TW201330027A - Magnetic element and manufacturing method thereof - Google Patents

Magnetic element and manufacturing method thereof Download PDF

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TW201330027A
TW201330027A TW101131320A TW101131320A TW201330027A TW 201330027 A TW201330027 A TW 201330027A TW 101131320 A TW101131320 A TW 101131320A TW 101131320 A TW101131320 A TW 101131320A TW 201330027 A TW201330027 A TW 201330027A
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layer
extraction electrode
coil
surface portion
electrode layer
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TW101131320A
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TWI490894B (en
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Ryo Nakabayashi
Hisato Koshiba
Takao Mizushima
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Alps Green Devices Co Ltd
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Abstract

The present invention aims to provide a magnetic element and a manufacturing method thereof capable of reducing contact resistance in contrast to the prior art. The magnetic element comprises: an insulating substrate (11); a first coil (12); a second coil (13); a conducting layer (14) for connecting winding start ends to each other via a through hole; a first extraction electrode layer (15) electrically connected to a winding terminal of the first coil; and a second extraction electrode layer (16) electrically connected to a winding terminal of the second coil. The first coil, the second coil, the conducting layer, the first extraction electrode layer, and the second extraction electrode layer are formed integrally. Each extraction electrode layer (15,16) comprises: a side surface portion (15a,16a) formed on the side surface of the insulating substrate; an upper surface portion (15b,16b); and a lower surface portion (15c,16c).

Description

磁力元件及其製造方法 Magnetic element and method of manufacturing same

本發明涉及在絕緣基材的面具備線圈和從線圈引出的取出電極層的磁力元件及其製造方法。 The present invention relates to a magnetic element including a coil and an extraction electrode layer drawn from the coil on the surface of the insulating base material, and a method of manufacturing the same.

在下述專利文獻中揭示了一種涉及作為平面電感器等而使用的薄膜磁力元件的發明。 An invention relating to a thin film magnetic element used as a planar inductor or the like is disclosed in the following patent documents.

在專利文獻1或專利文獻2中揭示了一種在絕緣基材的上下面形成有線圈的層疊構造。但是,在專利文獻1或專利文獻2中並未揭示與線圈電性連接的取出電極層的構造。 Patent Document 1 or Patent Document 2 discloses a laminated structure in which coils are formed on the upper and lower surfaces of an insulating base material. However, Patent Document 1 or Patent Document 2 does not disclose the structure of the extraction electrode layer electrically connected to the coil.

另一方面,雖然在專利文獻3、專利文獻4及專利文獻5中揭示了一種取出電極層的結構,但由於與線圈分開形成,存在接觸電阻增大的問題。而且在絕緣基材的上下設置有線圈的結構中,在各線圈和透過形成於絕緣基材的通孔而與各線圈導通的導通層之間,也會產生接觸電阻。 On the other hand, in Patent Document 3, Patent Document 4, and Patent Document 5, a structure in which an electrode layer is taken out is disclosed. However, since it is formed separately from the coil, there is a problem that contact resistance increases. Further, in the structure in which the coils are provided on the upper and lower sides of the insulating base material, contact resistance is also generated between the respective coils and the conduction layers which are formed in the through holes formed in the insulating base material and which are electrically connected to the respective coils.

另外,以往,線圈的形成工序與取出電極層的形成工序分開,製造效率的下降等成為問題。 In addition, conventionally, the step of forming the coil is separated from the step of forming the extraction electrode layer, and the manufacturing efficiency is lowered.

〔先前技術文獻〕 [Previous Technical Literature] 〔專利文獻〕 [Patent Document]

〔專利文獻1〕日本特開平4-363006號公報 [Patent Document 1] Japanese Patent Laid-Open No. 4-363006

〔專利文獻2〕日本特開2000-243637號公報 [Patent Document 2] Japanese Patent Laid-Open Publication No. 2000-243637

〔專利文獻3〕日本特開平8-115840號公報 [Patent Document 3] Japanese Patent Laid-Open No. Hei 8-115840

〔專利文獻4〕日本特開平9-270342號公報 [Patent Document 4] Japanese Patent Laid-Open No. Hei 9-270342

〔專利文獻5〕日本特開2000-68125號公報 [Patent Document 5] Japanese Patent Laid-Open Publication No. 2000-68125

因此,本發明目的是解決上述的現有課題,特別是提供一種與以往相比能夠減少接觸電阻的磁力元件及其製造方法。 Accordingly, an object of the present invention is to solve the above-described conventional problems, and in particular to provide a magnetic element capable of reducing contact resistance as compared with the related art and a method of manufacturing the same.

另外,本發明目的在於提供一種能夠提高線圈及取出電極層的製造效率的磁力元件的製造方法。 Further, an object of the present invention is to provide a method of manufacturing a magnetic element capable of improving the manufacturing efficiency of a coil and an extraction electrode layer.

本發明的磁力元件的特徵在於,具有:絕緣基材;及第一線圈,形成於前述絕緣基材的上面;及第二線圈,形成於前述絕緣基材的下面;及導通層,透過形成於前述絕緣基材的通孔,而將位於前述第一線圈的內側的捲繞始端及位於前述第二線圈的內側的捲繞始端之間電性連接;及第一取出電極層,與位於前述第一線圈的外側的捲繞終端電性連接;及第二取出電極層,與位於前述第二線圈的外側的捲繞終端電性連接,前述第一線圈、前述第二線圈、前述導通層、前述第一取出電極層及前述第二取出電極層一體形成,前述第一取出電極層具有:第一側面部,形成於前述絕緣基材的第一側面;及第一上面部,從前述第一側面部 向前述絕緣基材的上面延伸而出,並與前述第一線圈的前述捲繞終端一體連結;及第一下面部,從前述第一側面部向前述絕緣基材的下面延伸而出,前述第二取出電極層具有:第二側面部,形成於前述絕緣基材的與前述第一側面不同的第二側面;及第二下面部,從前述第二側面部向前述絕緣基材的下面延伸而出,並與前述第二線圈的捲繞終端一體連結。由此,與以往相比,能夠減少第一線圈與第一取出電極層之間、第二線圈與第二取出電極層之間、及各線圈與導通層之間的接觸電阻。而且藉由在絕緣基材的上下使用線圈而能夠得到高電感。 A magnetic element according to the present invention includes: an insulating base material; and a first coil formed on an upper surface of the insulating base material; and a second coil formed on a lower surface of the insulating base material; and a conductive layer formed through the conductive layer The through hole of the insulating substrate is electrically connected between a winding start end located inside the first coil and a winding start end located inside the second coil; and the first extraction electrode layer is located at the foregoing a winding terminal on the outer side of the coil is electrically connected; and a second extraction electrode layer is electrically connected to the winding end located outside the second coil, the first coil, the second coil, the conduction layer, and the foregoing The first extraction electrode layer and the second extraction electrode layer are integrally formed, and the first extraction electrode layer has a first side surface portion formed on the first side surface of the insulating substrate, and a first upper surface portion from the first side surface unit Extending from the upper surface of the insulating base material and integrally connected to the winding end of the first coil; and the first lower surface portion extending from the first side surface portion toward the lower surface of the insulating base material, the first portion The second extraction electrode layer has a second side surface portion formed on a second side surface of the insulating base material different from the first side surface, and a second lower surface portion extending from the second side surface portion toward a lower surface of the insulating base material And connected integrally with the winding end of the second coil. Thereby, the contact resistance between the first coil and the first extraction electrode layer, between the second coil and the second extraction electrode layer, and between the respective coils and the conduction layer can be reduced as compared with the related art. Further, high inductance can be obtained by using a coil on the upper and lower sides of the insulating substrate.

另外,各取出電極層不僅具備上面部及下面部而且具備側面部,與上面部及下面部成為一體化並從兩側支承絕緣基材,從而能夠使各取出電極層作為抑制磁力元件的變形等的兩側支承體發揮功能。 In addition, each of the extraction electrode layers includes not only the upper surface portion and the lower surface portion but also a side surface portion, and is integrated with the upper surface portion and the lower surface portion to support the insulating base material from both sides, so that each of the extraction electrode layers can be used as a deformation preventing magnetic element. The support on both sides functions.

在本發明中,優選的是,構成前述第一取出電極層的前述第一上面部及前述第一下面部、以及構成前述第二取出電極層的前述第二下面部,形成得比前述第一線圈及前述第二線圈厚,在前述第一線圈的上面側重合地設置第一磁性體層,在前述第二線圈的下面側重合地設置第二磁性體層,前述第一磁性體層及前述第一上面部的各表面大致在同一面形成、或前述第一上面部的表面比前述第一磁性體層的表面還向離開前述絕緣基材的方向突出,前述第二磁性體層、前述第一下面部及前述第二下面部的各表面大 致在同一面形成、或前述第一下面部及前述第二下面部的各表面比前述第二磁性體層的表面還向離開前述絕緣基材的方向突出。在本發明中,下面部及上面部的各表面形成為與磁性體層的各表面大致同一面或突出的方式,由此在利用焊料等安裝於電路基板時,能夠將第一取出電極層及第二取出電極層與電路基板適當地連接,能夠防止不良情況的發生。並且,藉由使用磁性體層,能夠實現Q值的提高,而且能夠使用磁性體層作為磁性屏蔽。 In the invention, it is preferable that the first upper surface portion and the first lower surface portion constituting the first extraction electrode layer and the second lower surface portion constituting the second extraction electrode layer are formed to be larger than the first a coil and the second coil are thick, a first magnetic layer is disposed on a front surface side of the first coil, and a second magnetic layer is disposed on a lower surface side of the second coil, the first magnetic layer and the first upper surface Each surface of the portion is formed substantially on the same surface, or the surface of the first upper surface portion protrudes away from the surface of the first magnetic layer in a direction away from the insulating substrate, and the second magnetic layer, the first lower portion, and the The surface of the second lower portion is large The surfaces formed on the same surface or the first lower portion and the second lower portion protrude from the surface of the second magnetic layer in a direction away from the insulating substrate. In the present invention, each surface of the lower surface portion and the upper surface portion is formed to be substantially flush with or protruded from each surface of the magnetic layer, whereby the first extraction electrode layer and the first extraction electrode layer can be attached to the circuit board by solder or the like. The second extraction electrode layer is appropriately connected to the circuit board, and the occurrence of defects can be prevented. Further, by using the magnetic layer, the Q value can be improved, and the magnetic layer can be used as the magnetic shield.

另外,在本發明中,優選的是,構成前述第一取出電極層的前述第一上面部及前述第一下面部、以及構成前述第二取出電極層的前述第二下面部,具有與前述第一線圈及前述第二線圈大致相同膜厚的內層和與前述內層重合形成的外層,前述內層與前述外層一體化而形成。由此,能夠藉由簡單的結構一體形成從線圈到取出電極層,能夠有效地減少接觸電阻。 Further, in the invention, it is preferable that the first upper surface portion and the first lower surface portion constituting the first extraction electrode layer and the second lower surface portion constituting the second extraction electrode layer have the An inner layer having substantially the same thickness as the coil and the second coil, and an outer layer formed by overlapping the inner layer, wherein the inner layer and the outer layer are integrated. Thereby, the electrode layer can be integrally formed by the simple structure, and the contact resistance can be effectively reduced.

另外,在本發明中,優選的是,前述內層及各線圈由在前述絕緣基材的表面形成的箔體和與前述箔體重合形成的第一鍍敷層構成,前述外層由與前述第一鍍敷層重合形成的第二鍍敷層形成,前述第一取出電極層的第一側面部、及前述第二取出電極層的第二側面部分別由前述第一鍍敷層與前述第二鍍敷層的層疊結構形成。由此,能夠增加第一線圈及第二線圈的厚度,能夠減少線圈電阻。 Further, in the invention, it is preferable that the inner layer and each of the coils are composed of a foil formed on a surface of the insulating base material and a first plating layer formed by being combined with the foil, wherein the outer layer is Forming a second plating layer formed by overlapping a plating layer, wherein the first side surface portion of the first extraction electrode layer and the second side surface portion of the second extraction electrode layer are respectively formed by the first plating layer and the second surface A laminated structure of the plating layer is formed. Thereby, the thickness of the first coil and the second coil can be increased, and the coil resistance can be reduced.

另外,在本發明中,優選的是,前述第一鍍敷層是無電解鍍敷層,前述第二鍍敷層是電解鍍敷層。由此,在絕 緣基材的第一側面及第二側面能夠適當地形成基於無電解鍍敷的第一鍍敷層,能夠利用第一鍍敷層與第二鍍敷層的層疊結構來形成前述第一取出電極層的第一側面部、及前述第二取出電極層的第二側面部。而且,藉由以基於無電解鍍敷的第一鍍敷層與基於電解鍍敷的第二鍍敷層的層疊結構來形成,能夠將鍍敷層的厚度形成得較厚。 Further, in the invention, it is preferable that the first plating layer is an electroless plating layer, and the second plating layer is an electrolytic plating layer. Thus The first plating layer based on electroless plating can be appropriately formed on the first side surface and the second side surface of the edge substrate, and the first extraction electrode can be formed by using a laminated structure of the first plating layer and the second plating layer a first side surface portion of the layer and a second side surface portion of the second extraction electrode layer. Further, by forming a laminated structure of the first plating layer based on electroless plating and the second plating layer by electrolytic plating, the thickness of the plating layer can be made thick.

另外,在本發明中,優選的是,前述第一線圈、及前述第一取出電極層的前述第一上面部具有在前述絕緣基材的上面形成的第一箔體,前述第二線圈、前述第一取出電極層的前述第一下面部、及前述第二取出電極層的前述第二下面部具有在前述絕緣基材的下面形成的第二箔體,在前述第一箔體的表面及前述第二箔體的表面分別重合形成鍍敷層,在前述第一取出電極層中,具有從前述第一箔體的表面通過前述絕緣基材的前述第一側面直到前述第二箔體的表面而形成的鍍敷層,從而構成前述第一上面部、前述第一側面部及前述第一下面部,在前述第二取出電極層中,具有從前述絕緣基材的前述第一側面直到前述第二箔體的表面而形成的鍍敷層,從而構成前述第二側面部及前述第二下面部。由此,能夠增加第一線圈及第二線圈的厚度,能夠減少線圈電阻,並且能夠簡單且適當地形成第一取出電極層及第二取出電極層,該第一取出電極層及第二取出電極層具有從第一箔體 的表面及第二箔體的表面直到絕緣基材的第一側面及第二側面而形成的鍍敷層。 Further, in the invention, it is preferable that the first coil and the first upper surface portion of the first extraction electrode layer have a first foil formed on an upper surface of the insulating substrate, the second coil, and the The first lower surface portion of the first extraction electrode layer and the second lower surface portion of the second extraction electrode layer have a second foil formed on a lower surface of the insulating substrate, on the surface of the first foil and the aforementioned The surfaces of the second foil are superposed to form a plating layer, and the first extraction electrode layer has a surface from the first foil through the first side surface of the insulating substrate to the surface of the second foil. The formed plating layer constitutes the first upper surface portion, the first side surface portion, and the first lower surface portion, and the second extraction electrode layer has the first side surface from the insulating substrate until the second portion A plating layer formed on the surface of the foil body constitutes the second side surface portion and the second lower surface portion. Thereby, the thickness of the first coil and the second coil can be increased, the coil resistance can be reduced, and the first extraction electrode layer and the second extraction electrode layer can be easily and appropriately formed, the first extraction electrode layer and the second extraction electrode. Layer has a first foil The surface and the surface of the second foil are formed on the first side and the second side of the insulating substrate.

另外,在本發明中,優選的是,前述第一取出電極層形成為與前述第一側面大致同一長度,前述第二取出電極層形成為與前述第二側面大致同一長度。能夠以大面積形成第一取出電極層及前述第二取出電極層,能夠減少與安裝基板的連接端子之間的接觸電阻,並且能夠可靠地簡單地將各取出電極層與連接端子之間電性連接。 Further, in the invention, it is preferable that the first extraction electrode layer is formed to have substantially the same length as the first side surface, and the second extraction electrode layer is formed to have substantially the same length as the second side surface. The first extraction electrode layer and the second extraction electrode layer can be formed in a large area, and the contact resistance with the connection terminal of the mounting substrate can be reduced, and the electrical property between each of the extraction electrode layers and the connection terminal can be reliably and simply connection.

另外,在本發明中,優選的是,在前述第一取出電極層及前述第二取出電極層的最表面形成有焊墊。由此,能夠將磁力元件適當地焊接在安裝基板上。 Further, in the invention, it is preferable that a pad is formed on an outermost surface of the first extraction electrode layer and the second extraction electrode layer. Thereby, the magnetic element can be appropriately welded to the mounting substrate.

另外,在本發明中,優選的是,前述第二取出電極層具有:前述第二側面部;及第二上面部,從前述第二側面部向前述絕緣基材的上面延伸而出,並由與前述第一上面部相同的結構所形成;及前述第二下面部。由此,在第一取出電極層及前述第二取出電極層上分別設置上面部和下面部,因此,無論將磁力元件的上下面的任一方朝向安裝基板,皆能可靠且簡單地與安裝基板導通連接,從而能夠提高組裝性。 Further, in the invention, it is preferable that the second extraction electrode layer has the second side surface portion and the second upper surface portion extending from the second side surface portion toward the upper surface of the insulating base material, and The same structure as the first upper surface portion; and the second lower portion. Thereby, since the upper surface portion and the lower surface portion are respectively provided on the first extraction electrode layer and the second extraction electrode layer, the mounting substrate can be reliably and simply mounted on either of the upper and lower surfaces of the magnetic element. The connection is made to improve the assemblability.

另外,在本發明中,優選的是,前述第一線圈的從前述捲繞始端的最初的延伸而出方向是第一方向,前述第二線圈的從前述捲繞始端的最初的延伸而出方向是與前述第一方向相反方向的第二方向,前述絕緣基材的前述第二側面位於與前述第一側面面對的相反側,前述第一方向及前 述第二方向是與前述絕緣基材的前述第一側面及前述第二側面的長度方向正交的正交方向。能夠使第一線圈與第二線圈的匝數相同,而且能夠將匝數增加為最大限度,能夠實現電感的增加。 Further, in the invention, it is preferable that a direction in which the first coil is extended from a first end of the winding start end is a first direction, and a direction in which the second coil is extended from a first end of the winding start end a second direction opposite to the first direction, wherein the second side surface of the insulating substrate is located on a side opposite to the first side surface, the first direction and the front side The second direction is an orthogonal direction orthogonal to the longitudinal direction of the first side surface and the second side surface of the insulating base material. The number of turns of the first coil and the second coil can be made the same, and the number of turns can be increased to the maximum, and the inductance can be increased.

另外,本發明的磁力元件的製造方法的特徵在於,具有:第一工序,其中,準備在絕緣基材的上面形成有第一箔體且在下面形成有第二箔體的、能夠切斷成複數個磁力元件的絕緣基板,在前述絕緣基板的成為各磁力元件的區域間的位置上形成貫通孔,在成為各磁力元件的區域內形成通孔;第二工序,其中,與前述第一箔體及前述第二箔體重合地形成第一鍍敷層,此時,在前述通孔內形成基於前述第一鍍敷層的導通層,並從前述第一箔體的表面直到前述貫通孔內的側壁面及前述第二箔體的表面而形成前述第一鍍敷層;第三工序,其中,使用微影技術,在前述絕緣基材的上面側形成具有前述第一箔體及前述第一鍍敷層而成的第一線圈,而且,在前述絕緣基材的下面側形成具有前述第二箔體及前述第一鍍敷層而成的第二線圈,此時,將位於前述第一線圈的內側及前述第二線圈的內側的各捲繞始端與前述導通層一體化而形成,此外,形成第一取出電極層並形成第二取出電極層,前述第一取出電極層具有:第一側面部,形成於與前述絕 緣基材的第一側面相當之前述貫通孔的第一側壁面上;及第一上面部,從前述第一側面部向前述絕緣基材的上面延伸而出並與位於前述第一線圈的外側的捲繞終端一體化;及第一下面部,從前述第一側面部向前述絕緣基材的下面延伸而出;前述第二取出電極層具有:第二側面部,形成於與前述絕緣基材的不同於前述第一側面的第二側面相當之前述貫通孔的第二側壁面上;及第二下面部,從前述第二側面部向前述絕緣基材的下面延伸而出並與位於前述第二線圈的外側的捲繞終端一體化;第四工序,其中,切斷前述絕緣基板,得到複數個前述磁力元件。 Further, the method for producing a magnetic element according to the present invention includes the first step of preparing a first foil body on the upper surface of the insulating base material and forming the second foil body on the lower surface thereof to be cut into a plurality of insulating members of the magnetic element, wherein a through hole is formed at a position between the regions of the insulating substrate that is a magnetic element, and a through hole is formed in a region where each magnetic element is formed; and a second step, wherein the first foil And the second foil is formed to form a first plating layer by weight, and a conductive layer based on the first plating layer is formed in the through hole, and from the surface of the first foil to the through hole Forming the first plating layer on the side wall surface and the surface of the second foil body; and the third step of forming the first foil body and the first surface on the upper surface side of the insulating base material by using a lithography technique a first coil formed by plating a layer, and a second coil having the second foil body and the first plating layer formed on a lower surface side of the insulating base material, and at this time, the first coil is located The inner winding end and the inner winding end of the second coil are integrally formed with the conduction layer, and a first extraction electrode layer is formed to form a second extraction electrode layer, and the first extraction electrode layer has a first side surface portion. Formed in the foregoing a first side surface of the edge substrate corresponding to the first side wall surface of the through hole; and a first upper surface portion extending from the first side surface portion toward the upper surface of the insulating substrate and located outside the first coil The winding end is integrated; and the first lower portion extends from the first side portion toward the lower surface of the insulating substrate; the second extraction electrode layer has a second side portion formed on the insulating substrate a second side wall surface different from the through hole corresponding to the second side surface of the first side surface; and a second lower surface portion extending from the second side surface portion toward the lower surface of the insulating base material and located at the foregoing The winding terminal on the outer side of the two coils is integrated; in the fourth step, the insulating substrate is cut to obtain a plurality of the magnetic elements.

在本發明中,能夠藉由相同工序形成各線圈、導通層及各取出電極層,能夠一體化形成各線圈、導通層及各取出電極層。由此,在本發明中,與以往相比,能夠以比以往優異的製造效率製造出能夠減少線圈與取出電極層之間、及線圈與導通層之間的接觸電阻的薄型電感器。 In the present invention, each of the coil, the conduction layer, and the extraction electrode layer can be formed in the same step, and each of the coil, the conduction layer, and each of the extraction electrode layers can be integrally formed. Therefore, in the present invention, a thin inductor capable of reducing the contact resistance between the coil and the extraction electrode layer and between the coil and the conduction layer can be manufactured with higher manufacturing efficiency than conventionally.

在本發明中,優選的是,在前述第三工序與前述第四工序之間,具有在前述第一取出電極層及前述第二取出電極層的前述第一鍍敷層的面上重合形成第二鍍敷層的第五工序,在前述第五工序之後,具有在前述第一線圈的上面側重合設置第一磁性體層並在前述第二線圈的下面側重合設置第二磁性體層的第六工序,使前述第一磁性體層、及前述第一上面部的各表面為大致同一面、或使前述第一上面 部的表面比前述第一磁性體層的表面還向離開前述絕緣基材的方向突出,使前述第二磁性體層、前述第一下面部及前述第二下面部的各表面為大致同一面、或使前述第一下面部及前述第二下面部的各表面比前述第二磁性體層的表面還向離開前述絕緣基材的方向突出。根據上述情況,能夠在前述第一取出電極層及前述第二取出電極層的第一鍍敷層上重合形成第二鍍敷層,能夠將第一取出電極層的第一上面部及第一下面部、第二取出電極層的第二下面部形成得比各線圈厚。因此,在線圈的面側重合設有磁性體層時,能夠做成以大致同一面形成各磁性體層、第一取出電極層及第二取出電極層的各表面、或使下面部及上面部的各表面比各磁性體層的各表面突出之構造。 In the present invention, it is preferable that a surface of the first plating layer and the second extraction electrode layer overlap each other on the surface of the first plating electrode layer and the second extraction electrode layer between the third step and the fourth step In the fifth step of the second plating layer, after the fifth step, the sixth step of disposing the first magnetic layer on the upper surface side of the first coil and the second magnetic layer on the lower surface side of the second coil is superposed. And the first magnetic layer and the surface of the first upper surface are substantially the same surface or the first surface The surface of the portion of the first magnetic layer protrudes away from the insulating substrate, and the surfaces of the second magnetic layer, the first lower surface, and the second lower surface are substantially the same or Each surface of the first lower surface portion and the second lower surface portion protrudes in a direction away from the insulating base material than a surface of the second magnetic material layer. According to the above, the second plating layer can be formed on the first plating layer of the first extraction electrode layer and the second extraction electrode layer, and the first upper surface portion and the first lower surface of the first extraction electrode layer can be formed. The second lower portion of the face and the second extraction electrode layer is formed thicker than each of the coils. Therefore, when the magnetic layer is superposed on the surface side of the coil, each surface of each of the magnetic layer, the first extraction electrode layer, and the second extraction electrode layer can be formed on substantially the same surface, or each of the lower surface and the upper surface portion can be formed. The structure in which the surface protrudes from each surface of each magnetic layer.

另外,在本發明中,優選的是,在前述第一取出電極層及前述第二取出電極層的最表面上形成焊墊。 Further, in the invention, it is preferable that a pad is formed on the outermost surface of the first extraction electrode layer and the second extraction electrode layer.

另外,在本發明中,優選的是,在前述第二取出電極層上,與前述第二側面部及前述第二下面部一起形成第二上面部,該第二上面部係從前述第二側面部向前述絕緣基材的上面延伸而出且與前述第一上面部為相同結構。 Further, in the invention, it is preferable that a second upper surface portion is formed on the second extraction electrode layer together with the second side surface portion and the second lower surface portion, the second upper surface portion being from the second side surface The portion extends to the upper surface of the insulating base material and has the same structure as the first upper surface portion.

根據本發明的磁力元件,與以往相比,能夠減少第一線圈與第一取出電極層之間、第二線圈與第二取出電極層之間、及各線圈與導通層之間的接觸電阻。 According to the magnetic element of the present invention, the contact resistance between the first coil and the first extraction electrode layer, between the second coil and the second extraction electrode layer, and between the respective coils and the conduction layer can be reduced as compared with the related art.

另外,根據本發明的磁力元件的製造方法,能夠藉由 相同工序形成各線圈、導通層及各取出電極層,能夠一體化形成各線圈、導通層及各取出電極層。由此能夠提高製造效率。 In addition, the method of manufacturing the magnetic element according to the present invention can be Each of the coil, the conduction layer, and each of the extraction electrode layers is formed in the same step, and each of the coil, the conduction layer, and each of the extraction electrode layers can be integrally formed. Thereby, the manufacturing efficiency can be improved.

圖1(a)是本實施方式的薄型電感器的俯視圖,尤其是設置在絕緣基材上的第一線圈和取出電極層的上面部的俯視圖,並以虛線表示設置在絕緣基材下的第二線圈的圖,圖1(b)是圖1(a)所示的從A-A線切斷而從箭頭方向觀察的本實施方式的薄型電感器的縱向剖視圖,圖1(c)是設置在絕緣基材下的第二線圈及取出電極層的下面部的俯視圖,圖2是圖1(b)所示的薄型電感器的局部放大縱向剖視圖。 1(a) is a plan view of a thin inductor of the present embodiment, in particular, a top view of an upper surface of a first coil and an extraction electrode layer provided on an insulating substrate, and a broken line indicating a portion disposed under an insulating substrate FIG. 1(b) is a longitudinal cross-sectional view of the thin inductor of the present embodiment taken along line AA of FIG. 1(a) and viewed from the direction of the arrow, and FIG. 1(c) is set in insulation. FIG. 2 is a partially enlarged longitudinal cross-sectional view of the thin inductor shown in FIG. 1(b), showing a plan view of a lower portion of the second coil and the lower electrode layer of the substrate.

如圖1(b)所示,薄型電感器(磁力元件)10具有絕緣基材11、第一線圈12、第二線圈13、導通層14、第一取出電極層15、第二取出電極層16、磁性片(磁性體層)17、30。 As shown in FIG. 1(b), the thin inductor (magnetic element) 10 has an insulating base material 11, a first coil 12, a second coil 13, a conduction layer 14, a first extraction electrode layer 15, and a second extraction electrode layer 16. Magnetic sheets (magnetic layers) 17, 30.

絕緣基材11的材質並未特別限定,但優選對應於後述的各線圈12、13的銅箔(箔體)而為玻璃環氧基板。 The material of the insulating base material 11 is not particularly limited, but is preferably a glass epoxy substrate corresponding to a copper foil (foil) of each of the coils 12 and 13 to be described later.

在圖1(a)中,絕緣基材11的平面是正方形或矩形形狀,但形狀並未限定。 In Fig. 1(a), the plane of the insulating substrate 11 is a square or rectangular shape, but the shape is not limited.

如圖1(a)(b)所示,第一線圈12形成在絕緣基材11的上面11a。而且,如圖1(b)所示,第二線圈13形成在絕緣基材11的下面11b。 As shown in FIGS. 1(a) and (b), the first coil 12 is formed on the upper surface 11a of the insulating base material 11. Further, as shown in FIG. 1(b), the second coil 13 is formed on the lower surface 11b of the insulating base material 11.

如圖1(a)所示,第一線圈12是從內側的捲繞始端12a到外側的捲繞終端12b折彎成直角並同時捲繞的平面線圈。如圖1(a)所示,第一線圈12從捲繞始端12a的最初的延伸而出方向α1為X1方向。 As shown in Fig. 1(a), the first coil 12 is a planar coil which is bent at a right angle from the winding start end 12a of the inner side to the outer winding end 12b and simultaneously wound. As shown in Fig. 1(a), the first coil 12 extends from the first extension of the winding start end 12a in the direction α1 in the X1 direction.

另外,如圖1(c)所示,第二線圈13是從內側的捲繞始端13a到外側的捲繞終端13b折彎成直角並同時捲繞的平面線圈。如圖1(c)所示,第二線圈13從捲繞始端13a的最初的延伸而出方向α2為X2方向。 Further, as shown in FIG. 1(c), the second coil 13 is a planar coil which is bent at a right angle from the winding start end 13a on the inner side to the winding end 13b on the outer side. As shown in Fig. 1(c), the second coil 13 extends from the first direction of the winding start end 13a and the direction α2 is the X2 direction.

如圖1(b)所示,在絕緣基材11的大致中央形成有從上面11a貫通到下面11b的通孔11c。如圖1(b)所示,在通孔11c內設有導通層14。並且,導通層14與第一線圈12的捲繞始端12a電性連接,導通層14與第二線圈13的捲繞始端13a電性連接。 As shown in FIG. 1(b), a through hole 11c penetrating from the upper surface 11a to the lower surface 11b is formed substantially at the center of the insulating base material 11. As shown in FIG. 1(b), a conduction layer 14 is provided in the through hole 11c. Further, the conduction layer 14 is electrically connected to the winding start end 12a of the first coil 12, and the conduction layer 14 is electrically connected to the winding start end 13a of the second coil 13.

如圖1(b)所示,在絕緣基材11的第一側面(X1側面)11d側形成有第一取出電極層15。而且如圖1(b)所示,在絕緣基材11的第二側面(X2側側面)11e側形成有第二取出電極層16。 As shown in FIG. 1(b), a first extraction electrode layer 15 is formed on the first side surface (X1 side surface) 11d side of the insulating base material 11. Further, as shown in FIG. 1(b), a second extraction electrode layer 16 is formed on the second side surface (X2 side surface) 11e side of the insulating base material 11.

如圖1(b)所示,第一取出電極層15具有:形成在絕緣基材11的第一側面11d上的第一側面部15a;從第一側面部15a向絕緣基材11的上面11a延伸而出,並與第一線圈12的捲繞終端12b連接的第一上面部15b;從第一側面部15a向絕緣基材11的下面11b延伸而出的第一下面部15c,而構成。 As shown in FIG. 1(b), the first extraction electrode layer 15 has a first side surface portion 15a formed on the first side surface 11d of the insulating base material 11 and an upper surface 11a of the insulating base material 11 from the first side surface portion 15a. The first upper surface portion 15b extending from the winding end 12b of the first coil 12 and the first lower surface portion 15c extending from the first side surface portion 15a toward the lower surface 11b of the insulating base material 11 are formed.

如圖1(a)所示,第一取出電極層15的第一上面部 15b在絕緣基材11的上面11a露出。而且,如圖1(c)所示,第一取出電極層15的第一下面部15c在絕緣基材11的下面11b露出。 As shown in FIG. 1(a), the first upper face of the first extraction electrode layer 15 15b is exposed on the upper surface 11a of the insulating base material 11. Further, as shown in FIG. 1(c), the first lower surface portion 15c of the first extraction electrode layer 15 is exposed on the lower surface 11b of the insulating base material 11.

如圖1(b)所示,第二取出電極層16具有:形成在絕緣基材11的第二側面11e上的第二側面部16a;從第二側面部16a向絕緣基材11的上面11a延伸而出的第二上面部16b;從第二側面部16a向絕緣基材11的下面11b延伸而出,並與第二線圈13的捲繞終端13b連接的第二下面部16c。需要說明的是,在圖1(a)中,如後述那樣,第一線圈12與第二線圈13的匝數一致,因此使第二側面11e位於與第一側面11d面對的相反側,但在將薄型電感器10安裝於安裝基板25時,隨著安裝基板25的連接端子25a的配線圖案的位置不同,也可能形成在與第一側面11d相鄰的位置。 As shown in FIG. 1(b), the second extraction electrode layer 16 has a second side surface portion 16a formed on the second side surface 11e of the insulating base material 11 and an upper surface 11a of the insulating substrate 11 from the second side surface portion 16a. The second upper surface portion 16b that extends is a second lower surface portion 16c that extends from the second side surface portion 16a toward the lower surface 11b of the insulating base material 11 and is connected to the winding end 13b of the second coil 13. In addition, in FIG. 1(a), as will be described later, since the number of turns of the first coil 12 and the second coil 13 coincides, the second side surface 11e is located on the opposite side to the first side surface 11d. However, when the thin inductor 10 is mounted on the mounting substrate 25, it may be formed at a position adjacent to the first side surface 11d depending on the position of the wiring pattern of the connection terminal 25a of the mounting substrate 25.

如圖1(a)所示,第二取出電極層16的第二上面部16b在絕緣基材11的上面11a露出。而且,如圖1(c)所示,第二取出電極層16的第二下面部16c在絕緣基材11的下面11b露出。 As shown in FIG. 1(a), the second upper surface portion 16b of the second extraction electrode layer 16 is exposed on the upper surface 11a of the insulating base material 11. Further, as shown in FIG. 1(c), the second lower surface portion 16c of the second extraction electrode layer 16 is exposed on the lower surface 11b of the insulating base material 11.

如圖1(b)、圖2所示,第一線圈12藉由形成在絕緣基材11的上面11a上的第一箔體(例如銅箔)18與重合形成在第一箔體18的面18a上的第一鍍敷層19的層疊結構而形成。 As shown in FIG. 1(b) and FIG. 2, the first coil 12 is formed on the surface of the first foil body 18 by overlapping with a first foil body (for example, a copper foil) 18 formed on the upper surface 11a of the insulating base material 11. The laminated structure of the first plating layer 19 on 18a is formed.

另外,如圖1(b)、圖2所示,第二線圈13藉由形成在絕緣基材11的下面11b上的第二箔體(例如銅箔) 20與重合形成在第二銅箔20的面20a上的第一鍍敷層19的層疊結構而形成。 Further, as shown in FIG. 1(b) and FIG. 2, the second coil 13 is formed of a second foil (for example, a copper foil) formed on the lower surface 11b of the insulating base material 11. 20 is formed by superposing a laminated structure of the first plating layer 19 formed on the face 20a of the second copper foil 20.

如圖1(b)、圖2所示,第一取出電極層15的第一上面部15b與第一線圈12同樣地具有第一箔體18與第一鍍敷層19的層疊結構。在第一上面部15b,將第一箔體18與第一鍍敷層19的層疊結構當做內層21。另外,如圖1(b)、圖2所示,第一取出電極層15的第一下面部15c與第二線圈13同樣地具有第二箔體20與第一鍍敷層19的層疊結構。在第一下面部15c,將第二箔體20與第一鍍敷層19的層疊結構當做內層22。 As shown in FIG. 1(b) and FIG. 2, the first upper surface portion 15b of the first extraction electrode layer 15 has a laminated structure of the first foil body 18 and the first plating layer 19, similarly to the first coil 12. In the first upper surface portion 15b, the laminated structure of the first foil body 18 and the first plating layer 19 is regarded as the inner layer 21. Further, as shown in FIGS. 1(b) and 2, the first lower surface portion 15c of the first extraction electrode layer 15 has a laminated structure of the second foil body 20 and the first plating layer 19 in the same manner as the second coil 13. In the first lower portion 15c, the laminated structure of the second foil 20 and the first plating layer 19 is regarded as the inner layer 22.

如圖2所示,第一取出電極層15的第一上面部15b的內層21與第一線圈12為大致相同膜厚,第一取出電極層15的第一下面部15c的內層22與第二線圈13為大致相同膜厚。 As shown in FIG. 2, the inner layer 21 of the first upper surface portion 15b of the first extraction electrode layer 15 is substantially the same film thickness as the first coil 12, and the inner layer 22 of the first lower surface portion 15c of the first extraction electrode layer 15 is The second coil 13 has substantially the same film thickness.

如圖1(b)、圖2所示,在構成第一取出電極層15的第一上面部15b的內層21的表面形成有作為外層的第二鍍敷層23。而且,在構成第一取出電極層15的第一下面部15c的內層22的表面形成有作為外層的第二鍍敷層23。 As shown in FIGS. 1(b) and 2, a second plating layer 23 as an outer layer is formed on the surface of the inner layer 21 constituting the first upper surface portion 15b of the first extraction electrode layer 15. Further, a second plating layer 23 as an outer layer is formed on the surface of the inner layer 22 constituting the first lower surface portion 15c of the first extraction electrode layer 15.

另外,如圖1(b)、圖2所示,第一取出電極層15的第一側面部15a由第一鍍敷層19與第二鍍敷層23的層疊結構形成。 Further, as shown in FIGS. 1(b) and 2, the first side surface portion 15a of the first extraction electrode layer 15 is formed by a laminated structure of the first plating layer 19 and the second plating layer 23.

在第一取出電極層15的第一側面部15a中,第一鍍敷層19直接形成於絕緣基材11的第一側面11d,在前述 第一鍍敷層19的表面重合形成有第二鍍敷層23。 In the first side surface portion 15a of the first extraction electrode layer 15, the first plating layer 19 is directly formed on the first side surface 11d of the insulating substrate 11, in the foregoing The surface of the first plating layer 19 is superposed to form a second plating layer 23.

上述對於第一取出電極層15的層疊結構進行了說明,但關於第二取出電極層16也同樣。即如圖1(b)所示,第二取出電極層16的第二側面部16a是第一鍍敷層19與第二鍍敷層23的層疊結構,第二上面部16b是第一箔體18、第一鍍敷層19及第二鍍敷層23的層疊結構,第二下面部16c是第二箔體20、第一鍍敷層19及第二鍍敷層23的層疊結構。 Although the laminated structure of the first extraction electrode layer 15 has been described above, the same applies to the second extraction electrode layer 16. That is, as shown in FIG. 1(b), the second side surface portion 16a of the second extraction electrode layer 16 is a laminated structure of the first plating layer 19 and the second plating layer 23, and the second upper surface portion 16b is the first foil body. 18. The laminated structure of the first plating layer 19 and the second plating layer 23, and the second lower surface portion 16c is a laminated structure of the second foil body 20, the first plating layer 19, and the second plating layer 23.

如圖1(b)所示,導通層14由第一鍍敷層19形成。 As shown in FIG. 1(b), the conduction layer 14 is formed of the first plating layer 19.

例如,第一箔體18、20是銅箔,第一鍍敷層19及第二鍍敷層23是鍍銅。由此,內層21、22與作為外層的第二鍍敷層23成為一體化。 For example, the first foils 18, 20 are copper foils, and the first plating layer 19 and the second plating layer 23 are copper plated. Thereby, the inner layers 21 and 22 are integrated with the second plating layer 23 as the outer layer.

如圖1(a)(b)、圖2所示,第一線圈12與第一取出電極層15,具備由共通的第一箔體18及第一鍍敷層19構成的層疊結構而一體化,而且,第二線圈13與第二取出電極層16具備由共通的第二箔體20及第一鍍敷層19構成的層疊結構而一體化。而且,導通層14由第一鍍敷層19形成,並與具備第一鍍敷層19的第一線圈12及第二線圈13一體化而形成。 As shown in FIGS. 1(a), (b) and 2, the first coil 12 and the first extraction electrode layer 15 are provided with a laminated structure including a common first foil 18 and a first plating layer 19, and are integrated. Further, the second coil 13 and the second extraction electrode layer 16 are provided with a laminated structure including the common second foil 20 and the first plating layer 19, and are integrated. Further, the conduction layer 14 is formed of the first plating layer 19, and is formed integrally with the first coil 12 and the second coil 13 including the first plating layer 19.

如此,在本實施方式中,第一線圈12、第二線圈13、第一取出電極層15、第二取出電極層16及導通層14一體形成。 As described above, in the present embodiment, the first coil 12, the second coil 13, the first extraction electrode layer 15, the second extraction electrode layer 16, and the conduction layer 14 are integrally formed.

由此,與以往那樣將各線圈12、13和各取出電極層15、16分別形成的結構相比,能夠減少接觸電阻。根據本 實施方式的結構,能夠使各線圈與各取出電極層間的接觸電阻為零。而且,在本實施方式中,能夠減少線圈12、13與導通層14之間的接觸電阻,具體而言,能夠使各線圈與導通層之間的接觸電阻為零。 Thereby, the contact resistance can be reduced as compared with the conventional structure in which each of the coils 12 and 13 and each of the extraction electrode layers 15 and 16 are formed. According to this In the configuration of the embodiment, the contact resistance between each coil and each of the extraction electrode layers can be made zero. Further, in the present embodiment, the contact resistance between the coils 12 and 13 and the conduction layer 14 can be reduced, and specifically, the contact resistance between each coil and the conduction layer can be made zero.

在本實施方式中,在絕緣基材11的上下形成有第一線圈12和第二線圈13。由此,能夠得到高電感。而且藉由將線圈12、13形成在絕緣基材11的上下,能夠藉由簡單的結構從各線圈12、13引出取出電極層15、16。 In the present embodiment, the first coil 12 and the second coil 13 are formed above and below the insulating base material 11. Thereby, high inductance can be obtained. Further, by forming the coils 12 and 13 on the upper and lower sides of the insulating base material 11, the electrode layers 15 and 16 can be taken out from the respective coils 12 and 13 by a simple structure.

另外,在本實施方式中,在第一取出電極層15及第二取出電極層16這兩者均設有上面部15b、16b和下面部15c、16c。因此,無論薄型電感器10的上下面的哪一面朝向安裝基板25,都能夠與前述安裝基板25導通連接。即如圖2所示,第一取出電極層15的第一下面部15c和圖2中未圖示的第二取出電極層16的第二下面部16c與安裝基板25表面的連接端子25a電性連接,圖2所示的薄型電感器也可以顛倒180度而與安裝基板25的連接端子25a電性連接。由此,能夠將薄型電感器10簡單且可靠地安裝在安裝基板25的表面,能夠得到良好的組裝性。需要說明的是,若無需這種功能,則第二線圈13被連接在第二取出電極16和第二下面部16c,因此考慮到後述的焊料層35設置在第一、第二側面部15a、16a與第一、第二下面部15c之間的情況時,也可以沒有第二上面部16b。 Further, in the present embodiment, the upper surface portions 15b and 16b and the lower surface portions 15c and 16c are provided in both of the first extraction electrode layer 15 and the second extraction electrode layer 16. Therefore, regardless of which of the upper and lower surfaces of the thin inductor 10 faces the mounting substrate 25, it can be electrically connected to the mounting substrate 25. That is, as shown in FIG. 2, the first lower surface portion 15c of the first extraction electrode layer 15 and the second lower surface portion 16c of the second extraction electrode layer 16 not shown in FIG. 2 and the connection terminal 25a on the surface of the mounting substrate 25 are electrically The thin inductor shown in FIG. 2 can also be electrically connected to the connection terminal 25a of the mounting substrate 25 by being reversed by 180 degrees. Thereby, the thin inductor 10 can be easily and reliably attached to the surface of the mounting substrate 25, and good assemblability can be obtained. In addition, if the second coil 13 is connected to the second extraction electrode 16 and the second lower surface portion 16c without such a function, it is considered that the solder layer 35 to be described later is provided on the first and second side surface portions 15a, In the case of the relationship between 16a and the first and second lower portions 15c, the second upper surface portion 16b may not be provided.

另外,如圖1(b)、圖2所示,各取出電極層15、 16不僅具備上面部15b、16b及下面部15c、16c而且具備側面部15a、16a並與上面部15b、16b及下面部15c、16c一體化,而成為從X1-X2方向的兩側支承絕緣基材11的結構。由此,能夠使各取出電極層15、16作為抑制薄型電感器的變形等的兩側支承體發揮功能。 In addition, as shown in FIG. 1(b) and FIG. 2, each of the electrode layers 15 is taken out, 16 includes not only the upper surface portions 15b and 16b and the lower surface portions 15c and 16c but also the side surface portions 15a and 16a and integrated with the upper surface portions 15b and 16b and the lower surface portions 15c and 16c, and the insulating base is supported from both sides in the X1-X2 direction. The structure of the material 11. Thereby, each of the extraction electrode layers 15 and 16 can function as a both-side support body that suppresses deformation or the like of the thin inductor.

如圖1(b)、圖2所示,構成第一取出電極層15的第一上面部15b及第一下面部15c,和構成第二取出電極層16的第二上面部16b及第二下面部16c,係形成得比第一線圈12及第二線圈13厚。 As shown in FIG. 1(b) and FIG. 2, the first upper surface portion 15b and the first lower surface portion 15c constituting the first extraction electrode layer 15, and the second upper surface portion 16b and the second lower surface constituting the second extraction electrode layer 16 are formed. The portion 16c is formed thicker than the first coil 12 and the second coil 13.

因此,在第一取出電極層15及第二取出電極層16的各上面部15b、16b及各下面部15c、16c與第一線圈12及第二線圈13之間能夠形成高低差。並且,如圖1(b)、圖2所示,在第一線圈12的上面透過絕緣層(黏接層)31而配置第一磁性片17。而且,如圖1(b)、圖2所示,在第二線圈13的下面透過絕緣層(黏接層)32而配置第二磁性片30。此時,在本實施方式中,如圖1(b)、圖2所示,能夠以第一磁性片17、第一上面部15b及第二上面部16b的各表面成為大致同一面的方式配置第一磁性片17。而且,能夠以第二磁性片30、第一下面部15c及第二下面部16c的各表面成為大致同一面的方式配置第二磁性片30。 Therefore, a height difference can be formed between each of the upper surface portions 15b and 16b and each of the lower surface portions 15c and 16c of the first extraction electrode layer 15 and the second extraction electrode layer 16 and between the first coil 12 and the second coil 13. Further, as shown in FIGS. 1(b) and 2, the first magnetic sheet 17 is placed on the upper surface of the first coil 12 through the insulating layer (adhesive layer) 31. Further, as shown in FIGS. 1(b) and 2, the second magnetic sheet 30 is placed on the lower surface of the second coil 13 through the insulating layer (adhesive layer) 32. At this time, in the present embodiment, as shown in FIG. 1(b) and FIG. 2, the surfaces of the first magnetic sheet 17, the first upper surface portion 15b, and the second upper surface portion 16b can be arranged substantially flush with each other. The first magnetic sheet 17. Further, the second magnetic sheet 30 can be disposed such that the respective surfaces of the second magnetic sheet 30, the first lower surface portion 15c, and the second lower surface portion 16c are substantially flush with each other.

或者在本實施方式中,也可以將第一上面部15b及第二上面部16b的各表面形成為比第一磁性體層17的表面還向離開絕緣基材11的方向(上方)突出的方式。而 且,也可以將第一下面部15c及第二下面部16c的各表面形成為比第二磁性體層30的表面還向離開絕緣基材11的方向(下方)突出的方式。 Alternatively, in the present embodiment, each surface of the first upper surface portion 15b and the second upper surface portion 16b may be formed to protrude from the surface of the first magnetic layer 17 in a direction (upward) away from the insulating base material 11. and Further, each surface of the first lower surface portion 15c and the second lower surface portion 16c may be formed to protrude from the surface of the second magnetic layer 30 in a direction (downward) away from the insulating base material 11.

如以上所述,各上面部、各下面部及各磁性體層由大致同一面形成或使各上面部、各下面部的各表面比各磁性體層的各表面向外方突出,由此,在利用焊料等將薄型電感器10安裝於安裝基板25時,不易發生安裝不良等。 As described above, each of the upper surface portion, each of the lower surface portions, and each of the magnetic layer layers is formed by substantially the same surface, or each surface of each of the upper surface portion and each of the lower surface portions protrudes outward from each surface of each of the magnetic layer layers, thereby utilizing When the thin inductor 10 is mounted on the mounting substrate 25 such as solder, mounting failure or the like is less likely to occur.

在本實施方式中,藉由使用磁性片17、30,能夠實現Q值的提高,而且可以使用磁性片17、30作為磁性屏蔽。磁性片17、30的結構並未特別限定。可以列舉聚萘二甲酸乙二醇酯、聚對苯二甲酸乙二醇酯、聚醯胺系等的絕緣片表面上形成有FeAlN或FeN的磁性層的結構、在絕緣片的表面將FeAlN或FeN的磁性層與SiO2等的絕緣層交替層疊規定數目的結構、或既知的鐵氧體片、鐵氧體板、磁性合金薄帶等。 In the present embodiment, by using the magnetic sheets 17, 30, the Q value can be improved, and the magnetic sheets 17, 30 can be used as the magnetic shield. The structure of the magnetic sheets 17, 30 is not particularly limited. A structure in which a magnetic layer of FeAlN or FeN is formed on the surface of an insulating sheet such as polyethylene naphthalate, polyethylene terephthalate or polyamidamide, or FeAlN or on the surface of the insulating sheet The magnetic layer of FeN and the insulating layer of SiO 2 or the like are alternately laminated with a predetermined number of structures, or a known ferrite sheet, a ferrite plate, a magnetic alloy thin strip, or the like.

將各線圈12、13與各磁性片17、30之間接合的絕緣層(黏接層)31、32可以使用例如環氧系低溫硬化劑、丙烯系低溫硬化劑。 For the insulating layers (adhesive layers) 31 and 32 to which the respective coils 12 and 13 and the magnetic sheets 17 and 30 are joined, for example, an epoxy-based low-temperature curing agent or an acryl-based low-temperature curing agent can be used.

在各線圈12、13與各磁性片17、30之間夾設有絕緣層31、32,因此可以使磁性片17、30的磁性層朝向線圈12、13側進行接合,也可以使磁性片17、30的磁性層朝向外側進行接合。而且,也可以是如下的結構:在各磁性片17、30的磁性層表面藉由SiO2、Al2O3、SiAlON、AlN等預先形成絕緣膜(未圖示),在絕緣層31、32使用黏 接劑,在填充了前述黏接劑的狀態下,使磁性片17、30的磁性層朝向線圈12、13側進行壓接、接合。藉由該結構,黏接劑因壓接而被壓扁,線圈12、13與磁性片17、30的間隔大致成為僅有磁性層表面的絕緣膜的厚度,在保持了磁性片17、30與線圈12、13的絕緣的狀態下,能夠使薄型電感器的厚度進一步變薄,也能夠提高電感值及Q值。 Since the insulating layers 31 and 32 are interposed between the coils 12 and 13 and the magnetic sheets 17 and 30, the magnetic layers of the magnetic sheets 17 and 30 can be joined toward the coils 12 and 13 or the magnetic sheets 17 can be joined. The magnetic layers of 30 are joined to the outside. Further, a configuration may be adopted in which an insulating film (not shown) is formed on the surface of the magnetic layer of each of the magnetic sheets 17 and 30 by SiO 2 , Al 2 O 3 , SiAlON, AlN or the like, and the insulating layers 31 and 32 are formed. The magnetic layer of the magnetic sheets 17 and 30 is pressure-bonded and joined to the coils 12 and 13 side in a state in which the above-mentioned adhesive is filled with an adhesive. With this configuration, the adhesive is crushed by pressure bonding, and the gap between the coils 12, 13 and the magnetic sheets 17, 30 is substantially the thickness of the insulating film having only the surface of the magnetic layer, and the magnetic sheets 17, 30 are held. In the insulated state of the coils 12 and 13, the thickness of the thin inductor can be further reduced, and the inductance value and the Q value can be increased.

另外,在圖2所示的結構中,第一磁性片17、第一上面部15b及第二上面部16b的各表面形成為大致同一面,另外,第二磁性片30、第一下面部15c及第二下面部16c的各表面形成為大致同一面,因此能夠將各上面部15b、16b或各下面部15c、16c構成作為對安裝基板25的安裝面,能夠得到與安裝基板25的連接端子25a的良好的電性連接性。 Further, in the configuration shown in FIG. 2, the respective surfaces of the first magnetic sheet 17, the first upper surface portion 15b, and the second upper surface portion 16b are formed to be substantially the same surface, and the second magnetic sheet 30 and the first lower surface portion 15c are formed. Since the respective surfaces of the second lower surface portion 16c are formed to be substantially the same surface, the upper surface portions 15b and 16b or the respective lower surface portions 15c and 16c can be formed as a mounting surface to the mounting substrate 25, and a connection terminal with the mounting substrate 25 can be obtained. Good electrical connectivity of 25a.

如圖1(b)、圖2所示,在本實施方式中,第一取出電極層15的第一上面部15b及第一下面部15c由內層21、22與外層(第二鍍敷層23)的層疊結構形成。並且,前述內層21與各線圈12、13以大致相同膜厚形成。需要說明的是,第二取出電極層16也與第一取出電極層15為同樣的結構,以下,使用第一取出電極層15進行說明。 As shown in FIG. 1(b) and FIG. 2, in the present embodiment, the first upper surface portion 15b and the first lower surface portion 15c of the first extraction electrode layer 15 are composed of inner layers 21, 22 and an outer layer (second plating layer). 23) The laminated structure is formed. Further, the inner layer 21 and the coils 12 and 13 are formed to have substantially the same film thickness. In addition, the second extraction electrode layer 16 has the same structure as the first extraction electrode layer 15, and the first extraction electrode layer 15 will be described below.

如圖2所示,第一上面部15b的內層21及第一線圈12是同樣的第一箔體18與第一鍍敷層19的層疊結構,由此,能夠將第一上面部15b的內層21及第一線圈12以相 同膜厚形成。 As shown in FIG. 2, the inner layer 21 of the first upper surface portion 15b and the first coil 12 are a laminated structure of the same first foil body 18 and the first plating layer 19, whereby the first upper surface portion 15b can be The inner layer 21 and the first coil 12 are in phase Formed with the same film thickness.

另外如圖2所示,第一下面部15c的內層22及第二線圈13是同樣的第二箔體20與第一鍍敷層19的層疊結構,由此,能夠將第一下面部15c的內層21及第二線圈13以相同膜厚形成。第一鍍敷層19例如為無電解鍍敷層,由此能夠從第一箔體18及第二箔體20的表面直到絕緣基材11的第一側面11d而直接形成第一鍍敷層19。 Further, as shown in FIG. 2, the inner layer 22 and the second coil 13 of the first lower surface portion 15c are a laminated structure of the same second foil body 20 and the first plating layer 19, whereby the first lower surface portion 15c can be used. The inner layer 21 and the second coil 13 are formed to have the same film thickness. The first plating layer 19 is, for example, an electroless plating layer, whereby the first plating layer 19 can be directly formed from the surface of the first foil body 18 and the second foil body 20 to the first side surface 11d of the insulating substrate 11. .

並且,在構成第一上面部15b及第一下面部15c的第一鍍敷層19的表面重合形成第二鍍敷層23,由此,能夠將第一上面部15b及第一下面部15c的膜厚形成得比第一線圈12及第二線圈13厚。 Further, the surface of the first plating layer 19 constituting the first upper surface portion 15b and the first lower surface portion 15c is superposed to form the second plating layer 23, whereby the first upper surface portion 15b and the first lower surface portion 15c can be formed. The film thickness is formed thicker than the first coil 12 and the second coil 13.

另外,第二鍍敷層23與形成在第一側面11d上的第一鍍敷層19重合形成,第一側面部15a由第一鍍敷層19與第二鍍敷層23的層疊結構形成。 Further, the second plating layer 23 is formed to overlap the first plating layer 19 formed on the first side surface 11d, and the first side surface portion 15a is formed by a laminated structure of the first plating layer 19 and the second plating layer 23.

第二鍍敷層23優選為電解鍍敷層。也可以形成為無電解,但形成為電解鍍敷層時能夠在短時間內較厚地形成第二鍍敷層23。 The second plating layer 23 is preferably an electrolytic plating layer. It may be formed as electroless, but when formed into an electrolytic plating layer, the second plating layer 23 can be formed thickly in a short time.

另外,第一鍍敷層19和第二鍍敷層23由相同或同質的材質形成,優選為一體化。 Further, the first plating layer 19 and the second plating layer 23 are formed of the same or homogeneous material, and are preferably integrated.

若要提出各層的膜厚的一例,各箔體18、20的膜厚為35μm左右,第一鍍敷層19的膜厚為35μm左右,第二鍍敷層23的膜厚為65~75μm左右。 In order to provide an example of the film thickness of each layer, the film thickness of each of the foils 18 and 20 is about 35 μm, the film thickness of the first plating layer 19 is about 35 μm, and the film thickness of the second plating layer 23 is about 65 to 75 μm. .

如圖1(a)、圖1(c)所示,在本實施方式中,第一取出電極層15以與絕緣基材11的第一側面11d相同長 度形成。而且,第二取出電極層16以與絕緣基材11的第二側面11e同一長度形成。如圖1(a)所示,第一取出電極層15、第一側面11d、第二取出電極層16及第二側面11e的在Y1-Y2方向上的長度尺寸為L1。 As shown in FIGS. 1(a) and 1(c), in the present embodiment, the first extraction electrode layer 15 is the same length as the first side surface 11d of the insulating base material 11. Degree formation. Further, the second extraction electrode layer 16 is formed to have the same length as the second side surface 11e of the insulating base material 11. As shown in FIG. 1(a), the length dimension of the first extraction electrode layer 15, the first side surface 11d, the second extraction electrode layer 16, and the second side surface 11e in the Y1-Y2 direction is L1.

另外,如圖1(a)所示,第一取出電極層15的第一上面部15b及第二取出電極層16的第二上面部16b保持L1的長度尺寸並同時沿著X1-X2方向以T1的寬度尺寸形成。而且,如圖1(c)所示,第一取出電極層15的第一下面部15c及第二取出電極層16的第二下面部16c保持L1的長度尺寸並同時沿著X1-X2方向以T1的寬度尺寸形成。 Further, as shown in FIG. 1(a), the first upper surface portion 15b of the first extraction electrode layer 15 and the second upper surface portion 16b of the second extraction electrode layer 16 maintain the length dimension of L1 while being along the X1-X2 direction. The width dimension of T1 is formed. Further, as shown in FIG. 1(c), the first lower surface portion 15c of the first extraction electrode layer 15 and the second lower surface portion 16c of the second extraction electrode layer 16 maintain the length dimension of L1 while being along the X1-X2 direction. The width dimension of T1 is formed.

長度尺寸L1為2~5mm左右,寬度尺寸T1為0.35mm左右。 The length dimension L1 is about 2 to 5 mm, and the width dimension T1 is about 0.35 mm.

由此,能夠大面積形成第一取出電極層15及第二取出電極層16,能夠減少與安裝基板25的連接端子25a之間的接觸電阻,並且能夠將各取出電極層15、16與連接端子25a之間可靠且簡單地電性連接。 Thereby, the first extraction electrode layer 15 and the second extraction electrode layer 16 can be formed over a large area, and the contact resistance with the connection terminal 25a of the mounting substrate 25 can be reduced, and the respective extraction electrode layers 15, 16 and the connection terminal can be provided. Reliable and simple electrical connection between 25a.

另外,如圖2所示,在本實施方式中,在第一取出電極層15的最表面形成有焊墊34。需要說明的是,在第二取出電極層16的最表面也形成有焊墊。焊墊34例如是Ni/Au層(Ni為基底側)、Ni/Sn層、Ni/焊料層、Ni/Ag層。焊墊34的膜厚形成得薄至5μm左右。 Further, as shown in FIG. 2, in the present embodiment, the pad 34 is formed on the outermost surface of the first extraction electrode layer 15. It should be noted that a pad is also formed on the outermost surface of the second extraction electrode layer 16. The pad 34 is, for example, a Ni/Au layer (Ni is a base side), a Ni/Sn layer, a Ni/solder layer, and a Ni/Ag layer. The film thickness of the pad 34 is formed to be as thin as about 5 μm.

如圖2所示,第一取出電極層15與安裝基板25的連接端子25a之間藉由焊料層35接合。藉由在第一取出電 極層15的最表面設有焊墊34,而第一取出電極層15的最表面的焊料浸潤性提高,如圖2所示,能夠形成圓角狀的焊料層35,能夠提高第一取出電極層15與安裝基板25的連接端子25a之間的電性連接性。需要說明的是,對於第二取出電極層16與安裝基板25的連接端子25a之間也可以藉由圓角狀的焊料層進行接合。 As shown in FIG. 2, the first extraction electrode layer 15 and the connection terminal 25a of the mounting substrate 25 are joined by a solder layer 35. By taking out the electricity at the first The pad 34 is provided on the outermost surface of the pole layer 15, and the solder wettability of the outermost surface of the first extraction electrode layer 15 is improved. As shown in FIG. 2, the solder layer 35 having a rounded shape can be formed, and the first extraction electrode can be improved. Electrical connection between the layer 15 and the connection terminal 25a of the mounting substrate 25. It should be noted that the second extraction electrode layer 16 and the connection terminal 25a of the mounting substrate 25 may be joined by a rounded solder layer.

如圖1(a)所示,第一線圈12的從捲繞始端12a的最初的延伸而出方向α1是X1方向(第一方向),另一方面,如圖1(c)所示,第二線圈13的從捲繞始端13a的最初的延伸而出方向α2是X2方向(第二方向),在第一線圈12和第二線圈13中,延伸而出方向相反。 As shown in Fig. 1(a), the direction α1 of the first coil 12 from the first extension of the winding start end 12a is the X1 direction (first direction), and on the other hand, as shown in Fig. 1(c), The first extension from the winding start end 13a of the two coils 13 is the X2 direction (second direction), and the first coil 12 and the second coil 13 extend in opposite directions.

而且,前述延伸而出方向α1、α2與絕緣基材11的第一側面11d及第二側面11e的長度方向(Y1-Y2)正交。由此,能夠使第一線圈12與第二線圈13的匝數相同,而且能夠將匝數增加為最大限度,能夠實現電感的增加。 Further, the extending directions α1 and α2 are orthogonal to the longitudinal direction (Y1-Y2) of the first side surface 11d and the second side surface 11e of the insulating base material 11. Thereby, the number of turns of the first coil 12 and the second coil 13 can be made the same, and the number of turns can be increased to the maximum, and the inductance can be increased.

圖3(a)是與圖1(a)、圖1(c)不同的另一實施方式,圖3(a)的右圖表示第一線圈40的俯視圖,圖3(a)的左圖表示第二線圈41的俯視圖。 Fig. 3 (a) is another embodiment different from Fig. 1 (a) and Fig. 1 (c), and the right diagram of Fig. 3 (a) shows a plan view of the first coil 40, and the left diagram of Fig. 3 (a) shows A top view of the second coil 41.

如圖3(a)所示,第一線圈40的從捲繞始端40a的最初的延伸而出方向α3為Y1方向,第二線圈41的從捲繞始端41a的最初的延伸而出方向α4為Y2方向。 As shown in Fig. 3(a), the direction α3 of the first coil 40 from the first extension of the winding start end 40a is the Y1 direction, and the direction α4 of the second coil 41 from the first extension of the winding start end 41a is Y2 direction.

如圖3(a)的右圖所示,第一線圈40的捲繞終端40b與一體化的第一取出電極層42連接,第一取出電極層42沿著絕緣基材的第一側面(未圖示)的長度方向(X1- X2)形成。 As shown in the right diagram of FIG. 3(a), the winding end 40b of the first coil 40 is connected to the integrated first extraction electrode layer 42, and the first extraction electrode layer 42 is along the first side of the insulating substrate (not The length direction of the illustration) (X1- X2) is formed.

另外,如圖3(a)的左圖所示,第二線圈41的捲繞終端41b與一體化的第二取出電極層43連接,第二取出電極層43沿著絕緣基材的第二側面(未圖示)的長度方向(X1-X2)形成。 Further, as shown in the left diagram of FIG. 3(a), the winding end 41b of the second coil 41 is connected to the integrated second extraction electrode layer 43, and the second extraction electrode layer 43 is along the second side of the insulating substrate. The longitudinal direction (X1-X2) of (not shown) is formed.

即,第一線圈40及第二線圈41的從各捲繞始端40a、41a的最初的延伸而出方向α3、α4(Y1-Y2)彼此為相反方向,且前述延伸而出方向α3、α4與絕緣基材的第一側面及第二側面的長度方向(X1-X2)正交。 In other words, the first and second coils 40 and 41 of the first coil 40 and the second coil 41 are opposite to each other in the direction α3 and α4 (Y1 to Y2), and the extending directions α3 and α4 are opposite to each other. The longitudinal direction (X1-X2) of the first side surface and the second side surface of the insulating base material is orthogonal.

其結果是,如圖3(a)所示,第一線圈40與第二線圈41的匝數相同,當使第一線圈40與第二線圈41重合時,第一線圈40的各匝的位置與第二線圈41的各匝的位置一致,且能夠將匝數增加為最大限度。 As a result, as shown in FIG. 3(a), the number of turns of the first coil 40 and the second coil 41 is the same, and when the first coil 40 and the second coil 41 are overlapped, the positions of the respective turns of the first coil 40 are obtained. The position of each turn of the second coil 41 is identical, and the number of turns can be increased to the maximum.

另一方面,圖3(b)揭示比較例的線圈,圖3(b)的右圖表示第一線圈45的俯視圖,圖3(b)的左圖表示第二線圈46的俯視圖。 On the other hand, Fig. 3(b) discloses a coil of a comparative example, and the right diagram of Fig. 3(b) shows a plan view of the first coil 45, and the left diagram of Fig. 3(b) shows a plan view of the second coil 46.

如圖3(b)所示,第一線圈45的從捲繞始端45a的最初的延伸而出方向α5為Y1方向,第二線圈46的從捲繞始端46a的最初的延伸而出方向α6為Y2方向。 As shown in Fig. 3(b), the direction α5 of the first coil 45 from the first extension of the winding start end 45a is the Y1 direction, and the direction α3 of the second coil 46 from the first extension of the winding start end 46a is Y2 direction.

如圖3(b)的右圖所示,第一線圈45的捲繞終端45b與一體化的第一取出電極層47連接,第一取出電極層47沿著絕緣基材的側面(未圖示)的長度方向(Y1-Y2)形成。 As shown in the right diagram of FIG. 3(b), the winding end 45b of the first coil 45 is connected to the integrated first extraction electrode layer 47, and the first extraction electrode layer 47 is along the side surface of the insulating substrate (not shown). The length direction (Y1-Y2) is formed.

另外,如圖3(b)的左圖所示,第二線圈46的捲繞 終端46b與一體化的第二取出電極層48連接,第二取出電極層48沿著絕緣基材的側面(未圖示)的長度方向(Y1-Y2)形成。 In addition, as shown in the left diagram of FIG. 3(b), the winding of the second coil 46 The terminal 46b is connected to the integrated second extraction electrode layer 48, and the second extraction electrode layer 48 is formed along the longitudinal direction (Y1-Y2) of the side surface (not shown) of the insulating substrate.

在圖3(b)的比較例中,第一線圈45及第二線圈46的從各捲繞始端45a、46a的最初的延伸而出方向α5、α6(Y1-Y2)彼此為相反方向,但前述延伸而出方向α5、α6與形成有各取出電極層47、48的絕緣基材的側面的長度方向(Y1-Y2)平行。 In the comparative example of FIG. 3(b), the first coil 45 and the second coil 46 are in the opposite directions from the first extension of the respective winding start ends 45a and 46a, and the directions α5 and α6 (Y1-Y2) are opposite to each other. The extending directions α5 and α6 are parallel to the longitudinal direction (Y1-Y2) of the side surface of the insulating base material on which the extraction electrode layers 47 and 48 are formed.

其結果是,如圖3(b)所示,第一線圈45與第二線圈46的匝數不同。如圖3(b)所示,在從第一線圈45的捲繞始端45a觀察的情況下,Y2側區域的線圈匝數為3,但在從第二線圈46的捲繞始端46a觀察的情況下,Y2側區域的線圈匝數為4。 As a result, as shown in FIG. 3(b), the number of turns of the first coil 45 and the second coil 46 is different. As shown in FIG. 3(b), when viewed from the winding start end 45a of the first coil 45, the number of turns of the Y2 side region is 3, but it is observed from the winding start end 46a of the second coil 46. Next, the number of turns of the coil in the Y2 side region is 4.

如此,在圖3(b)的比較例中,第一線圈45與第二線圈46的匝數在局部不一致,無法將匝數增加為最大限度,與圖3(a)的實施方式相比,電感下降。 As described above, in the comparative example of FIG. 3(b), the number of turns of the first coil 45 and the second coil 46 does not coincide locally, and the number of turns cannot be increased to the maximum, as compared with the embodiment of FIG. 3(a). The inductance drops.

由此,如圖3(a)那樣,第一線圈40及第二線圈41的從各捲繞始端40a、41a的最初的延伸而出方向α3、α4(Y1-Y2)彼此為相反方向,且前述延伸而出方向α3、α4與絕緣基材的第一側面及第二側面的長度方向(X1-X2)正交,由此能夠實現電感的增加。而且,為了得到相同匝數,也可以包含取出電極層而形成為最小尺寸的薄型電感器。 As a result, as shown in FIG. 3( a ), the first coil 40 and the second coil 41 are opposite to each other from the first extending end 40 a , 41 a , and the directions α3 and α4 (Y1 - Y2) are opposite to each other, and The extending directions α3 and α4 are orthogonal to the longitudinal direction (X1-X2) of the first side surface and the second side surface of the insulating base material, whereby an increase in inductance can be achieved. Further, in order to obtain the same number of turns, a thin inductor in which the electrode layer is taken out to form the minimum size may be included.

需要說明的是,本實施方式的共通的特徵的部分是將 線圈、導通層及取出電極層一體化的點。由此,關於線圈的捲繞方向與取出電極層的延伸而出方向的關係,並未將圖3(b)的結構排除在外。但是,圖3(a)更優選。 It should be noted that part of the common features of the present embodiment is A point where the coil, the conduction layer, and the extraction electrode layer are integrated. Thereby, the relationship between the winding direction of the coil and the direction in which the electrode layer is taken out is not excluded from the structure of FIG. 3(b). However, Fig. 3(a) is more preferable.

圖4是另一實施方式的薄型電感器的縱向剖視圖。在圖4中,對於與圖1(b)相同的層,標注了相同符號。 4 is a longitudinal cross-sectional view of a thin inductor of another embodiment. In FIG. 4, the same elements as those in FIG. 1(b) are denoted by the same reference numerals.

在圖4中,與圖1(b)不同地,在第一取出電極層15及第二取出電極層16未形成第二鍍敷層23。由此,在圖4中,第一取出電極層15和第二取出電極層16的各上面部15b、16b、各下面部15c、16c與第一線圈12及第二線圈13同樣地,是箔體18、20與第一鍍敷層19的層疊結構,形成為大致相同的膜厚。因此,如圖4所示,在磁性片17、30的表面與各取出電極層15、16的各上面部15b、16b及各下面部15c、16c的表面之間產生高低差。由此,如圖3所示,在各取出電極層15、16的各下面部15c、16c與安裝基板25的連接端子25a之間容易形成間隙β。前述間隙β藉由焊料層35填埋,各取出電極層15、16與連接端子25a之間透過焊料層35電性連接。 In FIG. 4, unlike FIG. 1(b), the second plating layer 23 is not formed on the first extraction electrode layer 15 and the second extraction electrode layer 16. Therefore, in FIG. 4, the upper surface portions 15b and 16b and the lower surface portions 15c and 16c of the first extraction electrode layer 15 and the second extraction electrode layer 16 are foils similarly to the first coil 12 and the second coil 13 The laminated structure of the bodies 18 and 20 and the first plating layer 19 is formed to have substantially the same film thickness. Therefore, as shown in FIG. 4, a height difference is generated between the surfaces of the magnetic sheets 17, 30 and the upper surface portions 15b, 16b of the respective extraction electrode layers 15, 16 and the surfaces of the respective lower surface portions 15c, 16c. Thereby, as shown in FIG. 3, a gap β is easily formed between each of the lower surface portions 15c and 16c of each of the extraction electrode layers 15 and 16 and the connection terminal 25a of the mounting substrate 25. The gap β is filled by the solder layer 35, and the extraction electrode layers 15 and 16 and the connection terminal 25a are electrically connected to each other through the solder layer 35.

但是,在圖3的結構的情況下,各取出電極層15、16的各下面部15c、16c未成為對安裝基板25的安裝面,而是成為浮起的狀態,因此能減少與連接端子25a之間的接觸電阻,並且為了得到與連接端子25a的可靠的連接,而如圖1(b)、圖2所示,對第一取出電極層15及第二取出電極層16施以第二鍍敷層23,各取出電極層15、16的各上面部15b、16b及各下面部15c、16c的膜厚形成得比 各線圈12、13的膜厚厚,優選將各磁性片17、30的表面與各取出電極層15、16的各上面部15b、16b及各下面部15c、16c的表面形成為大致同一平面。或者優選使各上面部15b、16b及各下面部15c、16c的表面比各磁性片17、30的表面還向離開絕緣基材11的方向突出。 However, in the case of the configuration of FIG. 3, the lower surface portions 15c and 16c of the respective extraction electrode layers 15 and 16 are not mounted on the mounting substrate 25 but are in a floating state, so that the connection terminal 25a can be reduced. Contact resistance between the two, and in order to obtain a reliable connection with the connection terminal 25a, as shown in FIG. 1(b) and FIG. 2, the first extraction electrode layer 15 and the second extraction electrode layer 16 are subjected to the second plating. In the cladding layer 23, the film thicknesses of the upper surface portions 15b and 16b and the lower surface portions 15c and 16c of the respective extraction electrode layers 15 and 16 are formed. The thickness of each of the coils 12 and 13 is thick, and it is preferable that the surfaces of the respective magnetic sheets 17 and 30 and the upper surface portions 15b and 16b of the respective extraction electrode layers 15 and 16 and the surfaces of the lower surface portions 15c and 16c are formed in substantially the same plane. Alternatively, it is preferable that the surfaces of the upper surface portions 15b and 16b and the respective lower surface portions 15c and 16c protrude from the surfaces of the magnetic sheets 17 and 30 in a direction away from the insulating base material 11.

接下來,對本實施方式的薄型電感器(磁力元件)的製造方法進行說明。圖5的各圖是製造階段的薄型電感器的局部縱向剖視圖。需要說明的是,對於與圖1等相同的層,標注相同符號。 Next, a method of manufacturing the thin inductor (magnetic element) of the present embodiment will be described. Each of the figures of Figure 5 is a partial longitudinal cross-sectional view of a thin inductor at the manufacturing stage. It should be noted that the same elements as those in FIG. 1 and the like are denoted by the same reference numerals.

在圖5(a)中,準備了在絕緣基材11的上面11a形成第一箔體18且在下面50b形成有第二箔體20的絕緣基板51。如圖5(b)~圖5(f)所示對該絕緣基板51進行加工,藉由圖5(f)工序進行切斷,由此從絕緣基板51能得到複數個圖1所示的薄型電感器。例如,絕緣基板51優選為在上下面具備銅箔的玻璃環氧基板。在此,第一箔體18及第二箔體20的膜厚例如為35μm左右。 In Fig. 5(a), an insulating substrate 51 in which a first foil body 18 is formed on the upper surface 11a of the insulating base material 11 and a second foil body 20 is formed on the lower surface 50b is prepared. The insulating substrate 51 is processed as shown in FIGS. 5(b) to 5(f), and is cut by the step of FIG. 5(f), whereby a plurality of thin patterns as shown in FIG. 1 can be obtained from the insulating substrate 51. Inductor. For example, the insulating substrate 51 is preferably a glass epoxy substrate provided with a copper foil on the upper and lower surfaces. Here, the film thickness of the first foil body 18 and the second foil body 20 is, for example, about 35 μm.

在圖5(b)的工序中,在將絕緣基板51區分為複數個薄型電感器的區域時的各區域間的位置形成有貫通孔52。在絕緣基板51的從上面51a直到下面51b形成貫通孔52。貫通孔52的向Y1-Y2方向的長度尺寸為圖1所示的L1。而且,貫通孔52的向X1-X2方向的寬度尺寸T3為通孔53的寬度尺寸T5以上,優選以從絕緣基板51能獲取複數個薄型電感器的方式儘量減小。尤其是,寬度尺寸T3形成得大於各薄型電感器的側面11d、11e上形成的 第一鍍敷層19與第二鍍敷層23的膜厚相加所得到的膜厚T4(參照圖1(a)(b))的2倍。具體而言,寬度尺寸T3為200μm以上。 In the step of FIG. 5( b ), the through hole 52 is formed at a position between the respective regions when the insulating substrate 51 is divided into a plurality of thin inductors. A through hole 52 is formed in the insulating substrate 51 from the upper surface 51a to the lower surface 51b. The length dimension of the through hole 52 in the Y1-Y2 direction is L1 shown in Fig. 1 . Further, the width dimension T3 of the through hole 52 in the X1-X2 direction is equal to or larger than the width dimension T5 of the through hole 53, and is preferably minimized so that a plurality of thin inductors can be obtained from the insulating substrate 51. In particular, the width dimension T3 is formed larger than that formed on the side faces 11d, 11e of the respective thin inductors The film thickness T4 (see FIG. 1 (a) (b)) obtained by adding the film thickness of the first plating layer 19 and the second plating layer 23 is twice as large. Specifically, the width dimension T3 is 200 μm or more.

另外,如圖5(b)所示,在成為各薄型電感器的區域的大致中央位置形成有從絕緣基板51的上面51a到下面51b貫通的通孔53。通孔53例如為圓柱狀或棱柱狀。如圖1(b)所示,貫通孔52的寬度尺寸T3形成得大於通孔53的寬度尺寸T5。 Further, as shown in FIG. 5(b), a through hole 53 penetrating from the upper surface 51a of the insulating substrate 51 to the lower surface 51b is formed at a substantially central position of a region where each thin inductor is formed. The through hole 53 is, for example, cylindrical or prismatic. As shown in FIG. 1(b), the width dimension T3 of the through hole 52 is formed larger than the width dimension T5 of the through hole 53.

貫通孔52及通孔53的形成可以使用微影技術。或者不僅是微影技術,也可以使用鑽頭等的機械加工來廉價地形成孔。 The formation of the through hole 52 and the through hole 53 can use a lithography technique. Alternatively, not only the lithography technique, but also machining using a drill or the like can form the hole at low cost.

接下來,在圖5(c)的工序中,與第一箔體18及第二箔體20重合地藉由無電解鍍敷法形成第一鍍敷層19。此時,在通孔53內形成基於第一鍍敷層19的導通層14,並且從第一箔體18的表面直到貫通孔52內的側壁面52a、52b及第二箔體20的表面而形成前述第一鍍敷層19。例如藉由基於Cu的無電解鍍敷形成第一鍍敷層19。第一鍍敷層19的膜厚例如為35μm左右。 Next, in the step of FIG. 5(c), the first plating layer 19 is formed by electroless plating in superposition with the first foil body 18 and the second foil body 20. At this time, the conduction layer 14 based on the first plating layer 19 is formed in the through hole 53, and from the surface of the first foil body 18 to the surface of the side wall faces 52a, 52b and the second foil body 20 in the through hole 52. The aforementioned first plating layer 19 is formed. The first plating layer 19 is formed, for example, by electroless plating based on Cu. The film thickness of the first plating layer 19 is, for example, about 35 μm.

接下來,在圖5(d)的工序中,使用微影技術,在成為薄型電感器的各區域的上面側形成由第一箔體18及第一鍍敷層19構成的第一線圈12,而且,在成為薄型電感器的各區域的下面側形成由第二箔體20及第一鍍敷層19構成的第二線圈13。 Next, in the step of FIG. 5(d), the first coil 12 composed of the first foil body 18 and the first plating layer 19 is formed on the upper surface side of each region of the thin inductor by using a lithography technique. Further, a second coil 13 composed of the second foil body 20 and the first plating layer 19 is formed on the lower surface side of each region of the thin inductor.

例如,藉由圖1(a)、圖1(c)所示的平面形狀形 成第一線圈12及第二線圈13。 For example, the planar shape shown by FIG. 1(a) and FIG. 1(c) The first coil 12 and the second coil 13 are formed.

如圖5(d)所示,將位於第一線圈12的內側的捲繞始端12a和導通層14一體化形成,而且,將位於第二線圈13的內側的捲繞始端13a和導通層14一體化形成。 As shown in FIG. 5(d), the winding start end 12a and the conduction layer 14 located inside the first coil 12 are integrally formed, and the winding start end 13a and the conduction layer 14 located inside the second coil 13 are integrated. Formed.

另外,在圖5(d)的工序中,形成與位於第一線圈12的外側的捲繞終端12b連接的第一取出電極層15、及與位於第二線圈13的外側的捲繞終端13b連接的第二取出電極層16(參照圖1(a)(c))。 Further, in the step of FIG. 5(d), the first extraction electrode layer 15 connected to the winding terminal 12b located outside the first coil 12 and the winding terminal 13b located outside the second coil 13 are formed. The second extraction electrode layer 16 (see Fig. 1 (a) (c)).

貫通孔52的第一側壁面52a相當於構成薄型電感器10的絕緣基材11的第一側面11d。而且,貫通孔52的第二側壁面52b相當於構成薄型電感器10的絕緣基材11的第二側面11e。並且,第一取出電極層15具有:直接形成於第一側壁面52a的具有基於無電解鍍敷的第一鍍敷層19的第一側面部15a;從第一側面部15a向絕緣基材11的上面延伸而出的第一上面部15b;從第一側面部15a向絕緣基材11的下面延伸而出的第一下面部15c。而且,第二取出電極層16具有:直接形成於第二側壁面52b的具有基於無電解鍍敷的第一鍍敷層19的第二側面部16a;從第二側面部16a向絕緣基材11的上面延伸而出的第二上面部16b;從第二側面部16a向絕緣基材11的下面延伸而出的第二下面部16c。 The first side wall surface 52a of the through hole 52 corresponds to the first side surface 11d of the insulating base material 11 constituting the thin inductor 10. Further, the second side wall surface 52b of the through hole 52 corresponds to the second side surface 11e of the insulating base material 11 constituting the thin inductor 10. Further, the first extraction electrode layer 15 has a first side surface portion 15a having a first plating layer 19 based on electroless plating directly formed on the first side wall surface 52a, and an insulating substrate 11 from the first side surface portion 15a. The first upper surface portion 15b extending from the upper surface thereof and the first lower surface portion 15c extending from the first side surface portion 15a toward the lower surface of the insulating base material 11. Further, the second extraction electrode layer 16 has a second side surface portion 16a having a first plating layer 19 based on electroless plating directly formed on the second side wall surface 52b, and an insulating substrate 11 from the second side surface portion 16a. The second upper surface portion 16b extending from the upper surface thereof and the second lower surface portion 16c extending from the second side surface portion 16a toward the lower surface of the insulating base material 11.

如圖1(a)(c)所示,第一取出電極層15及第二取出電極層16沿著Y1-Y2方向藉由長度尺寸L1形成。該長度尺寸L1與構成各薄型電感器10的絕緣基材11的第一 側面11d及第二側面11e的向Y1-Y2方向的長度尺寸一致。 As shown in FIGS. 1(a) and (c), the first extraction electrode layer 15 and the second extraction electrode layer 16 are formed by the length dimension L1 along the Y1-Y2 direction. The length dimension L1 and the first of the insulating substrates 11 constituting each of the thin inductors 10 The lengths of the side surface 11d and the second side surface 11e in the Y1-Y2 direction are the same.

如圖5(d)及圖1(a)所示,第一線圈12及第一取出電極層15同樣地由第一箔體18與第一鍍敷層19的層疊結構形成,並從第一線圈12的捲繞終端12b直到第一取出電極層15的第一上面部15b而一體化形成。而且如圖5(d)及圖1(c)所示,第二線圈13及第二取出電極層16同樣地由第二箔體20與第一鍍敷層19的層疊結構形成,並從第二線圈13的捲繞終端13b直到第二取出電極層16的第二下面部16c而一體化形成。 As shown in FIG. 5(d) and FIG. 1(a), the first coil 12 and the first extraction electrode layer 15 are similarly formed by a laminated structure of the first foil 18 and the first plating layer 19, and are first The winding end 12b of the coil 12 is integrally formed up to the first upper surface portion 15b of the first extraction electrode layer 15. Further, as shown in FIGS. 5(d) and 1(c), the second coil 13 and the second extraction electrode layer 16 are similarly formed by a laminated structure of the second foil 20 and the first plating layer 19, and The winding end 13b of the two coils 13 is integrally formed up to the second lower surface portion 16c of the second extraction electrode layer 16.

接下來,在圖5(e)的工序中,在第一取出電極層15及第二取出電極層16的第一鍍敷層19的表面藉由電解鍍敷法而形成第二鍍敷層23。第二鍍敷層23優選由與第一鍍敷層19相同或同質的材質形成。例如藉由Cu形成第二鍍敷層23。而且,第二鍍敷層23的膜厚例如為65~75μm左右。 Next, in the step of FIG. 5(e), the second plating layer 23 is formed on the surface of the first plating layer 19 of the first extraction electrode layer 15 and the second extraction electrode layer 16 by electrolytic plating. . The second plating layer 23 is preferably formed of the same or homogenous material as the first plating layer 19. The second plating layer 23 is formed, for example, by Cu. Further, the film thickness of the second plating layer 23 is, for example, about 65 to 75 μm.

為了僅在第一取出電極層15及第二取出電極層16形成第二鍍敷層23,只要在第一取出電極層15及第二取出電極層16以外的區域設置阻劑層而不鍍敷第二鍍敷層23即可。 In order to form the second plating layer 23 only on the first extraction electrode layer 15 and the second extraction electrode layer 16, it is only necessary to provide a resist layer in a region other than the first extraction electrode layer 15 and the second extraction electrode layer 16 without plating. The second plating layer 23 may be used.

由此,能夠將第一取出電極層15及第二取出電極層16的各上面部15b、16b及各下面部15c、16c的膜厚形成得比第一線圈12及第二線圈13厚。 Thereby, the thicknesses of the upper surface portions 15b and 16b and the lower surface portions 15c and 16c of the first extraction electrode layer 15 and the second extraction electrode layer 16 can be made thicker than the first coil 12 and the second coil 13.

此時,第一取出電極層15及第二取出電極層16的各 側面部15a、16a藉由第一鍍敷層19與第二鍍敷層23的層疊結構形成。此時,如圖5(e)所示,在貫通孔52內相鄰的第一取出電極層15與第二取出電極層16不抵接,而隔開空間。 At this time, each of the first extraction electrode layer 15 and the second extraction electrode layer 16 The side surface portions 15a and 16a are formed by a laminated structure of the first plating layer 19 and the second plating layer 23. At this time, as shown in FIG. 5(e), the first extraction electrode layer 15 and the second extraction electrode layer 16 adjacent to each other in the through hole 52 are not in contact with each other, and space is separated.

另外,第一鍍敷層19與第二鍍敷層23藉由相同或同質的材質形成,第一鍍敷層19與第二鍍敷層23一體化。 Further, the first plating layer 19 and the second plating layer 23 are formed of the same or homogeneous material, and the first plating layer 19 and the second plating layer 23 are integrated.

而且,在第一取出電極層15及第二取出電極層16的最表面形成有由Ni/Au層(Ni為基底側)、Ni/Sn層、Ni/焊料層、Ni/Ag層等構成的焊墊34(參照圖2)。 Further, on the outermost surfaces of the first extraction electrode layer 15 and the second extraction electrode layer 16, a Ni/Au layer (Ni is a base side), a Ni/Sn layer, a Ni/solder layer, a Ni/Ag layer, or the like is formed. Pad 34 (see Figure 2).

接下來,在圖5(f)的工序中,在第一線圈12及第二線圈13的表面形成絕緣層31、32。絕緣層31、32可以使用環氧系低溫硬化劑、丙烯系低溫硬化劑。並且,在絕緣層31、32的表面黏貼有磁性片17、30。此時,磁性片17、30的表面和第一取出電極層15及第二取出電極層16的各上面部15b、16b、各下面部15c、16c的表面可以在大致同一平面形成。而且,可以使第一取出電極層15及第二取出電極層16的各上面部15b、16b、各下面部15c、16c的表面比磁性片17、30的表面還向離開絕緣基材11的方向突出。如此,只要是構成為以焊料安裝於電路基板時沒有障礙般地,至少使磁性片17、30從各上面部15b、16b、各下面部15c、16c的表面不突出即可。 Next, in the step of FIG. 5(f), insulating layers 31 and 32 are formed on the surfaces of the first coil 12 and the second coil 13. As the insulating layers 31 and 32, an epoxy-based low-temperature curing agent or a propylene-based low-temperature curing agent can be used. Further, magnetic sheets 17, 30 are adhered to the surfaces of the insulating layers 31, 32. At this time, the surfaces of the magnetic sheets 17, 30 and the upper surface portions 15b and 16b of the first extraction electrode layer 15 and the second extraction electrode layer 16 and the surfaces of the lower surface portions 15c and 16c may be formed on substantially the same plane. Further, the surfaces of the upper surface portions 15b and 16b and the lower surface portions 15c and 16c of the first extraction electrode layer 15 and the second extraction electrode layer 16 may be further away from the surface of the magnetic sheets 17, 30 in the direction away from the insulating substrate 11. protruding. As described above, at least the magnetic sheets 17 and 30 are not protruded from the surfaces of the upper surface portions 15b and 16b and the respective lower surface portions 15c and 16c as long as the solder is mounted on the circuit board without any hindrance.

並且,從圖5(f)的單點鏈線的位置切斷絕緣基板51時,能夠得到複數個薄型電感器10。 Further, when the insulating substrate 51 is cut from the position of the single-dot chain line of FIG. 5(f), a plurality of thin inductors 10 can be obtained.

根據圖5所示的本實施方式的薄型電感器10的製造 方法,如圖5(b)~圖5(d)所示,各線圈12、13、導通層14及各取出電極層15、16可以藉由相同的工序形成,各線圈12、13、導通層14及各取出電極層15、16可以一體化形成。由此,在本實施方式中,與以往相比,能夠以比以往更優異的製造效率製造出能夠減少線圈12、13與取出電極層15、16之間、及線圈12、13與導通層14之間的接觸電阻的薄型電感器。 Fabrication of the thin inductor 10 according to the present embodiment shown in FIG. As shown in FIGS. 5(b) to 5(d), each of the coils 12, 13, the conduction layer 14, and the respective extraction electrode layers 15, 16 can be formed by the same process, and the coils 12, 13, and the conduction layers are formed. 14 and each of the extraction electrode layers 15, 16 can be integrally formed. As a result, in the present embodiment, it is possible to reduce the manufacturing efficiency of the coils 12 and 13 and the extraction electrode layers 15 and 16 and the coils 12 and 13 and the conduction layer 14 more than conventionally. A thin inductor with a contact resistance between.

另外,在圖5(e)的工序中,在第一取出電極層15及第二取出電極層16的第一鍍敷層19上能夠重合形成第二鍍敷層23,能夠將第一取出電極層15的第一上面部15b及第一下面部15c、第二取出電極層16的第二上面部16b及第二下面部16c形成得比各線圈12、13厚。因此,在圖5(f)的工序中,能夠在線圈12、13的表面適當且簡單地設置與第一取出電極層15及第二取出電極層16的表面成為大致同一面的磁性片17、30。或者可以使第一取出電極層15及第二取出電極層16的表面比磁性片17、30的表面還突出。 Further, in the step of FIG. 5(e), the first plating layer 23 can be superposed on the first plating layer 19 of the first extraction electrode layer 15 and the second extraction electrode layer 16, and the first extraction electrode can be removed. The first upper surface portion 15b and the first lower surface portion 15c of the layer 15 and the second upper surface portion 16b and the second lower surface portion 16c of the second extraction electrode layer 16 are formed thicker than the respective coils 12 and 13. Therefore, in the step of FIG. 5(f), the magnetic sheets 17 which are substantially flush with the surfaces of the first extraction electrode layer 15 and the second extraction electrode layer 16 can be appropriately and easily provided on the surfaces of the coils 12 and 13, 30. Alternatively, the surfaces of the first extraction electrode layer 15 and the second extraction electrode layer 16 may protrude from the surfaces of the magnetic sheets 17, 30.

另外,若要製造圖4所示的結構的薄型電感器,只要除去圖5(e)的工序即可。 Further, in order to manufacture the thin inductor having the structure shown in Fig. 4, the step of Fig. 5(e) may be omitted.

另外,在本實施方式中,構成第二取出電極層16的第二上面部16b也可以不形成。藉由在第二上面部16b的位置設置阻劑等而不形成鍍敷層,能夠形成沒有第二上面部16b的結構的薄型電感器。 Further, in the present embodiment, the second upper surface portion 16b constituting the second extraction electrode layer 16 may not be formed. By providing a resist or the like at the position of the second upper surface portion 16b without forming a plating layer, it is possible to form a thin inductor having no structure of the second upper surface portion 16b.

10‧‧‧薄型電感器 10‧‧‧Small inductors

11‧‧‧絕緣基材 11‧‧‧Insulation substrate

11c、53‧‧‧通孔 11c, 53‧‧‧through holes

12、40、45‧‧‧第一線圈 12, 40, 45‧‧‧ first coil

12a、13a、40a、41a、45a、46a‧‧‧捲繞始端 12a, 13a, 40a, 41a, 45a, 46a‧‧‧ winding start

12b、13b、40b、41b、45b、46b‧‧‧捲繞終端 12b, 13b, 40b, 41b, 45b, 46b‧‧‧ winding terminal

13、41、46‧‧‧第二線圈 13, 41, 46‧‧‧ second coil

14‧‧‧導通層 14‧‧‧ conduction layer

15、42、47‧‧‧第一取出電極層 15, 42, 47‧‧‧ first extraction electrode layer

15a‧‧‧第一側面部 15a‧‧‧First side section

15b‧‧‧第一上面部 15b‧‧‧First upper face

15c‧‧‧第一下面部 15c‧‧‧ first lower part

16、43、48‧‧‧第二取出電極層 16, 43, 48‧‧‧ second extraction electrode layer

16a‧‧‧第二側面部 16a‧‧‧Second side section

16b‧‧‧第二上面部 16b‧‧‧Second upper face

16c‧‧‧第二下面部 16c‧‧‧ second lower part

17、30‧‧‧磁性片 17, 30‧‧‧ magnetic sheets

18‧‧‧第一箔體 18‧‧‧First foil

19‧‧‧第一鍍敷層 19‧‧‧First plating layer

23‧‧‧第二鍍敷層 23‧‧‧Second plating

25‧‧‧安裝基板 25‧‧‧Installation substrate

31、32‧‧‧絕緣層 31, 32‧‧‧Insulation

34‧‧‧焊墊 34‧‧‧ solder pads

35‧‧‧焊料層 35‧‧‧ solder layer

51‧‧‧絕緣基板 51‧‧‧Insert substrate

52‧‧‧貫通孔 52‧‧‧through holes

〔圖1〕圖1中,圖1(a)是本實施方式的薄型電感器的俯視圖,尤其是設置在絕緣基材上的第一線圈和取出電極層的上面部的俯視圖,並以虛線表示設置在絕緣基材下的第二線圈的圖,圖1(b)是從圖1(a)所示的A-A線切斷而從箭頭方向觀察到的本實施方式的薄型電感器的縱向剖視圖,圖1(c)是設置在絕緣基材下的第二線圈及取出電極層的下面部的俯視圖。 1] FIG. 1(a) is a plan view of a thin inductor of the present embodiment, in particular, a top view of an upper surface of a first coil and an extraction electrode layer provided on an insulating substrate, and is indicated by a broken line. FIG. 1(b) is a longitudinal cross-sectional view of the thin inductor of the embodiment, taken along the line AA shown in FIG. 1(a) and viewed from the direction of the arrow. Fig. 1 (c) is a plan view of a lower portion of the second coil and the extraction electrode layer provided under the insulating substrate.

〔圖2〕圖2是圖1(b)所示的薄型電感器的局部放大縱向剖視圖。 FIG. 2 is a partially enlarged longitudinal cross-sectional view of the thin inductor shown in FIG. 1(b).

〔圖3〕圖3中,圖3(a)、圖3(b)是第一線圈及第二線圈的俯視圖。 3] FIG. 3(a) and FIG. 3(b) are plan views of the first coil and the second coil.

〔圖4〕圖4是另一實施方式的薄型電感器的縱向剖視圖。 4] Fig. 4 is a longitudinal cross-sectional view of a thin inductor according to another embodiment.

〔圖5〕圖5中,圖5(a)~圖5(f)是用於說明本實施方式的薄型電感器的製造方法的工序圖(縱向剖視圖)。 5(a) to 5(f) are process drawings (longitudinal cross-sectional views) for explaining a method of manufacturing the thin inductor of the present embodiment.

10‧‧‧薄型電感器 10‧‧‧Small inductors

11‧‧‧絕緣基材 11‧‧‧Insulation substrate

11a‧‧‧絕緣基材的上面 11a‧‧‧Top of insulating substrate

11b‧‧‧絕緣基材的下面 11b‧‧‧Under the insulating substrate

11c‧‧‧通孔 11c‧‧‧through hole

11d‧‧‧絕緣基材的第一側面 11d‧‧‧First side of the insulating substrate

11e‧‧‧絕緣基材的第二側面 11e‧‧‧Second side of the insulating substrate

12‧‧‧第一線圈 12‧‧‧First coil

12a、13a‧‧‧捲繞始端 12a, 13a‧‧‧ winding start

12b、13b‧‧‧捲繞終端 12b, 13b‧‧‧ winding terminal

13‧‧‧第二線圈 13‧‧‧second coil

14‧‧‧導通層 14‧‧‧ conduction layer

15‧‧‧第一取出電極層 15‧‧‧First take-out electrode layer

15a‧‧‧第一側面部 15a‧‧‧First side section

15b‧‧‧第一上面部 15b‧‧‧First upper face

15c‧‧‧第一下面部 15c‧‧‧ first lower part

16‧‧‧第二取出電極層 16‧‧‧Second take-out electrode layer

16a‧‧‧第二側面部 16a‧‧‧Second side section

16b‧‧‧第二上面部 16b‧‧‧Second upper face

16c‧‧‧第二下面部 16c‧‧‧ second lower part

17‧‧‧磁性片 17‧‧‧ Magnetic sheet

18‧‧‧第一箔體 18‧‧‧First foil

19‧‧‧第一鍍敷層 19‧‧‧First plating layer

20‧‧‧第二箔體 20‧‧‧Second foil

23‧‧‧第二鍍敷層 23‧‧‧Second plating

30‧‧‧第二磁性片 30‧‧‧Second magnetic sheet

31、32‧‧‧絕緣層 31, 32‧‧‧Insulation

L1‧‧‧長度尺寸 L1‧‧‧ length dimensions

T1‧‧‧寬度尺寸 T1‧‧‧Width size

T4‧‧‧膜厚 T4‧‧‧ film thickness

Claims (14)

一種磁力元件,其特徵為:具有:絕緣基材;及第一線圈,形成於前述絕緣基材的上面;及第二線圈,形成於前述絕緣基材的下面;及導通層,透過形成於前述絕緣基材的通孔,而將位於前述第一線圈的內側的捲繞始端及位於前述第二線圈的內側的捲繞始端之間電性連接;及第一取出電極層,與位於前述第一線圈的外側的捲繞終端電性連接;及第二取出電極層,與位於前述第二線圈的外側的捲繞終端電性連接,前述第一線圈、前述第二線圈、前述導通層、前述第一取出電極層及前述第二取出電極層一體形成,前述第一取出電極層具有:第一側面部,形成於前述絕緣基材的第一側面;及第一上面部,從前述第一側面部向前述絕緣基材的上面延伸而出,並與前述第一線圈的前述捲繞終端一體連結;及第一下面部,從前述第一側面部向前述絕緣基材的下面延伸而出,前述第二取出電極層具有:第二側面部,形成於前述絕緣基材的與前述第一側面不同的第二側面;及第二下面部,從前述第二側面部向前述絕緣基材的下面延伸而出,並與前述第二線圈的捲繞終端一體連結。 A magnetic element characterized by comprising: an insulating substrate; and a first coil formed on the upper surface of the insulating substrate; and a second coil formed on a lower surface of the insulating substrate; and a conductive layer formed through the foregoing The through hole of the insulating substrate is electrically connected between the winding start end of the inner side of the first coil and the winding start end of the inner side of the second coil; and the first extraction electrode layer is located at the first a winding terminal on the outer side of the coil is electrically connected; and a second extraction electrode layer is electrically connected to a winding end located outside the second coil, the first coil, the second coil, the conduction layer, and the first An extraction electrode layer and the second extraction electrode layer are integrally formed, the first extraction electrode layer having a first side surface portion formed on a first side surface of the insulating substrate, and a first upper surface portion from the first side surface portion Extending from the upper surface of the insulating base material and integrally connected to the winding end of the first coil; and the first lower surface portion from the first side surface portion to the insulating substrate Extendingly, the second extraction electrode layer has a second side surface portion formed on a second side surface of the insulating base material different from the first side surface, and a second lower surface portion that is insulated from the second side surface portion The lower surface of the substrate extends and is integrally coupled to the winding end of the second coil. 如申請專利範圍第1項所述的磁力元件,其中,構成前述第一取出電極層的前述第一上面部及前述第一下面部、以及構成前述第二取出電極層的前述第二下面部,係形成得比前述第一線圈及前述第二線圈厚;在前述 第一線圈的上面側重合地設置第一磁性體層,在前述第二線圈的下面側重合地設置第二磁性體層;前述第一磁性體層及前述第一上面部的各表面大致在同一面形成、或前述第一上面部的表面比前述第一磁性體層的表面還向離開前述絕緣基材的方向突出;前述第二磁性體層、前述第一下面部及前述第二下面部的各表面大致在同一面形成、或前述第一下面部及前述第二下面部的各表面比前述第二磁性體層的表面還向離開前述絕緣基材的方向突出。 The magnetic element according to claim 1, wherein the first upper surface portion and the first lower surface portion of the first extraction electrode layer and the second lower surface portion constituting the second extraction electrode layer are Formed thicker than the first coil and the second coil; a first magnetic layer is disposed on the upper surface of the first coil, and a second magnetic layer is disposed on a lower surface side of the second coil; and the surfaces of the first magnetic layer and the first upper surface are formed substantially on the same surface. Or the surface of the first upper surface portion protrudes from the surface of the first magnetic layer further away from the insulating substrate; the surfaces of the second magnetic layer, the first lower surface, and the second lower portion are substantially the same The surface formation or the surfaces of the first lower surface portion and the second lower surface portion protrude from the surface of the second magnetic material layer in a direction away from the insulating base material. 如申請專利範圍第2項所述的磁力元件,其中,構成前述第一取出電極層的前述第一上面部及前述第一下面部、以及構成前述第二取出電極層的前述第二下面部,係具有:與前述第一線圈及前述第二線圈大致相同膜厚的內層,及與前述內層重合形成的外層;前述內層與前述外層一體化而形成。 The magnetic element according to claim 2, wherein the first upper surface portion and the first lower surface portion of the first extraction electrode layer and the second lower surface portion constituting the second extraction electrode layer are The inner layer has an inner layer having substantially the same thickness as the first coil and the second coil, and an outer layer formed by overlapping the inner layer; and the inner layer is formed integrally with the outer layer. 如申請專利範圍第3項所述的磁力元件,其中,前述內層及各線圈係由在前述絕緣基材的表面形成的箔體和與前述箔體重合形成的第一鍍敷層所構成,前述外層係由與前述第一鍍敷層重合形成的第二鍍敷層所形成;前述第一取出電極層的第一側面部、及前述第二取出電極層的第二側面部,分別由前述第一鍍敷層與前述第二鍍敷層的層疊結構所形成。 The magnetic element according to claim 3, wherein the inner layer and each of the coils are composed of a foil formed on a surface of the insulating base material and a first plating layer formed by being combined with the foil. The outer layer is formed by a second plating layer formed by overlapping the first plating layer; the first side surface portion of the first extraction electrode layer and the second side surface portion of the second extraction electrode layer are respectively The first plating layer is formed of a laminated structure of the second plating layer. 如申請專利範圍第4項所述的磁力元件,其中,前述第一鍍敷層是無電解鍍敷層,前述第二鍍敷層是電解鍍敷層。 The magnetic element according to claim 4, wherein the first plating layer is an electroless plating layer, and the second plating layer is an electrolytic plating layer. 如申請專利範圍第1項所述的磁力元件,其中,前述第一線圈、及前述第一取出電極層的前述第一上面部具有在前述絕緣基材的上面形成的第一箔體,前述第二線圈、前述第一取出電極層的前述第一下面部、及前述第二取出電極層的前述第二下面部具有在前述絕緣基材的下面形成的第二箔體,在前述第一箔體的表面及前述第二箔體的表面,分別重合形成鍍敷層,在前述第一取出電極層中,具有從前述第一箔體的表面通過前述絕緣基材的前述第一側面直到前述第二箔體的表面而形成的鍍敷層,從而構成前述第一上面部、前述第一側面部及前述第一下面部,在前述第二取出電極層中,具有從前述絕緣基材的前述第一側面直到前述第二箔體的表面而形成的鍍敷層,從而構成前述第二側面部及前述第二下面部。 The magnetic element according to claim 1, wherein the first coil and the first upper surface portion of the first extraction electrode layer have a first foil formed on an upper surface of the insulating substrate, and the first The second coil, the first lower surface portion of the first extraction electrode layer, and the second lower surface portion of the second extraction electrode layer have a second foil formed on a lower surface of the insulating substrate, and the first foil body The surface of the second foil and the surface of the second foil are superposed to form a plating layer, and the first extraction electrode layer has a surface from the first foil through the first side of the insulating substrate until the second a plating layer formed on a surface of the foil to constitute the first upper surface portion, the first side surface portion, and the first lower surface portion, and the second extraction electrode layer has the first surface from the insulating substrate The plating layer formed on the side surface up to the surface of the second foil body constitutes the second side surface portion and the second lower surface portion. 如申請專利範圍第1項所述的磁力元件,其中,前述第一取出電極層形成為與前述第一側面大致同一長度,前述第二取出電極層形成為與前述第二側面大致同一長度。 The magnetic element according to claim 1, wherein the first extraction electrode layer is formed to have substantially the same length as the first side surface, and the second extraction electrode layer is formed to have substantially the same length as the second side surface. 如申請專利範圍第1項所述的磁力元件,其中,在前述第一取出電極層及前述第二取出電極層的最表面形成有焊墊。 The magnetic element according to claim 1, wherein a pad is formed on an outermost surface of the first extraction electrode layer and the second extraction electrode layer. 如申請專利範圍第1項所述的磁力元件,其中,前述第二取出電極層具有:前述第二側面部;及第二 上面部,從前述第二側面部向前述絕緣基材的上面延伸而出,並藉由與前述第一上面部相同的結構而形成;及前述第二下面部,而構成。 The magnetic element according to claim 1, wherein the second extraction electrode layer has: the second side portion; and the second The upper surface portion is formed to extend from the second side surface portion toward the upper surface of the insulating base material, and is formed by the same structure as the first upper surface portion, and the second lower surface portion. 如申請專利範圍第1項所述的磁力元件,其中,前述第一線圈的從前述捲繞始端的最初的延伸而出方向是第一方向,前述第二線圈的從前述捲繞始端的最初的延伸而出方向是與前述第一方向相反方向的第二方向,前述絕緣基材的前述第二側面位於與前述第一側面面對的相反側,前述第一方向及前述第二方向是與前述絕緣基材的前述第一側面及前述第二側面的長度方向正交的正交方向。 The magnetic element according to claim 1, wherein the first coil has a first direction from the first winding end and a first direction, and the second coil has an initial direction from the winding start end. The extending direction is a second direction opposite to the first direction, and the second side surface of the insulating substrate is located on a side opposite to the first side surface, and the first direction and the second direction are The longitudinal direction of the first side surface and the second side surface of the insulating base material is orthogonal to each other. 一種磁力元件的製造方法,其特徵為,具有:第一工序,其中,準備在絕緣基材的上面形成有第一箔體且在下面形成有第二箔體的、能夠切斷成複數個磁力元件的絕緣基板,在前述絕緣基板的成為各磁力元件的區域間的位置上形成貫通孔,在成為各磁力元件的區域內形成通孔;第二工序,其中,與前述第一箔體及前述第二箔體重合地形成第一鍍敷層,此時,在前述通孔內形成基於前述第一鍍敷層的導通層,並從前述第一箔體的表面直到前述貫通孔內的側壁面及前述第二箔體的表面而形成前述第一鍍敷層;第三工序,其中,使用微影技術,在前述絕緣基材的上面側形成具有前述第一箔體及前述第一鍍敷層而成的第 一線圈,而且,在前述絕緣基材的下面側形成具有前述第二箔體及前述第一鍍敷層而成的第二線圈,此時,將位於前述第一線圈的內側及前述第二線圈的內側的各捲繞始端與前述導通層一體化而形成,此外,形成第一取出電極層並形成第二取出電極層,其中,前述第一取出電極層具有:第一側面部,形成於與前述絕緣基材的第一側面相當之前述貫通孔的第一側壁面上;及第一上面部,從前述第一側面部向前述絕緣基材的上面延伸而出,並與位於前述第一線圈的外側的捲繞終端一體化;及第一下面部,從前述第一側面部向前述絕緣基材的下面延伸而出;前述第二取出電極層具有:第二側面部,形成於與前述絕緣基材的不同於前述第一側面的第二側面相當之前述貫通孔的第二側壁面上;及第二下面部,從前述第二側面部向前述絕緣基材的下面延伸而出,並與位於前述第二線圈的外側的捲繞終端一體化;第四工序,其中,切斷前述絕緣基板,得到複數個前述磁力元件。 A method for producing a magnetic element, comprising: a first step of preparing a first foil body on an upper surface of an insulating base material and forming a second foil body on a lower surface thereof to be cut into a plurality of magnetic bodies The insulating substrate of the device has a through hole formed at a position between the regions of the insulating substrate which is a magnetic element, and a through hole is formed in a region where each magnetic element is formed. In the second step, the first foil and the first foil and the The second foil is formed to form a first plating layer by weight, and a conductive layer based on the first plating layer is formed in the through hole, and a surface of the first foil is formed from the surface of the first foil to the side wall of the through hole. And forming a surface of the second foil to form the first plating layer; and a third step of forming the first foil body and the first plating layer on an upper surface side of the insulating substrate by using a lithography technique Made of a coil, and a second coil having the second foil and the first plating layer formed on a lower surface side of the insulating base material, and at this time, is located inside the first coil and the second coil Each of the inner winding ends is formed integrally with the conductive layer, and a first extraction electrode layer is formed to form a second extraction electrode layer, wherein the first extraction electrode layer has a first side surface portion formed in and a first side wall surface of the through hole corresponding to the first side surface of the insulating base material; and a first upper surface portion extending from the first side surface portion toward the upper surface of the insulating base material and located at the first coil The outer winding end is integrated; and the first lower surface portion extends from the first side surface portion toward the lower surface of the insulating base material; and the second extraction electrode layer has a second side surface portion formed to be insulated from the foregoing a second side wall surface of the through hole corresponding to the second side surface of the first side surface; and a second lower surface portion extending from the second side surface portion to the lower surface of the insulating substrate Integrated with and located outside of the second coil winding terminal; a fourth step, wherein the insulating substrate is cut to obtain a plurality of the magnetic elements. 如申請專利範圍第11項所述的磁力元件的製造方法,其中,在前述第三工序與前述第四工序之間具有:在前述第一取出電極層及前述第二取出電極層的前述第一鍍敷層的表面上重合形成第二鍍敷層的第五工序,在前述第五工序之後,具有:在前述第一線圈的上面側重合設置第一磁性體層並在前述第二線圈的下面側重合 設置第二磁性體層的第六工序;使前述第一磁性體層、及前述第一上面部的各表面為大致同一面、或使前述第一上面部的表面比前述第一磁性體層的表面還向離開前述絕緣基材的方向突出;使前述第二磁性體層、前述第一下面部及前述第二下面部的各表面為大致同一面、或使前述第一下面部及前述第二下面部的各表面比前述第二磁性體層的表面還向離開前述絕緣基材的方向突出。 The method of manufacturing a magnetic element according to claim 11, wherein the first step of the first extraction electrode layer and the second extraction electrode layer is between the third step and the fourth step a fifth step of forming a second plating layer on the surface of the plating layer, and after the fifth step, the first magnetic layer is superposed on the upper surface side of the first coil and is on the lower surface side of the second coil coincide a sixth step of providing the second magnetic layer; the surfaces of the first magnetic layer and the first upper surface are substantially the same surface, or the surface of the first upper surface is further oriented than the surface of the first magnetic layer a direction protruding away from the insulating base material; wherein each surface of the second magnetic layer, the first lower surface portion, and the second lower surface portion is substantially the same surface, or each of the first lower surface portion and the second lower surface portion The surface protrudes from the surface of the second magnetic layer in a direction away from the insulating substrate. 如申請專利範圍第11項所述的磁力元件的製造方法,其中,在前述第一取出電極層及前述第二取出電極層的最表面上形成焊墊。 The method of manufacturing a magnetic element according to claim 11, wherein a pad is formed on an outermost surface of the first extraction electrode layer and the second extraction electrode layer. 如申請專利範圍第11項所述的磁力元件的製造方法,其中,在前述第二取出電極層上,與前述第二側面部及前述第二下面部一起形成第二上面部,該第二上面部從前述第二側面部向前述絕緣基材的上面延伸而出,且與前述第一上面部為相同結構。 The method of manufacturing a magnetic element according to claim 11, wherein the second extraction electrode layer forms a second upper surface portion together with the second side surface portion and the second lower surface portion, the second upper surface The portion extends from the second side surface portion toward the upper surface of the insulating base material, and has the same structure as the first upper surface portion.
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