TW201434725A - Substrate transfer tray and film formation device - Google Patents

Substrate transfer tray and film formation device Download PDF

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Publication number
TW201434725A
TW201434725A TW102142841A TW102142841A TW201434725A TW 201434725 A TW201434725 A TW 201434725A TW 102142841 A TW102142841 A TW 102142841A TW 102142841 A TW102142841 A TW 102142841A TW 201434725 A TW201434725 A TW 201434725A
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Taiwan
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substrate
substrate transfer
transfer tray
vacuum chamber
thickness direction
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TW102142841A
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Chinese (zh)
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Makoto Maehara
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Sumitomo Heavy Industries
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/6734Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders specially adapted for supporting large square shaped substrates

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

The present invention provides a substrate transfer tray and a film formation device, which can simplify the structure used for substrate transfer and enhance the film formation efficiency. The substrate transfer tray (20) comprises a frame body (21) and a support part (22) configured on a top side of the frame body (21). The support part (22) is provided with a guide rail part (31) that is contacted with a driving roller (63) utilized for providing the driving force for transfer. Besides, even though particles generated by film peeling at the driving roller (63) or a portion contacted with the driving roller (63), a lower wall part (32) extended in the thickness direction can receive the particles. Thus, with a simple structure of the invention provided for contacting the guide rail part (31) of the support part (22) with the driving roller (63), the transfer of substrate (101) can be performed and scattered particles can be prohibited.

Description

基板傳送托盤及成膜裝置 Substrate transfer tray and film forming device

本發明係有關一種成膜裝置用基板傳送托盤及成膜裝置。 The present invention relates to a substrate transfer tray and a film forming apparatus for a film forming apparatus.

以往,作為在成膜裝置的真空腔室內傳送基板時所使用之基板傳送托盤,已知有如專利文獻1所示者。該基板傳送托盤的傳送採用齒條/小齒輪方式。亦即,在真空腔室的上側設置有具有小齒輪的驅動部,在基板傳送托盤的上端側設置有以與驅動部的小齒輪嚙合之方式齒排列成直線狀之齒條。藉由該種構成,以基板傳送托盤保持基板,並使驅動部的小齒輪旋轉,藉此該基板傳送托盤與齒條一同向傳送方向移動。藉此,在成膜裝置的真空腔室內,基板以保持於基板傳送托盤之狀態被傳送。 Conventionally, a substrate transfer tray used for transporting a substrate in a vacuum chamber of a film forming apparatus is known as disclosed in Patent Document 1. The substrate transfer tray is conveyed in a rack/pinion manner. That is, a drive portion having a pinion gear is provided on the upper side of the vacuum chamber, and a rack in which the teeth are linearly arranged to mesh with the pinion gear of the drive portion is provided on the upper end side of the substrate transfer tray. According to this configuration, the substrate holding tray holds the substrate, and the pinion of the driving portion is rotated, whereby the substrate transfer tray moves together with the rack in the conveying direction. Thereby, the substrate is transferred while being held in the substrate transfer tray in the vacuum chamber of the film forming apparatus.

(先前技術文獻) (previous technical literature) (專利文獻) (Patent Literature)

專利文獻1:日本特開平1-268870號公報 Patent Document 1: Japanese Patent Laid-Open No. 1-268870

然而,如上所述作為基板傳送托盤的傳送方法,當採用齒條/小齒輪方式時,存在成膜裝置傳送部的結構和基板傳送托盤的結構變得複雜之問題。並且,從一真空腔室向相鄰的真空腔室傳送基板傳送托盤時,有時會進行如下控制(追趕控制),亦即從一真空腔室被傳送之基板傳送托盤能夠追上在相鄰的真空腔室內被傳送之基板傳送托盤。採用齒條/小齒輪方式時,存在如下問題,亦即因齒條的齒與小齒輪的齒嚙合之關係,在基板傳送托盤靠近一真空腔室的驅動部和另一真空腔室的驅動部的狀態下,無法在各真空腔室的驅動部之間設定傳送速度之差,難以應對追趕控制。當難以應對追趕控制時,在進行成膜之部份,有時存在基板傳送托盤彼此的間隔變大之情況,會影響成膜效率。根據以上,可實現簡化基板傳送的結構,並且提高成膜效率。 However, as the transfer method of the substrate transfer tray as described above, when the rack/pinion type is employed, there is a problem that the structure of the film forming apparatus transfer portion and the structure of the substrate transfer tray become complicated. Further, when the substrate transfer tray is transported from a vacuum chamber to an adjacent vacuum chamber, the following control (catch control) is sometimes performed, that is, the substrate transfer tray transported from a vacuum chamber can be caught up adjacent The substrate transfer tray is conveyed in the vacuum chamber. When the rack/pinion gear method is adopted, there is a problem that the driving portion of the substrate transfer tray close to one vacuum chamber and the driving portion of the other vacuum chamber are caused by the teeth of the rack and the teeth of the pinion. In the state of this, it is impossible to set the difference in the conveying speed between the driving portions of the respective vacuum chambers, and it is difficult to cope with the catch-up control. When it is difficult to cope with the catch-up control, there is a case where the interval between the substrate transfer trays becomes large in the portion where the film formation is performed, and the film formation efficiency is affected. According to the above, the structure for simplifying the substrate transfer can be realized, and the film formation efficiency can be improved.

本發明係為了解決該種問題而提出者,其目的為提供一種能夠簡化用於基板傳送之結構,並且能夠提高成膜效率之基板傳送托盤以及成膜裝置。 The present invention has been made to solve such a problem, and an object thereof is to provide a substrate transfer tray and a film forming apparatus which can simplify a structure for substrate transfer and can improve film formation efficiency.

本發明之基板傳送托盤係一種向與基板的厚度方向交叉之傳送方向傳送基板時,能夠保持基板的成膜裝置用基板傳送托盤,其具備:框體,能夠安裝基板;以及支撐部,設於框體的一端側,且傳送時支撐框體,支撐部具 有:第1部份,連接於框體的一端側,且至少向框體的厚度方向延伸;以及第2部份,與賦予用於傳送之驅動力之驅動輥接觸。 The substrate transfer tray of the present invention is a substrate transfer tray for a film forming apparatus capable of holding a substrate when the substrate is transported in a transport direction intersecting the thickness direction of the substrate, and includes a housing capable of mounting the substrate, and a support portion provided on the substrate One end side of the frame, and supports the frame when being conveyed, and the support portion has The first portion is connected to one end side of the frame and extends at least in the thickness direction of the frame; and the second portion is in contact with a driving roller that imparts a driving force for transmission.

本發明之基板傳送托盤具備設置於框體的一端側之支撐部,該支撐部具有與賦予用於傳送之驅動力之驅動輥接觸之第2部份。藉此,能夠安裝基板的框體經由具有第2部份之支撐部,由驅動輥賦予驅動力,並能夠與基板一同向傳送方向移動。並且,支撐部具有與框體連接之第1部份,該第1部份向框體的厚度方向延伸。因此,即使在驅動輥或與該驅動輥接觸之部份產生由膜剝落等產生之粒子,向厚度方向延伸之第1部份亦能夠接收該粒子。如此,雖然只是使支撐部的第2部份與驅動輥接觸之簡化結構,但亦能夠進行基板傳送且抑制粒子的飛散。並且,並非係如齒條/小齒輪方式那樣使齒條側的齒與小齒輪側的齒嚙合而賦予驅動力者,而是藉由使用驅動輥,即使在一真空腔室的驅動部與另一真空腔室的驅動部之間存在傳送速度之差,亦能夠進行傳送,因此可以應對追趕控制。藉此,能夠有效率地傳送基板,並能夠提高成膜效率。根據以上,能夠簡化用於基板傳送之結構,並且能夠提高成膜效率。 The substrate transfer tray of the present invention includes a support portion provided on one end side of the housing, and the support portion has a second portion in contact with a drive roller that imparts a driving force for transport. Thereby, the frame which can mount the board|substrate is provided with the drive-force by the drive roller via the support part which has a 2nd part, and can move to the conveyance direction with the board|substrate. Further, the support portion has a first portion connected to the frame, and the first portion extends in the thickness direction of the frame. Therefore, even if particles generated by peeling of the film or the like are generated in the driving roller or the portion in contact with the driving roller, the first portion extending in the thickness direction can receive the particles. In this manner, the simplified structure of the second portion of the support portion in contact with the driving roller is achieved, but the substrate can be transported and the scattering of particles can be suppressed. Further, in the case of the rack/pinion type, the teeth on the rack side are meshed with the teeth on the pinion side to give the driving force, but by using the driving roller, even in the driving portion of one vacuum chamber and the other Since there is a difference in the conveying speed between the driving portions of a vacuum chamber, and it is also possible to transmit, it is possible to cope with the catch-up control. Thereby, the substrate can be efficiently transported, and the film formation efficiency can be improved. According to the above, the structure for substrate transfer can be simplified, and the film formation efficiency can be improved.

本發明之基板傳送托盤中,傳送方向上之第2部份的端部可以具有隨著朝向傳送方向寬度變窄之形狀。第2部份與賦予用於傳送之驅動力之驅動輥接觸,但驅動輥為了支撐第2部份有時在厚度方向上的兩端側具有凸緣部。在 該種情況下,第2部份的端部具有隨著朝向傳送方向寬度變窄之形狀,藉此第2部份的端部不干擾驅動輥的凸緣部就能夠順利地與驅動輥接觸。 In the substrate transfer tray of the present invention, the end portion of the second portion in the transport direction may have a shape that becomes narrower in width toward the transport direction. The second portion is in contact with a driving roller that imparts a driving force for conveyance, but the driving roller has a flange portion on both end sides in the thickness direction in order to support the second portion. in In this case, the end portion of the second portion has a shape that narrows in width toward the conveying direction, whereby the end portion of the second portion can smoothly contact the driving roller without interfering with the flange portion of the driving roller.

本發明之基板傳送托盤中,在框體的另一端側的傳送方向上之端部可以具有隨著朝向傳送方向寬度變窄之形狀。在框體的另一端側,有時設置有支撐該框體的另一端側的兩個側面之側面支撐部。如該種情況時,藉由在框體的傳送方向上之端部具有隨著朝向傳送方向寬度變窄之形狀,藉此框體的傳送方向上之端部不干擾側面支撐部就能夠順利地向傳送方向移動。 In the substrate transfer tray of the present invention, the end portion in the conveying direction of the other end side of the frame body may have a shape which becomes narrower in width toward the conveying direction. On the other end side of the casing, a side support portion that supports both side faces of the other end side of the frame may be provided. In this case, since the end portion in the conveying direction of the casing has a shape which becomes narrower in width toward the conveying direction, the end portion in the conveying direction of the casing can be smoothly prevented from interfering with the side supporting portion. Move in the direction of the transfer.

本發明之基板傳送托盤中,從傳送方向觀察時,第1部份形成為字形狀,在該字形狀之內表面可安裝第2部份。藉此,藉由第1部份的字形狀,能夠包圍與第2部份接觸之驅動輥。因此,能夠可靠地接收在驅動輥附近產生之粒子並抑制飛散。 In the substrate transfer tray of the present invention, when viewed from the transport direction, the first portion is formed as Word shape, in the The second part can be mounted on the inner surface of the word shape. By virtue of the first part The shape of the word can surround the driving roller that is in contact with the second portion. Therefore, it is possible to reliably receive the particles generated in the vicinity of the driving roller and suppress the scattering.

本發明之成膜裝置具備:真空腔室,能夠容納上述基板傳送托盤及被基板傳送托盤保持之狀態的基板;傳送部,將基板以直立的狀態或從直立的狀態傾斜的狀態進行傳送,其中,傳送部具有配置於真空腔室的上側且向基板傳送托盤賦予驅動力之驅動輥,驅動輥在配置於被支撐部的第1部份及第2部份包圍之空間內時與第2部份接觸,並向基板傳送托盤賦予驅動力。 The film forming apparatus of the present invention includes a vacuum chamber that can accommodate the substrate transfer tray and a substrate held by the substrate transfer tray, and a transfer unit that transports the substrate in an upright state or in an upright state. The transport unit has a drive roller that is disposed on the upper side of the vacuum chamber and that supplies a driving force to the substrate transfer tray. The drive roller is disposed in the space surrounded by the first portion and the second portion of the supported portion, and the second portion. The parts are contacted and the driving force is given to the substrate transfer tray.

本發明之成膜裝置中,由於配置在真空腔室的上側之驅動輥配置於被基板傳送托盤的支撐部的第1部份及第2 部份包圍之空間內,從而能夠與第2部份接觸而向基板傳送托盤賦予驅動力。藉此,在僅為將驅動輥配置在被支撐部的第1部份及第2部份包圍之空間內的簡化結構中,能夠發揮如上所述的基板傳送托盤的效果。 In the film forming apparatus of the present invention, the driving roller disposed on the upper side of the vacuum chamber is disposed in the first portion and the second portion of the support portion of the substrate transfer tray. In the partially enclosed space, the second portion can be brought into contact with each other to impart a driving force to the substrate transfer tray. Thereby, the effect of the substrate transfer tray as described above can be exhibited in a simplified configuration in which only the drive roller is disposed in the space surrounded by the first portion and the second portion of the supported portion.

在本發明之成膜裝置中,藉由驅動輥支撐及驅動基板傳送托盤時,基板傳送托盤的下端部可從真空腔室的底側的結構物在上下方向上分離。藉此,藉由設為用真空腔室上側的驅動輥懸掛支撐基板傳送托盤的重量的結構,從而能夠藉由熱量等消除基板傳送托盤向上下方向延伸時對傳送帶來的影響。另外,在基板傳送托盤的下側支撐重量時,由於基板傳送托盤的重心位於支撐部上側的關係,必須設為基板傳送托盤本身的強度高的結構,但藉由只在上側進行支撐,重心位於支撐部的更下側,能夠簡化基板傳送托盤的結構。 In the film forming apparatus of the present invention, when the substrate transfer tray is supported and driven by the driving roller, the lower end portion of the substrate transfer tray can be separated from the structure on the bottom side of the vacuum chamber in the up and down direction. By this means, by arranging the structure for supporting the weight of the substrate transfer tray by the drive roller on the upper side of the vacuum chamber, it is possible to eliminate the influence on the conveyance when the substrate transfer tray is extended in the vertical direction by heat or the like. Further, when the weight is supported on the lower side of the substrate transfer tray, since the center of gravity of the substrate transfer tray is located on the upper side of the support portion, it is necessary to have a structure in which the strength of the substrate transfer tray itself is high, but the center of gravity is located by being supported only on the upper side. The lower side of the support portion simplifies the structure of the substrate transfer tray.

本發明之成膜裝置中,傳送部可具備支撐基板傳送托盤的下端部側之兩個側面之側面支撐部。藉此,雖然在與支撐有基板傳送托盤之上端側相反的一側的下端部側存在厚度方向的搖晃變大的情況,但能夠藉由側面支撐部抑制該搖晃。 In the film forming apparatus of the present invention, the conveying portion may be provided with a side surface supporting portion that supports the two side faces on the lower end side of the substrate conveying tray. As a result, there is a case where the thickness in the thickness direction is increased on the lower end side of the side opposite to the upper end side on which the substrate transfer tray is supported, but the side support portion can suppress the shaking.

根據本發明,能夠簡化用於基板傳送之結構,並且能夠提高成膜的效率。 According to the present invention, the structure for substrate transfer can be simplified, and the efficiency of film formation can be improved.

10‧‧‧傳送部 10‧‧‧Transportation Department

20‧‧‧基板傳送托盤 20‧‧‧Substrate transfer tray

21‧‧‧框體 21‧‧‧ frame

22‧‧‧支撐部 22‧‧‧Support

30‧‧‧主體部(第1部份) 30‧‧‧ Main Department (Part 1)

31‧‧‧導軌部(第2部份) 31‧‧‧ Rails (Part 2)

61‧‧‧驅動輥 61‧‧‧ drive roller

81‧‧‧側面支撐部 81‧‧‧Side support

100‧‧‧成膜裝置 100‧‧‧ film forming device

150‧‧‧真空腔室 150‧‧‧vacuum chamber

第1圖係表示本發明的實施形態之成膜裝置的基本構成之俯視圖。 Fig. 1 is a plan view showing a basic configuration of a film forming apparatus according to an embodiment of the present invention.

第2圖係從蒸鍍源側觀察本發明的實施形態之基板傳送托盤之圖。 Fig. 2 is a view of the substrate transfer tray according to the embodiment of the present invention as seen from the vapor deposition source side.

第3圖係沿第2圖中所示之III-III線之剖視圖。 Fig. 3 is a cross-sectional view taken along line III-III shown in Fig. 2.

第4圖係表示第3圖所示之上部結構周邊的構成之放大圖。 Fig. 4 is an enlarged view showing the configuration of the periphery of the upper structure shown in Fig. 3.

第5圖係表示第3圖所示之下部結構周邊的構成之放大圖。 Fig. 5 is an enlarged view showing the configuration of the periphery of the lower portion structure shown in Fig. 3.

第6圖係從上方觀察驅動系統的基本構成之圖。 Fig. 6 is a view showing the basic configuration of the drive system from above.

第7圖係表示傳送方向上之導軌部的端部及下端部側之框體的端部的形狀之概略圖。 Fig. 7 is a schematic view showing the shape of the end portion of the end portion of the rail portion and the end portion of the lower end portion in the conveying direction.

第8圖係表示在變形例之基板傳送托盤的上部結構周邊的基本構成之放大圖。 Fig. 8 is an enlarged view showing a basic configuration of a periphery of an upper structure of a substrate transfer tray according to a modification.

以下參閱附圖對基於本發明之基板傳送托盤及成膜裝置的一實施形態進行詳細說明。另外,在附圖說明中對相同的要件賦予相同的符號,並省略重複說明。 Hereinafter, an embodiment of a substrate transfer tray and a film forming apparatus according to the present invention will be described in detail with reference to the accompanying drawings. In the description of the drawings, the same reference numerals are given to the same elements, and the repeated description is omitted.

第1圖係表示本實施形態之成膜裝置100的基本構成之俯視圖。第1圖所示之成膜裝置100係用於對作為成膜對象物之基板101(例如玻璃基板)實施成膜等處理者。成膜裝置100為根據例如RPD法(反應性電漿蒸鍍法) 進行成膜之裝置。成膜裝置100具備生成電漿之電漿槍,使用所生成之電漿,對成膜材料(蒸鍍源140)進行離子化,並藉由使成膜材料的粒子附著於基板101的表面來進行成膜。為了便於說明,在第1圖中示出XYZ座標系。Y軸方向為傳送基板101之方向。X軸方向為基板101與蒸鍍源140相對向之方向。Z軸方向為與X軸方向和Y軸方向正交之方向。本實施形態之成膜裝置100係為了使基板101的厚度方向呈水平方向,在使基板101直立或從直立的狀態傾斜的狀態下,將基板101配置於真空腔室內進行傳送之所謂的立式成膜裝置,且Z軸方向相當於上下方向。 Fig. 1 is a plan view showing a basic configuration of a film forming apparatus 100 of the present embodiment. The film forming apparatus 100 shown in Fig. 1 is for performing processing such as film formation on a substrate 101 (for example, a glass substrate) as a film formation target. The film forming apparatus 100 is based on, for example, the RPD method (reactive plasma evaporation method) A device for film formation. The film forming apparatus 100 includes a plasma gun that generates plasma, and ionizes the film forming material (vapor deposition source 140) using the generated plasma, and adheres particles of the film forming material to the surface of the substrate 101. Film formation is carried out. For convenience of explanation, the XYZ coordinate system is shown in Fig. 1. The Y-axis direction is the direction in which the substrate 101 is transferred. The X-axis direction is a direction in which the substrate 101 and the vapor deposition source 140 face each other. The Z-axis direction is a direction orthogonal to the X-axis direction and the Y-axis direction. In the film forming apparatus 100 of the present embodiment, in order to make the thickness direction of the substrate 101 in the horizontal direction, the substrate 101 is placed in the vacuum chamber and the so-called vertical type is placed in a state where the substrate 101 is erected or tilted from the upright state. The film forming apparatus has a Z-axis direction corresponding to the vertical direction.

成膜裝置100具備裝載鎖定腔室121、緩衝腔室122、成膜腔室123、緩衝腔室124及裝載鎖定腔室125。該些腔室121~125以如上順序排列配置。所有腔室121~125構成為真空腔室150,在腔室121~125的出入口設置有腔室門135。成膜裝置100可為排列有複數個緩衝腔室122、124、成膜腔室123之構成。並且,亦可為由一系列的腔室構成的成膜裝置。 The film forming apparatus 100 includes a load lock chamber 121, a buffer chamber 122, a film forming chamber 123, a buffer chamber 124, and a load lock chamber 125. The chambers 121 to 125 are arranged in the above order. All of the chambers 121 to 125 are configured as a vacuum chamber 150, and chamber doors 135 are provided at the entrances and exits of the chambers 121 to 125. The film forming apparatus 100 may be configured by arranging a plurality of buffer chambers 122 and 124 and a film forming chamber 123. Further, it may be a film forming apparatus composed of a series of chambers.

各腔室121~125中連接有用於將內部設為適當的壓力之真空泵(未圖示)。並且,各腔室121~125中設置有用於監視腔室內的壓力之真空儀(未圖示)。各腔室121~125中連通有連接於真空泵的真空排氣管,該真空排氣管上設置有真空儀。 A vacuum pump (not shown) for setting the inside to an appropriate pressure is connected to each of the chambers 121 to 125. Further, a vacuum gauge (not shown) for monitoring the pressure in the chamber is provided in each of the chambers 121 to 125. A vacuum exhaust pipe connected to the vacuum pump is connected to each of the chambers 121 to 125, and a vacuum gauge is disposed on the vacuum exhaust pipe.

成膜裝置100中設置有用於傳送保持基板101之基板 傳送托盤20之傳送部10。傳送部10具有在腔室121~125內以使基板101及基板傳送托盤20直立的狀態進行傳送之功能。另外,針對傳送部10及基板傳送托盤20的詳細構成進行後述。 A substrate for transferring the holding substrate 101 is disposed in the film forming apparatus 100 The conveying portion 10 of the conveying tray 20 is conveyed. The transfer unit 10 has a function of transporting the substrate 101 and the substrate transfer tray 20 in the chambers 121 to 125 in an upright state. The detailed configuration of the transport unit 10 and the substrate transport tray 20 will be described later.

在成膜裝置100中,一真空腔室150的出口側經由腔室門135與在基板101的傳送方向D1上鄰接之另一真空腔室150的入口側連接。一真空腔室150藉由開放腔室門135而與鄰接之另一真空腔室150連通。並且,基板101及基板傳送托盤20通過所開放的腔室門135,藉此從一真空腔室150向鄰接之另一真空腔室150移動。基板101及基板傳送托盤20的移動結束後,關閉腔室門135。 In the film forming apparatus 100, the outlet side of a vacuum chamber 150 is connected to the inlet side of another vacuum chamber 150 adjacent to the transfer direction D1 of the substrate 101 via the chamber door 135. A vacuum chamber 150 communicates with another adjacent vacuum chamber 150 by opening the chamber door 135. Further, the substrate 101 and the substrate transfer tray 20 pass through the opened chamber door 135, thereby moving from a vacuum chamber 150 to the adjacent vacuum chamber 150. After the movement of the substrate 101 and the substrate transfer tray 20 is completed, the chamber door 135 is closed.

接著,參閱第2圖~第6圖對本實施形態之基板傳送托盤20及成膜裝置100的傳送部10進行說明。基板傳送托盤20使基板101以直立的狀態進行傳送時能夠保持基板101。所謂使基板101直立的狀態係指基板101的厚度方向D2呈水平方向之狀態(該情況下,厚度方向D2與X軸方向一致)。此時,基板101的成膜面101e沿上下方向配置。另外,可以將基板101以從直立的狀態傾斜的狀態保持基板101之構成。基板101的厚度方向D2可以為大致水平的方向,亦可以為比水平方向傾斜。另外,基板101的傳送方向D1(與Y軸方向一致)係與基板的厚度方向D2正交且水平的方向。另外,將厚度方向D2上的基板101的成膜面101e所面向的一側作為“前側”,基板101的背面101f所面向的一側作為“後側”。 Next, the substrate transfer tray 20 of the present embodiment and the transfer unit 10 of the film forming apparatus 100 will be described with reference to FIGS. 2 to 6 . The substrate transfer tray 20 can hold the substrate 101 while the substrate 101 is being transported in an upright state. The state in which the substrate 101 is erected means that the thickness direction D2 of the substrate 101 is in the horizontal direction (in this case, the thickness direction D2 coincides with the X-axis direction). At this time, the film formation surface 101e of the substrate 101 is arranged in the vertical direction. In addition, the substrate 101 can be held in a state of being inclined from an upright state. The thickness direction D2 of the substrate 101 may be a substantially horizontal direction or may be inclined to the horizontal direction. Further, the transport direction D1 of the substrate 101 (which coincides with the Y-axis direction) is a direction orthogonal to the thickness direction D2 of the substrate and horizontal. In addition, the side on which the film formation surface 101e of the substrate 101 in the thickness direction D2 faces is referred to as "front side", and the side on which the back surface 101f of the substrate 101 faces is referred to as "back side".

(真空腔室) (vacuum chamber)

如第2圖及第3圖所示,真空腔室150呈能夠容納基板傳送托盤20的箱型,且具備上壁部51、下壁部52、前壁部(未圖示)、後壁部54、入側端壁部55及出側端壁部56。上壁部51及下壁部52為上下方向相對向配置的壁體。入側端壁部55及出側端壁部56為沿傳送方向D1相對向配置的壁體。入側端壁部55為基板101及基板傳送托盤20被搬入到真空腔室150內的一側亦即入口側的壁體。出側端壁部56為基板101及基板傳送托盤20向真空腔室150外搬出的一側亦即出口側的壁體。前壁部及後壁部54為沿基板101的厚度方向D2相對向配置的壁體。在入側端壁部55形成有用於使基板101及基板傳送托盤20通過之孔部57。在出側端壁部56形成有用於使基板101及基板傳送托盤20通過之孔部58。 As shown in FIGS. 2 and 3, the vacuum chamber 150 has a box shape capable of accommodating the substrate transfer tray 20, and includes an upper wall portion 51, a lower wall portion 52, a front wall portion (not shown), and a rear wall portion. 54. The entrance side end wall portion 55 and the exit side end wall portion 56. The upper wall portion 51 and the lower wall portion 52 are wall bodies that are arranged to face each other in the vertical direction. The entrance side end wall portion 55 and the exit side end wall portion 56 are wall bodies that are disposed to face each other in the transport direction D1. The entrance side end wall portion 55 is a wall body on the side of the inlet side, that is, the substrate 101 and the substrate transfer tray 20 are carried into the vacuum chamber 150. The exit side end wall portion 56 is a wall body on the outlet side which is the side on which the substrate 101 and the substrate transfer tray 20 are carried out to the outside of the vacuum chamber 150. The front wall portion and the rear wall portion 54 are wall bodies that are disposed to face each other in the thickness direction D2 of the substrate 101. A hole portion 57 through which the substrate 101 and the substrate transfer tray 20 pass is formed in the inlet side end wall portion 55. A hole portion 58 through which the substrate 101 and the substrate transfer tray 20 pass is formed in the outlet side end wall portion 56.

(基板傳送托盤) (substrate transfer tray)

如第2圖及第3圖所示,基板傳送托盤20具備能夠安裝基板101的框體21及設置於框體21的上端側之支撐部22。本實施形態的基板傳送托盤20構成為保持1個基板101。基板傳送托盤20亦可構成為能夠保持複數個(例如2個)基板101。基板傳送托盤20既可以保持基板101的邊緣部的全周,亦可以局部保持基板101的邊緣部。作為基板傳送托盤20的材質可採用例如不銹鋼。 As shown in FIGS. 2 and 3 , the substrate transfer tray 20 includes a housing 21 to which the substrate 101 can be mounted, and a support portion 22 provided on the upper end side of the housing 21 . The substrate transfer tray 20 of the present embodiment is configured to hold one substrate 101. The substrate transfer tray 20 may be configured to hold a plurality of (for example, two) substrates 101. The substrate transfer tray 20 can hold the entire circumference of the edge portion of the substrate 101 or partially maintain the edge portion of the substrate 101. As the material of the substrate transfer tray 20, for example, stainless steel can be used.

框體21為從基板101的厚度方向D2觀察時具有比該基板101大的外周,並且具有比基板101小的開口部23之矩形環狀構件。框體21具備:上端部保持部21A,保持基板101的上端部101a;下端部保持部21B,保持基板101的下端部101b;及側端部保持部21C、21D,保持基板101的側端部101c、101d。 The housing 21 is a rectangular annular member having an outer circumference larger than the substrate 101 when viewed in the thickness direction D2 of the substrate 101 and having an opening 23 smaller than the substrate 101. The housing 21 includes an upper end holding portion 21A that holds the upper end portion 101a of the substrate 101, a lower end portion holding portion 21B that holds the lower end portion 101b of the substrate 101, and side end portion holding portions 21C and 21D that hold the side end portion of the substrate 101. 101c, 101d.

上端部保持部21A具備從基板101的成膜面101e的相反的一側支撐該基板101的上端部101a的一部份之支撐板24A。支撐板24A為在基板101的上端部101a側沿傳送方向D1延伸的板材。支撐板24A的厚度方向與基板101的厚度方向D2一致,且至少比基板101厚。支撐板24A在下端側的邊緣部支撐基板101的上端部101a。支撐板24A上設置有從成膜面101e側按壓基板101的上端部101a之基板按壓構件26(參閱第4圖)。藉此,基板101的上端部101a從厚度方向D2的兩側被支撐板24A及基板按壓構件26夾住而進行支撐。 The upper end holding portion 21A includes a support plate 24A that supports a part of the upper end portion 101a of the substrate 101 from the opposite side of the film formation surface 101e of the substrate 101. The support plate 24A is a plate material that extends in the conveying direction D1 on the upper end portion 101a side of the substrate 101. The thickness direction of the support plate 24A coincides with the thickness direction D2 of the substrate 101, and is at least thicker than the substrate 101. The support plate 24A supports the upper end portion 101a of the substrate 101 at the edge portion on the lower end side. The support plate 24A is provided with a substrate pressing member 26 that presses the upper end portion 101a of the substrate 101 from the side of the film formation surface 101e (see Fig. 4). Thereby, the upper end portion 101a of the substrate 101 is supported by the support plate 24A and the substrate pressing member 26 from both sides in the thickness direction D2.

下端部保持部21B具備從基板101的成膜面101e的相反的一側支撐該基板101的下端部101b的一部份之支撐板24B。支撐板24B為在基板101的下端部101b側沿傳送方向D1延伸的板材。支撐板24B的厚度方向與基板101的厚度方向D2一致,且至少比基板101厚。支撐板24B在上端側的邊緣部支撐基板101的下端部101b。支撐板24B上設置有從成膜面101e側按壓基板101的下端部101b之基板按壓構件26(參閱第5圖)。藉此,基板 101的下端部101b從厚度方向D2的兩側被支撐板24B及基板按壓構件26夾住而進行支撐。 The lower end holding portion 21B includes a support plate 24B that supports a part of the lower end portion 101b of the substrate 101 from the opposite side of the film formation surface 101e of the substrate 101. The support plate 24B is a plate material that extends in the conveying direction D1 on the lower end portion 101b side of the substrate 101. The thickness direction of the support plate 24B coincides with the thickness direction D2 of the substrate 101, and is at least thicker than the substrate 101. The support plate 24B supports the lower end portion 101b of the substrate 101 at the edge portion on the upper end side. The support plate 24B is provided with a substrate pressing member 26 that presses the lower end portion 101b of the substrate 101 from the side of the film formation surface 101e (see Fig. 5). Thereby, the substrate The lower end portion 101b of the 101 is supported by the support plate 24B and the substrate pressing member 26 from both sides in the thickness direction D2.

下端部保持部21B的支撐板24B的下端部24Ba上設置有框架構件27B。框架構件27B以支撐支撐板24B的下端部24Ba的整個區域的方式向傳送方向D1延伸。框架構件27B呈向厚度方向D2延伸之截面長方形的形狀,在上表面27Ba的厚度方向D2上的中間位置固定於支撐板24B的下端部24Ba(參閱第5圖)。 A frame member 27B is provided on the lower end portion 24Ba of the support plate 24B of the lower end holding portion 21B. The frame member 27B extends in the conveying direction D1 in such a manner as to support the entire area of the lower end portion 24Ba of the support plate 24B. The frame member 27B has a rectangular cross section extending in the thickness direction D2, and is fixed to the lower end portion 24Ba of the support plate 24B at an intermediate position in the thickness direction D2 of the upper surface 27Ba (see Fig. 5).

側端部保持部21C、21D分別具備從基板101的成膜面101e的相反的一側支撐該基板101的側端部101c、101d的一部份之支撐板24C、24D。支撐板24C、24D為在基板101的側端部101c、101d側沿上下方向延伸之板材。支撐板24C、24D的厚度方向與基板101的厚度方向D2一致,且至少比基板101厚。支撐板24C、24D在開口部23側的邊緣部支撐基板101的側端部101c、101d。支撐板24C、24D上設置有從成膜面101e側按壓基板101的側端部101c、101d之基板按壓構件(雖未圖示,但具有與基板按壓構件26相同的構成)。藉此,基板101的側端部101c、101d從厚度方向D2的兩側被支撐板24C、24D及基板按壓構件夾住而進行支撐。 Each of the side end holding portions 21C and 21D includes a support plate 24C and 24D that support a part of the side end portions 101c and 101d of the substrate 101 from the opposite side of the film formation surface 101e of the substrate 101. The support plates 24C and 24D are plate members extending in the vertical direction on the side end portions 101c and 101d of the substrate 101. The thickness direction of the support plates 24C, 24D coincides with the thickness direction D2 of the substrate 101, and is at least thicker than the substrate 101. The support plates 24C and 24D support the side end portions 101c and 101d of the substrate 101 at the edge portions on the side of the opening portion 23. The support plates 24C and 24D are provided with a substrate pressing member (not shown, but having the same configuration as the substrate pressing member 26) that presses the side end portions 101c and 101d of the substrate 101 from the film formation surface 101e side. Thereby, the side end portions 101c and 101d of the substrate 101 are supported by the support plates 24C and 24D and the substrate pressing member from both sides in the thickness direction D2.

側端部保持部21C、21D的支撐板24C、24D外側的側端部24Ca、24Da上設置有框架構件27C、27D。框架構件27C、27D以支撐支撐板24C、24D的側端部24Ca、24Da的整個區域的方式沿上下方向延伸。框架構件 27C、27D呈向厚度方向D2延伸之截面長方形的形狀,且在內側面27Ca、27Da的厚度方向D2上的中間位置固定於支撐板24C、24D的側端部24Ca、24Da。 Frame members 27C and 27D are provided on the side end portions 24Ca and 24Da on the outer sides of the support plates 24C and 24D of the side end holding portions 21C and 21D. The frame members 27C, 27D extend in the up and down direction so as to support the entire area of the side end portions 24Ca, 24Da of the support plates 24C, 24D. Frame member 27C and 27D have a rectangular cross section extending in the thickness direction D2, and intermediate positions in the thickness direction D2 of the inner side surfaces 27Ca and 27Da are fixed to the side end portions 24Ca and 24Da of the support plates 24C and 24D.

另外,上述支撐板24A、24B、24C、24D既可以由在1個板材上設置開口部23而一體構成,亦可以使每個板材相互連結。 Further, the support plates 24A, 24B, 24C, and 24D may be integrally formed by providing the opening portions 23 in one plate member, or each of the plate members may be coupled to each other.

接著,參閱第2圖及第4圖對基板傳送托盤20的支撐部22的構成進行說明。如第2圖及第4圖所示,支撐部22設置於框體21的上端側,係用於在傳送基板101時支撐框體21者。支撐部22具備連結於框體21之主體部(第1部份)30及與傳送部10的驅動輥63(詳細結構進行後述)接觸之導軌部(第2部份)31。 Next, the configuration of the support portion 22 of the substrate transfer tray 20 will be described with reference to FIGS. 2 and 4 . As shown in FIGS. 2 and 4, the support portion 22 is provided on the upper end side of the casing 21 and is used to support the casing 21 when the substrate 101 is transported. The support portion 22 includes a main body portion (first portion) 30 that is coupled to the frame body 21 and a rail portion (second portion) 31 that is in contact with the drive roller 63 of the transport portion 10 (described in detail later).

如第4圖所示,主體部30為從傳送方向D1觀察時形成為截面字形狀,且在框體21的上端側向傳送方向D1延伸之構件。具體而言,主體部30具備:下壁部32,固定於框體21的上側保持部21A的支撐板24A的上端部24Aa並且向厚度方向D2延伸;前壁部33,從下壁部32的前側的端部32a向上方延伸;及上壁部34,從前壁部33的上端部33a向後側沿厚度方向D2延伸。下壁部32、前壁部33及上壁部34遍及從框體21的傳送方向D1上的一個端部至另一個端部的整個區域而向傳送方向D1延伸(參閱第2圖)。 As shown in FIG. 4, the main body portion 30 is formed as a cross section when viewed from the conveying direction D1. A member having a shape of a word and extending in the conveying direction D1 on the upper end side of the casing 21. Specifically, the main body portion 30 includes a lower wall portion 32 that is fixed to the upper end portion 24Aa of the support plate 24A of the upper holding portion 21A of the frame body 21 and extends in the thickness direction D2, and a front wall portion 33 that is from the lower wall portion 32. The front end portion 32a extends upward; and the upper wall portion 34 extends from the upper end portion 33a of the front wall portion 33 toward the rear side in the thickness direction D2. The lower wall portion 32, the front wall portion 33, and the upper wall portion 34 extend in the conveying direction D1 over the entire region from one end portion to the other end portion in the conveying direction D1 of the casing 21 (see Fig. 2).

如第4圖所示,下壁部32在下表面32b的厚度方向D2上的大致中間位置被固定於支撐板24A的上端部24Aa。 在本實施形態中,下壁部32的後側之端部32c與框架構件27C(及框架構件27D)的端部27Cb在厚度方向D2上配置於相同位置,但亦可以不是相同位置。並且,下壁部32的前側端部32a(亦即前壁部33的前表面33b)比框架部27C(及框架部27D)的端部27Cc在厚度方向D2上更靠前側配置,但亦可以根據驅動輥63的大小配置於任何地方。 As shown in Fig. 4, the lower wall portion 32 is fixed to the upper end portion 24Aa of the support plate 24A at a substantially intermediate position in the thickness direction D2 of the lower surface 32b. In the present embodiment, the rear end portion 32c of the lower wall portion 32 and the end portion 27Cb of the frame member 27C (and the frame member 27D) are disposed at the same position in the thickness direction D2, but they may not be the same position. Further, the front end portion 32a of the lower wall portion 32 (that is, the front surface 33b of the front wall portion 33) is disposed on the front side of the end portion 27Cc of the frame portion 27C (and the frame portion 27D) in the thickness direction D2, but It can be placed anywhere depending on the size of the drive roller 63.

上壁部34設置為與下壁部32在上下方向上相對向,其下表面34a安裝有導軌部31。上壁部34與導軌部31的固定方法並無特別限定,但在本實施形態中由螺栓固定。上壁部34的後側之端部34b比下壁部32的端部32c更靠前側配置,但能夠充份確保與導軌部31的固定餘量,並且只要不干擾安裝構件73,配置在任何地方皆可。 The upper wall portion 34 is provided to face the lower wall portion 32 in the up-and-down direction, and the lower surface 34a is attached with the rail portion 31. The method of fixing the upper wall portion 34 and the rail portion 31 is not particularly limited, but in the present embodiment, it is fixed by a bolt. The rear end portion 34b of the upper wall portion 34 is disposed on the front side of the end portion 32c of the lower wall portion 32. However, the remaining amount of the rail portion 31 can be sufficiently secured, and the mounting member 73 can be disposed without being disturbed. Available anywhere.

導軌部31呈向厚度方向D2延伸之截面矩形的形狀,且沿主體部30的上壁部34的下表面34a向傳送方向D1延伸。導軌部31遍及主體部30的上壁部34的傳送方向D1上之一個端部至另一個端部的整個區域延伸。導軌部31的上表面31a與上壁部34的下表面34a接觸,導軌部31的下表面31b與驅動輥63的外周面63a接觸。 The rail portion 31 has a rectangular cross section extending in the thickness direction D2 and extends in the conveying direction D1 along the lower surface 34a of the upper wall portion 34 of the main body portion 30. The rail portion 31 extends over one end portion of the upper wall portion 34 of the main body portion 30 in the conveying direction D1 to the entire region of the other end portion. The upper surface 31a of the rail portion 31 is in contact with the lower surface 34a of the upper wall portion 34, and the lower surface 31b of the rail portion 31 is in contact with the outer peripheral surface 63a of the drive roller 63.

(傳送部) (transfer department)

如第2圖及第3圖所示,傳送部10具備設置於真空腔室150的上端側區域的上部結構60,及設於真空腔室 150的下端側區域的下部結構61。上部結構60具有以懸掛的態樣支撐保持基板101的基板傳送托盤20,並且向基板傳送托盤20賦予驅動力之功能。下部結構61具有導引基板傳送托盤20的下端部側的移動,並且限制向厚度方向D2移動之功能。 As shown in FIGS. 2 and 3, the transfer unit 10 includes an upper structure 60 provided in an upper end side region of the vacuum chamber 150, and is provided in a vacuum chamber. A lower structure 61 of the lower end side region of 150. The upper structure 60 has a function of supporting the substrate transfer tray 20 holding the substrate 101 in a suspended state, and imparting a driving force to the substrate transfer tray 20. The lower structure 61 has a function of guiding the movement of the lower end side of the substrate transfer tray 20 and restricting the movement in the thickness direction D2.

參閱第4圖對傳送部10的上部結構60的詳細結構進行說明。如第4圖所示,上部結構60具備:驅動輥63,向基板傳送托盤20賦予驅動力;軸部64,以能夠旋轉的方式支撐驅動輥63;第1軸承部66,在真空腔室150的後壁部54的貫穿部份以能夠旋轉的方式支撐軸部64;第2軸承部67,在真空腔室150內以能夠旋轉的方式支撐軸部64;及驅動系統68,經由軸部64使驅動輥63旋轉驅動。另外,在上部結構60中,驅動輥63、軸部64、第1軸承部66及第2軸承部67構成一組滾輪單元70。滾輪單元70彼此隔開規定間隔沿傳送方向D1設置有複數個(參閱第2圖)。各滾輪單元70在上下方向上配置於相同位置。 The detailed structure of the upper structure 60 of the transport unit 10 will be described with reference to Fig. 4 . As shown in FIG. 4, the upper structure 60 includes a driving roller 63 that applies a driving force to the substrate transfer tray 20, a shaft portion 64 that rotatably supports the driving roller 63, and a first bearing portion 66 that is in the vacuum chamber 150. The through portion of the rear wall portion 54 rotatably supports the shaft portion 64; the second bearing portion 67 rotatably supports the shaft portion 64 in the vacuum chamber 150; and the drive system 68 via the shaft portion 64 The drive roller 63 is rotationally driven. Further, in the upper structure 60, the drive roller 63, the shaft portion 64, the first bearing portion 66, and the second bearing portion 67 constitute a set of roller units 70. The roller units 70 are provided in plural in the transport direction D1 at predetermined intervals (see FIG. 2). Each of the roller units 70 is disposed at the same position in the vertical direction.

驅動輥63配置於真空腔室150內的上側,係能夠以向厚度方向D2平行延伸之軸線CL1為中心旋轉的圓筒形狀的構件。驅動輥63配置為從真空腔室150的上壁部51向下方分離,並且從後壁部54向厚度方向D2分離。驅動輥63具有與基板傳送托盤20的支撐部22的導軌部31接觸之外周面63a。驅動輥63的外周面63a與導軌部31的下表面31b接觸,並且經由導軌部31對基板傳送托盤20 賦予向傳送方向D1的驅動力。驅動輥63的軸線方向的兩個端部上形成有限制導軌部31在厚度方向D2移動之凸緣部71。凸緣部71向外周側擴展以使具有大於外周面63a的外徑。各凸緣部71分別與導軌部31的厚度方向D2上的兩端部相對向。在凸緣部71彼此之間的厚度方向D2的之尺寸大於導軌部31的厚度方向D2上的尺寸。 The driving roller 63 is disposed on the upper side in the vacuum chamber 150, and is a cylindrical member that is rotatable about an axis CL1 that extends in parallel in the thickness direction D2. The driving roller 63 is disposed to be separated downward from the upper wall portion 51 of the vacuum chamber 150, and is separated from the rear wall portion 54 in the thickness direction D2. The driving roller 63 has a peripheral surface 63a that is in contact with the rail portion 31 of the support portion 22 of the substrate transfer tray 20. The outer peripheral surface 63a of the driving roller 63 is in contact with the lower surface 31b of the rail portion 31, and the substrate transport tray 20 is transported via the rail portion 31. The driving force in the conveying direction D1 is given. At both end portions of the drive roller 63 in the axial direction, a flange portion 71 that restricts the movement of the rail portion 31 in the thickness direction D2 is formed. The flange portion 71 is expanded to the outer peripheral side so as to have an outer diameter larger than the outer peripheral surface 63a. Each of the flange portions 71 faces each end portion of the rail portion 31 in the thickness direction D2. The dimension in the thickness direction D2 between the flange portions 71 is larger than the dimension in the thickness direction D2 of the rail portion 31.

在基板傳送托盤20支撐於傳送部10的驅動輥63之狀態,亦即驅動輥63的外周面63a與導軌部31的下表面31b接觸之狀態下,在驅動輥63的下端與下壁部32的上表面32d之間設置間隙。在驅動輥63的前端與前壁部33的後面33c之間設置間隙。 In a state where the substrate transfer tray 20 is supported by the drive roller 63 of the transport unit 10, that is, in a state where the outer peripheral surface 63a of the drive roller 63 is in contact with the lower surface 31b of the rail portion 31, the lower end and the lower wall portion 32 of the drive roller 63 are provided. A gap is provided between the upper surfaces 32d. A gap is provided between the front end of the driving roller 63 and the rear surface 33c of the front wall portion 33.

另外,如第7圖(a)所示,導軌部31的端部31c側呈船底形狀以不使端部31c卡到驅動輥63的凸緣部71。亦即,導軌部31的端部31c具有隨著朝向傳送方向D1的前端側寬度(厚度方向D2的大小)變窄之形狀。導軌部31的端部31c側上形成有向傳送方向傾斜之傾斜面31d、31d。 Further, as shown in Fig. 7(a), the end portion 31c side of the rail portion 31 has a ship bottom shape so that the end portion 31c is not caught by the flange portion 71 of the driving roller 63. In other words, the end portion 31c of the rail portion 31 has a shape that is narrowed toward the front end side width (the size in the thickness direction D2) toward the transport direction D1. On the side of the end portion 31c of the rail portion 31, inclined surfaces 31d and 31d which are inclined in the conveying direction are formed.

如第4圖所示,軸部64為以軸線CL1為中心向厚度方向D2延伸的圓形的棒狀構件。軸部64貫穿真空腔室150的後壁部54。軸部64在真空腔室150的內側的端部與驅動輥63固定,在外側的端部與驅動系統68連接。軸部64藉由來自驅動系統68的驅動力與驅動輥63一同旋轉。 As shown in Fig. 4, the shaft portion 64 is a circular rod-shaped member that extends in the thickness direction D2 around the axis CL1. The shaft portion 64 penetrates the rear wall portion 54 of the vacuum chamber 150. The shaft portion 64 is fixed to the driving roller 63 at the inner end portion of the vacuum chamber 150, and is connected to the drive system 68 at the outer end portion. The shaft portion 64 is rotated together with the driving roller 63 by the driving force from the drive system 68.

第1軸承部66設置於真空腔室150的後壁部54上的 軸部64所貫穿之部份。使用磁性流體軸承等作為第1軸承部66。藉此,第1軸承部66以能夠旋轉的方式支撐軸部64,並且能夠確保後壁部54上的軸部64所貫穿之部份的氣密性。 The first bearing portion 66 is disposed on the rear wall portion 54 of the vacuum chamber 150 The portion through which the shaft portion 64 extends. A magnetic fluid bearing or the like is used as the first bearing portion 66. Thereby, the first bearing portion 66 rotatably supports the shaft portion 64, and the airtightness of the portion through which the shaft portion 64 of the rear wall portion 54 penetrates can be secured.

第2軸承部67以能夠旋轉的方式支撐軸部64的前端側。第2軸承部67具備以能夠旋轉的方式支撐軸部64的軸承72,及用於安裝軸承72之安裝構件73。安裝構件73從真空腔室150的上壁部51向下方延伸,並在下端側安裝軸承72。安裝構件73的上端部與固定在上壁部51的板狀構件74連接。軸承72及安裝構件73比驅動輥63更靠後側配置。藉此,真空腔室150的上壁部51能夠藉由支撐基板傳送托盤20而經由第2軸承部支撐施加於驅動輥63及軸部64之荷載。 The second bearing portion 67 rotatably supports the distal end side of the shaft portion 64. The second bearing portion 67 includes a bearing 72 that rotatably supports the shaft portion 64 and a mounting member 73 for mounting the bearing 72. The mounting member 73 extends downward from the upper wall portion 51 of the vacuum chamber 150, and a bearing 72 is attached to the lower end side. The upper end portion of the mounting member 73 is connected to the plate member 74 fixed to the upper wall portion 51. The bearing 72 and the mounting member 73 are disposed on the rear side of the drive roller 63. Thereby, the upper wall portion 51 of the vacuum chamber 150 can support the load applied to the driving roller 63 and the shaft portion 64 via the second bearing portion by supporting the substrate transfer tray 20.

驅動系統68係向各滾輪單元70的軸部64及驅動輥63賦予旋轉驅動力者。驅動系統68配置於真空腔室150的外側。驅動系統68如果係能夠使各滾輪單元70的軸部64及驅動輥63旋轉驅動者,則構成無特別限定,但是將由一馬達產生之驅動力等速分配給各軸部64及驅動輥63的結構為佳。 The drive system 68 applies a rotational driving force to the shaft portion 64 of each roller unit 70 and the drive roller 63. The drive system 68 is disposed outside of the vacuum chamber 150. The drive system 68 is not particularly limited as long as the shaft portion 64 and the drive roller 63 of each roller unit 70 are rotated. However, the driving force generated by a motor is equally distributed to the shaft portion 64 and the drive roller 63. The structure is better.

具體如第6圖所示,馬達76使用同步帶77與同步帶輪78使各滾輪單元70的軸部64及驅動輥63同時等速旋轉。軸部64的真空腔室150的外側端部上安裝有同步帶輪78,與傳送方向D1鄰接之軸部64的同步帶輪78彼此被同步帶77連結。另外,軸部64的端部上沿厚度方向 D2設置有兩段同步帶輪78,用於與在傳送方向D1鄰接之另一滾輪單元70連結之同步帶77和用於與在傳送方向D1的相反的一側鄰接之另一滾輪單元70連結之同步帶77在厚度方向D2上相異。並且,在鄰接之滾輪單元70彼此之間亦可設置調整同步帶77的張力的張緊裝置(未圖示)。 Specifically, as shown in Fig. 6, the motor 76 uses the timing belt 77 and the timing pulley 78 to simultaneously rotate the shaft portion 64 and the driving roller 63 of each roller unit 70 at the same speed. A timing pulley 78 is attached to the outer end portion of the vacuum chamber 150 of the shaft portion 64, and the timing pulleys 78 of the shaft portion 64 adjacent to the conveying direction D1 are coupled to each other by the timing belt 77. In addition, the end portion of the shaft portion 64 is in the thickness direction D2 is provided with two timing pulleys 78 for coupling the timing belt 77 coupled to the other roller unit 70 adjacent in the conveying direction D1 and for connecting another roller unit 70 adjacent to the opposite side in the conveying direction D1. The timing belts 77 are different in the thickness direction D2. Further, a tensioning device (not shown) that adjusts the tension of the timing belt 77 may be provided between the adjacent roller units 70.

在傳送方向D1上的最下游側的滾輪單元70由馬達76賦予驅動力(其中,亦可以是最上游側的滾輪單元70、中間位置之滾輪單元70)。馬達76配置於滾輪單元70的下側(上側或旁側亦可),並經由未圖示的支架固定於真空腔室150的壁部。馬達76的軸部的前端上設置有同步帶輪,該馬達76的同步帶輪經由同步帶79與滾輪單元70的軸部64的同步帶輪78連結。其中,滾輪單元70的軸部64與馬達76的軸部在軸線方向上連結,馬達76可以向滾輪單元70的軸部64直接賦予驅動力。 The roller unit 70 on the most downstream side in the conveying direction D1 is given a driving force by the motor 76 (the roller unit 70 on the most upstream side and the roller unit 70 in the intermediate position). The motor 76 is disposed on the lower side (upper side or side) of the roller unit 70, and is fixed to the wall portion of the vacuum chamber 150 via a bracket (not shown). A timing pulley is provided at the front end of the shaft portion of the motor 76, and the timing pulley of the motor 76 is coupled to the timing pulley 78 of the shaft portion 64 of the roller unit 70 via the timing belt 79. The shaft portion 64 of the roller unit 70 is coupled to the shaft portion of the motor 76 in the axial direction, and the motor 76 can directly apply a driving force to the shaft portion 64 of the roller unit 70.

另外,驅動系統68中的馬達76如果係能夠向滾輪單元70的軸部64賦予旋轉力者,則以任何態樣安裝皆可。例如,馬達76的軸部沿上下方向延伸,經由傘形齒輪向滾輪單元70的軸部64賦予驅動力亦可。 Further, if the motor 76 in the drive system 68 can impart a rotational force to the shaft portion 64 of the roller unit 70, it can be mounted in any aspect. For example, the shaft portion of the motor 76 extends in the vertical direction, and the driving force may be applied to the shaft portion 64 of the roller unit 70 via the bevel gear.

參閱第5圖對傳送部10的下部結構61的詳細結構進行說明。第5圖中示出之下部結構61具備:側面支撐部81,支撐基板傳送托盤20的下端部側的與厚度方向D2相對向之兩個側面;以及底座部82,用於固定側面支撐部81。另外,在下部結構61中,側面支撐部81及底座部 82該組相互隔開規定間隔沿傳送方向D1設置有複數個(參閱第2圖)。 The detailed structure of the lower structure 61 of the transport unit 10 will be described with reference to Fig. 5. In the fifth embodiment, the lower portion structure 61 includes a side surface supporting portion 81 that supports both side surfaces of the lower end portion side of the substrate transfer tray 20 facing the thickness direction D2, and a base portion 82 for fixing the side surface supporting portion 81. . In addition, in the lower structure 61, the side support portion 81 and the base portion The group is provided in plural in the transport direction D1 at a predetermined interval (see Fig. 2).

底座部82為從真空腔室150的下壁部52向上方延伸,並向厚度方向D2延伸之長方體形狀的構件。底座部82配置於被驅動輥63支撐之狀態的基板傳送托盤20的下方。在底座部82的厚度方向D2上的一個端部82b比基板傳送托盤20的前側的側面(在此為框架構件27B的側面27Bb)更向前側延伸,另一端部82c比基板傳送托盤20的後側的側面(在此為框架構件27B的側面27Bc)更向後側延伸。在底座部82的上表面82a設置側面支撐部81。 The base portion 82 is a rectangular parallelepiped member that extends upward from the lower wall portion 52 of the vacuum chamber 150 and extends in the thickness direction D2. The base portion 82 is disposed below the substrate transfer tray 20 in a state of being supported by the drive roller 63. One end portion 82b in the thickness direction D2 of the base portion 82 extends further forward than the side surface of the front side of the substrate transfer tray 20 (here, the side surface 27Bb of the frame member 27B), and the other end portion 82c is rearward than the substrate transfer tray 20. The side of the side (here, the side 27Bc of the frame member 27B) extends further toward the rear side. A side support portion 81 is provided on the upper surface 82a of the base portion 82.

側面支撐部81具有在厚度方向D2上限制基板傳送托盤20的下端側區域的移動,並且導引向基板傳送托盤20的下端側區域的傳送方向D1移動之功能。側面支撐部81具備:一對惰輪軸承83A、83B,在厚度方向D2上設置間隔而配置;及一對軸部84A、84B,分別支撐惰輪軸承83A、83B。惰輪軸承83A、83B的外周面83Aa、83Ba側的部份能夠以沿上下方向鉛直延伸的軸線CL2、CL3為中心旋轉。軸部84A、84B為分別以中心軸線CL2、CL3為中心沿上下方向延伸之圓柱形的構件。軸部84A、84B的上端部嵌入到惰輪軸承83A、83B的內周面83Ab、83Bb側的部份。軸部84A、84B的下端部固定於底座部82的上表面82a上。 The side support portion 81 has a function of restricting the movement of the lower end side region of the substrate transfer tray 20 in the thickness direction D2 and guiding the movement to the transport direction D1 of the lower end side region of the substrate transfer tray 20. The side support portion 81 includes a pair of idler bearings 83A and 83B which are disposed at intervals in the thickness direction D2, and a pair of shaft portions 84A and 84B that support the idler bearings 83A and 83B, respectively. The portions on the outer circumferential surfaces 83Aa and 83Ba of the idler gear bearings 83A and 83B are rotatable about the axes CL2 and CL3 that extend vertically in the vertical direction. The shaft portions 84A and 84B are cylindrical members that extend in the vertical direction around the center axes CL2 and CL3, respectively. The upper end portions of the shaft portions 84A and 84B are fitted to the inner circumferential surfaces 83Ab and 83Bb of the idler gear bearings 83A and 83B. The lower end portions of the shaft portions 84A, 84B are fixed to the upper surface 82a of the base portion 82.

惰輪軸承83A支撐基板傳送托盤20的前側的側面 (在此為框架構件27B的側面27Bb),惰輪軸承83B支撐基板傳送托盤20的後側的側面(在此為框架構件27B的側面27Bc)。惰輪軸承83A、83B與被驅動輥63支撐之狀態的基板傳送托盤20的下端側的框架構件27B在上下方向上配置於相同位置。並且,惰輪軸承83A、83B在厚度方向D2上以夾住框架構件27B的方式配置。惰輪軸承83A的外周面83Aa與框架構件27B的側面27Bb隔著極小的間隙在厚度方向D2上相對向。惰輪軸承83B的外周面83Ba與框架構件27B的側面27Bc隔著極小的間隙在厚度方向D2上相對向。 The idler bearing 83A supports the side of the front side of the substrate transfer tray 20 (here, the side surface 27Bb of the frame member 27B), the idler bearing 83B supports the side surface of the rear side of the substrate transfer tray 20 (here, the side surface 27Bc of the frame member 27B). The frame members 27B on the lower end side of the substrate transfer tray 20 in a state in which the idler gear bearings 83A and 83B are supported by the drive roller 63 are disposed at the same position in the vertical direction. Further, the idler bearing 83A, 83B is disposed so as to sandwich the frame member 27B in the thickness direction D2. The outer circumferential surface 83Aa of the idler bearing 83A and the side surface 27Bb of the frame member 27B face each other in the thickness direction D2 with a very small gap therebetween. The outer peripheral surface 83Ba of the idler bearing 83B and the side surface 27Bc of the frame member 27B face each other in the thickness direction D2 with a very small gap therebetween.

由驅動輥63支撐基板傳送托盤20並賦予驅動力時,基板傳送托盤20的下端部(本實施形態中為框架構件27B的下表面27Bd)從真空腔室150底側的結構物(在此為底座部82,但即使是設有從真空腔室底面側向上方突出之結構物之情況,亦從該些結構物在上下方向上分離)在上下方向上分離。亦即,基板傳送托盤20的重量在上端側僅由上部結構60支撐,且在下端側不由設置於真空腔室150之構件支撐而呈飄浮於空中的狀態。本實施形態中,相當於基板傳送托盤20的下端部的框架構件27B的下表面27Bd從設置於真空腔室150的底側的底座部82的上表面82a分離。另外,惰輪軸承83A、83B能夠在厚度方向D2上支撐基板傳送托盤20(限制厚度方向D2的移動),但無法支撐基板傳送托盤20的重量。 When the substrate transfer tray 20 is supported by the drive roller 63 and the driving force is applied, the lower end portion of the substrate transfer tray 20 (the lower surface 27Bd of the frame member 27B in the present embodiment) is a structure from the bottom side of the vacuum chamber 150 (here, The base portion 82 is separated from the vertical direction even when the structure protrudes upward from the bottom surface side of the vacuum chamber, and is separated from the structure in the vertical direction. That is, the weight of the substrate transfer tray 20 is supported only by the upper structure 60 on the upper end side, and is floating in the air at the lower end side without being supported by the member provided in the vacuum chamber 150. In the present embodiment, the lower surface 27Bd of the frame member 27B corresponding to the lower end portion of the substrate transfer tray 20 is separated from the upper surface 82a of the base portion 82 provided on the bottom side of the vacuum chamber 150. Further, the idler gear bearings 83A and 83B can support the substrate transfer tray 20 in the thickness direction D2 (the movement in the thickness direction D2 is restricted), but the weight of the substrate transfer tray 20 cannot be supported.

另外,如第7圖(b)所示,框架構件27B的端部 27Be側呈船底形狀以順利地進入惰輪軸承83A、83B彼此之間。亦即,框架構件27B的端部27Be具有隨著朝向傳送方向D1的前端側寬度(厚度方向D2的大小)變窄的形狀。框架構件27B的端部27Be側形成有向傳送方向D1傾斜的傾斜面27Bf、27Bf。 Further, as shown in Fig. 7(b), the end of the frame member 27B The 27Be side is in the shape of a ship bottom to smoothly enter the idler bearings 83A, 83B with each other. That is, the end portion 27Be of the frame member 27B has a shape that narrows toward the front end side width (the size of the thickness direction D2) toward the conveying direction D1. The end portion 27Be side of the frame member 27B is formed with inclined surfaces 27Bf and 27Bf which are inclined in the conveying direction D1.

接著,對本實施形態之成膜裝置100及基板傳送托盤20的作用、效果進行說明。 Next, the action and effect of the film forming apparatus 100 and the substrate transfer tray 20 of the present embodiment will be described.

以往,作為成膜裝置中傳送基板之機構,採用齒條/小齒輪方式。亦即,在真空腔室的上側設置具有小齒輪之驅動部,在基板傳送托盤的上端側設置形成為以與驅動部的小齒輪嚙合之方式將齒排列成直線狀之齒條。根據該構成以基板傳送托盤保持基板,使驅動部的小齒輪旋轉,藉此該基板傳送托盤與齒條一同向傳送方向移動。藉此,在成膜裝置的真空腔室內基板以保持於基板傳送托盤的狀態被傳送。然而,當採用該種齒條/小齒輪方式時,存在基板傳送托盤本身的結構亦變得複雜,並且向基板傳送托盤賦予驅動力之驅動部側的結構亦變得複雜,整體的結構複雜且規模變大的問題。 Conventionally, as a mechanism for transporting a substrate in a film forming apparatus, a rack/pinion method has been employed. That is, a drive portion having a pinion gear is provided on the upper side of the vacuum chamber, and a rack that is arranged in a linear shape so as to mesh with the pinion gear of the drive portion is provided on the upper end side of the substrate transfer tray. According to this configuration, the substrate holding tray holds the substrate, and the pinion of the driving portion is rotated, whereby the substrate transfer tray moves together with the rack in the conveying direction. Thereby, the substrate in the vacuum chamber of the film forming apparatus is transferred while being held by the substrate transfer tray. However, when such a rack/pinion type is employed, the structure of the substrate transfer tray itself is complicated, and the structure on the side of the drive unit that imparts a driving force to the substrate transfer tray becomes complicated, and the overall structure is complicated. The problem of getting bigger.

另一方面,本實施形態之基板傳送托盤20具備設置於框體21的上端側之支撐部22,該支撐部22具有與賦予用於傳送之驅動力之驅動輥63接觸之導軌部31。藉此,能夠安裝基板101的框體21經由具有導軌部31之支撐部22由驅動輥63被賦予驅動力,並能夠在傳送方向D1上與基板101一同移動。並且,支撐部22具有與框體 21連接之主體部30,在該主體部30內與框體21連接之下壁部32(其上表面32d)向框體21的厚度方向D2延伸。因此,即使在驅動輥63或與該驅動輥63接觸之部份產生由膜剝落等產生之粒子,向厚度方向延伸之下壁部32亦能夠接收該粒子。此時,在下壁部32的面內至少向厚度方向D2延伸之上表面32d與朝向驅動系統68側之端部32c作為粒子接收面而發揮作用。藉由在粒子接收面接收粒子,能夠抑制將粒子附著於基板101的成膜面,藉由接觸能夠抑制成膜面的質量低下。如此,雖然只是使支撐部22的導軌部31與驅動輥63接觸之簡化結構,但亦能夠傳送基板101,並且抑制粒子的飛散。 On the other hand, the substrate transfer tray 20 of the present embodiment includes a support portion 22 provided on the upper end side of the housing 21, and the support portion 22 has a rail portion 31 that is in contact with a drive roller 63 that imparts a driving force for transport. Thereby, the frame 21 to which the substrate 101 can be mounted is given a driving force by the driving roller 63 via the support portion 22 having the rail portion 31, and can move together with the substrate 101 in the conveying direction D1. And, the support portion 22 has a frame The main body portion 30 connected to the main body portion 30 is connected to the frame body 21 in the main body portion 30, and the wall portion 32 (the upper surface 32d thereof) extends in the thickness direction D2 of the casing 21. Therefore, even if the particles generated by the film peeling or the like are generated in the driving roller 63 or the portion in contact with the driving roller 63, the wall portion 32 can receive the particles in the thickness direction. At this time, the upper surface 32d extending in the thickness direction D2 and the end portion 32c facing the drive system 68 side function as a particle receiving surface in the surface of the lower wall portion 32. By receiving the particles on the particle receiving surface, it is possible to suppress adhesion of the particles to the film formation surface of the substrate 101, and it is possible to suppress the deterioration of the quality of the film formation surface by the contact. In this manner, although the guide portion 31 of the support portion 22 is simply in contact with the drive roller 63, the substrate 101 can be transported and the scattering of particles can be suppressed.

並且,在如第1圖所示之成膜裝置100中,從一真空腔室150向相鄰的真空腔室150傳送基板傳送托盤20時,有時會進行如下控制(追趕控制),亦即從一真空腔室150被傳送之基板傳送托盤20能夠追上在相鄰的真空腔室150內被傳送之基板傳送托盤20。具體來說,在成膜腔室123中,為了得到均勻的膜厚需要以恆定速度(為了確保堆積時間,膜在成膜腔室123中的速度比在其他真空腔室150中的速度慢)傳送基板傳送托盤20。另一方面,從緩衝腔室122向成膜腔室123傳送基板傳送托盤20時,以使已傳送至成膜腔室123內並以恆定速度被傳送之基板傳送托盤20之間的間隔不會變大的方式(以追上先行之基板傳送托盤20),使基板傳送托盤20加速而從緩衝腔室122傳送至成膜腔室123內為佳。 Further, in the film forming apparatus 100 shown in Fig. 1, when the substrate transfer tray 20 is transported from the vacuum chamber 150 to the adjacent vacuum chamber 150, the following control (catch control) may be performed, that is, The substrate transfer tray 20 transported from a vacuum chamber 150 can catch up with the substrate transfer tray 20 that is transported in the adjacent vacuum chamber 150. Specifically, in the film forming chamber 123, in order to obtain a uniform film thickness, it is necessary to have a constant speed (to ensure the deposition time, the speed of the film in the film forming chamber 123 is slower than that in the other vacuum chambers 150) The substrate transfer tray 20 is transported. On the other hand, when the substrate transfer tray 20 is transported from the buffer chamber 122 to the film forming chamber 123, the interval between the substrate transfer trays 20 that have been transferred into the film forming chamber 123 and transported at a constant speed does not occur. The larger mode (to catch up with the preceding substrate transfer tray 20) is preferably such that the substrate transfer tray 20 is accelerated and transferred from the buffer chamber 122 to the film forming chamber 123.

在此,採用以往的齒條/小齒輪方式時,存在由於齒條的齒與小齒輪的齒嚙合之關係,一真空腔室150的驅動部與另一真空腔室150的驅動部之間無法設定傳送速度之差,難以應對追趕控制(例如,因結構變得極為複雜等)之問題。難以應對追趕控制時,在進行成膜之部份,存在基板傳送托盤彼此的間隔變大之情況,並影響成膜的效率。 Here, when the conventional rack/pinion type is employed, there is a relationship between the teeth of the rack and the teeth of the pinion, and the driving portion of one vacuum chamber 150 and the driving portion of the other vacuum chamber 150 cannot be used. Setting the difference in transmission speed makes it difficult to cope with the problem of catch-up control (for example, because the structure becomes extremely complicated). When it is difficult to cope with the catch-up control, there is a case where the interval between the substrate transfer trays becomes large in the portion where the film formation is performed, and the efficiency of film formation is affected.

例如,如第1圖所示,成膜腔室123具有:接收區域EA1,從緩衝腔室122接收基板傳送托盤20;恆定速度區域EA2,在與蒸鍍源140相對向之位置以恆定速度傳送基板傳送托盤20;及交接區域EA3,向緩衝腔室124交接基板傳送托盤20,各區域EA1、EA2、EA3具有分別獨立驅動之驅動系統68。以該種構成進行追趕控制時,在恆定速度區域EA2內,驅動系統68以恆定速度傳送基板傳送托盤20,而另一方面,接收區域EA1及緩衝腔室122的驅動系統68為了快速進入到成膜腔室123內,以使基板傳送托盤20加速的方式運作。然而,採用齒條/小齒輪方式時,在恆定速度區域EA2被傳送之基板傳送托盤20的齒條的齒只要有一部份與接收區域EA1內的小齒輪的齒嚙合時,接收區域EA1亦需要與恆定速度區域EA2的速度配合。藉此,若未等到基板傳送托盤20完全向恆定速度區域EA2側移動,則在接收區域EA1及緩衝腔室122中的驅動系統68就無法使基板傳送托盤20加速。如此,在以往的齒條/小齒輪方式中難以應對追趕控制。 For example, as shown in FIG. 1, the film forming chamber 123 has a receiving area EA1 that receives the substrate transfer tray 20 from the buffer chamber 122, and a constant speed area EA2 that is conveyed at a constant speed at a position opposite to the vapor deposition source 140. The substrate transfer tray 20 and the transfer area EA3 transfer the substrate transfer tray 20 to the buffer chamber 124, and each of the areas EA1, EA2, EA3 has a drive system 68 that is independently driven. When the catch-up control is performed in this configuration, the drive system 68 transports the substrate transfer tray 20 at a constant speed in the constant speed region EA2, and on the other hand, the drive system 68 of the receiving region EA1 and the buffer chamber 122 is quickly entered. The inside of the film chamber 123 operates in such a manner as to accelerate the substrate transfer tray 20. However, in the rack/pinion mode, when the tooth of the rack of the substrate transfer tray 20 conveyed in the constant speed region EA2 has a portion that meshes with the teeth of the pinion gear in the receiving region EA1, the receiving region EA1 also needs Matches the speed of the constant speed zone EA2. Thereby, if the substrate transfer tray 20 is not completely moved toward the constant velocity region EA2 side, the drive system 68 in the receiving region EA1 and the buffer chamber 122 cannot accelerate the substrate transfer tray 20. As described above, it is difficult to cope with the catch-up control in the conventional rack/pinion type.

另一方面,本實施形態之基板傳送托盤20藉由驅動輥63賦予驅動力來傳送。藉此,在恆定速度區域EA2內被傳送之基板傳送托盤20的一部份靠近於接收區域EA1內的驅動輥63之狀態下,即使使接收區域EA1及緩衝腔室122的驅動輥63加速,與以恆定速度被傳送之基板傳送托盤20的一部份接觸之驅動輥63亦只是打滑而進行空轉,不會像齒條/小齒輪方式那樣無法傳送。因此,即使未等到先行之基板傳送托盤20完全向恆定速度區域EA2傳送,亦能夠使後續的基板傳送托盤20從緩衝腔室122向成膜腔室123快速地加速而傳送。如此,在本實施形態中,由於使用驅動輥63,即使在一真空腔室150的驅動系統68與另一真空腔室150的驅動系統68之間存在傳送速度之差,亦能夠進行傳送,因此能夠應對追趕控制。藉此,能夠有效地傳送基板101,且能夠提高成膜效率。綜上所述,能夠簡化用於基板傳送之結構,並且能夠提高成膜的效率。 On the other hand, the substrate transfer tray 20 of the present embodiment is driven by the drive roller 63 to provide a driving force. Thereby, even if a part of the substrate transfer tray 20 conveyed in the constant speed area EA2 is close to the drive roller 63 in the receiving area EA1, even if the receiving area EA1 and the driving roller 63 of the buffer chamber 122 are accelerated, The drive roller 63 that is in contact with a portion of the substrate transfer tray 20 that is transported at a constant speed is also idling by slipping, and cannot be transported as in the rack/pinion method. Therefore, even if the preceding substrate transfer tray 20 is not completely transferred to the constant velocity region EA2, the subsequent substrate transfer tray 20 can be quickly accelerated from the buffer chamber 122 to the film forming chamber 123 to be transported. As described above, in the present embodiment, since the driving roller 63 is used, even if there is a difference in conveying speed between the driving system 68 of the vacuum chamber 150 and the driving system 68 of the other vacuum chamber 150, the transfer can be performed. Ability to respond to catch-up control. Thereby, the substrate 101 can be efficiently transported, and the film formation efficiency can be improved. As described above, the structure for substrate transfer can be simplified, and the efficiency of film formation can be improved.

並且,在成膜裝置100中,配置於真空腔室150的上側的驅動輥63藉由配置於由基板傳送托盤20的支撐部22的下壁部32、前壁部33、上壁部34及導軌部31所包圍之空間內,能夠與導軌部31接觸而向基板傳送托盤20賦予驅動力。如此,能夠以只是將驅動輥63配置於支撐部22內的空間之簡化結構中,發揮如上述的基板傳送托盤20的效果。 Further, in the film forming apparatus 100, the driving roller 63 disposed on the upper side of the vacuum chamber 150 is disposed on the lower wall portion 32, the front wall portion 33, the upper wall portion 34 of the support portion 22 of the substrate transfer tray 20, and The space surrounded by the rail portion 31 can be brought into contact with the rail portion 31 to impart a driving force to the substrate transfer tray 20. In this manner, the effect of the substrate transfer tray 20 as described above can be exhibited in a simplified configuration in which only the drive roller 63 is disposed in the space in the support portion 22.

另外,在本實施形態之基板傳送托盤20中,傳送方 向D1上的導軌部31的端部31c具有隨著朝向傳送方向D1寬度變窄之形狀。藉此,導軌部31的端部31c不干擾驅動輥63的凸緣部71就能夠順利地與驅動輥63接觸。 Further, in the substrate transfer tray 20 of the present embodiment, the transfer side The end portion 31c of the rail portion 31 on the D1 has a shape that becomes narrower in width toward the conveying direction D1. Thereby, the end portion 31c of the rail portion 31 can smoothly contact the driving roller 63 without interfering with the flange portion 71 of the driving roller 63.

本實施形態之基板傳送托盤20中,在框體21的下端側,在傳送方向D1的行進方向上的端部27Be具有隨著朝向傳送方向D1寬度變窄的形狀。藉此,框體21的傳送方向D1上的端部27Be不干擾側面支撐部81就能夠順利地向傳送方向移動。 In the substrate transfer tray 20 of the present embodiment, the end portion 27Be in the traveling direction of the transport direction D1 has a shape that is narrowed in width toward the transport direction D1 on the lower end side of the casing 21. Thereby, the end portion 27Be in the conveying direction D1 of the casing 21 can smoothly move in the conveying direction without interfering with the side supporting portion 81.

本實施形態之基板傳送托盤20中,主體部30從傳送方向D1觀察時形成為字形狀,在該字形狀的內表面(在此為上壁部34的下表面34a)安裝有導軌部31。藉此,由主體部30的字形狀,能夠包圍與導軌部31接觸之驅動輥63。因此,能夠可靠地接收在驅動輥63附近產生之粒子而抑制向基板101的成膜面101e的飛散。此時,主體部30中,至少下壁部32的上表面32d和端部32c、前壁部33的內表面33c、以及上壁部34的下表面34a的一部份作為粒子接收面發揮作用。以該種粒子接收面接收粒子,藉此,能夠藉由粒子附著於基板101的成膜面並藉由接觸,來抑制成膜面的質量低下。 In the substrate transfer tray 20 of the present embodiment, the main body portion 30 is formed as viewed from the transport direction D1. Word shape, in the The rail portion 31 is attached to the inner surface of the font shape (here, the lower surface 34a of the upper wall portion 34). Thereby, by the main body 30 The shape of the word can surround the driving roller 63 that is in contact with the rail portion 31. Therefore, it is possible to reliably receive the particles generated in the vicinity of the driving roller 63 and suppress the scattering to the film formation surface 101e of the substrate 101. At this time, in the main body portion 30, at least the upper surface 32d and the end portion 32c of the lower wall portion 32, the inner surface 33c of the front wall portion 33, and a portion of the lower surface 34a of the upper wall portion 34 function as a particle receiving surface. . By receiving the particles on the particle receiving surface, the particles can be adhered to the film formation surface of the substrate 101 and contacted to suppress the deterioration of the quality of the film formation surface.

本實施形態之成膜裝置100中,藉由驅動輥63支撐基板傳送托盤20並賦予驅動力時,基板傳送托盤20的下端部從真空腔室底側的結構物在上下方向上分離。藉此,由設為將基板傳送托盤20的重量用真空腔室150的上側的驅動輥63懸掛支撐的結構,能夠因熱量等消除基板傳 送托盤20沿上下方向延伸時對傳送的影響。並且,例如在基板傳送托盤20的下側支撐重量時,由於基板傳送托盤20的重心位於比基板傳送托盤20的支撐點更靠上側,所以變得不穩定(容易產生振動的狀態)。另外,如果在下側支撐基板傳送托盤20,則基板傳送托盤20必須承受自身重量(必須承受因自身重量產生之彎曲),因此需要提高強度。然而,在本實施形態中,藉由僅在真空腔室150的上側支撐基板傳送托盤20,從而重心位於比基板傳送托盤20的支撐部22更靠下側,因此能夠穩定地進行支撐。並且,因為無需過度考慮由基板傳送托盤20的自身重量產生之變形,因此無需提高強度,能夠簡化基板傳送托盤20的結構。 In the film forming apparatus 100 of the present embodiment, when the substrate transfer tray 20 is supported by the drive roller 63 and the driving force is applied, the lower end portion of the substrate transfer tray 20 is separated from the structure on the bottom side of the vacuum chamber in the vertical direction. Thereby, the structure in which the weight of the substrate transfer tray 20 is suspended and supported by the upper drive roller 63 of the vacuum chamber 150 can eliminate the substrate transfer by heat or the like. The influence of the conveyance tray 20 on the conveyance when extending in the up and down direction. Further, for example, when the weight is supported on the lower side of the substrate transfer tray 20, since the center of gravity of the substrate transfer tray 20 is located above the support point of the substrate transfer tray 20, it becomes unstable (a state in which vibration is likely to occur). In addition, if the substrate transfer tray 20 is supported on the lower side, the substrate transfer tray 20 must withstand its own weight (must be subjected to bending due to its own weight), and thus it is necessary to increase the strength. However, in the present embodiment, since the substrate transfer tray 20 is supported only on the upper side of the vacuum chamber 150, the center of gravity is located below the support portion 22 of the substrate transfer tray 20, so that the support can be stably performed. Further, since it is not necessary to excessively consider the deformation caused by the weight of the substrate transfer tray 20, it is not necessary to increase the strength, and the structure of the substrate transfer tray 20 can be simplified.

在本實施形態之成膜裝置100中,傳送部10具備支撐基板傳送托盤20的下端部側的兩個側面27Bb、27Bc之側面支撐部81。在支撐基板傳送托盤20之與上端側相反的一側的下端部側,存在厚度方向D2的搖晃變大之情況,但是能夠由側面支撐部81抑制該搖晃。 In the film forming apparatus 100 of the present embodiment, the transport unit 10 includes side surface support portions 81 that support the two side surfaces 27Bb and 27Bc on the lower end side of the substrate transport tray 20. The lower end portion side of the side opposite to the upper end side of the support substrate transfer tray 20 may be shaken in the thickness direction D2, but the side support portion 81 can suppress the shake.

並且,在本實施形態之成膜裝置100中,將驅動輥63設為在真空腔室150的後壁部54側支撐之懸臂結構,將基板傳送托盤20掛於該種驅動輥63上的結構。因此,能夠使有關驅動的結構物(例如,支撐驅動輥63之第2軸承部67和驅動系統68等)比基板傳送托盤20更向後側靠近,亦可不在基板101的成膜面101e的上方設置驅動部和滑動部,由該些結構物能夠抑制由膜剝落產生的粒 子朝向成膜面101e。 In the film forming apparatus 100 of the present embodiment, the drive roller 63 is a cantilever structure supported on the rear wall portion 54 side of the vacuum chamber 150, and the substrate transfer tray 20 is hung on the drive roller 63. . Therefore, the structure to be driven (for example, the second bearing portion 67 that supports the driving roller 63, the drive system 68, and the like) can be closer to the rear side than the substrate transfer tray 20, or can be not above the film formation surface 101e of the substrate 101. Providing a driving portion and a sliding portion, wherein the structures are capable of suppressing particles generated by film peeling The child faces the film formation surface 101e.

本發明係不限定於上述實施形態者。例如,框體的形狀/大小和驅動輥的個數和配置等不過是一個例子,亦可根據基板的大小和形狀,及成膜裝置的大小和類型等進行適當變更。例如,可採用第8圖所示之球狀的滾輪單元270。與此對應,基板傳送托盤側的主體部270的形狀亦成為與該球狀的滾輪對應之形狀。 The present invention is not limited to the above embodiments. For example, the shape and size of the frame, the number and arrangement of the driving rollers, and the like are merely examples, and may be appropriately changed depending on the size and shape of the substrate, the size and type of the film forming apparatus, and the like. For example, a spherical roller unit 270 shown in Fig. 8 can be employed. In response to this, the shape of the main body portion 270 on the substrate transfer tray side also has a shape corresponding to the spherical roller.

10‧‧‧傳送部 10‧‧‧Transportation Department

20(101)‧‧‧基板傳送托盤(基板) 20(101)‧‧‧Substrate transfer tray (substrate)

63‧‧‧驅動輥 63‧‧‧ drive roller

68‧‧‧驅動系統 68‧‧‧Drive system

100‧‧‧成膜裝置 100‧‧‧ film forming device

121(150)‧‧‧裝載鎖定腔室(真空腔室) 121(150)‧‧‧Load lock chamber (vacuum chamber)

122(150)‧‧‧緩衝腔室(真空腔室) 122(150)‧‧‧buffer chamber (vacuum chamber)

123(150)‧‧‧成膜腔室(真空腔室) 123(150)‧‧‧ Film forming chamber (vacuum chamber)

124(150)‧‧‧緩衝腔室(真空腔室) 124(150)‧‧‧buffer chamber (vacuum chamber)

125(150)‧‧‧裝載鎖定腔室(真空腔室) 125(150)‧‧‧Load lock chamber (vacuum chamber)

135‧‧‧腔室門 135‧‧‧ chamber door

140‧‧‧蒸鍍源 140‧‧‧vaporation source

EA1‧‧‧接收區域 EA1‧‧‧ receiving area

EA2‧‧‧恆定速度區域 EA2‧‧‧ Constant speed zone

EA3‧‧‧交接區域 EA3‧‧‧ handover area

D1‧‧‧傳送方向 D1‧‧‧Transfer direction

Claims (7)

一種基板傳送托盤,其為向與基板的厚度方向交叉之傳送方向傳送前述基板時,能夠保持前述基板之成膜裝置用基板傳送托盤,其特徵為,具備:框體,能夠安裝前述基板;以及支撐部,設置於前述框體的一端側,且傳送時支撐前述框體,前述支撐部具有:第1部份,連接於前述框體的前述一端側,且至少沿前述框體的厚度方向延伸;以及第2部份,與賦予用於傳送之驅動力之驅動輥接觸。 A substrate transfer tray which is a substrate transfer tray for a film formation apparatus capable of holding the substrate when the substrate is transported in a transport direction intersecting with a thickness direction of the substrate, and is characterized in that: a substrate is provided, and the substrate can be mounted; The support portion is provided on one end side of the frame body and supports the frame body during transport, and the support portion has a first portion connected to the one end side of the frame body and extending at least along a thickness direction of the frame body And the second part is in contact with a drive roller that imparts a driving force for transmission. 如申請專利範圍第1項所述之基板傳送托盤,其中,在前述傳送方向上之前述第2部份的端部具有隨著朝向前述傳送方向寬度變窄之形狀。 The substrate transfer tray according to the first aspect of the invention, wherein the end portion of the second portion in the conveying direction has a shape that becomes narrower in width toward the conveying direction. 如申請專利範圍第1或2項所述之基板傳送托盤,其中,在前述框體的另一端側,前述傳送方向上之端部具有隨著向前述傳送方向寬度變窄之形狀。 The substrate transfer tray according to the first or second aspect of the invention, wherein the end portion in the transport direction has a shape that narrows in width in the transport direction on the other end side of the housing. 如申請專利範圍第1或2項所述之基板傳送托盤,其中,從前述傳送方向觀察時,前述第1部份形成為字形狀,在該字形狀之內表面安裝有前述第2部份。 The substrate transfer tray according to claim 1 or 2, wherein the first portion is formed as viewed from the transport direction Word shape, in the The second part is attached to the inner surface of the word shape. 一種成膜裝置,其具備: 真空腔室,能夠容納如申請專利範圍第1~4項中任一項所述之基板傳送托盤及被前述基板傳送托盤保持之狀態的前述基板;以及傳送部,將前述基板以直立的狀態或從直立的狀態傾斜的狀態進行傳送,其特徵為,前述傳送部具有配置於前述真空腔室的上側,且向前述基板傳送托盤賦予驅動力之驅動輥,前述驅動輥配置於被前述支撐部的前述第1部份和前述第2部份包圍之空間內時,與前述第2部份接觸,並向前述基板傳送托盤賦予驅動力。 A film forming apparatus having: The substrate, wherein the substrate transfer tray according to any one of claims 1 to 4, and the substrate held by the substrate transfer tray; and a transfer portion, the substrate is erected or The conveyance unit has a drive roller that is disposed on the upper side of the vacuum chamber and that supplies a driving force to the substrate transfer tray, and the drive roller is disposed on the support portion. When the space between the first portion and the second portion is in contact with the second portion, a driving force is applied to the substrate transfer tray. 如申請專利範圍第5項所述之成膜裝置,其中,在藉由前述驅動輥支撐及驅動前述基板傳送托盤時,前述基板傳送托盤的下端部從前述真空腔室的底側的結構物在上下方向上分離。 The film forming apparatus according to claim 5, wherein, when the substrate transfer tray is supported and driven by the driving roller, a structure of a lower end portion of the substrate transfer tray from a bottom side of the vacuum chamber is Separate in the up and down direction. 如申請專利範圍第5或6項所述之成膜裝置,其中,前述傳送部具備支撐前述基板傳送托盤的下端部側之兩個側面之側面支撐部。 The film forming apparatus according to claim 5, wherein the conveying unit includes a side surface supporting portion that supports the two side surfaces on the lower end side of the substrate conveying tray.
TW102142841A 2013-03-15 2013-11-25 Substrate transfer tray and film formation device TW201434725A (en)

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