valve 120 is possible. The intermittent supply of the coating liquid 66 from the liquid supply device 40 to the slit nozzle 20 can be repeated indefinitely.

  The timing of closing the suck back valve 120 at the end of application and the timing of opening the suction valve 44 are the same, or the timing of closing the suck back valve 120 rather than opening the suction valve 44 is the same. It is preferable to delay the coating liquid 66 because the coating liquid 66 directed from the syringe pump 50 toward the suck back valve 120 is reduced.

  Although it is the closing time ta that affects the length of the film thickness failure region and the film thickness profile at the coating start portion, it is preferable to roughly determine from the surplus coating liquid amount Qe that directly affects the formation of the coating start portion.

  That is, the blocking time ta (s) = the volume Qe (μl) of the surplus coating solution / the supply volume speed VP (μl / s).

  In the above formula, the units in parentheses indicate units. In order to make it more precise, it is preferable to make fine adjustments according to the length of the defective film thickness region or the film thickness profile at the start of the applied coating film. That is, it is preferable that the closing time ta is shortened when the starting portion is thicker than the reference film thickness, and the closing time ta is lengthened when the starting portion is smaller than the reference film thickness.

  However, depending on the relationship between the first application end position and the second application start position, there is a restriction on the closing time ta, and when the desired surplus coating liquid amount Qe cannot be obtained, the syringe pump 50 can be used during the closing time ta. The supply capacity speed may be changed from the supply capacity speed VP. An example of the time profile of the supply capacity speed of the syringe pump 50 is shown in FIG.

  The time on the horizontal axis in FIG. 5 is combined with that in FIG. 3, and the time profile of the supply capacity speed of the syringe pump 50 in FIG. 3 may be replaced with that in FIG. Accordingly, the supply volume rate of the syringe pump 50 is changed from VP to a larger VPE between t7 <t <t8 in FIG. 5 so that the excess coating liquid amount Qe can be increased, and the film thickness at the second coating start position is increased. It is effective in improving the shortage.

  In the coating method presented above, at the start of the first coating film formation, the coating was started while moving the slit nozzle 20 relative to the substrate A at a constant speed in the X direction in the same manner as after the second coating film formation. The slit nozzle 20 may be temporarily stopped at the first application start position of the substrate A and then the application may be started.

  In addition, the substrate A is stopped and the slit nozzle 20 is moved for application, but the slit nozzle 20 may be stopped and the mounting table 6 for holding the substrate A by suction may be moved for intermittent application.

  Even if the slit nozzle 20 that can form a planar coating film is replaced with a stripe nozzle that can form a striped coating film, the same coating method can be applied, and the defective film thickness region can be minimized as well. .

  Furthermore, in the above embodiment, the syringe pump 50 is used as an intermittent constant volume pump. However, the present invention is not limited to this as long as the constant volume coating liquid 66 is supplied and suctioned. Nominal CT pump), diaphragm pump, and the like can be suitably used.

  The coating liquid 66 to which the present invention described above can be applied has a viscosity of 1 to 100,000 mPaS and is preferably a Newtonian from the viewpoint of coating properties, but can also be applied to the coating liquid 66 having thixotropy.

  Specific examples of the coating solution 66 that can be applied include low viscosity such as a black matrix for color filters, a coating solution for forming RGB color pixels, a resist solution, an overcoat material, a column forming material, and a positive resist for a TFT array substrate. There are paste for thin film coating, hole injection layer forming paste for organic EL, pixel forming paste, partition wall paste for PDP back plate, dielectric paste, paste for high viscosity thin film coating of electrode paste, and the like.

  As a member to be coated which is the substrate A, a metal plate such as aluminum, a ceramic plate, a silicon wafer or the like may be used in addition to glass. Further, as application conditions to be used, the application speed is 1 to 500 mm / s, more preferably 10 to 300 mm / s, the slit gap of the slit nozzle 20 is 50 to 1000 μm, more preferably 80 to 200 μm, and the application thickness is wet. 0.2 to 100 μm, more preferably 1 to 20 μm.

  The present invention will be specifically described below with reference to examples.

  In a non-alkali glass substrate having a thickness of 250 mm (width direction) × 550 mm (application direction) and a thickness of 0.7 mm, a surface area of 210 mm (width direction) × 250 mm (application direction) is spaced apart by 30 mm in the application direction. An organic EL pattern substrate in which 2101 thick polyimide films each having a thickness of 20 μm and a length of 250 mm in the longitudinal direction of the substrate as a bank were arranged at a pitch of 100 μm was prepared.

  Each surface region is in the center of the substrate in the width direction and is 10 mm inside from the end of the substrate in the coating direction. That is, a region of 20 mm on both sides in the substrate width direction (Y direction), 10 mm on both sides in the substrate application direction and 30 mm in the center was a non-product region without a striped polyimide film. Furthermore, between the polyimide films as the banks, an ITO transparent electrode was formed as an anode on the glass substrate with a thickness of 0.1 μm.

  A hole injecting and transporting layer having a thickness after drying of 0.1 μm was formed on the surface area by intermittent coating. The hole injecting and transporting layer is composed mainly of a mixture of polyethylene dioxythiophene and polystyrene sulfonic acid. The solid content concentration is 1% and the viscosity is 5 mPas. It was necessary to apply by.

  As a coating device, a slit coater 1 shown in FIG. 1 was used. The slit nozzle 20 had a slit 28 with a Y-direction length of 210 mm and a slit 28 with a gap (length in the X-direction) of 0.1 mm, and was capable of forming a coating film with a width of 210 mm. The supply valve 42 and the suction valve 44 are ball valves that do not change in capacity due to opening / closing switching, and the suck back valve 120 is a commercial product having a structure shown in FIG. 2 that can be adjusted with a suck back amount Qs of 1 μl. .

  As the intermittent application method, the method shown in FIG. 3 was used as it was. At this time, the coating speed VC was 100 mm / s, the clearance CL was 80 μm, and the supply volume speed VP of the syringe pump 50 was 210 μl / s. Further, the suck back valve 120 was adjusted so that the suck back amount Qs was 2 μl. On the other hand, the closing time ta (= t3−t2 = t8−t7) was adjusted to 19 ms so that the volume Qe of the excess coating solution was 4 μl.

  The time related to coating is t0 = 0, t1 = 0.5s, t2 = 1.981s, t3 = 2.0s, t4 = 4.5s, t5 = 4.6s, t6 = 4.7s, t7 = It was 4.781s, t8 = 4.8s, t9 = 7.3s, t10 = 7.4s, t11 = 7.5s, t12 = 8.3s.

  The substrate applied intermittently under the above conditions was vacuum dried to reach 65 Pa in 30 seconds for 60 seconds, and further dried for 10 minutes on a 120 ° C. hot plate.

  When the film thickness was measured after drying, in both of the two coating films, the area that was not 0.1 μm at 3 mm from the start of coating and 0.1 μm at the end of coating was 4 mm. In a range of 250 mm excluding 4 mm from the start and end of coating, that is, in a range where a polyimide film bank was formed, the film thickness unevenness was ± 5% or less, which was very good.

  Thereafter, R, G, and B light emitting materials were applied in a stripe shape of 50 nm on the hole injection / transport layer between the banks formed in the above steps. RGB light emitting materials are all polyphenylene vinylene polymers, R light emitting materials have a solid content concentration of 1% and a viscosity of 2 mPas, G light emitting materials have a solid content concentration of 0.5% and a viscosity of 1.5 mPas, and B light emitting materials are The viscosity was 5 mPas at a solid content concentration of 1%.

  After applying this stripe shape, vacuum drying that reached 65 Pa in 30 seconds was performed for 60 seconds, and then further dried on a hot plate at 120 ° C. for 12 minutes.

  And the negative electrode was vapor-deposited so that the RGB light-emitting material and the bank which were apply | coated last may be covered, and the organic EL element was created. When this organic EL element was further processed in a subsequent process and formed on a display device, RGB colors were displayed uniformly over the entire surface of the substrate, and both the two surfaces were satisfactory in quality.

  The present invention relates to various display members that form a plurality of planar and striped coating films on a surface of a substrate such as a color filter for a color liquid crystal display, an organic EL, and a plasma display intermittently and stably with high accuracy. It can be used for manufacturing.

DESCRIPTION OF SYMBOLS 1 Slit coater 2 Base 4 Guide rail 6 Mounting base 8 Upper surface 10 Gate type gantry 12 Stay 14 Bearing 16 Traveling part 20 Slit nozzle (applicator)
22 Front lip 24 Rear lip 26 Manifold 28 Slit 32 Shim 34 Discharge port 36 Discharge port surface 38 Slope 40 Coating liquid supply device 42 Supply valve 44 Suction valve 46 Filter 50 Syringe pump 52 Syringe 54 Piston 56 Main body
60 Supply hose 62 Suction hose 64 Tank 66 Coating liquid 68 Air pressure source 70 Vertical lift unit 72 Motor 74 Guide 76 Ball screw 78 Lift stand 80 Suspension holding stand 90 Wiping unit 92 Wiping head 94 Bracket 96 Slider 98 Drive unit 100 Tray 102 stand 104 Lifting cylinder 110 Control device 112 Operation panel 120 Suck back valve 122 Body A
123 Body B
124 Blocking bar 126 Diaphragm 128 Holding plate 130 Blocking convex surface 132 Blocking concave surface 134 Inlet 136 Outlet 138 Flow path 140 Blocking part 142 Upper end

A Substrate (Coating member)
B bead C1 first coating film (liquid film)
C2 Second coating film (liquid film)
CL clearance amount (clearance (clearance) size (unit of length))
CP substrate A surface (coating surface)
H Height (thickness of substrate A)
Hn height (height from the upper surface 8 to the discharge port surface 36)
Qe Excess coating liquid amount Qs Suckback amount RP Substrate bottom surface S Movement amount t Time ta Closure time VC Coating speed VP Supply capacity speed (of syringe pump 50)
VPE supply capacity speed (of syringe pump 50)

Claims (5)

An applicator provided with a discharge port for discharging the coating liquid onto the coated member at the tip;
A mounting table for holding the coated member;
A coating liquid supply means for intermittently supplying the coating liquid to the applicator;
A moving means for relatively moving at least one of the applicator and the mounting table, and an intermittent coating apparatus that intermittently forms a plurality of coating films on the coated member,
The coating liquid supply means includes
An intermittent constant-capacity pump that supplies the coating liquid at a predetermined flow rate to the applicator;
A storage tank for storing the coating liquid;
An upstream pipe disposed on the upstream side of the intermittent constant capacity pump and communicating the intermittent constant capacity pump and the storage tank;
An upstream open / close valve provided in the upstream pipe;
A downstream pipe disposed on the downstream side of the intermittent constant capacity pump and communicating the intermittent constant capacity pump and the applicator;
Two on-off valves provided in the downstream pipe, a downstream first on-off valve and a downstream second on-off valve;
An intermittent coating apparatus characterized by comprising: The said downstream 1st on-off valve is provided in the upstream from the said downstream 2nd on-off valve, and is a suck back valve which draws back a coating liquid to the upstream from the said applicator when a valve is closed. Intermittent application equipment. The pipe between the applicator provided with the discharge port and the storage tank for storing the coating liquid is provided with an application means having an upstream open / close valve, an intermittent constant capacity pump, a downstream first open / close valve, and a downstream second open / close valve from the upstream side. An intermittent coating method for intermittently forming a plurality of coating films on a member to be coated,
Opening the downstream first opening / closing valve, closing the second downstream opening / closing valve and the upstream opening / closing valve, and applying pressure from the intermittent constant capacity pump to the coating liquid;
An application step of applying by opening the downstream second on-off valve;
An intermittent coating method comprising: a coating end step of closing the downstream first open / close valve while drawing the coating liquid upstream. 4. The intermittent coating method according to claim 3, wherein in the coating ending step, the upstream open / close valve is further opened, and the coating liquid is delivered from the intermittent constant capacity pump toward the storage tank. A display member is manufactured using the intermittent application method according to claim 3 or 4, wherein the display member is manufactured.