TW201446524A - 用於形成嵌入式奈米結構之層疊轉印膜 - Google Patents

用於形成嵌入式奈米結構之層疊轉印膜 Download PDF

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Publication number
TW201446524A
TW201446524A TW103106594A TW103106594A TW201446524A TW 201446524 A TW201446524 A TW 201446524A TW 103106594 A TW103106594 A TW 103106594A TW 103106594 A TW103106594 A TW 103106594A TW 201446524 A TW201446524 A TW 201446524A
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Taiwan
Prior art keywords
layer
sacrificial
transfer film
template layer
thermally stable
Prior art date
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TW103106594A
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English (en)
Chinese (zh)
Inventor
Michael Benton Free
Martin Benson Wolk
Margaret Mary Vogelmartin
Evan Lawrence Schwartz
Mieczyslaw Henryk Mazurek
Robert Fredrick Kamrath
Terry Odell Collier
Olester Benson
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3M Innovative Properties Co
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Publication of TW201446524A publication Critical patent/TW201446524A/zh

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    • B44C1/16—Processes, not specifically provided for elsewhere, for producing decorative surface effects for applying transfer pictures or the like
    • B44C1/165—Processes, not specifically provided for elsewhere, for producing decorative surface effects for applying transfer pictures or the like for decalcomanias; sheet material therefor
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TW103106594A 2013-02-27 2014-02-26 用於形成嵌入式奈米結構之層疊轉印膜 TW201446524A (zh)

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US20140242343A1 (en) 2014-08-28
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CN105899359B (zh) 2018-03-09
KR20150123251A (ko) 2015-11-03

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